TW201621352A - Anti-glare film, anti-glare polarizing plate and image display device - Google Patents

Abstract

The present invention provides an anti-glare film, and a polarizing plate and an Image display device using same. The anti-glare film comprises a transparent support, and an anti-glare layer having a rough surface that is laminated on the transparent support. A power spectrum of the rough surface is 1 [mu]m2 or more at a spatial frequency of 0.01 [mu]m<SP>-1</SP>, and 0.05 [mu]m2 or less at a spatial frequency of 0.033 [mu]m<SP>-1</SP>.

Description

Anti-glare film, anti-glare polarizing plate and image display device

The present invention relates to an anti-glare film, and an anti-glare polarizing plate and an image display device using the anti-glare film.

An image display device such as a liquid crystal display device, an organic electroluminescence (EL: Electroluminescence) display device, a plasma display panel, or a CRT (Cathode Ray Tube) display, when external light is mapped to its display surface At the time, the visibility is significantly impaired. The anti-glare film is an optical film used to suppress the mapping of such external light. The anti-glare film is provided with an anti-glare layer having a fine uneven surface which is advantageous for suppressing the mapping of external light, and is assembled in the image display device such that the uneven surface faces the viewing side.

Japanese Laid-Open Patent Publication No. 2014-119650 (Patent Document 1) discloses an anti-glare polarizing plate in which an anti-glare layer having a fine uneven surface is formed on a polarizing film, and is a power spectrum of the height of the fine uneven surface. Controlled anti-glare polarizer.

In the anti-glare polarizing plate described in Patent Document 1, the fine uneven surface is a secondary derivative function d ² logH ² (f) related to the spatial frequency f of a common logarithm logH ² (f) of the power spectrum of the elevation. ) / df ^2, the spatial frequency content to 0 and less than 0.01μm to 0.02μm spatial frequency control of ^-1 from exceeding 0, whereby ^-1, even at a low haze, may exhibit sufficient antiglare Sex, and can suppress glare. The glare is a phenomenon occurring in a relatively high-definition image display device, and the surface uneven shape of the anti-glare layer interferes with the pixels of the image display device, resulting in generation of a luminance distribution and viewing of the image display device. The phenomenon of reduced sexuality.

However, in the anti-glare polarizing plate described in Patent Document 1, when the high-definition image display device is incorporated, when the uneven surface-color filter distance L is less than 1 mm, glare may not be sufficiently suppressed. The distance L means a distance from the uneven surface (viewing side surface) of the antiglare layer to the viewing side surface of the RGB pattern of the color filter, and the substrate including the color filter formed with the RGB pattern (glass) The thickness of the substrate, etc.).

In general, when internal haze (internal scattering function) is applied to the antiglare layer, glare suppression is facilitated, but when the internal haze is increased, the brightness is lowered and the contrast is lowered.

Accordingly, an object of the present invention is to provide an anti-glare film which, when applied to an image display device, has sufficient anti-glare property and excellent glare suppression even at a low haze when the distance L is less than 1 mm. Sex. Another object of the present invention is to provide an anti-glare polarizing plate and an image display device using the anti-glare film.

The present invention provides an anti-glare film, an anti-glare polarizing plate, and an image display device shown below.

[1] An anti-glare film comprising: a transparent support; and an anti-glare layer having an uneven surface laminated on the transparent support; and a power spectrum of the elevation of the uneven surface at a spatial frequency of 0.01 μm ^-1 The middle is 1 μm ² or more, and is 0.05 μm ² or less in 0.033 μm ^-1 .

[2] The anti-glare film according to [1], which is an anti-glare film for an image display device having a color filter; is applied to the image display device from the uneven surface to the color The distance from the filter is less than 1 mm.

[3] The anti-glare film according to [2], wherein the aforementioned distance is less than 0.75 mm.

[4] An anti-glare polarizing film according to any one of [1] to [3], wherein the anti-glare film and the polarizing film are provided on the transparent support side of the anti-glare film. The polarizing film is disposed.

The anti-glare film according to any one of [1] to [3], and an image display element, wherein the transparent support of the anti-glare film is provided. On the side, the aforementioned image display element is disposed.

[6] The image display device according to [5], wherein the uneven surface is in contact with the air layer.

[7] An image display device comprising: the anti-glare polarizing plate according to [4]; and an image display element; wherein the image is disposed on the polarizing film side of the anti-glare polarizing plate Display component.

[8] The image display device according to [7], wherein the uneven surface is in contact with the air layer.

According to the present invention, it is possible to provide an anti-glare film, an anti-glare polarizing plate, and an image display device which are low even when the distance L is less than 1 mm when applied to an image display device. It also has sufficient anti-glare and glare suppression under the haze.

1‧‧‧Anti-glare film

2‧‧‧ concave surface

3‧‧‧Projection surface

5‧‧‧Main normal direction

7‧‧‧Mold base for mold

8‧‧‧ surface

9‧‧‧Photosensitive resin film

10‧‧‧ exposed areas

11‧‧‧Unexposed areas

12‧‧‧ mask

13‧‧‧Unmasked area

15‧‧‧1st surface relief shape

16‧‧‧2nd surface relief shape

17‧‧‧chrome plating

18‧‧‧chrome surface

101‧‧‧Anti-glare layer

102‧‧‧ Transparent support

103a‧‧‧1st adhesive layer

103b‧‧‧2nd adhesive layer

104‧‧‧ polarizing film

105‧‧‧Transparent resin layer

200‧‧‧Adhesive layer

300‧‧‧Substrate

400‧‧‧Color filters

L‧‧‧ concave surface - color filter distance

Fig. 1 is a cross-sectional view showing an example of an anti-glare film and an anti-glare polarizing plate of the present invention.

Fig. 2 is a perspective view schematically showing the surface of the anti-glare film of the present invention.

Fig. 3 is a view showing a state in which the function h(x, y) indicating the elevation is discretely obtained.

Fig. 4 is a diagram showing the elevation of the uneven surface of the antiglare layer by a two-dimensional discrete function h(x, y).

Fig. 5 is a view showing a method of averaging the two-dimensional power spectrum H ² (f _x , f _y ) by the distance f from the origin in the frequency space.

Fig. 6 (a) to (e) are views showing a preferred example of the first half of the method for producing a mold for forming an uneven surface.

Fig. 7 (a) to (d) are views showing a preferred example of the latter half of the method for producing a mold for forming an uneven surface.

Fig. 8 is a view showing a part of image data of the exposure pattern A.

Fig. 9 is a view showing a part of image data of the exposure pattern C.

Fig. 10 is a view showing a part of image data of the exposure pattern D.

Fig. 11 is a view showing a part of image data of the exposure pattern H.

Fig. 12 is a view showing a part of image data of the exposure pattern I.

Fig. 13 is a view showing a part of the image data of the exposure pattern J.

Fig. 14 is a view showing a part of image data of the exposure pattern K.

Fig. 15 is a view showing a one-dimensional power spectrum G ² (f) obtained by performing discrete Fourier transform on the image data of the exposure patterns A, C, and D.

Fig. 16 is a view showing a one-dimensional power spectrum G ² (f) obtained by performing discrete Fourier transform on the image data of the exposure patterns H, I, J, and K.

Fig. 17 is a view showing a one-dimensional power spectrum H ² (f) calculated from the elevation of the anti-glare films A to C.

Fig. 18 is a view showing a one-dimensional power spectrum H ² (f) calculated from the elevation of the anti-glare films D and E.

Fig. 19 is a view showing a one-dimensional power spectrum H ² (f) calculated from the elevation of the anti-glare film H to K.

1 is a cross-sectional view showing an example of an anti-glare film and an anti-glare polarizing plate of the present invention, and is shown in a state of being assembled in an image display device, specifically, via an adhesive layer 200. The anti-glare polarizing plate is bonded to the substrate 300 of a part of the image display element. The anti-glare film 1 of the present invention includes the transparent support 102 and an anti-glare layer 101 having a fine uneven surface 2 laminated thereon. Further, the anti-glare polarizing plate of the present invention, as shown in Fig. 1, includes an anti-glare film 1 and a polarizing film. Film 104. Hereinafter, the anti-glare film, the anti-glare polarizing plate, and the image display device using the same according to the present invention will be described in more detail.

<Anti-glare film>

(1) Power spectrum of the anti-glare layer and the elevation of its concave and convex surface

The anti-glare film 1 has an anti-glare layer 101 laminated on the transparent support 102, and the anti-glare layer 101 has a fine uneven surface 2. First, the power spectrum of the elevation of the uneven surface 2 of the anti-glare layer 101 will be described.

Fig. 2 is a perspective view schematically showing the surface of the anti-glare film of the present invention. The "elevation of the uneven surface 2" means an arbitrary point P on the uneven surface 2 of the anti-glare film 1 and a virtual plane having the height on the average height of the uneven surface 2 (the height is based on 0 μm) The linear distance in the main normal direction 5 of the anti-glare film 1 (the normal direction of the imaginary plane). In the second drawing, the entire surface of the anti-glare film is indicated by the projection surface 3.

The fine uneven surface 2 of the anti-glare layer 101 is a two-dimensional plane as shown in FIG. 2, and therefore, the elevation of the uneven surface 2, as shown in FIG. 2, represents the film surface by (x, y). The inner orthogonal coordinates can be represented by the two-dimensional function h(x, y) of the coordinates (x, y).

The elevation of the uneven surface 2 can be obtained from three-dimensional information of the surface shape measured by a device such as a confocal microscope, an interference microscope, or an atomic force microscope (AFM). The horizontal resolution required for the measuring machine is at least 5 μm or less, preferably 2 μm or less, and the vertical resolution is at least 0.1 μm or less, preferably 0.01 μm or less. A non-contact three-dimensional surface shape/roughness measuring machine suitable for the measurement includes a New View 5000 series (manufactured by Zygo Corporation, available from Zygo Co., Ltd. in Japan), a three-dimensional microscope PLμ2300 (manufactured by Sensofar Co., Ltd.), and the like. . Since the resolution of the power spectrum of the elevation must be 0.005 μm ^-1 or less, the measurement area is preferably at least 200 μm × 200 μm or more, more preferably 500 μm × 500 μm or more.

Next, a method of obtaining the power spectrum of the elevation from the two-dimensional function h(x, y) will be described. First, from the two-dimensional function h(x, y), the two-dimensional function H(f _x , f _y ) is obtained by the two-dimensional Fourier transform defined by the following formula (1).

f _x and f _y are frequencies in the x direction and the y direction, respectively, and are dimensions having a reciprocal of length. Further, π in the formula (1) is a pi, and i is an imaginary unit. Obtained by the two-dimensional function H (f _x, f _y) squaring, it may be a two-dimensional power spectrum is obtained ^{_{H 2 (f x, f y}} ). This two-dimensional power spectrum H ² (f _x , f _y ) represents the spatial frequency distribution of the uneven surface 2.

Hereinafter, a method of obtaining a two-dimensional power spectrum of the elevation of the uneven surface 2 will be described more specifically. The three-dimensional information of the surface shape actually measured by the confocal microscope, the interference microscope, the atomic force microscope, or the like is generally obtained as a discrete value, that is, corresponding to the elevation of a plurality of measurement points. Fig. 3 is a view showing a state in which the function h(x, y) indicating the elevation is discretely obtained. As shown in Fig. 3, when (x, y) is used, the in-plane of the anti-glare layer 101 is indicated. The orthogonal coordinates, and the dotted line indicates the line divided by Δx in the x-axis direction on the projection surface 3 and the line divided by Δy in the y-axis direction, in the actual measurement, the uneven surface The elevation of 2 can be obtained as a discrete elevation value for each intersection of each dashed line on the projection surface 3.

The number of the obtained elevation values is determined by the measurement range and Δx and Δy. As shown in Fig. 3, the measurement range in the x-axis direction is X = (M - 1) Δx, in the y-axis direction. When the measurement range is Y = (N - 1) Δy, the number of the obtained elevation values is M × N.

As shown in Fig. 3, when the coordinates of the eye point A on the projection surface 3 are (j Δx, k Δy) (j is 0 or more and M-1 or less, and k is 0 or more and N-1 or less) The elevation of the point P corresponding to the anti-glare film surface on the eye point A can be expressed as h(jΔx, kΔy).

Here, the measurement intervals Δx and Δy are dependent on the horizontal resolution of the measuring device, and the uneven surface is evaluated for accuracy. As described above, Δx and Δy are preferably 5 μm or less, and more preferably 2 μm or less. . Further, the measurement ranges X and Y are preferably 200 μm or more, and more preferably 500 μm or more, as described above.

As described above, in the actual measurement, the function indicating the elevation of the uneven surface can be obtained as a discrete function h(x, y) having M × N values. The discrete function H(f _x , f _y ) is obtained by taking the discrete function h(x, y) obtained by the measurement and the discrete Fourier transform defined by the following formula (2), and by using the discrete function H (f _x , f _y ) performs a squaring operation to obtain a discrete function H ² (f _x , f _y ) of the two-dimensional power spectrum. 1 in the formula (2) is an integer of -M/2 or more and M/2 or less, and m is an integer of -N/2 or more and N/2 or less. Further, Δf _x and Δf _y are frequency intervals in the x direction and the y direction, respectively, and are defined by the following formula (3) and the following formula (4).

Fig. 4 is an example of a graph showing the elevation of the uneven surface 2 of the anti-glare layer 101 by a two-dimensional discrete function h(x, y). In Fig. 4, the elevation is expressed in terms of white and black gradations. As shown in FIG. 4, since the uneven surface 2 of the anti-glare layer 101 is randomly formed by the unevenness, the two-dimensional power spectrum H ² (f _x , f _y ) in the frequency space (spatial frequency region) is the origin. (f _x =0, f _y =0) is symmetric about the center. Therefore, the two-dimensional function H ² (f _x , f _y ) can be converted into a distance function f (unit: μm ^-1 ) from the origin of the frequency space as a one-dimensional function H ² (f) of the variable. The anti-glare layer 101 of the present invention has a one-dimensional function H ² (f) indicating that one-dimensional power spectrum has a certain characteristic.

Specifically, as shown in Fig. 5, in the frequency space, it is calculated that it is located at (n-1/2) Δf or less from the origin O (f _x =0, f _y =0). n + 1/2) The number of points (the point of the black circle in Fig. 5) of all the distances of Δf is Nu. In the example shown in Fig. 5, Nn = 16. Next, the total value of H ² (f _x , f _y ) at the point where the distance from (n-1/2) Δf or more and less than (n+1/2) Δf is reached from the origin O is calculated. H ² n (the total value of H ² (f _x , f _y ) in the point of the black circle in Fig. 5), and as shown in the following formula (5), the total value is divided by the number of points Nn The value after H ² n is set to H ² (f).

Here, when M≧N, n is an integer of 0 or more and N/2 or less, and when M<N, n is an integer of 0 or more and M/2 or less. Further, M and N, as shown in Fig. 3, mean the number of measurement points in the x-axis direction and the number of measurement points in the y-axis direction, respectively. Further, Δf is set to (Δf _x + Δf _y )/2.

In general, one-dimensional power spectrum obtained by the foregoing method may include noise during measurement. In order to obtain the one-dimensional power spectrum, in order to remove the influence of the noise, it is preferable to measure the elevation of the concave-convex surface 2 at a plurality of points on the anti-glare layer 101, and one of the elevations of each uneven surface 2 is obtained. The average of the dimensional power spectrum is used as the one-dimensional power spectrum H ² (f). The number of the elevations of the uneven surface 2 on the antiglare layer 101 is preferably 3 or more, more preferably 5 or more.

In the anti-glare film 1 of the present invention, the power spectrum (one-dimensional power spectrum) of the height of the uneven surface 2 obtained as described above is set to 1 μm ² or more at a spatial frequency of 0.01 μm ^-1 at 0.033 μm ^{-1 .} The middle is set to 0.05 μm ² or less. Therefore, when assembled into a high-definition image display device, when the uneven surface-color filter distance L is less than 1 mm, sufficient anti-glare property and excellent glare suppressing property can be achieved. When the distance L is less than 0.75 mm, a higher glare suppression effect can be obtained.

As described above, the uneven surface-color filter distance L in the present specification refers to the first figure, and means the concave-convex surface 2 of the anti-glare layer 101 to the color filter 400 (more specifically, The distance from the surface of the RGB pattern of the color filter 400. The term "convex surface 2" as used herein means the side surface of the viewing surface and is the surface of the most prominent convex portion. Further, the surface of the color filter 400 means the surface on the viewing side, that is, the surface on the side of the substrate 300 on which the color filter 400 is disposed. The substrate 300 is a substrate constituting the viewing side of the image display element, and is a substrate to which the anti-glare film 1 or the anti-glare polarizing plate is bonded.

The common logarithm logH ² (f) of the one-dimensional power spectrum H ² (f) of the elevation of the concave-convex surface 2 is one-dimensional power obtained from the elevations of the different five concave-convex surfaces 2 on the anti-glare layer 101 The common logarithm of the spectrum is averaged. From the one-dimensional power spectrum of common logarithm logH ² (f), calculated one-dimensional power spectrum used the second derivative of the function related to the number of logH ² (f) of the spatial frequency ^{f d 2 logH 2 (f)} / df ² . Specifically, the second derivative function can be calculated by the difference method of the following formula (6).

From the two-dimensional discrete function h(x, y) shown in Fig. 4, the common logarithm logH ² (f) of the one-dimensional power spectrum H ² (f) obtained by the above equation (5) and the spatial frequency are obtained. f function associated second derivative ^{d 2 logH 2 (f) /} df 2, the spatial frequency of 0.01μm ^-1 to -5192, the spatial frequency as 36695 0.02μm ^-1. Therefore, the common logarithm logH ² (f) of the one-dimensional power spectrum is expressed as a graph with respect to the intensity of the spatial frequency, and has a convex shape at a spatial frequency of 0.01 μm ^-1 at a spatial frequency of 0.02 μm ^{- 1} has a shape that is convex downward.

The glare suppressing energy of the anti-glare film 1 of the present invention will be described in more detail below. The reason for the occurrence of glare is the brightness distribution caused by the interference between the pixels of the image display device and the surface uneven shape of the anti-glare film 1, so that the intensity of the glare depends on the fineness of the pixels of the image display device. The inventors assumed that the cause of glare is a hypothesis relating to the lens function of the unevenness of the uneven surface 2 in addition to the fineness of the pixel. That is, the unevenness of the uneven surface 2 functions as a lens, and when there is a pixel inside the focal length of the lens, the viewer sees that the enlarged virtual image of the pixel is a cause of glare. In this case, it is considered that when the undulating component of a certain period included in the fine unevenness is regarded as a continuously arranging lens, when the concave-convex surface-color filter distance L is shorter than the focal length of the lens, the undulating component enlarges the pixel It produces glare. According to this assumption, it is considered that the period of the undulating undulating component is different depending on the distance L.

After careful investigation, the inventors found that even if the same anti-glare film is used, the glare suppression energy differs depending on the distance L, and it is found that when the distance L is less than 1 mm, the fine unevenness is included. The undulating component of 30 μm or a period close to this is a major factor in generating glare. The present inventors have conducted investigations based on this finding, and as a result, it has been found that in order to reduce the undulating component of the above-described period and effectively suppress the glare when the distance L is less than 1 mm, it is necessary to set the height of the uneven surface 2 in the spatial frequency of 0.033 μm ^-1 . The power spectrum was set to 0.05 μm ² or less. From the viewpoint of suppressing glare of view, the power spectrum is preferably 0.04μm ² or less, more preferably 0.030μm ² or less.

On the other hand, the anti-glare polarizing plate described in the above-mentioned publication 1 can suppress the undulating component of the period of 50 μm in the vicinity of the fine unevenness, and it is confirmed that the glare can be effectively suppressed when the distance L is 1 mm or more. The surface has a concave-convex shape, but on the other hand, when applied to an image display device having a distance L of less than 1 mm, the glare suppression may be insufficient.

The power spectrum of the elevation of the uneven surface 2 in the spatial frequency of 0.033 μm ^-1 is usually 0.005 μm ² or more. When the power spectrum is less than 0.005 μm ² , it may be difficult to set the power spectrum in the spatial frequency of 0.01 μm ^-1 to 1 μm ² or more.

In addition, the inventors of the present invention have found that the anti-glare property of the anti-glare film 1 is related to the intensity of the undulating component in the vicinity of 100 μm included in the fine concavities and convexities, and when the undulation component in the period of the vicinity of 100 μm is strong, the external light can be made. The map is effectively scattered to enhance the anti-glare property, and in order to obtain good anti-glare property, it is necessary to set the power spectrum of the elevation at a spatial frequency of 0.01 μm ^-1 to 1 μm ² or more. The power spectrum is preferably 2 μm ² or more, more preferably 2.5 μm ² or more, still more preferably 3 μm ² or more from the viewpoint of anti-glare property.

The power spectrum of the elevation of the uneven surface 2 in the spatial frequency of 0.01 μm ^-1 is usually 10 μm ² or less. When the power spectrum exceeds 10 μm ² , it may be difficult to set the power spectrum in the spatial frequency of 0.033 μm ^-1 to 0.05 μm ² or less.

(2) Method for making anti-glare layer

A method for forming an uneven surface is formed by a method including a step of forming a surface shape (fine unevenness) according to a predetermined pattern on a surface of a mold base material, and transferring the shape of the uneven surface of the mold to the formed The anti-glare layer 101 can be produced by a method (imprint method) of the surface of the resin layer (photocurable resin layer or the like) on the transparent support 102. The "pattern" generally means an image data which can be formed by a computer for forming the uneven surface 2 of the anti-glare layer 101, but it can also be converted into the image data in a single meaning. Information (ranking data, etc.). The data that can be converted into image data in a single sense can be listed as the coordinates and the tone data of each pixel.

In order to accurately form the uneven surface 2 of the antiglare layer 101 having the power spectrum characteristics as described above, the one-dimensional power spectrum of the predetermined pattern used for the production of the concave-convex surface forming mold is expressed as the intensity with respect to the spatial frequency. graph, based on the preferred spatial frequency of more than 0.15 m ^{-1 -1} 0.006 having two maximum values, and the spatial frequency range of 0.012μm 0.006μm ^{-1 -1} having more than one maximum value, the spatial frequency above 0.07μm ^-1 range 0.15μm ^-1 or less with the other maximum value. The minimum value between the two maximum values is preferably in the range of 0.012 μm ^-1 or more and 0.025 μm ^-1 or less in the spatial frequency. The term "maximum value and minimum value" as used herein means the maximum and minimum values of the whole region, and is not the local maximum and minimum values formed by the small vibrations in the graph.

Further, a space formed by the surface irregularities of the manufacturing mold used in the intensity of the frequency of the first local maximum value of 0.006 ^{-1 -1} or less than 0.012 m, a spatial frequency less than the preferred system of the above 0.07 m ^{-1 -1} of 0.15μm The strength of 2 maxima. When the intensity of the first maximum is greater than the second maximum, the glare tends to increase. The pattern is designed such that the first maximum value of the power spectrum is increased, whereby the power spectrum of the elevation in the spatial frequency of the uneven surface 2 of 0.01 μm ^-1 can be increased. On the other hand, the pattern is designed such that the minimum value of the spatial frequency of 0.012 μm ^-1 or more and 0.025 μm ^-1 or less is reduced, and the second maximum value is shifted to the high frequency side, whereby the spatial frequency of the uneven surface 2 can be reduced. Power spectrum of the elevation in 0.033 μm ^-1 .

The two-dimensional power spectrum of the pattern, for example, when the pattern is image data, the image data is converted into the second-order binary image data, and the image data is represented by the two-dimensional function g(x, y). The gradation, and the Fourier transform of the obtained two-dimensional function g(x, y) is calculated to calculate the two-dimensional function G(f _x , f _y ), and then the obtained two-dimensional function G(f _x , f _y ) is performed. Calculate by square operation. Here, x and y represent orthogonal coordinates in the image data plane, and f _x and f _y represent the frequency in the x direction and the frequency in the y direction.

The same as the two-dimensional power spectrum for obtaining the elevation of the concave-convex surface 2 of the anti-glare layer 101, the two-dimensional function g(x, y) of the tone is generally used as a discrete function when determining the two-dimensional power spectrum of the pattern. obtain. At this time, the same as the two-dimensional power spectrum for obtaining the elevation of the concave-convex surface 2, the two-dimensional power spectrum can be calculated by discrete Fourier transform. The one-dimensional power spectrum of the pattern can be from the two-dimensional power spectrum of the pattern, and the one-dimensional power spectrum of the elevation of the concave surface 2 Sample the way.

In order to produce a one-dimensional spatial frequency power spectrum at 0.006μm ^-1 less than 0.012μm ^-1 0.07μm ^-1 and less than 0.15μm ^-1 each have a second maximum value of the first maximum value and the spatial frequency 0.012μm ^{- 1} or more and 0.025 μm ^-1 or less has a pattern of a minimum value, and it is possible to determine an uneven luminance distribution from a pattern formed by irregularly arranging dots or a random number generated by a random number or a computer. The pattern passes through a bandpass filter that removes components of a particular spatial frequency range.

As described above, in order to appropriately control the spatial frequency distribution of the uneven surface 2 of the anti-glare layer 101 to impart a predetermined power spectrum characteristic to the uneven surface 2, it is preferable to form the anti-glare layer 101 by imprinting. The imprint method may, for example, be a UV imprint method using a photocurable resin or a hot imprint method using a thermoplastic resin, and among them, a UV imprint method is preferred from the viewpoint of productivity.

In the UV imprinting method, a photocurable resin layer is formed on the surface of a transparent support, and the photocurable resin layer is pressed while being pressed against the uneven surface of the mold, thereby transferring the uneven surface of the mold to the light. A method of curing a resin layer. Specifically, the ultraviolet curable resin is applied to the transparent support, and the ultraviolet curable resin is cured by being irradiated with ultraviolet rays from the side of the transparent support while the ultraviolet curable resin after application is adhered to the uneven surface of the mold. Then, the transparent support on which the cured ultraviolet curable resin layer (antiglare layer) was formed was peeled off from the mold.

The type of the ultraviolet curable resin when the UV imprint method is used is not particularly limited, and a commercially available suitable product can be used. Also, you can use: A photo-curable agent which is appropriately selected is combined with an ultraviolet curable resin to cure the resin by visible light having a longer wavelength than ultraviolet light.

Specific examples of the ultraviolet curable resin, for example, a polyfunctional acrylate such as trimethylolpropane triacrylate or neopentyl glycol tetraacrylate may be used alone or two or more of them may be used in combination, and the polyfunctional acrylic acid may be used. A resin composition obtained by mixing a polyester with a photopolymerization initiator such as Irgacure 907 (manufactured by Ciba Specialty Chemicals Co., Ltd.), Irgacure 184 (manufactured by Ciba Specialty Chemicals Co., Ltd.), or Lucirin TPO (manufactured by BASF Corporation).

On the other hand, the hot stamping method is a method in which a transparent support formed of a thermoplastic resin is pressed against a mold in a heated state to transfer the surface shape of the mold to a transparent support. The transparent support used in the hot stamping method may be substantially transparent, and for example, polymethyl methacrylate, polycarbonate, polyethylene terephthalate, cellulose triacetate, or the like may be used. A solvent cast film or an extruded film of a thermoplastic resin such as a non-crystalline cyclic polyolefin in which a decene-based compound is a monomer. As the transparent resin film, a transparent support for coating an ultraviolet curable resin in the UV imprint method described above can also be preferably used.

(3) Transparent support

The transparent support 102 constituting the anti-glare film 1 may be a film that is substantially optically transparent, and examples thereof include a cellulose triacetate film, a polyethylene terephthalate film, and polymethyl methacrylate. Film, polycarbonate film, non-crystalline ring with a decene-based compound as a monomer A resin film such as a solvent cast film or an extruded film of a thermoplastic resin such as polyolefin.

The thickness of the transparent support 102 is, for example, 10 to 200 μm, preferably 10 to 100 μm, more preferably 10 to 60 μm. When the thickness of the transparent support 102 is in this range, the anti-glare film 1 having sufficient mechanical strength tends to be obtained, and the image display device including the anti-glare film 1 is less likely to cause glare.

(4) Haze of anti-glare film

The anti-glare film 1 preferably has a haze of from 0.3 to 5%, more preferably from 0.3 to 3%, still more preferably from 0.3 to 1%. When the haze exceeds this range, the contrast is lowered. Further, when the haze is less than this range, sufficient anti-glare properties may not be obtained. The haze is measured in accordance with JIS K 7136.

(5) Manufacturing method of mold for forming uneven surface

Next, a method of manufacturing a mold for forming the fine uneven surface 2 on the surface of the anti-glare layer 101 will be described. The method for producing the mold for forming an uneven surface is not particularly limited as long as the predetermined uneven surface 2 is obtained by using the above-described pattern, and the uneven surface 2 is preferably produced for high precision and reproducibility. It basically contains [1] first plating step, [2] polishing step, [3] photosensitive resin film forming step, [4] exposure step, [5] development step, [6] first etching step, [ 7] Photosensitive resin film peeling step, [8] second etching step, and [9] second plating step.

Figure 6 is a schematic view showing a mold for forming a concave-convex surface A diagram of a preferred example of the first half of the manufacturing process. In Fig. 6, a cross section of the mold in each step is schematically shown. Hereinafter, each step of the method for producing a mold for forming an uneven surface will be described in detail with reference to Fig. 6.

[1] 1st plating step

In the method for producing a mold for forming an uneven surface, first, the surface of the substrate used for the mold is plated with copper. As described above, by applying copper plating to the surface of the substrate for a mold, the adhesion and gloss of chrome plating in the subsequent second plating step can be improved. This is because the coating property of copper plating is high and the smoothing action is strong, and a fine uneven surface or a pothole of the base material for the mold is buried to form a flat and shiny surface. By the characteristics of such copper plating, even if chrome plating is applied in the second plating step described later, the roughness of the chrome-plated surface which is considered to be caused by minute irregularities or pits existing in the substrate is eliminated, and copper plating is caused. The coverage is high, and the generation of fine cracks is reduced.

The copper used in the first plating step may be a copper-based alloy, and may be an alloy mainly composed of copper. Therefore, the term "copper" as used in the present specification means the meaning of copper and copper alloy. Copper plating can be carried out by electrolytic plating or electroless plating, and is generally electrolytic plating.

When copper plating is applied, when the plating layer is too thin, the influence of the underlying surface cannot be completely excluded, so the thickness is preferably 50 μm or more. The upper limit of the thickness of the plating layer is not limited, and is generally preferably about 500 μm from the viewpoint of cost and the like.

As the metal material constituting the substrate, aluminum, iron, or the like can be preferably used from the viewpoint of cost. From the perspective of handling, it is better for lightweight Aluminum. The aluminum or iron referred to herein may be an alloy mainly composed of aluminum or iron, in addition to being pure metal, respectively.

Further, the shape of the substrate may be a flat plate shape or a cylindrical or cylindrical roller as long as it is an appropriate shape conventionally used in the field. When a mold is produced using a roll-shaped base material, there is an advantage that an anti-glare film can be produced in a continuous roll shape.

[2] Grinding step

In the subsequent polishing step, the surface of the substrate on which the copper plating has been applied in the first plating step is polished. Preferably, the surface of the substrate is ground to a state close to the mirror surface in this step. Since this is a metal plate or a metal roll which becomes a base material, in order to achieve the desired precision, machining processing such as cutting or grinding is often applied, and processing marks remain on the surface of the substrate, even if copper plating has been applied. In the state, such processing marks may remain, or in the state after plating, the surface may not be completely smooth. In other words, even if the step described later is applied to the surface on which the deep processing marks or the like remain, the irregularities such as the processing marks may be deeper than the irregularities formed after the respective steps, and there may be influences such as residual processing marks. When the mold is used to produce an anti-glare film, it may have an unpredictable effect on optical characteristics. In Fig. 6(a), the substrate 7 for a flat mold is schematically shown, and the surface is subjected to copper plating in the first plating step (the copper-plated layer formed in this step is not shown in In the figure), there is then a state of the mirror-polished surface 8 by the grinding step.

About grinding the surface of a substrate to which copper plating has been applied The method is not particularly limited, and any of a mechanical polishing method, an electrolytic polishing method, and a chemical polishing method can be used. The mechanical polishing method is exemplified by a super processing method, a lapping method, a fluid polishing method, a buffing method, and the like. Further, in the polishing step, the surface of the substrate 7 for a mold may be formed into a mirror surface by mirror cutting using a cutting tool. The material and shape of the cutting tool at this time are not particularly limited, and a super hard drill, a CBN drill, a ceramic drill, a diamond drill or the like can be used, and from the viewpoint of processing accuracy, a diamond drill is preferably used.

The surface roughness after polishing is preferably 0.1 μm or less, and more preferably 0.05 μm or less, in accordance with the center line average roughness Ra of JIS B 0601. When the center line average roughness Ra after grinding is more than 0.1 μm, the influence of the surface roughness after polishing may remain on the uneven shape of the finally formed mold surface. The lower limit of the center line average roughness Ra is not particularly limited, and is appropriately determined in consideration of processing time, processing cost, and the like.

[3] Photosensitive resin film forming step

In the subsequent photosensitive resin film forming step, a solution in which a photosensitive resin is dissolved in a solvent is applied to the surface 8 of the substrate 7 for a mold which has been mirror-polished by the above-described polishing step, and is heated/ It is dried to form a photosensitive resin film. In the figure (b), the photosensitive resin film 9 is formed on the surface 8 of the substrate 7 for a mold.

As the photosensitive resin, a conventionally known photosensitive resin can be used. A negative photosensitive resin having a property that a photosensitive portion is hardened, for example, can be used for a (meth) acrylate having a (meth) acrylonitrile group in a molecule. A monomer or prepolymer, a mixture of a double azide and a diene rubber, a polyethylene cinnamate compound, or the like. In addition, a positive photosensitive resin having a property of eluting a photosensitive portion by development and leaving only an unexposed portion, for example, a phenol resin-based or a novolak resin-based resin can be used. Further, the photosensitive resin may be formulated with various additives such as a sensitizer, a development accelerator, an adhesion modifier, and a coatability modifier as needed. In the present specification, the term "(meth)acrylic acid" means acrylic acid and/or methacrylic acid.

When the photosensitive resin is applied to the surface 8 of the substrate 7 for a mold, it is preferably diluted with a suitable solvent and applied in order to form a favorable coating film. As the solvent, a cellosolve solvent, a propylene glycol solvent, an ester solvent, an alcohol solvent, a ketone solvent, a highly polar solvent, or the like can be used.

The method of applying the photosensitive resin solution can be generally known using meniscus coating, spray coating, dip coating, spin coating, roll coating, wire bar coating, air knife coating, blade coating, curtain coating, ring coating, and the like. method. The thickness of the coating film is preferably in the range of 1 to 10 μm in terms of drying.

[4] Exposure step

In the subsequent exposure step, the following pattern is exposed on the photosensitive resin film 9 formed in the above-described photosensitive resin film forming step, which is expressed by expressing the above-described one-dimensional power spectrum as the intensity with respect to the spatial frequency. when the graph, the spatial frequency than 0.012 m 0.006 ^{-1 -1 -1 -1} or more and 0.07 m or less 0.15μm having a first maximum value and the second maximum value, respectively, and the spatial frequency than 0.012 m ^-1 0.025 A pattern having a minimum value of μm ^-1 or less. The light source used in the exposure step can be appropriately selected in accordance with the photosensitive wavelength or sensitivity of the applied photosensitive resin, and for example, g-ray (wavelength: 436 nm) of a high-pressure mercury lamp or h-ray of a high-pressure mercury lamp (wavelength) can be used. : 405 nm), i-ray (wavelength: 365 nm) of high-pressure mercury lamp, semiconductor laser (wavelength: 830 nm, 532 nm, 488 nm, 405 nm, etc.), YAG laser (wavelength: 1064 nm), KrF excimer laser (wavelength: 248 nm) ), ArF excimer laser (wavelength: 193 nm), F2 excimer laser (wavelength: 157 nm), and the like.

In order to accurately form the surface uneven shape of the mold or even the shape of the uneven surface 2 of the anti-glare layer 101, in the exposure step, it is preferable to expose the pattern onto the photosensitive resin film in a state of being precisely controlled. Specifically, it is preferable to make a pattern in the form of image data in a computer, and to draw a laser light emitted from a computer-controlled laser head according to the pattern of the image data. For laser drawing, a laser drawing device for printing plate production can be used. For example, Laser Stream FX (manufactured by Think Laboratory Co., Ltd.) or the like can be used as the laser drawing device.

In Fig. 6(c), the state in which the pattern is exposed to the photosensitive resin film 9 is schematically shown. When the photosensitive resin film is formed of a negative photosensitive resin, the exposed region 10 is subjected to a crosslinking reaction of the resin by exposure to lower the solubility of the developer to be described later. Therefore, the unexposed area 11 in the developing step is dissolved by the developer, and only the exposed region 10 remains on the surface of the substrate to become a mask. On the other hand, when the photosensitive resin film is formed of a positive photosensitive resin, the exposed region 10 is cut by the exposure of the resin to increase the solubility of the developer to be described later. Therefore, the exposed region 10 in the developing step is carried out by the developer Dissolved, only the unexposed areas 11 remained on the surface of the substrate to form a mask.

[5] Development step

In the subsequent development step, when a negative photosensitive resin is used as the photosensitive resin film 9, the unexposed region 11 is dissolved by the developer, and only the exposed region 10 remains on the substrate for the mold, and It acts as a mask in the subsequent first etching step. On the other hand, when a positive photosensitive resin is used as the photosensitive resin film 9, only the exposed region 10 is dissolved by the developer, and the unexposed region 11 remains on the substrate for the mold, and is continued. The first etching step acts as a mask.

The developer used in the development step can be used in a conventionally known manner. Examples thereof include inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium citrate, sodium metasilicate, and aqueous ammonia; primary amines such as ethylamine and n-propylamine; and diethylamine and di-n-butylamine. Amines; tertiary amines such as triethylamine and methyldiethylamine; alcohol amines such as dimethylethanolamine and triethanolamine; tetramethylammonium hydroxide, tetraethylammonium hydroxide, trimethyl hydroxide a quaternary ammonium salt such as hydroxyethylammonium; an alkaline aqueous solution such as a cyclic amine such as pyrrole or piperidine; or an organic solvent such as xylene or toluene.

The developing method in the developing step is not particularly limited, and methods such as immersion development, spray development, brush development, and ultrasonic development can be used.

In the figure (d), the state in which the development process is performed using the negative photosensitive resin as the photosensitive resin film 9 is shown. In Fig. 6(c), the unexposed area 11 is dissolved by the developer, and only the exposure is exposed. The region 10 remains on the surface of the substrate to form the mask 12. In the sixth embodiment, the state in which the development process is performed using the positive photosensitive resin as the photosensitive resin film 9 is schematically shown. In Fig. 6(c), the exposed region 10 is dissolved by the developer, and only the unexposed region 11 remains on the surface of the substrate to become the mask 12.

[6] First etching step

In the subsequent first etching step, after the development step, the photosensitive resin film remaining on the surface of the substrate for a mold is used as a mask, and the substrate for the mold which is not covered is mainly applied. Etching is performed on the plated surface.

Fig. 7 is a view schematically showing a preferred example of the latter half of the method for producing a mold for forming an uneven surface. Fig. 7(a) is a view schematically showing a state in which the substrate 7 for a mold of the maskless region 13 is mainly etched by the first etching step. The substrate 7 for the mold at the lower portion of the mask 12 is not etched from the surface of the substrate for the mold, but is etched from the unmasked region 13 as the etching progresses. Therefore, in the vicinity of the boundary between the mask 12 and the unmasked region 13, the substrate 7 for the mold at the lower portion of the mask 12 is also etched. Hereinafter, in the vicinity of the boundary between the mask 12 and the maskless region 13, the substrate 7 for the mold at the lower portion of the mask 12 is also etched, which is called side etching.

The etching treatment in the first etching step is generally performed by using a ferric chloride (FeCl ₃ ) solution, a copper chloride (CuCl ₂ ) solution, an alkali etching solution (Cu(NH ₃ ) ₄ Cl ₂ ), or the like by performing a metal surface. Corrosion is carried out, but a strong acid such as hydrochloric acid or sulfuric acid may be used, or a reverse electrolytic etching may be performed by applying a potential opposite to that at the time of electrolytic plating. The concave shape formed on the substrate for a mold during the etching treatment differs depending on the type of the underlying metal, the type of the photosensitive resin film, and the etching method, and the like, but when the etching amount is 10 μm or less, The metal surface of the etching solution is contacted and etched substantially equidistantly. The amount of etching referred to herein means the thickness of the substrate removed by etching.

The etching amount in the first etching step is preferably from 1 to 50 μm, more preferably from 2 to 10 μm. When the etching amount is less than 1 μm, the metal surface hardly forms an uneven shape and becomes a nearly flat mold, so that the anti-glare property cannot be exhibited. Further, when the etching amount exceeds 50 μm, the height difference of the uneven shape formed on the metal surface increases, and when the anti-glare film produced using the obtained mold is applied to an image display device, it is displayed in the image display device. There are doubts about the emergence of whitening. The term "whitening" means a phenomenon in which the entire display surface is whitened by the scattered light to cause a hazy color.

The etching treatment in the first etching step can be performed by one etching treatment or by dividing the etching treatment into two or more. When the etching treatment is carried out in two or more steps, the total etching amount of the etching treatment of two or more times is preferably within the above range.

[7] Photosensitive resin film peeling step

In the subsequent photosensitive resin film peeling step, the photosensitive resin film remaining as a mask in the first etching step is dissolved and removed. In this step, a release resin is used to dissolve the photosensitive resin film. The peeling liquid can be used in the same manner as the above developing solution, and the exposure, the temperature, the concentration, the immersion time, and the like of the peeling liquid can be changed, and when the negative photosensitive resin film is used, the exposure can be performed. The photosensitive resin film of the portion is dissolved and removed, and when a positive photosensitive resin film is used, the photosensitive resin film in the non-exposed portion can be dissolved and removed. The specific peeling method is not particularly limited, and methods such as immersion peeling, spray peeling, brush peeling, and ultrasonic peeling can be used.

In the case of the photosensitive resin film peeling step, the photosensitive resin film used as a mask in the first etching step is dissolved and removed in the first etching step. The first surface uneven shape 15 is formed on the surface of the substrate for a mold by etching using the mask 12 formed of the photosensitive resin film.

[8] Second etching step

In the second etching step, the first surface uneven shape 15 formed by the first etching step using the photosensitive resin film as a mask is passivated by an etching process. By the second etching treatment, the portion of the first surface uneven shape 15 formed by the first etching step is steeply inclined, and the optical characteristics of the antiglare film produced by using the obtained mold are preferably improved. The direction changes. In the seventh embodiment, (c), the first surface uneven shape 15 of the mold base material 7 is passivated by the second etching treatment, and the portion having a steep surface inclination is passivated, and a gentle surface inclination is formed. The state of the second surface uneven shape 16.

The etching treatment in the second etching step is the same as in the first etching step, and generally, a ferric chloride (FeCl ₃ ) solution, a copper chloride (CuCl ₂ ) solution, or an alkali etching solution (Cu(NH ₃ ) ₄ Cl ₂ ) is used. Etc., by performing etching on the surface, it is also possible to use a strong acid such as hydrochloric acid or sulfuric acid, or a reverse electrolytic etching by applying a potential opposite to that at the time of electrolytic plating. The degree of passivation of the unevenness after the etching treatment differs depending on the type of the underlying metal, the etching method, and the size and depth of the unevenness obtained by the first etching step, and cannot be generalized, but the maximum factor for controlling the degree of passivation is etching. the amount. The amount of etching referred to herein is the same as that of the first etching step, and means the thickness of the substrate removed by etching. When the etching amount is small, the effect of passivating the surface shape of the unevenness obtained by the first etching step is insufficient, and the optical characteristics of the anti-glare film obtained by transferring the uneven shape to the transparent film are not good. . On the other hand, when the etching amount is too large, the uneven shape almost disappears and becomes a nearly flat mold, so that the anti-glare property cannot be exhibited. Therefore, the etching amount is preferably in the range of 1 to 50 μm, more preferably in the range of 4 to 20 μm.

The etching treatment in the second etching step can be performed by one etching process or by dividing the etching process into two or more steps, similarly to the first etching step. Here, when the etching treatment is carried out in two or more steps, the total etching amount of the etching treatment of two or more times is preferably within the above range.

[9] 2nd plating step

Next, by applying chrome plating, the second surface uneven shape 16 is passivated while protecting the mold surface. In the seventh embodiment, the chrome-plated layer 17 is formed in the second surface uneven shape 16 formed by the etching treatment in the second etching step as described above, and the chrome-plated layer surface 18 is passivated.

The chrome plating is preferably a chrome plating which is glossy on a surface of a flat plate or a roll, has a high hardness, a small coefficient of friction, and imparts good mold release property. The chrome plating is not particularly limited, but it is preferably a chrome plating which exhibits a good gloss called so-called gloss chrome plating or decorative chrome plating. The chrome plating is generally carried out by electrolysis, and an aqueous solution containing anhydrous chromic acid (CrO ₃ ) and a small amount of sulfuric acid can be used for the plating bath. The thickness of the chrome plating can be controlled by adjusting the current density and the electrolysis time.

In the second plating step, plating other than chrome plating is not preferable. In the plating other than chrome plating, since the hardness or the abrasion resistance is low, the durability as a mold is lowered, and the unevenness is worn or damaged during use. In the anti-glare film obtained by using the mold, it may be difficult to obtain a sufficient anti-glare function, and the possibility of occurrence of defects on the anti-glare film is also high.

Thus, it is preferable to use the chrome-plated surface as the uneven surface of the mold. By chrome plating the surface on which the fine surface irregularities are formed, the uneven shape is passivated, and a mold having improved surface hardness can be obtained. The degree of passivation of the concavities and convexities at this time differs depending on the type of the underlying metal, the size and depth of the concavities and convexities obtained by the first etching step, and the type and thickness of the plating, and it is not possible to generalize, but the maximum factor for controlling the degree of passivation is still It is the plating thickness. When the thickness of the chrome plating is thin, the effect of passivating the surface shape of the unevenness obtained before the chrome plating is insufficient, and the optical characteristics of the anti-glare film obtained by transferring the uneven shape are not so good. On the other hand, when the thickness of the chrome plating is too thick, in addition to deterioration in productivity, a protrusion-like plating defect called a nodule is generated, which is not preferable. Therefore, the chrome plating thickness is preferably in the range of 1 to 10 μm, more preferably in the range of 3 to 6 μm.

The chrome plating layer formed in the second plating step is preferably It is formed so that the Vickers hardness becomes 800 or more, and it is more preferable to form it as 1000 or more. When the Vickers hardness of the chrome plating layer is less than 800, the durability at the time of use of the mold is lowered, and the hardness is lowered by chrome plating, and the possibility of abnormality in plating bath composition, electrolysis conditions, and the like during plating treatment is improved, and The possibility of occurrence of defects also increases the likelihood of adverse effects.

<Anti-glare polarizing plate>

Referring to Fig. 1, an anti-glare polarizing plate of the present invention comprises an anti-glare film 1 and a polarizing film 104. The polarizing film 104 is disposed on the transparent support 102 side of the anti-glare film 1 . In the example shown in FIG. 1, the polarizing film 104 is laminated on the surface of the transparent support 102 opposite to the antiglare layer 101 via the first adhesive layer 103a. The anti-glare polarizing plate of the present invention may further include a transparent resin laminated on the surface of the polarizing film 104 opposite to the anti-glare film 1 via the second adhesive layer 103b as in the example shown in FIG. Layer 105.

(1) Polarized film

As the polarizing film 104, a film in which a dichroic dye is adsorbed to a uniaxially stretched polyvinyl alcohol resin film is preferably used. The polyvinyl alcohol-based resin constituting the polarizing film 104 can be obtained by saponifying a polyvinyl acetate-based resin. The polyvinyl acetate-based resin is exemplified by a copolymer of vinyl acetate and another monomer copolymerizable with the vinyl acetate, in addition to polyvinyl acetate of a homopolymer of vinyl acetate. Co-owned with vinyl acetate Examples of the other monomer to be polymerized include unsaturated carboxylic acids, olefins, vinyl ethers, and unsaturated sulfonic acids. The degree of saponification of the polyvinyl alcohol-based resin is usually from 85 to 100 mol%, preferably from 98 to 100 mol%. The polyvinyl alcohol-based resin can be further modified, and for example, polyvinyl formal or polyvinyl acetal modified with an aldehyde can be used. The degree of polymerization of the polyvinyl alcohol-based resin is usually in the range of 1,000 to 10,000, preferably 1,500 to 10,000.

The polarizing film 104 can be produced by a step of uniaxially stretching the polyvinyl alcohol resin film, a step of dyeing the polyvinyl alcohol resin film with a dichroic dye, and adsorbing the dichroic dye; The step of treating the polyvinyl alcohol-based resin film having the dichroic dye adsorbed thereon with a boric acid aqueous solution; and the step of washing with a boric acid aqueous solution and then washing with water.

The uniaxial stretching can be carried out before the dyeing by the dichroic dye, or simultaneously with the dyeing by the dichroic dye, or after the dyeing by the dichroic dye. When uniaxial stretching is performed after dyeing by a dichroic dye, the uniaxial stretching can be carried out before boric acid treatment or boric acid treatment. In addition, it is of course also possible to perform uniaxial stretching in a plurality of stages. Uniaxial stretching allows uniaxial stretching between rolls with different peripheral speeds or uniaxial stretching with hot rolls. Further, it may be a dry stretching which is stretched in the air or a wet stretching which is stretched in a state of being swollen by a solvent. The draw ratio is generally 4 to 8 times.

To dye a polyvinyl alcohol resin film with a dichroic pigment For example, the polyvinyl alcohol-based resin film may be immersed in an aqueous solution containing a dichroic dye. As the dichroic dye, specifically, iodine or a dichroic dye can be used.

When iodine is used as the dichroic dye, a method in which a polyvinyl alcohol-based resin film is immersed in an aqueous solution containing iodine and potassium iodide is usually used for dyeing. The content of iodine in the aqueous solution is usually about 0.01 to 0.5 parts by weight per 100 parts by weight of water, and the content of potassium iodide is usually about 0.5 to 10 parts by weight per 100 parts by weight of water. The temperature of the aqueous solution is usually about 20 to 40 ° C, and the immersion time in the aqueous solution is usually about 30 to 300 seconds.

On the other hand, when a dichroic dye is used as the dichroic dye, a method in which a polyvinyl alcohol-based resin film is immersed in an aqueous solution containing a water-soluble dichroic dye is usually used for dyeing. The content of the dichroic dye in the aqueous solution is usually about 0.001 to 0.01 parts by weight per 100 parts by weight of water. The aqueous solution may contain an inorganic salt such as sodium sulfate. The temperature of the aqueous solution is usually about 20 to 80 ° C, and the immersion time in the aqueous solution is usually about 30 to 300 seconds.

The boric acid treatment after dyeing by the dichroic dye is carried out by immersing the dyed polyvinyl alcohol-based resin film in an aqueous boric acid solution. The content of boric acid in the aqueous boric acid solution is usually about 2 to 15 parts by weight, preferably about 5 to 12 parts by weight, per 100 parts by weight of water. When iodine is used as the dichroic dye, the aqueous boric acid solution preferably contains potassium iodide. The content of potassium iodide in the aqueous boric acid solution is usually from 2 to 20 parts by weight, preferably from 5 to 15 parts by weight, per 100 parts by weight of water. The immersion time in the aqueous boric acid solution is usually about 100 to 1200 seconds, preferably about 150 to 600 seconds, more preferably about 200 to 400 seconds. The temperature of the aqueous boric acid solution is usually 50 ° C or higher, preferably 50 to 85 ° C.

The polyvinyl alcohol-based resin film after the boric acid treatment is usually subjected to a water washing treatment. The water washing treatment is carried out, for example, by immersing a polyvinyl alcohol-based resin film treated with boric acid in water. After washing with water, drying treatment is performed to obtain a polarizing film 104. The temperature of the water in the water washing treatment is usually about 5 to 40 ° C, and the immersion time is usually about 2 to 120 seconds. The drying treatment performed thereafter can be carried out using a hot air dryer or a far infrared heater. The drying temperature is usually from 40 to 100 ° C, and the drying treatment time is usually from about 120 to 600 seconds.

Thus, a polarizing film 104 formed by adsorbing a polyvinyl alcohol-based resin film having an iodine or a dichroic dye adsorbed thereto can be obtained. The thickness of the polarizing film 104 is preferably in the range of 5 to 100 μm, more preferably in the range of 5 to 30 μm. When the thickness of the polarizing film 104 is less than 5 μm, there is a concern that sufficient optical characteristics cannot be exhibited, and mechanical strength may be insufficient. On the other hand, when the thickness of the polarizing film 104 is higher than 100 μm, the anti-glare polarizing plate becomes thick, and as a result, glare may occur.

(2) Transparent resin layer

The transparent resin layer 105 may be a protective film that protects the surface of the polarizing film 104. The protective film can be an optical compensation film. Specific examples of the protective film include a cellulose triacetate film, a non-crystalline polyolefin resin film, a polyester resin film, a (meth)acrylic resin film, and polycarbonate. An ester resin film, a polyfluorene-based resin film, an alicyclic polyimide film, or the like. Among these, a film composed of cellulose triacetate or a non-crystalline polyolefin resin can be preferably used.

The amorphous polyolefin-based resin is usually a polymerized unit having a cyclic olefin such as a norbornene or a polycyclic norbornene-based monomer, and may be a copolymer of a cyclic olefin and a chain olefin. Among them, a representative one is a thermoplastic saturated decene-based resin. In addition, it is also effective to introduce a polar base. Commercially available non-crystalline polyolefin-based resins, such as ARTON (manufactured by JSR Co., Ltd.), ZEONOR (manufactured by Zcon Japan Co., Ltd.), ZEONEX (manufactured by Zeon Japan Co., Ltd.), and APO (Mitsui Chemical Co., Ltd.) System), APEL (manufactured by Mitsui Chemicals, Inc.), etc. When the non-crystalline polyolefin-based resin of the commercially available product is used, the amorphous polyolefin-based resin can be formed into a film by a generally known method such as a solvent casting method or a melt extrusion method.

The transparent resin layer 105 may be an optical compensation layer (or an optical compensation film, the same applies hereinafter). Further, the transparent resin layer 105 may be a laminate of a protective film and an optical compensation layer. The optical compensation layer is intended to compensate for a phase difference, and the like, and a birefringent film composed of a stretched film of a transparent resin or the like; a film in which a discotic liquid crystal or a nematic liquid crystal is fixed, and a film substrate; The liquid crystal layer or the like is formed. The optical compensation layer laminated on the polarizing film 104 may be a single layer or a plurality of layers. When a plurality of optical compensation layers are provided, the same type of optical compensation layer or different kinds of optical compensation layers may be laminated. For example, a birefringent film composed of a stretched film of a transparent resin may be laminated with other transparent resin by an adhesive layer. A birefringent film composed of a stretched film or a birefringent film formed by disposing a discotic liquid crystal or a nematic liquid crystal in a stretched film made of a transparent resin.

Examples of the transparent resin constituting the birefringent film include polyolefins such as polycarbonate, polyvinyl alcohol, polystyrene, polymethyl methacrylate, and polypropylene, polyarylate, polyamine, and amorphous. A polyolefin resin or the like. The stretched film can be processed by a suitable method such as uniaxial or biaxial. Further, the following birefringent film may be used as an optical compensation film which is applied with a shrinkage force and/or a state in which a heat-shrinkable film is bonded to a film composed of the above transparent resin. The extension force controls the refractive index in the thickness direction of the film.

The bonding of the optical compensation layer can be carried out by using an adhesive described later, and it can also be carried out by using an adhesive (also referred to as a pressure-sensitive adhesive) which will be described later from the viewpoint of the convenience of the work and the prevention of optical strain.

For example, when an anti-glare polarizing plate is applied to a liquid crystal display device, the optical compensation layer is appropriately selected in accordance with each driving mode of the liquid crystal cell. Examples of the driving mode of the liquid crystal include a Vertical Alignment (VA) mode, an In-Plane Switching (IPS) mode, and a Twisted Nematic (TN) mode.

In the liquid crystal cell of the vertical alignment mode, a cellulose-based resin typified by cellulose triacetate or the like, a cyclic olefin resin, a polycarbonate, or the like can be used to have a positive refractive index anisotropy. A film made of a transparent resin is subjected to uniaxial or biaxial stretching and has a relationship of n _x > n _y ≧ n _z as an optical compensation film. Here, n _x represents the refractive index in the in-plane axis direction of the film, n _y represents the refractive index in the in-plane axis direction of the film, and n _z represents the refractive index in the thickness direction of the film. Among these transparent resins, cellulose triacetate or a cyclic olefin resin can be preferably used because the photoelastic coefficient is small and the in-plane characteristics are not uniform due to thermal strain under the use conditions. Further, a film in which a disk-shaped liquid crystal is coated on a substrate, a film in which a cholesteric liquid crystal is coated on a substrate at a short pitch, a film in which a layer of an inorganic layered compound such as mica is formed on a substrate, or a resin may be used successively or simultaneously An optical compensation film having a relationship of n _x ≒n _y > n _z such as a biaxially stretched film or an unstretched solution cast film.

Further, in the case of the liquid crystal cell of the TN mode, an organic compound, particularly a compound which exhibits liquid crystallinity and has a disk-like molecular structure, or which does not exhibit liquid crystallinity, is used, but an electric field is used. Or a compound exhibiting a negative refractive index anisotropy in a magnetic field, coated on a transparent resin film composed of cellulose triacetate or the like, and inclined so that the optical axis is inclined from the normal direction of the film by 5 to 50° The aligned film or the like serves as an optical compensation layer. The alignment, not only unidirectional, but also a so-called hybrid alignment in which the slope gradually increases from one side of the film to the other. An organic compound having a discotic molecular structure exhibiting liquid crystallinity, exemplified by a discotic liquid crystal such as a low molecular weight or a high molecular weight, for example, in a plane having a triphenylene, a trimerene, a benzene or the like, radially radiated A linear substituent such as an alkyl group, an alkoxy group, an alkyl-substituted benzhydryloxy group or an alkoxy-substituted benzhydryloxy group is bonded. Among them, it is preferred that no absorber appears in the visible light region. Such organic compounds having a discotic molecular structure are not limited Only one type may be used alone, and two or more types may be used in combination as needed, or may be used in combination with other organic compounds such as a polymer matrix. The organic compound to be used in combination may be one which is compatible with an organic compound having a discotic molecular structure or which can disperse an organic compound having a discotic molecular structure to a degree that does not scatter light. There is no special limit. A transparent base film made of a cellulose resin is provided with a layer composed of the liquid crystalline compound, and the optical axis is inclined with respect to the normal line of the film. For example, "WV Film" (Fuji) can be preferably used. Film Co., Ltd.). Further, an organic compound having an elongated rod-like structure, particularly a compound exhibiting nematic liquid crystallinity and having a molecular structure imparting positive optical anisotropy, or liquid crystallinity is not preferably used. However, a compound exhibiting a positive refractive index anisotropy by an electric field or a magnetic field is formed on a transparent base film composed of a cellulose resin or the like, and the optical axis is inclined from the normal direction of the film. A film or the like that is aligned between 5 and 50 degrees. The alignment, not only unidirectional, but also a so-called mixing alignment in which the slope gradually increases from one side of the film to the other. In the transparent base film, a film made of a nematic liquid crystal compound and having an optical axis inclined with respect to the normal line of the film is preferably used. For example, "NH Film" (manufactured by Nippon Oil Co., Ltd.) can be preferably used.

The thickness of the transparent resin layer 105 is usually in the range of about 5 to 200 μm, preferably 10 to 120 μm, more preferably 10 to 85 μm.

(3) adhesive layer

The anti-glare film 1 can be laminated on the surface of one side of the polarizing film 104 via the first adhesive layer 103a. Further, when the transparent resin layer 105 is laminated, the transparent resin layer 105 may be laminated on the other surface of the polarizing film 104 via the second adhesive layer 103b.

The adhesive for forming the first adhesive layer 103a or the second adhesive layer 103b can be used by a conventionally known one. For example, a water-soluble adhesive using a polyvinyl alcohol-based resin, a cationic polymerization adhesive using an epoxy resin, an adhesive for applying a radical polymerization of a (meth)acrylic resin, and an epoxy resin can be used. An agent for cationic polymerization and radical polymerization carried out with a mixture of a (meth)acrylic resin. The thickness of the subsequent agent varies depending on the type of the adhesive, and cannot be generalized, but is preferably in the range of 0.1 μm to 5 μm. When the thickness of the subsequent layer is less than 0.1 μm, there is a fear that sufficient adhesion strength cannot be obtained. On the other hand, when the thickness of the adhesive layer is higher than 5 μm, the anti-glare polarizing plate becomes thick, and as a result, glare may occur.

The anti-glare film 1 and the transparent resin layer 105 can be subjected to a saponification treatment, a corona treatment, a primer treatment, a anchor coating treatment, etc., before being applied to the polarizing film 104. .

(4) Adhesive layer

The anti-glare polarizing plate of the present invention may have an adhesive layer for bonding the image display member. As the adhesive constituting the adhesive layer, an adhesive group using a (meth)acrylic polymer, a polyoxymethylene polymer, a polyester, a polyurethane, a polyether or the like as a base polymer can be used. Adult. In the case of a (meth)acrylic adhesive, it is preferably selected from the group consisting of excellent optical transparency, moderate wettability and cohesive force, excellent adhesion to a substrate, and weather resistance and heat resistance. It is used without causing peeling problems such as lifting or peeling under heating or humidification conditions. The base polymer of the (meth)acrylic adhesive is preferably an alkyl ester of (meth)acrylic acid having an alkyl group having a carbon number of 20 or less, such as a methyl group, an ethyl group or a butyl group, and (meth) a (meth)acrylic copolymer of a (meth)acrylic monomer having a functional group such as acrylic acid or hydroxyethyl (meth)acrylate, and having a glass transition temperature of 25 ° C or less (preferably 0 ° C or less). A (meth)acrylic copolymer having a weight average molecular weight of 100,000 or more.

For the formation of the adhesive layer of the anti-glare polarizing plate, for example, a solution of 10 to 40% by weight can be prepared by dissolving or dispersing the adhesive composition in an organic solvent such as toluene or ethyl acetate, and the solution is directly Coating on the anti-glare polarizing plate (transparent resin layer 105) to form an adhesive layer, or forming an adhesive layer on the protective film in advance, and then transferring the adhesive layer to the anti-glare polarizing plate to form an adhesive The method of the agent layer or the like is carried out. The thickness of the adhesive layer is determined depending on the adhesion force, etc., and is suitably in the range of about 1 to 25 μm.

<Image display device>

The present invention further provides an image display device comprising the above-described antiglare film 1 or an anti-glare polarizing plate of the present invention and an image display element. The image display device is not particularly limited as long as it is provided with an image display element having a color filter, and examples thereof include a liquid crystal display device and an organic battery. An excitation light (EL) display device, a plasma display panel, or the like. When the image display device is a liquid crystal display device, the image display device is a liquid crystal cell in which liquid crystal is sealed between the upper and lower substrates, and the alignment state of the liquid crystal is changed by voltage application to display an image.

In the image display device of the present invention, the anti-glare film 1 or the anti-glare polarizing plate is disposed on the transparent support 102 side or the polarizing film 104 side of the anti-glare polarizing plate, with reference to Fig. 1 . In this manner, the side of the anti-glare layer 101 is set to the outside, and is disposed on the viewing side of the image display element (more specifically, the substrate 300 such as a glass substrate constituting the image display element) (opposite to the color filter 400) side). In other words, the anti-glare film 1 or the anti-glare polarizing plate of the present invention is suitably used as a front-side polarizing plate, and the uneven surface 2 of the anti-glare film 1 is also an outer side (that is, the anti-glare layer 101). The way of viewing the side) is arranged on the viewing side of the image display element. The adhesion of the anti-glare polarizing plate to the image display element can be performed using the adhesive layer 200.

In the image display device, the uneven surface 2 of the anti-glare layer 101 may be in contact with the air layer or may be in contact with other layers. For example, the image display device may further include a translucent member disposed on the outer surface (viewing side) of the anti-glare layer 101. In this case, the translucent member may be attached to the anti-adhesion layer or the resin layer. The glare layer 101 is disposed on the viewing side of the anti-glare layer 101 via an air layer. The light transmissive member may be, for example, a glass plate or the like, or may be a touch panel input element.

The uneven surface-color filter distance L is set to be less than 1 mm, preferably less than 0.75 mm. Thereby, even if the anti-glare film 1 is low Haze can also show good anti-glare properties and effectively suppress glare. Further, from the viewpoint of the strength of the image display device, the distance L is preferably 100 μm or more.

[Examples]

The invention is described in more detail in the following examples, but the invention is not limited thereto. In the following examples, the physical properties of the anti-glare film and the anti-glare polarizing plate were measured or evaluated as follows.

[1] Determination of surface shape of anti-glare film

(Measurement of the elevation of the surface)

The elevation of the surface of the anti-glare film was measured using a three-dimensional microscope PLμ2300 (manufactured by Sensofar Co., Ltd.). In order to prevent the warpage of the sample, an optically transparent adhesive is applied to the glass substrate so that the uneven surface is located outside, and then provided for measurement. At the time of measurement, the magnification of the objective lens was set to 10 times. The horizontal resolutions Δx and Δy were both 1.66 μm, and the measurement area was 1270 μm × 950 μm.

(power spectrum of the elevation of the surface of the bump)

From the central portion of the measurement data obtained above, 512 × 512 (measurement area: 850 μm × 850 μm) data were sampled, and the elevation of the uneven surface of the anti-glare film was obtained as a two-dimensional function h(x, y). The two-dimensional function H(f _x , f _y ) is obtained by performing a discrete Fourier transform on the two-dimensional function h( _x , _y ). The two-dimensional function H(f _x , f _y ) is squared to calculate a two-dimensional function H ² (f _x , f _y ) of the two-dimensional power spectrum, and one of the functions as a distance f from the origin is calculated. The one-dimensional function H ² (f) of the dimensional power spectrum. The elevation of the surface at 5 points is determined for each sample, and the average of the one-dimensional function H ² (f) of one-dimensional power spectrum calculated from the data is set as a one-dimensional function H of one of the power spectra of each sample. ² (f). Further, an average of the common logarithm of the one-dimensional function H ² (f) of the one-dimensional power spectrum is obtained from the elevation of the surface at the above five points, and logH ² (f) is calculated, and according to the above formula (6) The second derivative function d ² logH ² (f)/df ^{2 in the} spatial frequency f = 0.01 μm ^-1 and 0.02 μm ^-1 was obtained.

[2] Determination of haze of anti-glare film

The haze of the anti-glare film is an optically transparent adhesive, and the anti-glare film is bonded to the glass substrate on the surface opposite to the surface on which the anti-glare layer is formed, and light is incident from the glass substrate side. The anti-glare film to be bonded to the glass substrate was measured using a haze meter "HM-150" manufactured by Murakami Color Research Co., Ltd., JIS K 7136.

[3] Evaluation of the visibility of anti-glare polarizers

The liquid crystal display device produced by bonding the anti-glare polarizing plate to the front side (viewing side) was black-displayed in a bright room, and the mapping state and whitening were visually observed. Then, it was in a white display state in a bright room, and it was visually observed also in glare. The evaluation criteria for the mapping state, whitening, and glare are as follows.

(mapping)

1: No mappings were observed.

2: A few mappings were observed.

3: The mapping is clearly observed.

(whitening)

1: No whitening was observed.

2: A little whitewash was observed.

3: Whitening was clearly observed.

(glare)

1: No glare was observed.

2: Only a few glare was observed.

3: A lot of glare was observed.

<Example 1>

(A) Production of polarizing film

A polyvinyl alcohol film having a thickness of 75 μm, a polymerization degree of 2,400, and a saponification degree of 99.9 mol% or more was subjected to uniaxial stretching at a draw ratio of 5 times in a dry manner, and immersed at a temperature of 28 ° C while being kept under tension. Each 100 parts by weight of water contained 0.05 parts by weight of iodine and 5 parts by weight of an aqueous solution of potassium iodide for 60 seconds. Next, while maintaining the tension, the aqueous solution of boric acid containing 7.5 parts by weight of boric acid and 6 parts by weight of potassium iodide per 100 parts by weight of water was immersed at a temperature of 73 ° C for 300 seconds. It was then washed with pure water at 15 ° C for 10 seconds. After the water-washed film is kept under tension, it is dried at 70 ° C for 300 seconds, and A polarizing film was obtained.

(B) Production of a mold for forming fine unevenness

A ballard plated person having a diameter of 200 mm in diameter (according to JIS A5056) was prepared. The copper ballard plating is formed by a copper plating layer/thin silver plating layer/surface copper plating layer, and the thickness of the entire plating layer is set to be about 200 μm. The copper plating surface is mirror-polished, and a photosensitive resin is applied onto the polished copper plating surface, and dried to form a photosensitive resin film. Next, a pattern in which the pattern [exposure pattern A] shown in FIG. 8 (from a pattern having a random luminance distribution and a band pass filter for removing a component of a specific spatial frequency range) is repeatedly arranged, Exposure and development are performed by laser light on a photosensitive resin film. Exposure and development by laser light were carried out using Laser Stream FX (manufactured by Think Laboratory Co., Ltd.). A positive photosensitive resin is used for the photosensitive resin film.

Then, the first etching treatment is performed with a copper chloride solution. The etching amount at this time was set to 4 μm. The photosensitive resin film was removed from the roll after the first etching treatment, and the second etching treatment was performed again with the copper chloride solution. The etching amount at this time was set to 13 μm. Then, chrome processing is performed to produce the mold A. At this time, the chrome plating thickness was set to 4 μm.

Further, Fig. 8 is a view showing a part (1 mm × 1 mm) of image data of the exposure pattern A used in the present embodiment. The image data of the exposure pattern A shown in Fig. 8 was made in a size of 33 mm × 33 mm and was produced at 12,800 dpi. The same applies to Figures 9 to 14.

(C) Formation of anti-glare film

The following components were dissolved in ethyl acetate at a solid concentration of 60% by weight to obtain an ultraviolet curable resin composition A having a refractive index of 1.53 after curing.

The ultraviolet curable resin composition A was applied onto a cellulose triacetate (TAC) film having a thickness of 60 μm so that the coating thickness after drying was 4 μm, and dried in a dryer set at 60 ° C for 3 minutes. . The dried film is pressed against the uneven surface of the previously obtained mold A by a rubber roller so that the photocurable resin composition layer becomes the mold side, and is adhered to each other. In this state, light from a high-pressure mercury lamp having a strength of 20 mW/cm ^{2 was} irradiated from the TAC film side so that the amount of light converted into h-rays was 200 mJ/cm ² to cure the photocurable resin composition layer. Then, the TAC film and the cured resin were peeled off from the mold to form a transparent anti-glare film A composed of a laminate of a cured resin having a rough surface and a TAC film.

(D) Production of anti-glare polarizing plate

Relative to 100 parts by weight of water, will be sold by Kuraray Co., Ltd. The carboxyl group-modified polyvinyl alcohol "Kuraray Poval KL318" (modified degree: 2 mol%) was dissolved in 1.8 parts by weight, and then sold as a water-soluble polyamine epoxy resin sold by Takooka Chemical Industry Co., Ltd. 1.5 parts by weight of "Sumirez Resin 650" (aqueous solution of 30% by weight of solid content) was dissolved to prepare a polyvinyl alcohol-based adhesive.

After the saponification treatment was performed on the side opposite to the side on which the anti-glare layer was formed on the anti-glare film A, the above-mentioned prepared polyvinyl alcohol-based adhesive was applied by a bar coater at 10 μm, and the previous obtained was applied thereto. Polarized film. Further, the thickness of the polarizing film on the side opposite to the surface on which the anti-glare film A was bonded was applied to the surface of the prepared polyvinyl alcohol-based adhesive 10 μm by a bar coater, and then the thickness after the saponification treatment was applied. A transparent protective film (KC4UE manufactured by Konica Minolta Opto Co., Ltd., in-plane retardation value R ₀ = 0.7 nm, thickness direction retardation R _th = -0.1 nm) composed of 40 μm of cellulose triacetate was bonded. Then, it was dried at 80 ° C for 5 minutes and then aged at room temperature for 1 day. Then, the (meth)acrylic adhesive layer formed on the pellicle film is transferred and adhered to the side opposite to the side on which the anti-glare film A is bonded to the polarizing film, thereby forming an adhesive layer, thereby obtaining anti-glare. Polarizer A.

(E) Production of liquid crystal display device

The polarizing plate is peeled off from the front side (viewing side) of the liquid crystal cell of a commercially available notebook computer (ZENBOOK UX21A, ASUS, 11.6, FHD) equipped with an IPS mode liquid crystal cell, and then the absorption axis is the same as the original The direction of the absorption axis of the polarizing plate attached to the liquid crystal cell is the same, The anti-glare polarizing plate A is bonded to the front surface of the liquid crystal cell to fabricate a liquid crystal panel. Then, the liquid crystal panel is returned to the original position to fabricate the liquid crystal display device A. The uneven surface-color filter distance L was 521 μm.

<Example 2>

A mold B was produced in the same manner as in Example 1 except that the first etching amount at the time of mold production was 5 μm and the second etching amount was 13 μm. Further, an anti-glare film B, an anti-glare polarizing plate B, and a liquid crystal display device B were produced in the same manner as in Example 1 except that the mold B was used. The uneven surface-color filter distance L was 523 μm.

<Example 3>

At the time of mold production, the mold C was produced in the same manner as in Example 1 except that the pattern [exposure pattern C] shown in FIG. 9 was used and the first etching amount was changed to 4.5 μm. An anti-glare film C, an anti-glare polarizing plate C, and a liquid crystal display device C were produced in the same manner as in Example 1 except that the mold C was used. The uneven surface-color filter distance L was 520 μm.

<Example 4>

At the time of mold production, the mold D was produced in the same manner as in Example 1 except that the pattern [exposure pattern D] shown in Fig. 10 was used and the first etching amount was changed to 4.5 μm. An anti-glare film D and an anti-glare property were produced in the same manner as in Example 1 except that the mold D was used. Light board D and liquid crystal display device D. The uneven surface-color filter distance L was 521 μm.

<Example 5>

A mold E was produced in the same manner as in Example 1 except that the first etching amount at the time of mold production was 4 μm and the second etching amount was 12 μm. Further, an anti-glare film E, an anti-glare polarizing plate E, and a liquid crystal display device E were produced in the same manner as in Example 1 except that the mold E was used. The uneven surface-color filter distance L was 520 μm.

<Example 6>

The polarizing plate is peeled off from the front surface of the liquid crystal cell of the above-mentioned notebook computer (ZENBOOK UX21A, manufactured by ASUS Co., Ltd.), and the above-mentioned (meth) is added to the front surface of the liquid crystal cell in order to increase the uneven surface-color filter distance L. The acrylic pressure-sensitive adhesive layer and the transparent protective film (KC4UE manufactured by Konica Minolta Opto Co., Ltd.) were laminated to each other in a six-fold manner, and the absorption axis was aligned with the absorption axis direction of the polarizing plate originally bonded to the liquid crystal cell. The above-described anti-glare polarizing plate A was bonded thereto from above to produce a liquid crystal panel. Then, the liquid crystal panel is returned to the original position to fabricate the liquid crystal display device G. The uneven surface-color filter distance L was 708 μm.

<Comparative Example 1>

At the time of mold production, the pattern [exposure pattern H] shown in Fig. 11 was used, and the second etching amount was set to 12 μm, and other implementations were carried out. In the same manner as in Example 1, a mold H was produced. An anti-glare film H, an anti-glare polarizing plate H, and a liquid crystal display device H were produced in the same manner as in Example 1 except that the mold H was used. The uneven surface-color filter distance L was 521 μm.

<Comparative Example 2>

At the time of mold production, the mold 1 was produced in the same manner as in Example 1 except that the pattern [exposure pattern I] shown in Fig. 12 was used and the second etching amount was changed to 12 μm. An anti-glare film I, an anti-glare polarizing plate I, and a liquid crystal display device 1 were produced in the same manner as in Example 1 except that the mold 1 was used. The uneven surface-color filter distance L was 522 μm.

<Comparative Example 3>

At the time of mold production, the mold J was produced in the same manner as in Example 1 except that the pattern [exposure pattern J] shown in Fig. 13 was used and the second etching amount was changed to 12 μm. An anti-glare film J, an anti-glare polarizing plate J, and a liquid crystal display device J were produced in the same manner as in Example 1 except that the mold J was used. The uneven surface-color filter distance L was 520 μm.

<Comparative Example 4>

At the time of mold production, the pattern [exposure pattern K] shown in Fig. 14 was used, and the first etching amount was set to 3 μm, and the second etching amount was set to 10 μm. Except for this, a mold K was produced in the same manner as in Example 1. An anti-glare film K, an anti-glare polarizing plate K, and a liquid crystal display device K were produced in the same manner as in Example 1 except that the mold K was used. The uneven surface-color filter distance L was 524 μm.

The power spectrum G ² (f) obtained by discrete Fourier transform of the image data of the exposure patterns A, C, and D used for the production of the anti-glare films A to E is shown in Fig. 15. Further, the power spectrum G ² (f) obtained by performing discrete Fourier transform on the image data of the exposure patterns H, I, J, and K used for the production of the anti-glare films H to K is shown in FIG.

From Fig. 15, it can be seen that the one-dimensional power spectrum of the exposure patterns A, C, and D used for the production of the anti-glare films A to E is expressed as a graph with respect to the intensity of the spatial frequency at a spatial frequency of 0.006 μm. less than 0.012 m ^{-1 -1 -1 to} 0.15 m and 0.07 m ^-1 or less have a first maximum value and the second maximum value, and the spatial frequency of 0.012 m to 0.025 m ^-1 or more has a minimum value ^-1 or less. On the other hand, from Fig. 16, it can be seen that the one-dimensional power spectrum of the exposure patterns H to I used for the production of the anti-glare films H to I has the first and second maximum values and the minimum within the above range. However, in the exposure pattern H used for the production of the anti-glare film H, the first maximum value is smaller than the exposure patterns A, C, and D, and the minimum value is large. Further, in the exposure pattern I used for the production of the anti-glare film I, the first maximum value is smaller than the exposure patterns A, C, and D. In the one-dimensional power spectrum of the exposure pattern J used for the production of the anti-glare film J, the first maximum value is remarkably small, and the second maximum value exists outside the above range. In the one-dimensional power spectrum of the exposure pattern K used for the production of the anti-glare film K, the minimum value is larger than the exposure patterns A, C, and D, and the second maximum value exists outside the above range.

The results of measurement and evaluation of the physical properties of the antiglare film and the antiglare polarizing plate obtained in the examples and the comparative examples are shown in Table 1. In addition, FIG. 17, FIG. 18, and FIG. 19 show one-dimensional power spectrum calculated from the elevations of the anti-glare films A to C, the anti-glare films D and E, and the anti-glare films H to K, respectively. H ² (f).

The anti-glare films A to E (Examples 1 to 6) satisfying the requirements of the present invention exhibited sufficient anti-glare properties and showed no whitening, although they were low in haze. Among them, the anti-glare films A to D having a power spectrum of 0.01 μm ^-1 in the spatial frequency of the uneven surface of 2 μm ² or more exhibited excellent anti-glare properties. Further, the anti-glare films A to E are effective for suppressing glare even when applied to a high-definition liquid crystal panel having a distance L between the uneven surface and the color filter of less than 1 mm.

On the other hand, in the anti-glare film H (Comparative Example 1) and the anti-glare film K (Comparative Example 4), the power spectrum in the spatial frequency of the uneven surface of 0.01 μm ^-1 was 2 μm ² or more, and excellent anti-glare was exhibited. However, the power spectrum in the spatial frequency of 0.033 μm ^-1 exceeded 0.05 μm ² , so strong glare was observed. In the anti-glare film I (Comparative Example 2), although the power spectrum in the spatial frequency of the uneven surface of 0.033 μm ^-1 is 0.05 μm ² or less, an excellent glare suppressing effect is exhibited, but the power spectrum in the spatial frequency of 0.01 μm ^-1 is not Up to 1 μm ² , so the anti-glare property is insufficient. In the anti-glare film J (Comparative Example 3), the power spectrum in the spatial frequency of the uneven surface of 0.01 μm ^-1 is not 1 μm ² or more, and the power spectrum in the spatial frequency of 0.033 μm ^-1 is not 0.05 μm ² or less, so the anti-glare is Sexuality and glare inhibition are insufficient.

In Examples 1 and 6, the same anti-glare film A was used, but the uneven surface-color filter distance L was different. Since the power spectrum in the spatial frequency of the anti-glare film A of 0.033 μm ^-1 is 0.05 μm ² or less, in Examples 1 and 6 in which the uneven surface-color filter distance L is 521 μm and 708 μm, respectively, Excellent glare suppression.

1‧‧‧Anti-glare film

2‧‧‧ concave surface

101‧‧‧Anti-glare layer

102‧‧‧ Transparent support

103a‧‧‧1st adhesive layer

103b‧‧‧2nd adhesive layer

104‧‧‧ polarizing film

105‧‧‧Transparent resin layer

200‧‧‧Adhesive layer

300‧‧‧Substrate

400‧‧‧Color filters

Claims (8)

An anti-glare film comprising: a transparent support; and an anti-glare layer having a concave-convex surface laminated on the transparent support; and a power spectrum of the elevation of the uneven surface is 1 μm in a spatial frequency of 0.01 μm ^{-1 2} or more is 0.05 μm ² or less in 0.033 μm ^-1 . The anti-glare film according to the first aspect of the invention, which is an anti-glare film for an image display device having a color filter; and the color surface of the image display device from the uneven surface to the color The distance from the filter is less than 1 mm. The anti-glare film according to claim 2, wherein the distance is less than 0.75 mm. An anti-glare polarizing plate according to any one of claims 1 to 3, wherein the anti-glare film and the polarizing film are provided on the transparent support side of the anti-glare film. The aforementioned polarizing film. An image display device comprising: the anti-glare film according to any one of claims 1 to 3; and an image display element; and the transparent support body side of the anti-glare film is disposed There are the aforementioned image display elements. The image display device according to claim 5, wherein the uneven surface is in contact with the air layer. An image display device comprising: an anti-glare polarizing plate according to item 4 of the patent application; and an image display element; The image display element is disposed on the polarizing film side of the anti-glare polarizing plate. The image display device according to claim 7, wherein the uneven surface is in contact with the air layer.