JP4539068B2 - Photomask storage container - Google Patents
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- JP4539068B2 JP4539068B2 JP2003349125A JP2003349125A JP4539068B2 JP 4539068 B2 JP4539068 B2 JP 4539068B2 JP 2003349125 A JP2003349125 A JP 2003349125A JP 2003349125 A JP2003349125 A JP 2003349125A JP 4539068 B2 JP4539068 B2 JP 4539068B2
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- 239000000126 substance Substances 0.000 claims description 19
- 239000000428 dust Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000007599 discharging Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 36
- 239000011261 inert gas Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000007547 defect Effects 0.000 description 5
- 238000012856 packing Methods 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010410 dusting Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Packages (AREA)
- Packaging Frangible Articles (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
本発明は、半導体装置用のフォトマスク、フォトマスク用ブランクス等の薄板状の製品を、保持して、搬送、又は保管をするためのフォトマスク収納容器に関する。 The present invention relates to a photomask storage container for holding, transporting or storing thin plate products such as photomasks for semiconductor devices and blanks for photomasks.
フォトマスク及びフォトマスク用ブランクスの製造工程は、クリーンルームの環境中、又は製造装置内のワークチャンバー内の環境中で基板が処理し、製造される。前記製造工程は、基板上にレジストを塗布する工程と、レジスト上に描画露光する工程と、現像処理工程及びエッチング処理工程と、レジストを剥膜する工程等複数の工程により構成されている。そのため、製造工程で使用する微量の薬品の成分が浮遊する環境下で、フォトマスク及びフォトマスク用ブランクスを処理し、一時保管することが通常である。前記環境中でフォトマスク及びフォトマスク用ブランクスを保管する場合、環境中に浮遊する種々の薬品の成分に汚染される問題がある。前記薬品の成分、例えば、アンモニア、アミン類等の塩基性物質、又は、ＮＯX及びＳＯXや有機酸等の酸性物質等が、前記基板上にパターン形成の際に使用する化学増幅型レジストや、レジスト塗布された基板表面に付着し、浸透し、レジスト寸法の変化や、レジスト膜の変化を引き起こし、欠陥となってしまう問題がある。 In the manufacturing process of the photomask and the photomask blank, the substrate is processed and manufactured in a clean room environment or an environment in a work chamber in a manufacturing apparatus. The manufacturing process includes a plurality of processes such as a process of applying a resist on a substrate, a process of drawing exposure on the resist, a developing process and an etching process, and a process of stripping the resist. For this reason, it is usual to process and temporarily store the photomask and photomask blanks in an environment in which a small amount of chemical components used in the manufacturing process float. When storing photomasks and photomask blanks in the environment, there is a problem of being contaminated by various chemical components floating in the environment. The chemical components such as ammonia, amines and other basic substances, or acid substances such as NO x and SO x and organic acids are chemically amplified resists used for pattern formation on the substrate. There is a problem in that it adheres to and penetrates the resist-coated substrate surface, causing a change in resist dimensions and a change in the resist film, resulting in a defect.
その対策として、窒素等の不活性ガスを充填できるフォトマスク収納容器、例えば、マスク用ＳＭＩＦ−ＰＯＤ（標準機械的インターフエース機構の統一規格のマスク用ボックス）が使用されている。標準機械的インターフエース機構の装置間では、ＳＭＩＦ−ＰＯＤを介して基板を投入及び受取と、ＳＭＩＦ−ＰＯＤによる装置間の移動を行うことが一般的な方法である（特許文献１参照）。 As a countermeasure, a photomask storage container that can be filled with an inert gas such as nitrogen, for example, a mask SMIF-POD (standard mechanical interface mechanism mask box) is used. Between the devices of the standard mechanical interface mechanism, it is a general method to insert and receive a substrate through the SMIF-POD and to move between the devices by the SMIF-POD (see Patent Document 1).
図３は、従来のフォトマスク収納容器の一例の全体図で、（ａ）は、斜視図であり、（ｂ）は側断面図である。図３（ａ）は、マスク用ＳＭＩＦ−ＰＯＤを説明するものであり、本体（１）上に、ガス供給口（２２）と、ガス排出口（２６）とが装備されている。載置台（８）上にはフォトマスク（２０）が収納されている。容器内部はパッキング（９、１９）を介して密封されている。図３（ｂ）では、ガス排出口（２６）は具備した逆止弁（７）により通常時は閉じている。一方ガス供給口（２２）では、常時開放され、外部環境より容器内部へ流入する外気は、具備する除塵フィルタ（４）により浮遊塵のみは除去されるが、ケミカル成分は処理出来ない構造である。 FIG. 3 is an overall view of an example of a conventional photomask storage container, in which (a) is a perspective view and (b) is a side sectional view. FIG. 3A illustrates the mask SMIF-POD, which is equipped with a gas supply port (22) and a gas discharge port (26) on the main body (1). A photomask (20) is accommodated on the mounting table (8). The inside of the container is sealed through packing (9, 19). In FIG. 3B, the gas discharge port (26) is normally closed by the check valve (7) provided. On the other hand, the gas supply port (22) is always open, and the outside air flowing into the container from the external environment has a structure in which only the suspended dust is removed by the dust removal filter (4), but the chemical component cannot be treated. .
マスク用ＳＭＩＦ−ＰＯＤは、窒素等の不活性ガスが充填出来る構造であり、ガス供給口とガス排出口が設けられている。この収納容器は、完全な密閉型ではないため、ガスの充填時以外では、すなわち、時間の経過につれて収納容器の外気のケミカル成分が容器内部に流入することによって、収納中の基板、例えばレジスト膜等へ悪影響を及ぼす問題がある。ガス供給口、ガス排出口のどちらにも除塵用フィルタは装着されているが、外気環境中のケミカル成分を除去するためのフィルタは装着されていない問題がある（特許文献２参照）。 The mask SMIF-POD has a structure that can be filled with an inert gas such as nitrogen, and is provided with a gas supply port and a gas discharge port. Since this storage container is not a completely sealed type, a substrate being stored, for example, a resist film, except when gas is filled, that is, when chemical components of the outside air of the storage container flow into the container as time elapses. There is a problem that adversely affects the above. Although a dust removal filter is attached to both the gas supply port and the gas discharge port, there is a problem that a filter for removing chemical components in the outside air environment is not attached (see Patent Document 2).
以下に公知文献を記す。
フォトマスク用ブランクス及びフォトマスクを製造又は保管時に、製造工程の環境中に存在浮遊するケミカル成分が、フォトマスク等基板を収納する収納容器の内部に流入しないフォトマスク収納容器を提供することにある。 It is an object of the present invention to provide a photomask storage container in which chemical components that exist and float in the manufacturing process environment do not flow into a storage container for storing a substrate such as a photomask when manufacturing or storing photomask blanks and photomasks. .
本発明の請求項１に係る発明は、半導体装置の製造に用いるフォトマスク用ブランクス及びフォトマスクの薄板状の製品を、１枚ずつ、製品の端部にて保持して、搬送、又は保管をするためのフォトマスク収納容器において、該フォトマスク収納容器は、本体と蓋体よりなり、前記製品を容器の該本体上に固定した状態で、該蓋体を合わせて容器内を密封することにより、前記製品を容器内に収納し、前記本体の底部には、前記容器の内部にガスを充填するためのガス供給口と、前記容器の内部から大気及び充填されたガスを容器の外部に排出するためのガス排気口を具備する。
そして、前記ガス供給口には、ケミカルフィルタ及び除塵フィルタが装着されており、前記排気口には、ガス充填時にのみ開き、それ以外のときには閉じている逆止弁と、除塵フィルタが装着される構造であることを特徴とするフォトマスク収納容器である。
The invention according to claim 1 of the present invention, a thin plate-like products of blanks and photomasks for photomasks used in the fabrication of semiconductor devices, one by one, and held at the end of the product, transport, or storage in the reticle pod for a the reticle pod is made of the body and the lid, in a state of fixing the said product on said body of the container, sealing the container to fit the lid Accordingly, to accommodate the product in the container, the bottom of the body has a gas supply port for filling the gas into the container, the air and the filling gas from the interior of the container to the outside of the container A gas exhaust port for discharging is provided.
The gas supply port is equipped with a chemical filter and a dust filter, and the exhaust port is fitted with a check valve that is open only when gas is filled and closed otherwise, and a dust filter. A photomask storage container having a structure.
本発明のフォトマスク収納容器を用いることにより、フォトマスク用ブランクス及びフォトマスクの製造環境において、フォトマスク用ブランクス、又はフォトマスクを収納する容器の内部に、製造環境中のケミカル成分が流入することを防止することが可能となり、その結果、容器内に保管したフォトマスク用ブランクス、又はフォトマスクにレジスト寸法の変化や、レジスト膜の変化が発生せず、欠陥不良の発生を回避することができた。さらに、欠陥不良が大幅に削減されたことにより製造コストの削減ができる効果があった。 By using the photomask storage container of the present invention, in the photomask blank and photomask manufacturing environment, chemical components in the manufacturing environment flow into the photomask blank or the container storing the photomask. As a result, there is no change in resist dimensions or resist film in photomask blanks or photomasks stored in the container, and the occurrence of defect defects can be avoided. It was. In addition, the manufacturing cost can be reduced due to the significant reduction in defect defects.
本発明のフォトマスク収納容器について、以下に具体的に説明する。図１は、本発明のフォトマスク収納容器一実施例を示す説明図であり、（ａ）は、全体の斜視図で、（ｂ）は側断面図である。 The photomask storage container of the present invention will be specifically described below. FIG. 1 is an explanatory view showing an embodiment of a photomask storage container according to the present invention, in which (a) is an overall perspective view and (b) is a side sectional view.
次に、図１（ａ）に示すフォトマスク収納容器では、本体と、蓋体よりなる構造である。本体及び蓋体の接触面は、パッキング材を介して容器内部を密閉する構造である。本体の四隅には載置台（８）が装備されている。載置台（８）上には、フォトマスク（２０）が収納され、蓋体（１０）のピン状の抑え冶具（１８）と前記載置台（８）とで固定されている。このため、保管、又は搬送時でも振動による異物は発生せず、異物付着も起こさずに清浄な状態が維持できる。更に本体及び蓋体のパッキング材（９）により容器の内部環境が密閉状態となっている。容器内部は、ガス供給口（２）より所定の不活性ガスを供給され、同時にガス排出口（６）から逆止弁（７）を介して排出されている。容器内部が所定の不活性ガスのみで充填された後、ガスの供給を停止し、さらに、逆止弁（７）が作動してガス排出口（６）の通気孔（５）が閉まる。フォトマスクを収納した容器内部では、常時、上記の状態で保管使用する。すなわち、ガス供給口（２）は常時、開放状態であり、ガス排出口（６）は常時閉鎖状態となる。容器内部のガス圧は経時により容器内部のガス気圧が低下すると外気を取り込み平均化する。このとき流入する外気は、具備するケミカルフィルタ（３）及び除塵フィルタ（４）によりケミカル成分及び浮遊塵は除去され、容器内部には常時清浄エアーのみ流入されるため、環境による汚染の影響が最小限に抑
制できる効果がある（図１（ｂ）参照）。
Next, the photomask storage container shown in FIG. 1A has a structure including a main body and a lid. The contact surfaces of the main body and the lid have a structure that seals the inside of the container via a packing material. There are mounting tables (8) at the four corners of the main body. A photomask (20) is accommodated on the mounting table (8), and is fixed by the pin-shaped holding jig (18) of the lid (10) and the mounting table (8). For this reason, foreign matter due to vibration does not occur even during storage or transportation, and a clean state can be maintained without causing foreign matter adhesion. Furthermore, the internal environment of the container is hermetically sealed by the packing material (9) for the main body and the lid. The inside of the container is supplied with a predetermined inert gas from the gas supply port (2) and is simultaneously discharged from the gas discharge port (6) via the check valve (7). After the inside of the container is filled with only a predetermined inert gas, the gas supply is stopped, and the check valve (7) is operated to close the vent hole (5) of the gas discharge port (6). The inside of the container containing the photomask is always stored and used in the above state. That is, the gas supply port (2) is always open, and the gas discharge port (6) is always closed. As the gas pressure inside the container decreases with time, outside gas is taken in and averaged. At this time, since the chemical components (3) and dust filters (4) remove the chemical components and airborne dust from the outside air that flows in, and only clean air always flows into the container, the influence of environmental pollution is minimal. There is an effect that can be suppressed to the limit (see FIG. 1B).
次に、本発明のフォトマスク収納容器による収納の方法を説明する。フォトマスクの収納の手順では、最初に、フォトマスクを収納するフォトマスク収納容器を準備し、前記容器を洗浄等により前準備をした。次に、本体の載置台上にフォトマスクを載置した。次に、蓋体を合体した。フォトマスクは、左右前後方向は前記載置台に具備した保持冶具により固定され、上下方向は蓋体の内部に具備したピン状の抑え冶具により固定した。すなわち、フォトマスクの端部により固定されて収納した。次に、本体と蓋体の接触部近傍を所定の方法で密封梱包した。次に、本体の供給口より窒素ガスを供給し、容器内部を充填しながら、所定の時間が経過後、窒素ガスの充填をとめた。以上の手順で収納作業が完了した。 Next, the storage method using the photomask storage container of the present invention will be described. In the procedure for storing the photomask, first, a photomask storage container for storing the photomask was prepared, and the container was pre-prepared by washing or the like. Next, the photomask was mounted on the mounting table of the main body. Next, the lid was united. The photomask was fixed by the holding jig provided in the mounting table in the left-right and front-back directions, and fixed in the vertical direction by a pin-like holding jig provided in the lid. That is, it was fixed and stored by the end of the photomask. Next, the vicinity of the contact portion between the main body and the lid was hermetically packed by a predetermined method. Next, nitrogen gas was supplied from the supply port of the main body, and filling of the nitrogen gas was stopped after a predetermined time while filling the inside of the container. The storage operation was completed by the above procedure.
図２は、本発明のフォトマスク収納容器を説明する部分側断面図で、（ａ）は、本体であり、（ｂ）は蓋体である。図２（ａ）は、本発明のフォトマスク収納容器の本体（１）であり、フォトマスク（２０）の基板を固定する４本の保持冶具を具備した載置台（８）を備えている。該載置台（８）上にフォトマスク（２０）を固定する。本体（１）は、本体の裏面から表面に貫通する通気孔（５）が２箇所に形成され、該通気孔の１つがガス供給口（２）であり、残りがガス排出口（６）として配置されている。前記ガス供給口（２）は、不活性ガスを容器内部に供給する役割を持ち、不活性ガス等の供給口の入口部にはケミカルフィルタ（３）を具備し、ガス供給口の通気口内を通過する外気のエアー、又はガス内のケミカル成分を、ケミカルフィルタで除去する。また、ガス供給口（２）は、常時開放の状態である。従って、外気から容器内部に流入する大気エアーはケミカル成分のないクリーンなエアーが供給される。前記ガス排出口は、ガス充填時初期に、外気と不活性ガスが混交したエアーを容器内部から外部へ排出する役割を持ち、不活性ガス等の排出口の出口部にはガス圧により駆動する逆止弁（７）を具備し、ガス排出口（６）の通気口（５）内を不活性ガスが混交した外気が通過する場合、すなわち、高内圧の場合は開放させ、不活性ガスを停止する場合、すなわち低内圧の場合は閉鎖する。更に、ガス供給口（２）及びガス排出口（６）ともに、除塵フィルタ４）が装備され、容器内に流入する外気及び不活性ガスより浮遊塵を除去する。蓋体と接触する近傍の本体表面では、パッキング材（９）が配置されている。 FIG. 2 is a partial side sectional view for explaining the photomask storage container of the present invention, in which (a) is a main body and (b) is a lid. FIG. 2A shows the main body (1) of the photomask storage container of the present invention, which includes a mounting table (8) having four holding jigs for fixing the substrate of the photomask (20). A photomask (20) is fixed on the mounting table (8). The main body (1) is formed with two vent holes (5) penetrating from the back surface to the front surface of the main body, one of the vent holes being a gas supply port (2) and the rest being a gas discharge port (6). Is arranged. The gas supply port (2) has a role of supplying an inert gas into the container, and has a chemical filter (3) at the inlet of the supply port for the inert gas, etc. A chemical filter removes the air component of the outside air or the chemical component in the gas. The gas supply port (2) is always open. Accordingly, clean air having no chemical components is supplied as atmospheric air flowing into the container from outside air. The gas outlet has a role of discharging air mixed with outside air and inert gas from the inside of the container to the outside at the initial stage of gas filling, and is driven by gas pressure at the outlet of the outlet of inert gas or the like. When a check valve (7) is provided and outside air mixed with inert gas passes through the vent (5) of the gas discharge port (6), that is, when the internal pressure is high, the inert gas is opened. When stopping, that is, when the internal pressure is low, it is closed. Furthermore, both the gas supply port (2) and the gas discharge port (6) are equipped with a dust removal filter 4), which removes suspended dust from outside air and inert gas flowing into the container. A packing material (9) is disposed on the surface of the main body near the lid.
図２（ｂ）は、本発明のフォトマスク収納容器の蓋体（１０）であり、本体（１）と合体し、容器内部を外力から保護し、且つ密封状態にする役割がある。蓋体（１０）の内側にピン状の抑え冶具（１８）を備えている。 FIG. 2B shows a cover (10) of the photomask storage container of the present invention, which is combined with the main body (1) to protect the inside of the container from external force and to have a sealed state. A pin-shaped holding jig (18) is provided inside the lid (10).
フォトマスク収納容器に用いる材料では、材料表面よりの発塵が無く、熱的及び電気的な性質が安定した熱可塑性プラスチックス、例えばポリカーボネート、ポリアミド等を適宜選択する。 As a material used for the photomask storage container, a thermoplastic plastic having no thermal dusting from the material surface and stable thermal and electrical properties, such as polycarbonate and polyamide, is appropriately selected.
１…本体
２…ガス供給口
３…ケミカルフィルタ
４…除塵フィルタ
５…通気孔
６…ガス排出口
７…逆止弁
８…載置台
９…パッキング材
１０…蓋体
１８…ピン状の抑え冶具
２０…フォトマスク
DESCRIPTION OF SYMBOLS 1 ... Main body 2 ... Gas supply port 3 ... Chemical filter 4 ... Dust removal filter 5 ... Vent hole 6 ... Gas exhaust port 7 ... Check valve 8 ... Mounting base 9 ... Packing material 10 ... Cover 18 ... Pin-shaped restraining jig 20 ... Photomask
Claims (1)
The lamellar products blanks and photomasks for photomasks used in the fabrication of semiconductor devices, one by one, and held at the end of the product, transport, or in the reticle pod for storage, the reticle pod is made of the body and the lid, in a state of fixing the said product on said body of the container, by sealing the container to fit the lid, retract and said the product into the container , the bottom of the body, comprises a gas supply port for filling the gas into the container, a gas exhaust port for discharging the atmosphere and filled gas to the outside of the container from the inside of the container The gas supply port is equipped with a chemical filter and a dust filter, and the exhaust port is open only when gas is filled, and closed at other times, and a dust filter is installed. In Reticle pod, characterized in that.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003349125A JP4539068B2 (en) | 2003-10-08 | 2003-10-08 | Photomask storage container |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003349125A JP4539068B2 (en) | 2003-10-08 | 2003-10-08 | Photomask storage container |
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| Publication Number | Publication Date |
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| JP2005115033A JP2005115033A (en) | 2005-04-28 |
| JP4539068B2 true JP4539068B2 (en) | 2010-09-08 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2003349125A Expired - Lifetime JP4539068B2 (en) | 2003-10-08 | 2003-10-08 | Photomask storage container |
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Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007086363A (en) * | 2005-09-21 | 2007-04-05 | Hoya Corp | Mask blank housing case, method for housing mask blank, and mask blank housed body |
| JP2007091296A (en) * | 2005-09-29 | 2007-04-12 | Hoya Corp | Mask blank storage container, storing method of mask blank and stored body of mask blank |
| JP5058735B2 (en) * | 2006-09-15 | 2012-10-24 | Ｈｏｙａ株式会社 | Mask blank manufacturing method and mask manufacturing method |
| JP4859065B2 (en) * | 2007-10-23 | 2012-01-18 | 信越ポリマー株式会社 | Substrate storage container |
| JP2009227305A (en) * | 2008-03-24 | 2009-10-08 | E-Sun Precision Industrial Co Ltd | Shielding type air input/output structure of mask transfer container |
| JP2012078562A (en) * | 2010-10-01 | 2012-04-19 | Toppan Printing Co Ltd | Mask case and mask cleaning method |
| CN110758912A (en) * | 2019-11-11 | 2020-02-07 | 中国科学院上海技术物理研究所 | Optical load automatic feedback nitrogen charging protection device |
| KR102242026B1 (en) * | 2020-06-29 | 2021-04-19 | 피엠씨글로벌 주식회사 | Photomask case in which nitrogen gas is injected into the interior space |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1159778A (en) * | 1997-06-09 | 1999-03-02 | Mitsubishi Materials Shilicon Corp | Wafer case |
| JP2001053136A (en) * | 1999-08-06 | 2001-02-23 | Dainippon Printing Co Ltd | Case |
| JP2003038622A (en) * | 2001-08-02 | 2003-02-12 | Nippon Muki Co Ltd | Air cleaner and photocatalytic unit |
| JP2003170969A (en) * | 2001-12-06 | 2003-06-17 | Shin Etsu Polymer Co Ltd | Storing container |
-
2003
- 2003-10-08 JP JP2003349125A patent/JP4539068B2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1159778A (en) * | 1997-06-09 | 1999-03-02 | Mitsubishi Materials Shilicon Corp | Wafer case |
| JP2001053136A (en) * | 1999-08-06 | 2001-02-23 | Dainippon Printing Co Ltd | Case |
| JP2003038622A (en) * | 2001-08-02 | 2003-02-12 | Nippon Muki Co Ltd | Air cleaner and photocatalytic unit |
| JP2003170969A (en) * | 2001-12-06 | 2003-06-17 | Shin Etsu Polymer Co Ltd | Storing container |
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| JP2005115033A (en) | 2005-04-28 |
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