TW201032931A - Laser patterning method and laser patterning device - Google Patents

Laser patterning method and laser patterning device Download PDF

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Publication number
TW201032931A
TW201032931A TW098145091A TW98145091A TW201032931A TW 201032931 A TW201032931 A TW 201032931A TW 098145091 A TW098145091 A TW 098145091A TW 98145091 A TW98145091 A TW 98145091A TW 201032931 A TW201032931 A TW 201032931A
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Taiwan
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substrate
laser
pattern
glass substrate
line data
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TW098145091A
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Chinese (zh)
Inventor
Masanori Tao
Tomoo Uchikata
Naoyoshi Hamakawa
Hiromitsu Wada
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Toray Eng Co Ltd
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Publication of TW201032931A publication Critical patent/TW201032931A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/0869Devices involving movement of the laser head in at least one axial direction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/083Devices involving movement of the workpiece in at least one axial direction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/362Laser etching
    • B23K26/364Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/18Sheet panels
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Abstract

The subject of this invention is not to cause contact or error in interval dimension for the patterns formed on the substrate by laser light in the front-end process and the patterns formed on the substrate by laser light in the back-end process. The solution means of this invention is a laser patterning method, which forms specified patterns on the substrate (K) by the relative drive of substrate (K) and laser light (b2), and includes: an imitation datum line data acquisition step (S200) using the data of the first pattern (LA1) shape formed on the substrate (K) in a specific front-end process as the acquisition of imitation datum line data (D2); and a second pattern forming step (S300) relative driving substrate (K) and laser light (b2) based on the imitation datum line data (D2) so that the trajectory tracked by the laser light (b2) in the back-end process becomes the shape that imitates the shape of the first pattern (LA1) and forms the second patterns (L1).

Description

201032931 , 四、 指定代表圖: (一) 本案指定代表圖為:第(6 )圖。 (二) 本代表圖之元件符號簡單說明· 9 :控制裝置 52Y、74X、74Y:線性馬達 73:雷射照射頭 7 7 :攝影機 9 1 :輸入/輸出裝置 9 2 : s己憶部(記憶手段) ® 93:運算處理部c算出手段) 95:硬碟裝置 96 :介面電路 D1 :影像資料 D 2 :倣元線資料 K:玻璃基板 L1 :第一條刻劃線 LA1 :刻劃線 ❿ 五、 本案若有化學式時,請揭示最能顯示發明特 徵的化學式: 六、 發明說明: 【發明所屬之技術領域】 本發明疋關於雷射加工方法(laser patterning meth〇d)及雷射加工裝置(laser patterning equipment)。 2 201032931 更詳細為關於藉由相對驅動基板與雷射光,在基板加工形 成規定的圖案之方法及裝置。 【先前技術】 為了製造薄膜太陽電池板(thin film solar cell pane 1) 的雷射圖案形成(laser卩以忟^辻“製程一般可大大地分 成4個製程。亦即,第一製程如圖ι5(Α)所示,藉由雷射光 bl刻劃(scribe)成膜於透明玻璃Kt之上(在圖中為下)的 ⑩ TC0 膜(Transparent Conducting Oxide:氧化物透明導電 媒)Kjl之製程。第二製程如圖15(b)所示,藉由雷射光b2 選擇性地僅刻劃成膜於TC0膜κ〗丨之上的非晶矽(am〇rph〇us silicon)膜Kj2之製程。第三製程如圖15(c)所示,藉由雷 射光b3選擇性地僅刻劃非晶矽膜Kj2與成膜於非晶矽膜201032931, IV. Designated representative map: (1) The representative representative of the case is: (6). (2) A brief description of the component symbols of the representative figure. 9: Control devices 52Y, 74X, 74Y: Linear motor 73: Laser irradiation head 7 7 : Camera 9 1 : Input/output device 9 2 : s 忆 部 (memory Means) ® 93: Calculation processing unit c calculation means) 95: Hard disk device 96: Interface circuit D1: Image data D 2: Meta-line data K: Glass substrate L1: First scribe line LA1: scribe line ❿ 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: 6. Description of the invention: [Technical field of the invention] The invention relates to a laser patterning meth〇d and a laser processing apparatus (laser patterning equipment). 2 201032931 More specifically, it relates to a method and apparatus for forming a predetermined pattern on a substrate by relatively driving a substrate and laser light. [Prior Art] In order to manufacture a laser pattern of a thin film solar cell pane 1 (laser), the process can be generally divided into four processes. That is, the first process is as shown in FIG. (Α), a process of forming a 10 TC0 film (Transparent Conducting Oxide) Kjl formed on the transparent glass Kt (bottom in the figure) by laser light bl is scribed. As shown in FIG. 15(b), the second process is selectively etched only by the laser light b2 to form an amorphous germanium film Kj2 over the TC0 film. The third process is as shown in FIG. 15(c), and only the amorphous germanium film Kj2 is selectively scribed by the laser light b3 and formed into an amorphous germanium film.

Kj2之上的金屬膜Kj3之製程。第四製程如圖15(D)所示, 藉由雷射光b4同時刻畫TC〇膜川與非晶賴川與金屬 膜Kj3的全部之製程。在第一製程與第二製程之間另存在形 ©成非晶梦膜Kj2的製程,在第二製程與第三製程之間另存在 形成金屬膜Kj3的製程。 在上述的各 別叼蚵豕朕的柯料[電路形The process of the metal film Kj3 above Kj2. As shown in Fig. 15(D), the fourth process is characterized by laser light b4 simultaneously depicting all processes of TC film and amorphous Laichuan and metal film Kj3. Between the first process and the second process, there is another process of forming the amorphous film Kj2, and a process of forming the metal film Kj3 exists between the second process and the third process. In the above-mentioned various materials [circuit shape

成用材料)不同,其加工方法昤& A 乃在除了改變雷射光的波長之外基 本上是相同。亦即’藉由相對雕私 対驅動破成膜的玻璃基板K與昭 射雷射光的雷射照射頭,在對象聪^ 仕對象膜形成複數條筆直的刻劃蝮 (例如下述專利文獻1)。據卜, τ 各層的材料各自以刻劃線 LAI、LI、LB1、LC1為界線祜知j 到綠 被切邊成相鄰的材料。該等刻劃 3 201032931 線LAI、Ll、LB 1、LC1為擔負相鄰的同一層間的絕緣及上下 的異質層的導通的任務之區域’為無助於發電之所謂的死區 (dead zone) 〇 [專利文獻1]曰本國特開2001-111078號公報 【發明内容】 一般在薄膜太陽電池板的製造線中,上述的第一至第四 製程為每一製程为成各個雷射刻劃裝置(laser scribing ❹apparatus),例如往往以總計4台的裝置階段性地依次被進 行。這種情形即使可在各個裝置中形成筆直且平行的刻劃 線’也會因每一裝置存在的各個機械的個體差而產生如下的 情況不佳。 例如在第二製程形成的刻劃線L1於接近在第一製程形 成的刻劃線LA1的間隔尺寸誤差方向的方向偏移的情形 等’即使各個間隔尺寸誤差量彼此少,也有刻劃線LAI、L1 彼此接觸之虞^乃因該等兩條刻劃線La 1、L1間的距離d(參 ❿照圖15(B))—般窄到數lOym左右。而且,即使是朝彼此 遠離的方向偏移的情形也不會接觸’由於刻劃線L a 1與刻劃 線L1的間隔d擴大使得死區擴大’其結果,薄膜太陽電池 板的發電效率(power generation efficiency)(轉換效率 (conversion efficiency))就會降低。 因此,在這種雷射刻劃製程中’每一製程設置的雷射刻 - 劃裝置可各自形成筆直的刻劃線也很重要,惟考慮兼顧在後 段的製程形成的刻劃線L1與在前段的製程形成的刻劃線 201032931 LA1的形狀或位置關係,不引起與該前段的刻劃線LA1的接 觸或間隔尺寸誤差等也很重要。 如此,在前段的製程形成的圖案(pat tern)與在後段的 製程形成的圖案不會接觸或不會引起間隔尺寸誤差,可形成 囷案的技術即使是太陽電池板的製造程序中的雷射圖案形 成製程以外也被要求。例如液晶面板(liquid crystal panel)或電聚顯示器面板(piasma display panel)、可撓 性面板(flexiblepanel)、其他的薄片(sheet)材料的製造 U程序等。本發明是鑒於這種情況所進行的創作,目的為提 供一種雷射加工方法及雷射加工裝置,可不使在前段的製 程藉由雷射光形成於基板的圖案與在後段的製程藉由雷射 光形成於該基板的圖案引起接觸或間隔尺寸誤差。 上述目的是藉由下述的本發明達成。此外,在本棚([發 明内容])中附加於各構成要素的加括號的符號是表示與在 後述的實施形態記載的具體的手段(means)對應的關係。 申請專利範圍第1項的發明是一種雷射加工方法,藉 ®由相對媒動基板(K)與雷射光(b2)在基板(κ)加工形成規定 的圖案,其特徵包含,·以特定在前段的製程形成於基板(κ) 的第一圖案(LA1)的形狀的資料當作倣元線(仿照先被加工 的基準線的形狀的線)資料(D2)取得之倣元線資料取得步 驟(S200 );根據倣元線資料(D2),相對驅動基板(κ)與雷射 •光(b2),俾在後段的製程雷射光(b2)所追蹤的軌跡成為仿 '照第一圖案(LA1)的形狀的形狀並形成第二圖案(L1)之第 二圖案形成步驟(S300 )。 5 201032931 申請專利範圍第2項的發明是在前述基板(κ)於至少一 方的面成膜有由複數層構成的電路形成用材料(Kj),在倣 元線資料取得步驟(S2 00)中算出、記憶形成於第一層的電 路形成用材料(Kjl)之第一圖案(LA1)的倣元線資料(D2), 在第二圖案形成步驟(S300)中根據倣元線資料(j)2),在第 二層的電路形成用材料(Kj2)形成第二圖案(L1)。 在申請專利範圍第3項的發明中’前述基板(g)是由成 膜有使用於薄膜太陽電池板的製造的電路形成用材料(Kj) ❺之玻璃基板構成,前述雷射光(b2)被調整成可刻劃電路形 成用材料(Kj)的功率(power),被使用於製造薄膜太陽電池 板的製程。 申請專利範圍第4項的發明是一種雷射加工裝置(1), 藉由相對驅動基板(K)與雷射光(b2)在基板(κ)加工形成規 定的圖案’其特徵包含:以特定在前段的製程形成於基板(κ) 的第一圖案(LA1)的形狀的資料當作倣元線資料(ρ2)取得 之傲元線資料取得手段(77, 9);根據倣元線資料(D2),相 〇對驅動基板(K)與雷射光(b2),俾在後段的製程雷射光(1)2) 所追蹤的軌跡成為仿照第一圖案(LA1)的形狀的形狀並形 成第一圖案(L1)之第二圖案形成手段(?)。 申請專利範圍第5項的發明是在前述基板(]〇於至少一 方的面成膜有由複數層構成的電路形成用材料(Kj),倣元 •線資料取得手段(77, 9)包含:拍攝形成於第一層的電路形 -成用材料的第一圖案(LA1)之攝影手段(77);算出、 記憶倣元線資料(D2)之算出、記憶手段(9),第二圖案形成 6 201032931 手段(7)根據倣元線資料(D2),在第二層的電路形成用材料 (K j2)形成第二圖案(L1)。 在申請專利範圍第6項的發明中,前述基板(K)是由成 膜有使用於薄膜太陽電池板的製造的電路形成用材料 之玻璃基板構成’包含照射可刻劃電路形成用材料j )的 雷射光(b)之雷射照射頭(73),被使用於製造薄膜太陽電池 板的製程。 @ 【發明的功效】 依照本發明’可不使在前段的製程藉由雷射光形成於 基板的圖案與在後段的製程藉由雷射光形成於該基板的圖 案引起接觸或間隔尺寸誤差。The material used in the process is different, and the processing method 昤 & A is substantially the same except for changing the wavelength of the laser light. In other words, a plurality of straight scribes are formed on a target film of a target film by driving a glass substrate K that is broken by a film and a laser irradiation head that emits laser light (for example, Patent Document 1 below) ). According to the paper, the materials of each layer of τ are each defined by the scribe lines LAI, LI, LB1, and LC1, and the green is trimmed into adjacent materials. These characterizations 3 201032931 Lines LAI, L1, LB 1, and LC1 are the areas of the task of carrying on the insulation between adjacent layers and the conduction of the upper and lower heterogeneous layers. A so-called dead zone that does not contribute to power generation.专利 [Patent Document 1] Japanese Laid-Open Patent Publication No. 2001-111078. SUMMARY OF THE INVENTION Generally, in the manufacturing line of a thin film solar panel, the above-described first to fourth processes are each laser scribing device for each process. (laser scribing ❹apparatus), for example, is often performed in stages in a total of four devices. In this case, even if the straight and parallel scribe lines ' can be formed in the respective devices, the following may be unfavorable due to the individual mechanical differences of the respective devices present in each device. For example, in the case where the scribe line L1 formed in the second process is shifted in the direction close to the direction of the interval error direction of the scribe line LA1 formed in the first process, etc., even if the amount of error of each interval size is small, there is a scribe line LAI. The contact between L1 and L1 is narrow to a few lOym due to the distance d between the two scribe lines La 1 and L1 (see Fig. 15(B)). Moreover, even if it is shifted toward the direction away from each other, it does not contact 'the expansion of the dead zone due to the enlargement of the interval d of the scribe line L a 1 and the scribe line L1'. As a result, the power generation efficiency of the thin film solar panel ( Power generation efficiency) (conversion efficiency) will decrease. Therefore, in this laser scribing process, it is also important that each of the laser engraving devices provided in each process can form a straight scribe line, but consider the scribe line L1 formed in the process of the latter stage. It is also important that the shape or positional relationship of the score line 201032931 LA1 formed by the process of the preceding stage does not cause contact with the scribe line LA1 of the preceding stage or the size error of the interval. In this way, the pattern formed by the process in the previous stage does not contact with the pattern formed in the process of the subsequent stage or does not cause the gap size error, and the technique of forming the defect can be formed even in the laser manufacturing process of the solar panel. It is also required in addition to the pattern forming process. For example, a liquid crystal panel or a piasma display panel, a flexible panel, and other sheet material manufacturing U-programs. The present invention has been made in view of such circumstances, and an object thereof is to provide a laser processing method and a laser processing apparatus which can prevent laser light from being formed on a substrate by laser light in a pattern of a front stage and laser light in a process in a subsequent stage. The pattern formed on the substrate causes contact or spacing dimensional errors. The above object is achieved by the present invention described below. In addition, the bracketed symbols attached to the respective constituent elements in the present shed ([Clain Content]) indicate relationships corresponding to specific means (means) described in the embodiments to be described later. The invention of claim 1 is a laser processing method in which a predetermined pattern is formed by processing a substrate (K) with a relative carrier substrate (K) and laser light (b2), and its characteristics include, The process of obtaining the shape of the first pattern (LA1) of the substrate (κ) in the preceding stage is used as the imitation element line (the line of the shape of the reference line to be processed first). (S200); according to the meta-element data (D2), relative to the driving substrate (κ) and the laser light (b2), the track traced by the laser light (b2) in the latter stage becomes the first pattern ( The shape of the shape of LA1) and forming a second pattern forming step (S300) of the second pattern (L1). In the invention of the second aspect of the invention, the circuit forming material (Kj) composed of a plurality of layers is formed on at least one surface of the substrate (κ), and the dummy element data obtaining step (S2 00) is performed. Calculating and memorizing the meta-line data (D2) of the first pattern (LA1) of the circuit-forming material (Kj1) formed in the first layer, and in the second pattern forming step (S300), according to the dummy line data (j) 2) A second pattern (L1) is formed in the circuit forming material (Kj2) of the second layer. In the invention of claim 3, the substrate (g) is formed of a glass substrate on which a circuit forming material (Kj) for use in the production of a thin film solar cell is formed, and the laser light (b2) is The power adjusted to the circuit forming material (Kj) is used in the process of manufacturing a thin film solar panel. The invention of claim 4 is a laser processing apparatus (1) which is formed by processing a predetermined pattern on a substrate (κ) by a relative driving substrate (K) and laser light (b2). The data of the shape of the first pattern (LA1) formed in the substrate (κ) in the preceding stage is used as the data source (77, 9) obtained by the imitation element line data (ρ2); according to the imitation element line data (D2) ), the trajectory tracked by the drive substrate (K) and the laser light (b2), and the laser light (1) 2) in the subsequent stage becomes a shape that follows the shape of the first pattern (LA1) and forms a first pattern. The second pattern forming means (?) of (L1). According to the invention of claim 5, the circuit forming material (Kj) composed of a plurality of layers is formed on at least one surface of the substrate, and the dummy material line obtaining means (77, 9) includes: Photographing means (77) of the first pattern (LA1) of the circuit-forming material formed on the first layer; calculating, memorizing the meta-line data (D2), memorizing means (9), and forming the second pattern 6 201032931 The means (7) forms a second pattern (L1) in the circuit forming material (K j2) of the second layer according to the meta-line data (D2). In the invention of claim 6 of the invention, the substrate ( K) is a laser irradiation head (73) which is formed of a glass substrate for forming a circuit for forming a thin film solar cell, and includes laser light (b) including a material for forming a scribeable circuit (j). It is used in the manufacturing process of thin film solar panels. @ [Effect of the Invention] According to the present invention, the pattern formed by the laser light on the substrate and the pattern formed by the laser light on the substrate in the process of the subsequent stage may cause contact or gap size error.

依照申請專利範圍第1項、第4項的發明,第二圖案 (L1)是如下般被形成。亦即,根據取得的倣元線資料, 藉由相對驅動基板(K)與雷射光(b2)而形成,俾在後段的製 程雷射光(b2)所追蹤的軌跡成為仿照第一圖案(Lai)的形 狀的形狀。據此’在基板(K)的面形成有仿照第—圖案 的形狀的第二圖案(L1)。例如第一圖案(LA1)為刻刻線,該 第一圖案(LA1)稍微f曲的情形’成為後段的刻劃線的第二 圖案(L1)不會被筆直地形成,而是以與第一圓案相同 的形狀’曲而形成…b ’可不使在前段的製程藉由雷二 光(bi)形成於基板(κ)的第一圖案(LA1)與在後段的製程藉 由雷射光(b2)形成於該基板(K)的第二圖案(Li)引 或間隔尺寸誤差。 7 201032931 依照申請專利範圍第2 ^ 第5項的發明,*俞祕i 板(K)於至少一方的面遍3 ^ ,、 遍及複數層成膜有電路形成用Μ Μ (Kj),可不使形成於第一 办成用材料 Λ 層的電路形成用材料(Kjl)的第一 第—層的電路形成用材料(Kj2)的第二 囷案(L1)引起接觸或間隔 了誤差。因此’適於適用於在 使在前段的製程形成的圄垒迥用於在 或的圖案與在後段的製程形成的圖案接 近的狀態下形成的製裎,彳u )圃系钱 % 例如薄膜太陽電池板、液晶面板 或電漿顯示器面板、可Mwp 撓面板、其他的薄片材料的製造 ❾程序。 依照申請專利範圍第3箱、筮R话认欲nn 禾d項、第6項的發明,可不引起 薄膜太陽電池板中的各刻劃線的接觸或間隔尺寸誤差。其結 果,可生產發電效率高的薄膜太陽電池板。 【實施方式】 以下邊參照添附圖面,一邊針對本發明的實施形態說 明。圖1是與本發明有關的雷射刻劃裝4 1之外觀斜視圖, ❹圖2是顯示雷射刻劃裝置1的主要部分之俯視圖圓3是 顯不雷射刻劃裝置1的主要部分之前視圖,圖4是顯示雷 射單元7之斜視圖4該等各圖中以正交座標系的3轴為 X、Y、Z,以玻璃基板K的移送方向為γ方向,以在水平面 正交於Υ方向的方向為Χ方向,以鉛直方向為ζ方向,以 繞鉛直轴的旋轉方向為0方向。而且,設圖丨的紙面靠近 眼前側為上游,紙面裏頭側為下游❶亦即,在圖2、圖3 中朝紙面左側成上游,右侧成下游。而且,需更進一步區 8 201032931 別χϋ各方向的方向成左右或前後而說明的情形有在最前 頭附加[+ ]或[-]的符號而表示。例如將玻璃基板κ的移送 •方向的Υ方向之中刻劃線的形成動作中的移送方向記為 • [+γ方向]’將刻劃線的形成動作後的移送方向記為[-Υ方 向]等。 而且’圖5是顯示雷射刻劃裝置1中的控制裝置9與各 種構成部的連接之連接圖,圖6是為了說明本發明的主要 部分之圖’圖7是顯示頭驅動部74及夾持器群驅動部52 ❹的驅動方向的關係之圖,圖8是顯示藉由雷射刻劃裝置1 形成有刻劃線的玻璃基板Κ之三面圖。此外,在圖6中A 圖是顯示倣元線資料取得時的動作狀態,B圖是顯示刻割線 形成時的動作狀態。而且’在圖8中a圖為俯視囷,B圖為 侧視圖,C圖為前視圖。 雷射刻劃裝置1是如下而構成··藉由以規定強度的雷射 光掃描在單面成膜有電路形成用材料Kj(參照圖8)的玻璃 基板K’形成響應目的的電路圖案(circuit pattern)之刻 ❹劃線(scribe 1 ine)。在本形態中,成為刻劃對象的電路形 成用材料是以成膜於TC0膜Kjl之上(在圖中為下)的非晶矽 膜Kj2’該TC0膜Kjl是成膜於透明玻璃j(t之上(在圖中為 •下)。假設在T C 0膜K j 1藉由前段製程中的別的雷射刻劃裝 * 置已經形成有刻劃線LA 1、LA2…。此外,該等刻劃線LA1、 • LA2…如圖8(A)所示,假設由玻璃基板κ的長邊方向傾斜一 . 點點而形成。雷射刻劃裝置1是當作在該TC0膜K j 1之上的 非晶矽膜K j 2形成刻劃線L1、L2...的裝置而被使用。特別 9 201032931 是該雷射刻劃裝置1是在使玻璃基板κ中的電路形成用材料 K j的成膜面朝下的狀態下進行刻劃線的形成之類型。而 . 且,在藉由空氣浮起支撐玻璃基板κ的狀態下一邊使其移動 •於+γ方向,一邊形成刻劃線而構成。 具體上雷射刻劃裝置1如圖1所示,包含:機台2、浮 起平σ 3、升降機單元(iifterunit)4、移送單元5、基板 定位襄置6、雷射單元7、集塵單元8及控制裝置9等。而 且’在雷射刻劃裝置】的上游外側設置有進行玻璃基板κ ®之搬進搬出浮起平台3的搬進搬出機械手臂(carrying ^n/〇ut rGbGt)1G。以下針對雷射刻劃裝置1的各構成要素 說明。 機台2為支撐雷射刻劃裝置i的主構成部之支撐艘,包 含台座部21及門型框架台 兹1 _ 口座# d支撐浮起平台3及 移送早疋5等’門型框架22支撐雷鉍萤-7丄 叉得雷射卓凡7中的雷射照射 =面頭:/部广“的機台2為了確保充分的剛 ^面精度且最小限度地抑制伴隨溫度變化的變形,以 置:=lte)等的石材較佳,惟在本形態中為了謀求裝 置成本的降低,以不銹鋼等的金屬為材質。 浮起平台3是藉由由其表面噴出的空氣浮起支撐成為 刻劃對象的玻璃基板K之構件,句人 〇9 ^ 傅仵包含主平台31及副平台 2。主平台31是在雷射刻劃裝晋 -自配μ △ 】裝置1内的上游側與下游側各 目配攻有一台。該配置是在上 α ^ ϋ « 、下游的各主平台31間用 u保持規定的空間。 主平台31具體上如圖2所示, 掖以使在Y方向長的長 10 201032931 條的浮起單元3ΐι於χ古a ^ d 、λ方向空出規定間隔配設複數台之成 網籃狀的構成製作。力^ 一 在各洋起單元311的表面穿設有多數 個空氣喷出孔3iih。兮楚办忽 该等空氣喷出孔311h被配管連接於 具備壓縮空氣泵等的 I 八機早 7^(ΐ3ΐ〇ν6Ι·ιιηί1;)33’ 朝上噴 出由鼓風機單元33供& Μ la Α «Τ d供、,。的規疋壓力的空氣,藉由該空氣浮 起支樓玻璃基板嗜 策出的空氣的壓力被設定為成為浮起 對象的玻璃基板κ不會彎曲且被維持穩定的狀態的麼力。According to the inventions of the first and fourth aspects of the patent application, the second pattern (L1) is formed as follows. That is, according to the obtained meta-line data, which is formed by relatively driving the substrate (K) and the laser light (b2), the track traced by the process laser light (b2) in the subsequent stage becomes the first pattern (Lai). Shape of the shape. According to this, a second pattern (L1) which is shaped like the first pattern is formed on the surface of the substrate (K). For example, the first pattern (LA1) is a scribe line, and the first pattern (LA1) is slightly f-curved, and the second pattern (L1) which becomes the scribe line of the subsequent stage is not formed straight, but is The same shape of a round case is curved to form ...b' without causing the process in the preceding stage to be formed by the first pattern (LA1) of the substrate (κ) by Ray light (bi) and by the laser light by the process of the latter stage ( B2) A second pattern (Li) lead or spacer size error formed on the substrate (K). 7 201032931 In accordance with the invention of the second and fifth aspects of the patent application, the 俞 秘 i plate (K) is formed on at least one of the faces of the film, and the circuit formation Μ Μ (Kj) is formed over the plurality of layers. The second case (L1) of the circuit-forming material (Kj2) of the first first layer of the circuit-forming material (Kj1) formed in the first material-forming material layer (Kj1) causes contact or interval error. Therefore, it is suitable for use in a state in which the enthalpy barrier formed in the process of the preceding stage is formed in a state in which the pattern of the or is formed close to the pattern formed in the process of the subsequent stage, 彳u) Manufacturing process for panels, liquid crystal panels or plasma display panels, Mwp flexible panels, and other sheet materials. According to the invention of the third box of the patent application, the invention of nn, and the item of item 6, the contact or spacing error of each scribe line in the thin film solar panel may not be caused. As a result, thin-film solar panels with high power generation efficiency can be produced. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. 1 is a perspective view showing the appearance of a laser scribing device 4 relating to the present invention, and FIG. 2 is a plan view showing a main portion of the laser scoring device 1 in a plan view. The circle 3 is a main portion of the laser scribing device 1. In the front view, FIG. 4 is a perspective view showing the laser unit 7. The three axes of the orthogonal coordinate system are X, Y, and Z in the respective figures, and the transfer direction of the glass substrate K is the γ direction to be positive in the horizontal plane. The direction intersecting the Υ direction is the Χ direction, and the vertical direction is the ζ direction, and the direction of rotation around the vertical axis is 0 direction. Further, the paper surface of the drawing is placed near the front side of the eye as the upstream side, and the head side of the paper surface is the downstream side, that is, in the drawing, the upstream side is the upstream side and the right side is the downstream side in Figs. 2 and 3 . Furthermore, it is necessary to further the area 8 201032931. The case where the directions in each direction are left or right or before and after is indicated by adding a symbol of [+] or [-] at the forefront. For example, the transfer direction in the formation operation of the scribe line in the Υ direction of the transfer direction of the glass substrate κ is denoted by [[+ γ direction]', and the transfer direction after the formation of the scribe line is referred to as [-Υ direction ]Wait. Further, Fig. 5 is a connection diagram showing the connection of the control device 9 and various components in the laser scribing device 1, and Fig. 6 is a view for explaining the main part of the present invention. Fig. 7 is a display head driving portion 74 and a clip. FIG. 8 is a three-side view showing a glass substrate 形成 in which a score line is formed by the laser scribing device 1 in a driving direction of the holder group driving unit 52. Further, in Fig. 6, A is an operation state at the time of acquiring the meta-line data, and B is an operation state at the time of forming the scribe line. Further, in Fig. 8, a is a plan view, a side view of B, and a front view of C. The laser scribing device 1 is configured to form a circuit pattern for the purpose of response by scanning a glass substrate K' on which a circuit forming material Kj (see FIG. 8) is formed on one surface by laser light of a predetermined intensity. Pattern) scribe 1 ine. In the present embodiment, the circuit forming material to be scribed is an amorphous ruthenium film Kj2' formed on the TC0 film Kj1 (bottom in the figure). The TC0 film Kjl is formed on the transparent glass j ( Above t (in the figure is • under). It is assumed that the TC 0 film K j 1 has been formed with the scribe lines LA 1 , LA2 ... by other laser scribes in the front-end process. As shown in Fig. 8(A), the scribe lines LA1, LA2, ... are formed by a slight inclination of the longitudinal direction of the glass substrate κ. The laser scribing device 1 is treated as the TC0 film Kj. The amorphous ruthenium film K j 2 above 1 is used to form a device for scribe lines L1, L2, etc. In particular, 993332931, the laser scribe device 1 is a material for forming a circuit in a glass substrate κ. In the state in which the film formation surface of K j is formed in a downward direction, the type of the scribe line is formed, and the glass substrate κ is supported by the air to move in the +γ direction. Specifically, the laser scribing device 1 includes a machine 2, a floating flat σ 3, an elevator unit 4, a transfer unit 5, and the like. The board positioning device 6, the laser unit 7, the dust collecting unit 8, the control device 9, etc., and the moving of the glass substrate κ® to move the floating platform 3 on the outer side of the upstream of the laser scribing device Carrying out the robotic arm (carrying ^n/〇ut rGbGt) 1G. The following describes each component of the laser scribing device 1. The machine 2 is a support ship that supports the main component of the laser scoring device i, and includes a pedestal. Department 21 and door frame platform 1 _ mouth seat # d support floating platform 3 and transfer early 疋 5 etc. 'Door frame 22 support Thunder 铋 丄 丄 得 得 雷 卓 卓 卓 卓 卓 卓 卓 卓 卓 卓In order to ensure the sufficient rigidity of the machine and to minimize the deformation accompanying the temperature change, it is preferable to use a stone such as: =lte), but in order to obtain the device cost in the present embodiment, The lowering is made of a metal such as stainless steel. The floating platform 3 is a member that supports the glass substrate K to be scratched by the air ejected from the surface thereof, and the sentence 〇9 ^ 傅仵 includes the main platform 31 and Sub-platform 2. The main platform 31 is in the laser scoring equipment - self-matching μ △ 】 device 1 There is one for each of the upstream side and the downstream side. This configuration is to maintain a predetermined space with u between the upper α ^ ϋ « and the downstream main platforms 31. The main platform 31 is specifically as shown in Fig. 2, The floating unit 3 329 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 2010 The surface of the surface is provided with a plurality of air ejection holes 3iih. The air ejection holes 311h are connected to a pipe with a compressed air pump, etc. 7((3ΐν6Ι·ιιηί1;) 33' The upward jet is supplied by the blower unit 33 for & Μ la Α «Τ d. In the air of the pressure-receiving air, the pressure of the air which is caused by the air-floating glass substrate is set to a state in which the glass substrate κ which is a floating object is not bent and is maintained in a stable state.

副平台32被以在上游與下游的主平台31間,於 向空出規定間隔的狀態下配設2台在X方向長的長條的浮 起單元321的構成製作。形成於2台的浮起單元321間的 空間部分是當作藉由位於其上方的雷射照射頭73進行刻 劃加工時落下的微粒(particle)(非晶矽膜Kj2的刻劃屑) 的回收孔而發揮功能。針對浮起單元321也與浮起單元311 一樣’在表面穿設有多數個空氣喷出孔321h,該等空氣噴 出孔321h朝上喷出由鼓風機單元33供給的規定壓力的空 氣。副平台32如後述般是為了使如下的動作平順且確實而 ◎被配設:藉由玻璃基板K朝+Y方向移動,由利用上游側的 主平台31進行的浮起支撐移動至利用下游侧的主平台31 進行的浮起支撐時的動作’以及與其相反,藉由玻璃基板 K朝-Y方向移動,由利用下游側的主平台31進行的浮起支 撐移動至利用上游側的主平台31進行的浮起支撐時的動 作0 升降機單元4為進行成為刻劃對象的玻璃基板κ的接 受以及刻劃完了的玻璃基板K的傳遞之裝置,包含銷框架 201032931 (pin frame)41及框架驅動部42。 銷框架41為依照成為接受及傳遞的對象的玻璃基板κ 的大丨之略[日]的子形的柩體,如圖2所示包含:平面視各 自略[口]的子形的周圍框41&與略[一]的字形的中央框 41b。在周圍框41a複數根頂出銷(lift pin)43彼此各自相 鄰空出規定間隔而被立設。頂出銷43為以其尖端部抵接玻 璃基板κ中的額緣部Kf(參照圖8)的底面並可支撐該玻璃基 板κ之銷構件。該額緣部為在玻璃基板κ的外側周团具 ©有規疋寬而形成的區為未成膜有電路形成用材料Kj或 者即使成膜有電路形成用材料Kj,在頂出銷’43的尖端部 抵接的情形下也不影響最終製品的區域。 框架驅動部42為升降驅動銷框架41於Z方向而構成, 例如藉由女裝於中央框41b的旋轉滾珠螺桿(加⑽ball SCreW)機構等實現。藉由框架驅動部42驅動銷框架41使頂 出銷43可選擇地配置於圖3所示的上限位置^與下限位 置 上限位置P1為在自搬進搬出機械手臂1〇接受成為 ❹刻劃加工的對象的破璃基板K時’或者將刻劃加工完了的玻 璃基板K傳遞至搬進搬出機械手臂1()時被配置的位置,為 頂出銷43的尖端部遠高於浮起平台3的表面的位置。下限 位置P2為在玻璃基板κ的搬進搬出以外時,例如在刻劃線 的形成時等不使用頂出銷43時,使該等頂出銷43退避的 位置,為頂出銷43的尖端部低於浮起平台3的表面的位置。 出銷43在接受玻璃基板κ後下降,此時的下降速度 如下般被設定。亦即,設頂出銷43由上限位置Η移到浮 12 201032931 起面上方位置P3(於下述)時的下降速度為以,設由浮起面 上方位置P3移到浮起面位置p4(同樣地於下述)時的下降 速度為U2時,有U2CU1的關係。更佳為υ2<υι/2。此外, 浮起面上方位置P3為頂出銷43的尖端部比浮起面位置p4 高一些且比上限位置pl低的位置。浮起面位置P4為藉由 自浮起平σ 3中的空氣噴出口 3nh、321h喷出的空氣使玻 璃基板K被浮起支標時的高度位置。 移送單7L 5為在懸臂支撐玻璃基板κ的狀態下可使玻 ❿璃基板Κ移動於γ方向而構成的裝置包含夾持器群 (gripper group)51與夾持器群驅動部52。 夾持器群51為合计4個的夾持器(gripper)53沿著γ 方向各自空出規定間隔一體地配置成一列狀而成,各夾持器 53抓住玻璃基板κ中的額緣部Kf的一邊並可懸臂支撐該玻 璃基板κ而構成。具體上各夾持器53具有上下一對的可動 爪。該可動爪為根據由控制裝置9傳輸的信號,可在上下方 向藉由壓縮空氣作用等被同步驅動而構成,據此可開閉自 ❿如。打開可動爪是即將抓住玻璃基板κ中的額緣部的一 邊。關閉可動爪是抓住玻璃基板κ中的額緣部Kf的一邊時, 或者使各夾持器53退避時。即將抓住玻璃基板〖以外為了 防止手指的夾入等的安全性確保,基本上可動爪是在關閉的 狀態下被運用。 而且夾持器群51藉由伺服馬達(serv0 m〇t〇r)等的驅 .動裝置被驅動於X方向,可選擇地配置於圖2所示的保持位 置P5與回避位置P6。保持位置p5為藉由頂出銷43支撐的 13 201032931 玻璃基板κ中的額緣部〇的_邊進入央持器 的位置。回避位置Ρ6為對 、 區域 且ro馮對上述保持位置ρ5位 ,在不抓住玻璃基板κ時被配置的位置。而且/ °則’ • 各自獨立並且也可藉由伺服馬達等的驅動枭署 53 服巧運寻的驅動裴置被箱動於 ζ、θ各方向βΖ方向的驅動主要是在夾持器53 :被進行。Θ方向的驅動主要是在夾持器53_ Θ 安裝角度補正時被進行。 夾持器群驅動部52為使上述夾持器群51朝u ❿驅動自如的裝置’具體上是以在台座部21的—方側 方向配設的線性馬達(linear m〇t〇r)52Y為主要構成。 線性馬達52Y動作,失持器群51可選擇地配置於圓由 所示的接受位置”與待避位置p8。接受位置在由搬 進搬出機械手臂1()搬進的玻璃基板K6tx方向範 範圍内)包含有所有的爽持器53的位置,位於浮起平么3 的上游側。而且’待避位置P8為為了安全性確保使所:的 夾持器53待避用的位置,位於浮起平台3的下游側。進行 U移送玻璃基板K的動作時以外為了防止手臂的夾入等的安 全性確保,基本上4個夾持器群51被配置於待避位置以。 基板定位裝置6配設於浮起平台3的上游侧中的χ方 向兩側,包含:可各自按壓玻璃基板κ中的兩個短邊側的端 面之按壓滾子61;驅動按壓滾子61於χ方向之氣缸Uir cy 1 inder)62。該基板定位裝置6藉由在定位時同時使兩方 '的氣缸62伸長,藉由按壓滾子61夾入玻璃基板K中的兩 個短邊側的端面,以進行玻璃基板κ的定位。然後定位結束 14 201032931 的話,藉由同時使兩方的氣缸62縮短,使玻璃基板κ離開 各按壓滾子6 1。 雷射單元7為透過對藉由夾持器群51及浮起平台3支 撐且被移送於+Υ方向的玻璃基板Κ由其上方照射、掃描雷 射光b2,刻劃成膜於玻璃基板Κ的底面的電路形成用材料 K j (非晶矽膜K j 2 )並形成規定的刻劃線而構成。具體上如圖 1、圖4所示包含:雷射振盪器(laser oscillator)71、照 射光學系統7 2、雷射照射頭7 3及頭驅動部7 4等。 φ 雷射振盪器Π是發出為了刻劃成膜於玻璃基板K的電 路形成用材料K j (非晶矽膜Kj2)的雷射光b2之光源裝置, 例 如 可 使 用 振 盡 波 長 (oscillation wavelength)355nm〜1064nm 、輸 出 卜20W 左右的The sub-stage 32 is formed by arranging two long floating units 321 long in the X direction with a predetermined interval therebetween between the upstream and downstream main platforms 31. The space portion formed between the two floating units 321 is a particle (the swarf of the amorphous enamel film Kj2) which is dropped when the laser irradiation head 73 located above is scribed. Recover holes to function. The floating unit 321 is also provided with a plurality of air ejection holes 321h on the surface as in the floating unit 311, and the air ejection holes 321h discharge the air of a predetermined pressure supplied from the blower unit 33 upward. As will be described later, the sub-stage 32 is arranged so that the following operation is smooth and reliable. The glass substrate K is moved in the +Y direction, and the floating support by the upstream main platform 31 is moved to the downstream side. The operation of the floating support at the main platform 31 is reversed, and the glass substrate K is moved in the -Y direction, and the floating support by the main platform 31 on the downstream side is moved to the main platform 31 on the upstream side. The operation of the lifting support 4 is performed. The elevator unit 4 is a device for receiving the glass substrate κ to be scribed and transferring the etched glass substrate K, and includes a pin frame 201032931 (pin frame) 41 and a frame driving portion. 42. The pin frame 41 is a sub-shaped body which is slightly larger than the glass substrate κ which is the object of receiving and transmitting, and includes a sub-shaped peripheral frame which is slightly like the [mouth] in plan view. 41& and the central box 41b of the glyph of [a]. In the peripheral frame 41a, a plurality of lift pins 43 are erected at predetermined intervals adjacent to each other. The ejector pin 43 is a pin member that abuts against the bottom surface of the forehead portion Kf (see Fig. 8) in the glass substrate κ at its tip end portion and can support the glass substrate κ. The front edge portion is a film forming material Kj which is formed without forming a film on the outer side of the glass substrate κ, or a circuit forming material Kj is formed on the outer surface of the glass substrate κ. The area where the tip portion abuts does not affect the area of the final product. The frame driving unit 42 is configured to extend and lower the driving pin frame 41 in the Z direction, and is realized by, for example, a rotating ball screw (plus ball SCreW) mechanism of the center frame 41b. The frame driving unit 42 drives the pin frame 41 to selectively arrange the ejector pin 43 at the upper limit position ^ and the lower limit position upper limit position P1 shown in FIG. 3 to receive the boring process from the loading/unloading robot 1 The position at which the glass substrate K of the target object is transferred or the glass substrate K that has been subjected to the singulation is transferred to the loading/unloading robot 1 () is at a position where the tip end portion of the ejector pin 43 is much higher than the floating platform 3 The location of the surface. When the ejector pin 43 is not used, such as when the glass substrate κ is moved in and out, for example, when the ejector pin 43 is not used, the ejector pin 43 is retracted, and the tip end of the ejector pin 43 is the tip end of the ejector pin 43. The portion is lower than the position of the surface of the floating platform 3. The delivery pin 43 is lowered after receiving the glass substrate κ, and the descending speed at this time is set as follows. That is, the lowering speed at which the ejector pin 43 is moved from the upper limit position to the upper position P3 (described below) of the float 12 201032931 is set to be moved from the upper position P3 to the floating surface position p4 ( Similarly, when the falling speed at the time of the following is U2, there is a relationship of U2CU1. More preferably υ2<υι/2. Further, the floating position upper position P3 is a position at which the tip end portion of the ejector pin 43 is higher than the floating surface position p4 and lower than the upper limit position pl. The floating surface position P4 is a height position at which the glass substrate K is floated by the air ejected from the air ejection ports 3nh and 321h in the floating level σ3. The transfer sheet 7L 5 is a device including a gripper group 51 and a gripper group drive unit 52, which are configured to move the glass substrate Κ in the γ direction while the cantilever supports the glass substrate κ. In the gripper group 51, a total of four grippers 53 are integrally arranged in a line at predetermined intervals in the γ direction, and each gripper 53 grips the fore edge portion of the glass substrate κ. One side of the Kf is configured to support the glass substrate κ by cantilever. Specifically, each of the grippers 53 has a pair of upper and lower movable claws. The movable claw is configured to be driven synchronously by the action of compressed air or the like in accordance with a signal transmitted from the control unit 9, and can be opened and closed. Opening the movable claw is to grasp one side of the fore edge portion of the glass substrate κ. When the movable claw is closed, one side of the forehead portion Kf of the glass substrate κ is grasped, or when each of the grippers 53 is retracted. In order to ensure the safety of the fingers, etc., it is necessary to grasp the glass substrate, and basically the movable claw is used in a closed state. Further, the gripper group 51 is driven in the X direction by a drive device such as a servo motor or the like, and is selectively disposed at the holding position P5 and the avoidance position P6 shown in Fig. 2 . The holding position p5 is the position of the front edge of the front edge portion of the glass substrate κ supported by the ejector pin 43. The avoidance position Ρ6 is a position where the pair, the area, and the von are placed at the position ρ5, and the glass substrate κ is not caught. Moreover, / ° then ' • are independent of each other and can also be driven by a servo motor or the like. 53 The driving device is arbitrarily moved by the box. The driving in the βΖ direction in each direction of θ is mainly in the holder 53: Was carried out. The drive in the Θ direction is mainly performed when the gripper 53_ Θ is mounted at the angle of correction. The gripper group drive unit 52 is a linear motor (linear m〇t〇r) 52Y that is disposed in the side direction of the pedestal portion 21 in order to drive the gripper group 51 toward the ❿. As the main component. The linear motor 52Y is operated, and the detentor group 51 is selectively disposed in the receiving position of the circle and the to-be-avoided position p8. The receiving position is within the range of the glass substrate K6tx in which the loading and unloading robot 1 () is moved in. The position including all the holders 53 is located on the upstream side of the floating flat 3. The 'avoidance position P8 is a position to be avoided for the safety to ensure that the holder 53 is to be avoided, and is located on the floating platform 3 On the downstream side of the glass substrate K, in order to prevent the safety of the insertion of the arm, etc., the four gripper groups 51 are basically disposed at the position to be avoided. The substrate positioning device 6 is disposed on the downstream side. The two sides of the upstream side of the platform 3 in the χ direction include: a pressing roller 61 that can respectively press the end faces of the two short sides of the glass substrate κ; and a cylinder that drives the pressing roller 61 in the χ direction Uir cy 1 inder 62. The substrate positioning device 6 performs the glass substrate κ by simultaneously stretching the two cylinders 62 while positioning, and sandwiching the two short-side end faces of the glass substrate K by the pressing roller 61. Positioning. Then positioning ends 14 201032931 When the two cylinders 62 are simultaneously shortened, the glass substrate κ is separated from the pressing rollers 61. The laser unit 7 is supported by the holder group 51 and the floating platform 3 and is transferred to the +. The glass substrate Υ in the Υ direction is irradiated with the laser light b2, and the circuit forming material K j (amorphous ruthenium film K j 2 ) is formed on the bottom surface of the glass substrate 并 to form a predetermined scribe line. Specifically, as shown in FIG. 1 and FIG. 4, a laser oscillator 71, an illumination optical system 7, a laser irradiation head 73, a head driving unit 704, and the like are included. φ Laser oscillator Π It is a light source device that emits laser light b2 for patterning the circuit forming material K j (amorphous germanium film Kj2) formed on the glass substrate K. For example, an oscillation wavelength of 355 nm to 1064 nm and an output of 20 W can be used. Left and right

Nd-YAG(yttrium aluminum garnet:釔鋁石榴石)雷射或 Nd — YVCh(y 11 r i um orthovanadate : Ifl 酸在乙)雷射等 〇 照射光學系統72是將由雷射振盪器7i發出的雷射光 b2導引到雷射照射頭73而構成’包含:反射鏡722a~72 2h、 ❹擴束器(beam expander)723 及衰減器(attenuat〇r)724 等。上述雷射光b2藉由配設於由雷射振盪器71射出的雷射 光b2的光軸上的機械式快門(mechanical shutter)721開 閉,使至雷射照射頭73的導光的開關(〇n/〇ff)被切換。機 械式快門721的開閉是根據由控制裝置9傳輸的信號進行。 .而且,上述反射鏡722f〜72 2h在被收容於盒子(b〇x)76的狀 態下,可藉由線性馬達76X與雷射照射頭73同步被驅動於 X方向形成光程長補正部。透過藉由這種可動的盒子76 15 201032931 將光學系統的一部分由雷射照射頭73分開,藉由減少如下 所不的雷射照射頭73内的收容物,且減輕其重量,減少成 為驅動源的頭驅動部74的負载。與此同時可使動作的追 .蹤性及響應性良好,使精密的微調整為可能。 雷射照射頭73為將透過照射光學系統72導引的來自雷 射振盪器71的雷射光b2以垂直光束(vertical beam)照射 至玻璃基板K的面而構成。具體上是由具備成為雷射光b2 的…、射口的雷射照射窗735的光學盒體構成,在其内部收容 ©返回鏡731、聚焦透鏡(focus 〗ens)732及聚光鏡 = 〇ndenSer)733。雷射照射頭73藉由下述的頭驅動部74 可在X方向及Y方向各自獨立自在地驅動(行走、停止卜而 且,在雷射照射頭73的侧壁安裝有攝影機77。攝影機77 為具有CCD(Charge Coupled Device:電荷耦合元件)等的攝 影元件,可將藉由攝影取得的影像資料(image data)Di輸 出到控制裝置9而構成。攝影機77的安裝被設置成使其攝Nd-YAG (yttrium aluminum garnet) laser or Nd — YVCh (y 11 ri um orthovanadate : Ifl acid in B) laser illuminating optical system 72 is laser light emitted by laser oscillator 7i B2 is guided to the laser irradiation head 73 to constitute 'including: mirrors 722a to 72 2h, a beam expander 723, an attenuator 724, and the like. The laser light b2 is opened and closed by a mechanical shutter 721 disposed on the optical axis of the laser beam b2 emitted from the laser oscillator 71, and the light guide to the laser head 73 is turned on (〇n) /〇ff) is switched. The opening and closing of the mechanical shutter 721 is performed based on a signal transmitted from the control device 9. Further, in the state in which the mirrors 722f to 72h are housed in the case (b〇x) 76, the mirrors 722f to 72h can be driven in the X direction to form the path length correction unit in synchronization with the laser head 73. By separating a part of the optical system from the laser irradiation head 73 by such a movable case 76 15 201032931, the storage contents in the laser irradiation head 73 are reduced as follows, and the weight is reduced, and the drive source is reduced. The load of the head drive unit 74. At the same time, the tracking and responsiveness of the action are good, and precise fine adjustment is possible. The laser irradiation head 73 is configured such that the laser light b2 from the laser oscillator 71 guided by the illumination optical system 72 is irradiated onto the surface of the glass substrate K by a vertical beam. Specifically, it is constituted by an optical cartridge having a laser irradiation window 735 which is a laser beam b2 and an injection port, and houses a return mirror 731, a focus lens (focus ens) 732, and a condensing mirror = 〇ndenSer 733 therein. . The laser irradiation head 73 can be independently driven in the X direction and the Y direction by the head driving unit 74 described below (walking and stopping), and the camera 77 is attached to the side wall of the laser irradiation head 73. The camera 77 is An imaging element having a CCD (Charge Coupled Device) or the like can be configured to output image data Di obtained by photography to the control device 9. The camera 77 is mounted to be photographed.

I方向朝下方的狀態。據此,可一邊使形成於玻璃基板K ©的刻劃線LA1行走於X方向,一邊進行攝影。在控制裝置9 中根據該影像資料m進行[倣元線資料D2]的算出、記憶處 理°其詳細於後述。 頭驅動部74是以線性馬達74χ及線性馬達74γ為主構 成具體上線性馬達74Χ是在門型框架22的上部沿著其長 度方向(X方向)被安裝。該線性馬達74χ具有被驅動於χ方 2的可動台子(未圖示)。線性馬達74Υ是在該可動台子上 /Q著Υ方向被配設。據此,雷射照射頭73可同時且獨立地 201032931 被驅動於X方向及γ方向❶雷射照 q私-4 m 町碩73的可動範圍如圖 3所不,被f又置於-γ方向的界限位 1置的初始位置P9輿+γ方 向的界限位置的終端位置P10之間。 因雷射照射頭73如上 述般非常輕量地被製作,故其停止、 、^正起動所需的負載小。因 此’頭驅動部74無須高輸出的驅動 勒/尿及制動力強的剎車 (brake),可謀求裝置的成本降低1且停止、起動時來 自驅動源的發熱少。因此’由於因該發熱的影響使裝置細部The direction of the I direction is downward. According to this, it is possible to perform imaging while walking the scribe line LA1 formed on the glass substrate K© in the X direction. In the control device 9, the calculation of the [imitation element line data D2] and the memory processing are performed based on the image data m. Details thereof will be described later. The head driving portion 74 is mainly composed of a linear motor 74A and a linear motor 74γ. The upper linear motor 74 is mounted on the upper portion of the portal frame 22 along its longitudinal direction (X direction). The linear motor 74A has a movable table (not shown) that is driven to the side 2 . The linear motor 74A is disposed on the movable table in the /Q direction. According to this, the laser irradiation head 73 can be driven simultaneously and independently 201032931 in the X direction and the γ direction. The movable range of the 私 私 私 私 私 -4 -4 -4 m m 73 73 73 73 73 73 73 73 73 73 73 73 73 73 73 73 73 The boundary position 1 of the direction is set between the initial position P9 舆 + the end position P10 of the limit position in the γ direction. Since the laser irradiation head 73 is produced very lightly as described above, the load required for stopping and starting is small. Therefore, the head drive unit 74 does not require a high-output brake that has a strong pull/urine and a strong braking force, and the cost of the device can be reduced by one, and the heat generated from the drive source at the time of stop and start is small. Therefore, due to the influence of the heat, the device details

膨脹,發生位置精度的經時變化,成A 战為精度不良的原因也極Expansion, the occurrence of positional accuracy over time, the cause of poor accuracy in the A war is also extremely

少〇 集塵單元8如圖1所示為回收在藉由位於其上方的雷 射照射頭73進行刻劃加工時由玻璃基板κ的底面落下的微 粒(非晶石夕媒Kj2的刻劃屑)而構成,具體上包含托盤81及 真空室(vacuum chamber)83。托盤81配設於雷射照射頭73 移動於X方向的範圍的下方,透過配管82連接於真空室 83。藉由這種構成,由於雷射刻劃落下到托盤81的微粒透 過真空吸引被回收至真空室8 3内。刻劃動作中為真空室8 3 ❿基本上一直進行吸引動作。 控制裝置9如圖5所示為各種命令及條件的輸入、響應 該等輸入的運算處理以及根據該運算處理結果之適當的控 制信號輸出至各驅動系統等為可能,俾雷射刻劃裝置1進行 一連串的刻劃動作而構成。具體上如圖6所示由如下的構件 構成:觸控面板(touch panel)等的輸入/輸出裝置91;以記 憶體裝置為主體的記憶部92;以微處理器為主體的運算處 理部93;與雷射刻劃裝置1中的各驅動系統及搬進搬出機 201032931 械手臂ίο進行資料通訊之適當的介面電路(interface cueu it)96;包含為了使該等硬體動作的電腦程式之硬碟裝 置95等。運算處理部93根據藉由攝影機77取入的刻劃線 LA1的影像資料Dl(參照圖6(A)),進行倣元線資料D2的算 出處理。該倣元線資料!)2為特定刻劃線laI的形狀的資 料,根據刻劃線LA1的X、Y各座標被算出。而且,為以仿 照刻劃線L A1的形狀形成在後段的製程(亦即第二製程)形 成的刻劃線L1之手段(means)。藉由運算處理部93算出的 ❿倣兀線資料D2被記憶於記憶部92。針對該等的詳細是在 後述的動作說明的攔說明。 搬進搬出機械手臂10被以進行玻璃基板K對浮起平台 3的搬進搬出的構成製作,如圖1所示包含:吸附手11、臂 (arm)12、真空泵(vacuum pump)13、馬達 14 及操作板 17。 吸附手11包含在框體i 5排列成二維狀的複數個吸引墊 16該等吸引墊16為令各個吸附面在同一平面,據此可在 複數處同時吸附平面體之玻璃基板K的頂面(非成膜面各 φ吸引墊16藉由真空泵13的動作而產生吸引壓。然後,吸附 手11依照來自操作板17的命令使馬達14被驅動,透過臂 12在XYZ 0各方向移動自如地構成。 其次,針對雷射刻劃裝置1的動作說明。 圖9是顯示雷射刻劃裝置1的基本動作的概要及倣 線資料取得步驟S200的動作^ 切作耘序之流程圖,圖1〇是顯 玻璃基板搬進步驟1〇〇的叙决a — 刃動作程序之流程圖,圖11是顯 刻劃步驟300的動作程序夕法< 斤之流程圖,圖12是顯示玻璃基 201032931 疋顯示雷射刻劃 圖1 4是顯示刻 搬出步驟500的動作程序之流程圖,圖13 裝置1的基本動作之時序圖(timechart), 劃動作之時序圖。此外,在圖9中A圖是 置1的基本動作的概要’B圖是顯示倣元線資料取得步驟的 動作程序。而且’在圖13中針對未意識到動作速度的可變 的轴(可動部)’僅成為開關(0n/0f f )的表記,加減速則未 表記。頂出銷43在動作途中動作速度為可變。 如圖9(A)所示’雷射刻劃裝置1的基本動作是以玻璃 ❿基板搬進步驟S1 00、倣元線資料取得步驟s2〇〇、刻劃步驟 S3 0 0、玻璃基板搬出步驟S5 0 0的順序被進行。以下,針對 各步驟的動作内容隨後說明順序。 此外’在以下的說明中雷射刻劃裝置1的初始狀態 (initial state)是设為如下所不(參照圖13的各囷表中的 時間轴的左方)。亦即,由浮起平台3 —直吹出浮起空氣的 狀態。頂出銷43位於上限位置pi。夾持器群51位於待避 位置(shunt ing location )P8。各夾持器53關閉。基板定 〇位裝置6為引入的狀態。成為刻劃對象的玻璃基板κ是使 成膜面朝下承載於台車或托板(pallet)的狀態。 [S1 0 0搬進玻璃基板] 首先,參照圖10、圖13針對玻璃基板搬進步驟S100 說明。 [S110接受玻璃基板(圖13的t卜t2)] • 操作者操作搬進搬出機械手臂10並將玻璃基板K搬進 雷射刻劃裝置1。具體上使用操作板1 7如下般移動臂1 2。 201032931 首先,使吸附手11來到承載於台車或托板的玻璃基板κ的 上方。接著,使該吸附手11下降到玻璃基板κ中的非成臈 面的高度。接著,藉由吸附手11中的吸附塾16吸附玻璃 基板Κ中的非成膜面的複數處。接著,移動臂12將吸附手 11吸附保持的玻璃基板Κ拿到浮起平台3的上游側位置。 接著’解除利用吸附手1 1進行的吸附保持,沿著附在銷框 架41的導件(guide)(未圖示),藉由手動將玻璃基板κ的額 緣部Kf的底面承載於頂出銷43的尖端部。 ® [S120使夾持器群朝接受位置移動(圖13的t3)] 玻璃基板K 一藉由頂出銷43的尖端部支撐,夾持器群 51就由待避位置P8朝接受位置P7移動。具體上線性馬達 5/y根據由控制裝置9傳輸的信號驅動夾持器群51於4方 向。據此,為了安全確保而待避至待避位置ρ8的夾持器群 51被配置於接受位置Ρ7。 [S130打開夾持器(圖13的t4)] 龜根姑夾持器群51 一被配置於接受位置P7,各夾持器53就 ©根捸由控制裝置9傳輸的信號打開關閉的可動爪。 [S14〇使夾持器群朝保持位置移動(圖13的t5)] 若各夾持器53在接受位置p7打開,則夾持 回避位置P6移到保拉办婆nr 控制裝署q值終 具體上夹持器群51根據由 刷裝置9傳輸的作缺# .位番里 °旎破驅動於方向,據此,被由回避 位置Ρ6配置於保持竹番Dc ^ A . 寻位置P5。此時,各夾持器53成為破璃 '基板κ中的額'緣部— ^ Λ 風為玻璃 空間的狀態。 邊進人各自的上下的可動爪間的 20 201032931 [S150使頂出銷下降(圖13的t6 打開可動爪的失持器群51 一被配 ψ ^ ^ 罝於保持值置P5,頂 出銷43就下降。據此,玻璃基板κ 盔士祕 迓精由孑起平台3空 氣文撐,一邊下降到浮起面位置Ρ4。 根據由#舍丨# # 〇 π #架驅動部42 根據由控制裝置9傳輸的信號下降驅動銷框架…該 驅動是如下進行。亦即,首先頂出銷43在支樓玻璃 的狀態下以速度Ui由上限位置P1下降到浮起面上方位置 ❹ P3(圖13的t6〜t7)e在玻璃基板κ以速度Μ下降到浮起面 上方位置Ρ3後是以速度U2(<U1)下降到浮起面位置ρ4(圖 13的t7~t8h如此,在使玻璃基板κ下降時使用兩階段的 速度,如U2<tJl般在浮起面位置Ρ4的附近以低速是為了防 止因在浮起平台3的正上方的急遽的下降,使浮起平台3 與玻璃基板K接觸。頂出銷43以速度U2下降後成為浮起 面位置P4,若玻璃基板K在淨起面位置P4被淨起支推, 則頂出銷43 —時停止(圖13的t8—tl2)。在該階段玻璃基 板K藉由頂出銷43與由浮起平台3喷出的空氣支撐。 Q [S160玻璃基板的定位(圖13的t9)] 玻璃基板K 一藉由頂出銷43與空氣支撐,基板定位裝 置6就根據由控制裝置9傳輸的信號使氣缸62伸長,按屋 滾子61按壓玻璃基板K的兩端面。據此,玻璃基板K被配 置於預先決定的位置。 [S170關閉夾持器(圖13的tlO)] 玻璃基板K的定位一被進行’根據由控制裝置9傳輸 的信號各夾持器5 3就關閉,抓住玻璃基板K中的額緣部κ f 201032931 的一邊。在該階段玻璃基板K藉由夾持器53與頂出鎖43 與空氣支撐。 [S180使基板定位裝置後退(圖13的tll)] 夾持器53 —抓住玻璃基板K中的額緣部的一邊,基 板定位裝置6就根據由控制裝置9傳輸的信號使氣缸62縮 短,使按壓滾子61後退。 [S190使頂出銷更下降(圖13的tl2、tl3);| 基板定位裝置6 —後退,框架驅動部42就根據由控制 〇裝置9傳輸的信號更丁降驅動銷框架41。此時,玻璃基板κ 藉由空氣支撐。頂出銷43離開玻璃基板κ,下降到下限位 置Ρ2。在該階段玻璃基板Κ為額緣部Kf的一邊藉由爽持器 53保持,成膜面的全面藉由空氣浮起支撐。如以上,玻璃 基板K被搬進。 [S200倣元線資料取得步驟] 接著,參照圖6U)及圖9(B)針對倣元線資料取得步驟 S200說明。此外,假設攝影機77與刻劃線ίΑι的對準被 ©行而說明。亦即,攝影機77被配置於可拍攝刻劃線[Μ _ — π&7 αΑ» ^ 踝性馬達74Χ根據由控制裝置9傳輸的 射頭73於+X方向(圖9⑻的S2l〇)。據此被安裝於 照射碩73的側部的攝影機77移動於+χ方向。攝 隨該移動拍攝刻劃線LA1,將該影像資料Μ(參 傳送到控制裝置9。控制裝置9中 、()) 、笔以… 异〜理部93根櫨值 送的影像資料m算出倣元線資料 據傳 ^使其s己憶於記憶部 22 201032931 92。倣元線資料D2為成為在第二製程形成的刻割線 L 2…的倣元的線的資料。 、 倣元線資料D2的算出方法可任意設定。例如As shown in FIG. 1, the sputum dust collecting unit 8 collects particles which are dropped from the bottom surface of the glass substrate κ at the time of scribing by the laser irradiation head 73 located above it (the swarf of the amorphous smectite Kj2) The configuration specifically includes a tray 81 and a vacuum chamber 83. The tray 81 is disposed below the range in which the laser irradiation head 73 moves in the X direction, and is connected to the vacuum chamber 83 through the pipe 82. With this configuration, the particles dropped by the laser scoring to the tray 81 are recovered into the vacuum chamber 83 by vacuum suction. In the scribing operation, the vacuum chamber 8 3 ❿ basically performs the suction operation. As shown in FIG. 5, the control device 9 is capable of inputting various commands and conditions, arithmetic processing in response to the inputs, and outputting an appropriate control signal based on the result of the arithmetic processing to each drive system, etc., and the laser scribing apparatus 1 is possible. It is constructed by performing a series of scribing actions. Specifically, as shown in FIG. 6, the input/output device 91 such as a touch panel; the memory unit 92 mainly composed of a memory device; and the arithmetic processing unit 93 mainly composed of a microprocessor. And an appropriate interface circuit (interface cueu it) 96 for data communication with each drive system and loading and unloading machine 201032931 in the laser scoring device 1; including a computer program for operating the hardware Disc device 95 and the like. The arithmetic processing unit 93 performs the calculation processing of the pseudo-line data D2 based on the video data D1 (see Fig. 6(A)) of the scribe line LA1 taken in by the camera 77. The imitation meta line information! 2 is a material of the shape of the specific score line laI, and is calculated based on the coordinates of X and Y of the score line LA1. Further, means for forming the score line L1 formed in the process of the subsequent stage (i.e., the second process) is formed in the shape of the scribe line L A1 . The imaginary line data D2 calculated by the arithmetic processing unit 93 is stored in the memory unit 92. The details of these are explained in the description of the operation described later. The loading/unloading robot arm 10 is configured to carry out the loading and unloading of the floating substrate 3 by the glass substrate K, and includes an adsorption hand 11, an arm 12, a vacuum pump 13, and a motor as shown in Fig. 1 . 14 and the operation panel 17. The adsorption hand 11 includes a plurality of suction pads 16 arranged in a two-dimensional shape in the frame i 5 . The suction pads 16 are such that the respective adsorption surfaces are on the same plane, whereby the top of the glass substrate K of the planar body can be simultaneously adsorbed at a plurality of places. The surface (the non-film formation surface φ suction pad 16 generates a suction pressure by the operation of the vacuum pump 13. Then, the adsorption hand 11 drives the motor 14 in accordance with an instruction from the operation panel 17, and the transmission arm 12 moves freely in the XYZ 0 direction. Next, the operation of the laser scribing apparatus 1 will be described. Fig. 9 is a flow chart showing the outline of the basic operation of the laser scribing apparatus 1 and the operation of the imitation data acquisition step S200. 1〇 is a flow chart of the process of the glass substrate loading step 1A, the blade operation program, FIG. 11 is a flow chart showing the operation procedure of step 300, and FIG. 12 is a glass base. 201032931 疋Display laser sculpt diagram 14 is a flow chart showing the operation procedure of the squeegee out step 500, and FIG. 13 is a timing chart of the basic operation of the apparatus 1 and a timing chart of the stroke operation. Further, in Fig. 9, A The figure is a summary of the basic actions set. 'B is an operation program for displaying the step of obtaining the meta-line data. Moreover, 'the variable axis (movable part)' that is not aware of the operation speed in FIG. 13 is only the expression of the switch (0n/0f f ), plus The deceleration is not indicated. The ejector pin 43 has a variable speed during the operation. As shown in Fig. 9(A), the basic operation of the laser scribing device 1 is to carry the glass crucible substrate into the step S1 00 and the imitation line. The order of the data acquisition step s2 〇〇, the scribe step S3 0 0 , and the glass substrate carry-out step S 510 is performed. Hereinafter, the operation contents of the respective steps will be described later. Further, the laser scribe apparatus will be described in the following description. The initial state of 1 is set to the following (see the left side of the time axis in each of the tables in Fig. 13). That is, the floating platform 3 is directly blown out of the floating air. The pin 43 is located at the upper limit position pi. The gripper group 51 is located at a shunting position P8. Each of the grippers 53 is closed. The substrate fixing and positioning device 6 is in an introduced state. The glass substrate κ which is the object of scribing is such that The film is placed face down on the trolley or pallet (pall [S1 0 0 Loading Glass Substrate] First, the glass substrate loading step S100 will be described with reference to Figs. 10 and 13 [S110 accepts a glass substrate (tb t2 in Fig. 13)] • Operator operation The robot arm 10 is moved in and out and the glass substrate K is carried into the laser scribing device 1. Specifically, the arm 1 is moved as follows using the operation panel 17. 201032931 First, the suction hand 11 is brought to the glass carried on the trolley or the pallet. Above the substrate κ. Next, the adsorption hand 11 is lowered to a height of the non-composite surface of the glass substrate κ. Next, the plurality of non-film formation faces in the glass substrate crucible are adsorbed by the adsorption crucible 16 in the adsorption hand 11. Next, the moving arm 12 takes the glass substrate sucked and held by the suction hand 11 to the upstream side position of the floating platform 3. Then, the suction holding by the suction hand 1 1 is released, and the bottom surface of the front edge portion Kf of the glass substrate κ is manually carried out by a guide (not shown) attached to the pin frame 41. The tip end portion of the pin 43. ® [S120 moves the gripper group toward the receiving position (t3 of Fig. 13)] The glass substrate K is supported by the tip end portion of the ejector pin 43, and the gripper group 51 is moved from the standby position P8 toward the receiving position P7. Specifically, the linear motor 5/y drives the gripper group 51 in the 4 direction in accordance with the signal transmitted from the control unit 9. According to this, the gripper group 51 to be avoided to the standby position ρ8 for safety assurance is disposed at the receiving position Ρ7. [S130 Opening the Gripper (t4 of Fig. 13)] Once the turtle root gripper group 51 is disposed at the receiving position P7, each gripper 53 opens and closes the movable pawl by a signal transmitted from the control device 9. . [S14〇 Move the gripper group toward the holding position (t5 of Fig. 13)] If each gripper 53 is opened at the receiving position p7, the grip avoidance position P6 is moved to the end of the control position. Specifically, the gripper group 51 is driven in accordance with the movement caused by the brush device 9. The position is driven by the avoidance position Ρ6 to maintain the position D5. At this time, each of the grippers 53 is in a state in which the edge of the 'substrate κ' is broken—the Λ wind is a glass space. 20 201032931 between the upper and lower movable claws of the erectors [2010] The ejector pins are lowered (the t6 of the movable claws of the t6 of Fig. 13 is assigned ψ ^ ^ 保持 to the holding value P5, the ejector pin 43. According to this, the glass substrate κ 盔 迓 迓 迓 孑 孑 平台 平台 平台 平台 平台 盔 盔 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃 玻璃The signal transmitted by the device 9 is lowered by the driving pin frame. The driving is performed as follows. First, the ejector pin 43 is lowered from the upper limit position P1 to the upper position of the floating surface ❹ P3 at the speed Ui in the state of the louver glass (Fig. 13). After t6 to t7)e, the glass substrate κ is lowered to the upper position of the floating surface Ρ3 at the speed κ, and then the speed U2 (<U1) is lowered to the floating surface position ρ4 (t7 to t8h of Fig. 13) When the substrate κ is lowered, a two-stage speed is used. As in the case of U2 < tJ1, the low speed is in the vicinity of the floating surface position Ρ4 in order to prevent the floating platform 3 and the glass substrate from being drastically lowered directly above the floating platform 3. K contact. The ejector pin 43 is lowered at the speed U2 to become the floating surface position P4, if the glass base K is lifted at the net-lifting position P4, and the ejector pin 43 is stopped (t8-t12 of Fig. 13). At this stage, the glass substrate K is ejected by the ejector pin 43 and by the floating platform 3. Air support Q [Locating the S160 glass substrate (t9 of Fig. 13)] The glass substrate K is supported by the ejector pin 43 and the air, and the substrate positioning device 6 elongates the cylinder 62 according to the signal transmitted by the control device 9. The both ends of the glass substrate K are pressed by the roof roller 61. Accordingly, the glass substrate K is placed at a predetermined position. [S170 Closing the holder (t10 of Fig. 13)] The positioning of the glass substrate K is performed as follows. The signals transmitted by the control device 9 are closed by the respective holders 5, and one side of the fore edge portion κ f 201032931 in the glass substrate K is grasped. At this stage, the glass substrate K is held by the holder 53 and the ejection lock 43 Air support [S180 causes the substrate positioning device to retreat (t11 of Fig. 13)] gripper 53 - grips one side of the fore edge portion of the glass substrate K, and the substrate positioning device 6 causes the cylinder according to the signal transmitted by the control device 9. The shortening of 62 causes the pressing roller 61 to retreat. [S190 causes the ejector pin to be lowered further (t12 of Fig. 13). Tl3);| The substrate positioning device 6 is retracted, and the frame driving portion 42 drives the pin frame 41 in accordance with the signal transmitted from the control device 9. At this time, the glass substrate κ is supported by air. The ejection pin 43 leaves the glass. The substrate κ is lowered to the lower limit position Ρ 2. At this stage, the side of the front edge portion Kf of the glass substrate 保持 is held by the holder 53 and the entire film formation surface is supported by air floating. As described above, the glass substrate K is moved. [S200 Meta-Line Data Acquisition Step] Next, the dummy line data acquisition step S200 will be described with reference to FIGS. 6U) and 9(B). Further, it is assumed that the alignment of the camera 77 with the scribe line ίΑ is explained by the line. That is, the camera 77 is disposed on the photographable score line [Μ _ - π & 7 α Α » ^ 马达 马达 Χ Χ Χ Χ according to the head 73 transmitted by the control device 9 in the +X direction (S2l 图 of Fig. 9 (8)). Accordingly, the camera 77 attached to the side portion of the illumination beam 73 moves in the +χ direction. The photographing line LA1 is taken with the movement, and the image data is transmitted to the control device 9. The control device 9 is controlled by the image data m of the 93-valued value. The meta-line data is reported to have been remembered in the memory department 22 201032931 92. The dummy line data D2 is data of a line which becomes a dummy of the scribe line L 2 ... formed in the second process. The calculation method of the meta-line data D2 can be arbitrarily set. E.g

辱入刻蠡I 線LA1上的複數點(例如2〜10點)’藉由根據該等 曲線或近似直線近似而算出。使用該算出方法時 J,释由線料 馬達74Χ在上述步驟S210間歇地驅動雷射照射 3而進 行。亦即’每次使攝影機77在上述2〜10點停止,進行攝/ 處理《而且,另外的方法也能讀入刻劃線ίΑ1上 影 尺多數個 ❿點,當作追蹤刻劃線LA1的資料而算出。使用該算出方法時 為藉由不使攝影機77停止而以較低的速度連續地驅動於X 方向而進行。 被S己憶於記憶部9 2的倣元線資料D 2在下一段落以後 敘述的刻劃步驟S300被讀出,當作在刻劃動作時補正驅動 雷射照射頭7 3的控制資料而被使用。 [S300刻劃] 接著,參照圖7、圖11、圖14針對刻劃步驟S3〇〇說 φ明《此外,假設雷射照射頭73中的雷射照射窗735與第一 個刻劃開始端L S1的對準被進行而說明。 [S31〇~S345第—條刻劃線的形成(圖14的wbw12)] 線性馬達52Y根據由控制裝置9傳輸的信號,成為π 的一定速度而驅動夾持器群51於_^方向(圖11的531〇、圖 14的wl、w4)。據此,玻璃基板κ在+γ方向以n的一定速 度行走。另一方面,線性馬達74Υ根據由控制裝置9傳輸的 信號,成為vi的一定速度而驅動雷射照射頭73於+γ方向 23 201032931The multiple points (e.g., 2 to 10 points) on the insulting line I1 are calculated by approximating the curve or the approximate straight line approximation. When this calculation method is used, J is released by the wire motor 74 间歇 intermittently driving the laser irradiation 3 in the above-described step S210. That is, 'the camera 77 is stopped at the above 2 to 10 o'clock every time, and the camera is processed/processed. Moreover, another method can also read the scribe line on the scribe line Α1, which is used as the tracking scribe line LA1. Calculated by data. When this calculation method is used, it is performed by continuously driving the X direction at a low speed without stopping the camera 77. The meta-line data D 2, which has been recalled by the memory unit 92, is read out in the scribing step S300 described later in the next paragraph, and is used as the control data for correcting the driving of the laser irradiation head 73 at the time of the scribing operation. . [S300 scribing] Next, referring to FIG. 7, FIG. 11, and FIG. 14, the scribing step S3 will be described. In addition, the laser irradiation window 735 and the first scribing start end in the laser irradiation head 73 are assumed. The alignment of L S1 is performed to explain. [S31〇~S345 Formation of the first scribe line (wbw12 of Fig. 14)] The linear motor 52Y drives the gripper group 51 in the _^ direction at a constant speed of π according to the signal transmitted from the control device 9. 531〇 of 11 and wl, w4 of Fig. 14). According to this, the glass substrate κ travels at a constant speed of n in the +γ direction. On the other hand, the linear motor 74 驱动 drives the laser irradiation head 73 in the + γ direction according to the signal transmitted from the control device 9 at a constant speed of vi 23 201032931

(圖11的S3 20、圖14的”、*5)。據此,玻璃基板K與雷 射照射頭7 3的相對速度變成〇,雷射照射頭7 3為對玻璃基 板Κ外觀上靜止。機械式快門了以根據由控制裝置9傳輸的 仏號而打開(圖11的S325)。線性馬達74χ根據由控制裝置 9傳輸的信號,成為¥2的一定速度而驅動雷射照射頭73於 + Χ方向(圖11的S330、圖η的w3、w6)。與此同時,線性 馬達74Y根據記憶於控制裝置9中的記憶部92的倣元線資 料D2 ’在γ方向每次極少量地補正驅動雷射照射頭73,俾 雷射光b2所追蹤的軌跡成為與刻劃線LA1大致相同的形 狀°該媒動是由雷射照射窗735照射的雷射光b2從第一刻 劃開始端LSI (參照圖8)移動到第一刻劃結束端lei而進行 (圖 11 的 S330、圖 14 的 w5—w7)。 藉由以上的動作’由雷射照射窗735照射的雷射光b2 為邊維持玻璃基板K移動於+γ方向的狀態,一邊從第一 刻劃開始端LSI到第一刻劃結束端LE1移動於玻璃基板κ 俾仿照刻劃線LA1的形狀(圖6(Β)、圖丨丨的S33〇、圖 的w6 w8)。藉由該雷射光b2透過玻璃基板κ的透明玻 璃Kt(囷8),刻劃成膜於底面的電路形成用材料非晶矽 膜Kj2)’形成平行於刻劃線U1的刻劃線[卜該刻割線u 如圖8(A)所不’若成為倣元的刻劃線傾斜一點點,則 :為仿照刻劃線LA1的形狀。同樣地,刻劃線ui形成曲線 :鑛齒狀的情形,所形成的刻劃線u也成為響應各自的形 的形狀。而且,此時所產生的微粒落下到托盤81,藉由 真空吸引被回收到真空室83内。在形成有第—條刻劃㈣ 24 201032931 的時間點’機械式快門721根據由控制裝置9傳輪的信號而 關閉(囷11的S345)。 [S350使雷射照射頭返回初始位置(圖丨4的w7~wl2)] 機械式快門721關閉,並且線性馬達74Y根據由控制裝 置9傳輸的彳5號’透過如下的要領驅動雷射照射頭73於—γ 方向(圖14的w7〜wl2h亦即,第一條刻劃線L1的形成結 束後到t = Q/VI的時間.經過為止,使雷射照射頭返回原來 的初始位置P9。該動作的目的如下所示。亦即,玻璃基板κ ❹不會靜止而是以VI的一定速度移動於+ γ方向。此處,因在 玻璃基板κ的短邊方向相鄰的刻劃線彼此的間距(pitch)間 隔為Q (參照圖8 ),故第一條刻劃線l 1的形成結束後在 t = Q/Vl的經過後’雷射照射窗735位於第二個刻劃開始端 LS2的上方。到此為止,藉由使雷射照射頭73返回原來的 初始位置P9 ’用以確保在形成第二條刻劃線L2時(圖14的 wl6—*18),雷射照射頭73為了朝+γ方向移動的衝程 (stroke) ° ❿ [S360〜S385第二條刻劃線的形成(圖14的w14~w21)] 玻璃基板K為以VI的一定速度行走於+γ方向的狀態。 線性馬達74Y根據由控制裝置9傳輸的信號,成為νι的一 定速度而驅動雷射照射頭73s+Y方向(圖u的s36〇、圖 14的wl3—wl5)。據此,與第一條刻劃線u的形成時一樣, •玻璃基板K與雷射照射頭73的相對速度變成〇,雷射照射 -頭73為對玻璃基板κ外觀上靜止❶機械式快門721根據由 控制裝置9傳輸的信號而打開(圖u的S365 )。線性馬達 201032931 根據由控制裝置9傳輪的信號,成為V2的一定速度而驅動 雷射照射頭73於-X方向(圖11的如0、目Η的wl4-wl6)。與此同時,線性馬達74γ根據記憶於控制裝置9中的 記憶部92的倣元線資料D2,在γ方向每次極少量地補正 驅動雷射照射頭73’俾雷射光b2所追蹤的軌跡成為與刻劃 線LA1大致相同的形狀。該驅動是由雷射照射窗照射的 雷射光b2從第一刻劃開始端LS2移動到第二刻劃結束端 LE2而進行(圖U的S37〇、圖14的η?)。 ® 藉由以上的動作,由雷射照射窗735照射的雷射光b2 為一邊維持玻璃基板K移動於+γ方向的狀態,一邊從第二 刻劃開始端LS2到第二刻劃結束端lE2移動於玻璃基板Κ 上’俾仿照刻劃線LA1的形狀(圖丨丨的S370、圖14的wl6、 wl8)。藉由該雷射光透過玻璃基板κ的透明玻璃Kt (參 照圖8 )’刻劃成膜於底面的電路形成用材料κ j (非晶矽膜 Kj 2) ’形成平行於第一條刻劃線L1 (平行於刻劃線LA1)的 第二條刻劃線L2。此時所產生的微粒與第一條刻劃線L1的 ©形成時一樣落下到托盤81 ’藉由真空吸引被回收到真空室 83内。在形成有第二條刻劃線l2的時間點,機械式快門721 根據由控制裝置9傳輸的信號而關閉(圖Η的S385)。 [S390使雷射照射頭返回初始位置(圖14的 wl7~w22 )] 機械式快門721關閉’並且線性馬達74Y根據由控制裝 置9傳輸的信號,透過與剛形成第一條刻劃線u後一樣的 要領驅動雷射照射頭73於-γ方向(圖14的wl7〜w2 2)。亦 26 201032931 即’第二條刻劃線L 2的形成結束後到t = Q / V1的時間經過, 使雷射照射頭73返回原來的初始位置P9。據此,可確保在 •形成第三條刻劃線L3時(圖14的w26— w28),雷射照射頭 • 73為了朝+ Y方向移動的衝程。 [S400第三條以後的刻劃線以後的刻劃線的形成] 之後針對第三條以後的刻劃線也藉由與第一條或第二 條一樣的要領,一邊維持使玻璃基板K朝+γ方向移動的狀 態,一邊不會使其靜止而使雷射光1)2朝_^方向或_χ方向移 〇動,並且根據倣元線資料D2在Υ方向每次極少量地補正驅 動雷射照射頭73並形成刻劃線。此外,表示線性馬達52γ 為Υ1軸,表示線性馬達74Υ為Υ2軸,表示線性馬達74χ 為XI轴時的各轴的位置關係及動作關係如圖7所示。 此處,藉由玻璃基板Κ移動於+γ方向,使玻璃基板κ 的π起支撐由上游的主平台31移到下游的主平台31時, 因空氣也由副平台32吹出,故在回收孔部(托盤81的上方) 破璃基板Κ大大地彎曲被防止。據此,玻璃基板[的行進方 ©向端部碰觸下游的主平台31的端部等被防止,玻璃基板κ 之由上游的主平台31換乘到下游的主平台31被平順且確 實地進行。此外’在後述的步驟S5l〇中使玻璃基板κ移動 於方向時也具有與此相同的效果。 如以上,不會停止玻璃基板Κ而一邊使其移動於+γ方 向’—邊形成有預定條數的刻劃線的話(在圖u @ s4〇〇為 卿,線性馬達52Y根據由控制裝i 9傳輸的信號使夹持器 群5丨之驅動於+Y方向停止(圖u的S4i〇、圖13的m 27 201032931 tl7)。 如此’依照雷射刻劃裝置1,當形成第二製程中的刻劃 線L1時,線性馬達74Y如下般在γ方向每次極少量地補正 驅動雷射照射頭73。亦即,線性馬達74X正以等速度驅動 雷射照射頭7 3於X方向時,線性馬達7 4γ根據記憶於控制 裝置9中的記憶部92的傲元線資料D2,在Y方向每次極少 量地補正驅動雷射照射頭73,俾雷射光b2所追蹤的軌跡成 為與成為該傲元的刻劃線LA1大致相同的形狀。據此,考 φ慮兼顧在前段的製程形成的刻劃線LA1的形狀或位置關 係,可形成剛好按照該刻劃線LA1的形狀的刻劃線L1於刻 劃線L A1的接鄰位置(窄間距位置)。亦即,以雷射刻劃裝置 1形成的刻劃線L1若在前段的第一製程藉由別的機台形成 的成為倣元的刻劃線LA1傾斜一點點或彎曲的話,則會成為 仿照刻劃線LA1的形狀。因此,不會有刻劃線lai、L1彼此 接觸’或由於刻劃線LA 1與刻劃線l 1的間隔d擴大使得死 區(無助於刻劃線間的發電的區域)擴大。其結果,可防止薄 ❿膜太陽電池板的發電效率降低。而且,雷射照射頭73因減 少收容物,被以輕的構成製作,故動作的追蹤性及響應性 佳,精密的微調整為可能。此外,不進行依照倣元線資料 D2進行的補正而形成的刻劃線lΓ例如如圖丨6所示,有 成為自刻劃绛L A1 [間隔尺寸誤差]擴大的形狀。 接著,參照圖12、圖13針對玻璃基板搬出步驟§5〇〇 說明。 [S510使玻璃基板返回接受位置(圖13的tl7)] 201032931 刻劃線的形成一結束,線性馬達5 2 Y就根據由控制裝置 9傳輸的信號驅動夾持器群51於-Υ方向。據此,位於下游 的玻璃基板Κ 一邊朝-Υ方向移動,一邊返回接受位置Ρ7。 . 因在玻璃基板Κ朝-Υ方向移動時,由利用下游側的主平台 31進行的浮起支撐移動至利用上游側的主平台31進行的 浮起支撐時是藉由由副平台32喷出的空氣,使玻璃基板Κ 被支撐,故即使是回收孔部’移動動作也平順且確實。 [S5 20使頂出銷上升(圖13的tl8、tl9)] Φ 抓住玻璃基板Κ的夾持器群51 —返回接受位置ρ7, 極架驅動部42就根據由控制裝置9傳輸的信號上升联動销 框架41至浮起面位置Ρ4。據此’頂出銷43由下限位置Ρ2 上升’其尖端部抵接玻璃基板Κ中的額緣部Kf的底面。在 該階段玻璃基板K藉由夾持器53與頂出銷43與空氣支樓。 [S5 30打開夾持器(圖13的t20)] 若頂出銷43上升,其尖端部抵接玻璃基板κ中的額緣 部Kf的底面,則各夾持器53根據由控制裝置9傳輪的信號 ©打開關閉的可動爪,鬆開玻璃基板κ。在該階段玻璃基^ ^ 藉由頂出銷43與空氣支撐。 [S540夾持器群於回避位置(圖13的t2l)] 各夾持器53 —鬆開玻璃基板κ,夾持器群5ι 控制裝置9傳輸的信號被驅動於 , • Η由保持位置P5移到回避位置Ρ6β據此,夹持11群 移到回避位置Ρ6’框架驅動部42就根 29 201032931 據由控制裝置9傳輸的信號上升驅動鎖框架4i。據此,頂 出銷43在其尖端部抵接玻璃基板K中的額緣部Kf的底面的 •狀態下由浮起面位置P4上升至上限位置N。在該階段玻璃 .基板κ變成完全由浮起面位置P4升起,僅藉由頂出銷43 支撐的狀態。 [S560夾持器群於待避位置(圖13的七以、^5)] 玻璃基板Κ —成為上限位置p卜線性馬達52γ就根據 由控制裝置9傳輸的信號驅動夾持器群51於+γ方向。據 ®此,夾持器群51由接受位置Ρ7移到待避位置ρ8。然後, 各夾持器53根據由控制裝置9傳輸的信號關閉打開的可動 爪0 [S570傳遞玻璃基板(圖13的t26、t27)] 夾持器群51 —移到待避位置卩8,操作者就操作搬進搬 出機械手臂ίο,由雷射刻劃裝置j將僅藉由頂出銷43支撐 的玻璃基板K傳遞到台車或托板。具體上首先操作臂a, 配置吸附手11到被頂出銷43支撐的玻璃基板£的上方。 ©接著’使該吸附手11下降到玻璃基板κ中的非成膜面的高 度。接著,以吸附手1丨吸附玻璃基板κ中的非成骐面的複 數處。接著操作臂1 2,將吸附手丨丨吸附保持的玻磷基板κ 拿到台車或托板的位置。接著,解除利用吸附手u進行的 吸附保持’以手動將玻璃基板K搬出到台車或托板。 以上雖然是針對本發明的實施形態進行說明,惟以上所 揭不的實施形態只不過是舉例說明,本發明的範圍不是被限 定於該實施的形態。本發明的範圍是藉由申請專利範圍的記 30 201032931 載而顯示,更企圖包含與申請專利範圍均等的意義及在範圍 内的所有的變更。亦即,雷射刻劃裝置1的全體或一部分 的構造、形狀、尺寸、材質、個數等可依照本發明的旨趣 -進行種種的變更。 而且,在本實施形態中雖然基板處理裝置是以雷射刻 劃裝置’惟也能適用於雷射刻劃裝置以外’例如對成膜於 破璃基板上的膜進行曝光(exposure)的裝置、對玻璃基板 進行標記(marking)或切割(cutting)等的裝置等。而且, ❹在上述的實施形態中雖然是透過藉由線性馬達74Y的微小 驅動對雷射照射頭73位置補正而進行為了仿照刻劃線LA1 的動作’惟藉由組合驅動失持器53於ΧΖΘ各方向的各媒動 部’及線性馬達52Y的全部或一部分的驅動動作,使玻璃 基板K之側驅動也可以。或者使用電流鏡(gaivan〇_mirr〇r) 等驅動玻璃基板K也可以。 而且,雖然雷射刻劃裝置1是以在TC0膜K j丨之上的 非晶矽膜K j 2形成刻劃線L1、L2…的裝置,亦即第二製程 ©用的裝置,惟以在形成於非晶矽膜Kj2之上的金屬膜Kj3 形成刻劃線的裝置,亦即第三製程用的雷射刻刻裝查也可 以0 【圖式簡單說明】 圖1是與本發明有關的雷射刻劃裝置之外觀斜視圖。 圖2是顯示雷射刻劃裝置的主要部分之俯視圖。 圖3是顯示雷射刻劃裴置的主要部分之前視圖。 31 201032931 圖4是顯示街_ 甯射單疋之斜視圖。(S3 20 of Fig. 11 and "5" of Fig. 14). Accordingly, the relative speed of the glass substrate K and the laser irradiation head 713 becomes 〇, and the laser irradiation head 713 is stationary to the appearance of the glass substrate 。. The mechanical shutter is opened in accordance with the nickname transmitted by the control device 9 (S325 of Fig. 11). The linear motor 74 驱动 drives the laser irradiation head 73 at a constant speed of ¥2 based on the signal transmitted from the control device 9. In the Χ direction (S330 of Fig. 11, w3, w6 of Fig. η), at the same time, the linear motor 74Y is corrected in a small amount in the γ direction according to the dummy line data D2' stored in the memory unit 92 of the control unit 9. The laser irradiation head 73 is driven, and the trajectory tracked by the laser light b2 is substantially the same shape as the scribe line LA1. The medium is the laser light b2 irradiated by the laser irradiation window 735 from the first scribe start end LSI ( Referring to Fig. 8), moving to the first scribing end lei (S330 of Fig. 11 and w5-w7 of Fig. 14) is performed by the above operation 'the laser light b2 irradiated by the laser irradiation window 735 is the side maintaining glass The substrate K moves in the +γ direction, from the first scribing start end LSI to the first scribing The beam end LE1 moves on the glass substrate κ 俾 in the shape of the scribe line LA1 (Fig. 6 (Β), S33 of the figure 〇, w6 w8 of the figure). The transparent glass Kt transmitted through the glass substrate κ by the laser light b2 (囷8), the material-forming material amorphous film Kj2)' which is formed by filming on the bottom surface is formed into a scribe line parallel to the scribe line U1 [this secant line u is as shown in Fig. 8(A)] When the scribe line of the imitation element is inclined a little, it is: the shape of the scribe line LA1. Similarly, the scribe line ui forms a curve: in the case of a mineral tooth, the formed scribe line u also responds to each. Further, the particles generated at this time fall to the tray 81 and are recovered into the vacuum chamber 83 by vacuum suction. At the time point when the first stripe is formed (4) 24 201032931, the mechanical shutter 721 is based on The control device 9 turns off the signal of the wheel (S345 of 囷11). [S350 returns the laser head to the initial position (w7~wl2 of Fig. 4)] The mechanical shutter 721 is closed, and the linear motor 74Y is controlled by the control device 9 transmitted 彳5#' drives the laser irradiation head 73 in the -γ direction by the following method (w7~w of Fig. 14) L2h, that is, the time from the completion of the formation of the first scribe line L1 to the time t = Q/VI. The laser irradiation head is returned to the original initial position P9. The purpose of this operation is as follows. The glass substrate κ ❹ does not stand still but moves in the + γ direction at a constant speed of VI. Here, the pitch of the scribe lines adjacent to each other in the short-side direction of the glass substrate κ is Q (refer to the figure). 8), the laser irradiation window 735 is located above the second scratch start end LS2 after the formation of the first scribe line l 1 after t = Q/Vl. Up to this point, by returning the laser irradiation head 73 to the original initial position P9' to ensure that when the second scribe line L2 is formed (wl6 - * 18 of Fig. 14), the laser irradiation head 73 is directed toward + Stroke in the γ direction movement ❿ [S360 to S385 formation of the second scribe line (w14 to w21 in Fig. 14)] The glass substrate K is in a state of traveling at a constant speed of VI in the +γ direction. The linear motor 74Y drives the laser irradiation head 73s + Y direction at a certain speed of νι according to the signal transmitted from the control device 9 (s36 of Fig. u, wl3 - wl5 of Fig. 14). Accordingly, as in the formation of the first scribe line u, the relative speed of the glass substrate K and the laser irradiation head 73 becomes 〇, and the laser irradiation-head 73 is a stationary mechanical shutter for the appearance of the glass substrate κ. 721 is turned on according to the signal transmitted by the control device 9 (S365 of Fig. u). The linear motor 201032931 drives the laser irradiation head 73 in the -X direction based on the signal transmitted from the control device 9 at a constant speed of V2 (when the target is wl4-wl6 in Fig. 11). At the same time, the linear motor 74γ corrects the trajectory tracked by the laser irradiation head b' 俾 in the γ direction by a small amount of correction in the γ direction based on the dummy line data D2 stored in the memory unit 92 of the control unit 9. It has substantially the same shape as the score line LA1. This driving is performed by the laser light b2 irradiated by the laser irradiation window moving from the first scribing start end LS2 to the second scribing end LE2 (S37 of Fig. U, η? of Fig. 14). By the above operation, the laser beam b2 irradiated by the laser irradiation window 735 moves from the second scribing start end LS2 to the second scribing end lE2 while maintaining the glass substrate K in the +γ direction. On the glass substrate 俾, the shape of the scribe line LA1 is imitation (S370 of Fig. 14 and wl6, wl8 of Fig. 14). The circuit forming material κ j (amorphous germanium film Kj 2) formed by the transparent glass Kt (see FIG. 8 ) of the laser light transmitted through the glass substrate κ is formed parallel to the first underline. The second scribe line L2 of L1 (parallel to the scribe line LA1). The particles generated at this time are dropped to the tray 81' as in the formation of the first scribe line L1, and are recovered into the vacuum chamber 83 by vacuum suction. At the time point when the second scribe line 12 is formed, the mechanical shutter 721 is turned off in accordance with the signal transmitted from the control device 9 (S385 of Fig.). [S390 returns the laser irradiation head to the initial position (wl7 to w22 of Fig. 14)] the mechanical shutter 721 is closed' and the linear motor 74Y transmits and transmits the first scribe line u according to the signal transmitted from the control device 9. The same method drives the laser irradiation head 73 in the -γ direction (wl7 to w2 2 of Fig. 14). Also, 26 201032931, that is, after the formation of the second scribe line L 2 is completed and the time elapses from t = Q / V1, the laser irradiation head 73 is returned to the original initial position P9. According to this, it is ensured that the stroke of the laser irradiation head 73 is moved in the +Y direction when the third scribe line L3 is formed (w26-w28 of Fig. 14). [Formation of the scribe line after the third line and the subsequent scribe line] After the third line, the scribe line is also maintained by the same method as the first or second strip, while maintaining the glass substrate K toward + γ direction moving state, while not making it stationary, the laser light 1) 2 is moved in the _^ direction or _χ direction, and the driving lightning is corrected in a small amount in the Υ direction according to the imitation element line data D2. The irradiation head 73 is irradiated and a score line is formed. Further, the linear motor 52γ is referred to as a Υ1 axis, and the linear motor 74 Υ is a Υ2 axis, and the positional relationship and operational relationship of each axis when the linear motor 74 χ is the XI axis are as shown in FIG. 7 . Here, when the glass substrate Κ is moved in the +γ direction and the π support of the glass substrate κ is moved from the upstream main stage 31 to the downstream main stage 31, since the air is also blown by the sub-stage 32, the recovery hole is formed. Part (above the tray 81) The glass substrate Κ is greatly bent and prevented. According to this, the end portion of the main substrate 31 that is in contact with the downstream end of the glass substrate is prevented, and the main platform 31 of the glass substrate κ that is transferred from the upstream main platform 31 to the downstream main platform 31 is smoothly and surely get on. Further, the same effect is obtained when the glass substrate κ is moved in the direction in the step S5I described later. As described above, if a predetermined number of scribe lines are formed without stopping the glass substrate Κ while moving in the +γ direction ' (in the figure u @ s4〇〇, the linear motor 52Y is controlled by the control device i) 9 The transmitted signal stops the driving of the gripper group 5丨 in the +Y direction (S4i〇 of Fig. u, m 27 201032931 tl7 of Fig. 13). Thus [in accordance with the laser scoring device 1, when forming the second process When the scribe line L1 is drawn, the linear motor 74Y corrects the driving of the laser irradiation head 73 in a small amount in the γ direction as follows. That is, when the linear motor 74X is driving the laser irradiation head 73 in the X direction at a constant speed, The linear motor 74 4 γ is used to correct the driving of the laser irradiation head 73 in a small amount in the Y direction in accordance with the proud line data D2 of the memory unit 92 stored in the control unit 9. The trajectory tracked by the laser light b2 becomes and The slanting line LA1 of the proud element has substantially the same shape. Accordingly, the shape or positional relationship of the scribe line LA1 formed in the process of the preceding stage can be considered, and the scribe line just in accordance with the shape of the scribe line LA1 can be formed. L1 is adjacent to the adjacent line (narrow pitch position) of the scribe line L A1. The score line L1 formed by the laser scoring device 1 is tilted or curved if the first process in the preceding stage is tilted or bent by the scribe line LA1 formed by another machine. The shape of LA1. Therefore, there is no scribe line lai, L1 is in contact with each other' or because the interval d between the scribe line LA 1 and the scribe line l 1 is enlarged to make the dead zone (the area that does not contribute to the power generation between the scribe lines) As a result, it is possible to prevent the power generation efficiency of the thin film solar panel from being lowered. Further, since the laser irradiation head 73 is made of a light structure by reducing the contents, the tracking property and the responsiveness of the operation are excellent, and the precision is excellent. Further, the scribe line formed by the correction by the dummy line data D2 is not formed, for example, as shown in Fig. 6, and has a shape in which the self-engraving 绛L A1 [interval size error] is enlarged. Next, the glass substrate carrying out step §5〇〇 will be described with reference to Figs. 12 and 13 [S510 returns the glass substrate to the receiving position (t17 in Fig. 13)] 201032931 When the formation of the scribe line is completed, the linear motor 5 2 Y is based on Signal driven by control device 9 The holder group 51 is in the -Υ direction. Accordingly, the downstream glass substrate 移动 moves in the -Υ direction and returns to the receiving position Ρ7. When the glass substrate is moved in the -Υ direction, the downstream side is used. When the floating support by the stage 31 is moved to the floating support by the main platform 31 on the upstream side, the glass substrate Κ is supported by the air ejected from the sub-stage 32, so that even the recovery hole portion moves. It is also smooth and reliable. [S5 20 raises the ejector pin (t8, tl9 of Fig. 13)] Φ grips the gripper group 51 of the glass substrate — - returns to the receiving position ρ7, and the pole drive unit 42 is controlled by the control device The 9 transmitted signal rises in conjunction with the pin frame 41 to the floating surface position Ρ4. Accordingly, the ejector pin 43 is raised from the lower limit position Ρ2, and the tip end portion abuts against the bottom surface of the forehead portion Kf in the glass substrate Κ. At this stage, the glass substrate K is separated from the ejector pin 43 and the air branch by the holder 53. [S5 30 Opening the gripper (t20 of Fig. 13)] If the ejector pin 43 is raised and the tip end portion abuts against the bottom surface of the fore edge portion Kf of the glass substrate κ, each gripper 53 is transmitted by the control device 9. The signal of the wheel © opens the closed movable claw and releases the glass substrate κ. At this stage, the glass substrate is supported by the ejector pin 43 and the air. [S540 gripper group in the avoidance position (t2l of Fig. 13)] Each gripper 53 - releases the glass substrate κ, the signal transmitted by the gripper group 5 ι control device 9 is driven, • Η is moved by the holding position P5 In response to the avoidance position Ρ6β, the clamp 11 group is moved to the avoidance position Ρ6'. The frame drive unit 42 drives the lock frame 4i according to the signal transmitted from the control unit 9 at the root 29 201032931. According to this, the ejector pin 43 is raised from the floating surface position P4 to the upper limit position N in a state where the tip end portion abuts against the bottom surface of the forehead portion Kf in the glass substrate K. At this stage of the glass, the substrate κ is in a state of being completely raised by the floating surface position P4 and supported only by the ejector pin 43. [S560 gripper group is in the position to be avoided (seventh, ^5 in Fig. 13)] glass substrate Κ - becomes the upper limit position p. The linear motor 52 γ drives the gripper group 51 to + γ according to the signal transmitted from the control device 9. direction. According to this, the gripper group 51 is moved from the receiving position Ρ7 to the to-be-avoided position ρ8. Then, each gripper 53 closes the open movable pawl 0 according to the signal transmitted from the control device 9 [S570 transmits the glass substrate (t26, t27 of Fig. 13)] the gripper group 51 - moves to the to-be-avoided position 卩 8, the operator In the operation of moving in and out of the robot arm ίο, the glass substrate K supported only by the ejector pin 43 is transmitted to the bogie or the pallet by the laser scribing device j. Specifically, the arm a is first operated, and the suction hand 11 is disposed above the glass substrate supported by the ejection pin 43. © Next, the adsorption hand 11 is lowered to the height of the non-film formation surface in the glass substrate κ. Next, the adsorption target 1 is used to adsorb the plural portions of the non-composite surface of the glass substrate κ. Next, the arm 12 is operated to take the glass-phosphorus substrate κ adsorbed by the handcuff to the position of the trolley or the pallet. Then, the adsorption holding by the adsorption hand u is released, and the glass substrate K is manually carried out to the carriage or the pallet. The embodiments of the present invention have been described above, but the above-described embodiments are merely illustrative, and the scope of the present invention is not limited to the embodiments. The scope of the present invention is to be construed as being limited by the scope of the appended claims. That is, the structure, shape, size, material, number, and the like of the entire or a part of the laser scribing device 1 can be variously changed in accordance with the gist of the present invention. Further, in the present embodiment, the substrate processing apparatus is a laser scribing apparatus, and can be applied to an apparatus other than the laser scribing apparatus, for example, for exposing a film formed on a glass substrate. A device or the like for marking or cutting a glass substrate. Further, in the above-described embodiment, the position of the laser irradiation head 73 is corrected by the minute drive of the linear motor 74Y, and the operation of the scribe line LA1 is performed. The driving operation of all or a part of each of the medium moving portion 'and the linear motor 52Y in each direction may be driven on the side of the glass substrate K. Alternatively, the glass substrate K may be driven by using a current mirror (gaivan〇_mirr〇r) or the like. Further, although the laser scribing apparatus 1 is a device for forming the scribe lines L1, L2, ..., the amorphous ruthenium film K j 2 over the TC0 film K j ,, that is, the device for the second process ©, The metal film Kj3 formed on the amorphous germanium film Kj2 forms a scribe line, that is, the laser engraving for the third process can also be 0. [Simplified illustration] FIG. 1 is related to the present invention. An oblique view of the appearance of the laser scoring device. Fig. 2 is a plan view showing a main part of the laser scoring apparatus. Figure 3 is a front elevational view showing the main portion of the laser scoring device. 31 201032931 Figure 4 is an oblique view showing the street _ 宁射单疋.

圖5是龜+ $ A 觸不雷射刻劃裝置中的控制裝置與各種構成部 的連接之連接圖。 圖6是為了 說明本發明的主要部分之圖。 圖7是龜-_ 不頭驅動部及夾持器群驅動部的驅動方向的 關係之圈。 圖 8 是 JSs —.. 上v "不藉由雷射刻劃裝置形成有刻劃線的玻璃基 板K之三面圖。Fig. 5 is a connection diagram of the connection between the control device and the various components in the turtle + $ A touchless scoring device. Fig. 6 is a view for explaining the main part of the present invention. Fig. 7 is a circle showing the relationship between the driving direction of the turtle-_head drive unit and the gripper group drive unit. Figure 8 is a three-sided view of a glass substrate K on which JSs —.. is v" not formed by a laser scoring device.

圖9是+ A 眘不雷射刻劃裝置的基本動作的概要及倣元線 買料取得步赚Μ 的動作程序之流程圖。 圖10是顯;4 ·、不玻璃基板搬進步驟的動作程序之流程圖。 圖11是顯+ t "不刻劃步驟的動作程序之流程圖。 囷12是龜 ’、不玻璃基板搬出步驟的動作程序之流程圖。 圖13是 疋顯不雷射刻劃裝置的基本動作之時序圈。 圖1 4疋顯示刻劃動作之時序圖。 15 ®Fig. 9 is a flow chart showing the basic operation of the + A cautionary laser scoring apparatus and the operational procedure of the imitation element purchase. Fig. 10 is a flow chart showing the operation procedure of the step of carrying out the glass substrate. Figure 11 is a flow chart showing the action procedure of the + t " not scribing step.囷12 is a flow chart of the operation procedure of the turtle's and the glass substrate unloading step. Figure 13 is a timing circle showing the basic operation of the laserless scoring device. Figure 1 shows the timing diagram of the scribing action. 15 ®

G 疋說明為了製造薄膜太陽電池板的雷射圖案形成 製程之圏。 圏 16是顯示 不使用本發明形成的刻劃線的狀態之圈 【主要元件符號說明】 1:雷射刻劃裝置 2:機台 3 :浮起平台 4:升降機單元 32 201032931 5 :移送單元 6 :基板定位裝置 7:雷射單元 8:集塵單元 9 :控制裝置 10:搬進搬出機械手臂 11 :吸附手 12:臂 φ 1 3 :真空泵 1 4 :馬達 15:框體 1 6 :吸引墊 1 7 :操作 2 1 :台座部 22:門型框架 31 :主平台 © 32 :副平台 33:鼓風機單元 41 :銷框架 41 a :周圍框 41 b :中央框 42:框架驅動部 43 :頂出銷 51 :夾持器群 33 201032931 52:夾持器群驅動部 52Y、74X、74Y、76X:線性馬達 53:夹持器 61 :按壓滚子 6 2 :氣缸 71 :雷射振盪器 72:照射光學系統 73 :雷射照射頭 ⑩ 74:頭驅動部 76:盒子 77:攝影機 81 :托盤 8 2 :配管 83 :真空室 91:輸入/輸出裝置 92:記憶部(記憶手段) φ 93 ··運算處理部(算出手段) 95:硬碟裝置 9 6 :介面電路 311 :浮起單元 311h、321h:空氣喷出孔 321 :浮起單元 721 :機械式快門 722a~722h:反射鏡 34 201032931 723 :擴束器 724 :衰減器 7 31 :返回鏡 732:聚焦透鏡 733·.聚光鏡 735:雷射照射窗 b2 :雷射光 D1 :影像資料 φ D 2 :倣元線資料 K:玻璃基板G 疋 Describes the process of forming a laser pattern for the fabrication of thin film solar panels.圏16 is a circle showing a state in which the score line formed by the present invention is not used. [Main element symbol description] 1: Laser scribing device 2: Machine table 3: Floating platform 4: Elevator unit 32 201032931 5: Transfer unit 6 : Substrate positioning device 7 : Laser unit 8 : Dust collecting unit 9 : Control device 10 : Loading and unloading robot arm 11 : Adsorption hand 12 : Arm φ 1 3 : Vacuum pump 1 4 : Motor 15 : Frame 1 6 : Suction pad 1 7 : Operation 2 1 : pedestal portion 22 : portal frame 31 : main platform © 32 : sub-stage 33 : blower unit 41 : pin frame 41 a : peripheral frame 41 b : center frame 42 : frame drive portion 43 : ejection Pin 51: gripper group 33 201032931 52: gripper group drive unit 52Y, 74X, 74Y, 76X: linear motor 53: gripper 61: press roller 6 2 : cylinder 71: laser oscillator 72: irradiation Optical system 73: laser irradiation head 10 74: head driving unit 76: box 77: camera 81: tray 8 2: piping 83: vacuum chamber 91: input/output device 92: memory unit (memory means) φ 93 ·· Processing unit (calculation means) 95: hard disk device 9 6 : interface circuit 311 : floating unit 311h, 321h: air ejection hole 321 : floating Element 721: Mechanical shutters 722a-722h: Mirror 34 201032931 723: Beam expander 724: Attenuator 7 31: Return mirror 732: Focus lens 733. Condenser 735: Laser illumination window b2: Laser light D1: Image data φ D 2 : Imitation element line data K: glass substrate

Kf :玻璃基板K的額緣部 K j :電路形成用材料 Kjl:TC0 膜 K j 2 :非晶矽膜 K j 3 :金屬膜 L1 :第一條刻劃線 Q L Γ :刻劃線 L2:第二條刻劃線 L3 :第三條刻劃線 LAI、LA2 :刻劃線 P1 :上限位置 P2 :下限位置 P3:浮起面上方位置 P4:浮起面位置 35 201032931 P5:保持位置 P 6 :回避位置 P7:接受位置 P8:待避位置 P 9 :初始位置 P10 :終端位置Kf : front edge portion K j of glass substrate K : circuit forming material Kjl : TC0 film K j 2 : amorphous germanium film K j 3 : metal film L1 : first strip line QL Γ : scribe line L2: The second scribe line L3: the third scribe line LAI, LA2: scribe line P1: upper limit position P2: lower limit position P3: position above the floating surface P4: floating surface position 35 201032931 P5: holding position P 6 : Avoidance position P7: Accept position P8: Waiting position P 9 : Initial position P10 : Terminal position

Claims (1)

201032931 七、申請專利範圍: . 1、一種雷射加工方法,藉由相對驅動 基板加工形成規定的圖案,其特徵包含. . 以特定在前段的製程形成於基板的第 資料當作傲元線資料取得之倣元線資料取 根據倣7L線資料,相對驅動基板與雷 的製程雷射光所追蹤的轨跡成為仿照第一 狀並形成第二圖案之第二圖案形成步驟。 ® 2、如申請專利範圍第1項之雷射加工 基板於至少一方的面成膜有由複數層構成 料,在倣元線資料取得步驟中算出、記憶 電路形成用材料之第一圖案的倣元線資料 成步驟中根據倣元線資料,在第二層的電 成第二圖案。 3、 如申請專利範圍第1項或第2項之 其中該基板是由成旗有使用於薄膜太陽電 ⑩路形成用材料之玻璃基板構成,該雷射光 電路形成用材料的功率,被使用於製造薄 製程。 4、 種雷射加工裝置,藉由相對驅動 基板加工形成規定的圖案,其特徵包含: 以特定在前段的製程形成於基板的第 資料當作傲元線資料取得之倣元線資料取 根據倣元線資料,相對驅動基板與雷 基板與雷射光在 一圖案的形狀的 得步驟;以及 射光,俾在後段 圖案的形狀的形 方法,其中在該 的電路形成用材 形成於第一層的 ’在第二圖案形 路形成用材料形 雷射加工方法, 池板的製造的電 被調整成可刻劃 膜太陽電池板的 基板與雷射光在 一圖案的形狀的 得手段;以及 射光,俾在後段 37 201032931 的製程雷射光所追蹤的軌 的形狀的形 ’其争在該 路形成用材 層的電路形 手段得到的 段;記憶藉 二囷案形成 材料形成第 双為仿昭@ 狀並形成第二圖案之第二 …第一圖案 - r d, 萊形成手段。 5、如申請專利範園第4項 •基板於至少一方的面成臈有由複數M工裝置 料,倣元線資料取得手段 構成的電 成用材料的第-圖案之攝影手成於第- 于段,根撼由4¾. &A 的影像資料算出倣元線資料之算出: 段算出的倣元線資料之記憶手段第 ❹手段根據倣元線資料,在第二層的電路形成用 二圖案。 、如申請專利範圍第4項或第5項之雷射加工裝置, 其·中該基板是由成膜有使用於薄膜太陽電池板的製造的電 路形成用材料之玻璃基板構成包含照射可刻劃電路形成 用材料的雷射光之雷射照射頭被使用於製造薄膜太陽電 池板的製程。 38201032931 VII. Patent application scope: 1. A laser processing method, which forms a prescribed pattern by processing relative to a driving substrate, and its characteristics include: The data formed on the substrate in a specific front-end process is regarded as an Aoyuan line data. The obtained meta-line data is taken according to the imitation 7L line data, and the trajectory tracked by the laser light of the driving substrate and the lightning process becomes a second pattern forming step of patterning the first shape and forming the second pattern. ® 2. The laser processing substrate of the first application of the patent application is formed on a surface of at least one of the plurality of layers, and the first pattern of the memory circuit forming material is calculated in the step of obtaining the dummy line data. The meta-line data is formed into a second pattern in the second layer according to the imitation meta-line data. 3. In the first or second aspect of the patent application, wherein the substrate is composed of a glass substrate for forming a material for forming a thin film solar cell 10, and the power of the material for forming the laser optical circuit is used for Make a thin process. 4, a laser processing device, formed by a relative drive substrate to form a predetermined pattern, the characteristics of which include: the specific data formed on the substrate in the process of the front segment is taken as the material of the ray element line data obtained according to the imitation a line data, a step of driving the substrate and the lightning substrate in a shape of the laser light; and a method of illuminating the shape of the pattern in the rear stage, wherein the circuit forming material is formed on the first layer The second pattern-shaped road is formed by a material-shaped laser processing method, and the electricity of the manufacture of the pool plate is adjusted to a means for marking the substrate of the solar panel and the shape of the laser light in a pattern; and the light is emitted in the latter stage 37 The shape of the shape of the track tracked by the laser light of the process of 201032931 is the segment obtained by the circuit-shaped means for forming the material layer in the road; the memory is formed by the second case forming material to form the second pair and form the second The second pattern...the first pattern - rd, the means of formation. 5. If you apply for the fourth section of the patent garden, the substrate is formed on the surface of at least one of the first surface of the electroforming material composed of a plurality of M equipment materials and the imitation element data acquisition means. In the section, the calculation of the imitation meta-line data is calculated from the image data of 43⁄4. &A: The memory means of the imitation meta-line data calculated by the segment is based on the imitation meta-line data, and the circuit formation in the second layer is pattern. A laser processing apparatus according to the fourth or fifth aspect of the invention, wherein the substrate is formed of a glass substrate on which a circuit forming material for manufacturing a thin film solar cell is formed, comprising irradiation scribeable A laser irradiation head for laser light of a circuit forming material is used in a process for manufacturing a thin film solar panel. 38
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DE102011052444A1 (en) * 2011-08-05 2013-02-07 Jenoptik Automatisierungstechnik Gmbh Process for the linear structuring of a coated substrate for the production of thin-film solar cell modules
JP6019892B2 (en) 2012-07-30 2016-11-02 三星ダイヤモンド工業株式会社 Scribing apparatus and scribing method
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