TW201012882A - Coating liquid, cured film, resin multilayer body, method for producing the cured film and method for producing the resin multilayer body - Google Patents

Coating liquid, cured film, resin multilayer body, method for producing the cured film and method for producing the resin multilayer body Download PDF

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TW201012882A
TW201012882A TW098122441A TW98122441A TW201012882A TW 201012882 A TW201012882 A TW 201012882A TW 098122441 A TW098122441 A TW 098122441A TW 98122441 A TW98122441 A TW 98122441A TW 201012882 A TW201012882 A TW 201012882A
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Taiwan
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group
component
coating liquid
cured film
substrate
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TW098122441A
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Chinese (zh)
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TWI462979B (en
Inventor
Naoko Abe
Kazuhiko Ito
Futoshi Utsuno
Kazuyoshi Inoue
Kenji Goto
Masahiro Sekiguchi
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Idemitsu Kosan Co
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • C09D183/08Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • C09D183/06Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/45Anti-settling agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/48Stabilisers against degradation by oxygen, light or heat

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Silicon Polymers (AREA)

Abstract

Disclosed is a coating liquid containing: (A) a hydrolysis-condensation product of silane compounds having an alkoxy group, namely (A-1) a tetraalkoxysilane compound, (A-2) an organoalkoxysilane compound containing no amino group, no epoxy group and no isocyanate group, (A-3) a silane compound having an amino group and an alkoxy group, (A-4) a silane compound having an epoxy group and an alkoxy group and (A-5) a blocked isocyanate silane compound having an alkoxy group; (B) organic polymer fine particles composed of a copolymer containing a monomer unit having an ultraviolet-absorbing group; (C) a colloidal silica; (D) a curing catalyst and (E) a dispersion medium. A cured film using the coating liquid, a resin multilayer body, a method for producing the cured film and a method for producing the resin multilayer body are also disclosed.

Description

201012882 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種塗布液、硬化膜及樹脂積層體與該硬 化膜及樹脂積層體之製造方法。 【先前技術】 熱塑性塑膠尤其是聚碳酸酯樹脂,因透明性優異、輕量 且耐衝擊性亦優異,故被廣泛用作代替玻璃之結構材料。 然而,因耐磨耗性、耐擦傷性、耐候性及耐化學性等表面 特性差’故其用途受到限制,業者迫切希望改良聚碳酸酿 基材的表面特性。 作為表面特性之改良方法’有以表面處理劑被覆聚碳酸 酉曰樹知成形品的表面之方法。例如,提出有一種於聚碳酸 醋基材之表面形成包含多官能丙烯酸系光硬化性樹脂、三 聚氰胺系或有機聚矽氧烧系熱硬化性樹脂之硬化層之方 法。 該等之中,以有機矽氧烷系樹脂被覆者,因耐磨耗性、 耐擦傷性、耐化學性優異而被認為有用。但是,利用該有 機矽氧烷系樹脂之被覆在對聚碳酸酯樹脂之密著性方面存 在問題,尤其於在室外長期使用之情形時,存在塗布層剝 落之問題。又,即使為了提高密著性或耐磨耗性而使有機 矽氧f系樹脂的膜厚變厚,亦存在於硬化時容易產生斷裂 4問’故業者迫切希望加以改良。 關於进著性之改良,專利文獻!中提出有_種將接著性 良好的各種聚合物調人塗料或硬塗材料中之方法,但耐 141326.doc 201012882 擦傷性並不充分。又’專利文獻2及3中記載有,將硬化膜 施加於基材表面’ &而在其上設置無機硬質物層,但並未 獲得充分的密著性。 專利文獻4及5中揭示有—種包含被覆層及基材之樹脂積 層體,該?皮覆層具有具備紫外線吸收能力之高分子奈米粒 子咼分散於矽氧烷基質(Si_〇骨架)中的膜内部結構。該樹 脂積層體之耐磨耗性以及基板與被覆層之初期密著性優 異,但於將該樹脂積層體用於如附雨刷之車窗等伴有劇烈 摩擦之零件之情形時,在耐擦傷性及耐磨耗性等方面尚有 改良之餘地。又,在耐久性(耐煮沸性)方面亦尚有改良之 餘地。 專利文獻1:日本專利特開平u_43646號公報 專利文獻2:日本專利特開昭58_29835號公報 專利文獻3:曰本專利特開昭64-4343號公報 專利文獻4 : WO 2006/022347號小冊子 專利文獻5 : WO 2007/099784號小冊子 【發明内容】 發明所欲解決之問題 本發明係於上述情況下完成者,其目的在於提供一種形 成如下硬化膜之塗布液,該硬化膜即使不使用底塗劑亦對 基材或無機硬質物層、透明導電膜及光觸媒層具有良好之 密著性’並且具有優異之耐磨耗性、耐擦傷性、耐撓曲 性、耐候性(紫外線吸收能力)、耐久性(耐煮沸性)等特 性,將該塗布液硬化而成之具有上述特性之硬化膜及於基 141326.doc 201012882 材上,、有該硬化膜之樹脂積層體,·與該硬化膜及樹脂積層 體之製造方法。 解決問題之技術手段 、本發明者們對形成具有上述特性之硬化膜的塗布液反覆 進行努力研究,結果獲得下述知識見解。 本發明者們發現:藉由將包含具有烷氧基之矽烷化合物 的水解縮合物、含有包含具有紫外線吸收基之單體單元之 共聚物的有機咼分子微粒、膠體二氧化矽、硬化觸媒及分 散介質之塗布液加熱使其硬化,而獲得具有所需特性之硬 化膜’並且藉由使該硬化膜形成於基材上或者無機硬質物 層、透明導電膜及光觸媒層的各層與基材之間,而獲得所 需之樹脂積層體。 本發明係基於上述知識見解而完成者。 亦即’本發明提供一種下述之塗布液、硬化膜及樹脂積 層體與該硬化膜及樹脂積層體之製造方法。 [1]一種塗布液’其特徵在於包含下述(A)〜(E)成分: (A)下述(A-1)〜(A-5)成分之具有烷氧基之矽烷化合物的水 解縮合物, (A-1)四烷氧基矽烷化合物, (A-2)不含胺基、環氧基及異氰酸酯基之有機烷氧基矽 烧化合物, (A-3)具有胺基及烷氧基之矽烷化合物, (A-4)具有環氧基及烷氧基之矽烷化合物, (A-5)具有烷氧基之封端化異氰酸基矽烷化合物; 141326.doc 201012882 (B) 含有包含具有紫外線吸收基之單體單元之共聚物的有 機高分子微粒; (C) 膠體二氧化矽; (D) 硬化觸媒; (E) 分散介質。 [2] 如[1]之塗布液,其更包含(F)經矽烷化合物處理之氧化 飾、及(G)分散穩定劑。 [3] 如[1]或[2]之塗布液,其中(A-1)成分為以下述通式(1)所 表示之四烷氧基矽烷化合物:[Technical Field] The present invention relates to a coating liquid, a cured film, a resin laminate, and a method for producing the cured film and the resin laminate. [Prior Art] Thermoplastic plastics, especially polycarbonate resins, are widely used as structural materials instead of glass because of their excellent transparency, light weight, and excellent impact resistance. However, since the surface properties are poor due to abrasion resistance, scratch resistance, weather resistance, and chemical resistance, the use thereof is limited, and it is highly desired to improve the surface characteristics of the polycarbonate base material. As a method for improving the surface characteristics, there is a method in which the surface of the molded article is coated with a polycarbonate treatment with a surface treatment agent. For example, a method of forming a cured layer containing a polyfunctional acrylic photocurable resin, a melamine-based or an organopolyoxygenated thermosetting resin on the surface of a polycarbonate substrate has been proposed. Among these, those covered with an organic siloxane-based resin are considered to be useful because they are excellent in abrasion resistance, scratch resistance, and chemical resistance. However, the coating of the organic siloxane-based resin has a problem in adhesion to the polycarbonate resin, and in particular, when it is used outdoors for a long period of time, there is a problem that the coating layer is peeled off. Further, even if the film thickness of the organic fluorene f-based resin is increased in order to improve the adhesion or the abrasion resistance, it is likely to be broken at the time of curing. About patent improvement, patent document! Among them, there are proposed methods for adjusting various kinds of polymers to be used in hard coating or hard coating materials, but resistance is not sufficient. 141326.doc 201012882 The scratch resistance is not sufficient. Further, in Patent Documents 2 and 3, the cured film is applied to the surface of the substrate and the inorganic hard layer is provided thereon, but sufficient adhesion is not obtained. Patent Documents 4 and 5 disclose a resin laminate including a coating layer and a substrate. The sheath layer has a film internal structure in which a polymer nanoparticle having an ultraviolet absorbing ability is dispersed in a siloxane matrix (Si_〇 skeleton). The resin laminate has excellent abrasion resistance and initial adhesion between the substrate and the coating layer. However, when the resin laminate is used for a member such as a window with a wiper, which is accompanied by severe friction, it is resistant to abrasion. There is still room for improvement in terms of sex and wear resistance. In addition, there is still room for improvement in durability (boil resistance). Patent Document 1: Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. 5: WO 2007/099784 SUMMARY OF INVENTION PROBLEMS TO BE SOLVED BY THE INVENTION The present invention has been made in view of the above circumstances, and an object thereof is to provide a coating liquid which forms a cured film which does not use a primer even if it is not used. It also has good adhesion to the substrate or inorganic hard layer, transparent conductive film and photocatalyst layer, and has excellent wear resistance, scratch resistance, flex resistance, weather resistance (UV absorption capacity), and durability. Properties such as properties (boil resistance), a cured film having the above characteristics, and a base material, a resin laminate having the cured film, and a cured film and resin A method of manufacturing a laminate. MEANS FOR SOLVING THE PROBLEMS The present inventors have conducted intensive studies on the formation of a coating liquid for forming a cured film having the above characteristics, and as a result, obtained the following knowledge. The present inventors have found that a hydrolyzed condensate comprising a decane compound having an alkoxy group, an organic cerium molecular microparticle containing a copolymer containing a monomer unit having an ultraviolet absorbing group, a colloidal cerium oxide, a hardening catalyst, and The coating liquid of the dispersion medium is heated to be hardened to obtain a cured film having desired characteristics and formed by forming the cured film on the substrate or the layers of the inorganic hard layer, the transparent conductive film and the photocatalyst layer, and the substrate. In order to obtain the desired resin laminate. The present invention has been completed based on the above knowledge findings. That is, the present invention provides a coating liquid, a cured film, a resin laminate, and a method for producing the cured film and the resin laminate. [1] A coating liquid characterized by comprising the following components (A) to (E): (A) Hydrolysis condensation of a decyl compound having an alkoxy group of the following components (A-1) to (A-5) (A-1) a tetraalkoxy decane compound, (A-2) an organoalkoxy oxime compound containing no amine group, epoxy group and isocyanate group, (A-3) having an amine group and an alkoxy group a decane compound, (A-4) a decane compound having an epoxy group and an alkoxy group, (A-5) a blocked isocyanatodecane compound having an alkoxy group; 141326.doc 201012882 (B) Organic polymer microparticles comprising a copolymer of monomer units having an ultraviolet absorbing group; (C) colloidal cerium oxide; (D) a hardening catalyst; (E) a dispersion medium. [2] The coating liquid according to [1], which further comprises (F) an oxidizing agent treated with a decane compound, and (G) a dispersion stabilizer. [3] The coating liquid according to [1] or [2], wherein the component (A-1) is a tetraalkoxydecane compound represented by the following formula (1):

Si(〇R1)4……(1) [式中,R1表示碳數為1〜4之烷基或具有醚鍵之烷基;複數 個R1可相同亦可不同]。 [4] 如[1]或[2]之塗布液,其中(A-2)成分為以下述通式(2)所 表示之不含胺基、環氧基及異氰酸酯基之有機烷氧基矽燒 化合物: R2aSi(〇R3)4.a ……(2) [式中,R2表示碳數為1〜10之烷基或氟烷基;乙烯基;笨 基;或者經曱基丙烯醯氧基取代之碳數為1〜3之烷基,R3 表示碳數為1〜4之烷基或具有醚鍵之烷基’ a表示1或2;於 R2為複數個之情形時,複數個R2可相同亦可不同,複數個 OR3可相同亦可不同]。 [5] 如[1]或[2]之塗布液,其中(A-3)成分為以下述通式(3)所 表示之具有胺基及烷氧基之矽烷化合物: R4bSi(〇R5)4.b ……(3) 141326.doc -6 * 201012882 [式中’ R4表示碳數為1〜4之烷基;乙烯基;苯基;或者經 選自甲基丙烯醯氧基、胺基(-NH2基)、胺基烷基[•(chJx-NH2基(其中’ X為1〜3之整數)]、烧基胺基[-NHR基(其中, R為碳數1〜3之烧基)]中的1種以上基所取代之碳數為1〜3之 院基,R4之至少1個表示經胺基、或胺基烷基或烷基胺基 中之任一者所取代之碳數為1〜3之烷基;R5表示碳數為1〜4 之烧基,b表示1或2;於R4為複數個之情形時,複數個 可相同亦可不同,複數個OR5可相同亦可不同]。 [6] 如[1]或[2]之塗布液,其中(A-4)成分為以下述通式(4)所 表示之具有環氧基及烷氧基之矽烷化合物: R6〇Si(OR7)4.c ……(4) [式中,R6表示碳數為1〜4之烷基;乙烯基;苯基;或者經 選自曱基丙稀醯氧基、環氧丙氧基、3,4-環氧基環己基中 的1種以上基所取代之碳數為1〜3之烷基,r6之至少i個表 示經環氧丙氧基或3,4-環氧基環己基所取代之碳數為1〜3之 烧基,R表示碳數為1〜4之烧基,c表示1或2;於R6為複數 個之情形時,複數個R6可相同亦可不同,複數個〇R7可相 同亦可不同]。 [7] 如[1]或[2]之塗布液,其中(A-5)成分為以下述通式(5)所 表示之具有烷氧基之封端化異氰酸基矽烷化合物: R8dSi(OR9)4_d (5) [式中,R8表示碳數為1〜4之烷基;乙烯基;笨基;或者經 選自甲基丙烯醯氧基、封端化異氰酸酯基中的丨種以上基 所取代之碳數為1〜3之烷基,R8之至少1個表示經封端化異 141326.doc 201012882 氰酸酯基所取代之碳數為1〜3之烷基;R9表示碳數為1〜4之 炫基,d表示1或2,於R8為複數個情形時,複數個r8可相 同亦可不同’複數個OR9可相同亦可不同]。 [8] 如[1]至[7]中任一項之塗布液,其係於向使(A1)成分、 (A-2)成分及(A-4)成分的水解縮合物與(B)〜成分接觸而 獲得之反應產物中加入(A-5)成分並使其反應後,進而加 入(A-3)成分並使其反應而成者。 [9] 如第[1]至[7]中任一項之塗布液,其係於向藉由將包含 (A-1)成分、(A-2)成分、(A-4)成分及(B)〜(E)成分之混合物 加熱而獲得之反應產物中加入(A-5)成分並使其反應後, 進而加入(A-3)成分並使其反應而成者。 [10] —種硬化膜’其係使如上述[1]至[9]中任一項之塗布液 硬化而成者。 [11] 一種樹脂積層體,其特徵在於具有:基材、及直接形 成於該基材上之如[10]之硬化膜。 [12] —種樹脂積層體,其特徵在於具有:基材、形成於該 基材上之如[10]之硬化膜、及形成於上述硬化膜上之無機 層。 [13] —種樹脂積層體,其特徵在於具有:基材、形成於該 基材上之如[10]之硬化膜、及形成於上述硬化膜上之透明 導電膜。 [14] 一種樹脂積層體’其特徵在於具有:基材、形成於該 基材上之如[10]之硬化膜、及形成於上述硬化膜上之光觸 媒層 141326.doc 201012882 [15] 如Π3]之樹脂積層體,其中上述硬化膜之厚度為 0.1〜50 μιη 〇 [16] 如[13]之樹月曰積層體’其中上述透明導電膜之載子濃 度為lxl018/cm3以上。 [17] 如[13]之樹脂積層體,其中上述基材為樹脂基材。 [18] 如[11]、[12]及[17]中任一項之樹脂積層體,其中上述 基材具有凹凸。 [19] 如[11]、[12]、[17]及[18]中任一項之樹脂積層體,其 中上述基材呈橢圓柱形。 [20] 如[11]、[12]、[17]及[18]中任一項之樹脂積層體,其 中上述基材呈圓柱形。 [21] 如[11]、[12]、[17]至[20]中任一項之樹脂積層體,其 中在上述基材之未形成硬化膜的面上具有樹脂層。 [22] 如[11]、[12]、[14]、[17]至[21]中任一項之樹脂積層 體’其中上述硬化膜之厚度為〇.5〜6 μιη。 [23] 如[11]、[12]、[14]、[17]至[22]中任一項之樹脂積層 體’其中基材為聚酯樹脂、聚碳酸酯樹脂或聚烯烴系樹 脂。 [24] —種硬化膜之製造方法’其特徵在於包括:將上述 至[9]中任一項之塗布液加熱並使其硬化之步驟。 [25] —種樹脂積層體之製造方法,其特徵在於包括:將如 上述[1]至[9]中任一項之塗布液塗布於基材上之步驟、使 上述塗布液乾燥之步驟、對上述基材進行熱成形之步驟、 使上述塗布液硬化而設置塗布層之步驟。 141326.doc 201012882 [26] 如[25]之樹脂積層體之製造方法,其更包括··在使上 述塗布液硬化而成之樹脂積層體之不具有塗布層的面上設 置樹脂層之步驟。 [27] —種樹脂積層體之製造方法,其特徵在於包括:在基 材上形成使如上述⑴至[9]中任—項之塗布液硬化而成之 硬化膜之步驟、在上述硬化膜上形成透明導電膜之步驟。 [28] —種樹脂積層體之製造方法,其特徵在於包括:在基 材上形成使如上述⑴至[9]中任一項之塗布液硬化而成之 硬化膜之步驟、在上述硬化膜上形成光觸媒層之步驟。 發明之效果 根據本發明,可提供一 種形成如下硬化膜之塗布液,該 硬化膜即衫❹底塗㈣對歸或無物層、透明 導電模及光觸媒層具有良好之密著性,並且具有優異的对 磨耗性、< 擦傷性、耐撓曲性、财候性(紫外線吸收能 力)、耐久性(耐煮沸性)等特性。 又根據本發明’可提供一種使上述塗布液硬化而成之 具有上述特性之硬化媒,以及在基材上或者在無機硬質物 層透月導電膜及光觸媒層的各層與基材之間具有該硬化 膜之樹脂積㈣,與該硬化膜及難積層社製造方法。 【實施方式】 首先,對本發明之塗布液加以說明。 [塗布液] 本發明之塗布液之特徵在於包含下述(A)〜⑻成分。 ((A)成分) 141326.doc -10- 201012882 本發月之塗布液含有下述(A.1)〜(Ad)之5種化合物的水 解縮合物作為(A)成分之具有烧氧基之石mb合物的水解 縮合物。水解縮合物可為(Α_υ〜(Α·5)中之單獨化合物的水 解縮0物’亦可為包含(Α·1)〜(Α-5)中之任意2種以上之混 合物的水解縮合物。 於本發明中,所謂具有烷氧基之矽烷化合物,係指烷氧 基矽烷化合物及/或其部分縮合物;所謂烷氧基矽烷化合 物的邛刀縮合物,係指炫氧基碎院化合物的一部分進行縮 合,於分子内形成矽氡烷鍵(Si-Ο鍵)而成之聚烷氧基矽烷 化合物或聚有機烷氧基矽烷化合物。 又’所謂具有燒氧基之矽烷化合物的水解縮合物,係指 除包含具有烷氧基之矽烷化合物的水解縮合物以外,亦包 含水解縮合前的該具有烷氧基之矽烷化合物之狀態者。 <(A-1)化合物> (Λ-1)化合物為四烷氧基矽烷化合物。又,亦可使用以 石夕氧烧鍵(Si-◦鍵)而鍵結之部分縮合物(聚烷氧基矽烷化合 物)°該等化合物可單獨使用1種,亦可組合使用2種以 上。 作為(A-1)化合物,四烷氧基矽烷化合物及其部分縮合 物例如可以下述通式(1)表示,尤其適宜的是以下述通式 (6)所表示之化合物。Si(〇R1)4 (1) wherein R1 represents an alkyl group having 1 to 4 carbon atoms or an alkyl group having an ether bond; a plurality of R1's may be the same or different. [4] The coating liquid according to [1] or [2], wherein the component (A-2) is an organoalkoxy group having no amine group, epoxy group or isocyanate group represented by the following formula (2) Calcined compound: R2aSi(〇R3)4.a (2) wherein R2 represents an alkyl group having 1 to 10 carbon atoms or a fluoroalkyl group; a vinyl group; a stupid group; or a mercaptopropenyloxy group Substituting an alkyl group having a carbon number of 1 to 3, R3 represents an alkyl group having a carbon number of 1 to 4 or an alkyl group having an ether bond 'a represents 1 or 2; when R2 is plural, a plurality of R2 may be The same or different, multiple OR3s can be the same or different]. [5] The coating liquid according to [1] or [2], wherein the component (A-3) is a decane compound having an amine group and an alkoxy group represented by the following formula (3): R4bSi(〇R5)4 .b ......(3) 141326.doc -6 * 201012882 [wherein R4 represents an alkyl group having a carbon number of 1 to 4; a vinyl group; a phenyl group; or an alkyl group selected from the group consisting of methacryloxy groups and amine groups ( -NH2 group), aminoalkyl group [•(chJx-NH2 group (wherein 'X is an integer of 1 to 3)], an alkylamino group [-NHR group (wherein R is a carbon number of 1 to 3) a compound having one or more substituents substituted with a carbon number of 1 to 3, and at least one of R4 representing a carbon substituted with an amine group, or an aminoalkyl group or an alkylamine group The number is 1 to 3 alkyl groups; R5 represents a carbon number of 1 to 4, and b represents 1 or 2; when R4 is plural, the plurality may be the same or different, and the plurality of OR5 may be the same [6] The coating liquid according to [1] or [2], wherein the component (A-4) is a decane compound having an epoxy group and an alkoxy group represented by the following formula (4): R6 〇Si(OR7)4.c (4) [wherein R6 represents an alkyl group having a carbon number of 1 to 4; a vinyl group; a phenyl group; An alkyl group having 1 to 3 carbon atoms substituted with one or more groups selected from the group consisting of mercaptopropyloxycarbonyl, glycidoxy, and 3,4-epoxycyclohexyl, and at least i of r6 The alkyl group having a carbon number of 1 to 3 substituted by a glycidoxy group or a 3,4-epoxycyclohexyl group, R represents a burning group having a carbon number of 1 to 4, and c represents 1 or 2; In the case of plural cases, a plurality of R6 may be the same or different, and a plurality of 〇R7 may be the same or different.] [7] The coating liquid of [1] or [2], wherein the component (A-5) is the following The blocked isocyanatodecane compound having an alkoxy group represented by the formula (5): R8dSi(OR9)4_d (5) wherein R8 represents an alkyl group having a carbon number of 1 to 4; a stupid group; or an alkyl group having 1 to 3 carbon atoms substituted with an anthracene group selected from a methacryloxy group and a blocked isocyanate group; at least one of R8 represents a blocked group 141326.doc 201012882 The cyanate group is substituted with an alkyl group having 1 to 3 carbon atoms; R9 is a shinyl group having a carbon number of 1 to 4, and d is 1 or 2, and when R8 is plural, a plurality of r8 Can be the same or different 'multiple OR9 can be the same or different】 [8] The coating liquid according to any one of [1] to [7], which is a hydrolysis condensate of (A1) component, (A-2) component and (A-4) component, and (B) The component (A-5) is added to the reaction product obtained by contacting the component, and then reacted, and then the component (A-3) is further added and reacted. [9] As described in [1] to [7] The coating liquid according to any one of the preceding claims, which is obtained by heating a mixture comprising the components (A-1), (A-2), (A-4) and (B) to (E) After the component (A-5) is added to the reaction product and reacted, the component (A-3) is further added and reacted. [10] A cured film which is obtained by hardening the coating liquid according to any one of the above [1] to [9]. [11] A resin laminate comprising: a substrate; and a cured film of [10] directly formed on the substrate. [12] A resin laminated body comprising: a substrate; a cured film of [10] formed on the substrate; and an inorganic layer formed on the cured film. [13] A resin laminated body comprising: a substrate; a cured film of [10] formed on the substrate; and a transparent conductive film formed on the cured film. [14] A resin laminate] characterized by comprising: a substrate, a cured film such as [10] formed on the substrate, and a photocatalyst layer formed on the cured film 141326.doc 201012882 [15] The resin laminate in which the thickness of the cured film is 0.1 to 50 μm 〇 [16], such as the tree sap structure of [13], wherein the carrier concentration of the transparent conductive film is lxl018/cm3 or more. [17] The resin laminate according to [13], wherein the substrate is a resin substrate. [18] The resin laminate according to any one of [11], wherein the substrate has irregularities. [19] The resin laminate according to any one of [11], [12], [17], or [18] wherein the substrate is an elliptical cylinder. [20] The resin laminate according to any one of [11], [12], [17], or [18] wherein the substrate is cylindrical. [21] The resin laminate according to any one of [11], wherein the resin substrate is provided on a surface of the substrate on which the cured film is not formed. [22] The resin laminate of any one of [11], [12], [14], [17] to [21] wherein the thickness of the cured film is 〇.5 to 6 μmη. [23] The resin laminate of any one of [11], [12], [14], [17] to [22] wherein the substrate is a polyester resin, a polycarbonate resin or a polyolefin resin. [24] A method for producing a cured film, which comprises the step of heating and hardening the coating liquid according to any one of the above [9]. [25] A method for producing a resin layered product, comprising the steps of: applying a coating liquid according to any one of [1] to [9] to a substrate, and drying the coating liquid, The step of thermoforming the substrate, and curing the coating liquid to form a coating layer. The method for producing a resin laminate according to [25], further comprising the step of providing a resin layer on a surface of the resin laminate obtained by curing the coating liquid without a coating layer. [27] A method for producing a resin laminated body, comprising: forming a cured film obtained by hardening a coating liquid according to any one of the above (1) to [9] on a substrate, and the cured film The step of forming a transparent conductive film thereon. [28] A method of producing a resin laminated body, comprising: forming a cured film obtained by hardening a coating liquid according to any one of (1) to [9] above, on the substrate, and the cured film The step of forming a photocatalyst layer thereon. Advantageous Effects of Invention According to the present invention, it is possible to provide a coating liquid which forms a cured film which is excellent in adhesion to a layer of a ruthenium or a material, a transparent conductive mold and a photocatalyst layer, and which is excellent in a coating film. Characteristics such as abrasion resistance, <scratch resistance, flex resistance, financial property (ultraviolet absorbing ability), durability (boil resistance). According to the present invention, it is possible to provide a curing medium having the above characteristics obtained by curing the coating liquid, and to have the substrate or the substrate between the layers of the inorganic hard layer and the photoconductive layer and the photocatalyst layer. The resin product of the cured film (4), and the method for producing the cured film and the difficult-to-layer layer. [Embodiment] First, the coating liquid of the present invention will be described. [Coating Liquid] The coating liquid of the present invention is characterized by comprising the following components (A) to (8). (Component (A)) 141326.doc -10- 201012882 The coating liquid of the present month contains a hydrolysis condensate of five compounds of the following (A.1) to (Ad) as the component (A) having an alkoxy group. A hydrolysis condensate of a stone mb complex. The hydrolysis condensate may be a hydrolyzed condensate of (a single compound in Α_υ~(Α·5)' may be a hydrolysis condensate containing a mixture of any two or more of (Α·1)~(Α-5) In the present invention, a decane compound having an alkoxy group means an alkoxy decane compound and/or a partial condensate thereof; a so-called alum condensate of an alkoxy decane compound means a oxy-oxyl compound A part of a polyalkoxy decane compound or a polyorgano alkoxy decane compound formed by condensation of a decane bond (Si-Ο bond) in a molecule. Further, a hydrolytic condensation of a decane compound having an alkoxy group The term "containing a hydrolyzed condensate of a decane compound having an alkoxy group, and a state of the alkoxy group-containing decane compound before hydrolysis and condensation. - (A-1) compound > 1) The compound is a tetraalkoxydecane compound. Further, a partial condensate (polyalkoxydecane compound) bonded by a sulphur-oxygen bond (Si-oxime bond) may be used. These compounds may be used alone. One type may be used in combination of two or more types. Of (A-1) compound, an alkoxy silicon tetraalkoxy compound and a partial condensate of example by the following general formula (1), is a particularly suitable compound of the following general formula (6) represented by the.

Si(OR,)4…⑴ [式中’ R1為碳數1〜4之烷基或具有醚鍵之烷基;複數個R〗 可相同亦可不同]。 141326.doc 201012882 [化i]Si(OR,)4 (1) [wherein R1 is an alkyl group having 1 to 4 carbon atoms or an alkyl group having an ether bond; and a plurality of R's may be the same or different]. 141326.doc 201012882 [化i]

R’OR’O

…· ($) [式中,R1與上述相同,!!為hi 5之整數]。 於上述通式(1)及(6)中,作為碳數為【〜4之烷基,可列 舉:曱基、乙基、正丙基、異丙基、正丁基、各種丁基; 又,作為R1為具有醚鍵的碳數為卜4之烷基之〇Rl,例如可 列舉:2-甲氧基乙氧基、3_曱氧基丙氧基等。 作為(A-1)化合物之四烷氧基矽烷化合物,可列舉:四 曱氧基矽烷、四乙氧基矽烷、四正丙氧基矽烷、四異丙氡 基矽烷、四正丁氧基矽烷、四異丁氧基矽烷等。 又,作為聚烷氧基矽烷化合物,可列舉:多摩化學工業 股份有限公司製造之「M Silicate 51」、「Silicate 4Q/、' 「Sihcate 45」;Colcoat股份有限公司製造之「矽酸甲酯 51」、「矽酸甲酯53A」、「矽酸乙酯4〇」、「矽酸乙酯48 等。 」 <(A-2)化合物> (A-2)化合物為不含胺基、環氧基及異氰酸酯基之有機 烷氧基矽烷化合物。又,亦可使用其部分縮合物。該等化 合物可單獨使用1種,亦可組合使用2種以上。 作為(A-2)化合物,有機烷氧基矽烷化合物及其部分缩 合物較好的是2官能烷氧基矽烷、3官能烷氧基矽烷,例如 141326.doc -12- 201012882 可以下述通式(2)表示’尤其適宜的是以下述通式(?)所表 示之化合物。 R2aSi(〇R3)4-a ......(2) [式中,R2為碳數1〜10之烷基或氟烷基;乙烯基;苯基; 或者經甲基丙烯醯氧基取代之碳數為1〜3之烷基,R3為碳 數1〜4之烷基或具有醚鍵之烧基,a為1或2 ;於R2為複數個 之情形時’複數個R2可相同亦可不同,複數個〇R3可相同 亦可不同]。...· ($) [In the formula, R1 is the same as above,! ! is an integer of hi 5]. In the above formulae (1) and (6), examples of the alkyl group having a carbon number of [~4] include a mercapto group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, and various butyl groups; Examples of the ruthenium R1 in which R1 is an alkyl group having an ether bond and the carbon number is 4, and examples thereof include a 2-methoxyethoxy group and a 3-methoxyoxypropoxy group. The tetraalkoxydecane compound of the compound (A-1) may, for example, be tetradecyloxydecane, tetraethoxydecane, tetra-n-propoxydecane, tetraisopropyldecyldecane or tetra-n-butoxydecane. , tetraisobutoxy decane, and the like. Further, examples of the polyalkoxydecane compound include "M Silicate 51", "Silicate 4Q/," "Sihcate 45" manufactured by Tama Chemical Industry Co., Ltd.; and "methyl citrate 51 manufactured by Colcoat Co., Ltd." "Methyl decanoate 53A", "Ethyl citrate 4", "Ethyl citrate 48, etc." <(A-2) compound> (A-2) The compound is an amine group-free, Epoxy and isocyanate-based organoalkoxydecane compounds. Further, a partial condensate thereof can also be used. These compounds may be used alone or in combination of two or more. As the compound (A-2), the organoalkoxydecane compound and a partial condensate thereof are preferably a bifunctional alkoxydecane or a trifunctional alkoxydecane, for example, 141326.doc -12-201012882 may have the following formula (2) It is a compound which is represented by the following general formula (?). R2aSi(〇R3)4-a (2) wherein R2 is an alkyl group having 1 to 10 carbon atoms or a fluoroalkyl group; a vinyl group; a phenyl group; or a methacryloxy group Substituting an alkyl group having a carbon number of 1 to 3, R3 is an alkyl group having 1 to 4 carbon atoms or an alkyl group having an ether bond, and a is 1 or 2; when R2 is plural, a plurality of R2 may be the same It can also be different, and multiple 〇R3 can be the same or different].

[化2][Chemical 2]

[式中,R及R3與上述相同,爪為丨〜^之整數]。 於上述通式(2)及(7)中,作為碳數為卜⑺之烷基,可為[wherein, R and R3 are the same as described above, and the claw is an integer of 丨~^]. In the above formulas (2) and (7), the alkyl group having a carbon number of (7) may be

直鏈狀、支鏈狀中之任意者,例如可列舉:曱基、乙基' 正丙基、異丙基、各種丁基、各種己基各種辛基、各種 癸基等;作為氟燒基,例如可列舉:三敦乙基、三氣丙基 等。又,作為碳數為1〜3之烷基,可列舉:曱基、乙基、 異丙基兔數為1〜4之烧基或具有醚鍵之统基係 如上述通式(1)中所說明。 於以通式(2)所表示之有機炫氧基石夕燒化合物中,作為3 :能烷氧基矽烷,1列舉:甲基三甲氧基矽烷、甲基三乙 乳基石夕燒、甲其 一丙氧基矽烷、甲基三丁氧基矽烷、甲 141326.doc -13- 201012882 基-三(2-甲氧基乙氧基)矽烷、乙基三甲氧基矽烷、乙基三 乙氧基矽烷、乙基三丙氧基矽烷、乙基三丁氧基矽烷、乙 基-三(2-甲氧基乙氧基)矽烷、己基三甲氧基矽烷、己基三 乙氧基矽烷、己基三丙氧基矽烷、己基三丁氧基矽烷、癸 基三甲氧基矽烷、癸基三乙氧基矽烷、癸基三丙氧基矽 烷、癸基三丁氧基矽烷、於取代基中導入有氟原子之三氟 丙基三甲氧基矽烷等氟烷基(三烷氧基)矽烷、苯基三曱氧 基梦炫、苯基二乙氧基破烧、乙稀基三甲氧基梦烧、乙稀 基三乙氧基砍烧、γ-甲基丙稀瘋氧基丙基三甲氧基碎烧 等。又,亦可列舉:具有2種烷氧基之曱基二甲氧基(乙氧 基)矽烷、乙基二乙氧基(甲氧基)矽烷等。 作為2官能烷氧基矽烷,可列舉:二甲基二甲氧基矽 烷、二甲基二乙氧基矽烷、雙(2-甲氧基乙氧基)二甲基矽 烧、二乙基二乙氧基碎烧、二苯基二甲氧基碎烧、二苯基 二乙氧基矽烷等。 作為聚有機烷氧基矽烷化合物之具體例,可列舉:多摩 化學工業股份有限公司製造之「MTMS-A」;Colcoat股份 有限公司製造之「SS-101」;東麗道康寧(Toray-Dow Corning)股份有限公司製造之「AZ-6101」、「SR2402」、 「AY42-163」等。 <(A-3)化合物> (A-3)化合物為具有胺基及烷氧基之矽烷化合物,且為 不含環氧基及異氰酸酯基之烷氧基矽烷化合物。又,亦可 使用其部分縮合物(含有胺基之聚有機烷氧基矽烷化合 141326.doc • 14- 201012882 物)。該等化合物可單獨使用丨種,亦可組合使用2種以 上。 作為(A-3)化合物,含有胺基之有機烷氧基矽烷化合物 及其部分縮合物,例如可以下述通式(3)表示。 R4bSi(OR5)4.b (3) [式中,R為碳數1〜4之烷基;乙烯基;苯基;或者經選自 甲基丙烯醯氧基、胺基(_NH2基)、胺基烷基卜(CH2h_NH2 基(其中,X為1〜3之整數、烷基胺基卜NHR基(其中,尺為 碳數1〜3之烷基)中的丨種以上基所取代之碳數為卜3之烷 基,R4之至少1個為經胺基' 或者胺基烷基或烷基胺基中 之任一者所取代之碳數為i〜3之烷基;R5為碳數1〜4之烷 基’ b為1或2,於R4為複數個之情形時,複數個R4可相同 亦可不同’複數個OR5可相同亦可不同]。 於上述通式(3)中’碳數為^之烷基、碳數為i〜4之烷 基係如上述通式(1)或(2)中所說明。 作為以通式(3)所表示之含有胺基之有機烷氧基矽烷化 合物之具體例,可列舉:N-(2-胺基乙基)-3-胺基丙基曱基 二曱氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽 烧、N-(2-胺基乙基)·3_胺基丙基曱基二乙氧基矽烷、ν·(;2_ 胺基乙基)-3-胺基丙基三乙氡基矽烷、3·胺基丙基三甲氧 基石夕烧、3-胺基丙基三乙氧基矽烷、N_曱基胺基丙基三甲 氧基矽烷、N-曱基胺基丙基三乙氧基矽烷等。 又’作為含有胺基之聚有機烷氧基矽烷化合物,例如可 列舉:信越矽酮(Shin-Etsu Silicones)股份有限公司製造之 141326.doc -15- 201012882 「KBP-90 j 等。 <(A-4)化合物> (A-4)化合物為具有環氧基及烷氧基之矽烷化合物且 為不含胺基及異氰酸s旨基之絲基钱化合物。又,亦可 使用其部分縮合物(含有環氧基之聚有機烷氧基矽烷化合 物)。該等化合物可單獨使用1種,亦可組合使用2種以 上。 作為(A-4)化合物’含有環氧基之有機烷氧基矽烷化合 物及其部分縮合物。例如可以下述通式(4)表示。 [R6cSi(OR7)4.c ……⑷ [式中,R6為碳數1〜4之烷基;乙烯基;苯基;或者經選自 甲基丙稀酿氧基、環氧丙氧基、3,4•環氧基環己基中的旧 以上基所取代之碳數為丨〜3之烷基;R6之至少丨個為經環氧 丙氧基或3,4-環氧基環己基所取代之碳數為丨〜3之烷基;R7 為碳數1〜4之烷基,0為!或2 ;於尺6為複數個之情形時複 數個R6可相同亦可不同,複數個〇R7可相同亦可不同]。 於上述通式(4)中之碳數為1〜3之烷基、碳數為ι〜4之烷 基係如上述通式(1)或(2)中所說明。 作為以通式(4)所表示之含有環氧基之有機烷氧基矽烷 化合物之具體例,可列舉:3_環氧丙氧基丙基曱基二曱氡 基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、3_環氧丙 氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽 烧、2-(3,4-環氧基環己基)乙基三甲氧基矽烷、2·(3,4_環氧 基環己基)乙基三乙氧基矽烷等。 141326.doc 201012882 <(A-5)化合物> (A-5)化合物為具有烷氧基之封端化異氰酸基矽烷化合 物(一般而言’亦稱為封端化異氰酸酯基矽烷化合物),且 為雖含有封端化異氰酸酯基但不含有胺基及環氧基之烧氧 基矽烧化合物。又,亦可使用其部分縮合物(含有封端化 異氰酸醋基之聚有機烷氧基矽烷化合物)。該等化合物可 單獨使用1種’亦可使用2種以上。Examples of the linear or branched form include a mercapto group, an ethyl 'n-propyl group, an isopropyl group, various butyl groups, various hexyl groups of various octyl groups, various fluorenyl groups, and the like; For example, a triterpene ethyl group, a trimethyl propyl group, etc. are mentioned. Further, examples of the alkyl group having a carbon number of 1 to 3 include a mercapto group, an ethyl group, an alkyl group having an isopropyl group number of 1 to 4, or a system having an ether bond such as the above formula (1). Explained. In the organoxyloxy zephyr compound represented by the formula (2), 3 is an alkoxy decane, and 1 is exemplified by methyltrimethoxydecane, methyltriethyllacylate, and kiwi. Propoxydecane, methyl tributoxydecane, methyl 141326.doc -13- 201012882 ki-tris(2-methoxyethoxy)decane, ethyltrimethoxydecane, ethyltriethoxydecane , ethyl tripropoxydecane, ethyl tributoxydecane, ethyl-tris(2-methoxyethoxy)decane, hexyltrimethoxydecane, hexyltriethoxydecane, hexyltripropoxy Base decane, hexyl tributoxy decane, decyl trimethoxy decane, decyl triethoxy decane, decyl tripropoxy decane, decyl tributoxy decane, having a fluorine atom introduced into the substituent Fluoroalkyl (trialkoxy) decane such as trifluoropropyltrimethoxydecane, phenyltrimethoxy oxime, phenyldiethoxy deflagration, ethylene trimethoxy octyl, ethylene Triethoxy decocting, γ-methyl propyl madoxypropyltrimethoxy pulverization, and the like. Further, examples thereof include mercapto dimethoxy (ethoxy) decane and ethyl diethoxy (methoxy) decane having two kinds of alkoxy groups. Examples of the bifunctional alkoxydecane include dimethyldimethoxydecane, dimethyldiethoxydecane, bis(2-methoxyethoxy)dimethyloxime, and diethyldicarboxylate. Ethoxylated calcined, diphenyldimethoxy calcined, diphenyldiethoxydecane, and the like. Specific examples of the polyorgano alkoxydecane compound include "MTMS-A" manufactured by Tama Chemical Industry Co., Ltd.; "SS-101" manufactured by Colcoat Co., Ltd.; Toray-Dow Corning "AZ-6101", "SR2402", "AY42-163" manufactured by the company. <(A-3) Compound> The compound (A-3) is a decane compound having an amine group and an alkoxy group, and is an alkoxydecane compound containing no epoxy group or isocyanate group. Further, a partial condensate thereof (polyorgano alkoxydecane compound containing an amine group 141326.doc • 14-201012882) can also be used. These compounds may be used singly or in combination of two or more. The organoalkoxydecane compound containing an amine group and a partial condensate thereof as the compound (A-3) can be represented, for example, by the following formula (3). R4bSi(OR5)4.b (3) [wherein R is an alkyl group having 1 to 4 carbon atoms; a vinyl group; a phenyl group; or an alkyl group selected from a methacryloxy group, an amine group (-NH2 group), an amine Alkyl group (CH2h_NH2 group (wherein X is an integer of 1 to 3, an alkylamino group NHR group (wherein the alkyl group having a carbon number of 1 to 3) is substituted with a carbon number In the alkyl group of 3, at least one of R4 is an alkyl group having a carbon number of i to 3 substituted with an amine group or an aminoalkyl group or an alkylamine group; R5 is a carbon number of 1 The alkyl group '4 of 4' is 1 or 2. When R4 is plural, the plurality of R4 may be the same or different. 'Multiple OR5 may be the same or different.' In the above formula (3), 'carbon The alkyl group having a number of alkyl groups and having a carbon number of i to 4 is as described in the above formula (1) or (2). The organoalkoxy group having an amine group represented by the formula (3) Specific examples of the decane compound include N-(2-aminoethyl)-3-aminopropyl decyl decyloxydecane and N-(2-aminoethyl)-3-aminopropyl Trimethoxy oxime, N-(2-aminoethyl)·3_aminopropyl decyl diethoxy decane, ν·(; 2_Aminoethyl)-3-aminopropyltriethoxydecane, 3·Aminopropyltrimethoxycarbazide, 3-Aminopropyltriethoxydecane, N-decylaminopropyl Further, as a polyorgano alkoxydecane compound containing an amine group, for example, a share of Shin-Etsu Silicones can be cited as a trimethoxydecane, N-decylaminopropyltriethoxydecane, and the like. 141326.doc -15- 201012882 manufactured by the company "KBP-90 j, etc. <(A-4) compound> (A-4) The compound is a decane compound having an epoxy group and an alkoxy group and is not contained An amine group and an isocyanate s. A partial condensate (a polyorgano alkoxy decane compound containing an epoxy group) may be used. These compounds may be used alone or in combination. Two or more kinds of the compound (A-4), the epoxy group-containing organoalkoxydecane compound and a partial condensate thereof, which can be represented by the following formula (4): [R6cSi(OR7)4.c (4) [wherein, R6 is an alkyl group having 1 to 4 carbon atoms; a vinyl group; a phenyl group; or a methyl propylene oxide group, a glycidoxy group, 3, 4: The alkyl group substituted by the above upper group in the epoxycyclohexyl group is an alkyl group of 丨~3; at least one of R6 is substituted by a glycidoxy group or a 3,4-epoxycyclohexyl group. The carbon number is an alkyl group of 丨~3; R7 is an alkyl group having a carbon number of 1 to 4, and 0 is ! or 2; when the ruler 6 is plural, the plurality of R6 may be the same or different, and a plurality of 〇R7 may be used. The same or different in the above formula (4), the alkyl group having 1 to 3 carbon atoms and the alkyl group having 1 to 4 carbon atoms are as described in the above formula (1) or (2). Specific examples of the epoxy group-containing organoalkoxydecane compound represented by the formula (4) include 3-glycidoxypropyl decyl decyl decane and 3-epoxy propylene. Oxypropylmethyldiethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxysulfonate, 2-(3,4-ring Oxycyclohexyl)ethyltrimethoxydecane, 2·(3,4-epoxycyclohexyl)ethyltriethoxydecane, and the like. 141326.doc 201012882 <(A-5) compound> (A-5) compound is a blocked isocyanatodecane compound having an alkoxy group (generally 'also known as blocked isocyanate decane compound And an alkoxy sinter compound containing an blocked isocyanate group but not containing an amine group and an epoxy group. Further, a partial condensate (polyorgano alkoxy decane compound containing a blocked isocyanate group) may also be used. These compounds may be used alone or in combination of two or more.

再者’所謂封端化異氰酸基矽烷化合物’係指以肟等封 端劑(blocking agent)將異氰酸酯基加以保護而使其不活 化’再藉由加熱使其去封端化以使異氰酸酯基活化(再生) 之異氰酸基矽烷化合物(一般而言,亦稱為異氰酸酯基矽 烷化合物)。 作為(A-5)化合物,含有封端化異氰酸酯基之有機烷氧 基矽烷化合物及其部分縮合物,例如可以下述通式(5)來表 示0 R8dSi(OR9)4.d ...... (5) [式中’ R8為碳數之院基;乙稀基;苯基;或者經選自 甲基丙烯醯氧基、封端化異氰酸s旨基中的1種以上基所取 代之碳數為1 3之燒基,R8之至少t個為經封端化n㈣ 基取代?^數為1〜3之烧基;R9為碳數1〜4之烧基’ d為1或 2 ’於R為複數個情形時,複數個…可相同亦可 數個OR9可相同亦可不同]。 稷 基俜如式(5)中’碳數為1〜3之烧基、碳數為1〜4之烧 基係如上述通式(1)或(2)中所說明。 141326.doc -17. 201012882 作為以上述通式(5)所表示之含有封端化異氰酸酯基之 有機燒氧基m合物之具體例,可列舉將3_異氰酸基丙 基三甲氧基矽烷、3-異氰酸基丙基三乙氧基矽烷、3_異氰 酸基丙基曱基二甲氧基矽烷、3_異氰酸基丙基曱基二乙氧 基秒燒、3-異氰酸基丙基乙基二乙氧基石夕燒等化合物中的 異氰酸酯基以封端劑加以保護者。該等之中, 合物’可列舉:3-封端化異氣酸基丙基三乙氧基石夕烷。 作為異氰酸酯基之封端劑,可使用:丙酮肟、2_ 丁酮 _裒己酮If f基異丁基_聘等肪化合物;S·己内酿胺 等内醯胺類,.單⑥基紛(甲⑤、壬基齡等)等燒基龄類; w -甲苯盼、二第三丁基苯盼等二燒基盼類;三甲基紛 等三烷基酚類;丙二酸二乙酯等丙二酸二酯;乙醯丙酮、 乙醯乙酸乙s曰之乙醯乙酸酯等活性亞甲基化合物類;甲 醇乙醇正丁醇等醇類;甲基溶纖劑、丁基溶纖劑等含 有羥基之醚類;乳酸乙酯、乳酸戊酯等含有羥基之酯類,. 丁基硫醇、己基硫醇等硫醇類;乙醯苯胺、丙義胺、二 聚酸醯胺等醯胺類;咪唑、2_乙基咪唑等咪唑類;3,5_二 甲基比坐等吡唑類,!,2,4_三唑等三唑類,·丁二醯亞胺、 鄰^二甲酿亞胺等酿亞胺類等。χ,為了控制封端劑之解 離,撒度,亦可併用二月桂酸二丁基錫(dibutyltin dilaurate) 等觸媒。 ((B)成分) 發月之塗布液中含有有機高分子微粒(以下,有時稱 為ΠΤ刀子紫外線吸收樹脂微粒)作為(B)成分,該有機高分 141326.doc 201012882 子微粒子含有包含具有紫外線吸收基之單體單元之共聚 物。 作為該ifj分子象外線吸收樹脂微粒,例如可例示:使側 鏈上具有發揮紫外線吸收劑之作用的骨架(二笨甲鲷系、 苯并三唑系、三畊系等)之丙烯酸系單體(以下,稱為紫外 線吸收性丙烯酸系單體)與其他乙烯系不飽和化合物(丙烯 酸、曱基丙烯酸及該等之衍生物、笨乙烯、乙酸乙烯酯Further, 'so-called blocked isocyanatodecane compound' means that the isocyanate group is protected from blocking by a blocking agent such as hydrazine, and then deblocked by heating to make the isocyanate A base activated (regenerated) isocyanatodecane compound (generally, also known as an isocyanate decane compound). The (A-5) compound, an organoalkoxydecane compound containing a blocked isocyanate group, and a partial condensate thereof, for example, can be represented by the following formula (5): 0 R8dSi(OR9)4.d .... (5) [wherein R8 is a hospital base of carbon number; ethylene group; phenyl group; or one or more groups selected from the group consisting of methacryloxy group and blocked isocyanate The substituted carbon number is a pyridyl group of 1, 3, and at least t of R8 is a group of 1 to 3 substituted by a blocked n(tetra) group; R9 is a burning group of 1 to 4 carbon atoms d is 1 Or 2 'When R is a plural case, the plural number can be the same or several OR9 can be the same or different]. The alkyl group having a carbon number of 1 to 3 and a carbon number of 1 to 4 in the formula (5) is as described in the above formula (1) or (2). 141326.doc -17. 201012882 Specific examples of the organic alkoxy group-containing compound having a blocked isocyanate group represented by the above formula (5) include 3-isocyanatopropyltrimethoxy group. Decane, 3-isocyanatopropyltriethoxydecane, 3-isocyanatepropylmercaptodimethoxydecane, 3-Isocyanatepropylmercaptodiethoxylate, 3 The isocyanate group in the compound such as isocyanatopropylethyldiethoxylate is protected with a blocking agent. Among these, the compound 'is exemplified by 3-blocked isogas propyl triethoxy oxane. As the terminal blocking agent for the isocyanate group, acetone sulfonium, 2-butanone ketone ketone, if f-isobutyl ketone, etc., and sulfonamides such as succinylamine can be used. (A5, 壬基龄, etc.) and other burning base ages; w-toluene, di-tert-butyl benzophenone, etc.; trimethyl phenols; trimethyl phenols; Malonic acid diesters such as esters; active methylene compounds such as acetamidineacetone, acetamidine acetate, ethyl acetate, etc.; methanol, ethanol, n-butanol, etc.; methyl cellosolve, butyl cellosolve An ether containing a hydroxyl group; an ester containing a hydroxyl group such as ethyl lactate or amyl lactate; a mercaptan such as butyl mercaptan or hexyl mercaptan; an anthranilil, a pro-ylamine or a dimer acid guanamine; Amines; imidazoles such as imidazole and 2-ethylimidazole; 3,5-dimethyl is a pyrazole such as sitting. , 2,4_triazole and other triazoles, such as butyl succinimide, ortho-imine, and the like. χ In order to control the dissociation of the blocking agent, it is also possible to use a catalyst such as dibutyltin dilaurate. (Component (B)) The organic polymer fine particles (hereinafter referred to as "knife ultraviolet absorbing resin fine particles") are contained as the component (B), and the organic high score 141326.doc 201012882 submicroparticle contains A copolymer of monomer units of ultraviolet absorbing groups. As the outer-side absorbing resin fine particles of the above-mentioned ifj molecule, for example, an acrylic monomer having a skeleton (such as a diterpenoid, a benzotriazole, or a tri-till) which functions as an ultraviolet absorber in the side chain can be exemplified. (hereinafter referred to as ultraviolet absorbing acrylic monomer) and other ethylenically unsaturated compounds (acrylic acid, methacrylic acid and derivatives thereof, stupid ethylene, vinyl acetate)

等)共聚合而成者。先前之紫外線吸收劑一般為分子量 200〜700之低分子,相對於此,高分子紫外線吸收樹脂微 粒之重量平均分子量通常超過1。該高分子紫外線吸收 樹脂微粒係與塑膠的相容性及耐熱性等自先前以來所存在 之低分子型紫外線吸收劑的缺點得到改良、且可長期賦 财候性能者。 作為上述紫外線吸收性丙烯酸系單體,若係分子内具 各為至少〗個之紫外線吸收基及丙烯醯基之化合物即^;, 並無特別限制。作為此種化合物,例如可 式⑻所表示之苯并三唾系化合物、以及以通式(9)= 之一苯甲網系化合物。 不 [化3]Etc.) Co-aggregation. The conventional ultraviolet absorber is generally a low molecular weight having a molecular weight of 200 to 700. On the other hand, the weight average molecular weight of the polymer ultraviolet absorbing resin fine particles usually exceeds 1. The polymer ultraviolet-ray absorbing resin particles are compatible with plastics and heat resistance, and the disadvantages of the low-molecular-weight ultraviolet absorbers which have existed since the prior art are improved, and the long-term financial performance can be obtained. The ultraviolet absorbing acrylic monomer is not particularly limited as long as it has at least one of an ultraviolet absorbing group and an acryl fluorenyl group in the molecule. As such a compound, for example, a benzotris-based compound represented by the formula (8) and a benzylnet-based compound represented by the formula (9) can be used. No [3]

141326.doc •19· 201012882 [式中,x表示氫原子或氣原子,Rl。表示氫原子、甲&、 或碳數為4教三級烧基’ Rnu直鏈狀或支鏈狀之破數 為2〜H)之伸烧基,f表示氫原子或f基,p表示…]。 [化4]141326.doc •19· 201012882 [wherein, x represents a hydrogen atom or a gas atom, Rl. Represents a hydrogen atom, a &, or a carbon number of 4, a tertiary alkyl group of 'Rnu straight or branched, 2 to H), f represents a hydrogen atom or an f group, and p represents ...]. [Chemical 4]

(9)(9)

之直鏈狀或支鏈狀之碳數為2〜1〇之伸烷基,Rls表示氫原子 或羥基,R16表示氫原子、羥基、或碳數為丨〜6之烷氧基]。 作為以上述通式(8)所表示之笨并三唾系化合物之具體 例例如可列舉.2-(2,-經基-5ι_(甲基)丙烯醯氧基苯基)_ 2H-本并三唑、2_(2,_羥基·3,_第三丁基-5、甲基)丙烯醯氧 基甲基笨基)-2Η·苯并三唾、2_[2,_經基_5,_(2_(f基)丙婦醢 氧基乙基)苯基]-2H-苯并三唑、2_[2,_羥基·3,_第三丁基_5,_The linear or branched carbon number is 2 to 1 Å of an alkylene group, Rls represents a hydrogen atom or a hydroxyl group, and R16 represents a hydrogen atom, a hydroxyl group, or an alkoxy group having a carbon number of 丨6. Specific examples of the stupidized trisalt compound represented by the above formula (8) include, for example, 2-(2,-carbyl-5ι-(meth)acryloxyphenyl)-2H- Triazole, 2_(2,-hydroxy-3,_t-butyl-5,methyl)propenyloxymethylphenyl)-2Η·benzotrisole, 2_[2,_ vial_5, _(2_(f-based) propyl ethyl oxyethyl) phenyl]-2H-benzotriazole, 2_[2,_hydroxy·3,_t-butyl _5,_

(2_(甲基)丙烯醯氧基乙基)苯基]_5_氣_2Η-苯并三唑、2[21 羥基3_曱基_5_(8-(甲基)丙烯醯氧基辛基)苯基]_2Η苯并 三唑等。 作為以上述通式(9)所表示之二苯甲酮系化合物之具體 例,例如可列舉:2_羥基_4_(2·(甲基)丙烯醯氧基乙氧基) 一苯甲網、2-經基-4-(4-(甲基)丙烯醯氧基丁氧基)二苯甲 ,2·-二經基-4-(2-(甲基)丙烯醯氧基乙氧基)二苯甲 m 2,4~二經基-4'-(2-(甲基)丙烯醯氧基乙氧基)二苯甲 141326.doc •20- 201012882 酮、2,2,,4-三羥基-4·-(2-(甲基)丙烯醯氧基乙氧基)二笨甲 嗣、2-經基-4-(3-(甲基)丙烯醯氧基-2-經基丙氧基)二苯甲 酮、2-羥基-4-(3-(曱基)丙烯醯氧基-卜羥基丙氧基)二笨曱 嗣等。 該等紫外線吸收性丙烯酸系單體可單獨使用1種,亦可 組合使用2種以上。 該作為(B)成分之高分子紫外線吸收樹脂微粒中之上述(2_(Methyl)acryloxyethyl)phenyl]_5_gas_2Η-benzotriazole, 2[21 hydroxy-3-indolyl_5_(8-(methyl)propene oxime octyl Phenyl] 2 benzotriazole and the like. Specific examples of the benzophenone-based compound represented by the above formula (9) include, for example, a 2-hydroxy- 4-(2·(methyl)acryloxyethoxyethoxy)-benzoyl network. 2-yl-4-(4-(methyl)propenyloxybutoxy)diphenyl, 2·-di-diyl-4-(2-(methyl)propenyloxyethoxy) Diphenyl m 2,4~di-based-4'-(2-(methyl)acryloxyethoxyethoxy)diphenyl 141326.doc •20- 201012882 ketone, 2,2,,4-three Hydroxy-4·-(2-(methyl)acryloxyethoxyethoxy)dibenzopyrene, 2-yl-4-(3-(methyl)propenyloxy-2-ylpropoxy Benzo) benzophenone, 2-hydroxy-4-(3-(indenyl) propylene oxy-p-hydroxypropoxy) dioxin, and the like. These ultraviolet absorbing acrylic monomers may be used alone or in combination of two or more. The above-mentioned polymer ultraviolet absorbing resin particles as the component (B)

紫外線吸收性丙烯酸系單體單元的含量,就所得硬化膜的 紫外線吸收能力、其他物性及經濟性之平衡等觀點而言, 通常為5〜70質量%左右,較好的是1〇〜6〇質量%左右。 於本發明之塗布液中,該用作(B)成分之高分子紫外線 吸收樹脂微粒就製造性、塗布液中之分散性、塗布液之塗 布性及硬化膜之透明性等觀點而言,平均粒徑較好的是 1〜200 nm之範圍,更好的是丨〜丨⑽nm之範圍。再者,該高 分子紫外線吸收樹脂微粒之平均粒徑可藉由雷射繞射散射 法進行測定。 於本發明中’該高分子紫外線吸收樹脂微粒較好的是以 分散於分散介質中之形態而使用;作為分散介f,例如可 較好地列舉.水、甲醇、乙醇、丙醇、卜甲氧基丙醇等 :級:;甲基溶纖劑等溶纖劑類等。藉由使用此種分散介 间刀子紫外線吸收樹脂微粒之分散性提高,可防止沈 較好的是分散介質為水者。於分散介質為水之情 ^時Γ用於在形成具有來自上述⑷成分之_鍵之 基質時所必需的錢化合物之水解、縮合反應中,因而較 141326.doc 21 201012882 為適宜。 對於該用作(B)成分之高分子紫外線吸收樹脂微粒之製 造方法並無特別限制,可採用先前公知之方法例如乳化 聚合法及微細懸浮聚合法等。 乳化聚合法係如下方法:使用包含水性分散介質、陰離 子性或非離子性界面活性劑之乳化劑以及水溶性聚合起始 · 劑γ使包含作為單體之紫外線吸收性丙烯酸系單體、及與 . 該單體共聚合之乙烯性不飽和單體之混合物乳化成微細之 液滴,於包含上述單體混合物之界面活性劑微胞層内進行 · 聚合’而獲得高分子紫外線吸收樹脂微粒之分散液。 另一方面,微細懸浮聚合法係如下方法:#先,向水性 介質中加入上述單體現合物、油溶性聚合起始劑、乳化劑 以及視需要之其他添加劑並進行預混合,再利用均質機進 打均質化處理’以進行油滴之粒徑調節。繼而’將經均質 化處理之溶液送入聚合器中進行聚合反應,而獲得高分子 紫外線吸收樹脂微粒之分散液。 上述任一種方法中之聚合溫度均為3〇〜8(rc左右。 〇 作為用於乳化聚合之水溶性聚合起始劑,例如可列舉· 過硫酸卸、過硫酸銨、過氧化氫等水溶性過氧化物;該等 起始劑或者氫過氧化異丙苯(eumene hydr—十氯過 氧化第三丁基等氫過氧化物;組合有酸性亞硫酸納、亞硫 酸銨、抗壞血酸等還原劑之氧化還原系起始劑;2,2.-偶氮 雙(2-:基丙脾)二鹽酸鹽等水溶性偶氮化合物等。 另-方面,作為用於微細懸浮聚合之油溶性聚合起始 141326.doc •22- 201012882 劑,例如可列舉:二酿基過氧化物(diacyl peroxide)類、酮 過氧化物(ketone peroxide)類、過氧酯(peroxyester)類、過 氧化二碳酸酯(peroxydicarbonate)類等油溶性有機過氧化 物;2,2'-偶氮雙異丁腈、2,2’-偶氮雙(2,4-二曱基戊腈)等偶 氣化合物等。 作為該可用作(B)成分之高分子紫外線吸收樹脂微粒之 具體例,可列舉:一方社油脂工業股份有限公司製造之塗 布用高分子紫外線吸收劑111^-700、1;1^-1770、1;1^· 383MA ' ULS-1383MA ' ULS-383MG ' ULS-385MG ' ULS-1383MG、ULS-1385MG、ULS-635MH等;Nikko化學研究 所股份有限公司製造之高分子紫外線吸收樹脂塗料NCI-905-20EM及NCI-905-20EMA(以苯乙烯單體與苯并三唑系 單體之共聚物形成之高分子紫外線吸收劑)等。 於本發明中,作為(B)成分,上述高分子紫外線吸收樹 脂微粒可單獨使用1種,亦可組合使用2種以上。 ((C)成分) 本發明之塗布液中含有膠體二氧化矽作為(C)成分。 本發明中所使用之所謂膠體二氧化矽,亦指膠體二氧化 矽、膠體矽酸。在水中係指藉由水合而在表面具有Si-OH 基之氧化矽的膠體懸浮液,若向矽酸鈉的水溶液中加入鹽 酸則生成。最近,相繼開發出新的製備法,有分散於非水 溶液中者、及以氣相法所製作之微粉末狀者,粒徑亦為自 數nm至數μηι者,各種各樣。平均粒徑較好的是1~200 nm 左右。粒子之組成不定,亦存在形成碎氧炫鍵(-Si-O-、 141326.doc •23· 201012882 -Si-O-Si-)而尚分子化者。粒子表面為多孔性,在水中一般 帶負電。再者,上述平均粒徑可藉由雷射繞射散射法進行 測定。 作為市售品,可列舉:扶桑化學工業股份有限公司製造 之「超高純度膠體二氧化矽」Quartron PL系列(品名:卩!^ 1、PL-3、PL-7);上述公司製造之「高純度有機溶膠」、 日產化學工業股份有限公司製造之「膠體二氧化矽(品 名:Snowtex 20、Snowtex 30、Snowtex 40、Snowtex Ο、 Snowtex 0-40 ' Snowtex C ' Snowtex N ' Snowtex S ' Snowtex 20L、Snowtex OL等)」及「有機二氧化石夕溶膠(品 名:甲醇二氧化矽溶膠、]\/[八-81'-]^8、14人-81:-1^、1?八-ST、IPA-ST-MS、IPA-ST-L、IPA-ST-ZL、IPA-ST-UP、 EG-ST、NPC-ST-30、MEK-ST、MEK-ST-MS、MIBK-ST、 XBA-ST、PMA-ST、DMAC-ST、ΡΑΜ-ST等)」。 於本發明中,作為(C)成分’上述膠體二氧化矽可單獨 使用1種,亦可組合使用2種以上。 ((D)成分) 本發明之塗布液含有硬化觸媒作為(D)成分。 該硬化觸媒係使上述(A)成分中的矽烷化合物(A-1)〜(A-5)成分水解及縮合(硬化)之觸媒’例如可列舉:鹽酸、硫 酸、硝酸、碟酸、亞梢酸、過氣酸、胺基續酸等無機酸; 曱酸、乙酸、丙酸、丁酸、乙二酸、檸檬酸、酒石酸、丁 二酸、馬來酸、麩胺酸、乳酸、對曱苯磺酸等有機酸。 又,可列舉:氫氧化裡、氫氧化鈉、氫氧化鉀、正己基 141326.doc -24· 201012882 胺、二甲基胺、三丁基胺、二氮雜雙環十一烯、乙酸乙醇 胺、甲酸二甲基苯胺、苯甲酸四乙基銨鹽、乙酸鈉、乙酸 鉀、丙酸鈉、麵胺酸鈉、丙酸鉀、甲酸鈉、甲酸鉀、乙酸 苯甲醯基三甲基銨鹽、乙酸四甲基銨、辛酸錫等有機金屬 鹽;鈦酸四異丙酯、鈦酸四丁酯、三異丁氧基鋁、三異丙 氧基鋁、乙醯丙酮鋁、SnCU、TiCU、ZnCU等路易斯酸 等。The content of the ultraviolet absorbing acrylic monomer unit is usually from about 5 to 70% by mass, preferably from 1 to 6 Å, from the viewpoints of the ultraviolet absorbing ability, other physical properties, and economy of the cured film. About % by mass. In the coating liquid of the present invention, the polymer ultraviolet absorbing resin fine particles used as the component (B) are averaged from the viewpoints of manufacturability, dispersibility in a coating liquid, coating properties of a coating liquid, and transparency of a cured film. The particle diameter is preferably in the range of 1 to 200 nm, more preferably in the range of 丨~丨(10) nm. Further, the average particle diameter of the high molecular ultraviolet absorbing resin particles can be measured by a laser diffraction scattering method. In the present invention, the polymer ultraviolet absorbing resin fine particles are preferably used in a form dispersed in a dispersion medium; and as the dispersion medium f, for example, water, methanol, ethanol, propanol, and buckwheat are preferably used. Oxypropanol and the like: grade:; cellosolve such as methyl cellosolve; By using such a dispersion medium knife, the dispersibility of the ultraviolet absorbing resin particles is improved, and it is possible to prevent the dispersion from being a water. When the dispersion medium is water, it is used in the hydrolysis and condensation reaction of the money compound necessary for forming a matrix having the _ bond from the above (4) component, and thus is more suitable than 141326.doc 21 201012882. The method for producing the polymer ultraviolet absorbing resin fine particles used as the component (B) is not particularly limited, and a conventionally known method such as an emulsification polymerization method or a fine suspension polymerization method can be employed. The emulsion polymerization method is a method of using an emulsifier comprising an aqueous dispersion medium, an anionic or nonionic surfactant, and a water-soluble polymerization initiator γ to form a UV-absorbing acrylic monomer as a monomer, and A mixture of the monomer-polymerized ethylenically unsaturated monomers is emulsified into fine droplets, and polymerized in a surfactant microcap layer containing the above monomer mixture to obtain dispersion of the polymer ultraviolet absorbing resin particles. liquid. On the other hand, the fine suspension polymerization method is as follows: # First, the above-mentioned single exemplified compound, oil-soluble polymerization initiator, emulsifier and other additives as needed are added to the aqueous medium and premixed, and then the homogenizer is used. The homogenization treatment is carried out to adjust the particle size of the oil droplets. Then, the homogenized solution is sent to a polymerization vessel to carry out a polymerization reaction, and a dispersion of the polymer ultraviolet absorbing resin fine particles is obtained. The polymerization temperature in any of the above methods is about 3 〇 8 8 (r). 〇 As a water-soluble polymerization initiator for emulsion polymerization, for example, water-soluble hydrazine, ammonium persulfate, hydrogen peroxide, etc. a peroxide; such a starter or hydroperoxide hydroquinone (eumene hydr-hydroperoxide such as tributyl oxyperoxide; combined with a reducing agent such as acidic sodium sulfite, ammonium sulfite, ascorbic acid a redox-based initiator; a water-soluble azo compound such as 2,2-.-azobis(2-:propylpropane spleen) dihydrochloride; etc. Further, as an oil-soluble polymerization for fine suspension polymerization 141326.doc • 22- 201012882 agents, for example, diacyl peroxide, ketone peroxide, peroxyester, peroxydicarbonate ( An oil-soluble organic peroxide such as peroxydicarbonate); an azo compound such as 2,2'-azobisisobutyronitrile or 2,2'-azobis(2,4-dimercaptophthalonitrile). Specific examples of the polymer ultraviolet absorbing resin fine particles usable as the component (B) include Polymer UV absorber for coating manufactured by Yosho Oil & Fat Industry Co., Ltd. 111^-700, 1; 1^-1770, 1; 1^· 383MA 'ULS-1383MA ' ULS-383MG ' ULS-385MG ' ULS-1383MG , ULS-1385MG, ULS-635MH, etc.; UV-absorbing resin coatings NCI-905-20EM and NCI-905-20EMA manufactured by Nikko Chemical Research Institute Co., Ltd. (with styrene monomer and benzotriazole monomer) In the present invention, the polymer ultraviolet absorbing resin fine particles may be used singly or in combination of two or more kinds as the component (B). (C) The coating liquid of the present invention contains colloidal cerium oxide as the component (C). The so-called colloidal cerium oxide used in the present invention also refers to colloidal cerium oxide or colloidal ceric acid. In water, it means hydration. A colloidal suspension of Si-OH-based cerium oxide on the surface is formed by adding hydrochloric acid to an aqueous solution of sodium citrate. Recently, a new preparation method has been developed, which is dispersed in a non-aqueous solution, and in a gas phase method. Made of micro-powder, grain Also from the number of nm to the number of μηι, various. The average particle size is preferably about 1 ~ 200 nm. The composition of the particles is uncertain, there is also the formation of broken oxygen key (-Si-O-, 141326.doc • 23· 201012882 -Si-O-Si-) is still molecularized. The surface of the particles is porous and generally negatively charged in water. Further, the above average particle diameter can be measured by a laser diffraction scattering method. As a commercial item, the "Ultra High Purity Colloidal Antimony Oxide" Quartron PL series manufactured by Fuso Chemical Industry Co., Ltd. (product name: 卩!^ 1, PL-3, PL-7); "High-purity organosol", manufactured by Nissan Chemical Industries Co., Ltd. "Colloidal cerium oxide (product name: Snowtex 20, Snowtex 30, Snowtex 40, Snowtex Ο, Snowtex 0-40 ' Snowtex C ' Snowtex N ' Snowtex S ' Snowtex 20L , Snowtex OL, etc.) and "Organic dioxide dioxide sol (product name: methanol dioxide sol,]\/[eight-81'-]^8, 14 people-81:-1^, 1?8-ST , IPA-ST-MS, IPA-ST-L, IPA-ST-ZL, IPA-ST-UP, EG-ST, NPC-ST-30, MEK-ST, MEK-ST-MS, MIBK-ST, XBA -ST, PMA-ST, DMAC-ST, ΡΑΜ-ST, etc.). In the present invention, the above-mentioned colloidal cerium oxide may be used singly or in combination of two or more kinds. (Component (D)) The coating liquid of the present invention contains a curing catalyst as the component (D). The catalyst for hydrolyzing and condensing (curing) the decane compounds (A-1) to (A-5) in the component (A), for example, hydrochloric acid, sulfuric acid, nitric acid, and acid acid, Inorganic acids such as citric acid, peroxyacid, and amino acid; citric acid, acetic acid, propionic acid, butyric acid, oxalic acid, citric acid, tartaric acid, succinic acid, maleic acid, glutamic acid, lactic acid, For organic acids such as toluenesulfonic acid. Further, there may be mentioned: hydrogen hydroxide, sodium hydroxide, potassium hydroxide, n-hexyl 141326.doc -24· 201012882 amine, dimethylamine, tributylamine, diazabicycloundecene, ethanolamine, formic acid Dimethylaniline, tetraethylammonium benzoate, sodium acetate, potassium acetate, sodium propionate, sodium lamelinate, potassium propionate, sodium formate, potassium formate, benzamidine trimethylammonium acetate, acetic acid Organic metal salts such as methylammonium and tin octylate; tetraisopropyl titanate, tetrabutyl titanate, triisobutoxyaluminum, aluminum triisopropoxide, aluminum acetoacetate, SnCU, TiCU, ZnCU, etc. Acid, etc.

該等硬化觸媒中,即使增加(B)及(c)成分之調配量,亦 可進行高分散化,可提高所得膜之透明性,因此可較好地 使用有機酸。尤其可使用有機羧酸,其中可較好地使用乙 酸。 .,〜 '•卞W Ί又 用,亦可組合使用2種以上。 ((E)成分) 本發明之塗布液含有分散介質作為(Ε)成分。 本發明之塗布液係以上述各成分粒子經分散於分散介質 中之狀態而使用。本發明中所使用之分散介f,若係可將 上述各成分粒子均句混合且分散者即可,並無特別限定, 例如除水之外’可列舉:醇類、料族烴類、_、嗣 類、醋類等有機系分散介質。該等有機系分散介作 為醇類之具體例,可列舉:甲醇、7會 ^ 6醇、正丙醇、里丙 醇、正丁醇、第二丁醇、第三丁醇、 '、 正己醇、正辛醇、乙 二醇、二乙二醇、三乙二醇、乙二醇 千』醚乙二醇單乙 醚乙酸酯、二乙二醇單乙醚、1_甲。 氧基_2·丙醇(丙二醇單 141326.doc -25- 201012882 曱醚)、丙二醇單曱醚乙酸酯、二丙酮酵、甲基溶纖劑、 乙基溶纖劑、丙基溶纖劑、丁基溶纖劑等。 作為其他分散介質之具體例’可列舉:環己酮、丙酮、 曱基乙基酮、曱基異丁基酮、四氫吱喃、丨’心二^号燒、 1,2-二甲氧基乙烷、二甲苯、二氯乙烷、甲苯、乙酸甲 酯、乙酸乙酯、乙酸乙氧基乙酯等。 該等分散介質中,就作為分散介質的性能之觀點 較好的是水及醇類。 於本發明中,作為(E)成分,上述分散介質可單獨使用1 種,亦可組合使用2種以上。 ((F)成分) 本發明之塗布液較好的是含有經矽烷化合物處理(前處 理)之氧化鈽作為(F)成分。 此處所謂之前處理,係指藉由氧化鈽之〇H基與矽烷化 合物之矽醇基反應形成共價鍵而改變氧化鈽的表面狀熊。 經矽烷處理之氧化鈽即使與分散有陰離子性粒子之溶膠 (例如膠體二氧化矽等)混合亦不會產生凝集或析出物了進 而該經矽烷處理之氧化鈽可分散於水及醇之兩者中。 對於所使用之氧化鈽並無特別限定,但較好的是呈粒子 狀且平均粒徑為丨〜?^ nm者,就透明性之觀點而言,較好 的是平均粒徑為1〜100 11111者。又,就提高分散性之觀點而 言,於將(F)成分添加於本發明之塗布液中時較好的是 使其分散於水或醇等分散介質中後再添加。 所謂(F)成分之「分散」,係指分散相(固體)浮游懸 141326.doc •26- 201012882 分散介質(液體)中之狀態。又,所謂「溶膠」,係指以液體 為分散介質且以固體為分散粒子之膠體’有時亦稱為膠體 溶液。又,上述氧化鈽微粒之平均粒徑可藉由雷射繞射散 射法進行測定。 作為分散介質,係基於上述(E)成分,較好的是水或 醇。尤其醇係指由上述(A)成分中之(八_1)〜(A_5)成分中所 - 記載的矽烷化合物所生成之醇及上述(E)成分中所記載之 醇,尤其好的是分散於甲醇、乙醇、正丙醇、異丙醇、卜 ❹ ?氧基·2_丙料低級醇中。再者,作為分散介質之水或醇 可單獨使用1種,亦可組合使用2種以上。 *亥(F)成分係使具有表面電荷之氧化鈽溶膠與矽烷化合 物反應而使其表面改質而成之分散液,係不會產生凝集、 析出、凝膠化而可適宜添加於本發明之塗布液中者。該矽 烷化合物係亦完全包含烷氧基矽烷或其水解縮合物者。因 此,由於無法求出在分散液狀態下之正確的固形物濃度, φ 而將成為原料之氧化鈽之量與烷氧基矽烷之完全縮合物之 量的總量除以投入量之總量,將以百分率所表示者作為計 算上之固形物濃度。 ° ' <(F)成分之製造方法〉 . 冑於所使用原料之氧化鈽微粒之製造方法並無特別限 制,但由於在粉體狀態下難以與石夕燒化合物反應,故適宜 作為分散液來使用。用以使其分散之穩定劑就促進石夕燒化 合物的水解反應之觀點而言,可適宜利用使用酸性分散穩 疋劑之酸穩定型陽離子系氧化錦溶膠,較理想的是平均粒 141326.doc -27- 201012882 仅為1〜200 nm者,就賦予透明性之觀點而言,平均粒徑較 好的是1 100 nm。作為所添加之酸性分散穩定劑,可列 牛鹽酸、硝酸、過氣酸等無機酸;或乙酸、甲酸、乳酸 等有機缓酸。該等可單獨或者併用使用。纟中,有機竣酸 ^有針對金屬之配位效果,因而就使氧化鈽與矽烷化合物 進一步反應之觀點而言,分散穩定劑以使用無機酸、更適 宜的是鹽酸之氧化鈽溶膠為佳。 作為市售品,可列舉:多木化學股份有限公司製造之 厂 Needral H-15」等。 所使用原料之矽烷化合物可與上述(A)成分同等地定 義’為了在製造硬化膜時使其與(A)成分及(c)成分之矽醇 基適宜形成矽氧烷鍵,則較好的是上述(Ad)化合物。該 等可單獨使用,亦可將兩者組合使用。 又’作為(F)成分中之矽烷化合物,除上述四烷氧基矽 烧及其水解縮合物或者聚烷氧基矽烷之外,亦可併用有機 烧氧基矽烷或其水解縮合物或者聚有機烷氧基矽烷來使 用。作為有機烷氧基矽烷之具體例,係(A)成分中具有一 種以上之有機取代基者,更好的是可列舉(A_2)〜(A_5)成 分。 表面處理之結構可為完全的2層結構,亦可為各自的烷 氧基矽烷或其水解縮合物或者聚烷氧基矽烷混合存在之結 構。 氧化鈽粒子表層之OH基的反應性高,因而若於表面處 理中僅直接使用有機烷氧基矽烷,則由於其反應速度之不 141326.doc • 28- 201012882 同而存在促進僅氧化鈽的凝集、凝膠化之虞。因此,作為 (F)成刀中之氧化鈽之表面處理,較理想的是,第一,利 用反應性高之四絲基錢或其水解縮合物對氧化鈽表層 進行處理,第二,使有機燒氧基㈣或其水解縮合物反應 而進行處理。 " 如此,在(F)成分之矽烷處理層中形成具有一部分有機 取代基之結構,藉此可在製造硬化膜時使其與(A)成分及 (C)成分之矽醇基適宜形成矽氧烷鍵,同時可進一步提高 硬化膜之柔軟性。 一般的陽離子性氧化鈽溶膠,若並非在以矽烷化合物進 行表面處理之後,則由於與本發明塗布液中之具有陰離子 性之成分產生凝集、凝膠化,而變得難以添加。因此,為 了使其穩定地分散於本發明之塗布液中,必需如上述般使 陽離子性氧化鈽溶膠之氧化鈽微粒表層部之〇H基與矽烷 化合物之石夕醇基反應而進行表面處理後使用。 於(F)成分中’用於表面處理之矽烷化合物的使用量係 以作為梦烧化合物之金屬氧化物之質量來考慮。矽烷化合 物之金屬氧化物例如係以下述通式來定義。 R mR nSiO((4-m.n)/2) (式中,R1及R2分別獨立為碳數丨〜⑺之烷基或氟烷基;乙 稀基;苯基;或者經選自甲基丙烯醯氧基、胺基、胺基烷 基、烧基胺基、環氧丙氧基、3,4-環氧基環己基及封端化 異氰酸酯基中之1種以上基所取代之碳數為之烷基,m 及η分別獨立為0、1或2,m+n為0、1或2)。 141326.doc -29- 201012882 溶膠中之金屬氧化物總質量(Ce02與R'R^SiO ((4-m-n)/2) 之總量)中的矽烷化合物之質量(R^R^SiOwnp))之比例 較好的是50質量%以下,更好的是2〜40質量%。若少於 此,則存在氧化鈽其本身產生凝集、凝膠化之虞,進而若 多於此,則存在矽烷化合物其本身發生反應而凝集、凝膠 化之虞。 該(F)成分之具體製造方法可採用下述方法。 製備包含陽離子性氧化鈽溶膠與上述(E)成分之第一混 合液,繼而混合入一種以上之矽烷化合物(A)成分,藉此 製備第二液。於室溫下之熟成之後,進而進行室溫或加熱 攪拌,藉此製成(F)成分。(E)成分可在製備(F)成分後進而 加入以進行稀釋,又,亦可加入其他分散介質以進行分散 介質置換。 進而,於併用有機烷氧基矽烷之情形時,更好的是可採 用下述方法。 製備包含陽離子性氧化鈽溶膠與下述(E)成分之第一混 合液,繼而混合入四烷氧基矽烷((A)成分),藉此製備第二 液。於室溫下之熟成之後,混合入有機烷氧基矽烷((A)成 分),製備第三混合液。進而進行室溫或加熱攪拌,藉此 製成(F)成分。(E)成分可在製備(F)成分後進而加入以進行 稀釋,又,亦可加入其他分散介質以進行分散介質置換。 添加於本發明塗布液中之經矽烷處理之氧化鈽溶膠,即 使在製造後於室溫下放置1週,在容器底部亦未以目視確 認到凝集沈降物。對於直至添加於本發明塗布液為止之該 141326.doc •30- 201012882 溶膠靜置時間並無特別限制。 於本發明中,作為(F)成分,上述氧化铈溶膠可單獨使 用1種,亦可組合使用2種以上。 ((G)成分) 本發明之塗布液較好的是含有分散穩定劑作為(G)成 分。 該分散穩定劑係用以使矽烷化合物(A])〜(A_5)成分之反 應物、(B)、(〇及(F)成分穩定地分散於塗布液中而抑制凝 集沈降及凝膠化之添加劑。於本發明塗布液中,(B)、(C) 及(F)成分之微粒較好的是不產生凝集沈降及凝膠化而保 持分散之狀態,例如較好的是穩定地浮游懸浮之膠體狀 態。 為了利用熱硬化時之縮合反應,本發明之塗布液較理邦 的疋在塗布前將金屬烷氧化物封端為〇11體。因此,較理 想的是維持促進水解反應且抑制縮合反應之酸性條件。進 而,羧酸本身不僅具有作為酸之效果,而且亦具有針對金 屬之配位效果,從而亦成為對烷氧化物之穩定化有效之添 加劑,因此可利用有機酸,其中可更好地利用有機綾酸作 為(G)成分。例如可列舉:甲酸、乙酸、丙酸、丁酸 '戍 酸、三曱基乙酸(pivalic acid)、乙二酸、丙二酸 丁二 酸、戊二酸、己二酸等。又,本發明之塗布液藉由熱硬化 而形成硬化膜,因而較好的是具有在熱硬化時不會殘留於 硬化膜内之程度彿點者’更好的是可利用乙酸。 於本發明中,作為(G)成分,上述分散穩定劑可單獨使 U1326.doc •31 · 201012882 用1種’亦可組合使用2種以上。 (任意添加成分) 本發明之塗布液中,除上述(A)[(A-1)〜(A_5)卜⑻成分以 外’可視需要而適當含有先前塗布液中所使用之公知之各 種添加成分。 作為可視需要而含有之添加成分,例如可列舉:調平 劑、可撓性賦予劑,進而可列舉:濁滑性賦予劑、抗氧化 劑、上藍劑(blueing agent)、抗靜電齊卜消泡劑(發泡抑制, 劑)、光穩定劑、对候性賦予劑、著色劑、微粒之分散劑 _ (沈降防止劑)及微粒表面活性之改質劑等。 <調平劑>In the hardening catalyst, even if the amount of the components (B) and (c) is increased, the dispersion can be increased, and the transparency of the obtained film can be improved. Therefore, an organic acid can be preferably used. In particular, an organic carboxylic acid can be used, of which acetic acid can be preferably used. ., ~ '•卞W Ί Also, you can use two or more combinations. (Component (E)) The coating liquid of the present invention contains a dispersion medium as a (Ε) component. The coating liquid of the present invention is used in a state in which the above-mentioned respective component particles are dispersed in a dispersion medium. The dispersion medium f used in the present invention is not particularly limited as long as the particles of the above-mentioned respective components are uniformly mixed and dispersed, and examples thereof include: alcohols, hydrocarbons, and _ Organic dispersion media such as hydrazines and vinegars. Specific examples of the organic dispersions include alcohols, methanol, 7-hexanol, n-propanol, propylene glycol, n-butanol, second butanol, butanol, and n-hexanol. , n-octanol, ethylene glycol, diethylene glycol, triethylene glycol, ethylene glycol ether ether ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether, 1_A. Oxy-2·propanol (propylene glycol mono 141326.doc -25- 201012882 decyl ether), propylene glycol monoterpene ether acetate, diacetone fermentation, methyl cellosolve, ethyl cellosolve, propyl cellosolve , butyl cellosolve, and the like. Specific examples of the other dispersion medium include cyclohexanone, acetone, mercaptoethyl ketone, decyl isobutyl ketone, tetrahydrofuran, 丨 '心二^, 1, 2-dimethoxy Ethylethane, xylene, dichloroethane, toluene, methyl acetate, ethyl acetate, ethoxyethyl acetate, and the like. Among these dispersion media, water and alcohols are preferred from the viewpoint of the performance of the dispersion medium. In the present invention, the above-mentioned dispersion medium may be used singly or in combination of two or more kinds as the component (E). (Component (F)) The coating liquid of the present invention preferably contains cerium oxide treated (pretreated) with a decane compound as the component (F). Here, the term "pretreatment" refers to a surface-like bear which changes the cerium oxide by reacting a ruthenium oxide group of ruthenium oxide with a decyl group of a decane compound to form a covalent bond. The decane-treated cerium oxide does not generate agglomerates or precipitates even when mixed with a sol (for example, colloidal cerium oxide or the like) in which anionic particles are dispersed, and the decane-treated cerium oxide can be dispersed in both water and alcohol. in. The cerium oxide to be used is not particularly limited, but is preferably in the form of particles and has an average particle diameter of 丨~? ^ nm, in terms of transparency, it is preferred that the average particle diameter is from 1 to 100 11111. In addition, when the component (F) is added to the coating liquid of the present invention, it is preferred to disperse it in a dispersion medium such as water or alcohol and then add it. The term "dispersion" of the component (F) means the state of the dispersed phase (solid) floating suspension 141326.doc •26- 201012882 in the dispersion medium (liquid). Further, the term "sol" refers to a colloid which uses a liquid as a dispersion medium and a solid as a dispersed particle, which is sometimes referred to as a colloidal solution. Further, the average particle diameter of the above cerium oxide microparticles can be measured by a laser diffraction scattering method. The dispersion medium is based on the above component (E), and preferably water or alcohol. In particular, the alcohol is an alcohol produced from the decane compound described in the (8-1) to (A-5) component of the component (A) and the alcohol described in the above (E) component, and particularly preferably dispersed. In methanol, ethanol, n-propanol, isopropanol, dike? Oxygen 2 - propylene in lower alcohols. Further, the water or the alcohol as the dispersion medium may be used singly or in combination of two or more. * The hai (F) component is a dispersion obtained by reacting a surface-charged cerium oxide sol with a decane compound to modify the surface thereof, and is preferably added to the present invention without causing aggregation, precipitation, or gelation. In the coating solution. The decane compound also completely contains an alkoxydecane or a hydrolyzed condensate thereof. Therefore, since it is impossible to determine the correct solid concentration in the dispersion state, φ, the total amount of the amount of cerium oxide which is the raw material and the amount of the complete condensate of the alkoxy decane is divided by the total amount of the input amount. The percentage expressed as a percentage is taken as the calculated solid concentration. ° ' <Production Method of (F) Component> The method for producing the cerium oxide microparticles to be used as the raw material to be used is not particularly limited, but it is difficult to react with the smelting compound in the powder state, so it is suitable as a dispersion. To use. The acid-stabilized cationic oxidized gold sol using an acidic dispersion stabilizer can be suitably used from the viewpoint of promoting the hydrolysis of the compound by the use of an acid-stabilizing stabilizer, and is preferably an average particle of 141,326.doc. -27- 201012882 For those of only 1 to 200 nm, the average particle size is preferably 1 100 nm from the viewpoint of imparting transparency. As the acid dispersion stabilizer to be added, an inorganic acid such as bovine hydrochloric acid, nitric acid or peroxy acid; or an organic acid such as acetic acid, formic acid or lactic acid may be mentioned. These can be used alone or in combination. Among the oxime, the organic citric acid has a coordination effect on the metal, and therefore, from the viewpoint of further reacting the cerium oxide with the decane compound, it is preferred to use a mineral acid, more preferably a cerium oxide sol of hydrochloric acid. As a commercial item, a plant manufactured by Toki Chemical Co., Ltd. Needral H-15, etc. may be mentioned. The decane compound of the raw material to be used may be defined in the same manner as the above-mentioned component (A). It is preferred to form a decyl alcohol bond with a sterol group of the component (A) and the component (c) when the cured film is produced. It is the above (Ad) compound. These can be used alone or in combination. Further, as the decane compound in the component (F), in addition to the above tetraalkoxy oxime and its hydrolysis condensate or polyalkoxydecane, an organic alkoxy decane or a hydrolysis condensate thereof or a polyorganic organic compound may be used in combination. Alkoxydecane is used. Specific examples of the organoalkoxydecane include those having at least one organic substituent in the component (A), and more preferably (A_2) to (A-5). The surface treatment structure may be a completely two-layer structure, or may be a structure in which a respective alkoxydecane or a hydrolysis condensate thereof or a polyalkoxydecane is mixed. The OH group of the surface layer of the cerium oxide particles has high reactivity, so if only the organoalkoxy decane is directly used in the surface treatment, since the reaction rate is not 141,326.doc • 28-201012882, there is agglomeration which promotes only cerium oxide. Gelatinization. Therefore, as the surface treatment of (F) cerium oxide in the knives, it is preferable that, first, the surface layer of cerium oxide is treated with a highly reactive four-silver or its hydrolysis condensate, and second, organic The alkoxy group (tetra) or its hydrolysis condensate is reacted and treated. " Thus, a structure having a part of an organic substituent is formed in the decane-treated layer of the component (F), whereby the sterol group of the component (A) and the component (C) can be suitably formed in the production of the cured film. The oxygen chain bond can further increase the softness of the cured film. When the surface of the cationic cerium oxide sol is not subjected to surface treatment with a decane compound, aggregation with a component having an anionic property in the coating liquid of the present invention causes aggregation and gelation, which makes it difficult to add. Therefore, in order to stably disperse it in the coating liquid of the present invention, it is necessary to react the 〇H group of the surface layer of the cerium oxide microparticles of the cationic cerium oxide sol with the ceramide group of the decane compound as described above, and then perform surface treatment. use. The amount of the decane compound used for the surface treatment in the component (F) is considered as the quality of the metal oxide as the dream burning compound. The metal oxide of the decane compound is, for example, defined by the following formula. R mR nSiO((4-mn)/2) (wherein R1 and R2 are each independently an alkyl group or a fluoroalkyl group having a carbon number of 丨~(7); an ethyl group; a phenyl group; or The number of carbon atoms substituted by one or more of an oxy group, an amine group, an aminoalkyl group, an alkylamino group, a glycidoxy group, a 3,4-epoxycyclohexyl group, and a blocked isocyanate group is The alkyl groups, m and η are each independently 0, 1 or 2, and m+n is 0, 1 or 2). 141326.doc -29- 201012882 The total mass of metal oxides in the sol (the total mass of decane compounds in the total amount of Ce02 and R'R^SiO ((4-mn)/2)) (R^R^SiOwnp)) The ratio is preferably 50% by mass or less, more preferably 2 to 40% by mass. If it is less than this, the cerium oxide itself is agglomerated and gelled, and if it is more than this, the decane compound itself reacts to aggregate and gel. The specific method for producing the component (F) can be carried out by the following method. A second mixed liquid comprising a cationic cerium oxide sol and the above-mentioned (E) component is prepared, followed by mixing one or more decane compound (A) components. After the aging at room temperature, the mixture is further stirred at room temperature or under heating to prepare a component (F). The component (E) may be further added after the preparation of the component (F) for dilution, or may be added to another dispersion medium for dispersion medium replacement. Further, in the case of using an alkoxysilane in combination, it is more preferable to employ the following method. A first mixed liquid containing a cationic cerium oxide sol and the following component (E) was prepared, followed by mixing with a tetraalkoxy decane (component (A)), whereby a second liquid was prepared. After aging at room temperature, the organoalkoxydecane ((A) component) was mixed to prepare a third mixed liquid. Further, the component (F) is prepared by stirring at room temperature or by heating. The component (E) may be further added after the preparation of the component (F) to be diluted, or may be added to another dispersion medium for dispersion medium replacement. The decane-treated cerium oxide sol added to the coating liquid of the present invention did not visually recognize the aggregated sediment at the bottom of the container even after being allowed to stand at room temperature for one week after the production. There is no particular limitation on the sol standing time of the 141326.doc • 30-201012882 until it is added to the coating liquid of the present invention. In the present invention, the cerium oxide sol may be used singly or in combination of two or more kinds as the component (F). (Component (G)) The coating liquid of the present invention preferably contains a dispersion stabilizer as the component (G). The dispersion stabilizer is used to stably disperse the reactants, (B), and (F) components of the decane compound (A)) to (A-5) in the coating liquid to suppress aggregation and gelation. In the coating liquid of the present invention, the fine particles of the components (B), (C) and (F) are preferably in a state in which they are dispersed without causing agglomeration, sedimentation and gelation, and for example, it is preferably a stable floating suspension. Colloidal state. In order to utilize the condensation reaction during thermal hardening, the coating liquid of the present invention binds the metal alkoxide to the oxime 11 before coating. Therefore, it is desirable to maintain the hydrolysis promoting reaction and suppress it. The acidic condition of the condensation reaction. Further, the carboxylic acid itself not only has an effect as an acid, but also has a coordination effect on the metal, and thus becomes an effective additive for stabilizing the alkoxide, and thus an organic acid can be utilized. The organic citric acid is preferably used as the component (G), and examples thereof include formic acid, acetic acid, propionic acid, butyric acid, citric acid, pivalic acid, oxalic acid, and malonic acid succinic acid. Glutaric acid Further, the coating liquid of the present invention forms a cured film by thermal hardening, and therefore it is preferable to have a degree of not remaining in the cured film at the time of heat curing, and it is better to use acetic acid. In the present invention, as the component (G), the above-mentioned dispersion stabilizer may be used alone or in combination of two or more kinds of U1326.doc • 31 · 201012882. (Optional addition component) In the coating liquid of the present invention, In addition to the above-mentioned (A) [(A-1) to (A_5) (8) components, various known additives to be used in the previous coating liquid may be appropriately contained as necessary. Examples of the additive component contained as needed may be, for example, : a leveling agent and a flexibility imparting agent, and further, a turbidity-imparting agent, an antioxidant, a blueing agent, an antistatic antifoaming agent (foaming suppressing agent), and a light stabilizer , a fugitive agent, a coloring agent, a dispersing agent for fine particles _ (precipitation preventing agent), a modifying agent for surface active particles, etc. <Leveling agent>

本發明之塗布液中,為了提高所得硬化膜之平滑性以及 塗布時之流動性,可添加調平劑,作為該等添加劑,可列 舉5^夕氧系調平劑、氟系調平劑、丙稀酸系調平劑、乙 稀系調平劑、以及將㈣與丙烯㈣複合化而成之調平劑 等。上述調平劑全部可作用於塗膜表面,從而使表面張力 降低。上述調平劑具有各種特徵,可視目的而使用。表面 張力之降低能力較強的是聚矽氧系調平劑及氟系調平劑, 丙稀I系調平劑與乙稀基系冑平劑於進行再塗布之情形 時,不易產生潤濕不良而較為有利。 作為聚錢系調平劑之具_,可❹聚環氧烧與聚二 曱基矽氧烷之共聚物等。作為聚矽氧系調平劑之市售品, 可列舉:東麗道康寧股份有限公司製造之Fz_2ii8、fz_ 77、FZ-2161 等 信越化學工業股份有限公司製造之 141326.doc -32- 201012882 KP321、KP323、KP324、KP326、KP340、KP341 等; Momentive Performance Materials Japan有限公司製造之 TSF4440 、 TSF4441 、 TSF4445 、 TSF4450 、 TSF4446 、 TSF4452、TSF4453、TSF4460等;BYK Chemie Japan股份 有限公司製造之 BYK-300、BYK-302、BYK-306、BYK-' 307、BYK-320、BYK-325、BYK-330、BYK-331、BYK- - 333、BYK-337、BYK-341、BYK-344、BYK-345、BYK, 346、BYK-348、BYK-377、BYK-378、BYK-UV3500、 ❹ BYK-3510、BYK-3570等聚醚改質矽油(聚環氧烷改質矽 油)等。 又,於必需具有15 0 °C以上的耐熱性之情形時,以聚酯 改質或具有苯環之芳烷基改質矽油為宜。作為聚酯改質矽 油之市售品,可列舉:BYK Chemie Japan股份有限公司製 造之BYK-310、BYK-315、BYK-370等;作為具有苯環之 芳燒基改質石夕油之市售品’可列舉:BYK Chemie Japan股 份有限公司製造之BYK-322、BYK-323等。 ^ 作為氟系調平劑,可使用聚環氧烷與氟碳化合物之共聚 物等。 • 作為氟系調平劑之市售品’可列舉:DIC股份有限公司 - 製造之MEGAFAC系列、住友3M股份有限公司製造之FC系 列等。 作為丙烯酸系調平劑之市售品,可列舉·· BYK Chemie Japan股份有限公司製造之3丫1^-350 '8丫1352、6丫1 354、BYK-355、BYK-358N、BYK-361N、BYK-380N、 141326.doc -33· 201012882 BYK 381、BYK-392等、導入有氟之ΒΥΚ·340等。 :由調配此種調平劑’可改善硬化媒之完成後外觀,即 使製成薄膜亦可㈣塗布。相對於塗布液之總量,調平劑 之使用量較好的是0.01〜10質量%’進而較好的是m 量% 〇 、 作為調配調平劑之方法,可在製備塗布料調配,亦可 在即將形成硬化膜前調配人塗布液中,進而亦可在製備塗 布液及即將形成硬化膜前的兩個階段進行調配。 <可撓性賦予劑> 為了提高所得硬化膜之柔軟姓,可使本發明之塗布液中 含有可撓性賦予劑作為應力緩和劑。 作為可撓性賦予劑’例如可使用聚矽氧樹脂等。 作為聚矽氧樹脂之市售品,可列舉:Wacker公司製造之 ReSin MK系列,例如Beisil PMS MK(為包含CH3Si〇w之重 複單元(單兀T)之聚合物,且為亦包含至1質量%為止之 (CHshSiO2/2單元(單元D)者);及信越化學工業股份有限公 司製造之KR-242A(包含98質量〇/〇之單元τ與2質量%之二甲 基單元D且包含Si-ΟΗ末端基者)、KR-251(包含88質量❶/〇之 單tlT與12質量%之二曱基單元d且包含Si-ΟΗ末端基者)、 KR-220L(包含式CHsSiO3,2之單元γ且包含si-〇H(矽醇)末 端基者)等。 (含有(A)〜(E)成分之塗布液之製備) <各成分之含量> 本發明塗布液中之各成分之含量可適當選定,各成分之 141326.doc •34· 201012882 含量例如較好的是選定為以下所示之範圍。 除(E)成分之分散介質之外,以質量%來表示相對於 (A)[(A-1)〜(A-5)]〜(D)成分之總量的各成分含量。再者,以 分散狀態而較好地使用之(B)及(C)成分僅利用各自的固形 物來計算,各成分中所包含之分散介質係(E)成分中所包 ' 含者。 . (A-1)成分之含量通常為0.01〜40質量%左右,較好的是 0.1〜20質量%。(A-2)成分之含量通常為0.1〜40質量%左 ® 右,較好的是1〜30質量%。(A-3)成分之含量通常為0.1〜30 質量%左右,較好的是0.3〜20質量%。(Α-4)成分之含量通 常為0.1〜30質量%左右,較好的是0.3~20質量%。(Α-5)成 分之含量通常為0.1〜50質量%左右,較好的是1〜40質量 %。 (Β)成分之含量通常為0.1〜50質量%左右,較好的是1〜40 質量%。(C)成分之含量通常為0.1〜70質量%左右,較好的 是1〜50質量%。(D)成分之含量通常為0.001〜30質量%左 ❿ 右,較好的是0.001〜20質量%。相對於(Α)[(Α-1)〜(Α-5)]〜 (D)成分 之總質 量份, (Ε)成分 之含量通常為 5〜 1000質 * 量份左右,較好的是20〜800質量份。 • 再者,對於(Α-3)成分與(Α-5)成分之調配莫耳比並無特 別限制,較好的是1 : 1〜1 : 5,更好的是1 : 2〜1 : 4。若 (Α-3)成分與(Α-5)成分之調配莫耳比在上述範圍内,則所 得硬化膜之耐久性進一步提高。 <含有(Α)〜(Ε)成分之塗布液之製備方法> 141326.doc -35- 201012882 本發明之塗布液較好的是向使(A-1)成分、(A-2)成分及 (A-4)成分之水解縮合物與(B)〜(E)成分接觸而獲得之反應 產物中加入(A-5)成分並使其反應後,進而加入(A-3)成分 並使其反應而成者。又,進而較好的是向藉由將包含(A-1)成分、(A-2)成分、(A-4)成分及(B)〜(E)成分之混合物加 熱而獲得之反應產物中加入(A-5)成分並使其反應後,進 而加入(A-3)成分並使其反應而成者。 具體而言,較理想的是進行下述操作來製備塗布液。 較好的是,首先製作至少包含(A-l)、(A-2)、(A-4)、 (B)、(D)及(E)成分之第一混合液,繼而混合入(C)成分而 製作第二混合液,進而繼續混合入(A-5)成分而製作第三 混合液。最後混合入(A-3)成分而製備塗布液。 若以上述方式將各成分分離而製備,則塗布液之溶液保 存穩定性(不產生凝膠化等)提高,因而較好。 尤其於藉由(B)及(C)成分之添加量而使溶液中之水量增 加時,該效果得以進一步發揮。例如,將(A-l) ' (A-2)、 (A-4)、(B)、(D)及(E)成分混合後,加入(C)成分。繼而, 混合入(A-5)成分,最後混合入(A-3)成分。再者,在製備 塗布液後進而加入(E)成分,藉此可稀釋塗布液。 已知如本發明塗布液之混合材料的溶液保存穩定性容易 影響溶液pH值(例如,「溶膠-凝膠法於奈米技術中之應用/ 主編··作花濟夫」CMC出版)。於本發明塗布液之製備 中,因混合入酸性成分作為(D)成分,且混合入驗性成分 作為(A-3)成分及(D)成分,故溶液pH值隨混合順序而變 141326.doc *36- 201012882 化0 作為7谷液pH值,你丨1各丨m 例如利用以校正用pH標準液修正 攜式pH計(Hanna公司製造.商。々 J展知··商时名Checker-Ι)進行評僧In the coating liquid of the present invention, a leveling agent may be added in order to improve the smoothness of the obtained cured film and the fluidity at the time of coating, and examples of the additives include a halogen-based leveling agent and a fluorine-based leveling agent. An acrylic-based leveling agent, an ethylene-based leveling agent, and a leveling agent obtained by combining (4) with propylene (4). All of the above leveling agents can act on the surface of the coating film, thereby lowering the surface tension. The above leveling agents have various characteristics and can be used as intended. The surface tension reduction ability is stronger than the polyfluorene-based leveling agent and the fluorine-based leveling agent, and the propylene-based leveling agent and the ethylene-based leveling agent are less likely to be wetted when recoating. Bad and more favorable. As a poly-based leveling agent, it is a copolymer of polyepoxy-fired and polydidecyloxane. As a commercial product of a polyfluorene-based leveling agent, Fz_2ii8, fz_77, FZ-2161, etc. manufactured by Toray Dow Corning Co., Ltd., etc., 141326.doc-32-201012882 KP321, manufactured by Shin-Etsu Chemical Co., Ltd., KP323, KP324, KP326, KP340, KP341, etc.; TSF4440, TSF4441, TSF4445, TSF4450, TSF4446, TSF4452, TSF4453, TSF4460, etc. manufactured by Momentive Performance Materials Japan Co., Ltd.; BYK-300, BYK- manufactured by BYK Chemie Japan Co., Ltd. 302, BYK-306, BYK-' 307, BYK-320, BYK-325, BYK-330, BYK-331, BYK--333, BYK-337, BYK-341, BYK-344, BYK-345, BYK, 346, BYK-348, BYK-377, BYK-378, BYK-UV3500, ❹ BYK-3510, BYK-3570 and other polyether modified eucalyptus oil (polyalkylene oxide modified eucalyptus oil). Further, in the case where it is necessary to have heat resistance of 150 ° C or higher, it is preferred to modify the polyester or the aralkyl modified sulfonate having a benzene ring. As a commercial product of the polyester modified oyster sauce, BYK-310, BYK-315, BYK-370, etc., manufactured by BYK Chemie Japan Co., Ltd., and the like; The sales item 'is exemplified by BYK-322, BYK-323, etc. manufactured by BYK Chemie Japan Co., Ltd. ^ As the fluorine-based leveling agent, a copolymer of a polyalkylene oxide and a fluorocarbon compound can be used. • As a commercial product of a fluorine-based leveling agent, DIC Co., Ltd. - manufactured MEGAFAC series, FC series manufactured by Sumitomo 3M Co., Ltd., etc. can be cited. As a commercial product of an acrylic leveling agent, the product is manufactured by BYK Chemie Japan Co., Ltd. 3丫1^-350 '8丫1352, 6丫1 354, BYK-355, BYK-358N, BYK-361N , BYK-380N, 141326.doc -33· 201012882 BYK 381, BYK-392, etc., introduced fluorine ΒΥΚ · 340 and so on. : The preparation of the leveling agent can improve the finished appearance of the hardening medium, and even if the film is formed, it can be coated. With respect to the total amount of the coating liquid, the amount of the leveling agent used is preferably 0.01 to 10% by mass, and more preferably m% by weight. As a method of blending the leveling agent, it can be formulated in the preparation of the coating material. The human coating liquid may be blended before the formation of the cured film, or may be formulated in two stages before the preparation of the coating liquid and the formation of the cured film. <Flexibility imparting agent> In order to increase the softness of the obtained cured film, the coating liquid of the present invention may contain a flexibility imparting agent as a stress relieving agent. As the flexibility-imparting agent, for example, a polyfluorene resin or the like can be used. As a commercial product of a polyoxyxene resin, a ReSin MK series manufactured by Wacker Co., Ltd., for example, Beisil PMS MK (which is a polymer containing a repeating unit of CH3Si〇w (monoterpene T), and also contains 1 mass. %(Jsh-SiO2/2 unit (unit D)); and KR-242A manufactured by Shin-Etsu Chemical Co., Ltd. (containing 98 mass/〇 unit τ and 2 mass% dimethyl unit D and containing Si - ΟΗ end group), KR-251 (containing 88 ❶/〇 of single tlT and 12% by mass of bismuth unit d and including Si-ΟΗ end group), KR-220L (including CHsSiO3, 2 The unit γ includes a Si-〇H (sterol) terminal group, etc. (Preparation of a coating liquid containing the components (A) to (E)) <Content of each component> Each component in the coating liquid of the present invention The content of 141326.doc •34·201012882 of each component is preferably selected as the range shown below. In addition to the dispersion medium of the component (E), it is expressed by mass% relative to (A) The content of each component of the total amount of [(A-1) to (A-5)] to (D) components. Further, it is preferably used in a dispersed state. The components (B) and (C) are calculated using only the respective solid materials, and the dispersion medium contained in each component is contained in the component (E). The content of the component (A-1) is usually 0.01~. 40% by mass or so, preferably 0.1 to 20% by mass. The content of the component (A-2) is usually 0.1 to 40% by mass left to right, preferably 1 to 30% by mass. (A-3) The content is usually from 0.1 to 30% by mass, preferably from 0.3 to 20% by mass. The content of the component (Α-4) is usually from about 0.1 to 30% by mass, preferably from 0.3 to 20% by mass. The content of the component is usually from 0.1 to 50% by mass, preferably from 1 to 40% by mass. The content of the component is usually from 0.1 to 50% by mass, preferably from 1 to 40% by mass. The content of the component (C) is usually from about 0.1 to 70% by mass, preferably from 1 to 50% by mass. The content of the component (D) is usually from 0.001 to 30% by mass, preferably from 0.001 to 20% by mass. %. Relative to the total mass parts of (Α)[(Α-1)~(Α-5)]~ (D), the content of the (Ε) component is usually about 5 to 1000 mass* parts, preferably Is 20~800 quality Further, there is no particular limitation on the molar ratio of the (Α-3) component to the (Α-5) component, and it is preferably 1:1 to 1:5, more preferably 1:2. ~1: 4. If the molar ratio of the (Α-3) component to the (Α-5) component is within the above range, the durability of the obtained cured film is further improved. <Preparation method of coating liquid containing (Α)~(Ε) component> 141326.doc -35- 201012882 The coating liquid of the present invention preferably has a component (A-1) and a component (A-2) And (A-5) component is added to the reaction product obtained by contacting the hydrolysis condensate of the component (A-4) with the components (B) to (E), and the component (A-3) is further reacted, and then the component (A-3) is further added and It is the reaction. Further, it is further preferred to use a reaction product obtained by heating a mixture containing the components (A-1), (A-2), (A-4) and (B) to (E). After the component (A-5) is added and reacted, the component (A-3) is further added and reacted. Specifically, it is preferred to carry out the following operations to prepare a coating liquid. Preferably, first, a first mixed liquid containing at least (Al), (A-2), (A-4), (B), (D), and (E) components is prepared, followed by mixing into the (C) component. The second mixed liquid was prepared, and the mixture was further mixed into the component (A-5) to prepare a third mixed liquid. Finally, the component (A-3) was mixed to prepare a coating liquid. When the components are separated and prepared as described above, the stability of the solution of the coating liquid (without gelation or the like) is improved, which is preferable. In particular, when the amount of water in the solution is increased by the addition amount of the components (B) and (C), the effect is further exerted. For example, after mixing (A-1) '(A-2), (A-4), (B), (D), and (E) components, the component (C) is added. Then, the component (A-5) is mixed, and finally, the component (A-3) is mixed. Further, after the preparation of the coating liquid, the component (E) is further added, whereby the coating liquid can be diluted. It is known that the solution storage stability of the mixed material of the coating liquid of the present invention easily affects the pH value of the solution (for example, "Application of Sol-Gel Method in Nanotechnology/Editor-in-Chief" by CMC). In the preparation of the coating liquid of the present invention, since the acidic component is mixed as the component (D) and the inspecting component is mixed as the component (A-3) and the component (D), the pH of the solution changes with the mixing order of 141,326. Doc *36- 201012882 0 As the pH value of the 7-grain solution, you can use the pH standard solution to correct the portable pH meter (Hanna company. -Ι) to evaluate

冷液pH值,較好的是使上述第—混合液及第二混合 ΡΗ$ 6,使第三混合液及最終混合液為pHS 7。尤其若第 -展口液亦即於(A_3)成分之混合時溶液pH值超過8,則存 在命液穩疋性下降之虞。自塗布液之製備開始時直至製備 ,成時為止,較好的是溶液保持酸性狀態。亦即,較好的 是以維持此種條件之順序來製備塗布液。 上述第混δ液、第二混合液、及第三混合液較好 的是在將各成分混合後進行加熱處理。溫度較好的是 〇C 130C,更好的是5〇°c〜90°C,加熱處理時間較好的 是3〇分鐘〜24小時,更好的是1小時〜8小時。關於混合、加 熱方法,若為可均勻混合、加熱之方法則無特別限制。藉 由以此種方式進行加熱,則溶液内之 3) 、(Ad)及(A-5)成分之縮合反應進行,耐煮沸性及其他 耐久性提高。(A-丨)、(Α·2)、(A_3) ' (A_4)及(A 5)成分之 反應可利用溶液 Si-NMR(nuclear magnetic resonance,核磁 共振)進行分析,藉此可設計成合適之結構。若未達3(rc 或未達30分鐘,則反應極其緩慢之情形較多,又,於超過 130 C 或超過 24小時之情形時,(A-l)、(A-2)、(A-3)、(A- 4) 及(A-5)成分之反應過度進行,溶液產生凝膠化或高黏性 化’從而存在無法塗布之虞。 混合入(A-3)成分後之最終液(塗布液)亦較好的是進行加 141326.doc -37- 201012882 熱處理。於在室溫下混合之情形時,容易受到授拌效率之 影響’於由此導致(A-3)成分之分散度較低之情形時,存 在硬化膜之透明性(總透光率下降、霧度上升)下降之虞。 溫度較好的是30°C〜130°C,更好的是50°C〜90°C,時間較 好的是5分鐘〜10小時’更好的是15分鐘〜6小時。關於混 合、加熱方法’若為可均勻混合、加熱之方法則無特別限 制。若未達30°C或未達5分鐘,則加熱處理之效果欠缺之 情形較多,又’若超過130°C或超過1 〇小時,則溶液產生 凝膠化或高黏性化,從而存在無法塗布之虞。 於後述之實施例中,記載有使用靜置1週後所獲得之塗 布液而製造之硬化膜的評價結果,對於直至製造硬化膜為 止之溶液靜置時間並無特別限制。 (含有(A)〜(G)成分之塗布液之製備) <各成分之含量> 本發明之含有(A)〜(G)成分之塗布液中之各成分的含量 可適當選定,(A)〜(E)成分之各含量除(E)成分之分散介質 之外,係以質量。/。來表示相對於(A)[(A1)〜(A5)]〜(G)成分 之總量的各成分含量,除此以外,可與含有(A)〜(E)成分 之塗布液之情形相同。 (F)成分之含量通常為〇.〇1〜3〇質量%左右,較好的是 0.1〜20質量%。(G)成分之含量通常為1〜60質量份左右,較 好的是10〜50質量份左右。 〈含有(A)〜(G)成分之塗布液之製備方法〉 "亥塗布液較好的是向使(A_1)、(A-2)、(A-4)及(A-5)成分 141326.doc •38- 201012882 之水解縮合物與(B)〜(G)成分接觸而獲得之反應產物中加 入(A-3)成分並使其反應而成者,具體而言,較好的是進 行下述操作而製備塗布液。 較好的是,首先製作至少包含(A-l)、(A-2)、(A-4)、 (B)、及(D)、(E)、(G)成分之第一混合液,繼而混合入(C) 及(F)成分而製作第二混合液,進而繼續混合入(A-5)成分 而製作第三混合液。最後混合入(A-3)成分而製備塗布 液。 若以上述方式將各成分分離而製備,則塗布液之溶液保 存穩定性(不產生凝膠化等)提高,因而較好。尤其於由於 (B) 、(C)及(F)成分之添加量增加而使溶液中之水量增加 時,該效果得以進一步發揮。 例如,在混合入(A-l)、(A-2)、(A-4)、(B)、及(D)、 (E)、(G)成分後,加入(C)及(F)成分。繼而,混合入(A-5) 成分,最後混合入(A-3)成分。 再者,(E)成分可藉由在製備塗布液後進而加入來稀釋 塗布液。 作為進而較好的塗布液製備方法,可向使(A- 1 )、(A-2)、(A-4)成分之水解縮合物與(B)、(C)、(D)、(E)及(G)成 分接觸而獲得之反應產物中加入(F)及(A-5)成分並使其反 應,再向所獲得之反應產物中加入(A-3)成分並使其反應 而製備塗布液。 具體而言,係向將包含(A-l)、(A-2)、(A-4)、(B)、 (C) 、(D)、(E)及(G)成分之混合物加熱而獲得之反應產物 141326.doc •39· 201012882 中加入(F)及(A-5)成分並加熱,繼而向所獲得之反應產物 中加入(A-3)成分並加熱而獲得塗布液者。藉由採用此種 製備方法,可進一步提高塗布液之分散性,可提高硬化膜 之透明性。 又,向使(A-l)、(A-2)、(A-4)及(A-5)成分的水解縮合物 與(B)、(C)、(D)、(E)及(G)成分接觸而獲得的反應產物中 加入(F)成分並使其反應,再向所獲得的反應產物中加入 (A-3)成分並使其反應,藉此亦可製備塗布液。 具體而言,例如向包含(A-l)、(A-2)、(A-4)、(A-5)、 (B)、(C)、(D)、(E)及(G)成分的混合物加熱而獲得的反應 產物中加入(F)成分並加熱,繼而向所獲得的反應產物中 加入(A-3)成分並加熱,藉此獲得塗布液。藉由採用此種 製備方法,可進一步提高塗布液之分散性,從而可提高硬 化膜之透明性。 進而,亦可藉由向使(A-l)、(A-2)、(A-4)成分之水解縮 合物與(B)〜(G)成分接觸而獲得之反應產物中加入(A-5)成 分並使其反應,再向所獲得之反應產物中加入(A-3)成分 並使其反應而製備塗布液。 具體而言,例如係向將包含(A-l)、(A-2)、(A-4)及 (B)〜(G)成分之混合物加熱而獲得之反應產物中加入(A-5) 成分並加熱,繼而向所獲得之反應產物中加入(A-3)成分 並加熱而獲得塗布液者。藉由採用此種製備方法,可進一 步提高塗布液之分散性,可提高硬化膜之透明性。 已知如本發明塗布液之混合材料的溶液保存穩定性容易 141326.doc -40- 201012882 影響溶液pH值(例如,「溶膠-凝膠法於奈米技術中之應用/ 主編:作花濟夫」CMC出版)。於本發明塗布液之製備 中,因混合入酸性成分作為(D)及(G)成分,且混合入鹼性 成分作為(A-3)及(D)成分,故溶液pH值隨混合順序而變 化。 • 作為溶液pH值,例如利用以校正用pH標準液修正之可 • 攜式pH計(Hanna公司製造:商品名Checker-Ι)進行評價之 溶液pH值,較好的是使上述第一混合液及第二混合液為 鲁 pHS 6,使第三混合液及最終混合液為pHS 7。尤其若第 三混合液亦即於(A-3)成分之混合時溶液pH值超過8,則存 在溶液穩定性下降之虞。自塗布液之製備開始時直至製備 完成時為止,較好的是溶液保持酸性狀態。亦即,較好的 是以維持上述條件之順序來製備塗布液。 又,上述第一混合液、第二混合液、及第三混合液較好 的是在將各成分混合後進行加熱處理。溫度較好的是 30°C〜130°C,更好的是50°C〜90°C,加熱處理時間較好的 是30分鐘~24小時,更好的是1小時〜8小時。關於混合、加 熱方法,若為可均勻混合、加熱之方法則無特別限制。藉 由以此種方式進行加熱,則溶液内之(A-1)、(A-2)、(A- . 3)、(A-4)、及(A-5)成分之縮合反應進行,耐久性(耐煮沸 性)及其他特性提高。(A-l)、(A-2)、(A-3)、(A-4)、及(A-5)成分之反應可利用溶液Si-NMR進行分析,藉此可設計成 合適之結構。若未達30°C或未達30分鐘,則反應極其緩慢 之情形較多,又,於超過130°C或超過24小時之情形時, 141326.doc -41 - 201012882 (A 1)、(A-2)、(A-3)、(A-4)、及(A-5)成分之反應過度進 行,溶液產生凝膠化或高黏性化,從而存在無法塗布之 虞。 又,混合入(A-3)成分後之最終液(塗布液)亦較好的是進 行加熱處理。於在室溫下混合之情形時,容易受到攪拌效 率之影響,於由此導致(A-3)成分之分散度較低之情形 · 時,存在硬化膜之透明性下降(總透光率下降、霧度上升) 之虞。溫度較好的是3(TC〜130t,更好的是5(rc〜9(rc, 時間較好的是5分鐘〜10小時’更好的是15分鐘〜6小時。關 碜 於混合、加熱方法,若為可均勻混合、加熱之方法則無特 別限制。若未達3(TC或未達5分鐘,則加熱處理之效果欠 缺之情形較多,又,若超過13〇。(:或超過1〇小時,則溶液 產生凝膠化或高黏性化,從而存在無法塗布之虞。 於下述實施例中,記載有使用靜置〗週後所得之塗布液 而製造之硬化膜的評價結果,對於直至硬化膜製造為止之 溶液靜置時間並無特別限制。 進而,本發明中所使用之(F)成分由於係酸性穩定型,〇 故與其他分散液混合時’為了防止混合時之凝集、析出、 凝膝化,更好的是在同為酸性之溶谬中進行混合。例如, 若將驗性穩定型陰離子性微粒之溶膠與(F)成分直接混 合’則會脫離可穩定分散之pH值範圍,由此存在無法維持 分散之可能性。 (塗布液之用途) 本發明塗布液之透明性、與樹脂之密著性、耐候性、耐 141326.doc •42· 201012882 磨耗性、耐擦傷性優異,可用作各種透明有機構件之塗布 材科。具體而言可用作:樹脂製車窗、建築物等之樹脂 固、道路遮音壁、拱廊等大面積透明構件、儀器面板等計 量儀器類、建築物之椒_ f月曰商、透明塑膠零件、眼鏡透鏡、 ,冑目鏡、轉印用膜、”溫室等透明有機構件之面塗材料 或底塗材料。 . 因透㈣料高’故著色亦料,且與各種著色 顏料之相容性優異,因此亦可用作各種塗料之原料或塗裝 前之底塗材料。例如,可應用於汽車内外部裝飾、產業機 械、鋼傢具、建築用内外部裝饰、家電、塑膠製品等之塗 裝。又,本發明之塗布液因與金屬亦充分密著並且耐酸性 南’故亦耐受近來被視為問題之酸雨。因此,尤其適於車 體或铭車輪等在室外使用之構件。作為與塗料非常相似之 ρ ’利用其高著色性、與顏料之相容’從而亦可應用於 各種油墨中。 • 又’本發明之塗布液利用高透明性、高密著性、優異之 耐磨耗性、耐擦傷性,從而亦可應用於電氣電子領域、光 學領域等中所使用之精密構件。例如,在電漿顯示器、液 晶,不器、有機EL(electroluminescence,電激發光)顯示 .Μ各種顯示器中,使用各種抗反射膜、偏光膜、氣體阻 ^膜、相位差膜、導電性膜等必需具有硬塗性作為其功能 之一的膜’亦可用作該等之構件。此外,光碟基板用之硬 塗材料、光纖之塗布劑、觸摸面板、太陽電池面板之被覆 材料等亦作為利用高透㈣、高密著性、優異之耐磨耗 141326.doc •43. 201012882 性、耐擦傷性之用途而列舉。於遽色鏡、全像元件、ccd (charge coupled device,電漿輕合裝置)照相機等中使用各 種保護膜’該等保護模不僅被要求具有透明性、耐磨耗 性、耐擦傷性及密著性,而且自製造上之問題考慮亦要求 具有某種程度的低黏度。本發明之塗布液可藉由成分調整 而控制為所需黏度’因而亦可用作上述保護膜。又,本發 明之塗布液係不僅具有硬塗性能並且亦可使其變曲變形之 材料,亦可用於近來盛行研究之可撓性顯示器。 · 又本發明之塗布液亦可使近紅外區域之電磁波良好地參 透射因此,亦可應用於電波收發用天線、RFID(Ra(ji〇Preferably, the pH of the cold liquid is such that the first mixed liquid and the second mixed liquid are 6, $6 so that the third mixed liquid and the final mixed liquid are pHS 7. In particular, if the pH of the solution is more than 8 when the first-spreading liquid is mixed with the component (A_3), the stability of the liquid is lowered. From the start of the preparation of the coating liquid to the preparation, it is preferred that the solution remain in an acidic state. That is, it is preferred to prepare a coating liquid in the order in which such conditions are maintained. It is preferred that the above-mentioned mixed δ liquid, the second mixed liquid, and the third mixed liquid are subjected to heat treatment after mixing the respective components. The temperature is preferably 〇C 130C, more preferably 5 〇 ° c to 90 ° C, and the heat treatment time is preferably 3 Torr to 24 hours, more preferably 1 hour to 8 hours. The mixing and heating method is not particularly limited as long as it can be uniformly mixed and heated. By heating in this manner, the condensation reaction of the components 3) and (Ad) and (A-5) in the solution proceeds, and the boiling resistance and other durability are improved. The reaction of (A-丨), (Α·2), (A_3) '(A_4) and (A 5) components can be analyzed by solution Si-NMR (nuclear magnetic resonance), which can be designed to be suitable The structure. If it is less than 3 (rc or less than 30 minutes, the reaction is extremely slow, and when it exceeds 130 C or exceeds 24 hours, (Al), (A-2), (A-3) The reaction of the components (A-4) and (A-5) is excessively carried out, and the solution is gelled or highly viscous, so that there is no coating which can not be coated. The final solution after mixing the component (A-3) (coating) It is also preferable to carry out the heat treatment of 141326.doc -37-201012882. When it is mixed at room temperature, it is easily affected by the mixing efficiency, which results in the dispersion of the component (A-3). In the case of low, there is a decrease in the transparency (total decrease in light transmittance and increase in haze) of the cured film. The temperature is preferably from 30 ° C to 130 ° C, more preferably from 50 ° C to 90 ° C. The time is preferably from 5 minutes to 10 hours. More preferably, it is from 15 minutes to 6 hours. Regarding the method of mixing and heating, there is no particular limitation on the method of uniform mixing and heating. If it is less than 30 ° C or not For 5 minutes, the effect of heat treatment is insufficient, and if the temperature exceeds 130 ° C or exceeds 1 〇, the solution gelatinizes or is high. In the examples described later, the evaluation results of the cured film produced by using the coating liquid obtained after standing for one week are described, and the solution standing time until the cured film is produced is described. (Preparation of coating liquid containing components (A) to (G)) <Content of each component> Content of each component in the coating liquid containing the components (A) to (G) of the present invention The content of each of the components (A) to (E) may be appropriately selected from the (A) [(A1) to (A5)] to The content of each component of the total amount of the component G) may be the same as the case of the coating liquid containing the components (A) to (E). The content of the component (F) is usually 〇1 to 3 〇% by mass. The content of the component (G) is usually from about 1 to 60 parts by mass, preferably from about 10 to 50 parts by mass, based on the amount of the component (A) to (G). The preparation method of the liquid> "Hai coating liquid is preferably to make (A_1), (A-2), (A-4) and (A-5) components 141326.doc •38- 201012882 When the (A-3) component is added to the reaction product obtained by contacting the (B) to (G) component and the reaction product is reacted, specifically, it is preferred to prepare a coating liquid by the following operation. Preferably, first, a first mixed liquid containing at least (Al), (A-2), (A-4), (B), and (D), (E), (G) components is produced, and then The second mixed liquid was prepared by mixing the components (C) and (F), and further mixing the component (A-5) to prepare a third mixed liquid. Finally, the component (A-3) was mixed to prepare a coating liquid. When the components are separated and prepared as described above, the stability of the solution of the coating liquid (without gelation or the like) is improved, which is preferable. This effect is further exerted especially when the amount of water in the solution is increased by the addition of the components (B), (C) and (F). For example, after mixing the components (A-1), (A-2), (A-4), (B), and (D), (E), and (G), the components (C) and (F) are added. Then, the component (A-5) is mixed and finally mixed into the component (A-3). Further, the component (E) can be diluted by further adding a coating liquid after the preparation of the coating liquid. Further, as a further preferred method for preparing a coating liquid, the hydrolysis condensate of the components (A-1), (A-2), and (A-4) and (B), (C), (D), and (E) can be used. (F) and (A-5) are added to the reaction product obtained by contacting the component (G), and reacted, and (A-3) component is added to the obtained reaction product, and reacted to prepare a reaction product. Coating solution. Specifically, it is obtained by heating a mixture containing the components (Al), (A-2), (A-4), (B), (C), (D), (E), and (G). Reaction product 141326.doc •39· 201012882 The components (F) and (A-5) are added and heated, and then the component (A-3) is added to the obtained reaction product and heated to obtain a coating liquid. By using such a production method, the dispersibility of the coating liquid can be further improved, and the transparency of the cured film can be improved. Further, the hydrolysis condensate of the components (Al), (A-2), (A-4) and (A-5) and (B), (C), (D), (E) and (G) The component (F) is added to the reaction product obtained by the component contact and reacted, and the component (A-3) is added to the obtained reaction product and allowed to react, whereby a coating liquid can also be prepared. Specifically, for example, it includes components (Al), (A-2), (A-4), (A-5), (B), (C), (D), (E), and (G). The component (F) is added to the reaction product obtained by heating the mixture and heated, and then the component (A-3) is added to the obtained reaction product and heated, whereby a coating liquid is obtained. By adopting such a production method, the dispersibility of the coating liquid can be further improved, and the transparency of the hardened film can be improved. Further, (A-5) may be added to the reaction product obtained by bringing the hydrolysis condensate of the components (Al), (A-2) and (A-4) into contact with the components (B) to (G). The component was reacted, and the component (A-3) was added to the obtained reaction product and reacted to prepare a coating liquid. Specifically, for example, a component (A-5) is added to a reaction product obtained by heating a mixture containing the components (A1), (A-2), (A-4), and (B) to (G). Heating is carried out, and then the component (A-3) is added to the obtained reaction product and heated to obtain a coating liquid. By adopting such a preparation method, the dispersibility of the coating liquid can be further improved, and the transparency of the cured film can be improved. It is known that the storage stability of the mixed material of the coating liquid of the present invention is easy to be 141326.doc -40- 201012882 affecting the pH value of the solution (for example, "Application of Sol-Gel Method in Nanotechnology / Editor-in-Chief: CMC Publishing). In the preparation of the coating liquid of the present invention, since the acidic component is mixed as the components (D) and (G), and the alkaline component is mixed as the components (A-3) and (D), the pH of the solution varies depending on the mixing order. Variety. • As the pH value of the solution, for example, the pH of the solution to be evaluated by a portable pH meter (manufactured by Hanna: trade name: Checker-Ι) corrected by the pH standard solution is preferably used to make the first mixed liquid described above. And the second mixture is Lu pHS 6, so that the third mixture and the final mixture are pHS 7. In particular, if the pH of the solution exceeds 8 when the third mixture is mixed with the component (A-3), the stability of the solution is lowered. It is preferred that the solution remains in an acidic state from the start of preparation of the coating liquid until the completion of the preparation. Namely, it is preferred to prepare a coating liquid in the order of maintaining the above conditions. Further, it is preferred that the first mixed liquid, the second mixed liquid, and the third mixed liquid are subjected to heat treatment after mixing the respective components. The temperature is preferably from 30 ° C to 130 ° C, more preferably from 50 ° C to 90 ° C, and the heat treatment time is preferably from 30 minutes to 24 hours, more preferably from 1 hour to 8 hours. The mixing and heating method is not particularly limited as long as it can be uniformly mixed and heated. By heating in this manner, the condensation reaction of the components (A-1), (A-2), (A-.3), (A-4), and (A-5) in the solution proceeds. Durability (boiling resistance) and other properties are improved. The reaction of the components (A-1), (A-2), (A-3), (A-4), and (A-5) can be carried out by solution Si-NMR, whereby a suitable structure can be designed. If it is less than 30 ° C or less than 30 minutes, the reaction is extremely slow, and when it exceeds 130 ° C or exceeds 24 hours, 141326.doc -41 - 201012882 (A 1), (A -2) The reaction of the components (A-3), (A-4), and (A-5) is excessively carried out, and the solution is gelled or highly viscous, so that there is no possibility of coating. Further, it is also preferred that the final liquid (coating liquid) after mixing the component (A-3) is subjected to heat treatment. When mixing at room temperature, it is easily affected by the stirring efficiency, and thus the dispersion of the (A-3) component is low, and the transparency of the cured film is lowered (the total light transmittance is lowered). After the haze rises. The temperature is preferably 3 (TC~130t, more preferably 5(rc~9(rc, better time is 5 minutes~10 hours', more preferably 15 minutes~6 hours. About mixing and heating The method is not particularly limited as long as it can be uniformly mixed and heated. If it is less than 3 (TC or less than 5 minutes, the effect of the heat treatment is insufficient, and if it exceeds 13 〇. (: or exceeds When the solution is gelled or highly viscous for 1 hour, there is a problem that the coating cannot be applied. In the following examples, the evaluation results of the cured film produced by using the coating liquid obtained after standing still are described. The solution standing time until the production of the cured film is not particularly limited. Further, since the component (F) used in the present invention is acid-stable, when mixed with other dispersions, 'in order to prevent agglutination during mixing. , precipitation, kneading, and more preferably mixing in the same acidic solution. For example, if the sol of the amorphous anionic fine particles is directly mixed with the component (F), it will be separated from the stable dispersion. pH range, there is no way to maintain the score (The use of the coating liquid) The transparency of the coating liquid of the present invention, the adhesion to the resin, the weather resistance, and the resistance to 141326.doc • 42· 201012882 Excellent abrasion resistance and scratch resistance, and can be used as various transparent Specifically, it can be used as a coating material for organic members, such as a resin-made window, a resin solid for a building, a large-area transparent member such as a road sound-blocking wall or an arcade, a measuring instrument such as an instrument panel, and a pepper of a building. f 曰 曰, transparent plastic parts, spectacle lenses, 胄 eyepieces, transfer film, "surface coating materials or primer materials for transparent organic components such as greenhouses. · Because of the high (four) material color, so coloring, and It has excellent compatibility with various color pigments, so it can also be used as a raw material for various coatings or as a primer material before painting. For example, it can be applied to interior and exterior decoration of automobiles, industrial machinery, steel furniture, interior and exterior decoration for construction. Coatings for household appliances, plastic products, etc. Moreover, the coating liquid of the present invention is also sufficiently resistant to the metal and is resistant to acidity, so it is also resistant to acid rain which has recently been regarded as a problem. Therefore, it is particularly suitable for the body or the body. Wheels, etc. A member for outdoor use, which is very similar to paint, can be used in various inks because of its high colorability and compatibility with pigments. • The coating liquid of the present invention utilizes high transparency and high adhesion. Excellent wear resistance and scratch resistance, and can also be applied to precision components used in electrical and electronic fields, optical fields, etc. For example, in plasma displays, liquid crystals, organic devices, and organic EL (electroluminescence) (Light) display. In various displays, various anti-reflection films, polarizing films, gas barrier films, retardation films, conductive films, etc., which have hard coat properties as one of their functions, can be used as these. In addition, hard coating materials for optical disk substrates, coating materials for optical fibers, touch panels, and coating materials for solar cell panels are also used as high-through (four), high-density, and excellent wear resistance 141326.doc •43. Listed for use in 201012882 for scratch and scratch resistance. Various protective films are used in holly mirrors, hologram elements, ccd (charge coupled device) cameras, etc. These protective dies are not only required to have transparency, abrasion resistance, scratch resistance and density. Sexuality, and consideration of manufacturing issues also requires a certain degree of low viscosity. The coating liquid of the present invention can be controlled to a desired viscosity by composition adjustment, and thus can also be used as the above protective film. Further, the coating liquid of the present invention is a material which not only has a hard coating property but also can be deformed and deformed, and can also be used for a flexible display which has recently been studied. Further, the coating liquid of the present invention can also transmit electromagnetic waves in the near-infrared region well. Therefore, it can also be applied to an antenna for radio wave transmission and reception, and RFID (Ra(ji)

Frequency Identificati〇n,射頻辨識)資料載體車用雷達 裝置等之被覆材料等。 作為其他用途,可列舉:各種透明裝飾品之塗布劑、各 種表皮材料(汽車座椅、汽車門内部裝飾用、沙發、傢具 等)β動零件(煞車片(brake pad)等)、纖維之集束劑、氣 體阻隔塗布劑等。 以下,對本發明之硬化膜加以說明。 〇 [硬化膜] 本發月之硬化膜係利用常法使上述本發明之塗布液硬化 而成之硬化膜。 八體而S,於形成硬化膜之對象即樹脂成形品(射出成 形⑽、膜或片等)之基材上,利用喷霧、浸潰、淋幕式塗 布棒式塗布或輥塗布等公知之方法,塗布塗布液而形成 塗膜。 141326.doc .44- 201012882 塗膜之厚度取決於所形成 用。 之硬化膜最終以何種形態來使 於第一態樣中’作為塗膜夕a ‘膜之厚度,將硬化膜之厚度調整 為較好的疋0.5〜6 μηι、更好的是 J疋0.5〜3 μιη。其後,以適當 硬化條件,通常於室溫,、較好的是⑼〜戰下加 …硬㈣分鐘〜24小時左右、較好的是3〇分鐘〜3小時,藉 此獲得所需之硬化膜^Frequency Identificati〇n, radio frequency identification) data carrier vehicle radar, etc. Examples of other uses include coating agents for various transparent decorations, various skin materials (car seats, interior doors for automobiles, sofas, furniture, etc.), β-moving parts (brake pads, etc.), and bundles of fibers. Agent, gas barrier coating agent, and the like. Hereinafter, the cured film of the present invention will be described. 〇 [Cured film] The cured film of the present invention is a cured film obtained by hardening the above-described coating liquid of the present invention by a usual method. In the case of a resin molded article (injection molding (10), film, sheet, or the like) which is a target of a cured film, it is known by spraying, dipping, shower coating, bar coating, or roll coating. In the method, a coating liquid is applied to form a coating film. 141326.doc .44- 201012882 The thickness of the film depends on the formation. In the final form of the cured film, the thickness of the cured film is adjusted to a thickness of 0.5 to 6 μηι, more preferably J疋0.5. ~3 μιη. Thereafter, it is suitably hardened, usually at room temperature, preferably (9) to under the war. Hard (four) minutes to about 24 hours, preferably 3 minutes to 3 hours, thereby obtaining the desired hardening. Membrane ^

於第二態樣中,作為塗膜之厚度,將硬化膜之厚度調整 為杈好的是υο μιη、更好的是2〜2〇 μηι。其後,以適當之 硬化條件,通常於80〜携。C、較好的是1〇㈠做下加熱 硬化10分鐘〜24小時、較好的是3〇分鐘〜3小時藉此獲得 所需之硬化膜。 由本發明之含有⑷〜⑻成分之塗布液所獲得之硬化膜 :膜中刀散有有機南分子微粒(⑻成分)、膠體二氧化石夕 ((c)成分)。 、該分散狀態較好的是無機有機混成之海島結構。相當於 海島結構之島的有機高分子微粒及膠體二氧化料粒子成 分的粒徑較好的是200 nm以下,更好的是100 nm以下不 凝集而均勻分散。 本發明硬化膜之總透光率較好的是80%以上更好的是 85%以上,霧度值較好的是1〇%以下,更好的是以下。 此種硬化膜具有高透明性。 再者有機局分子微粒((B)成分)、膠體二氧化碎((c)成 分)所分散之具有Si-ο鍵之基質來自(A-i)、(Α·2)、(A_3)、 141326.doc -45_ 201012882 (A-4)及(A-5)成分。 又’本發明亦提供一種硬化膜之製造方法,其特徵在於 包括:將上述本發明之塗布液加熱並使其硬化之步驟。 又’由本發明之含有(A)〜(G)成分之塗布液所獲得之硬 化膜於膜中分散有有機高分子微粒((B)成分)、膠體二氧化 矽((C)成分)、氧化鈽粒子成分;)。 本發明之硬化膜之霧度值較好的是10%以下,更好的是 5。/〇以下。此種硬化膜之耐紫外線性優異並且具有高透明 性。 再者’有機高分子微粒((B)成分)、膠體二氧化矽(((:)成 分)、氧化鈽粒子((F)成分)所分散之具有Si-Ο鍵之基質來 自各(A)成分。 又,本發明亦提供一種硬化膜之製造方法,其特徵在於 包括:將上述本發明之塗布液加熱並使其硬化之步驟。 以下’對本發明之樹脂積層體加以說明。 [樹脂積層體] 樹月旨積層體包含基材及形成於基材上之樹脂層。 形成於基材上之樹脂層可為一層,亦可為兩層以上。 以下’對本發明之樹脂積層體加以詳細說明。 本發明之第1樹脂積層體係在基材上或者在無機層(無機 硬質物層)與基材之間具有上述本發明硬化膜之積層體。 又,本發明之第2樹脂積層體係具有基材、形成於該基材 上之本發明硬化膜、形成於硬化膜上之透明導電膜之積層 體。進而,本發明之第3樹脂積層體係具有基材、形成於 141326.doc 201012882 該基材上之本發明硬化膜、及形成於硬化膜上之光觸媒層 之積層體》以下,有時將第卜第3樹脂積層體統稱為本發 明之樹脂積層體。 使用本發明之塗布液而形成上述硬化膜之方法,係如上 述本發明硬化膜之說明中所示。本發明之樹脂積層體具有 優異之耐磨耗性、耐擦傷性、耐撓曲性及耐煮沸性,其用 途係如上述本發明塗布液中之用途說明中所示。In the second aspect, as the thickness of the coating film, the thickness of the cured film is adjusted to be υο μιη, more preferably 2 to 2 〇 μηι. Thereafter, in a suitable hardening condition, it is usually carried at 80~. C, preferably 1 〇 (1) is subjected to heat hardening for 10 minutes to 24 hours, preferably 3 minutes to 3 hours, whereby a desired cured film is obtained. The cured film obtained by the coating liquid containing the components (4) to (8) of the present invention has organic south molecular fine particles (component (8)) and colloidal silica dioxide (component (c)) dispersed in the film. The dispersed state is preferably an island structure of inorganic organic mixture. The particle size of the organic polymer microparticles and the colloidal dioxide particle component corresponding to the island of the island structure is preferably 200 nm or less, and more preferably 100 nm or less is not aggregated and uniformly dispersed. The total light transmittance of the cured film of the present invention is preferably 80% or more, more preferably 85% or more, and the haze value is preferably 1% by weight or less, more preferably the following. Such a cured film has high transparency. Further, the matrix having the Si-O bond dispersed by the organic microparticle (B component) and the colloidal dioxide dimer (c) component are derived from (Ai), (Α·2), (A_3), and 141326. Doc -45_ 201012882 (A-4) and (A-5) ingredients. Further, the present invention provides a method for producing a cured film, which comprises the steps of heating and hardening the above-described coating liquid of the present invention. Further, the cured film obtained from the coating liquid containing the components (A) to (G) of the present invention has organic polymer fine particles (component (B)) dispersed therein, colloidal cerium oxide (component (C)), and oxidation.钸 particle composition ;). The cured film of the present invention preferably has a haze value of 10% or less, more preferably 5. /〇The following. Such a cured film is excellent in ultraviolet resistance and has high transparency. Further, the organic polymer microparticles (component (B)), colloidal cerium oxide ((:) component), and cerium oxide particles (component (F)) are dispersed in a matrix having Si-germanium bonds from each (A). Further, the present invention provides a method for producing a cured film, which comprises the step of heating and hardening the coating liquid of the present invention. The resin laminate of the present invention will be described below. [Resin laminate] The tree-layered laminate includes a substrate and a resin layer formed on the substrate. The resin layer formed on the substrate may be one layer or two or more layers. Hereinafter, the resin laminate of the present invention will be described in detail. The first resin laminate system of the present invention has the laminate of the above-described cured film of the present invention on a substrate or between an inorganic layer (inorganic hard layer) and a substrate. Further, the second resin laminate system of the present invention has a substrate. And a laminated body of the cured film of the present invention formed on the substrate and the transparent conductive film formed on the cured film. Further, the third resin layered system of the present invention has a substrate and is formed at 141326.doc 201012882 In the laminated body of the cured film of the present invention and the photocatalyst layer formed on the cured film, the third resin laminate is collectively referred to as the resin laminate of the present invention. The coating liquid of the present invention is used to form the above. The method of curing the film is as shown in the above description of the cured film of the present invention. The resin laminate of the present invention has excellent abrasion resistance, scratch resistance, flex resistance and boiling resistance, and its use is as described above. It is shown in the description of the use in the coating liquid of the present invention.

本發明之樹脂積層體若具有上述構成則無特別限制。例 如可使用於:二輪車、三輪車之擋風玻璃,汽車用、軌道 車輛用、建設機械車㈣f,建設機械車輛用1,汽車内 部裝部用構件,汽車外部裝飾用構件,摩托車用構件,卡 車之貨箱外罩,電車、飛機、船舶等各種交通工具的内外 部裝㈣構件:視聽設備(audiQvisual)、洗衣機、炊飯 電鋼IH(InducUon Heating,感應加熱)烹調爐等家 庭用電盗、傢具等之構件,行動電話、筆記型電腦、遙控 裝置等之構件;傢具用外部裝飾材料、建築材料、車窗、 建築物等之窗用遮光膜,牆面、天花板、地板等之建築用 内部裝飾,壁板等之外壁、圍 筮w ®牆屋頂、門扇、擋山牆封 篇板荨之建築用外部裝飾,窗框、門扇、㈣、_ 揭等傢具類之表面裝飾材 裳株Φ將下聚光燈、路燈等之照明 零=電聚、液晶、有機肛等之各種顯示器,太陽電池, ;透鏡,光碟,鏡,橋正用眼鏡、太陽眼鏡、 =用護目鏡、安全眼鏡等之眼鏡透鏡,窗玻璃等之光學 構件容器,洗劑、沐浴4、洗手皂等之容 141326.doc •47- 201012882 器’甜食及點心、飲料類之容器,小件盒等各種包 器、…包裝材料;此外,可使用於:日式彈珠台等之構:、 手提相等提包類,衛生間便座、桌塾、鐘錶、白板 盾以及雜貨等。 不°隻 作為上述汽車内部裝飾用構件,例如可列舉 板、控制台盒、儀錶蓋、儀錶面板、指示面板、門飾板、 門鎖圈、方向盤、車窗升降開關座、中央儀錶群、控制 板、變速桿套、開關類、煙灰缸等。 參 作為上述汽車外部裝飾用構件,例如可列舉:防風雨概 、保險桿、保險桿護撞η輯泥板、車身鑲板、車門、 擾流板、發動機罩、車身護條、料箱蓋、前格柵、支樓 :、車輪蓋、中柱、後視鏡、中心褒飾、側飾條、門姊 ^条、窗飾條等,窗、頭燈、尾燈、車燈反射鏡、門遮陽 板、擋風零件等。 也又、!^上述摩托車用構件,例如可列舉:外殼、擋泥 板、油箱蓋、載物箱蓋等。 =上述視聽設備、洗衣機、炊飯器、電銷、m烹調爐 專豕庭用電器、傢具等構件,例如可列舉:前面板、控制 =望觸摸面板'薄膜開關面板、按紐、標諸'表面裝飾 材料等。 :道路透光性遮音板、 防風面板、防雪棚、車 曰光室、遊廊等之屋頂 、建築物等之窗、塑膠 作為上述建築材料,例如可列舉 鐵路及工廠周邊之隔音板、拱廊、 棚及自行車停車場、公共汽車站、 及入口或半球型屋頂等之採光材料 141326.doc -48· 201012882 溫室等。 作為上述行動電話、筆記型電腦、遙控裝置等之構件, 例如可列舉:殼體、顯示窗、小鍵盤、按鈕等。 (基材) 作為基材’可使用包含樹脂、金屬、木材、橡膠、混凝 土、石材、陶瓷、皮革、紙、布及纖維中之至少任—種 者’但較好的是使用樹脂製基材(樹脂基材)。The resin laminate of the present invention is not particularly limited as long as it has the above configuration. For example, it can be used for: windshields for two-wheeled vehicles, tricycles, automobiles, rail vehicles, construction machinery vehicles (four) f, construction machinery vehicles, automotive interior components, automotive exterior components, motorcycle components, trucks. The outer cover of the cargo box, the internal and external equipment of various vehicles such as trams, airplanes, ships, etc. (4) Components: audiovisual equipment (audiQvisual), washing machine, IH (InducUon Heating) cooking stove, household electric thieves, furniture, etc. Components, mobile phones, notebook computers, remote control devices, etc.; exterior decorative materials for furniture, building materials, window shades for windows, buildings, etc., interior finishes for walls, ceilings, floors, etc. Exterior wall such as siding, cofferdam w ® wall roof, door leaf, gable wall sealing sheet, exterior decoration for building, window frame, door leaf, (4), _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Illumination of street lamps, etc. = various displays such as electro-convergence, liquid crystal, organic anus, solar cells, lenses, optical discs, mirrors, bridge glasses, and sun glasses Mirrors, glasses lenses such as goggles and safety glasses, optical component containers such as window glass, lotion, bath 4, hand soap, etc. 141326.doc •47- 201012882 'Confectionery and snacks, beverage containers , small boxes and other various packaging, packaging materials; in addition, can be used for: Japanese-style pinball, etc.:, portable equal bag, bathroom toilet, table, clock, whiteboard shield and groceries. It is not only used as the above-mentioned automotive interior decorative member, but for example, a board, a console box, a meter cover, an instrument panel, an indicator panel, a door trim, a door lock ring, a steering wheel, a window lift switch seat, a central instrument cluster, and a control Plates, shift lever sleeves, switches, ashtrays, etc. As the member for the exterior decoration of the automobile, for example, a weatherproof, a bumper, a bumper protector, a body panel, a door panel, a spoiler, a hood, a body guard, a tank cover, Front grille, branch building: wheel cover, center pillar, rear view mirror, center enamel trim, side trim strip, door sill strip, window trim strip, etc., window, headlight, taillight, lamp mirror, door shade Board, windshield parts, etc. Further, the above-mentioned components for the motorcycle include, for example, a casing, a fender, a fuel tank cap, a tank lid, and the like. =The above-mentioned audio-visual equipment, washing machine, rice cooker, electric power, m cooking oven, electrical appliances, furniture and other components, for example, front panel, control = touch panel "membrane switch panel, button, standard" surface Decorative materials, etc. : Road light transmissive soundproof panels, windproof panels, snow shelters, car light chambers, verandas, etc., roofs, buildings, etc., windows, plastics, etc. As such building materials, for example, soundproof panels and arcades around railways and factories can be cited. Lighting materials for sheds and bicycle parking lots, bus stops, and entrance or hemispherical roofs 141326.doc -48· 201012882 Greenhouses, etc. Examples of the components of the mobile phone, the notebook computer, and the remote control device include a casing, a display window, a keypad, a button, and the like. (Substrate) As the substrate, at least any one of resin, metal, wood, rubber, concrete, stone, ceramic, leather, paper, cloth, and fiber can be used, but it is preferable to use a resin substrate. (Resin substrate).

作為基材,可列舉樹脂製成形體、膜、片等。膜、片係 採用擠出成形法、充氣法、溶液流延法等公知之成形方法 而製造,其等亦可視需要而沿單軸及/或雙軸方向延伸。 對於基材中之樹脂種類並無特別限制,可根據所得樹脂積 層體的用途,自各種樹脂中適當選擇。 又,本發明之基材可具有凹凸,並且不論基材形狀如 何,可為圓柱形、橢圓柱形、稜柱形等。 又,本發明之樹脂積層體可於其内部具有空間於具有 内部空間之情形時’亦可於内壁部分積層其他樹脂層。、 因此’對於本發明之基材的形狀並無特別限制本發明 之樹脂積層體包含如下所述的藉由嵌人成形或嵌入模成形 而獲得之樹脂積層體。 -% <衢脂,例如可列舉··聚 乙烯、聚丙稀、環稀烴系樹脂(例如:微股份有限 造之 「Arton ,、曰太7 」曰本Ze〇n股份有限公司製造之 「Zeonor」、「Zeonex」)、 M ® ^ 土戊烯等聚烯烴系樹脂; 眾對本一曱酸乙二酯、聚對苯二 T酸丁一 5曰、聚萘二甲酸 141326.doc •49- 201012882 乙二醋等之聚酯系樹脂;二乙酸纖維素、三乙酸纖維素、 乙酸丁酸纖維素等纖維素系樹脂;聚苯乙烯、對排聚苯乙 烯、丙烯腈-丁二烯·苯乙烯樹脂(ABS樹脂)等苯乙烯系樹 脂’聚醯亞胺、聚醚醯亞胺、聚醯胺醯亞胺等醯亞胺系樹 月曰,尼龍專聚醯胺系樹脂;聚趟酿I、聚越醚酮等酮系樹 脂,聚颯、聚醚砜等砜系樹脂;聚氯乙稀、聚偏二氣乙烯 , 等氣乙烯系樹脂;聚甲基丙烯酸甲酯等丙烯酸系樹脂;聚 故酸s曰樹脂、聚苯硫醚、聚縮越、改質聚苯醚、聚乙烯 醇、環氧樹脂、氟樹脂等;亦可為將上述聚合物混合複數 _ 種而成之聚合物合金.聚合物掺合物。又,亦可為將上述 樹脂積層複數層而成之積層結構體。上述樹脂中,較好的 是聚酯系樹脂、聚烯烴系樹脂及聚碳酸酯樹脂。 以該專掏·脂為展好姐I u __Examples of the substrate include a resin, a film, a sheet, and the like. The film or sheet is produced by a known molding method such as an extrusion molding method, an aeration method, or a solution casting method, and the like may be extended in a uniaxial and/or biaxial direction as needed. The kind of the resin in the substrate is not particularly limited, and can be appropriately selected from various resins depending on the use of the obtained resin laminate. Further, the substrate of the present invention may have irregularities and may have a cylindrical shape, an elliptical cylindrical shape, a prismatic shape or the like regardless of the shape of the substrate. Further, when the resin laminate of the present invention has a space inside it and has an internal space, it is also possible to laminate another resin layer on the inner wall portion. Therefore, the shape of the substrate of the present invention is not particularly limited. The resin laminate of the present invention comprises a resin laminate obtained by insert molding or insert molding as described below. -% <Rouge, for example, polyethylene, polypropylene, and cycloaliphatic resin (for example, "Arton, 曰太 7" manufactured by Micro Co., Ltd." Polyolefin resin such as Zeonor, Zeonex, M ® ^ glutaryl; publicly available ethylene phthalate, poly(p-phenylene tert-butyrate), polyphthalic acid 141326.doc •49- 201012882 Polyester resin such as ethylene diacetate; cellulose resin such as cellulose diacetate, cellulose triacetate or cellulose acetate butyrate; polystyrene, aligned polystyrene, acrylonitrile butadiene benzene A styrene-based resin such as a vinyl resin (ABS resin), such as a polyimine, a polyether quinone, or a polyamidamine, and a nylon polyamine phthalamide resin; a ketone resin such as polyether ketone, a sulfone resin such as polyfluorene or polyether sulfone; a polyvinyl chloride resin such as polyvinyl chloride or polyvinylidene; an acrylic resin such as polymethyl methacrylate; Therefore, acid s曰 resin, polyphenylene sulfide, polycondensation, modified polyphenylene ether, polyvinyl alcohol, epoxy resin, fluororesin ;. The above polymer alloy may also be a polymer obtained by mixing a plurality of kinds _ polymer blend. Further, it may be a laminated structure in which a plurality of layers of the above resin are laminated. Among the above resins, preferred are polyester resins, polyolefin resins and polycarbonate resins. With this special 掏 grease as a good sister I u __

機械物性、耐熱性等優異之聚碳酸酯。A polycarbonate excellent in mechanical properties, heat resistance, and the like.

電漿法或大氣壓電漿法等之電漿處理 例如可列舉:電暈放電處理、低壓 等之電漿處理、鉻酸處理(濕式)、 I41326.doc •50. 201012882 火悠處理、熱風處理、臭氧.紫外線照射處理、電子 理、1TR〇處理等,又,作為凹凸化法,例如可列舉··噴 砂法、溶劑處理法等。該等表面處理法可根據基材之種類 來適當選擇,通常就硬化及操作性等方面而言,較好的是 採用電暈放電處理法。x,亦可利用石夕烧偶合劑進行表面 處理或設置底塗層。 (無機硬質物層) 第靖脂積層體中之無機硬f物層可根據所欲賦予之功 能來選擇,並無特別限制。例如,於欲對無機硬質物層職 予耐磨耗性之情形時,無機硬質物層較好的是 SKM1.GK2)膜、SiNy(1^yS4/3)膜或者非晶碳膜。 上述Si〇x(1.8以2)膜、SiNy(1 2以4/3)膜由於係利 用例如下述化學性氣相沈積法或物理性氣相沈積法進行成 膜,故就化學計量學而言反應並未完成。因此,在盈機硬 質物層+可形成未導入氧原子或氮原子之缺損部,且在 SiOx及SiNy膜中X及y具有範圍。 再者,若將氧與氮同時投人即可製作的氧切與氮化妙 混合存在之複合物亦適宜。 又’無機硬質物層之硬質性若於如實施例中所示的使用 TABERS試驗機之評價中霧度之上升為未達iq%之程度 即可。或者,若以微維氏硬度(mi⑽viekers ^如咖)計 為500 HV左右以上即可。 無機硬質物層之厚度例如較好的是丨μπ1以上,更好的是 1〜8 μιη。又,於下述無機硬質物層之製造方法中,無機= 141326.doc •51 - 201012882 質物層較好的是直接積層於硬化膜上。 本發明之樹脂積層體之無機硬質物層較好的是藉由化學 氣相沈積法(CVD法,chemical vapor deposition)或者物理 氣相沈積法(PVD法,physical vapor deposition)進行成 膜。作為CVD法之具體例,可列舉:電漿CVD法、光CVD 法等;作為PVD法之具體例,可列舉:離子電鍵法、真空 蒸鍍法、濺鍍法等。 利用如上述之於真空下進行之薄膜形成技術而成膜之無 機硬質物層通常具有與無機成分密著,但與有機成分難以 密著之性質。於本發明之樹脂積層體之情形時,由於硬化 膜具有將有機微粒封入Si-O基質中之無機.有機混成結構, 故無機硬質物層與硬化膜之密著性良好。 作為利用CVD法來積層無機硬質物層之具體例,對利用 電漿CVD法而於硬化膜上形成Si〇x(1 8$χ$2)之情形加以 說明。 所謂電漿CVD法,係指將原料氣體導入至能量密度高之 電漿狀態中以使其分解,並利用化學反應使目標材料被覆 於基材上之方法。於本發明中,於電漿CVD裝置内配置包 含基材及硬化膜之積層體’使裝置内成為真空後,—面向 電漿CVD裝置内添加氬氣一面導入Si〇x(18 $ 2)膜之原 料氣體,當各氣體流量變得穩定時,施加電力而產生電 漿,從而於硬化膜上形成Si〇x(1_8$xS2)膜。 於無機硬質物層為Si〇x(l_8^x^2)膜之情形時,形成 Si〇x(1.8SxS 2)膜之原料例如為矽原料氣體及氧原料氣 141326.doc -52- 201012882 形成Si〇x(1.8sxg2)膜之矽原料氡體,較好的是使用矽 燒氣體或有機矽化合物氣體。 作為適宜使用之矽烷氣體,可列舉;SiH4氣體、以2116氣 體、Si3HA體等。 有機矽化合物較好的是自矽上鍵結有含碳之基者中任意 選擇。作為適宜使用之有機碎化合物之具體例,可列舉= 四甲氧基矽烷、四乙氧基矽烷、甲基三甲氧基矽烷、乙基 三甲氧基錢、四曱基二石夕氧垸、二甲氧基二甲基石夕烧、 二乙氧基二甲基石夕烧、甲基三乙氧基石夕烧、八甲基 烷等。 該等有機⑦化合物可單獨使用其—種,亦可併用兩種以 上0 於SK>X(1.8SU2)膜之石夕原、料氣體為錢氣體之情形 時,作為適宜使用之氧原料氣體,可列舉”山氣。 又,於Si〇x(1.KG2)膜之石夕原料氣體為有機石夕化合物 氣體之情形時,作為適宜使用之氧原料氣體,可列舉: n2o氣、〇2氣及〇3氣。 上述石夕原料氣體及氧原料氣體之流量例如為i韻⑽3/ 分鐘,較好的是1〜300 cm3/分鐘…氬氣之流量例如為 20〜400 CmV分鐘,較好的是100〜300 cm3/分鐘。 所使用之電漿CVD裝置若為通常所使用之裝置則無特別 限定,例如可使用平行板電極型、電容輕合型、電感耗合 型等。電漿⑽裝置内之M力例如較好岐h33〜133^左 141326.doc -53· 201012882 右’尤其好的是約2.7 Pa。 電力施加中所使用之電源的頻率可於聲波〜微波範圍内 廣泛使用。 於利用上述電漿CVD法於硬化膜上形成Si〇x(1 8$χ$2) 膜之情形時,使用有機矽化合物作為矽原料氣體且有機矽 化合物於常溫下為液體或固體時,將加入有機矽化合物之 容器整體加熱,使其氣化而使用。 於上述情形時,將有機矽化合物氣體及氧原料氣體之流 量例如控制為1〜10 cm3/分鐘,與將流量例如控制為2〇〜4〇〇Examples of the plasma treatment such as the plasma method or the atmospheric piezoelectric slurry method include corona discharge treatment, plasma treatment at a low pressure, chromic acid treatment (wet), and I41326.doc • 50. 201012882 Fire treatment, hot air treatment In addition, as the embossing method, for example, a blasting method, a solvent treatment method, or the like can be mentioned. These surface treatment methods can be appropriately selected depending on the kind of the substrate, and in general, in terms of hardening and workability, a corona discharge treatment method is preferred. x, can also be surface treated or provided with a primer coating. (Inorganic Hard Layer) The inorganic hard f layer in the smectic layer may be selected depending on the function to be imparted, and is not particularly limited. For example, in the case where the inorganic hard layer is to be subjected to abrasion resistance, the inorganic hard layer is preferably a SKM1.GK2) film, a SiNy (1^yS4/3) film or an amorphous carbon film. The Si〇x (1.8 to 2) film and the SiNy (1 2 in 4/3) film are formed by a chemical vapor deposition method or a physical vapor deposition method, for example, so that stoichiometry is performed. The reaction was not completed. Therefore, in the filler layer +, a defect portion into which an oxygen atom or a nitrogen atom is not introduced can be formed, and X and y have a range in the SiOx and SiNy films. Further, it is also suitable to combine a combination of oxygen and nitriding which can be produced by simultaneously injecting oxygen and nitrogen. Further, the hardness of the inorganic hard layer may be such that the increase in haze in the evaluation using the TABERS tester as shown in the examples is less than iq%. Alternatively, it may be about 500 HV or more in terms of micro Vickers hardness (mi (10) viekers ^ as coffee). The thickness of the inorganic hard layer is, for example, preferably 丨μπ1 or more, more preferably 1 to 8 μm. Further, in the method for producing an inorganic hard material layer described below, inorganic = 141326.doc • 51 - 201012882 The physical layer is preferably laminated directly on the cured film. The inorganic hard layer of the resin laminate of the present invention is preferably formed by chemical vapor deposition (CVD) or physical vapor deposition (PVD). Specific examples of the CVD method include a plasma CVD method and a photo CVD method. Specific examples of the PVD method include an ion key method, a vacuum vapor deposition method, and a sputtering method. The inorganic hard layer formed by the thin film forming technique carried out under vacuum as described above usually has a property of being in close contact with the inorganic component but not easily adhered to the organic component. In the case of the resin laminate of the present invention, since the cured film has an inorganic-organic hybrid structure in which the organic fine particles are sealed in the Si-O matrix, the adhesion between the inorganic hard layer and the cured film is good. As a specific example of laminating an inorganic hard material layer by a CVD method, a case where Si〇x (1 8 $ χ $2) is formed on a cured film by a plasma CVD method will be described. The plasma CVD method refers to a method in which a material gas is introduced into a plasma state having a high energy density to be decomposed, and a target material is coated on a substrate by a chemical reaction. In the present invention, a laminate including a substrate and a cured film is placed in a plasma CVD apparatus to evacuate the inside of the apparatus, and an argon gas is introduced into the plasma CVD apparatus to introduce a Si〇x (18 $ 2) film. When the flow rate of each gas becomes stable, electric power is applied to generate plasma, and a Si〇x (1_8$xS2) film is formed on the cured film. In the case where the inorganic hard material layer is a Si〇x(l_8^x^2) film, the raw material for forming the Si〇x (1.8SxS 2) film is, for example, a bismuth source gas and an oxygen source gas 141326.doc -52- 201012882 The Si〇x (1.8sxg2) film is preferably a ruthenium gas or an organic ruthenium compound gas. Examples of the decane gas to be suitably used include SiH4 gas, 2116 gas, Si3HA body, and the like. The organic ruthenium compound is preferably selected from those having a carbon-containing group bonded to the ruthenium. Specific examples of the organic pulverized compound to be suitably used include, for example, tetramethoxy decane, tetraethoxy decane, methyl trimethoxy decane, ethyl trimethoxy hydroxy, tetradecyl oxazepam, and Methoxy dimethyl sinter, diethoxy dimethyl sulphur, methyl triethoxy sulphur, octamethyl alkane, and the like. These organic 7 compounds may be used singly or in combination with two or more kinds of oxysulfide raw materials, which are suitable for use in the case where the gas of the SK>X (1.8SU2) film is used as a money gas. In the case where the raw material gas of the Si〇x (1.KG2) film is an organic compound gas, the oxygen source gas which is suitably used may be, for example, n2o gas or helium gas. And the flow rate of the above-mentioned stone raw material gas and oxygen raw material gas is, for example, i rhyme (10) 3 / minute, preferably 1 to 300 cm 3 / minute... the flow rate of argon gas is, for example, 20 to 400 CmV minutes, preferably The plasma CVD apparatus to be used is not particularly limited as long as it is a commonly used device, and for example, a parallel plate electrode type, a capacitance light type, an inductance consumption type, or the like can be used. The plasma (10) device can be used. The internal force of M is, for example, better 岐h33~133^left 141326.doc -53·201012882 Right' particularly good is about 2.7 Pa. The frequency of the power source used in power application can be widely used in the range of acoustic wave to microwave. Si〇x (1 8$χ) is formed on the cured film by the above plasma CVD method. In the case of the film, when an organic ruthenium compound is used as the ruthenium raw material gas and the organic ruthenium compound is a liquid or a solid at normal temperature, the entire organic ruthenium compound-containing container is heated and vaporized and used. The flow rate of the organic hydrazine compound gas and the oxygen source gas is controlled, for example, to 1 to 10 cm 3 /min, and the flow rate is controlled to, for example, 2 〇 to 4 〇〇.

Cm3/分鐘之氬氣一同導入電漿CVD裝置内(直接氣化導入方 式)。 又,除上述直接氣化導入方式外,於有機矽化合物為液 體之情形時,亦可使用氬氣作為載體氣體,例如以2〇〜4〇〇 cm3 /分鐘之流量將氬氣導入至加入有機矽化合物之可控制 溫度的容器中,使有機矽化合物起泡,從而將有機矽化合 物蒸氣與氬氣一同導入電漿CVD裝置内(使用載體氣體之 起泡導入方式)。 於上述無機硬質物層之製造方法中,於無機硬質物層為 SiNy(1.2^y$4/3)膜之情形時,形成 SiNy(12syg4/3)膜 之原料氣體例如為矽原料氣體及氮原料氣體。 作為適宜使用之矽原料氣體,可列舉:SiH4氣、81出6 氣、Si3H8氣等之矽烷氣體。 又,作為適宜使用之氮原料氣體,可列舉:n2氣及Nh3 氣。 141326.doc •54· 201012882 於上述無機硬質物層之· 表知·方法中,於無機硬質物層為 非晶碳膜之情形時,作為形成非晶碳膜之原料氣體,適宜 使用烴氣體。 再者於Ι氣體之農度南之情形時,亦可同時導入氣 進行稀釋。 . 於上述利用⑽法之無機硬質物層之製造方法中,使用 • 4料氣體作為無機硬質物層之原料,但並不限定於此。例 φ h,亦可使下述無機硬質物層之蒸錢原料氣化後使用。 作為利用PVD法來積層無機硬質物層之具體例,對利用 離子電鑛法來積層無機硬質物層之情形加以說明。 所明離子電鍍法,係指將反應性氣體等導入真空基鍍裝 f内,利用各種方法使裝置内產生氣體電漿,使所生成之 蒸鍍粒子(原子·分子)之—部分離子化並加速,向置於真空 中之基材照射蒸鑛粒子及其離子,從而於基材上形成蒸鑛 材料之薄膜之方法。亦即,所謂離子電鑛法,係指真空蒸 φ 鍍技術與電漿技術之複合技術。 上述離子電鍍法例如揭示於日本專利特開昭58_29835號 公報中。 於本發明中,將基材及硬化膜之積層體、以及無機硬質 ‘ 物層之蒸鍍原料分別配置於真空蒸鍍裝置内之規定位置, 為了產生電漿而將氬氣、氙氣等惰性氣體,以及視需要之 〇2、N2、乙炔、空氣等反應性氣體導入装置内,於蒸鍍原 料之附近施加高頻電壓以使蒸鍍原料電漿化,從而將無機 硬質物層積層於硬化膜上。 141326.doc -55- 201012882The argon gas of Cm3/min was introduced into the plasma CVD apparatus (direct gasification introduction method). Further, in addition to the above-described direct gasification introduction method, when the organic ruthenium compound is a liquid, argon gas may be used as a carrier gas, for example, argon gas may be introduced into the organic phase at a flow rate of 2 〇 to 4 〇〇 cm 3 /min. In a temperature-controllable container of the hydrazine compound, the organic hydrazine compound is foamed, and the organic hydrazine compound vapor is introduced into the plasma CVD apparatus together with argon gas (foaming introduction method using a carrier gas). In the method for producing the inorganic hard material layer, when the inorganic hard material layer is a SiNy (1.2^y$4/3) film, the material gas for forming the SiNy (12 syg4/3) film is, for example, a bismuth material gas and a nitrogen material. gas. Examples of the raw material gas which is suitably used include a decane gas such as SiH4 gas, 81-out 6 gas, and Si3H8 gas. Further, examples of the nitrogen source gas which is suitably used include n2 gas and Nh3 gas. In the case of the inorganic hard material layer being an amorphous carbon film, a hydrocarbon gas is suitably used as a material gas for forming an amorphous carbon film. In the case of the south of the Ι gas, it is also possible to introduce the gas at the same time for dilution. In the method for producing an inorganic hard material layer according to the above (10) method, the fourth material gas is used as the raw material of the inorganic hard material layer, but the invention is not limited thereto. For example, φ h can also be used after vaporizing the steamed raw material of the inorganic hard material layer described below. As a specific example of laminating an inorganic hard substance layer by the PVD method, a case where an inorganic hard substance layer is laminated by an ion-mine method will be described. The ion plating method is a method in which a reactive gas or the like is introduced into a vacuum-based plating f, and a gas plasma is generated in the device by various methods to partially ionize the generated vapor-deposited particles (atoms and molecules). Accelerating a method of irradiating a substrate placed in a vacuum with molten metal particles and ions thereof to form a thin film of a vaporized material on a substrate. That is, the so-called ionization method refers to a composite technology of vacuum evaporation φ plating technology and plasma technology. The above ion plating method is disclosed, for example, in Japanese Patent Laid-Open Publication No. SHO 58-29835. In the present invention, the laminate of the substrate and the cured film and the vapor deposition material of the inorganic hard layer are disposed at predetermined positions in the vacuum vapor deposition apparatus, and an inert gas such as argon gas or helium gas is generated to generate plasma. And, if necessary, in a reactive gas introduction device such as N2, N2, acetylene or air, a high-frequency voltage is applied in the vicinity of the vapor deposition material to plasma the vapor deposition material, thereby laminating the inorganic hard material on the cured film. on. 141326.doc -55- 201012882

乍為’·、、機硬質物層之蒸鍍原料,於無機硬質物層為 Si〇x(1.8SU2m之情形時可列舉氧化碎等,&無機硬質 物層為SiNy(1.2g y $ 4/3)膜之情形時可列舉氣化石夕等, 於…機硬質物層為非晶碳膜之情形時可列舉DLC (diamond-like carbon,類鑽碳)等。 無機硬質物層之蒸鍍原料錢用欲使其形成為無機硬質 物層之原料本身即可。 參 >再者,離子電錄法中之無機硬質物層之蒸鍵原料並不限 疋於固體W如’於難以使蒸鑛原料蒸發的原料之情形 時,亦可將上述無機硬質物層之料氣 氧原料氣體)導入真空塞鍍裝 讨虱體及 無機硬質物層。,’、、鑛裝置内,進行反應驗而積層 右真空蒸鑛裝置内之壓力例如為Pa左 施加高頻電叙裝置若為可進行高頻放電之裝 別限定。上述高頻電壓例如从…〜8.GkV左右\、 φ 於上述離子電錢法中’為了使對硬化膜表層 頻放電中進行,可採用電阻加執 ’、、、鑛於而 加熱、雷射光束加妖等力…、電子束加熱、高頻感應 發。 ‘、、、專加熱方法,視需要使蒸錢原料蒸 二咖法之無機硬質物層之積層方法並 電鑛法。如上所述,可利用真疋於離子 無機硬質物層。 、濺鍍法等來積層 所謂真空蒸鍍法,係指在 真二中使原料受熱蒸發,將該 141326.doc • 56 - 201012882 蒸發粒子輸送至基材表面,使蒸發粒子在基材表面再排列 而形成薄膜之方法。於真空蒸鍍法中,真空度通常為 1 ·3χ ΙΟ·2 Pa以下。 所謂濺鍍法’係指使惰性氣體成為電漿,再使所獲得之 正離子撞擊原料而將原料表面之元素原子撞出,使其附著 及/或堆積在位於其附近之基材上而形成薄膜之方法。 (透明導電膜)乍 is a vapor deposition material for the hard layer of '·, and the inorganic hard material layer is Si〇x (in the case of 1.8SU2m, oxidized smash, etc., & inorganic hard layer is SiNy (1.2gy $ 4/) 3) In the case of a film, a gasification stone or the like may be mentioned, and when the hard material layer is an amorphous carbon film, DLC (diamond-like carbon) or the like may be mentioned. The vapor deposition material of the inorganic hard material layer The money is intended to be formed into the raw material of the inorganic hard layer itself. Further, the steamed bond material of the inorganic hard layer in the ion-recording method is not limited to the solid W such as 'difficult to steam In the case where the raw material of the mineral raw material is evaporated, the gas oxygen source material of the inorganic hard material layer may be introduced into the vacuum plug plating body and the inorganic hard material layer. In the mine equipment, the reactor is subjected to a reaction test and the pressure in the right vacuum distillation unit is, for example, Pa. The application of the high-frequency electric discharge device is limited to the high-frequency discharge. The above-mentioned high-frequency voltage is, for example, from about ~8.GkV, and φ is used in the above-mentioned ion-electric money method, in order to perform the discharge on the surface of the cured film, it is possible to use a resistor, a heater, a heater, and a laser. The beam adds demon and other forces..., electron beam heating, high frequency induction. ‘,、, special heating method, as needed, steaming the raw materials of the steaming method, the method of laminating the inorganic hard layer and the electro-mine method. As described above, it is possible to utilize the ionic inorganic hard layer. The so-called vacuum evaporation method, such as sputtering, means that the raw material is evaporated by heat in the true two, and the 141326.doc • 56 - 201012882 evaporating particles are transported to the surface of the substrate, and the evaporated particles are rearranged on the surface of the substrate. And a method of forming a film. In the vacuum evaporation method, the degree of vacuum is usually 1 · 3 χ 2 2 Pa or less. The term "sputtering method" means that the inert gas is made into a plasma, and the obtained positive ions are struck against the raw material to knock out elemental atoms on the surface of the raw material, and adhere to and/or accumulate on the substrate located in the vicinity thereof to form a thin film. The method. (transparent conductive film)

本發明之第2樹脂積層體中之透明導電膜可根據所欲賦 予之功能而選擇,並無特別限制。例如,於欲對透明導電 膜賦予低電阻的電氣特性之情形時,透明導電膜較好的是 可列舉·氧化鋅、AZ0(摻鋁氧化辞)4GZ〇(摻鎵氧化鋅) 等以氧化鋅為主成分之材料,或者IT〇(摻錫氧化銦)、 Sn〇2(氧化錫)、ΙΖ〇(摻鋅氧化銦)、ic〇(摻鈽氧化銦)、 ATO(摻錄氧化錫)、FT〇(摻氟氧化錫)等不以氧化辞為主成 分之透明且具有導電性之材料。 透明導電膜之導電性的指標之一有載子濃度,載子濃度 越大則導電性越高。載子濃度^lxl()18/em3以上,則獲 得10000 Ω/□以下之表面電阻值,因而較好。又,若載子 /農度為1 X1 〇丨9/cm以上,則舍姦 、J言產生紅外反射,適宜作為抗 反射膜。⑼’若載子濃度為5xlQl9/em3以上,則可製作 用作觸摸面板用彳伞夕 板用途之具有1〇〜100() Ω/□之表面電阻值的樹 脂積層體。 若將透明導電膜製成非晶質薄膜, 因此可進一步減小膜厚,故較好。作 則被覆率變得良好 為非晶質之透明導 電 141326.doc •57· 201012882 膜材料,可列舉·· IZ〇(摻鋅 錫)糸Μ勝 τ ) ' ΖΤ〇(氧化鋅-氧化 錫)系相、l2T〇(氧化鋼_ 氧化 膜等,又,π μ迦、 f乳化錫)系、氧化錫系薄 特性 ,+添加有對該等薄膜賦予電氣特性、光學 特性、機械特性之氧化物之系等。 光學 材:==阻值設定為高電阻值之情形時,可藉由選擇 ==厚或成媒條件來調整。例如,於降… ^值之十月形時,透明導電媒中可使用ιτ〇等電阻率良好 (低)之結晶性材料。又’藉 找 糟由增加膜厚而降低表面電阻 值’但若減小透明導電媒之膜厚,則可期待透射率提高。 又’關於表面電阻值,若視使用目的而適當決定即可, 若為用於光電4、光電轉換^件、液晶、觸摸面板等 者’則表面電阻值較好較1G_以上且侧⑽以下, 更好的是_ Ω/□以上且2_ Ω/α以下。又,透明導電膜 之厚度例如較好的是5 nm以上,更好的是1〇〜3〇〇… 又,於下述透明導電膜之形成方法中,透明導電膜較好的 是直接積層於硬化膜上。 又,各層之最佳膜厚例如可藉由以下方法而決定。 首先,根據用途來決定可獲得必需表面電阻值之透明導 電膜的膜厚。其次,將硬化膜中所使用之材料的折射率設 為固定值,一面採用最佳化演算法一面改變硬化膜之膜 厚,求出可獲得最高透射率或者最低反射率之硬化膜的膜 厚。 再者,設於硬化膜上之透明導電膜可為單層,亦可為2 層以上之多層膜。例如,可考慮具有導電性之附多層膜之 141326.doc -58- 201012882 基材的透射率(反射率)而設置2層以上之透明導電膜,亦可 進步°又置折射率高之抗反射膜。又,即使於形成抗反射 膜之清^/時,亦並非揭限於1層者,亦可形成可獲得所需 透射率(反射率)之多層結構(例如2層〜6層等)。 (樹脂積層體之製造方法) 以下,對本發明之第2樹脂積層體之製造方法加以說 明0 本發明之樹脂積層體之製造方法之特徵在於包括:於基 材上形成使上述包含(A)〜(E)成分之塗布液硬化而成之硬 化膜的步驟(a)、以及於上述硬化膜上形成透明導電膜之步 驟(b)。 再者’關於上述步驟(a),係如上述塗布液及硬化膜之說 明中所示。 (透明導電膜之形成) 本發明之第2樹脂積層體係在透明導電膜與基材之間形 成有硬化膜者,透明導電膜較好的是利用化學氣相沈積法 (CVD法)、物理氣相沈積法(PVD法)或者塗布法而形成於 該硬化膜上。作為CVD法之具體例,可列舉:電裝CVD 法、光CVD法、細霧(mist)法等;作為Pvd法之具體例, 可列舉:離子電鍍法、真空蒸鍍法、濺鍍法等;塗布法之 具體例可列舉:喷霧法、旋轉塗布法、棒式塗布法、到刀 塗布法、噴墨法等。 利用於真空下進行之薄膜形成技術而形成之透明導電膜 通常具有與無機成分密著’但與有機成分難以密著之性 141326.doc -59- 201012882 質。於本發明之樹脂積層體之情形時,由於硬化膜具有將 有機微粒封入Si-Ο基質中之無機.有機混成結構,故透明導 電膜與硬化膜之密著性良好。 作為利用濺鍍法來積層透明導電膜之具體例,對利用賤 鑛法而於硬化膜上形成ITO膜之情形加以說明。 所謂濺鍍法,係指使惰性氣體成為電漿,再使所獲得之 正離子撞擊原料而將原料表面之元素原子撞出,使其附著 及/或堆積在位於其附近的稱為靶(target)之基材上而形成 薄臈之方法。 於此情形時,靶係使用ITO燒結體。於濺鍍裝置内配置 包含基材及硬化膜之積層體,使裝置内通常成為1〇·5以以 下之真空後,通入氬氣,於O.hiO Pa左右之真空下施加 0.W0 kWW左右的直流電力以產生電裂,從而於硬化 膜上形成ITO膜。 於透明導電膜為ITO媒之情形時,形成ITC)膜之原料例 如係使用添加有10質量%之叫之氧化銦燒結體靶。為了 控制導電率及光學特性,亦有將氧氣混入氬氣中之情形。 利用PVD法之透明導電膜之積層方法並不限定於上述澈 鍍法可利用真空蒸鍍法、離子電鍍法等來積層透明導電 -、M P丹工T仗屌科雙熱蒸發,將 蒸發粒子輸送至基材表面,使蒸發粒子在基材表面上再 列而形2成薄膜之方法。於真空蒸鍍法中,纟空度通常 1.3x10 2 Pa以下。 141326.doc 201012882 所謂離子電鍍法,係指將反應性氣體等導入真空蒸鍍裝 置内,利用各種方法使裝置内產生氣體電漿,使所生成之 蒸鍍粒子(原子·分子)之一部分離子化並加速,向置於真空 中之基材照射蒸鍍粒子及其離子,從而於基材上形成蒸鍍 材料之薄膜之方法。亦即,所謂離子電鍍法,係指真空蒸 鍍技術與電漿技術之複合技術。 作為利用CVD法來積層透明導電膜之具體例,對利用電 漿CVD法而於硬化膜上形成Zn〇膜之情形加以說明。 所謂電漿CVD法,係指將原料氣體導入至能量密度高之 電漿狀態中以使其分解,並利用化學反應使目標材料被覆 於基材上之方法。 於本發明之第2樹脂積層體中,於電漿cvd裝置内配置 包含基材及硬化膜之積層體,使裝置内成為真空後,一面 向電漿CVD裝置内添加氬氣一面導入Zn〇膜之原料氣體, 當各氣體流量變得穩定時,施加電力而產生電漿,從而於 硬化膜上形成ZnO膜。 (光觸媒層) 對於本發明之第3樹脂積層體之光觸媒層中所使用之光 觸媒材料並無特別限制,可使用先前公知者,例如:二氧 化鈦、鈦酸錄、鈦酸鋇、鈦酸鈉、二氧化錄、、 氧化鎢、硫化鎘、硫化辞等。該等可單獨使用,亦可將複 數種組合使用。該等之中,二氧化鈦、尤其是銳鈦礦型二 氧化欽可用作實用性光觸媒。又,為了促進該等光觸媒之 活性’亦可添加先前公知之光觸媒促進劑。作為光觸媒促 141326.doc -61 - 201012882 進劑,例如可較好地列舉:鉑、鈀、铑、釕等鉑族金屬, 該等可單獨使用,亦可將複數種組合使用。就光觸媒活性 之觀點而言,該光觸媒促進劑之添加量通常相對於光觸媒 而而於1〜20質量%之範圍内選擇。 光觸媒層之形成法如後述,於利用濕式法之情形時光 觸媒層之基質中通常使用聚矽氧系化合物。例如作為一 例,將聚有機矽氧烷或四乙氧基矽烷等烷氧基矽烷水解後 進行縮合而成者等直接成為基質。 (樹脂積層體之製造方法) 以下,對本發明之第3樹脂積層體之製造方法加以說 明。 本發明之樹脂積層體之製造方法包括:於基材上形成上 述本發明之硬化膜之步驟⑷、以及於上述硬化膜上形成光 觸媒層之步驟(b)。再者,關於上述步驟⑷,係如上述硬 化膜之說明中所示。 ❹ 對於在硬化膜上形成光觸媒層之方法並無特別限制可The transparent conductive film in the second resin laminate of the present invention can be selected depending on the function to be imparted, and is not particularly limited. For example, when it is desired to impart a low-resistance electrical property to the transparent conductive film, the transparent conductive film is preferably zinc oxide, AZ0 (aluminum-doped oxidized) 4GZ lanthanum (gallium-doped zinc oxide), or the like. Main component material, or IT〇 (tin-doped indium oxide), Sn〇2 (tin oxide), antimony (zinc-doped indium oxide), ic〇 (indium-doped indium oxide), ATO (doped with tin oxide), A material that is transparent and electrically conductive, such as FT〇 (fluorinated tin oxide), which is not mainly composed of oxidation. One of the indexes of the conductivity of the transparent conductive film is the carrier concentration, and the higher the carrier concentration, the higher the conductivity. When the carrier concentration is above lxl() 18/em3 or more, a surface resistance value of 10000 Ω/□ or less is obtained, which is preferable. In addition, if the carrier/agronomy is 1 X1 〇丨 9/cm or more, it is suitable for use as an anti-reflection film. (9) When the carrier concentration is 5xlQl9/em3 or more, a resin layered body having a surface resistance value of 1 〇 to 100 () Ω/□ which is used for a touch panel for a touch panel can be produced. When the transparent conductive film is made into an amorphous film, the film thickness can be further reduced, which is preferable. The coating coverage becomes good as amorphous transparent conductive 141326.doc •57· 201012882 Membrane material, exemplified by IZ〇(zinc-doped tin)糸Μ胜τ) 'ΖΤ〇(zinc oxide-tin oxide) Phase, l2T 〇 (oxidized steel _ oxide film, etc., π μ jia, f emulsified tin), tin oxide thin characteristics, + added oxides that impart electrical, optical and mechanical properties to the films Department and so on. Optical material: == When the resistance value is set to a high resistance value, it can be adjusted by selecting == thick or medium. For example, in the case of a valence of a value of ..., a crystalline material having a good (low) resistivity such as ιτ〇 can be used for the transparent conductive medium. Further, it is expected to reduce the surface resistance by increasing the film thickness. However, if the film thickness of the transparent conductive medium is made small, the transmittance can be expected to be improved. In addition, the surface resistance value may be appropriately determined depending on the purpose of use, and if it is used for photoelectric 4, photoelectric conversion, liquid crystal, touch panel, etc., the surface resistance value is preferably 1 G_ or more and side (10) or less. More preferably, it is _ Ω / □ or more and 2 Ω / α or less. Further, the thickness of the transparent conductive film is, for example, preferably 5 nm or more, more preferably 1 〇 to 3 Å... Further, in the method of forming a transparent conductive film described below, the transparent conductive film is preferably directly laminated on the transparent conductive film. On the hardened film. Further, the optimum film thickness of each layer can be determined, for example, by the following method. First, the film thickness of the transparent conductive film in which the necessary surface resistance value can be obtained is determined according to the use. Next, the refractive index of the material used in the cured film is set to a fixed value, and the film thickness of the cured film is changed by an optimization algorithm to determine the film thickness of the cured film which can obtain the highest transmittance or the lowest reflectance. . Further, the transparent conductive film provided on the cured film may be a single layer or a multilayer film of two or more layers. For example, a transparent conductive film of two or more layers may be provided in consideration of the transmittance (reflectance) of a substrate having a conductive multilayer film of 141326.doc -58 - 201012882, and the anti-reflection with a high refractive index may be improved. membrane. Further, even when the antireflection film is formed, it is not limited to one layer, and a multilayer structure (e.g., two to six layers) having a desired transmittance (reflectance) can be formed. (Method for Producing Resin Laminate) Hereinafter, a method for producing a second resin laminate according to the present invention will be described. The method for producing a resin laminate according to the present invention includes the step of forming the above-mentioned (A) to The step (a) of curing the cured coating film of the component (E) and the step (b) of forming a transparent conductive film on the cured film. Further, the above step (a) is as shown in the above description of the coating liquid and the cured film. (Formation of Transparent Conductive Film) The second resin laminated system of the present invention has a cured film formed between the transparent conductive film and the substrate, and the transparent conductive film is preferably a chemical vapor deposition method (CVD method) or a physical gas. A phase deposition method (PVD method) or a coating method is formed on the cured film. Specific examples of the CVD method include an electric CVD method, a photo CVD method, and a mist method. Specific examples of the Pvd method include an ion plating method, a vacuum vapor deposition method, and a sputtering method. Specific examples of the coating method include a spray method, a spin coating method, a bar coating method, a knife coating method, and an inkjet method. The transparent conductive film formed by the thin film formation technique under vacuum generally has a property of being intimate with the inorganic component but having difficulty in adhering to the organic component 141326.doc -59- 201012882. In the case of the resin laminate of the present invention, since the cured film has an inorganic-organic hybrid structure in which the organic fine particles are encapsulated in the Si-ruthenium matrix, the adhesion between the transparent conductive film and the cured film is good. As a specific example of laminating a transparent conductive film by a sputtering method, a case where an ITO film is formed on a cured film by a bismuth method will be described. The sputtering method refers to the process of causing an inert gas to be a plasma, and causing the obtained positive ions to strike the raw material to knock out elemental atoms on the surface of the raw material, causing them to adhere and/or accumulate in the vicinity thereof. A method of forming a thin crucible on a substrate. In this case, the target system uses an ITO sintered body. A layered body including a substrate and a cured film is placed in a sputtering apparatus, and a vacuum of 1 〇·5 or less is usually placed in the apparatus, and argon gas is introduced thereto, and 0. W0 kWW is applied under a vacuum of about 0. HiO Pa. The left and right DC power is generated to cause electric cracking to form an ITO film on the cured film. In the case where the transparent conductive film is an ITO medium, the material for forming the ITC) film is, for example, an indium oxide sintered body target to which 10% by mass is added. In order to control conductivity and optical characteristics, there is also a case where oxygen is mixed into argon gas. The method of laminating the transparent conductive film by the PVD method is not limited to the above-described plating method, and a transparent conductive layer can be laminated by a vacuum vapor deposition method, an ion plating method, or the like, and a double-heat evaporation of the MP is carried out to transport the evaporated particles. A method of forming a film by evaporating particles on the surface of the substrate to form a film on the surface of the substrate. In the vacuum evaporation method, the hollowness is usually 1.3 x 10 2 Pa or less. 141326.doc 201012882 The ion plating method is a method in which a reactive gas or the like is introduced into a vacuum vapor deposition apparatus, and gas plasma is generated in the apparatus by various methods to partially ionize the generated vapor deposition particles (atoms and molecules). Further, the method of irradiating the substrate placed in a vacuum with the vapor-deposited particles and ions thereof to form a thin film of the vapor-deposited material on the substrate is accelerated. That is, the so-called ion plating method refers to a composite technology of vacuum evaporation technology and plasma technology. As a specific example of laminating a transparent conductive film by a CVD method, a case where a Zn film is formed on a cured film by a plasma CVD method will be described. The plasma CVD method refers to a method in which a material gas is introduced into a plasma state having a high energy density to be decomposed, and a target material is coated on a substrate by a chemical reaction. In the second resin laminate of the present invention, a laminate including a substrate and a cured film is placed in a plasma cvd device, and after the inside of the device is vacuumed, Zn film is introduced into the plasma CVD device while adding argon gas. When the flow rate of each gas becomes stable, electric power is applied to generate plasma, thereby forming a ZnO film on the cured film. (Photocatalyst layer) The photocatalyst material used in the photocatalyst layer of the third resin laminate of the present invention is not particularly limited, and conventionally known ones such as titanium dioxide, titanate, barium titanate, sodium titanate, and the like can be used. Oxidation record, tungsten oxide, cadmium sulfide, vulcanization, etc. These may be used singly or in combination of plural kinds. Among these, titanium dioxide, especially anatase type dioxide, can be used as a practical photocatalyst. Further, a conventionally known photocatalyst promoter may be added to promote the activity of the photocatalysts. As the photocatalyst, for example, a platinum group metal such as platinum, palladium, rhodium or iridium may be preferably used, and these may be used singly or in combination of plural kinds. From the viewpoint of photocatalytic activity, the amount of the photocatalyst promoter to be added is usually selected in the range of 1 to 20% by mass based on the photocatalyst. The formation method of the photocatalyst layer is as follows. In the case of the wet method, a polyfluorene-based compound is usually used in the matrix of the photocatalyst layer. For example, an alkoxydecane such as polyorganosiloxane or tetraethoxysilane is hydrolyzed and then condensed to form a matrix. (Method for Producing Resin Laminate) Hereinafter, a method for producing the third resin laminate of the present invention will be described. The method for producing a resin laminate of the present invention comprises the step (4) of forming the cured film of the present invention on a substrate, and the step (b) of forming a photocatalyst layer on the cured film. Further, the above step (4) is as shown in the above description of the hardened film.并无 There is no particular limitation on the method of forming the photocatalyst layer on the cured film.

使用各種方法。例如可列舉:真空蒸鑛法、減鑛法等PVD ^或金屬喷敷法等乾式法、使㈣布液之濕式法等。作 夕濕纽之料液,較料是使肢除絲媒粒子以 外的成分分散於適當之盔德备 合物等)中者。 ”,、機系點。劍(例如,聚妙氧系化 塗布液可利用公知之太、土 ., 法、㈣塗布法、棒例如浸漬塗布法、旋轉塗布 到刀塗布法、模塗法、凹布去 ,沄等進订塗布,使其乾燥 I4J326.doc •62· 201012882 或硬化而形成光觸媒層。光觸媒層之厚度通常為5 nm〜2 μπι’較好的是10 nm〜2 μιη,尤其好的是2〇 nmM μιη。若 未達5 nm,則有未充分發揮光觸媒功能之虞。若超過2 μιη’則即使厚度大於此,光觸媒功能亦不明顯提高。 本發明之樹脂積層體亦可為成形體(樹脂積層體之成形 體)。樹脂積層體之成形體可藉由熱成形而製造。作為熱 成形’例如可列舉:真空成形、真空壓空成形、壓空成 形、塞助成形、緊合模成形。 (用於熱成形之基材) 以下對用於熱成形之基材(以下,僅稱為r基材」)加以 說明。 為了進行利用熱之成形’較好的是以基材之軟化點在 50〜300°C左右之範圍内之熱塑性樹脂為主體之片或膜,例 如可列舉:聚碳酸酯、聚丙烯、聚乙烯、聚苯乙烯、丙烯 腈-丁二烯-笨乙烯樹脂(ABS樹脂)、丙烯腈-苯乙烯樹脂 (AS樹脂)、甲基丙烯酸甲酯-苯乙烯樹脂樹脂)、聚醋 系樹脂、丙烯酸系樹脂、氣乙烯系樹脂、氟系樹脂等,亦 可為將上述聚合物混合複數種而成之聚合物合金.聚合物 摻合物。又’亦可為將上述樹脂積層複數層而成之積層結 構體。 亦可於基材之未形成硬化膜之面上設置裝飾層。作為裝 飾層’可列舉:油墨層、高亮度油墨層 '金屬蒸鍍層等。 又’裝飾層可為單層,亦可為相互組合之積層》 其次,對基材之厚度加以說明。 141326.doc -63- 201012882 嵌入成形用基材片或膜之厚度較好的是5 μιη〜〇 7 mm。 於未達5 μιη之情形時,存在膜強度低而在成形時膜破裂之 問題。又,若超過0.7 mm,則難以製成捲繞狀態之嵌入成 形用片,成為生產性差者。 以下,對熱成形方法之一例加以說明,但本發明不受下 述記載之限制。 於射出成形模具内以硬化膜側之面朝向可動模具之方式 設置未進行熱成形之基材片,利用可動模具之真空抽吸孔 進行真空抽吸,藉此進行預備成形。繼而,利用將射出樹 脂填充於未形成硬化膜之面側之模内成形,使射出樹脂與 基材片一體化。 又,亦可於射出成形模具内設置已進行熱成形之基材片 後,利用將射出樹脂填充於未形成硬化膜之面側之散入模 成形’使射出樹脂與基材片一體化。 為了將成形用基材片成形為凹凸或者圓柱形、橢圓柱形 =行熱成形。作為熱成形法,可列舉:冑空成形(包含 =成形等)、真空壓空成形、壓空成形、緊合模成形、 擠壓成形等。 為了將已進行熱成形之基材片安裝於射出成形模具内, 而進灯將不需要之部分切割而使其 之修整。 使其符-射出成形模具形狀 對於修整之方法並無特別限 法、雷射切割法、嘴水法;V列如可列舉:模切割 (Thom—沖壓法等。再者於::壓法、湯姆森 Γ了於熱成形時同時進行修 141326.doc -64 - 201012882 整。 於射出成形模具内以硬化膜側之面朝向可動模具之方式 設置未進行熱成形之基材,利用可動模具之真空抽吸孔進 行真空抽吸,藉此進行預備成形。繼而,將射出樹脂填充 於未形成硬化膜之面側。對於模内射出成形之條件並無特 別限制,可在通常的射出成形之條件範圍内進行調整。 又,射出成形機可使用立式射出成形機、臥式射出成形機 中之任一種。 將已進行熱成形之基材片設置於射出成形模具内後將 射出樹脂填充於未形成硬化膜之面側。 對於嵌入模射出成形之條件並無特別限制,可在通常的 射出成形之條件範圍内進行調整。又,射出成形機可使用 立式射出成形機、臥式射出成形機中之任一種。 射出成形模纟中具有用以將射出樹脂填充於纟進行熱成 形之基材片的未形成硬化膜之面侧而設置的機構。 於立式射出成形機之情形時,若設置於模具之下模中則 由重力固^。於必需設置於模具之上模中之情形時,則 有自模具中進行真空抽吸而將已進行熱成形之基材片加 以固定之方法、利用模具之凸部分加以覆蓋之方法、及利 用鎖子加以固疋之方法等。於臥式射出成形機之情形時, 則有在設置於固^側、可移動側之任意側的情形下均進行 真空抽吸而加以固定之方式、利用模具之凸部分加以覆蓋 之方法、及利用銷子加以固定之方法等。 又,本發明亦提供··硬化臈之製造方法,其特徵在於包 I41326.doc -65· 201012882 括將上述本發明之塗布液加熱並使其硬化之步驟;以及樹 脂積層體之製造方法,其特徵在於包括將上述本發明之塗 布液塗㈣基材上之步禪、使上述塗布液乾燥之步驟、將 上述基材進行熱成形之步驟、使上述塗布液硬化而設置塗 布層之步驟。 再者,於上述樹脂積層體之製造方法中,更包括於使爹 布液硬化而成之樹脂積層冑的不具有、塗布層之面上設置樹 脂層之步驟。 實施例 利用實施例來更詳細地說明本發明,但本發明不受該等 例之任何限定。 再者’只要未特職及’則各例中之諸特性係依照下述 要領而求得。 ⑴硬化膜中之來自無機成分之氧化物換算含量(質量%) π於鐵氟龍(註冊商標)培養皿上,對使塗布液熱硬化而獲 知之忒樣進行熱重量測定(氮氣下,以2〇。〔〕/分鐘升溫,室 溫〜800eC),根據其於8〇〇。〇下之殘渣而求得。 (2) 硬化膜中之有機高分子微粒含量(質量%) 藉由計算而算出。詳細而言,算出(A分(A-5)成分之水 解縮。反應几全進行者成分)、有機高分子微粒((B)成 分)及膝體二氧切((〇成分)之總質量中的有機高分子微 粒之質量%。 (3) 塗布液之溶液穩定性 於常溫下密封保存14日,藉由目視而判定凝膠化之有 141326.doc 201012882 無。對於未凝膠化者,利用A & D股份有限公司之音叉型 振動式黏度計8^10進行黏度測定’將與初期相比之變化 率為3倍以内者記為「〇」,將超過3倍者記為Γχ」。 (4)膜外觀 目視觀察硬化膜之外觀,對異物及斑點圖案、白濁加以 碎認’將未確認到上述情況者記為「良好」。 • (5)總透光率及霧度 鲁利用直讀霧度計(direct-read haze computer)(Suga試驗機 股份有限公司製造,HGM_2DP)測定積層體之總透光率及 霧度。 (6) 耐磨耗性 使用磨耗輪CS-1 OF及TABER磨耗試驗機(旋轉磨耗試驗 機)(東洋精機股份有限公司製造,型號:TS),於荷重4.9 N下進行500轉TABER磨耗試驗,將TABER磨耗試驗前之 霧度與TABER磨耗試驗後之霧度之差(δη)未達15者記為 • 「〇」,將霧度之差為15以上者記為「X」。 (7) 耐擦傷性 於實施例1〜11及比較例1〜6中,使用鋼絲域#〇〇〇〇(荷重 為4.9 N) ’以2000 mm/sec往復50次後,藉由目視來評價表 面之受損情況。將完全未受損者記為「1」,將稍許受損者 記為「2」,將經摩擦之部位的一半以上之面受損者記為 「3」。 於實施例12〜16及比較例7〜11中,使用鋼絲絨#〇〇〇〇(荷 重為9.8 N),以2000 mm/sec往復50次後,藉由目視來評價 141326.doc -67. 201012882 表面之受損情況。將完全未受損者記為「1」,將稍許受損 者5己為「2」,將經摩擦之部位的一半以上之面受損者記為 「3」。 (8) 密著性 依照Jis K 5400,利用剃刀之刀刃將試樣(硬化膜)以2 mm間隔切入縱橫各Π條之切縫而形成100個網格,用指腹 使市售之玻璃紙膠帶(「CT-24(寬度為24 mm)」,Nichiban 股份有限公司製造)與試樣充分密著後,以9〇0之角度向近 J方向迅速剝離,將硬化膜未剝離而殘存之網格數(X)以 X/100表示,以對硬化膜之密著性進行評價。 (9) 耐煮沸性(煮沸5小時後之密著性) 將積層體之試樣於不鏽鋼製燒杯中之沸水中浸潰5小時 後對雄、著性進行評價。密著性之評價係以與上述(8)同樣 之方式進行。 (10) 耐候性 用1000小時實施氙弧燈耐候試驗(Atlas公司之Ci65,輸 出功率為6.5 kW,黑面板溫度為63°c,相對濕度為5〇%)。 以试驗前後之硬化膜密著性的變化來評價耐候性。 (11) 耐繞曲性 除使用100 mmx寬度50 tnmx厚度1 mm之住友電木 (Sumitomo Bakelite)股份有限公司製造之聚碳酸酯標準板 (商品名:ECK100)作為基板以外,以與各例相同之方法製 造樹脂積層體之試樣。 用手指夾持該試樣之兩端,進行丨〇次半徑為5 〇 mni之曲 141326.doc -68 *- 201012882 線之強制彎曲,將積層面上未產生裂痕者記為「〇」,將產 生裂痕者記為Γχ」。 (12)耐熱性 利用耐熱性試驗(ΤΑΒΑΙ製造,PS-222)中,以110°C、 720小時之條件實施。以試驗前後之硬化膜密著性的變化 來評價耐熱性。 (13) 有機微粒分散結構Use a variety of methods. For example, a dry method such as a vacuum distillation method or a reduced ore method, or a dry method such as a metal spray method or a wet method using a (four) cloth liquid may be mentioned. The liquid of the wetness of the spleen is more preferably dispersed in an appropriate hood or the like. "", the machine point. Sword (for example, the polyoxygenated coating liquid can be known by the use of too much, soil, method, (four) coating method, rod, for example, dip coating method, spin coating to knife coating method, die coating method, The concave cloth is removed, coated, etc., and dried to form a photocatalyst layer. The thickness of the photocatalyst layer is usually 5 nm~2 μπι', preferably 10 nm~2 μιη, especially Preferably, it is 2 〇 nmM μιη. If it is less than 5 nm, the photocatalytic function is not fully utilized. If it exceeds 2 μm, the photocatalytic function is not significantly improved even if the thickness is larger than this. The resin laminate of the present invention may also be used. The molded body (molded body of the resin laminated body). The molded body of the resin laminated body can be produced by thermoforming. Examples of the hot forming include vacuum forming, vacuum forming, pressure forming, plug assist forming, and the like. Tightly-molding. (Substrate for thermoforming) The following is a description of a substrate for thermoforming (hereinafter, simply referred to as "r-substrate"). The softening point of the material is 50~30 The sheet or film in which the thermoplastic resin is in the range of about 0 ° C, for example, polycarbonate, polypropylene, polyethylene, polystyrene, acrylonitrile-butadiene-stupid vinyl resin (ABS resin), An acrylonitrile-styrene resin (AS resin), a methyl methacrylate-styrene resin), a polyester resin, an acrylic resin, an ethylene-based resin, a fluorine-based resin, or the like, or a mixture of the above polymers A plurality of polymer alloys and polymer blends. Further, it may be a laminated structure in which a plurality of layers of the above resin are laminated. A decorative layer may also be provided on the surface of the substrate on which the cured film is not formed. The decorative layer 'is an ink layer, a high-brightness ink layer, a metal vapor-deposited layer, or the like. Further, the decorative layer may be a single layer or a laminated layer combined with each other. Next, the thickness of the substrate will be described. 141326.doc -63- 201012882 The thickness of the substrate sheet or film for insert molding is preferably 5 μm to 〇 7 mm. In the case of less than 5 μηη, there is a problem that the film strength is low and the film is broken at the time of forming. In addition, when it exceeds 0.7 mm, it is difficult to form a sheet for insert molding in a wound state, which is inferior in productivity. Hereinafter, an example of the thermoforming method will be described, but the present invention is not limited to the description described below. In the injection molding die, a substrate sheet which is not thermoformed is placed so that the surface on the side of the cured film faces the movable mold, and vacuum forming is performed by vacuum suction holes of the movable mold to perform preliminary molding. Then, the injection resin is molded in the mold on the side where the cured film is not formed, and the injection resin is integrated with the substrate sheet. Further, after the base material sheet which has been subjected to hot forming is provided in the injection molding die, the injection resin is formed by filling the injection resin on the surface side of the surface on which the cured film is not formed, and the injection resin is integrated with the base material sheet. In order to form the base material sheet for forming into irregularities or cylindrical shapes, an elliptical cylindrical shape is formed by hot forming. Examples of the thermoforming method include hollow forming (including molding, etc.), vacuum forming, pressure forming, press molding, and extrusion molding. In order to mount the substrate sheet which has been thermoformed in the injection molding die, the incoming lamp cuts the unnecessary portion and trims it. The shape of the injection-molding mold is not limited to the method of dressing, the laser cutting method, or the mouth water method; the V column can be exemplified by die cutting (Thom-stamping method, etc.. Thomson repaired 141326.doc -64 - 201012882 at the same time as hot forming. In the injection molding die, the substrate which is not thermoformed is placed in such a manner that the surface of the cured film faces the movable mold, and the vacuum of the movable mold is utilized. The suction hole is subjected to vacuum suction to perform preliminary molding. Then, the injection resin is filled on the surface side where the cured film is not formed. The conditions for in-mold injection molding are not particularly limited, and can be in the range of usual injection molding conditions. Further, the injection molding machine can use either a vertical injection molding machine or a horizontal injection molding machine. The base material sheet that has been thermoformed is placed in an injection molding die, and the injection resin is not formed. The surface side of the cured film is not particularly limited, and can be adjusted within the conditions of normal injection molding. Further, the injection molding machine can be used. Any one of a vertical injection molding machine and a horizontal injection molding machine. The injection molding die has a mechanism for filling the surface of the base material sheet on which the injection resin is thermoformed without forming a cured film. In the case of a vertical injection molding machine, if it is placed in the lower mold of the mold, it is fixed by gravity. When it is necessary to be placed in the mold above the mold, vacuum suction from the mold will be performed. a method of fixing a base sheet to be thermoformed, a method of covering with a convex portion of a mold, a method of fixing by a lock, etc. In the case of a horizontal injection molding machine, it is disposed at a solid state. In the case of either side of the side or the movable side, vacuum suction is applied to fix it, a method of covering with a convex portion of the mold, a method of fixing with a pin, etc. Further, the present invention also provides A method for producing a hardened crucible, characterized in that the package I41326.doc-65·201012882 includes a step of heating and hardening the coating liquid of the present invention; and a method for producing a resin laminate, characterized in The method includes the steps of applying the coating liquid of the present invention to the step of immersing the substrate, drying the coating liquid, and thermally forming the substrate, and curing the coating liquid to form a coating layer. In the method for producing a resin laminated body, the method further includes a step of providing a resin layer on the surface of the resin layer which is obtained by curing the coating liquid, and the coating layer is provided. The embodiment will be described in more detail by way of examples. The present invention is not limited to the examples, and the characteristics in each of the examples are as follows. (1) Oxidation of inorganic components in the cured film. The content of the substance (% by mass) was measured by thermogravimetric measurement on a Teflon (registered trademark) petri dish on a Teflon (registered trademark) petri dish, and the sample solution was thermally hardened (nitrogen was heated at 2 Torr. Temperature ~800eC), according to its 8〇〇. Find the residue of your arm. (2) The content (% by mass) of the organic polymer fine particles in the cured film is calculated by calculation. Specifically, the total mass of the organic polymer microparticles ((B) component) and the knee biodegradation ((〇 component)) is calculated (the component of the A (A-5) component is hydrolyzed and reduced. % of the organic polymer microparticles in the solution. (3) The solution stability of the coating solution was sealed and stored at room temperature for 14 days, and it was judged by visual observation that the gelation was 141326.doc 201012882. For non-gelling, The viscosity measurement by the tuning fork vibrating viscometer 8^10 of A & D Co., Ltd. is described as "〇" when the rate of change is less than 3 times, and is marked as "Γχ". (4) Appearance of the film The appearance of the cured film was visually observed, and the foreign matter, the speckle pattern, and the white turbidity were identified. The case where the above was not confirmed was described as "good". (5) The total light transmittance and the haze were straight. The total light transmittance and haze of the laminate were measured by a direct-read haze computer (manufactured by Suga Test Machine Co., Ltd., HGM_2DP). (6) Wear resistance using the wear wheel CS-1 OF and TABER Abrasion Tester (Rotary Abrasion Tester) (Toyo Seiki Co., Ltd.) Manufactured, model: TS), 500 ton TABER abrasion test at a load of 4.9 N, and the difference between the haze before the TABER abrasion test and the haze after the TABER abrasion test (δη) is less than 15 as "•" In the case of the first to eleventh and the comparative examples 1 to 6, the steel wire field #〇〇〇〇 'After reciprocating 50 times at 2000 mm/sec, the surface damage was evaluated by visual inspection. Those who were completely intact were recorded as "1", and those who were slightly damaged were recorded as "2", and the parts to be rubbed were The damage of more than half of the faces is marked as "3". In Examples 12 to 16 and Comparative Examples 7 to 11, steel wool #〇〇〇〇 (load 9.8 N) was used, and reciprocating at 2000 mm/sec 50 After that, the damage of the surface of 141326.doc -67. 201012882 was evaluated by visual inspection. The person who was completely undamaged was recorded as "1", and the person who was slightly damaged was "2", and the part that would be rubbed The damage of more than half of the face is marked as "3". (8) Adhesiveness According to Jis K 5400, the sample (hardened film) is cut into the vertical and horizontal directions at intervals of 2 mm using a razor blade. The strip was slit to form 100 grids, and the commercially available cellophane tape ("CT-24 (width: 24 mm)", manufactured by Nichiban Co., Ltd.) was sufficiently adhered to the sample with the fingertips. The angle of 0 was quickly peeled off in the near J direction, and the number of meshes (X) in which the cured film was not peeled off and represented by X/100 was evaluated to evaluate the adhesion of the cured film. (9) Boiling resistance (boil 5) Adhesiveness after hours) The sample of the laminate was immersed in boiling water in a stainless steel beaker for 5 hours, and then the male and the traits were evaluated. The evaluation of the adhesion was carried out in the same manner as in the above (8). (10) Weather resistance The Xenon arc lamp weathering test was carried out for 1000 hours (Ci65 from Atlas, the output power was 6.5 kW, the black panel temperature was 63 °c, and the relative humidity was 5〇%). The weather resistance was evaluated by the change in the adhesion of the cured film before and after the test. (11) Refractor resistance is the same as in each case except that a polycarbonate standard plate (trade name: ECK100) manufactured by Sumitomo Bakelite Co., Ltd., which is 100 mm x width 50 tnmx and 1 mm thick, is used as the substrate. A method of producing a sample of a resin laminate. Hold the two ends of the specimen with your fingers, and perform the forced bending of the 141326.doc -68 *- 201012882 line with a radius of 5 〇mni, and record the crack on the layer as "〇". Those who have cracks are recorded as Γχ." (12) Heat resistance The heat resistance test (manufactured by Konica Minolta, PS-222) was carried out at 110 ° C for 720 hours. The heat resistance was evaluated by the change in the adhesion of the cured film before and after the test. (13) Organic particle dispersion structure

利用 TEM(transmission electron microscope,穿透式電 子顯微鏡)進行硬化膜之剖面觀察,選出1〇個存在於其1 μιη見方之區域中之有機微粒,使用美國NIH(Nati〇nalThe TEM (transmission electron microscope) was used to observe the cross-section of the cured film, and one organic particle present in the region of 1 μιη square was selected, and the NIH (Nati〇nal) was used.

Institute of Health)製造之 Freesoft : NIH Image 1.63 求得平 均粒彳k。將有機微粒之平均粒徑為200 nm以下者記為 「〇」,將平均粒徑大於200 nm者記為「X」,又,將雖亦存 在粒徑為200 nm以下者,但存在粒子熔著而成為粒徑達到 200 nm以上之變形蟲(ameba)狀者的情況記為「△」。 (14) 無機微粒分散結構 以與上述(13)同樣之方式求得硬化膜中之膠體二氧化夕 微粒各自之平均粒徑。將平均粒徑為2〇〇 nm以下者弋 「〇」,將平均粒徑大於2〇〇 nm者記為rx」。 為 又,於實施例及比較例中 内容如下。 ’以商品名記载之原Freesoft: NIH Image 1.63 manufactured by the Institute of Health). Those whose average particle diameter of organic fine particles is 200 nm or less are referred to as "〇", those whose average particle diameter is larger than 200 nm are referred to as "X", and those having a particle diameter of 200 nm or less are present, but there is particle melting. The case of an amoeba having a particle diameter of 200 nm or more is referred to as "Δ". (14) Inorganic fine particle dispersion structure The average particle diameter of each of the colloidal cerium oxide particles in the cured film was determined in the same manner as in the above (13). Those whose average particle diameter is 2 〇〇 nm or less are 〇 "〇", and those whose average particle diameter is larger than 2 〇〇 nm are denoted as rx". Further, in the examples and comparative examples, the contents are as follows. 'The original name recorded in the trade name

細 (A-1)成分:M Silicate 51「作為四曱氧基矽烷之部分 物(平均為三〜五聚物)的聚烷氧基矽烷」多摩化學縮合 份有限公司製造 業艰1 141326.doc -69· 201012882 (A-2)成分:MTMS-Α「作為甲基三甲氧基矽烷之部分縮合 物的聚有機烷氧基矽烷」多摩化學工業股份有限公司製造 (A-2)成分:SR2402「作為甲基三甲氧基矽烷之部分縮合 物的聚有機烷氧基矽烷」東麗道康寧股份有限公司製造 (B)成分:ULS-1385MG(紫外線吸收骨架種:苯并三唑系) 一方社油脂工業股份有限公司製造(水分散/固形物濃度為 30質量%) (B) 成分:ULS-385MG(紫外線吸收骨架種:二苯甲酮系) 一方社油脂工業股份有限公司製造(水分散/固形物濃度為 30質量%) (C) 成分:IPA-ST-L(膠體二氧化矽) 曰產化學工業股份有限公司製造(異丙醇分散,膠體二 氧化矽濃度為30質量%,平均粒徑為40〜50 nm(製造廠公布 值)) [實施例1〜11、比較例1〜6] 實施例1 (1)塗布液之製造 依照表1所示之成分及調配量進行製備。 向容積為50 ml之試樣管中投入有機高分子微粒:ULS-1385MG((B)成分+(E)成分)0.80 g,一面以 500 rpm 攪拌, 一面分別用1分鐘依序滴加1-曱氧基-2-丙醇((E)成分)4.25 g、水((E)成分)0.50 g、乙酸((D)成分)0.50 g、M Silicate 51((A-1)成分 0.40 g、MTMS-A((A-2)成分)1.10 g、二甲氧 基-3-環氧丙氧基丙基甲基矽烷((A-4)成分)0.55 g、20質量 141326.doc -70- 201012882Fine (A-1) component: M Silicate 51 "Poly alkoxy decane as a part of tetradecyloxydecane (average three to pentamer)" Tama Chemical Condensation Co., Ltd. Manufacturing Hard 1 141326.doc -69· 201012882 (A-2) Component: MTMS-Α "Polyorganoalkoxydecane which is a partial condensate of methyltrimethoxydecane" manufactured by Tama Chemical Industry Co., Ltd. (A-2) Component: SR2402" Polyorganoalkoxydecane which is a partial condensate of methyltrimethoxydecane" manufactured by Toray Dow Corning Co., Ltd. (B) Component: ULS-1385MG (UV absorption skeleton: benzotriazole) Manufactured by the company of the company (water dispersion/solids concentration: 30% by mass) (B) Ingredients: ULS-385MG (ultraviolet absorbing skeleton: benzophenone) Manufactured by Yokosuka Oil & Fats Co., Ltd. (water dispersion/solids) Concentration: 30% by mass) (C) Component: IPA-ST-L (colloidal cerium oxide) Manufactured by 曰Production Chemical Industry Co., Ltd. (isopropyl alcohol dispersion, colloidal cerium oxide concentration of 30% by mass, average particle size 40~50 nm (manufacturer announced )) [Examples 1~11 and Comparative Examples 1~6] Example 1 (1) Preparation of coating solution prepared in accordance with the embodiment of the composition and the blending amount shown in Table 1. Into a sample tube having a volume of 50 ml, an organic polymer microparticle: ULS-1385MG ((B) component + (E) component) 0.80 g was placed, and the mixture was stirred at 500 rpm while being sequentially added dropwise for 1 minute.曱oxy-2-propanol ((E) component) 4.25 g, water ((E) component) 0.50 g, acetic acid ((D) component) 0.50 g, M Silicate 51 ((A-1) component 0.40 g, MTMS-A ((A-2) component) 1.10 g, dimethoxy-3-glycidoxypropylmethyldecane (component (A-4)) 0.55 g, 20 mass 141326.doc -70- 201012882

%對甲苯磺酸甲醇溶液((D)成分+(E)成分)0.05 g。繼而, 於室溫下以500 rpm攪拌60分鐘後,靜置一日,將其作為A 液。 向容積為20 ml之試樣管中投入3-異氰酸基丙基三乙氧基 矽烷1.10 g及2-丁酮肟(異氰酸酯基之封端劑)0.35 g,於室 溫下以500 rpm攪拌10分鐘後,靜置一日,將其作為C液。 關於異氰酸酯基經封端化,係根據13C-NMR中異氰酸酯基 之信號消失而確認。將3-異氰酸基丙基三乙氧基矽烷與2-丁酮肟的調配量之合計作為封端化異氰酸基矽烷化合物: (A-5)成分之量。 於安裝有冷卻管之200 ml三口燒瓶中加入A液及攪拌 子,一面以500 rpm攪:拌,一面用5分鐘滴加作為B液之 IPA-ST-L((C)成分+(E)成分)6.50 g,於室溫下攪拌60分 鐘。繼而,以氮氣流下、600 rpm、80°C之條件加熱3小 時。繼而,加入C液,以相同條件於80°C下攪拌4小時後, 於室溫下靜置一夜。 進而,向其中用2分鐘滴加作為D液之3-胺基丙基三甲氧 基矽烷((A-3)成分)0.40 g。於室溫下攪拌10分鐘後,進而 以氮氣流下、700 rpm、80°C之條件加熱3小時。 繼而靜置1週而獲得塗布液。 (2)積層體之製作 使用聚碳酸酯基材[出光興產股份有限公司製造,商品 名:Tarflon,商品編號·· IV2200R(耐候等級),厚度為3 mm(總透光率為90%,霧度值為0.5%)]作為基材。 141326.doc -71 · 201012882 利用棒式塗布機,將上述⑴中所獲得之塗布液以硬化 膜達到3 μιη之方式塗布於厚度為3 mm之聚碳酸醋成形體 之表面,以13(TC、2小時之條件使其熱硬化,藉此製作包 含基材及硬化膜之積層體。 對所獲得之塗布液及積層體進行評價。將評價結果示於 表2。 實施例2〜11 以與實施例1同樣之方法並依照表i所示之成分及調配量 來製造塗布液,且製作積層體。將對所獲得之塗布液及積 層體之評價結果示於表2。 比較例1 依照表3所示之成分及調配量進行製備。 向容積為50 ml之試樣管中投入ULS-1385MG((B)成分 + (E)成分)0.90 g ’ 一面以5〇〇 rpm攪拌,一面分別用1分鐘 依序滴加1-甲氧基-2-丙醇((E)成分)2.00 g、水((E)成 分)0.09 g、乙酸((d)成分)3.20 g、曱基三曱氧基矽烷((A-2)成分)2.00 g、二甲氧基_3_環氧丙氧基丙基曱基矽烷((A_ 4)成分)0.96 g、5質量%對曱苯磺酸甲醇溶液((d)成分+(E) 成分)0.20 g。繼而,於室溫下以5〇〇 rpin攪拌60分鐘後, 靜置一日,將其作為A液。 向谷積為20 ml之試樣官中投入3 -異氮酸基丙基三乙氧基 矽烷1·10 g及2-丁酮肟(異氰酸酯基之封端劑)〇.36 g,於室 溫下以500 rpm攪拌10分鐘後,靜置一日,將其作為C液。 關於異氰酸酯基經封端化,係根據13C-NMR中異氰酸酯基 141326.doc -72- 201012882 之信號消失而確認。將3-異氰酸基丙基三乙氧基矽烷與2-丁酮肟的調配量之合計作為封端化異氰酸基矽烷化合物: (A-5)成分之量。 於安裝有冷卻管之200 ml三口燒瓶中加入A液及授拌 子,一面以500 rpm搜拌,一面用5分鐘滴加作為B液之 IPA-ST-L((C)成分+(E)成分)7.20 g,於室溫下攪拌1〇分 鐘。繼而,以氮氣流下、600 rpm、80°C之條件加熱3小 時。繼而,加入C液,以相同條件於80°C下攪拌4小時後, 於室溫下靜置一夜。 進而,向其中用2分鐘滴加作為D液之3·胺基丙基三曱氧 基矽烷((A-3)成分)0.40 g。於室溫下攪拌10分鐘後,進而 以氮氣流下、700 rpm、8(TC之條件加熱3小時。 繼而靜置1週而獲得塗布液。(該比較例1係表示於實施 例1之塗布液令不使用(A-1)成分而製造之塗布液者,且為 使其硬化膜中之有機高分子微粒含量與實施例1為相同量 者)。繼而,使用該塗布液,以與實施例1 (2)同樣之方式製 作包含基材及硬化膜之積層體。 對所獲得之塗布液及積層體進行評價。將評價結果示於 表4 〇 比較例2〜6 以與比較例1同樣之方法並依照表3所示之成分及調配量 來製造塗布液,並且製作積層體。(該比較例2、3係表示 於實施例2、3之塗布液中不使用(A_1}成分而製造之塗布 液者’且為使其硬化膜中之有機高分子微粒含量與實施例 141326.doc -73· 201012882 2、3為相同量者。又,比較例4係表示於實施例3之塗布液 中不使用(A-5)成分而製造之塗布液者,且為使其硬化膜 中之有機高分子含量與實施例3為相同量者。比較例$係表 示於實施例3之塗布液中不使用(A-5)成分及(〇成分而製造 之塗布液者,且為使其硬化膜中之有機高分子含量與實施 例3為相同量者。比較例6係表示於實施例3之塗布液中不 使用(A-1)成分及(C)成分而製造之塗布液者,且為使其碘 化膜中之有機高分子含量與實施例3為相同量者)。 對所獲得之塗布液及積層體進行評價。將評價結果示於 表4。 141326.doc •74· 201012882 1< 【1<】 1 寸? s? rn v〇i w> oo o ^ oo 5 "S 〇 5 <r> 〇〇 o ^ 。京 *rt 〇〇 1 〇篆 S〇 〇 1 1 s| ^ so 1 »n r〇 °2 一芝 〇 »n °S 寸冢 〇 一 Ο ^ 〇 )Q %η ^ 〇\ rs 5 2§ —V£; 3° |1 v〇 g 〇 i 2§ ώ >〇 5 m oo d oo 1 5 〇i" Vi oo o ^ 〇? 2泛 °κ 1 |l 1 1 4 \〇 <w> 1 °oo 〇 V) °5 啤5 〇 — 〇 -ο: d $ 〇? 二 1 3| 〇? 2〇 g Os W 1 1 if rn m On i 〇9 »r> m 〇 -r 匕 O? u·) rn < 〇爹 sc ώ —录 —— CJ 1 1 1 〇寸 °S 呀5 〇卜 〇 ^ 〇 安s Ci· i 寸塞 ·—1 vi SI 〇 ? 2F 141.23 | 00 |1 心i' »n 〇\ 〇 1 1 5 "g 〇5 v> m d -: 〇 S' tn rn 1 ο ? —— • 1 1 2 » o ^ °5, 寸5 〇卜 〇 〇 g ss — δ g °| —I/S n? 2I 〇袞 141.23 | Γ- 卜(N 〇〇 r^i —rS 4.375 _(31.〇8 份) 1 t 5 in 〇i «λ O ^ rn §| "" 1 1 sS ^ oo —d 1 rn^ ss s 寸i] 〇 〇〇 ο ο n 10.01 (71.12 份) Cp *N wS 〇 ? 2| §鋈 161.09 | sO 1.125 (13.14%) 2.625 (30·67 份) 1 ' 5 ss 'f σ; oi «Λ々 o °〇 o泛 s ώ • ll s °K — w^m •w* 1 1 1 2? Sm -5 〇卜 ο^. ο 2.625 (30.67%) «ηΦ <Ν *η —Vi vd —^ 〇g 2§ °s og 51 158.18 | χη ¥ π荽 “ rS «Λ 5 (NO \〇卜 (Ν rn 1 1 i 呀—: vr> 〇5 *n ★ o ® O? W si \〇 • 1 3l rn 1 1 S3 〇 r>i ώΞ ο 〇0 ο ο 2.625 (31.70%) 6.125 (73.97 份) 二 °3 1§ 163.52 1 —1 2.625 (33.40份) 1 1 s oi m ό d o? «Λ Ό °g 1 〇2 1 4 cn 1 < <n 〇 〇 PO °S ο — ο ^ ο 2.625 (33.40%) 6.125 (77.93份) ^ rn ll to 172.27 1 π荽 « Γ〇 2.625 (32.17 份) 1 1 i «i ^ <N \n 〇i m m o v〇 *n r*"t 1 ll 1 4 ^ rn 1 • 2苎 w 〇 <N °Ξ Ο ΟΝ ο^: ο 2.625 (32.17%) 6.125 (75.06份) 〇I 二 2| 〇| 51 165.93 1 (N d· i —匕 1 1 i 〇i vrv O Ci ® 匕 of 2| 1 ll ώ 1 Λ 1 1 0 6 o寸 °5 ο \〇 ο ^ ο 〇\ p-—J VO <N 〇 =l 匕 〇? —U~j 2| !| 156.3 1 i £ si r〇 V> OO « 1 i 〇 δ VT} 00 G ^ 匕 〇泛 S* °k • if °s〇 s| ·-1 \£) 1 1 w-i m °g 〇 ΧΠ °S ο — θ'® ο it» Ci 5 ,od 〇? =1 2° 〇? 5率 § S ω £ w s ω § (A-l) (A_2) (A-2) (A-2) ,(A-4) (A-4) § S S ω (A-5) (A-3) i m 麵; m 衮 令 ω USL-1385MG(固形物濃度為30質 f%)(g) ULS_385(固形物濃度為30質量%) 3 1-甲氧基-2-丙醇(g) 水(g) 乙酸(g) 四甲氡基矽烷(g) M Silicate 51(g) 甲基三甲氧基矽烷(g) MTMS-A(g) SR2402(g) 1 3-環氧丙氧基丙基三甲氧基矽烷 IM_ 二甲氧基-3-環氧丙氧基丙基甲基 矽烧⑼ 20質量%對甲笨續酸甲酵溶液(g) 1 IPA-ST-L(固形物濃度為30質量 %)(g) 3-異氱酸基丙基三乙氧基矽烷(g) 2-丁《肟(異氰酸酯基封端劑)(g) 3-胺基丙基三甲氧基矽炫(g) < CO u D挺 。傘¥鉍W傘¥鉍001¥璨>令噠〇)~(5食葙要长<(拿)趄碱》令噠(3)-^ 。一-钵 WIB%001 辆瓒 νφ^(αΜν)维长 <(%)!>柘 w M^龙 * 141326.doc •75· 201012882% p-toluenesulfonic acid methanol solution ((D) component + (E) component) 0.05 g. Then, after stirring at 500 rpm for 60 minutes at room temperature, it was allowed to stand for one day, and it was made into the A liquid. To a sample tube having a volume of 20 ml, 0.37 g of 3-isocyanatopropyltriethoxydecane and 0.35 g of 2-butanone oxime (isocyanate-based blocking agent) were introduced at room temperature at 500 rpm. After stirring for 10 minutes, it was allowed to stand for one day and used as a liquid C. The blocking of the isocyanate group was confirmed by the disappearance of the signal of the isocyanate group in the 13C-NMR. The total amount of 3-isocyanatepropyltriethoxydecane and 2-butanone oxime is defined as the amount of the blocked isocyanatodecane compound: (A-5). Add a liquid A and a stirrer to a 200 ml three-necked flask equipped with a cooling tube, and stir at 500 rpm while mixing, and add IPA-ST-L as a liquid B for 5 minutes ((C) component + (E) Ingredient) 6.50 g, stirred at room temperature for 60 minutes. Then, it was heated under a nitrogen stream at 600 rpm and 80 ° C for 3 hours. Then, the solution C was added, and the mixture was stirred at 80 ° C for 4 hours under the same conditions, and then allowed to stand at room temperature overnight. Further, 0.40 g of 3-aminopropyltrimethoxydecane (component (A-3)) as a solution D was added dropwise thereto over 2 minutes. After stirring at room temperature for 10 minutes, it was further heated under a nitrogen stream at 700 rpm and 80 ° C for 3 hours. Then, it was allowed to stand for 1 week to obtain a coating liquid. (2) The production of the laminate was carried out using a polycarbonate substrate [manufactured by Idemitsu Kosan Co., Ltd., trade name: Tarflon, product number·· IV2200R (weathering grade), thickness: 3 mm (total light transmittance: 90%). The haze value was 0.5%)] as a substrate. 141326.doc -71 · 201012882 The coating liquid obtained in the above (1) was applied to the surface of a polycarbonate molded body having a thickness of 3 mm by a bar coater at a thickness of 3 μm to 13 (TC, The layered body including the base material and the cured film was produced by thermosetting for 2 hours. The obtained coating liquid and laminated body were evaluated. The evaluation results are shown in Table 2. Examples 2 to 11 In the same manner as in Example 1, the coating liquid was produced in accordance with the components and the amounts shown in Table i, and a laminate was produced. The evaluation results of the obtained coating liquid and laminate were shown in Table 2. Comparative Example 1 According to Table 3 Prepare the ingredients and the amount of the preparation shown in the figure. Into the sample tube with a volume of 50 ml, put ULS-1385MG ((B) component + (E) component) 0.90 g ' while stirring at 5 rpm, using 1 1-methoxy-2-propanol ((E) component) 2.00 g, water ((E) component) 0.09 g, acetic acid ((d) component) 3.20 g, decyltridecyloxy group were added dropwise in sequence.矽 ( ((A-2) component) 2.00 g, dimethoxy _3_glycidoxypropyl decyl decane ((A_ 4) component) 0.96 g 5 mass% p-toluenesulfonic acid methanol solution ((d) component + (E) component) 0.20 g. Then, after stirring at 5 rpin for 60 minutes at room temperature, it was allowed to stand for one day, and it was used as liquid A. To a sample of 20 ml of grain, 3 -isopropoxypropyltriethoxydecane 1·10 g and 2-butanone oxime (isocyanate-based blocking agent) 〇.36 g, in room After stirring at 500 rpm for 10 minutes under temperature, the mixture was allowed to stand for one day, and this was referred to as liquid C. The blocking of the isocyanate group was confirmed by the disappearance of the signal of isocyanate group 141326.doc-72-201012882 in 13C-NMR. The total amount of 3-isocyanatepropyltriethoxydecane and 2-butanone oxime is defined as the amount of the blocked isocyanatodecane compound: (A-5). Add a liquid A and a stir-mixer to a 200 ml three-necked flask, and mix at 500 rpm while adding IPA-ST-L ((C) component + (E) component) 7.20 g as liquid B in 5 minutes. The mixture was stirred at room temperature for 1 minute, and then heated under a nitrogen stream at 600 rpm and 80 ° C for 3 hours. Then, liquid C was added, and the mixture was stirred at 80 ° C for 4 hours under the same conditions, and then placed in a chamber. The mixture was allowed to stand overnight at room temperature. Further, 0.40 g of 3·aminopropyltrimethoxy decane (component (A-3)) as a D solution was added dropwise thereto over 2 minutes. After stirring at room temperature for 10 minutes, Further, it was heated under a nitrogen stream at 700 rpm and 8 (TC) for 3 hours. Then, it was allowed to stand for 1 week to obtain a coating liquid. (Comparative Example 1 shows that the coating liquid of Example 1 was not used (A-1). In the case of the coating liquid to be produced, the content of the organic polymer fine particles in the cured film is the same as in the first embodiment. Then, using the coating liquid, a laminate including a substrate and a cured film was produced in the same manner as in Example 1 (2). The obtained coating liquid and laminated body were evaluated. The evaluation results are shown in Table 4. 〇 Comparative Examples 2 to 6 A coating liquid was produced in the same manner as in Comparative Example 1 in accordance with the components and the amounts shown in Table 3, and a laminate was produced. (Comparative Examples 2 and 3 show the coating liquid produced by using the component (A_1} in the coating liquids of Examples 2 and 3) and the content of the organic polymer fine particles in the cured film and Example 141326. Doc-73·201012882 2, 3 are the same amount. Further, Comparative Example 4 is a coating liquid produced by using the component (A-5) in the coating liquid of Example 3, and is made into a cured film. The content of the organic polymer is the same as that of the third embodiment. The comparative example $ indicates that the coating liquid produced in the example 3 does not use the component (A-5) and the coating liquid produced by the bismuth component. The content of the organic polymer in the cured film is the same as that in the third embodiment. The comparative example 6 shows the coating liquid produced by using the component (A-1) and the component (C) in the coating liquid of the third embodiment. In addition, the content of the organic polymer in the iodinated film was the same as in Example 3. The obtained coating liquid and the laminated body were evaluated. The evaluation results are shown in Table 4. 141326.doc •74· 201012882 1<[1<] 1 inch? s? rn v〇i w> oo o ^ oo 5 "S 〇5 <r> 〇〇o ^京*rt 〇〇1 〇篆S〇〇1 1 s| ^ so 1 »nr〇°2 一芝〇»n °S 寸冢〇一Ο ^ 〇)Q %η ^ 〇\ rs 5 2§ — V£; 3° |1 v〇g 〇i 2§ ώ >〇5 m oo d oo 1 5 〇i" Vi oo o ^ 〇? 2pan°κ 1 |l 1 1 4 \〇<w> 1 °oo 〇V) °5 Beer 5 〇 — 〇-ο: d $ 〇? 2 1 3| 〇? 2〇g Os W 1 1 if rn m On i 〇9 »r> m 〇-r 匕O? u·) rn < 〇爹sc ώ —录——CJ 1 1 1 〇°°S 呀5 〇卜〇^ 〇安s Ci· i 寸塞·—1 vi SI 〇? 2F 141.23 | 00 |1 i' »n 〇\ 〇1 1 5 "g 〇5 v> md -: 〇S' tn rn 1 ο ? —— • 1 1 2 » o ^ °5, inch 5 〇 〇〇 ss — δ g °| —I/S n? 2I 〇衮141.23 | Γ- 卜(N 〇〇r^i —rS 4.375 _(31.〇8 copies) 1 t 5 in 〇i «λ O ^ rn §| "" 1 1 sS ^ oo —d 1 rn^ ss s inch i] 〇〇〇ο ο n 10.01 (71.12 copies) Cp *N wS 〇? 2| §鋈161.09 | sO 1.125 (13.14%) 2.625 (30· 67 copies) 1 ' 5 ss 'f σ; oi «Λ々o °〇o pan s ώ • ll s °K — w^m w* 1 1 1 2? 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Umbrella ¥铋W Umbrella¥铋001¥璨>令哒〇)~(5 葙 葙 & & ( ( ( 拿 3 3 3 φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ αΜν) dimension length <(%)!>柘w M^龙* 141326.doc •75· 201012882

(N 141326.doc (N ♦ 實施例11 〇 90% 0.7% 〇 100/100 100/100 100/100 〇 100/100 〇 〇 實施例10 〇 索 90% 0.7% 〇 1 1 100/100 1 100/100 1 100/100 〇 100/100 〇 〇 實施例9 a 〇 衆 90% 0.7% 〇 1—^ 丽100 1 100/100 100/100 〇 100/100 〇 〇 實施例8 〇 泶 90% 0.7% 〇 100/100 100/100 100/100 〇 100/100 〇 〇 實施例7 oo 〇 90% 0.6% 〇 (Ν 1 100/100 1 100/100 100/100 〇 100/100 〇 〇 實施例6 oo 〇 1 90% ί 0.6% 〇 100/100 100/100 1 ί 100/100 〇 100/100 〇 〇 實施例5 oo 〇 索 J〇^i 90% | 0.6% 〇 100/100 [ i 100/100 1 100/100 〇 100/100 〇 〇 實施例4 oo 〇 90% ! 1 0.7% 〇 100/100 I 100/100 100/100 〇 100/100 〇 〇 實施例3 oo 〇 Ί 90% ί 0.7% 〇 一 100/100 100/100 100/100 〇 100/100 〇 〇 實施例2 o 〇 90% 0.7% 〇 一 100/100 100/100 〇 100/100 〇 〇 實施例1 ίο Vi 〇 本 jsid 90% 0.7% 〇 一 100/100 100/100 〇 100/100 〇 〇 評價項目 來自無機成分之氧化物換算含量(質量%) 有機高分子微粒含量(質量%:計算值) 溶液穩定性 膜外觀 總透光率 霧度 耐磨耗性 耐擦傷性 密著性 煮沸5分鐘後之密著性 耐候性(1000小時) 耐撓曲性 财熱性 有機微粒分散結構 無機微粒分散結構 -76- 201012882 【εί·· 141326.doc Ό 鸾 0.66 (11.02%) 1.54 (25.71 份) 5.00 (83.47份) 〇i •ο νη 〇〇 0.50 (8.35%) 1 ON cn trl cn 〇 (N 1 0,96 (16.03%) 1 1 0.01 (0.17%) 0.04 (0.67 份) 1 1 1.10 (18.36%) 0.36 (6.01%) 0.40 (6.68%) 118.2 I ¥ £ 0.36 (10.84%) 0.84 (25.30份) i !/*> — ts Ο rt 00 (N 0.50 (15.06 份) 0.50 (15.06%) 1 0.40 (12.05%) ! 1 1.10(33.13%) 0.55 (16.57%) 1 1 0.01 (0.30%) 寸签 Ο 〇 d^. 'w1 1 1 1 1 0.40 (12.05%) 169.6 I 对 £ 0.72 (13.66%) 1.68 (31.88 份) 4.25 (80.65份) 。$ Os Os 0.50 (9.49%) i 0.40 (7.59%) 1 1.10 (20.87%) 0.55 Π0.44%) 1 1 0.01 (0.19%) 〇 s〇 〇 -d m 3.71 (70_40 份)_ 1 1 0.40 (7.59%) 193.2 I cn osg ^P: · ON 3.01 (21.86 份) 2.80 (20.33 份) 1 4.80 (34.86%) 1 — 〇 (N 1 0.96 (6.97%) 0.01 (0.07%) 00 • 1 9 oc 1 (20.70%) 6.65 (48.29份) 1.10 (7.99%) 0.36 (2.61%) 0.40 (2.90%) 91.9 1 CN ¥ 0.60 (5.43%) 1.40 (12.69 份) 2.00 Π8.13 份) 1 3.20 (29.01%) 1 芝 cn od w- (N 1 0.96 (8.70%) 0.01 (0.09%) 0.19 (Ί.72 份) 1 1 2.40 (21.76%) 5.60 (50.77份) 1.10 (9.97%) cn Ό rn 0,40 (3.63%) 83.3 | £ 0.27 (2.58%) 0.63 (6.02 份) 2.00 i Π9.Π 份) 0.09 (0.86 份)i 3.20 (30.59%) 1 哀 (N 〇< CN 1 0.96 (9.18%) 0.01 (0.10%) ci —(N 1 1 2.16 I (20.65%) 1 5.04 (48.18 份) 1.10 (10.52%) 0.36 (3.44%) 0.40 (3.82%) g g W g S'" (A-l) 1 < (Α-2) (Α-4) g S' g g (A-5) (A-3) 傘 Μ 鉍 絮 S Φ ULS-1385MG(固形物濃度為30質量 %)(g) 1-甲氧基-2-丙醇(g) 水(g) 乙酸(g) M Silicate 51(g) _i 一 ¢- MTMS-A(g) &- νϋ 於 1 '1^ 5質量%對甲苯磺酸甲醇溶液(g) 1 1 :20質量%對甲苯磺酸甲醇溶液(g) IPA-ST-L(固形物濃度為30質量 %)(g) 3-異#L酸基丙基三乙氧基石夕烷(g) 2-丁酮肟(異氰酸酯基封端劑) 3-胺基丙基三甲氧基矽院(g) A液 1 D液 。。/0驷鉍^^。/0001碳钵啉鉍絮4令噠〇)~(<绔桕<(%)1>碱》€:磋龙* •77- 201012882 寸崦 【寸<】 比較例6 m 〇〇 〇 88% 0.8% X m 100/100 100/100 100/100 〇 100/100 〇 1 比較例5 On 00 X 87% 0.9% X (N 100/100 50/100 20/100 〇 100/100 〇 1 比較例4 00 X 87% 0.9% 〇 (N 100/100 50/100 20/100 〇 100/100 〇 〇 比較例3 00 00 〇 4? Af>j 90% 0.7% 〇 cn 100/100 100/100 100/100 〇 100/100 〇 〇 比較例2 CN Ο 〇 〇 本 JTtifi 90% 0.7% 〇 m 100/100 100/100 100/100 〇 100/100 〇 〇 比較例1 〇 90% 0.7% 〇 100/100 100/100 100/100 〇 100/100 〇 〇 評價項目 來自無機成分之氧化物換算含量(質量%) 有機高分子微粒含量(質量%:計算值) 溶液穩定性 膜外觀 總透光率 霧度 而ί磨耗性 耐擦傷性 密著性 煮沸5小時後之密著性 耐候性(1000小時) 财撓曲性 耐熱性 有機微粒分散結構 無機微粒分散結構 141326.doc -78 - 201012882 由表1〜4可知,本發明之塗布液、由其所獲得之硬化膜 及積層體(實施例1〜11)均於大致所有評價項目中為合格。 不含(A-1)成分之比較例1〜3及比較例ό的溶液穩定性、 膜外觀、透明性、密著性、耐煮沸性良好,但耐擦傷性與 實施例1〜11者相比較差。又,不含(Α_5)成分之比較例4、 5的膜外觀、透明性、密著性良好,但溶液穩定性、耐煮 沸性與實施例1〜11者相比較差。 實施例12〜16 利用棒式塗布機,將實施例丨之塗布液以硬化膜達到3 μιη之方式塗布於厚度為3 mm之聚碳酸酯(pc)成形體之表 面或者經電暈處理之聚丙烯片[Idemitsu Uniteeh股份有限 公司製造’商品名:Superpurelay,商品編號:SG_ 14〇1'(:’厚度為3〇〇0„1(;總透光率為94%、霧度值為2.3%)] 上’以130°C、2小時之條件使其熱硬化,藉此製作包含基 材及硬化膜之積層體。於上述所製作之積層體上,進而以 下述方法成膜為無機硬質物層,從而獲得積層體。 對所獲得之包含基材、硬化膜及無機硬質物層之積層體 進行評價。將評價結果示於表5。 無機硬質物層之成膜 (1) Si〇x 將所製作之包含基材及硬化膜之積層體設置於電漿CVD 裝置内’進行排氣直至裝置内之真空度達到2.7χ1(Γ3 Pa, 將基材之溫度提高至l〇〇°C,保持5分鐘,進行基材之脫 氣°其後’恢復至室溫後,進行排氣直至裝置内之真空度 141326.doc -79· 201012882 達到 2.7χ1(Γ4 Pa。 使真空度為2.7乂1〇-4卩&後,向裝置内導入8出4氣、:^〇 氣及Ar氣,氣體流量為:siH4氣流量為i cm3/分鐘、n2〇 氣流量為200 cm3/分鐘、Ar氣流量為3〇〇 cm3/分鐘,當真 空度穩定為2.7 Pa左右時,施加電力而產生電漿,從而於 硬化膜上形成膜厚為5 μηι之SiOx(l.8Sxg2)膜(無機硬質 物層)。 (2) 非晶碳膜(N 141326.doc (N ♦ Example 11 〇90% 0.7% 〇100/100 100/100 100/100 〇100/100 〇〇Example 10 〇 90 90% 0.7% 〇1 1 100/100 1 100/ 100 1 100/100 〇100/100 〇〇Example 9 a 〇90% 0.7% 〇1—^ 丽 100 1 100/100 100/100 〇100/100 〇〇Example 8 〇泶90% 0.7% 〇 100/100 100/100 100/100 〇100/100 〇〇Example 7 oo 〇90% 0.6% 〇(Ν 1 100/100 1 100/100 100/100 〇100/100 〇〇Example 6 oo 〇1 90% ί 0.6% 〇100/100 100/100 1 ί 100/100 〇100/100 〇〇Example 5 oo 〇索J〇^i 90% | 0.6% 〇100/100 [ i 100/100 1 100/ 100 〇100/100 〇〇Example 4 oo 〇90% ! 1 0.7% 〇100/100 I 100/100 100/100 〇100/100 〇〇Example 3 oo 〇Ί 90% ί 0.7% 〇一100/ 100 100/100 100/100 〇100/100 〇〇Example 2 o 〇90% 0.7% 〇100/100 100/100 〇100/100 〇〇Example 1 ίο Vi j本jsid 90% 0.7% 〇一100/100 100/100 〇100/100 〇〇Evaluation project from oxygen of inorganic components Content converted by compound (% by mass) Organic polymer fine particle content (% by mass: calculated value) Solution stability film appearance Total light transmittance Haze abrasion resistance Scratch resistance Adhesiveness Baked after 5 minutes of adhesion Weatherability (1000 hours) Flexibility-resistant organic particulate dispersion structure Inorganic particulate dispersion structure-76- 201012882 [εί·· 141326.doc Ό 鸾0.66 (11.02%) 1.54 (25.71 servings) 5.00 (83.47 servings) 〇i •ο Ηη〇〇0.50 (8.35%) 1 ON cn trl cn 〇(N 1 0,96 (16.03%) 1 1 0.01 (0.17%) 0.04 (0.67 parts) 1 1 1.10 (18.36%) 0.36 (6.01%) 0.40 ( 6.68%) 118.2 I ¥ £ 0.36 (10.84%) 0.84 (25.30 copies) i !/*> — ts Ο rt 00 (N 0.50 (15.06 parts) 0.50 (15.06%) 1 0.40 (12.05%) ! 1 1.10( 33.13%) 0.55 (16.57%) 1 1 0.01 (0.30%) Inch sign 〇d^. 'w1 1 1 1 1 0.40 (12.05%) 169.6 I vs. £0.72 (13.66%) 1.68 (31.88 copies) 4.25 (80.65 Share). $ Os Os 0.50 (9.49%) i 0.40 (7.59%) 1 1.10 (20.87%) 0.55 Π0.44%) 1 1 0.01 (0.19%) 〇s〇〇-dm 3.71 (70_40 servings) _ 1 1 0.40 (7.59 %) 193.2 I cn osg ^P: · ON 3.01 (21.86 parts) 2.80 (20.33 parts) 1 4.80 (34.86%) 1 — 〇 (N 1 0.96 (6.97%) 0.01 (0.07%) 00 • 1 9 oc 1 ( 20.70%) 6.65 (48.29 copies) 1.10 (7.99%) 0.36 (2.61%) 0.40 (2.90%) 91.9 1 CN ¥ 0.60 (5.43%) 1.40 (12.69 servings) 2.00 Π8.13 copies) 1 3.20 (29.01%) 1芝 cn od w- (N 1 0.96 (8.70%) 0.01 (0.09%) 0.19 (Ί.72 copies) 1 1 2.40 (21.76%) 5.60 (50.77 servings) 1.10 (9.97%) cn Ό rn 0,40 (3.63 %) 83.3 | £ 0.27 (2.58%) 0.63 (6.02 servings) 2.00 i Π9.Π portion) 0.09 (0.86 parts) i 3.20 (30.59%) 1 哀 (N 〇< CN 1 0.96 (9.18%) 0.01 (0.10 %) ci —(N 1 1 2.16 I (20.65%) 1 5.04 (48.18 copies) 1.10 (10.52%) 0.36 (3.44%) 0.40 (3.82%) gg W g S'" (Al) 1 < (Α -2) (Α-4) g S' gg (A-5) (A-3) Umbrella 铋 S S Φ ULS-1385MG (solid content concentration: 30% by mass) (g) 1-methoxy-2 -propanol (g) water (g) acetic acid (g) M Silicate 51(g) _i ¢ - MTMS -A(g) &- νϋ in 1 '1^ 5 mass% p-toluenesulfonic acid methanol solution (g) 1 1 : 20 mass% p-toluenesulfonic acid methanol solution (g) IPA-ST-L (solids concentration 30% by mass) (g) 3-iso(L-acid propyl triethoxy oxetane (g) 2-butanone oxime (isocyanate-based blocking agent) 3-aminopropyltrimethoxy fluorene ( g) Liquid A 1 D. . /0驷铋^^. /0001 Carbon porphyrin smear 4 哒〇)~(<绔桕<(%)1> alkali" €:Shulong* •77- 201012882 inch 崦【inch<】 Comparative example 6 m 〇〇〇 88% 0.8% X m 100/100 100/100 100/100 〇100/100 〇1 Comparative Example 5 On 00 X 87% 0.9% X (N 100/100 50/100 20/100 〇100/100 〇1 Comparison Example 4 00 X 87% 0.9% 〇 (N 100/100 50/100 20/100 〇100/100 〇〇Comparative Example 3 00 00 〇4? Af>j 90% 0.7% 〇cn 100/100 100/100 100 /100 〇100/100 〇〇Comparative Example 2 CN Ο 〇〇本JTtifi 90% 0.7% 〇m 100/100 100/100 100/100 〇100/100 〇〇Comparative Example 1 〇90% 0.7% 〇100/100 100/100 100/100 〇100/100 〇〇Evaluation item from oxide content of inorganic component (% by mass) Organic polymer particle content (% by mass: calculated value) Solution stability film appearance Total light transmittance haze磨Abrasion resistance, scratch resistance, adhesion, and adhesion resistance after boiling for 5 hours (1000 hours) Condensation heat-resistant organic fine particle dispersion structure, inorganic fine particle dispersion structure 141326.doc -78 - 201012882 It is known from Tables 1 to 4. , the invention The cloth liquid, the cured film obtained by the film, and the laminate (Examples 1 to 11) were all qualified in almost all evaluation items. The solutions of Comparative Examples 1 to 3 and Comparative Example without the component (A-1) were contained. The stability, the film appearance, the transparency, the adhesion, and the boiling resistance were good, but the scratch resistance was inferior to those of Examples 1 to 11. Further, the film appearances of Comparative Examples 4 and 5 containing no (Α_5) component were obtained. The transparency and the adhesion were good, but the solution stability and the boiling resistance were inferior to those of Examples 1 to 11. Examples 12 to 16 The coating liquid of Example 以 was obtained as a cured film by a bar coater. 3 μιη by coating on the surface of a polycarbonate (pc) molded body having a thickness of 3 mm or a corona-treated polypropylene sheet [Manufactured by Idemitsu Uniteeh Co., Ltd.] Trade name: Superpurelay, product number: SG_ 14〇1 '(:'The thickness is 3〇〇0„1 (the total light transmittance is 94%, the haze value is 2.3%)] The upper part is thermally cured at 130 ° C for 2 hours, thereby producing A laminate of a substrate and a cured film. Further, a layered body was obtained by forming an inorganic hard substance layer on the layered body produced as described above by the following method. The obtained laminate including the substrate, the cured film, and the inorganic hard layer was evaluated. The evaluation results are shown in Table 5. Film formation of inorganic hard layer (1) Si〇x The laminated body including the substrate and the cured film was placed in a plasma CVD apparatus to perform evacuation until the vacuum in the apparatus reached 2.7 χ 1 (Γ3 Pa, The temperature of the substrate is raised to 10 ° C for 5 minutes, and the substrate is degassed. After that, after returning to room temperature, the gas is exhausted until the vacuum in the device is 141326.doc -79· 201012882 2.7χ1 (Γ4 Pa. After the vacuum degree is 2.7乂1〇-4卩&, introduce 8 out of 4 gas, :〇 gas and Ar gas into the device, the gas flow rate is: siH4 gas flow rate is i cm3/min , n2 helium gas flow rate is 200 cm3 / min, Ar gas flow rate is 3 〇〇 cm3 / min, when the vacuum is stable at about 2.7 Pa, electric power is applied to generate plasma, thereby forming a film thickness of 5 μηι on the cured film. SiOx (l.8Sxg2) film (inorganic hard layer). (2) Amorphous carbon film

將所製作之包含基材及硬化膜之積層體設置於電漿CVD 裝置内,進行排氣直至裝置内之真空度達到27xl〇-3 pa, 將基材之溫度提高至1 〇〇°C ’保持5分鐘,進行基材之脫 耽其後,恢復至至溫後,進行排氣直至裝置内之真空度 達到 2.7xl0_4 Pa。 向使真空度為2.7xl〇-4 Pa之電漿CVD裝置内,以ch4氣 流量為1 cm3/分鐘、&氣流量為150 cm3/分鐘、Ar氣流量 為300 cm3/分鐘之氣體流量導入eh氣、Η2氣及心氣,當 真工度穩疋為2.7 Pa左右時,施加電力而產生電聚,形成 膜厚為7 μπι之非晶碳膜(無機硬質物層)。 (3) SiNy 將所製作之包含基材及硬化膜之積層體設置於電聚CVD 裝置内,進行排氣直至裝置内之真空度達到2.7x1()_3 pa, 將基材之溫度提高至1〇〇。(:,保持5分鐘,進行基材之脫 氣。其後’恢復至室溫後’進行排氣直至裝置内之真空度 達到 2.7xl0·4 Pa。 141326.doc • 80 · 201012882 向電漿CVD裝置内,以SiH4氣流量為1 cm3/分鐘、NH3 氣流量為200 cm3/分鐘、Αγ氣流量為400 cm3/分鐘之氣體 流量導入SiH4氣、NH3氣及Ar氣,當真空度穩定為2.7 Pa 左右時’施加電力而產生電浆’形成膜厚為7 μηι之 SiNy(l_2$ 4/3)膜(無機硬質物層)。 (4) Si02 將所製作之包含基材及硬化膜之積層體設置於離子電鍵 裝置内’蒸發源為Si〇2晶粒。進行排氣直至裝置内之真空 度達到2.7χ1(Γ4 Pa。向高頻線圈施加高頻電壓ι·5 kV,導 入氬氣及〇2氣。停止導入氣體後,使裝置内之真空度為 1·33χUT3 Pa ’進行卜2分鐘Si〇2離子電鍍。其後,一面保 持裝置内之真空一面放置冷卻20分鐘,從而於硬化膜上形 成膜厚為1.5 μηι之Si02(1.8SxS2)膜(無機硬質物層)。 比較例7〜11 使用比較例1之塗布液,以與實施例12〜16同樣之方法獲 得積層體。 對所獲得之包含基材、硬化膜及無機硬質物層之積層體 進行評價。將評價結果示於表5。 141326.doc -81 - 201012882 比較例11 比較例1 U CU Si02 jni>j 90% 0.7% 〇 50/100 50/100 10/100 〇 50/100 比較例10 比較例1 U CX, 1 SiNv , ^>i 90% 0.7% 〇 r < 40/100 40/100 10/100 〇 40/100 比較例9 比較例1 〇 非晶碳膜 joai 90% i 1 0.7% 〇 50/100 50/100 10/100 〇 50/100 比較例8 比較例1 &Η Si〇x 索 —1 92% i 2.5% 〇 30/100 30/100 10/100 〇 30/100 比較例7 -1 比較例1 , 〇 Pm 1 SiOx , 汝 90% 0.7% 〇 50/100 50/100 10/100 〇 50/100 實施例16 實施例1 U Ο, Si02 眾 90% 0.7% 〇 ί-Ή 100/100 〇 100/100 實施例15 實施例1 U Ph SiNv 衆 90% 0.7% 〇 100/100 100/100 100/100 〇 100/100 實施例14 實施例1 U Oh -1 非晶碳膜 索 90% 0.7% 〇 100/100 100/100 1 100/100 〇 100/100 實施例13 實施例1 Oh Ph SiOx 92% i 2.5% 〇 100/100 1 100/100 100/100 〇 100/100 實施例12 實施例1 U P-. -csi 1 90% I 0.7% 〇 100/100 100/100 100/100 〇 100/100 評價項目 塗布液 樹脂基材 1 無機硬質物層 」 1 膜外觀 J 總透光率 霧度 对磨耗性 耐擦傷性 密著性 煮沸5小時後之密著性 耐候性(1000小時) 财撓曲性 耐熱性 141326.doc ·82· 201012882 由表5可知’使用實施例1之塗布液的積層體(實施例 12〜16)均於大致所有評價項目中為合格。 比較例7〜11係使用比較例1之塗布液的積層體,膜外 觀、透明性、耐磨耗性、耐擦傷性良好,但密著性、耐煮 沸性與實施例12〜16者相比較差。 [實施例17〜20及比較例12〜14] 上述例中之諸特性係依照下述要領而求得。 (1) 硬化膜中之來自無機成分之氧化物換算含量(質量0/〇) 於鐵氟龍(註冊商標)培養孤上,對使塗布液熱硬化而獲 得之試樣進行熱重量測定(氮氣下,以2〇°C/分鐘升溫,室 溫〜800°c ),根據其於80(TC下之殘渣而求得。 (2) 硬化膜中之有機高分子微粒含量(質量0/〇) 藉由計算而算出。詳細而言,算出〜(入_5)成分之水 解·縮合反應完全進行者((A)成分)、有機高分子微粒((B)成 分)及膠體二氧化矽成分)、氧化鈽((F)成分)之總質量 中的有機高分子微粒之質量%。 (3) 硬化膜中之氧化鈽含量(質量%〕 藉由計算而算出。 (4) 塗布液之溶液穩定性 於常溫下密封保存14日,藉由目視而判定凝膠化之有 無。對於未凝膠化者,利用A & D股份有限公司之音叉型 振動式黏度計SV-10進行黏度測定,將與初期相比之變化 率在3倍以内者記為「〇」,將超過3倍者記為「X」。 (5) 膜外觀 141326.doc • 83 - 201012882 目視觀察硬化臈之外觀,對異物及斑點圖案、白濁加以 確認,將未確認到上述情況者記為「良好」。 (6) 總透光率及霧度 利用直讀霧度計(Suga試驗機股份有限公司製造,HGM-2DP)測定積層體之總透光率及霧度。 (7) 耐磨耗性及耐擦傷性 關於耐磨耗性之評價,係使用磨耗輪cs_1〇F及TABER磨 耗試驗機(旋轉磨耗試驗機)(東洋精機股份有限公司製造, 型號.TS) ’於荷重4.9 N下進行500轉TABER磨耗試驗, 將TABER磨耗試驗前之霧度與TABER磨耗試驗後之霧度之 差(ΔΗ)未達15者記為「〇」,將霧度之差為15以上者記為 「X」。 關於耐擦傷性之評價’係於實施例1 7〜2〇及比較例〗4 中,使用鋼絲絨#0000(荷重為4.9 N),以2〇〇〇 mm/sec往復 5〇次後,藉由目視來評價表面之受損情況。將完全未受損 者記為「1」,將稍許受損者記為r 2」,將經摩擦之部位的 一半以上之面受損者記為「3」。 (8) 密著性 依照JIS K 5400,利用剃刀之刀刃將試樣(硬化膜)以2 mm間隔切入縱橫各11條之切縫而形成i 〇〇個網格,用指腹 使市售之玻璃紙膠帶(「CT-24(寬度為24 mm)」,Nichiban 股伤有限公司製造)與試樣充分密著後,以9〇。之角度向近 前方向迅速剝離,將硬化膜未剝離而殘存之網格數以 Χ/100表示,以對硬化膜之密著性進行評價。 141326.doc -84 - 201012882 (9) 耐煮沸性 將積層體之試樣於不鏽鋼製燒杯中之沸水中浸潰5小時 後,對密著性進行評價。密著性之評價係以與上述(8)同樣 之方式進行。 (10) 耐候性 用2400小時實施氙弧燈耐候試驗(Atlas公司之ci65,輸 出功率為6.5 kW,黑面板溫度為63°C,相對濕度為50%)。 以試驗前後之硬化膜密著性的變化來評價耐候性。 (11) 耐撓曲性 除使用100 mmx寬度50 mmx厚度1 mm之住友電木股份 有限公司製造之聚碳酸酯標準板(商品名:p〇lyca_Ace,商 品編號:ECK100)作為基板以外,以與各例相同之方法製 造樹脂積層體之試樣。 用手指夾持該試樣之兩端,進行10次半徑為5〇 mm之曲 線之強制彎曲’將積層面上未產生裂痕者記為「〇」,將產 生裂痕者記為「X」。 (12) 耐熱性 利用耐熱性試驗(TABAI製造,PS-222),以ll(TC、720 小時之條件實施。以試驗前後之硬化膜密著性的變化來評 價耐熱性。 (13) 有機微粒分散結構 利用TEM(穿透式電子顯微鏡)進行硬化膜之剖面觀察, 選出10個存在於其1 μιη見方之區域中之有機微粒,使用美 國 NIH(National Institute of Health)製造之 Freesoft: ΝΙΗ 141326.doc -85- 201012882The produced laminate including the substrate and the cured film is placed in a plasma CVD apparatus, and evacuated until the degree of vacuum in the apparatus reaches 27 x 1 〇 -3 pa, and the temperature of the substrate is raised to 1 〇〇 ° C ' After the substrate was removed for 5 minutes, it was returned to the temperature, and then evacuated until the degree of vacuum in the apparatus reached 2.7 x 10 4 Pa. To a plasma CVD apparatus with a vacuum of 2.7 x 1 〇 -4 Pa, a gas flow rate of 1 cm 3 /min with a gas flow rate of 150 cm 3 /min and an Ar gas flow rate of 300 cm 3 /min was introduced. Eh gas, Η2 gas and heart, when the true working degree is about 2.7 Pa, electric power is applied to generate electropolymerization, and an amorphous carbon film (inorganic hard material layer) having a film thickness of 7 μm is formed. (3) SiNy The laminated body including the substrate and the cured film was placed in an electropolymerization CVD apparatus, and evacuated until the vacuum in the apparatus reached 2.7x1()_3 pa, and the temperature of the substrate was raised to 1. Hey. (:, hold for 5 minutes, degas the substrate. Then 'restore to room temperature' and vent until the vacuum in the device reaches 2.7x10·4 Pa. 141326.doc • 80 · 201012882 Plasma CVD In the apparatus, SiH4 gas, NH3 gas and Ar gas are introduced into the gas flow rate of SiH4 gas flow rate of 1 cm3/min, NH3 gas flow rate of 200 cm3/min, and Αγ gas flow rate of 400 cm3/min, when the vacuum degree is stable to 2.7 Pa. On the left and right sides, 'electricity is applied to generate plasma' to form a SiNy (l_2$4/3) film (inorganic hard layer) having a film thickness of 7 μη. (4) Si02 is a laminate comprising a substrate and a cured film. It is installed in the ion key device. 'The evaporation source is Si〇2 crystal grain. Exhaust until the vacuum in the device reaches 2.7χ1 (Γ4 Pa. Apply high frequency voltage ι·5 kV to the high frequency coil, and introduce argon gas and helium gas. 2 gas. After the introduction of the gas is stopped, the vacuum degree in the apparatus is 1·33 χ UT3 Pa ', and the Si〇2 ion plating is performed for 2 minutes. Thereafter, the vacuum inside the apparatus is left and left to cool for 20 minutes, thereby being cured on the cured film. Forming a SiO 2 (1.8SxS2) film with a film thickness of 1.5 μη (inorganic hard layer Comparative Examples 7 to 11 Using the coating liquid of Comparative Example 1, a laminate was obtained in the same manner as in Examples 12 to 16. The obtained laminate including the substrate, the cured film, and the inorganic hard layer was evaluated. The evaluation results are shown in Table 5. 141326.doc -81 - 201012882 Comparative Example 11 Comparative Example 1 U CU Si02 jni>j 90% 0.7% 〇50/100 50/100 10/100 〇50/100 Comparative Example 10 Comparative Example 1 U CX, 1 SiNv , ^>i 90% 0.7% 〇r < 40/100 40/100 10/100 〇40/100 Comparative Example 9 Comparative Example 1 〇Amorphous carbon film joai 90% i 1 0.7% 〇 50/100 50/100 10/100 〇50/100 Comparative Example 8 Comparative Example 1 & Η Si〇x cable -1 92% i 2.5% 〇30/100 30/100 10/100 〇30/100 Comparative Example 7 -1 Comparative Example 1, 〇Pm 1 SiOx , 汝90% 0.7% 〇50/100 50/100 10/100 〇50/100 Example 16 Example 1 U Ο, Si02 90% 0.7% 〇ί-Ή 100 /100 〇100/100 Example 15 Example 1 U Ph SiNv 90% 0.7% 〇100/100 100/100 100/100 〇100/100 Example 14 Example 1 U Oh -1 amorphous carbon film 90 % 0.7% 〇100/100 100/100 1 100/100 〇100/100 implementation Example 13 Example 1 Oh Ph SiOx 92% i 2.5% 〇100/100 1 100/100 100/100 〇100/100 Example 12 Example 1 U P-. -csi 1 90% I 0.7% 〇100/100 100/100 100/100 〇100/100 Evaluation item Coating liquid resin substrate 1 Inorganic hard material layer 1 Film appearance J Total light transmittance Haze to abrasion resistance Scuffing adhesion After 5 hours of boiling adhesion Weather resistance (1000 hours) Flexibility heat resistance 141326.doc · 82· 201012882 It can be seen from Table 5 that the laminates using the coating liquid of Example 1 (Examples 12 to 16) were all qualified in substantially all evaluation items. . In Comparative Examples 7 to 11, the laminate of the coating liquid of Comparative Example 1 was used, and the film appearance, transparency, abrasion resistance, and scratch resistance were good, but the adhesion and boiling resistance were compared with those of Examples 12 to 16. difference. [Examples 17 to 20 and Comparative Examples 12 to 14] The characteristics in the above examples were obtained in accordance with the following procedures. (1) The content of the oxide derived from the inorganic component in the cured film (mass 0 / 〇) is thermolyzed by a sample obtained by thermally hardening the coating liquid on a Teflon (registered trademark) culture. Next, the temperature is raised at 2 ° C / min, room temperature ~ 800 ° c), according to the residue at 80 (TC). (2) The content of organic polymer particles in the cured film (mass 0 / 〇) Calculated by calculation. Specifically, the hydrolysis/condensation reaction of the (into_5) component is completed ((A) component), organic polymer microparticle (component (B)), and colloidal ceria component) And the mass % of the organic polymer fine particles in the total mass of the cerium oxide (component (F)). (3) The cerium oxide content (% by mass) in the cured film was calculated by calculation. (4) The solution stability of the coating liquid was sealed and stored at room temperature for 14 days, and the presence or absence of gelation was visually observed. For the gel, the viscosity is measured by the tuning fork vibrating vibrometer SV-10 of A & D Co., Ltd., and the rate of change compared with the initial period is less than 3 times, which is more than 3 times. (5) Film appearance 141326.doc • 83 - 201012882 The appearance of the hardened enamel was visually observed, and the foreign matter, the speckle pattern, and the white turbidity were confirmed, and those who did not confirm the above were recorded as "good". ) Total light transmittance and haze The total light transmittance and haze of the laminate were measured by a direct reading haze meter (manufactured by Suga Testing Machine Co., Ltd., HGM-2DP). (7) Abrasion resistance and scratch resistance For the evaluation of wear resistance, a 500 rpm TABER abrasion test was carried out using a wear wheel cs_1〇F and a TABER abrasion tester (rotary wear tester) (manufactured by Toyo Seiki Co., Ltd., model.TS) under a load of 4.9 N. , the haze before TABER abrasion test and TABER The difference in haze (ΔΗ) after the consumption test is less than 15 and is referred to as "〇", and the difference in haze is 15 or more as "X". The evaluation of scratch resistance is based on Example 1 7~ 2〇 and Comparative Example 4, using steel wool #0000 (load 4.9 N), reciprocating 5 times in 2〇〇〇mm/sec, visually assessing the damage of the surface. The damage is recorded as "1", the person who is slightly damaged is referred to as r 2", and the person whose surface is damaged by more than half of the friction is recorded as "3". (8) Adhesiveness is used in accordance with JIS K 5400 The razor blade cuts the sample (hardened film) into 11 slits at intervals of 2 mm to form i 网格 a grid, and uses commercially available cellophane tape with a finger pad ("CT-24 (width 24 mm) )), Nichiban Co., Ltd.) After fully adhering to the sample, it is quickly peeled off at an angle of 9 〇. The number of meshes in which the cured film is not peeled off and remains is indicated by Χ/100. The adhesion of the film was evaluated. 141326.doc -84 - 201012882 (9) Boiling resistance The sample of the laminate was immersed in boiling water in a stainless steel beaker. After the hour, the adhesion was evaluated. The evaluation of the adhesion was carried out in the same manner as in the above (8). (10) The weather resistance test was carried out for 2400 hours of the xenon arc lamp (Atlas ci65, the output was 6.5 kW, black panel temperature is 63 ° C, relative humidity is 50%). Weather resistance is evaluated by changes in the hardening film adhesion before and after the test. (11) Flexibility is limited to 100 mm x width 50 mm x thickness 1 A sample of a resin laminate was produced in the same manner as in each example except that a polycarbonate standard plate (trade name: p〇lyca_Ace, product number: ECK100) manufactured by Sumitomo Bakelite Co., Ltd. was used as the substrate. The both ends of the sample were held with a finger, and forced bending of a curve having a radius of 5 mm was performed 10 times. A person who does not have a crack on the layer is referred to as "〇", and a person who has a crack is referred to as "X". (12) Heat resistance was measured by heat resistance test (manufactured by TABAI, PS-222) at ll (TC, 720 hours). The heat resistance was evaluated by the change in the cured film adhesion before and after the test. (13) Organic particles The dispersed structure was observed by a TEM (transmission electron microscope) for the cross-section of the cured film, and 10 organic fine particles present in the region of 1 μm square were selected, and Freesoft: ΝΙΗ 141326 manufactured by National Institute of Health, USA. Doc -85- 201012882

Image 1.63求得平均粒徑。將有機微粒之平均粒徑為觸 -以下者記為「〇」,將平均粒徑大於2〇〇⑽者記為 「^ ’又,將雖亦存在粒徑為2〇〇 nm以下者,但存在粒子 熔著而成為粒徑為細⑽以上之變形蟲狀者的情況記為 「△」。 (14)無機微粒分散結構 以與上述(13)同樣之方式求得硬化膜中之氧化錦微粒及 膠禮二氧化石夕微粒各自之平均粒徑。將各自之平均粒徑為 200 nm以下者記為「〇」,將任一者之平均粒徑大於 nm者記為「X」。 又,於實施例及比較例中,以商品名所記載之原料的詳 細内容如下。 (A) 成分:M Silicate 51「作為四曱氧基矽烷之部分縮合物 (平均為三〜五聚物)的聚烷氧基矽烷」多摩化學工業股份 有限公司製造 习 (B) 成分:ULS-1385MG(紫外線吸收骨架種:苯并三唑系) 一方社油脂工業股份有限公司製造(水分散/固形物濃度 為30質量%) ^ (B) 成分:ULS-385MG(紫外線吸收骨架種:二苯曱_系) 一方社油脂工業股份有限公司製造(水分散/固形物濃度 為30質量%) ^ (C) 成分:IPA-ST-L(膠體二氧化矽) 曰產化學工業股份有限公司製造(異丙醇分散,膠體二 氧化矽濃度為30質量%,平均粒徑為4〇〜50 nm(製造廠公布 141326.doc -86 - 201012882 值)) (F')成分:NeedralU-15(陽離子性氧化鈽水分散液) 多木化學股份有限公司製造(水分散,氧化鈽濃度為15 質量%,平均粒徑為8 nm以下,pH值為3.5(製造廠產品目 錄值)) _(再者,使用Malvern公司製造之Zetasizer Nano系列 . Nano-ZS,以20°C、分散介質為水、累計次數為50次之條 件對Needral U-15測定ζ電位,結果為+28.8 mV,確認氧化 ® 鈽粒子具有陽離子性)。 (F’)成分:NeedralH-15(酸穩定型氧化鈽水分散液) 多木化學股份有限公司製造(水分散,氧化鈽濃度為 15〜16質量%,穩定劑:鹽酸未達1.0質量%,pH值為 1〜3(製造廠公布值)) (再者,使用Malvern公司製造之Zetasizer Nano系列 Nano-ZS,以20°C、分散介質為水、累計次數為50次之條 件對NeedralH-15測定ζ電位,結果為+53.7mV,確認氧化 Φ 鈽粒子具有陽離子性)。 (1)(F)成分之製備(分散液F1) 依照表6之成分及投入量進行製造。 向容積為50 ml之試樣管中投入Needral H-15((F')成 分)10.0 g,一面以500 rpm攪拌,一面分別用1分鐘依序滴 加1-甲氧基-2-丙醇((E)成分)7.0 g、四乙氧基矽烷((A)成 分)2.23 g。繼而,於室溫下攪拌90分鐘後,於室溫下靜置 90分鐘。將其與攪拌子投入安裝有冷卻管之100 ml三口燒 141326.doc -87- 201012882 瓶中,一面以500 rpm攪拌,一面於氮氣流下、80°C下加 熱4小時。繼而,於室溫下靜置一週,製成包含矽烷化合 物與氧化鈽之反應產物的分散液F1((F)成分)。 (2) (F)成分之與陰離子性微粒溶膠之分散性試驗 向容積為10 ml之試樣管中投入IPA-ST-L((C)成分,分散 有陰離子性膠體二氧化矽之IPA分散溶膠)1_0 g及攪拌子., 一面以400 rpm攪拌,一面用1分鐘滴加包含石夕烧化合物與 氧化鈽之反應產物的分散液F1((F)成分)1.0 g,繼而於室溫 下攪拌1小時。以目視確認攪拌結束後之分散狀態為未產 生凝集、析出、凝膠化而分散。 (3) (F)成分之製備(分散液F2) 依照表6之成分及投入量進行製造。 向容積為50 ml之試樣管中投入Needral H-15((F')成 分)10.0 g,一面以500 rpm攪拌,一面分別用1分鐘滴加1-甲氧基-2-丙醇((E)成分)7.0 g、四乙氧基矽烷((A)成 分)1.49 g。繼而,於室溫下攪拌90分鐘後,於室溫下靜置 90分鐘。將其及攪拌子投入安裝有冷卻管之100 ml三口燒 瓶中,一面以500 rpm攪拌,一面用1分鐘滴加3-環氧丙氧 基丙基三曱氧基矽烷((A)成分)0.30 g,於室溫下攪拌120分 鐘。將其一面以500 rpm攪拌一面於氮氣流下、80°C下加 熱9小時。繼而,於室溫下靜置一週,製成包含矽烷化合 物與氧化飾之反應產物的分散液F2((F)成分)。 再者,對於該分散液F2,以與上述(2)之分散性試驗同 樣之方法,確認未產生凝集、析出、凝膠化而分散。 141326.doc -88 - 201012882 [表6] 成分 成分 分散液F1 分散液F2 Needral Η-15(g) (F) 10.0 10.0 L甲氧基-2-丙醇(g) (G) 7.0 7.0 四曱氧基矽炫Xg) ㈧ - _ 四乙氧基矽烷(g) (A) 2.23 1.49 M Silicate 51(g) (A) - 3-環氧丙氧基丙基三甲氧基矽燒(g) (A) - 0.30 甲氧基-2-丙醇 (用於為置換分散介質而進行稀釋)(g) (G) - - 實施例17〜1 8 (4)塗布液之製造 依照表7之成分及投入量進行製備。 向容積為50 ml之試樣管中投入有機高分子微粒:ULS-1385MG(實施例17)或者ULS-385MG(實施例18)((B)成分 + (E)成分)0.85 g,一面以500 rpm攪拌,一面分別用1分鐘 滴加1-甲氧基-2-丙酵((E)成分)4.25 g、水((E)成分)0.50 g、乙酸((G)成分)2.80 g、M Silicate 51((A-1)成分)0.40 g、甲基三甲氧基矽烷((A-2)成分)1.51 g、二甲氧基-3-環 氧丙氧基丙基曱基矽烷((A-4)成分)0.55 g、20質量°/〇對甲 苯磺酸曱醇溶液((D)成分+(E)成分)〇.〇5 g。繼而,於室溫 下以500 rpm攪拌60分鐘後,靜置一日’將其作為A液。 於安裝有冷卻管之200 ml三口燒瓶中加入A液及攪拌 子,一面以500 rpm攪拌,一面用5分鐘滴加作為B液之 IPA-ST-L((C)成分+(E)成分)6.50 g ’於室溫下攪拌20分 鐘。繼而,以氮氣流下、500 rpm、80°C之條件加熱攪拌7 小時後,於溫下靜置一夜,將其作為A'液。 141326.doc -89- 201012882 向容積為20 ml之試樣管中投入3_異氰酸基丙基三乙氧基 矽烷1.10 g及2-丁酮肟(異氰酸酯基之封端劑)〇.35 g,於室 溫下以500 rpm攪拌1〇分鐘後,靜置一日,將其作為c液。 關於異氰酸酯基經封端化,係根據i3c_NMR中異氰酸酯基 之信號消失而確認。將3-異氰酸基丙基三乙氧基矽烷與2_ 丁酮肟的調配量之合計作為封端化異氰酸基矽烷化合物: (A-5)成分之量。 一面以650 rpm攪拌A,液,一面用5分鐘滴加包含矽烷化 合物與氧化鈽之反應產物的分散液F1((F)成分+(E)成 分)3.26 g,於室溫下攪拌2〇分鐘。繼而用5分鐘加入〇 液,於室溫下攪拌1〇分鐘。繼而,以氮氣流下、65〇 rpm、80°C之條件加熱攪拌4小時後,於室溫下靜置一夜。 進而,向其中用2分鐘滴加作為D液之3-胺基丙基三甲氧 基矽烷((A-3)成分)〇.4〇 g。於室溫下攪拌1〇分鐘後,繼而 以氮氣流下、45〇rpm、80°c之條件加熱3小時。 繼而靜置1週而獲得塗布液。 (5)積層體之製作 使用聚碳酸酯基材[出光興產股份有限公司製造,商品 名:Tarflon,商品編號:IV22〇〇R(耐候等級),厚度為3 mm(總透光率為9〇%,霧度值為〇 5%)]作為樹脂基材。 利用棒式塗布機,將上述所獲得之塗布液以硬化膜達到 7 μιη之方式塗布於厚度為3 mm之聚碳酸酯成形體之表 面,以130°C、2小時之條件使其熱硬化,藉此製作積層 體。 141326.doc •90· 201012882 將評價結果示於 對所獲得之塗布液及積層體進行評價。 表8 〇 實施例19〜20 於上述「⑷塗布液之製造」中’使用分散㈣來代替 分散液F1,依照表7之成分及投人量來製備該實施例之塗 布液’並製作積層體1對所獲得之塗布液及積層體之評 價結果不於表8。 比較例12〜14Image 1.63 Find the average particle size. The average particle diameter of the organic fine particles is referred to as "〇", and the average particle diameter is greater than 2 〇〇 (10), and the particle size is 2 〇〇 nm or less. In the case where the particles are fused and the shape of the worm having a particle diameter of fine (10) or more is "Δ". (14) Inorganic fine particle dispersion structure The average particle diameter of each of the oxidized cerium particles and the cerium dioxide cerium particles in the cured film was determined in the same manner as in the above (13). Those whose average particle diameter is 200 nm or less are referred to as "〇", and those whose average particle diameter is larger than nm are referred to as "X". Further, in the examples and comparative examples, the details of the raw materials described in the trade names are as follows. (A) Ingredients: M Silicate 51 "Polyalkyloxydecane as a partial condensate of tetradecyloxydecane (average three to pentamer)" Tama Chemical Industry Co., Ltd. (B) Ingredients: ULS- 1385MG (Ultraviolet absorption skeleton: benzotriazole) Manufactured by One Society Oil & Fat Industry Co., Ltd. (water dispersion/solid content concentration: 30% by mass) ^ (B) Component: ULS-385MG (UV absorption skeleton: diphenyl)曱_系) Manufactured by ONE Oil & Fat Industry Co., Ltd. (water dispersion/solid content concentration: 30% by mass) ^ (C) Component: IPA-ST-L (colloidal cerium oxide) 曰Production Chemical Industry Co., Ltd. Isopropanol dispersion, colloidal cerium oxide concentration of 30% by mass, average particle size of 4〇~50 nm (manufacturer announced 141326.doc -86 - 201012882 value)) (F') component: NeedralU-15 (cationic Hydrazine Hydroxide Dispersion (manufactured by Doki Chemical Co., Ltd.) (water dispersion, yttrium oxide concentration of 15% by mass, average particle size of 8 nm or less, pH of 3.5 (manufacturer catalogue value)) _ (again, Use the Zetasizer Nano series manufactured by Malvern Nano-ZS measured the zeta potential of Needral U-15 at 20 ° C with a dispersion medium of 50, and the result was +28.8 mV, confirming that the oxidized ® ruthenium particles were cationic). (F') component: NeedralH-15 (acid-stable cerium oxide aqueous dispersion) manufactured by Doki Chemical Co., Ltd. (water dispersion, cerium oxide concentration: 15 to 16% by mass, stabilizer: hydrochloric acid not up to 1.0% by mass, The pH value is 1 to 3 (manufacturer's published value)) (Further, using the Zetasizer Nano series Nano-ZS manufactured by Malvern, the temperature is 20 ° C, the dispersion medium is water, and the cumulative number of times is 50 times. The zeta potential was measured and found to be +53.7 mV, confirming that the oxidized Φ 钸 particles are cationic). (1) Preparation of component (F) (dispersion F1) Manufactured according to the components and the amounts of the amounts in Table 6. Into a sample tube having a volume of 50 ml, 10.0 g of Needral H-15 ((F') component) was placed, and while stirring at 500 rpm, 1-methoxy-2-propanol was sequentially added dropwise over 1 minute. ((E) component) 7.0 g, tetraethoxy decane (component (A)) 2.23 g. Then, after stirring at room temperature for 90 minutes, it was allowed to stand at room temperature for 90 minutes. This was placed in a 100 ml three-burner 141326.doc -87-201012882 bottle equipped with a cooling tube, and stirred at 500 rpm while being heated at 80 ° C for 4 hours under a nitrogen stream. Then, it was allowed to stand at room temperature for one week to prepare a dispersion F1 (component (F)) containing a reaction product of a decane compound and cerium oxide. (2) Dispersibility test of (F) component and anionic fine particle sol IPA-ST-L ((C) component, IPA dispersion in which anionic colloidal ceria is dispersed is introduced into a sample tube having a volume of 10 ml Sol) 1_0 g and a stirrer. While stirring at 400 rpm, 1.0 g of a dispersion F1 ((F) component) containing a reaction product of a smelting compound and cerium oxide was added dropwise over 1 minute, followed by room temperature Stir for 1 hour. It was visually confirmed that the dispersed state after the completion of the stirring was such that aggregation, precipitation, and gelation were not generated and dispersed. (3) Preparation of component (F) (dispersion F2) Manufactured according to the components and input amounts of Table 6. Into a sample tube having a volume of 50 ml, 10.0 g of Needral H-15 ((F') component) was placed, and while stirring at 500 rpm, 1-methoxy-2-propanol was added dropwise over 1 minute (( E) component) 7.0 g, tetraethoxy decane (component (A)) 1.49 g. Then, after stirring at room temperature for 90 minutes, it was allowed to stand at room temperature for 90 minutes. This and the stirrer were placed in a 100 ml three-necked flask equipped with a cooling tube, and while stirring at 500 rpm, 3-glycidoxypropyltrimethoxy decane (component (A)) 0.30 was added dropwise over 1 minute. g, stirred at room temperature for 120 minutes. One side was stirred at 500 rpm and heated at 80 ° C for 9 hours under a nitrogen stream. Then, it was allowed to stand at room temperature for one week to prepare a dispersion F2 (component (F)) containing a reaction product of a decane compound and an oxidized product. In the same manner as in the dispersibility test of the above (2), it was confirmed that the dispersion liquid F2 was not aggregated, precipitated, or gelated and dispersed. 141326.doc -88 - 201012882 [Table 6] Ingredient Fraction F1 Dispersion F2 Needral Η-15(g) (F) 10.0 10.0 L-methoxy-2-propanol (g) (G) 7.0 7.0 Four Oxyfluorene Xg) (8) - _ Tetraethoxydecane (g) (A) 2.23 1.49 M Silicate 51(g) (A)-3-Ethoxypropyloxypropyltrimethoxysulfonate (g) ( A) - 0.30 methoxy-2-propanol (for dilution for displacement of the dispersion medium) (g) (G) - - Examples 17 to 1 8 (4) Preparation of coating liquid According to the composition of Table 7 and The amount of input was prepared. The organic polymer microparticles were injected into a sample tube having a volume of 50 ml: ULS-1385MG (Example 17) or ULS-385MG (Example 18) ((B) component + (E) component) 0.85 g, one side was 500 After stirring at rpm, 1-methoxy-2-propanol ((E) component) 4.25 g, water ((E) component) 0.50 g, acetic acid ((G) component) 2.80 g, M were added dropwise over 1 minute. Silicate 51 ((A-1) component) 0.40 g, methyltrimethoxydecane ((A-2) component) 1.51 g, dimethoxy-3-glycidoxypropyldecyl decane (A -4) Ingredient) 0.55 g, 20 mass ° / 〇 p-toluenesulfonic acid decyl alcohol solution (component (D) + (E)) 〇. 5 g. Then, after stirring at 500 rpm for 60 minutes at room temperature, it was allowed to stand for one day as a liquid A. Add a liquid A and a stirrer to a 200 ml three-necked flask equipped with a cooling tube, and while stirring at 500 rpm, add IPA-ST-L as a liquid B in 5 minutes ((C) component + (E) component) 6.50 g 'Stir at room temperature for 20 minutes. Then, the mixture was heated and stirred under a nitrogen stream at 500 rpm and 80 ° C for 7 hours, and then allowed to stand overnight at a temperature to obtain an A' solution. 141326.doc -89- 201012882 To the sample tube with a volume of 20 ml, add 1.10 g of isocyanatopropyltriethoxydecane and 2-butanone oxime (blocking agent for isocyanate group) 〇.35 g, after stirring at 500 rpm for 1 minute at room temperature, it was allowed to stand for one day and used as a liquid c. The blocking of the isocyanate group was confirmed by the disappearance of the signal of the isocyanate group in i3c_NMR. The total amount of 3-isocyanatepropyltriethoxydecane and 2-butanone oxime is defined as the amount of the blocked isocyanatodecane compound: (A-5). While stirring A and liquid at 650 rpm, 3.26 g of a dispersion F1 ((F) component + (E) component) containing a reaction product of a decane compound and cerium oxide was added dropwise over 5 minutes, and stirred at room temperature for 2 minutes. . The mash was then added over 5 minutes and stirred at room temperature for 1 minute. Then, the mixture was heated and stirred under a nitrogen stream at 65 rpm and 80 ° C for 4 hours, and then allowed to stand at room temperature overnight. Further, 3-aminopropyltrimethoxydecane (component (A-3)) as a solution D was added dropwise thereto for 2 minutes to 〇.4〇 g. After stirring at room temperature for 1 minute, it was heated under a nitrogen stream at 45 rpm and 80 ° C for 3 hours. Then, it was allowed to stand for 1 week to obtain a coating liquid. (5) The production of the laminate was carried out using a polycarbonate substrate [manufactured by Idemitsu Kosan Co., Ltd., trade name: Tarflon, product number: IV22〇〇R (weathering grade), thickness: 3 mm (total light transmittance: 9) 〇%, haze value 〇5%)] as a resin substrate. The coating liquid obtained above was applied to the surface of a polycarbonate molded body having a thickness of 3 mm by a bar coater at a thickness of 7 μm, and was thermally cured at 130 ° C for 2 hours. Thereby making a laminate. 141326.doc •90· 201012882 The evaluation results are shown in the evaluation of the obtained coating liquid and laminate. Table 9 〇 Examples 19 to 20 In the above "(4) Production of Coating Liquid", "Dispersion (4) was used instead of Dispersion F1, and the coating liquid of the Example was prepared in accordance with the components and the amount of the ingredients in Table 7 and a laminate was produced. The evaluation results of the obtained coating liquid and laminate were not shown in Table 8. Comparative Example 12~14

於上述「(4)塗布液之製造」中,使用表7所示之Needral U-15或Needral H-15來代替分散液F1,依照表7之成分及投 入ΐ來製備該比較例之塗布液,並製作積層體。將對所獲 得之塗布液及積層體之評價結果示於表8。In the above "(4) Production of coating liquid", Needral U-15 or Needral H-15 shown in Table 7 was used instead of the dispersion liquid F1, and the coating liquid of the comparative example was prepared in accordance with the composition of Table 7 and the crucible. And make a layered body. The evaluation results of the obtained coating liquid and laminate were shown in Table 8.

141326.doc 91- 201012882 【卜磷】 ϊ « 一1 3° <^| ch$ 甘ο • 1 4.25 (66.82份) /— 〇拿 «Λ» Ό 〇°® °b • 2.00 (21.45%) 0.95 (14.94%) 0.01 (0.16%) ο <-η ο^. ο ; 0.69 1 (10.85%) % 1 1 1 1 <s 0.85 Π 1.36 份) 1 t 〇I —·ΓΤ) —* 0.35 (5.50%) _ 121.68 1 Ϊ 兹 1 I 0.255 (2.66%) 0.595 (6.22 份) i 0.50 (5.22m 2.80 ! (29.26%) 1.51 ; (15.78%) 1 0.55 (5.75%) 0.01 (0.10%) 0.04 (0.42 份) 1.95 (20.38%) 1 4.55 · (47.54份) 1 • 1 • * 0.249 (2.60%) 1,411 (14.74 份) 1.10 (11.48%) 2岑 0.40 (4.18%) 118.55 1 <N Ϊ -O 0.255 (2.66%) 0.595 (6.22 份) 1 5 啤5 0.50 ! (5.22 份) 2.80 1 (29.26%) j —wS 2" 0.01 (0.10%) 0.04 (0.42 份) ~a 1 4.55 ι (47.54份) 1 1 1 1 (N ^ 〇fSj 1.411 (14.74 份) 1 1 2| ——. •ng 2岑 ΓΟ 0.40 (4.18%) 118.55 | tK 1 0.255 (2.63%) 0.595 (6.131¾ 4.25 (43.81 份) 0.50 (5.15 份〕 2.80 (28.87¾ ϊ 0.40 (4.12%) ! 1.51 ϊ (15.57¾ 1 0.55 (5.67%) 0.01 (0.10%) 0.04 (0.41 份) S3 —δ 1 4.55 i (46.91 份) 1 1 0.37 (3.81%) 9 〇〇 (29.79份) * * I t —— «w 0.35 (3.61%) 132.20 | On Ϊ 0.255 (2.63%) 0S 4.25 (43.8丨份) 〇拿 *n *n 〇*r *r^ 2.80 (28.87%) i j ” A ~ <n 0.55 | (5.67%) i 0.01 (0.10%) ο 1.95 (20.10%) 4.55 (46.9丨份) ' i 0.37 (2.81%) i mO< (N 1 1 I • ό| 2 s. cn 132.20 | 〇〇 Ϊ > • 0.255 (2.63%) 0.595 (6.14#) i iql 〇念 >Λ SO d- ΙΛ 2.80 (28.90¾ —«Λ 0.55 l (5.68%) i 0.01 ! (0.10%) I si c;, ο —wJ, <Ν, 4.55 (46.96 份) I 2.90 1 (29.93份) • • 1 I 1 2| ——' rn 0.40 (4.13%) 132.46 | 卜 ϊ 始 0d· 0.595 (6.14 份) • $ 0.50 (5.16 份) 2,80 (28.90%) 。条 寸m 。'5 1.51 (15.58%) 2" 0.0! i (〇.!〇%) I 寸i ο — ο 4.55 (46.96份) I 2.90 1 (29.93份j_ 1 1 1 1 • 1.10 (1135%) 0.40 (4.13%) S § S ω g ω 〇 (A-l) (A-2) (A-4) § ω S g ε g ω e ω g s (Α-5) (A-3) $ ΦΙ Φ USL-1385MG(因形物濃度為 30®f%)(g) ULS-385MG(固形物濃度為30質董%)(g) 1-甲氣基-2-丙酵(g) 水(g) 乙酸(g) M Silicate 51(g) 甲基三甲氡基矽烷(g) .. _ _ _ 一 一 ___ 一 _ 1 二f氧基-3-環氧丙氧基丙基甲基矽炫(g) 20質量%對甲苯磺酸甲酵溶液(g) IPA-ST-L(固形物濃度為30質量%)(g) ρ 審气 W * 審a < 象π 4d ^ ud 51 鉍2 •a举 Needral U-15(固形物濃度為丨5質量%)(g) Needral H-15(固形物濃度為15質量%)化) 3-異氱酸基丙基三乙氧基矽烧(g) 2-丁綢肟(異氱酸酯基封端劑)(g) 3-胺基丙基三甲氧基矽烷(g) A液 1 I 1 Μ 鸾 V ω 。%ii,w*yoool%^l*wl,璨 4令噶(0~<)宪长<(%>电搞"^€:滋龙* 141326.doc •92- 201012882 ο· 00<【8<】 141326.doc 1比較例14 1 vn 〇 j〇Sti 88% [2.0% I 〇 m 100/100 80/100 80/100 〇 100/100 〇 〇 比較例13 ΓΟ vn X |白濁| 1 1 1 1 1 1 1 1 1 1 1 比較例12 r〇 〇 88% 2.0% 〇 r-H 100/100 80/100 80/100 〇 100/100 〇 〇 |實施例20 ! ΓΛ VO 〇 90% | 1.2% | 〇 100/100 100/100 100/100 〇 100/100 〇 〇 實施例19 m 〇 90% | 1.2% I 〇 100/100 100/100 〇 100/100 〇 〇 實施例18 1 iTi 〇 89% | 1.3% I 〇 t刚/励 100/100 100/100 〇 100/100 〇 〇 實施例17 〇 •ίώί 89% | 1.3% I 〇 ^—4 100/100 1_ 100/100 100/100 〇 100/100 〇 〇 評價項目 來自無機成分之氧化物換算含量(質量%) 有機高分子微粒含量(質量% :計算值) 氧化鈽含量(質量%:計算值) 溶液穩定性 膜外觀 總透光率 霧度 耐磨耗性 耐擦傷性 密著性 煮沸5小時後之密著性 耐候性(2400小時) 对撓曲性 耐熱性 有機微粒分散結構 無機微粒分散結構 -93- 201012882 實施例17〜2〇之塗布液均為 馮/合液穩定性良好,由其所獲 得之積層體亦在所有評價中獲得優異之結果。另―方面, 比較例13之塗布液的穩4性低、實_低。又,比㈣ 12、14之密著性差。 [實施例21〜32、比較例15〜26J 實施例21〜32 [樹脂積層體之製作] 將藉由實施例1、2、5、6所盥造之♦太%、,* _ W农is之塗布液以硬化膜之厚 度達到2〜3 μΐη之方式塗布於基材表面上,如下述< 基材及 硬化膜之熱硬化條件 > 所示,以適合於所使用之基材的溫 度及時間使其熱硬化’藉此製作包含基材及硬化膜之積層 體。 其次,利用下述方法在所製作之包含基材及硬化膜之積 層體上形成透明導電膜,獲得樹脂積層體。 將對所獲得之包含基材、硬化膜及透明導電膜之樹脂積 層體進行評價之結果示於表9。 <基材及硬化膜之熱硬化條件> (1) 聚碳酸酯[厚度為400 μηι(總透光率為92%,霧度值為 0.4%)],120°C,2小時 (2) 聚對苯二甲酸乙二酯[Unitika股份有限公司製造,商品 名:Emblet ’等級:s,厚度為25 μιη(總透光率為89%,霧 度值為 2.5°/。)],i〇〇°c,2小時 (3) 聚丙烯[Idemitsu Unitech股份有限公司製造,商品名: Purethermo,厚度為250 μιη(總透光率為94%,霧度值為 141326.doc -94· 201012882 8.5%)],i〇〇°c,2小時 <透明導電膜之形成方法> (1) IZO薄膜141326.doc 91- 201012882 【卜磷】 ϊ « 一 1 3° <^| ch$ 甘ο • 1 4.25 (66.82 servings) /— Λ拿Λ«Λ Ό 〇°® °b • 2.00 (21.45%) 0.95 (14.94%) 0.01 (0.16%) ο <-η ο^. ο ; 0.69 1 (10.85%) % 1 1 1 1 <s 0.85 Π 1.36 copies) 1 t 〇I —·ΓΤ) —* 0.35 (5.50%) _ 121.68 1 Ϊ 1 I 0.255 (2.66%) 0.595 (6.22 parts) i 0.50 (5.22m 2.80 ! (29.26%) 1.51 ; (15.78%) 1 0.55 (5.75%) 0.01 (0.10%) 0.04 (0.42 copies) 1.95 (20.38%) 1 4.55 · (47.54 copies) 1 • 1 • * 0.249 (2.60%) 1,411 (14.74 copies) 1.10 (11.48%) 2岑0.40 (4.18%) 118.55 1 <N Ϊ - O 0.255 (2.66%) 0.595 (6.22 servings) 1 5 Beer 5 0.50 ! (5.22 servings) 2.80 1 (29.26%) j —wS 2" 0.01 (0.10%) 0.04 (0.42 servings) ~a 1 4.55 ι (47.54 servings) ) 1 1 1 1 (N ^ 〇fSj 1.411 (14.74 copies) 1 1 2| ——. • ng 2岑ΓΟ 0.40 (4.18%) 118.55 | tK 1 0.255 (2.63%) 0.595 (6.1313⁄4 4.25 (43.81 servings) 0.50 (5.15 parts) 2.80 (28.873⁄4 ϊ 0.40 (4.12%) ! 1.51 ϊ (15.573⁄4 1 0.55 (5.67%) 0.01 (0.10%) 0.04 (0.41 parts) S3 - δ 1 4.55 i (46.91 copies) 1 1 0.37 (3.81%) 9 〇〇 (29.79 copies) * * I t —— «w 0.35 (3.61%) 132.20 | On Ϊ 0.255 (2.63%) 0S 4.25 (43.8 copies) **n *n 〇*r *r^ 2.80 (28.87%) ij ” A ~ <n 0.55 | (5.67%) i 0.01 (0.10%) ο 1.95 (20.10%) 4.55 (46.9 copies) ' i 0.37 (2.81%) i mO< (N 1 1 I • ό| 2 s. cn 132.20 | 〇〇Ϊ > • 0.255 (2.63%) 0.595 (6.14#) i iql mourning > Λ SO d- ΙΛ 2.80 (28.903⁄4 —«Λ 0.55 l (5.68%) i 0.01 ! (0.10%) I si c;, ο —wJ, <Ν, 4.55 (46.96 copies) I 2.90 1 (29.93 copies) • • 1 I 1 2 | ——' rn 0.40 (4.13%) 132.46 | Divination 0d· 0.595 (6.14 servings) • $0.50 (5.16 copies) 2,80 (28.90%). Inch m. '5 1.51 (15.58%) 2" 0.0! i (〇.!〇%) I inch i ο — ο 4.55 (46.96 copies) I 2.90 1 (29.93 copies j_ 1 1 1 1 • 1.10 (1135%) 0.40 (4.13 %) S § S ω g ω 〇(Al) (A-2) (A-4) § ω S g ε g ω e ω gs (Α-5) (A-3) $ ΦΙ Φ USL-1385MG The concentration of the substance is 30®f%) (g) ULS-385MG (solid concentration is 30% by weight) (g) 1-methane-2-propanyl (g) water (g) acetic acid (g) M Silicate 51(g) Methyl trimethyldecyl decane (g) .. _ _ _ one one ___ one _ 1 di-foxy-3-glycidoxypropyl methyl fluorene (g) 20% by mass p-Toluenesulfonic acid methylation solution (g) IPA-ST-L (solid content concentration: 30% by mass) (g) ρ Trial W * Review a < π 4d ^ ud 51 铋 2 • a Lifted U- 15 (solid content concentration: 丨5 mass%) (g) Needral H-15 (solid content concentration: 15% by mass) 3-isodecanoic acid propyl triethoxy oxime (g) 2-butyl silk肟 (isodecanoate-based blocking agent) (g) 3-aminopropyltrimethoxydecane (g) A liquid 1 I 1 Μ 鸾V ω . %ii,w*yoool%^l*wl,璨4噶噶(0~<) Constitutional Length<(%>Electricity"^€:Zilong* 141326.doc •92- 201012882 ο· 00&lt ;[8<] 141326.doc 1Comparative Example 14 1 vn 〇j〇Sti 88% [2.0% I 〇m 100/100 80/100 80/100 〇100/100 〇〇Comparative Example 13 ΓΟ vn X |White turbidity| 1 1 1 1 1 1 1 1 1 1 1 Comparative Example 12 r〇〇88% 2.0% 〇rH 100/100 80/100 80/100 〇100/100 〇〇|Example 20 ! ΓΛ VO 〇90% | 1.2 % | 〇100/100 100/100 100/100 〇100/100 〇〇Example 19 m 〇90% | 1.2% I 〇100/100 100/100 〇100/100 〇〇Example 18 1 iTi 〇89% 1.3% I 〇t Gang/Excited 100/100 100/100 〇100/100 〇〇Example 17 〇•ίώί 89% | 1.3% I 〇^—4 100/100 1_ 100/100 100/100 〇100/ 100 〇〇Evaluation item from oxide content of inorganic component (% by mass) Organic polymer microparticle content (% by mass: calculated value) Cerium oxide content (% by mass: calculated value) Solution stability film appearance Total transmittance haze Abrasion resistance, abrasion resistance, adhesion, boiling, adhesion after 5 hours Weatherability (2400 hours) for the flexural heat-resistant organic fine particle dispersion structure inorganic fine particle dispersion structure - 93 - 201012882 The coating liquids of Examples 17 to 2 are all good in the stability of the von/liquid mixture, and the laminate obtained therefrom The body also obtained excellent results in all evaluations. On the other hand, the coating liquid of Comparative Example 13 was low in stability and low in actual value, and was inferior in adhesion to (4) 12 and 14. [Examples 21 to 32, Comparative Examples 15 to 26J Examples 21 to 32 [Production of Resin Laminate] The coating liquid of ♦ Too%, * _ W is 盥 manufactured by Examples 1, 2, 5, and 6 was used as a cured film. The film is applied to the surface of the substrate in such a manner that the thickness thereof is 2 to 3 μΐη, and is thermally hardened as shown in the following <Temperature curing conditions of the substrate and the cured film>, at a temperature and time suitable for the substrate to be used. Thereby, a laminate including a substrate and a cured film was produced. Next, a transparent conductive film was formed on the produced laminate including the substrate and the cured film by the following method to obtain a resin laminate. The results of evaluation of the obtained resin laminate including the substrate, the cured film, and the transparent conductive film are shown in Table 9. <Heat-hardening conditions of substrate and cured film> (1) Polycarbonate [thickness: 400 μηι (total light transmittance: 92%, haze value: 0.4%)], 120 ° C, 2 hours (2) Polyethylene terephthalate [manufactured by Unitika Co., Ltd., trade name: Emblet 'grade: s, thickness 25 μιη (total light transmittance 89%, haze value 2.5 ° /.)], i 〇〇°c, 2 hours (3) Polypropylene [Manufactured by Idemitsu Unitech Co., Ltd., trade name: Purethermo, thickness 250 μηη (total light transmittance 94%, haze value 141326.doc -94· 201012882 8.5 %)], i〇〇°c, 2 hours <Formation method of transparent conductive film> (1) IZO film

將所製作之包含基材及硬化膜之積層體設置於濺鍍裝置 (島津HSM-552)内’進行排氣直至裝置内之真空度達到 1.Οχ 1(Γ4 Pa。其後,使氬氣流入裝置内,將裝置内之壓力 調整為 0·2 Pa。靶係使用 lz〇(In203 : ZnO= 90 : 1〇 質量 〇/〇) 燒結體乾。以濺鑛DC(direct current ’直流)輸出功率1 〇〇 W來製作膜厚為2〇 nm或膜厚為120 nm之透明導電膜。基 板溫度為室溫。 (2) IZTO 薄膜 靶係使用 IZTO靶(ln203 : ZnO : Sn02 = 20 : 40 ·· 40 質量 %),以與上述同樣之方法形成。 (3) ZTO薄膜 以與上述 靶係使用ZTO靶(ZnO : Sn〇2= 10 : 90質量%) (1)同樣之方法形成。 (4) Sn02 薄膜 靶係使用SnOJA結體靶 Sn02薄膜。 以與上述(1)同樣之The produced laminate including the substrate and the cured film was placed in a sputtering apparatus (Shimadzu HSM-552) to perform evacuation until the degree of vacuum in the apparatus reached 1. Οχ 1 (Γ4 Pa. Thereafter, argon was made Into the device, adjust the pressure inside the device to 0·2 Pa. The target system uses lz〇 (In203: ZnO=90: 1〇 mass〇/〇) sintered body. Splash DC (direct current 'DC' output) A transparent conductive film with a film thickness of 2 〇 nm or a film thickness of 120 nm is produced at a power of 1 。W. The substrate temperature is room temperature. (2) The IZTO target is used for the IZTO thin film target system (ln203 : ZnO : Sn02 = 20 : 40 40% by mass is formed in the same manner as described above. (3) The ZTO film is formed in the same manner as the above-mentioned target system using a ZTO target (ZnO: Sn〇2 = 10: 90% by mass) (1). 4) Sn02 thin film target system uses SnOJA junction target Sn02 film. The same as (1) above.

(5) ITO薄膜 靶係使用 ITO靶(ln203 : Sn〇2= 90 : 10 質量 V、 0) ’以與上 述(1)同樣之方法形成。形成後,在大氣中剎m 。 W用烘箱於 120C下進行1小時熱處理。 比較例15〜26 141326.doc •95- 201012882 在實施例21巾所使狀基材4料硬化膜而直接形成 透明導電膜,獲得樹脂積層體。 將對所獲得之包含基材及透明導電膜之積層體進行評價 之結果示於表1 0。 實施例21〜32、比較例丨5〜26之各例中之諸特性係依照下 述要領而求得。 0)膜外觀 目視觀察樹脂積層體之外觀,對異物及斑點圖案、裂痕 之有無加以確認,將未確認到上述情況者記為「〇」,將確 認到上述情況者記為「X」。 (2) 總透光率及霧度 利用直讀霧度計(Suga試驗機股份有限公司製造,HGM_ 2DP)測定樹脂積層體之總透光率及霧度。 (3) 表面硬度 依照JIS K5600-5-4 ’使用塗膜用鉛筆刮痕硬度試驗機 (手動式)(井元製作所股份有限公司製造),在樹脂積層體 之透明導電膜表面進行評價。 (4) 耐擦傷性 使用鋼絲絨#0000 ’以荷重4.9 N、2000 mm/sec在樹脂積 層體之透明導電膜之表面上往復次後,藉由目視以3等 級來評價透明導電膜之表面的受損狀態。將完全未受損者 記為「1」,將稍許受損者記為「2」,將經摩擦之部位的一 半以上之面受損者記為「3」。 (5) 密著性 14I326.doc -96· 201012882 依照JIS Κ 5400 ’利用剃刀之刀刀將樹脂積層體之透明 導電膜表面以2 mm間隔切入縱橫各11條之切縫而形成i 〇〇 個網格,用指腹使市售之玻璃紙膠帶(「cT_24(寬度為24 mm)」,Nichiban股份有限公司製造)與透明導電膜表面充 为费著後,以90 C之角度向近前方向迅速剝離,將透明導 電膜未剝離而殘存之網格數(X)以X/100表示,以對透明導 電膜之密著性進行評價。 (6)耐濕性 於耐濕性試驗(小型環境試驗器,Espec股份有限公司製 造’ SH-221)中’於5(TC、95 RH%之環境中靜置1〇〇小時 後,對密著性進行評價。密著性係以與上述(5)同樣之方式 進行評價。 (7 )耐挽曲性 用手指夾持樹脂積層韹試樣之兩端,進行10次半徑為5〇 mm之曲線之強制彎曲,對積層面確認裂痕或剝離之有 無’將未確認到該等者記為「〇」’將破認到該等者記為 「X」。 (8) 比電阻 利用低電阻率計L0resta-EP(三菱化學股份有限公司製 造),藉由四探針法在樹脂積層體之透明導電膜表面進行 比電阻之測定。 (9) 栽子濃度 載子漠度係以van der Pole法進行測定。霍爾(Hall)測定 裝置及其測定條件如下。 141326.doc -97- 201012882 •霍爾測定裝置 東陽技術公司製造:Resi Test8310 •測定條件 測定溫度:室溫(25°C )(5) The ITO thin film target was formed by the same method as the above (1) using an ITO target (ln203: Sn〇2 = 90 : 10 mass V, 0). After formation, brake m in the atmosphere. W was heat treated in an oven at 120 C for 1 hour. Comparative Example 15 to 26 141326.doc • 95-201012882 In the film of Example 21, the substrate was cured, and a transparent conductive film was directly formed to obtain a resin laminate. The results of evaluation of the obtained laminate including the substrate and the transparent conductive film are shown in Table 10. The characteristics of each of Examples 21 to 32 and Comparative Examples 5 to 26 were obtained in accordance with the following procedures. 0) Film appearance The appearance of the resin laminate was visually observed, and the presence or absence of foreign matter, speckle patterns, and cracks was confirmed. Those who did not confirm the above were referred to as "〇", and those who confirmed the above were referred to as "X". (2) Total light transmittance and haze The total light transmittance and haze of the resin laminate were measured by a direct reading haze meter (manufactured by Suga Test Machine Co., Ltd., HGM_ 2DP). (3) Surface hardness The surface of the transparent conductive film of the resin laminate was evaluated in accordance with JIS K5600-5-4' using a pencil scratch hardness tester (manual type) (manufactured by Imoto Seisakusho Co., Ltd.). (4) Scratch resistance The surface of the transparent conductive film was evaluated by visual inspection using steel wool #0000' after reciprocating the surface of the transparent conductive film of the resin laminate with a load of 4.9 N and 2000 mm/sec. Damaged state. The person who is completely undamaged is marked as "1", the person who is slightly damaged is marked as "2", and the person whose face is damaged by more than half is marked as "3". (5) Adhesion 14I326.doc -96· 201012882 According to JIS Κ 5400', the surface of the transparent conductive film of the resin laminate is cut into the slits of 11 vertical and horizontal lines at intervals of 2 mm using a razor blade to form i 〇〇 In the grid, the commercially available cellophane tape ("cT_24 (width: 24 mm)", manufactured by Nichiban Co., Ltd.) and the surface of the transparent conductive film were charged with the fingertips, and the film was quickly peeled off at an angle of 90 C. The number of meshes (X) in which the transparent conductive film was not peeled off and represented by X/100 was evaluated to evaluate the adhesion of the transparent conductive film. (6) Moisture resistance in the moisture resistance test (small environment tester, manufactured by Espec Co., Ltd. 'SH-221) in '5 in TC, 95 RH% environment, after standing for 1 hour, the dense The adhesion was evaluated in the same manner as in the above (5). (7) The buckling resistance was sandwiched between the ends of the resin laminated ruthenium sample by fingers, and the radius was 5 〇 mm. Forced bending of the curve, check for the presence or absence of cracks or peeling on the layer. 'The person who has not confirmed the number is marked as "〇" and will be identified as "X". (8) The specific resistance is measured by a low resistivity meter. L0resta-EP (manufactured by Mitsubishi Chemical Corporation), the specific resistance was measured on the surface of the transparent conductive film of the resin laminate by the four-probe method. (9) The concentration of the carrier was carried out by the van der Pole method. The Hall measuring device and its measurement conditions are as follows: 141326.doc -97- 201012882 • Hall measuring device manufactured by Dongyang Technology Co., Ltd.: Resi Test 8310 • Measurement conditions Measurement temperature: room temperature (25 ° C)

測定磁場:0.5 TMeasuring magnetic field: 0.5 T

測定電流:1〇_12〜1〇_4 A 測定模式:AC(alternating current,交流)磁場 (10)透明導電膜之結晶性 結晶性之判定係藉由X射線繞射測定而進行。X射線繞 射測定(XRD,X-ray diffraction)之測定條件如下所述。將 無明確之結晶性峰者作為非晶。 • X射線繞射測定裝置Measurement current: 1〇_12~1〇_4 A Measurement mode: AC (alternating current) magnetic field (10) Crystallinity of transparent conductive film The determination of crystallinity was carried out by X-ray diffraction measurement. The measurement conditions of X-ray diffraction (XRD, X-ray diffraction) are as follows. Those who have no clear crystallographic peaks are regarded as amorphous. • X-ray diffraction measuring device

Rigaku股份有限公司製造:Ultima-Ill •測定條件 X射線:Cu-Κα射線(波長未1.5406 A,利用石墨單色器 進行單色化)Manufactured by Rigaku Co., Ltd.: Ultima-Ill • Measurement conditions X-ray: Cu-Κα ray (wavelength not 1.5406 A, monochromatized with graphite monochromator)

輸出功率:50 kV-120 mA 2Θ-Θ反射法,連續掃描(1.0°/分鐘) 2Θ測定角度:5〜80° 取樣間隔:0.02° 狹縫 DS、SS : 2/3。、RS : 0.6 mm 141326.doc •98- 201012882Output power: 50 kV-120 mA 2Θ-Θ reflection method, continuous scanning (1.0°/min) 2Θ Measurement angle: 5~80° Sampling interval: 0.02° Slit DS, SS: 2/3. , RS: 0.6 mm 141326.doc •98- 201012882

6 <【6<】 141326.doc 實施例 32 實施例6 〇 ITO (20 nm) 〇 90% 0.4% [Χι 100/100 1- 1 100/100 〇 320 結晶 實施例 31 實施例6 U Oh Sn02 (20 nm) 〇 90% 0.4% 100/100 100/100 〇 1200 ON 非晶 實施例 30 實施例5 U ZTO 1 (120 nm) 〇 90% 0.4% (X) 100/100 100/100 〇 1750 ΓΟ rag Δϋ- 實施例 29 實施例2 Ο cu ZTO (20 nm) 〇 90% 0.4% Uh 100/100 100/100 〇 2200 非晶 實施例 28 | 實施例1 PET IZTO (120 nm) 〇 87% 2.0% X 100/100 1 100/100 〇 2630 0.88 非晶 實施例 27 實施例1 PET IZTO (20 nm) 〇 87% 1.8% ! loo/ioo 1 ;100/100 〇 2950 0.87 非晶 實施例 26 實施例1 Ok Oh IZO 1 (120 nm) 〇 91% 5.0% CQ m ! loo/ioo 1_ 100/100 〇 410 ON 非晶 實施例 25 實施例1 Ph Oh IZO 1 (20 nm) 〇 91% 5.0% PQ ro 100/100 100/100 〇 1 1 490 非晶 實施例 24 實施例1 u cu IZTO (120 nm) 1 〇 90% 0.4% E-Lh 100/100 1 100/100 〇 2750 0.98 非晶 實施例 _23__| 實施例1 U cu IZTO (20 nm) 〇 90% 0.4% I-Ih 100/100 100/100 〇 3200 0.91 非晶 實施例 2, 實施例1 U cu IZO (120 nm) 〇 90% 0.4% |Xt 100/100 100/100 〇 400 寸 非晶 實施例 21 實施例1 U Pk IZO (20 nm) 〇 90% 0.4% 100/100 1 100/100 〇 480 «r; 非晶 評價項目 _1 硬化膜(塗布液) 樹脂基材 透明導電膜 膜外觀 總透光率 镞 表面硬度 耐擦傷性 密著性 耐濕性 耐撓曲性 比電阻(μΩοιτι) 載子濃度 (Xl020/cm3) 透明導電膜之 結晶性 -99- 201012882 141326.doc 比較例26 U CU ITO (20 nm) Ο 88% 0.4% 1 >6Β m 100/100 100/100 X g yn 00 cn 結晶 比較例25 U PU Sn02 1 (20 nm) 〇 88% 0.4% >6Β ΓΛ ί 100/100 丽100 ο 1695 rn 非晶 比較例24 U Pm ZTO (120 nm) ο 88% -1 0.4% >6Β cn 1 100/100 100/100 ο 2520 as o 非晶 比較例23 U PU ZTO (20 nm) j ο 88% 0.4% >6Β ΓΛ [ ! 100/100 ί 00/100 〇 3251 0.86 非晶 比較例22 PET IZTO (120 nm), ο 87% -1 2.5% CQ X C^) Γ 1 100/100 10/100 ο 3793 0.65 非晶 比較例21 PET IZTO (20 nm) i ο 87〇/« 2.4% CQ X m I 1 100/100 100/100 0 4329 0.61 非晶 比較例20 IZTO (120 nm) X 1 90% 10.0% >6Β m Γ ;50/100 0/100 X 1 1 非晶 比較例19 & IZO (120 nm) X 90% 10.0% >6Β 1 ι 50/100 0/100 X 1 1 非晶 比較例18 IZTO (120 nm) ! ο 88% 0.4% >6Β m 1 100/100 100/100 ο 3745 0.75 非晶 比較例17 IZTO (20 nm) 〇 88% 1 0.4% 1 1 >6Β cn 100/100 100/100 ο 4542 0.67 非晶 比較例16 IZO (120 nm) j 〇 88% 0.4% >6Β m 1- 100/100 1 100/100 0 00 非晶 比較例 15 IZO Ω.0 nm) ο 1 88% J 0.4% >6Β cn 1- 1 100/100 100/100 〇 〇\ <N 非晶 評價項目 樹脂基材 透明導電膜 ! 膜外觀 總透光率 铢 表面硬度 耐擦傷性 密著性 财濕性 耐撓曲性 比電阻(μΩαη) 載子濃度 (xl020/cm3) 透明導電膜之結 晶性 -]〇0- 201012882 由表9、10可知,包含基材、硬化膜及透明導電膜之樹 脂積層體(實施例21〜3 2)均於大致所有評價項目中為人 格。 於未夹持硬化膜之比較例15〜26中,基材中使用聚碳酸 醋之比較例15〜18及23〜26的膜外觀、密著性、耐撓曲性良 好,但透明性、表面硬度、耐擦傷性、導電性與實施例 . 21〜24及29〜32相比較差。又,基材中使用聚丙烯之實施例 19、20與實施例25、26相比,膜外觀、表面硬度、耐擦傷 性、密著性、耐撓曲性較差。基材中使用聚對苯二甲酸乙 二酯之比較例21、22的膜外觀、光學特性、密著性、耐撓 曲性良好,但表面硬度、耐擦傷性、導電性與實施例、 28相比較差。 [實施例33〜35、比較例27〜29] 實施例33 (樹脂積層體之製作) 譬 利用棒式塗布機,將實施例1中所獲得之塗布液以硬化 膜達到2〜5 μπι之方式塗布於厚度為3 mm之聚碳酸酯成形 體之表面,以丨3(TC、2小時之條件使其熱硬化,藉此製作 包含基材及硬化膜之積層體。 繼而,於所製作之包含基材及硬化膜之積層體的硬化膜 上,以加熱處理後之厚度達到約0·5 μιη之方式塗布石原產 業股份有限公司製造之光觸媒面塗劑「ST_K211」後,於 1 〇〇 C下進行30分鐘加熱處理,而製作光觸媒層。 將對所獲得之包含基材、硬化膜及光觸媒層之樹脂積層 141326.doc -101 - 201012882 體進行評價之結果示於表η β 實施例34 ^除使用實施例8中所獲得之塗布液來代替實施例i中所獲 得之塗布液以外’以與實施例33同樣之方式製作包含基 材、硬化膜及光觸媒層之樹脂積層體。將對其評價之結果 示於表11。 實施例35 除使用實施例9中所獲得之塗布液來代替實施例】中所獲 得之塗布液以外,以與實施例33同#之方式製作包含基 材、硬化膜及光觸媒層之樹脂積層體。將對其評價之結果 示於表11。 ' ° 比較例27 除不使用實施例1中所獲得之塗布液以外’以與實施例 33同樣之方式製作包含基材、硬化模及光觸媒層之樹脂積 層體。將對其評價之結果示於表^。 比較例28 除使用石原產業(股)製造之底塗劑「ST_K3〇〇」來代替 實施例i中所獲得之塗布液,且將其以乾燥後之厚度達到 約0.3 μπι之方式塗布以外,以與實施例33同樣之方式製作 包含基材、硬化膜及光觸媒層之樹脂積層體。將對其評價 之結果不於表11。 比較例29 除了於比較例28之底塗劑上,進而以乾燥加熱後之厚度 達到約3 μπι之方式塗布石原產業(股)製造之底塗劑「 141326.doc -102- 201012882 K102a」與「ST_K1〇2b」之等量混合液(STKl〇2),於室溫 下乾燥5分鐘後,於l〇(TC下加熱30分鐘以外,以與實施例 33同樣之方式製作包含基材、硬化膜及光觸媒層之樹脂積 層體。將對其評價之結果示於表11。 實施例33〜35、比較例27〜29之各例中之諸特性係依照下 述要領而求得。 1 ·樹脂積層體之評價 (1) 光觸媒功能 作為光觸媒功能是否表現之指標,可列舉親水性之程度 (一般若具有與水之接觸角為40。以下之親水性,則稱為具 有防污性)。作為光觸媒功能表現出何種程度之指標,係 利用以下方法測定接觸角。 以藍黑燈管(black light blue lamp)向光觸媒層側照射J mW/cm2之紫外線,測定接觸角之經時變化。接觸角係利 用微注射器將離子交換水20 ml滴加至光觸媒層面上,利 用影像處理接觸角計(協和界面科學(股)製造,匸八_八)對水 滴進行測定。 (2) 總透光率及霧度 利用直讀霧度計(Suga試驗機股份有限公司製造,Η〇Μ_ 2DP)測定積層體之總透光率及霧度。 (3) 黃變度(YI) 使用SZ-_cal SENS0R(日本電色工業(股)製造),依照 JIS K7105來測定。 (4) 耐磨耗性 141326.doc -103- 201012882 «用磨耗輪cs_1()F&TABEI^s試驗機(旋轉磨耗試驗 機)(東洋精機股份有限公司製造,型號:ts),於荷重4 9 下進行50〇轉7^3£尺磨耗試驗,將taber磨耗試驗前之 f度與TABER磨耗試驗後之霧度之差(ΔΗ)未達15者記為 °」’將霧度之差為15以上者記為「&。 (5 )耐擦傷性 使用鋼絲絨#〇〇〇〇(荷重為4·9 Ν),在樹脂積層體之光觸 =層之表面上以2000 mm/sec往復50次後藉由目視來評 價光觸媒層表面之受損情況。將完全未受損者記為「i」, 將稍許受損者記為「2」’將經摩擦之部位的一半以上之面 受損者記為「3」。 (6) 密著性 依照JIS K 5400,利用剃刀之刀刃將樹脂積層體之光觸 媒層表面以2 m m間隔切入縱橫各丨丨條之切縫而形成丨〇 〇個 網格,用指腹使市售之玻璃紙膠帶(「CT_24(寬度為24 mm)」,Nichiban股份有限公司製造)與光觸媒表面充分密 著後’以90。之角度向近前方向迅速剝離,將光觸媒層未 剝離而殘存之網格數(X)以X/100表示’以對光觸媒層之密 著性進行評價。 (7) 耐候性 實施氙弧燈耐候試驗(Atlas公司之Ci65,輪出功率為6 5 kw,黑面板溫度為63°C,濕度為50%),以上述霧度、黃 變度、密著性之參數變化程度來評價耐候性。 141326.doc -104- 2010128826 <[6<] 141326.doc Example 32 Example 6 〇ITO (20 nm) 〇90% 0.4% [Χι 100/100 1- 1 100/100 〇320 Crystallization Example 31 Example 6 U Oh Sn02 (20 nm) 〇90% 0.4% 100/100 100/100 〇1200 ON Amorphous Example 30 Example 5 U ZTO 1 (120 nm) 〇90% 0.4% (X) 100/100 100/100 〇1750 ΓΟ Rg Δϋ - Example 29 Example 2 cu cu ZTO (20 nm) 〇90% 0.4% Uh 100/100 100/100 〇2200 Amorphous Example 28 | Example 1 PET IZTO (120 nm) 〇87% 2.0% X 100/100 1 100/100 〇2630 0.88 Amorphous Example 27 Example 1 PET IZTO (20 nm) 〇87% 1.8% ! loo/ioo 1 ;100/100 〇2950 0.87 Amorphous Example 26 Example 1 Ok Oh IZO 1 (120 nm) 〇91% 5.0% CQ m ! loo/ioo 1_ 100/100 〇410 ON Amorphous Example 25 Example 1 Ph Oh IZO 1 (20 nm) 〇91% 5.0% PQ ro 100 /100 100/100 〇1 1 490 Amorphous Example 24 Example 1 u cu IZTO (120 nm) 1 〇90% 0.4% E-Lh 100/100 1 100/100 〇2750 0.98 Amorphous Example _23__| Example 1 U cu IZTO (20 nm) 〇90% 0.4% I-Ih 100/100 100/ 100 〇 3200 0.91 Amorphous Example 2, Example 1 U cu IZO (120 nm) 〇 90% 0.4% | Xt 100/100 100/100 〇 400 inch amorphous Example 21 Example 1 U Pk IZO (20 nm 〇90% 0.4% 100/100 1 100/100 〇480 «r; Amorphous evaluation item _1 Curing film (coating liquid) Resin substrate Transparent conductive film Appearance Total light transmittance 镞 Surface hardness Scratch resistance Moisture resistance, flexural resistance, specific resistance (μΩοιτι), carrier concentration (Xl020/cm3), crystallinity of transparent conductive film-99-201012882 141326.doc Comparative Example 26 U CU ITO (20 nm) Ο 88% 0.4% 1 >6Β m 100/100 100/100 X g yn 00 cn Crystallization Comparative Example 25 U PU Sn02 1 (20 nm) 〇88% 0.4% >6Β ΓΛ ί 100/100 丽100 ο 1695 rn Amorphous Comparative Example 24 U Pm ZTO (120 nm) ο 88% -1 0.4% >6Β cn 1 100/100 100/100 ο 2520 as o Amorphous Comparative Example 23 U PU ZTO (20 nm) j ο 88% 0.4% >6Β ΓΛ [ ! 100/100 ί 00/100 〇3251 0.86 Amorphous Comparative Example 22 PET IZTO (120 nm), ο 87% -1 2.5% CQ XC^) Γ 1 100/100 10/100 ο 3793 0.65 Amorphous comparison Example 21 PET IZTO (20 nm) i ο 87〇/« 2.4% CQ X m I 1 100/100 100/100 0 4329 0.61 Amorphous Comparative Example 20 IZTO (120 nm) X 1 90% 10.0% > 6Β m Γ ; 50/100 0/100 X 1 1 Amorphous Comparative Example 19 & IZO (120 nm) X 90% 10.0% >6Β 1 ι 50/100 0/100 X 1 1 Amorphous Comparative Example 18 IZTO (120 nm) ! ο 88% 0.4% >6Β m 1 100/100 100/100 ο 3745 0.75 Amorphous Comparative Example 17 IZTO (20 nm) 〇88% 1 0.4% 1 1 >6Β cn 100/100 100/100 ο 4542 0.67 Amorphous Comparative Example 16 IZO (120 nm) j 〇88 % 0.4% >6Β m 1- 100/100 1 100/100 0 00 Amorphous Comparative Example 15 IZO Ω.0 nm) ο 1 88% J 0.4% >6Β cn 1- 1 100/100 100/100 〇 〇\ <N Amorphous Evaluation Project Resin Substrate Transparent Conductive Film! Film Appearance Total Transmittance 铢 Surface Hardness Scratch Resistance Adhesion Humidity Flexibility Specific Resistance (μΩαη) Carrier Concentration (xl020/cm3 Crystallinity of Transparent Conductive Film - 〇 0 - 201012882 It can be seen from Tables 9 and 10 that the resin laminate including the substrate, the cured film, and the transparent conductive film (Examples 21 to 32) is used in substantially all evaluation items. Personality. In Comparative Examples 15 to 26 in which the cured film was not sandwiched, the film appearance, adhesion, and flexural resistance of Comparative Examples 15 to 18 and 23 to 26 using polycarbonate in the substrate were good, but transparency and surface were obtained. Hardness, scratch resistance, and electrical conductivity are inferior to those of Examples. 21 to 24 and 29 to 32. Further, in Examples 19 and 20 in which polypropylene was used as the substrate, the film appearance, surface hardness, scratch resistance, adhesion, and flex resistance were inferior to those of Examples 25 and 26. In Comparative Examples 21 and 22 in which polyethylene terephthalate was used as the substrate, the film appearance, optical properties, adhesion, and flex resistance were good, but surface hardness, scratch resistance, conductivity, and examples, 28 Relatively poor. [Examples 33 to 35, Comparative Examples 27 to 29] Example 33 (Production of Resin Laminate) 譬 The coating liquid obtained in Example 1 was cured to a thickness of 2 to 5 μm by a bar coater. It was applied to the surface of a polycarbonate molded body having a thickness of 3 mm, and was thermally cured by 丨3 (TC, 2 hours) to prepare a laminate including a substrate and a cured film. On the cured film of the laminate of the substrate and the cured film, the photocatalytic topcoat "ST_K211" manufactured by Ishihara Sangyo Co., Ltd. was applied to the cured film after the heat treatment to a thickness of about 0.5 μm. The photocatalyst layer was formed by heat treatment for 30 minutes. The results of evaluation of the obtained resin laminate 141326.doc -101 - 201012882 including the substrate, the cured film and the photocatalyst layer are shown in Table η β Example 34 A resin laminate including a substrate, a cured film, and a photocatalyst layer was produced in the same manner as in Example 33 except that the coating liquid obtained in Example 8 was used instead of the coating liquid obtained in Example i. It The results are shown in Table 11. Example 35 A substrate, a cured film, and the like were prepared in the same manner as in Example 33 except that the coating liquid obtained in Example 9 was used instead of the coating liquid obtained in the Example. The resin laminate of the photocatalyst layer was evaluated in Table 11. '° Comparative Example 27 A substrate was prepared in the same manner as in Example 33 except that the coating liquid obtained in Example 1 was not used. The resin laminate of the hardened mold and the photocatalyst layer, and the results of the evaluation thereof are shown in Table 2. Comparative Example 28 The primer "ST_K3〇〇" manufactured by Ishihara Sangyo Co., Ltd. was used instead of the one obtained in Example i. A resin layered product including a substrate, a cured film, and a photocatalyst layer was produced in the same manner as in Example 33 except that the coating liquid was applied so as to have a thickness of about 0.3 μm after drying. In Table 11, Comparative Example 29 was applied to the primer of Comparative Example 28, and further coated with a primer of "Ishihara Industry Co., Ltd." by a thickness of about 3 μm after drying and heating "141326.doc -102- 201012882The same amount of the mixed liquid (STK1〇2) of K102a" and "ST_K1〇2b" was dried at room temperature for 5 minutes, and then the base was prepared in the same manner as in Example 33 except that the temperature was heated for 30 minutes at TC. The resin laminate of the material, the cured film, and the photocatalyst layer was shown in Table 11. The characteristics of each of Examples 33 to 35 and Comparative Examples 27 to 29 were determined in accordance with the following procedures. (1) Evaluation of Resin Laminate (1) Photocatalyst function As an indicator of whether or not the photocatalyst function is expressed, the degree of hydrophilicity (generally, the contact angle with water is 40). The following hydrophilicity is referred to as having antifouling properties. As a measure of the extent to which the photocatalyst function is exhibited, the contact angle is measured by the following method. Ultraviolet rays of J mW/cm 2 were irradiated to the side of the photocatalyst layer by a black light blue lamp, and the change in the contact angle with time was measured. At the contact angle, 20 ml of ion-exchanged water was dropped onto the photocatalyst layer using a micro-syringe, and the water droplets were measured using an image processing contact angle meter (Concord Interface Science Co., Ltd., 匸8-8). (2) Total light transmittance and haze The total light transmittance and haze of the laminate were measured by a direct reading haze meter (manufactured by Suga Test Machine Co., Ltd., Η〇Μ 2 DP). (3) Yellowness (YI) Measured in accordance with JIS K7105 using SZ-_cal SENS0R (manufactured by Nippon Denshoku Industries Co., Ltd.). (4) Abrasion resistance 141326.doc -103- 201012882 «Using wear wheel cs_1()F&TABEI^s testing machine (rotary wear testing machine) (manufactured by Toyo Seiki Co., Ltd., model: ts), under load 4 9 Under the 50 〇 7 7 3 ft. abrasion test, the difference between the f-degree before the taber abrasion test and the haze after the TABER abrasion test (ΔΗ) is less than 15 as the difference between the haze Those who are 15 or more are referred to as "&. (5) The abrasion resistance is achieved by using steel wool #〇〇〇〇 (load is 4·9 Ν), and reciprocating at 2000 mm/sec on the surface of the photo-contact layer of the resin laminated body. After 50 times, the damage of the surface of the photocatalyst layer was evaluated by visual observation. Those who were completely unimpaired were recorded as "i", and those who were slightly damaged were recorded as "2", and more than half of the rubbed parts were subjected to The loss is recorded as "3". (6) Adhesiveness According to JIS K 5400, the surface of the photocatalyst layer of the resin laminate is cut into the slits of the vertical and horizontal girders at intervals of 2 mm using a razor blade to form a grid. The cellophane tape sold ("CT_24 (width: 24 mm)", manufactured by Nichiban Co., Ltd.) was sufficiently sealed with the surface of the photocatalyst to be '90. The angle was quickly peeled off in the near direction, and the number (X) of the grid in which the photocatalyst layer was not peeled off was expressed by X/100' to evaluate the adhesion of the photocatalyst layer. (7) Weather resistance performance of Xenon arc lamp weathering test (Ci65 of Atlas, the wheel power is 6 5 kw, the black panel temperature is 63 ° C, the humidity is 50%), with the above haze, yellowing, and adhesion The degree of change in the parameter of the sex is used to evaluate the weather resistance. 141326.doc -104- 201012882

【II<】 比較例29 ST-K102 ST-K300 89% X m 0 jn ON 1.2% ι- 14.5% 1.1% 14.0% 100/100 10/100 比較例28 ST-K300 90% X ο JO Ο Ο 1.0% 15.0% 1_______ 1 , 1.1% 1- 15.2% 100/100 0/100 比較例27 1 90% X cn ο 0 Ο 0.9% ( 1 1.2% 0/100 1 實施例35 實施例9 i 90% 〇 ο 00 0.9% 丨 2.6% j 1.1% 2.8% 100/100 100/100 實施例34 1 實施例8 1 1 90% ί 〇 ο 0.9% 3.4% 1.1% 3.0% 100/100 100/100 實施例33 1 實施例1 90% 〇 ο ΟΝ 0.9% 3.3% 1.1% 3.0% 100/100 100/100 評價項目 1 塗布液 1 _i 總透光率 而十磨耗性 耐擦傷性 初期 光照射(5曰) 初期 耐候性(1000小時) 初期 1_ 耐候性(1000小時) 初期 耐候性(1000小時) 接觸角 霧度 黃變度(YI) 密著性 141326.doc -105- 201012882 實施例33〜35中任一者之評價與比較例27〜29相比,均為 耐磨耗性、耐擦傷性及耐候性良好。 實施例36〜43、比較例3〇〜33 (樹脂積層體之成形體) 實施例36 將實施例1之塗布液以膜厚達到2〜3 μιη之方式塗布於厚 度為0.5 mm之聚碳酸酯(PC)片[三菱瓦斯股份有限公司製 造,商品名:Iupilon Sheet]上,於2(rc下使其乾燥24〇分 鐘作為預硬化,製作成形用聚碳酸酯片。將所製作之成形 用片進行真空成形,其後將其設置於射出成形模具中,以 樹脂溫度為27〇£>C、樹脂壓力為50 MPa之條件將包含聚碳 酸酯之射出成形樹脂[出光興產股份有限公司製造,商品 名Tarflon]射出至未形成預硬化膜之面上,藉此製造樹 月曰積層體之成形體。進而,使成形體於12〇c>c下進行丨分鐘 後硬化。對於該樹脂積層體之成形體,將下述項目(丨)〜(3) 之評價結果示於表12。 (1) 膜外觀 目視觀察成形體之硬化膜面的外觀,對異物及斑點圖 案裂痕加以確§忍,將未確認到該等者記為「〇」,將確認 到該等者記為「X」。 (2) 耐擦傷性 使用鋼絲絨#〇〇〇〇(荷重為49 N)往復1〇次後藉由目視 ,評價表面之受損情況。將完全未受損者記為Γ1」,將稱 又抽者。己為「2」’將經摩擦之部位的-半以上之面受損 141326.doc 201012882 者記為「3」。 (3)密著性 依照JIS K 5400,利用剃刀之刃將成形體之硬化膜面以2 mm間隔切入縱橫各11條之切縫而形成1 〇〇個網格’用指腹 使市售之玻璃紙膠帶(「CT-24(寬度為24 mm)」,Nichiban 股份有限公司製造)與成形體之硬化膜面充分密著後,以 90°之角度向近前方向迅速剝離,硬化膜未自基材上剝離 而殘存之網格數(X)以X/100表示,以對硬化膜之密著性進 行評價。 實施例37~39 以與實施例36同樣之方法製造成形體。成形用聚碳酸酯 片係依照表6中所示之預硬化温度、預硬化時間、後硬化 溫度及後硬化時間而製作。將評價結果示於表丨2。 實施例40 將實施例1之塗布液以膜厚達到2〜3 μηι之方式塗·布於厚 度為0.3 mm之聚丙烯(ρρ)片[曰本聚丙烯(Japan Polypropylene)股份有限公司製造,商品名:wintec]上, 於20 C下使其乾燥240分鐘作為預硬化’製作成形用聚丙 稀片。將所製作之成形用片進行真空成形,其後設置於射 出成形模具中’以樹脂溫度為270。〇、樹脂壓力為40 MPa 之條件將包含聚丙烯之射出成形樹脂[Priine p〇iymer股份 有限公司製造’商品名:Prime Polypro]射出至未形成預 硬化膜之面上’藉此製造樹脂積層體之成形體。進而,使 成形體於120°C下進行30秒後硬化。將評價結果示於表 141326.doc -107- 201012882 * 12 〇 實施例41〜43 以與實施例4〇同樣之方法製造成形體。成形用聚丙烯片 係依照表12中所示之預硬化溫度、預硬化時間、後硬化溫 度及後硬化化時間而製作《將評價結果示於表12。 比較例3 0〜3 3 使用比較例1之塗布液,以與實施例36、實施例π、實 施例40、實施例43同樣之方法來製造成形體。將評價結果 示於表12。 141326.doc -108- 201012882[II<] Comparative Example 29 ST-K102 ST-K300 89% X m 0 jn ON 1.2% ι- 14.5% 1.1% 14.0% 100/100 10/100 Comparative Example 28 ST-K300 90% X ο JO Ο Ο 1.0 % 15.0% 1_______ 1 , 1.1% 1- 15.2% 100/100 0/100 Comparative Example 27 1 90% X cn ο 0 Ο 0.9% ( 1 1.2% 0/100 1 Example 35 Example 9 i 90% 〇ο 00 0.9% 丨 2.6% j 1.1% 2.8% 100/100 100/100 Example 34 1 Example 8 1 1 90% ί 〇 ο 0.9% 3.4% 1.1% 3.0% 100/100 100/100 Example 33 1 Implementation Example 1 90% 〇ο ΟΝ 0.9% 3.3% 1.1% 3.0% 100/100 100/100 Evaluation item 1 Coating liquid 1 _i Total light transmittance and ten abrasion resistance Scratch resistance Initial light irradiation (5 曰) Initial weather resistance ( 1000 hours) Initial 1_ Weather resistance (1000 hours) Initial weather resistance (1000 hours) Contact angle haze yellowness (YI) Adhesion 141326.doc -105- 201012882 Evaluation of any of Examples 33 to 35 Comparative Examples 27 to 29 were all excellent in abrasion resistance, scratch resistance, and weather resistance. Examples 36 to 43 and Comparative Examples 3 to 33 (molded bodies of resin laminate) Example 36 Example 1 The coating liquid has a film thickness of 2 to 3 The method of μιη was applied to a polycarbonate (PC) sheet having a thickness of 0.5 mm [manufactured by Mitsubishi Gas Co., Ltd., trade name: Iupilon Sheet], and dried at 2 (rc for 24 minutes) as a pre-hardening. A polycarbonate sheet was used, and the formed sheet for forming was vacuum-formed, and then placed in an injection molding die to contain polycarbonate at a resin temperature of 27 Å > C and a resin pressure of 50 MPa. The injection molding resin of the ester [manufactured by Idemitsu Kosan Co., Ltd., trade name: Tarflon] was injected onto the surface on which the pre-cured film was not formed, thereby producing a molded body of the eucalyptus layer. Further, the molded body was made at 12 °c> In the case of the molded article of the resin laminate, the evaluation results of the following items (丨) to (3) are shown in Table 12. (1) Film appearance The cured film surface of the molded body was visually observed. The appearance of the foreign object and the speckle pattern crack is confirmed, and those who have not confirmed such a mark are marked as "〇", and it is confirmed that the person is marked as "X". (2) Scratch resistance The surface damage was evaluated by visual inspection using steel wool #〇〇〇〇 (load: 49 N) after 1 reciprocation. If the person who is completely undamaged is recorded as Γ1", it will be called the sputum. It is "2", and the part that is rubbed is damaged by more than half of the surface. 141326.doc 201012882 is marked as "3". (3) Adhesiveness According to JIS K 5400, the cured film surface of the molded body is cut into the slits of 11 vertical and horizontal sides at intervals of 2 mm by a razor blade to form a grid of one of the commercially available ones. The cellophane tape ("CT-24 (width: 24 mm)", manufactured by Nichiban Co., Ltd.) is sufficiently adhered to the cured film surface of the molded body, and is quickly peeled off at an angle of 90°. The cured film is not self-substrate. The number of meshes (X) remaining on the peeling and peeling was represented by X/100, and the adhesion of the cured film was evaluated. Examples 37 to 39 A molded article was produced in the same manner as in Example 36. The polycarbonate sheet for molding was produced in accordance with the pre-hardening temperature, the pre-hardening time, the post-hardening temperature, and the post-hardening time shown in Table 6. The evaluation results are shown in Table 2. Example 40 The coating liquid of Example 1 was applied to a polypropylene (ρρ) sheet having a thickness of 0.3 mm as a film thickness of 2 to 3 μm [manufactured by Japan Polypropylene Co., Ltd., Name: wintec], it was dried at 20 C for 240 minutes as a pre-hardened 'preformed polypropylene sheet. The formed sheet for forming was vacuum-formed, and then placed in an injection molding die to have a resin temperature of 270. 〇, the resin pressure is 40 MPa, and the injection molding resin containing polypropylene [manufactured by Priline p〇iymer Co., Ltd., trade name: Prime Polypro] is ejected onto the surface on which the pre-cured film is not formed. The formed body. Further, the molded body was cured at 120 ° C for 30 seconds. The evaluation results are shown in Table 141326.doc -107-201012882 * 12 实施 Examples 41 to 43 A molded article was produced in the same manner as in Example 4A. The polypropylene sheet for molding was prepared in accordance with the pre-hardening temperature, the pre-hardening time, the post-hardening temperature, and the post-hardening time shown in Table 12, and the evaluation results are shown in Table 12. Comparative Example 3 0 to 3 3 Using the coating liquid of Comparative Example 1, a molded article was produced in the same manner as in Example 36, Example π, Example 40, and Example 43. The evaluation results are shown in Table 12. 141326.doc -108- 201012882

CNI <【21<】 比較例33 比較例1 0- 〇 d 1 1 〇 cn 比較例32 比較例1 240 § 〇 〇 1 1 100/100 比較例31 比較例1 〇 ο 1 1 〇 ί 100/100 比較例30 比較例1 240 1—^ 〇 m 1- 100/100 實施例43 實施例1 CU 〇 *Τ) ο 1 1 〇 1 100/100 實施例42 實施例1 CL, g 一 § 〇 〇 100/100 實施例41 實施例1 s § 〇 〇 ♦—H 100/100 實施例40 實施例1 & 240 ν〇 d 〇 [ 100/100 實施例39 實施例1 ο to d 1 1 〇 100/100 實施例38 實施例1 U § — Τ—Η 〇 T·"^ j :100/100 實施例37 實施例1 U § f—Η 〇 1 ,100/100 實施例36 實施例1 U 240 一 〇 1 ;100/100 評價項目丨 硬化膜(塗布液) 樹脂基材 預硬化溫度(°c) 預硬化時間(min) 後硬化溫度(°C) 後硬化時間(min) 膜外觀 耐擦傷性 密著性 141326.doc •109- 201012882 由表U可知,實施例36〜43係使用實施例i之塗布液的樹 月旨積層體之成形體,均於大致所有評價項目中為合格。 比較例30〜33係使用比較例丨之塗布液的樹脂積層體之成 形體’膜外觀、密著性良好’但耐擦傷性與實施例㈣ 者相比較差。 產業上之可利用性 _ 藉由使用本發明之塗布液,除了儀錶蓋等汽車内部零 · 件、二輪車及三輪車之擋風玻璃、樹脂製車窗(各種車 窗)、樹脂製建築材料窗、建築設備用頂、道路透光板(遮 磡 音板)、矯正用以外,可展開至太陽眼鏡、運動用眼鏡、 安全眼鏡等眼鏡透鏡,電漿或液晶、有機EL·等之顯示器, 光碟行動電話零件、觸摸面板、太陽電池等之電子設備 零件等,路燈等照明零件、防風板、防護盾用之各種樹脂 製材料’尤其是聚碳酸酯製材料;可適宜用作玻璃替代構 件。 141326.doc -110-CNI <[21<] Comparative Example 33 Comparative Example 1 0- 〇d 1 1 〇cn Comparative Example 32 Comparative Example 1 240 § 〇〇1 1 100/100 Comparative Example 31 Comparative Example 1 〇ο 1 1 〇ί 100/ 100 Comparative Example 30 Comparative Example 1 240 1 -^ 〇m 1- 100/100 Example 43 Example 1 CU 〇*Τ) ο 1 1 〇1 100/100 Example 42 Example 1 CL, g a § 〇〇 100/100 Example 41 Example 1 s § 〇〇 ♦ H 100/100 Example 40 Example 1 & 240 ν〇d 〇 [100/100 Example 39 Example 1 ο to d 1 1 〇100/ 100 Example 38 Example 1 U § - Τ - Η · T · " ^ j : 100 / 100 Example 37 Example 1 U § f - Η 〇 1, 100 / 100 Example 36 Example 1 U 240 〇1 ;100/100 Evaluation item 丨 Hardening film (coating liquid) Resin substrate pre-hardening temperature (°c) Pre-hardening time (min) Post-hardening temperature (°C) Post-hardening time (min) Film appearance scratch-resistant 141 326.doc • 109- 201012882 It can be seen from Table U that Examples 36 to 43 are formed of the sapphire laminate using the coating liquid of Example i, and all of them are evaluated. Qualified in the project. In Comparative Examples 30 to 33, the molded article of the resin laminate using the coating liquid of Comparative Example was excellent in film appearance and adhesion, but the scratch resistance was inferior to those in Example (4). Industrial Applicability _ By using the coating liquid of the present invention, in addition to automobile interior parts such as instrument covers, windshields for two-wheeled vehicles and tricycles, resin-made windows (various windows), and resin building materials windows, For construction equipment, top, road light-transmissive panels (concealed soundboard), and other corrections, it can be deployed to sunglasses, sports glasses, safety glasses, and other spectacle lenses, plasma or liquid crystal, organic EL, etc. Electronic parts such as telephone parts, touch panels, and solar cells, various resin materials for lighting parts such as street lamps, windshields, and shields, especially polycarbonate materials; can be suitably used as glass substitute members. 141326.doc -110-

Claims (1)

201012882 七、申請專利範圍: 1. 一種塗布液’其特徵在於包含下述(A)~(E)成分: (A) 下述(A-1)〜(A-5)成分之具有烷氧基之矽烷化合物的 水解縮合物, (A-1)四烧氧基梦烧化合物, (A-2)不含胺基、環氧基及異氰酸酯基之有機烷氧基矽 烧化合物, (A-3)具有胺基及烷氧基之矽烷化合物, (A-4)具有環氧基及烷氧基之矽烷化合物, (A-5)具有烷氧基之封端化異氟酸基矽烷化合物; (B) 由包含具有紫外線吸收基之單體單元之共聚物構成的 有機高分子微粒; (C) 膠體二氧化矽; (D) 硬化觸媒; (E) 分散介質。 2. 如請求項1之塗布液’其更包含(F)經矽烷化合物處理之 氧化鈽、及(G)分散穩定劑。 3’如明求項1或2之塗布液,其中(A-1)成分為以下述通式 (1)所表示之四烷氧基矽烷化合物: si(〇R,)4 ......⑴ 「式中,D _ 表示碳數為1〜4之烷基或具有醚鍵之烷基;複 數個Rl可相同亦可不同]。 4.如凊求項1或2之塗布液,其中(A-2)成分為以下述通式 ()所表示之不含胺基、環氧基及異氰酸酯基之有機烷氧 141326.doc 201012882 基矽烷化合物: R2aSi(OR3)4.a.,··.·(2) [式中,R2表示碳數為i〜10之烷基或氟烷基;乙烯基;笨 基;或者經甲基丙烯醯氧基取代之礙數為1~3之烷基’ R表示碳數為1〜4之烷基或具有醚鍵之烷基,a表示1或 2 ;於R2為複數個之情形時,複數個R2可相同亦可不 同,複數個OR3可相同亦可不同]。 5. 如請求項1或2之塗布液,其中(a-3)成分為以下述通式 (3) 所表示之具有胺基及烷氧基之矽烷化合物: R4bSi(〇R5)4.b(3) [式中’ R4表示碳數為1〜4之烷基;乙烯基;苯基;或者 經選自曱基丙烯醯氧基、胺基(_NH2基)、胺基烷基 KCH2)x_Nh2基(其中,X為卜3之整數)]、烷基胺基[-NHR 基(其中’ R為碳數1〜3之烷基)]中的i種以上之基所取代 之碳數為1〜3之烷基,R4之至少i個表示經胺基、或胺基 炫1基或燒基胺基中之任一者所取代之碳數為丨〜3之烧 基’ R表示碳數為1〜4之烧基’ b表示1或2;於R4為複數 個之情形時,複數個R4可相同亦可不同,複數個〇R5可 相同亦可不同]。 6. 如請求項1或2之塗布液’其中(A_4)成分為以下述通式 (4) 所表示之具有環氧基及烷氧基之矽烷化合物: R6cSi(〇R7)4.c……⑷ [式中,R6表示碳數為1〜4之烧基;乙稀基;苯基;或者 經選自甲基丙烯醯氧基、環氧丙氧基、3,4•環氧基環己 141326.doc 201012882 基中的1種以上之基所取代之碳數為U之烷基,R6之至 少1個表示經環氧丙氧基或3,4-環氧基環己基所取代之碳 數為1〜3之烧基;R7表示碳數為1〜4之烧基,C表示1或 2;於R6為複數個之情形時,複數個R6可相同亦可不 同’複數個OR7可相同亦可不同]。 如請求項1或2之塗布液,其中(A_5)成分為以下述通式 (5)所表示之具有烷氧基之封端化異氰酸基矽烷化合物: R8dSi(〇R9)4.d……(5) [式中’ R8表示碳數為1〜4之烷基;乙烯基;苯基;或者 經選自甲基丙烯醯氧基、封端化異氰酸酯基中的1種以 上之基所取代之碳數為1〜3之烷基,R8之至少1個表示經 封端化異氰酸酯基所取代之碳數為1〜3之烷基;R9表示 碳數為1〜4之烷基,d表示1或2;於R8為複數個情形時, 複數個R8可相同亦可不同,複數個〇R9可相同亦可不 同]。 8. 9. 10. 如請求項1至7中任一項之塗布液,其係在藉由使(A_1}成 刀、(A-2)成分及(A-4)成分的水解縮合物與(B)〜(E)成分 接觸而獲得之反應產物中加入(A_5)成分且使其反應,之 後加入(Α·3)成分並使其反應而成者。 如請求項1至7中任一項之塗布液,其係在藉由對包含(Α_ 1)成分、(Α-2)成分、(Α_4)成分及(Β)〜(Ε)成分之混合物 加熱而獲得之反應產物中加入(Α·5)成分且使其反應之 後加入(Α-3)成分並使其反應而成者。 一種硬化膜,其係使如請求項丨至9中任一項之塗布液硬 141326.doc 201012882 化而成者。 11. 一種樹脂積層體,其特徵在於具有:基材、及直接形成 於該基材上之如請求項10之硬化膜。 12. —種樹脂積層體,其特徵在於具有:基材、形成於該基 材上之如請求項10之硬化膜、及形成於上述硬化膜上之 無機層。 13. —種樹脂積層體,其特徵在於具有:基材、形成於該基 材上之如請求項10之硬化膜、及形成於上述硬化膜上之 透明導電膜》 14. 種樹爿曰積層體’其特徵在於具有:基材、形成於該基 材上之如請求項10之硬化膜、及形成於上述硬化膜上之 光觸媒層。 15. 如請求項13之樹脂積層體,其中上述硬化膜之厚度為 〇. 1 〜50 μιη。 16. 如請求項13之樹脂積層體,其中上述透明導電膜之載子 濃度為lxl〇18/cm3以上。 17. 如請求項13之樹脂積層體,其中上述基材為樹脂基材。 18. 如請求項u、12及17中任一項之樹脂積層體,其中上述 基材具有凹凸。 19. 如請求項n、12、17及18中任一項之樹脂積層體,其中 上述基材呈橢圓柱形。 20. 如請求項n、12、17及18中任一項之樹脂積層體,其中 上述基材呈圓柱形。 21. 如請求項u、12、17至20中任一項之樹脂積層體,其中 141326.doc 201012882 在上述基材之未形成硬化膜的面上具有樹脂層。 22. 如請求項丨丨、12、14、17至21中任一項之樹脂積層體, 其中上述硬化膜之厚度為〇.5〜6 pm。 23. 如請求項11、12、14、17至22中任一項之樹脂積層體, 其中基材為聚酯樹脂、聚碳酸酯樹脂或聚稀烴系樹脂。 24. —種硬化膜之製造方法,其特徵在於包括:將如請求項 1至9中任一項之塗布液加熱並使其硬化之步驟。201012882 VII. Patent Application Range: 1. A coating liquid characterized by comprising the following components (A) to (E): (A) alkoxy groups having the following components (A-1) to (A-5) a hydrolysis condensate of a decane compound, (A-1) a tetra-oxyalkyloxymethane compound, (A-2) an organoalkoxy sinter compound containing no amine group, epoxy group or isocyanate group, (A-3) a decane compound having an amine group and an alkoxy group, (A-4) a decane compound having an epoxy group and an alkoxy group, (A-5) a blocked isofluorinated decane compound having an alkoxy group; B) organic polymer microparticles composed of a copolymer comprising a monomer unit having an ultraviolet absorbing group; (C) colloidal cerium oxide; (D) a hardening catalyst; (E) a dispersion medium. 2. The coating liquid of claim 1 which further comprises (F) cerium oxide treated with a decane compound, and (G) a dispersion stabilizer. 3' The coating liquid according to Item 1 or 2, wherein the component (A-1) is a tetraalkoxydecane compound represented by the following formula (1): si(〇R,)4 ..... (1) "wherein, D _ represents an alkyl group having a carbon number of 1 to 4 or an alkyl group having an ether bond; and a plurality of R1 may be the same or different.] 4. A coating liquid according to item 1 or 2, wherein The component (A-2) is an organoalkoxy group having no amine group, epoxy group or isocyanate group represented by the following formula (): 141326.doc 201012882 decane compound: R2aSi(OR3)4.a.,·· (2) [wherein, R2 represents an alkyl group having a carbon number of i 10 or a fluoroalkyl group; a vinyl group; a stupid group; or an alkyl group substituted by a methacryloxy group having a hindrance of 1 to 3 'R represents an alkyl group having a carbon number of 1 to 4 or an alkyl group having an ether bond, and a represents 1 or 2; when R 2 is plural, plural R 2 's may be the same or different, and a plurality of OR 3 may be the same 5. The coating liquid according to claim 1 or 2, wherein the component (a-3) is a decane compound having an amine group and an alkoxy group represented by the following formula (3): R4bSi (〇R5) 4.b(3) [wherein R4 represents an alkyl group having a carbon number of 1 to 4; Alkenyl; phenyl; or selected from the group consisting of mercaptopropenyloxy, amine (_NH2), aminoalkyl KCH2)x_Nh2 (wherein X is an integer of 3), alkylamino [- The alkyl group having 1 or more carbon atoms substituted by i or more of the NHR group (wherein R is an alkyl group having 1 to 3 carbon atoms), and at least i of R4 represents an amine group or an amine group. The alkyl group substituted with any one of the succinyl group or the alkyl group is a decyl group of 丨~3, and R represents a group having a carbon number of 1 to 4, wherein b represents 1 or 2; and R4 is plural. In the case, a plurality of R4 may be the same or different, and a plurality of 〇R5 may be the same or different. 6. The coating liquid of claim 1 or 2 wherein the component (A_4) is represented by the following formula (4) a decane compound having an epoxy group and an alkoxy group: R6cSi(〇R7)4.c (4) wherein R6 represents a carbon group having a carbon number of 1 to 4; an ethyl group; a phenyl group; or a selected one. The alkyl group having a carbon number of U substituted by one or more groups of a methacryloxy group, a glycidoxy group, a 3,4 epoxy group 141326.doc 201012882 group, and at least 1 of R6 Means a glycidoxy or 3,4-epoxy ring The group has a carbon number of 1 to 3; R7 represents a carbon group having a carbon number of 1 to 4, and C represents 1 or 2; when R6 is plural, a plurality of R6 may be the same or different. The plurality of OR7 may be the same or different. The coating liquid of claim 1 or 2, wherein the component (A-5) is a blocked isocyanatodecane compound having an alkoxy group represented by the following formula (5) : R8dSi(〇R9)4.d (5) [wherein R8 represents an alkyl group having a carbon number of 1 to 4; a vinyl group; a phenyl group; or a terminal group selected from a methacryloxy group; One or more of the isocyanate groups are substituted with an alkyl group having 1 to 3 carbon atoms, and at least one of R8 represents an alkyl group having 1 to 3 carbon atoms substituted by a blocked isocyanate group; R9 represents carbon The number is 1 to 4, and d is 1 or 2. When R8 is plural, a plurality of R8s may be the same or different, and a plurality of 〇R9 may be the same or different. 8. The coating liquid according to any one of claims 1 to 7, which is characterized in that a hydrolysis condensate of (A_1}, a (A-2) component and (A-4) component is (B) The (A-5) component is added to the reaction product obtained by contacting the component (B) and reacted, and then the (Α·3) component is added and reacted. As in any of claims 1 to 7, The coating liquid is added to a reaction product obtained by heating a mixture containing (Α-1) component, (Α-2) component, (Α_4) component, and (Β)~(Ε) component (Α -5) A component obtained by reacting and reacting the component (Α-3) after the reaction. A cured film which is obtained by applying the coating liquid according to any one of claims 1 to 9 141326.doc 201012882 11. A resin laminate comprising: a substrate; and a cured film as claimed in claim 10 formed directly on the substrate. 12. A resin laminate comprising: a base a cured film according to claim 10 formed on the substrate, and an inorganic layer formed on the cured film. 13. A resin laminate, A substrate comprising: a substrate, a cured film of claim 10, and a transparent conductive film formed on the cured film. 14. A tree-layered layer body characterized by: a substrate The cured film of claim 10, and the photocatalyst layer formed on the cured film. The resin laminate according to claim 13, wherein the thickness of the cured film is 〇. 1 to 50 16. The resin laminate according to claim 13, wherein the transparent conductive film has a carrier concentration of 1 x 10 〇 18 / cm 3 or more. 17. The resin laminate according to claim 13, wherein the substrate is a resin substrate. The resin laminate according to any one of the preceding claims, wherein the substrate has a concavity and convexity. The resin laminate according to any one of claims n, 12, 17 and 18, wherein the base The resin laminate according to any one of claims n, 12, 17 and 18, wherein the substrate is cylindrical. 21. As claimed in any of claims u, 12, 17 to 20. Resin laminate, 141326.doc 201012882 in the above base The resin laminate according to any one of the preceding claims, wherein the thickness of the cured film is 〇5 to 6 pm. 23. The resin laminate according to any one of claims 11, 12, 14, 17 to 22, wherein the substrate is a polyester resin, a polycarbonate resin or a polyolefin resin. 24. Production of a cured film The method comprising the step of heating and hardening the coating liquid according to any one of claims 1 to 9. 25. —種樹脂積層體之製造方法,其特徵在於包括:將如請 求項1至9中任一項之塗布液塗布於基材上之步驟、使上 述塗布液㈣之步驟、對上述基材進行熱成形之步驟、 使上述塗布液硬化而設置塗布層之步驟。 26. 如請求項25之樹脂積層體之製造方法,其更包括:在使 上述塗布液硬化而成之樹脂積層體之不具有塗布層的面 上設置樹脂層之步驟。 27. —種樹脂積層體之製造方法,其特徵在於包括: 在基材上形成使如請求項 峒主9中任—項之塗布液硬化 而成之硬化膜之步驟、 28. 在上述硬化膜上形成透明 一種樹脂積層體之製造方法 在基材上形成使如請求項 而成之硬化膜之步驟、 導電膜之步驟。 ’其特徵在於包括: 1至9中任—項之塗布液硬化 在上述硬化膜上形成光觸媒層之步驟 141326.doc 201012882 ' 四、指定代表圖: (一) 本案指定代表圖為:(無) (二) 本代表圖之元件符號簡單說明: 五、本案若有化學式時,請揭示最能顯示發明特徵的化學式:A method for producing a resin laminate, comprising: a step of applying a coating liquid according to any one of claims 1 to 9 to a substrate, a step of applying the coating liquid (4), and the substrate The step of thermoforming, the step of curing the coating liquid, and providing a coating layer. 26. The method of producing a resin laminate according to claim 25, further comprising the step of providing a resin layer on a surface of the resin laminate obtained by curing the coating liquid without a coating layer. 27. A method of producing a resin laminate, comprising: a step of forming a cured film on a substrate to harden a coating liquid as claimed in claim 9; A method of producing a transparent resin laminate by forming a step of forming a cured film as claimed in the substrate, and a step of forming a conductive film. 'It is characterized by the steps of: 1 to 9 of the coating liquid hardening to form a photocatalyst layer on the above cured film 141326.doc 201012882 ' IV. Designated representative figure: (1) The representative representative figure of the case is: (none) (2) A brief description of the symbol of the representative figure: 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: 141326.doc141326.doc
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