201006556 九、發明說明： 【發明所屬之技術領域】 本發明係關於塗佈密封劑或排出液晶於構成液晶顯 示器（LCD)面板及類似者之基板之塗佈機。 日” 【先前技術】 塗佈機通常為一種製造例如液晶顯示器（LCD)之平面 板顯示器時用以塗佈（或排出）密封劑或液晶於基板之設 備’並建構成利用具有塗佈器頭單元塗佈密封劑或排出液 晶到置於平台上方位置之基板上。 以下將簡易說明塗佈機的主要結構。 平台安裝於框架頂上，而頭支撐件形成為支撐頭單元 於框架上。頭單元架構於基板上方，藉由朝基板於X、Y、 及Z轴方向相對移動，而塗佈密封劑或液晶到基 目的，平台、頭切件、以及頭單元相互鱗結，以^ 撐的基板至少相對移動於一個方向。 具體而§，碩支撐件的兩端支撐於框架的兩端，藉此 利用例如線性馬達之線性運動裝置，移動於框架縱長^向 之Y軸方向來運送頭單元。 藉由同步控财_丨之雜馬it，頭支#件移動於γ 201006556 軸方向。當基板變大時，相關的設備亦必須變大。因此， 由於頭支#件變得越來越大，而使在兩側之線性馬達精確 地同步驅動頭支撐件產生問題。 由於頭支撐件沿線性馬達之導引件在兩側進行線性 運動，當在兩側的線性馬達並未精確地同步驅動時，移動 中的頭支撐件的兩個支撐部負擔有負荷。因此，當所負擔 之負荷扭曲或振動頭單元時，無法確保能精確地塗佈密封 劑或液晶到正確位置，且塗佈品質差。 【發明内容】 因此，本發明有鑒於習知技術發生的問題，本發明之 =的為提供—種具有頭支擇件之負荷減輕結構之塗佈 ，其中頭支撐件架構成繞著軸旋轉或沿緩衝導引件滑 制且=動頭支撐件之兩個線性馬達並未精確地同步控 時，減輕頭支樓件之負荷， 或振動，善操作設== 利於改善㈣劑及類似者之塗佈適用性。 架機枝其上《平台之框 之頭單元j支撐塗佈膠於平台上之裝載基板 移動於方/支撐件之兩端支撐於框架之上部以線性 而頭支撐件^ ’頭支撐叙—端可雜地支撐於框架， 、 之另―端可線性移動於X轴方向地支樓於框 201006556 架。 於本發明例示實施例，塗佈機可更包含第一線性馬達 以及第二線性馬達，分別提供於頭支撐件之兩端以及框架 之間，以線性地移動頭支撐件於Y軸方向；安裝於頭支撐 件之一端及第一線性馬達之間之第一軸；以及安裝於頭支 撐件之另一端及第二線性馬達之間之緩衝導引件，以移動 頭支撐件之另一端於X軸方向。 第一線性馬達可包含縱向地安裝於框架之固定導引 件’以及絲於頭續件以沿@定料件雜移動之可移 動塊’以及其巾第-軸絲於可移械及頭支撑件之間。 =發明另—例示實_ ’第—軸安裝於可移動塊及 二支請之間。塗佈機可更包含軸承結構，環繞第一軸安 裝於可移動塊或頭支撐件之任一侧。 可又—例示實細，緩衝導餅可包含形成於 緩衝塊’以及形成_支料之導引部， 導引緩衝塊移動於頭支撐件之縱向。 轴 於本發明另—例示實施例，㈣機可更包含第二 201006556 塊之間。 於本發明又一例示實施例，軸承結構可環繞第二軸安 裝於可移動塊或緩衝塊之任一側。201006556 IX. Description of the Invention: [Technical Field] The present invention relates to a coater for applying a sealant or discharging liquid crystal to a substrate constituting a liquid crystal display (LCD) panel and the like. [Prior Art] A coater is generally a device for coating (or discharging) a sealant or a liquid crystal on a substrate when manufacturing a flat panel display such as a liquid crystal display (LCD), and is constructed using an applicator head. The unit coats the sealant or discharges the liquid crystal onto the substrate placed above the platform. The main structure of the coater will be briefly explained below. The platform is mounted on the top of the frame, and the head support is formed as a support head unit on the frame. The substrate is arranged on the substrate, and the substrate, the head-cut member, and the head unit are scaled to each other by the relative movement of the substrate in the X, Y, and Z directions, thereby applying a sealant or a liquid crystal to the base. At least relatively moving in one direction. Specifically, §, both ends of the support member are supported at both ends of the frame, thereby moving the head unit by moving the longitudinal direction of the frame to the Y-axis direction by using a linear motion device such as a linear motor. By synchronously controlling the money _ 丨 杂 it , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , It becomes more and more large, and the linear motor on both sides accurately synchronizes the driving of the head support. Since the head support moves linearly on both sides along the guide of the linear motor, when the linear motor is on both sides When the drive is not precisely synchronized, the two support portions of the moving head support are burdened. Therefore, when the load is distorted or vibrated by the head unit, it is impossible to accurately apply the sealant or liquid crystal to the correct one. The present invention is based on the problems of the prior art, and the present invention provides a coating for a load mitigation structure having a head support, wherein the head support The frame is configured to rotate around the shaft or slide along the buffer guide and the two linear motors of the head support are not accurately synchronized, reducing the load on the head support, or vibrating, and operating properly == It is beneficial to improve the coating applicability of the (four) agent and the like. The loading unit on the platform of the frame head of the platform supports the loading substrate on the platform, and the two ends of the square/support member are supported on the frame. The linear support head can be supported by the frame at the head support, and the other end can be linearly moved in the X-axis direction to the frame 201006556. In the exemplary embodiment of the present invention, the coater can be Further comprising a first linear motor and a second linear motor respectively provided at both ends of the head support and between the frames to linearly move the head support in the Y-axis direction; at one end of the head support and the first line a first shaft between the motor; and a buffer guide mounted between the other end of the head support and the second linear motor to move the other end of the head support in the X-axis direction. The first linear motor can The utility model comprises a fixed guiding member longitudinally mounted to the frame and a movable block which is moved to the head splicing piece to move along the @ sizing piece and the towel-axis is between the movable and the head support. Inventively another example of the actual _ 'the first axis is installed between the movable block and the two. The coater can further comprise a bearing structure mounted on either side of the movable block or head support about the first axis. Alternatively, the buffer guide may comprise a guide formed on the buffer block and forming a support, the guide buffer moving in the longitudinal direction of the head support. In the other embodiment of the invention, the (4) machine may further comprise a second 201006556 block. In still another exemplary embodiment of the present invention, the bearing structure can be mounted to either side of the movable block or the buffer block about the second axis.
如上所述，於根據本發明具有頭支撐件之負荷減輕結 構之塗佈機中，軸安裝於支撐頭支撐件之一部分，而緩衝 導引件安裝於支樓頭支樓件之另一部份。這樣的架構提供 之優點在於’當驅細支撐件之兩個雜馬達並未精確地 同步控制時，藉由解決頭支撐件所負擔之負荷，來避免頭 支樓件變开)或強烈振動，而有利於改善塗佈適用性，以及 改善操作設備之可靠度。 【實施方式】 明〜參考本個較佳實_及伴_式，將詳細說明本發 列。於圖式及說明巾，相_參考符餅儘可 不相同或類似的部份。 衣 負r备至圖4為根據本發明實施咖示具有頭支樓件之 2、為了偷^結構之塗佈機之各視圖，其中圖1為透視圖，圖 俯視圖^。圖’圖3為前視圖’而圖4為減輕負荷之狀態之 如圖1至圖3所示’根據本發明實施例，塗佈機架構 8 201006556 或液晶層於液晶顯示面板之基板s上。 基板裝栽於安裝於框架頂上之平台12上。於此，平 台12可移動地架構，以滑動於X軸或Y軸方向。As described above, in the coater having the load relieving structure of the head support according to the present invention, the shaft is mounted to one portion of the support head support member, and the buffer guide member is mounted to the other portion of the branch head support member. . The advantage provided by such an architecture is that 'when the two hybrid motors of the thinned support are not precisely synchronized, the head support is prevented from being opened or the strong vibration is caused by solving the load imposed by the head support. It is beneficial to improve the applicability of the coating and to improve the reliability of the operating equipment. [Embodiment] The present invention will be described in detail with reference to the preferred embodiment and the accompanying formula. In the drawings and the description of the towel, the phase _ reference cake may be different or similar parts. FIG. 4 is a view showing a top view of a coater having a head support member according to the present invention. FIG. 1 is a perspective view and a plan view. Fig. 3 is a front view' and Fig. 4 is a state in which the load is relieved as shown in Figs. 1 to 3. According to an embodiment of the present invention, a coater frame 8 201006556 or a liquid crystal layer is on a substrate s of a liquid crystal display panel. The substrate is loaded on a platform 12 mounted on the top of the frame. Here, the platform 12 is movably constructed to slide in the X-axis or Y-axis direction.
位於平台12上方之頭支樓件2〇亦安裝於框架1〇之 頂t 一且頭支揮件2Q的兩端架構成藉由第-線性馬達30 及了線性馬達35線性移動於γ軸方向，第一線性馬達 30及第二線性馬達35為線性運動裝置的一種類型。 第一線性馬達30及第二線性馬達35包含縱向地安裝 於第一框架1G兩側之固定導引件31及36,以及安裝於頭 支樓件20之任-支撐部之可移動塊33及訂，以沿著固定 導引件31及36線性移動。於此，各線性馬達之轉子 (armature)可安裝於對應的可移動塊33及37，相對於安 裝於對應_定導餅31及37之抒移鱗，產生驅動 動力。The head support member 2 located above the platform 12 is also mounted on the top of the frame 1 and the both ends of the head support 2Q are configured to linearly move in the γ-axis direction by the first linear motor 30 and the linear motor 35. The first linear motor 30 and the second linear motor 35 are one type of linear motion device. The first linear motor 30 and the second linear motor 35 include fixed guides 31 and 36 longitudinally mounted on both sides of the first frame 1G, and a movable block 33 mounted on any of the support portions of the head support 20 And ordering to linearly move along the fixed guides 31 and 36. Here, the armature of each linear motor can be mounted to the corresponding movable blocks 33 and 37, and the driving force is generated with respect to the scales mounted on the corresponding _ guiding cakes 31 and 37.
當然’可選擇性地實施-崩於A尺寸之其他類型的 線性運動裝置’以取代上述架構之第一線性馬達3〇 一線性馬達35。 第一軸40、緩衝導引件50、以及第二軸45安裝於頭 支撐件20及兩個線性馬達30及35之間，當兩個線性馬 達30及35操作而未精確地執行同步控制時，用以減輕頭 ❹Of course, it is possible to selectively implement - another type of linear motion device that collapses in the A size to replace the first linear motor 3 〇 a linear motor 35 of the above architecture. The first shaft 40, the buffer guide 50, and the second shaft 45 are mounted between the head support 20 and the two linear motors 30 and 35, and when the two linear motors 30 and 35 are operated without performing the synchronous control accurately To alleviate head lice
201006556 支撐件之負荷。以下將詳細說明。 於頭支撐件20上安裝頭單元22及24，以供應膠例如 岔封劑或液晶於平台12上之基板s。頭單元22及24可分 別架構成供應料敵料雜應鮮元22以及供應液 晶之液晶供應頭單元24。 頭單疋22及24建構成調整其於X、Y、以及Z軸方向 之位置’以改鶴出密封劑或液晶之喷嘴及基板間之相對 位置。由於頭支樓件可移動於Y軸方向，頭單元22及24 可t構整其於如軸方向之位置。更不用說，頭單 το 22及24可架構成調整其於γ軸方向之位置。 作為ί 4G、緩衝導引件5G、以及第二軸45 作為刖述頭域件之負荷減輕裝置之主要元件。 性馬頭支撐㈣之-侧及第-線 動塊33及頭支樓件2〇之間。# 4〇是連接地安裝於可移 亦即’第一軸4〇安萝於 33及頭支撑件之間，且架構%之可移動塊 朝可移動塊33轉動頭支撑件 田頭支撐件20載有負荷時 201006556 第一軸40之底部固定地安裝於可移動塊33，而第一 軸40之上部架構成由頭支撐件2G之—底端上的推力軸承 所支撐’以致能相對旋動運動。 此外’第-軸40可架構成大部份插入於可移動塊 及頭支撐件20之-侧間的空間而無任何暴露，且組装 複數個滾珠财之麻結構42可絲於兩觸構之間， 當頭支揮件2G之頂部姆_捕件2()下之可移動塊33 轉動時，用以降低旋轉阻力。 (成、^42繞著第一轴4〇可安装有複數個滾珠轴承 (或滾子轴承）。這樣安裝的軸承結構4 件2〇於可移動塊33上方，並協助頭支撐件2〇支的撐轉頭動支樓 .ί次，緩衝導5丨件Μ安裝於頭支撑件2G的另-支撐 Φ d 馬達35之間，使得3 =的負:部份可移動於X轴方向，以移除頭支樓件 所負擔的負何，而吸收頭支#件20之負荷。 緩衝導W件50包含形成於可移動塊37頂上之 51 ’以及形成於頭支撐件2G上之料部53 ，衝4 塊51移祕頭支撐件之縱向。 導引緩衝 而 缓衝塊51為第二軸45(將於下說明）输的部份， 201006556 衝上 份， 或類=5:構:構成與前述第，。相同 Φ 參考圖4’將說明第一軸4〇、緩衝導引件5〇、以及 娜貞叙崎，頭 當藉由兩個線性馬達3〇及35移動頭支擇單元2〇於 ’而第-線性馬㈣及第二線性馬達35並未精確 =3，20兩側之部份的γ軸座標 1传彼此不同。此時，因為第—軸4G安裝於切 件20之—側的第一位置，而第二轴45及緩衝導弓丨件^ 12 201006556 兩者女裝於支#頭賴件另_側之第二位置 位置透過緩衝料件5〇微微改敎根_切件2〇戶^ ==兩個轴40及45轉動時’可解決頭支撐件2〇 圖4顯示頭支標件之過度扭曲狀態，以顯示頭支樓件 ❹ =上之負荷減輕狀態。事實上，頭支推件20於X軸方向 轉動或移動時可應付負荷。 ，有此負荷減輕結構，藉由解決由於扭曲及變形之頭 二Ϊ續造成之品質不良塗佈的問題，以及解決雖 :芽件20負擔有負荷’而由於兩個線性馬達3〇及昶 ^同步控制，因負荷使頭切件2G於ζ軸方向振動之 „問題，例如密封劑或類似者之膠可排出 厚度之基板上。 、 1根據本個另—實_具有败㈣之負荷減 t、，、D構之塗佈機之俯視圖。 省略^本實_之塗佈機為類似於前述實施例塗佈機 40 1第—轴45(見圖D之結構。於本實施例中，第一轴 於頭支餅20之一側，而緩衝導引件50安裝於頭 # 20之另一侧’其中省略了第二轴45(見圖】）。 13 201006556 於本發明此實施例之塗佈機中，當負荷加重到頭支樓 件=時，藉由繞著頭支撐件20之第一轴4〇微微轉動頭 支撐件20以及透過緩衝塊50解決透支撐件2〇於另一側 所產生的支撐位移，可避免頭支撐件2G之變形及振動移 動0 雖然已為說明目的描述本發明例示實施例，熟此技術 領域者應明瞭在不恃離本發明申請專利範圍界定之精神 與範疇下可有各種修改、添加、及替換。 【圖式簡單說明】 現詳細參轉咖式所私本發明麻實施例。圖式 及說明中賴的相同參考符雜可能地表神同或類似 的元件。 圖1為根據本發明實施例具有頭支撐件之負荷減輕結 構之塗佈機之透視圖； Φ 圖2為圖1之塗佈機之俯視圖； 圖3為圖1之塗佈機之前視圖； 圖4為圖1之塗佈機之操作狀態之俯視圖；以及 圖5為根據本發明另一實施例具有頭支撐件之負荷減 輕結構之塗佈機之俯視圖。 【主要元件符號說明】 1〇 框架 14 201006556 平台 ❹ 頭支撐件 頭單元 頭單元 第一線性馬達 導引件 可移動塊 第二線性馬達 固定導引件 可移動塊 第一轴 轴承結構 第二軸 轴承結構 缓衝導引件 緩衝塊 導引部201006556 The load of the support. The details will be described below. Head units 22 and 24 are mounted on head support 20 to supply a substrate such as a sealant or liquid crystal on substrate 12. The head units 22 and 24 can be configured to form a supply of the hosted hybrid fresh material 22 and a liquid crystal supply head unit 24 for supplying liquid crystals. The head units 22 and 24 are constructed to adjust their positions in the X, Y, and Z-axis directions to change the relative position between the nozzle and the substrate of the sealant or liquid crystal. Since the head support member can be moved in the Y-axis direction, the head units 22 and 24 can be configured to be in the axial direction. Needless to say, the head sheets το 22 and 24 can be configured to adjust their positions in the γ-axis direction. The ί 4G, the buffer guide 5G, and the second shaft 45 serve as main components of the load mitigation device of the head region. Sex horse head support (4) - side and first - line moving block 33 and head support 2 〇. #4〇 is connected to the movable shaft, that is, the first shaft 4〇 Anluo 33 and the head support member, and the movable block of the structure % is rotated toward the movable block 33. The head support field support member 20 At the time of load 201006556, the bottom of the first shaft 40 is fixedly mounted to the movable block 33, and the upper frame of the first shaft 40 is supported by the thrust bearing on the bottom end of the head support 2G to enable relative rotational motion. . In addition, the 'the first shaft 40 can form a space which is mostly inserted between the side of the movable block and the head support 20 without any exposure, and the assembly of a plurality of balls of the hemp structure 42 can be made in two touches. Between, when the movable block 33 under the top _ catching member 2 () of the head support 2G is rotated, the rotation resistance is lowered. (Cheng, ^42 can be installed with a plurality of ball bearings (or roller bearings) around the first axis 4〇. The bearing structure 4 thus mounted is placed above the movable block 33, and assists the head support 2撑, the buffer guide 5丨 is mounted between the other support Φ d motor 35 of the head support 2G, so that 3 = negative: part can be moved in the X-axis direction, The load of the head support member is removed, and the load of the head support member 20 is absorbed. The buffer guide member 50 includes a 51' formed on the top of the movable block 37 and a material portion 53 formed on the head support member 2G. The punching block 51 moves the longitudinal direction of the secret head support member. The guiding buffer and the buffer block 51 are the portions of the second shaft 45 (to be described below), 201006556 punched up, or class = 5: structure: composition The same as the foregoing, Φ. Referring to FIG. 4', the first shaft 4〇, the buffer guide 5〇, and the Naa Saki, the head will be moved by the two linear motors 3〇 and 35 to move the head selection unit 2 The '-the linear horse (4) and the second linear motor 35 are not exactly = 3, and the γ-axis coordinate 1 of the two sides is different from each other. At this time, because the first-axis 4G is mounted In the first position on the side of the cutting member 20, and the second shaft 45 and the buffering guide member ^ 12 201006556 both pass through the cushioning member 5 at the second position of the other side of the head. Slightly change the root _ cut piece 2 ^ ^ ^ = two shafts 40 and 45 when rotating 'can solve the head support 2 〇 Figure 4 shows the excessive distortion of the head support member to show the head support ❹ = The load mitigation state. In fact, the head urging member 20 can cope with the load when it is rotated or moved in the X-axis direction. The load mitigation structure can solve the poor quality coating due to the twist and deformation of the head. The problem, as well as the solution: the bud member 20 bears the load' and the two linear motors 3〇 and 昶^ are synchronously controlled, causing the head cutting member 2G to vibrate in the x-axis direction due to the load, such as a sealant or the like. The glue can be discharged on the substrate of the thickness. 1 According to the load of the other, the load of the machine is reduced, and the coating machine of the D structure is omitted. Embodiment coater 40 1 first axis 45 (see the structure of Figure D. In this embodiment, the first axis is at the head One side of the cake 20, and the buffer guide 50 is mounted on the other side of the head #20, in which the second shaft 45 (see Fig.) is omitted. 13 201006556 In the coating machine of this embodiment of the invention, When the load is increased to the head support member, the support displacement of the support member 2 on the other side is solved by slightly rotating the head support member 20 around the first shaft 4 of the head support member 20 and through the buffer block 50. </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> <RTIgt; Modify, add, and replace. [Simple description of the drawings] Now, the details of the invention are referred to in the embodiment of the invention. The same reference symbols in the drawings and descriptions may be identical or similar elements. 1 is a perspective view of a coater having a load mitigation structure of a head support according to an embodiment of the present invention; Φ FIG. 2 is a plan view of the coater of FIG. 1; FIG. 3 is a front view of the coater of FIG. 4 is a plan view of an operating state of the coater of FIG. 1; and FIG. 5 is a plan view of a coater having a load relieving structure of a head support according to another embodiment of the present invention. [Main component symbol description] 1 frame 14 201006556 platform 头 head support head unit head unit first linear motor guide movable block second linear motor fixed guide movable block first shaft bearing structure second axis Bearing structure buffer guide buffer block guide