KR102242026B1 - Photomask case in which nitrogen gas is injected into the interior space - Google Patents

Photomask case in which nitrogen gas is injected into the interior space Download PDF

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KR102242026B1
KR102242026B1 KR1020200079049A KR20200079049A KR102242026B1 KR 102242026 B1 KR102242026 B1 KR 102242026B1 KR 1020200079049 A KR1020200079049 A KR 1020200079049A KR 20200079049 A KR20200079049 A KR 20200079049A KR 102242026 B1 KR102242026 B1 KR 102242026B1
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South Korea
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case
nitrogen gas
photomask
injection
injected
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KR1020200079049A
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Korean (ko)
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이현만
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피엠씨글로벌 주식회사
이현만
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control

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  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Environmental & Geological Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Toxicology (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)

Abstract

The present invention relates to a photomask case provided with an injection means and a discharge means so that nitrogen gas can be injected into an inner space of the case. More specifically, the present invention relates to a photomask case in which nitrogen gas is injected into an inner space, wherein a mask inside can be made safe by injecting the nitrogen gas into the case, the mask can be protected from chemicals used to produce the case, the inner space of the case is not affected by the temperature due to the nitrogen gas, and air is prevented from entering from the outside during transportation.

Description

내부공간에 질소가스가 주입되는 포토마스크 케이스{Photomask case in which nitrogen gas is injected into the interior space}Photomask case in which nitrogen gas is injected into the interior space}

본 발명은 포토마스크 케이스에 관한 것으로써, 케이스의 내부공간에 질소가스가 주입될 수 있도록 주입수단과 배출수단이 구비된 포토마스크 케이스에 관한 것이다.The present invention relates to a photomask case, and relates to a photomask case provided with an injection means and a discharge means so that nitrogen gas can be injected into the inner space of the case.

최근 들어 LCD나 PDP 등의 디스플레이 장치의 제조 공정에 있어서, 패널면 부착수의 증가는 제조 비용 절감의 방법으로서 일반화되고, 패널용 마더 기판의 사이즈가 대형화되는 경향에 있다.In recent years, in the manufacturing process of display devices such as LCDs and PDPs, an increase in the number of panel surfaces has become common as a method of reducing manufacturing costs, and the size of the mother substrate for panels tends to increase in size.

이와 관련하여, LCD나 PDP 등의 디스플레이 제조 공정에서 역시, 블랭크마스크(blankmask) 및 패턴 전사에 이용되는 포토마스크(photomask)도 대형화되는 추세에 있다.In this regard, in a display manufacturing process such as an LCD or a PDP, a blank mask and a photomask used for pattern transfer are also trending to increase in size.

이때, 상기 블랭크마스크는 포토마스크의 원재료로 사용되고, 포토마스크는 반도체 칩 생산시 사진의 원판과 같은 역할을 하는 것으로서 크롬 등의 물질이 도포된 유리판에 다양한 방법으로 패턴회로가 설계된 일종의 설계도면이라 할 수 있다.At this time, the blank mask is used as a raw material for a photomask, and the photomask serves as a photo original plate when producing semiconductor chips, and is a kind of design drawing in which a pattern circuit is designed in various ways on a glass plate coated with a material such as chromium. I can.

이때, 과학 기술이 발전함에 따라 반도체 칩 역시 고집적화가 되었으며, 마스크에 형성된 패턴도 점차 집적화되면서 더욱 미세해지고 고정밀성과 고밀집성을 요구하게 되었다.At this time, with the development of science and technology, semiconductor chips have also become highly integrated, and patterns formed on masks are gradually integrated, resulting in finer, higher precision and high density requirements.

이러한 마스크를 생산하여 보관함에 있어서, 상기 마스크는 마스크의 미세한 패턴 회로가 손상되지 않도록 외부의 이물질, 케이스 자체의 파티컬 플라스틱 수지 아웃가스, 정전기 등에 노출되지 않도록 해야함은 물론, 외부 충격으로부터도 보호되어야 함은 당연하다.In the production and storage of such a mask, the mask should not be exposed to external foreign substances, particulate plastic resin outgas of the case itself, static electricity, etc., so as not to damage the fine pattern circuit of the mask, and should be protected from external shocks. It is natural.

따라서, 마스크의 종류 및 크기에 따라, 여러 종류의 마스크 보관케이스를 각각 이용하여 마스크를 안정적으로 보관할 수 있도록 한다.Therefore, depending on the type and size of the mask, various types of mask storage cases are used, respectively, so that the mask can be stably stored.

그러나, 케이스를 이동 시에는 내부의 공기로 인해 마스크의 안전성이 저하되고, 패턴 회로가 손상되는 일이 빈번하게 발생되며, 항공, 해상, 육상 및 운송과정에서 오염된 공기가 유입될 수 있는 등 많은 문제점이 발생되었다.However, when moving the case, the safety of the mask is deteriorated due to the air inside, the pattern circuit is frequently damaged, and contaminated air may be introduced during air, sea, land, and transportation. A problem has occurred.

이에 종래에는 등록번호 20-0384059호의 '포토마스크 보관케이스'와, 등록번호 10-1511599호의 '마스크 컨테이너' 및 공개번호 10-2011-0056765호의 '반도체 및 LCD공정용 마스크 보관케이스'가 개시되었지만, 여전히 개선되지 않고 있는 실정이다.Thus, in the past,'photomask storage case' of registration number 20-0384059,'mask container' of registration number 10-1511599 and'mask storage case for semiconductor and LCD process' of publication number 10-2011-0056765 were disclosed. The situation is still not improving.

본 발명은 상기한 종래기술의 문제점을 해결하기 위해 안출해낸 것으로써, 케이스 내부에 질소가스를 주입하여 내부의 마스크를 안전화시킬 수 있고, 케이스 제작에 사용된 화학제로부터 마스크를 보호할 수 있으며, 질소가스로 인해 케이스의 내부공간이 온도에 영향을 받지 않고, 운송과정에서 외부로부터 공기가 유입되지 않도록 하는 내부공간에 질소가스가 주입되는 포토마스크 케이스를 제공함에 주안점을 두고 기술적 과제로서 완성해낸 것이다.The present invention was devised to solve the problems of the prior art described above, by injecting nitrogen gas into the case to make the inner mask safe, and to protect the mask from the chemical agent used in the case manufacturing, It was completed as a technical task with the focus on providing a photomask case in which nitrogen gas is injected into the inner space that prevents air from entering from outside during the transportation process, and the internal space of the case is not affected by temperature due to nitrogen gas. .

이에 본 발명은 내부에 포토마스크를 수납하여 수평으로 지지할 수 있도록 바닥면에 상호 이격되어 위치하는 다수의 하부지지수단이 구비된 하부케이스와, 상기 하부케이스와 결합하여 밀폐된 내부공간을 제공하되 바닥면에 상기 하부지지수단과 대응하는 위치에 다수의 상부지지수단이 각각 형성되어 상기 상, 하부지지수단 사이에 포토마스크를 개재시켜 지지하는 상부케이스로 구성된 포토마스크 케이스에 있어서, 상기 케이스의 일 측에는 질소가스를 주입하는 주입수단이 구성되고, 타 측에는 케이스 내부공간의 공기 및 질소가스가 배출되는 배출수단이 구성되어 있는 것을 특징으로 하는 내부공간에 질소가스가 주입되는 포토마스크 케이스을 그 기술적 특징으로 한다.Accordingly, the present invention provides a lower case provided with a plurality of lower supporting means spaced apart from each other on the floor so that the photomask can be accommodated and horizontally supported, and a sealed internal space by combining with the lower case. In a photomask case comprising an upper case for supporting by interposing a photomask between the upper and lower support means by forming a plurality of upper support means at positions corresponding to the lower support means on a bottom surface, one of the case A photomask case in which nitrogen gas is injected into an internal space, characterized in that an injection means for injecting nitrogen gas is configured on the side, and a discharge means for discharging nitrogen gas and air in the inner space of the case is configured on the other side. do.

본 발명인 내부공간에 질소가스가 주입되는 포토마스크 케이스에 따르면, 케이스의 내부공간에 질소가스를 주입할 수 있어 포토마스크에 대한 안전성이 확보되고, 케이스 제작에 사용되는 화학제로부터 포토마스크를 보호할 수 있으며, 케이스의 내외부 온도차가 발생되지 않아 포토마스크에 대한 수축 및 팽창작용을 억제할 수 있고, 운송 시 외부로부터 공기의 유입을 방지할 수 있는 등 그 효과가 큰 발명이다.According to the photomask case in which nitrogen gas is injected into the inner space of the present inventor, nitrogen gas can be injected into the inner space of the case, thereby ensuring safety for the photomask and protecting the photomask from chemicals used in case manufacturing. It is an invention that has a great effect, such as suppressing contraction and expansion of the photomask as there is no temperature difference between the inside and outside of the case, and preventing the inflow of air from the outside during transportation.

도 1은 본 발명인 케이스를 나타내는 정면도
도 2는 본 발명인 하부케이스를 나타내는 평면도
도 3은 도 2에 포토마스크가 위치된 것을 나타내는 평면도
도 4는 본 발명인 케이스의 내부에 포토마스크가 위치된 것을 하부케이스에서 나타낸 측면도
도 5는 본 발명인 케이스의 내부에 포토마스크가 위치된 것을 상부케이스에서 나타낸 측면도
도 6은 본 발명의 구성 중 주입수단과 배출수단을 나타내는 단면도
도 7은 도 6의 작동을 나타내는 단면도
도 8은 본 발명의 구성인 주입수단과 배출수단에 음이온발생기가 구성된 것을 나타내는 단면도
도 9는 본 발명의 구성인 주입수단과 배출수단에 탭이 구성된 것을 나타내는 단면도
도 10은 도 8에 음이온발생기가 결합되는 것을 나타내는 단면도1 is a front view showing an inventor case
2 is a plan view showing a lower case of the present inventor
3 is a plan view showing a photomask positioned in FIG. 2
Figure 4 is a side view showing the photomask is located inside the case of the inventor from the lower case
Figure 5 is a side view showing from the upper case that the photomask is located inside the case of the inventors
6 is a cross-sectional view showing an injection means and a discharge means in the configuration of the present invention
7 is a cross-sectional view showing the operation of FIG. 6
Figure 8 is a cross-sectional view showing that the negative ion generator is configured in the injection means and the discharge means constituting the present invention
Figure 9 is a cross-sectional view showing that the tab is configured in the injection means and discharge means constituting the present invention
10 is a cross-sectional view showing that an anion generator is coupled to FIG. 8

이하, 첨부되는 도면과 관련하여 상기 목적을 달성하기 위한 본 발명의 바람직한 구성 및 작용에 대해 도 1 내지 도 10을 참고로 설명하면 다음과 같다.Hereinafter, with reference to the accompanying drawings, a preferred configuration and operation of the present invention for achieving the above object will be described with reference to FIGS. 1 to 10.

본 발명인 내부공간에 질소가스가 주입되는 포토마스크 케이스는 내부에 포토마스크(20)를 수납하여 수평으로 지지할 수 있도록 바닥면에 상호 이격되어 위치하는 다수의 하부지지수단(110)이 구비된 하부케이스(100)와, 상기 하부케이스(100)와 결합하여 밀폐된 내부공간을 제공하되 바닥면에 상기 하부지지수단(110)과 대응하는 위치에 다수의 상부지지수단(210)이 각각 형성되어 상기 상, 하부지지수단(110, 210) 사이에 포토마스크(20)를 개재시켜 지지하는 상부케이스(200)로 구성된 포토마스크 케이스(10)에 있어서,The photomask case in which nitrogen gas is injected into the inner space of the present inventor is provided with a plurality of lower supporting means 110 spaced apart from each other on the bottom surface so that the photomask 20 is accommodated and horizontally supported therein. The case 100 and the lower case 100 are combined to provide a sealed inner space, but a plurality of upper support means 210 are formed on the bottom surface at a position corresponding to the lower support means 110, respectively, so that the In the photomask case 10 consisting of an upper case 200 supporting the photomask 20 between the upper and lower supporting means 110 and 210,

상기 케이스(10)의 일 측에는 질소가스를 주입하는 주입수단(300)이 구성되고, 타 측에는 케이스(10) 내부공간의 공기 및 질소가스가 배출되는 배출수단(400)이 구성되어 있다.One side of the case 10 includes an injection means 300 for injecting nitrogen gas, and the other side includes a discharge means 400 for discharging air and nitrogen gas in the inner space of the case 10.

상기한 본 발명에 대해 보다 상세히 설명하면,When explaining in more detail the above-described invention

우선, 포토마스크 케이스(10)는 상부케이스(200), 하부케이스(100)가 상호 결합되어 내부가 밀봉되도록 잠금수단이 구성되어 있다.First, the photomask case 10 is configured with a locking means such that the upper case 200 and the lower case 100 are coupled to each other to seal the interior thereof.

또한, 상, 하부케이스(100, 200)의 내부에는 포토마스크(20)가 위치되는데, 상기 포토마스크(20)가 위치될 수 있도록 상, 하부지지수단(110, 210)이 각각 다수개 구성된다.In addition, a photomask 20 is located inside the upper and lower cases 100 and 200, and a plurality of upper and lower supporting means 110 and 210 are respectively configured so that the photomask 20 can be located. .

본 발명의 핵심은 상기 케이스(10)의 내부공간에 질소가스를 주입하는 주입수단(300)과, 내부의 공기 및 질소가스를 외부로 배출하는 배출수단(400)이 구성되는 것이다.The core of the present invention is to include an injection means 300 for injecting nitrogen gas into the inner space of the case 10 and a discharge means 400 for discharging the air and nitrogen gas inside the case 10 to the outside.

상기 주입수단(300), 배출수단(400)은 케이스(10)의 외부에서부터 내부공간까지 관통되며 연결된다.The injection means 300 and the discharge means 400 are connected through the case 10 from the outside to the inner space.

부싱(320, 420)이 위치된 부분은 케이스(10)의 외측에 구성되고, 패킹(340, 440)이 위치된 부분은 케이스(10)의 내측에 구성된다.The portion where the bushings 320 and 420 are positioned is configured on the outside of the case 10, and the portion where the packing 340 and 440 is positioned is configured on the inside of the case 10.

상기 주입수단(300)과 배출수단(400)은 동일한 구조와 구성요소를 가지며 이송로(310, 410), 부싱(320, 420), 스프링(330, 430), 패킹(340, 440) 및 오링(350, 450)이 구성된다.The injection means 300 and the discharge means 400 have the same structure and components, and transfer paths 310 and 410, bushings 320 and 420, springs 330 and 430, packings 340 and 440, and O-rings (350, 450) is composed.

이송로(310, 410)는 질소가스가 주입되거나 또는 배출 시에는 케이스(10) 내부의 공기와 질소가스가 배출된다.When nitrogen gas is injected or discharged in the transfer paths 310 and 410, air and nitrogen gas inside the case 10 are discharged.

부싱(320, 420)은 상기 이송로(310, 410) 내에서 외부의 힘에 의해 슬라이딩한다.The bushings 320 and 420 slide by an external force within the transfer paths 310 and 410.

스프링(330, 430)은 일 측이 부싱(320, 420)과 연결되고 타 측이 패킹(340, 440)과 연결된다.One side of the springs 330 and 430 is connected to the bushings 320 and 420 and the other side of the springs 330 and 430 is connected to the packings 340 and 440.

상기 스프링(330, 430)은 패킹(340, 440)을 부싱(320, 420) 방향으로 당김하여 상기 패킹(340, 440)이 주입수단(300) 및 배출수단(400)에 밀착하게 되어 외력으로 부싱(320, 420)을 밀림 하지 않을 시에는 패킹(340, 440)이 열림되지 않도록 하여 케이스(10) 내부공간의 질소가스가 외부로 배출되는 것을 방지한다.The springs 330 and 430 pull the packings 340 and 440 in the direction of the bushings 320 and 420 so that the packings 340 and 440 come into close contact with the injection means 300 and the discharge means 400 by external force. When the bushings 320 and 420 are not pushed, the packings 340 and 440 are not opened to prevent nitrogen gas in the inner space of the case 10 from being discharged to the outside.

패킹(340, 440)은 스프링(330, 430)과 연결되며 주입수단(300 및 배출수단(400)을 관통한 후 상기 주입수단(300) 및 배출수단(400)의 저면을 닫힘 한다.The packings 340 and 440 are connected to the springs 330 and 430, and after passing through the injection means 300 and the discharge means 400, the bottom surfaces of the injection means 300 and the discharge means 400 are closed.

상기 패킹(340, 440)이 주입수단(300) 및 배출수단(400)의 저면에 닿는 부분은 수평이 되도록 형성되거나 또는 오목한 형상으로 형성된다.A portion of the packings 340 and 440 that contacts the bottom surfaces of the injection means 300 and the discharge means 400 is formed to be horizontal or formed in a concave shape.

상기 오목한 형상은 패킹(340, 440)이 닫힘 시에 내외부로 배출가스의 주입 또는 배출 방지를 극대화하기 위함이다.The concave shape is for maximizing the prevention of injection or discharge of exhaust gas inside and outside when the packings 340 and 440 are closed.

오링(350, 450)은 이송로(310, 410)의 입구 내측에 구성되며 부싱(320, 420)의 외측과 닿게 된다.The O-rings 350 and 450 are configured inside the inlet of the transfer paths 310 and 410 and come into contact with the outside of the bushings 320 and 420.

이는 케이스 내부의 질소가스가 외부로 배출되는 것을 방지하기 위함이다.This is to prevent the nitrogen gas inside the case from being discharged to the outside.

탭(360, 460)은 주입수단(300) 및 배출수단(400)을 케이스(10)에 연결 구성하기 위함이다.The tabs 360 and 460 are for connecting the injection means 300 and the discharge means 400 to the case 10.

이에 상기 탭(350, 460)이 연결되는 부분의 케이스(10)에는 상기 탭(360, 460)과 대응되도록 형성되어 있어야 한다.Accordingly, the case 10 at the portion to which the tabs 350 and 460 are connected must be formed to correspond to the tabs 360 and 460.

주입수단(300)의 경우, 사용자가 질소가스를 주입하기 위해 주입부재를 상기 부싱(320)이 위치된 곳으로 누름 하면 눌림 된 부싱(320)으로 인해 발생되는 여유공간으로 질소가 케이스(10)의 내부공간으로 주입된다.In the case of the injection means 300, when the user presses the injection member to the position where the bushing 320 is positioned to inject nitrogen gas, nitrogen is introduced into the free space generated by the pressed bushing 320 and the case 10 Is injected into the inner space of

이때, 부싱(320)과 연결된 스프링(330)의 유동함에 따라 상기 스프링(330)과 연결된 패킹(340)이 열림되어 질소가스가 유입될 수 있도록 하였다.At this time, as the spring 330 connected to the bushing 320 flows, the packing 340 connected to the spring 330 is opened so that nitrogen gas can be introduced.

반대로 배출수단(400)의 경우, 케이스(10)의 내부공간으로 질소가스를 주입하기 전에 내부공간의 공기와 질소가스를 배출하는데, 사용자가 부싱(420)을 누름 하면 스프링(430)과 패킹(440)이 상기 부싱(420)과 같이 유동함에 따라 내부공간의 공기와 질소가스가 외부로 배출하게 된다.Conversely, in the case of the discharge means 400, the air and nitrogen gas of the inner space are discharged before the nitrogen gas is injected into the inner space of the case 10. When the user presses the bushing 420, the spring 430 and the packing ( As 440 flows with the bushing 420, air and nitrogen gas in the internal space are discharged to the outside.

상기 주입수단(300)의 일측에는 정전기 방지를 위해 음이온발생기(500)가 구성되어 있다.One side of the injection means 300 is configured with an ion generator 500 to prevent static electricity.

상기 음이온발생기(500)는 케이스(10)가 무정전소재로 제조됨에 따라 질소가스로 인해 발생할 수 있는 정전기를 미연에 방지하고자 함이다.The negative ion generator 500 is intended to prevent static electricity that may occur due to nitrogen gas as the case 10 is made of an uninterruptible material.

상기 음이온발생기(500)는 도 8에 도시된 바와 같이 주입수단(300)에 일체형으로 구성되거나 또는 도 9, 10에 도시된 바와 같이 별도의 탭(361)을 형성하고, 상기 탭(361)과 연결되는 별도의 음이온발생기(500)가 구성된다.The negative ion generator 500 is configured integrally with the injection means 300 as shown in FIG. 8 or forms a separate tab 361 as shown in FIGS. 9 and 10, and the tab 361 and A separate negative ion generator 500 is configured to be connected.

상기 별도의 음이온발생기(500)에는 질소가스 주입을 위한 관통공과 밀폐력을 위한 오링이 구성된다.The separate negative ion generator 500 includes a through hole for injecting nitrogen gas and an O-ring for sealing force.

상기 별도의 음이온발생기(500)가 주입수단(300)에 연결 시에는 음이온발생기(500)의 오링과 주입수단(300)의 오링(350)이 닿게 되는데, 상기 음이온발생기(500)의 오링 일 측에는 보호부재가 별도로 구성된다.When the separate negative ion generator 500 is connected to the injection means 300, the O-ring of the negative ion generator 500 and the O-ring 350 of the injection means 300 come into contact with one side of the O-ring of the negative ion generator 500. The protective member is configured separately.

상기 보호부재는 주입수단(300)의 상부면(도면을 기준으로 한 위치임)과, 음이온발생기(500)의 저면이 닿게 됨에 따라 별도의 이물질이 발생하거나 파손되는 것을 미연에 방지하고 상호 맞닿는 오링의 밀폐력을 더욱더 극대화하기 위함이다.The protective member prevents the occurrence or damage of separate foreign substances as the upper surface of the injection means 300 (the position is based on the drawing) and the bottom surface of the negative ion generator 500 come into contact with each other, and the O-rings come into contact with each other. It is to further maximize the sealing power of the product.

상기 케이스(10)의 일 측에는 내부공간과 관통을 이루며 구성되어 압력을 표시하는 압력조절기가 구성되어 있다.At one side of the case 10, a pressure regulator configured to penetrate the inner space and display pressure is configured.

상기 압력조절기는 케이스(10) 내부의 압력을 사용자가 확인하기 위함으로 과도한 압력에 의해 포토마스크(20)가 파손되는 것을 미연에 방지하기 위함이다.The pressure regulator is for the user to check the pressure inside the case 10 and to prevent the photomask 20 from being damaged by excessive pressure.

또한, 상기 주입수단(300)과 배출수단(400)에는 각각의 덮개가 구성된다.In addition, the injection means 300 and the discharge means 400 are configured with respective covers.

상기 덮개는 내부에 완충력을 가진 보호부재가 구성된다.The cover is configured with a protective member having a buffering force therein.

또한, 상기 덮개는 단일로 구성되거나 또는 2개의 덮개가 적층을 이루며 덮개를 구성할 수도 있다.In addition, the cover may be configured as a single unit, or two covers may be stacked to form a cover.

상기 적층을 이루는 덮개는 각각의 덮개를 상호 연결하는 연결부가 형성되어 있으며 하부에 위치된 덮개가 주입수단(300) 및 배출수단(400)에 1차적으로 덮힘 되고, 상부에 위치된 덮개는 상기 하부 덮개를 감싸며 2차적으로 덮힘 되도록 하였다.The cover forming the stack is formed with a connection part for interconnecting each cover, and the cover located at the lower part is primarily covered by the injection means 300 and the discharging means 400, and the cover located at the top is the lower part. Covering the cover was made to be covered secondarily.

상기와 같은 본 발명에 따르면, 케이스의 내부공간에 질소가스를 주입할 수 있어 포토마스크에 대한 안전성이 확보되고, 케이스 제작에 사용되는 화학제로부터 포토마스크를 보호할 수 있으며, 케이스의 내외부 온도차가 발생되지 않아 포토마스크에 대한 수축 및 팽창작용을 억제할 수 있고, 운송 시 외부로부터 공기의 유입을 방지할 수 있다.According to the present invention as described above, since nitrogen gas can be injected into the inner space of the case, safety for the photomask can be secured, the photomask can be protected from chemicals used in case manufacturing, and the temperature difference inside and outside the case is As it does not occur, contraction and expansion of the photomask can be suppressed, and air inflow from the outside during transportation can be prevented.

10 : 케이스 20 : 포토마스크
100 : 하부케이스 110 : 하부지지수단
200 : 상부케이스 210 : 상부지지수단
300 : 주입수단 310 : 이송로 320 : 부싱
330 : 스프링 340 : 패킹 350 : 오링
360, 361 :탭
400 : 배출수단 410 : 이송로 420 : 부싱
430 : 스프링 440 : 패킹 450 : 오링
460 : 탭
500 : 음이온발생기10: case 20: photomask
100: lower case 110: lower support means
200: upper case 210: upper support means
300: injection means 310: transfer path 320: bushing
330: spring 340: packing 350: O-ring
360, 361: tap
400: discharge means 410: transfer path 420: bushing
430: spring 440: packing 450: O-ring
460: tab
500: negative ion generator

Claims (3)

내부에 포토마스크(20)를 수납하여 수평으로 지지할 수 있도록 바닥면에 상호 이격되어 위치하는 다수의 하부지지수단(110)이 구비된 하부케이스(100)와, 상기 하부케이스(100)와 결합하여 밀폐된 내부공간을 제공하되 바닥면에 상기 하부지지수단(110)과 대응하는 위치에 다수의 상부지지수단(210)이 각각 형성되어 상기 상, 하부지지수단(110, 210) 사이에 포토마스크(20)를 개재시켜 지지하는 상부케이스(200)와, 상기 상, 하부케이스(100, 200)에 연결되며 질소가스를 주입하는 주입수단(300) 및 공기와 질소가스를 배출하는 배출수단(400)으로 구성되되,
상기 주입수단(300)과 배출수단(400)에는 케이스(10)의 외부에서부터 내부공간까지 관통하며 연결되되 질소가스가 주입/배출되는 이송로(310, 410)와, 상기 이송로(310, 410) 내에서 외부의 힘으로 슬라이드하는 부싱(320, 420)과, 상기 부싱(320, 420)과 연결된 스프링(330, 430)과, 상기 스프링(330, 430)과 연결되며 이송로(310, 410)에서 외측으로 관통되어 외측면을 덮는 패킹(340, 440)과, 상기 이송로(310, 410)의 입구 내측에는 부싱(320, 420)의 외측과 닿는 오링(350, 450)과, 상기 주입수단(300)과 배출수단(400)의 외주에는 케이스(10)에 연결하기 위해 형성된 탭(360, 460) 및 상기 주입, 배출수단(300, 400)의 각각에는 덮개가 구성되고, 상기 케이스(10)의 일 측에는 내부의 압력을 표시하는 압력조절기가 구성된 포토마스크 케이스(10)에 있어서,
상기 패킹(340, 440)은 주입수단(300) 및 배출수단(400)과 닿는 부분이 오목한 형상으로 형성되고,
상기 주입수단(300)의 일측에는 별도의 탭(361)이 형성되며 상기 탭(361)과 연결되는 별도의 음이온발생기(500)가 구성되며,
상기 별도의 음이온발생기(500)에는 주입수단(300)의 오링(350)과 닿는 부분에 오링이 구성되고,
상기 주입수단(300) 및 배출수단(400)에 구성된 덮개의 내부에는 완충력을 가진 보호부재가 구성되어 있는 것을 특징으로 하는 내부공간에 질소가스가 주입되는 포토마스크 케이스.

A lower case 100 provided with a plurality of lower support means 110 spaced apart from each other on the floor so that the photomask 20 can be accommodated and horizontally supported therein, and the lower case 100 is combined To provide a sealed inner space, but a plurality of upper support means 210 are formed at positions corresponding to the lower support means 110 on the bottom surface, respectively, so that a photomask between the upper and lower support means 110 and 210 An upper case 200 supported by interposing 20, an injection means 300 connected to the upper and lower cases 100, 200 and for injecting nitrogen gas, and a discharge means 400 for discharging air and nitrogen gas. ),
Transfer paths 310 and 410 through which nitrogen gas is injected/discharged are connected to the injection means 300 and the discharge means 400 from the outside of the case 10 to the internal space, and the transfer paths 310 and 410 ) The bushings (320, 420) that slide with external force within, and the springs (330, 430) connected to the bushings (320, 420), and the springs (330, 430) are connected and the transfer paths (310, 410) ), the packing (340, 440) that penetrates outward to cover the outer surface, and O-rings (350, 450) contacting the outside of the bushings (320, 420) inside the inlet of the transfer path (310, 410), and the injection The outer circumference of the means 300 and the discharging means 400 includes tabs 360 and 460 formed to connect to the case 10 and a cover for each of the injection and discharging means 300 and 400, and the case ( In the photomask case 10 configured with a pressure regulator displaying the internal pressure on one side of 10),
The packing (340, 440) is formed in a concave shape in contact with the injection means (300) and the discharge means (400),
A separate tab 361 is formed on one side of the injection means 300 and a separate negative ion generator 500 connected to the tab 361 is configured,
In the separate negative ion generator 500, an O-ring is configured at a portion in contact with the O-ring 350 of the injection means 300,
A photomask case in which nitrogen gas is injected into an internal space, characterized in that a protective member having a buffering force is formed inside the cover formed of the injection means 300 and the discharge means 400.

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