200927593 九、發明說明： 【發明所屬之技術領域】 本發明制-種光I移載容^之技術領域，具體而言 糸-種避免氣流傷害光罩之移載容器，且可長時間維持與 控制移載谷器内部的潔淨度與環境條件。 【先前技術】 ” ❹ 受到電子產品不斷朝向輕薄短小、高頻、高效能 發展的影響，用於電子產品中的核心晶片就必需更 处:的微小化與高效能化，而欲使晶片微小化與具高效 /吏晶片上的積體電路線徑微細化，以容人更多的積 元件’因此現有的積體電路線徑已由早期的〇 25 《^沾士 45奈料製程發展，而晶片上積體電路線徑微 :„，主要係在於半導體製程中的黃光微 掃描步進機【⑽·】與光罩 時中光罩為例’當光罩表面附著微粒或產生霧化 導上 洗、制於滅城廿，隹牛導體的無塵至中，不論係清 的溶劑，而二：右影或蝕刻等’其均需使用到很多 害Γ在經過製程加熱或曝光等動作時 ”衣兄中的水軋等產生化合 == 其=良率的附加物，為了二= 業界開發有如美國專利第us 4,532,97Q號 ^ 4, 534, 389號之晶圓、光罩密閉 ’、、 、水氣等有害物質不致進入緊鄰 =系圓統的二確保微粒 但前述的密_轉系統並無法克服殘留於容^内之有 5 200927593 害物質所產生的問題。以光罩為例，造成光罩污損的原因 除了微粒外，更進一步包含環境中的水氣、有毒氣體、塑 膠製移載容器所釋出的硫化物和製作光罩製程中殘留或是 光罩上圖形材質本身釋出的氨（nh4+)、以及光罩清洗過程 中殘留的化學分子等有害物質，以結晶為例，其化學式為 (NH〇 2S〇4，此一結晶物由前述不同原因釋出的氨（NH4+) 及硫酸根離子（S〇t)經高能量光源與環境水氣等化合而 成，因此經常發生光罩於清洗後，再經一段時間的儲存後 0,只要一經黃光微影製程中的紫外線照射曝光就會產生結 晶的現象， 造成此一問題的主要原因來自於儲存容器之氣密性不 足，使移載容器外的環境空氣中的微粒、水分子不斷的滲 入，進而提供其化學反應所需的元素。再者該移載容器主 要係以塑膠製成，塑膠材料會不斷的釋出硫化物等有害物 質，且外部氣體會滲透進入光罩，和光罩圖形材質本身或 是移載容器内氨氣產生反應，造成有害物質附著於光罩正 反兩面與光罩護膜表面。 〇 為了解決這些問題，業界開發有於光罩之移載容器内 加設不銹鋼内罩，除了能產生靜電導出的功效外，並可用 以吸收塑膠材質所釋出的硫化物，同時於移載容器上加裝 充、填氣結構，用以將乾淨的惰性氣體注入該移載容器内 ，並擠出移載容器内的有害氣體，同時進一步提升該移載 容器的氣密性，以防止外部微粒進入，如我國專利公告第 223680號及第1262164號等，其均在透過該移載容器結構 的改變，來提高移載容器的氣密性。惟氣密性的改良是一 項重大的工程，不僅需要增加開發、製模與組裝的成本， 6 200927593 且受到材質、蓋合力量與蓋合接觸面積等因素的影響，移 載容器並無法達到完全氣密的效果，因此移載容器内的氣 體仍然會漸漸向外流失，由於微粒與水分子極小，因此移 載容器在經長時間儲存後，外部環境中如微粒與水分子等 有害物質仍會漸漸滲入該移載容器内部，而失去維持光罩 潔淨度的作用，其一樣會造成光罩與光罩護膜的污損、霧 化與結晶等，進一步影響到後續晶圓加工的良率、產量與 成本。 再者前述具充、填氣結構的光罩盒，主要係將其充氣 ® 閥件設於光罩盒的底座或殼罩上，使其直接連通光罩盒的 内部，如此當充氣設備透過充氣閥件注氣時，其氣流會直 接衝擊光罩表面，造成氣體中殘留的微粒直接撞擊光罩表 面的圖形材質，甚至強力的氣流也會傷及圖形，使光罩圖 形受損，進而於晶圓製造時形成不良品，故亦有待進一步 的改良。 緣是，為了克服前述移載容器之充氣氣流易傷及光罩 圖形的問題深入探討，且配合長時間保持内部潔淨度的需 ❹ 求，積極尋求解決之道，在經不斷努力研究與試作，終於 成功的開發出一種移載容器之遮蔽式入出氣結構，而能 克服現有移載容器於充氣時容易傷及光罩圖形的困擾， 同時可進一步維持移載容器内部的潔淨度與控制環境條 件。 【發明内容】 《解決問題的技術手段》 因此，本發明之主要目的係在提供一種可防止傷害光 罩圖形的移載容器之遮蔽式入出氣結構，藉以延長光罩的 7 200927593 使用壽命。 種可長時間維 構，以避免微 器中有害物質 ’能有效降低 又，本發明另一主要係目的係在提供〜 持内部潔淨度的移载容n之遮蔽式入出氣結 粒或水氣等有害物質進入，並可加速移戴容 的釋出，而減少光罩清洗與重新製作的: 營運成本。 |200927593 IX. Description of the invention: [Technical field of the invention] The invention relates to the technical field of the light-transfer capacity, in particular to avoid the airflow damage to the transfer container of the reticle, and can be maintained for a long time Control the cleanliness and environmental conditions inside the transfer tank. [Prior Art] ” Due to the continuous development of electronic products, such as light, short, high-frequency, high-efficiency, the core chips used in electronic products must be further miniaturized and highly efficient, and the wafers must be miniaturized. The wire diameter of the integrated circuit on the high-efficiency/吏 wafer is refined to accommodate more integrated components. Therefore, the existing integrated circuit wire diameter has been developed by the early 〇25“^沾士45奈料process, and The wire diameter of the integrated circuit on the wafer is micro: „, mainly in the yellow light micro-scanning stepper in the semiconductor process [(10)·] and the reticle in the case of the reticle as an example] when the surface of the reticle is attached with particles or the atomization guide is washed Made in the city of annihilation, the yak conductor is dust-free, regardless of the solvent, and the second: right shadow or etching, etc., all of which require the use of a lot of pests during process heating or exposure. In the process of water rolling, etc. in the brothers, ========================================================================================================== Harmful substances such as water and gas do not enter the immediate vicinity The second one ensures the particles, but the aforementioned dense-transfer system cannot overcome the problems caused by the harmful substances in the residual material. In the case of the reticle, the cause of the viscous fouling is further included in addition to the particles. Moisture in the environment, toxic gases, sulfides released from plastic transfer containers and ammonia remaining in the process of making the mask or the material on the mask itself (nh4+), and residues in the mask cleaning process For the harmful substances such as chemical molecules, for example, the chemical formula is (NH〇2S〇4, which is a high-energy light source of ammonia (NH4+) and sulfate ion (S〇t) released by the above different reasons. It is combined with environmental water and gas, so it often happens after the mask is cleaned and then stored for a period of time. As long as it is exposed to ultraviolet light in the yellow lithography process, it will crystallize, causing the main problem. The reason is that the airtightness of the storage container is insufficient, so that the particles and water molecules in the ambient air outside the transfer container are continuously infiltrated, thereby providing the elements required for the chemical reaction. The main device is made of plastic. The plastic material will continuously release harmful substances such as sulfides, and the external gas will penetrate into the reticle, and react with the reticle pattern material or the ammonia in the transfer container to cause harmful substances to adhere. In order to solve these problems, the industry has developed a stainless steel inner cover in the transfer container of the reticle. In addition to the effect of generating static electricity, it can be used to absorb plastic. The sulphide released by the material is simultaneously filled with a filling and filling structure on the transfer container for injecting a clean inert gas into the transfer container, and extruding the harmful gas in the transfer container, and further improving The transfer container is airtight to prevent the entry of external particles, such as the Chinese Patent Publication Nos. 223680 and 1262164, etc., all of which improve the airtightness of the transfer container by changing the structure of the transfer container. However, the improvement of airtightness is a major project, which not only needs to increase the cost of development, molding and assembly, 6 200927593 and is affected by factors such as material, cover force and cover contact area. The gas is completely airtight, so the gas in the transfer container will still gradually lose out. Because the particles and water molecules are extremely small, the hazardous materials in the external environment such as particles and water molecules remain after the storage container is stored for a long time. Will gradually infiltrate into the interior of the transfer container, and lose the role of maintaining the cleanliness of the mask, which will cause fouling, atomization and crystallization of the mask and the mask film, further affecting the yield of subsequent wafer processing. , production and cost. Furthermore, the above-mentioned photomask case with a filling and filling structure mainly has its inflation® valve member disposed on the base or the cover of the photomask case so as to directly communicate with the inside of the photomask case, so that when the inflating device is inflated When the valve member is inflated, the airflow will directly impact the surface of the reticle, causing the residual particles in the gas to directly hit the graphic material on the surface of the reticle. Even the strong airflow will damage the pattern and damage the reticle pattern. Defective products are formed during the round manufacturing, so further improvements are needed. The reason is that in order to overcome the problem that the inflated airflow of the transfer container is easy to damage and the reticle pattern, and to meet the needs of maintaining the internal cleanliness for a long time, and actively seeking solutions, after continuous efforts and research, Finally, a shielded inlet and outlet structure of the transfer container was successfully developed, which can overcome the trouble that the existing transfer container is easy to damage the reticle pattern when inflating, and further maintain the cleanliness and control environmental conditions inside the transfer container. . SUMMARY OF THE INVENTION [Technical Means for Solving the Problem] Accordingly, it is a primary object of the present invention to provide a shielded inlet and outlet structure for a transfer container that can prevent damage to a reticle pattern, thereby extending the life of the reticle 7 200927593. The type can be constructed for a long time to avoid the harmful substances in the micro-processor can be effectively reduced. In addition, another main purpose of the present invention is to provide a shielded gas-injection or water-gas content of the transfer capacity of the internal cleanliness. When harmful substances enter, and can accelerate the release of the wearing capacity, and reduce the mask cleaning and re-manufacturing: operating costs. |
再者，本發明次一主要目的係在提 條件的移載容器之遮蔽式人出氣結構，S種可控制環境 内部的環境條件，以節省後續製程的時;曰;皰改變移載容器 程之成本。 s ’並降低後續製 術手段來具體實 置一光罩，其包 基於此’本發明主要係透過下列的枝 現前述的目的與效能；該移載容器用於 ur*· 含有： 抵持件圍繞形成 其中承托件底面 之外侧分別形成Furthermore, the second primary object of the present invention is to provide a shielded human venting structure for the transfer container of the condition, and to control the environmental conditions inside the environment to save the subsequent process; 曰; blister changes the transfer container process cost. s 'and reduce the means of follow-up to specifically implement a reticle, the package is based on this 'the invention mainly through the following purposes and effectiveness; the transfer container for ur*· contains: resisting parts Formed around the outer side of the bottom surface of the support member
一底座，其頂面設有由兩承托件與〜 的支樓體’供支樓光罩及光罩側邊貼靠， 形成有一中空的迴氣空間，兩承托件相異 有複數連通内部與外部的通氣孔； N -殼罩’其供騎性相對前述底座蓋合與開啟，該殼 罩可蓋合於底座上形成一容置光罩之容置空間； 至少兩入出氣元件，其設於前述底座上，該兩入出氣 元件並設於底座兩承托件下方，且與承托件迴氣空間連通 《解決問題所達成的功效》 經由前述技術手段的實現’使得本發明至少具有下列 的效能與功效增進： 1、本發明移載容器的入出氣元件係設於承托件内 8 200927593 部，使上衝的氣流受到遮蔽，並經適當引導後，讓氣流 沿著光罩上、下之水平表面流動，而非以垂直方向衝擊 光罩表面的圖形，故不致傷害光罩圖形，且可將有害物 質順利帶走，有效延長光罩的使用壽命，並可加速移載 容器中有害物質的釋出，而減少光罩清洗與重新製作的次 數，能有效降低營運成本。 2、 本發明移載容器利用入出氣元件的設計，使移 載容器内部可保持正壓狀態，得以防止外部的微粒、水 分子等無法進入，以長時間維持移轉容器内部環境的潔 淨度，並可解決現有移載容器需不斷提升氣密度的困擾 與不便。 3、 本發明之移載容器可透過不斷注入與排出的氣 體，形成一種循環氣流，不致發生現有長時間儲存後， 正壓消失的狀況，並能將移載容器與光罩所釋出的有害 物質排出，使該移載容器的内部環境能長時間維持潔淨 度，減少光罩表面之微粒附著與霧化、結晶等現象，而 能提升晶圓製作的良率。 〇 4、本發明之移載容器内部可長時維持其潔淨度， 故在儲存光罩時不需受限於早進早出的原則，能增進光 罩管理的便利性。 5、本發明移載容器可對移載容器提供循環流動的 乾淨氣體，其進一步可因應不同製程的需要，預先透過 透過入出氣元件注入所需材料，以控制其内部環境，如 改變溼度、溫度、乃至特殊製程氣體或物質等，以減少 後續製程處理的時間與成本。 以下為配合圖式及圖號，列舉一較佳實施例做進一 9 200927593 步之說明，期能使熟悉本項技術者對本發明有更詳細的 暸解，惟以下所述者僅為用來解釋本發明之較佳實施例 ，並非企圖據以對本發明做任何形式上之限制，因此凡 是在本發明之創作精神下，所為任何形式的修飾或變更 ，皆仍應屬於本發明意圖保護之範疇。 【實施方式】 本發明係一種用於儲存或運輸製程中光罩之移載容器 ，請參照第一、二圖所揭示者，該移載容器（1)包含有一 承置光罩（50)之底座（10)、一供蓋合底座（10)形成 ® 密合空間之殼罩（20)、以及至少二個可對容置空間注氣 或排氣之入出氣元件（3); 而關於本發明較佳實施例之詳細構成，則請參照第二 、三及四圖所顯示者，其中底座（10)頂面設有一金屬板 (13)，再者底座（10)上並設有兩承托件（15)與一抵 持件（16)，且承托件（15)與抵持件（16)可將金屬板 (13)壓掣於底座（10)頂面，又兩承托件（15)與抵持 件（16)並於金屬板（13)圍繞形成”门”型支撐體，供 〇 支撐光罩（50)及光罩（50)側邊貼靠，且各承托件（15 )底面形成有一迴氣空間（150)，再者兩承托件（15)相 異之外側頂緣分別形成有複數連通内部與外部的通氣孔（ 151)，且底座（10)形成有至少兩個凸出頂面與底面的承 座（11)，而金屬板（13)形成有對應的透孔（14)，使 該兩承座（11)可分別對應連通前述之承托件（15)迴氣 空間（150)【如第四圖所示】，且供金屬板（13)限位之 用，再者承座（11)下段内緣可形成一螺紋段或埋設有一 螺帽件（12)，本發明以埋設螺帽件（12)為主要實施例 200927593 ，以供鎖設前述之入出氣元件（3)，能便於使用者由移載 容器（1)外部組裝或拆解該入出氣元件（3); 該殼罩（20)係由一外殼（21)與一金屬製内襯（25 )所組成，其中外殼（21)周緣設有一儲存元件（22)， 該儲存元件（22)係以無線射頻識別系統【RFID】為實施 例，儲存元件（22)供記錄移載容器（丨）内光罩（5〇)之 相關資訊，又内襯（25)係鎖設於外殼（21)内緣，該内 襯（25)内設有若干壓抵件（26)，壓抵件（26)可壓掣 ❹及推抵於光罩（5〇)的頂面與侧面，使得光罩（5〇)可定 位於底座（10)之，，门，’型支撐體上； 尸又前述入出氣元件（3)具有選擇性啟閉之功能，該入 出氣元件（3)並設於底座（1〇)之承座（11)内，入出氣 疋件（3)係由-管體（3Q)及—選擇性啟閉管體（3〇)的 活動件（32)所組成。其中管體（3〇)内部中段分別形成 有-供氣體流經之中空隔片⑽），使管體⑽）内部於 隔片（ 300 )兩側分別形成一第一槽孔⑽）與一第二槽 孔（ 302)，且入出氣元件（3)之管體（3〇)於對應第二 ❹槽孔（ 302)之外緣形成有一螺紋段（3〇3)，供入出氣元 件（3)將管體（3〇)鎖設於前述承座（11)的螺帽件⑴ )上。再者活動件（32)兩端分別形成有一較大徑之抵頂 端（33)與-較小徑之閉合端（34)，該活動件（32)之 閉合端（34)可穿經一復位彈簧（35)後，由管體（30) 第槽孔（301)經隔片（3〇〇)進入第二槽孔（3〇2)，並 =，口端（34)上套設有一活塞墊圈（36)，使活動件 ()於管體（3G)内選擇性移動。讓復位彈簧（35)可 提供一彈性偏壓力，以推抵活動件（32)於位移後自動復 11 200927593 Ϊ管的活塞塾圈(36)相對開敌或密閉 〇)隔片（3〇〇)，供阻隔氣體於第一槽孔〔 301)與第二槽孔（3〇2)間流動，且當活動件， =推抵時，可讓活動件（32)之活塞墊圈（36)遠離$ (3〇〇)，使得氣體可由管體（3〇)之第一槽孔 J二槽J ( 302)流動。再者用於注氣之入出氣元件L 由移載容器⑴外部鎖設於底座（1〇)承座（ 依序壓擎-壓抵墊圈（38)與一遽片（37)，以進一步: ❹ Φ ，進入移載容器⑴⑽乾淨氣體，防止微 物質 進入移載容器（1)内。 蜀。物質 藉此’透過移載容器⑴兩人出氣元件（3)的設計 ’使注入移載容器⑴内部的氣流可沿光罩⑽ 平流動，而不致直接衝擊光罩（50)表面_，且 内部的氣體產生循環流動，令乾淨氣體可不斷^ =入移載容器⑴内形成正壓，以避免外部微粒與有宝物 質進入’同時將釋出的有害物質利用流動氣體不斷的帶出 ’而組構成-不傷及光罩圖形、且可長時間維持潔淨产鱼 控制内部環境條件的移載容器之遮蔽式人出氣結構者。〜 透過上述的設計，本發明於實際運用時，則係如第五 圖所顯示者，本發明移載容器可運用於各式 輸之裝置（60)中，其中裝置（60)可為光罩管理系I儲 存櫃、光罩充氣櫃、光罩運輸設備、以及製程設 進、出單元【L〇ad、Unload】等，該裝置（6〇)至少j 有-置設移載容器（1)之承板（61)及兩具充、排氣作= 的啟閉元件（80) ’其中承板（61)上具有複數防止微粒 沉積之網孔，供進一步保持裝置（60)内部的潔淨度，又 12 200927593 承板（61)上設有至少一定位元件（62)，使得對應的移 載谷器（1)可穩固定位於該承板（61)上，再者承板（61 )並設有至少一檢知元件（64)，供感應移載容器（1)是 否定位置設於承板（61)上，再者裝置（6〇)上並具有一 典型無線射頻識別系統【RFID】之讀取元件（63)，該讀 取元件（63)可對應移載容器（丨）之儲存元件（22)，讀 取元件（63)供傳輸與讀取移載容器（1)内光罩（5〇)相 關資訊；a base, the top surface of which is provided with two supporting members and a supporting body body for supporting the floor reticle and the side of the reticle to form a hollow return air space, and the two supporting members have different interconnections The inner and outer vents; the N-shell hood is mounted and opened relative to the base, and the cover can be covered on the base to form a receiving space for accommodating the reticle; at least two inlet and outlet elements are The invention is disposed on the base, and the two inlet and outlet air components are disposed under the two support members of the base, and communicate with the return air space of the support member, “the effect achieved by solving the problem” is achieved by the foregoing technical means to make the invention at least The following performance and efficiency enhancements are as follows: 1. The inlet and outlet components of the transfer container of the present invention are disposed in the support member 8 200927593, so that the airflow of the upper punch is shielded, and after proper guidance, the airflow is carried along the mask. The horizontal surfaces of the upper and lower sides flow, instead of striking the pattern of the surface of the reticle in a vertical direction, so that the reticle pattern is not damaged, and the harmful substances can be taken away smoothly, the life of the reticle can be prolonged, and the transfer container can be accelerated. In Release of the substance, while reducing the number of times the cleaning and re-create the mask, can effectively reduce operating costs. 2. The transfer container of the present invention utilizes the design of the inlet and outlet elements to maintain a positive pressure state inside the transfer container, thereby preventing external particles, water molecules and the like from entering, and maintaining the cleanliness of the internal environment of the transfer container for a long time. It can solve the trouble and inconvenience that the existing transfer container needs to continuously increase the gas density. 3. The transfer container of the present invention can continuously inject and discharge gas to form a circulating airflow, which does not cause the positive pressure to disappear after the long-term storage, and can remove the harmful effects released by the transfer container and the reticle. The material is discharged, so that the internal environment of the transfer container can maintain cleanliness for a long time, and the phenomenon of particle adhesion, atomization, crystallization, etc. on the surface of the mask can be reduced, and the yield of the wafer can be improved. 〇 4. The interior of the transfer container of the present invention can maintain its cleanliness for a long time, so that the principle of early entry and exit is not limited when storing the reticle, and the convenience of hood management can be improved. 5. The transfer container of the present invention can provide a circulating flow of clean gas to the transfer container, and further can inject the required material through the through-in and out-out components to control the internal environment, such as changing humidity and temperature, according to the needs of different processes. Or even special process gases or substances to reduce the time and cost of subsequent process processing. The following is a description of the preferred embodiment and the description of the steps of the present invention. The following is a more detailed understanding of the present invention, but the following is only for explaining the present invention. The preferred embodiments of the invention are not intended to limit the scope of the invention, and any modifications or changes in the form of the invention are intended to be included in the scope of the invention. [Embodiment] The present invention is a transfer container for storing or transporting a photomask in a process. Referring to the first and second figures, the transfer container (1) includes a receiving mask (50). a base (10), a cover (20) for forming a close-contact space, and at least two inlet and outlet elements (3) for injecting or exhausting the accommodation space; For a detailed configuration of the preferred embodiment of the invention, please refer to the second, third and fourth figures, wherein the top surface of the base (10) is provided with a metal plate (13), and the base (10) is provided with two bearings. The supporting member (15) and a resisting member (16), and the supporting member (15) and the resisting member (16) can press the metal plate (13) against the top surface of the base (10), and the two supporting members (15) forming a "door" type support body with the resisting member (16) and surrounding the metal plate (13), and supporting the reticle (50) and the reticle (50) on the side, and each supporting member (15) The bottom surface is formed with a return air space (150), and the two receiving members (15) are different from each other. The outer top edge is respectively formed with a plurality of vent holes (151) communicating with the inside and the outside, and the base (10) is formed with At least two sockets (11) projecting from the top surface and the bottom surface, and the metal plate (13) is formed with corresponding through holes (14), so that the two sockets (11) can respectively communicate with the aforementioned support members ( 15) Return air space (150) [as shown in the fourth figure], and for the metal plate (13) limit position, and then the inner edge of the lower part of the seat (11) can form a thread segment or a nut member is embedded. (12) The present invention uses the embedded nut member (12) as the main embodiment 200927593 for locking the aforementioned air inlet and outlet member (3), which can facilitate the user to assemble or disassemble the externally from the transfer container (1). The inlet and outlet member (3); the casing (20) is composed of a casing (21) and a metal lining (25), wherein the casing (21) is provided with a storage element (22) at the periphery thereof, the storage element ( 22) Taking the radio frequency identification system [RFID] as an embodiment, the storage component (22) is used to record information about the photomask (5〇) in the transfer container (丨), and the lining (25) is locked in the outer casing. (21) the inner edge, the inner liner (25) is provided with a plurality of pressing members (26), and the pressing member (26) can be pressed and pushed against the top surface and the side surface of the photomask (5〇), so that The reticle (5 〇) can be positioned on the base (10), the door, the 'type support body; the corpse and the aforementioned inlet and outlet elements (3) have the function of selectively opening and closing, the inlet and outlet elements (3) and Located in the seat (11) of the base (1〇), the air inlet and outlet element (3) is composed of a -tube body (3Q) and a movable member (32) of the selective opening and closing pipe body (3〇). . The inner middle section of the pipe body (3 〇) is respectively formed with a hollow spacer (10) through which the gas flows, so that a first slot (10) and a first part are formed on the two sides of the spacer (300) inside the pipe body (10). a second slot (302), and a pipe body (3〇) of the air inlet and outlet member (3) is formed with a threaded section (3〇3) at an outer edge of the corresponding second slotted hole (302) for feeding the air outlet component (3) The tube body (3〇) is locked to the nut member (1) of the aforementioned seat (11). Further, the movable member (32) is respectively formed with a larger diameter abutting end (33) and a smaller diameter closed end (34), and the closed end (34) of the movable member (32) can pass through a reset. After the spring (35), the first slot (3〇2) of the pipe body (30) through the slot (3〇〇) enters the second slot (3〇2), and the piston (30) is sleeved with a piston. A washer (36) moves the movable member () selectively within the tubular body (3G). Let the return spring (35) provide a resilient biasing force to push the movable member (32) to automatically reverse after the displacement. 200927593 The piston ring (36) of the manifold is relatively open or closed (3). ), the barrier gas flows between the first slot [301] and the second slot (3〇2), and when the movable member, = push, the piston washer (36) of the movable member (32) can be moved away from $ (3〇〇), so that the gas can flow from the first slot J (slot J) (302) of the pipe body (3〇). Further, the gas inlet and outlet element L for gas injection is externally locked by the transfer container (1) to the base (1〇) socket (the pressure-pressure washer (38) and the one piece (37) are sequentially pressed to further: ❹ Φ , enter the transfer container (1) (10) clean gas to prevent the micro-substance from entering the transfer container (1). 物质. The substance is passed through the transfer container (1) the design of the two-person outlet element (3) to inject the transfer container (1) The internal airflow can flow flat along the reticle (10) without directly impacting the surface of the reticle (50), and the internal gas generates a circulating flow, so that the clean gas can be continuously injected into the transfer container (1) to form a positive pressure to avoid The external particles and the eucalyptus substance enter the 'at the same time, the released harmful substances are continuously taken out by the flowing gas' and are composed of a transfer container which does not damage the reticle pattern and can maintain the clean environment for controlling the internal environmental conditions for a long time. The occluded person venting structure. ~ Through the above design, the present invention is actually used, as shown in the fifth figure, the transfer container of the present invention can be applied to various types of devices (60), wherein The device (60) can be a mask management system I storage cabinet, reticle inflatable cabinet, reticle transport equipment, and process setting and exit unit [L〇ad, Unload], etc., the device (6 〇) at least j - set the transfer container (1) Plate (61) and two opening and closing elements (80) for charging and exhausting = wherein the carrier plate (61) has a plurality of meshes for preventing particle deposition to further maintain the cleanliness inside the device (60), 12 200927593 The carrier plate (61) is provided with at least one positioning component (62), so that the corresponding transfer carrier (1) can be stably fixed on the carrier plate (61), and then the carrier plate (61) is provided At least one detecting component (64) for the inductive transfer container (1) to be positioned on the carrier (61), and further on the device (6〇) and having a typical radio frequency identification system [RFID] reading Taking the component (63), the reading component (63) can correspond to the storage component (22) of the transfer container (丨), and the reading component (63) is for transmitting and reading the transfer mask (1) inner mask (5) 〇) related information;
Ο 至於裝置（60)之兩啟閉元件（8〇)係與移載容器（1 )之兩入出氣元件（30)對應連接，而前述啟閉元件（8〇 )可選擇性啟閉前述之入出氣元件（3)，該啟閉元件（8〇 )具有一管狀的管體（81)與一選擇性密閉管體（81)的 活動件（83)。其中管體（81)内部中段係形成有一供氣 體流經之中空隔片（810)，使管體（81)内部於隔片、'( 810)兩側分別形成一第一槽孔（811)與一第 W啟閉元件⑽之管體⑻第一 J二(係： 應前述之移載容器（1)，又活動件（83)兩端分別形成有 一較大徑之抵頂端（84)與一較小徑之閉合端（85)，使 活動件（83)可以閉合端（85)穿套一復位彈f (8 ，由管體（81)第一槽孔（811)穿經隔片（81〇)進入 ，槽孔（812)，並利用一活塞墊目（87)絲於該閉 (85)上，使活動件（83)可於管體（81)内浮動。詨 位彈簧（86)將提供-彈性㈣力，以推抵活動件（/ 上之活塞墊圈（87)密閉該管體（81)隔片（81〇)，供 隔氣體於第-槽孔⑽）與第二槽孔（812)間流動，且 當活動件（83)受外力推抵時，可讓活動件（83)活塞塾 13 200927593 圈（87)遠離隔片（810)，使得管體（81)之第一槽孔（ 811)與第二槽孔（812)相互連通，再者活動件（83)之 抵頂端（84)對應移載容器⑴的表面凸伸有—抵頂凸柱 (88 )。 於實際操作上’則係如第六、七及八圖所揭 容置有光罩（50)之移載容器⑴置入裝置（6〇)内，當 裝置（60)之檢知元件（64)感應移載容器（1)定位後， 可啟動讀取元件（63)對應存取該移載容器⑴之儲存元 件（22)内的光罩（50)相關資訊，同時令移載容器 〇之兩入出氣元件（3)與裝置（⑹之兩啟閉元^(器8〇()^ 時相對插接，而如第六、七圖所示，使得入出氣元件⑺ 之管體（30)可推抵啟閉元件（8〇)之活動件（84)，而 啟閉元件（80)活動件（84)之抵頂凸柱（88)可同步推 抵入出氣元件（3)之活動件（32)，使兩啟閉元件（8〇) 與兩入出氣π件（3)可同步開啟，讓乾淨氣體可於移載容 器〇)之底座（10)與殼罩（20)間的空間内流動。且由 於乾淨氣體於注入時，係由啟閉元件（8〇)經入出氣元件 © (3)注入底座（10)之承托件（15)迴氣空間（150)内 ’該乾淨氣體進-步由承托件（15)外側頂緣的通氣孔（ 151)進出，使氣流係沿著光罩（5〇)表面流動，而不致直 接衝擊光罩（50)表面的圖形，避免造成圖形的傷害，能 有效延長光罩（50)的使用壽命，且可將有害物質順利帶 走，而加速移載容器（1)中有害物質的釋出，而減少光罩 (50)凊洗與重新製作的次數，能有效降低營運成本； 再者透過移載容器（1)内部氣體可不斷的注入與排出 ，使移載容器（1)内部環境產生一氣體之猶環流動狀態， 200927593 ^ 如此可使移載容器（1)内部環境形成正壓，有效防止移載 容器（1)外部之微粒、水氣等有害物質進入。更甚者，可 依後續製程的需要，透過循環流動的氣體，預先控制移載 容器（1)内部的環境條件，如溼度、溫度等，以節省後續 製程的時間與成本。 綜上所述，本發明具有上述眾多的實用價值，因此 本發明確實為一新穎進步的創作，在相同的技術領域中 未見相同或近似的產品公開使用，故本發明已符合發明 專利的要件’乃依法提出申請’祈請早日賜准本案發明 ®專利。 ❿ 15 200927593 【圖式簡單說明】 第一圖：本發明移載容器之立體外觀示意圖。 第二圖：本發明之底座俯視分解示意圖，用以說明該移載 容器入出氣元件之構成及其相對關係。 第三圖：本發明之底座仰視分解示意圖。 第四圖：本發明移載容器之組成剖面示意圖。 第五圖：本發明移載容器實際運用之裝置外觀示意圖。 第六圖：本發明之移載容器與裝置接合前的局部平面剖視 圖。Ο As for the two opening and closing elements (8〇) of the device (60), the two inlet and outlet elements (30) of the transfer container (1) are connected correspondingly, and the opening and closing element (8〇) can selectively open and close the aforementioned The inlet and outlet element (3) has a tubular body (81) and a movable member (83) of a selectively closed tube (81). The inner middle portion of the pipe body (81) is formed with a hollow spacer (810) through which the gas flows, so that a first slot (811) is formed on the two sides of the spacer (81) inside the pipe body (81). The tube body (8) of the first W opening and closing element (10) is first J2 (the system: the moving container (1) and the movable member (83) are respectively formed with a larger diameter abutting end (84) and a closed end (85) of the smaller diameter allows the movable member (83) to pass through the reset end f (8) through the slit (8), and the first slot (811) of the tubular body (81) passes through the spacer ( 81〇) enters the slot (812) and utilizes a piston pad (87) wire on the closure (85) to allow the movable member (83) to float within the tubular body (81). The clamp spring (86) ) will provide - elastic (four) force to push the movable member (/ piston washer (87) to seal the tube (81) spacer (81 〇) for gas separation in the first slot (10)) and the second slot The hole (812) flows between, and when the movable member (83) is pushed by the external force, the movable member (83) piston 塾13 200927593 circle (87) is away from the spacer (810), so that the tube body (81) The first slot (811) and the second slot (812) communicate with each other Further, the abutting end (84) of the movable member (83) protrudes from the surface of the transfer container (1) with a top protruding post (88). In actual operation, it is as disclosed in the sixth, seventh and eighth figures. The transfer container (1) provided with the mask (50) is placed in the device (6〇), and when the detecting element (64) of the device (60) senses the positioning of the transfer container (1), the reading element can be activated (63). Corresponding to accessing the information about the mask (50) in the storage element (22) of the transfer container (1), and simultaneously making the two inlet and outlet elements (3) of the transfer container and the device (the two opening and closing elements of (6) The device 8〇()^ is relatively inserted, and as shown in the sixth and seventh figures, the tube body (30) of the inlet and outlet element (7) can be pushed against the movable member (84) of the opening and closing element (8〇), and The abutting protrusion (88) of the movable member (80) movable member (84) can be synchronously pushed into the movable member (32) of the air outlet member (3), so that the two opening and closing members (8〇) and the two inlet and outlet members π The piece (3) can be opened synchronously, so that the clean gas can flow in the space between the base (10) and the cover (20) of the transfer container, and the clean gas is injected and closed by the opening and closing element (8) 〇) Parts © (3) Injecting into the base (10) (15) in the return air space (150) 'The clean gas advances in and out from the vent hole ( 151 ) on the outer top edge of the receiving member ( 15 ) The airflow flows along the surface of the reticle (5〇) without directly impacting the pattern on the surface of the reticle (50), avoiding damage to the pattern, effectively extending the life of the reticle (50), and smoothing harmful substances. Take away, and accelerate the release of harmful substances in the transfer container (1), and reduce the number of times the mask (50) is washed and re-made, which can effectively reduce the operating cost; and then pass the internal gas of the transfer container (1) It can be continuously injected and discharged, so that the internal environment of the transfer container (1) generates a gas circulation state of the gas, 200927593 ^ This can make the internal environment of the transfer container (1) form a positive pressure, effectively preventing the transfer container (1) Excessive particulate matter, moisture and other harmful substances enter. What's more, the environmental conditions inside the transfer container (1), such as humidity and temperature, can be pre-controlled through the circulating gas according to the needs of subsequent processes to save time and cost of subsequent processes. In summary, the present invention has many of the above-mentioned practical values, and thus the present invention is indeed a novel and progressive creation, and the same or similar products are not disclosed in the same technical field, so the present invention has met the requirements of the invention patent. 'Issued to apply according to law', pray for the early grant of the invention patent. ❿ 15 200927593 [Simple description of the drawings] The first figure: a schematic view of the three-dimensional appearance of the transfer container of the present invention. The second drawing is a schematic exploded view of the base of the present invention for explaining the composition of the transfer container into and out of the gas and its relative relationship. Third: The bottom view of the base of the present invention is exploded. Figure 4 is a schematic cross-sectional view showing the composition of the transfer container of the present invention. Fig. 5 is a schematic view showing the appearance of a device for practical use of the transfer container of the present invention. Figure 6 is a partial plan cross-sectional view of the transfer container of the present invention before it is joined to the apparatus.
第七圖：本發明之移載容器與裝置接合後的局部平面剖視 圖。 第八圖：本發明移載容器於實際使用時之氣流示意圖。 【主要元件符號說明】 (1) 移載容器 (10) 底座 (11) 承座 (12) 螺帽件 (13) 金屬板 (14) 透孔 (15) 承托件 (150) 迴氣空間 (151) 通氣孔 (16) 抵持件 (20) 殼罩 (21) 外殼 (22) 儲存元件 (25) 内襯 (26) 壓抵件 (3) 入出氣元件 (30) 管體 ( 300) 隔片 (301) 第一槽孔 ( 302) 第二槽孔 ( 303) 螺紋段 (32) 活動件 (33) 抵頂端 (34) 閉合端 (35) 復位彈簧 (36) 活塞墊圈 16 200927593 (37) 濾、片 (38) 壓抵墊圈 (50) 光罩 (60) 裝置 (61) 承板 (62) 定位元件 (63) 讀取元件 (64) 檢知元件 (80) 啟閉元件 (81) 管體 (810) 隔片 (811) 第一槽孔 (812) 第二槽孔 (83) 活動件 (84) 抵頂端 (85) 閉合端 (86) 復位彈簧 (87) 活塞墊圈 (88) 抵頂凸柱Figure 7 is a partial plan cross-sectional view showing the transfer container of the present invention joined to the apparatus. Figure 8 is a schematic view of the gas flow of the transfer container of the present invention in actual use. [Main component symbol description] (1) Transfer container (10) Base (11) Seat (12) Nut member (13) Metal plate (14) Through hole (15) Support member (150) Return air space ( 151) Vent (16) Resisting member (20) Housing (21) Housing (22) Storage element (25) Lining (26) Pressing member (3) Inlet and outlet member (30) Tube body (300) Separation Sheet (301) First Slot (302) Second Slot (303) Threaded Section (32) Moving Member (33) Abutting Tip (34) Closed End (35) Return Spring (36) Piston Washer 16 200927593 (37) Filter, sheet (38) Pressure washer (50) Photomask (60) Unit (61) Carrier plate (62) Positioning element (63) Reading element (64) Detection element (80) Opening and closing element (81) Tube Body (810) Spacer (811) First Slot (812) Second Slot (83) Moving Member (84) Abutting Tip (85) Closed End (86) Return Spring (87) Piston Washer (88) Tab
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