TW201018955A - Optical imaging system, exposure device and device manufacturing method - Google Patents

Optical imaging system, exposure device and device manufacturing method Download PDF

Info

Publication number
TW201018955A
TW201018955A TW098133825A TW98133825A TW201018955A TW 201018955 A TW201018955 A TW 201018955A TW 098133825 A TW098133825 A TW 098133825A TW 98133825 A TW98133825 A TW 98133825A TW 201018955 A TW201018955 A TW 201018955A
Authority
TW
Taiwan
Prior art keywords
mirror
optical system
imaging optical
light
imaging
Prior art date
Application number
TW098133825A
Other languages
English (en)
Chinese (zh)
Inventor
Hideki Komatsuda
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW201018955A publication Critical patent/TW201018955A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
TW098133825A 2008-11-10 2009-10-06 Optical imaging system, exposure device and device manufacturing method TW201018955A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008287356 2008-11-10

Publications (1)

Publication Number Publication Date
TW201018955A true TW201018955A (en) 2010-05-16

Family

ID=42152771

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098133825A TW201018955A (en) 2008-11-10 2009-10-06 Optical imaging system, exposure device and device manufacturing method

Country Status (2)

Country Link
TW (1) TW201018955A (fr)
WO (1) WO2010052961A1 (fr)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003015040A (ja) * 2001-07-04 2003-01-15 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2004170869A (ja) * 2002-11-22 2004-06-17 Nikon Corp 結像光学系、露光装置および露光方法
JP2006245148A (ja) * 2005-03-01 2006-09-14 Canon Inc 投影光学系、露光装置及びデバイスの製造方法
JP4366151B2 (ja) * 2003-09-09 2009-11-18 キヤノン株式会社 投影光学系、露光装置及びデバイスの製造方法
JP2006243197A (ja) * 2005-03-01 2006-09-14 Canon Inc 投影光学系、露光装置及びデバイスの製造方法
JP4438060B2 (ja) * 2003-09-02 2010-03-24 キヤノン株式会社 投影光学系、露光装置及びデバイスの製造方法
JP4387902B2 (ja) * 2004-09-09 2009-12-24 キヤノン株式会社 反射型投影光学系、当該投影光学系を有する露光装置、並びに、デバイス製造方法
JP2006245147A (ja) * 2005-03-01 2006-09-14 Canon Inc 投影光学系、露光装置及びデバイスの製造方法
US7973908B2 (en) * 2005-05-13 2011-07-05 Carl Zeiss Smt Gmbh Six-mirror EUV projection system with low incidence angles
JP2008158211A (ja) * 2006-12-22 2008-07-10 Canon Inc 投影光学系及びそれを用いた露光装置

Also Published As

Publication number Publication date
WO2010052961A1 (fr) 2010-05-14

Similar Documents

Publication Publication Date Title
US11467501B2 (en) Image-forming optical system, exposure apparatus, and device producing method
TWI328719B (en) A sensor for use in a lithographic apparatus
TWI468838B (zh) 成像光學系統與包含此類型成像光學系統之用於微影的投影曝光裝置
JP6221160B2 (ja) ミラーの配置
TW200931061A (en) Spatial light modulation unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
JP2003233001A (ja) 反射型投影光学系、露光装置及びデバイス製造方法
TWI283798B (en) A microlithography projection apparatus
US9146475B2 (en) Projection exposure system and projection exposure method
CN102870030B (zh) 成像光学系统和具有这种成像光学系统的用于微光刻的投射曝光设备
TW200406593A (en) Projection optical system and exposure device equipped with the projection optical system
TWI701458B (zh) 反射折射光學系統、照明光學系統、曝光裝置及物品製造方法
TW201018955A (en) Optical imaging system, exposure device and device manufacturing method
JP6365723B2 (ja) 反射結像光学系、結像方法、露光装置、露光方法、およびデバイス製造方法
TW200915017A (en) Illumination optical system, illumination optical apparatus, exposure apparatus, and device manufacturing method
TW530335B (en) Image-forming optical system and exposure device equipped therewith
TW200907588A (en) Catoptric reduction projection optical system, exposure apparatus, and method for manufacturing device