JP6585342B2 - Anti-glare film, anti-glare polarizing plate and image display device - Google Patents

Description

  The present invention relates to an antiglare film, and an antiglare polarizing plate and an image display device using the same.

  In an image display device such as a liquid crystal display device, an organic electroluminescence (EL) display device, a plasma display panel, and a cathode ray tube (CRT) display, visibility is significantly impaired when external light is reflected on the display surface. The antiglare film is an optical film used for suppressing such reflection of external light. The antiglare film includes an antiglare layer having a fine uneven surface that contributes to suppression of reflection of external light, and is incorporated into an image display device so that the uneven surface faces the viewer side.

  JP 2014-119650 A (Patent Document 1) is an anti-glare polarizing plate in which an anti-glare layer having a fine uneven surface is formed on a polarizing film, and the power spectrum of the altitude of the fine uneven surface is A controlled anti-glare polarizing plate is disclosed.

JP 2014-119650 A

In the antiglare polarizing plate described in Patent Document 1, the fine uneven surface has a second derivative d ² logH ² (f) / df ² with respect to the spatial frequency f of the common logarithm log H ² (f) of the power spectrum of the altitude. It is controlled so as to satisfy less than 0 at a spatial frequency of 0.01 μm ⁻¹ and greater than 0 at 0.02 μm ⁻¹ , thereby exhibiting sufficient antiglare properties and suppressing glare even at low haze. It is said that. Glare is a phenomenon that occurs in a relatively high-definition image display device, where the uneven surface shape of the antiglare layer interferes with the pixels of the image display device, and a luminance distribution is generated, resulting in the visibility of the image display device. It is a phenomenon that decreases.

  However, when the antiglare polarizing plate described in Patent Document 1 is incorporated in a high-definition image display device, if the uneven surface-color filter distance L is less than 1 mm, glare may be insufficiently suppressed. There was sex. The distance L refers to the distance from the uneven surface (viewing side surface) of the antiglare layer to the viewing side surface of the RGB pattern of the color filter, and the color filter substrate (glass substrate or the like) on which the RGB pattern is formed. Including the thickness of

  In general, if an internal haze (internal scattering function) is imparted to the antiglare layer, it works to suppress glare. However, increasing the internal haze causes a decrease in luminance and a decrease in contrast.

  Therefore, the present invention provides an antiglare film that has both sufficient antiglare property and excellent glare-suppressing property while having low haze when the distance L is less than 1 mm when applied to an image display device. With the goal. Another object of the present invention is to provide an antiglare polarizing plate and an image display device using the antiglare film.

The present invention provides the following antiglare film, antiglare polarizing plate and image display device.
[1] A transparent support and an antiglare layer having an uneven surface laminated on the transparent support,
The antiglare film wherein the power spectrum of the elevation of the uneven surface is 1 μm ² or more at a spatial frequency of 0.01 μm ⁻¹ and 0.05 μm ² or less at 0.033 μm ⁻¹ .

[2] An antiglare film for an image display device having a color filter,
The antiglare film according to [1], wherein a distance from the uneven surface to the color filter when applied to the image display device is less than 1 mm.

[3] The antiglare film according to [2], wherein the distance is less than 0.75 mm.
[4] The antiglare film according to any one of [1] to [3] and a polarizing film,
An anti-glare polarizing plate in which the polarizing film is disposed on the transparent support side of the anti-glare film.

[5] The antiglare film according to any one of [1] to [3] or the antiglare polarizing plate according to [4] and an image display element,
An image display device in which the image display element is disposed on the transparent support side of the antiglare film or on the polarizing film side of the antiglare polarizing plate.

  [6] The image display device according to [5], wherein the uneven surface is in contact with an air layer.

  According to the present invention, even when the distance L when applied to an image display device is less than 1 mm, the antiglare film has both low glaze and sufficient antiglare properties and glare suppression, An antiglare polarizing plate and an image display device can be provided.

It is sectional drawing which shows typically the example of the anti-glare film which concerns on this invention, and an anti-glare polarizing plate. It is a perspective view which shows typically the surface of the anti-glare film which concerns on this invention. It is a schematic diagram which shows the state from which the function h (x, y) showing an altitude is obtained discretely. It is the figure which represented the altitude of the uneven | corrugated surface of an anti-glare layer with the two-dimensional discrete function h (x, y). Two-dimensional power spectrum _{^{H 2 (f x, f y}} ) is a schematic view for explaining a method of averaging the distance f from the origin in the frequency space. It is a figure which shows typically a preferable example of the first half part of the manufacturing method of the metal mold | die for uneven | corrugated surface formation. It is a figure which shows typically a preferable example of the latter half part of the manufacturing method of the metal mold | die for uneven | corrugated surface formation. It is a figure which shows a part of image data of the exposure pattern A. FIG. 5 is a view showing a part of image data of an exposure pattern C. FIG. 5 is a view showing a part of image data of an exposure pattern D. FIG. 5 is a view showing a part of image data of an exposure pattern H. It is a figure which shows a part of image data of the exposure pattern I. It is a figure which shows a part of image data of the exposure pattern J. FIG. It is a figure which shows a part of image data of the exposure pattern K. Exposure patterns A, C, shows a discrete Fourier transform and one-dimensional power spectrum G ² obtained by ^(f) the image data of D. Exposure pattern H, a diagram illustrating I, J, one dimensional power spectrum obtained by discrete Fourier transform of image data of K G ² a ^(f). Was calculated from the elevation of the anti-glare film A~C illustrates a one-dimensional power spectrum H ² (f). Was calculated from the elevation of the antiglare film D and E is a diagram showing a one-dimensional power spectrum H ² (f). Was calculated from the elevation of the anti-glare film H~K illustrates a one-dimensional power spectrum H ² (f).

  FIG. 1 is a cross-sectional view schematically showing an example of an antiglare film and an antiglare polarizing plate according to the present invention, and is a state incorporated in an image display device, specifically, a part of an image display element. The anti-glare polarizing plate in the state of being bonded to the substrate 300 through the pressure-sensitive adhesive layer 200 is shown. As the anti-glare film 1 shown in FIG. 1, the anti-glare film according to the present invention includes a transparent support 102 and an anti-glare layer 101 having a fine uneven surface 2 laminated thereon. Moreover, the anti-glare polarizing plate which concerns on this invention contains the anti-glare film 1 and the polarizing film 104 like the example shown by FIG. Hereinafter, the anti-glare film, the anti-glare polarizing plate and the image display apparatus using these according to the present invention will be described in more detail.

<Anti-glare film>
(1) Anti-glare layer and power spectrum of elevation of uneven surface The anti-glare film 1 includes an anti-glare layer 101 laminated on a transparent support 102, and the anti-glare layer 101 has fine unevenness. It has a surface 2. First, the altitude power spectrum of the uneven surface 2 of the antiglare layer 101 will be described.

  FIG. 2 is a perspective view schematically showing the surface of the antiglare film according to the present invention. “Elevation of the uneven surface” means an arbitrary point P on the uneven surface 2 of the antiglare film 1 and a virtual plane having the height at the average height of the uneven surface 2 (the altitude is 0 μm as a reference). Means the linear distance in the main normal direction 5 (normal direction in the virtual plane) of the anti-glare film 1. In FIG. 2, the entire surface of the antiglare film is displayed on the projection surface 3.

  The fine uneven surface 2 of the antiglare layer 101 is a two-dimensional plane as schematically shown in FIG. 2, and therefore, the elevation of the uneven surface 2 is expressed by orthogonal coordinates in the film plane as shown in FIG. When displayed in (x, y), it can be represented by a two-dimensional function h (x, y) of coordinates (x, y).

The elevation of the concavo-convex surface 2 can be obtained from three-dimensional information of the surface shape measured by an apparatus such as a confocal microscope, an interference microscope, an atomic force microscope (AFM) or the like. The horizontal resolution required for the measuring instrument is at least 5 μm or less, preferably 2 μm or less, and the vertical resolution is at least 0.1 μm or less, preferably 0.01 μm or less. Non-contact three-dimensional surface shape / roughness measuring instruments suitable for this measurement include New View 5000 series (manufactured by Zygo Corporation, available from Zygo Corporation in Japan), three-dimensional microscope PLμ2300 (manufactured by Sensofar), etc. Can be mentioned. Since the resolution of the power spectrum of the altitude needs to be 0.005 μm ⁻¹ or less, the measurement area is preferably at least 200 μm × 200 μm, and more preferably 500 μm × 500 μm.

Next, a method for obtaining an altitude power spectrum from a two-dimensional function h (x, y) will be described. First, a two-dimensional function H (f _x , f _y ) is obtained from the two-dimensional function h (x, y) by a two-dimensional Fourier transform defined by the following formula (1).

f _x and f _y is the frequency of the x and y directions, respectively, with the dimension of reciprocal length. Further, in Expression (1), π is a pi and i is an imaginary unit. By squaring the obtained two-dimensional function H (f _x , f _y ), the two-dimensional power spectrum H ² (f _x , f _y ) can be obtained. This two-dimensional power spectrum H ² (f _x , f _y ) represents the spatial frequency distribution of the uneven surface 2.

  Hereinafter, the method for obtaining the two-dimensional power spectrum of the elevation of the uneven surface 2 will be described more specifically. The three-dimensional information of the surface shape actually measured by the above confocal microscope, interference microscope, atomic force microscope or the like is generally obtained as discrete values, that is, elevations corresponding to a large number of measurement points. FIG. 3 is a schematic diagram showing a state in which the function h (x, y) representing the altitude is obtained discretely. As shown in FIG. 3, the in-plane orthogonal coordinates of the antiglare layer 101 are displayed as (x, y), and a line divided every Δx in the x-axis direction on the projection plane 3 and every Δy in the y-axis direction. When the divided lines are indicated by broken lines, the elevation of the concavo-convex surface 2 is obtained as a discrete elevation value at each intersection of the broken lines on the projection plane 3 in actual measurement.

  The number of altitude values obtained is determined by the measurement range and Δx and Δy. As shown in FIG. 3, the measurement range in the x-axis direction is X = (M−1) Δx, and the measurement range in the y-axis direction is Y = ( N-1) Assuming Δy, the number of obtained elevation values is M × N.

  As shown in FIG. 3, when the coordinates of the point of interest A on the projection plane 3 are (jΔx, kΔy) (j is 0 or more and M−1 or less and k is 0 or more and N−1 or less), the attention is paid. The altitude of the point P on the antiglare film surface corresponding to the point A can be expressed as h (jΔx, kΔy).

  Here, the measurement intervals Δx and Δy depend on the horizontal resolution of the measuring device, and in order to accurately evaluate the uneven surface, both Δx and Δy are preferably 5 μm or less, as described above, and preferably 2 μm or less. Is more preferable. Further, as described above, the measurement ranges X and Y are both preferably 200 μm or more, and more preferably 500 μm or more.

Thus, in actual measurement, the function representing the elevation of the uneven surface is obtained as a discrete function h (x, y) having M × N values. Discrete function h obtained by measurement (x, y) and the discrete by a discrete Fourier transform defined by the following formula (2) function _{H (f} x, _{f y)} is Motomari, discrete function _H (f _{x, f} y) To obtain a discrete function H ² (f _x , f _y ) of the two-dimensional power spectrum. In the formula (2), l is an integer of −M / 2 or more and M / 2 or less, and m is an integer of −N / 2 or more and N / 2 or less. Δf _x and Δf _y are frequency intervals in the x direction and the y direction, respectively, and are defined by the following formula (3) and the following formula (4).

FIG. 4 is an example of a diagram in which the elevation of the uneven surface 2 of the antiglare layer 101 is represented by a two-dimensional discrete function h (x, y). In FIG. 4, the altitude is indicated by a gradation of white and black. As shown in FIG. 4, since the uneven surface 2 of the antiglare layer 101 is randomly formed, the two-dimensional power spectrum H ² (f _x , f _y ) in the frequency space (spatial frequency region) is the origin ( symmetric with respect to f _x = 0, f _y = 0). Therefore, the two-dimensional function H ² (f _x , f _y ) can be converted into a one-dimensional function H ² (f) having a variable f (unit: μm ⁻¹ ) from the origin in the frequency space. The antiglare layer 101 according to the present invention has a feature that the one-dimensional power spectrum represented by the one-dimensional function H ² (f) is constant.

Specifically, as shown in FIG. 5, first, in the frequency space, the distance from the origin O (f _x = 0, f _y = 0) is not less than (n−1 / 2) Δf and less than (n + 1/2) Δf. The number Nn of all the points (black dots in FIG. 5) located is calculated. In the example shown in FIG. 5, Nn = 16. Next, the total value H ² n of H ² (f _x , f _y ) of all points located at a distance of (n−1 / 2) Δf or more and less than (n + 1/2) Δf from the origin O (in FIG. 5) of at the point bullet ^{_{H 2 (f x, f y}} ) to calculate the total value) of, as shown in the following formula (5), those obtained by dividing the total value ^{H 2} n by the number of points Nn ^{H 2} The value of (f) is assumed.

Here, when M ≧ N, n is an integer of 0 or more and N / 2 or less, and when M <N, n is an integer of 0 or more and M / 2 or less. M and N mean the number of measurement points in the x-axis direction and the number of measurement points in the y-axis direction, respectively, as shown in FIG. In addition, Δf is (Δf _x + Δf _y ) / 2.

In general, the one-dimensional power spectrum obtained by the above-described method may include noise during measurement. In obtaining the one-dimensional power spectrum, in order to eliminate the influence of this noise, the elevation of the uneven surface 2 at a plurality of locations on the antiglare layer 101 is measured, and the one-dimensional power spectrum obtained from the elevation of each uneven surface 2 Is preferably used as the one-dimensional power spectrum H ² (f). The number of places where the elevation of the uneven surface 2 on the antiglare layer 101 is measured is preferably 3 or more, more preferably 5 or more.

In the anti-glare film 1 of the present invention, the power spectrum (one-dimensional power spectrum) of the uneven surface 2 obtained as described above is ¹ μm ² or more at a spatial frequency of 0.01 μm ⁻¹ and is 0.033 μm. ⁻¹ is 0.05 μm ² or less. Thereby, when the distance L between the concavo-convex surface and the color filter is less than 1 mm when incorporated in a high-definition image display device, it is possible to achieve both sufficient antiglare property and excellent glare suppression. When the distance L is less than 0.75 mm, a higher glare suppression effect can be obtained.

  As described above, the uneven surface-color filter distance L in this specification refers to the color filter 400 (more specifically, the color filter 400) from the uneven surface 2 of the antiglare layer 101 with reference to FIG. The distance to the surface of (RGB pattern). The uneven surface 2 here means the surface on the visual recognition side, and of these, the surface of the most protruding convex portion. The surface of the color filter 400 means the surface on the viewing side, that is, the surface on the substrate 300 side where the color filter 400 is provided. The substrate 300 is a viewing side substrate constituting the image display element, and is a substrate to which the antiglare film 1 or an antiglare polarizing plate including the antiglare film 1 is bonded.

Logarithm logH second uneven surface 2 of the one-dimensional power spectra of H ² Elevation ^{(f) (f),} the one-dimensional power spectrum of common logarithm obtained from elevation uneven surface 2 at different five positions on the antiglare layer 101 Is the average. From common logarithm logH ² of the one-dimensional power spectrum (f), calculating the secondary on the spatial frequency f of the common logarithm logH ² one-dimensional power spectrum (f) the derivative ^{d 2 logH 2 (f) /} df 2 Can do. Specifically, the second derivative can be calculated by the difference method of the following formula (6).

Two-dimensional discrete function h shown in FIG. 4 (x, y) second derivative on the spatial frequency f of the formulas logarithm logH ² (f) of the one-dimensional obtained according (5) power spectrum ^H 2 (f) The function d ² logH ² (f) / df ² was −5192 at a spatial frequency of 0.01 μm ^{−1 and} 36695 at a spatial frequency of 0.02 μm ⁻¹ . Therefore, the graph when the common logarithm logH ² (f) of this one-dimensional power spectrum is expressed as the intensity with respect to the spatial frequency has a convex shape at the spatial frequency of 0.01 μm ⁻¹ , and the spatial frequency of 0.02 μm ^{− 1} has a downwardly convex shape.

  The glare suppressing ability of the antiglare film 1 of the present invention will be described in more detail. The cause of the occurrence of glare is a luminance distribution caused by interference between the pixels of the image display device and the surface unevenness of the anti-glare film 1, and therefore the intensity of the glare depends on the definition of the pixels of the image display device. The present inventor made a hypothesis that the uneven lens function of the uneven surface 2 is involved as a glare factor in addition to the pixel definition. That is, it was considered that the unevenness of the uneven surface 2 functions as a lens, and when the pixel is inside the lens focal length, the viewer can show an enlarged virtual image of the pixel to cause glare. In this case, when the undulation component having a certain period included in the fine unevenness is regarded as a lens arranged continuously, when the distance L between the uneven surface and the color filter is shorter than the focal length of the lens, the undulation component is It is thought that the pixel is enlarged and glare is generated. Based on this hypothesis, it is considered that the period of the undulation component that causes glare differs according to the distance L.

As a result of intensive studies, the present inventors have found that even if the same antiglare film is used, the glare suppression ability varies depending on the distance L, and in the case where the distance L is less than 1 mm, It has been found that the swell component having a period of 30 μm or a period close to it is a main factor that causes glare. As a result of studying based on such knowledge, the present inventor has found that the unevenness at the spatial frequency of 0.033 μm ⁻¹ is effective in reducing the waviness component of the above period and effectively suppressing glare when the distance L is less than 1 mm. It has been found that the power spectrum of the altitude of the surface 2 should be 0.05 μm ² or less. From the viewpoint of suppressing glare, the power spectrum is preferably 0.04 μm ² or less, and more preferably 0.030 μm ² or less.

  On the other hand, the anti-glare polarizing plate described in the above cited reference 1 can mainly suppress the waviness component having a period of about 50 μm included in the fine irregularities, and the glare is caused when the distance L is 1 mm or more. On the other hand, when it is applied to an image display device in which the distance L is less than 1 mm, it is possible that the suppression of glare may be insufficient.

The power spectrum of the elevation of the uneven surface 2 at a spatial frequency of 0.033 μm ⁻¹ is usually 0.005 μm ² or more. When the power spectrum is less than 0.005 .mu.m ^2, it may become difficult to make the power spectrum in the spatial frequency 0.01 [mu] m ^-1 to 1 [mu] m ² or more.

Further, the present inventor relates to the strength of the swell component having a period of about 100 μm included in the fine irregularities in the anti-glare property of the anti-glare film 1. The anti-glare property can be effectively scattered, and in order to obtain good anti-glare property, the power spectrum of the altitude at a spatial frequency of 0.01 μm ⁻¹ should be 1 μm ² or more. I found it. From the viewpoint of antiglare properties, the power spectrum is preferably 2 μm ² or more, more preferably 2.5 μm ² or more, and further preferably 3 μm ² or more.

The power spectrum of the altitude of the uneven surface 2 at a spatial frequency of 0.01 μm ⁻¹ is usually 10 μm ² or less. When the power spectrum is greater than 10 [mu] m ^2, it may become difficult to make the power spectrum in the spatial frequency 0.033Myuemu ^-1 to 0.05 .mu.m ² below.

(2) Manufacturing method of anti-glare layer The anti-glare layer 101 is manufactured by a method including a step of forming a surface shape (fine irregularities) based on a predetermined pattern on the surface of a mold substrate. And it can produce by the method (embossing method) which transfers the shape of the uneven | corrugated surface of this metal mold | die to the surface of the resin layer (photocurable resin layer etc.) formed on the transparent support body 102. FIG. “Pattern” typically means image data that can be created by a computer, which is used to form the concavo-convex surface 2 of the antiglare layer 101, but can be uniquely converted to the image data. Such as matrix data. Data that can be uniquely converted to image data includes data in which only the coordinates and gradation of each pixel are stored.

In order to accurately form the concavo-convex surface 2 of the antiglare layer 101 having the power spectrum characteristics as described above, the one-dimensional power spectrum of the predetermined pattern used for manufacturing the concavo-convex surface forming mold is used as the intensity with respect to the spatial frequency. graph when expressed has two maximum values in the following spatial frequency 0.006 ^-1 or 0.15 [mu] m ^-1, one of the maximum value spatial frequency 0.006 ^-1 or 0.012 .mu.m ^-1 following It is preferable to have the other maximum value in the range of the spatial frequency of 0.07 μm ⁻¹ or more and 0.15 μm ⁻¹ or less. Minimum value which is present between these two maxima are preferably present in the range of spatial frequencies 0.012 .mu.m ^-1 or 0.025 .mu.m ^-1. Here, the local maximum value and the local minimum value refer to the local maximum value and the local minimum value, and do not refer to the local local maximum value and local minimum value due to small fluctuations in the graph.

The intensity of the first local maximum value in the spatial frequency 0.006 ^-1 or 0.012 .mu.m ^-1 following patterns used for the production of the irregular surface forming mold, the spatial frequency 0.07 .mu.m ^-1 or 0.15 [mu] m ^- It is preferably smaller than the intensity of the second maximum value at ¹ or less. When the intensity of the first maximum value is greater than the second maximum value, the glare tends to increase. By designing the pattern so that the first maximum value of the power spectrum is increased, the power spectrum of the altitude at the spatial frequency 0.01 μm ⁻¹ of the uneven surface 2 can be increased. On the other hand, to reduce the minimum value in the following spatial frequency 0.012 .mu.m ^-1 or 0.025 .mu.m ^-1, and to design a pattern to shift the second maximum value to a higher frequency side, irregular surface It is possible to reduce the power spectrum of the altitude at a spatial frequency of 0.033 μm ⁻¹ .

For example, when the pattern is image data, the two-dimensional power spectrum of the pattern is obtained by converting the image data into binary image data having two gradations, and then converting the gradation of the image data with a two-dimensional function g (x, y). represents, resulting two-dimensional function g (x, y) to Fourier transform two-dimensional function _{G (f} x, f _y) to calculate the resulting two-dimensional function _{G (f} x, f _y) square It is required by doing. Here, x and y represent orthogonal coordinates of the image data plane, f _x and f _y represent the frequency of the frequency and the y-direction in the x direction.

  Similar to the case of obtaining the two-dimensional power spectrum of the altitude of the uneven surface 2 of the antiglare layer 101, the two-dimensional function g (x, y) of the gradation is a discrete function when obtaining the two-dimensional power spectrum of the pattern. Generally obtained. In that case, the two-dimensional power spectrum may be calculated by discrete Fourier transform, as in the case of obtaining the elevation two-dimensional power spectrum of the uneven surface 2. The one-dimensional power spectrum of the pattern is obtained from the two-dimensional power spectrum of the pattern in the same manner as the one-dimensional power spectrum of the elevation of the uneven surface 2.

One dimensional power spectrum has a first local maximum value and the second maximum value respectively 0.15 [mu] m ^-1 or less spatial frequency 0.006 ^-1 or 0.012 .mu.m ^-1 or less and 0.07 .mu.m ^-1 or more, the space to create a pattern having a minimum value to a frequency 0.012 .mu.m ^-1 or 0.025 .mu.m ^-1 or less, determines the shade by the pseudo random number generated by the pattern and the random number or computer that created by placing dots at random What is necessary is just to pass through the bandpass filter which removes the component of a specific spatial frequency range from the pattern which has random brightness distribution.

  As described above, in order to appropriately control the spatial frequency distribution of the uneven surface 2 of the antiglare layer 101 and to impart a predetermined power spectrum characteristic to the uneven surface 2, the antiglare layer 101 is produced by an embossing method. Is preferred. Examples of the embossing method include a UV embossing method using a photocurable resin and a hot embossing method using a thermoplastic resin. Among these, the UV embossing method is preferable from the viewpoint of productivity.

  The UV embossing method forms a photocurable resin layer on the surface of a transparent support and cures the photocurable resin layer by pressing the photocurable resin layer against the mold's concave / convex surface. It is a method of transferring to a layer. Specifically, an ultraviolet curable resin is applied onto a transparent support, and the ultraviolet curable resin is irradiated with ultraviolet rays from the transparent support side while the applied ultraviolet curable resin is in close contact with the uneven surface of the mold. The resin is cured, and then the transparent support on which the cured UV curable resin layer (antiglare layer) is formed is peeled from the mold.

  Although the kind of ultraviolet curable resin in the case of using UV embossing method is not specifically limited, The commercially available appropriate thing can be used. It is also possible to use a resin that can be cured by visible light having a wavelength longer than that of ultraviolet rays by combining an ultraviolet curable resin with an appropriately selected photoinitiator.

  Specific examples of the ultraviolet curable resin include, for example, polyfunctional acrylates such as trimethylolpropane triacrylate and pentaerythritol tetraacrylate, or a mixture of two or more of them, and Irgacure 907 (Ciba This is a resin composition obtained by mixing a photopolymerization initiator such as Specialty Chemicals Co., Ltd., Irgacure 184 (Ciba Specialty Chemicals Co., Ltd.), or Lucyrin TPO (BASF Co., Ltd.).

  On the other hand, the hot embossing method is a method in which a transparent support formed of a thermoplastic resin is pressed against a mold in a heated state, and the surface shape of the mold is transferred to the transparent support. The transparent support used in the hot embossing method may be any material as long as it is substantially transparent. For example, polymethyl methacrylate, polycarbonate, polyethylene terephthalate, triacetyl cellulose, norbornene compounds are used as monomers. A solvent cast film or an extruded film of a thermoplastic resin such as amorphous cyclic polyolefin can be used. These transparent resin films can also be suitably used as a transparent support for coating the ultraviolet curable resin in the UV embossing method described above.

(3) Transparent support The transparent support 102 constituting the antiglare film 1 may be a substantially optically transparent film, such as a triacetyl cellulose film, a polyethylene terephthalate film, a polymethyl methacrylate film, and a polycarbonate. Examples thereof include resin films such as films, solvent cast films of thermoplastic resins such as amorphous cyclic polyolefins having norbornene compounds as monomers, and extruded films.

  The thickness of the transparent support 102 is, for example, 10 to 200 μm, preferably 10 to 100 μm, and more preferably 10 to 60 μm. If the thickness of the transparent support 102 is within this range, the antiglare film 1 having sufficient mechanical strength tends to be obtained, and the image display device provided with the antiglare film 1 is more glaring. It becomes difficult to do.

(4) Haze of antiglare film The antiglare film 1 preferably has a haze of 0.3 to 5%, more preferably 0.3 to 3%, and 0.3 to 1%. More preferably it is. If the haze exceeds this range, the contrast is lowered. If the haze is below this range, sufficient antiglare properties may not be obtained. The haze is measured according to JIS K 7136.

(5) Manufacturing method of uneven | corrugated surface formation metal mold | die Next, the method of manufacturing the metal mold | die used in order to form the fine uneven surface 2 on the surface of the glare-proof layer 101 is demonstrated. Although the manufacturing method of the uneven surface forming mold is not particularly limited as long as it can obtain the predetermined uneven surface 2 by using the pattern described above, the uneven surface 2 is manufactured with high accuracy and reproducibility. Therefore, [1] first plating step, [2] polishing step, [3] photosensitive resin film forming step, [4] exposure step, [5] development step, and [6] first etching Preferably, the method basically includes a step, [7] a photosensitive resin film peeling step, [8] a second etching step, and [9] a second plating step.

  FIG. 6 is a diagram schematically illustrating a preferred example of the first half of the method for manufacturing a mold for forming an uneven surface. FIG. 6 schematically shows a cross section of the mold in each step. Hereafter, each process of the manufacturing method of the uneven | corrugated surface formation metal mold | die is demonstrated in detail, referring FIG.

[1] First Plating Step In the method for producing a mold for forming an uneven surface, first, copper plating is applied to the surface of a substrate used for the mold. Thus, by performing copper plating on the surface of the mold base, it is possible to improve the adhesion and gloss of chrome plating in the subsequent second plating step. This is because copper plating has a high covering property and a strong smoothing action, and therefore fills minute irregularities and voids of the mold base to form a flat and glossy surface. Due to these copper plating characteristics, even if chromium plating is applied in the second plating step described later, the roughness of the chromium plating surface that seems to be caused by minute irregularities and voids existing on the substrate is eliminated, The occurrence of fine cracks is reduced due to the high coverage of copper plating.

  The copper used in the first plating step may be a pure copper metal or may be an alloy mainly composed of copper. Therefore, “copper” in this specification means copper and a copper alloy. It means to include. Copper plating may be performed by electrolytic plating or electroless plating, but electrolytic plating is usually employed.

  When copper plating is performed, if the plating layer is too thin, the influence of the underlying surface cannot be completely eliminated. Therefore, the thickness is preferably 50 μm or more. Although the upper limit of the plating layer thickness is not critical, it is generally preferable to set the thickness to about 500 μm in view of cost and the like.

  As the metal material constituting the substrate, aluminum, iron or the like is preferably used from the viewpoint of cost. From the viewpoint of handleability, aluminum is more preferable. The aluminum and iron here may be pure metals, respectively, or may be an alloy mainly composed of aluminum or iron.

  The shape of the base material may be an appropriate shape conventionally employed in this field, may be a flat plate shape, or may be a columnar or cylindrical roll. If a die is produced using a roll-shaped substrate, there is an advantage that an antiglare film can be produced in a continuous roll shape.

[2] Polishing Step In the subsequent polishing step, the surface of the substrate that has been subjected to copper plating in the first plating step described above is polished. In this step, it is preferable to polish the surface of the substrate so as to be close to a mirror surface. This is because metal plates and metal rolls that are base materials are often subjected to mechanical processing such as cutting and grinding in order to achieve the desired accuracy, and as a result, processed marks remain on the surface of the base material. This is because even if the copper plating is applied, those processed eyes may remain, and the surface is not always completely smooth in the plated state. That is, even if a process described later is performed on the surface where such deep processed marks remain, the unevenness such as processed marks may be deeper than the unevenness formed after performing each process. Such effects may remain, and when an antiglare film is produced using such a mold, the optical properties may be unexpectedly affected. In FIG. 6 (a), copper plating is performed on the surface of the plate-shaped mold substrate 7 in the first plating step (the copper plating layer formed in the step is not shown). Furthermore, the state which was made to have the surface 8 further mirror-polished by the grinding | polishing process is shown typically.

  The method for polishing the surface of the substrate on which the copper plating is applied is not particularly limited, and any of a mechanical polishing method, an electrolytic polishing method, and a chemical polishing method can be used. Examples of the mechanical polishing method include super finishing, lapping, fluid polishing, and buff polishing. Moreover, it is good also considering the surface of the base material 7 for metal mold | die as a mirror surface by carrying out mirror surface cutting using a cutting tool in a grinding | polishing process. The material and shape of the cutting tool at that time are not particularly limited, and carbide tools, CBN tools, ceramic tools, diamond tools, etc. can be used, but diamond tools should be used from the viewpoint of processing accuracy. Is preferred.

  As for the surface roughness after polishing, the center line average roughness Ra in accordance with the provisions of JIS B 0601 is preferably 0.1 μm or less, and more preferably 0.05 μm or less. If the centerline average roughness Ra after polishing is greater than 0.1 μm, the final unevenness of the mold surface may remain affected by the surface roughness after polishing. The lower limit of the center line average roughness Ra is not particularly limited, and is appropriately determined in consideration of processing time, processing cost, and the like.

[3] Photosensitive resin film forming step In the subsequent photosensitive resin film forming step, the photosensitive resin is applied as a solution in which the photosensitive resin is dissolved in a solvent to the surface 8 of the mold substrate 7 that has been mirror-polished by the polishing step described above. Then, a photosensitive resin film is formed by heating and drying. FIG. 6B schematically shows a state where the photosensitive resin film 9 is formed on the surface 8 of the mold base 7.

  A conventionally known photosensitive resin can be used as the photosensitive resin. Examples of the negative photosensitive resin having a property of curing the photosensitive portion include (meth) acrylic acid ester monomers and prepolymers having an acrylic group or a methacrylic group in the molecule, bisazide and diene rubber. Mixtures, polyvinyl cinnamate compounds, and the like can be used. In addition, as a positive photosensitive resin having a property that a photosensitive part is eluted by development and only an unexposed part remains, for example, a phenol resin type or a novolac resin type can be used. Moreover, you may mix | blend various additives, such as a sensitizer, a development accelerator, an adhesiveness modifier, and a coating property improving agent, with a photosensitive resin as needed.

  When applying the photosensitive resin to the surface 8 of the mold substrate 7, it is preferable to dilute and apply the photosensitive resin in an appropriate solvent in order to form a good coating film. As the solvent, cellosolve solvents, propylene glycol solvents, ester solvents, alcohol solvents, ketone solvents, highly polar solvents, and the like can be used.

  As a method for applying the photosensitive resin solution, a known method such as meniscus coating, fountain coating, dip coating, spin coating, roll coating, wire bar coating, air knife coating, blade coating, curtain coating, ring coating or the like is used. be able to. The thickness of the coating film is preferably in the range of 1 to 10 μm after drying.

[4] In the exposure step subsequent exposure step, the graph of the time representing the one-dimensional power spectrum above as strength against spatial frequency, spatial frequency 0.006 ^-1 or 0.012 .mu.m ^-1 or less and 0.07 .mu.m ^-1 or 0.15 [mu] m ^-1 or less in a first maximum value, respectively and the second maximum value, a pattern having a minimum value below the spatial frequency 0.012 .mu.m ^-1 or 0.025 .mu.m ^-1, the above-mentioned photosensitive resin Exposure is performed on the photosensitive resin film 9 formed in the film forming step. The light source used in the exposure process may be appropriately selected according to the photosensitive wavelength and sensitivity of the coated photosensitive resin. For example, the g-line (wavelength: 436 nm) of the high-pressure mercury lamp, the h-line (wavelength: 405 nm) of the high-pressure mercury lamp. ), I line (wavelength: 365 nm) of high pressure mercury lamp, semiconductor laser (wavelength: 830 nm, 532 nm, 488 nm, 405 nm, etc.), YAG laser (wavelength: 1064 nm), KrF excimer laser (wavelength: 248 nm), ArF excimer laser (wavelength) 193 nm), F2 excimer laser (wavelength: 157 nm), or the like.

  In order to accurately form the uneven surface shape of the mold, and hence the uneven surface 2 of the antiglare layer 101, the above-described pattern is exposed on the photosensitive resin film in a precisely controlled manner in the exposure step. It is preferable. Specifically, it is preferable that a pattern is created as image data on a computer, and a pattern based on the image data is drawn by laser light emitted from a computer-controlled laser head. When performing laser drawing, a laser drawing apparatus for making a printing plate can be used. Examples of such a laser drawing apparatus include Laser Stream FX (manufactured by Sink Laboratories).

  FIG. 6C schematically shows a state in which the pattern is exposed to the photosensitive resin film 9. When the photosensitive resin film is formed of a negative photosensitive resin, the exposed region 10 undergoes a crosslinking reaction of the resin by exposure, and the solubility in a developing solution described later decreases. Therefore, the unexposed area 11 in the developing process is dissolved by the developer, and only the exposed area 10 remains on the substrate surface as a mask. On the other hand, in the case where the photosensitive resin film is formed of a positive photosensitive resin, the exposed region 10 is cut by bonding of the resin by exposure, and the solubility in a developer described later increases. Therefore, the area 10 exposed in the development process is dissolved by the developer, and only the unexposed area 11 remains on the substrate surface as a mask.

[5] Development Step In the subsequent development step, when a negative photosensitive resin is used for the photosensitive resin film 9, the unexposed region 11 is dissolved by the developer, and only the exposed region 10 is gold. It remains on the mold substrate and acts as a mask in the subsequent first etching step. On the other hand, when a positive photosensitive resin is used for the photosensitive resin film 9, only the exposed region 10 is dissolved by the developer, and the unexposed region 11 remains on the mold substrate. It acts as a mask in the subsequent first etching step.

  A conventionally well-known thing can be used about the developing solution used for a image development process. For example, inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, aqueous ammonia, primary amines such as ethylamine, n-propylamine, diethylamine, di-n-butylamine, etc. Secondary amines, tertiary amines such as triethylamine, methyldiethylamine, alcohol amines such as dimethylethanolamine, triethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, trimethylhydroxyethylammonium hydroxide, etc. Examples include alkaline aqueous solutions such as quaternary ammonium salts, cyclic amines such as pyrrole and pihelidine, and organic solvents such as xylene and toluene.

  The development method in the development step is not particularly limited, and methods such as immersion development, spray development, brush development, and ultrasonic development can be used.

  FIG. 6D schematically shows a state in which a development process is performed using a negative photosensitive resin for the photosensitive resin film 9. In FIG. 6C, the unexposed region 11 is dissolved by the developer, and only the exposed region 10 becomes the remaining mask 12 on the substrate surface. FIG. 6E schematically shows a state in which a development process is performed using a positive photosensitive resin for the photosensitive resin film 9. In FIG. 6C, the exposed area 10 is dissolved by the developer, and only the unexposed area 11 becomes the remaining mask 12 on the substrate surface.

[6] First Etching Step In the subsequent first etching step, the mold base is mainly used in a portion where there is no mask, using the photosensitive resin film remaining on the mold base surface after the development step as a mask. Etch the plated surface of the material.

  FIG. 7 is a diagram schematically showing a preferred example of the latter half of the method for manufacturing a mold for forming an uneven surface. FIG. 7A schematically shows a state in which the mold base 7 in the region 13 without the mask is mainly etched by the first etching step. The mold base 7 below the mask 12 is not etched from the mold base surface, but the etching from the region 13 without the mask proceeds with the progress of etching. Therefore, in the vicinity of the boundary between the mask 12 and the region 13 without the mask, the mold base 7 below the mask 12 is also etched. In the vicinity of the boundary between the mask 12 and the region 13 without the mask, the die base material 7 under the mask 12 is also etched, which is called side etching.

The etching process in the first etching step is usually performed by using a ferric chloride (FeCl ₃ ) solution, a cupric chloride (CuCl ₂ ) solution, an alkaline etching solution (Cu (NH ₃ ) ₄ Cl ₂ ), etc. Although it is performed by corroding the surface, a strong acid such as hydrochloric acid or sulfuric acid can be used, or reverse electrolytic etching by applying a potential opposite to that at the time of electrolytic plating can also be used. The concave shape formed on the mold base material when the etching process is performed differs depending on the type of the base metal, the type of the photosensitive resin film, the etching technique, and the like. In the following cases, the etching is performed isotropically from the metal surface in contact with the etching solution. The etching amount here is the thickness of the base material to be cut by etching.

  The etching amount in the first etching step is preferably 1 to 50 μm, more preferably 2 to 10 μm. When the etching amount is less than 1 μm, the unevenness shape is hardly formed on the metal surface, and the die is almost flat, so that the antiglare property is not exhibited. Further, when the etching amount exceeds 50 μm, the height difference of the uneven shape formed on the metal surface becomes large, and in the image display device to which the antiglare film produced using the obtained mold is applied. There is a risk of whitening. Whitish is a phenomenon in which the entire display surface becomes whitish due to scattered light, and the display becomes turbid.

  The etching process in the first etching step may be performed by one etching process, or may be performed in two or more times. In the case where the etching process is performed twice or more, the total etching amount in the two or more etching processes is preferably within the above range.

[7] Photosensitive resin film peeling step In the subsequent photosensitive resin film peeling step, the remaining photosensitive resin film used as a mask in the first etching step is dissolved and removed. In this step, the photosensitive resin film is dissolved using a stripping solution. As the stripper, the same developer as that described above can be used. By changing the pH, temperature, concentration, immersion time, etc. of the stripping solution, when using a negative photosensitive resin film, the exposed part, when using a positive photosensitive resin film, non-exposure Part of the photosensitive resin film is dissolved and removed. The specific peeling method is not particularly limited, and methods such as immersion peeling, spray peeling, brush peeling, and ultrasonic peeling can be used.

  FIG. 7B schematically shows a state in which the photosensitive resin film used as a mask in the first etching process is dissolved and removed by the photosensitive resin film peeling process. The first surface irregularities 15 are formed on the surface of the mold substrate by etching using the mask 12 made of a photosensitive resin film.

[8] Second Etching Step In the second etching step, the first surface uneven shape 15 formed by the first etching step using the photosensitive resin film as a mask is blunted by an etching process. By this second etching treatment, there is no portion with a steep surface inclination in the first surface irregularity shape 15 formed by the first etching treatment, and the optical characteristics of the antiglare film produced using the obtained mold Changes in the preferred direction. In FIG. 7C, the second etching process causes the first surface irregularity shape 15 of the mold base 7 to be blunted, a portion having a steep surface slope is blunted, and a second surface having a gentle surface slope. The state in which the surface irregularities 16 are formed is shown.

Similarly to the first etching process, the etching process of the second etching process is usually ferric chloride (FeCl ₃ ) liquid, cupric chloride (CuCl ₂ ) liquid, alkaline etching liquid (Cu (NH ₃ ) ₄ Cl ₂ ) or the like, and by corroding the surface, a strong acid such as hydrochloric acid or sulfuric acid can be used, or reverse electrolytic etching by applying a potential opposite to that during electrolytic plating can also be used. The bluntness of the unevenness after the etching process varies depending on the type of the underlying metal, the etching technique, the size and depth of the unevenness obtained by the first etching process, etc. The largest factor in controlling the amount is the etching amount. The etching amount here is also the thickness of the base material to be cut by etching, as in the first etching step. If the etching amount is small, the effect of dulling the surface shape of the unevenness obtained by the first etching process is insufficient, and the optical properties of the antiglare film obtained by transferring the uneven shape to a transparent film are not so good. Don't be. On the other hand, when the etching amount is too large, the uneven shape is almost lost and the die is almost flat, so that the antiglare property is not exhibited. Therefore, the etching amount is preferably in the range of 1 to 50 μm, and more preferably in the range of 4 to 20 μm.

  Similarly to the first etching process, the etching process in the second etching process may be performed by one etching process, or may be performed in two or more times. In the case where the etching process is performed twice or more, the total etching amount in the two or more etching processes is preferably within the above range.

[9] Second plating step Subsequently, by performing chromium plating, the second surface irregularity shape 16 is blunted and the mold surface is protected. In FIG. 7D, as described above, the chromium plating layer 17 is formed on the second surface irregularities 16 formed by the etching process of the second etching step, and the surface 18 of the chromium plating layer is blunted. It is shown.

As the chrome plating, it is preferable to employ a chrome plating that has a glossy surface, a high hardness, a low friction coefficient, and good release properties on the surface of a flat plate or a roll. The chrome plating is not particularly limited, but it is preferable to use chrome plating that expresses good gloss, so-called gloss chrome plating, decorative chrome plating, or the like. Chromium plating is usually performed by electrolysis, and an aqueous solution containing chromic anhydride (CrO ₃ ) and a small amount of sulfuric acid is used as the plating bath. By adjusting the current density and electrolysis time, the thickness of the chromium plating can be controlled.

  In the second plating step, it is not preferable to perform plating other than chromium plating. This is because plating other than chromium has low hardness and wear resistance, so that the durability as a mold is lowered, and unevenness is worn away during use or the mold is damaged. In an antiglare film produced using such a mold, there is a high possibility that a sufficient antiglare function will not be obtained, and there is a high possibility that defects will occur on the antiglare film.

  Thus, it is preferable to use the surface which gave chrome plating as an uneven surface of a metal mold | die. By applying chrome plating to the surface on which the fine surface irregularities are formed, a mold having an irregular shape blunted and an increased surface hardness can be obtained. The bluntness of the irregularities at this time varies depending on the type of the underlying metal, the size and depth of the irregularities obtained from the first etching process, the type and thickness of the plating, and so on. The greatest factor in controlling is the plating thickness. If the thickness of the chrome plating is thin, the effect of dulling the surface shape of the unevenness obtained before the chrome plating process is insufficient, and the optical properties of the antiglare film obtained by transferring the uneven shape are not so good. . On the other hand, when the plating thickness is too thick, productivity is deteriorated and a protruding plating defect called a nodule is generated. Therefore, the thickness of the chrome plating is preferably in the range of 1 to 10 μm, and more preferably in the range of 3 to 6 μm.

  The chromium plating layer formed in the second plating step is preferably formed so as to have a Vickers hardness of 800 or more, and more preferably 1000 or more. When the Vickers hardness of the chromium plating layer is less than 800, the durability when using the mold is lowered, and the hardness is reduced by the chromium plating. This is because the possibility of occurrence is high, and the possibility of undesirably affecting the occurrence of defects is also high.

<Anti-glare polarizing plate>
With reference to FIG. 1, the antiglare polarizing plate according to the present invention includes an antiglare film 1 and a polarizing film 104. The polarizing film 104 is disposed on the transparent support 102 side of the antiglare film 1. In the example shown in FIG. 1, the polarizing film 104 is laminated on the surface of the transparent support 102 opposite to the antiglare layer 101 via the first adhesive layer 103a. The anti-glare polarizing plate according to the present invention is laminated on the surface of the polarizing film 104 opposite to the anti-glare film 1 via the second adhesive layer 103b as in the example shown in FIG. The transparent resin layer 105 can be further provided.

(1) Polarizing film As the polarizing film 104, a film in which a dichroic dye is adsorbed and oriented on a uniaxially stretched polyvinyl alcohol-based resin film is preferably used. The polyvinyl alcohol resin constituting the polarizing film 104 can be obtained by saponifying a polyvinyl acetate resin. Examples of the polyvinyl acetate resin include polyvinyl acetate, which is a homopolymer of vinyl acetate, as well as copolymers of vinyl acetate and other monomers copolymerizable therewith. Examples of other monomers copolymerized with vinyl acetate include unsaturated carboxylic acids, olefins, vinyl ethers, and unsaturated sulfonic acids. The degree of saponification of the polyvinyl alcohol resin is usually 85 to 100 mol%, preferably 98 to 100 mol%. This polyvinyl alcohol-based resin may be further modified, and for example, polyvinyl formal and polyvinyl acetal modified with aldehydes may be used. The degree of polymerization of the polyvinyl alcohol-based resin is usually 1000 to 10,000, preferably 1500 to 10,000.

  The polarizing film 104 is a step of uniaxially stretching such a polyvinyl alcohol resin film, a step of dyeing the polyvinyl alcohol resin film with a dichroic dye, and adsorbing the dichroic dye, and a dichroic dye adsorbing The polyvinyl alcohol-based resin film thus obtained can be manufactured through a step of treating with a boric acid aqueous solution and a step of washing with water after the treatment with the boric acid aqueous solution.

  Uniaxial stretching may be performed before dyeing with a dichroic dye, may be performed simultaneously with dyeing with a dichroic dye, or may be performed after dyeing with a dichroic dye. When uniaxial stretching is performed after dyeing with a dichroic dye, this uniaxial stretching may be performed before boric acid treatment or during boric acid treatment. Of course, it is also possible to perform uniaxial stretching in these plural stages. For uniaxial stretching, rolls having different peripheral speeds may be uniaxially stretched or uniaxially stretched using a hot roll. Moreover, the dry-type extending | stretching which extends | stretches in air | atmosphere may be sufficient, and the wet extending | stretching which extends | stretches in the state swollen with the solvent may be sufficient. The draw ratio is usually about 4 to 8 times.

  In order to dye the polyvinyl alcohol resin film with the dichroic dye, for example, the polyvinyl alcohol resin film may be immersed in an aqueous solution containing the dichroic dye. Specifically, iodine or a dichroic dye is used as the dichroic dye.

  When iodine is used as the dichroic dye, a method of dyeing a polyvinyl alcohol-based resin film in an aqueous solution containing iodine and potassium iodide is usually employed. The content of iodine in this aqueous solution is usually about 0.01 to 0.5 parts by weight per 100 parts by weight of water, and the content of potassium iodide is usually about 0.5 to 10 parts by weight per 100 parts by weight of water. It is. The temperature of this aqueous solution is usually about 20 to 40 ° C., and the immersion time in this aqueous solution is usually about 30 to 300 seconds.

  On the other hand, when a dichroic dye is used as the dichroic dye, a method of immersing and dyeing a polyvinyl alcohol-based resin film in an aqueous solution containing a water-soluble dichroic dye is usually employed. The content of the dichroic dye in this aqueous solution is usually about 0.001 to 0.01 parts by weight per 100 parts by weight of water. This aqueous solution may contain an inorganic salt such as sodium sulfate. The temperature of this aqueous solution is usually about 20 to 80 ° C., and the immersion time in this aqueous solution is usually about 30 to 300 seconds.

  The boric acid treatment after dyeing with a dichroic dye is performed by immersing the dyed polyvinyl alcohol resin film in an aqueous boric acid solution. The boric acid content in the boric acid aqueous solution is usually about 2 to 15 parts by weight, preferably about 5 to 12 parts by weight per 100 parts by weight of water. When iodine is used as the dichroic dye, the boric acid aqueous solution preferably contains potassium iodide. The content of potassium iodide in the boric acid aqueous solution is usually about 2 to 20 parts by weight, preferably 5 to 15 parts by weight per 100 parts by weight of water. The immersion time in the boric acid aqueous solution is usually about 100 to 1200 seconds, preferably about 150 to 600 seconds, and more preferably about 200 to 400 seconds. The temperature of the boric acid aqueous solution is usually 50 ° C. or higher, preferably 50 to 85 ° C.

  The polyvinyl alcohol resin film after the boric acid treatment is usually washed with water. The water washing treatment is performed, for example, by immersing a boric acid-treated polyvinyl alcohol resin film in water. After washing with water, a drying process is performed to obtain the polarizing film 104. The temperature of water in the water washing treatment is usually about 5 to 40 ° C., and the immersion time is usually about 2 to 120 seconds. The drying process performed after that can be performed using a hot air dryer or a far-infrared heater. The drying temperature is usually 40 to 100 ° C. The processing time in the drying process is usually about 120 to 600 seconds.

  In this way, a polarizing film 104 made of a polyvinyl alcohol-based resin film on which iodine or a dichroic dye is adsorbed and oriented is obtained. The thickness of the polarizing film 104 is preferably in the range of 5 to 100 μm, and more preferably in the range of 5 to 30 μm. When the thickness of the polarizing film 104 is less than 5 μm, sufficient optical characteristics may not be exhibited, and the mechanical strength may be insufficient. On the other hand, when the thickness of the polarizing film 104 exceeds 100 μm, the antiglare polarizing plate becomes thick, and as a result, glare may occur.

(2) Transparent resin layer The transparent resin layer 105 can be a protective film that protects the surface of the polarizing film 104. The protective film may be an optical compensation film. Specific examples of the protective film include triacetyl cellulose film, amorphous polyolefin resin film, polyester resin film, acrylic resin film, polycarbonate resin film, polysulfone resin film, and alicyclic polyimide resin film. Can be mentioned. In these, the film which consists of a triacetyl cellulose or an amorphous polyolefin-type resin is used preferably.

  The amorphous polyolefin-based resin usually has a cyclic olefin polymerization unit such as norbornene or a polycyclic norbornene-based monomer, and may be a copolymer of a cyclic olefin and a chain olefin. Among them, a thermoplastic saturated norbornene resin is representative. Those having a polar group introduced are also effective. As commercially available amorphous polyolefin resins, Arton (manufactured by JSR Corporation), Zeonore (manufactured by ZEON Corporation), ZEONEX (manufactured by ZEON Corporation), APO (manufactured by Mitsui Chemicals, Inc.) And Apel (manufactured by Mitsui Chemicals, Inc.). When such a commercially available amorphous polyolefin resin is used, the amorphous polyolefin resin can be formed into a film by a known method such as a solvent casting method or a melt extrusion method.

  The transparent resin layer 105 can be an optical compensation layer (or an optical compensation film, the same applies hereinafter). The transparent resin layer 105 may be a laminate of a protective film and an optical compensation layer. The optical compensation layer is for the purpose of compensation of retardation, etc., and is a birefringent film made of a stretched film of transparent resin, etc .; a film in which a discotic liquid crystal or nematic liquid crystal is aligned and fixed; What was formed is mentioned. The optical compensation layer laminated on the polarizing film 104 may be a single layer or a plurality of layers. When providing a plurality of optical compensation layers, the same type of optical compensation layer may be laminated, or different types of optical compensation layers may be laminated. For example, a birefringent film made of another transparent resin stretched film may be laminated on a birefringent film made of a stretched transparent resin film via an adhesive layer, or made of a stretched transparent resin film. A discotic liquid crystal or a nematic liquid crystal may be aligned and fixed on the birefringent film.

  Examples of the transparent resin constituting the birefringent film include polycarbonate, polyvinyl alcohol, polystyrene, polymethyl methacrylate, polyolefins such as polypropylene, polyarylate, polyamide, amorphous polyolefin resin, and the like. The stretched film may be processed by an appropriate method such as uniaxial or biaxial. Moreover, the birefringent film which controlled the refractive index of the thickness direction of a film by applying a shrinkage force and / or extending | stretching force in the state which bonded the heat-shrinkable film to the film which consists of the said transparent resin is used as an optical compensation film. You can also.

  Bonding of the optical compensation layer may be performed by using an adhesive described later, or an adhesive (also referred to as a pressure sensitive adhesive) described later from the viewpoint of simplicity of bonding work and prevention of optical distortion. May be used.

  For example, when an antiglare polarizing plate is applied to a liquid crystal display device, the optical compensation layer is appropriately selected according to each driving mode of the liquid crystal cell. Examples of the driving mode of the liquid crystal include a vertical alignment (VA) mode, a lateral electric field (In-Plane Switching: IPS) mode, and a twisted nematic (TN) mode.

If it is a liquid crystal cell of the vertical alignment mode, a film made of a transparent resin having positive refractive index anisotropy such as a cellulose resin represented by acylated cellulose such as triacetyl cellulose, a cyclic olefin resin, or polycarbonate is used. a film having a uniaxially or biaxially stretched relationship n _x> n _y ≧ n _z can be used as an optical compensation layer. Here n _x plane slow axis direction of the refractive index of the film, n _y is the plane fast axis direction of the refractive index of the film, n _z represents the refractive index in the thickness direction of the film. Among these transparent resins, triacetyl cellulose and cyclic olefin-based resins are preferably used because they have a small photoelastic coefficient and less occurrence of in-plane characteristic unevenness due to thermal strain under use conditions. Also, films with discotic liquid crystal coated on the substrate, films with cholesteric liquid crystal coated on the substrate at a short pitch, films with inorganic layered compound layers such as mica formed on the substrate, sequential or simultaneous biaxial stretching of resin film, it is also possible to use an optical compensation layer having a relationship of n _x ≒ n _y> n _z the solvent casting films of unstretched.

  In addition, a TN mode liquid crystal cell is an organic compound, particularly a compound having a liquid crystallinity and having a disk-like molecular structure or a liquid crystal cell, but exhibiting negative refractive index anisotropy by an electric field or a magnetic field. Is preferably used as the optical compensation layer, such as a film in which the compound is coated on a transparent resin film made of triacetylcellulose and the like, and oriented so that the optical axis is inclined at 5 to 50 ° from the film normal direction. It is done. The orientation may be not only one direction but also, for example, a so-called hybrid orientation in which the inclination gradually increases from one side of the film to the other side. Examples of the organic compound having a discotic molecular structure exhibiting liquid crystallinity include a low molecular or high molecular discotic liquid crystal, for example, a host nucleus having a planar structure such as triphenylene, torquesen, benzene, an alkyl group, an alkoxy group, an alkyl group. Examples include those in which linear substituents such as a substituted benzoyloxy group and an alkoxy-substituted benzoyloxy group are radially bonded. Among them, those that do not absorb in the visible light region are preferable. These organic compounds having a disc-like molecular structure are not only used alone, but also used in combination of two or more as required to obtain the required orientation, or a polymer matrix, etc. It can be used by mixing with other organic compounds. The organic compound used as a mixture is compatible with an organic compound having a discotic molecular structure or can disperse an organic compound having a discotic molecular structure in a particle size that does not scatter light. If it does not specifically limit. For example, a WV film (Fuji Photo Film Co., Ltd.) may be used as a film in which a layer made of a liquid crystal compound is provided on a transparent substrate film made of a cellulose resin and the optical axis is inclined with respect to the film normal. Can be suitably used. In addition, organic compounds having an elongated rod-like structure, especially those having a nematic liquid crystallinity and a molecular structure that gives positive optical anisotropy, and those that do not exhibit liquid crystallinity, but have positive refractive index anisotropy due to electric or magnetic fields. Also preferably used is a film obtained by orienting a compound that expresses a film on a transparent substrate film made of a cellulose-based resin and the like so that the optical axis is inclined at 5 to 50 ° from the film normal direction. It is done. This orientation may be not only one direction but also, for example, a so-called hybrid orientation in which the inclination gradually increases from one side of the film to the other side. As a film in which a layer made of a nematic liquid crystal compound is provided on a transparent substrate film and the optical axis is inclined with respect to the film normal, for example, an NH film (manufactured by Nippon Oil Corporation) is preferably used. Can do.

  The thickness of the transparent resin layer 105 is usually in the range of about 5 to 200 μm, preferably 10 to 120 μm, and more preferably 10 to 85 μm.

(3) Adhesive layer The antiglare film 1 can be laminated on one surface of the polarizing film 104 via the first adhesive layer 103a. When the transparent resin layer 105 is laminated, the transparent resin layer 105 can be laminated on the other surface of the polarizing film 104 via the second adhesive layer 103b.

  A conventionally well-known thing can be used as an adhesive agent which forms the 1st adhesive bond layer 103a and the 2nd adhesive bond layer 103b. For example, water-soluble adhesives using polyvinyl alcohol resins, adhesives using cationic polymerization of epoxy resins, adhesives using radical polymerization of acrylic resins, and cationic polymerization using a mixture of epoxy resins and acrylic resins An adhesive or the like utilizing radical polymerization can be used. The thickness of the adhesive varies depending on the type of adhesive and cannot be generally specified, but is preferably in the range of 0.1 μm to 5 μm. If the thickness of the adhesive layer is less than 0.1 μm, sufficient adhesive strength may not be obtained. On the other hand, when the thickness of the adhesive layer exceeds 5 μm, the antiglare polarizing plate becomes thick, and as a result, glare may occur.

  The anti-glare film 1 and the transparent resin layer 105 are subjected to easy adhesion treatment such as saponification treatment, corona treatment, primer treatment, anchor coating treatment on the bonding surface prior to bonding to the polarizing film 104. Also good.

(4) Adhesive layer The anti-glare polarizing plate which concerns on this invention may have the adhesive layer for bonding this to an image display element. As the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer, a pressure-sensitive adhesive composition having an acrylic polymer, a silicone-based polymer, polyester, polyurethane, polyether or the like as a base polymer can be used. Above all, like acrylic pressure-sensitive adhesives, it has excellent optical transparency, retains appropriate wettability and cohesion, has excellent adhesion to substrates, and has weather resistance, heat resistance, etc. It is preferable to select and use a material that does not cause peeling problems such as floating and peeling under the conditions of heating and humidification. As the base polymer of the acrylic pressure-sensitive adhesive, alkyl esters of (meth) acrylic acid having an alkyl group having 20 or less carbon atoms such as methyl group, ethyl group, butyl group, (meth) acrylic acid and (meth) acrylic An acrylic copolymer with a functional group-containing acrylic monomer such as hydroxyethyl acid, having a glass transition temperature of 25 ° C. or lower (preferably 0 ° C. or lower) and a weight average molecular weight of 100,000 or higher. Is preferably used.

  For example, the pressure-sensitive adhesive layer is formed on the anti-glare polarizing plate by dissolving or dispersing the pressure-sensitive adhesive composition in an organic solvent such as toluene or ethyl acetate to prepare a 10 to 40% by weight solution. Directly on the polarizing plate (transparent resin layer 105) to form a pressure-sensitive adhesive layer, or to form a pressure-sensitive adhesive layer on a protective film in advance and transfer it onto the anti-glare polarizing plate By doing so, it can be performed by a method of forming an adhesive layer. Although the thickness of an adhesive layer is determined according to the adhesive force etc., the range of about 1-25 micrometers is suitable.

<Image display device>
The present invention further provides an image display device comprising the antiglare film 1 or the antiglare polarizing plate according to the present invention described above and an image display element. The image display device is not particularly limited as long as it includes an image display element having a color filter, and examples thereof include a liquid crystal display device, an organic electroluminescence (EL) display device, and a plasma display panel. When the image display device is a liquid crystal display device, the image display element is a liquid crystal cell in which liquid crystal is sealed between upper and lower substrates, and an image is displayed by changing the alignment state of the liquid crystal by applying a voltage.

  In the image display device according to the present invention, the anti-glare film 1 or the anti-glare polarizing plate has an image display element on the transparent support 102 side or the polarizing film 104 side of the anti-glare polarizing plate with reference to FIG. The image display element (more specifically, the substrate 300 such as a glass substrate constituting the image display element) on the viewing side (opposite side to the color filter 400) with the antiglare layer 101 side facing outside. Placed in. That is, the antiglare film 1 or the antiglare polarizing plate according to the present invention is suitably used as a front side polarizing plate, and the uneven surface 2 of the antiglare film 1, that is, the antiglare layer 101 is outside. It arrange | positions at the visual recognition side of an image display element so that it may become (visual recognition side). Bonding between the antiglare polarizing plate and the image display element can be performed using the pressure-sensitive adhesive layer 200.

  In the image display device, the uneven surface 2 of the antiglare layer 101 may be in contact with the air layer or in contact with another layer. For example, the image display device can further include a translucent member disposed on the outer surface (viewing side) of the antiglare layer 101. In this case, the translucent member includes an adhesive layer or a resin layer. It may be pasted on the anti-glare layer 101 via, and may be arrange | positioned at the visual recognition side of the anti-glare layer 101 via an air layer. The translucent member can be, for example, a glass plate or the like, or can be a touch panel input element.

  The distance L between the uneven surface and the color filter is less than 1 mm, preferably less than 0.75 mm. Thereby, even if the anti-glare film 1 is a low haze, glare can be suppressed effectively, showing favorable anti-glare property. Further, from the viewpoint of the strength of the image display device, the distance L is preferably 100 μm or more.

  EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to these examples. In the following examples, the physical property measurement or evaluation for the antiglare film and the antiglare polarizing plate was performed as follows.

[1] Measurement of surface shape of antiglare film (Measurement of surface elevation)
The elevation of the surface of the antiglare film was measured using a three-dimensional microscope PLμ2300 (manufactured by Sensofar). In order to prevent the sample from warping, it was used for measurement after being bonded to a glass substrate using an optically transparent adhesive so that the concavo-convex surface was on the outside. At the time of measurement, the magnification of the objective lens was 10 times. The horizontal resolutions Δx and Δy were both 1.66 μm and the measurement area was 1270 μm × 950 μm.

(Power spectrum of elevation on uneven surface)
The data of 512 × 512 (measured area: 850 μm × 850 μm) is sampled from the center of the measurement data obtained above, and the elevation of the uneven surface of the antiglare film is defined as a two-dimensional function h (x, y). Asked. Two-dimensional function h (x, y) of the discrete Fourier transform to two-dimensional function H (f _x, f _y) was determined. Two-dimensional function H (f _x, f _y) a two-dimensional function ^{_{H 2 (f x, f y}} ) of the two-dimensional power spectrum by squaring calculates a is a function of the distance f from the origin of the one-dimensional power spectrum A one-dimensional function H ² (f) was calculated. The elevation of the surface of the five positions for each sample was measured, the one-dimensional power spectrum is calculated from these data one-dimensional function H ² dimensional function of the average value of (f) one-dimensional power spectrum of each sample H ² (F). Further, log H ² (f) is calculated by taking the average of common logarithms of the one-dimensional function H ² (f) of the one-dimensional power spectrum obtained from the elevation of the surface at the five locations, and based on the above formula (6). The second derivative d ² logH ² (f) / df ² at the spatial frequencies f = 0.01 μm ⁻¹ and 0.02 μm ⁻¹ was determined.

[2] Measurement of haze of antiglare film The haze of an antiglare film is obtained by sticking an antiglare film to a glass substrate on the surface opposite to the surface on which the antiglare layer is formed using an optically transparent adhesive. For the anti-glare film bonded to the glass substrate, light is incident from the glass substrate side, and a haze meter “HM-150” type manufactured by Murakami Color Research Laboratory in accordance with JIS K 7136 is used. It measured using.

[3] Evaluation of visibility of anti-glare polarizing plate A liquid crystal display device produced by sticking an anti-glare polarizing plate to the front surface (viewing side) is set to a black display state in a bright room, and the reflection state and white The damage was visually observed. Next, the white display state was set in the bright room, and the glare was also visually observed. The evaluation criteria for the reflection state, whiteness, and glare are as follows.

(Reflection)
1: Reflection is not observed.
2: Reflection is slightly observed.
3: Reflection is clearly observed.

(White)
1: No whitishness is observed.
2: A little whitish is observed.
3: The whitish is clearly observed.

(Glitter)
1: No glare is observed.
2: Very slight glare is observed.
3: Severe glare is observed.

<Example 1>
(A) Production of Polarizing Film A polyvinyl alcohol film having a thickness of 75 μm, a polymerization degree of 2400, and a saponification degree of 99.9% or more is uniaxially stretched at a draw ratio of 5 times in a dry manner, and 100 parts by weight of water is kept in a tension state. The sample was immersed in an aqueous solution containing 0.05 parts by weight of iodine and 5 parts by weight of potassium iodide at a temperature of 28 ° C. for 60 seconds. Next, while maintaining the tension state, it was immersed in a boric acid aqueous solution containing 7.5 parts by weight of boric acid and 6 parts by weight of potassium iodide per 100 parts by weight of water at a temperature of 73 ° C. for 300 seconds. Then, it wash | cleaned for 10 second with 15 degreeC pure water. The film washed with water was dried at 70 ° C. for 300 seconds while keeping the tensioned state to obtain a polarizing film.

(B) Production of mold for forming fine unevenness A surface of an aluminum roll (A5056 according to JIS) having a diameter of 200 mm was subjected to copper ballad plating. Copper ballad plating consists of a copper plating layer / thin silver plating layer / surface copper plating layer, and the thickness of the entire plating layer was set to be about 200 μm. The copper plating surface was mirror-polished, and a photosensitive resin was applied to the polished copper plating surface and dried to form a photosensitive resin film. Next, a pattern obtained by repeatedly arranging the pattern [exposure pattern A] shown in FIG. 8 (created by passing a bandpass filter that removes a component in a specific spatial frequency range from a pattern having a random brightness distribution) is photosensitive. The resin film was exposed to a laser beam and developed. Laser beam exposure and development were performed using Laser Stream FX (manufactured by Sink Laboratories). A positive photosensitive resin was used for the photosensitive resin film.

  Then, the 1st etching process was performed with the cupric chloride liquid. The etching amount at that time was set to 4 μm. The photosensitive resin film was removed from the roll after the first etching treatment, and the second etching treatment was performed again with cupric chloride solution. The etching amount at that time was set to 13 μm. Then, the metal plating A was produced and the metal mold | die A was produced. At this time, the chromium plating thickness was set to 4 μm.

  FIG. 8 is a view showing a part (1 mm × 1 mm) of the image data of the exposure pattern A used in this embodiment. The image data of the exposure pattern A shown in FIG. 8 has a size of 33 mm × 33 mm and was created at 12800 dpi. The same applies to FIGS.

(C) Formation of antiglare film The following components were dissolved in ethyl acetate at a solid concentration of 60% by weight, and an ultraviolet curable resin composition A having a refractive index of 1.53 after curing was obtained.

Pentaerythritol triacrylate 60 parts by weight Polyfunctional urethanized acrylate (reaction product of hexamethylene diisocyanate and pentaerythritol triacrylate) 40 parts by weight Diphenyl (2,4,6-trimethoxybenzoyl) phosphine oxide 5 parts by weight.

This ultraviolet curable resin composition A was applied onto a 60 μm thick triacetyl cellulose (TAC) film so that the coating thickness after drying was 4 μm, and was dried in a dryer set at 60 ° C. for 3 minutes. . The film after drying was brought into close contact with the concavo-convex surface of the mold A obtained previously with a rubber roll so that the photocurable resin composition layer was on the mold side. In this state, light from a high-pressure mercury lamp having an intensity of 20 mW / cm ² was irradiated from the TAC film side so that the amount of light in terms of h-line was 200 mJ / cm ² to cure the photocurable resin composition layer. Thereafter, the TAC film was peeled from the mold together with the cured resin, and a transparent antiglare film A composed of a laminate of the cured resin having irregularities on the surface and the TAC film was produced.

(D) Preparation of anti-glare polarizing plate For 100 parts by weight of water, 1.8 parts by weight of carboxyl group-modified polyvinyl alcohol “Kuraray Poval KL318” (modified degree 2 mol%) sold by Kuraray Co., Ltd. Dissolve, and then add 1.5 parts by weight of “Smileze Resin 650” (aqueous solution with a solid content of 30% by weight) sold by Taoka Chemical Industry Co., Ltd., which is a water-soluble polyamide epoxy resin. A polyvinyl alcohol-based adhesive was prepared.

After the saponification treatment was performed on the side opposite to the side on which the antiglare layer of the antiglare film A was formed, the polyvinyl alcohol-based adhesive prepared as described above was applied with a 10 μm bar coater, and obtained on that. The obtained polarizing film was bonded. In addition, a transparent protective film (made by Konica Minolta Opto Co., Ltd.) made of triacetyl cellulose having a thickness of 40 μm subjected to saponification treatment is provided on the surface opposite to the surface on which the antiglare film A of the polarizing film is bonded. KC4UE, in-plane retardation value R ₀ = 0.7 nm, thickness direction retardation value R _th = −0.1 nm), and the polyvinyl alcohol adhesive prepared above was applied with a 10 μm bar coater and then bonded. . Thereafter, it was dried at 80 ° C. for 5 minutes, and further cured at room temperature for 1 day. Thereafter, an adhesive layer is formed by transferring an acrylic adhesive layer formed on the protective film to the side opposite to the side where the anti-glare film A is bonded to the polarizing film, thereby providing anti-glare properties. A polarizing plate A was obtained.

(E) Production of liquid crystal display device The polarizing plate is peeled off from the front surface (viewing side) of a liquid crystal cell of a commercially available notebook computer (ZENBOOK UX21A, ASUS, 11.6 type, FHD) equipped with an IPS mode liquid crystal cell. Then, the antiglare polarizing plate A was bonded to the front surface of the liquid crystal cell so that the absorption axis thereof coincided with the absorption axis direction of the polarizing plate originally bonded to the liquid crystal cell, thereby preparing a liquid crystal panel. Next, the liquid crystal panel was returned to its original position, and a liquid crystal display device A was produced. The distance L between the uneven surface and the color filter was 521 μm.

<Example 2>
A mold B was fabricated in the same manner as in Example 1 except that the first etching amount at the time of mold fabrication was 5 μm and the second etching amount was 13 μm. Further, an antiglare film B, an antiglare polarizing plate B, and a liquid crystal display device B were produced in the same manner as in Example 1 except that the mold B was used. The distance L between the uneven surface and the color filter was 523 μm.

<Example 3>
A mold C was produced in the same manner as in Example 1 except that the pattern [exposure pattern C] shown in FIG. 9 was used at the time of mold production and the first etching amount was 4.5 μm. An antiglare film C, an antiglare polarizing plate C, and a liquid crystal display device C were produced in the same manner as in Example 1 except that the mold C was used. The distance L between the uneven surface and the color filter was 520 μm.

<Example 4>
A mold D was fabricated in the same manner as in Example 1 except that the pattern [exposure pattern D] shown in FIG. 10 was used at the time of mold fabrication, and the first etching amount was 4.5 μm. An antiglare film D, an antiglare polarizing plate D, and a liquid crystal display device D were produced in the same manner as in Example 1 except that the mold D was used. The distance L between the uneven surface and the color filter was 521 μm.

<Example 5>
A mold E was fabricated in the same manner as in Example 1 except that the first etching amount at the time of mold fabrication was 4 μm and the second etching amount was 12 μm. Further, an antiglare film E, an antiglare polarizing plate E, and a liquid crystal display device E were produced in the same manner as in Example 1 except that the mold E was used. The distance L between the uneven surface and the color filter was 520 μm.

<Example 6>
In order to increase the distance L between the uneven surface and the color filter by peeling the polarizing plate from the front surface of the liquid crystal cell of the notebook personal computer (ZENBOOK UX21A, manufactured by ASUS), the acrylic pressure-sensitive adhesive layer and the transparent protective film are formed on the front surface of the liquid crystal cell. (Konica Minolta Opto Co., Ltd. KC4UE) are alternately stacked in six layers, and the antiglare polarizing plate A is laminated on the absorption axis of the polarizing plate whose absorption axis was originally bonded to the liquid crystal cell. A liquid crystal panel was manufactured by bonding them so as to match the direction. Next, this liquid crystal panel was returned to its original position, and a liquid crystal display device G was produced. The distance L between the uneven surface and the color filter was 708 μm.

<Comparative Example 1>
A mold H was fabricated in the same manner as in Example 1 except that the pattern [exposure pattern H] shown in FIG. 11 was used at the time of mold fabrication, and the second etching amount was 12 μm. An antiglare film H, an antiglare polarizing plate H, and a liquid crystal display device H were produced in the same manner as in Example 1 except that the mold H was used. The distance L between the uneven surface and the color filter was 521 μm.

<Comparative example 2>
Mold I was produced in the same manner as in Example 1 except that the pattern [exposure pattern I] shown in FIG. 12 was used at the time of mold production, and the second etching amount was 12 μm. An antiglare film I, an antiglare polarizing plate I and a liquid crystal display device I were produced in the same manner as in Example 1 except that the mold I was used. The distance L between the uneven surface and the color filter was 522 μm.

<Comparative Example 3>
A mold J was produced in the same manner as in Example 1 except that the pattern [exposure pattern J] shown in FIG. 13 was used at the time of mold production and the second etching amount was 12 μm. An antiglare film J, an antiglare polarizing plate J, and a liquid crystal display device J were produced in the same manner as in Example 1 except that the mold J was used. The distance L between the uneven surface and the color filter was 520 μm.

<Comparative example 4>
14 was used in the same manner as in Example 1 except that the pattern [exposure pattern K] shown in FIG. 14 was used at the time of mold fabrication, the first etching amount was 3 μm, and the second etching amount was 10 μm. Produced. An antiglare film K, an antiglare polarizing plate K, and a liquid crystal display device K were produced in the same manner as in Example 1 except that the mold K was used. The distance L between the uneven surface and the color filter was 524 μm.

FIG. 15 shows a power spectrum G ² (f) obtained by discrete Fourier transform of the image data of the exposure patterns A, C, and D used for the production of the antiglare films A to E. In addition, FIG. 16 shows a power spectrum G ² (f) obtained by performing a discrete Fourier transform on the image data of the exposure patterns H, I, J, and K used for the production of the antiglare films H to K.

From FIG. 15, the graph when the one-dimensional power spectra of the exposure patterns A, C, and D used for the production of the antiglare films A to E are expressed as the intensity with respect to the spatial frequency is a spatial frequency of 0.006 μm ⁻¹ or more and 0. .012Myuemu ^-1 have the following and 0.07μm first maximum value respectively ^-1 to 0.15 [mu] m ^-1 or less and a second maximum value, the spatial frequency 0.012 .mu.m ^-1 0.025 .mu.m ^-1 below It can be seen that it has a local minimum. On the other hand, from FIG. 16, the one-dimensional power spectra of the exposure patterns H to I used for the production of the antiglare films H to I have the first and second maximum values and minimum values in the above-described range. In the exposure pattern H used for the production of the antiglare film H, the first maximum value is small and the minimum value is large compared to the exposure patterns A, C, and D. Moreover, in the exposure pattern I used for preparation of the anti-glare film I, the first maximum value is smaller than the exposure patterns A, C, and D. In the one-dimensional power spectrum of the exposure pattern J used for the production of the antiglare film J, the first maximum value is remarkably small, and the second maximum value is outside the above-mentioned range. In the one-dimensional power spectrum of the exposure pattern K used to produce the anti-glare film K, the minimum value is larger than the exposure patterns A, C, and D, and the second maximum value is outside the above-mentioned range. is doing. .

Table 1 shows the results of physical property measurements and evaluations of the antiglare films and the antiglare polarizing plates obtained in Examples and Comparative Examples. In addition, in FIGS. 17, 18, and 19, the one-dimensional power spectrum H ² (f) calculated from the elevations of the antiglare films A to C, the antiglare films D and E, and the antiglare films H to K, respectively. )showed that.

Although the anti-glare films A to E (Examples 1 to 6) satisfying the requirements of the present invention had low haze, they exhibited sufficient anti-glare properties and no whitening occurred. Among them, the antiglare films AD having a power spectrum of 2 μm ² or more at a spatial frequency of 0.01 μm ⁻¹ on the uneven surface showed excellent antiglare properties. Further, the anti-glare films A to E effectively suppressed glare even when applied to a high-definition liquid crystal panel having an uneven surface-color filter distance L of less than 1 mm.

On the other hand, the antiglare film H (Comparative Example 1) and the antiglare film K (Comparative Example 4) have an excellent antiglare property because the power spectrum at a spatial frequency of 0.01 μm ⁻¹ of the uneven surface is 2 μm ² or more. However, since the power spectrum at a spatial frequency of 0.033 μm ⁻¹ exceeds 0.05 μm ² , glare was strongly observed. The antiglare film I (Comparative Example 2) showed an excellent glare suppression effect because the power spectrum at the spatial frequency of 0.033 μm ⁻¹ on the uneven surface was 0.05 μm ² or less, but the spatial frequency was 0.01 μm ^{−. Since} the power spectrum at 1 was less than 1 μm ² , the antiglare property was insufficient. In the antiglare film J (Comparative Example 3), the power spectrum at a spatial frequency of 0.01 μm ⁻¹ on the uneven surface is not 1 μm ² or higher, and the power spectrum at a spatial frequency of 0.033 μm ⁻¹ is not 0.05 μm ² or lower. Therefore, both the antiglare property and the glare suppression were insufficient.

In Examples 1 and 6, the same antiglare film A is used, but the uneven surface-color filter distance L is different. Since the anti-glare film A has a power spectrum at a spatial frequency of 0.033 μm ⁻¹ of 0.05 μm ² or less, it is excellent in Example 1 and Example 6 in which the distance L between the uneven surface and the color filter is 521 μm and 708 μm, respectively. It showed an anti-glare effect.

  DESCRIPTION OF SYMBOLS 1 Anti-glare film, 2 Uneven surface, 3 Projection surface of anti-glare film, 5 Main normal direction of anti-glare film, 7 Base material for metal mold | die, 8 Surface of the base material ground | polished by the grinding | polishing process, 9 Photosensitive resin film, 10 exposed region, 11 unexposed region, 12 mask, 13 location without mask, 15 first surface uneven shape (uneven shape of mold substrate surface after first etching step) ), 16 2nd surface uneven shape (irregular shape on the mold substrate surface after the second etching step), 17 chromium plated layer, 18 chromium plated surface, 101 antiglare layer, 102 transparent support, 103a first 1 adhesive layer, 103b second adhesive layer, 104 polarizing film, 105 transparent resin layer, 200 adhesive layer, 300 substrate, 400 color filter (RGB pattern).

Claims (6)

A transparent support, and an antiglare layer having an uneven surface laminated on the transparent support,
The power spectrum of the altitude of the uneven surface, and a 2 [mu] m ² or more at a spatial frequency 0.01 [mu] m ^-1, is 0.04 .mu.m ² or less at 0.033Myuemu ^-1, antiglare film. An antiglare film according to claim 1 and a polarizing film,
An anti-glare polarizing plate in which the polarizing film is disposed on the transparent support side of the anti-glare film. An antiglare film according to claim 1 or an antiglare polarizing plate according to claim 2, and an image display element,
An image display device in which the image display element is disposed on the transparent support side of the antiglare film or on the polarizing film side of the antiglare polarizing plate.   The image display apparatus according to claim 3, wherein the uneven surface is in contact with an air layer.   The image display device according to claim 3, further comprising a color filter, wherein a distance from the uneven surface to the color filter is less than 1 mm.   The image display device according to claim 5, wherein the distance is less than 0.75 mm.