TW201137394A - Spatial light modulator, illumination optical system, exposure apparatus, and method for manufacturing device - Google Patents

Spatial light modulator, illumination optical system, exposure apparatus, and method for manufacturing device Download PDF

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Publication number
TW201137394A
TW201137394A TW099136304A TW99136304A TW201137394A TW 201137394 A TW201137394 A TW 201137394A TW 099136304 A TW099136304 A TW 099136304A TW 99136304 A TW99136304 A TW 99136304A TW 201137394 A TW201137394 A TW 201137394A
Authority
TW
Taiwan
Prior art keywords
spatial light
light modulator
mirror
optical system
illumination
Prior art date
Application number
TW099136304A
Other languages
English (en)
Chinese (zh)
Inventor
Norio Miyake
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW201137394A publication Critical patent/TW201137394A/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW099136304A 2009-12-10 2010-10-25 Spatial light modulator, illumination optical system, exposure apparatus, and method for manufacturing device TW201137394A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009280122 2009-12-10

Publications (1)

Publication Number Publication Date
TW201137394A true TW201137394A (en) 2011-11-01

Family

ID=44145406

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099136304A TW201137394A (en) 2009-12-10 2010-10-25 Spatial light modulator, illumination optical system, exposure apparatus, and method for manufacturing device

Country Status (2)

Country Link
TW (1) TW201137394A (ja)
WO (1) WO2011070853A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI676856B (zh) * 2018-09-27 2019-11-11 明基電通股份有限公司 投影系統

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11016287B2 (en) * 2018-11-08 2021-05-25 Silicon Light Machines Corporation High étendue spatial light modulator
CN116980576A (zh) * 2020-09-08 2023-10-31 青岛海信激光显示股份有限公司 激光投影设备
CN114779464A (zh) * 2022-05-24 2022-07-22 北京有竹居网络技术有限公司 光学信号调制器、控制方法及投影设备

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001350106A (ja) * 2000-06-05 2001-12-21 Seiko Epson Corp 薄膜ミラー素子及び薄膜ミラーアレイ
JP2002328315A (ja) * 2001-04-27 2002-11-15 Nec Corp ミラー駆動機構
JP4783558B2 (ja) * 2003-07-22 2011-09-28 日本碍子株式会社 アクチュエータ装置
JP4038685B2 (ja) * 2003-12-08 2008-01-30 独立行政法人科学技術振興機構 アクチュエータ素子
JP4561262B2 (ja) * 2004-09-09 2010-10-13 セイコーエプソン株式会社 アクチュエータ
JP2009009093A (ja) * 2007-05-28 2009-01-15 Konica Minolta Opto Inc 画像表示装置
WO2009078223A1 (ja) * 2007-12-17 2009-06-25 Nikon Corporation 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法
WO2010018612A1 (ja) * 2008-08-15 2010-02-18 パナソニック株式会社 導電性高分子アクチュエータおよびその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI676856B (zh) * 2018-09-27 2019-11-11 明基電通股份有限公司 投影系統

Also Published As

Publication number Publication date
WO2011070853A1 (ja) 2011-06-16

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