TW201015246A - Exposure device and exposure method for display panel, and assembly or adjustment method of exposure device for display panel - Google Patents

Exposure device and exposure method for display panel, and assembly or adjustment method of exposure device for display panel Download PDF

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Publication number
TW201015246A
TW201015246A TW098133402A TW98133402A TW201015246A TW 201015246 A TW201015246 A TW 201015246A TW 098133402 A TW098133402 A TW 098133402A TW 98133402 A TW98133402 A TW 98133402A TW 201015246 A TW201015246 A TW 201015246A
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Taiwan
Prior art keywords
platform
platforms
connection
display panel
substrate
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TW098133402A
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Chinese (zh)
Inventor
Nobuyuki Maki
Naruo Watanabe
Katsuaki Matsuyama
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Hitachi High Tech Corp
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Publication of TW201015246A publication Critical patent/TW201015246A/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70791Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70225Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/7035Proximity or contact printers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70775Position control, e.g. interferometers or encoders for determining the stage position
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

To provide a split-state loading platform capable of easy processing and delivery, the exposure device can enhance connection strength of the loading platform when it is assembled, and the exposure device or liquid crystal exposure method allows easy assembly or easy adjustment to be carried out on parts assembled from split-state even after the assembly. To install a connection platform having a hollow tetragonal column structure that connects plural platforms in order to constitute the loading platform, to set up a protrusion on the connecting surface and insert it into the opposite side of the platform and manipulate the location of the protrusion from the upper surface of the platform. Also, adjust air volume of an air storage chamber disposed in the aforementioned connection surface.

Description

201015246 六、發明說明: 【發明所屬之技術領域】 本發明,是關於顯示用面板等之基板的製造裝置,特 別是於玻璃基板上形成圖案之液晶曝光裝置。 【先前技術】 使光罩與基板玻璃接近到1mm以下,照射平行光而 0 將光罩圖案轉印於基板玻璃之近接式(proximity)的曝光 裝置,爲初次將液晶使用在顯示用面板製造用。該曝光裝 置處理的基板玻璃,爲了使液晶面板的生產性提昇,因而 使曝光裝置,以一次性的曝光可作成液晶面板的數量盡量 增多之方式朝大型化邁進,有時候,其尺寸可達l〇m (長 度)x5m (寬度)x8m (高度),在重量上光是載物台就 達100噸。面對曝光裝置的大型化,爲了其從裝置組裝工 場到液ΘΘΗ面板製造工場的搬運時,或是,在製造時其重量 φ 或是大小上不會造成阻礙地,使曝光裝置,或是構成曝光 裝置的載物台裝置爲:可由分割成幾部份的零件以組裝方 式而構成。 於以下的文獻中,記述有曝光裝置之載物台裝置的分 割構成以及其接連方法。於專利文獻1、2中,皆揭露出 從左右的搬入載物台,於中央的曝光載物台交互地將玻璃 基板搬運至曝光載物台,進行曝光的曝光裝置。專利文獻 1 ’爲提案出移動軌道以不分割之方式而使移動到搬入載 物台及中央的曝光載物台之引導載物台爲一體,而於左右 -5- 201015246 成2分割之構成。於專利文獻2中,爲提案出將載物台3 分割成左右的搬入載物台及曝光載物台之構成。 [專利文獻1] 日本特開2005-189775號公報 [專利文獻2] 日本特開2007-065588號公報 【發明內容】 [發明所要解決之問題] 但是’專利文獻丨,其目的在於藉由左右交互進行曝 光以謀求曝光的高效率化,並無對於前述之大型裝置之認 知’並且對於2個平台的連接,是揭示出以螺栓夾介襯墊 來連接2個平台的方法,由於移動軌道並沒有分割所以也 無須連接。另一方面,專利文獻2,雖對於大型裝置之分 割有所認知,但並沒有揭示如何連接已分割的載物台等。 本發明,是對於於先行技術中沒有認知到之以下所記 述的新課題而硏創的。亦即,先行技術的載物台裝置,是 運送分割狀態的載物台裝置之後,在裝置設置場所進行組 裝而使用的。在該組裝下的連接強度,是依賴連接時所使 用之螺絲的強度及螺絲所產生的軸向力。使用在液晶曝光 裝置的載物台,由於從其尺寸及所必要的強度考量,多以 鑄造物來製造,故用以將此等鑄造物連接之螺絲之座面的 凸凹或是傾斜,將會使軸向力降低。(第1課題) 又,載物台裝置爲大型,爲了減少支撐裝置之支撐腳 部的荷重,所以必須要有多數的腳部。載物台裝置,在組 裝完成後要連續動作數年至十年,在此期間,當設置場所 -6- 201015246 的地盤有所變動時’要對由分割狀態組裝完成之部位進行 調整’此時對於載物台下面有多數的腳部,要進行調整作 業有其困難。(第2課題) 又,對於載物台裝置的組裝部位,除了作用有使連接 面上下偏離的力量’還作用有欲使之彎曲的力量。在爲了 調整而將組裝成載物台之組裝部位的螺絲放鬆或鎖緊時, 藉由該力量,會有造成各部位自由位移,而產生調整困難 & 。(第3課題) 因此’本發明之第1目的,是在於提供一種對於加工 及運送容易之分割狀態的載物台,其中可以強化載物台在 組裝時之連接強度的液晶曝光裝置。 本發明之第2目的,是在於提供一種可以容易地組裝 ,或是即使在組裝後也可以容易地對由分割狀態組裝完成 之部位進行調整的液晶曝光裝置或液晶曝光方法、以及曝 光裝置的組裝或調整方法。 [發明解決問題之技術手段] 爲了達成第1目的,本發明,是對於搬運基板的複數 個平台,以及在搬送後的曝光位置將光罩板的圖案燒入於 上述基板表面的顯示用面板曝光裝置,上述複數個平台中 之至少一個平台爲具有多角柱之構造的連接平台,且至少 其一部分爲中空,並具有與其他的2個平台接觸的連接面 ,來作爲其第1特徵。 又,爲了達成第1目,本發明,是於第1特徵再加上 201015246 :在上述連接面的內側,於締結用之螺絲或是螺帽用之座 面以及與該座面相對向的面,具有至少比座面直徑還大的 孔,來作爲第2特徵。 再者,爲了達成第1目的,本發明,是於第2特徵再 加上:上述座面是藉由穿過上述孔之切削手段所加工,來 作爲第3特徵。 又,爲了達成第2目的,本發明,是具有平台上下調 整製程,該平台上下調整製程是將上述複數個平台中之具 有連接面之2個平台中之一方之平台之上述連接面所設的 突起部,插入於設在另一方之平台之上述連接面的凹部, 從上述另一方之平台的上表面使上述突起部上下移動,來 將上述一方之平台的位置上下調整,來作爲第4特徵。 再者,爲了達成第2目的,本發明,是於第4特徵再 加上:具有上述平台上下調整製程,以及如下之平台上下 調整製程:將與於上述另一方之平台之上述連接面所設的 凹部鄰接且設於上述另一方之平台之上述連接面的突起部 ,插入與於上述一方之平台之上述連接面所設的突起部鄰 接且設於上述一方之平台之上述連接面的凹部,從上述一 方之平台的上表面使上述突起部上下移動,來將上述一方 之平台的位置上下調整,來作爲第5特徵。 又’爲了達成第2目的,本發明,是將於上述複數個 平台中之2個平台之連接面所設之空氣存積室中的空氣量 予以調節,來作爲第6特徵。 201015246 [發明效果] 根據本發明,可以提供對於加工及運送容易之分割狀 態的載物台,可以強化載物台在組裝狀態下之連接強度的 液晶曝光裝置。 又,根據本發明,可以提供可容易地組裝、或是即使 在組裝後也可以容易地對由分割狀態組裝完成之部位進行 調整的液晶曝光裝置或液晶曝光方法、以及曝光裝置的組 裝或調整方法。 【實施方式】 以下,參照圖面針對用以實施本發明之最佳形態進行 說明。 第1圖,是顯示依本發明之液晶曝光裝置之一實施例 的立體圖。載物台1,是由:平台10、連接平台11、以 及平台12所構成。於載物台1的上表面設置有6根X軸 ❿軌道20 ,且於位在上述載物台1上表面之凹下的側部, 相對向地設置有線形馬達的固定子30。於X軸軌道20之 上’安裝有可於X軸方向移動的X軸可動載物台40,藉 由圖面省略顯示的線形馬達可動子可在X軸軌道2〇上移 動。 於X軸可動載物台上表面,設置有2根Y軸軌道 21。於X軸可動載物台40,係與上述載物台丨同樣地, 於位在該上表面之凹下的側部相對向地設置有線形馬達的 固定子31。於Y軸軌道21之上,安裝有γ軸可動載物台 -9- 201015246 41’藉由圖面省略顯示的線形馬達可動子可在γ軸軌道 21上移動。於Υ軸可動載物台41上,安裝有載置台50 ’可將基板玻璃載置於其上表面,沿著X軸軌道20與Υ 軸軌道21定位出載物台1上的曝光位置。 構成載物台1之平台的個數,可依據載物台1的規模 ;固定子30,31的設置數量可配合可動載物台的動作目 的;X軸軌道20、Υ軸軌道21的設置數量,可考量施加 於軌道的負荷,但並不受上述說明所限定,是可以增減。 第2圖,是針對於第1圖的裝置,顯示由平台10, 12以及連接平台11來構成載物台1的情形,且爲了說明 方便而將平台10予以拆卸後的狀態。連接平台11與平台 12,是在連接平台11之內側空間70內,使用複數根的締 結螺絲60所締結(以下亦稱「鎖固連結」)。如第2圖 之抽出圖所示,締結螺絲60之頸下部60a,由於是位於 後述第3圖之魚眼座的螺絲座面61上,所以相較於鑄造 物的粗坏表面,座面不會有凹陷不平,所以締結螺絲60 不會有鬆弛的情形。又,由於螺絲座面61是以平行於螺 絲頸下部60a的面之方式所形成,所以締結螺絲60的軸 向力不會降低而可以鎖固連結。又,於本實施例中,作爲 防塵對策即使不使用墊圏來鎖固連結亦可以具有充分的締 結力。 第3圖,是顯示於連接平台Π’在空間70內加工螺 絲座面61的方法。如前所述,若於螺絲的座面具有凹凸 或是傾斜時就會使軸向力降低,所以必須要製作成平坦無 -10- 201015246 傾斜的座面。由現今所要求之使用於液晶曝光裝置 台的尺寸與所必須的強度來考量,還有面加工機的 本身的大小就幾近lm,所以就算具有人員可進入 ’但要在連接平台1 1之空間70進行座面形成作業 能的。 在此,在本實施例中,是在連接平台11的連; 上(請參照第2圖)設置對應於螺絲座面61的加 62,並將搭載於上述面加工機頭部的加工鑽頭14 入來加工螺絲座面61。 亦即,將連接平台11載置於面加工機機床13 於連接平台11的連接面15上設置加工用孔62。 用孔62,是開設在與欲加工之螺絲座面61相對向 ,其孔徑爲可使加工鑽頭14穿通過連接平台11之 15的大小。如第3圖所示地,於連接面15上,使 用孔62於左右(於第2圖之連接時爲上下)且呈 設置。在此,加工鑽頭14通過加工用孔62,於連 1 1之空間70內的內面16加工螺絲座面61。如第 示地,對設置於連接面15上之全部的加工用孔62 螺絲座面加工。其結果,螺絲座面61,係呈列狀 於:對應於上述加工用孔62之列的上述內面16。 如第1圖所示,於連接平台11的兩側面連接 平台之情形時,其他的連接面15亦同樣地進行座 。在本實施例中,此時’螺絲座面61與加工用孔 於連接平台11之空間70內的內面16以交互地成 之載物 加工頭 的空間 是不可 妾面1 5 工用孔 予以插 上,再 該加工 的位置 連接面 該加工 列狀地 接平台 3圖所 進行該 地形成 其他的 面加工 62,是 爲一對 -11 - 201015246 並配置成一列之方式來進行加工。 第4圖是顯示以往的連接方法。在以往,係於一方的 平台17設置作業孔64,在該部分與端部藉由締結螺絲60 來連接。對於如此之以往的連接,在爲了確保平台17之 強度,是不能將用以鎖緊締結螺絲60的作業孔64的孔穴 予以增大。其結果,是無法於平台17設置如本實施例般 之加工用孔,亦無法將座面加工成平坦且無傾斜。又,由 於作業孔64之作業空間不夠充分,故難以進行作業孔64 底面之螺絲(圖示省略)的螺鎖作業。 另一方面,依據本實施例,首先由於藉由設置加工用 孔可以使座面平坦且無傾斜地予以加工,所以以較小的螺 絲就可以確保必要的連接強度。又,由於可以增多螺絲締 結根數,所以可提高連接強度。又,即使產生振動時,也 可以使由螺絲間所決定的共鳴振動數成爲振動能量較小的 高周波。此等之結果,使用上述連接平台11來連接平台 10與平台12時,由於可提高耐震性,使X軸可動載物台 在載物台1上移動時減少其變形,所以可以正確地進行載 置於載置台50上之基板玻璃的定位,進而可以提供精度 較高的曝光裝置。 又,依據本實施例,依照曝光裝置1之規模,可以進 入連接平台11的空間70內進行作業,由於螺鎖作業容易 ,所以對於載物台1的製作,可以提供作業性較高的方法 〇 再者,在上述實施例中,連接平台11之空間701雖 -12- 201015246 設置一個’若以於連接平台11之左右設置2個空間70之 方式將區隔壁設置於連接平台11中央的話,可以更進一 步提升連接平台11的彎曲剛性。其結果,可以提供精度 更加高的曝光裝置。 在上述的實施例中雖是以螺絲進行鎖固連結,但以具 有同樣功能的螺帽等來實施亦可。 第5圖,是顯示依本發明之液晶曝光裝置之另一實施 0 例的立體圖。本實施例,是在平台10、12以及連接平台 11的平台之間進行位置對準來消除階段差,用以減少該 X軸軌道20彎曲的構成與方法者。 如第5圖所示,載物台1是由平台10、連接平台11 、以及平台12等3個所構成。此3個平台10、11、12, 是由腳部111〜118等(於其他圖示並無顯示腳部)所支 撐。平台10與12,是中介連接平台11,由如先前之實施 例所示之複數根的締結螺絲60所鎖固連結。其中爲了使 φ 說明易於理解,故並無圖示出在第1圖所示之設置在載物 台1上的X軸可動載物台等。 平台10與連接平台11、連接平台11與平台12,由 於是將X軸軌道20設置在該上表面,所以當於該平台連 接端面具有階段差時,X軸軌道20就會以沿著該階段差 之方式彎曲。X軸可動平台40在位於該X軸軌道20爲彎 曲之部分的時候,由於X軸可動平台40會配合X軸軌道 20的彎曲而位移,所以載置在載置台50上之基板玻璃的 定位上就會產生誤差。 -13- 201015246 以往,平台10與連接平台11、連接平台11與平台 12之連接端面的階段差,是利用腳部111〜118的高度調 整機構來配合調整。但是,此方法,係難以只移動所欲調 整的端面,只要一以其中任一根腳部來調整平台之間的階 段差時,所連接著的平台就會一起移動。特別是,要使平 台端面降低時,即使將腳部的高度降低,由於平台之連接 面的摩擦力很大所以無法降低,而必須將連接平台的螺絲 大幅度地放鬆。當將連接平台的螺絲大幅度地放鬆時,則 在平台之間會產生間隙,在階段差調整後,一鎖緊連接平 台的螺絲時,會致使平台的姿勢有所變化。 本實施例是爲了解決此等問題之本發明的另一實施例 ,使用第5圖至第7圖加以說明。 如第5圖所示,在平台10與連接平台11的上面,設 置有用來進行在兩平台間高度方向之位置對準(以下僅稱 位置對準)的位置對準螺絲81、82、及85、86。同樣地 在連接平台11與平台12的上面,設置有位置對準螺絲 83,84 及_ 87、88 ° 第6圖,是用以說明於第5圖中之位在載物台1之平 台10與連接平台11、或是連接平台11與平台12之間, 用來進行位置對準的構成,是顯示將藉由締結螺絲60 ( 圖式省略)鎖固連結予以拆卸後之狀態者》 在本實施例中之平台10與連接平台11之位置對準, 是將在兩平台10、11的連接面所設置的位置對準突起91 、92,分別插入於設置在與位置對準突起91、92相對向 -14- 201015246 之平台之連接面的位置對準孔93、94’再從平台10與連 接平台11的上面,將位置對準螺絲85、86插入於設在位 置對準突起91、92的位置對準螺絲孔101、102中,來將 進行螺鎖鎖固之機構,藉由設於連接面的兩端側來實施。 於前述中,位置對準孔93是被製作成比位置對準突 起91更大一些,位置對準突起91在位置對準孔93之中 可以自由地移動,亦即,使平台10相對於連接平台11爲 & 了進行位置對準而可以移動。同樣地,位置對準孔94是 被製作成比位置對準突起92更大一些,位置對準突起92 在位置對準孔94之中可以自由地移動,亦即,使平台11 相對於連接平台1〇爲了進行位置對準而可以移動。 第7圖,是爲了說明以上述的機構來進行平台10與 連接平台11、或是連接平台Π與12之位置對準的方法 ,因而包含位置對準螺絲85、86的斷面圖。 如前所述,在平台1 〇的上面設有位置對準螺絲8 5, φ 其前端螺紋部係連接於連接平台11之突起92前端的位置 對準螺絲孔102,同樣地,在連接平台11的上面設有位 置對準螺絲86,其前端螺紋部係連接於平台10之位置對 準突起9 1前端的位置對準螺絲孔1 0 1。 對於平台10與連接平台11之上面的位置對準,例如 ,當將平台10上面的位置對準螺絲85予以鎖緊時,由於 連接平台11的位置對準突起92就會被拉近於平台1〇, 所以迫使連接平台11的上表面相對於平台10 —點一點地 昇上來。當將連接平台11上面的位置對準螺絲86予以鎖 -15- 201015246 緊時,由於平台10的位置對準突起91就會被拉近於連接 平台11,所以迫使平台1〇之上表面相對於連接平台11 一點一點地昇上來。在此,藉由加上設在連接面之對面側 的位置對準螺絲81、82合計4根位置對準螺絲85、86、 81及82相互協調地調整,並藉由進行平台10與11之上 表面的位置對準,而可以消除兩平台之上表面的階段差。 藉由締結螺絲螺固連結後,由於可以充分地維持締結力, 所以在此所謂消除兩平台之上表面的階段差的意思,亦指 不需要調整載物台下之各腳部111或112等的高度,而只 要使施加於各腳的荷重予以均等、或是只要調整上浮的腳 部即可。 其次,藉由同樣地進行連接平台11與平台12之上表 面的位置對準,可以完成3個平台10、11、12的位置對 準。 在上述中,可明確得知一旦以締結螺絲60等將兩平 台予以固定的話,兩平台就不會移動,在調整後,藉由將 兩螺絲鎖好,便可以防止平台不經意地移動。 依據本實施例,平台10與11之上表面的位置對準, 只要對螺絲85或是86進行螺鎖,而載物台下的腳部111 或112等也只要在最後進行簡單的調整即可。特別是平台 的尺寸較大時’由於若只操作平台中央部下面的腳部,要 進行兩平台間之上表面的位置對準是有其困難性,故依本 方法來調整實爲有用。 又,由於只在進行調整的平台10與11之間產生調整 -16- 201015246 力’所以對於目的以外的平台不會不經意地移動,而使得 調整作業變得容易。 特別是,平台尺寸即使較大,進行平台間的位置對準 ,於平台上表面’對於以往依靠平台本身自重向下方向的 力來拉下一方之平台表面的作業,現在只要操作此調整機 構所設置的螺絲即可。又,調整後的固定也只要鎖緊全部 的螺絲即可,所以可以使調整作業變得容易。 由第5圖至第7圖所示的實施例中,是在平台設置突 起、以及容納相對向之突起的孔穴,並且明確得知將平台 的突起設置於平台側面亦可以得到同樣的效果。又,構成 載物台之平台的個數,在本實施例中爲3個,但不僅限定 於此,也可以連接更多個。 在上述實施例中,雖是以螺絲來操作突起,但並不限 於螺絲’只要是可以從平台上表面操作的方法,也可以使 用其他的方法。 第8圖,是顯示依本發明之液晶曝光裝置之另一實施 例的立體圖。本實施例,爲關於更容易進行上述平台1〇 、12與連接平台U之位置對準者,在位置對準調整時減 少連接面的摩擦,位置對準調整後增大摩擦,確實地將平 台固定之構成及方法。 於第8圖,爲了說明方便,是顯示平台10與u爲拆 卸掉由締結螺絲60所鎖固連結的狀態。於連接平台1 1的 連接面15,至少設置丨個以上摩擦調整凹部丨20,並設有 連接平台11與平台10在連接後時,可以使連結凹部i 2〇 -17- 201015246 與外部的空氣相通的空氣孔121。空氣孔121,是使用管 子’連接於可以通過高壓空氣的連接部122。 連接平台10與連接平台11之後,在進行兩平台之上 表面的位置對準時’透過連接部122注入高壓空氣。例如 ,將每平方公分40kgf的高壓空氣注入摩擦調整凹部12〇 的面積3000平方公分時,於凹部整體中產生以 120000kgf的力量欲擴展於平台10與連接平台n的連接 面。藉由該力量’減少由締結螺絲60對上述連接面產生 的締結力。連接面存在有摩擦,由於當締結力減少時使平 台在連接面內方向移動的力量減少,因而容易進行由位置 對準螺絲85、86等之平台上表面的位置對準作業。 平台10與連接平台11、或是連接平台11與12之連 接,載物台1於使用時爲了減小在該連接部的變形,因而 更加多使用締結螺絲60,對於平台上表面的位置對準作 業時是從放鬆該締結螺絲60的作業開始。但該締結螺絲 60的放鬆程度將造成問題。其理由是,於該作業中,當 完全將螺絲60放鬆時平台之間的摩擦力消失全無雖可使 平台上表面的位置對準作業變得容易,但當彎曲旋轉力矩 作用於平台時,間隙在連接面間會有呈V字狀打開之情 形。在平台上表面的位置對準結束後,當再次鎖緊螺絲 60時,該間隙雖然消失,不過由於平台是以傾斜般的動 作下被連接,所以會在平台之連接面以外的部分造成位移 〇 在此,若應用本實施例的話,無須將締結螺絲60完 -18- 201015246 全放鬆,以仍殘留有軸向力之狀態進行平台上表面的位置 對準作業,由於可以縮小平台的傾斜即可進行’所以在平 台上表面的位置對準結束後,即使再次鎖緊締結螺絲60 時,平台也不會如前述傾斜般地動作,所以可以容易地進 行作業。 又,摩擦調整凹部120的容積是越少注入於此的空氣 量就越少即可。於摩擦調整凹部120之中,若置入比摩擦 & 調整凹部120的深度還薄的板來縮小容積的話,則泵浦的 負荷下降而可以使用小型的泵浦,因而具有可以提高在現 場之作業性的效果。再者,以圈圍於摩擦調整凹部120之 方式設置〇型環,來減少空氣從摩擦調整凹部120逃逸 也可以獲得同樣的效果。 再者,於摩擦調整凹部120,與注入高壓空氣相反地 ,將摩擦調整凹部120內的空氣抽出,以使之產生負壓, 除了締結螺絲60的締結力之外,再加上由負壓力所產生 φ 的力量而可以使平台連接強度更加提高。特別是,平台上 表面的位置對準完成後,藉由立即切換成負壓,可以防止 在螺絲締結完成爲止之時間中造成平台位置對準有所變化 〇 又再者’爲了使來自外部的空氣不會流入摩擦調整凹 部120以〇型環將之繞裝並於連接部122設有閥的話, 在平台上表面的位置對準完成後,只要一次抽出空氣即使 作爲曝光裝置在載物台使用中時亦可容易地持續具有效果 -19- 201015246 在本實施例中,雖是使用連接平台11,不過如第4 圖所示的先行例在直接連接平台10、12之情形時’於連 接面之至少一方的平台設置摩擦調整凹部來應用本實施例 時,亦可以取得本實施例之效果。 本發明,不僅對於液晶基板,亦可以應用在大型的薄 基板作爲顯示用面板上。 【圖式簡單說明】 第1圖是顯示依本發明之液晶曝光裝置之一實施例的 立體圖。 第2圖是顯示依本發明之液晶曝光裝置之一實施例的 立體圖。 第3圖是顯示依本發明之液晶曝光裝置之加工方法的 立體圖。 第4圖是顯示以往之載物台之連接方法的立體圖。 第5圖是顯示依本發明之液晶曝光裝置之另一實施例| 的立體圖。 第6圖是顯示依本發明之液晶曝光裝置之另一實施例 的立體圖。 第7圖是顯示依本發明之液晶曝光裝置之另一實施例 的斷面圖。 第8圖是顯示依本發明之液晶曝光裝置之另一實施例 的立體圖。 -20- 201015246 【主要元件符號說明】 1 :載物台 1 0、1 2 :平台 1 1 :連接平台 1 3 :面加工機機床 1 4 :加工鑽頭 15:連接平台之連接面 g 16:連接平台之空間內的內面 20 : X軸軌道 21 : Y軸軌道 3 0、3 1 :線形馬達固定子 40: X軸可動載物台 41 : Y軸可動載物台 5〇 :載置台 60 :締結螺絲 φ 6 1 ··螺絲座面 6 2 :加工用孔 70 :連接平台的內側空間 8 1〜8 8 :位置對準螺絲 91、92 :位置對準突起 93、94 :位置對準孔 101、102 :位置對準螺絲孔 111〜118 :(支撐)腳部 120 :摩擦調整凹部 -21 - 201015246 1 2 1 :空氣孔 122 :連接部[Technical Field] The present invention relates to a substrate manufacturing apparatus for a display panel or the like, and more particularly to a liquid crystal exposure apparatus for forming a pattern on a glass substrate. [Prior Art] A proximity exposure device in which a photomask and a substrate glass are brought close to 1 mm or less and irradiated with parallel light and 0 is used to transfer a mask pattern to a substrate glass, for the first time, liquid crystal is used for display panel manufacturing. . In order to improve the productivity of the liquid crystal panel, the substrate glass processed by the exposure apparatus advances the exposure apparatus in such a manner that the number of liquid crystal panels can be increased as much as possible by one-time exposure, and sometimes the size thereof can be increased. 〇m (length) x 5m (width) x 8m (height), the weight of the stage is 100 tons. Facing the enlargement of the exposure device, in order to carry it from the device assembly workshop to the liquid helium panel manufacturing workshop, or at the time of manufacture, the weight φ or the size is not hindered, the exposure device, or the composition The stage device of the exposure apparatus is constructed by assembling parts that are divided into several parts. In the following documents, the division configuration of the stage device having the exposure device and the method of connecting the same are described. In Patent Documents 1 and 2, exposure apparatuses that carry the exposure from the left and right loading stages and the glass substrate to the exposure stage are alternately carried out at the center exposure stage. Patent Document 1 ′ is a configuration in which a moving track is moved so as to be integrated into a loading stage and a leading stage of an exposure stage at the center, and is divided into two on the left-side -5-201015246. Patent Document 2 proposes a configuration in which the stage 3 is divided into left and right loading stages and exposure stages. [Patent Document 1] JP-A-2005-189775 [Patent Document 2] JP-A-2007-065588 [Summary of the Invention] [Problems to be Solved by the Invention] However, the patent document is intended to be interactive by left and right. Exposure to achieve high efficiency of exposure, there is no understanding of the aforementioned large-scale device' and for the connection of the two platforms, it is revealed that the two platforms are connected by a bolt-intercepting pad, since the moving track does not Split so there is no need to connect. On the other hand, Patent Document 2 recognizes the division of a large-scale device, but does not disclose how to connect a divided stage or the like. The present invention has been invented for a new subject not described below in the prior art. In other words, the prior art stage device is used by transporting the stage device in a divided state and then assembling it at the device installation place. The joint strength under this assembly depends on the strength of the screw used in the connection and the axial force generated by the screw. The stage used in the liquid crystal exposure apparatus is mostly made of a cast material due to its size and necessary strength. Therefore, the convex or concave surface of the screw used to connect the cast objects or the tilt will be Reduce the axial force. (First Problem) Further, the stage device is large, and in order to reduce the load on the support leg of the support device, it is necessary to have a large number of leg portions. The stage device shall be operated continuously for several years to ten years after the assembly is completed. During this period, when the site of the installation site -6-201015246 is changed, 'the part to be assembled by the divided state is adjusted'. For the majority of the foot below the stage, it is difficult to adjust the operation. (Second Problem) Further, in the assembly portion of the stage device, in addition to the force acting to deflect the connecting surface, the force to be bent is also exerted. When the screws assembled into the assembly portion of the stage are loosened or locked for adjustment, the force may cause free displacement of each part, which may cause adjustment difficulties. (Third Problem) Therefore, a first object of the present invention is to provide a liquid crystal exposure apparatus which can enhance the connection strength of a stage during assembly, which is a stage in which the processing and transportation are easy to be separated. A second object of the present invention is to provide a liquid crystal exposure apparatus, a liquid crystal exposure method, and an assembly of an exposure apparatus which can be easily assembled or can be easily adjusted to a portion assembled in a divided state even after assembly. Or adjust the method. [Technical means for solving the problem] In order to achieve the first object, the present invention is directed to a plurality of stages on which a substrate is transported, and a display panel in which a pattern of a mask is burned on the surface of the substrate at an exposure position after the conveyance. In the apparatus, at least one of the plurality of platforms is a connection platform having a configuration of a polygonal column, and at least a part thereof is hollow and has a connection surface in contact with the other two platforms as its first feature. Further, in order to achieve the first object, the present invention is further characterized in that the first feature is added to the first surface of the connecting surface, the seat surface for the screw or the nut for the joint, and the surface facing the seat surface. A hole having a diameter at least larger than the seating surface is used as the second feature. Further, in order to achieve the first object, the present invention is further characterized in that the seat surface is processed by a cutting means passing through the hole as a third feature. Moreover, in order to achieve the second object, the present invention has a platform up-and-down adjustment process, wherein the platform up-and-down adjustment process is provided by the connection face of one of the two platforms having the connection faces among the plurality of platforms. The protruding portion is inserted into the concave portion provided on the connecting surface of the other platform, and the protruding portion is moved up and down from the upper surface of the other platform to adjust the position of the one platform up and down as the fourth feature. . Furthermore, in order to achieve the second object, the present invention is further characterized in that the fourth feature includes: the above-mentioned platform up-and-down adjustment process, and the following platform up-and-down adjustment process: the connection surface to be connected to the other platform a protrusion that is adjacent to the connection surface of the other platform and that is adjacent to the protrusion provided on the connection surface of the one of the platforms, and is provided in a recess of the connection surface of the one of the platforms. The projections are moved up and down from the upper surface of the platform, and the position of the one of the platforms is adjusted up and down as the fifth feature. Further, in order to achieve the second object, the present invention is to adjust the amount of air in the air storage chamber provided in the connection surface of the two of the plurality of platforms as the sixth feature. [Effect of the Invention] According to the present invention, it is possible to provide a liquid crystal exposure apparatus which can enhance the connection strength of the stage in an assembled state for a stage which is easy to process and convey. Moreover, according to the present invention, it is possible to provide a liquid crystal exposure apparatus or a liquid crystal exposure method which can be easily assembled, or which can easily adjust a portion assembled in a divided state even after assembly, and an assembly or adjustment method of the exposure apparatus. . [Embodiment] Hereinafter, the best mode for carrying out the invention will be described with reference to the drawings. Fig. 1 is a perspective view showing an embodiment of a liquid crystal exposure apparatus according to the present invention. The stage 1 is composed of a platform 10, a connection platform 11, and a platform 12. Six X-axis rails 20 are provided on the upper surface of the stage 1, and the stator 30 of the linear motor is disposed opposite to the recessed side of the upper surface of the stage 1. An X-axis movable stage 40 movable in the X-axis direction is attached to the upper side of the X-axis rail 20, and the linear motor movable member which is omitted from the drawing can be moved on the X-axis rail 2''. On the upper surface of the X-axis movable stage, two Y-axis rails 21 are provided. Similarly to the above-described stage table, the X-axis movable stage 40 is provided with a stator 31 of a linear motor in a side portion recessed on the upper surface. Above the Y-axis rail 21, a γ-axis movable stage -9-201015246 41' is mounted on the γ-axis rail 21 by a linear motor mover which is omitted from the drawing. On the x-axis movable stage 41, a mounting table 50' is mounted to mount the substrate glass on the upper surface thereof, and the exposure position on the stage 1 is positioned along the X-axis rail 20 and the yoke track 21. The number of platforms constituting the stage 1 can be determined according to the scale of the stage 1; the number of the fixed holders 30, 31 can be matched with the action purpose of the movable stage; the number of the X-axis track 20 and the x-axis track 21 is set. The load applied to the track can be considered, but it is not limited by the above description, and can be increased or decreased. Fig. 2 is a view showing a state in which the stage 10 is constituted by the platforms 10 and 12 and the connection platform 11 for the apparatus of Fig. 1, and the stage 10 is detached for convenience of explanation. The connection platform 11 and the platform 12 are confined in a plurality of connection screws 60 in the inner space 70 of the connection platform 11 (hereinafter also referred to as "locking connection"). As shown in the drawing of Fig. 2, the neck lower portion 60a of the screw 60 is located on the screw seat surface 61 of the fisheye seat of Fig. 3 to be described later, so that the seat surface is not larger than the rough surface of the cast object. There will be unevenness in the depression, so the screw 60 will not be loosened. Further, since the screw seat surface 61 is formed to be parallel to the surface of the screw neck lower portion 60a, the axial force of the screw 60 can be locked without being lowered. Further, in the present embodiment, as a dustproof measure, it is possible to have a sufficient contracting force even if the mat is not used to lock the joint. Fig. 3 is a view showing the method of processing the screw seating surface 61 in the space 70 in the connection platform Π'. As mentioned above, if the seat surface of the screw has irregularities or inclinations, the axial force is lowered, so it is necessary to make a flat surface without a -10-201015246 tilt. Considering the size and necessary strength of the liquid crystal exposure apparatus required today, the size of the surface processing machine itself is almost lm, so even if there is personnel to enter 'but to connect the platform 1 1 The space 70 performs the work of forming the seat surface. Here, in the present embodiment, the attachment 62 corresponding to the screw seat surface 61 is provided on the connection of the connection platform 11 (see FIG. 2), and the machining bit 14 mounted on the head of the surface processing machine is placed. Come in to machine the screw seat surface 61. That is, the connecting hole 11 is placed on the joining surface 15 of the joining platform 11 on the surface processing machine tool 13 to provide the processing hole 62. The hole 62 is formed to face the screw seat surface 61 to be processed, and has a hole diameter that allows the machining bit 14 to pass through the connecting platform 11 15 . As shown in Fig. 3, the hole 62 is provided on the connecting surface 15 on the left and right (upper and lower in the connection of Fig. 2). Here, the machining bit 14 passes through the machining hole 62, and the screw seat surface 61 is machined in the inner surface 16 in the space 70 of the connection. As shown in the above, all the machining holes 62 provided on the joint surface 15 are machined in a screw seat surface. As a result, the screw seat surface 61 is arranged in line with the inner surface 16 corresponding to the row of the machining holes 62. As shown in Fig. 1, when the platform is connected to both sides of the connection platform 11, the other connection faces 15 are similarly seated. In this embodiment, at this time, the space between the screw seat surface 61 and the machining hole in the space 16 in the space 70 of the connection platform 11 is alternately formed into a space of the workpiece processing head. Inserted, the processed joint surface is formed by the processing of the row-like grounding platform 3 to form another surface processing 62, which is processed in a pair of -11 - 201015246 and arranged in a row. Fig. 4 is a view showing a conventional connection method. Conventionally, a working hole 64 is provided in one of the platforms 17, and the portion and the end portion are connected by a screw 60. For such a conventional connection, in order to secure the strength of the platform 17, the hole for locking the working hole 64 of the screw 60 can not be increased. As a result, the processing hole as in the present embodiment cannot be provided on the stage 17, and the seating surface cannot be processed flat and without tilting. Further, since the working space of the working hole 64 is insufficient, it is difficult to perform the screwing operation of the screw (not shown) on the bottom surface of the working hole 64. On the other hand, according to the present embodiment, first, since the seating hole can be processed flat and without inclination by providing the machining hole, the necessary joint strength can be secured with a small screw. Moreover, since the number of screw connections can be increased, the connection strength can be improved. Further, even when vibration occurs, the number of resonance vibrations determined by the screws can be made into a high frequency with a small vibration energy. As a result of the above, when the platform 10 and the platform 12 are connected by using the above-described connection platform 11, the shock resistance can be improved, and the X-axis movable stage can be reduced in deformation when it moves on the stage 1, so that it can be correctly carried. The positioning of the substrate glass placed on the mounting table 50 provides a more accurate exposure apparatus. Further, according to the present embodiment, according to the scale of the exposure apparatus 1, the work can be performed in the space 70 of the connection platform 11, and since the screw lock operation is easy, it is possible to provide a method of high workability in the production of the stage 1. Furthermore, in the above embodiment, the space 701 of the connection platform 11 is -12-201015246, and if the partition wall is disposed in the center of the connection platform 11 in such a manner that two spaces 70 are provided on the left and right of the connection platform 11, The bending rigidity of the connecting platform 11 is further improved. As a result, an exposure apparatus with higher precision can be provided. In the above embodiment, the screw is used for the locking connection, but it may be implemented by a nut having the same function or the like. Fig. 5 is a perspective view showing another embodiment of the liquid crystal exposure apparatus according to the present invention. This embodiment is a configuration and method for reducing the phase difference between the platforms 10, 12 and the platform of the connection platform 11 to eliminate the phase difference and to reduce the bending of the X-axis rail 20. As shown in Fig. 5, the stage 1 is composed of three platforms, a platform 10, a connection platform 11, and a platform 12. The three platforms 10, 11, and 12 are supported by the legs 111 to 118 and the like (the foot portions are not shown in other figures). The platforms 10 and 12 are intermediate connection platforms 11 that are lockedly coupled by a plurality of tie screws 60 as shown in the previous embodiments. In order to make the description of φ easy to understand, the X-axis movable stage or the like provided on the stage 1 shown in Fig. 1 is not shown. The platform 10 and the connecting platform 11, the connecting platform 11 and the platform 12, since the X-axis rail 20 is disposed on the upper surface, when the connecting end surface of the platform has a step difference, the X-axis rail 20 follows the stage. The way to bend is poor. When the X-axis movable platform 40 is located at the curved portion of the X-axis rail 20, since the X-axis movable platform 40 is displaced in accordance with the bending of the X-axis rail 20, the positioning of the substrate glass placed on the mounting table 50 is performed. There will be errors. -13- 201015246 In the past, the stage difference between the platform 10 and the connection platform 11 and the connection end surface of the connection platform 11 and the platform 12 was adjusted by the height adjustment mechanism of the leg portions 111 to 118. However, in this method, it is difficult to move only the end faces to be adjusted, and as long as the step difference between the platforms is adjusted by any one of the legs, the connected platforms move together. In particular, when the end surface of the platform is lowered, even if the height of the leg portion is lowered, the frictional force of the connecting surface of the platform cannot be lowered, and the screw connecting the platform must be largely relaxed. When the screws that connect the platform are greatly relaxed, a gap is created between the platforms. When the stage difference is adjusted, the posture of the platform is changed when the screws that are connected to the platform are locked. This embodiment is another embodiment of the present invention for solving such problems, and will be described using Figs. 5 to 7. As shown in FIG. 5, on the upper surface of the platform 10 and the connecting platform 11, position alignment screws 81, 82, and 85 for performing positional alignment (hereinafter referred to as positional alignment) in the height direction between the two platforms are provided. 86. Similarly, on the upper surface of the connecting platform 11 and the platform 12, positioning screws 83, 84 and _87, 88 °, FIG. 6 are provided for explaining the platform 10 of the stage 1 in FIG. Between the connection platform 11 or the connection platform 11 and the platform 12, the position for alignment is to show the state of being disassembled by the fastening screw 60 (not shown). In the embodiment, the platform 10 is aligned with the position of the connecting platform 11, and the positioning projections 91, 92 are provided at the connecting faces of the two platforms 10, 11 respectively, and are respectively inserted in the positioning projections 91, 92. Positioning the alignment holes 93, 94' with respect to the connection faces of the platforms of the platform of -14 to 201015246 and inserting the alignment screws 85, 86 from the upper surface of the platform 10 and the connection platform 11 in the alignment projections 91, 92 The position is aligned with the screw holes 101 and 102, and the mechanism for locking the screw is implemented by being provided on both end sides of the joint surface. In the foregoing, the alignment holes 93 are made larger than the alignment protrusions 91, and the alignment protrusions 91 are freely movable in the alignment holes 93, that is, the platform 10 is relatively connected. The platform 11 can be moved for positional alignment. Similarly, the alignment holes 94 are made larger than the alignment protrusions 92, and the alignment protrusions 92 are freely movable among the alignment holes 94, that is, the platform 11 is opposed to the connection platform. 1〇 It can be moved for positional alignment. Fig. 7 is a cross-sectional view showing the positional alignment screws 85, 86 for explaining the method of aligning the platform 10 with the connection platform 11 or the position of the connection platforms Π and 12 by the above mechanism. As described above, the position alignment screw 8 5 is provided on the upper surface of the platform 1 , and the front end thread portion is connected to the screw hole 102 at the front end of the projection 92 of the connection platform 11 , and similarly, on the connection platform 11 The upper surface of the platform 10 is provided with a positional alignment screw 86 whose front end threaded portion is connected to the position of the front end of the positioning projection 9 1 of the platform 10 to be aligned with the screw hole 110. For alignment of the platform 10 with the upper surface of the connection platform 11, for example, when the position above the platform 10 is locked by the screw 85, the alignment protrusion 92 will be brought closer to the platform 1 due to the position of the connection platform 11. 〇, so the upper surface of the connecting platform 11 is forced to rise up a little with respect to the platform 10. When the position on the connecting platform 11 is aligned with the screw 86 to be locked -15-201015246, since the positional alignment protrusion 91 of the platform 10 is brought closer to the connecting platform 11, the upper surface of the platform 1 is forced relative to the surface The connection platform 11 is raised little by little. Here, by adding the position alignment screws 81 and 82 provided on the opposite side of the joint surface, the four position alignment screws 85, 86, 81, and 82 are adjusted in coordination with each other, and by performing the stages 10 and 11 The position of the upper surface is aligned, and the phase difference of the surface above the two platforms can be eliminated. Since it is possible to sufficiently maintain the bonding force by the screwing of the screw, the meaning of eliminating the phase difference between the upper surfaces of the two platforms means that it is not necessary to adjust the respective foot portions 111 or 112 under the stage. The height is as long as the load applied to each leg is equalized or the foot that is raised is adjusted. Secondly, the position alignment of the three platforms 10, 11, 12 can be completed by similarly aligning the position of the connection platform 11 with the upper surface of the platform 12. In the above, it is clear that once the two platforms are fixed by the screw 60 or the like, the two platforms do not move. After the adjustment, the two screws can be locked to prevent the platform from inadvertently moving. According to the embodiment, the positions of the upper surfaces of the platforms 10 and 11 are aligned, as long as the screws 85 or 86 are screwed, and the foot portions 111 or 112 under the stage can be simply adjusted at the end. . In particular, when the size of the platform is large, it is difficult to adjust the position of the upper surface between the two platforms because only the foot portion under the central portion of the platform is operated. Therefore, it is useful to adjust according to the method. Further, since the adjustment -16 - 201015246 force is generated only between the platforms 10 and 11 for which adjustment is made, the platform other than the destination is not inadvertently moved, and the adjustment work is made easy. In particular, even if the size of the platform is large, the alignment between the platforms is performed, and on the upper surface of the platform, the operation of pulling down the surface of one of the platforms by the force of the platform itself in the downward direction is now only required to operate the adjustment mechanism. Set the screws. Further, the adjustment can be performed by simply locking all the screws, so that the adjustment work can be facilitated. In the embodiment shown in Figs. 5 to 7, the projections are provided on the platform, and the cavities which are opposed to the projections are accommodated, and it is clear that the same effect can be obtained by arranging the projections of the platform on the side of the platform. Further, the number of platforms constituting the stage is three in the present embodiment, but it is not limited thereto, and more may be connected. In the above embodiment, although the projection is operated by a screw, it is not limited to the screw ', as long as it can be operated from the upper surface of the platform, other methods can be used. Fig. 8 is a perspective view showing another embodiment of the liquid crystal exposure apparatus according to the present invention. In this embodiment, in order to facilitate the alignment of the above-mentioned platforms 1〇, 12 and the connection platform U, the friction of the connection surface is reduced during the position alignment adjustment, the friction is increased after the position alignment adjustment, and the platform is surely The composition and method of fixation. In Fig. 8, for convenience of explanation, the display platforms 10 and u are in a state in which the fastening screws 60 are detachably connected. At least one or more friction adjusting recesses 20 are provided on the connecting surface 15 of the connecting platform 1 1 , and when the connecting platform 11 and the platform 10 are connected, the connecting recesses i 2〇-17- 201015246 and the outside air can be provided. The air hole 121 is in communication. The air hole 121 is connected to a connecting portion 122 through which high-pressure air can pass. After the connection platform 10 and the connection platform 11, the high-pressure air is injected through the connection portion 122 when the alignment of the surfaces above the two platforms is performed. For example, when the high-pressure air of 40 kgf per square centimeter is injected into the area of the friction-adjusting concave portion 12A by 3,000 square centimeters, a joint surface of the platform 10 and the joint platform n is expanded in the entire concave portion with a force of 120,000 kgf. By this force, the contraction force generated by the concluding screw 60 on the above-mentioned joint surface is reduced. There is friction in the joint surface, and since the force for moving the platform in the direction of the joint surface is reduced when the contraction force is reduced, the alignment of the upper surface of the platform by the positional alignment screws 85, 86 or the like is facilitated. The platform 10 is connected to the connection platform 11 or the connection platforms 11 and 12. When the stage 1 is used, in order to reduce the deformation at the connection portion, the use of the screw 60 is more used for the alignment of the upper surface of the platform. At the time of work, the work of loosening the screw 60 is started. However, the degree of relaxation of the screw 60 will cause problems. The reason is that in this operation, when the screw 60 is completely relaxed, the friction between the platforms disappears completely, although the alignment of the upper surface of the platform can be facilitated, but when the bending rotational moment acts on the platform, The gap may open in a V shape between the joint faces. After the alignment of the upper surface of the platform is completed, when the screw 60 is locked again, the gap disappears, but since the platform is connected under the action of tilting, the displacement is caused in a portion other than the connecting surface of the platform. Here, if the present embodiment is applied, it is not necessary to fully loosen the screw 60 to -18-201015246, and the positional alignment of the upper surface of the platform can be performed while the axial force remains, since the tilt of the platform can be reduced. When the positioning of the upper surface of the platform is completed, even if the screw 60 is locked again, the platform does not move as described above, so that the work can be easily performed. Further, the volume of the friction adjusting concave portion 120 may be smaller as the amount of air injected therein is smaller. When a plate thinner than the depth of the friction &amplitude adjustment recess 120 is placed in the friction adjusting concave portion 120 to reduce the volume, the pumping load is lowered and a small pump can be used, so that it can be improved at the site. Workability. Further, the same effect can be obtained by providing the 〇-shaped ring so as to surround the friction adjusting concave portion 120 to reduce the escape of air from the friction adjusting concave portion 120. Further, in the friction adjusting concave portion 120, in contrast to the injection of the high-pressure air, the air in the friction adjusting concave portion 120 is extracted to generate a negative pressure, in addition to the contracting force of the screw 60, plus the negative pressure. Producing a force of φ can increase the strength of the platform connection. In particular, after the alignment of the upper surface of the platform is completed, by immediately switching to a negative pressure, it is possible to prevent the positional alignment of the platform from being changed during the time when the screw is completed, and again, in order to make the air from the outside If the friction adjusting recess 120 does not flow into the friction adjusting recess 120 and the valve is provided in the connecting portion 122, after the alignment of the upper surface of the platform is completed, the air is extracted once, even if it is used as an exposure device in the stage. In the present embodiment, although the connection platform 11 is used, the first example shown in FIG. 4 is in the case of directly connecting the platforms 10 and 12. When the friction adjusting concave portion is provided on at least one of the platforms to apply the present embodiment, the effects of the present embodiment can also be obtained. The present invention can be applied not only to a liquid crystal substrate but also to a large-sized thin substrate as a display panel. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing an embodiment of a liquid crystal exposure apparatus according to the present invention. Fig. 2 is a perspective view showing an embodiment of a liquid crystal exposure apparatus according to the present invention. Fig. 3 is a perspective view showing a processing method of the liquid crystal exposure apparatus according to the present invention. Fig. 4 is a perspective view showing a method of connecting a conventional stage. Fig. 5 is a perspective view showing another embodiment of the liquid crystal exposure apparatus according to the present invention. Fig. 6 is a perspective view showing another embodiment of the liquid crystal exposure apparatus according to the present invention. Figure 7 is a cross-sectional view showing another embodiment of the liquid crystal exposure apparatus according to the present invention. Fig. 8 is a perspective view showing another embodiment of the liquid crystal exposure apparatus according to the present invention. -20- 201015246 [Description of main component symbols] 1 : Stage 1 0, 1 2 : Platform 1 1 : Connection platform 1 3 : Surface processing machine 1 4 : Machining drill 15 : Connection surface of connection platform g 16: Connection Inner surface 20 in the space of the platform: X-axis rail 21: Y-axis rail 3 0, 3 1 : Linear motor stator 40: X-axis movable stage 41: Y-axis movable stage 5: Mounting table 60: Screw φ 6 1 ·· Screw seat surface 6 2 : Machining hole 70 : Inner space 8 1 to 8 8 of the connection platform : Positioning screws 91 , 92 : Positioning projections 93 , 94 : Positioning hole 101 , 102 : Positioning screw holes 111 to 118 : (support) leg 120 : friction adjusting recess 21 - 201015246 1 2 1 : air hole 122 : connecting portion

-22--twenty two-

Claims (1)

201015246 七、申請專利範圍: 1· 一種顯示用面板曝光裝置,是對於搬運基板的複 數個平台,以及在搬送後的曝光位置將光罩板的圖案燒入 於上述基板表面的顯示用面板曝光裝置,其特徵爲: 上述複數個平台中之至少一個平台爲具有多角柱之構 造的連接平台,且至少其一部分爲中空,並具有與其他的 2個平台接觸的連接面。 φ 2.如申請專利範圍第1項所記載之顯示用面板曝光 裝置,其中在上述連接面的內側,於締結用之螺絲或是螺 帽用之座面以及與該座面相對向的面,具有至少比座面直 徑還大的孔。 3. 如申請專利範圍第2項所記載之顯示用面板曝光 裝置,其中上述座面是藉由穿過上述孔之切削手段所加工 〇 4. 一種顯示用面板曝光裝置,是對於搬運基板的複 • 數個平台,以及在搬送後的曝光位置將光罩板的圖案燒入 於上述基板表面的顯示用面板曝光裝置,其特徵爲: 具有平台上下調整機構,該平台上下調整機構具備有 :對於上述複數個平台之中之具有連接面的2個平台,於 一方之平台之上述連接面所設的突起部、及可將另一方之 平台之上述連接面所設之上述突起物予以插入的凹部、以 及從上述另一方之平台的上表面使上述突起物上下移動的 突起物上下手段。 5·如申請專利範圍第4項所記載之顯示用面板曝光 -23- 201015246 裝置,其中具有:具備上述平台上下調整機構以及另一平 台上下調整機構之一對的平台上下調整機構,該另一平台 上下調整機構,係具備有:與上述平台上下調整機構鄰接 且設於上述另一方之平台之上述連接面的突起部、及能夠 將於上述一方之平台之上述連接面所設的該突起物予以插 入的凹部、以及從上述一方之平台的上表面使上述突起部 上下移動的突起物上下手段。 6. 如申請專利範圍第4或5項所記載之顯示用面板 曝光裝置,其中上述突起物上下手段,係具有:使座面撐 在具有上述凹部之平台的上表面並使另一端卡合於上述突 起部的螺絲。 7. —種顯示用面板曝光裝置,是對於搬運基板的複 數個平台,以及在搬送後的曝光位置將光罩板的圖案燒入 於上述基板表面的顯示用面板曝光裝置,其特徵爲: 具有:設於上述複數個平台之中之2個平台之連接面 的空氣存積室、以及調節上述空氣存積室之空氣量的空氣 量調節手段。 8. 如申請專利範圍第7項所記載之顯示用面板曝光 裝置,其中上述空氣存積室爲上述2個平台之中之至少一 方之連接面所設的凹部。 9. 如申請專利範圍第4項所記載之顯示用面板曝光 裝置,其中上述2個平台之中之一個平台,至少其一部分 爲中空,並具有多角柱的構造。 10. 如申請專利範圍第7項所記載之顯示用面板曝光 -24- 201015246 裝置,其中上述2個平台之中之一個平台,至少其一部分 爲中空,並具有多角柱的構造。 1 1 ·如申請專利範圍第1、9或1 0項所記載之顯示用 面板曝光裝置,其中上述多角柱爲4角柱。 12· —種顯示用面板曝光方法,是在複數個平台上搬 運基板’在搬運後的曝光位置將光罩板的圖案燒入於上述 基板表面的顯示用面板曝光方法,其特徵爲: $ 具有平台上下調整製程,並於上述平台上下調整製程 後將光罩板之圖案燒入於上述基板表面,該平台上下調整 製程,是將上述複數個平台中之具有連接面之2個平台中 之一方之平台之上述連接面所設的突起部,插入於設在另 一方之平台之上述連接面的凹部,從上述另一方之平台的 上表面使上述突起部上下移動,來將上述一方之平台的位 置上下調整。 13. 如申請專利範圍第12項所記載之顯示用面板曝 φ 光方法,其中具有上述平台上下調整製程,以及如下之平 台上下調整製程:將與於上述另一方之平台之上述連接面 所設的凹部鄰接且設於上述另一方之平台之上述連接面的 突起部,插入與於上述一方之平台之上述連接面所設的突 起部鄰接且設於上述一方之平台之上述連接面的凹部’從 上述一方之平台的上表面使上述突起部上下移動’來將上 述一方之平台的位置上下調整。 14. 一種顯示用面板曝光方法,是在複數個平台上搬 運基板’在搬運後的曝光位置將光罩板之圖案燒入於上述 -25- 201015246 基板表面的顯示用面板曝光方法,其特徵爲: 具有位置對準製程,並於上述位置對準製程後將光罩 板的圖案燒入於上述基板表面,該位置對準製程,是將於 上述複數個平台中之2個平台之連接面所設之空氣存積室 中的空氣量予以調節,來進行上述2個平台的位置對準。 15. 如申請專利範圍第14項所記載之顯示用面板曝 光方法,其中上述空氣存積室是設於上述2個平台中之至 少一方之連接面的凹部。 16. —種顯示用面板曝光裝置的組裝或是調整方法, 是在複數個平台上搬運基板,在搬運後的曝光位置將光罩 板之圖案燒入於上述基板表面之曝光裝置的組裝或是調整 方法,其特徵爲: 具有載物台上下調整製程,該載物台上下調整製程, 是將上述複數個平台中之具有連接面之2個平台中之一方 之平台之上述連接面所設的突起部,插入於設在另一方之 平台之上述連接面的凹部,從上述另一方之平台的上表面 使上述突起部上下移動,來將上述一方之平台的位置上下 調整。 17. 如申請專利範圍第16項所記載之顯示用面板曝 光裝置的組裝或是調整方法,其中更具有:將於上述複數 個平台中之2個平台之連接面所設之空氣存積室中的空氣 量予以調節之製程。 1 8 ·如申請專利範圍第1 7項所記載之顯示用面板曝 光裝置的組裝或是調整方法,其中調節上述空氣量之製程 -26- 201015246 是無須鬆緩上述連接面之締結力而進行201015246 VII. Patent application scope: 1. A panel exposure device for display, which is a display panel exposure device that burns a pattern of a mask plate on the surface of the substrate on a plurality of platforms for transporting the substrate and an exposure position after the transfer. And characterized in that: at least one of the plurality of platforms is a connection platform having a configuration of a polygonal column, and at least a part thereof is hollow, and has a connection surface in contact with the other two platforms. The display panel exposure apparatus according to claim 1, wherein a seat surface for the screw or the nut for the connection and a surface facing the seat surface are provided inside the connection surface. There are holes that are at least larger than the diameter of the seat surface. 3. The panel exposure apparatus for display according to claim 2, wherein the seating surface is processed by a cutting means passing through the hole. 4. A display panel exposure apparatus is a complex for transporting a substrate • a plurality of platforms, and a display panel exposure device for burning the pattern of the mask plate onto the surface of the substrate at the exposure position after the transfer, characterized in that: the platform up-and-down adjustment mechanism is provided: Among the plurality of platforms, the two platforms having the connection faces, the protrusions provided on the connection faces of one of the platforms, and the protrusions into which the protrusions provided on the connection faces of the other platform are inserted And a protrusion upper and lower means for moving the protrusion up and down from the upper surface of the other platform. 5. The display panel exposure -23-201015246 device of claim 4, comprising: a platform up-and-down adjustment mechanism having one of the platform up-and-down adjustment mechanism and another platform up-and-down adjustment mechanism, the other The platform up-and-down adjustment mechanism includes: a protrusion that is adjacent to the platform up-and-down adjustment mechanism and that is provided on the connection surface of the other platform; and the protrusion that can be provided on the connection surface of the one of the platforms a recessed portion to be inserted, and a projection upper and lower means for moving the projection portion up and down from the upper surface of the one of the above-mentioned platforms. 6. The display panel exposure apparatus according to claim 4, wherein the protrusion upper and lower means has a seat surface supported on an upper surface of the platform having the concave portion and the other end is engaged with The screw of the above protrusion. 7. A panel exposure apparatus for display, which is a display panel exposure apparatus that burns a pattern of a mask sheet onto a surface of the substrate on a plurality of stages on which a substrate is transported, and an exposure position after the conveyance. An air accumulating chamber provided on a connecting surface of two of the plurality of platforms, and an air amount adjusting means for adjusting the amount of air in the air accumulating chamber. 8. The display panel exposure apparatus according to claim 7, wherein the air storage chamber is a recess provided in a connection surface of at least one of the two platforms. 9. The panel exposure apparatus for display according to claim 4, wherein one of the two platforms is at least partially hollow and has a polygonal column structure. 10. The display panel according to claim 7, wherein the one of the two platforms is hollow and has a polygonal column structure. The display panel exposure apparatus according to the first, ninth or tenth aspect of the invention, wherein the polygonal column is a four-corner column. A display panel exposure method is a display panel exposure method in which a substrate is conveyed on a plurality of stages, and a pattern of a mask sheet is burned on the surface of the substrate at an exposure position after conveyance, and is characterized in that: The platform is adjusted up and down, and the pattern of the mask plate is burned on the surface of the substrate after adjusting the process up and down the platform, and the platform is adjusted up and down, which is one of the two platforms having the connection surface among the plurality of platforms. a protrusion provided on the connection surface of the platform is inserted into a recess provided in the connection surface of the other platform, and the protrusion is moved up and down from the upper surface of the other platform to open the platform Position up and down adjustment. 13. The panel exposure φ light method according to claim 12, wherein the platform up-and-down adjustment process and the following platform up-and-down adjustment process are provided: the connection surface of the platform of the other party is set a protruding portion of the connecting surface provided on the other platform is adjacent to the recessed portion, and a recessed portion adjacent to the protruding portion provided on the connecting surface of the one of the platforms and provided on the connecting surface of the one of the platforms The protrusion is moved up and down from the upper surface of the platform of the one side to adjust the position of the one platform up and down. 14. A method for exposing a panel for display, which is a display panel exposure method for transporting a substrate on a plurality of stages to burn a pattern of a mask onto the surface of the substrate of the above -25 - 201015246 on an exposure position after the conveyance. : having a position alignment process, and burning the pattern of the mask plate on the surface of the substrate after the above alignment process, the position alignment process is to be the connection surface of the two platforms of the plurality of platforms The amount of air in the air storage chamber is adjusted to align the two platforms. The display panel exposure method according to claim 14, wherein the air storage chamber is a recess provided on a connection surface of at least one of the two platforms. 16. A method of assembling or adjusting a display panel exposure apparatus, comprising: transporting a substrate on a plurality of stages, and exposing the pattern of the mask sheet to an exposure apparatus of the surface of the substrate at an exposure position after the transfer or The adjustment method is characterized in that: the upper and lower adjustment processes of the stage are set, and the upper and lower adjustment processes of the stage are provided by the connection surface of one of the two platforms having the connection faces among the plurality of platforms The protruding portion is inserted into a concave portion provided on the connecting surface of the other platform, and the protruding portion is moved up and down from the upper surface of the other platform to adjust the position of the one platform up and down. 17. The method of assembling or adjusting a display panel exposure apparatus according to claim 16, wherein the method further comprises: an air storage chamber provided in a connection surface of two of the plurality of platforms; The amount of air is adjusted to the process. 1 8 - The assembly or adjustment method of the panel exposure device for display according to Item 17 of the patent application, wherein the process of adjusting the amount of air -26-201015246 is performed without loosening the bonding force of the connection face -27--27-
TW098133402A 2008-10-03 2009-10-01 Exposure device and exposure method for display panel, and assembly or adjustment method of exposure device for display panel TW201015246A (en)

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