JP2014119552A - Antiglare film and method for manufacturing mold for the film, and method for producing antiglare film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an antiglare film in which transmissive visibility can be decreased without increasing haze and unevenness or moire can be effectively eliminated, and to provide a method for manufacturing a mold for producing the antiglare film, and a method for producing an antiglare film by using the mold.SOLUTION: The antiglare film comprises a transparent support and an antiglare layer formed on the transparent support and having a fine rugged surface with a fine rugged pattern on an opposite side to the transparent support. When a power spectrum of heights on the fine rugged surface of the film is represented in a graph of intensities with respect to spatial frequencies, the graph has a local maximum only in a region of spatial frequencies from 0.010 μmto 0.020 μm. A cross-sectional curve of the rugged surface shows an absolute value of skewness of 0.5 or less. A method for manufacturing a mold for producing the antiglare film, and a method for producing the antiglare film are also disclosed.

Description

  The present invention relates to an antiglare film, a method for producing a mold therefor, and a method for producing an antiglare film.

Recent image display devices are becoming thinner and lighter for portability, convenience, power saving, and the like, and problems such as the following (1) to (3) occur:
(1) When a brightness enhancement sheet is used for power saving, moire occurs due to interference between the brightness enhancement sheet and the liquid crystal cell.
(2) In order to reduce the thickness of the member to be used and improve the mechanical strength, color unevenness due to phase difference occurs when a stretched film is used for the member.
(3) Since the gap between the liquid crystal panel and the backlight system on the back surface is narrow, circular unevenness and Newton rings due to contact between the liquid crystal panel and the backlight system occur.

  Anti-glare films generally have anti-glare properties, exhibit good contrast when placed on the surface of an image display device, the entire display surface becomes whitish due to scattered light when placed on the surface of an image display device, Suppresses the occurrence of so-called “whitening”, which causes the display to become cloudy, and the pixel of the image display device interferes with the uneven surface shape of the antiglare film when placed on the surface of the image display device. As a result, there is a demand for suppressing the occurrence of so-called “glare”, in which a luminance distribution is generated and is difficult to see. In addition to these general characteristics, the antiglare film is also required to eliminate the unevenness described above.

  As an anti-glare film, for example, JP 2009-116109 A (Patent Document 1) discloses a transmission sharpness in order to eliminate moire generated by a brightness enhancement sheet and a liquid crystal panel arranged between a light source and a liquid crystal panel. Describes an anti-glare film having a thickness of 150% or less. Further, it is disclosed that the transmission definition is more preferably 100% or less. As a method for producing an antiglare film, a method using a mold having a concavo-convex shape formed by blasting, a resin solution in which fine particles are dispersed is coated on a transparent support, and the coating film thickness is adjusted so that the fine particles are applied to the coating film surface. A method of forming random irregularities on a sheet by exposing is disclosed.

  Further, for example, Japanese Patent Application Laid-Open No. 2009-156938 (Patent Document 2) discloses an antiglare film in which an antiglare layer is formed on a polyethylene terephthalate film, wherein the total haze of the antiglare film is H%, and the clear transmission is achieved. An antiglare film characterized by satisfying the relational expression Tc ≦ 8H when the degree is Tc% is disclosed. In addition, as a method for producing an antiglare film, a resin solution in which fine particles are dispersed is applied onto a transparent support, and a random unevenness is formed on the sheet by adjusting the coating thickness to expose the fine particles to the coating film surface. A method of forming is disclosed.

JP 2009-116109 A JP 2009-156938 A

  However, the antiglare film disclosed in Patent Document 1 has not been able to sufficiently reduce the transmission clarity, and the effect of eliminating moire, unevenness, and the like has been insufficient. Also, the antiglare film disclosed in Patent Document 2 has not been able to sufficiently reduce the transmission clarity, and the effect of eliminating unevenness has been insufficient.

  Further, in the antiglare film disclosed in Patent Document 2, since the uneven surface of the antiglare layer is formed by dispersing fine particles, the haze is high, and the luminance of the antiglare film when arranged in an image display device is increased. A decrease and a decrease in contrast occurred.

  Examples of the method for eliminating the unevenness include a method for improving the haze of the antiglare film and a method for reducing the transmission clarity of the antiglare film. However, in the case of the method for improving the haze of the antiglare film, there is a problem that when the antiglare film is disposed in the image display device, the luminance and the contrast are reduced. In addition, in the case of the method of reducing the transmission clarity of the antiglare film, the unevenness is eliminated, but it is unclear how to reduce the transmission clarity, so eventually the fine particles added to the antiglare layer The transmission sharpness was lowered by increasing the number of copies. On the other hand, when the number of added fine particles is increased, the haze also increases, causing problems such as a decrease in luminance and a decrease in contrast.

  The present invention has been made in order to solve the above-described problems, and the object of the present invention is to reduce transmission clearness without increasing haze and effectively eliminate unevenness and moire. It is in providing the anti-glare film which can be performed. Another object of the present invention is to provide a method for producing a mold for producing the antiglare film as described above, and a method for producing an antiglare film using the mold.

As a result of intensive studies by the present inventors, the graph when the power spectrum of the altitude on the surface of the fine irregularities is expressed as the intensity with respect to the spatial frequency has a maximum value only at the spatial frequency of 0.010 μm ⁻¹ or more and 0.020 μm ⁻¹ or less. In addition, the anti-glare film having an absolute value of the skewness of the cross-sectional curve of 0.5 or less can reduce the transmission clarity without increasing haze, and can effectively eliminate unevenness and moire. I understood.

The antiglare film of the present invention is an antiglare film comprising a transparent support, and an antiglare layer having a fine uneven surface formed on the transparent support and having fine unevenness on the opposite side of the transparent support. And the graph when the power spectrum of the altitude on the surface of the fine irregularities is expressed as the intensity with respect to the spatial frequency has a maximum value only at the spatial frequency of 0.010 μm ⁻¹ or more and 0.020 μm ⁻¹ or less, and the cross-sectional curve The absolute value of the skewness is 0.5 or less.

  The antiglare film of the present invention has a total transmission definition of 50 measured using four types of optical combs in which the width of the dark part and the bright part is 0.125 mm, 0.5 mm, 1.0 mm and 2.0 mm. % Or less is preferable.

The antiglare film of the present invention preferably has a haze of 1% or more and 10% or less.
The present invention is also a method for producing a mold used for producing the above-described antiglare film of the present invention, wherein the first plating step of performing copper plating on the surface of the mold substrate, A polishing step for polishing the surface plated by the plating step, a photosensitive resin film forming step for forming a photosensitive resin film by applying a photosensitive resin to the polished surface, and a pattern on the photosensitive resin film An exposure process for exposing, a developing process for developing the pattern-exposed photosensitive resin film, a first etching process for performing an etching process using the developed photosensitive resin film as a mask to form irregularities on the plated surface, and etching A photosensitive resin film peeling step for peeling the photosensitive resin film after the treatment, a second etching step for dulling the uneven surface formed by the first etching step by the etching treatment, and a second etching process. And a second plating step of applying chromium plating to blunt been uneven surface by, 0.030 ^-1 following graph spatial frequency 0.010 ^-1 or more when expressed the power spectrum of the pattern as the intensity with respect to the spatial frequency The present invention also provides a method for producing a mold for producing an antiglare film, which has a maximum value only in the case of the above.

  In the present invention, the shape of the uneven surface of the mold produced by the above-described method for producing the mold for producing an antiglare film of the present invention is transferred to a transparent resin film, and then the shape of the uneven surface of the mold is transferred. The present invention also provides a method for producing an antiglare film including peeling off a transparent resin film from a mold.

  According to the present invention, it is possible to provide an antiglare film that can reduce the transmission clarity without increasing haze, and can effectively eliminate unevenness and moire. Moreover, according to this invention, the method of manufacturing the metal mold | die for manufacturing the above anti-glare films suitably, and the manufacturing method of the anti-glare film using the said metal mold | die can be provided.

It is a figure which shows typically the cross section of the anti-glare film 1 of this invention. It is a perspective view which shows typically the surface of the anti-glare film 1 of this invention. It is a schematic diagram which shows the state from which the function h (x, y) showing an altitude is obtained discretely. It is the figure which represented the altitude of the fine unevenness | corrugation surface of the anti-glare film of this invention with the two-dimensional discrete function h (x, y). Two-dimensional power spectrum _{^{H 2 (f x, f y}} ) is a schematic view for explaining a method of averaging the distance f from the origin in the frequency space. Is a diagram illustrating a two-dimensional function h (x, y) of a one-dimensional power spectrum of the altitude of the fine uneven surface obtained by discrete Fourier transform complex amplitude calculated from H ^{2 (f)} of FIG. 4 . It is a figure showing a part of image data which is a pattern used in order to manufacture the anti-glare film of this invention. It is the one-dimensional power spectrum calculated from the pattern shown in FIG. It is the pattern used for manufacture of the metal mold | die for anti-glare film manufacture of Examples 4-6. It is the pattern used for manufacture of the metal mold | die for anti-glare film manufacture of the comparative example 1. FIG. It is the power spectrum of the altitude of the anti-glare film of Examples 1-3. It is a power spectrum of the altitude of the anti-glare film of Examples 4-6. It is a power spectrum of the altitude of the anti-glare film of Comparative Examples 1-3.

<Anti-glare film>
The antiglare film of the present invention includes a transparent support and an antiglare layer provided on the transparent support and having a fine uneven surface having fine unevenness on the opposite side of the transparent support. Furthermore, in the antiglare film of the present invention, the graph when the power spectrum of the altitude on the surface of the fine irregularities is expressed as the intensity with respect to the spatial frequency has a maximum value only at the spatial frequency of 0.010 μm ⁻¹ or more and 0.020 μm ⁻¹ or less. And the absolute value of the skewness of the cross-sectional curve is 0.5 or less. As a result of intensive studies by the present inventors, if the surface irregularity shape of the antiglare film mainly has a surface irregularity shape with a period of 50 μm to 100 μm, the transmission clarity is effectively obtained even when the haze is reduced. It was found that the film showed good contrast while sufficiently eliminating unevenness and moire. That is, according to the present invention, if the graph representing the power spectrum of the altitude on the surface of the fine unevenness as the intensity with respect to the spatial frequency has a maximum only at the spatial frequency of 0.010 μm ⁻¹ or more and 0.020 μm ⁻¹ or less. It was found that an antiglare film showing good contrast while sufficiently eliminating unevenness and moire was obtained.

  First, the power spectrum of the altitude of the fine uneven surface of the antiglare film will be described. FIG. 1 is a cross-sectional view schematically showing the surface of the antiglare film 1 of the present invention, and FIG. 2 is a perspective view schematically showing the surface of the antiglare film 1 of the present invention. As shown in FIG. 1, the antiglare film 1 of the present invention has an antiglare layer 4 on a transparent support 2 with fine irregularities 3 formed on the surface thereof. Here, the “elevation of the surface of the fine unevenness” as used in the present invention means an arbitrary surface P on the surface of the antiglare film 1 and an average surface obtained from the average when the elevation of the surface of the fine unevenness is measured (the altitude is used as a reference). 0 μm) 5 means a linear distance in the main normal direction (direction perpendicular to the average surface of the fine uneven surface) 6. When the arbitrary point P on the surface of the antiglare film 1 is lower than the average surface (when located on the transparent support side), the altitude is a negative value, and when the elevation is higher than the average surface (when located on the fine uneven surface side). The altitude is positive. When the orthogonal coordinates in the average surface of the fine uneven surface are represented by (x, y), the elevation of the fine uneven surface can be expressed as a two-dimensional function h (x, y) of the coordinates (x, y).

The elevation of the surface of the fine irregularities can be obtained from three-dimensional information of the surface shape measured by an apparatus such as a confocal microscope, an interference microscope, an atomic force microscope (AFM). The horizontal resolution required for the measuring instrument is at least 5 μm or less, preferably 2 μm or less, and the vertical resolution is at least 0.1 μm or less, preferably 0.01 μm or less. Non-contact three-dimensional surface shape / roughness measuring instruments suitable for this measurement include New View 5000 series (manufactured by Zygo Corporation, available from Zygo Corporation in Japan), three-dimensional microscope PLμ2300 (manufactured by Sensofar), etc. Can be mentioned. Since the resolution of the power spectrum of the altitude needs to be 0.005 μm ⁻¹ or less, the measurement area is preferably at least 200 μm × 200 μm, and more preferably 500 μm × 500 μm.

Next, a method for obtaining an altitude power spectrum from a two-dimensional function h (x, y) will be described. First, a two-dimensional function H (f _x , f _y ) is obtained from the two-dimensional function h (x, y) by a two-dimensional Fourier transform defined by equation (1).

Where f _x and f _y is the frequency of the x and y directions, respectively, with the dimension of reciprocal length. Further, in Expression (1), π is a pi and i is an imaginary unit. By squaring the obtained two-dimensional function H (f _x , f _y ), the two-dimensional power spectrum H ² (f _x , f _y ) can be obtained. This two-dimensional power spectrum H ² (f _x , f _y ) represents the spatial frequency distribution of the fine uneven surface of the antiglare film.

  Hereinafter, a method for obtaining the two-dimensional power spectrum of the altitude of the fine uneven surface of the antiglare film will be described more specifically. The three-dimensional information of the surface shape actually measured by the above confocal microscope, interference microscope, atomic force microscope or the like is generally obtained as discrete values, that is, elevations corresponding to a large number of measurement points. FIG. 3 is a schematic diagram showing a state in which the function h (x, y) representing the altitude is obtained discretely. As shown in FIG. 3, the orthogonal coordinates in the film plane are displayed as (x, y), and the lines divided on the film projection plane 8 for each Δx in the x-axis direction and the lines divided for each Δy in the y-axis direction. Is indicated by a broken line, the actual elevation of the surface of the fine irregularities is obtained as a discrete elevation value at each intersection of the broken lines on the film projection surface 8.

  The number of elevation values obtained is determined by the measurement range and Δx and Δy. As shown in FIG. 3, the measurement range in the x-axis direction is X = (M−1) Δx, and the measurement range in the y-axis direction is Y = (N -1) Assuming Δy, the number of obtained elevation values is M × N.

  As shown in FIG. 3, the coordinates of the point of interest A on the film projection surface 8 are (jΔx, kΔy) (where j is 0 or more and M−1 or less, and k is 0 or more and N−1 or less). Then, the altitude of the point P on the film surface corresponding to the point of interest A can be expressed as h (jΔx, kΔy).

  Here, the measurement intervals Δx and Δy depend on the horizontal resolution of the measuring device, and in order to accurately evaluate the fine uneven surface, both Δx and Δy are preferably 5 μm or less, as described above, and preferably 2 μm or less. Is more preferable. Further, as described above, the measurement ranges X and Y are both preferably 200 μm or more, and more preferably 500 μm or more.

As described above, in actual measurement, the function representing the altitude of the fine uneven surface is obtained as a discrete function h (x, y) having M × N values. Obtained by measuring discrete function h (x, y) discrete by a discrete Fourier transform defined by equation (2) function _{H (f} x, _{f y)} is Motomari, discrete function _{H (f} x, _{f y)} a The discrete function H ² (f _x , f _y ) of the two-dimensional power spectrum is obtained by squaring. In the formula (2), l is an integer of −M / 2 or more and M / 2 or less, and m is an integer of −N / 2 or more and N / 2 or less. Δf _x and Δf _y are frequency intervals in the x and y directions, respectively, and are defined by equations (3) and (4).

Here, FIG. 4 is a diagram showing the altitude of the fine uneven surface of the antiglare film of the present invention by a two-dimensional discrete function h (x, y). As shown in FIG. 4, since the uneven surface of the antiglare film of the present invention is randomly formed, the two-dimensional power spectrum H ² (f _x , f _y ) in the frequency space (spatial frequency region). Is symmetric about the origin (f _x = 0, f _y = 0). Therefore, the two-dimensional function H ² (f _x , f _y ) can be converted into a one-dimensional function H ² (f) having a variable f (unit: μm ⁻¹ ) from the origin in the frequency space. The antiglare film of the present invention has a characteristic that the one-dimensional power spectrum represented by the one-dimensional function H ² (f) is constant.

FIG. 5 is a schematic diagram for explaining a method of averaging the two-dimensional power spectrum H ² (f _x , f _y ) with the distance f from the origin in the frequency space. Specifically, as shown in FIG. 5, first, in the frequency space, the distance from the origin O (f _x = 0, f _y = 0) is not less than (n−1 / 2) Δf and less than (n + 1/2) Δf. The number Nn of all the points (black dots in FIG. 5) located is calculated. In the example shown in FIG. 5, Nn = 16. Next, the total value H ² n of H ² (f _x , f _y ) of all points located at a distance of (n−1 / 2) Δf or more and less than (n + 1/2) Δf from the origin O (in FIG. 5) H ² (total value of f _x , f _y ) at the black circle points of ( ² ) is calculated, and the total value H ² n divided by the number of points Nn is calculated as H ² ( It was set as the value of f).

Here, when M ≧ N, n is an integer of 0 or more and N / 2 or less, and when M <N, n is an integer of 0 or more and M / 2 or less. M and N mean the number of measurement points in the x-axis direction and the number of measurement points in the y-axis direction, respectively, as shown in FIG. Δf was set to (Δf _x + Δf _y ) / 2.

In general, the one-dimensional power spectrum obtained by the above-described method includes noise during measurement. To determine the one-dimensional power spectrum here, in order to eliminate the influence of this noise, the elevation of the surface of the fine irregularities at multiple locations on the antiglare film is measured, and the one-dimensionality obtained from the elevation of each fine irregular surface. It is preferable to use the average value of the power spectrum as the one-dimensional power spectrum H ² (f). The number of locations for measuring the elevation of the fine uneven surface on the antiglare film is preferably 3 or more, more preferably 5 or more. FIG. 6 shows a one-dimensional power spectrum H ² (f) of the elevation of the fine uneven surface obtained by performing a discrete Fourier transform on the complex amplitude calculated from the two-dimensional function h (x, y) shown in FIG. . The one-dimensional power spectrum H ² (f) in FIG. 6 is an average of the one-dimensional power spectra obtained from the elevations of the fine uneven surfaces at five different locations on the antiglare film. The one-dimensional power spectrum H ² (f) at an altitude shown in FIG. 6 has a maximum value at 0.019 μm ⁻¹ .

In the antiglare film of the present invention, the one-dimensional power spectrum H ² (f) calculated from the elevation of the fine uneven surface has a local maximum only at a spatial frequency of 0.010 μm ⁻¹ or more and 0.020 μm ⁻¹ or less. Features. As a result, the uneven surface shape of the antiglare film is mainly formed with a surface shape having a period of 50 μm to 100 μm.

  In addition, the antiglare film of the present invention preferably has an absolute value of the skewness Psk of the cross-sectional curve in accordance with JIS B 0601 of 0.5 or less. The small absolute value of the skewness Psk of the cross-sectional curve means that the area of the area lower than the average height of the fine uneven surface is close to the area of the higher area, and the surface having such characteristics is a continuous uneven surface shape. Will be formed. When the absolute value of the skewness Psk of the cross-sectional curve is greater than 0.5, there are more regions that are lower or higher than the average height of the surface of the fine unevenness than regions that are relatively higher or lower than the average height, and unevenness and moire are present. There is a tendency that cannot be effectively eliminated. Here, the absolute value of the skewness Psk of the cross-sectional curve is preferably 0.4 or less, more preferably 0.25 or less.

  The antiglare film of the present invention preferably has a transmission clarity of 50% or less. Here, the transmission clarity of the antiglare film conforms to the provisions of JIS K 7105, and four types of optical combs in which the width of the dark part and the bright part are 0.125 mm, 0.5 mm, 1.0 mm, and 2.0 mm. Is the total value of the values measured by the image clarity measuring device ICM-1DP (manufactured by Suga Test Instruments Co., Ltd.). The maximum value of the transmission definition according to this definition is 400%. When an antiglare film having a transmission clarity exceeding 50% is used, there is a possibility that unevenness and moire cannot be sufficiently eliminated.

  The haze of the antiglare film of the present invention is preferably 1% or more and 10% or less. Here, the haze of the antiglare film is measured according to JIS K 7136. When the haze exceeds 10%, it is not preferable because the luminance is lowered and the contrast is lowered when the haze is arranged in the image display device. Further, when the haze is less than 1%, the antiglare property may be lowered, and unevenness and moire may not be effectively eliminated, which is not preferable. The haze of the antiglare film of the present invention is more preferably 2% or more and 5% or less.

  The haze of the antiglare film of the present invention is preferably generated mainly by fine irregularities on the surface of the antiglare film. A conventional anti-glare film is a method in which a resin solution in which fine particles are dispersed is applied onto a transparent support, the coating thickness is adjusted, and fine particles are exposed on the surface of the coating film to form random irregularities on the sheet. Is manufactured by. The antiglare film produced by dispersing such fine particles has haze (internal haze) generated by the refractive index difference between the binder resin and the fine particles in addition to the fine irregularities on the surface of the antiglare film. There are many cases. When such an antiglare film is disposed on the surface of an image display device, the contrast is lowered due to light scattering at the interface between the fine particles and the binder resin, such being undesirable. Therefore, the smaller the internal haze that causes the decrease in contrast, the better. Moreover, in order not to generate internal haze, the antiglare film preferably does not contain fine particles that scatter light.

<Manufacturing method of mold>
The present invention is a method for producing a mold used for producing the above-described antiglare film of the present invention, and also provides a mold production method including the following steps. The mold manufacturing method of the present invention includes (1) first plating step, (2) polishing step, (3) photosensitive resin film forming step, (4) exposure step, (5) development step, and (6) first step. 1 etching process, (7) photosensitive resin film peeling process, (8) 2nd etching process, and (9) 2nd plating process, and the pattern exposed on the photosensitive resin film in the exposure process has its power A major feature is that the graph when the spectrum is expressed as an intensity with respect to a spatial frequency has a maximum value only at a spatial frequency of 0.010 μm ⁻¹ or more and 0.030 μm ⁻¹ or less. Here, the “pattern” means image data for forming the fine uneven surface of the antiglare film of the present invention, a mask having a light transmitting part and a light shielding part, and the like. By setting it as such a pattern, the anti-glare film in which the surface uneven | corrugated shape which has the above characteristics was formed with sufficient reproducibility can be manufactured.

For example, if the power spectrum of the pattern is image data, the gradation of the image data is represented by a two-dimensional function g (x, y), and the two-dimensional function G (f) is obtained by the two-dimensional Fourier transform defined by Expression (6). _x , _fy ) is obtained.

Here, x and y represent orthogonal coordinates of the image data plane, f _x and f _y is the frequency of the frequency and the y-direction in the x direction, with the dimension of reciprocal length. Further, in Expression (6), π is a circular ratio, and i is an imaginary unit. Further, <g> is an average value of the two-dimensional function g (x, y). The resulting two-dimensional function _{G (f} x, f _y) by squaring the can determine the two-dimensional power spectrum ^{_{G 2 (f x, f y}} ).

When obtaining the power spectrum of an actual pattern, the gradation two-dimensional function g (x, y) is generally obtained as a discrete function. Thus resulting discrete function g (x, y) and the discrete by a discrete Fourier transform defined by equation (7) function _{G (f} x, _{f y)} is Motomari, discrete function _{G (f} x, _{f y)} squared discrete function ^{_{G 2 (f x, f y}} ) of the two-dimensional power spectrum by is required.

Here, M and N are the numbers of data in the x and y directions of the pattern, respectively, l is an integer of −M / 2 to M / 2, and m is an integer of −N / 2 to N / 2. It is. Further, [Delta] x and Δy are data interval in the x and y directions, Delta] f _x and Delta] f _y are frequency intervals of the x and y directions. Here, in order to accurately evaluate the pattern characteristics, the data intervals Δx and Δy are preferably 5 μm or less, and more preferably 2 μm or less. The number of data M and N is preferably 200 or more, and more preferably 500 or more.

Here, since the fine uneven surface of the antiglare film of the present invention randomly forms unevenness, the two-dimensional power spectrum G ² (f _x , f _y ) in the frequency space (spatial frequency region) is the origin (f _x = 0). , F _y = 0). Therefore, the two-dimensional function G ² (f _x , f _y ) can be converted into a one-dimensional function G ² (f) having a variable f (unit: μm ⁻¹ ) from the origin in the frequency space. Specifically, the one-dimensional function is calculated by calculating in the same manner as when the two-dimensional function H ² (f _x , f _y ) of the power spectrum of the elevation of the fine uneven surface is converted to the one-dimensional function H ² (f). G ² (f) is obtained.

  FIG. 7 is a diagram showing a part of image data which is a pattern (Examples 1 to 3 described later) used for manufacturing the antiglare film of the present invention. The image data which is the pattern shown in FIG. 7 was 33 mm × 33 mm and was produced at 12800 dpi.

FIG. 8 shows the distance from the origin to the power spectrum G ² (f _x , f _y ) obtained by discrete Fourier transform of the two-dimensional discrete function g (x, y) of the gradation of the image data shown in FIG. It is the figure represented as a function of f. From this, it can be seen that the pattern shown in FIG. 8 has a local maximum only at a spatial frequency of 0.026 μm ⁻¹ .

When the power spectrum of a pattern for producing an antiglare film has a maximum value only at 0.010 μm ⁻¹ or more and 0.030 μm ⁻¹ or less, the power spectrum of the altitude of the fine uneven surface of the antiglare film is a spatial frequency. 0.010 ^-1 or 0.020 ^-1 now have only local maxima below, the resulting antiglare film may be indicators of good contrast while eliminating sufficiently unevenness or moire.

For power spectrum to produce a pattern with a maximum value below 0.010 ^-1 or 0.030 ^-1 is the dot size of less than 100μm may be randomly and uniformly arranged above 50 [mu] m. One or more types of dot diameters may be arranged at random. In addition, a pattern obtained by passing a high-pass filter that removes components below a specific spatial frequency that is 0.010 μm ⁻¹ or more in the spatial frequency from a pattern that is formed by randomly arranging dots in this way is used. Thus, a pattern for producing an antiglare film may be used. Further, a bandpass for removing a component having a spatial frequency of 0.010 μm ⁻¹ or more and a component having a specific spatial frequency of 0.030 μm ⁻¹ or less from a pattern produced by randomly arranging dots. It is good also as a pattern for glare-proof film preparation using the pattern obtained by letting a filter pass. When creating a pattern using a method that passes through a high-pal filter or band-pass filter, a random brightness distribution with the density determined by a random number or a pseudo-random number generated by a computer as the pattern before passing through the filter A pattern having can also be used.

Hereinafter, each process in the manufacturing method of the metal mold | die of this invention is demonstrated.
(1) First Plating Step First, in the first plating step, copper plating is performed on the surface of the mold base. This is because a flat and glossy surface is formed by filling the fine irregularities and voids of the mold base with copper plating having a high covering property and a strong smoothing action.

  Copper used in the first plating step may be copper pure metal or an alloy mainly composed of copper. Therefore, “copper” as used herein is meant to include copper and copper alloys. Copper plating may be performed by electrolytic plating or electroless plating, respectively, but usually electrolytic plating is employed. When copper plating is performed, if the plating layer is too thin, the influence of the surface of the base material for the mold as a base cannot be excluded, so the thickness is preferably 50 μm or more. The upper limit of the thickness of the formed copper plating layer is generally about 500 μm from the viewpoint of cost.

  In addition, as a metal material used suitably for formation of the base material for metal mold | die, aluminum, iron, etc. are mentioned from a viewpoint of cost. Furthermore, lightweight aluminum is more preferable from the convenience of handling. The aluminum and iron here may be pure metals, respectively, or may be an alloy mainly composed of aluminum or iron.

  Further, the shape of the mold base material is not particularly limited as long as it is an appropriate shape that has been conventionally employed in this field, and may be a flat plate shape or a columnar or cylindrical roll. Also good. If a mold is produced using a roll-shaped substrate, there is an advantage that the antiglare film can be produced in a continuous roll shape.

(2) Polishing process In the subsequent polishing process, the surface plated by the first plating process is polished. Through this process, the surface of the copper plating layer is polished in a state close to a mirror surface. This is because die base materials (metal plates, metal rolls, etc.) are often subjected to machining such as cutting and grinding in order to achieve the desired surface shape. This is because the processed marks remain on the surface, and even when the copper plating is applied, the processed marks may remain, and the surface may not be completely smooth in the plated state. In other words, even if the process described later is performed on the surface where such processed marks remain, the unevenness such as processed marks may be deeper than the unevenness formed after performing each process. In the case where an antiglare film is produced using such a mold, the optical characteristics may be unexpectedly affected.

  The method for polishing the surface of the copper plating layer is not particularly limited, and any of a mechanical polishing method, an electrolytic polishing method, and a chemical polishing method can be used. Examples of the mechanical polishing method include super finishing, lapping, fluid polishing, and buffing. Moreover, it is good also considering the surface of a copper plating layer as a mirror surface by carrying out mirror surface cutting using a cutting tool in a grinding | polishing process. The material and shape of the cutting tool at that time are not particularly limited, and carbide tools, CBN tools, ceramic tools, diamond tools, etc. can be used, but diamond tools should be used from the viewpoint of processing accuracy. Is preferred.

(3) Photosensitive resin film forming step In the subsequent photosensitive resin film forming step, a photosensitive resin is applied to the surface polished in the above-described polishing step to form a photosensitive resin film. A conventionally known photosensitive resin can be used as the photosensitive resin. For example, an acrylic ester having an acrylic group or a methacrylic group in the molecule as a negative photosensitive resin having a property of curing the photosensitive portion. Monomers, prepolymers, mixtures of bisazide and diene rubber, polyvinyl cinnamate compounds, and the like can be used. In addition, as a positive photosensitive resin having a property that a photosensitive portion is eluted by development and only an unexposed portion remains, a phenol resin type or a novolac resin type can be used. Moreover, you may mix | blend various additives, such as a sensitizer, a development accelerator, an adhesiveness modifier, and a coating property improving agent, with a photosensitive resin as needed.

  When applying these photosensitive resins to the surface of the copper plating layer, in order to form a good coating film, it is preferable to dilute and apply in an appropriate solvent, cellosolve solvent, propylene glycol solvent, An ester solvent, an alcohol solvent, a ketone solvent, a highly polar solvent, or the like can be used.

  As a coating type of the photosensitive resin solution, a conventionally known type can be appropriately selected according to the physical properties of the solution. Among them, spin coating, roll coating, wire bar coating, and ring coating are preferably employed. Moreover, after apply | coating the photosensitive resin solution, it is preferable to perform a heating and drying process.

(4) Exposure process In the subsequent exposure process, the pattern mentioned above is exposed on the formed photosensitive resin film. The light source used in the exposure process may be appropriately selected according to the photosensitive wavelength and sensitivity of the coated photosensitive resin. For example, the g-line (wavelength: 436 nm) of a high-pressure mercury lamp, the h-line (wavelength: 405 nm) of a high-pressure mercury lamp. , High pressure mercury lamp i-line (wavelength: 365 nm), semiconductor laser (wavelength: 830 nm, 532 nm, 488 nm, 405 nm, etc.), YAG laser (wavelength: 1064 nm), KrF excimer laser (wavelength: 248 nm), ArF excimer laser (wavelength: 193 nm), F2 excimer laser (wavelength: 157 nm), or the like.

  In order to form the surface irregularities with high accuracy in the mold manufacturing method of the present invention, in the exposure step, the pattern having the above-described features can be exposed on the photosensitive resin film in a precisely controlled state. preferable. In the mold manufacturing method of the present invention, in order to accurately expose the above-described pattern on the photosensitive resin film, the pattern is produced as image data on a computer, and the pattern based on the image data is controlled by a computer. It is preferable to draw with a laser beam emitted from the laser head. When performing laser drawing, a laser drawing apparatus for preparing a printing plate can be used. An example of such a laser drawing apparatus is Laser Stream FX (manufactured by Sink Laboratories).

(5) Development Step In the subsequent development step, the pattern-exposed photosensitive resin film is developed. When a positive photosensitive resin is used for the photosensitive resin film, the exposed area is dissolved by the developer, and only the unexposed area remains on the copper plating layer. In the subsequent first etching step, Acts as a mask. When a negative photosensitive resin is used for the photosensitive resin film, only the unexposed areas are dissolved by the developer, and the exposed areas remain on the copper plating layer, and the subsequent first etching step. Acts as a mask.

  A conventionally well-known thing can be used about the developing solution used for a image development process. For example, inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, aqueous ammonia, primary amines such as ethylamine and n-propylamine, diethylamine, di-n-butylamine, etc. Secondary amines, tertiary amines such as triethylamine and methyldiethylamine, alcohol amines such as dimethylethanolamine and triethanolamine, secondary amines such as tetramethylammonium hydroxide, tetraethylammonium hydroxide and trimethylhydroxyethylammonium hydroxide Examples include alkaline aqueous solutions such as quaternary ammonium salts, cyclic amines such as pyrrole and pihelidine, and organic solvents such as xylene and toluene.

  The development method in the development step is not particularly limited, and methods such as immersion development, spray development, brush development, and ultrasonic development can be used.

(6) First Etching Step In the subsequent first etching step, the developed photosensitive resin film is used as a mask to etch mainly the unmasked region of the copper plating layer to form irregularities on the plating surface. The etching process in the first etching step is usually performed using a ferric chloride (FeCl ₃ ) solution, a cupric chloride (CuCl ₂ ) solution, an alkaline etching solution (Cu (NH ₃ ) ₄ Cl ₂ ), etc. Although it is performed by corroding the surface, a strong acid such as hydrochloric acid or sulfuric acid can be used, or reverse electrolytic etching by applying a potential opposite to that at the time of electrolytic plating can also be used. The etching process in the first etching step may be performed by one etching process, or the etching process may be performed twice or more. The etching amount (thickness of the base material to be cut by etching) can be controlled by adjusting the etching processing technique, the composition of the processing liquid used for the etching processing, the etching processing temperature, the etching processing time, and the like.

(7) Photosensitive resin film peeling step In the subsequent photosensitive resin film peeling step, the photosensitive resin film is peeled after the etching process in the first etching step. In the photosensitive resin film peeling step, the photosensitive resin film is usually dissolved using a peeling solution. As the remover, the same developer as described above can be used, but changing pH, temperature, concentration, immersion time, etc., for example, increasing the pH, temperature, concentration than the developer, By extending the immersion time, the photosensitive resin film in the exposed area is completely exposed when a negative photosensitive resin film is used, and in the non-exposed area when a positive photosensitive resin film is used. Dissolve and remove. The peeling method in the photosensitive resin film peeling step is not particularly limited, and methods such as immersion peeling, spray peeling, brush peeling, and ultrasonic peeling can be used.

(8) Second Etching Step In the subsequent second etching step, the uneven shape formed by the first etching step is blunted by an etching process. By this second etching process, there is no portion with a steep surface slope in the concavo-convex shape formed by the first etching process, and the optical characteristics of the antiglare film manufactured using the obtained mold are changed in a preferable direction. To do.

Similarly to the first etching process, the etching process of the second etching process is usually ferric chloride (FeCl ₃ ) liquid, cupric chloride (CuCl ₂ ) liquid, alkaline etching liquid (Cu (NH ₃ ) ₄ Cl ₂ ) or the like, and by corroding the surface, strong acid such as hydrochloric acid or sulfuric acid can be used, or reverse electrolytic etching by applying a potential opposite to that at the time of electrolytic plating can also be used.

  The bluntness of the unevenness after the etching treatment can vary depending on the type of the underlying metal, the etching technique, the size and depth of the unevenness obtained by the first etching process, etc., but it is the most effective in controlling the bluntness. A large factor is the etching amount. The etching amount here is also the thickness of the copper plating layer cut by etching, as in the first etching step. Similarly to the first etching process, the etching process in the second etching process may be performed by one etching process, or the etching process may be performed twice or more.

(9) Second plating step In the subsequent second plating step, chromium plating is performed on the uneven surface blunted by the second etching step. The type of chrome plating is not particularly limited, but it is preferable to use a chrome plating that expresses a good gloss, so-called gloss chrome plating or decorative chrome plating. Chromium plating is usually performed by electrolysis, and an aqueous solution containing chromic anhydride (CrO ₃ ) and a small amount of sulfuric acid is used as the plating bath. By adjusting the current density and electrolysis time, the thickness of the chromium plating can be controlled. By forming a protective plating layer with high coverage by chromium plating on the surface of the copper plating layer on which fine uneven shapes are formed, the uneven shapes are industrially advantageously blunted, and the uneven shapes are antiglare films. It changes in a preferable direction as a mold for production.

The graph when the power spectrum is expressed as the intensity with respect to the spatial frequency through the above-described steps and the pattern has a maximum value only at the spatial frequency of 0.010 μm ⁻¹ or more and 0.030 μm ⁻¹ or less. By making it, a suitable metal mold | die can be manufactured in order to manufacture the anti-glare film provided with the characteristic mentioned above.

<Method for producing antiglare film>
The antiglare film of the present invention is obtained by transferring the uneven shape on the surface of the mold for producing an antiglare film produced as described above to a transparent resin film, and then transferring the transparent resin film having the transferred uneven shape to the mold. It can be manufactured by a manufacturing method including peeling from the substrate.

  For example, the uneven shape on the surface of the mold for producing an antiglare film manufactured as described above is transferred to a photocurable resin layer or the like on a transparent support, and then the uneven shape is transferred to the uneven shape. It can be manufactured by an embossing method characterized in that an antiglare film is produced by peeling off the transparent support from the mold.

  Here, examples of the embossing method include a UV embossing method using a photocurable resin and a hot embossing method using a thermoplastic resin. Among these, the UV embossing method is preferable from the viewpoint of productivity. The UV embossing method forms a photocurable resin layer on the surface of a transparent support, and cures the photocurable resin layer while pressing the photocurable resin layer against the uneven surface of the mold. It is a method of transferring to a layer. Specifically, an ultraviolet curable resin is coated on a transparent support, and the ultraviolet curable resin is irradiated with ultraviolet rays from the transparent support side in a state where the coated ultraviolet curable resin is in close contact with the uneven surface of the mold. The resin is cured, and then the concavo-convex shape of the mold is transferred to the ultraviolet curable resin by peeling the transparent support on which the cured ultraviolet curable resin layer is formed from the mold.

  When the UV embossing method is used, the transparent support may be a substantially optically transparent film. For example, a triacetyl cellulose film, a polyethylene terephthalate film, a polymethyl methacrylate film, a polycarbonate film, or a norbornene compound is used as a monomer. And a resin film such as a solvent cast film of thermoplastic resin such as amorphous cyclic polyolefin and an extruded film.

  Further, the type of the ultraviolet curable resin in the case of using the UV embossing method is not particularly limited, but a commercially available appropriate one can be used. It is also possible to use a resin that can be cured by visible light having a wavelength longer than that of ultraviolet rays by combining an ultraviolet curable resin with an appropriately selected photoinitiator. Specifically, polyfunctional acrylates such as trimethylolpropane triacrylate and pentaerythritol tetraacrylate are used alone or in admixture of two or more thereof, and Irgacure 907 (manufactured by Ciba Specialty Chemicals) ), Irgacure 184 (manufactured by Ciba Specialty Chemicals), and a photopolymerization initiator such as Lucillin TPO (manufactured by BASF) can be suitably used.

  On the other hand, the hot embossing method is a method in which a transparent support formed of a thermoplastic resin is pressed against a mold in a heated state, and the surface shape of the mold is transferred to the transparent support. The transparent support used in the hot embossing method may be any material as long as it is substantially transparent. For example, polymethyl methacrylate, polycarbonate, polyethylene terephthalate, triacetyl cellulose, norbornene compounds are used as monomers. A solvent cast film or an extruded film of a thermoplastic resin such as amorphous cyclic polyolefin can be used. These transparent resin films can also be suitably used as a transparent support for coating the ultraviolet curable resin in the UV embossing method described above.

  EXAMPLES Hereinafter, although an Example is shown and this invention is demonstrated further more concretely, this invention is not limited by these examples.

[1] Measurement of surface shape of antiglare film (Measurement of surface elevation)
The elevation of the surface of the antiglare film was measured using a three-dimensional microscope PLμ2300 (manufactured by Sensofar). In order to prevent the sample from warping, it was subjected to measurement after being bonded to a glass substrate using an optically transparent pressure-sensitive adhesive so that the uneven surface became the surface. During the measurement, the objective lens was measured at a magnification of 10 times. The horizontal resolutions Δx and Δy were both 1.66 μm and the measurement area was 1270 μm × 950 μm.

(Power spectrum of elevation of fine surface irregularities)
Sampling 512 × 512 data (850 μm × 850 μm in measurement area) from the center of the measurement data obtained above, and using the two-dimensional function h (x, y) as the elevation of the fine uneven surface of the antiglare film Asked. Two-dimensional function h (x, y) of the discrete Fourier transform to two-dimensional function _{H (f} x, f _y) was determined. The two-dimensional function H (f _x , f _y ) is squared to calculate a two-dimensional function H ² (f _x , f _y ) of the two-dimensional power spectrum, and the one-dimensional power spectrum is a function of the distance f from the origin. A one-dimensional function H ² (f) was calculated. The elevation of the surface of the five positions for each sample was measured, the one-dimensional power spectrum is calculated from these data one-dimensional function H ² dimensional function of the average value of ^(f) one-dimensional power spectrum of each sample H ² (F).

(Absolute value of the skewness Psk of the sectional curve)
The absolute value of the skewness Psk of the cross-sectional curve of the fine uneven surface of the antiglare film was measured by the method defined in JIS B 0601: 2001. Specifically, the measurement was performed using a small surface roughness measuring machine Surf Test SJ-310 (manufactured by Mitutoyo Corporation) based on this standard.

(Transparency definition)
The transmission clarity of the antiglare film was measured using an image clarity measuring device “ICM-1DP” manufactured by Suga Test Instruments Co., Ltd. based on JIS K 7105. Also in this case, in order to prevent the sample from warping, it was subjected to measurement after being bonded to a glass substrate using an optically transparent adhesive so that the fine uneven surface of the antiglare layer was the surface. . In this state, light was incident from the glass side and measurement was performed. The measured value here is a total value of values measured using four types of optical combs in which the widths of the dark part and the bright part are 0.125 mm, 0.5 mm, 1.0 mm, and 2.0 mm, respectively. . In this case, the maximum value of the transmission clarity is 400%.

(Haze)
The haze of the antiglare film is that the antiglare film is bonded to a glass substrate on the side opposite to the antiglare layer forming surface using an optically transparent adhesive, and the antiglare film is bonded to the glass substrate. The film was measured using a haze meter “HM-150” manufactured by Murakami Color Research Laboratory Co., Ltd. in accordance with JIS K 7136, with light incident from the glass substrate side.

(Evaluation of elimination of unevenness and moire)
The polarizing plates on both the front and back surfaces were peeled from a liquid crystal cell of a commercially available liquid crystal television KDL-32EX710 (manufactured by Sony Corporation) in which a prism sheet and a diffusion sheet were disposed between the light guide plate and the liquid crystal panel. Instead of these original polarizing plates, polarizing plate Sumikaran SRDB31E (manufactured by Sumitomo Chemical Co., Ltd.) is used on both the back side and the display side, and adhesive is applied so that the respective absorption axes coincide with the absorption axis of the original polarizing plate. The light guide plate / prism sheet / liquid crystal panel were assembled in the order of the light guide plate / prism sheet / liquid crystal panel with the diffusion sheet removed, and a liquid crystal image display device in which moire was generated by interference between the prism sheet and the liquid crystal cell was produced. An anti-glare film was bonded to the surface on the viewing side of the liquid crystal display device where the moire was generated via an adhesive, and the moire in that state was visually evaluated. The state of moire was evaluated according to the following criteria in three stages from 1 to 3.

Moire 1: No moire is observed,
2: Moire is slightly observed,
3: Moire is clearly observed.

(Visual evaluation of whitishness)
In order to prevent reflection from the back surface of the antiglare film, the antiglare film is bonded to the black acrylic resin plate so that the uneven surface becomes the surface, and visually observed from the uneven surface side in a bright room with a fluorescent lamp. Then, the degree of whitishness was visually evaluated. The whitishness was evaluated according to the following criteria in three stages from 1 to 3.

White 1: The white is not observed,
2: A little whitish is observed,
3: The whitish is clearly observed.

(Evaluation of pattern for antiglare film production)
The gradation of the produced pattern data is represented by a two-dimensional discrete function g (x, y). The horizontal resolutions Δx and Δy of the discrete function g (x, y) are both 2 μm. The resulting two-dimensional function g (x, y) and by discrete Fourier transform, two-dimensional function _{G (f} x, f _y) was determined. The two-dimensional function G (f _x , f _y ) is squared to calculate a two-dimensional power spectrum two-dimensional function G ² (f _x , f _y ), and the one-dimensional power spectrum is a function of the distance f from the origin. A one-dimensional function G ² (f) was calculated.

<Example 1>
(Production of molds for the production of anti-glare films)
An aluminum roll having a diameter of 200 mm (A5056 according to JIS) was prepared by applying copper ballad plating to the surface. Copper ballad plating consists of a copper plating layer / thin silver plating layer / surface copper plating layer, and the thickness of the entire plating layer was set to be about 200 μm. The copper plating surface was mirror-polished, and a photosensitive resin was applied to the polished copper plating surface and dried to form a photosensitive resin film. Next, a pattern in which the pattern shown in FIG. 7 (produced by passing a bandpass filter that removes a component in a specific spatial frequency range from a pattern having a random brightness distribution) is repeatedly arranged on the photosensitive resin film It was exposed by laser light and developed. Laser light exposure and development were performed using Laser Stream FX (manufactured by Sink Laboratory Co., Ltd.). A positive photosensitive resin was used for the photosensitive resin film.

  Then, the etching process as a 1st etching process was performed with the cupric chloride liquid. The etching amount at that time was set to 4 μm. The photosensitive resin film was removed from the roll after the first etching step, and etching treatment as a second etching step was performed again with cupric chloride solution. The etching amount at that time was set to 12 μm. Then, the chromium plating process was performed and the metal mold | die A was produced. At this time, the chromium plating thickness was set to 4 μm.

(Formation of antiglare film)
The following components were dissolved in ethyl acetate at a solid content concentration of 60%, and an ultraviolet curable resin composition A having a refractive index of 1.53 after curing was obtained.

Pentaerythritol triacrylate 60 parts Multifunctional urethanated acrylate 40 parts (Reactive product of hexamethylene diisocyanate and pentaerythritol triacrylate)
5 parts of diphenyl (2,4,6-trimethoxybenzoyl) phosphine oxide This UV curable resin composition A was applied onto a 60 μm thick triacetyl cellulose (TAC) film so that the coating thickness after drying was 7 μm. And dried for 3 minutes in a drier set at 60 ° C. The film after drying was brought into close contact with the concavo-convex surface of the mold A obtained previously with a rubber roll so that the photocurable resin composition layer was on the mold side. In this state, light from a high-pressure mercury lamp having an intensity of 20 mW / cm ² was irradiated from the TAC film side so that the amount of light in terms of h-line was 200 mJ / cm ² to cure the photocurable resin composition layer. Thereafter, the TAC film was peeled from the mold together with the cured resin, and a transparent anti-glare film A composed of a laminate of the cured resin having irregularities on the surface and the TAC film was produced.

<Example 2>
A mold B was prepared in the same manner as in Example 1 except that the etching amount in the first etching step was set to 5 μm and the etching amount in the second etching step was set to 12 μm. An antiglare film B was produced in the same manner as in Example 1 except that the mold B was used.

<Example 3>
A mold C was prepared in the same manner as in Example 1 except that the etching amount in the second etching step was set to 10 μm, and the same as in Example 1 except that the mold C was used. A dazzling film C was prepared.

<Example 4>
A pattern in which the pattern shown in FIG. 9 (produced by passing a bandpass filter that removes a component in a specific spatial frequency range from a pattern having a random brightness distribution) is repeatedly arranged on the photosensitive resin film by laser light A mold D was produced in the same manner as in Example 1 except that the exposure was performed, and an antiglare film D was produced in the same manner as in Example 1 except that the mold D was used.

<Example 5>
A mold E was prepared in the same manner as in Example 4 except that the etching amount in the first etching step was set to 5 μm and the etching amount in the second etching step was set to 12 μm. An antiglare film E was produced in the same manner as in Example 1 except that the mold E was used.

<Example 6>
A mold F was produced in the same manner as in Example 4 except that the etching amount in the first etching step was set to 3 μm and the etching amount in the second etching step was set to 10 μm. An antiglare film F was produced in the same manner as in Example 1 except that the mold F was used.

<Comparative Example 1>
A pattern in which the pattern shown in FIG. 10 (produced by passing a bandpass filter that removes a component in a specific spatial frequency range from a pattern having a random brightness distribution) is repeatedly arranged on the photosensitive resin film by laser light A mold G was produced in the same manner as in Example 6 except that the exposure was performed, and an antiglare film G was produced in the same manner as in Example 1 except that the mold G was used.

<Comparative example 2>
3 parts of porous silica particles “Silysia” (trade name, manufactured by Fuji Silysia Chemical Co., Ltd.) having a weight average particle diameter of 2.7 μm are added to 100 parts of the solid content of the ultraviolet curable resin composition A. An ultraviolet curable resin composition B was prepared.

This ultraviolet curable resin composition B was applied onto a 60 μm-thick triacetyl cellulose (TAC) film so that the coating thickness after drying was 3 μm, and was dried in a dryer set at 80 ° C. for 1 minute. . The UV-curable resin composition is irradiated with light from a high-pressure mercury lamp having an intensity of 20 mW / cm ² from the side of the UV-curable resin composition layer of the dried film so that the amount of light converted to h-ray is 300 mJ / cm ² . The layer was cured to form an antiglare layer (cured resin) having fine irregularities on the surface, and an antiglare film H was produced.

<Comparative Example 3>
Except that the addition part of the porous silica particles to be added was changed to 5 parts, the ultraviolet curable resin composition C was adjusted in the same manner as in Comparative Example 2, and the comparison was made except that the ultraviolet curable resin composition C was used. An antiglare film I was produced in the same manner as in Example 2.

  The evaluation results are shown in Tables 1 and 2. Moreover, the elevation power spectrum of the anti-glare film obtained in Examples 1-3 is obtained in FIG. 11, and the elevation power spectrum of the anti-glare film obtained in Examples 4-6 is obtained in FIG. 12, Comparative Examples 1-3. The elevation power spectrum of the antiglare film is shown in FIG.

  Examples 1 to 6, which satisfy all the requirements of the present invention, exhibited a good contrast with no haze and no whitening while completely eliminating moire. On the other hand, in Comparative Examples 1 and 2, which did not satisfy the requirements of the present invention, moire was slightly confirmed. Further, in Comparative Examples 2 and 3, whitening was strongly generated, and it was confirmed that the contrast was lowered when arranged in the image display device.

  DESCRIPTION OF SYMBOLS 1 Anti-glare film, 2 Transparent support body, 3 Concavity and convexity, 4 Anti-glare layer, 5 Virtual plane, 6 Main normal direction of film, 8 Film projection surface.

Claims (5)

An antiglare film comprising a transparent support and an antiglare layer formed on the transparent support and having a fine uneven surface having fine unevenness on the opposite side of the transparent support, The graph when the power spectrum of the altitude is expressed as the intensity with respect to the spatial frequency has a maximum value only at the spatial frequency of 0.010 μm ⁻¹ or more and 0.020 μm ⁻¹ or less, and the absolute value of the skewness of the cross-sectional curve is 0. An antiglare film, which is 5 or less.   The total of transmitted sharpness measured using four types of optical combs in which the width of a dark part and a bright part is 0.125 mm, 0.5 mm, 1.0 mm, and 2.0 mm is 50% or less. The anti-glare film as described in 2.   The antiglare film according to claim 1 or 2, wherein the haze is 1% or more and 10% or less. A method for producing a mold used for producing the antiglare film according to claim 1,
A first plating step for copper plating on the surface of the mold base, a polishing step for polishing the surface plated by the first plating step, and a photosensitive resin applied to the polished surface for photosensitivity A photosensitive resin film forming step for forming a resin film, an exposure step for pattern exposure on the photosensitive resin film, a development step for developing the photosensitive resin film subjected to pattern exposure, and a mask for the developed photosensitive resin film The etching process is performed, and the first etching process for forming irregularities on the plated surface, the photosensitive resin film peeling process for peeling the photosensitive resin film after the etching process, and the irregularities formed by the first etching process are etched. A second etching step for dulling by the second etching step, and a second plating step for performing chromium plating on the concavo-convex surface blunted by the second etching step,
A mold for producing an antiglare film, wherein a graph when the power spectrum of the pattern is expressed as intensity against a spatial frequency has a maximum value only at a spatial frequency of 0.010 μm ⁻¹ or more and 0.030 μm ⁻¹ or less. Production method.   5. The prevention including peeling off the transparent resin film having transferred the shape of the uneven surface of the mold from the mold after transferring the shape of the uneven surface of the mold manufactured by the method according to claim 4 to the transparent resin film. Manufacturing method of dazzling film.