201026902 六、發明說明： 【發明所屬之技術領域】 本發明係關於可供給排放電鑛液等之各種處理液之處理 液槽，尤其係關於具備可在短時間進行處理液之供給排 放，且具有可使垂直狀態之板狀工件不作升降地通過之工 件通過口之閘門裝置的處理液槽。 【先前技術】 在電鑛處理裝置等之處理液槽中，具備具有卫件通過口 之閘門裝置之情形時，該閘門裝置在工件不通過時係關閉 工件通過口，可進行向處理液槽内之處理液之填充，而在 工件通過時，則使工件通過口開啟。上述問門裝置之構造 係例如具備在水平方向上滑動自如之板狀之閘門構件，或 以左右對開形式在垂直轴周圍旋轉自如之一對板狀閘門構 件，藉由具有馬達及減速齒輪機構之機械性驅動機構，使 閘門構件啟閉驅動（專利文獻υ。 又，作為其他之啟閉方式之閘門裝置，其構成方式亦可 為：具備板狀閘門構件成上下方向滑動自如，且在上述閘 門構件上女裝浮子（浮具）’藉由處理液槽内之處理液之增 加，使閘門構件與浮子同時上升，從而關閉工件通過口 (專利文獻2)。 上述各閘門裝置由於均具有矩形狀之寬度較大之工件通 過口’並藉由驅動機構驅動一個或一對閘門構件而使工件 通過口整體啟閉之構造，故啟閉工件通過口需花費時間， 在連續處理多數工件之情形時，無法以短時間進行處理液 143926.doc 201026902 之供給排放’而使作業效率不佳。 相對於具有如上述之工件通過口及閉門裝置之處理液 槽’在專利文獻3中揭示有一種處理液槽，其係將 :口之：狀，形成為具有可供工件及保持工件之構件通過 的大致最小限度之面積的形狀。 專利文獻3之處.理液槽，如圖22❹，在電^槽_ 相槽15之間之槽壁82 ’或在箱槽15與空台Μ之間之槽㈣[Technical Field] The present invention relates to a treatment liquid tank which can supply various treatment liquids for discharging electric ore liquid, and the like, and particularly relates to supply and discharge of a treatment liquid which can be performed in a short time, and has The plate-shaped workpiece in the vertical state can be passed through the processing liquid tank of the gate device of the workpiece passing through the workpiece. [Prior Art] When a gate device having a passage of a guard is provided in a treatment tank of an electric ore processing device or the like, the gate device closes the passage of the workpiece when the workpiece does not pass, and can be moved into the treatment tank The filling of the treatment liquid, and when the workpiece passes, the workpiece is opened through the mouth. The structure of the door device is, for example, a shutter member that is slidable in a horizontal direction, or a plate-like shutter member that is rotatable around a vertical axis in a left-right split manner, and has a motor and a reduction gear mechanism. The mechanical drive mechanism opens and closes the shutter member (Patent Document 又. Further, as another gate device of the opening and closing method, the shutter device may be configured to have a plate-shaped shutter member that slides up and down in a vertical direction, and in the above-mentioned gate In the member, the float (floating) of the wearer closes the workpiece passage by raising the gate member and the float at the same time by the increase of the treatment liquid in the treatment tank (Patent Document 2). Each of the above gate devices has a rectangular shape. The workpiece having a larger width passes through the port and drives the one or a pair of shutter members to open and close the workpiece through the port. Therefore, it takes time to open and close the workpiece through the port, and in the case of continuously processing a plurality of workpieces It is impossible to carry out the discharge of the treatment liquid 143926.doc 201026902 in a short time, and the work efficiency is not good. There is a processing liquid tank having a workpiece passing port and a door closing device as described above. In Patent Document 3, there is disclosed a processing liquid tank which is formed in a shape of a mouth which is formed to have a substantially minimum passage for a workpiece and a member for holding the workpiece. The shape of the area of the limit. Patent Document 3, the liquid tank, as shown in Fig. 22, the groove wall 82' between the electric tank_phase groove 15, or the groove between the tank groove 15 and the empty table (4)
上’形成有工件通過口 88。各卫件通過〇88包含有最小限 度可供垂直狀態之工件通過之狹長寬度之狹縫狀開口部 湯’及可供支持I件上端部之保持構件通過之擴張開口 部88a。為啟閉狹縫狀開口部88b，而伸縮自如地具備有袋 狀彈性構件製之閘門構件(未圖示），藉此，可縮短處理液 之供給排放時間，且使閘門裝置關閉時之密封功能提高。 再者，形成上述擴張開口部88a之理由為以使工件之上端 沉入距電鍍液面（U)50 mm左右的方式浸潰工件，藉此而 防止電流集中於工件之上端部，從而防止電流集中所造成 之電鍍膜厚之不均一。 [專利文獻1]日本特開2004-99957號公報 [專利文獻2]曰本特開昭55-141558號公報 [專利文獻3]曰本特開2007-113066號公報 【發明内容】 [發明所欲解決之問題] 然而，如圖22(專利文獻3)所示，即使工件通過口 88包 含狹縫狀開口部88b與擴張開口部88a，在僅具備有啟閉狹 143926.doc 201026902 縫狀開口部88b之閘門構件之情形時，擴張開口部88a將總 疋開著，即使欲在處理液槽内收納期望量之處理液，處理 液也會從擴張開口部88a漏出，而難以長期保持特定量之 處理液。 例如，若在箱槽15與空台16之間之槽壁83上所形成之開 口 88之擴張開口部88a總是開著，則箱槽丨5在充滿時（以實 線表不之液面L1)，電鍍液將從箱槽15透過擴張開口部88a 漏出至空台16,且電鍍液勢必衝撞空台16之底面，而發生 氣泡。又，在粕槽1 5之排液時（以二點鏈線表示之液面 L2)，電鍍液會從電鍍液槽14透過槽壁“之擴張開口部“a 漏出至相槽15，電鍍液勢必衝撞於箱槽丨5之排液面並 發生氣泡。如此，一旦發生氣泡，氣泡將從各槽15、“溢 出而/亏染裝置周圍。又由於氣泡附於工件，故若工件搬 送至下個步驟，下個步驟之裝置會被氣泡污染。針對於 此，用以清潔工件或裝置之步驟及機構乃成為必要。 本發明之目的在於提供一種處理液槽，藉由使工件通過 口具有狹縫狀開口部及擴張開口 #，藉此，將卫件通過口 之開口面積限於必要最小限度，且即使為具有上述形狀之 牛I過之處理液槽，亦可以短時間且確實啟閉工件通 過口全體，且亦可維持工件通過口之密封性。 [解決問題之手段] 為解决上述問題，本發明之具備給液機構及排液機構且 在槽壁没置具有工件通過口之閘門裝置之處理液槽中，上 述工件通過π具有：可供垂直狀態之板狀卫件通過之於上 143926.doc 201026902The upper portion is formed with a workpiece passage opening 88. Each of the guard members includes a slit-shaped opening portion that has a narrow width for the workpiece passing through the vertical state, and an expansion opening portion 88a through which the holding member for supporting the upper end portion of the member passes. In order to open and close the slit-shaped opening portion 88b, a shutter member (not shown) made of a bag-shaped elastic member is provided in a telescopic manner, whereby the supply and discharge time of the processing liquid can be shortened, and the sealing device can be sealed when the shutter device is closed. Improved functionality. Further, the reason for forming the above-described expanded opening portion 88a is to impregnate the workpiece so that the upper end of the workpiece sinks about 50 mm from the plating liquid surface (U), thereby preventing current from being concentrated on the upper end portion of the workpiece, thereby preventing current The thickness of the plating film caused by the concentration is not uniform. [Patent Document 1] JP-A-2004-99957 [Patent Document 2] JP-A-55-141558 (Patent Document 3) JP-A-2007-113066A SUMMARY OF INVENTION [Invention] However, as shown in FIG. 22 (Patent Document 3), even if the workpiece passage opening 88 includes the slit-like opening portion 88b and the expansion opening portion 88a, only the opening and closing slit 143926.doc 201026902 slit-shaped opening portion is provided. In the case of the shutter member of 88b, the expansion opening portion 88a is always opened, and even if a desired amount of the treatment liquid is to be accommodated in the treatment liquid tank, the treatment liquid leaks from the expansion opening portion 88a, and it is difficult to maintain a certain amount for a long period of time. Treatment fluid. For example, if the expansion opening portion 88a of the opening 88 formed in the groove wall 83 between the tank groove 15 and the empty table 16 is always open, when the tank groove 5 is full (the liquid level is not indicated by the solid line) L1), the plating solution leaks from the tank 15 through the expansion opening portion 88a to the empty table 16, and the plating solution tends to collide with the bottom surface of the empty table 16 to generate bubbles. Further, when the liquid is drained from the gutter 15 (the liquid surface L2 indicated by the two-dot chain line), the plating solution leaks from the plating solution tank 14 through the expanded opening portion a of the groove wall to the phase groove 15, and the plating solution It is bound to collide with the drain surface of the tank tank 5 and bubble. In this way, once the air bubbles are generated, the air bubbles will overflow from the respective grooves 15 and around the dyeing device. Since the air bubbles are attached to the workpiece, if the workpiece is transported to the next step, the device in the next step will be contaminated by the air bubbles. Therefore, the steps and mechanisms for cleaning the workpiece or the device are necessary. It is an object of the present invention to provide a processing liquid tank which has a slit-like opening portion and an expansion opening # through the mouth of the workpiece, thereby The opening area of the passage opening is limited to the minimum necessary, and even if it is the treatment liquid tank having the above-described shape, the workpiece passage opening can be opened and closed for a short time, and the sealing property of the workpiece passage opening can be maintained. Means for Solving the Problem In order to solve the above problem, in the processing liquid tank of the present invention having the liquid supply mechanism and the liquid discharge mechanism and having no gate device having a workpiece passage opening in the groove wall, the workpiece passes through π and has a vertical state. The plate-shaped guards passed on 143926.doc 201026902
減的浮子升降，可使上述活動遮板在開啟位置與關閉位置 之間變更位置。 口之開口面積限制在 最小面積，故可抑制 (1)根據上述構成’由於可將工件通過口戈 可供工件及工件保持構件通過之大致最", 處理液從工件通過口漏出。 (2) 由於將狹縫狀開口部藉由在水平方向滑動或變形自如之 閘門構件而啟閉，並使擴張開口部藉由繞著水平旋轉轴自 由旋轉之活動遮板而啟閉，故可以短時間啟閉工件通過口 全體，而可使連續之工件處理作業之效率提高。即，由於 • 根據各開口部之形狀分別具備有滑動或變形式之閘門構件 或旋轉式之活動遮板，故可大為縮短工件通過口全體之啟 閉時間。 (3) 由於利用配置於處理液槽内之浮子而使活動遮板運作， 故無須具備活動遮板啟閉用之馬達等之特別之驅動機構， 從而可簡易化閘門裝置。 本發明在上述構成中，可以V字形形成上述擴張開口 根據上述構成，狹縫狀開口部及連接於其上方之擴張開 143926.doc 201026902 口部之形成作業較為簡單。 本發明在上述構成中，上述浮子可固著於活動遮板之旋 轉軸，從而可與活動遮板一體旋轉。 根據上述構成，可將浮子與活動遮板—體緊密地配置。 本發明在上述構成中，亦可代替旋轉式之浮子，而構造 成經由纽構件使浮子連接於活動遮板，並將上述索狀構 件從活動遮板延伸至下方，且經由反轉篩折回至上方，在 折回之上端部連接上述浮子。 根據上述構成，可在處理液槽内之期望位置配置浮 子。即’增加浮子佈局之靈活性。 【實施方式】 [第1實施形態] (電鑛裝置整體之概略） 圖1〜圖1G顯示具備本發明之處理液槽及驅動機構之電錢 裝置。圖1係電鍍裝置整體之平面圖，在以大致橢圓形狀 所構成之電鍍處理線’從處理線之長度方向之一端部(圖ι 之右端部）之裝載部10,於箭頭F方向（順時鐘旋轉方向）依 次具備有前處理步驟之前處理槽（淋浴槽、空台Μ、箱 槽13、電鍍步驟之電鍍槽14、後處理步驟之箱槽二、空台 16、第m處理槽（淋浴槽）17、長度方向之另一端部之第2 後處理槽（回收槽）18、卸載部19、_步驟（吊具返回步 驟）之空台20、箱槽21、剝離槽22、箱槽23、$台24及剝 離後處理槽（淋浴室）25。在浸潰處理槽之電鍍㈣及剝離 槽22之工件搬送方向之前後，分別毗連有箱槽13、15、 143926.doc -8 - 201026902 21、23，箱槽13、21之出口兼有電鍍槽14及剝離槽22之入 口，而箱槽15、23之入口兼有電鍍槽14及剝離槽22之出 口 ° 在上述電鍍處理線之内周側以橢圓形狀敷設有導軌27 , 在該導軌27以軌道長度方向可移動而支持有複數之搬送吊 具28。 在導軌27之内周側’為使搬送吊具28在水平方向移動， ❿ 配置有複數之獨立的搬送裝置31、32...40 ^該搬送裝置 31、32、…40中，在與各箱槽13、15、21、23對應之位 置’分別配設有直線加速器型往復動式之採集搬送裝置 31、32、33、34。在與前處理步驟之前處理槽u及空台12 對應之位置、與電鐘槽14對應之位置、與後處理步驟之空 台16及第1後處理槽17對應之位置、與剝離步驟之空台2〇 對應之位置、與剝離槽22對應之位置、及與空台24及剝離 後處理槽25對應之位置，分別配設有鏈條輸送機型之連續 參 搬送裝置35、36、37、38、39、4〇。又，從後處理步驟之 第1後處理槽17經由第2後處理槽18至卸載部19之間，與從 剝離後處理槽25經由裝載部10至前處理槽n之間，配置有 未圖示之推動搬送吊具之推進裝置。在圖丨中，以雙重線 箭頭所表示之各區間A1〜A6.顯示利用鏈條輸送機型之連 續搬送裝置35、36、37、38、39、40之搬送區間，而以虛 線箭頭所表示之各區間B1~B4係顯示利用直線加速器型之 採集搬送裝置31、32、33、34之搬送區間，而以實線箭頭 所表示之區間C1、C2、C3、C4係顯示利用推進裝置之搬 143926.doc 201026902 送區間。 圖2係圖1之電鍍槽14、後處理步驟之箱槽15、空台16及 第1後處理槽17之縱剖面放大簡圖，該等電鑛槽】*、箱槽 15、空台16及第1後處理槽17被設置於一定高度之架台42 上’而架台42内配置有預備槽43。在箱槽15之上方，透過 未圖示之架台’配設有特定容積之圓柱槽（給液機構）47。 在箱槽之15之底壁，設置有可啟閉之排出口栓（排液機 構）46，在該排出口栓46，設置有用於啟閉驅動該排出口 栓46之操作部46 a。在預備槽43與圓柱槽47之間配設配管 48，在該配管48，設置有用於從預備槽43向圓柱槽叨導入 電鍍液（處理液）之系49及過滤器50。圓柱槽47之底部，可 啟閉地設置有可從上方供給處理液至箱槽〗5之排出口栓 51 ° 在預備槽43與電鍵槽14之間並設有2個配管55、56，任 一配管55、56皆設置有泵y、59及過濾器58、60，用以從 預備槽43向電鍍槽14供給電鍍液。其中一者之配管55係在 箱槽15之閘門啟閉時，用於將電鍍槽14之液面維持於特定 高度者，另一者之配管56則用於電鍍液循環。又，在空台 16之底部設置有用於向預備槽43排出電鍍液之排出管料， 再者，在電鍍槽14，亦設置有用於將溢流之電鍍液排出至 預備槽43之溢流管61。 (搬送吊具） 圖3係搬送吊具28之圖剖面放大圖，搬送吊具 28包含有在上述導軌27支持導軌長方向移動自如之移動基 143926.doc •10· 201026902 台63、從該移動基台63水平延伸至與導軌27大致直角方向 之臂部64、及從該臂部64之前端部延伸至下方之工件书持 部65,在工件吊持部65之下端部，設置有吊持⑽及央具 67。將工件（例如電路用基板）w之上端部之扣合孔扣合於 •上述吊持銷66,並藉由夾具π使其保持不脫落。所吊持之 王件W透過吊持部65及雖未圖示但適宜之導電機構，電力 連接於導軌27後，從導軌27供給電力。在移動基台63之上 • 面，固著有在與臂部64成相反方向水平延伸之支軸70，該 支軸70以使鏈輪71透過單向離合器72僅向一個方向旋轉的 方式而予以支持。具體而言，在圖2中，上述鍵輪71以在 箭頭R方向旋轉，但不在箭頭尺反方向旋轉的方式而構 成。 (搬送裝置） 在圖2中，鏈條輸送機型之連續搬送裝置36、37係由驅 動鏈輪73、從動鏈輪74、及在兩鏈輪73、74之間所捲繞之 〇 搬送鏈條75(圖3)所構成，在搬送鏈條75之上側行駛部份， 上述搬送吊具28之鍵輪71為扣合之狀態。搬送吊具28如上 所述，具備有單向離合器72(圖3)，藉此，以扣合於搬送鏈 條7 5的狀態，使其與搬送鏈條7 5之上側部份同時向圖2之 箭頭F方向移動。 在圖2中，直線加速器型之採集搬送裝置32，係構成為 在與導軌27以並行而配置之引導部％上，以與導軌27平行 移動地支持滑件77，該滑件77藉由雖未圖示但具備於引導 部76之螺紋推進機構及伺服馬達等，使引導部76往復移 143926.doc -11 · 201026902 動。 圖4係圖2之IV-IV截面放大圖’在上述滑件77上，固著 有向搬送吊具28侧大致水平延伸之支軸78，而該支軸78支 持有在下方延伸之採集爪79嗖其可繞著支軸78旋轉。上述 採集爪79藉由未圖示之阻擋器，在圖2所示之狀態，從箭 頭S反方向扣止，而從箭頭F反方向側扣合於搬送吊具“之 支轴70,並向滑件77之箭頭F方向移動，藉此，透過採集 爪79，而使搬送吊具28朝箭頭F方向移動。再者，滑件π 相對於搬送吊具28於箭頭F反方向側移動時，可使採集爪 79在箭頭S方向旋轉並跨過擬送吊具28之支軸78。 (電鍍槽及其前後之箱槽13、15等之構造） 圖5係電鍍槽14與其前後之箱槽13、15及空台12 ' “之 縱剖面概略圖，圖6係後處理步驟之箱槽15之放大平面 圖，圖7係圖6之W-W剖面啟大圖，圖8係圖7之平面圖， 圖9係顯示開啟狀態之閘門裝置之作用說明圖，圖ι〇係顯 示關閉狀態之閘門裝置之作用說明圖。再者，在方便說明 之基礎上，將與工件搬送方向F正交之水平方向，如圖7從 搬送方向F侧看之方向作為「左右方向」，而作以下說明。 在圖6中’後處理步驟之箱槽15，在與箭頭f方向正交之 方向隔以特定之間隔，配置左右一對箱部15a，在左右箱 部15a間使工件W通過。藉由具備箱部…，使向箱槽_ 供給之液量變少，從而可減少啟閉間門裝置料時之電鑛液 之變動，且可縮短向箱槽15所供給之電鑛液之排出時間。 在電鍵槽！4與後處理用之箱槽15之間之縱壁^，設置 143926.doc •12· 201026902 有僅具滑動式之閘門構件93之閉門裝置84，在箱㈣與空 台16之間之縱壁83上，按照本發明，設置有㈣m 門構件93與浮子式活動遮板150之閘門裝置85。又，在配 置於圖5之電鍍槽14之搬送上游側之前處理用之箱槽Η與 ‘ t賴u之間及_13與以12之間，亦可分別設置有與 -後處理用同樣之閘門裝置84、85。 (閘門裝置85) • 說月後處理用之粕槽1 5與電鑛槽14之間之閘門裝置8 5之 構造。在圖7中，在縱壁83之左右寬之中央部，形成打字 狀之閘門裝置t裝用凹部89，在該凹部89，透過橡勝管製 襯墊90,安裝有閘門裝置85。該閘門裝置85在左右寬之中 央部具有工件通過口 88 ^該工件通過口 88係由在上下方向 延伸之狹縫狀開口部88b，及形成於該狹縫狀開口部88b之 上端且向上擴大之v字狀之擴張開口部88a所構成。狹縫狀 開口部88b之左右寬度比板狀工件霤之厚度大，v字狀開口 • 部88&為可供搬送吊具28之吊持部65及夾具67通過之大 小。作為閘門構件92、93之材料，宜選擇例如耐蝕性及耐 久性強之樹脂等》 形成上述V字狀之擴張開口部8 8 a之理由在先前技術之說 明項已有說明，其係以使工件w之上端沉降至距電鍍液面 等50 mm左右的方式，浸潰工件w，藉此，防止電流集中 於工件W之上端部，從而防止因電流集中所造成之電鍍膜 厚之不均一化。因此，把持工件W之上端部之夾具67之下 端部份亦有必要以浸潰於電鍍液之狀態而搬送，為夾具67 143926.doc -13· 201026902 通過用而形成有上述擴張開口部88a。 閘門裝置85具備有縱長U字狀之閘門裝置本體91;固定 於該U字狀閘門裝置本體91之左側柱部91 a之阻擋構件92 ; 為啟閉狹縫狀開口部88b並支持在閘門裝置本體91之右側 柱部91b於左右方向移動自如之上述可動閘門構件93 ;具 有用以移動該可動閘門構件93之第1及第2管體構件101、 102之驅動機構94 ;具備為啟閉擴張開口部88a而繞著水平 之旋轉軸152旋轉自如之上述浮子式活動遮板15〇 ;及為使 該浮子式活動遮板1 50運作之浮子15 1。 在圖8中，阻擋構件92之前端部，在上下方向之大致全 長上，安裝有襯墊108。而閘門裝置本體91之右侧柱部91b 上，在工件搬送方向F侧之面上，固定有引導上述可動閘 門構件93滑動自如之導板11〇，在與導板11〇之工件搬送方 向F側成相反側之面，配置有用以收納上述第丨及第2管體 構件101、1〇2之L字形之導箱1U。 在由上述導板110、導箱111、及右側柱部91b之右面所 圍成之管體收納室内，左右方向移動自如地收納有水平剖 面矩形狀之滑動部93a，在該滑動構件93a之左側之空間 部，收納有上述第丄管體構件1〇1，而在右側之空間部收^ 有上述第2管體構件102。#管體構件⑻、1〇2為具彈性之 橡膠製管體，#由在内部壓入空氣使其膨脹，並藉由排出 内部之空氣而使其收縮。 上述滑動部93a與從管體收納室於左方突出之上述可動 閘門構件93 -體成形，藉此，可使可動閘門％與滑動部 143926.doc 201026902 93a—體地在左右方向移動。 在圖7中，兩管體構件101、102之下端部總是以密封狀 態而閉塞，兩管體構件101、102之上端部分別連接於金屬 製或樹脂製之接頭管m、m。兩接頭管^、m透過空 氣官連接於空氣轉換閥130，在該空氣轉換閥13〇，連接有 壓縮機等之壓縮空氣供給源〗3 2，且設置有空氣排出部 133。該空氣轉換閥131，係在於第丨管體構件ι〇ι中供給壓 Φ 縮空氣使第1管體構件101膨脹，且將第2管體構件 102内之 空氣排出使第2管體構件1 〇2收縮之狀態，與於第2管體構 件102供給壓縮空氣使第2管體構件1〇2膨脹，且將第1管體 構件101内之空氣排出使第丨管體構件1〇1收縮之狀態之間 自由轉換。 在第1管體構件101中壓入空氣使其膨脹，從第2管體構 件1 02將空氣排出使其收縮，藉此，使滑動部a及可動閘 門構件93—體在開啟方向（右方向）移動，從而可開啟工件 Φ 通過口 88。另一方面，在第2管體構件102中壓入空氣使其 膨脹，從第1管體構件101將空氣排出使其收縮，藉此，使 滑動部93a及可動閘門93 —體在關閉方向（左方向）移動，從 而可關閉工件通過口 88。在該關閉狀態，可動閘門構件93 之端緣壓接於阻播構件92之襯塾1〇8。 (浮子式活動遮板15 〇之詳細構造） 在圖8中，在閘門裝置本體91之左側柱部9U上，旋轉自 如地支持有在工件搬送方向F延伸之旋轉軸152，該旋轉軸 152之兩端部分別突出於空台16與箱槽15。在旋轉軸152之 143926.doc -15- 201026902 空台16側之突出端部，一體固著有活動遮板15〇,在旋轉 轴152之箱槽15側之突出端部，一體固著有中空狀之浮子 151 ’藉此，活動遮板15〇與浮子151將繞著旋轉軸ι52之軸 怎一體地旋轉。活動遮板150例如可為氣乙烯樹脂，且不 折不扣為板狀之構件，另一方面，浮子15丨例如可為聚丙 烯，藉由以中空狀形成，而可在處理液内產生特定值以上 大小之浮力。 在圖1 0中，活動遮板丨50之構成方式為在關閉狀態，形 成為左右較長之大致矩形狀，且左右寬之大致中央部之下 端附近固著於上述旋轉軸152，將旋轉軸152作為旋轉轴 芯’使圖10之順時針方向之關閉方向B1之力矩，與逆時針 方向之開啟方向B1之力矩大致相等，或開啟方向B2之力 矩略大。活動遮板150之左端緣以一直線狀而形成，而右 端緣成為使距離上端大致1/3之上側部份150a抵接於在關 閉位置中之導板110之擴張開口部88a之右斜面n0a之傾斜 面，中間部份150b成為抵接於導板110之垂直之端面110b 之垂直面，且距離下端大致1/3之下側部份150c成為與上 述上側部份15 0 a同方向傾斜之傾斜面。即，活動遮板15 〇 藉由至少上側部份150a抵接於擴張開口部88a之右斜面 1 l〇a ’成為以關閉位置被扣止。 浮子1 5 1以相對於旋轉轴1 52在左側延伸的方式被固著， 藉由浮子151之自身重量，對於活動遮板150，賦予開啟方 向B2之力矩。即，浮子15 1無懸浮力時，藉由大概浮子15 i 之重量，將使活動遮板150在開啟方向B2旋轉。活動遮板 143926.doc •16- 201026902 150係藉由例如設置於閘門裝置本體91之阻擋器μ〗，以如 圖9所示之開啟狀態而被扣止。 (運作） 電鑛處理步驟及其後之吊具之剝離步驟等，由於歷來眾 所周知，故以簡單而說明之。在圖U，以裝載部1〇將電 鐘處理前之工件W吊持於搬送吊具28，藉由推進裝置將搬 送吊具28及工件W搬送至前處理㈣内，並使搬送吊具28 之鍵輪71扣合於前處理槽11之連續搬送裝置35之搬送鏈條 7 5之始端部。 從上述連續搬送裝置35朝箭頭F方向依次藉由採集搬送 裝置3!、連續搬送裝置36、採集搬送裝置32及連續搬送裝 而移動搬送节具28 ’藉此’工件W通過前處理槽u、 空台12、箱槽13、電錄槽14、箱槽i5、空台i6及第i後處 理槽17 ’或在特定之處理位置停止特定時間，並進行前處 電鍍處理及清潔等之後處理。電鍍處理完成後之工 • # ’藉由未圖示之推進裝置，透過第2後處理槽18搬送至 卸載°P19，從搬送吊具28拆卸電鑛處理後之工件w。 將件W卸下後之搬送吊具28接著在剝離步驟之空台2〇 連續搬送裝置38之鏈條輸送機75上扣合鏈輪71，從該連 送裝置38朝箭頭F方向依次藉由採集搬送裝置33、連 送裝置39、採集搬送裝置34及連續搬送裝置40而使其 移動剝離吸附物，清潔’並再次返回至裝載部10。 兩上述電鍍處理中，將工件w例如從空台12經由箱槽Η 在包鑛槽U水平移動時，及從電鑛槽14經由箱槽15在空台 143926.doc 17 201026902 16水平移動時，各閘門裝置84、85分別開啟，藉此，工件 W不作上升動作而通過工件通過口 88等。若工件w通過工 件通過口 88等之後，則關閉各閘門裝置84、85之工件通過 口 88等。 。 (閘門裝置8 5之啟閉運作之詳細說明） ()圖5係如上所述，簡單顯示有將工件w從空台a經由箱 槽13移動至電鑛槽14之步驟，及從電鍵槽⑽由箱槽^移 動至空台16之步驟。在電鐘槽14，電錄液總是保持在大致 =滿狀態’ S台12、16總是藉由排出電鍍液，而保持在略⑩ 空狀態。箱槽13、15在：於電鑛槽14之間移動時，藉 由從圓柱槽47等以短時間供給電鍍液，而保持與電鍍槽14 大致相同之充滿狀態，工件貿在各箱槽13、15與各空台 12、16之間移動時，藉由開啟排出口栓46 ,以短時間排液 至略空狀態。 (2) 箱槽13、15在如上述之電鍍液為充滿之情形時，電鍍槽 14與箱槽15之間之間門裝置料開啟，呈可供工件w通過之 狀態’另一方φ，箱槽13、15與空台12、16之間之問門裝❹ 置85則關閉。相反的’箱槽13、15從充滿狀態成為空狀態 之情形時，電鍍槽14與箱槽13、15之間之閘門裝置討關 閉，另一方面，箱槽13、15開啟排出口栓46，且亦開啟空 〇 12、16之間之閘門裝置85，從而將電鍍液排出。 (3) 詳細說明在後處理用之箱槽15從空狀態成為充滿狀態之 =程的閘門裝置95之運作。在圖9中，箱槽15内為空之狀 I時，可動閘門構件93移動至開啟位置，藉此工件通過口 143926.doc -18- 201026902 活動遮板150旋轉至開啟 88之狭縫狀開口部88b開啟，又， 位置，藉此擴張開口部88a亦開啟The reduced float lift allows the movable shutter to change position between the open position and the closed position. Since the opening area of the opening is limited to the minimum area, it is possible to suppress (1) according to the above configuration, the processing liquid can be leaked from the workpiece through port because the workpiece can be passed through the mouth and the workpiece holding member can pass. (2) The slit-shaped opening portion is opened and closed by a shutter member that slides or deforms in a horizontal direction, and the expansion opening portion is opened and closed by a movable shutter that is freely rotatable about a horizontal rotating shaft. The workpiece passing through the port is opened and closed in a short time, and the efficiency of the continuous workpiece processing operation can be improved. In other words, since the sliding member or the rotary movable shutter is provided in accordance with the shape of each opening, the opening and closing time of the entire passage of the workpiece can be greatly shortened. (3) Since the movable shutter is operated by the float disposed in the processing liquid tank, it is not necessary to provide a special driving mechanism such as a motor for opening and closing the movable shutter, and the shutter device can be simplified. In the above configuration, the expansion opening can be formed in a V shape. According to the above configuration, the slit-shaped opening portion and the expansion opening 143926.doc 201026902 connected thereto are relatively simple. In the above configuration, the float can be fixed to the rotating shaft of the movable shutter so as to be rotatable integrally with the movable shutter. According to the above configuration, the float and the movable shutter can be closely arranged. In the above configuration, the present invention may be configured to connect the float to the movable shutter via the button member, and extend the cable member from the movable shutter to the lower side, and return to the upper portion via the reverse screen. Fang, the above float is connected at the upper end of the fold back. According to the above configuration, the float can be disposed at a desired position in the processing liquid tank. That is to increase the flexibility of the float layout. [Embodiment] [First Embodiment] (Overview of the entire electro-mineral apparatus) Figs. 1 to 1G show a money-sending apparatus including the treatment liquid tank and the drive mechanism of the present invention. Fig. 1 is a plan view of the entire plating apparatus, in a direction of an arrow F direction (clockwise rotation) in a loading portion 10 of a plating process line 'having a substantially elliptical shape from one end of the length direction of the processing line (the right end portion of Fig. 1) The direction) is provided with a treatment tank (the shower tank, the empty table, the tank 13, the plating tank 14 of the plating step, the tank 2 of the post-processing step, the empty stage 16, the mth treatment tank (shower tank)) 17. The second post-treatment tank (recovery tank) 18 at the other end in the longitudinal direction, the unloading unit 19, the step (the spreader returning step), the empty table 20, the tank 21, the stripping tank 22, the tank 23, and the The table 24 and the post-peeling treatment tank (shower chamber) 25. After the plating (4) of the impregnation treatment tank and the workpiece conveyance direction of the separation tank 22, the tanks 13 , 15 , 143926.doc -8 - 201026902 21 are respectively adjacent. 23, the outlets of the tanks 13, 21 have both the plating tank 14 and the inlet of the stripping tank 22, and the inlets of the tanks 15, 23 have both the plating tank 14 and the outlet of the stripping tank 22 on the inner circumference side of the plating line A guide rail 27 is laid in an elliptical shape, and the guide rail 27 is in the length of the track A plurality of transport spreaders 28 are movably supported. On the inner peripheral side of the guide rail 27, in order to move the transport spreader 28 in the horizontal direction, a plurality of independent transporting devices 31, 32, ... 40 are disposed. In the devices 31, 32, ... 40, the linear accelerator type reciprocating collecting and conveying devices 31, 32, 33, and 34 are disposed at positions corresponding to the respective tanks 13, 15, 21, and 23, respectively. Before the processing step, the position corresponding to the processing tank u and the empty table 12, the position corresponding to the electric clock slot 14, the position corresponding to the empty stage 16 and the first post-processing tank 17 of the post-processing step, and the empty table of the peeling step 2〇 Corresponding positions, positions corresponding to the peeling grooves 22, and positions corresponding to the empty table 24 and the peeling post-treatment groove 25 are respectively provided with chain conveyor type continuous ginseng transfer devices 35, 36, 37, 38, 39, Further, the first post-treatment tank 17 from the post-treatment step is disposed between the second post-treatment tank 18 and the unloading portion 19, and between the post-peel processing tank 25 and the pre-treatment tank n. There is a propulsion device that pushes the spreader (not shown). In the picture, the double line arrow In each of the sections A1 to A6 shown, the transport sections of the continuous transport apparatuses 35, 36, 37, 38, 39, and 40 using the chain conveyor type are displayed, and the sections B1 to B4 indicated by the dotted arrows are used to display the use straight line. In the transport sections of the accumulator-type collection and transport devices 31, 32, 33, and 34, the sections C1, C2, C3, and C4 indicated by the solid arrows indicate the transfer section by the pusher 143926.doc 201026902. FIG. 1 is an enlarged schematic cross-sectional view of the plating tank 14 , the tank groove 15 of the post-processing step, the empty table 16 and the first post-treatment tank 17 , the electric tanks *, the tanks 15 , the empty tables 16 and the first The post-treatment tank 17 is placed on the gantry 42 of a certain height, and the preliminary tank 43 is disposed in the gantry 42. Above the tank 15, a cylindrical tank (liquid supply mechanism) 47 of a specific volume is disposed through a gantry (not shown). The bottom wall of the tank 15 is provided with an openable and closable discharge port plug (discharge mechanism) 46, and the discharge port plug 46 is provided with an operation portion 46a for opening and closing the discharge port plug 46. A pipe 48 is disposed between the preliminary tank 43 and the cylindrical groove 47. The pipe 48 is provided with a system 49 for introducing a plating liquid (treatment liquid) from the preliminary tank 43 into the cylindrical groove, and a filter 50. The bottom of the cylindrical groove 47 is provided with a discharge port 51 that can supply the treatment liquid from above to the tank slot 5, and is provided with two pipes 55 and 56 between the preliminary tank 43 and the key groove 14. Each of the pipes 55, 56 is provided with pumps y, 59 and filters 58, 60 for supplying plating solution from the preliminary tank 43 to the plating tank 14. One of the pipes 55 is used to maintain the liquid level of the plating tank 14 at a specific height when the gate of the tank 15 is opened and closed, and the other piping 56 is used for the plating liquid circulation. Further, a discharge pipe for discharging the plating solution to the preliminary tank 43 is provided at the bottom of the empty table 16, and further, an overflow pipe for discharging the overflow plating solution to the preliminary tank 43 is provided in the plating tank 14. 61. (Transporting spreader) Fig. 3 is an enlarged cross-sectional view of the transport spreader 28, and the transport spreader 28 includes a movable base 143926.doc •10· 201026902 table 63 in which the guide rail 27 supports the guide rail in the longitudinal direction. The base 63 extends horizontally to the arm portion 64 substantially perpendicular to the guide rail 27, and the workpiece holding portion 65 extending from the front end portion of the arm portion 64 to the lower portion, and is provided at the lower end portion of the workpiece holding portion 65. (10) and the central device 67. The engaging hole at the upper end of the workpiece (for example, the circuit board) w is fastened to the above-mentioned hanging pin 66, and is kept from falling off by the jig π. The suspended king piece W is electrically connected to the guide rail 27 through the hanging portion 65 and a suitable conductive mechanism (not shown), and then supplies electric power from the guide rail 27. On the surface of the moving base 63, a support shaft 70 extending horizontally opposite to the arm portion 64 is fixed, and the support shaft 70 is rotated in one direction by the sprocket 71 through the one-way clutch 72. Support. Specifically, in Fig. 2, the key wheel 71 is rotated in the direction of the arrow R, but is not rotated in the opposite direction of the arrow ruler. (Transporting device) In FIG. 2, the chain conveyor type continuous conveying devices 36 and 37 are driven by a drive sprocket 73, a driven sprocket 74, and a sprocket chain that is wound between the sprocket wheels 73 and 74. 75 (Fig. 3), in the traveling portion above the transport chain 75, the key wheel 71 of the transport spreader 28 is in a state of being engaged. As described above, the transport spreader 28 includes the one-way clutch 72 (FIG. 3), and is attached to the upper side of the transport chain 75 to the arrow of FIG. 2 in a state of being engaged with the transport chain 75. Move in the F direction. In FIG. 2, the linear accelerator type collecting and conveying device 32 is configured to support the slider 77 in parallel with the guide rail 27 in the guide portion % disposed in parallel with the guide rail 27, and the slider 77 is used by The screw advancement mechanism, the servo motor, and the like provided in the guide portion 76 are not shown, and the guide portion 76 is moved back and forth by 143926.doc -11 · 201026902. Figure 4 is an enlarged cross-sectional view taken along line IV-IV of Figure 2, in which a support shaft 78 extending substantially horizontally toward the side of the transfer spreader 28 is fixed, and the support shaft 78 supports a gripping claw extending downward. 79嗖 it can rotate about the support shaft 78. The collecting claw 79 is buckled in the opposite direction from the arrow S in the state shown in FIG. 2 by the stopper (not shown), and is engaged with the support shaft 70 of the conveying spreader from the opposite side of the arrow F, and When the slider 77 moves in the direction of the arrow F, the transporting claws 28 are moved in the direction of the arrow F through the collecting claws 79. Further, when the slider π is moved in the opposite direction to the arrow F with respect to the conveying spreader 28, The collecting claw 79 can be rotated in the direction of the arrow S and straddles the support shaft 78 of the intended spreader 28. (The plating tank and the structure of the front and rear tanks 13, 15 and the like) FIG. 5 is the plating tank 14 and the tank grooves before and after it. 13, 15 and empty table 12'" longitudinal sectional view, Fig. 6 is an enlarged plan view of the box 15 of the post-processing step, Fig. 7 is a WW cross-sectional view of Fig. 6, and Fig. 8 is a plan view of Fig. 7, The function diagram of the gate device showing the open state is shown in Fig. 9, and the action diagram of the shutter device in the closed state is shown. In addition, in the horizontal direction orthogonal to the workpiece conveyance direction F, the direction seen from the side of the conveyance direction F in Fig. 7 is referred to as "left-right direction", and will be described below. In the tank groove 15 of the 'post-processing step' in Fig. 6, a pair of right and left tank portions 15a are disposed at a predetermined interval in a direction orthogonal to the direction of the arrow f, and the workpiece W is passed between the right and left tank portions 15a. By providing the tank portion, the amount of liquid supplied to the tank tank _ is reduced, so that the fluctuation of the electric ore liquid at the time of opening and closing the door device material can be reduced, and the discharge of the electric mineral liquid supplied to the tank tank 15 can be shortened. time. In the key slot! 4 and the vertical wall ^ between the tank 15 for post-processing, set 143926.doc • 12· 201026902 There is a sliding device 84 with only sliding gate member 93, the vertical wall between the box (four) and the empty table 16 In accordance with the present invention, a gate device 85 of a (four) m-door member 93 and a float-type shutter 150 is provided. Further, in the case where the processing tank is disposed on the upstream side of the plating tank 14 of FIG. 5, and between the tanks ' and _13 and 12, the same can be used for the post-processing. Gate devices 84, 85. (Gate device 85) • The structure of the gate device 85 between the gutter 1 5 for processing after the month and the electric ore tank 14. In Fig. 7, in the center portion of the left and right widths of the vertical wall 83, a gate-shaped gate device t-mounting recess 89 is formed, and the gate portion 85 is attached to the recessed portion 89 through the rubber control pad 90. The shutter device 85 has a workpiece passage opening 88 at a center portion of the right and left widths. The workpiece passage opening 88 is formed in a slit-like opening portion 88b extending in the vertical direction, and is formed at an upper end of the slit-shaped opening portion 88b and enlarged upward. The v-shaped expanded opening portion 88a is formed. The left-right width of the slit-like opening portion 88b is larger than the thickness of the plate-like workpiece slip, and the v-shaped opening portion 88 & is the size through which the hanging portion 65 and the jig 67 for transporting the spreader 28 pass. As the material of the shutter members 92 and 93, for example, a resin having high corrosion resistance and durability is preferably selected. The reason for forming the V-shaped expanded opening portion 8 8 a has been described in the description of the prior art. The upper end of the workpiece w is settled to a distance of about 50 mm from the plating liquid surface, and the workpiece w is immersed, thereby preventing current from being concentrated on the upper end portion of the workpiece W, thereby preventing uneven thickness of the plating film due to current concentration. . Therefore, the lower end portion of the jig 67 holding the upper end portion of the workpiece W is also required to be conveyed in a state of being immersed in the plating solution, and the above-described expanded opening portion 88a is formed by the jig 67 143926.doc -13· 201026902. The shutter device 85 includes a gate device body 91 having a vertically long U shape; a blocking member 92 fixed to the left column portion 91a of the U-shaped gate device body 91; and opening and closing the slit-like opening portion 88b and supporting the gate The movable door member 93 of the right side column portion 91b of the apparatus main body 91 is movable in the left-right direction, and has a driving mechanism 94 for moving the first and second pipe members 101 and 102 of the movable shutter member 93. The float type movable shutter 15 is rotatably rotated around the horizontal rotating shaft 152, and the float 15 1 for operating the float type movable shutter 150. In Fig. 8, a pad 108 is attached to the front end portion of the blocking member 92 at substantially the entire length in the up and down direction. On the right side column portion 91b of the shutter device main body 91, a guide plate 11 that guides the movable shutter member 93 to slide freely is fixed on the surface on the side of the workpiece conveying direction F, and the workpiece conveyance direction F with the guide plate 11 is fixed. The guide case 1U for accommodating the above-described second and second tubular members 101 and 1〇2 is disposed on the side opposite to the side. In the tubular body storage chamber surrounded by the guide plate 110, the guide box 111, and the right side of the right column portion 91b, a horizontally-shaped rectangular sliding portion 93a is movably accommodated in the left-right direction, and is disposed on the left side of the sliding member 93a. The space portion accommodates the second tubular member 1〇1, and the second tubular member 102 is received in the space portion on the right side. The pipe body members (8) and 1〇2 are elastic rubber pipes, and # is inflated by air inside, and is contracted by discharging the air inside. The sliding portion 93a is formed integrally with the movable shutter member 93 projecting from the tubular housing chamber to the left side, whereby the movable shutter % and the sliding portion 143926.doc 201026902 93a can be moved in the left-right direction. In Fig. 7, the lower end portions of the two tubular members 101, 102 are always closed in a sealed state, and the upper ends of the two tubular members 101, 102 are respectively connected to metal or resin joint pipes m, m. The two joint pipes ^, m are connected to the air switching valve 130 through the air valve, and the air switching valve 13 is connected to a compressed air supply source 32 of a compressor or the like, and an air discharge portion 133 is provided. In the air switching valve 131, the first tubular body member 101 is expanded by the supply of the pressure Φ in the second tubular member ι, and the air in the second tubular member 102 is discharged to the second tubular member 1. In the state in which the crucible 2 is contracted, the second tubular member 1〇2 is expanded by supplying compressed air to the second tubular member 102, and the air in the first tubular member 101 is discharged to contract the first tubular member 1〇1. Free transition between states. Air is introduced into the first tubular body member 101 to be inflated, and air is discharged from the second tubular member 102 to contract, whereby the sliding portion a and the movable shutter member 93 are in the opening direction (right direction) Moving, so that the workpiece Φ can be opened through the port 88. On the other hand, air is introduced into the second tubular member 102 to be inflated, and air is discharged from the first tubular member 101 to be contracted, whereby the sliding portion 93a and the movable shutter 93 are in the closing direction ( The left direction is moved so that the workpiece passage port 88 can be closed. In this closed state, the end edge of the movable shutter member 93 is crimped to the lining 1〇8 of the blocking member 92. (Detailed structure of the float type movable shutter 15) In Fig. 8, a rotating shaft 152 extending in the workpiece conveying direction F is rotatably supported on the left column portion 9U of the shutter device body 91, and the rotating shaft 152 is Both ends protrude from the empty table 16 and the box groove 15, respectively. On the protruding end of the rotating shaft 152, 143926.doc -15- 201026902 on the side of the empty table 16, the movable shutter 15 is integrally fixed, and the protruding end on the side of the box groove 15 of the rotating shaft 152 is integrally fixed with a hollow. The float 151' is thereby rotated integrally by the movable shutter 15 and the float 151 about the axis of the rotary shaft ι52. The movable shutter 150 can be, for example, a gas-vinyl resin and can be folded into a plate-like member. On the other hand, the float 15 can be, for example, polypropylene, and can be formed in a hollow shape to produce a specific in the treatment liquid. Buoyancy above the value. In Fig. 10, the movable shutter 50 is configured to be in a closed state, and is formed in a substantially rectangular shape that is long in the left and right directions, and is fixed to the rotating shaft 152 near the lower end of the substantially central portion of the left and right widths, and the rotating shaft is rotated. 152 as the rotating shaft core 'the moment of the closing direction B1 of the clockwise direction of FIG. 10 is substantially equal to the moment of the opening direction B1 of the counterclockwise direction, or the moment of the opening direction B2 is slightly larger. The left end edge of the movable shutter 150 is formed in a straight line shape, and the right end edge is such that the upper side portion 150a of the upper end is abutted against the upper inclined surface n0a of the expanded opening portion 88a of the guide plate 110 in the closed position. In the inclined surface, the intermediate portion 150b abuts against the vertical surface of the vertical end surface 110b of the guide plate 110, and the lower portion 1/2 of the lower end portion is inclined at an inclination of the same direction as the upper portion 15 0 a. surface. That is, the movable shutter 15 is abutted at the right inclined surface 1 l〇a ' of the expanded opening portion 88a by at least the upper side portion 150a to be buckled at the closed position. The float 151 is fixed to the left side with respect to the rotation axis 1 52, and the moment of the opening direction B2 is given to the movable shutter 150 by the weight of the float 151. That is, when the float 15 1 has no levitation force, the movable shutter 150 is rotated in the opening direction B2 by the weight of the float 15 i. The movable shutter 143926.doc • 16- 201026902 150 is buckled in an open state as shown in Fig. 9 by, for example, a stopper μ set to the shutter device body 91. (Operation) The electric ore processing step and the stripping step of the spreader and the like are well known from the prior art. In FIG. U, the workpiece W before the electric clock processing is carried by the loading unit 1 to the transport spreader 28, and the transport spreader 28 and the workpiece W are transported to the pre-treatment (4) by the propulsion device, and the transport spreader 28 is transported. The key wheel 71 is engaged with the beginning end of the transport chain 75 of the continuous conveying device 35 of the pretreatment tank 11. The conveyance device 3, the continuous conveyance device 36, the collection and conveyance device 32, and the continuous conveyance are sequentially moved from the continuous conveyance device 35 in the direction of the arrow F to the transfer conveyance device 28', whereby the workpiece W passes through the pretreatment tank u, The empty table 12, the tank 13, the electric recording tank 14, the tank i5, the empty table i6, and the i-th post-treatment tank 17' are stopped at a specific processing position for a specific time, and subjected to post-plating treatment, cleaning, and the like. After the completion of the electroplating process, the workpiece is transferred from the second post-treatment tank 18 to the unloading portion P19 by the propulsion device (not shown), and the workpiece w after the electric ore processing is removed from the conveying spreader 28. The conveying spreader 28 after the removal of the member W is then engaged with the sprocket 71 on the chain conveyor 75 of the empty transfer unit 38 of the peeling step, and is sequentially collected from the transfer device 38 in the direction of the arrow F. The conveyance device 33, the conveyance device 39, the collection conveyance device 34, and the continuous conveyance device 40 are moved to peel off the adsorbate, and are cleaned and returned to the loading unit 10 again. In the above two plating processes, when the workpiece w is horizontally moved, for example, from the empty stage 12 via the tank sump in the ore bin U, and from the electric ore tank 14 via the tank 15 in the horizontal stage 143926.doc 17 201026902 16 Each of the shutter devices 84 and 85 is opened, whereby the workpiece W passes through the workpiece passage port 88 or the like without raising the workpiece. If the workpiece w passes through the port 88 or the like after passing through the workpiece, the workpiece pass port 88 of each of the shutter devices 84, 85 is closed. . (Detailed Description of Opening and Closing Operation of Gate Device 8 5) (5) As shown above, the step of moving the workpiece w from the empty table a through the tank 13 to the electric ore tank 14 and the slave key slot (10) are simply shown. The step of moving from the tank slot ^ to the empty table 16. In the bell jar 14, the electro-recording liquid is always maintained at a substantially full state. The S-stages 12, 16 are always kept in a slightly empty state by discharging the plating solution. When the tanks 13 and 15 are moved between the electric ore tanks 14, the plating liquid is supplied from the cylindrical tanks 47 and the like for a short period of time, and the filling state is substantially the same as that of the plating tanks 14, and the workpieces are traded in the tanks 13 When moving between 15 and each of the empty stages 12 and 16, the discharge port plug 46 is opened to discharge the liquid to a slightly empty state in a short time. (2) When the tanks 13, 15 are filled as described above, the gate device is opened between the plating tank 14 and the tank 15, and is in a state in which the workpiece w can pass. The door assembly 85 between the slots 13, 15 and the empty tables 12, 16 is closed. When the opposite tanks 13 and 15 are in an empty state from the full state, the gate device between the plating tank 14 and the tank grooves 13 and 15 is closed, and on the other hand, the tank grooves 13, 15 open the discharge port plug 46. The gate device 85 between the openings 12 and 16 is also opened to discharge the plating solution. (3) The operation of the shutter device 95 in which the tank 15 for post-processing is changed from the empty state to the full state will be described in detail. In Fig. 9, when the inside of the tank 15 is empty, the movable shutter member 93 is moved to the open position, whereby the workpiece passes through the opening 143926.doc -18- 201026902, and the movable shutter 150 is rotated to the slit opening of the opening 88. The portion 88b is opened, and the position is opened, whereby the expansion opening portion 88a is also opened.
在箱槽15中供給電鑛液之情形時，如圖1〇所示，首先， 可動間Η構件93移動至關閉位置，狹縫狀開口部咖關 閉。在該狀態，若從圓柱槽47(圖5)將電鍵液供給至箱槽 15，則隨著箱槽15内所供給之電鍵液增加，浮子⑸因浮 力而上升’且活動遮板15G與浮子151同時旋轉至關閉方向 B1，從而關閉擴張開口部88a之下半部。藉此，可在箱槽 15内’確實儲存至水平為止之電鐘液。上述水平線^ 如圖7所示，其係可將把持於搬送裝置28之工件W之上端 緣浸潰至大致50 mm左右之高度。藉此，可將在電鎮槽“ 内之工件W整體電鍍處理。 上述說明係從電鍍槽14經由箱槽15將工件w搬送至空台 16之情形之閘門裝置85等之啟閉，然而於從圖5之入 之空台12經由箱槽13將工件搬送至電鍍槽14之情形，配置 於入口側箱槽13與入口側空台丨2之間之具活動遮板的閘門 裝置85之啟閉，亦與上述閘門裝置85同樣進行。 (實施形態之效果） (1)圖6所示之箱槽15與空台16之間之閘門裝置85係如圖7， 具備有藉由驅動機構94(管體構件1〇1、102)在大致水平方 向移動而啟閉狹縫狀開口部88b之閘門構件93，及與該閉 門構件93另外之繞著水平旋轉軸152旋轉，而啟閉擴張開 口部88a之活動遮板150，於該活動遮板150上連動連接有 配置於箱槽15内之浮子151，藉由隨著箱槽15之電链液增 143926.doc •19· 201026902 加的浮子151之上升，而使上述活動遮板15〇旋轉至關閉位 置，故可將工件通過口 88之開口面積限制於可供工件^及 工件保持用之夹具67等通過之大致最小面積，從而可抑制 電鑛液從工件通過口 88漏出。 (2) 由於狹縫狀開口部88b係藉由在水平方向可滑動自如之 可動閘門構件93而使其啟閉’且擴張開口部88&係藉由繞 著水平旋轉軸152旋轉自如之活動遮板15〇而使其啟閉，故 可以短時間啟閉工件通過口 8 8全體’從而可使連續的工件 處理作業之效率提高。即，由於根據各開口部88b、8“之 形狀’分別具備有滑動式之閘門構件93與旋轉式之活動遮 板150，故可大為縮短工件通過口 88整體之啟閉時間。 (3) 由於利用配置於箱槽15内之浮子151，使活動遮板15〇上 升，故不必特別具備馬達等之活動遮板啟閉用驅動機構， 從而可簡易化閘門裝置85。 (4) 由於以V字形形成有擴張開口部88a，故在狹縫狀開口 部88b及其上方之連續的擴張開口部88a之形成作業較為容 易。 (5) 由於浮子151固著於活動遮板丨5〇之旋轉軸152，而可與 活動遮板150 —體旋轉，故可將浮子ι51與活動遮板15〇一 體緊密地配置。 [第2實施形態] 圖11及圖12顯示第2實施形態，在圖丨丨中，在箱槽15(紙 面之正前側）與空台（面向紙面之側）之間之槽壁83上，具 備有與工件通過口 88之擴張開口部88a之形狀對應之三角 143926.doc •20· 201026902 形狀的活動遮板150，及透過繩子161連接於該活動遮板 150之臂部150a之浮子151。活動遮板150與浮子151均配置 於箱槽1 5内。且，與上述第1實施形態同樣，具備有啟閉 狹縫狀開口部8 8 b之閘門裝篁8 5，但在圖中省略，僅顯示 '活動遮板150及其驅動機構。 -活動遮板150之臂部150a透過大致水平之旋轉軸〗52而可 旋轉自如地支持在槽壁83(或閘門裝置本體）上，在臂部 φ 150a之另一端部，設置有錘丨64以使相對於活動遮板150在 開啟方向B2施加力矩。在相對於旋轉轴152，與錘164之配 置側成相反側之臂部150a之部位，連接有上述繩子161， 該繩子161延伸至箱槽15下方，並捲繞在設置於箱槽15之 下k部附近之回轉槽輪162上，而朝上方折回，且在絕子 161之另端部連接有浮子15ι。 如圖11所示，在箱槽15為略空之狀態時，浮子151位於 箱槽15之底面附近，活動遮板15〇藉由因錘164產生之開啟 ❹ 方 向B2之力矩，位於開啟位置。 如圖12，若將電鍍液供給於箱槽15，則浮子151因浮力 而上升並拉緊繩子161，從而使活動遮板15 〇旋轉至關閉 方向B1。旋轉至關閉方向B1之活動遮板150以阻擋器163 而被扣止，藉此，保持於關閉位置，從而關閉擴張開口部 88a之下半部。 根據上述實施形態，增加浮子15 1之配置靈活性，從設 计將變得簡單。再者，在該實施形態中，連接浮子151與 活動遮板150之繩狀體不限制於繩子，亦可利用柔軟之導 143926.doc -21 · 201026902 線或鍵。 [第3實施形態] 圖13及圖14係本發明之第3實施形態，在顯示平面圖之 圖13中’在電鑛液槽丨4與箱槽15之間之槽壁82上，設置有 活動遮板350’活動遮板350配置於電鑛槽14内，浮子351 配置於箱槽15内。在槽壁82(或閘門裝置本體）上，旋轉自 如地支持有貫通槽壁之水平旋轉軸352,在旋轉軸352之電 鑛槽14側之端部固著有活動遮板35〇之臂部35〇a之基端 部，在旋轉軸352之箱槽15侧之端部，透過臂部35 la固著 有浮子35 1。且，與上述第丨實施形態同樣，具備有啟閉狹 縫狀開口部88b之閘門裝置84，但在圖中省略，僅顯示有 活動遮板350及其驅動機構。 圖14係圖13之XIV-XIV剖面圖，顯示活動遮板3 5 〇為關 閉之狀態’在槽壁82之擴張開口部88a之附近，設置有關 閉位置扣止用之阻擋器354 ’在電鍍液槽14之側壁之上端 部’设置有開啟位置扣止用之阻檔器353。 在箱槽15為空狀態時，如圖〗4所示，藉由浮子351及活 動遮板350之重力，活動遮板350旋轉至關閉方向B1，並被 阻擋器354扣止，藉此，保持於關閉位置。即，關閉擴張 開口部88a之下半部。藉此，防止電鍍液從電鍍液槽14漏 出至箱槽1 5。 若於箱槽15中供給電鍍液，則藉由浮子351因浮力上 升，浮子351及活動遮板350旋轉至開啟方向82，並開啟擴 張開口部88a。活動遮板350藉由開啟位置扣止用之阻擋器 143926.doc •22. 201026902 353，被扣止及保持。藉此，可快速地將箱槽^達到與電 鍍液槽14内相同之充滿狀態。 [第4實施形態] 圖15係本發明之第4實施形態，在箱槽15與空台16之間 之槽壁83上，設置有活動遮板45〇。活動遮板45〇與上述第 3實施形態同樣，形成為具臂部45〇&之三角形狀，並配置 於箱槽15内。活動遮板45〇之臂部45〇a之基端部透過大致 ❹水平之旋轉轴452，旋轉自如地支持在槽壁83。在本實施 形態中，藉由將活動遮板45〇自身製作為中空形狀或以比 重小之材料製作，作為在電鍍液中或水中浮動之浮子而利 用。且，與上述第1實施形態同樣，具備有啟閉狹縫狀開 口部88b之閘門裝置85，但在圖中省略，僅顯示有活動遮 板450及其驅動機構。 在箱槽15為空狀態時，活動遮板45〇藉由重力成為以虛 線表示之垂下狀態，而開啟擴張開口部88a。 ❹ 若於箱槽15内供給電鍍液，則活動遮板（浮子）450藉由 浮力而旋轉至關閉方向B1，並抵接於上方之阻擋器454, 藉此，扣止於關閉位置，從而關閉擴張開口部88&。 [第5實施形態] 圖16及圖17係本發明之第5實施形態，在空台16與箱槽 15之間之槽壁83上，設置有活動遮板55〇。圖丨6係平面 圖，圖17係圖16之XVII-XVn剖面圖，在圖17中，在槽壁 83之箱槽15側之面上，將剖面為略〕字狀之滑軌558以傾 斜狀態而固定，在該滑軌558内，滑動自如地支持平行四 143926.doc -23- 201026902 邊形狀之活動遮板550之一側端部55〇a。上述滑軌558以隨 著行駛至下方從工件通過口 88脫離的方式而傾斜，因此， 活動遮板550若移動至上方，則向工件通過口 88移動，而 關閉擴張開口部88a，若移動至下方，則從工件通過口 88 脫離而使擴張開口部開啟。又，在活動遮板55〇之軌道之 上下端’分別設置有關閉位置扣止用之阻擋器554，及開 啟位置扣止用阻擋器553。 在圖16中’在滑軌558沿著軌道長方向開口有槽558a開 口’透過該槽558a使活動遮板550向外部突出。 在該實施形態，活動遮板55〇自身亦成為浮子，形成為 中空狀，或以浮於電鍍液之比重較輕之材料（例如聚丙烯 等）而成形。 在箱槽1 5内為空狀態時，如圖丨7以假想線所表示，活動 遮板550因自身重量而下降至開啟位置，並以開啟位置扣 止用之阻擋器553扣止。即，開啟擴張開口部。 若在箱槽15内供給電鍍液’則活動遮板55〇藉由自身之 浮力而上升，抵接於上端之關閉位置扣止用之阻擋器 554，藉此，將擴張開口部88a保持於關閉狀態。 [第6實施形態] 圖18及圖19係本發明之第6實施形態，其係在空台16與 箱槽15之間之槽壁83上’具備螺旋移動型之活動遮板650 之實例。 在顯示平面圖之圖18中’在槽壁83之箱槽15侧之面上， 將引導筒655大致垂直狀態固著，在該引導筒655内，上下 143926.doc -24· 201026902 方向移動自如且旋轉自如地嵌合有圓筒狀之浮子65i。 圖19係圖18之XIX-XIX剖面圖，在引導筒之周壁， 形成有連通引導筒655之内部與外部之螺旋狹縫656，透過 插通於該螺旋狹縫656之臂部65〇a，三角形狀之活動遮板 650連接於浮子651。 在箱槽15内為空狀態時’如以假想線所示，活動遮板 650藉由重力與浮子651同時下降至開啟位置，位於與狹縫 φ 狀之開口部88b成相反之側。即，開啟擴張開口部88a。 若在箱槽15内供給電鍍液，則藉由浮子65 1之浮力，浮 子6 51與活動遮板6 5 0 —體上升，但藉由臂部6 5 〇 a沿著螺旋 狹縫656而移動’活動遮板650係螺旋狀上升。因此在上升 之關閉位置’朝擴張開口部88a側旋轉，從而關閉擴張開 口部88a。再者’在本實施形態中，藉由將活動遮板65〇自 身使用中空形狀或比重較小之材料，亦可作為在電鍍液中 浮動之浮子。， φ [第7實施形態] 圖20及圖21係本發明之第7實施形態，其係在電鍍槽14 與箱槽15之間之槽壁82上，配置活動遮板750之實例，藉 由浮子751上升’而使擴張開口部88a開啟。 在顯示關閉狀態之圖20中，具備有與擴張開口部88a之 形狀對應之三角形狀之上述活動遮板750，及在該活動遮 板750之臂部750a之另一端部透過繩子761而連接之浮子 751。臂部750a透過大致水平之旋轉轴752旋轉自如地支持 在槽壁82。 143926.doc •25· 201026902 上述繩子761從臂部750a延伸至下方，並捲繞在設置於 箱槽15之下端部附近之回轉槽輪762上，而朝上方折回。 如圖20所示，箱槽15為略空狀態時，浮子751位於箱槽 15之底面附近，活動遮板75〇藉由自身重量旋轉至關閉方 向B1從而關閉擴張開口部。活動遮板750以阻擋器754而 扣止，藉此，保持於關閉位置。When the electric ore is supplied to the tank 15, as shown in Fig. 1A, first, the movable jaw member 93 is moved to the closed position, and the slit-shaped opening portion is closed. In this state, when the key solution is supplied from the cylindrical groove 47 (FIG. 5) to the tank groove 15, the float (5) rises due to buoyancy as the amount of the key liquid supplied in the tank 15 increases, and the movable shutter 15G and the float 151 is simultaneously rotated to the closing direction B1, thereby closing the lower half of the expansion opening portion 88a. Thereby, the electric clock liquid can be surely stored in the tank 15 to the level. The horizontal line ^ shown in Fig. 7 is capable of immersing the upper edge of the workpiece W held by the conveying device 28 to a height of approximately 50 mm. Thereby, the entire workpiece W in the electric ballast can be plated. The above description is the opening and closing of the shutter device 85 in the case where the workpiece w is transferred from the plating tank 14 to the empty table 16 via the tank groove 15, but When the workpiece 12 is transferred from the empty tray 12 shown in FIG. 5 to the plating tank 14 via the tank 13, the shutter device 85 having the movable shutter disposed between the inlet side tank 13 and the inlet side empty table 2 is opened. The closing is also performed in the same manner as the above-described shutter device 85. (Effect of the embodiment) (1) The shutter device 85 between the tank 15 and the empty table 16 shown in Fig. 6 is as shown in Fig. 7, and is provided with a driving mechanism 94. (the tubular members 1〇1, 102) move in a substantially horizontal direction to open and close the shutter member 93 of the slit-like opening portion 88b, and the shutter member 93 is further rotated about the horizontal rotating shaft 152 to open and close the expansion opening. The movable shutter 150 of the portion 88a is connected to the movable shutter 150 with a float 151 disposed in the tank 15 , and the float is added by the electric chain of the tank 15 by 143926.doc • 19· 201026902 The rise of 151 causes the above-mentioned movable shutter 15 to rotate to the closed position, so that the workpiece can be passed The opening area of 88 is limited to a substantially minimum area through which the workpiece and the workpiece holding jig 67 can pass, thereby suppressing leakage of the electro-mineral liquid from the workpiece through port 88. (2) Since the slit-like opening portion 88b is used The movable shutter member 93 can be slidably opened in the horizontal direction to open and close 'and the expanded opening portion 88& is opened and closed by the movable shutter 15 旋转 rotating around the horizontal rotating shaft 152, so that it can be opened for a short time The opening and closing of the workpiece through the port 8 8 can improve the efficiency of the continuous workpiece processing operation. That is, since the shape of each of the openings 88b, 8 is provided with a sliding shutter member 93 and a rotary movable shutter, respectively. Since the plate 150 is used, the opening and closing time of the entire workpiece passage opening 88 can be greatly shortened. (3) Since the movable shutter 15 is lifted by the float 151 disposed in the tank 15, it is not necessary to provide a movable shutter opening/closing mechanism such as a motor, and the shutter device 85 can be simplified. (4) Since the expanded opening portion 88a is formed in a V shape, it is easy to form the slit-shaped opening portion 88b and the continuous expanded opening portion 88a above it. (5) Since the float 151 is fixed to the rotating shaft 152 of the movable shutter 5, it can be rotated integrally with the movable shutter 150, so that the float ι51 and the movable shutter 15 can be closely arranged. [Second Embodiment] Figs. 11 and 12 show a second embodiment in which a groove wall 83 between a tank groove 15 (front side of the paper surface) and a hollow table (the side facing the paper surface) is shown. A movable shutter 150 having a shape of a triangle 143926.doc • 20· 201026902 corresponding to the shape of the expanded opening portion 88a of the workpiece passage opening 88, and a float 151 connected to the arm portion 150a of the movable shutter 150 via the string 161 are provided. Both the movable shutter 150 and the float 151 are disposed in the tank 150. Further, similarly to the above-described first embodiment, the shutter assembly 8 5 having the slit-like opening portion 8 8 b is opened, but the illustration is omitted, and only the movable shutter 150 and its drive mechanism are displayed. The arm portion 150a of the movable shutter 150 is rotatably supported by the groove wall 83 (or the shutter device body) through a substantially horizontal rotation axis 52, and the hammer 64 is provided at the other end portion of the arm portion φ 150a. In order to apply a moment in the opening direction B2 with respect to the movable shutter 150. The rope 161 is connected to a portion of the arm portion 150a opposite to the arrangement side of the hammer 164 with respect to the rotating shaft 152, and the rope 161 extends below the tank groove 15 and is wound under the tank groove 15 The turning sheave 162 near the k portion is folded back upward, and a float 151 is connected to the other end of the stator 161. As shown in Fig. 11, when the tank groove 15 is in a slightly empty state, the float 151 is located near the bottom surface of the tank groove 15, and the movable shutter 15 is located at the open position by the moment of the opening direction B2 generated by the hammer 164. As shown in Fig. 12, when the plating solution is supplied to the tank 15, the float 151 is raised by the buoyancy and the rope 161 is tightened, so that the movable shutter 15 is rotated to the closing direction B1. The movable shutter 150 rotated to the closing direction B1 is buckled by the stopper 163, thereby being held in the closed position, thereby closing the lower half of the expanded opening portion 88a. According to the above embodiment, the flexibility of the arrangement of the float 15 1 is increased, and the design is simplified. Further, in this embodiment, the rope-like body connecting the float 151 and the movable shutter 150 is not limited to the rope, and the soft guide 143926.doc -21 · 201026902 line or key can also be used. [Third Embodiment] Figs. 13 and 14 show a third embodiment of the present invention. In Fig. 13 showing a plan view, "the activity is provided on the groove wall 82 between the electric ore tank 4 and the tank 15. The shutter 350' movable shutter 350 is disposed in the electric ore tank 14, and the float 351 is disposed in the tank 15. A horizontal rotating shaft 352 that penetrates the groove wall is rotatably supported on the groove wall 82 (or the shutter device body), and an arm portion of the movable shutter 35 is fixed to an end portion of the rotating shaft 352 on the side of the electro- ore channel 14 At the base end portion of the 35〇a, a float 35 1 is fixed to the end portion of the rotary shaft 352 on the side of the tank groove 15 through the arm portion 35 la. Further, similarly to the above-described third embodiment, the shutter device 84 having the slit-like opening portion 88b is opened and closed. However, the movable shutter 350 and its driving mechanism are only shown in the drawings. Figure 14 is a cross-sectional view taken along line XIV-XIV of Figure 13, showing a state in which the movable shutter 35 is closed. In the vicinity of the expanded opening portion 88a of the groove wall 82, a stopper 354 for closing the position is provided. The end portion of the side wall of the liquid tank 14 is provided with a stopper 353 for opening position. When the tank 15 is in an empty state, as shown in FIG. 4, the movable shutter 350 is rotated to the closing direction B1 by the gravity of the float 351 and the movable shutter 350, and is blocked by the stopper 354, thereby maintaining In the off position. That is, the lower half of the expansion opening portion 88a is closed. Thereby, the plating solution is prevented from leaking from the plating bath 14 to the tank 15 . When the plating solution is supplied to the tank 15, the float 351 is lifted by the buoyancy, and the float 351 and the movable shutter 350 are rotated to the opening direction 82, and the expansion opening portion 88a is opened. The movable shutter 350 is detained and held by the stopper for opening the position 143926.doc • 22. 201026902 353. Thereby, the tank can be quickly brought to the same full state as in the plating bath 14. [Fourth Embodiment] Fig. 15 shows a fourth embodiment of the present invention, in which a movable shutter 45 is provided on a groove wall 83 between the tank groove 15 and the empty table 16. Similarly to the third embodiment, the movable shutter 45 is formed in a triangular shape having an arm portion 45 〇 & and is disposed in the tank groove 15. The base end portion of the arm portion 45A of the movable shutter 45 is rotatably supported by the groove wall 83 through a substantially horizontal rotation shaft 452. In the present embodiment, the movable shutter 45 itself is formed into a hollow shape or made of a material having a small specific gravity, and is used as a float floating in a plating solution or water. Further, similarly to the above-described first embodiment, the shutter device 85 having the slit-like opening portion 88b is opened and closed. However, the movable shutter 450 and its driving mechanism are only shown in the drawings. When the tank groove 15 is in the empty state, the movable shutter 45 is opened by the gravity line by the imaginary line, and the expansion opening portion 88a is opened. ❹ If the plating solution is supplied in the tank 15, the movable shutter (float) 450 is rotated to the closing direction B1 by buoyancy, and abuts against the upper stopper 454, thereby being closed in the closed position, thereby closing Expand the opening 88 & [Fifth Embodiment] Figs. 16 and 17 show a fifth embodiment of the present invention. A movable shutter 55 is provided on a groove wall 83 between the empty table 16 and the tank 15. Figure 6 is a plan view, Figure 17 is a cross-sectional view of XVII-XVn of Figure 16, and in Figure 17, on the side of the groove 15 side of the groove wall 83, the slide rail 558 having a slightly-shaped cross section is inclined. Further, in the slide rail 558, one side end portion 55〇a of the movable shutter 550 of the side shape of the parallel four 143926.doc -23-201026902 is slidably supported. The slide rail 558 is inclined so as to be detached from the workpiece passage opening 88 as it travels downward. Therefore, when the movable shutter 550 is moved upward, the movable shutter 550 is moved toward the workpiece passage opening 88, and the expansion opening portion 88a is closed, and if it is moved to Below, the expansion opening is opened by the detachment from the workpiece through port 88. Further, a stopper 554 for closing the position and a stopper 553 for opening the position are respectively provided at the upper and lower ends ' of the rails of the movable shutter 55'. In Fig. 16, the groove 558a is opened in the track 558 along the track length direction. The movable shutter 550 is protruded outward through the groove 558a. In this embodiment, the movable shutter 55 itself is also formed as a float, and is formed into a hollow shape or formed of a material having a relatively small specific gravity (e.g., polypropylene) floating on the plating solution. When the tank slot 15 is in the empty state, as shown by the imaginary line in Fig. 7, the shutter 550 is lowered to the open position by its own weight, and is locked by the stopper 553 for the open position. That is, the expansion opening is opened. When the plating solution is supplied in the tank 15, the movable shutter 55 is raised by its own buoyancy, and is abutted against the stopper 554 for closing the upper end, thereby keeping the expansion opening 88a closed. status. [Embodiment 6] Figs. 18 and 19 show an embodiment of a sixth embodiment of the present invention, in which a spiral-moving movable shutter 650 is provided on a groove wall 83 between a hollow table 16 and a tank groove 15. In the plane of the tank groove 15 side of the groove wall 83 in Fig. 18 showing the plan view, the guide cylinder 655 is fixed in a substantially vertical state, and in the guide cylinder 655, the upper and lower sides 143926.doc -24· 201026902 are freely movable. A cylindrical float 65i is rotatably fitted. Figure 19 is a cross-sectional view taken along the line XIX-XIX of Figure 18, in which a spiral slit 656 is formed in the peripheral wall of the guiding cylinder to communicate with the inside and the outside of the guiding cylinder 655, and is inserted through the arm portion 65A of the spiral slit 656. A triangular shaped movable shutter 650 is coupled to the float 651. When the inside of the tank 15 is empty, as shown by the imaginary line, the movable shutter 650 is simultaneously lowered to the open position by the gravity and the float 651, and is located on the side opposite to the slit φ-shaped opening 88b. That is, the expansion opening portion 88a is opened. When the plating solution is supplied in the tank 15, the float 6 51 and the movable shutter 65 are lifted by the buoyancy of the float 65 1 , but moved by the arm 6 5 〇 a along the spiral slit 656. 'The movable shutter 650 is spirally raised. Therefore, it is rotated toward the expansion opening portion 88a at the rising closed position ', thereby closing the expansion opening portion 88a. Further, in the present embodiment, the movable shutter 65 can be used as a float floating in the plating solution by using a hollow shape or a material having a small specific gravity. φ [Seventh Embodiment] Figs. 20 and 21 show a seventh embodiment of the present invention, in which an example of a movable shutter 750 is disposed on a groove wall 82 between a plating tank 14 and a tank groove 15 by The float 751 rises ' and the expanded opening portion 88a is opened. In Fig. 20 showing the closed state, the movable shutter 750 having a triangular shape corresponding to the shape of the expanded opening portion 88a is provided, and the other end portion of the arm portion 750a of the movable shutter 750 is connected by a cord 761. Floating 751. The arm portion 750a is rotatably supported by the groove wall 82 through a substantially horizontal rotating shaft 752. 143926.doc •25· 201026902 The above-mentioned rope 761 extends from the arm portion 750a to the lower side, and is wound around the turning sheave 762 provided near the lower end portion of the tank groove 15, and is folded back upward. As shown in Fig. 20, when the tank groove 15 is in a slightly empty state, the float 751 is located near the bottom surface of the tank groove 15, and the movable shutter 75 is rotated by its own weight to the closing direction B1 to close the expansion opening portion. The movable shutter 750 is latched by the stopper 754, thereby being held in the closed position.
右在箱槽15内供給電鍍液，則浮子751藉由浮力上升， 並透過繩子761拉緊臂部75〇&之另一端部，如圖21，活動 遮板75G旋轉至開啟方向B2，從而開啟擴張開口部.。 [其他之實施形態] ⑴在上述圖1至圖21之實施形態中，為啟閉狹縫狀開口部 88b ’具備水平方向移動自如之閘門構件％，且作為驅動 該閘門構件93之驅動機構94，具備有一對管體構件ι〇ι、 但亦可具備有藉由其他驅動機構在水平方向移動之 閘門構件。又，亦可為藉由管體構件之膨脹，以管體構件 直接關閉狹縫狀開口部之構造。 (2)本發明之閘門裝置不 藉由儲存於處理液槽内 之浸潰處理裝置。 限制於電鍵裝置，例如亦可適用於 之處理液，而清潔工件之剝離槽等When the plating solution is supplied to the tank 15 in the right direction, the float 751 is raised by buoyancy, and the other end of the arm portion 75 〇 & is pulled through the rope 761, as shown in FIG. 21, the movable shutter 75G is rotated to the opening direction B2, thereby Open the expansion opening. [Other Embodiments] (1) In the embodiment of the above-described FIGS. 1 to 21, the opening and closing slit-shaped opening portion 88b' is provided with a shutter member % that is horizontally movable, and is a driving mechanism 94 that drives the shutter member 93. There is a pair of tubular members ι〇ι, but a shutter member that moves in the horizontal direction by another drive mechanism may be provided. Further, it is also possible to directly close the slit-like opening portion by the tubular member by expansion of the tubular member. (2) The shutter device of the present invention does not pass through the impregnation treatment device stored in the treatment liquid tank. Restricted to the key device, for example, it can also be applied to the treatment liquid, and the stripping groove of the workpiece is cleaned, etc.
[產業上之可利用性] 置、鋁 置等之 本發明係除電鍍裝置外 之陽極氧化處理裝置、電 處理裝置。 ’亦可適用於鉻酸處理裝 解研磨裝置或電解酸洗農 【圖式簡單說明】 143926.doc -26 - 201026902 圖1係本發明之第1實施形態’其係電鍍裝置之整體平面 固 · 園， 圖2係圖1之電鑛槽及箱槽附近之縱剖面放大圖； 圖3係圖2之III-III剖面放大圖； 圖4係圖2之IV-IV剖面放大圖； 圖5係圖1之電鑛槽、箱槽及空台之縱剖面概略圖； 圖.6係圖5之箱槽之平面圖； 圖7係圖6之VII-VII剖面圖； ❹ 圖8係圖7之閘門裝置之平面放大圖； 圖9係顯示工件通過口為開啟狀態之閘門裝置之作用說 明圖； 圖10係顯示工件通過口為關閉狀態之閘門裝置之作用說 明圖； 圖11係本發明之第2實施形態，其係活動遮板為開啟狀 態之處理液槽之縱剖面概略圖； ^ 圖12係與圖11同樣之處理液槽’其係顯示活動遮板為關 閉狀態之剖面概略圖； 圖13係本發明之第3實施形態，其係活動遮板為開啟狀 態之處理液槽之平面圖； 圖14係圖13之XIV-XIV剖面圖； 圖15係本發明之第4實施形態’其係活動遮板為關閉狀 態之處理液槽之縱剖面概略圖； 圖16係本發明之第5實施形態，其係處理液槽之平面 圖； 143926.doc -27- 201026902 圖17係圖16之XVn-XVII剖面圖； 面 圖1 8係本發明之第6實施形態，其係處理液槽之平 圖， 圖19係圖18之ΧΙΧ-ΧΙΧ剖面圖； 面 圖20係本發明之第7實施形態’其係處理液槽之縱剖 概略圖； 圖21係圖20之ΧΧΙ-ΧΧΙ剖面圖；及 立 圖22係顯示先前之處理液槽之排液及給 ^ '又寻之作用的[Industrial Applicability] The present invention is an anodizing treatment apparatus and an electric treatment apparatus other than the plating apparatus. 'It can also be applied to a chromic acid treatment and squeezing device or an electrolytic pickling peasant. [Brief Description] 143926.doc -26 - 201026902 Fig. 1 is a first embodiment of the present invention. Figure 2 is an enlarged longitudinal sectional view of the vicinity of the electric ore tank and the tank of Figure 1. Figure 3 is an enlarged view of the section III-III of Figure 2; Figure 4 is an enlarged view of the section IV-IV of Figure 2; Fig. 1 is a plan view of a longitudinal section of an electric ore tank, a tank and a hollow table; Fig. 6 is a plan view of the tank of Fig. 5; Fig. 7 is a sectional view taken along line VII-VII of Fig. 6; ❹ Fig. 8 is a gate of Fig. 7. FIG. 9 is an explanatory view showing the action of the shutter device in which the workpiece passing port is in an open state; FIG. 10 is an explanatory view showing the action of the shutter device in which the workpiece passing port is in a closed state; FIG. 11 is the second embodiment of the present invention; In the embodiment, it is a schematic longitudinal cross-sectional view of the processing liquid tank in which the movable shutter is in an open state; ^ FIG. 12 is a schematic view of a processing liquid tank similar to that in FIG. 11 showing a movable shutter in a closed state; FIG. According to a third embodiment of the present invention, the movable shutter is opened. FIG. 14 is a cross-sectional view of a processing liquid tank in a closed state of the fourth embodiment of the present invention; FIG. 16 is a plan view showing a fourth embodiment of the present invention; The fifth embodiment is a plan view of the processing liquid tank; 143926.doc -27- 201026902 FIG. 17 is a cross-sectional view taken along line XVn-XVII of FIG. 16; and FIG. 18 is a sixth embodiment of the present invention, which is a treatment liquid Figure 19 is a cross-sectional view of the ΧΙΧ-ΧΙΧ in Fig. 18; Fig. 20 is a longitudinal sectional view of a processing liquid tank according to a seventh embodiment of the present invention; Figure; and the diagram 22 shows the drainage of the previous treatment tank and the role of
體圖。 W 【主要元件符號說明】 15 箱槽（處理液槽之一例） 46 排出口检（排液機構之一例） 47 圓柱槽（給液機構之一例） 85 閘門裝置 88 工件通過口 88a 狹縫狀開口部 88b 擴張開口部 93 可動閘門構件 94 可動閘門構件之驅動機構 150 活動遮板 151 浮子 152 活動遮板之旋轉轴 161 繩子（繩狀體之一例） 143926.doc -28-Body map. W [Description of main component symbols] 15 tank (one example of treatment tank) 46 outlet inspection (an example of a drain mechanism) 47 cylindrical groove (an example of a liquid supply mechanism) 85 gate device 88 workpiece opening 88a slit-like opening Portion 88b Expansion opening portion 93 Mobility gate member 94 Driving mechanism of movable shutter member 150 Moving shutter 151 Float 152 Rotating shaft of movable shutter 161 Rope (one example of rope body) 143926.doc -28-