KR20160059957A - Antiglare film, antiglare polarizing plate and image display device - Google Patents

Abstract

Provided are an antiglare film, an antiglare polarizing plate and an image display device. The antiglare film comprises a transparent supporter and an antiglare layer having a recessed surface stacked on it. The power spectrum of the attitude of the recessed surface, is 1 μm^2 or more in a spatial frequency of 0.01 μm^-1, and is 0.05 μm^2 or less in 0.033 μm^-1. So, the deterioration of the visibility of the image display device can be prevented.

Description

TECHNICAL FIELD [0001] The present invention relates to an antireflection film, a polarizing plate,

The present invention relates to a light-shielding film, and a light-diffusing polarizing plate and an image display apparatus using the same.

An image display device such as a liquid crystal display device, an organic electroluminescence (EL) display device, a plasma display panel, and a cathode ray tube (CRT) display has a problem that visibility is considerably damaged do. The anti-glare film is an optical film used for suppressing the glare of such external light. The flicker-resistant film has an antiglare layer having a fine irregular surface contributing to suppressing glare of external light, and the irregular surface is provided on the image display device so that the irregular surface faces the viewing side.

Japanese Unexamined Patent Application Publication No. 2014-119650 (Patent Document 1) discloses a polarizing plate having a polarizing film on which an antiglare layer having a fine uneven surface is formed. The polarizing plate includes a polarizing plate polarizer having a power spectrum of a microscopic uneven surface controlled at an elevation .

In the light-diffusing polarizing plate described in Patent Document 1, the fine uneven surface has a quadratic derivative d ² logH ² (f) / df ² with respect to the spatial frequency f of the logarithm logH ² (f) ㎛ ^- less than 0, 0.02 ㎛ in the ^{first -} and is controlled so as to satisfy more than 0 in the ^first, and thus any haze Possession low enough room along overt is that the glare can be suppressed. Glare is a phenomenon occurring in a relatively high-definition image display device, in which the shape of the concavo-convex surface of the antiglare layer and the pixels of the image display device interfere with each other, resulting in a luminance distribution and deteriorating the visibility of the image display device.

However, in the light-deflecting polarizing plate described in Patent Document 1, when the distance L between the uneven surface-color filters is less than 1 mm, there is a possibility that suppression of glare becomes insufficient when installed in a high-definition image display apparatus. The distance L refers to the distance from the concavo-convex surface (visual side surface) of the antiglare layer to the visual side surface in the RGB pattern of the color filter, and the substrate (glass substrate or the like) .

Generally, if an inner haze (internal scattering function) is applied to the antiglare layer, it is advantageous in suppressing glare, but if the internal haze is increased, the luminance is lowered and the contrast is lowered.

Therefore, an object of the present invention is to provide a light-scattering film having low haze and sufficient flame retardancy and excellent anti-glare properties when the distance L is less than 1 mm when applied to an image display apparatus. Another object of the present invention is to provide a retardation polarizing plate and an image display apparatus using the above retardation film.

The present invention provides a retardation film, a polarizing plate, and an image display device described below.

[1] A light-emitting device comprising: a transparent support; and an antiglare layer having an uneven surface laminated on the transparent support,

The power spectrum of the irregular elevation of the surface, the spatial frequency 0.01 ㎛ ^- not less than 1 ㎛ ² in ^1, 0.033 ㎛ ^-1 0.05 ㎛ ² or less in the room overt film.

[2] A retardation film for an image display device having a color filter,

And the distance from the surface of the concavities and convexities to the color filter when applied to the image display device is less than 1 mm.

[3] The retardation film according to [2], wherein the distance is less than 0.75 mm.

[4] A polarizing plate comprising the retardation film described in any one of [1] to [3] and a polarizing film,

And the polarizing film is disposed on the transparent support side of the light-shielding film.

[5] A liquid crystal display comprising the retardation film described in any of [1] to [3] and an image display element,

And the image display element is disposed on the transparent support side of the light-shielding film.

[6] An image display apparatus according to [5], wherein the concavo-convex surface is in contact with the air layer.

[7] A liquid crystal display comprising the retardation polarizing plate described in [4] and an image display element,

And the image display element is disposed on the polarizing film side of the polarizing plate.

[8] An image display device according to [7], wherein the uneven surface is in contact with the air layer.

According to the present invention, even when the distance (L) when applied to an image display apparatus is less than 1 mm, a film having a low haze and sufficient flame retardancy and anti-glare properties, a polarizing plate Can be provided.

1 is a cross-sectional view schematically showing an example of a retardation film and a polarizing plate according to the present invention.
2 is a perspective view schematically showing a surface of a waterproof film according to the present invention.
Fig. 3 is a schematic diagram showing a state in which a function h (x, y) representing an elevation is discretely obtained.
4 is a diagram showing the elevation of the concavo-convex surface of the antiglare layer as a two-dimensional discrete function h (x, y).
5 is a schematic diagram for explaining a method of averaging the two-dimensional power spectrum H ² (f _x , f _y ) at a distance f from the origin in the frequency space.
Fig. 6 is a diagram schematically showing a preferable example of the first half of the method of manufacturing a mold for forming a concave-convex surface.
Fig. 7 is a diagram schematically showing a preferred example of the second half of the method for manufacturing a mold for forming a concave-convex surface.
Fig. 8 is a diagram showing a part of image data of the exposure pattern A. Fig.
9 is a diagram showing a part of image data of the exposure pattern C;
10 is a diagram showing a part of the image data of the exposure pattern D;
11 is a view showing a part of image data of the exposure pattern H. In Fig.
Fig. 12 is a diagram showing a part of image data of the exposure pattern I. Fig.
Fig. 13 is a diagram showing a part of image data of the exposure pattern J. Fig.
Fig. 14 is a diagram showing a part of image data of the exposure pattern K. Fig.
Fig. 15 is a diagram showing a one-dimensional power spectrum G ² (f) obtained by performing discrete Fourier transform on image data of the exposure patterns A, C, and D. Fig.
16 is a diagram showing a one-dimensional power spectrum G ² (f) obtained by performing discrete Fourier transform on image data of exposure patterns H, I, J, and K. FIG.
17 is a diagram showing a one-dimensional power spectrum H ² (f) calculated from the elevation of the blue-violet films A to C;
18 is a view showing a one-dimensional power spectrum H ² (f) calculated from the elevation of the light-blocking films D and E. FIG.
19 is a diagram showing a one-dimensional power spectrum H ² (f) calculated from the elevation of the gas-permeable films H to K. FIG.

1 is a cross-sectional view schematically showing an example of a polarizing plate and a polarizing plate according to the present invention. The polarizing plate is attached to a substrate 300, which is a part of an image display device, 200) having the same polarity as that of the polarizing plate. 1, the anti-glare film according to the present invention includes an anti-glare layer 101 having a transparent support 102 and a fine uneven surface 2 laminated thereon. Further, the polarizing plate of the present invention includes a light-blocking film 1 and a polarizing film 104, as in the example shown in Fig. Hereinafter, the retardation film, the retardation polarizer and the image display apparatus using the retardation film according to the present invention will be described in detail.

<Antifogging film>

(1) The power spectrum of the visibility of the antiglare layer and its concavo-convex surface

The antiglare film (1) has an antiglare layer (101) laminated on a transparent support (102), and the antiglare layer (101) has a fine irregular surface (2). First, the power spectrum of the elevation of the uneven surface 2 of the antiglare layer 101 will be described.

2 is a perspective view schematically showing a surface of a waterproof film according to the present invention. The term "elevation of the irregular surface" refers to an arbitrary point P on the irregular surface 2 of the diopter barrier film 1 and a virtual plane having its height at the average height of the irregular surface 2 (Normal direction in the imaginary plane) of the film 1 in the main normal direction 5 of the film 1. In Fig. 2, the entire surface of the light-shielding film is indicated by the projection plane 3.

The fine irregular surface 2 of the antiglare layer 101 is a two-dimensional plane as schematically shown in Fig. 2, and therefore the elevation of the irregular surface 2 is orthogonal to the inside of the film surface When the coordinates are represented by (x, y), they can be represented by a two-dimensional function h (x, y) of the coordinates (x, y).

The elevation of the uneven surface 2 can be obtained from the three-dimensional information of the surface shape measured by a confocal microscope, an interference microscope, an atomic force microscope (AFM) or the like. The horizontal resolution required for the measuring instrument is at least 5 μm or less, preferably 2 μm or less, and the vertical resolution is at least 0.1 μm or less, preferably 0.01 μm or less. Examples of the non-contact three-dimensional surface shape and roughness measuring instrument suitable for this measurement include a New View 5000 series (available from Zygo Corporation, Japan, available from Zaigo Inc.) and a three-dimensional microscope PLμ 2300 (manufactured by Sensofar Co., Ltd.) . The measurement area is preferably at least 200 탆 x 200 탆 or more, and more preferably 500 탆 x 500 탆 or more since the resolution of the power spectrum of the elevation is required to be 0.005 탆 ^-1 or less.

Next, a method of obtaining the power spectrum of elevation from the two-dimensional function h (x, y) will be described. First, a two-dimensional function H (f _x , f _y ) is obtained from a two-dimensional function h (x, y) by two-dimensional Fourier transform defined by the following equation (1).

Equation (1)

f _x and f _y are frequencies in the x and y directions, respectively, and have a dimension of reciprocal of length. Also, in the equation (1),? Is the circularity and i is the imaginary unit. The two-dimensional power spectrum H ² (f _x , f _y ) can be obtained by squaring the obtained two-dimensional function H (f _x , f _y ). The two-dimensional power spectrum H ² (f _x , f _y ) represents the spatial frequency distribution of the uneven surface 2.

Hereinafter, a method of obtaining the two-dimensional power spectrum of the elevation of the uneven surface 2 will be described in more detail. The three-dimensional information of the surface shape actually measured by the confocal microscope, the interference microscope, the atomic force microscope and the like is generally obtained as a discrete value, that is, an elevation corresponding to a plurality of measurement points. Fig. 3 is a schematic diagram showing a state in which a function h (x, y) representing an elevation is discretely obtained. 3, the rectangular coordinates in the plane of the antiglare layer 101 are represented by (x, y), the line segmented by? X in the x-axis direction on the projection plane 3, In the actual measurement, the elevation of the irregular surface 2 is obtained as a discrete elevation correction value for each intersection of each broken line on the projection surface 3.

As shown in Fig. 3, the measurement range in the x-axis direction is defined as X = (M-1) x, and the measurement range in the y-axis direction is defined as Y = (N-1)? Y, the number of the obtained elevation values is M × N.

(J DELTA x, k DELTA y) (where j is not less than 0 but not more than M-1, and k is not less than 0 but not more than N-1) as shown in Fig. 3, the target point A The elevation of the point P on the diopter film surface corresponding to the height h can be represented by h (j DELTA x, k DELTA y).

Here, the measurement intervals? X and? Y depend on the horizontal resolution of the measuring instrument. In order to evaluate the surface irregularities with precision, both? X and? Y are preferably 5 占 퐉 or less and more preferably 2 占 퐉 or less as described above. Further, as described above, the measurement ranges X and Y are preferably 200 占 퐉 or more, and more preferably 500 占 퐉 or more.

Thus, in actual measurement, the function representing the elevation of the uneven surface is obtained as a discrete function h (x, y) having M x N values. Discrete function h (x, y) and the formula (2) obtained a discrete function (f _x, f _y) H by a discrete Fourier transform is a discrete function (f _x, f _y), H is defined as obtained by the measurement The discrete function H ² (f _x , f _y ) of the two-dimensional power spectrum is obtained. 1 in the formula (2) is an integer of -M / 2 or more and M / 2 or less, and m is an integer of -N / 2 or more and N / 2 or less. Further,? F _x and? F _y are frequency intervals in the x and y directions, respectively, and are defined by the following equations (3) and (4).

Equation (2)

Equation (3)

Equation (4)

Fig. 4 is an example of a diagram showing the elevation of the uneven surface 2 of the antiglare layer 101 by a two-dimensional discrete function h (x, y). In Fig. 4, the elevation is represented by white and black gradations. 4, since the irregular surface 2 of the antiglare layer 101 is randomly formed, the two-dimensional power spectrum H ² (f _x , f _y ( ² )) in the frequency space ) Is symmetrical about the origin (f _x = 0, f _y = 0). Therefore, the two-dimensional function H ² (f _x , f _y ) can be converted into a one-dimensional function H ² (f) having a distance f (unit: μm ^-1 ) from the origin in the frequency space as a variable. The antiglare layer 101 according to the present invention has a certain characteristic of a one-dimensional power spectrum represented by this one-dimensional function H ² (f).

More specifically, first, even in a frequency space as shown in Fig. 5, the origin _{O (f x = 0, f} y = 0) from the (n-1/2) Δf more than (n + 1/2) is less than Δf The number Nn of all the points (black circles in Fig. In the example shown in Fig. 5, Nn = 16. Next, a total value H ² n (H ² (f _x , f _y )) of H ² (f _x , f _y ) at all points located at distances less than (n + 1/2) as shown in calculates a H ² total value of (f _x, f _y)) at the point of the black circle, the following formula (5), the total value that divides the H ² n by the number of points Nn H ² (f ).

Equation (5)

Here, when M &gt; = N, n is an integer of 0 or more and N / 2 or less, and when M &lt; N, n is an integer of 0 or more and M / 2 or less. On the other hand, M and N mean the number of measurement points in the x-axis direction and the number of measurement points in the y-axis direction, respectively, as shown in Fig. Further, Δf is to be _(x Δf Δf + _y) / 2.

Generally, the one-dimensional power spectrum obtained by the above-described method may include noise in measurement. In order to eliminate the influence of the noise in obtaining the one-dimensional power spectrum, the elevation of the irregular surface 2 at a plurality of sites on the antiglare layer 101 is measured, and the elevation angle of the uneven surface 2, It is preferable to use the average value of the power spectrum as the one-dimensional power spectrum H ² (f). The number of sites for measuring the elevation of the uneven surface 2 on the antiglare layer 101 is preferably 3 or more, more preferably 5 or more.

In the room overt film 1 of the present invention, the power spectrum of the altitude (one dimensional power spectrum) of the uneven surface (2) obtained as described above, the spatial frequency 0.01 ㎛ ^- and at least one ㎛ ² according to the ^first, 0.033 mu m ^{&lt; -1} &gt; and 0.05 mu m &lt; ² &gt; Thus, when the distance L between the concavo-convex surface and the color filter is set to be less than 1 mm when the image display device is installed in a high-definition image display device, it is possible to satisfactorily exhibit sufficient diffusibility and excellent shininess suppression. When the distance L is less than 0.75 mm, a higher anti-glare effect can be obtained.

As described above, the distance L between the concavo-convex surface and the color filter in this specification refers to the distance L between the concavo-convex surface and the color filter from the concavo-convex surface 2 of the antiglare layer 101 to the color filter 400 (more specifically, The RGB pattern of the color filter 400). The concavo-convex surface 2 referred to herein means a surface on the viewer's side, and refers to the surface of the convex portion that protrudes most. The surface of the color filter 400 means the surface on the viewer side, that is, the surface on the side of the substrate 300 on which the color filter 400 is provided. The substrate 300 is a substrate on the viewer's side constituting an image display device, and is a substrate to which the polarizing film 1 or the polarizing plate containing the polarizing film is bonded.

Logarithm logH ² (f) of the concave-convex surface (2) a one-dimensional power spectrum H ² (f), the elevation of, the one-dimensional power spectrum determined from the altitude of the concave-convex surface (2) in the other five on the anti-glare layer 101 Is the average of the commercial logarithms of. This can be from a one-dimensional power spectrum logarithm logH ² (f) of calculating the second derivative ^{d 2 logH 2 (f) /} df 2 of the spatial frequency f of the common logarithm logH ² (f) of the one-dimensional power spectrum. Specifically, the second derivative can be calculated by the difference method of the following formula (6).

Equation (6)

Discrete function h of the two dimensions shown in Figure 4 (x, y), the formula (5) obtained to be one-dimensional power spectrum H ² (f) common logarithm logH ² (f) space second derivative of the frequency f of the in accordance with the from d ^{2 logH 2 (f) / df} 2 , the spatial frequency 0.01 ㎛ ^- and -5192 in the ^first, was 36 695 according to the spatial frequency 0.02 ㎛ ^-1. Therefore, when the common logarithm logH ² (f) of the one-dimensional power spectrum is expressed as the intensity with respect to the spatial frequency, the graph has a convex shape at a spatial frequency of 0.01 μm ^-1 and has a convex shape at a spatial frequency of 0.02 μm ^-1 And has a convex shape.

The anti-glare ability of the film 1 of the present invention will be described in more detail. The cause of the occurrence of the flashing is a luminance distribution caused by interference between the pixel of the image display device and the surface irregularity shape of the diopter film 1, and therefore the intensity of the flashing depends on the pixel accuracy of the image display device. The present inventor has hypothesized that the lens function of the irregularities of the irregular surface 2 is involved as a factor of the glare separately from the accuracy of the pixel. In other words, it was thought that the irregularities of the irregular surface 2 functioned as a lens, and when there was a pixel inside the focal length of the lens, the visible image of the pixel was seen by the viewer. In this case, if the wrinkle component of the period included in the fine unevenness is regarded as a continuous lens, if the distance L between the uneven surface-color filter is shorter than the focal length of the lens, It is believed that it causes enlargement and generation of glare. On the basis of this hypothesis, it is considered that the period of the crease component causing the flashing varies depending on the distance L.

As a result of intensive studies, the present inventors have found that, even when the same diaphragm film is actually used, the flashing ability is different depending on the distance L. When the distance L is less than 1 mm, Mu] m or a wrinkle component of a period close to it is a main factor causing generation of glare. After a review of the basis of these findings, the present inventors, in order to suppress the flickering, in a case that to the distance (L) reducing wrinkles component of the cycle is less than 1 mm effectively, the spatial frequency 0.033 ㎛ ^- irregularities in the ^first And the power spectrum of the elevation of the surface 2 should be 0.05 mu m ² or less. From the viewpoint of suppressing the glare, the power spectrum is preferably 0.04 탆 ² or less, and more preferably 0.030 탆 ² or less.

On the other hand, the retardation polarizing plate described in Document 1 can suppress largely the wrinkle component in the period of about 50 占 퐉 included in the fine unevenness, and effectively suppresses the glare when the distance L is 1 mm or more It is possible to obtain a surface irregular shape which can be formed on the surface of the substrate. On the other hand, when applied to an image display apparatus in which the distance L is less than 1 mm, suppression of glare may be insufficient.

Spatial frequency 0.033 ㎛ ^- the power spectrum of the altitude of the concave-convex surface 2 of the ^first is greater than the normal 0.005 ㎛ ^2. When the power spectrum is less than 0.005 탆 ² , it sometimes becomes difficult to set the power spectrum at a spatial frequency of 0.01 탆 ^-1 to 1 탆 ² or more.

Further, the inventor of the present invention has found that the light-diffusing property of the water-repellent film (1) is related to the intensity of the wrinkle component in the period of about 100 탆 included in the fine irregularities, and if the wrinkle component in the period of about 100 탆 is strong, the ability to scatter makes it possible to improve the room manifest, also in order to obtain a good room overt, spatial frequency 0.01 ㎛ ^- found that should the power spectrum of the altitude in the ^first 1 to ² ㎛ above. From the viewpoint of dispersibility, the power spectrum is preferably 2 탆 ² or more, more preferably 2.5 탆 ² or more, and further preferably 3 탆 ² or more.

Spatial frequency 0.01 ㎛ ^- the power spectrum of the altitude of the concave-convex surface (2) in the ^first is usually 10 ㎛ ² below. When the power spectrum exceeds 10 탆 ² , it may be difficult to make the power spectrum at a spatial frequency of 0.033 탆 ^-1 to 0.05 탆 ² or less.

(2) Manufacturing method of antiglare layer

The antiglare layer 101 is prepared by forming a mold for forming a concave-convex surface by a method including a step of forming a surface shape (fine unevenness) based on a predetermined pattern on the surface of the mold base material, To a surface of a resin layer (photocurable resin layer or the like) formed on the transparent support 102 (emboss method). The "pattern" typically means image data that can be created by a calculator, which is used for forming the concavo-convex surface 2 of the antiglare layer 101. The "pattern" Data (such as matrix data). Data that can be uniquely converted into image data include data in which only the coordinates and gradations of each pixel are saved.

In order to precisely form the concavo-convex surface 2 of the antiglare layer 101 having the power spectrum characteristics as described above, the one-dimensional power spectrum of the predetermined pattern used for manufacturing the mold for forming the concave- when represented as a graph of eoteul is, has two maximum value in the spatial frequency more than 0.006 ㎛ ^-1 0.15 ㎛ ^-1 or less, with a maximum value of one in the range of not more than the spatial frequency at least 0.012 0.006 ㎛ ^{-1 -1} ㎛, other To a spatial frequency of 0.07 mu m- ¹ or more and 0.15 mu m- ¹ or less. It is preferable that the minimum value existing between these two maximum values exists in the range of the spatial frequency of 0.012 mu m- ¹ or more and 0.025 mu m- ¹ or less. Here, maxima and minima refer to global maxima and minima, not to local maxima and minima due to slight fluctuations of the graph.

In addition, uneven intensity of the first maximum value of the spatial frequency 0.006 ㎛ ^-1 than 0.012 ㎛ ^-1 or less of the patterns used in manufacturing a mold for forming the surface, the spatial frequency more than 0.07 ㎛ ^-1 0.15 ㎛ ^-1 or less in the Is preferably smaller than the intensity of the second maximum value. When the intensity of the first maximum value is larger than the second maximum value, the glare tends to become strong. By designing the pattern so as to increase the first maximum value of the power spectrum, the spatial frequency of 0.01 ㎛ uneven surface ⁽²⁾ it is possible to increase the power spectrum of the elevations in the ^first. On the other hand, while decreasing the spatial frequency 0.012 ㎛ ^-1 or higher in the minimum value 0.025 ㎛ ^-1 or less also by designing a pattern so as to shift the high-frequency side than the second maximum value, the spatial frequency of 0.033 ㎛ uneven surface ⁽²⁾ in the ^first The power spectrum of the elevation can be reduced.

When the pattern is image data, for example, the two-dimensional power spectrum of the pattern is obtained by converting the image data into two-gradation binary image data, expressing the gradation of the image data by a two-dimensional function g (x, y) (x, y) is Fourier-transformed to calculate a two-dimensional function G (f _x , f _y ), and the resultant two-dimensional function G (f _x , f _y ) is squared. Here, x and y indicate the orthogonal coordinates in the image data plane, and f _x and f _y indicate the frequency in the x direction and the frequency in the y direction.

The two-dimensional function g (x, y) of the grayscale can be obtained as a discrete function even when the two-dimensional power spectrum of the pattern is obtained as in the case of obtaining the two-dimensional power spectrum of the elevation of the uneven surface 2 of the antiglare layer 101 It is common. In this case, the two-dimensional power spectrum can be calculated by discrete Fourier transform similarly to the case of obtaining the two-dimensional power spectrum of the elevation of the uneven surface 2. The one-dimensional power spectrum of the pattern is obtained from the two-dimensional power spectrum of the pattern in the same manner as the one-dimensional power spectrum of the elevation of the uneven surface 2.

The one-dimensional power spectrum has a first maximum value and a second maximum value at a spatial frequency of 0.006 탆 ^-1 or more and 0.012 탆 ^-1 or less and 0.07 탆 ^-1 or more and 0.15 탆 ^-1 or less, respectively, and a spatial frequency of 0.012 탆 ^-1 to 0.025 탆 ^-1 In order to create a pattern having a minimum value in the following, a pattern having a random brightness distribution obtained by randomly arranging dots or a random number generated by a random number or a calculator, Pass band-pass filter to be removed.

As described above, in order to appropriately control the spatial frequency distribution of the irregular surface 2 of the antiglare layer 101 and to impart predetermined power spectral characteristics to the irregular surface 2, the antiglare layer 101 is preferably embossed It is preferable to produce it by a method. Examples of the embossing method include a UV embossing method using a photocurable resin and a hot embossing method using a thermoplastic resin. Among them, the UV embossing method is preferable from the viewpoint of productivity.

The UV embossing method is a method in which a photocurable resin layer is formed on the surface of a transparent support, and the photocurable resin layer is cured while pressing the uneven surface of the mold to transfer the uneven surface of the mold to the photocurable resin layer. Specifically, an ultraviolet ray-curable resin is coated on a transparent support, and ultraviolet rays are irradiated from the side of the transparent support in a state where the coated ultraviolet-curable resin is in close contact with the uneven surface of the mold to cure the ultraviolet- The transparent support having the ultraviolet-curable resin layer (antiglare layer) formed thereon is peeled off.

The type of the ultraviolet-curable resin in the case of using the UV embossing method is not particularly limited, but an appropriate commercially available one can be used. A resin capable of being cured by visible light having a wavelength longer than that of ultraviolet rays may also be used by combining a photoinitiator appropriately selected for the ultraviolet curing resin.

Specific examples of the ultraviolet ray hardenable resin include, for example, polyfunctional acrylates such as trimethylolpropane triacrylate and pentaerythritol tetraacrylate, which are used alone or as a mixture of two or more thereof, (Manufactured by Chiba Specialty Chemicals Co., Ltd.), Irgacure 184 (manufactured by Chiba Specialty Chemical Co., Ltd.), and lucylline TPO (manufactured by BASF Co., Ltd.).

On the other hand, the hot emboss method is a method in which a transparent support formed of a thermoplastic resin is pressed against a metal mold in a heated state, and the surface shape of the metal mold is transferred to a transparent support. As the transparent support for use in the hot embossing method, any transparent support may be used as long as it is substantially transparent, and examples thereof include polymethyl methacrylate, polycarbonate, polyethylene terephthalate, triacetyl cellulose, amorphous cyclic polyolefins having a norbornene- A solvent cast film of thermoplastic resin, an extruded film, or the like can be used. These transparent resin films can also be suitably used as a transparent support for coating the ultraviolet curable resin in the UV embossing method described above.

(3) Transparent support

The transparent support 102 constituting the anti-glare film 1 may be a substantially optically transparent film, for example, a triacetyl cellulose film, a polyethylene terephthalate film, a polymethyl methacrylate film, a polycarbonate film, a norbornene- Amorphous cyclic polyolefin having a compound as a monomer, and a resin film such as a solvent cast film and an extruded film of the thermoplastic resin.

The thickness of the transparent support 102 is, for example, 10 to 200 占 퐉, preferably 10 to 100 占 퐉, and more preferably 10 to 60 占 퐉. When the thickness of the transparent support 102 is within this range, there is a tendency to obtain the film 1 having sufficient mechanical strength, and the image display device equipped with the film 1 has a further problem of causing glare It becomes difficult.

(4) Haze of the film

The haze of the anti-glare film (1) is preferably 0.3 to 5%, more preferably 0.3 to 3%, still more preferably 0.3 to 1%. When the haze exceeds this range, the contrast is lowered. In addition, if the haze is below this range, there is a possibility that sufficient retardation can not be obtained. The haze is measured in accordance with JIS K 7136.

(5) Method of manufacturing mold for forming uneven surface

Next, a method of manufacturing a mold used for forming a fine uneven surface 2 on the surface of the antiglare layer 101 will be described. The method of producing the mold for forming the uneven surface is not particularly limited as long as the method can obtain the predetermined uneven surface 2 by using the above-described pattern. However, in order to manufacture the uneven surface 2 with good precision and reproducibility , [1] a first plating step, [2] a polishing step, [3] a photosensitive resin film forming step, [4] an exposure step, [5] a developing step, [6] a first etching step, [7] photosensitive resin film peeling step, [8] second etching step, and [9] second plating step.

Fig. 6 is a diagram schematically showing a preferable example of the first half of the method of manufacturing a mold for forming a concave-convex surface. Fig. 6 schematically shows a cross section of a mold in each step. Hereinafter, each step of the method for manufacturing a mold for forming a concave-convex surface will be described in detail with reference to Fig.

[1] First plating process

In the method for manufacturing a mold for forming a concave-convex surface, copper plating is first applied to the surface of a substrate used for a mold. As described above, by performing copper plating on the surface of the mold base material, adhesion and gloss of the chromium plating in the subsequent second plating process can be improved. This is because copper plating has a high covering property and a high smoothing action, so that a flat and glossy surface can be formed by filling fine irregularities and holes of a mold base material. Due to the characteristics of these copper platings, even if chromium plating is carried out in the second plating step described later, the roughness of the chromium plating surface, which is thought to be caused by minute irregularities and holes existing in the substrate, is solved, The occurrence of fine cracks is reduced due to the height of the coating of the substrate.

The copper used in the first plating step may be pure copper or an alloy mainly composed of copper. Thus, &quot; copper &quot; in this specification is meant to include copper and a copper alloy. Copper plating may be performed by electrolytic plating or electroless plating, but electrolytic plating is usually employed.

When copper plating is carried out, if the plating layer is too thin, the influence of the surface of the base can not be excluded. Therefore, the thickness is preferably 50 m or more. Although the upper limit of the thickness of the plating layer is not critical, in consideration of cost and the like, it is preferable that the upper limit is generally about 500 탆 or so.

As the metal material constituting the base material, aluminum, iron and the like are preferably used from the viewpoint of cost. From the viewpoint of handleability, aluminum is more preferably lightweight. The aluminum or the iron mentioned here may be a pure metal, or an alloy mainly composed of aluminum or iron.

The shape of the substrate may be a suitable shape conventionally employed in the art, or may be a flat plate or a cylindrical or cylindrical roll. When a mold is manufactured using a roll-shaped base material, there is an advantage that a waterproof film can be produced in a continuous roll shape.

[2] Polishing process

In the subsequent polishing step, the surface of the substrate coated with copper in the first plating step is polished. In this step, it is preferable to polish the substrate surface in a state close to the mirror surface. This is because the metal plate or the metal roll serving as the base material is often subjected to machining such as cutting or grinding in order to achieve a desired precision. As a result, a machining mark remains on the surface of the base material, There is a case in which a workpiece is left, and in the plated state, the surface is not completely smooth. That is, even if a step to be described later is carried out on the surface where such a deep processing mark is left, there is a possibility that the unevenness of the work or the like may be deeper than the unevenness formed after each step, , And when a diaphragm film is produced using such a mold, the optical characteristics may be unexpectedly affected. 6 (a), copper plating is applied to the surface of the flat base substrate 7 in the first plating step (the copper plating layer formed in this step is not shown), and in the polishing step The surface 8 having the mirror-polished surface is schematically shown.

There is no particular limitation on the method of polishing the surface of the substrate to which the copper plating has been performed, and any of mechanical polishing, electrolytic polishing and chemical polishing can be used. Examples of mechanical magic include super finishing, lapping, fluid polishing, and buffing. Further, the surface of the mold base 7 may be mirror-finished by mirror-cutting using a cutting tool in the polishing process. The material and shape of the cutting tool at that time are not particularly limited, and a cemented carbide, a CBN, a ceramic, or a diamond can be used, but it is preferable to use a diamond tool from the viewpoint of processing accuracy.

The surface roughness after polishing preferably has a centerline average roughness (Ra) in accordance with JIS B 0601 of 0.1 탆 or less, more preferably 0.05 탆 or less. If the center line average roughness (Ra) after polishing is larger than 0.1 占 퐉, there is a possibility that the final roughness of the mold surface may remain affected by the surface roughness after polishing. The lower limit of the center line average roughness Ra is not particularly limited and is appropriately determined in consideration of the machining time and machining cost.

[3] Photosensitive resin film forming process

In the subsequent photosensitive resin film forming step, the surface 8 of the mold base material 7 subjected to the mirror polishing by the above-mentioned polishing step is applied as a solution in which a photosensitive resin is dissolved in a solvent, followed by heating and drying to form a photosensitive resin film . Fig. 6 (b) schematically shows a state in which the photosensitive resin film 9 is formed on the surface 8 of the mold base material 7. Fig.

As the photosensitive resin, conventionally known photosensitive resins can be used. Examples of the negative-type photosensitive resin having a property of curing the photosensitive portion include a monomer or a prepolymer of a (meth) acrylic ester having a (meth) acryl group in the molecule, a mixture of a bisazide and a diene rubber, a polyvinyl cinnamate- Compounds and the like can be used. Further, as the positive photosensitive resin having the property that the photosensitive portion is eluted by development and only the non-photosensitive portion remains, for example, a phenol resin-based nano-bloc resin-based resin or the like can be used. If necessary, various additives such as a sensitizer, a development promoter, an adhesion modifier, and a coating improver may be added to the photosensitive resin. In the present specification, "(meth) acryl" means acryl and / or methacryl.

When the photosensitive resin is applied to the surface 8 of the mold base material 7, it is preferable to apply it by diluting it with a suitable solvent in order to form a good coating film. As the solvent, a cellosolve solvent, a propylene glycol solvent, an ester solvent, an alcohol solvent, a ketone solvent, a high polarity solvent and the like can be used.

As a method of applying the photosensitive resin solution, known methods such as meniscus coat, fountain coat, dip coat, spin coating, roll coating, wire bar coating, air knife coating, blade coating, curtain coating, have. The thickness of the coating film is preferably in the range of 1 to 10 mu m after drying.

[4] Exposure step

In the subsequent exposure step, the one-dimensional power spectrum described above is expressed as the intensity with respect to the spatial frequency, and the graph is obtained at a spatial frequency of 0.006 탆 ^-1 or more and 0.012 탆 ^-1 or less and 0.07 탆 ^-1 or more and 0.15 탆 ^-1 or less, A pattern having a minimum value of 1 maximum value and a maximum value of 2 at a spatial frequency of 0.012 mu m- ¹ or more and 0.025 mu m- ¹ or less is exposed on the photosensitive resin film 9 formed in the above photosensitive resin film forming step. The light source used in the exposure process may be suitably selected in accordance with the photosensitive wavelength and sensitivity of the applied photosensitive resin. For example, a g line (wavelength: 436 nm) of a high-pressure mercury lamp, h line (wavelength: 405 nm) A semiconductor laser (wavelength: 830 nm, 532 nm, 488 nm, 405 nm), a YAG laser (wavelength: 1064 nm), a KrF excimer laser (wavelength: 248 nm) An ArF excimer laser (wavelength: 193 nm), and an F2 excimer laser (wavelength: 157 nm).

In order to precisely form the shape of the concavo-convex surface of the mold, and furthermore the shape of the concavo-convex surface 2 of the antiglare layer 101, it is preferable to expose the above- desirable. Specifically, it is preferable that a pattern is created as image data on a computer, and a pattern based on the image data is drawn by laser light emitted from a computer-controlled laser head. When laser drawing is performed, a laser drawing apparatus for preparing a printing plate can be used. As such a laser beam drawing apparatus, for example, a Laser Stream FX (manufactured by Sink-Laboratories) can be used.

Fig. 6 (c) schematically shows a state in which the pattern is exposed on the photosensitive resin film 9. Fig. When the photosensitive resin film is formed of a negative type photosensitive resin, the exposure of the exposed region 10 causes the crosslinking reaction of the resin to proceed by exposure, and the solubility in a developing solution described later decreases. Therefore, in the developing process, the unexposed area 11 is dissolved by the developing solution, and only the exposed area 10 remains on the substrate surface to become a mask. On the other hand, in the case where the photosensitive resin film is formed of a positive photosensitive resin, the exposure of the exposed region 10 causes the bond of the resin to be broken by exposure, thereby increasing the solubility in the developing solution described later. Therefore, in the developing step, the exposed region 10 is dissolved by the developing solution, and only the unexposed region 11 remains on the substrate surface to become a mask.

[5] Development process

In the succeeding developing step, when a negative photosensitive resin is used for the photosensitive resin film 9, the unexposed area 11 is dissolved by the developing solution, and only the exposed area 10 remains on the mold base material, And acts as a mask in the subsequent first etching step. On the other hand, in the case where a positive photosensitive resin is used for the photosensitive resin film 9, only the exposed region 10 is dissolved by the developing solution, the unexposed region 11 remains on the substrate for a mold, And acts as a mask in the etching process.

Conventionally known developers may be used for the developing solution used in the developing process. Examples thereof include inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate and ammonia water, primary amines such as ethylamine and n-propylamine, and organic bases such as diethylamine and di- 2 amines, tertiary amines such as triethylamine and methyldiethylamine, alcohol amines such as dimethylethanolamine and triethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, trimethylhydroxyethylammonium hydroxide , And organic solvents such as xylene, toluene and the like can be given as an example.

The developing method in the developing step is not particularly limited and methods such as immersion phenomenon, spray phenomenon, brush phenomenon, and ultrasonic phenomenon can be used.

Fig. 6 (d) schematically shows a state in which the photosensitive resin film 9 is subjected to development processing using a negative-type photosensitive resin. In Fig. 6 (c), the unexposed area 11 is dissolved by the developing solution, and only the exposed area 10 remains on the substrate surface to become the mask 12. [ Fig. 6 (e) schematically shows a state in which the photosensitive resin film 9 is subjected to development processing using a positive photosensitive resin. In Fig. 6 (c), the exposed region 10 is dissolved by the developing solution, and only the unexposed region 11 remains on the substrate surface to become the mask 12.

[6] First etching step

In the subsequent first etching step, the plated surface of the mold base material mainly in a maskless portion is etched by using the photosensitive resin film remaining on the surface of the mold base material after the above-described development process as a mask.

Fig. 7 is a diagram schematically showing a preferred example of the second half of the method for manufacturing a mold for forming a concave-convex surface. Fig. 7A schematically shows a state in which the mold base material 7 in the region 13 mainly having no mask is etched by the first etching step. The mold base material 7 under the mask 12 is not etched on the surface of the mold base, but etching progresses from the maskless area 13 as the etching progresses. Therefore, near the boundary between the mask 12 and the maskless region 13, the mold base material 7 under the mask 12 is also etched. In the vicinity of the boundary between the mask 12 and the maskless region 13, the substrate for the mold base 7 under the mask 12 is also etched is referred to as a side etching.

The etching treatment in the first etching step is usually carried out using a ferric chloride (FeCl ₃ ) solution, a cupric chloride (CuCl ₂ ) solution, an alkaline etching solution (Cu (NH ₃ ) ₄ Cl ₂ ) But it is also possible to use a strong acid such as hydrochloric acid or sulfuric acid or use an inverse electrolytic etching in which a potential opposite to that at the time of electrolytic plating is applied. The concave shape formed on the mold base material at the time of performing the etching treatment varies depending on the kind of the base metal, the type of the photosensitive resin film, the etching method, and the like. However, if the etching amount is 10 m or less, Is etched approximately isotropically from the metal surface. The etching amount referred to here is the thickness of the substrate shaved by etching.

The etching amount in the first etching step is preferably 1 to 50 占 퐉, and more preferably 2 to 10 占 퐉. When the etching amount is less than 1 占 퐉, the irregular shape is hardly formed on the metal surface and the metal surface becomes a substantially flat mold, so that the film does not exhibit flicker resistance. When the etching amount exceeds 50 占 퐉, the difference in height of the concavo-convex shape formed on the metal surface becomes large, and there is a fear that color blurring may occur in the image display device using the anti-glare film produced using the obtained metal mold. The blurring of color refers to a phenomenon in which the entire display surface becomes white due to scattered light, and the display becomes a blurred color.

The etching treatment in the first etching step may be performed by one etching treatment, or may be performed two or more times. In the case where the etching treatment is divided into two or more times, it is preferable that the total etching amount in two or more etching treatments is within the above range.

[7] Photosensitive resin film peeling step

In the subsequent photosensitive resin film peeling step, the remaining photosensitive resin film used as a mask in the first etching step is dissolved and removed. In this step, the photosensitive resin film is dissolved by using a peeling solution. As the release liquid, the same developer as the above-mentioned developer can be used. When a negative photosensitive resin film is used by changing the pH, temperature, concentration or immersion time of the peeling solution, the photosensitive resin film of the non-visible portion is dissolved and removed in the case of using a positive photosensitive resin film of the exposed portion. A specific method of peeling is not particularly limited, and methods such as immersion peeling, spray peeling, brush peeling, and ultrasonic peeling can be used.

Fig. 7 (b) schematically shows a state in which the photosensitive resin film used as the mask in the first etching step is dissolved and removed by the photosensitive resin film peeling step. The first surface irregularities 15 are formed on the surface of the mold base material by etching using the mask 12 made of the photosensitive resin film.

[8] Second etching step

In the second etching step, the first surface irregularities 15 formed by the first etching step using the photosensitive resin film as a mask can be attenuated by the etching treatment. By this second etching treatment, there is no part where the surface inclination of the first surface relief shape 15 formed by the first etching treatment becomes steep, and the optical characteristics of the antireflection film produced using the obtained metal mold are preferable Direction. 7 (c), the first surface irregularity 15 of the mold base 7 is reduced by the second etching treatment, and the portion where the surface gradient becomes steep becomes dull, and the second There is shown a state in which the surface relief shapes 16 are formed.

The etching treatment of the second etching step is also conducted in the same manner as in the first etching step except that a solution of ferric chloride (FeCl ₃ ), cupric chloride (CuCl ₂ ), an alkali etching solution (Cu (NH ₃ ) ₄ Cl ₂ ) A strong acid such as hydrochloric acid or sulfuric acid may be used, or an inverse electrolytic etching may be employed in which a potential opposite to that at the time of electrolytic plating is applied. Since the degree of the unevenness of the unevenness after the etching treatment varies depending on the kind of the base metal, the etching method, and the size and depth of the unevenness obtained by the first etching step, it can not be said to be uniform. The factor is the etching amount. The amount of etching referred to here is also the thickness of the base material to be ground by etching in the same manner as in the first etching step. If the etching amount is small, the effect of slowing down the surface shape of the irregularities obtained by the first etching step is insufficient, and the optical characteristics of the diaphragm film obtained by transferring the irregular shape to the transparent film are not improved much. On the other hand, if the etching amount is too large, the irregularities disappear substantially, and the metal becomes a substantially flat mold, so that it is not deflected. Therefore, the etching amount is preferably in the range of 1 to 50 mu m, more preferably in the range of 4 to 20 mu m.

The etching treatment in the second etching step may be performed by one etching treatment, or may be divided into two or more times, as in the first etching step. In the case where the etching treatment is divided into two or more times, it is preferable that the total etching amount in two or more etching treatments is within the above range.

[9] Second plating process

Subsequently, chromium plating is performed to reduce the second surface relief shape 16 and protect the mold surface. 7 (d) shows a state in which the chromium plating layer 17 is formed on the second surface relief shape 16 formed by the etching treatment in the second etching step and the surface 18 of the chromium plating layer is made slow Are shown.

As the chromium plating, it is preferable to adopt a chromium plating which is glossy on the surface of a flat plate or a roll or the like, has a high hardness, a small coefficient of friction, and can give good releasability. Although such chromium plating is not particularly limited, it is preferable to use chromium plating, which is called "glossy chrome plating" or "decorative chromium plating", which exhibits good gloss. Chromium plating is usually carried out by electrolysis, and an aqueous solution containing chromic anhydride (CrO ₃ ) and a small amount of sulfuric acid is used as the plating bath. The thickness of the chromium plating can be controlled by adjusting the current density and the electrolysis time.

On the other hand, in the second plating step, plating other than chromium plating is not preferable. This is because in the plating other than chromium, the hardness and the abrasion resistance are lowered, so that the durability as a mold is lowered and the irregularities are worn out or the mold is damaged during use. In a light-diffusing film produced by using such a mold, it is highly likely that a sufficient antiglare function is hardly obtained, and the possibility of occurrence of defects on the light-diffusing film also increases.

As described above, it is preferable to use the chromium-plated surface as the uneven surface of the mold. By performing chromium plating on the surface on which the fine irregularities are formed, the irregularities are reduced and a mold having increased surface hardness can be obtained. The degree of the unevenness at this time varies depending on the type of the base metal, the size and depth of the unevenness obtained from the first etching step, the kind and thickness of the plating, and so on. The largest factor is the plating thickness. If the thickness of the chromium plating is small, the effect of slowing down the surface shape of the irregularities obtained before the chrome plating process is insufficient, and the optical characteristics of the diaphragm film obtained by transferring the irregular shape are not so good. On the other hand, if the plating thickness is excessively large, the productivity is deteriorated, and a protruding plating defect called nodule is generated. Therefore, the thickness of the chromium plating is preferably in the range of 1 to 10 mu m, more preferably in the range of 3 to 6 mu m.

The chromium plating layer formed in the second plating step is preferably formed so as to have a Vickers hardness of 800 or more, more preferably 1,000 or more. When the Vickers hardness of the chromium plated layer is less than 800, the durability at the time of using the mold decreases. The reason why the hardness is lowered by the chromium plating is that there is a high possibility that the plating bath composition, electrolytic conditions, It is likely to have an undesirable effect on the environment.

<Polarizer Polarizer>

Referring to Fig. 1, the polarizing plate of the present invention includes a polarizing film 104 and a polarizing film. The polarizing film 104 is disposed on the transparent support 102 side of the anti-glare film 1. In the example shown in Fig. 1, the polarizing film 104 is laminated on the surface of the transparent support 102 opposite to the antiglare layer 101 through the first adhesive layer 103a. The polarizing plate of the present invention is laminated on the polarizing film 104 opposite to the polarizing film 104 through the second adhesive layer 103b as in the example shown in Fig. 1 A transparent resin layer 105 may further be provided.

(1) polarizing film

As the polarizing film 104, a film in which a dichroic dye is adsorbed and oriented on a uniaxially stretched polyvinyl alcohol-based resin film is preferably used. The polyvinyl alcohol resin constituting the polarizing film 104 is obtained by saponifying a polyvinyl acetate resin. Examples of the polyvinyl acetate resin include polyvinyl acetate, which is a homopolymer of vinyl acetate, and copolymers of vinyl acetate and other monomers copolymerizable therewith. Examples of other monomers copolymerized with vinyl acetate include unsaturated carboxylic acids, olefins, vinyl ethers and unsaturated sulfonic acids. The degree of saponification of the polyvinyl alcohol-based resin is usually 85 to 100 mol%, preferably 98 to 100 mol%. The polyvinyl alcohol-based resin may also be modified. For example, polyvinyl formal or polyvinyl acetal modified with aldehydes may be used. The polymerization degree of the polyvinyl alcohol-based resin is usually in the range of 1,000 to 10,000, preferably 1,500 to 10,000.

The polarizing film 104 is a step of uniaxially stretching the polyvinyl alcohol based resin film, a step of dying the polyvinyl alcohol based resin film with a dichroic dye, a step of adsorbing the dichroic dye, a step of dichromatizing the dichroic dye- A step of treating the vinyl alcohol resin film with an aqueous solution of boric acid, and a step of washing with water after treatment with an aqueous solution of boric acid.

The uniaxial stretching may be carried out before dyeing with a dichroic dye, or with dyeing with a dichroic dye or after dyeing with a dichroic dye. When uniaxial stretching is carried out after dyeing with a dichroic dye, the uniaxial stretching may be carried out before the boric acid treatment or during the boric acid treatment. Of course, it is also possible to uniaxially stretch at a plurality of these steps. In order to uniaxially stretch, it may be uniaxially stretched between rolls having different circumferential velocities or may be uniaxially stretched using hot roll. Further, dry stretching may be used in which stretching is performed in the air, or wet stretching in which stretching is performed in a state of being swollen by a solvent. The stretching magnification is usually about 4 to 8 times.

In order to dye a polyvinyl alcohol-based resin film with a dichroic dye, for example, a polyvinyl alcohol-based resin film may be immersed in an aqueous solution containing a dichroic dye. As the dichroic dye, iodine or a dichroic dye is specifically used.

When iodine is used as the dichroic dye, a method in which a polyvinyl alcohol resin film is dipped in an aqueous solution containing iodine and potassium iodide is generally employed. The content of iodine in this aqueous solution is usually about 0.01 to 0.5 parts by weight per 100 parts by weight of water, and the content of potassium iodide is usually about 0.5 to 10 parts by weight per 100 parts by weight of water. The temperature of the aqueous solution is usually about 20 to 40 占 폚, and the immersion time in the aqueous solution is usually about 30 to 300 seconds.

On the other hand, when a dichroic dye is used as the dichroic dye, a method in which a polyvinyl alcohol resin film is dipped in an aqueous solution containing a water-soluble dichroic dye and dyed is employed. The content of the dichroic dye in the aqueous solution is usually about 0.001 to 0.01 part by weight per 100 parts by weight of water. The aqueous solution may contain an inorganic salt such as sodium sulfate. The temperature of the aqueous solution is usually about 20 to 80 占 폚, and the immersion time in the aqueous solution is usually about 30 to 300 seconds.

The boric acid treatment after dyeing with the dichroic dye is carried out by immersing the dyed polyvinyl alcohol resin film in an aqueous solution of boric acid. The content of boric acid in the aqueous solution of boric acid is usually about 2 to 15 parts by weight, preferably about 5 to 12 parts by weight, per 100 parts by weight of water. When iodine is used as the dichroic dye, it is preferable that the aqueous solution of boric acid contains potassium iodide. The content of potassium iodide in the aqueous solution of boric acid is usually about 2 to 20 parts by weight, preferably 5 to 15 parts by weight, per 100 parts by weight of water. The immersing time in the aqueous boric acid solution is usually about 100 to 1,200 seconds, preferably about 150 to 600 seconds, more preferably about 200 to 400 seconds. The temperature of the boric acid aqueous solution is usually 50 占 폚 or higher, preferably 50 to 85 占 폚.

The polyvinyl alcohol resin film after boric acid treatment is usually subjected to water washing treatment. The water washing treatment is carried out, for example, by immersing the boric acid-treated polyvinyl alcohol resin film in water. After washing with water, a drying treatment is carried out to obtain a polarizing film 104. The temperature of the water in the water washing treatment is usually about 5 to 40 占 폚, and the immersion time is usually about 2 to 120 seconds. The subsequent drying process can be performed using a hot-air dryer or a far-infrared heater. The drying temperature is usually 40 to 100 ° C. The treatment time in the drying treatment is generally about 120 to 600 seconds.

Thus, a polarizing film 104 comprising a polyvinyl alcohol-based resin film in which iodine or a dichroic dye is adsorbed and oriented can be obtained. The thickness of the polarizing film 104 is preferably in the range of 5 to 100 占 퐉, and more preferably in the range of 5 to 30 占 퐉. If the thickness of the polarizing film 104 is less than 5 占 퐉, sufficient optical characteristics may not be exhibited and the mechanical strength may be insufficient. On the other hand, when the thickness of the polarizing film 104 is more than 100 占 퐉, the polarizing plate 104 becomes thick, and as a result, glare may occur.

(2) Transparent resin layer

The transparent resin layer 105 may be a protective film for protecting the surface of the polarizing film 104. The protective film may be an optical compensation film. Specific examples of the protective film include triacetylcellulose film, amorphous polyolefin resin film, polyester resin film, (meth) acrylic resin film, polycarbonate resin film, polysulfone resin film, alicyclic polyimide resin film, etc. . Of these, films made of triacetylcellulose or an amorphous polyolefin resin are preferably used.

The amorphous polyolefin-based resin usually has a polymerization unit of a cyclic olefin such as norbornene or a polycyclic norbornene-based monomer, and may be a copolymer of a cyclic olefin and a chain olefin. Among them, a thermoplastic saturated norbornene resin is typical. It is also effective that a polar group is introduced. (Manufactured by JSR Corp.), Zeonoa (manufactured by Nippon Zeon Co., Ltd.), Zeonex (manufactured by Nippon Zeon Co., Ltd.), APO (manufactured by Mitsui Chemicals, Inc.) , Arpel (manufactured by Mitsui Chemicals, Inc.), and the like. When such an amorphous polyolefin-based resin as a commercially available product is used, the amorphous polyolefin-based resin can be formed into a film by a known method such as a solvent casting method or a melt extrusion method.

The transparent resin layer 105 may be an optical compensation layer (or an optical compensation film, hereinafter the same). The transparent resin layer 105 may be a laminate of a protective film and an optical compensation layer. The optical compensation layer is intended to compensate for retardation or the like, and includes a birefringent film made of a stretched film of transparent resin or the like; A film in which a discotic liquid crystal or a nematic liquid crystal is aligned and fixed; And the above-described liquid crystal layer formed on a film substrate. The optical compensation layer to be laminated on the polarizing film 104 may be a single layer or a plurality of layers. When a plurality of optical compensation layers are provided, the same type of optical compensation layers may be laminated, or different types of optical compensation layers may be laminated. For example, a birefringent film made of a stretched film of another transparent resin may be laminated on a birefringent film made of a stretched film of a transparent resin through a pressure-sensitive adhesive layer, or a birefringent film made of a stretched film of a transparent resin, Or nematic liquid crystals may be aligned and fixed.

Examples of the transparent resin constituting the birefringent film include polyolefins such as polycarbonate, polyvinyl alcohol, polystyrene, polymethyl methacrylate and polypropylene, polyarylate, polyamide and amorphous polyolefin resins. The stretched film may be treated by a suitable method such as uniaxial or biaxial stretching. A birefringent film in which the refractive index in the thickness direction of the film is controlled by applying a shrinking force and / or a stretching force in the state that the heat-shrinkable film is bonded to the film made of the transparent resin may be used as the optical compensation film.

The optical compensation layer may be bonded using an adhesive described later, or may be bonded using a pressure-sensitive adhesive (also referred to as a pressure-sensitive adhesive) described later from the viewpoints of simplicity of the bonding operation and prevention of optical distortion.

For example, when the polarizing plate is applied to a liquid crystal display, the optical compensation layer is appropriately selected in accordance with each driving mode of the liquid crystal cell. Examples of the driving mode of the liquid crystal include a vertical alignment (VA) mode, an in-plane switching (IPS) mode, and a twisted nematic (TN) mode.

In the case of a liquid crystal cell of the vertical alignment mode, a film made of a transparent resin having a positive refractive index anisotropy such as a cellulose-based resin represented by acylated cellulose such as triacetyl cellulose, a cyclic olefin-based resin or polycarbonate, _x> a film having a relationship of _y n ≥n _z can be used as an optical compensation layer. Where n _x is the refractive index in the in-plane slow axis direction of the film, n _y is the refractive index in the in-plane fast axis direction of the film, and n _z is the refractive index in the film thickness direction. Of these transparent resins, triacetyl cellulose and cyclic olefin resins are suitably used because they have a small photoelastic coefficient and little occurrence of in-plane characteristic unevenness due to thermal distortion under use conditions. It is also possible to use a film on which a discotic liquid crystal is applied on a substrate, a film formed by coating a cholesteric liquid crystal on a substrate at a short pitch, a film formed with a layer of an inorganic layer compound such as mica on a substrate, An optical compensation layer having a relationship of n _x ? N _y > n _z , such as a stretched film or a non-stretched solvent cast film, may be used.

In the case of a TN mode liquid crystal cell, an organic compound, a compound showing a liquid crystalline property and a discotic molecular structure, or a compound exhibiting a negative refractive index anisotropy due to an electric field or a magnetic field, A film which is applied on a transparent resin film made of acetyl cellulose or the like and is oriented such that the optical axis is inclined at 5 to 50 degrees in the film normal direction is preferably used as the optical compensation layer. The orientation may be not only one direction but also a so-called hybrid orientation in which the slope gradually increases from one side to the other side of the film, for example. Examples of organic compounds having a discotic molecular structure showing liquid crystallinity include discotic liquid crystals of low molecular weight or high molecular weight, such as triphenylene, tolylsene, benzene, and the like, with an alkyl group, an alkoxy group, And a straight chain substituent group such as an alkoxy-substituted benzoyloxy group are radially bonded. Among them, it is preferable that absorption is not seen in the visible light region. These discotic organic compounds having a molecular structure can be used not only singly but also in a mixture of two or more kinds, if necessary, or in the form of a polymer matrix or the like, in combination with other organic compounds Or the like. The organic compound to be mixed and used is not particularly limited as long as it is compatible with an organic compound having a discotic molecular structure or can disperse an organic compound having a discotic molecular structure to such an extent that light is not scattered . As a film in which a layer made of such a liquid crystalline compound is provided on a transparent base film made of a cellulose-based resin and the optical axis is inclined with respect to the film normal, for example, a WV film (manufactured by Fuji Shashin Film Co., Ltd.) . In addition, an organic compound having an elongated rod-like structure, particularly a compound having a nematic liquid crystal property and having a molecular structure giving a positive optical anisotropy, does not show liquid crystallinity, but has a positive refractive index anisotropy Is preferably formed on a transparent base film made of a cellulose resin or the like and oriented such that the optical axis is inclined at 5 to 50 degrees in the normal direction of the film. This orientation may be not only one direction but also a so-called hybrid orientation in which the slope gradually increases from one side to the other side of the film, for example. For example, an NH film (manufactured by Shin-Etsu Chemical Co., Ltd.) may be suitably used as a film in which a layer made of a nematic liquid crystal compound is provided on a transparent base film and an optical axis is inclined with respect to a film normal line.

The thickness of the transparent resin layer 105 is usually in the range of about 5 to 200 占 퐉, preferably 10 to 120 占 퐉, and more preferably 10 to 85 占 퐉.

(3) Adhesive layer

The anti-glare film (1) can be laminated on one side of the polarizing film (104) through the first adhesive layer (103a). When the transparent resin layer 105 is laminated, the transparent resin layer 105 can be laminated on the other surface of the polarizing film 104 through the second adhesive layer 103b.

As the adhesive forming the first adhesive layer 103a or the second adhesive layer 103b, conventionally known adhesives can be used. For example, a water-soluble adhesive using a polyvinyl alcohol resin, an adhesive using cationic polymerization of an epoxy resin, an adhesive using a radical polymerization of a (meth) acrylic resin, a cationic polymerization with a mixture of an epoxy resin and a (meth) An adhesive using polymerization, or the like can be used. The thickness of the adhesive varies depending on the kind of the adhesive, so it can not be said uniformly, but it is preferably within the range of 0.1 탆 to 5 탆. When the thickness of the adhesive layer is less than 0.1 占 퐉, sufficient adhesive strength may not be obtained. On the other hand, when the thickness of the adhesive layer exceeds 5 占 퐉, the thickness of the polarizing plate becomes large, and as a result, glare may occur.

Prior to bonding to the polarizing film 104, this adhesion treatment such as saponification treatment, corona treatment, primer treatment, and anchor coating treatment may be performed on the anti-glare film 1 and the transparent resin layer 105 .

(4) Pressure-sensitive adhesive layer

The polarizing plate of the present invention may have a pressure-sensitive adhesive layer for bonding the polarizing plate to an image display device. As a pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer, a pressure-sensitive adhesive composition comprising a (meth) acrylic polymer, a silicone polymer, polyester, polyurethane, polyether or the like as a base polymer can be used. Among them, a (meth) acryl-based pressure sensitive adhesive is preferred because it has excellent optical transparency, maintains adequate wettability and cohesive force, has excellent adhesiveness to a substrate, and further has weather resistance and heat resistance, It is preferable to select and use those that do not cause peeling problems such as peeling. As the base polymer of the (meth) acrylic pressure-sensitive adhesive, it is preferable to use an alkyl ester of a (meth) acrylic acid having an alkyl group having 20 or less carbon atoms such as a methyl group, an ethyl group or a butyl group, (Meth) acrylic copolymer having a (meth) acrylic monomer and a glass transition temperature of 25 占 폚 or less (preferably 0 占 폚 or less) and a weight average molecular weight of 100,000 or more.

The pressure-sensitive adhesive layer to be formed on the polarizing plate is prepared by dissolving or dispersing the pressure-sensitive adhesive composition in an organic solvent such as toluene or ethyl acetate to prepare a solution of 10 to 40% by weight and dispersing it in a polarizing plate (transparent resin layer 105 )), Or a method of forming a pressure-sensitive adhesive layer by previously forming a pressure-sensitive adhesive layer on a protective film and then transferring the pressure-sensitive adhesive layer onto a polarizing plate . The thickness of the pressure-sensitive adhesive layer is determined depending on its adhesive strength and the like, and is suitably in the range of about 1 to 25 μm.

<Image Display Device>

The present invention also provides an image display device comprising the above-described retardation film (1) or the retardation film polarizing plate according to the present invention and an image display element. The image display device is not particularly limited as long as it includes an image display device having a color filter, and examples thereof include a liquid crystal display device, an organic electroluminescence (EL) display device, and a plasma display panel. When the image display device is a liquid crystal display device, the image display device is a liquid crystal cell in which liquid crystal is enclosed between upper and lower substrates, and an image is displayed by changing the alignment state of the liquid crystal by applying a voltage.

1, in the image display apparatus according to the present invention, the image display element is disposed on the side of the transparent support 102 or the polarizing film 104 of the light-scattering polarizing plate, (On the side opposite to the color filter 400) of the image display element (more specifically, the substrate 300 such as a glass substrate constituting the image display element) with the side of the antiglare layer 101 facing outward . That is, the light-fastening film (1) or the light-diffusing polarizing plate according to the present invention is suitably used as a front-side polarizing plate, and the irregular surface (2) (On the viewer side) of the image display device. The light-scattering polarizing plate and the image display element can be bonded using the pressure-sensitive adhesive layer (200).

In the image display apparatus, the concavo-convex surface 2 of the antiglare layer 101 may be in contact with the air layer or in contact with another layer. For example, the image display apparatus may further include a light-transmissive member disposed on the outer surface (visual side) of the antiglare layer 101. In this case, the light-transmissive member may be formed of an antiglare layer 101 Or may be disposed on the viewer side of the antiglare layer 101 through the air layer. The light transmitting member may be, for example, a glass plate or the like, or may be a touch panel input element.

The distance L between the concave-convex surface and the color filter is less than 1 mm, preferably less than 0.75 mm. As a result, even when the film has a low haze, the film has excellent anti-glare properties and can effectively suppress glare. Further, from the viewpoint of the strength of the image display apparatus, the distance L is preferably 100 mu m or more.

Example

Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples. In the following examples, measurements or evaluations of physical properties of the retardation film and the polarizing plate were carried out as follows.

[1] Measurement of the surface shape of the light-diffusing film

(Measurement of surface elevation)

Using a three-dimensional microscope PL 占 2300 (manufactured by Sensofar Inc.), the surface of the film was measured for elevation. In order to prevent the sample from warping, an optically transparent pressure-sensitive adhesive was applied to the glass substrate such that the surface of the concavity and convexity was outside, and then used for measurement. When measuring, the magnification of the objective lens was set to 10 times. The horizontal resolutions [Delta] x and [Delta] y were 1.66 mu m and the measurement area was 1270 mu m x 950 mu m.

(Power spectrum of the elevation of the uneven surface)

Data of 512.times.512 (850 .mu.m.times.850 .mu.m as measured area) were sampled from the center of the measurement data obtained above, and the height of the irregular surface of the light-scattering film was obtained as a two-dimensional function h (x, y). The two-dimensional function h (x, y) is subjected to discrete Fourier transform to obtain a two-dimensional function H (f _x , f _y ). Two-dimensional function H (f _x, f _y) square by a two-dimensional function of two-dimensional power spectrum H ² (f _x, f _y) calculated and, in the one-dimensional power spectrum function of the distance f from the origin a one-dimensional function H ² (f ). As for each sample measured elevation of the surface of the five places, followed by an average value of one-dimensional function H ² (f) of the one-dimensional power spectrum calculated from these data to a one-dimensional function H ² (f) of the one-dimensional power spectrum of each sample. Further, by taking the average of the logarithm of the one-dimensional power spectrum dimensional function H ² (f) of the determined from the elevation of the surface of the five calculated logH ² (f), and on the basis of the equation (6) the spatial frequency f = The secondary derivative d ² logH ² (f) / df ² at 0.01 탆 ^-1 and 0.02 탆 ^-1 was obtained.

[2] Measurement of the haze of the film having a repulsive property

The haze of the antifogging film was obtained by bonding the antifogging film to the glass substrate on the side opposite to the antiglare layer forming side using an optically transparent pressure sensitive adhesive and measuring the antiglare film adhered to the glass substrate side And the haze meter "HM-150" type manufactured by Murakami Shikisai Co., Ltd. according to JIS K 7136 was used.

[3] Evaluation of visibility of polarizing plate

A liquid crystal display device produced by adhering a polarizing plate with a diffusing polarizing plate to the front side (viewing side) was made to be in a black display state in a bright room, and glare conditions and color blurring were visually confirmed and observed. Subsequently, a white display state was set in the bright room, and the glare was visually confirmed and observed. The evaluation criteria for glare condition, color blur and glare are as follows.

(Glare)

1: Glare is not observed.

2: A little glare is observed.

3: Glare is clearly observed.

(Blurring of color)

1: No blurring of color is observed.

2: A slight blur of color is observed.

3: Blur of color is clearly observed.

(flash)

1: No glare is recognized.

2: Very slight glare is observed.

3: A glow is observed.

&Lt; Example 1 >

(A) Production of polarizing film

A polyvinyl alcohol film having a thickness of 75 占 퐉, a degree of polymerization of 2400 and a degree of saponification of 99.9% or more was uniaxially stretched at a drawing magnification of 5 times in a dry manner and 0.05 parts by weight of iodine and 100 parts by weight of potassium iodide At 28 DEG C for 60 seconds. Subsequently, while maintaining the tension, the substrate was immersed in an aqueous solution of boric acid containing 73 parts by weight of boric acid and 6 parts by weight of potassium iodide per 100 parts by weight of water at 73 DEG C for 300 seconds. Thereafter, the substrate was rinsed with pure water at 15 DEG C for 10 seconds. The washed film was kept at 70 DEG C for 300 seconds while being kept in a stretched state to obtain a polarizing film.

(B) Fabrication of a mold for forming fine unevenness

(A5056 according to JIS) having a diameter of 200 mm was coated with copper ballard. The copper ballard plating is composed of a copper plating layer / a thin silver plating layer / a surface copper plating layer, and the thickness of the whole plating layer is set to be about 200 占 퐉. The copper-plated surface was mirror-polished, a polished copper-plated surface was coated with a photosensitive resin, and dried to form a photosensitive resin film. Next, a pattern in which a pattern (exposure pattern A) shown in Fig. 8 (which is formed by passing through a band-pass filter for removing a component in a specific spatial frequency range from a pattern having a random brightness distribution) is repeatedly formed is referred to as a photosensitive resin film Was exposed to laser light and developed. Exposure by laser light and development were carried out using Laser Stream FX (manufactured by Sink Laboratories). For the photosensitive resin film, a positive photosensitive resin was used.

Thereafter, the first etching treatment was performed with a cupric chloride solution. The etching amount at that time was set to be 4 占 퐉. The photosensitive resin film was removed from the roll after the first etching treatment, and the second etching treatment was performed again with the cupric chloride solution. The etching amount at that time was set to be 13 占 퐉. Thereafter, chrome plating was performed to produce mold A. At this time, the chromium plating thickness was set to be 4 占 퐉.

8 is a diagram showing a part (1 mm x 1 mm) of the image data of the exposure pattern A used in this embodiment. The image data of the exposure pattern A shown in Fig. 8 was 33 mm x 33 mm in size and was formed at 12800 dpi. This also applies to Figs. 9 to 14.

(C) Formation of flameproof film

Each of the following components was dissolved in ethyl acetate at a solid concentration of 60% by weight and an ultraviolet-curable resin composition A having a refractive index of 1.53 after curing was obtained.

Pentaerythritol triacrylate 60 parts by weight

Multifunctional urethane acrylate (reaction product of hexamethylene diisocyanate and pentaerythritol triacrylate) 40 parts by weight

Diphenyl (2,4,6-trimethoxybenzoyl) phosphine oxide 5 parts by weight

This ultraviolet ray curable resin composition A was applied on a triacetylcellulose (TAC) film having a thickness of 60 占 퐉 so that the coating thickness after drying was 4 占 퐉 and dried in a dryer set at 60 占 폚 for 3 minutes. The dried film was pressed against the uneven surface of the previously obtained mold A by a rubber roll so that the photo-curable resin composition layer was on the mold side. In this state, the light from the high-pressure mercury lamp with the intensity of 20 mW / cm 2 was irradiated on the TAC film side so as to have a hunted converted light quantity of 200 mJ / cm 2 to cure the photocurable resin composition layer. Thereafter, the TAC film was peeled from the mold for each of the cured resins, and a transparent light-retarding film A comprising a laminate of a cured resin having a concavo-convex surface and a TAC film was produced.

(D) Fabrication of Polarizer Polarizer

1.8 parts by weight of carboxyl group-modified polyvinyl alcohol &quot; Kurarefopal KL318 &quot; (having a degree of modification of 2 mol%) sold by Kuraray Co., Ltd. was dissolved in 100 parts by weight of water, and a water-soluble polyamide epoxy resin And 1.5 parts by weight of "Sumirez Resin 650" (aqueous solution having a solid content of 30% by weight) sold by Daoka Kagaku Kogyo Co., Ltd. were dissolved and dissolved to prepare a polyvinyl alcohol-based adhesive.

After the saponification treatment was performed on the opposite side of the side on which the antiglare layer of the antifogging film A was formed, the prepared polyvinyl alcohol adhesive was coated with a 10 탆 bar coater and the above obtained polarizing film was bonded. On the surface opposite to the surface of the polarizing film opposite to the surface to which the film A was bonded, a transparent protective film (KC4UE manufactured by Konica Minolta Opt Co., Ltd.) having a saponification treatment and having a thickness of 40 占 퐉 and made of triacetylcellulose, The difference R ₀ = 0.7 nm and the thickness direction retardation value R _th = -0.1 nm) was coated with the polyvinyl alcohol adhesive prepared above using a 10 탆 bar coater and then bonded. Thereafter, it was dried at 80 DEG C for 5 minutes and further cured at room temperature for 1 day. Thereafter, a pressure-sensitive adhesive layer was formed by adhering a (meth) acrylic pressure-sensitive adhesive layer formed on the protective film on the opposite side of the polarizing film to the side to which the polarizing film had adhered the film A to obtain a polarizing plate A.

(E) Fabrication of liquid crystal display device

(Polarizing plate) was peeled off from the front surface (viewing side) of a liquid crystal cell of a commercially available notebook computer (ZENBOOK UX21A, manufactured by ASUS, model 11.6, FHD) equipped with IPS mode liquid crystal cells, , And the absorption axis thereof was aligned with the absorption axis direction of the polarizing plate originally bonded to the liquid crystal cell to produce a liquid crystal panel. Subsequently, this liquid crystal panel was returned to its original position, and a liquid crystal display device A was produced. The distance (L) between the uneven surface and the color filter was 521 탆.

&Lt; Example 2 >

A mold B was produced in the same manner as in Example 1 except that the first etching amount at the time of producing the mold was 5 占 퐉 and the second etching amount was 13 占 퐉. Further, the retardation film B, the retardation polarizing plate B and the liquid crystal display B were produced in the same manner as in Example 1, except that the mold B was used. The distance (L) between the uneven surface and the color filter was 523 탆.

&Lt; Example 3 >

A mold C was produced in the same manner as in Example 1, except that the pattern (exposure pattern C) shown in Fig. 9 was used at the time of mold making and the first etching amount was 4.5 mu m. A retardation film C, a retardation polarizing plate C and a liquid crystal display C were produced in the same manner as in Example 1 except that the mold C was used. The distance (L) between the concave-convex surface and the color filter was 520 탆.

<Example 4>

A mold D was produced in the same manner as in Example 1, except that the pattern (exposure pattern D) shown in Fig. 10 was used at the time of mold production and the first etching amount was 4.5 탆. A retardation film D, a retardation polarizing plate D and a liquid crystal display D were produced in the same manner as in Example 1 except that the mold D was used. The distance (L) between the uneven surface and the color filter was 521 탆.

&Lt; Example 5 >

A mold E was produced in the same manner as in Example 1 except that the first etching amount at the time of producing the mold was 4 占 퐉 and the second etching amount was 12 占 퐉. A retardation film E, a polarizing plate E and a liquid crystal display E were produced in the same manner as in Example 1 except that the mold E was used. The distance (L) between the concave-convex surface and the color filter was 520 탆.

&Lt; Example 6 >

In order to peel the polarizing plate from the front surface of the liquid crystal cell of the notebook computer (ZENBOOK UX21A, manufactured by ASUS) and to increase the distance L between the uneven surface and the color filters, the (meth) acrylic pressure sensitive adhesive layer and the transparent (KC4UE manufactured by Konica Minolta Opt. Co., Ltd.) were alternately laminated in six layers, and the above-mentioned polarizing plate A was laminated so that its absorption axis coincided with the absorption axis direction of the polarizing plate originally bonded to the liquid crystal cell To produce a liquid crystal panel. Subsequently, this liquid crystal panel was returned to its original position, and a liquid crystal display device G was produced. The distance (L) between the uneven surface and the color filter was 708 탆.

&Lt; Comparative Example 1 &

A mold H was produced in the same manner as in Example 1, except that the pattern (exposure pattern H) shown in Fig. 11 was used at the time of mold making and the second etching amount was set at 12 mu m. A retardation film H, a retardation film polarizer H and a liquid crystal display H were produced in the same manner as in Example 1 except that the mold H was used. The distance (L) between the uneven surface and the color filter was 521 탆.

&Lt; Comparative Example 2 &

A mold I was produced in the same manner as in Example 1, except that the pattern (exposure pattern I) shown in Fig. 12 was used and the second etching amount was set at 12 占 퐉. A retardation film I, a retardation polarizing plate I and a liquid crystal display I were produced in the same manner as in Example 1 except that the mold I was used. The distance (L) between the uneven surface and the color filter was 522 탆.

&Lt; Comparative Example 3 &

A mold J was produced in the same manner as in Example 1, except that the pattern (exposure pattern J) shown in Fig. 13 was used and the second etching amount was 12 占 퐉. The retardation film J, the retardation film polarizer J and the liquid crystal display J were produced in the same manner as in Example 1 except that the mold J was used. The distance (L) between the concave-convex surface and the color filter was 520 탆.

&Lt; Comparative Example 4 &

The pattern K (exposure pattern K) shown in Fig. 14 was used at the time of mold making, and the mold K (thickness) was formed in the same manner as in Example 1, except that the first etching amount was 3 占 퐉 and the second etching amount was 10 占 퐉 . A retardation film K, a retardation type polarizing plate K and a liquid crystal display K were produced in the same manner as in Example 1 except that the mold K was used. The distance (L) between the uneven surface and the color filter was 524 탆.

15 shows the power spectrum G ² (f) obtained by performing discrete Fourier transform on the image data of the exposure patterns A, C, and D used in the fabrication of the repellency films A to E. 16 shows the power spectrum G ² (f) obtained by performing discrete Fourier transform on the image data of the exposure patterns H, I, J and K used in the fabrication of the light-blocking films H to K. FIG.

15, the one-dimensional power spectra of the exposure patterns A, C, and D used for the fabrication of the light-scattering films A to E are shown as the intensity with respect to the spatial frequency, and the graph shows the spatial frequency of 0.006 탆 ^-1 to 0.012 탆 ^-1 And 0.07 mu m- ¹ or more and 0.15 mu m- ¹ or less, respectively, and having a minimum value at a spatial frequency of 0.012 mu m- ¹ or more and 0.025 mu m- ¹ or less. On the other hand, FIG. 16 shows that the one-dimensional power spectrums of the exposure patterns H to I used for the fabrication of the retardation films H to I have the first and second maximum values and the minimum values in the above- Compared with the exposure patterns A, C and D in the used exposure pattern H, the first maximum value is small and the minimum value is large. Further, in the exposure pattern I used for the fabrication of the retardation film I, the first maximum value is smaller than the exposure patterns A, C, and D. In the one-dimensional power spectrum of the exposure pattern J used in the fabrication of the repellency film J, the first maximum value is significantly smaller and the second maximum value is outside the above-mentioned range. In the one-dimensional power spectrum of the exposure pattern K used for the fabrication of the repellent film K, the minimum value is larger than the exposure patterns A, C, and D, and the second maximum value exists outside the above-described range.

Table 1 shows the results of measurement and evaluation of physical properties of the retardation film and the polarizing plate obtained in Examples and Comparative Examples. Figs. 17, 18 and 19 show the one-dimensional power spectra H ² (f) calculated from the elevation angles of the diaphragm films A to C, the diaphragm films D and E and the diaphragm films H to K, respectively.

The retardation films A to E (Examples 1 to 6) satisfying the requirements of the present invention exhibited sufficient haze even though the haze was low, and no color blurring occurred. In particular, the spatial frequency of 0.01 ㎛ uneven ^surface, the power spectrum of the ^{1 2} ㎛ 2 or more room overt film A ~ D is, showed excellent room overt. Further, the flicker-resistant films A to E effectively suppressed flashing even when applied to a high-definition liquid crystal panel in which the distance L between the uneven surface-color filters was less than 1 mm.

On the other hand, room overt film H (Comparative Example 1) and a room overt film K (Comparative Example 4), the spatial frequency 0.01 ㎛ of the uneven ^surface, showed excellent room overt since the power spectrum of the ^first is more than ² ㎛ 2, The power spectrum at a spatial frequency of 0.033 mu m ^{&lt; -1 & gt} ; exceeded 0.05 mu m &lt; ² &gt; Room overt film I (Comparative Example 2), the spatial frequency 0.033 ㎛ of the uneven ^surface, showed an excellent glare suppressing effect due to the power spectrum in the ^first yeotgi 0.05 ㎛ ² or less, the spatial frequency 0.01 ^㎛-power spectrum in the ^first Was less than 1 mu m &lt; ^{2 &} gt ;, the antireflection property became insufficient. Room overt Film J (Comparative Example 3), the spatial frequency 0.01 ㎛ of the uneven ^surface, the power spectrum in the ^first neither 1 ㎛ ² or higher, spatial frequency 0.033 ^㎛-power spectrum of the ¹ 0.05 ㎛ ² below also Because it is not, the repulsion and the shining suppression were both insufficient.

In Examples 1 and 6, the same diopter film A is used, but the distance L between the uneven surface and the color filter is different. Since the power spectrum of the anti-glare film A at a spatial frequency of 0.033 mu m &lt; ^{-1 & gt} ; is not larger than 0.05 mu m &lt; ² &gt;, in Embodiments 1 and 6 in which the distance L between the uneven surface- color filters is 521 mu m and 708 mu m, Showed excellent glow suppressing effect.

Claims (8)

A transparent support and an antiglare layer having a concavo-convex surface laminated on the transparent support,
The uneven power spectrum of the altitude (標高) of the surface, the spatial frequency 0.01 ㎛ ^- in ^{1 1} ㎛ ² or more and, 0.033 ㎛ ^{- 1} 0.05 ㎛ ² or less in the room overt film. The retardation film for an image display device according to claim 1, having a color filter,
Wherein the distance from the surface of the concavities and convexities to the color filter when applied to the image display device is less than 1 mm. The film according to claim 2, wherein the distance is less than 0.75 mm. A polarizing plate comprising the retardation film according to any one of claims 1 to 3 and a polarizing film,
And the polarizing film is disposed on the transparent support side of the light-shielding film. A display device comprising the retardation film according to any one of claims 1 to 3 and an image display element,
And the image display element is disposed on the transparent support side of the light-shielding film. The image display apparatus according to claim 5, wherein the uneven surface is in contact with the air layer. A polarizing plate comprising the polarizing plate of claim 4 and an image display element,
And the image display element is disposed on the polarizing film side of the polarizing plate. The image display apparatus according to claim 7, wherein the uneven surface is in contact with the air layer.

Images