M324285 八、新型說明： 【新型所屬之技術領域】 本創作係關於/種使光罩可保持潔淨度之技術領域， 具體而言係一種可減少外部環境微粒水氣進入移轉容器、 且有效控制移轉容器内環境的為使光罩保持潔淨之系統， 以達增加晶圓良率、提高生產量與降低成本之效。 【先前技術】 近年來，電子產品不斷朝向輕薄短小、高頻、高效能 等特性發展，而欲滿足這個產品發展的方向，用於電子產 中的核心晶片就需微小化與具有高效能，而欲使晶片微 小化與具高效能，則需使晶片上的積體電路線徑微細化， 因此現有的積體電路線徑已由早期的0.25微米發展至9〇〜 45奈米，而晶片上積體電路線徑的微細化的成敗主要在於 ^導體製程中的黃光微影製程技術，而其關鍵設備係在掃 插步進機【Scanner】與光罩【Reticie】； .但^别光罩於製作、清洗、操作與儲存、運輸的過卷 ，不論係置於容置光罩的移轉容器或無塵室的環境中， ^存在Ϊ不少的微粒、水氣、氣體、化學溶劑分子等有1 ，，：^些有害物質會附著於光罩表面，且在經長時間信 j晶圓曝光製程的加紐，會於光罩表面產生微粒附^ 製:霧化等現象’而直接影響到光罩於黃光微澤 圓=:=進而使光罩上的圖形失真，其會造成曰， ，^對增加清理與改善的時間，造成生產量降令 相對上也會提高營運的成本； M324285 因此，為了解決這個問題，業界開發有如美國專利第 US 4, 532, 970號與美國專利第US 4, 534, 389號之晶圓、光 置密閉移轉系統，以確保周圓環境之微粒不致進入緊鄰光 罩與晶圓的環境中。但以其中光罩為例，造成光罩污損的 原因除了微粒外，更進一步包含環境中的水氣、有毒氣體 、塑膠製移載容器所釋出的硫化物和製作光罩製程中殘留 或是光罩上圖形材質本身釋出的氨（NH4)、以及光罩清洗 過程中殘留的化學分子等有害物質，以結晶為例，其化學 式為（NH4) 2S04 ，此一結晶物由前述不同原因釋出的氨 (NH4)及硫酸根離子（S04)經高能量光源與環境水氣等 化合而成，因此經常發生光罩於清洗後，再經一段時間的 儲存後，只要一經黃光微影製程中的紫外線照射曝光就會 產生結晶的現象； 而造成此一問題的主要原因來自於儲存容器之氣密性 不足，使移載容器外的環境空氣中的微粒、水分子不斷的 滲入，而提供其化學反應所需的元素。再者該移載容器主 要係以塑膠製成，其材料會不斷的釋出硫化物等有害氣體 ，且氣體會滲透進入光罩，和光罩圖形材質本身或是移載 容器内氨氣產生反應，造成有害物質附著於光罩正反兩面 與光罩護膜表面。又光罩護膜主要係以鋁框為主，其需進 行鋁合金的硫酸陽極處理，使鋁框表面產生硫酸根離子殘 留的問題。 故為了解決這些問題，業界開發有於移載容器上加裝 充、填氣的結構，可將乾淨的惰性氣體注入該移載容器内 以擠出有害氣體，同時進一步提升該移載容器的氣密性， 以防止外部微粒進入、且防止乾淨的惰性氣體流失，如我 6 M324285 國專利公告第223680號及第 移載容器結構的改變，來提古& 164號等’其均在透過該 構上進行氣密性的改良是一=移栽容器的氣密性，但於結 開發、製模與組裝的成本，員，大的工程，不僅需要增加 積等因素的影響，其並.無法到材質、蓋合力與接觸面 載容器内的氣體仍然會&漸沪到完全氣密的效果，因此移 ，因此移載容器在經‘時間二，/由於微粒與水分子極小 質仍會進入該移载容器内，失:竣，外部環境中的有害物 的擺置移載容器材質和光罩其保護作用。再者長時間 漸釋出，其一樣會造 二，枒質中的有害物質仍會逐 晶等，進,損、霧化與結 Μ、. 平產里與成本。 所以在目剷的光罩管理系 進出料的順序與儲存時門笼’、初$，不論係軟體的設計、 光罩早進早出的原則別的設計，把握 重新經過清洗才能進入製程，無形間並f 提高其維持光罩潔淨的成本。 里的不便’也 換言之，如能提供-種可長時間維持移载中光罩潔 度的裝置或系統’則不僅克服前述光罩清淨後儲存時的 損間題，增加光罩管理的便利性，且可有效達到提升良率 、增加產量與降低成本之效。 ^ 爭W π… ^ ……u ^ 淨度的問題，進一步提升光罩的潔淨度 有鑑於此，本創作即在於解決上述光罩無法長時間保 持潔淨的問題，而經由本創作人長期從事相關產業的研發 與製作經驗’經不斷努力的改良，終於.力開發—種為^ 光罩保持潔淨之系統’藉以克服現有光罩無法長時間維捭 7 M324285 【新型内容】 《解決問題的技術手段》 鄰空間潔淨度的為使光罩保持潔時間維持先罩相 存過程中，可劇綠粒、物使得光罩在儲 无罩賴表面，進而提升晶圓製作的良率。 解飞 光罩ί掊、3作另在提:共一種可控制光罩相鄰環境的為 Μ經山、、毳淨之系統，藉以加速光罩移載容器内有害物質 的釋出，同時有效控制光罩相鄰環境的溼度與溫度，進二 步減少光罩運用於後續製程中的穩定性。 基於此’本創作主要係透過下列的技術手段來具體實 現前述的目的與效能；其包含有··至少一移轉'容器，其具 有一可選擇性啟閉之容置空間，該容置空間可供設置一光 罩’且移轉容器上設有至少一連通容置空間與外部之進氣 單元’移轉容器上另設有至少一連通容置空間與外部之出 氣單元’其中進氣單元與出氣單元具有可防止移轉容器閉 合時容置空間内氣體溢出之選擇性氣密功能； 至少—裝置，其具有至少一可承載前述移轉容器之容 置結構’容置結構具有至少一對應移轉容器進氣單元之充 氣單元’且容置結構並具有至少一對應移轉容器出氣單元 之排氣單元； 使得移轉容器與光罩相鄰容置空間環境内的氣體形成 一種循環流動，讓乾淨氣體可不斷的注入該與光罩相鄰之 容置空間、並且不斷的排出，令該與光罩相鄰之容置空間 形成正壓’可防止外部有害物質進入前述之容置空間内’ M324285 同時帶走前述容置空間内的有害物質，進一步得控 置空間的環境條件。 ""〜各 《解決問題所達成的功效》 經由前述技術手段的實現，使得本創作至少具有 的效能與功效增進： ^ 下列 1、 透過本創作的循環充氣設計，使光罩相鄰的 器内保持正壓狀態，因此外部的微粒、水分子等無法各 該移載容器内，故應用於本創作之光罩移轉容器可不 別強調其氣密度，仍能有效地確保移轉容器内環境的二、、泰 度，如此可降低移載容器的設計、製造與組裝成本。^淨 2、 由於本創作可將移載容器内水分子、微粒與 質迅速帶出，並錢注人乾淨的氣體，使該光罩相二 長時間維持潔淨，減少光罩表面之微粒附著與霧化、 等現象，P方止後續製程時光罩發生不可預期的， 效提升晶圓的良率，且減少光罩清洗與重新的=有 可增加產量，並降低營運成本。 f間’ 3、 又本創作透過不斷循環的乾淨氣體，可牛 移轉容器材質中硫化物與氨氣等有害物質的釋=加速 不同製程的需要’預先透過注人的氣體控制其⑽=依 如溼度、溫度、甚至特殊製程氣體或物暫莖、、衣兄， 製程的處理餘，其-樣可以提升良率與降低營後續 4、 承前所述，因本創作可長時間維持 環境的潔淨度與敎度，故在儲存光料不=罩相鄰 -原則，如早進早出等原則，且減少重新、、c限定某 可增進光罩管理的便利性’進一步降低管;與=成= 9 M324285 以下並舉一較佳實施例，同時配合不同圖式及圖號， 對本創作做進一步之說明，讓熟悉本技術領域者能對本創 作有更詳細的瞭解： 【實施方式】 叫參照第一圖至第三圖所示，本創作為使光罩保持潔 淨之系統係包含有至少一裝置（1)與至少一移載容器（'2 )，該移載容器（2)係用於容置、保護光罩（3〇)【如第 四圖所示】，而裝置⑴可供容置、運輸前述之移載容器 2)，其中裝置（1)可為光罩管理系統儲存櫃、光罩充 氣樞光罩運輸設備、以及製程設備光罩進、出單元等， 而移载容器（2)則為供容置、移動、儲存光罩之塑膠盒、 金屬盒等盒體’且移載容器（2)具有—相鄰光罩之環境空 間，M324285 VIII. New Description: 【New Technical Fields】 This is a technical field that enables the reticle to maintain cleanliness. Specifically, it can reduce the external environment of particulate moisture into the transfer container and effectively control it. Transfer the environment inside the container to keep the mask clean, to increase wafer yield, increase throughput and reduce cost. [Prior Art] In recent years, electronic products have been developing toward thin, short, high-frequency, high-efficiency, etc., and in order to meet the development direction of this product, the core chips used in electronic production need to be miniaturized and highly efficient. In order to make the wafer miniaturized and highly efficient, the integrated circuit wire diameter on the wafer needs to be refined, so the existing integrated circuit wire diameter has been developed from the early 0.25 micron to 9 〇 to 45 nm, and on the wafer. The success of the miniaturization of the integrated circuit wire diameter lies mainly in the yellow light lithography process technology in the conductor process, and its key equipment is in the sweeping stepper [Scanner] and the photomask [Reticie]; The rolls of production, cleaning, handling, storage and transportation, whether in the environment of a transfer container or a clean room that houses the reticle, there are many particles, water vapor, gas, chemical solvent molecules, etc. There are 1 , , : ^ some harmful substances will adhere to the surface of the mask, and in the long time letter j wafer exposure process of the button, will produce particles on the surface of the mask: atomization and other phenomena directly affect To the mask in Huang Guangwei Zeyuan =:=In turn, the pattern on the reticle is distorted, which will cause 曰, ^ to increase the cleaning and improvement time, resulting in a decrease in production, which will also increase the operating cost; M324285 Therefore, in order to solve this problem The industry has developed a wafer, optically mounted closed transfer system such as U.S. Patent No. 4,532,970 and U.S. Patent No. 4,534,389, to ensure that particles in the surrounding environment do not enter the vicinity of the mask and crystal. In a round environment. However, in the case of the photomask, the cause of the viscous fouling is in addition to the particles, and further includes the moisture in the environment, the toxic gas, the sulfide released by the plastic transfer container, and the residue in the process of making the mask or It is ammonia (NH4) released from the pattern material on the mask, and harmful substances such as chemical molecules remaining in the mask cleaning process. Taking crystallization as an example, the chemical formula is (NH4) 2S04, and the crystal is different for the above reasons. The released ammonia (NH4) and sulfate ion (S04) are combined with high-energy light source and environmental moisture, so the mask often occurs after cleaning, and after a period of storage, as long as it is in the yellow lithography process. The ultraviolet radiation exposure causes crystallization; the main cause of this problem is that the airtightness of the storage container is insufficient, so that the particles and water molecules in the ambient air outside the transfer container are continuously infiltrated, thereby providing The elements required for the chemical reaction. Furthermore, the transfer container is mainly made of plastic, and the material will continuously release harmful gases such as sulfides, and the gas will penetrate into the reticle, and react with the reticle pattern material or the ammonia in the transfer container. Harmful substances are attached to the front and back sides of the reticle and the surface of the reticle film. The mask film is mainly made of aluminum frame, which needs to be treated with anodized aluminum alloy to cause residual sulfate ions on the surface of the aluminum frame. Therefore, in order to solve these problems, the industry has developed a structure for charging and filling gas on the transfer container, and a clean inert gas can be injected into the transfer container to extrude harmful gas, and the gas of the transfer container is further improved. Density, in order to prevent the entry of external particles and prevent the loss of clean inert gas, such as the change of the structure of the transfer of the container of the No. 223680 and the transfer container, I mention that the ancient & 164 et al. The improvement of the airtightness is the airtightness of the transplanting container, but the cost of the development, molding and assembly of the knot, the staff, and the large project need not only increase the influence of factors such as accumulation, but also cannot The material, the cover force and the gas in the contact surface carrier will still & the effect of the valve will be completely airtight, so it will move, so the transfer container will enter the time after the second time, due to the extremely small particles and water molecules. In the transfer container, the loss: 竣, the presence of harmful substances in the external environment, the material of the transfer container and the protective effect of the reticle. In addition, it will be released gradually for a long time, and the same will result in two. The harmful substances in the enamel will still crystallize, etc., and will be damaged, atomized and smeared, and the production and cost. Therefore, in the order of the shovel management of the eye shovel and the storage of the door cage, the initial $, regardless of the design of the soft body, the design of the mask early and early exit, grasp the re-washing to enter the process, invisible And f increase the cost of maintaining the glare clean. Inconvenience in the 'in other words, if it can provide a device or system that can maintain the cleanness of the mask during the long period of time', it not only overcomes the damage problem when the mask is cleaned, but also increases the convenience of mask management. And can effectively achieve the effect of improving yield, increasing production and reducing costs. ^ 争W π... ^ ......u ^ The problem of clarity, to further improve the cleanliness of the reticle. In view of this, the creation is to solve the problem that the reticle can not be kept clean for a long time, and the creator has long been engaged in related The industry's R&D and production experience 'continued efforts to improve, finally. Developed - the kind of ^Photomask keep clean system' to overcome the existing mask can not be long-term maintenance 7 M324285 [New content] "Technical means to solve the problem The cleanliness of the adjacent space is to keep the reticle clean and maintain the process of the first cover. The green granules and objects make the reticle cover the surface of the hood, thereby improving the yield of the wafer. The solution of the fly-off ray 掊 3, 3 is another mention: a system that can control the adjacent environment of the reticle is a system of Μ 山 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The humidity and temperature of the adjacent environment of the hood are used to reduce the stability of the reticle for subsequent processes. Based on this, the present invention mainly implements the aforementioned purposes and effects through the following technical means; it comprises at least one transfer container having a selectively openable and accommodating space, the accommodating space A reticle can be disposed and the transfer container is provided with at least one air absorbing unit that communicates with the accommodating space and the outside. The transfer container is further provided with at least one air venting unit that communicates with the accommodating space and the outside. The air outlet unit has a selective airtight function for preventing gas from overflowing in the accommodating space when the transfer container is closed; at least, the device has at least one accommodating structure capable of carrying the transfer container, and the accommodating structure has at least one correspondence Transferring the inflating unit of the container air intake unit and accommodating the structure and having at least one exhaust unit corresponding to the air outlet unit of the transfer container; such that the transfer container and the gas in the accommodating space environment of the reticle form a circulating flow, The clean gas can be continuously injected into the accommodating space adjacent to the reticle, and continuously discharged, so that the accommodating space adjacent to the reticle forms a positive pressure' External harmful substances enter the above-mentioned accommodating space. M324285 At the same time, the harmful substances in the above-mentioned accommodating space are taken away, and the environmental conditions of the space are further controlled. ""~Effects of Solving the Problem Through the implementation of the aforementioned technical means, the creation has at least the effectiveness and efficacy enhancement: ^ The following 1, through the creation of the cycle of inflatable design, the reticle adjacent The positive pressure state is maintained in the device, so that external particles, water molecules, and the like cannot be transferred into the container. Therefore, the reticle transfer container used in the present invention can effectively ensure the inside of the transfer container without paying attention to the gas density. The environment, the second, the degree, can reduce the design, manufacturing and assembly costs of the transfer container. ^Net 2, because this creation can quickly bring out the water molecules, particles and quality in the transfer container, and pay a clean gas to keep the reticle phase clean for a long time, reducing the adhesion of particles on the surface of the reticle. Atomization, etc., P will stop the subsequent process when the mask is unpredictable, improve the yield of the wafer, and reduce the mask cleaning and re-sale = increase production and reduce operating costs. f between the 3, and this creation through the continuous circulation of clean gas, can be transferred to the container material, the release of harmful substances such as sulfide and ammonia = accelerate the need of different processes 'pre-injection of gas to control it (10) = Such as humidity, temperature, and even special process gas or material temporary stem, clothing brother, the processing of the process, it can improve the yield and reduce the camp follow-up 4, as stated before, because this creation can maintain environmental cleanliness for a long time Degree and twist, so in the storage of light does not = cover adjacent - principle, such as early entry and early exit and other principles, and reduce re-, c limit can improve the convenience of the management of the mask 'further reduce the tube; and = into = 9 M324285 The following further exemplifies a preferred embodiment, and further explains the present creation with different drawings and drawing numbers, so that those skilled in the art can have a more detailed understanding of the creation: [Embodiment] Referring to the first figure As shown in the third figure, the system for keeping the reticle clean includes at least one device (1) and at least one transfer container ('2) for accommodating, Protective mask (3〇)【 As shown in the fourth figure, the device (1) can accommodate and transport the aforementioned transfer container 2), wherein the device (1) can be a reticle management system storage cabinet, a reticle inflatable reticle transport device, and a process The device is moved into and out of the unit, and the transfer container (2) is a plastic case, a metal case, etc. for housing, moving, and storing the photomask, and the transfer container (2) has an adjacent mask. Environmental space,
一而關於本創作較佳實施例之詳細構成，則仍請參看第 二二及三圖所示者，本創作之裝置⑴係以可進行充、 氣之充氣櫃櫃體（10)為主要實施例， 則為光罩進出對應製程設備之盒體⑽）為主要載;^例(;2) :中裝置⑴之充氣櫃櫃體（1G)係具有—由複數縱 二：桿組成之框架（11)與至少一供承載移載容器⑴之 =構上5)，而框架（11)外侧具有複數封閉所置容 用的側板（12) ’再者框架（11)並具有複 櫃門板（13)，供移載容器（2)進、出該 3 (二：又該櫃體（1G)於各容置結構（⑸上設有 ^充乳早70 (18)與至少一排氣單元（19)，其中充 M324285 、排氣單元（18)具有選擇性啟閉之功能，容置結構（15 )具有一供承載移載容器（2)之承載隔板乂16)，且承載 隔板（16)上形成有複數網孔（16〇)，以減少微粒之沉積 、且保持充氣櫃櫃體（10)内部的潔淨度，又承載隔板（ 16)上設有至少一檢知元件（161)，供感應移載容器（2 )就定位後啟動前述之充、排氣單元（18) (19)，再者 谷置結構（15)上設有一典型無線射頻識別系統之讀取元 件（Π)，該讀取元件（17)可供傳輸與讀取移載容器（2 .)内光罩（30)相關資訊，又前述具選擇性啟閉功能之充 、排氣單元（18) (19)可為單向閥件； 而移載容器（2)之盒體（20)具有至少一進氣單元（ 26 )與至少一出氣單元（27)，該盒體（2〇 )係由可相對 選擇性蓋合與開啟之一承座（21)與一殼罩（22)所組成 ，且承座（21)與殼罩（22)間形成有一供容置光罩（3〇 )之谷置空間（25)【如第四圖所示】，再者前述進氣單 元（26)係設於盒體（2〇)承座（21)對應前述裝置 充氣單元（18)處，進氣單元（26)並連通盒體（2〇)内 ，之容置空間（25)，供將由充氣單元〇8)注入之乾淨 氣體導入盒體（20)容置空間（25)内，且進氣單元（26 )，可選擇性產生氣密作用，以防止容置空間（25)内之乾 =氣體由進氣單元（26)溢出。又前述出氣單元（27) ^ 设於盒體（20)殼罩（22)對應前述裝置（1)排氣單元（ 19)處，而出氣單元（27)並連通盒體（2〇)内部之容置 空7(25)，供將盒體（20)容置空間（25)内的氣體由 排氣單元（19)導出，又出氣單元（27)可選擇性產生氣 密作用，以防止容置空間（25)内之乾淨氣體由出氣單元 11 M324285 (%)任思溢出，另盒體（2Q)上設有—典型無線射頻識 別系統之儲存元件（28)，該儲存元件（28)可供記錄移 載容器（2)内光罩（30)之相關資訊； 透過上述的設計，使得容置於移載容器（2)可利用盒 [(20)進、出氣單元（26) ( 27)與裝置⑴充、排氣 單兀(19)，使與光罩（3〇)相鄰環境的氣體形成 種循環流動，讓乾淨氣體可不斷的注入盒體（2〇)容置 空間（25)内、且不斷的排出，令光罩（3〇)相鄰環境形 成正壓，以避免外部微粒與有害物質進入，同時可帶走有 害物質與控制光罩（30)相鄰環境，而組構成一為使光罩 保持潔淨之系統者。 經由上述之說明，本創作於實際運用時，則係如第一 圖〜第四圖所揭示者，則容置有光罩（3〇)之移載容器（2 )盒體（20)置入裝置（1)櫃體（1〇)内部，當盒體（2〇 )置於櫃體（10)之對應容置結構（15)時，可利用容置 結構（15)上的檢知元件（ι61)感應，並啟動讀取元件（ Π)對應讀取盒體（20)上之儲存元件（28)，以記錄盒 體（20)内光罩（30)的相關資訊，且當盒體（2〇)就定 位時，盒體（20)承座（21)之進氣單元（26)適對應與 裝置（1)之充氣單元（18)連接，而盒體（2〇)殼罩（22 )之出氣單元（27)則與裝置（1)對應之排氣單元 連接，使得乾淨氣體可不斷的注入盒體（2〇)與光罩（3〇 )相鄰的容置空間（25)之環境中，且進一步不斷的由該 容置空間（25)排出，讓與光罩（30)相鄰的環境且有一 循環流動的氣體，如此可令光罩（30)相鄰環境形成正壓 ，有效防止外部微粒與有害物質進入與光罩（3〇)相鄰的 12For the detailed construction of the preferred embodiment of the present invention, please refer to the second and third figures. The device (1) of the present invention is mainly implemented by a gas-filled inflatable cabinet (10). For example, the case (10) for the reticle in and out of the corresponding process equipment is the main load; ^ (2): the inflatable cabinet (1G) of the middle device (1) has a frame composed of a plurality of vertical two: rods ( 11) and at least one for carrying the transfer container (1) = 5), and the outer side of the frame (11) has a plurality of side plates (12) for closing the contents of the container (11) and the frame (11) and the door panel (13) ), for the transfer container (2) to enter and exit the 3 (two: the cabinet (1G) in each housing structure ((5) is provided with ^ milking early 70 (18) and at least one exhaust unit (19 The charging unit M324285 and the exhaust unit (18) have the function of selectively opening and closing, and the accommodating structure (15) has a supporting partition 乂16) for carrying the transfer container (2), and the supporting partition (16) a plurality of meshes (16 turns) are formed to reduce the deposition of particles and maintain the cleanliness inside the inflatable cabinet (10), and at least one of the load-bearing partitions (16) The detecting component (161) is configured to activate the charging and exhausting unit (18) (19) after the positioning of the inductive transfer container (2), and a typical radio frequency identification system is provided on the valley structure (15). a reading element (Π) for transmitting and reading information about the inner mask (30) of the transfer container (2.), and the charging and exhausting unit having the selective opening and closing function (18) (19) may be a one-way valve member; and the casing (20) of the transfer container (2) has at least one air intake unit (26) and at least one air outlet unit (27), the casing (2〇) The utility model is composed of a socket (21) and a casing (22) which can be selectively closed and opened, and a hood is formed between the bearing seat (21) and the casing (22). 〇) the valley space (25) [as shown in the fourth figure], and the air intake unit (26) is provided in the box body (2) socket (21) corresponding to the device inflation unit (18) The air intake unit (26) is connected to the accommodating space (25) of the casing (2) for introducing the clean gas injected by the inflatable unit 〇8) into the accommodating space (25) of the casing (20). And intake unit (26) Selectively generating an airtight effect to prevent dry within the accommodating space (25) = gas (26) by overflow of the intake unit. Further, the foregoing air outlet unit (27) is disposed in the casing (20), the casing (22) corresponds to the exhaust unit (19) of the device (1), and the air outlet unit (27) communicates with the inside of the casing (2). The space 7 (25) is accommodated, and the gas in the housing (20) housing space (25) is led out by the exhaust unit (19), and the air outlet unit (27) selectively generates airtightness to prevent the capacitance. The clean gas in the space (25) is overflowed by the air outlet unit 11 M324285 (%), and the other box (2Q) is provided with a storage element (28) of a typical radio frequency identification system, and the storage element (28) can be For recording the information about the inner mask (30) of the transfer container (2); through the above design, the container can be accommodated in the transfer container (2) [[20] inlet and outlet unit (26) (27) And the device (1) charging and exhausting unit (19), so that the gas adjacent to the environment of the reticle (3 〇) forms a circulating flow, so that the clean gas can be continuously injected into the housing (2 〇) accommodating space (25) Internal and continuous discharge, so that the adjacent environment of the mask (3〇) forms a positive pressure to avoid the entry of external particles and harmful substances, and at the same time can take away harmful substances and control The cover (30) adjacent to the environment, and a group consisting of the mask is kept clean by the system. Through the above description, when the present invention is actually used, as disclosed in the first to fourth figures, the transfer container (2) containing the mask (3) is placed (20). Inside the cabinet (1) cabinet (1〇), when the box body (2〇) is placed in the corresponding accommodating structure (15) of the cabinet body (10), the detecting component on the accommodating structure (15) can be utilized ( Ii 61) sense and activate the reading element (Π) corresponding to the storage element (28) on the reading box (20) to record information about the mask (30) in the box body (20), and when the box body ( 2〇) When positioning, the air intake unit (26) of the socket (21) of the casing (20) is adapted to be connected to the inflatable unit (18) of the device (1), and the casing (2〇) casing (22) The outlet unit (27) is connected to the exhaust unit corresponding to the device (1), so that the clean gas can be continuously injected into the housing space (25) adjacent to the housing (2〇) and the mask (3〇). In the environment, and further continuously discharged from the accommodating space (25), the environment adjacent to the reticle (30) has a circulating gas, so that the adjacent environment of the reticle (30) forms a positive pressure. Effectively prevent outside Particles and harmful substances into the mask (3〇) adjacent 12
M324285 =速，(3:;鄰環境中的有害物質， 的環境條件，如渥度、釋显出度等進一步可控制光罩⑽）相鄰 環流動的二ί:與^環境可透過循 無法逸入诗從I —。谩微拉、水分子等外部有害物質 ⑴間移動的時致3容器(2)於不同裝置 光罩（3〇)移轉容=致衫響其内部環境條件，因此 有效地特別賴其氣密度，仍能 組最成本。又由於本創作可將移載 有或釋出的衫㈣帶出，故該光罩（ 箱杰读衣兄可長時間維持潔淨，並能依不同製程的需要 丄預先透過注人的氣體控制其内部環境，因此在本創作可 長時間維持與控制衫（3G)相鄰環境的潔淨度與穩定度 下、，儲存光罩時可不需受特別條件限制，而能且減少重新 清洗與重新製作的次數’如此可增進光罩（30)管理的便 峨峨升晶圓 藉此’可以理解到本創作為一創意極佳之新型創作， 可大幅增進現有物之功效，且在姻的技術領域中未見相 同或近似的產品創作或公開使用，㈣具有功效的增進， 故本創作已符合難專财關「龍性」肖「進步性」的 要件，乃依法提出申請新型專利。 M324285 【圖式簡單說明】 第一圖 第二圖 ••本創作較佳實施例之裝置外觀立體圖。 .:創丄乍較佳實施例之裝置局部與移載容器的外 ^忍圖，用以說明本創作之構成及其相對關 第三圖 :本創作較佳實 使用的外觀圖 施例之移載容器置於裝置内實際 〇 第四圖 :本創作較佳實施例於實際使用時移乾淨氣體於 移載容器内循環流動的剖視圖。 < 【主要元件符號說明】 (1) 裝置 (10) 櫃體 (11) 框架 (12) 侧板 (13) 門板 (15) 容置結構 (16) 承載隔板 (160) 網孑L (161) 檢知元件 (17) 讀取元件 (18) 充氣單元 (19) 排氣單元 (2) 移轉容器 (20) 盒體 (21) 承座 (22) 殼罩 (25) 容置空間 (26) 進氣單元 (27) 出氣單元 (28) 儲存元件 (30) 光罩M324285 = speed, (3:; environmental conditions in the adjacent environment, environmental conditions such as temperature, release, etc. can further control the reticle (10)) I entered the poem from I. When the external harmful substances such as micro-pulls and water molecules move (1), the 3 containers (2) are transferred to different masks (3〇), and the internal environment conditions are caused by the movement of the masks, so the air density is particularly effective. , still can set the most cost. Since this creation can bring out the shirts (4) that have been transferred or released, the masks can be kept clean for a long time and can be controlled by the gas injected in advance according to the needs of different processes. The internal environment, therefore, in this creation can maintain the cleanliness and stability of the environment adjacent to the control shirt (3G) for a long time, and the reticle can be stored without the special conditions, and can reduce the re-cleaning and re-production. The number 'this can enhance the management of the reticle (30), so that it can be understood that this creation is an innovative new creation, which can greatly enhance the efficacy of existing products, and in the technical field of marriage No similar or similar product creation or public use has been found. (4) It has the effect of improving the efficiency. Therefore, this creation has met the requirements of “Dragonity” and “Progressiveness”. It is a law to apply for a new type of patent. M324285 BRIEF DESCRIPTION OF THE DRAWINGS The first figure is a second perspective view of the device according to the preferred embodiment of the present invention. The external portion of the device of the preferred embodiment and the transfer container are used to illustrate the present invention. The composition and the relative relationship of the third figure: the appearance of the preferred embodiment of the transfer container is placed in the device. The fourth figure: the preferred embodiment of the present invention moves the clean gas in the actual use. Cross-sectional view of the circulating flow in the carrier. < [Description of main components] (1) Installation (10) Cabinet (11) Frame (12) Side panel (13) Door panel (15) Housing structure (16) Carrying partition (160) Net L (161) Detection element (17) Reading element (18) Inflator unit (19) Exhaust unit (2) Transfer container (20) Case (21) Seat (22) Cover (25) accommodating space (26) air intake unit (27) air outlet unit (28) storage component (30) reticle