201128340 六、發明說明： 【發明所屬之技術領域】 本發明是關於一種藉由電動真空閥之排氣速度控制方 法、藉由電動真空閥之排氣速度控制系統、用於排氣速度 控制之電動真空閥之閥開度設定點決定方法以及用於排氣 速度控制之排氣速度決定程式’可使配置於反應室與真空 泵之間的電動真空閥的閥開度設定產生變化，以控制排氣 速度。 【先前技術】 過去以來，真空技術使用於多方面。例如，在半導體 製轾中，為達到避開粒子、污染物質及防止副生成物產生 等目的，使用真空技術來管理反應室之真空壓力。亦即， 藉由慢慢擴張配設於反應室與真空泵之間的真空排氣閥之 閥開度，來控制從反應室排出氣體的排氣速度，在不捲起 反應室内之堆積物的情況下，控制來自反應室之排氣流量 及排氣懲力。 例如，專利文獻1所記载之排氣速度控制方法使用一種 閥其具備可在真空排氣閥中控制大流量的母閥與控制小 流量的子閥。在此方法中，>第26圖所示，從排氣開始之 後的既定時間中，藉由關閉母閥並開啟子閥，使排氣速度 變慢’以慢速進行少量之排4 ’從#氣開料經過既定時 藉由使母閥變為全開狀態，加速排氣速度，進行大 流里之排氣。根據此種方法，相較於僅藉由母閥控制排氣 201128340 速度的情況’可在使真空壓力慢慢近似線性的狀態下下降。 J如在專利文獻2所記載之排氣速度控制方法中， 將根據從外部給予或預先設定於控制器的目標真空壓力變 二速度來算出的真空壓力值’在控制器中作為内部控制指 令依序產生，再將依序產生之内部指令作為回饋控制之目 標值依序變更’藉& ’使壓力感測器所測定出之真空壓力 實測值與目標值作比較，將回饋控制作為追蹤控制來進 行。根據此方法，將真空壓力變化速度（排^速度）R3控制 疋在來自大氣壓力之黏性流場V1〜v 6中，可根據所要 之壓力下降梯度使真空壓力產生線性變化（參照專利文獻 2)。 [專利文獻1]特開平1 1 -1 66665號公報 [專利文獻2]特開2000-1 63137號公報 【發明内容】 【發明所欲解決的課題】 然而’在專利文獻丨中所記載之排氣速度控制方法中， 只有藉由子閥所調節的電導係數和使母閥在全開狀態的電 導奋數這2個狀態，所以，若要得到在黏性流場中不影響處 理程序的真空壓力排氣速度條件並縮短排氣時間，會有限 制。 又’在專利文獻2中所記載之排氣速度控制方法中，為 了進行回饋控制’需要複雜之控制基板及控制程式等，裝 置成本相當高。 201128340 近年來’半導體使用於各種領域，針對反應室内之排 氣速度控制的要求變得多樣化。因此，藉由專利文獻2之排 氣速度控制方法而更低價且藉由專利文獻i之排氣速度控 制方法與專利文獻2之排氣速度控制方法之間之控制= 得以實現的排氣速度控制方法，—直是產業界所求。不過， 為了回應此種需求而產生的問題是，可能控制績效(精产、 應答性、穩定性等）因排氣配管群而異，而㈣氣速度可又能 在黏性流場對處理程序產生不良影響（捲起堆積物或對在 工件上形成之薄膜有影響）。排氣配管群之控卿效必須在 現場實測才能確認。又，為了排除對處理程序的不良影響， 在現場調整排氣速度需要專門知識，不是任何人皆能簡單 地勝任此工作。 本發明為解決上述問題點，曰@ ^ k门畸點目的在提供—種藉由電動 真空閥之排氣速度控制方法、藉由電動真空間之排氣速度 控制系統、用於排氣速度控制之電動真空間之閱開度設定 點決定方法以及用於排氣速度控制之排氣速度決定程式， 其可以簡早且低價之方或七 貝之方式5又疋用來切換電動真空閥之閥開 度的設定點，以使反應室之壓力近似目標壓力下降梯度。 【用以解決課題的手段】 又 為解決上述課題，本發明其中一個型態中之藉由電動 真空閥之排氣速度控制方法’藉由控制配設於連接反應室 與真空泵之排氣配管群的電動真空閥之閥開度，控制排氣 速度，其特徵在於：具有壓力實測程序，根據等比倍數階 段性控制上述電動真空閥之閥開度’對每個間開度皆藉由 201128340 上述真空泵從黏性流場進行排氣，並藉由壓力感測器測定 上述反應室之真空壓力，以實測壓力下降曲線；具有排氣 速度決定程序，為使上述壓力實測程序所實測出之各個閥 開度之上述壓力下降曲線近似目標壓力下降梯度，產生相 位差，將上述各個壓力下降曲線之交點決定為切換上述電 動真空閥之閥開度的設定點；又具有真空壓力控制程序， 根據上述排氣速度決定程序所決定之上述設定點，切換上 述電動真空閥之閥開度，以控制上述黏性流場中之上述排 氣速度。 上述構造宜具有用來設定上述等比倍數之等比倍數設 定程序。 上述構造宜具有用來設定上述目標壓力下降梯度之目 標壓力下降梯度設定程序。 在上述構造中，當上述真空壓力控制程序使上述壓力 感測器測定上述反應室之壓力且上述壓力感測器測定與上 述设定點對應之真空壓力時，宜切換上述電動真空閥之閥 開度。 上述構造宜具有與上述電動真空閥並列設置而連接至 上述反應室且可藉由上述真空閥控制大流量的大口徑真空 遮斷閥’在上述真空壓力控制程序中，於上述黏性流場關 閉上述大口徑真空遮斷閥之狀態下，切換上述電動真空閥 之閥開度以㈣上述排氣速度，從上述黏性流場脫離後， 或者，上述黏性流場之黏性變低後，調整上述大口徑真空 遮斷閥之閥開度’以控制上述排氣速度。 201128340 上述構造宜在上述真空壓力控制程序中，從上述黏性 流場脫離後’調整上述電動真空閥之閥開度，以控制上述 排氣速度。 為解決上述課題，本發明其中一個型態之排氣速度栌 制系統，藉由控制配設於連接反應室與真空泵之排氣配管 群的電動真空閥之閥開度，控.制排氣速度，其特徵在於： 具有壓力感測盗，測定反應室之壓力；具有壓力實測裝置， 根據等比倍數階段性控制上述電動真空閥之閥開度/對每 個閥開度皆藉由上述真空泵從黏性流場進行排a，並藉由 壓力感測器測.定上述反應室之真空壓力，以實測壓力^降 曲線；具有排氣速度決定裝置，為使上述壓力實測裴置所 實測出之各個閥開度之上述壓力下降曲線近似目標壓力下 降梯度，產生相位差，將上述各個壓力下降曲線之交點決 定為切換上述電動真空閥之閥開度的設定點；&具有真空 I力控制裝置’根據上述排氣速度決定裝置所決^之上述 設定點，切換上述電動真空閥之閥開度，以控制上述黏性 流場中之上述排氣速度。 上述構造宜具有與上述電動真空閥並列設置而連接至BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exhaust speed control method by an electric vacuum valve, an exhaust speed control system by an electric vacuum valve, and an electric motor for exhaust speed control. The valve opening degree set point determining method of the vacuum valve and the exhaust speed determining program for the exhaust speed control can change the valve opening degree setting of the electric vacuum valve disposed between the reaction chamber and the vacuum pump to control the exhaust speed. [Prior Art] Vacuum technology has been used in many ways in the past. For example, in semiconductor crucibles, vacuum technology is used to manage the vacuum pressure of the reaction chamber for the purpose of avoiding particles, contaminants, and preventing by-product formation. That is, by slowly expanding the valve opening degree of the vacuum exhaust valve disposed between the reaction chamber and the vacuum pump, the exhaust velocity of the gas discharged from the reaction chamber is controlled, and the deposit in the reaction chamber is not rolled up. Next, control the exhaust flow and exhaust gas refraction from the reaction chamber. For example, the exhaust gas velocity control method described in Patent Document 1 uses a valve having a mother valve that can control a large flow rate in a vacuum exhaust valve and a sub-valve that controls a small flow rate. In this method, as shown in Fig. 26, in the predetermined time after the start of the exhaust, the exhaust speed is slowed by closing the mother valve and opening the sub-valve, and a small number of rows are made at a slow speed. #气开料 After the mother valve is fully opened, the exhaust speed is accelerated and the exhaust in the large flow is performed. According to this method, the case where the exhaust gas is controlled by the mother valve only at the time of the 201128340 can be lowered in a state where the vacuum pressure is gradually and approximately linear. In the exhaust gas velocity control method described in Patent Document 2, the vacuum pressure value calculated based on the target vacuum pressure twice or externally set to the controller is used as an internal control command in the controller. The sequence is generated, and the internal command generated in sequence is sequentially changed as the target value of the feedback control, and the measured value of the vacuum pressure measured by the pressure sensor is compared with the target value, and the feedback control is used as the tracking control. Come on. According to this method, the vacuum pressure change rate (discharge speed) R3 is controlled to 疋 in the viscous flow fields V1 to v6 from atmospheric pressure, and the vacuum pressure can be linearly changed according to the desired pressure drop gradient (refer to Patent Document 2) ). [Patent Document 1] Japanese Laid-Open Patent Publication No. 2000-1 63137 (Patent Document 2) [Problems to be Solved by the Invention] However, the row described in the patent document 丨In the gas velocity control method, only the two states of the conductance coefficient adjusted by the subvalve and the conductance of the mother valve in the fully open state are obtained, so that a vacuum pressure row that does not affect the processing procedure in the viscous flow field is obtained. There are limits to gas speed conditions and shorter exhaust times. Further, in the exhaust gas velocity control method described in Patent Document 2, in order to perform feedback control, a complicated control substrate, a control program, and the like are required, and the device cost is relatively high. 201128340 In recent years, 'semiconductors have been used in various fields, and the requirements for exhaust gas velocity control in the reaction chamber have become diversified. Therefore, the control between the exhaust speed control method of Patent Document i and the exhaust speed control method of Patent Document 2 is lower by the exhaust speed control method of Patent Document 2, and the exhaust speed can be realized. The control method is straightforward for the industry. However, the problem in response to this demand is that the possible control performance (fine production, responsiveness, stability, etc.) varies depending on the exhaust piping group, and (iv) the gas velocity can be processed in the viscous flow field. Defective effects (rolling up deposits or affecting the film formed on the workpiece). The control effect of the exhaust piping group must be confirmed on site. Also, in order to eliminate the adverse effects on the processing program, it is necessary to adjust the exhaust speed in the field, and no one can easily do the job. In order to solve the above problems, the invention aims to provide an exhaust speed control method by an electric vacuum valve, an exhaust speed control system by an electric vacuum chamber, and an exhaust speed control method. The method for determining the opening degree set point of the electric vacuum chamber and the exhaust speed determining program for the exhaust speed control, which can be used to switch the electric vacuum valve in a simple and low-cost manner or in a seven-bed manner. The set point of the valve opening is such that the pressure in the reaction chamber approximates the target pressure drop gradient. [Means for Solving the Problem] In order to solve the above problems, in one of the modes of the present invention, the exhaust gas velocity control method of the electric vacuum valve is controlled by the exhaust pipe group disposed in the connection reaction chamber and the vacuum pump. The valve opening degree of the electric vacuum valve controls the exhaust speed, and is characterized in that: a pressure measuring program is adopted, and the valve opening degree of the electric vacuum valve is controlled according to the step ratio multiple stepwise for each opening degree by the 201128340 The vacuum pump exhausts from the viscous flow field, and measures the vacuum pressure of the reaction chamber by a pressure sensor to measure the pressure drop curve; and has an exhaust speed determining program for each valve actually measured by the pressure measuring program The pressure drop curve of the opening degree approximates the target pressure drop gradient, and generates a phase difference, and the intersection point of each of the pressure drop curves is determined as a set point for switching the valve opening degree of the electric vacuum valve; and a vacuum pressure control program is provided, according to the above row The above-mentioned set point determined by the gas speed determining program switches the valve opening degree of the electric vacuum valve to control The exhaust gas velocity of the viscous flow field. The above configuration preferably has an equal ratio setting program for setting the above-described equal ratio multiple. The above configuration preferably has a target pressure drop gradient setting program for setting the above-described target pressure drop gradient. In the above configuration, when the vacuum pressure control program causes the pressure sensor to measure the pressure of the reaction chamber and the pressure sensor measures the vacuum pressure corresponding to the set point, it is preferable to switch the valve opening of the electric vacuum valve. degree. Preferably, the above configuration has a large-diameter vacuum interrupting valve that is juxtaposed to the electric vacuum valve and connected to the reaction chamber and can control a large flow rate by the vacuum valve. In the vacuum pressure control program, the viscous flow field is closed. In the state of the large-diameter vacuum shutoff valve, after switching the valve opening degree of the electric vacuum valve to (4) the exhaust speed, after the viscous flow field is detached, or after the viscosity of the viscous flow field is low, The valve opening degree of the above-mentioned large-diameter vacuum interrupting valve is adjusted to control the above-mentioned exhaust speed. 201128340 In the above vacuum pressure control program, the valve opening degree of the electric vacuum valve is adjusted to be detached from the viscous flow field to control the exhaust speed. In order to solve the above problems, one of the exhaust gas speed tanning systems of the present invention controls the exhaust speed by controlling the valve opening degree of the electric vacuum valve disposed in the exhaust pipe group connecting the reaction chamber and the vacuum pump. The utility model is characterized in that: the pressure sensing thief is measured, the pressure of the reaction chamber is measured; and the pressure measuring device is provided, and the valve opening degree of the electric vacuum valve is controlled according to the step ratio multiple times/the opening degree of each valve is obtained by the above vacuum pump The viscous flow field is arranged in a, and the vacuum pressure of the reaction chamber is determined by a pressure sensor to measure the pressure drop curve; and the exhaust speed determining device is used to measure the pressure. The pressure drop curve of each valve opening degree approximates a target pressure drop gradient, and a phase difference is generated, and the intersection of the respective pressure drop curves is determined as a set point for switching the valve opening degree of the electric vacuum valve; & has a vacuum I force control device 'switching the valve opening of the electric vacuum valve according to the set point determined by the exhaust speed determining device to control the row in the viscous flow field Gas speed. The above structure preferably has a parallel arrangement with the above-mentioned electric vacuum valve and is connected to
述大口從真空遮斷閥之狀態 間開度以控制上述排氣速度，從 者，上述黏性流場之黏性變低後 異空閥控制大流量的大口徑 制裝置於上述黏性流場關閉 下’切換上述電動真空閥之 從上述黏性流場脫離後，或 斷閥之閥開度， 以控制上述排氣速度。 201128340 $解決上述課題，本發明#中一個型態之闕開度設定 點決疋方法，ϋ由控制配設於連接反應室與真空泵之排氣 配s群的電動真空閥之閥開度，決定將要切換控制排氣速 度時之上述電動真空閥之閥開度的設定點，其特徵在於： 〃有登力貫測程序，根據等比倍數階段性控制上述電動真 工閥之閥開度’對每個閥開度皆藉由上述真空泵從黏性流 場進行排氣’從壓力感測器所測定出之上述反應室之真空 壓力求出壓力下降曲線；又具有排氣速度決定程序，為使 上述壓力f測程序所求出之各個閥開度之上述麗力下降曲 線近似目私壓力下降梯度，I生相位差將上述各個壓力 下降曲線之交點決定為切換上述電動真空閥之閥開度的設 定點。 為解決上述課題，本發明其中一個型態之排氣速度決 疋知式，藉由控制配設於連接反應室與真空泵之排氣配管 群的電動真空閥之閥開度，設定將要切換控制排氣速度時 之上述電動真空閥之閥開度的設定點，其特徵在於：電腦 作為下面兩個裝置來運作，其中一個為壓力實測裝置，根 據等比倍數階段性控制上述電動真空閥之閥開度，對每個 閥開度皆藉由上述真空泵從黏性流場進行排氣，從壓力感 測器所測定出之上述反應室之真空壓力求出壓力下降曲 線，另一個為排氣速度決定裝置，為使上述壓力實測裝置 所求出之各個閥開度之上述壓力下降曲線近似目標壓力下 降梯度’產生相位差，將上述各個壓力下降曲線之交點決 定為切換上述電動真空閥之閥開度的設定點。 201128340 【發明效果】 上述發明為了使真空果、反應室及排氣配管群所產生 之控制成效直接反映在排氣速度上，根據等比倍數階段性 控制電動真空閥之閥開纟’對每個閥開度皆藉由真空泵從 黏u琢進仃排氣’並藉由壓力感測器測定反應室之真空 壓力’以實測出壓力下降曲線”亦即，使用電動真空閥設 置所在之裝置，針對每—個閥開度實測壓力下降曲線。然 後’為使實測出之每個閥開度之壓力下降曲線近似目標壓 下降梯纟i生相位差，此時，壓力下降曲線與其前一 個閥：度之壓力下降曲線交又。目此，將這些壓力、；降曲 線之交點決^ Μ來切換電動真空閥之閥開度的設定點。 如此，當根據等比倍數使閥開度產生變化時，與各個閥開 度對應之壓力下降曲線與目標壓力下降梯度近似的部分= 會重疊，所以，設定點不會設定得無意義。當進行真空壓 力控制時，根據設定點切換電動真空閥之閥開度，藉此， 變更排氣配管群之電導係數，控制黏性流場中之排氣速 度此時’電動真空閥在從反應室之壓力近似目標壓力下 降梯度之部分解除的同時，以等比倍數擴張閥開度，再次 使反應室之壓力近似目標壓力下降梯度並使其下降，所 以’反應室之壓力即使在黏性流場中也會在近似目標壓力 不降梯度的狀態下下降。 如此，在上述發明中，黏性流場中之壓力下降曲線藉 由使用電動真空閥設置所在之反應室、真空泵及排氣配^ 群來進行實測，所以，電動真空閥設置所在的控制績效、 201128340 對黏性流場中之處理程序所產生的不良影響等等可能會反 映在用來切換電動真空閥之閥開度的設定點的決定上。另 外，決$閥開度之設定點&人員即使不具備可排除對處理 程序產生不良影響的專門知識，可僅藉由實測壓力下降曲 線並使其近似目標壓力下降梯度以使壓力下降曲線產生相 位差，決定閥開度之設定點以使反應室之壓力近似目標壓 力下降梯度。結果，上述發明相較於在黏性流場藉由母間 與子閥對閥開度進行2段控制以控制排氣速度的情況，可在 黏性流場中不影響處理程序，得到真空壓力之排氣控制條 件，·縮短排氣速度。另彳’上述發明如同對排氣速度進行 回饋控制的情;兄，無法使反應室之壓力U直線狀下降但 即使不使用複雜之控制基板、控制程式等’相較於以子閥 及母閥控制排氣速度，也可控制排氣速度，使反應室之壓 力直線下降。 因此，根據上述發明，可簡單而低價地設定用來切換 電動真空閥之閥開度的設定點，以使反應室之壓力近似目 標壓力下降梯度。 上述發明可任意設定等比倍數。因此，若將等比倍數 設定得較小，可增加用來切換電動真空閥之閥開度的設定 點的數目，將設定點決定在靠近目標壓力下降梯度的位 置，使反應室之壓力產生平滑順暢的變化。另一方面，若 將等比倍數設定得較大，將實測之壓力下降曲線的數目減 少，可縮短決定閥開度之設定點的時間。因此，根據上述 發明，可藉由等比倍數之設定值，調整使反應室之壓力平 10 201128340 滑順暢變化的程度、可確保取得閥開度之設定點的時間， 進而將使用者之個別要求反映在排氣速度控制上。 上述發明可任意設定目標壓力下降梯度。因此，若想 將排氣時間縮短’彳以加大傾斜角度之方式設定目標壓力 下降梯度。另-方面’若想要慢慢排氣，彳以縮小傾斜角 度之方式設定目標壓力下降梯度。因此，根據上述發明， 可藉由目標壓力下降梯度之設定，冑整排氣時間及反應室 之壓力變化之程度，進而將使用者之個別要求反映在排氣 速度控制上。 上述發明在進行真空壓力控制時，藉由壓力感測器測 定並監控反應室之壓力，當測定了反應室之壓力對應於閥 開度之設定點的壓力之後，切換電動真空閥之閥開度。因 此，上述發明在因外部干擾而導致閥開度之設定點產生相 位差時，即使不配合該錯開來校正該閥開度之設定點之後 的閥開度設定點，也可在反應室之壓力近似線性目標壓力 下降梯度的狀態下控制排氣速度。 在上述發明中’與電動真空閥並列設置大口徑真空遮 斷閥’並連接至反應室’在黏性流場中，切換電動真空閥 之閥開度以控制排氣速度’超出黏性流場後，或者，上述 黏性流場之黏性變低後，調整可比電動真空閥控制更大流 量之大口徑真空遮斷閥’以控制排氣速度。如此，在容易 捲起堆積物之黏性流場中，可進行比電動真空閥更慢之排 氣動作，當超出黏性流場以至於捲起堆積物之疑慮變低 時’進行比大口徑真空遮斷閥更快之排氣動作，所以，可 11 201128340 使反應室之壓力在短時間内從大氣壓力到達目標真空壓 力。 在上述構造之發明中’從黏性流場脫離後，也可調整 電動真空閥之閥開度以控制排氣速度，所以，可在進—步 確實防止堆積物被捲起的情況下控制排氣速度。 【實施方式】 以下一邊參照圖面，一邊說明本發明之實施型態。 (第1實施型態） 第25圖表示減壓乾燥裝置1的概略構造。 本實施型態之排氣速度控制方法使用於第25圖所示之 減壓乾燥裝置1«減壓乾燥裝置i一方面在反應室1〇内保持 減壓狀態，亦即，真空狀態，一方面進行基板之塗膜乾燥 程序。減壓乾燥裝置1在反應室1〇與真空泵13之間設置排氣 配·#群16。排氣配管群16與電動真空閥21及大口徑真空遮 斷閥12並列設置。在減壓乾燥裝置i中，排氣配管群16、大 口徑真空遮斷閥12及電動真空閥21之設置數目根據反應室 1 〇之大小而增減。此種減壓乾燥裝置i藉由電動真空閥2义 及大口徑真空遮斷閥12，控制從反應室1〇排氣至真空泵13 中的排氣流量。 反應室ίο之真空壓力之管理主要依賴真空泵13之能 力。真空泵13之能力根據真空泵13之排氣速度s及到達真空 疋力P來決疋 般而s，在大氣壓力（105 Pa)以下、1〇〇 Pa 以上之黏性流場中，真空泵丨3之排氣速度§近乎固定，反應 12 201128340 室1 0内之氣體之流速根據反應室丨〇之形狀、真空泵1 3之排 氣速度S及排氣配管群16之電導係數c來決定。又，當以真 空泵1 3之公稱外徑為基準來構成排氣配管群丨6時，實效排 氣速度幾乎接近真空泵13之排氣速度S。換言之，排氣配管 群16之電導係數C變大。 因此’在本實施型態之減壓乾燥裝置1中，排氣配管群 1 6以真空果1 3之公稱外徑為基準而構成。另外，電動真空 果21為了控制黏性流場中之排氣速度s，設置於用來連接反 應室10與真空泵13的排氣配管群16上。在此種情況下，電 動真空泵21之電導係數之大小成為真空泵13之排氣速度s 之支配要素。具體來說，排氣配管群16之電導係數C及真空 泵1 3之排氣速度s根據被稱為電子電路的並聯電阻的合成 式來決定。亦即，當藉由排氣配管群丨6之電導係數c在充分 窄縮閥開度之流場使用電動真空閥21時，排氣配管群16之 電導係數c幾乎藉由電動真空閥21之電導係數來決定，當以 將近全開之狀態使用電動真空閥21而設定為近似排氣配管 群16之電導係數c的條件時，會變成電動真空閥以之電導係 數會導致排氣配管群16之電導係數c下降的狀態。 然而，當對反應室10從大氣壓力（1G5Pa)開始抽出低真 空（105Pa以下’騰㈣上）、中真空uma以下，101Pa 以上）、冑真空（1〇心以下）時’在排氣配管群16中流動的 氣體流產生了黏性流、中間流、分子流的變化。在從大氣 壓力開始抽真空之後隨即出現的黏性流場（大氣壓力 (105Pa)以下，i〇()pa以上）中，若突然將電動真空㈣大 13 201128340 口控真空遮斷閥12之閥開度控制在全開附近，會捲起反應 室10内之堆積物’附著於基板上，有可能損傷基板本身。 另一方面’當使電動真空閥21、大口徑真空遮斷閥之閥 開度變得足夠小以避免捲起反應室丨〇内之堆積物時，排氣 速度變慢’需要長時間才能使反應室1 〇内之真空壓力到違 目標真空壓力。 因此’第25圖所示之減壓乾燥裝置1在開啟大口徑真空 遮斷閥12之前’藉由多段變化電動真空閥21之閥開度，使 反應室10内之真空壓力從大氣壓力狀態，以到真空狀態近 似線性目標壓力下降梯度的狀態下降，如此，控制從反應 室1 〇排出氣體的排氣速度。減壓乾燥裝置1藉由壓力感測器 15測定反應室1〇之真空壓力，當從壓力感測器15之壓力測 定結果檢測出反應室丨0内之真空壓力已經到達既定壓力 時，開啟大口徑真空遮斷閥12以增加排氣流量。藉由此種 排氣速度控制’減壓乾燥裝置1可在從大氣壓力狀態到真空 狀態時’不捲起反應室1 〇内之堆積物而使其附著於基板 上、損傷基板本身等，在此情況下，進行排氣量之調節並 縮短排氣時間。 〈排氣速度控制系統之概略構造〉 第1圖為本發明第1實施型態之排氣速度控制系統66的 概略構造圖。 第1圖所示之排氣速度控制系統66由伺服器61、網際網 路6 2、個人電腦6 3、減壓乾燥裝置1之控制器6 5、壓力感測 器15、電動真空閥21及真空泵13所構成。 14 201128340 在第1圖所示之伺服器61中，儲存有排氣速度決定程 式，當控制從反應室1 〇排出氣體的排氣速度時，其用來決 定切換電動真空閥21之閥開度的設定點。伺服器61透過網 際網路6 2以可通信之狀態連接至個人電腦6 3。 個人電腦63為一般習知的電腦。個人電腦63連接至伺 服61下載排氣速度決定程式。又，個人電腦6 3用來設 疋控制排氣速度時使電動真空閥21之閥開度產生變化的等 比倍數、使反應室i 〇之壓力下降的目標壓力下降梯度。個 人電腦63將所下載之排氣速度決定程式、設定好之等比倍 數、S又疋好之目標壓力下降梯度儲存於USB記憶體64中.。 第1圖所示之控制器65與USB記憶體64連接，從排氣速 度決定程式、設定好之等比倍數、設定好之目標壓力下降 :度從USB記憶體64複製過來。在控制器⑺上，設有用來決 广刀換電動真空閥21之㈣度之設定點的準備模式、根據 準備模式所決定之設定點控制排氣速度並選取用來進行處 理程序之執行模式的選取裝置65a。 〃控制器65在藉由選取裝置65a選取出準備模式時，執行 H速度心程式。在此情況下，控制器65根據等比倍數 白#又性控制電動真空闕 … 閲21之間開度’以此種方式對電動真 二閥21輸出閥開度於告 動真空㈣幻制器65針對每個間開度驅 4 4進行排氣，取得塵力感測器15測 疋出之壓力測定資料。 定眘祖 、 ，控制器6 5從所取得之壓力測 疋貧科針對每個閥開产 時間之Μ ^「 出反應室1〇之壓力與 關係的I力下降曲線（參照第5圖之Υ1，Υ2, γ4, 201128340 Υ8 ) ’使每個閥開度之壓力下降曲線近似目標壓力下降梯度 (參照第6圖之X)，產生相位差，將壓力下降曲線之交點決 定為用來切換電動真空閥2丨之閥開度的設定點（參照第6圖 之Pll， Ρ12， Ρ13)。 另外’當控制器65藉由選取裝置65選取出執行模式 時’根據決定好之設定點Ρ11，ρΐ2，ρι3(參照第6圖），將 用來切換電動真空閥21之閥開度的閥開度切換信號輸出至 電動真空閥21 ’控制黏性流場中之真空泵13的排氣速度。 此種控制器65相當於「壓力實測裝置」、「排氣速度 決定裝置」及「真空壓力控制裝置」之一例。 〈電動真空閥之構造> 第2圖為電動真空閥21的剖面圖，表示閉閥狀態。 在電動真空閥21中，球體24與汽缸體25藉由螺栓55一 體化，汽缸體25、上蓋26及步進馬達27藉由螺栓28—體化， 以構成外觀。 在閥部22上，開口於球體24之第一連接埠51舆第二連 接埠52透過閥室53來連通。 在閥至5 3中有第一連接槔51開口之開口部外周上，以 平坦狀態設置閥座54。閥室53收納有銜接至閥座54或與之 分離的閥體42。 在閥部22上，開口於球體24之第一連接埠51與第二連 接埠52透過閥室53來連通。 在閥室5 3内之第一連接埠51開口之開口部外周上，以 平坦狀態設置閥座54。閥室53收納有銜接至閥座54或與之 16 201128340 分離的閥體4 2。 驅動部23將步進馬達27之旋轉運動轉換為直線運動， 傳達至閥體42。步進馬達27之輸出軸30突出至上蓋26與汽 缸體25之間形成的收納空間部31。在上蓋26與汽缸體25之 間，失持有軸承32，該軸承32使夾具33以自由旋轉之狀態 又到支持。在夹具33之上端部，輸出軸3〇連結至耦合器58， 在下端部，以複數個固定釘35固定輸送釘螺帽，於是輸 送釘螺巾a 34之旋轉量可藉由步進馬達27之旋轉量控制。 匕驅動軸37插通旋轉中止螺帽38，其以固定釘39固定於 Μ體25上。在驅動轴37上’剖面形狀形成六角形之旋轉 中止轴部37a插通在旋轉中止螺帽38上形成的六角形旋轉 中止孔38a’在限制旋轉之狀態下朝軸方向進行往復直線運 輸送釘軸36螺合至輸送釘螺帽34，與驅動軸之上端 #接合’將輸送釘螺帽34之旋轉運動轉換為朝向軸方向之 直線運動，傳達至驅動軸37。 在驅動⑽之下端部，龍42透料結元件4G與其連 =°間體42具備波紋軟管圓盤47、球體圓盤48及撞板49, :、：成方式為’將它們重疊起來，藉由連結螺帽43固定至 連、。兀件4°上’以成為-體。環狀密封元件5。由彈性可變 I之材質所構成’裝載於在波紋軟管圓盤π與球體圓盤^ 之間所形成的桶頂槽上。回歸彈簧44收縮設置於彈簧座45 Γ吊將閥體42偏置於閥座54那個方向。連結元件40 广彈箬44住軸方向，以結合銷41連結至驅動轴37，藉由回 …44之彈菁扭力賦予密封負荷。波紋軟管46之上端部 17 201128340 /谷接至；α红體2 5與球體2 4被夾持之炎持部4 6 a，下端部溶接 至波紋軟管圓盤47。隨著閥體42之上下移動，在閥室53内 伸縮，在驅動軸37之滑動部等部位所產生的粒子不會流到 流道内。 在此’於步進馬達27上’固定有用來量測未圖示出之 轉子之機械旋轉變位量的編碼器29。編碼器29以可通信之 狀態連接至減壓乾燥裝置i之控制器65上，將量測結果輸出 至控制器65。控制器65連接至步進馬達27之未圖示出之線 圈，根據編碼器29之量測信號對未圖示出之線圈供給電力 (閥開度控制信號），以控制電動真空閥21之.間開度。 在此種電動真空閥21上，通常閥體42銜接至閥座54， 在第連接蟑51及第二連接埠52之間產生遮斷作用。當步 進馬達2 7從此狀態旋轉至正方向時，輸送釘螺帽3 4透過夾 具33與輸出軸3〇為一體地旋轉，該旋轉運動轉換為朝向圖 中上方（閥開方向）之直線運動，傳達至輸送軸36。驅動軸 37與輸达釘軸36為一體地上升，透過連結元件μ拉上閥體 42。藉此，閥體42與閥座54分離，使第一及第二連接埠51， 52連通。電動真空閥21在使環狀密封元件5〇之彈性變形量 產生變化的流場中，可藉由流㈣漏來控制微小流量。再 者，在間體42與閥座54分離的流場，可根據分離量控制排 氣流量。此閥開度藉由步進馬達27之未圖*出之轉子 轉量來控制。 疋 另-方面，當步進馬達27朝負方向旋轉時輪送 目4與輸出軸3〇為一體地朝負方向旋轉使輪送釘軸％下 18 201128340 降。驅動軸37與輸送釘軸36為一體地下降，透過連社元 4〇使閥體42銜接至_心料，在《伽接至閱座54 後’回歸彈簧44將閱體42向下推向闊座54那側，達到連結 元件40與結合銷41之腎宓拉人& Α „ '° 月^心緊在接合程度，使環狀密封元件5〇 合至閥座54上’進行密封。 〈關於壓力下降曲線> 第3圖表示在大氣壓力附近之黏性流場（大氣壓力 (105Pa)以下’ l〇〇Pa以上）中使閥開度以相同比率變化時之 壓力下降曲線π，Υ2, Υ3, Υ4, Υ5, γ6, γ7, γ8。縱轴代 表真空壓力（Pa)’橫軸代表時間（se〇。第4圖表示第3圖所 示之使壓力下降曲線Y1, Y2，Y3’ Y4, Y5’ γ6, γ7 %近 似目標壓力下降梯度Χ而產生相位差的狀態。縱轴代 壓力，橫轴代表時間。 第3圖及第4圖之縱軸上所記載之真空壓力沒有維度， 1.0在大氣壓力下作為u 1 325x贿a。又，第3圖之橫:上 所記載之時間之數字是為方便而附加上的，實際上不一定 要限定於這樣的時間。第3圖及第4圖所示之Y1〜γ8代表將 電動真空閥21之閥開度擴張至一定之大小時對每個閥開度 的壓力下降曲線。壓力下降曲線Y1〜γ8以無維度表示電動 真空閥21之能力，在字母γ後添加的數字的大小代表產生流 動能力之大小。第4圖之X為表示反應室1〇之壓力之目標變 化率的目標壓力下降梯度。第3圖及第4圖之χι〜χ8代表找 到壓力下降曲線Υ1〜Υ8中近似目標壓力下降梯度χ之部分 的結果。 19 201128340 如第3圖所示’當從壓力下降曲線Y1朝向壓力下降曲線 Y8使電動真空閥21之閥開度以一定之大小階段性（例如每 次1 mm )擴張時，壓力下降曲線Y1〜Y 8中近似目標壓力下降 梯度X之近似部分XI〜X8隨著閥開度之擴張而減少。這是因 為閥開度越是擴張，真空壓力之壓力越是描繪出更大之曲 線而顯出下降之趨勢。 又’如第3圖所示’壓力下降曲線γι〜γ8之近似部分η 〜X8在閥開度擴張得越大時，就越增加重疊之部分。亦即， 若壓力下降曲線Y2，Y3，Y4之近似部分Χ2, Χ3，X4，壓力 下降曲線Y3之近似部分X3與壓力下降曲線γ2之近似部分χ 2部分重疊，同時’與壓力下降曲線γ4之近似部分Χ4部分重 疊。又，壓力下降曲線Υ4〜Υ8之近似部分Χ4〜Χ8相互重疊。 因此，如第4圖所示，在使壓力下降曲線γ2〜γ8近似目 標壓力下降梯度X而沿著時間軸移動的情況下，使電動真空 閥21之閥開度從與壓力下降曲線γ 1對應之閥開度擴張到與 壓力下降曲線Υ 2對應之閥開度後’在壓力下降曲線γ 2之目 標壓力下降梯度Χ2之中途，使電動真空閥21之閥開度從與 壓力下降曲線Υ 2對應之閥開度擴張到與壓力下降曲線γ 3對 應之閥開度。然後，在使電動真空閥21之閥開度從與壓力 下降曲線Υ3對應之閥開度擴張至與壓力下降曲線Η對應之 閥開度後，隨即使電動真空閥21之閥開度從與壓力下降曲 線Υ5對應之閥開度擴張至與壓力下降曲線γ6對應之閥開 度，然後又隨即使電動真空閥21之閥開度從與壓力下降曲 線Υ6對應之閥開度擴張至與壓力下降曲線γ7對應之閥開 20 201128340 度°再進一步’使電動真空閥21之閥開度從與壓力下降曲 線Y7對應之閥開度擴張至與壓力下降曲線Y8對應之間開 度，從反應室1 0抽出絕對真空。亦即，如第4圖所示，當將 電動真空閥21之閥開度擴張至一定之大小時’必須在變更 閥開度之設定點之後隨即變更下一個閥開度的設定點為哪 一點的問題在此產生。此種設定點在實質上無益於排氣控 制’為無意義的設定點。 〈關於真空壓力特性> 如上所述’在變更電動真空閥21之閥開度並實測壓力 下降曲線的過程中’發明團隊發現，以等比倍數擴張閥開 度’使針對各個閥開度所得到之壓力下降曲線近似目標展 力下降梯度X ’若設定用來切換電動真空閥21之閥開度的時 間點，可不使壓力下降曲線中近似目標壓力下降梯度χ的部The large opening is controlled by the opening degree of the vacuum interrupting valve to control the exhausting speed. The viscosity of the viscous flow field is low, and the large-diameter device for controlling the large flow rate by the different space valve is used in the viscous flow field. Closing the 'opening of the above-mentioned electric vacuum valve from the viscous flow field, or breaking the valve opening degree to control the above-mentioned exhaust speed. 201128340 $Solution of the above problem, a method for setting the opening degree of the present invention in the present invention, and controlling the valve opening degree of the electric vacuum valve disposed in the exhaust gas distribution group connected to the reaction chamber and the vacuum pump, and determining to switch The set point of the valve opening degree of the above-mentioned electric vacuum valve when controlling the exhaust speed is characterized in that: 〃 There is a load-testing procedure, and the valve opening degree of the above-mentioned electric real-life valve is controlled stepwise according to a proportional multiple The valve opening degree is obtained by the vacuum pump from the viscous flow field, and the pressure drop curve is obtained from the vacuum pressure of the reaction chamber measured by the pressure sensor; and the exhaust speed determining program is used to make the pressure The above-mentioned Lili descent curve of each valve opening degree obtained by the f test program approximates the visual private pressure drop gradient, and the I phase difference determines the intersection of the above respective pressure drop curves as the set point for switching the valve opening degree of the electric vacuum valve. . In order to solve the above problems, the exhaust speed of one of the types of the present invention is determined by controlling the valve opening degree of the electric vacuum valve disposed in the exhaust pipe group connecting the reaction chamber and the vacuum pump, and the switching control row is set to be switched. The set point of the valve opening of the above-mentioned electric vacuum valve at the gas velocity is characterized in that the computer operates as the following two devices, one of which is a pressure measuring device, and the valve opening of the electric vacuum valve is controlled stepwise according to a proportional multiple. Degree, each valve opening is exhausted from the viscous flow field by the vacuum pump, and the pressure drop curve is obtained from the vacuum pressure of the reaction chamber measured by the pressure sensor, and the other is determined by the exhaust speed. The device generates a phase difference by causing the pressure drop curve of each valve opening degree obtained by the pressure measuring device to approximate a target pressure drop gradient, and determining an intersection of the respective pressure drop curves to switch a valve opening degree of the electric vacuum valve. Set point. 201128340 [Effect of the Invention] In order to directly reflect the control effect of the vacuum fruit, the reaction chamber, and the exhaust pipe group on the exhaust speed, the above-described invention controls the valve opening of the electric vacuum valve in stages according to the equal ratio multiple The valve opening degree is measured by the vacuum pump from the viscous enthalpy and the vacuum pressure of the reaction chamber is measured by a pressure sensor to measure the pressure drop curve, that is, the device using the electric vacuum valve is set, The pressure drop curve is measured for each valve opening. Then, the pressure drop curve for each valve opening is approximated by the target pressure drop. The pressure drop curve and its previous valve: The pressure drop curve is again and again. Therefore, the intersection point of these pressures and the falling curve is determined to switch the set point of the valve opening of the electric vacuum valve. Thus, when the valve opening degree is changed according to the equal ratio multiple, The pressure drop curve corresponding to each valve opening degree and the target pressure drop gradient approximation part = will overlap, so the set point will not be set meaningless. When vacuum pressure control is performed During the system, the valve opening degree of the electric vacuum valve is switched according to the set point, thereby changing the conductance coefficient of the exhaust pipe group and controlling the exhaust velocity in the viscous flow field. At this time, the electric vacuum valve is approximated in pressure from the reaction chamber. While the part of the target pressure drop gradient is released, the valve opening is expanded by an equal ratio multiple, and the pressure in the reaction chamber is again approximated to the target pressure drop gradient and lowered, so that the pressure in the reaction chamber will be even in the viscous flow field. Therefore, in the above-mentioned invention, the pressure drop curve in the viscous flow field is measured by using the reaction chamber, the vacuum pump, and the exhaust gas distribution group in which the electric vacuum valve is disposed. Therefore, the control performance of the electric vacuum valve setting, the adverse effects of 201128340 on the processing procedure in the viscous flow field, etc. may be reflected in the decision to switch the set point of the valve opening of the electric vacuum valve. In addition, the setpoint of the valve opening and the personnel can only use the measured pressure even if they do not have the expertise to eliminate the adverse effects on the processing procedure. The curve is lowered and approximated to the target pressure drop gradient so that the pressure drop curve produces a phase difference, and the set point of the valve opening is determined such that the pressure of the reaction chamber approximates the target pressure drop gradient. As a result, the above invention is compared to the viscous flow field. By controlling the valve opening degree by the two-stage control of the valve opening between the mother and the sub-valve, the process can be controlled without affecting the processing procedure in the viscous flow field, and the exhaust pressure control condition of the vacuum pressure can be obtained, and the exhaust speed can be shortened.彳 上述 'The above invention is like the feedback control of the exhaust speed; brother, can not make the pressure U of the reaction chamber linearly reduced, but even without the use of complex control boards, control programs, etc. compared to the sub-valve and the female valve By controlling the exhaust speed, the exhaust speed can also be controlled to linearly lower the pressure in the reaction chamber. Therefore, according to the above invention, the set point for switching the valve opening degree of the electric vacuum valve can be set simply and inexpensively to make the reaction The pressure in the chamber approximates the target pressure drop gradient. The above invention can arbitrarily set the geometrical multiple. Therefore, if the equalization multiple is set smaller, the number of set points for switching the valve opening degree of the electric vacuum valve can be increased, and the set point is determined to be close to the target pressure drop gradient, so that the pressure in the reaction chamber is smoothed. Smooth changes. On the other hand, if the equal multiplier is set to be large, the number of measured pressure drop curves is reduced, and the time for determining the set point of the valve opening degree can be shortened. Therefore, according to the above invention, it is possible to adjust the degree to which the pressure in the reaction chamber is smoothly changed by the set value of the multiple of the multiple, and to ensure the time at which the set point of the valve opening degree is obtained, and further the individual requirements of the user. Reflected in the exhaust speed control. The above invention can arbitrarily set the target pressure drop gradient. Therefore, if you want to shorten the exhaust time, you can set the target pressure drop gradient by increasing the tilt angle. On the other hand, if you want to slowly exhaust, set the target pressure drop gradient in such a way as to reduce the tilt angle. Therefore, according to the above invention, the degree of change in the exhaust time and the pressure in the reaction chamber can be adjusted by the setting of the target pressure drop gradient, and the individual requirements of the user can be reflected in the exhaust speed control. In the above invention, when the vacuum pressure control is performed, the pressure of the reaction chamber is measured and monitored by the pressure sensor, and when the pressure of the reaction chamber corresponds to the pressure at the set point of the valve opening degree, the valve opening degree of the electric vacuum valve is switched. . Therefore, in the above invention, when a phase difference occurs at a set point of the valve opening degree due to external disturbance, the pressure in the reaction chamber can be suppressed even if the valve opening degree set point after the set point of the valve opening degree is corrected without matching the shift. The exhaust velocity is controlled in a state where the linear target pressure drop gradient is approximated. In the above invention, 'the large-diameter vacuum interrupting valve is disposed in parallel with the electric vacuum valve and connected to the reaction chamber' in the viscous flow field, and the valve opening degree of the electric vacuum valve is switched to control the exhaust speed 'beyond the viscous flow field Thereafter, or after the viscosity of the viscous flow field is lowered, a large-diameter vacuum interrupting valve that can control a larger flow rate than the electric vacuum valve is adjusted to control the exhaust speed. In this way, in the viscous flow field where the deposit is easily rolled up, a slower exhaust operation than the electric vacuum valve can be performed, and when the viscous flow field is exceeded and the doubt that the pile is rolled up becomes low, the ratio is larger than that of the large diameter. The vacuum interrupting valve has a faster exhausting action, so, 11 201128340 allows the pressure in the reaction chamber to reach the target vacuum pressure from atmospheric pressure in a short time. In the invention of the above configuration, after the detachment from the viscous flow field, the valve opening degree of the electric vacuum valve can be adjusted to control the exhaust speed, so that the row can be controlled while the stack is prevented from being rolled up. Gas speed. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the drawings. (First embodiment) Fig. 25 shows a schematic structure of the vacuum drying apparatus 1. The exhaust gas velocity control method of the present embodiment is used in the vacuum drying apparatus 1 «the vacuum drying apparatus i shown in Fig. 25 to maintain a reduced pressure state in the reaction chamber 1 ,, that is, a vacuum state, on the one hand The coating film drying procedure of the substrate is performed. The vacuum drying apparatus 1 is provided with an exhaust gas distribution group #16 between the reaction chamber 1A and the vacuum pump 13. The exhaust pipe group 16 is provided in parallel with the electric vacuum valve 21 and the large-diameter vacuum shutoff valve 12. In the vacuum drying apparatus i, the number of the exhaust pipe group 16, the large-diameter vacuum shutoff valve 12, and the electric vacuum valve 21 is increased or decreased depending on the size of the reaction chamber 1 . The vacuum drying apparatus i controls the flow rate of the exhaust gas from the reaction chamber 1 to the vacuum pump 13 by the electric vacuum valve 2 and the large-diameter vacuum shutoff valve 12. The management of the vacuum pressure in the reaction chamber depends mainly on the capacity of the vacuum pump 13. The capacity of the vacuum pump 13 is determined according to the exhaust speed s of the vacuum pump 13 and the arrival of the vacuum force P. In the viscous flow field below atmospheric pressure (105 Pa) and above 1 〇〇 Pa, the vacuum pump 3 Exhaust speed § nearly fixed, reaction 12 201128340 The flow rate of the gas in chamber 10 is determined according to the shape of the reaction chamber, the exhaust speed S of the vacuum pump 13 and the conductance coefficient c of the exhaust pipe group 16. Further, when the exhaust pipe group 丨6 is constituted based on the nominal outer diameter of the vacuum pump 1, the effective exhaust speed is almost close to the exhaust speed S of the vacuum pump 13. In other words, the conductance coefficient C of the exhaust pipe group 16 becomes large. Therefore, in the vacuum drying apparatus 1 of the present embodiment, the exhaust pipe group 16 is constituted by the nominal outer diameter of the vacuum fruit 13 as a reference. Further, the electric vacuum unit 21 is provided on the exhaust pipe group 16 for connecting the reaction chamber 10 and the vacuum pump 13 in order to control the exhaust speed s in the viscous flow field. In this case, the magnitude of the conductance of the electric vacuum pump 21 becomes a dominant factor of the exhaust speed s of the vacuum pump 13. Specifically, the conductance coefficient C of the exhaust pipe group 16 and the exhaust velocity s of the vacuum pump 13 are determined according to a synthesis formula of a parallel resistor called an electronic circuit. That is, when the electric vacuum valve 21 is used in the flow field of the sufficiently narrowing valve opening degree by the conductance coefficient c of the exhaust pipe group ,6, the conductance coefficient c of the exhaust gas pipe group 16 is almost by the electric vacuum valve 21 When the electric vacuum valve 21 is used to approximate the conductance c of the exhaust pipe group 16 in a state of being nearly fully opened, the electric vacuum valve becomes a conductivity coefficient which causes the exhaust pipe group 16 to be The state in which the conductance coefficient c decreases. However, when the reaction chamber 10 is evacuated from atmospheric pressure (1G5Pa), low vacuum (up to 105 Pa or less), medium vacuum uma or less, 101 Pa or more, and 胄 vacuum (1 以下 below) are used in the exhaust piping group. The flow of gas flowing in 16 produces changes in viscous flow, intermediate flow, and molecular flow. In the viscous flow field (under atmospheric pressure (105Pa) below i) (above) after vacuuming from atmospheric pressure, if the vacuum is suddenly (four) large 13 201128340 mouth control vacuum interrupt valve 12 valve The opening degree is controlled in the vicinity of the full opening, and the deposit in the reaction chamber 10 is rolled up to adhere to the substrate, possibly damaging the substrate itself. On the other hand, when the valve opening degree of the electric vacuum valve 21 and the large-diameter vacuum shutoff valve is made small enough to avoid rolling up the deposit in the reaction chamber, the exhaust speed becomes slower, which takes a long time to make The vacuum pressure in the reaction chamber 1 is below the target vacuum pressure. Therefore, the vacuum drying apparatus 1 shown in FIG. 25 changes the vacuum pressure in the reaction chamber 10 from the atmospheric pressure state by changing the valve opening degree of the electric vacuum valve 21 by a plurality of stages before opening the large-diameter vacuum shutoff valve 12. The state in which the linear target pressure drop gradient is approximated by the vacuum state is lowered, and thus, the exhaust velocity of the gas discharged from the reaction chamber 1 控制 is controlled. The vacuum drying device 1 measures the vacuum pressure of the reaction chamber 1 by the pressure sensor 15, and when the vacuum pressure in the reaction chamber 丨0 has been detected from the pressure measurement result of the pressure sensor 15, the opening pressure is large. The aperture vacuum interrupt valve 12 is used to increase the exhaust flow rate. By the exhaust gas velocity control, the vacuum drying device 1 can roll up the deposit in the reaction chamber 1 而 from the atmospheric pressure state to the vacuum state, and attach it to the substrate, damage the substrate itself, and the like. In this case, the amount of exhaust gas is adjusted and the exhaust time is shortened. <Schematic Structure of Exhaust Gas Control System> Fig. 1 is a schematic structural view of an exhaust gas velocity control system 66 according to the first embodiment of the present invention. The exhaust speed control system 66 shown in Fig. 1 is composed of a server 61, an internet network 6, a personal computer 63, a controller 65 of the decompression drying device 1, a pressure sensor 15, an electric vacuum valve 21, and The vacuum pump 13 is constructed. 14 201128340 In the servo 61 shown in Fig. 1, an exhaust speed determining program is stored, which is used to determine the valve opening degree of the switching electric vacuum valve 21 when controlling the exhaust speed of the exhaust gas from the reaction chamber 1 Set point. The server 61 is connected to the personal computer 163 via the Internet 6 2 in a communicable state. The personal computer 63 is a commonly known computer. The personal computer 63 is connected to the servo 61 to download the exhaust speed determining program. Further, the personal computer 163 is used to set a target multiple of the change in the valve opening degree of the electric vacuum valve 21 when the exhaust speed is controlled, and a target pressure drop gradient for lowering the pressure in the reaction chamber i. The personal computer 63 stores the downloaded exhaust speed determining program, the set ratio, and the target pressure drop gradient which is better than S, in the USB memory 64. The controller 65 shown in Fig. 1 is connected to the USB memory 64, and is determined from the exhaust speed determination program, the set ratio, and the set target pressure drop: the degree is copied from the USB memory 64. The controller (7) is provided with a preparation mode for setting the (four) degree set point of the electric vacuum valve 21, controlling the exhaust speed according to the set point determined by the preparation mode, and selecting an execution mode for performing the processing program. The device 65a is selected. The UI controller 65 executes the H-speed heart program when the preparation mode is selected by the selection means 65a. In this case, the controller 65 re-controls the electric vacuum 根据 according to the equal-magnification white 阙... Read the opening degree between the two in this way to output the valve opening degree of the electric true two valve 21 to the slamming vacuum (four) magic device 65 is exhausted for each of the opening degree drives 4, and the pressure measurement data measured by the dust force sensor 15 is obtained. Ding Shenzu, controller 6 5 from the obtained pressure to measure the poverty of the section for each valve opening time Μ ^ "out of the reaction chamber 1 〇 pressure and relationship of the I force decline curve (refer to Figure 5 , Υ2, γ4, 201128340 Υ8) 'Make the pressure drop curve of each valve opening approximate the target pressure drop gradient (refer to X in Fig. 6), generate a phase difference, and determine the intersection of the pressure drop curves to switch the electric vacuum The set point of the valve opening of the valve 2 (refer to P11, Ρ12, Ρ13 in Fig. 6). In addition, when the controller 65 selects the execution mode by the selecting means 65, the set point Ρ11, ρΐ2 is determined according to the decision. Ρι3 (refer to Fig. 6), the valve opening degree switching signal for switching the valve opening degree of the electric vacuum valve 21 is output to the electric vacuum valve 21' to control the exhaust speed of the vacuum pump 13 in the viscous flow field. The device 65 corresponds to an example of a "pressure measuring device", an "exhaust speed determining device", and a "vacuum pressure control device". <Structure of Electric Vacuum Valve> Fig. 2 is a cross-sectional view of the electric vacuum valve 21, showing a closed state. In the electric vacuum valve 21, the ball body 24 and the cylinder block 25 are integrated by a bolt 55, and the cylinder block 25, the upper cover 26, and the stepping motor 27 are integrally formed by the bolts 28 to constitute an appearance. On the valve portion 22, the first connecting port 51 opening to the ball 24 and the second connecting port 52 are communicated through the valve chamber 53. The valve seat 54 is provided in a flat state on the outer circumference of the opening portion of the valve to 53 having the opening of the first port 51. The valve chamber 53 houses a valve body 42 that is coupled to or separated from the valve seat 54. In the valve portion 22, the first port 51 opened to the ball 24 and the second port 52 communicate with each other through the valve chamber 53. The valve seat 54 is provided in a flat state on the outer circumference of the opening of the opening of the first port 51 in the valve chamber 53. The valve chamber 53 houses a valve body 42 that is coupled to or separated from the valve seat 54. The drive unit 23 converts the rotational motion of the stepping motor 27 into a linear motion and transmits it to the valve body 42. The output shaft 30 of the stepping motor 27 projects to the housing space portion 31 formed between the upper cover 26 and the cylinder block 25. Between the upper cover 26 and the cylinder block 25, the bearing 32 is lost, and the bearing 32 supports the jig 33 in a freely rotatable state. At the upper end of the clamp 33, the output shaft 3〇 is coupled to the coupler 58. At the lower end portion, the delivery nail nut is fixed by a plurality of fixing nails 35, so that the rotation amount of the conveying nail screw a 34 can be rotated by the stepping motor 27. Quantity control. The cymbal drive shaft 37 is inserted through the rotation stop nut 38, which is fixed to the body 25 by a fixing nail 39. The hexagonal rotation stop shaft portion 37a of the cross-sectional shape forming a hexagonal shape on the drive shaft 37 is inserted into the hexagonal rotation stop hole 38a' formed on the rotation stop nut 38 to reciprocate linearly convey the nail in the axial direction while restricting the rotation. The shaft 36 is screwed to the delivery nail nut 34, and engages with the upper end of the drive shaft to convert the rotational motion of the delivery nail nut 34 into a linear motion toward the axial direction, which is transmitted to the drive shaft 37. At the lower end of the drive (10), the dragon 42 through-knot member 4G and its connection body 42 are provided with a corrugated hose disc 47, a spherical disc 48 and a striker 49, ::, in the form of 'overlapping them, It is fixed to the joint by the joint nut 43. The piece is placed at 4° to become a body. Annular sealing element 5. It is composed of a material of elastic variable I and is placed on the top groove formed between the corrugated hose disk π and the spherical disk ^. The return spring 44 is retracted in the spring seat 45. The sling biases the valve body 42 in the direction of the valve seat 54. The connecting member 40 has a wide magazine 44 in the axial direction, and is coupled to the drive shaft 37 by the coupling pin 41, and the sealing load is imparted by the elastic twisting force of 44. The upper end portion of the corrugated hose 46 is connected to the corrugated hose disc 47 by the end portion 17 201128340 / valley connected; the α red body 2 5 and the spherical portion 4 4 are sandwiched by the illuminating portion 4 6 a. As the valve body 42 moves up and down, it expands and contracts in the valve chamber 53, and particles generated at portions such as the sliding portion of the drive shaft 37 do not flow into the flow path. Here, an encoder 29 for measuring the amount of mechanical rotational displacement of the rotor (not shown) is fixed to the stepping motor 27. The encoder 29 is connected to the controller 65 of the decompressing and drying device i in a communicable state, and outputs the measurement result to the controller 65. The controller 65 is connected to a coil (not shown) of the stepping motor 27, and supplies power (valve opening control signal) to the coil (not shown) according to the measuring signal of the encoder 29 to control the electric vacuum valve 21. The degree of opening. In such an electric vacuum valve 21, normally, the valve body 42 is engaged with the valve seat 54, and a blocking action is generated between the first port 51 and the second port 52. When the stepping motor 27 is rotated from this state to the positive direction, the conveying nail nut 34 is integrally rotated with the output shaft 3 through the jig 33, and the rotational motion is converted into a linear motion toward the upper side (the valve opening direction) in the drawing. Communicated to the delivery shaft 36. The drive shaft 37 is integrally raised with the delivery nail shaft 36, and the valve body 42 is pulled up through the coupling member μ. Thereby, the valve body 42 is separated from the valve seat 54 to connect the first and second ports 51, 52. The electric vacuum valve 21 can control the minute flow rate by the flow (four) leakage in the flow field in which the amount of elastic deformation of the annular seal member 5 is changed. Further, in the flow field in which the intermediate body 42 and the valve seat 54 are separated, the exhaust flow rate can be controlled in accordance with the amount of separation. This valve opening is controlled by the rotor rotation of the stepper motor 27 which is not shown.疋 On the other hand, when the stepping motor 27 is rotated in the negative direction, the wheel feed 4 and the output shaft 3 are integrally rotated in the negative direction to lower the pin feed shaft % 18 201128340. The drive shaft 37 is integrally lowered with the conveying nail shaft 36, and the valve body 42 is connected to the core by the connecting member 4, and the return spring 44 pushes the reading body 42 downward after the "gathering to the reading 54". On the side of the wide seat 54, the connecting element 40 and the kidney pin of the coupling pin 41 are brought into contact with each other, and the annular sealing member 5 is kneaded to the valve seat 54 for sealing. <About the pressure drop curve> Fig. 3 shows the pressure drop curve π when the valve opening degree is changed at the same ratio in the viscous flow field (at atmospheric pressure (105 Pa) or less 'l〇〇Pa or more) near atmospheric pressure, Υ2, Υ3, Υ4, Υ5, γ6, γ7, γ8. The vertical axis represents vacuum pressure (Pa)' horizontal axis represents time (se〇. Figure 4 shows the pressure drop curve Y1, Y2, Y3 shown in Fig. 3. 'Y4, Y5' γ6, γ7 % approximate the target pressure drop gradient Χ and produce a phase difference. The vertical axis represents the pressure, and the horizontal axis represents time. The vacuum pressures on the vertical axis of Figures 3 and 4 have no dimension. , 1.0 is a u 1 325x bribe under atmospheric pressure. Again, the horizontal of Figure 3: the number of times recorded on the square is square In addition, the addition is not necessarily limited to such a time. Y1 to γ8 shown in Figs. 3 and 4 represent that each valve is opened when the valve opening degree of the electric vacuum valve 21 is expanded to a certain size. The pressure drop curve of the degree. The pressure drop curves Y1 γ γ8 indicate the ability of the electric vacuum valve 21 without dimension, and the size of the number added after the letter γ represents the magnitude of the flow capacity. The X of Fig. 4 indicates the reaction chamber 1〇 The target pressure drop gradient of the target rate of change of pressure. Fig. 3 and Fig. 4 χι~χ8 represent the results of finding the part of the pressure drop curve Υ1~Υ8 which approximates the target pressure drop gradient 19. 19 201128340 As shown in Fig. 3 When the valve opening degree of the electric vacuum valve 21 is expanded from a pressure drop curve Y1 toward the pressure drop curve Y8 by a certain magnitude (for example, 1 mm each time), the approximate target pressure drops in the pressure drop curves Y1 to Y8. The approximate portion XI to X8 of the gradient X decreases as the valve opening is expanded. This is because the more the valve opening is expanded, the more the vacuum pressure is drawn to show a larger curve and the tendency to decrease. As shown in Fig. 3, the approximate portions η to X8 of the pressure drop curves γι to γ8 increase the overlap when the valve opening degree is expanded. That is, if the pressure drop curve Y2, Y3, Y4 is approximated Χ2, Χ3, X4, the approximate portion X3 of the pressure drop curve Y3 partially overlaps with the approximate portion χ 2 of the pressure drop curve γ2, and at the same time 'overlaps with the approximate portion Χ4 of the pressure drop curve γ4. Further, the pressure drop curve Υ4~Υ8 The approximate portions Χ4 to Χ8 overlap each other. Therefore, as shown in Fig. 4, when the pressure drop curves γ2 to γ8 are approximated to the target pressure drop gradient X and moved along the time axis, the valve opening degree of the electric vacuum valve 21 is made. After the valve opening degree corresponding to the pressure drop curve γ 1 is expanded to the valve opening degree corresponding to the pressure drop curve Υ 2, the valve of the electric vacuum valve 21 is opened in the middle of the target pressure drop gradient Χ 2 of the pressure drop curve γ 2 . The degree is expanded from the valve opening corresponding to the pressure drop curve Υ 2 to the valve opening corresponding to the pressure drop curve γ 3 . Then, after the valve opening degree of the electric vacuum valve 21 is expanded from the valve opening degree corresponding to the pressure drop curve Υ3 to the valve opening degree corresponding to the pressure drop curve ,, even if the valve opening degree of the electric vacuum valve 21 is from the pressure and the pressure The valve opening degree corresponding to the falling curve Υ5 is expanded to the valve opening degree corresponding to the pressure drop curve γ6, and then the valve opening degree corresponding to the pressure drop curve Υ6 is expanded to the pressure drop curve even if the valve opening degree of the electric vacuum valve 21 is even Γ7 corresponds to the valve opening 20 201128340 degrees ° further and further 'the valve opening degree of the electric vacuum valve 21 is expanded from the valve opening degree corresponding to the pressure drop curve Y7 to the opening corresponding to the pressure drop curve Y8, from the reaction chamber 10 Take out the absolute vacuum. That is, as shown in Fig. 4, when the valve opening degree of the electric vacuum valve 21 is expanded to a certain size, it is necessary to change the set point of the next valve opening degree after changing the set point of the valve opening degree. The problem arises here. Such a set point is substantially not beneficial to the exhaust control 'as a meaningless set point. <About Vacuum Pressure Characteristics> As described above, in the process of changing the valve opening degree of the electric vacuum valve 21 and measuring the pressure drop curve, the inventors found that the valve opening degree was expanded by a multiple of the ratio to make the valve opening degree The obtained pressure drop curve approximates the target spread force drop gradient X'. If the time point for switching the valve opening degree of the electric vacuum valve 21 is set, the portion of the pressure drop curve that approximates the target pressure drop gradient χ may not be caused.
分重疊，使反應室1〇内之壓力在近似目標壓力下降梯度X 的狀態下下降，以控制排氣速度。以下，將進行具體的說 明。 第5圖為表示在大氣壓力附近之黏性流場使閥開度根 據2倍等比倍數變化時之壓力下降曲線γι，γ2, Υ4, γ8。縱 轴代表真空壓力，橫軸代表時間。第6圖表示使第5圖所示 之壓力下降曲線Υ1，Υ2，Υ4，Υ8近似目標壓力下降梯度又 而產生相位差的狀態。縱軸代表真空壓力，橫軸代表時間。 第5圖之Υ1，Υ2，Υ4，Υ8為壓力下降曲線，表示出根據 2倍等比倍數設定電動真空閥21之閥開度並以壓力感測器 1 5測定出反應室1 〇之壓力的結果。第6圖之χ表示反應室j 〇 21 201128340 之壓力之目標變化率的目標廢力下降梯度。第5圖之XI，X2 X4’ X8表示找到壓力下降曲線γι，γ2，γ4· γ8中近似目標 壓力梯度X之部分的結果。壓力下降曲線以，γ2，γ4,= 以無維度表示電動真空閥21之能力，在字母¥之後添加的數 字的大小代表產生流動能力的大小。 如第6圖所示，當使壓力下降曲線γι，γ2, γ4, γ8近似 目‘壓力下降梯度χ而產生相位差時，不使第5圖所示之壓 力下降曲線Υ1，Υ2’ Υ4，Υ8之近似部分XI，Χ2，Χ4，Χ8相 互重疊’閱ρθ度之設定點Ρ11，Ρ12, Ρ13得以設定。亦即， 如第6圖之β又疋點ρ 1 1所示，在開始抽真空之後到時間11 1 之刚的期間（或真空壓力從大氣壓力下降至壓力¢11的期 間），將電動真空閥21之閥開度設定為與壓力下降曲線γι 對應的閥開度，如圖中閥開度之設定點P12所示，從時間ti i 到tl2所經過的期間（或真空壓力從壓力QU下降至壓力qi2 的期間）’將電動真空閥21之閥開度設定為與壓力下降曲線 Y2對應的閥開度’如圖中閥開度之設定點pi3所示，從時間 112到113所經過的期間（或真空壓力從壓力卩丨2下降至壓力 Q13的期間），將電動真空閥21之閥開度設定為與壓力下降 曲線Y4對應的闕開度’如圖中閥開度之設定點^丨4所示，從 時間tl3以後（真空麗力下降之壓力Q13之後），若將電動真 空間21之間開度設定為與壓力下降曲線¥8對應的閥開度， 可藉由使電動真空閥21之閥開度經過*階段之擴張而使真 空Μ力在近似目標屋力下降梯度X的狀態下從大氣壓力抽 真空變成絕對真空。 22 201128340 第7圖表不在大氣壓力附近之黏性流場使閥開度根據 倍等比倍數變化時之壓力下降曲線γι， γι.4ι，γ2, Y2H Υ4’ γ5·64，Υ8。縱軸代表真空壓力，橫軸代表時 間第8圖表不使第7圖所示之壓力下降曲線γι，γι . 41, γ2, Υ2·82，Υ4’ Υ5.64，Υ8近似目標壓力下降梯度而產生相位 差的狀態。縱軸代表真空壓力，橫轴代表時間。 第 7 圖之Yl，Υ1.41，Υ2，Υ2.82，Υ4，Υ5.64，Υ8 為壓 力下降曲線，表示出根據/2倍等比倍數設定電動真空閥21 之閥開度並以壓力感測器15測定出反應室1〇之壓力的結 果。第8圖之X表示反應室1〇之壓力之目標變化率的目標壓 力下降梯度。第 7圖之 XU.41，Χ2, Χ2.82, Χ4, Χ5.64, X8表示找到壓力下降曲線Yl， Y1.41， Y2， Y2.82， Y4, Y5. 64’ Y8中近似目標壓力梯度χ之部分的結果。第7圖及第 8 圖之壓力下降曲線Y1，YU1，Υ2, Υ2.82, Υ4, Υ5.64, Υ8 以無維度表示電動真空閥21之能力，在字母Υ之後添加的數 字的大小代表產生流動能力的大小。 如第8圖所示，當使壓力下降曲線γι， γι 4丨，γ2, Y2·82’ Y4’ Y5.64，Y8近似目標壓力下降梯度又而產生相位 差時，不使第7圖所示之壓力下降曲線γι， γι· 4丨，γ2, Υ2.82’ Υ4’ Υ5·64，Υ8 之近似部分 XI, Χ1.41，Χ2，Χ2.82, Χ4, Χ5.64, Χ8相互重疊，閥開度之設定點ρ21, ρ22，ρ23, Ρ24’ ρ25，Ρ26得以設定。亦即，如第8圖之閥開度設定點 \21所不，在開始抽真空之後到時間t21之前的期間（或真空 4：力攸大氣壓力下降至壓力Q2丄的期間）’將電動真空閥21 23 201128340 之閥開度設定為與壓力下降曲線Y1對應的閥開度，如圖中 間開度之設定點P22所示，從時間t21到t22所經過的期間 (或真空壓力從壓力Q21下降至壓力Q22的期間），將電動真 空閥21之閥開度設定為與壓力下降曲線γι. 41對應的閥開 度’如圖中閥開度之設定點P23所示，從時間t22到t23所經 過的期間（或真空壓力從壓力Q22下降至壓力Q23的期間）， 將電動真空閥21之閥開度設定為與壓力下降曲線γ2對應的 閥開度’如圖中閥開度之設定點P24所示，從時間t23到124 所經過的期間（或真空壓力從壓力q23下降至壓力Q24的期 間）’將電動真空閥21之閥開度設定為與壓力下降曲線 Y2. 82對應的閥開度，如圖中閥開度之設定點p25所示，從 時間t24到125所經過的期間（或真空壓力從壓力Q24下降至 壓力Q25的期間），將電動真空閥21之閥開度設定為與壓力 下降曲線Y4對應的閥開度，如圖中閥開度之設定點p26所 示，從時間t25到t26所經過的期間（或真空壓力從壓力Q25 下降至壓力Q26的期間），將電動真空閥21之闊開度設定為 與壓力下降曲線Y5. 64對應的閥開度，從時間t26以後（或真 空壓力下降至壓力Q26之後），若將電動真空閥21之閥開度 設定為與壓力下降曲線γ8對應的閥開度，可藉由使電動真 空閥21之閥開度經過7階段之擴張而使真空壓力在近似目 標壓力下降梯度X的狀態下從大氣壓力抽真空變成絕對真 空。 因此，如第6圖及第8圖所示，可知若以等比倍數設定 電動真空閥21之閥開度並使針對設定好之每個閥開度所得 24 201128340 到的壓力下降曲線近似目標壓力下降梯度χ而產生相位 差’可在壓力下降曲線之近似目標壓力下降梯度㈣部分不 重疊的情況下，決定用來切換閥開度之設定點。亦即，可 知若要近似直線之目《力下降梯度^使反應㈣之氣 體排出至真U13 ’可以等比倍數設定電動真空閥21的間 開度°另彳’可知若決定等比倍數（或在哪—點切換間開 度）’閥開度之設定點必然根據設定好之目標壓力下降梯度 X來決定，不需要冒風險來進行設定。 當比較第6圖及第8圖之圖表時，發現若將等比倍數的 值設定得較小，如圖中閥開度之設定點pu〜ρΐ3及間開度 之設UP21〜Ρ26所示’壓力下降曲線之連接部分近似目 標壓力下降梯度X，不會在壓力下降曲線的連接部分產生浪 費。亦即’越是等比倍數的值設定得較小，使切換電動真 空閥21之閥開度的次數越多，就越能以真空壓力下降時之 直線性良好的方式控制排氣速度。 又，如第6圖及第8圖所示，若將等比倍數的值設定得 較大，將實測之壓力下降曲線的數目就會少掉。具體來說， 將等比倍數設定為2倍時的壓力下降曲線需要4條，相對於 此’將等比被數設定為γ 2倍時的壓力下降曲線需要7條， 將等比倍數設定為2倍時比將等比倍數設定為/"2倍時要少 掉3條壓力下降曲線。壓力下降曲線是藉由將電動真空閥。 之閥開度設定為根據等比倍數的閥開度並從大氣壓力抽真 空變成絕對真空而取得，所以，Μ力下降曲線的取得需要 時間°因Λ ’只要將等比倍數的值設定得較大，而減少應 25 201128340 取付的壓力下降曲線的數目，就可縮短壓力下降曲線之取 得時間，縮短以近似目標壓力下降梯度χ之方式決定電動真 空閥21之閥開度的時間。 〈藉由電動真空閥之排氣速度控制方法：排氣速度控制資料 產生動作〉 在此說明利用上述真空壓力特性的藉由電動真空閥之 排氣速度控制方法。第9圖為排氣速度決定程式之下載動作 的流程圖。第1〇圖至第16圖表示螢幕63a上所顯示之晝面之 -例。第17圖為排氣速度決定程式的流程圖。第圖為真 空壓力控制程式的流程圖。 個人電腦63根據來自使用者之要求，在第9圖之步驟 K以下簡略記為「Si」）’在個人電腦63之螢幕63a上，顯 示出第10圖所示之下載確認畫面。在下載確認晝面中，顯 示「正要下載排氣速度決定程式，確定下載嗎？」，所以， 若要進行下載’使用者以滑鼠等點選「轉定」按紐βι。於 是，個人電腦63透過網際網路62連接至伺服器61，從伺服 器61開始下載排氣速度決定程式。個人電腦63會一直待機 到排氣速度決定程式下載完畢（第9圖之S2 :否）。 當排氣速度決定程式下載完畢時（S2 :是），個人電腦 63在第9圖之S3中，將第11圖所示之等比倍數設定畫面顯示 於螢幕63a上。在等比倍數設定畫面中，設置有等比倍數輸 入攔B3 〇使用者從個人電腦63之鍵盤將所要之等比倍數（在 此為2倍）輸入等比倍數欄B3，再以滑鼠等點選確認鈕B4。 個人電腦6 3在確認紐B4被點選時，判斷已設定好閥開 26 201128340 度之等比倍數（第9圖之S4)，在S5中，將第12圖之目標壓力 ::梯度設定畫面顯示於螢幕咖中。“標壓力下降梯度 «又疋畫面中，设置有目標壓力下降梯度輸入襴，用來輪 入從大軋壓力使真空壓力線性下降至絕對真空的目標壓力 下降梯度X，又5又置有用來輸人排氣時間的排氣時間輪入搁 B6。使用者在目標壓力下降梯度輸入襴β5以拖食滑鼠等方 式手動輸人所要之目標壓力下降梯度χ，或者，藉由在排氣 時間輸入攔Β6輸人所要之排氣時間來決定目標壓力下降梯 度X。例如，若希望排氣時間較短，如圖中輸，使顯干 於目標壓力下降梯度輸入欄Β5之目標壓力下降梯度χ之傾 斜變大，另-方面，若希望排氣時間較長，如圖中^所心 使顯示於目標壓力下降梯度輸人攔β5之目標壓力下降梯度 X之傾斜變小。又例如，亦可根據輸入排氣時間輸入攔:6 的時間設定排氣時間的長短。若能在輪入排氣時間後，使 從大氣麼力開始之目標壓力下降梯度X根據排氣時間自動 顯示於目標壓力下降梯度輸入欄β5，則更好。冑目桴壓力 下降梯度X或排氣時間之設定—結束，使用者以滑鼠 認鈕B7。 個人電腦63在確認鈕被點選時，判斷目標壓力下降梯 度X已設定好(S6:是），在第9圖之S7中將第_所示之 設定内容禮認晝面顯示於螢幕63a上。在設定内容確認畫面 中之設定顯不《8中’顯示出使用者所設定好之閥開度之 等比倍數及使用者所設定好之目標壓力下降梯度X。當使用 者確認設定顯示囊之顯示内容為正確時，以滑鼠點選「確 27 201128340 定」按鈕B9。又，使用者若想變更設定顯示攔B8之顯示内 容，以滑鼠點選「變更」按鈕B10。在此情況下（第9圖之S8 : 變更），個人電腦63返回第9圖之S3，再度顯示第11圖所示 之等比倍數設定畫面。 當設定内容確認畫面之「確定」按鈕被B9點選（第9圖 之S8 :確定），個人電腦63將第14圖所示之USB記憶體插入 指示晝面顯示於螢幕63a上。在USB記憶體插入指示畫面 中，顯示出「排氣速度決定程式、設定好之等比倍數及設 定好之目標壓力下降梯度將要複製於USB記憶體中，請將 USB記憶體插入USB埠。」之類的指示。使用者遵照指示將 USB記憶體64插入個人電腦63之USB埠之後，點選USB記憶體 插入指示畫面的確認鈕B11。個人電腦63在檢測出USB記憶 體64之前（第9圖之S11:否），會持續待機。另一方面，當 個人電腦63檢測出USB記憶體64時（SI 1:是），在第9圖之S12 中’會開始在USB記憶體64中複製排氣速度決定程式、設定 好之閥開度之等比倍數及設定好之目標壓力下降梯度χ。複 製進度顯示於第15圖所示之複製進度顯示畫面中。當個人 電腦63複製完畢時’在第9圖之S13中，顯示第16圖所示之 複製完畢通知畫面。在複製完畢通知畫面中，顯示「複製 元畢。δ青將U S B s己憶體從U S Β埠拔出。另外，請將拔出之υ § β 記憶體連接至用來控制反應室壓力的控制器上，以將排氣 速度決定程式、設定好之等比倍數及設定好之目標壓力下 降梯度複製至控制器中。之後，在藉由設置於控制器上之 選取裝置選取準備模式並決定閥開度之設定點後，請藉由 28 201128340 選取裝置選取執行模式，執行處理程序。」之類的指示 當使用者從顯示内容理解之後的作業步驟時，點心：完 畢通知畫面的確認鈕B12，此時，個人電腦63結束第9圖= 處理’使螢幕6 3 a之顯示晝面恢復至初始畫面。 使用者帶著USB記憶體64，控制器65移動至某個場所。 然後，將USB記憶體64連接至控制器65iUSB埠上，從 記憶體64將排氣速度決定程式、設定好之等比倍數及設定 好之目標壓力下降梯度X複製到控制器65中。當複製完畢 時，使用者藉由選取裝置65a選取準備模式。此時，控=哭 65執行所複製之排氣速度決定 :°° 乐圔為排氣速度決 定程式的流程圖。 如第17圖之S15所示，控制器65以冑示燈通知使用者決 定排氣速度的處理正在執行中。#由此顯示燈等之通知:、 使用者辨識出無法在減壓乾燥裝置i中執行處理程序。 另外，在S16中，控制器65讀取設定好之間開度之等比 倍數，依次取得並儲存壓力下降 哗曲線亦即，控制器65根 據從_記憶體64複製過來的等比倍數，求出電動真空閥21 之閥開度。具體來說’當等比倍數設定為2倍時，求出電動 真空間21之間開度從閉間位置到全開位置的行程的12.5% 2 5 %, 5 0 %， 1 〇 〇 % 〇然後，斜科祕七山 …、傻針對所求出之每個閥開度，求出 壓力下降曲線。亦即，控制器 窃叻把將電動真空閥以之 度設定從閉閥位置到全開位置 I <仃柱之12· 5%的閥開唐押 制指令傳送至電動真空閥21， " 駆動真空泵13，使反應室1〇 之壓力從大氣壓力下降至絕對 H此時’控制器65從用 29 201128340 來測定反應室1 〇内之壓力的壓力感測器i 5輸入壓力測定資 料。然後，控制器65如第5圖之Y1所示，從所輸入之壓力測 疋資料’求出用來表示反應室1 〇之真空壓力與時間之關係 的壓力下降曲線，使所求出之壓力下降曲線與設定好之閥 開度12. 5%關聯，並儲存於記憶區中。相同於此，控制器w 將電動真空閥21之閥開度分別設定為從閉閥位置到全開位 置之行程之25%，50%，100%並取得壓力測定資料，使從所 取得之壓力測定資料求出的第5圖之壓力下降曲線γ2，γ4, Υ8與設定好之閱開度25%，5〇%，1〇〇%關聯，並分別儲存於 記憶區中。· 、 然後，在S1 7中，根據設定好之目標壓力下降梯度X與 所取付之壓力下降曲線產生並儲存排氣速度控制資料。在 此所謂排氣速度控制資料，是指表示出決定用來切換閥開 度之設定點之結果的資料。閥開度之設定點從真空壓力與 時間的關係求得。在此更具體地說明排氣速度控制資料之 產生方法◊當針對所取得之壓力下降曲線m2，以 分別找出近似目標壓力下降梯度X的部分時，就會在第5圖 之近似部分Xi，Χ2, Χ4, Χ8出現。如第6圖所示，當近似目 標壓力下降梯度X而沿著時間軸錯開壓力下降曲線Υ1，Υ2, 以’ Υ8時，在開始抽真空後到時間⑴的期間而且真空壓力 從大氣壓力下降至壓力01ΐΑΑ α > 力Qu的情況下，壓力下降曲線Yl，Υ2 又又X ’在開始抽真空後到時間⑴的期間而且真空壓力 下降至>1力Q12的情況下，選力下降曲線”，咐叉。又， 在開始括真空後到時間川的_而且真空壓力下降至壓 30 201128340 力Q13的情況下，壓力下降曲線γ4，γ8交叉。因此，將壓力 下降曲線Υ1’ Υ2之交點設定為閥開度從ι2. 5%切換至25%的 設定點Ρ11，將壓力下降曲線Υ2，¥4之交點設定為閥開度從 25%切換至50%的設定點！>12,將壓力下降曲線γ4, γ8之交點 設定為閥開度從50%切換至的設定點ρΐ3。然後，將真 空壓力和時間被選定之設定點pu，ρΐ2, ρΐ3製作成排氣速 度控制資料。 當排氣速度控制資料之產生及儲存結束時，在S1 8中， 熄滅顯不燈等，以告知排氣速度決定動作結束，處理完畢。 藉此’使用者辨識出可執行處理程序。 <藉由電動真空閥之排氣速度控制方法：真空壓力控制動作 > 第18圖為儲存於控制器65之真空壓力控制程式的流程 圖。 31 201128340 開度控制信號傳送至電動真空閥21，將電動真空閥21之閥 開度擴張為前面一個閥開度的2倍，增大排氣系統之電導係 數。然後，控制器6 5在開始抽真空後到閥開度切換時間112 的期間，控制器65將電動真空閥21之閥開度設定在50%的閥 開度控制彳§號傳送至電動真空閥21，將電動真空閥21之閥 開度擴張為前面一個閥開度的2倍，增大排氣系統之電導係 數。然後，控制器6 5在開始抽真空後到閥開度切換時間t j 3 的期間，控制器65將電動真空閥21之閥開度設定在1〇〇%的 閥開度控制信號傳送至電動真空閥21 ’將電動真空閥21之 閥開度擴張為前面一個閥開度的2倍，增大排氣系統之電導 係數。結果，反應室1 〇之壓力如第6圖所示，在近似使用者 所設定之目標壓力下降梯度X的狀態下，從大氣壓力減壓至 絕對真空。 然後，在S22中，根據壓力感測器丨5所測定之壓力測定 資料，判斷反應室10之壓力是否超出黏性流場。在超過黏 性流場之前（S22 :否）’於S21中，使用電動真空閥21來控 制排氣速度。另一方面，在反應室1〇之壓力超過黏性流場 後（S22 :是），調整大口徑真空遮斷閥12之閥開度來控制排 氣速度。大口徑真空遮斷閥12之閥座口徑大於電動真空閥 21，可控制大流量，所以，相較於僅藉由電動真空閥以來 進行排氣控制的情況下，可更快速進行排氣。 控制器65在對反應室10内之晶圓的處理結束時（s24 : 是），於S25中，將晶圓從反應室1〇搬出。然後，控制器65 在S26中，根據處理程序結束鈕是否被按下等來判斷是^輸 32 201128340 入了結束真空壓力控制的指示’判斷真空壓力控制是否終 了。當未輸入指示而繼續真空壓力控制時（S26 :否），在S27 中，使反應室10之壓力為大氣壓力之後，在S24中搬入下一 個晶圓。另一方面’當輪入指示以結束真空壓力控制時 (S 2 6 :是），則結束處理。 又’控制器65在上述真空壓力控制動作中，可藉由顯 示燈等告知程序正在處理中。 又’閥開度之設定點之最大段數（在此為閥開度丨〇〇% 的情況）中’有時會進入受到系統之電導係數之影響的流場 (例如中間流場）。不過，在此情況下，如第6圖之壓力下降 曲線Y4所示’至少排氣速度可在不會超過設定好之目標壓 力下降梯度X而變快的情況下，只有速度稍稍偏離的安全 點。 在上述說明中，舉例說明了使用者將等比倍數設定為2 倍的情況，例如，在使用者將閥開度之等比倍數設定為，2 的情況下，藉由與上述相同之處理，如第8圖所示，閥開度 之設定點P21〜P26得以決定，排氣速度以更線性之方式得 到控制。 <作用效果〉 於是’上述實施型態之藉由電動真空閥之排氣速度控 制方法、排氣速度控制系統66、閥開度決定方法、閥開度 決疋程式可達成以下之作用效果。為了使真空泵13'反應 至1 0排氣配管群1 6所產生之控制績效直接反映在排氣速 度上，根據等比倍數對電動真空閥2丨之閥開度進行階段性 33 201128340 控制’針對每個閥開度，使用真空泵13從黏性流場進行排 氣’取得壓力感測器1 5測定反應室1 〇之壓力的壓力測定資 料。亦即，使用電動真空閥21設置所在之裝置針對每個閥 開度實測壓力測定資料。從針對每個閥開度所實測出之壓 力測定資料求出壓力下降曲線Yl，Υ2，γ3，Υ4，當使壓力 下降曲線Υ1，Υ2，Υ3，Υ4近似目標壓力下降梯度X而產生相 位差時，壓力下降曲線Υ2，Υ3，Υ4分別與前一個閥開度之 壓力下降曲線Yl, Υ2, Υ3交叉。因此，將各個壓力下降曲 線之交點決定為用來切換電動真空21之閥開度的設定點 Ρ11，Ρ12，Ρ13。如此，當根據等比倍數使閥開度產生變化 時與各個閥開度對應之壓力下降曲線γι，γ2，γ3 Υ4近 似目標壓力下降梯度Χ的部分不重疊，所以，設定點？11， Ρ1 2，Ρ13不會設定得無意義。當進行真空壓力控制時，根 據設定點Ρ11，Ρ12，Ρ13切換電動真空閥21之閥開度，藉 此，變更排氣配管群1 6之電導係數，控制黏性流場中之排 氣速度。此時，電動真空閥21在從反應室1〇之壓力近似目 標壓力下降梯度X的部分釋出的同時，將閥開度擴張為等比 倍數，使反應室1 〇之壓力再次近似目標壓力下降梯度，所 以，反應室1 0之壓力即使在黏性流場中也可在近似目標壓 力下降梯度X的狀態下下降。 如此’在上述貫施型態中’黏性流場中之壓力下降曲 線Π，Υ2，Υ3，Υ4使用電動真空閥21設置所在的反應室 1 〇、真空泵1 3及排氣配管群丨6進行實測，所以，電動真空 閥21設置所在之控制績效、對黏性流場中之處理程序的不 34 201128340 良影響可能會反映在用來切換電動真空閥21之閥開度的設 疋點PI 1，P12，P13的決定上。另外，決定閥開度之設定點 川，P12, P13的人員即使不具備用來排除處理程序之不良 影響的專門知識，也可僅藉由實測壓力下降曲線γι，γ2, γ3 使/、近似目钻壓力下降梯度χ ,並使壓力下降曲線γ 1， Υ2, Υ3，Υ4產生相位差，使反應室1〇之壓力近似目標壓力 下降梯度X而決定閥開度之設定點Ρ11，ρΐ2，ρΐ3。結果， 上述實施型態相較於在黏性流場中以母閥與子閥對閥開度 進行2奴控制以控制排氣速度的情況（參照第26圖），可在黏 抓場中不影響處理程序的情況下得到真空壓力排氣控制 條件，並縮短排氣速度。 另外，上述實施型態如同對排氣速度進行回饋控制的 情況（參照第27圖），無法使反應室之壓力以直線狀下降， 但即使不使用複雜之控制基板、控制程式等，相較於以子 閥與母閥控制排氣速度的情況（參照第26圖），也可以使反 應室1 0之壓力直線下降之方式控制排氣速度。 因此’根據上述實施型態之藉由電動真空閥之排氣速 度控制方法、排氣速度控制系統66、閥開度決定方法、間 開度決定程式，可以簡單且低價之方式設定用來切換電動 真空閥21之閥開度的設定點P11, pl2，Ρ13，使反應室 之壓力近似目標壓力下降梯度X。 上述實施型態之藉由電動真空閥之排氣速度控制方法 可在等比倍數設定畫面中設定等比倍數。因此，若在等比 倍數設定晝面中將等比倍數設定得較小（例如，2倍），如第 35 201128340 8圖所示，可增加切換電動真空閥之閥開度的設定點的數 目，將設定點決定在靠近目標壓力下降梯度的位置，使反 應室之壓力產生平滑順暢的變化。另一方面，若在等比倍 數設定畫面中將等比倍數設定得較大（例如2倍），如第6圖 所示，要貫測之壓力下降曲線的數目減少，可縮短用來決 定閥開度之設定點的時間。於是，根據上述實施型態之藉 由電動真空閥之排氣速度控制方法，藉由等比倍數之設定 值，可調整使反應室1〇之壓力平滑順暢地變化的程度、可 確保取得閥開度之設定點的時間，進而可將使用者之個別 要求反映在排氣速度控制上。 上述實施型態之藉由電動真空閥之排氣速度控制方法 可在目標壓力下降梯度設定畫面中設定目標壓力下降梯度 X。因此，若想要排氣時間變短，可在目標壓力下降梯度設 .定畫面中增大傾斜角度來設定目標壓力下降梯度乂。另一方 面，若想要慢慢排氣，可在目標壓力下降梯度設定畫面中 縮小傾斜角度來設定目標壓力下降梯度χ。於是，根據上述 實施型態之藉由電動真空閥之排氣速度控制方法，藉由目 標壓力下降梯度X之設定，可調整排氣時間、反應室丨〇之壓 力變化的程度，進而可將使用者之個別要求反映在排氣速 度控制上。 在上述實施型態之藉由電動真空閥之排氣速度控制方 法及排氣速度控制系統66中，以與電動真空閥21並列之方 式》又置大口牷真空遮斷閥丨2，並連接至反應室1〇，在黏性 流％中切換電動真空閥21之閥開纟以控制排氣速度，超出 36 201128340 黏性流場後，調整相較 Λ 較於電動真空閥21可控制大流量的大 口住真二遮斷閥12的閥開度， — Α控制排軋逮度。如此，在 起堆積物之黏性流場進行比電動真空間”更慢的排 2 使堆積物被㈣的可能性降低時， 藉由大口徑真空遮斷闊12進行較快的排氣，所…使反 應室10之壓力在短時間内從大氣星力到達目標真空塵力。 此種方法及系祕在反應室1G之容積較大 (第2實施型態） $ 接著’說明本發明之第2實施型態。第19圖為本發明第 2實施型態之排氣速度控制系統72.的概略構造圖。 在本實施型態之排氣速度控制系統 ”所實測之壓力測定資料求出壓力下降曲線，個人= 使用該壓力下降曲線決定閥開度之設定點，控制器”根據 決定好之設；t點控制反應㈣之真空壓力。就此意義而 言，個人電腦63及控制器71是「壓力實測裝置」之一例， 個人電腦63是「排氣速度決定裝置」之一例，控制器”是 「真空壓力控制裝置」之一例。本實施型態之排氣速度控 制系統72用來決定閥開度之設定點的方法與第丨實施型2 不同。在此，以與第1實施型態的不同點為中心來進行說 明，與第丨實施型態的共通點在圖面及說明中使用與第1實 把型態相同的符號’並適當地省略其說明。 如第19圖所示，個人電腦63透過網際網路62連接至伺 服器61 ’從伺服器61下載排氣速度決定程式。當使用者在 個人電腦63上執行排氣速度控制程式時，個人電腦63執行The overlap is such that the pressure in the reaction chamber 1 下降 is lowered in a state close to the target pressure drop gradient X to control the exhaust velocity. Hereinafter, a specific description will be made. Fig. 5 is a graph showing the pressure drop curves γι, γ2, Υ4, γ8 when the viscous flow field in the vicinity of atmospheric pressure changes the valve opening according to a multiple of two times. The vertical axis represents vacuum pressure and the horizontal axis represents time. Fig. 6 is a view showing a state in which the pressure drop curves Υ1, Υ2, Υ4, and Υ8 shown in Fig. 5 approximate the target pressure drop gradient and cause a phase difference. The vertical axis represents vacuum pressure and the horizontal axis represents time. In Fig. 5, Υ1, Υ2, Υ4, and Υ8 are pressure drop curves, which indicate that the valve opening degree of the electric vacuum valve 21 is set according to the multiple of the multiple of 2 times and the pressure of the reaction chamber 1 测定 is measured by the pressure sensor 15. result. Figure 6 shows the target waste force drop gradient for the target rate of change of the pressure in the reaction chamber j 〇 21 201128340. In Fig. 5 XI, X2 X4' X8 represents the result of finding a portion of the pressure drop curve γι, γ2, γ4· γ8 which approximates the target pressure gradient X. The pressure drop curve is, γ2, γ4, = the ability to represent the electric vacuum valve 21 in no dimension, and the size of the number added after the letter ¥ represents the magnitude of the flow capacity. As shown in Fig. 6, when the pressure drop curves γι, γ2, γ4, γ8 are approximated to the pressure drop gradient χ and a phase difference is generated, the pressure drop curve Υ1, Υ2' Υ 4, Υ 8 shown in Fig. 5 is not caused. The approximate parts XI, Χ2, Χ4, Χ8 overlap each other. The set points Ρ11, Ρ12, Ρ13 of the ρθ degree are set. That is, as shown by the β and ρ 1 1 of Fig. 6, the electric vacuum is applied during the period from the start of the evacuation to the time 11 1 (or the period when the vacuum pressure drops from the atmospheric pressure to the pressure ¢ 11). The valve opening degree of the valve 21 is set to a valve opening degree corresponding to the pressure drop curve γι, as indicated by the set point P12 of the valve opening degree in the figure, and the period elapsed from the time ti i to t12 (or the vacuum pressure is decreased from the pressure QU) During the period to the pressure qi2, 'the valve opening degree of the electric vacuum valve 21 is set to the valve opening degree corresponding to the pressure drop curve Y2' as shown by the set point pi3 of the valve opening degree in the figure, from the time 112 to 113. During the period (or the period during which the vacuum pressure drops from the pressure 卩丨2 to the pressure Q13), the valve opening degree of the electric vacuum valve 21 is set to the opening degree corresponding to the pressure drop curve Y4', as shown in the figure, the valve opening degree is set. As shown in the figure, after the time t13 (after the vacuum pressure drop Q13), if the opening degree between the electric vacuum chambers 21 is set to the valve opening degree corresponding to the pressure drop curve ¥8, the electric vacuum valve 21 can be made available. The valve opening is expanded by the * stage to make the vacuum force The vacuum is evacuated from atmospheric pressure to an absolute vacuum in a state where the target home power is lowered by a gradient X. 22 201128340 The seventh chart is not a pressure drop field near the atmospheric pressure. The pressure drop curve γι, γι.4ι, γ2, Y2H Υ4' γ5·64, Υ8 when the valve opening is changed according to the multiple of the multiple. The vertical axis represents the vacuum pressure, and the horizontal axis represents the time. The eighth chart does not cause the pressure drop curves γι, γι . 41, γ2, Υ2·82, Υ4' Υ 5.64, and Υ8 to approximate the target pressure drop gradient as shown in Fig. 7. The state of the phase difference. The vertical axis represents vacuum pressure and the horizontal axis represents time. In Fig. 7, Yl, Υ1.41, Υ2, Υ2.82, Υ4, Υ5.64, Υ8 are pressure drop curves, indicating that the valve opening degree of the electric vacuum valve 21 is set according to the /2-fold equal ratio multiple times and the pressure is felt The detector 15 measures the result of the pressure in the reaction chamber. The X of Fig. 8 shows the target pressure drop gradient of the target change rate of the pressure in the reaction chamber. XU.41, Χ2, Χ2.82, Χ4, Χ5.64, X8 of Fig. 7 shows the approximate target pressure gradient in the pressure drop curve Yl, Y1.41, Y2, Y2.82, Y4, Y5. 64' Y8 The result of the partial part. The pressure drop curves Y1, YU1, Υ2, Υ2.82, Υ4, Υ5.64, Υ8 of Figs. 7 and 8 show the ability of the electric vacuum valve 21 without dimension, and the size of the number added after the letter 代表 represents the generation The size of the flow capacity. As shown in Fig. 8, when the pressure drop curve γι, γι 4丨, γ2, Y2·82' Y4' Y5.64, Y8 approximates the target pressure drop gradient and a phase difference occurs, the figure 7 is not shown. The pressure drop curve γι, γι· 4丨, γ2, Υ2.82' Υ4' Υ5·64, 近似8 approximate part XI, Χ1.41, Χ2, Χ2.82, Χ4, Χ5.64, Χ8 overlap each other, valve The set points ρ21, ρ22, ρ23, Ρ24' ρ25, Ρ26 of the opening degree are set. That is, as shown in Fig. 8, the valve opening degree set point \21 does not, after the start of vacuuming until the time t21 (or vacuum 4: force 攸 atmospheric pressure drops to the pressure Q2 丄) 'electric vacuum The valve opening degree of the valve 21 23 201128340 is set to the valve opening degree corresponding to the pressure drop curve Y1, as shown by the set point P22 of the intermediate opening degree, and the period elapsed from the time t21 to t22 (or the vacuum pressure is decreased from the pressure Q21) During the period to the pressure Q22, the valve opening degree of the electric vacuum valve 21 is set to the valve opening degree corresponding to the pressure drop curve γι. 41 as shown by the set point P23 of the valve opening degree in the figure, from time t22 to t23. During the elapsed period (or the period during which the vacuum pressure drops from the pressure Q22 to the pressure Q23), the valve opening degree of the electric vacuum valve 21 is set to a valve opening degree corresponding to the pressure drop curve γ2 'the valve opening degree setting point P24 in the figure. As shown, the period elapsed from time t23 to 124 (or the period during which the vacuum pressure drops from the pressure q23 to the pressure Q24) 'sets the valve opening degree of the electric vacuum valve 21 to the valve opening degree corresponding to the pressure drop curve Y2. , as shown in the valve opening degree As shown in p25, the period of time elapsed from time t24 to 125 (or the period during which the vacuum pressure drops from the pressure Q24 to the pressure Q25) sets the valve opening degree of the electric vacuum valve 21 to the valve opening degree corresponding to the pressure drop curve Y4. As shown by the set point p26 of the valve opening degree in the figure, the period from the time t25 to the time t26 (or the period during which the vacuum pressure drops from the pressure Q25 to the pressure Q26) sets the opening degree of the electric vacuum valve 21 to the pressure. The valve opening degree corresponding to the falling curve Y5. 64, after the time t26 (or after the vacuum pressure drops to the pressure Q26), if the valve opening degree of the electric vacuum valve 21 is set to the valve opening degree corresponding to the pressure drop curve γ8, By the expansion of the valve opening degree of the electric vacuum valve 21 through the seven-stage expansion, the vacuum pressure is evacuated from the atmospheric pressure to the absolute vacuum in a state of approximating the target pressure drop gradient X. Therefore, as shown in Fig. 6 and Fig. 8, it is understood that the valve opening degree of the electric vacuum valve 21 is set in a multiple of the ratio, and the pressure drop curve of 24 201128340 obtained for each valve opening degree set is approximated to the target pressure. The descending gradient χ produces a phase difference', and the set point for switching the valve opening degree is determined in the case where the pressure drop curve approximates the target pressure drop gradient (4) portion does not overlap. In other words, it can be seen that if the force of the straight line is reduced, the gas of the reaction (4) is discharged to the true U13', the ratio of the opening of the electric vacuum valve 21 can be set by the multiple. Where is the point-to-point switching opening degree? The set point of the valve opening degree is determined according to the set target pressure drop gradient X, and no risk is required to set it. When comparing the graphs of Fig. 6 and Fig. 8, it is found that if the value of the equal magnification is set to be small, the set point pu~ρΐ3 of the valve opening degree and the setting of the opening degree UP21 to Ρ26 are shown in the figure. The connecting portion of the pressure drop curve approximates the target pressure drop gradient X, and no waste is generated at the joint portion of the pressure drop curve. In other words, the value of the multiple of the equal magnification is set to be small, and the more the number of times the valve opening degree of the electric vacuum valve 21 is switched, the more the linear velocity can be controlled when the vacuum pressure is lowered. Further, as shown in Figs. 6 and 8, if the value of the multiple is set to be large, the number of measured pressure drop curves is reduced. Specifically, four pressure drop curves are required when the equal magnification is set to twice, and seven pressure drop curves are required when the equal ratio number is set to γ 2 times, and the equal ratio multiple is set to When 2 times, the pressure drop curve is reduced by 3 times when the equal ratio is set to /"2 times. The pressure drop curve is by means of an electric vacuum valve. The valve opening degree is set to be equal to the valve opening degree of the equal ratio and is obtained by vacuuming from atmospheric pressure to absolute vacuum. Therefore, it takes time to obtain the force drop curve because the value of the equal ratio multiple is set. Large, and reducing the number of pressure drop curves that should be taken by 25 201128340, the acquisition time of the pressure drop curve can be shortened, and the time for determining the valve opening degree of the electric vacuum valve 21 in a manner similar to the target pressure drop gradient 缩短 can be shortened. <Exhaust speed control method by electric vacuum valve: Exhaust speed control data generation operation> Here, an exhaust speed control method by an electric vacuum valve using the above vacuum pressure characteristics will be described. Figure 9 is a flow chart showing the download operation of the exhaust speed determination program. The first to sixth figures show an example of the face displayed on the screen 63a. Figure 17 is a flow chart of the exhaust speed determination program. The figure is a flow chart of the vacuum pressure control program. The personal computer 63 is simply referred to as "Si" in the step K of Fig. 9 based on the request from the user. On the screen 63a of the personal computer 63, the download confirmation screen shown in Fig. 10 is displayed. In the download confirmation screen, the message "Is the exhaust speed determination program to be downloaded, do you want to download it?" is displayed. Therefore, to download the user, click the "Confirm" button for the user to click the button. Thus, the personal computer 63 is connected to the server 61 via the Internet 62, and the exhaust speed determining program is downloaded from the server 61. The personal computer 63 will stand by until the exhaust speed determination program is downloaded (S2 of Figure 9: No). When the exhaust speed determination program is downloaded (S2: YES), the personal computer 63 displays the contour multiple setting screen shown in Fig. 11 on the screen 63a in S3 of Fig. 9. In the equal magnification setting screen, the input ratio multiple input is set to B3. The user inputs the desired multiple (two times) from the keyboard of the personal computer 63 into the equal multiple column B3, and then the mouse, etc. Click the confirmation button B4. When the personal computer 6 3 confirms that the button B4 is selected, it is judged that the ratio of the valve opening 26 201128340 degrees is set (S4 in FIG. 9), and in S5, the target pressure in the FIG. 12: gradient setting screen is set. Displayed in the screen cafe. "Standard pressure drop gradient « and 疋 screen, set the target pressure drop gradient input 襕, used to turn the target pressure drop gradient X from the large rolling pressure to linearly reduce the vacuum pressure to absolute vacuum, and 5 is also used to lose The exhaust time of the human exhaust time is turned into the B6. The user inputs the target pressure drop gradient 手动 in the target pressure drop gradient input 襕β5 by dragging the mouse, or by inputting in the exhaust time. Block 6 the input exhaust time to determine the target pressure drop gradient X. For example, if you want the exhaust time to be shorter, as shown in the figure, make the target pressure drop gradient input field Β5 target pressure drop gradient The inclination becomes larger, and on the other hand, if it is desired that the exhaust time is long, as shown in the figure, the inclination of the target pressure drop gradient X displayed on the target pressure drop gradient input block β5 becomes smaller. Enter the exhaust time input block: 6 time to set the length of the exhaust time. If the exhaust pressure time can be turned on, the target pressure from the atmospheric force will be lowered by the gradient X according to the exhaust time. It is better to display it in the target pressure drop gradient input field β5. The setting of the pressure drop gradient X or the exhaust time is set to end, and the user uses the mouse button B7. When the confirmation button is clicked on the personal computer 63, It is judged that the target pressure drop gradient X has been set (S6: YES), and the setting content shown in the _th sheet is displayed on the screen 63a in S7 of Fig. 9. The setting in the setting content confirmation screen is not displayed. "8" shows the ratio of the valve opening degree set by the user and the target pressure drop gradient X set by the user. When the user confirms that the display content of the setting display capsule is correct, the mouse point is Select the "Accept 27 201128340" button B9. Further, if the user wants to change the display content of the setting display block B8, click the "Change" button B10 with the mouse. In this case (S8: change in Fig. 9), the personal computer 63 returns to S3 in Fig. 9, and the equal magnification setting screen shown in Fig. 11 is displayed again. When the "OK" button of the setting content confirmation screen is clicked by B9 (S8: OK in Fig. 9), the personal computer 63 displays the USB memory insertion instruction shown in Fig. 14 on the screen 63a. In the USB memory insertion instruction screen, the "Exhaust speed determination program, the set ratio, and the set target pressure drop gradient will be copied to the USB memory. Please insert the USB memory into the USB port." Such instructions. After the user inserts the USB memory 64 into the USB port of the personal computer 63 in accordance with the instruction, the USB memory is inserted into the confirmation button B11 of the instruction screen. The personal computer 63 continues to stand by until the USB memory 64 is detected (S11: NO in Fig. 9). On the other hand, when the personal computer 63 detects the USB memory 64 (SI 1: YES), in S12 of Fig. 9, "the exhaust gas speed determining program is started to be copied in the USB memory 64, and the valve opening is set. The equal ratio of the degree and the set target pressure drop gradient χ. The copy progress is displayed in the copy progress display screen shown in Figure 15. When the copying of the personal computer 63 is completed, the copy completion notification screen shown in Fig. 16 is displayed in S13 of Fig. 9. On the copy completion notification screen, “Copy Yuan Bi. δ Qing will pull the USB s memory from the US 。. In addition, connect the § β memory to the control used to control the pressure in the reaction chamber. On the device, the exhaust gas speed determining program, the set ratio, and the set target pressure drop gradient are copied to the controller. Then, the preparation mode is selected and the valve is determined by the selecting device set on the controller. After setting the opening degree, please select the execution mode and execute the processing program by 28 201128340. Select the instruction. When the user understands the operation step from the display content, the confirmation button B12 of the notification screen is completed. At this time, the personal computer 63 ends the 9th figure = processing 'returns the display screen of the screen 6 3 a to the initial screen. The user carries the USB memory 64 and the controller 65 moves to a certain location. Then, the USB memory 64 is connected to the controller 65iUSB, and the exhaust speed determination program, the set ratio, and the set target pressure drop gradient X are copied from the memory 64 to the controller 65. When the copying is completed, the user selects the preparation mode by the selecting means 65a. At this time, control = cry 65 to execute the copied exhaust speed decision: ° ° is the flow chart of the exhaust speed decision program. As indicated by S15 in Fig. 17, the controller 65 notifies the user that the process of determining the exhaust speed is being executed with a flash. # Notification of the display lamp or the like: The user recognizes that the processing program cannot be executed in the decompression drying device i. Further, in S16, the controller 65 reads the equal ratio multiple of the set opening degrees, sequentially acquires and stores the pressure drop 哗 curve, that is, the controller 65 obtains the equal ratio multiples copied from the _memory 64. The valve opening degree of the electric vacuum valve 21 is output. Specifically, when the equal magnification is set to 2 times, 12.5% 2 5 %, 50%, 1 〇〇% 〇 of the stroke between the electric vacuum chamber 21 from the closed position to the fully open position is obtained. The slanting secret secretary Qishan..., silly for each valve opening obtained, find the pressure drop curve. That is, the controller steals the electric vacuum valve from the closed valve position to the fully open position I < 12 5% of the valve opening command is transmitted to the electric vacuum valve 21, " The vacuum pump 13 reduces the pressure of the reaction chamber 1 大气 from atmospheric pressure to absolute H. At this time, the controller 65 inputs the pressure measurement data from the pressure sensor i 5 which measures the pressure in the reaction chamber 1 用 with 29 201128340. Then, the controller 65 obtains a pressure drop curve indicating the relationship between the vacuum pressure and the time of the reaction chamber 1 from the input pressure measurement data as shown by Y1 in Fig. 5, so that the obtained pressure is obtained. The drop curve is associated with a set valve opening of 12.5% and stored in the memory area. Similarly, the controller w sets the valve opening degree of the electric vacuum valve 21 to 25%, 50%, 100% of the stroke from the closed position to the fully open position, and obtains pressure measurement data to determine the pressure obtained from the pressure. The pressure drop curves γ2, γ4, Υ8 of Fig. 5 obtained from the data are associated with the set reading degree of 25%, 5〇%, and 1%, and are stored in the memory area, respectively. Then, in S1 7, the exhaust speed control data is generated and stored according to the set target pressure drop gradient X and the taken pressure drop curve. Here, the exhaust gas velocity control data refers to data indicating the result of determining the set point for switching the valve opening. The set point of the valve opening is obtained from the relationship between the vacuum pressure and time. More specifically, the method of generating the exhaust velocity control data will be used to find the approximate target pressure drop gradient X for the obtained pressure drop curve m2, respectively, in the approximate portion Xi of FIG. Χ2, Χ4, Χ8 appear. As shown in Fig. 6, when the approximate target pressure is decreased by the gradient X and the pressure drop curve Υ1, Υ2 is shifted along the time axis, at Υ8, the period from the start of vacuuming to the time (1) and the vacuum pressure is lowered from the atmospheric pressure to Pressure 01 ΐΑΑ α > In the case of the force Qu, the pressure drop curve Y1, Υ2 and X' are in the period from the start of vacuuming to the time (1) and the vacuum pressure is lowered to > 1 force Q12, the force selection decreasing curve" In addition, after the vacuum is started to the time _ and the vacuum pressure drops to the pressure 30 201128340 force Q13, the pressure drop curves γ4, γ8 cross. Therefore, the intersection of the pressure drop curve Υ1' Υ 2 is set. Switch the valve opening from ι2. 5% to 25% of the set point Ρ11, set the pressure drop curve Υ2, and the intersection of ¥4 is set to switch the valve opening from 25% to 50% of the set point! >12, the pressure The intersection point of the descending curve γ4, γ8 is set to the set point ρΐ3 at which the valve opening degree is switched from 50%. Then, the set point pu, ρΐ2, ρΐ3 of the vacuum pressure and time are selected as the exhaust speed control data. Speed control data At the end of the generation and storage, in S1 8, the display or the like is turned off to inform the end of the exhaust speed determination operation, and the processing is completed. Thus, the user recognizes the executable processing program. <With the electric vacuum valve Exhaust speed control method: vacuum pressure control operation> Fig. 18 is a flow chart of the vacuum pressure control program stored in the controller 65. 31 201128340 The opening degree control signal is transmitted to the electric vacuum valve 21, and the valve of the electric vacuum valve 21 is used. The opening expansion is twice the opening degree of the previous valve, and the conductance coefficient of the exhaust system is increased. Then, after the controller 65 starts to evacuate to the valve opening degree switching time 112, the controller 65 sets the electric vacuum valve. The valve opening degree of 21 is set to 50% of the valve opening degree control 彳 § is transmitted to the electric vacuum valve 21, and the valve opening degree of the electric vacuum valve 21 is expanded to twice the opening degree of the previous valve to increase the exhaust system. Then, the controller 65 sets the valve opening degree of the electric vacuum valve 21 to 1%% of the valve opening degree control signal during the period from the start of the vacuuming to the valve opening degree switching time tj3. To electric vacuum 21 'Expand the valve opening degree of the electric vacuum valve 21 to twice the opening degree of the previous valve, and increase the conductance coefficient of the exhaust system. As a result, the pressure of the reaction chamber 1 如 is shown in Fig. 6, which is approximated by the user. In the state where the target pressure drop gradient X is set, the pressure is reduced from the atmospheric pressure to the absolute vacuum. Then, in S22, based on the pressure measurement data measured by the pressure sensor 丨5, it is judged whether the pressure of the reaction chamber 10 is beyond the viscosity. In the S21, before the viscous flow field is exceeded (S22: No), the electric vacuum valve 21 is used to control the exhaust velocity. On the other hand, after the pressure in the reaction chamber 1 exceeds the viscous flow field ( S22: Yes), the valve opening degree of the large-diameter vacuum interrupting valve 12 is adjusted to control the exhaust speed. The large-diameter vacuum interrupting valve 12 has a larger valve seat diameter than the electric vacuum valve 21, and can control a large flow rate, so that the exhaust can be performed more quickly than when the exhaust control is performed only by the electric vacuum valve. When the controller 65 finishes processing the wafer in the reaction chamber 10 (s24: YES), the wafer is carried out from the reaction chamber 1 in S25. Then, in S26, the controller 65 judges whether or not the button is pressed according to whether or not the end of the processing program is pressed, etc. 201128340 is instructed to end the vacuum pressure control'. It is judged whether or not the vacuum pressure control is ended. When the vacuum pressure control is continued without inputting an instruction (S26: NO), in S27, after the pressure of the reaction chamber 10 is atmospheric pressure, the next wafer is carried in S24. On the other hand, when the instruction is turned on to end the vacuum pressure control (S 2 6 : YES), the processing is terminated. Further, in the vacuum pressure control operation described above, the controller 65 can notify the program that it is being processed by a display lamp or the like. Further, the maximum number of sets of the valve opening degree (in the case of the valve opening degree 丨〇〇%) may sometimes enter a flow field (e.g., an intermediate flow field) that is affected by the conductance coefficient of the system. However, in this case, as shown in the pressure drop curve Y4 of Fig. 6, at least the exhaust speed can be faster than the set target pressure drop gradient X, and only the safety point with a slight deviation from the speed . In the above description, the case where the user sets the equal magnification to 2 times is exemplified. For example, when the user sets the equal ratio of the valve opening degree to 2, the same processing as described above is performed. As shown in Fig. 8, the valve opening degree setting points P21 to P26 are determined, and the exhaust speed is controlled in a more linear manner. <Effects and Effects> The following effects can be achieved by the exhaust gas velocity control method of the electric vacuum valve, the exhaust gas velocity control system 66, the valve opening degree determining method, and the valve opening degree reduction program. In order to reflect the control performance of the vacuum pump 13' to the exhaust pipe group 16 directly reflected in the exhaust speed, the valve opening degree of the electric vacuum valve 2 is staged according to the proportional multiple 33 201128340 control ' For each valve opening degree, the vacuum pump 13 is used to exhaust the viscous flow field. The pressure sensor 1 is used to measure the pressure measurement data of the pressure in the reaction chamber 1 。. That is, the device in which the electric vacuum valve 21 is disposed is used to measure the pressure measurement data for each valve opening degree. The pressure drop curves Y1, Υ2, γ3, Υ4 are obtained from the pressure measurement data measured for each valve opening degree, and when the pressure drop curves Υ1, Υ2, Υ3, Υ4 approximate the target pressure drop gradient X to generate a phase difference The pressure drop curves Υ2, Υ3, Υ4 intersect with the pressure drop curves Yl, Υ2, Υ3 of the previous valve opening, respectively. Therefore, the intersection of the respective pressure drop curves is determined as the set point Ρ11, Ρ12, Ρ13 for switching the valve opening degree of the electric vacuum 21. Thus, when the valve opening degree is changed according to the equal ratio multiple, the pressure drop curves γι, γ2, γ3 Υ4 corresponding to the respective valve opening degrees are not nearly overlapped with the target pressure drop gradient ,, so the set point is set? 11, Ρ1 2, Ρ13 will not be set to be meaningless. When the vacuum pressure control is performed, the valve opening degree of the electric vacuum valve 21 is switched according to the set point Ρ11, Ρ12, Ρ13, whereby the conductance coefficient of the exhaust pipe group 16 is changed, and the exhaust speed in the viscous flow field is controlled. At this time, the electric vacuum valve 21 is released from the portion of the reaction chamber 1〇 which is approximately the target pressure drop gradient X, and the valve opening degree is expanded to an equal ratio, so that the pressure of the reaction chamber 1 再次 is again approximated to the target pressure drop. The gradient, therefore, the pressure of the reaction chamber 10 can be lowered in a state of approximating the target pressure drop gradient X even in the viscous flow field. Thus, the pressure drop curve Π, Υ2, Υ3, Υ4 in the viscous flow field in the above-mentioned continuous application type is performed using the reaction chamber 1 〇 where the electric vacuum valve 21 is disposed, the vacuum pump 13 and the exhaust pipe group 丨6. Actually measured, therefore, the control performance of the electric vacuum valve 21 is set, and the good influence on the processing procedure in the viscous flow field may be reflected in the setting point PI 1 for switching the valve opening degree of the electric vacuum valve 21. , P12, P13 decision. In addition, if the valve opening degree is set, the personnel of P12 and P13 can only make / or approximate the measured pressure drop curve γι, γ2, γ3 even if they do not have the expertise to eliminate the adverse effects of the processing procedure. The drilling pressure drops the gradient χ and causes the pressure drop curves γ 1, Υ 2, Υ 3, Υ 4 to produce a phase difference, so that the pressure in the reaction chamber 1 近似 approximates the target pressure drop gradient X and determines the set point Ρ11, ρ ΐ 2, ρ ΐ 3 of the valve opening. As a result, in the above-described embodiment, in the case of the viscous flow field, the slave valve and the sub-valve are controlled by the slave to control the exhaust velocity (refer to Fig. 26), and it is not possible in the sticking field. The vacuum pressure exhaust control condition is obtained in the case of affecting the processing procedure, and the exhaust speed is shortened. Further, in the above embodiment, as in the case of feedback control of the exhaust velocity (refer to Fig. 27), the pressure in the reaction chamber cannot be linearly lowered, but the complicated control substrate, control program, etc. are not used, as compared with When the sub-valve and the mother valve are used to control the exhaust velocity (see Fig. 26), the exhaust velocity can be controlled such that the pressure in the reaction chamber 10 linearly decreases. Therefore, according to the above embodiment, the exhaust speed control method of the electric vacuum valve, the exhaust speed control system 66, the valve opening degree determining method, and the opening degree determining program can be set to be switched in a simple and low-cost manner. The set point P11, pl2, Ρ13 of the valve opening of the electric vacuum valve 21 causes the pressure in the reaction chamber to approximate the target pressure drop gradient X. In the above embodiment, the exhaust speed control method of the electric vacuum valve can set the geometrical multiple in the equal magnification setting screen. Therefore, if the equal multiplier is set smaller (for example, 2 times) in the equal-magnification setting, as shown in Fig. 35 201128340 8 , the number of set points for switching the valve opening of the electric vacuum valve can be increased. The set point is determined to be close to the target pressure drop gradient, so that the pressure in the reaction chamber is smoothly and smoothly changed. On the other hand, if the equal magnification is set to be large (for example, 2 times) in the equal magnification setting screen, as shown in Fig. 6, the number of pressure drop curves to be measured is reduced, and the valve can be shortened to determine the valve. The time at which the opening is set. Therefore, according to the exhaust gas velocity control method of the electric vacuum valve according to the above embodiment, the pressure of the reaction chamber 1〇 can be smoothly and smoothly changed by the set value of the multiple of the multiple ratio, and the valve opening can be ensured. The set point time, in turn, can reflect the individual requirements of the user on the exhaust speed control. In the above embodiment, the target pressure drop gradient X can be set in the target pressure drop gradient setting screen by the exhaust speed control method of the electric vacuum valve. Therefore, if the exhaust gas time is to be shortened, the target pressure drop gradient 乂 can be set by increasing the tilt angle in the target pressure drop gradient setting screen. On the other hand, if you want to slowly exhaust, you can set the target pressure drop gradient 缩小 by narrowing the tilt angle on the target pressure drop gradient setting screen. Therefore, according to the exhaust speed control method of the electric vacuum valve according to the above embodiment, by setting the target pressure drop gradient X, the exhaust time and the pressure change of the reaction chamber 可 can be adjusted, and then the use can be performed. The individual requirements are reflected in the exhaust speed control. In the above-described embodiment, the exhaust speed control method of the electric vacuum valve and the exhaust speed control system 66, in parallel with the electric vacuum valve 21, a large-mouth vacuum interrupt valve 丨2 is connected and connected to The reaction chamber 1〇 switches the valve opening of the electric vacuum valve 21 in the viscous flow % to control the exhaust speed. After the viscous flow field exceeds 36 201128340, the adjustment phase can control the large flow rate compared with the electric vacuum valve 21 . The mouth opening of the two-way shut-off valve 12, Α control the rolling catch. In this way, when the viscous flow field of the deposit is made to be slower than the electric vacuum, the possibility of the deposit being reduced by (4) is reduced, and the large-diameter vacuum is used to block the gap 12 for faster exhaust. ...the pressure of the reaction chamber 10 is reached from the atmospheric star force to the target vacuum dust force in a short time. This method and the system have a large volume in the reaction chamber 1G (the second embodiment) $ Next' illustrates the invention Fig. 19 is a schematic structural view showing an exhaust gas velocity control system 72. according to a second embodiment of the present invention. The pressure measurement data measured in the exhaust gas velocity control system of the present embodiment is used to determine the pressure. Decline curve, personal = use the pressure drop curve to determine the set point of the valve opening degree, the controller is set according to the decision; t point controls the vacuum pressure of the reaction (4). In this sense, the personal computer 63 and the controller 71 are " As an example of the pressure measuring device, the personal computer 63 is an example of the "exhaust speed determining device", and the controller is an example of the "vacuum pressure control device". The method for determining the set point of the valve opening degree by the exhaust speed control system 72 of the present embodiment is different from that of the second embodiment. Here, the differences from the first embodiment will be mainly described, and the same points as those of the first embodiment will be used in the drawings and descriptions, and the same reference numerals will be used. Its description. As shown in Fig. 19, the personal computer 63 is connected to the server 61' via the Internet 62 to download the exhaust speed determining program from the server 61. When the user executes the exhaust speed control program on the personal computer 63, the personal computer 63 executes
37 S 201128340 第20圖所示之處理，決定閥開度之設定點。第* 圖為排氣 速度決定程式的流程圖。 個人電腦63在S31中，與第9圖之S3相同，顯示等 數設定畫面（第11圖）’在S32中，判斷閥開度之笤a v ° ▼疋倍數是 否已設定好。當等比倍數設定畫面之等比倍數輪 八襴B 3被 輸入等比倍數且確認鈕B4被點選時，個人電腦63列斷出^ 開度之等比倍數已設定好（S32 :是），在S33中，顯_ μ 顯不第21 圖所示之壓力實測資料輸入晝面。在壓力實測資料許入责 面中’顯示「請對用來控制反應室之真空壓力的控制器役 定以下之閥開度以實測反應室之壓力變化，並輪入該實測 結果。」之類的指示。然後，在壓力實測資料輸入書面中， 顯示根據在S31中所設定之等比倍數（在此為2倍）所求出的 閥開度12. 5%，25%，50%，100%。因此，使用者帶著USB纪 憶體64去控制器71之設置場所’將USB記憶體64連接至控制 器71。然後，使用者對控制器71之閥開度設定裝置71a設定 閥開度12. 5%。此時，控制器71使反應室1〇之壓力從大氣壓 力減壓至絕對真空，將從壓力感測器丨5輸入至控制器71的 壓力測定資料儲存至USB記憶體64。使用者針對閥開度25%， 50%，100%，分別同樣地將壓力測定資料儲存至uSB記憶體 64。如此，當閥開度12. 5%，25%，5〇%，1〇〇%之壓力測定資 料被儲存至USB記憶體64之後，使用者從控制器71拔出USB 記憶體64，返回個人電腦63，將USB記憶體64連接至個人電 腦63，將儲存於USB記憶體64的壓力測定資料複製到個人電 脑6 3中。當複製完畢時，使用者以滑鼠等點選壓力實測資 38 201128340 料輸入畫面之輸入紐B21。 虽個人電腦6 3被點選輪入鈕B21時，根據閥開度之等比 倍數判斷壓力下降曲線之實測值是否被輸入（S34 :是），在 S35中，與第9圖之S5相同，將目標壓力下降梯度設定晝面 (參照第1 2圖）顯示於螢幕63a上。當使用者在目標壓力下降 梯度设定畫面中設定目標壓力下降梯度χ時（S36 :是），個 人電腦63在S37中產生排氣速度控制資料。排氣速度控制資 料之產生方法與第1 7圖之S 2 2相同，所以在此省略說明。 然後，個人電腦63在S38中，將第22圖所示之排氣速度 控制貝料確認畫面顯示於螢幕63a中，讓使用者確認排氣速 度控制資料的内容。在排氣速度控制資料確認畫面中，顯 示標示有閥開度之設定點的圖表B22及針對每個閥開度的 閥開時間B23。使用者，若想變更閥開度之設定點，可點選 變更鈕B25。在此情況下（S39:變更），個人電腦63返回幻丄， 讓使用者再次設定等比倍數及目標壓力下降梯度X。 另一方面’使用者若不想在排氣速度控制資料進行變 更，可點選「確定」按鈕B24(S39 :確定）。此時，個人電 腦63在S40中，將第23圖所示之記憶媒體設定指示晝面顯示 於螢幕63a上。在記憶媒體設定指示畫面中，顯示「將複製 閥開度之設定點，請在USB記憶體插入USB埠時，點選『1 定』。」之類的指示。因此，使用者將USB記憶體插入個人 電腦63之USB埠，點選記憶媒體設定指示晝面之設定鈕 B26。當個人電腦63檢測出uSB記憶體64(S41 :是），在s42 中將排氣速度控制資料複製到USB記憶體64中。當個人電腦 39 201128340 63對USB記憶體64所進行之排氣^丨* 拼軋迷度控制資料之複製完畢 時，在⑷中將第期所示之排氣速度決定結束畫面顯示於 螢幕63a，結束處理。在排氣速度決定結束畫面中，顯示「閥 開度之設定點已複製至USB記憶體中。咬收ττο U體中。晴將USB記憶體之閥 開度之設定點複製至真空壓力押制 刀径制系統之控制器t，並操 作處理程序開始開關。」之_的批-37 S 201128340 The processing shown in Figure 20 determines the set point of the valve opening. The figure * is a flow chart of the exhaust speed determination program. In S31, in the same manner as S3 in Fig. 9, the personal computer 63 displays an equal setting screen (Fig. 11). In S32, it is judged whether or not the valve opening degree 笤a v ° ▼疋 is set. When the equal-magnification setting screen is equal to the multiple of the rounds, the B 3 is input by the multiple and the confirmation button B4 is clicked, the ratio of the opening of the personal computer 63 is set to be equal (S32: Yes) In S33, the pressure measurement data shown in Figure 21 is displayed on the _ surface. In the pressure measurement data submission responsibilities, 'display', please use the following valve opening for the controller to control the vacuum pressure of the reaction chamber to measure the pressure change of the reaction chamber and turn the measurement result. Instructions. Then, in the written data of the pressure measurement data, the valve opening degree 12.5%, 25%, 50%, 100% obtained according to the equal ratio (here, 2 times) set in S31 is displayed. Therefore, the user connects the USB memory 64 to the controller 71 with the USB memory 64 to the setting place of the controller 71. Then, the user sets the valve opening degree of 12.5% to the valve opening degree setting means 71a of the controller 71. At this time, the controller 71 decompresses the pressure of the reaction chamber 1〇 from the atmospheric pressure to the absolute vacuum, and stores the pressure measurement data input from the pressure sensor 丨5 to the controller 71 to the USB memory 64. The user stores the pressure measurement data in the uSB memory 64 in the same manner for the valve opening degree of 25%, 50%, and 100%, respectively. Thus, when the pressure measurement data of the valve opening degree of 12.5%, 25%, 5〇%, and 1% is stored in the USB memory 64, the user pulls out the USB memory 64 from the controller 71 and returns to the individual. The computer 63 connects the USB memory 64 to the personal computer 63, and copies the pressure measurement data stored in the USB memory 64 to the personal computer 63. When the copying is completed, the user selects the pressure input value of the input screen B 2011 38340. When the personal computer 63 is clicked on the button B21, it is judged whether or not the measured value of the pressure drop curve is input based on the multiple of the valve opening degree (S34: YES), and in S35, it is the same as S5 of Fig. 9, The target pressure drop gradient setting surface (see Fig. 12) is displayed on the screen 63a. When the user sets the target pressure drop gradient 在 in the target pressure drop gradient setting screen (S36: YES), the personal computer 63 generates the exhaust speed control data in S37. The method of generating the exhaust speed control data is the same as that of S 2 2 in Fig. 7, and therefore the description thereof will be omitted. Then, in S38, the personal computer 63 displays the exhaust speed control beaker confirmation screen shown in Fig. 22 on the screen 63a, and allows the user to confirm the contents of the exhaust speed control data. On the exhaust speed control data confirmation screen, a graph B22 indicating the set point of the valve opening degree and a valve opening time B23 for each valve opening degree are displayed. If the user wants to change the set point of the valve opening degree, click the change button B25. In this case (S39: Change), the personal computer 63 returns to the illusion, and lets the user set the equal magnification and the target pressure drop gradient X again. On the other hand, if the user does not want to change the exhaust speed control data, click the "OK" button B24 (S39: OK). At this time, the personal computer 63 displays the memory medium setting indication screen shown in Fig. 23 on the screen 63a in S40. On the memory media setting instruction screen, "Set the copy valve opening setting point, please click "1" when the USB memory is inserted into the USB memory." Therefore, the user inserts the USB memory into the USB port of the personal computer 63, and clicks the setting button B26 of the memory medium setting indicator. When the personal computer 63 detects the uSB memory 64 (S41: YES), the exhaust speed control data is copied to the USB memory 64 in s42. When the copying of the exhaust control data by the personal computer 39 201128340 63 to the USB memory 64 is completed, the exhaust speed determination end screen shown in the first period is displayed on the screen 63a in (4). End processing. In the exhaust speed determination completion screen, it is displayed that the set point of the valve opening degree has been copied to the USB memory. The bite is ττο in the U body. The setting point of the valve opening of the USB memory is copied to the vacuum pressure. The controller of the knife diameter system, and the operation processing program starts the switch."
」之頬的才曰不。因此，使用者將USB 記憶體64從個人電腦63拔出，以、、典巧梦机 23以/月鼠荨點選排氣速度決定 結束晝面的確認紐b 2 7。雜此，/si , % 藉此個人電腦63結束第19圖所示 之處理。 然後’使用者帶著儲存有排氣速度控制資料（閥開度之 設定幻之_記憶體64,移動到控制器71之設置場所。然 後在控制益71上連接USB記憶體64，將排氣速度控制資料 (閥開度之設定點)儲存至控制器71中。之後，使用者操作 控制器71之處理程序開始開關m，根據排氣速度控制資料 使處理程序在控制器71中執行。 〈作用效果〉 於是本貫％型態之排氣速度控制方法除了在第1實施 型態中所說明過之作用效果，還能將在個人電腦63上所決 定之閥開度之設定點複製到控制器71中，所以，控制器” 會自動取付堡力測定資料，+需要決定閥開度之設定點， 於疋可m第1實施型態之控制器65更單純且低價之方式 得到控制器71之電路構造。 (第3實施型態） 接著，說明本發明之第3實施型態。 40 201128340 第3實施型態之排氣速度控制方法除了真空壓力控制 矛序之外其匕程序與第1實施型態之排氣速度控制方法相 同。所以，在此以與第1實施型態之不同點為中心來進行說 在本實施型態之排氣速度控制方法中，使根據排氣速 度控制資料（參照第6圖）切換電動真空閥21之閥開度的時 間點根據壓力m 15之壓力測定f料來進行，此點與第丄 實施型態不同。亦即，在控制器65使用第6圖所示之排氣速 度控制資料進行真空壓力控制的情況下，將電動真空閥21 之閥開度设定為1 2_ 5%且開始抽真空的同時，從壓力感測器 15輸入壓力測定資料，監控反應室10之壓力。當控制器65 檢測出壓力感測器1 5之壓力測定資料變為壓力Q1丨時，將電 動真空閥21之閥開度從12· 5%切換至25%。然後，當控制器 65檢測出壓力感測器丨5之壓力測定資料變為壓力卩丨2時，將 電動真空閥21之閥開度從25%切換至50%。再者，當控制琴 65檢測出壓力感測器1 5之壓力測定資料變為壓力Q1 3時，將 電動真空閥21之閥開度從50%切換至1〇〇%。 〈作用效果〉 在上述排氣速度控制方法中，使壓力感測器丨5之壓力 測定資料與排氣速度控制資料對照，來切換閥開度。因此， 上述排氣速度控制方法在排氣速度控制資料被設定之閥開 度之設定點P11因外在干擾（電導係數之合成等）而產生相 位差時’即使不配合該相位差而對該設定點P11之後之閥開 度之設定點P12，P13進行校正，也可使反應室1〇之壓力在 41 201128340 近似線性目標壓力下降梯度x的狀態下控制排氣速度。 又，本發明不受上述實施型態限定，可實現各種應用。 (1) 例如，在上述實施型態中，雖然藉由電動真空閥之 排氣速度控制方法使用於減壓乾燥裝置丨中，但其亦可使用 於半導體製造領域之CVD裝置、電漿裝置等使用於其它作業 工程的裝置、與半導體領域不同之領域的裝置(例如，將食 用麵包封裝於袋中再使袋内變成真空的裝置、乾燥食品用 之乾燥裝置）等。 (2) 例如，在上述實施型態中，電動真空閥21之驅動部 23使用了步進馬達27，但驅動部㈡亦可為螺線管式、風動 式等。 (3) 例如，在上述實施型態中，將排氣速度控制資料作 為映射貝料來取得，但亦可取得表格、函數所產生的排氣 速度控制資料。 ' (4 )例如，在上述實施型態中，使用排氣速度決定程式 使排氣速度控制資料在個人電腦63、控制器65中產生。相 對於此，❹者可—邊看著目錄之說明等，-邊製作排氣 速度控制資料。例如，使用者可根據所要之等比倍數切換 電動真空閥21之閥開度以實測塵力下降曲線，使所取得之 屢力下降曲線與所要之目標塵力下降梯度义進行對照，探食 、之邛刀，從探索出之部分以手動作業設定閥開度之 設定點’製作出排氣速度控制資料。在此情況下，不需要 職速度決定程式，可使成本變得便宜。相反地，若將排 軋速又決疋程式預先儲存於控制器Μ中並設定控制器μ之 42 201128340 排氣速度控制資料取得模式，合 a自動根據等比倍數控制電 動真空閥21之閥開度並取得壓力 一 于&刀T降曲線，製作出排氣速 度控制資料。在此情況下，排氣速 饼乱成度控制資料之製作讓使 用者投入的時間變短，使用上很方便。 ⑸例如，在上述實施型態中，使點性流場中之排氣速 度控制在電動真空閥21中進行’ #超出點性流場時，藉由 大口徑真空遮斷閥1 2控制排氣速度 相對於此，當反應室容積較小時， ’藉此’縮短排氣時間。 可僅電動真空閥21連接 至反應室’並僅藉由電動真空閥21來控制排氣速度。在此 情況下’電動真空閥21從大氣塵力到超出黏性流場之目標 真空壓力皆控制反應室10之壓力，所以，可更確實地防止 堆積物被捲起等情況並控制排氣速度。 (6)例如，在上述實施型態中，脫離黏性流場後，調整 位真二遮辦閥1 2之閥開度以控制真空壓力。相對於 此，隨著黏性流場之黏性下降，粒子變得不易被捲起，所 、了在黏性流場之黏性降低後，調整大口徑真空遮斷閥 U之閥開度以控制真空壓力。在此情況下，相較於在脫離 點性流場後藉由大口徑真空遮斷閥1 2控制真空壓力的情 况，可早一點使用大口徑真空遮斷閥12，進一步縮短排氣 速度。 【圖式簡單說明】 第1圖為本發明第1實施型態之排氣速度控制系統的概 略構造圖。 43 201128340 第2圖為電動真空閥的咅彳面圖’表示閉閥狀態。 第3圖表示在大氣壓力附近之黏性流場以相同比例變 化閥開度時的壓力下降曲線。縱軸代表真空壓力，橫軸代 表時間。 第4圖表不為了使第3圖所不之壓力下降曲線近似目標 壓力下降梯度而產生相位差的狀態。縱軸代表真空壓力， 橫軸代表時間。 第5圖表示在大氣壓力附近之黏性流場根據2倍等比倍 數變化閥開度時的壓力下降曲線。縱輪代表真空壓力，橫 軸代表時間。 第6圖表示為了使第5圖所示之壓力下降曲線近似目標 壓力下降梯度而產生相位差的狀態。縱軸代表真空壓力： 橫轴代表時間。 第7圖表示在大氣壓力附近之黏性流場根據/2倍等比 倍數變化閥開度時的壓力下降曲線。縱軸代表真空壓力， 橫軸代表時間。 第8圖表示為了使第7圖所示之壓力下降曲線近似目椁 壓力下降梯度而產生相位差的狀態。縱軸代表真空壓力了 橫軸代表時間。 第9圖為排氣速度決定程式之下載動作的流程圖。 第〗〇圖表示下載確認晝面之—例。 第π圖表示等比倍數設定畫面之一例。 第12圖表示目標壓力下降梯度設定畫面之一例。 第13圖表示設定内容確認晝面之一例。 44 201128340After that, the talent is not. Therefore, the user pulls out the USB memory 64 from the personal computer 63, and the cryptographic speed of the 梦 梦 荨 荨 荨 荨 荨 荨 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 In this case, /si, % ends the processing shown in Fig. 19 by the personal computer 63. Then the user carries the exhaust speed control data (the valve opening setting phantom_memory 64, moves to the setting place of the controller 71. Then the USB memory 64 is connected to the control benefit 71, and the exhaust is exhausted. The speed control data (set point of the valve opening degree) is stored in the controller 71. Thereafter, the user operates the controller 71 to start the switch m, and the processing program is executed in the controller 71 based on the exhaust speed control data. Effect of Operation> The exhaust gas velocity control method of the present % mode can also copy the set point of the valve opening determined on the personal computer 63 to the control in addition to the effect described in the first embodiment. In the controller 71, the controller will automatically take over the fort measurement data, and the set point of the valve opening degree needs to be determined. The controller 65 of the first embodiment of the controller can obtain the controller in a simpler and lower cost manner. Circuit configuration of 71. (Third embodiment) Next, a third embodiment of the present invention will be described. 40 201128340 The third embodiment of the exhaust gas velocity control method is the same as the vacuum pressure control spear sequence. 1 real In the exhaust gas speed control method of the present embodiment, the exhaust gas speed control method is the same as the first embodiment. Referring to Fig. 6), the timing at which the valve opening degree of the electric vacuum valve 21 is switched is performed based on the pressure measurement of the pressure m 15 , which is different from the third embodiment. That is, the controller 65 uses the sixth drawing. When the exhaust speed control data is shown as the vacuum pressure control, the valve opening degree of the electric vacuum valve 21 is set to 1 2 5% and the pressure measurement data is input from the pressure sensor 15 while the vacuum is started. The pressure of the reaction chamber 10 is monitored. When the controller 65 detects that the pressure measurement data of the pressure sensor 15 becomes the pressure Q1, the valve opening degree of the electric vacuum valve 21 is switched from 12.5% to 25%. When the controller 65 detects that the pressure measurement data of the pressure sensor 丨5 becomes the pressure 卩丨2, the valve opening degree of the electric vacuum valve 21 is switched from 25% to 50%. Further, when the control piano 65 is detected The pressure measurement data of the pressure sensor 15 becomes the pressure Q1 3 At this time, the valve opening degree of the electric vacuum valve 21 is switched from 50% to 1%. <Effects> In the above-described exhaust speed control method, the pressure measurement data and the exhaust speed control of the pressure sensor 丨5 are controlled. In the data comparison, the valve opening degree is switched. Therefore, the above-described exhaust speed control method is when the phase difference is generated due to external disturbance (combination of conductance, etc.) at the set point P11 of the valve opening degree at which the exhaust speed control data is set. Even if the set point P12, P13 of the valve opening degree after the set point P11 is corrected without matching the phase difference, the pressure of the reaction chamber 1〇 can be controlled in the state of 41 201128340 which is approximately the linear target pressure drop gradient x. Further, the present invention is not limited to the above embodiment, and various applications can be realized. (1) For example, in the above embodiment, although the exhaust speed control method of the electric vacuum valve is used in the vacuum drying apparatus, it can also be used in a CVD apparatus, a plasma apparatus, etc. in the field of semiconductor manufacturing. It is used in devices for other work projects, devices in fields other than the semiconductor field (for example, a device that packs bread in a bag and then vacuums the bag, and a drying device for dry food). (2) For example, in the above embodiment, the stepping motor 27 is used as the driving portion 23 of the electric vacuum valve 21. However, the driving portion (2) may be a solenoid type, a pneumatic type or the like. (3) For example, in the above embodiment, the exhaust gas velocity control data is obtained as a map material, but the exhaust gas velocity control data generated by the table and the function may be obtained. (4) For example, in the above embodiment, the exhaust speed control data is generated in the personal computer 63 and the controller 65 using the exhaust speed determination program. In contrast, the latter can make an exhaust speed control data while looking at the description of the catalog. For example, the user can switch the valve opening degree of the electric vacuum valve 21 according to the desired multiple of the ratio to measure the dust force drop curve, so that the obtained repeated force drop curve is compared with the desired target dust force gradient, and the food is inspected. For the boring tool, the exhaust speed control data is created from the set point of the valve opening by manually setting the valve opening degree. In this case, the speed determination program is not required, and the cost can be made cheap. Conversely, if the row rolling speed and the breaking program are pre-stored in the controller 并 and the controller μ 42 201128340 exhaust speed control data acquisition mode is set, a automatically controls the valve opening of the electric vacuum valve 21 according to the equal ratio multiple. And take the pressure one and the knife T drop curve to make the exhaust speed control data. In this case, the production of the exhaust speed cake control data makes the user's investment time shorter and is convenient to use. (5) For example, in the above embodiment, when the exhaust speed in the point flow field is controlled in the electric vacuum valve 21 to perform the '#excessive flow field, the exhaust is controlled by the large-diameter vacuum interrupting valve 1 2 The speed is relative to this, when the reaction chamber volume is small, 'by this' shortens the exhaust time. Only the electric vacuum valve 21 can be connected to the reaction chamber' and the exhaust speed can be controlled only by the electric vacuum valve 21. In this case, the electric vacuum valve 21 controls the pressure of the reaction chamber 10 from the atmospheric dust force to the target vacuum pressure exceeding the viscous flow field, so that the deposit can be more reliably prevented from being rolled up and the exhaust speed can be controlled. . (6) For example, in the above embodiment, after the viscous flow field is released, the valve opening degree of the valve 2 is adjusted to control the vacuum pressure. On the other hand, as the viscosity of the viscous flow field decreases, the particles become less likely to be rolled up, and after the viscosity of the viscous flow field is lowered, the valve opening degree of the large-diameter vacuum interrupting valve U is adjusted. Control the vacuum pressure. In this case, the large-diameter vacuum shutoff valve 12 can be used earlier to further shorten the exhaust speed as compared with the case where the vacuum pressure is controlled by the large-diameter vacuum shutoff valve 12 after the point flow field is released. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic structural view showing an exhaust gas velocity control system according to a first embodiment of the present invention. 43 201128340 Fig. 2 is a side view of the electric vacuum valve' showing the closed state. Figure 3 shows the pressure drop curve when the viscous flow field near atmospheric pressure changes the valve opening at the same ratio. The vertical axis represents vacuum pressure and the horizontal axis represents time. The fourth graph does not cause a phase difference in order to approximate the target pressure drop gradient by the pressure drop curve not shown in Fig. 3. The vertical axis represents vacuum pressure and the horizontal axis represents time. Fig. 5 is a graph showing the pressure drop curve when the viscous flow field in the vicinity of atmospheric pressure changes the valve opening degree in accordance with the double equal ratio. The vertical wheel represents vacuum pressure and the horizontal axis represents time. Fig. 6 is a view showing a state in which a phase difference is generated in order to approximate the target pressure drop gradient by the pressure drop curve shown in Fig. 5. The vertical axis represents vacuum pressure: The horizontal axis represents time. Fig. 7 is a graph showing the pressure drop curve when the viscous flow field in the vicinity of atmospheric pressure changes the valve opening degree according to a multiple of /2 times. The vertical axis represents vacuum pressure and the horizontal axis represents time. Fig. 8 is a view showing a state in which a phase difference is generated in order to approximate the pressure drop gradient shown in Fig. 7 to the pressure drop gradient. The vertical axis represents vacuum pressure and the horizontal axis represents time. Figure 9 is a flow chart showing the download operation of the exhaust speed determination program. The first 〇 diagram shows the example of downloading confirmation. The πth diagram shows an example of the equal magnification multiple setting screen. Fig. 12 shows an example of a target pressure drop gradient setting screen. Fig. 13 shows an example of setting the content confirmation screen. 44 201128340
概略構造圖。 第20圖為排氣速度決定程式的流程圖。 第21圖表示壓力實測資料輸入晝面之一例。 第22圖表示排氣速度控制資料確認畫面之-例。 第23圖表示記憶媒體設定指示畫面之一例。 第24圖表示排氣速度決定完畢晝面之一例。 第25圖表示減壓乾燥裝置的概略構造。 第26圖表示藉由2段排氣的排氣速度控制方法。 第27圖表示藉由回饋控制之電動真空閥的排氣速度控 制方法。 【主要元件符號說明】 10〜反應室； 12〜真空遮斷閥； 13〜真空泵； 16〜排氣配管群； 2 2〜閥部； 24〜球體； 26〜上蓋； 1 5〜壓力感測器； 21〜電動真空閥； 2 3〜驅動部； 25〜汽缸體； 27〜步進馬達； 45 201128340 65a〜選取裝置 71 ~控制器（真空壓力控制裝置之一例 71a〜閥開度設定裝置 28〜螺栓； 31〜收納空間部； 3 3〜夹具； 3 5〜固定钉； 3 7〜驅動轴； 38~旋轉中止螺帽； 39〜固定釘； 4卜結合銷； 43〜連結螺帽； • 45~彈簧座； 46a〜失持部； 球體圓盤； 5〇〜環狀密封元件； 52〜第二連接埠； 54〜閥座； 61〜伺服器； 63〜個人電腦（壓力實剛裝 例）； 63a~勞幕； 65~控制器（壓力實測裝置 壓力控制裝置之一例）； 30〜輪出軸； 3 2〜轴承； 輸送釘螺帽； 3 6 ~輪送釘轴； 37a〜旋轉中止軸部； 38a〜旋轉中止孔； 4 0〜連結元件； 42〜閥體； 44~回歸彈簧； 46~波紋軟管； 47〜波紋軟管圓盤； 49〜擋板； 51〜第一連接埠； 5 3 ~閥室； 58~耦合器； 6 2 ~網際網路； 置、排氣速度決定裝置之一 64〜USB記憶體； '排氣速度決定裝置、真空 66~排氣速度控制系統； 9 71b〜處理程序開始開關 46 201128340 72〜排氣速度控制系統。 47Schematic diagram. Figure 20 is a flow chart of the exhaust speed determination program. Figure 21 shows an example of the input of the pressure measurement data. Fig. 22 shows an example of the exhaust speed control data confirmation screen. Fig. 23 shows an example of a memory medium setting instruction screen. Fig. 24 shows an example of the completion of the exhaust velocity determination. Fig. 25 is a view showing the schematic structure of a vacuum drying apparatus. Fig. 26 shows a method of controlling the exhaust speed by the two-stage exhaust. Fig. 27 shows an exhaust gas velocity control method of the electric vacuum valve controlled by feedback. [Main component symbol description] 10~ reaction chamber; 12~vacuum interrupt valve; 13~vacuum pump; 16~exhaust pipe group; 2 2~valve; 24~sphere; 26~top cover; 1 5~pressure sensor 21~ electric vacuum valve; 2 3~ drive unit; 25~cylinder block; 27~stepping motor; 45 201128340 65a~ selection device 71 ~ controller (vacuum pressure control device one example 71a~ valve opening degree setting device 28~ Bolt; 31~ storage space; 3 3~ clamp; 3 5~ fixing nail; 3 7~ drive shaft; 38~ rotation stop nut; 39~ fixing nail; 4 binding pin; 43~ connecting nut; ~ spring seat; 46a~ off-hand; ball disc; 5〇~ ring seal element; 52~ second port; 54~ valve seat; 61~ server; 63~ PC (pressure just installed) 63a~ screen; 65~ controller (one example of pressure measuring device pressure control device); 30~ wheel output shaft; 3 2~ bearing; conveying nail nut; 3 6 ~ wheel nail shaft; 37a~ rotation stop shaft ; 38a~ rotating stop hole; 4 0~ connecting element; 42~ valve body; 44~return spring 46~ corrugated hose; 47~ corrugated hose disc; 49~ baffle; 51~ first connection 埠; 5 3 ~ valve chamber; 58~ coupler; 6 2 ~ internet; One of the determining devices 64 to USB memory; 'exhaust speed determining device, vacuum 66 to exhaust speed control system; 9 71b~ processing program start switch 46 201128340 72 ~ exhaust speed control system.