TW200951418A - Eccentricity measuring method - Google Patents
Eccentricity measuring methodInfo
- Publication number
- TW200951418A TW200951418A TW98117423A TW98117423A TW200951418A TW 200951418 A TW200951418 A TW 200951418A TW 98117423 A TW98117423 A TW 98117423A TW 98117423 A TW98117423 A TW 98117423A TW 200951418 A TW200951418 A TW 200951418A
- Authority
- TW
- Taiwan
- Prior art keywords
- lens
- eccentricity
- slope
- induced
- axial
- Prior art date
Links
Landscapes
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
The present invention relates to an eccentricity measuring method using auto-collimation. The method can easily separate eccentricity induced by axial slope from that induced by axial offset, wherein said eccentricities are encountered in non-spherical lens. The method consists of following steps: First, (S1) adjust and reduce the slope of lens carrier 22. At this point, remove object lens 15. Then, (S2) place and install lens 10 at the lens carrier 22. (S3) Find the relative slope of the cutting terminal faces 10FA, 10FB on the lens 10. (S4) According to the relative slope of the cutting terminal faces obtained at step S3, calculate the eccentricity induced by the axial slope. (S5) Install the object lens 15 at device 1 in order to rotate the lens carrier 22 at a preset angle, find the central location of a rectile image during each rotation operation. Measure the trajectory circle radius of the rectile image so as to find total eccentricity of the lens 10. Finally, (S6) calculate the eccentricity induced by said axial offset by subtracting the eccentricity induced by said axial slope from the total eccentricity.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008152296 | 2008-06-10 | ||
JP2009108549A JP5362431B2 (en) | 2008-06-10 | 2009-04-27 | Eccentricity measurement method |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200951418A true TW200951418A (en) | 2009-12-16 |
TWI396837B TWI396837B (en) | 2013-05-21 |
Family
ID=41704865
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW98117423A TWI396837B (en) | 2008-06-10 | 2009-05-26 | Method for determination of eccentricity |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5362431B2 (en) |
TW (1) | TWI396837B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102221449A (en) * | 2010-04-19 | 2011-10-19 | 鸿富锦精密工业(深圳)有限公司 | Auxiliary device for measuring eccentric quantity |
CN102822656A (en) * | 2010-04-13 | 2012-12-12 | 柯尼卡美能达先进多层薄膜株式会社 | Eccentric amount measuring method |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015146634A1 (en) * | 2014-03-28 | 2015-10-01 | コニカミノルタ株式会社 | Method for measuring amount of eccentricity of aspherical surface and method for analyzing shape of aspherical surface |
CN105823625B (en) * | 2016-04-27 | 2019-01-04 | 北京航天发射技术研究所 | The detection method of self-collimating angle measuring light tube photo electric axis stability |
CN112327471B (en) * | 2018-10-30 | 2022-10-14 | 深圳市真迈生物科技有限公司 | Microscope system, adjusting method thereof and sequencing system |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0875597A (en) * | 1994-09-02 | 1996-03-22 | Ricoh Co Ltd | Non-spherical surface eccentricity measuring machine |
US5854852A (en) * | 1995-08-02 | 1998-12-29 | Lucent Technologies Inc. | Eccentricity determination system and method for accurately computing an offset of a central feature of an object |
JP2003344219A (en) * | 2002-05-29 | 2003-12-03 | Nikon Corp | Method and instrument for measuring eccentricity, manufacturing method for projection optical system, and projection optical system |
US6990430B2 (en) * | 2002-12-20 | 2006-01-24 | Brooks Automation, Inc. | System and method for on-the-fly eccentricity recognition |
JP2005024254A (en) * | 2003-06-30 | 2005-01-27 | Mitsutoyo Corp | Information processor, calibration method for the same, information processing program, record medium recording the program, and eccentricity measuring apparatus |
JP2005055202A (en) * | 2003-08-06 | 2005-03-03 | Mitsutoyo Corp | Eccentricity measuring device, lens mounting method, and eccentricity measuring method for lens |
JP2007127473A (en) * | 2005-11-02 | 2007-05-24 | Hoya Corp | Measuring method, device, and program of aspheric lens, manufacturing method of aspheric lens, and aspheric lens |
JP4815273B2 (en) * | 2006-06-02 | 2011-11-16 | 富士フイルム株式会社 | Optical element rotation holding device |
JP4774332B2 (en) * | 2006-06-06 | 2011-09-14 | 富士フイルム株式会社 | Eccentricity measurement method |
JP4943946B2 (en) * | 2007-06-04 | 2012-05-30 | 富士フイルム株式会社 | Eccentricity measuring device |
JP2008304200A (en) * | 2007-06-05 | 2008-12-18 | Fujinon Corp | Method for adjusting height position of eccentricity measuring head |
-
2009
- 2009-04-27 JP JP2009108549A patent/JP5362431B2/en not_active Expired - Fee Related
- 2009-05-26 TW TW98117423A patent/TWI396837B/en not_active IP Right Cessation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102822656A (en) * | 2010-04-13 | 2012-12-12 | 柯尼卡美能达先进多层薄膜株式会社 | Eccentric amount measuring method |
CN102822656B (en) * | 2010-04-13 | 2016-05-11 | 柯尼卡美能达先进多层薄膜株式会社 | Offset measuring method |
CN102221449A (en) * | 2010-04-19 | 2011-10-19 | 鸿富锦精密工业(深圳)有限公司 | Auxiliary device for measuring eccentric quantity |
CN102221449B (en) * | 2010-04-19 | 2015-01-21 | 鸿富锦精密工业(深圳)有限公司 | Auxiliary device for measuring eccentric quantity |
Also Published As
Publication number | Publication date |
---|---|
JP2010019832A (en) | 2010-01-28 |
TWI396837B (en) | 2013-05-21 |
JP5362431B2 (en) | 2013-12-11 |
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Legal Events
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MM4A | Annulment or lapse of patent due to non-payment of fees |