200951042 九、發明說明： 【發明所屬之技術領域】 本發明隸屬一種半導用移載容器之進、排氣技術領域 ’具體而言係一種可選擇性對移載容器容置空間進排氣的 氣閥結構，藉以維持與控制移載容器内部的潔淨度與環境 條件。 【先前技術】 按，受到電子產品不斷朝向輕薄短小、高頻、高效能 0 等特性發展的影響，用於電子產品中的核心晶片就必需更 進一步的微小化與高效能化，而欲使晶片微小化與具高效 能則需使晶片上的積體電路線徑微細化，以容入更多的積 體電路及元件，因此其積體電路線徑已發展至90〜45奈米 ，再者為了增加同一晶圓【Wafer】上的晶片【Die】數量 ’晶圓尺寸也由早期的3 p寸、4叶、6叶、8对進展到12叫* ’故一旦製程中因微粒或有害物質，而使晶圓或光罩出現 不良品時’對薇商的損失也將大幅的擴大，因此如何進一 步的提高製程良率，是各半導體廠商不斷思考的方向。 -然當晶圓或光罩表面附著微粒或產生霧化時’其會直 接影響到晶圓的良率，因此其製程中需在極高等級的無塵 室中進行。但在半導體的無塵室中，不論係清洗、製作、 錢鑛、黃光微影或蝕刻等，其均需使用到很多的溶劑，而 這些有害物質在經過製程加熱或曝光等動作時’會與環境 中的水氣等產生化合作用，而於晶圓或光罩表面附著或產 生其他影響良率的附加物，為了解決這些問題，業界開發 有如美國專利第US 4, 532, 970號與美國專利第US 4, 534, 389號之晶圓、光罩密閉移轉系統，以確保微粒、水 200951042 氣等有害物質不致進入緊鄰光罩與晶圓的環境中。 但前述的密閉移轉系統並無法克服殘留於容器内之有 害物質所產生的問題。以光罩為例，造成光罩污損的原因 除了微粒外，更進一步包含環境中的水氣、有毒氣體、塑 膠製移載容器所釋出的硫化物和製作光罩製程中殘留或是 光罩上圖形材質本身釋出的氨（nh4+)、以及光罩清洗過程 . 中殘留的化學分子等有害物質，以結晶為例，其化學式為 (NKU) 2S〇4，此一結晶物由前述不同原因釋出的氨（NH4+) 及硫酸根離子（SOt)經高能量光源與環境水氣等化合而 ® 成，因此經常發生光罩於清洗後，再經一段時間的儲存後 ，只要一經黃光微影製程中的紫外線照射曝光就會產生結 晶的現象， 造成此一問題的主要原因來自於儲存容器之氣密性不 足，使移載容器外的環境空氣中的微粒、水分子不斷的滲 入，進而提供其化學反應所需的元素。再者該移載容器主 要係以塑膠製成，塑膠材料會不斷的釋出硫化物等有害物 質，且外部氣體會滲透進入光罩，和光罩圖形材質本身或 ❿ 是移載容器内氨氣產生反應，造成有害物質附著於光罩正 反兩面與光罩護膜表面。 為了解決這些問題，業界開發有於移載容器上加裝充 、填氣結構，如我國專利公告第1238804號與第M322056 號等，用以將乾淨的惰性氣體注入該移載容器内，並擠出 移載容器内的有害氣體，同時進一步提升該移載容器的氣 密性，以防止外部微粒進入，如我國專利公告第223680號 及第1262164號等，其均在透過該移載容器結構的改變， 來提高移載容器的氣密性。惟氣密性的改良是一項重大的 200951042 ΐ程蓋增加開發、製模與組裝的成本，且受到材 與蓋合接觸面積等因素的影響，移載容器Ϊ ，、因此移密的效果’甚至由這些充填氣的結構沒氣 與水分子氣體仍然會漸漸向外流失，由於微粒 境中如微間儲存後，外部環200951042 IX. Description of the Invention: [Technical Field] The present invention belongs to the field of intake and exhaust of a semi-transporting transfer container. Specifically, it is a selective inlet and exhaust of a transfer container accommodation space. The valve structure is used to maintain and control the cleanliness and environmental conditions inside the transfer container. [Prior Art] According to the development of electronic products, such as light and short, high frequency, high efficiency, etc., the core chips used in electronic products must be further miniaturized and highly efficient. Miniaturization and high-efficiency need to make the integrated circuit diameter on the wafer finer to accommodate more integrated circuits and components, so the integrated circuit diameter has been developed to 90~45 nm, and In order to increase the number of wafers on the same wafer [Wafer] [the size of the wafer is also advanced from the early 3 p inch, 4 leaf, 6 leaf, 8 pairs to 12 calls * ', so once the process is due to particles or harmful substances When the wafer or the mask is defective, the loss to Weishang will be greatly expanded. Therefore, how to further improve the process yield is a direction that semiconductor manufacturers are constantly thinking about. - When the surface of the wafer or reticle is attached with particles or fogging, it directly affects the yield of the wafer, so the process needs to be carried out in a very high-grade clean room. However, in the clean room of semiconductors, whether it is cleaning, fabrication, money mining, yellow lithography or etching, etc., it is necessary to use a lot of solvents, and these harmful substances will be in contact with the environment during process heating or exposure. In order to solve the problem, the water vapor and the like in the production of the water vapor and the like are attached to the surface of the wafer or the reticle, and other additives affecting the yield are developed. For example, U.S. Patent No. 4,532,970 and U.S. Patent No. 4, 534, 389 wafer, photomask closed transfer system to ensure that harmful substances such as particles and water 200951042 gas do not enter the environment close to the reticle and wafer. However, the aforementioned closed transfer system cannot overcome the problems caused by the harmful substances remaining in the container. In the case of a reticle, the cause of the viscous fouling is not only the particles, but also the moisture in the environment, the toxic gas, the sulphide released by the plastic transfer container, and the residual or light in the process of making the reticle. The ammonia (nh4+) released by the graphic material itself and the harmful substances such as chemical molecules remaining in the mask cleaning process are exemplified by crystallization, and the chemical formula is (NKU) 2S〇4, which is different from the above. The ammonia (NH4+) and sulfate ion (SOt) released by the cause are combined with the high-energy light source and the ambient water vapor. Therefore, the reticle is often washed and then stored for a period of time, as long as it is yellow lithography. The ultraviolet radiation exposure in the process causes crystallization, and the main cause of this problem is that the airtightness of the storage container is insufficient, so that the particles and water molecules in the ambient air outside the transfer container are continuously infiltrated, thereby providing The element required for its chemical reaction. Furthermore, the transfer container is mainly made of plastic, the plastic material will continuously release harmful substances such as sulfide, and external gas will penetrate into the reticle, and the reticle pattern material itself or ❿ is the ammonia gas generated in the transfer container. The reaction causes harmful substances to adhere to the front and back sides of the reticle and the surface of the reticle film. In order to solve these problems, the industry has developed a charging and filling structure on the transfer container, such as China Patent Publication No. 12388004 and No. M322056, etc., for injecting a clean inert gas into the transfer container and squeezing it. Exhausting the harmful gas in the container, and further improving the airtightness of the transfer container to prevent the entry of external particles, such as the Chinese Patent Publication Nos. 223680 and 1262164, etc., all of which are in the structure of the transfer container. Change to improve the airtightness of the transfer container. However, the improvement of airtightness is a major cost of development, molding and assembly of the 200951042 process cover, and it is affected by factors such as the contact area of the material and the cover, and the effect of the transfer of the container is reduced. Even the structure of these gas-filled gas and water molecules will gradually lose outward, due to the micro-space storage in the micro-environment, the outer ring
=罩=持光罩潔淨度的作用，其-樣會造成光罩 圓量=結晶等，進一步影響到後續晶 ，且ί 了提升移餘11之進排㈣便雜與氣密性 積極移載容器長時間保持内部潔淨度的需求，乃 的開發出-二努力研究與試作’終於成功 容哭夕亡诸Λ·移載奋器之氟閥結構，而能克服現有移載 氣結構氣密性不佳及動作不順的問題。 關蛀：此二本發明之主要目的係在提供-種移载容器之氣 閥…構，藉以増進移載容器進、排氣動作的順暢性。 痛本發明另—主要係目的係在提供—種移載容器之 虱閥…構，藉以提升移載容器的氣密性。 基於此，本發明主要係透過下列的技術手段來具體實 =刖述的目的與效能；該供儲存晶圓或光罩之移載容器具 y選擇性啟閉的容置空間，又移載容器上設有一或多數 之氣閥，而移载容器可供擺置於對應之承載裝置上，且承 載裝置上設有對應移載容器氣閥的進排氣閥件，其中； 該氣閥具有一中空的閥體，且閥體内部中段形成有一 具較小通孔的隔片，又閥體内部於隔片兩侧分別形成一第 200951042 ^ = 1二槽孔’再者閥體内滑設有—浮動桿，該浮 動杯兩端力別形成有-較大徑之抵頂部與—較小徑之頸部 隔之頸部可穿經-彈簧後，由閥體第-槽孔經 ==二槽孔，並於該頸部上套設有-密封墊圈，使 子動杯可透過彈簧讓密封細可選擇性啟_體之隔片。 以下為配合圖式及圖號，列舉一較佳實施例做進一步 之說明’期能使熟悉本項技術者對本發財更詳細的 ’惟以下所述者僅為用㈣釋本發明之較佳實施例，= hood = the role of the hood's cleanliness, which will cause the reticle to be rounded = crystallized, etc., further affecting the subsequent crystals, and the lifting of the shifting 11 into the row (four) will be miscellaneous and airtight positive transfer The container has maintained the need for internal cleanliness for a long time, and the development of the two-effort research and trials has finally succeeded in the construction of the fluorine valve structure of the smashing and smashing of the smashing device, and can overcome the airtightness of the existing transfer gas structure. Poor and unsatisfactory problems. OBJECT: The main purpose of the present invention is to provide a valve structure for the transfer container, thereby facilitating the smoothness of the moving and unloading operations of the transfer container. Pain The present invention is primarily directed to providing a valve for the transfer of containers to enhance the airtightness of the transfer container. Based on this, the present invention mainly uses the following technical means to specifically describe the purpose and performance of the present invention; the transfer container for storing the wafer or the reticle has a y selectively opened and closed accommodating space, and the transfer container One or more air valves are disposed, and the transfer container is disposed on the corresponding carrying device, and the carrying device is provided with an intake and exhaust valve member corresponding to the transfer valve air valve, wherein the gas valve has a Hollow valve body, and a small through hole is formed in the middle part of the valve body, and a valve hole is formed on both sides of the valve body to form a 200951042 ^ = 1 two slot hole. —Floating rod, the two ends of the floating cup are formed with a larger diameter against the top and a smaller diameter of the neck. The neck can be worn through the spring, and the valve body is slotted by the == two The slot is provided with a sealing gasket on the neck, so that the sub-actuating cup can pass through the spring to make the sealing thinly selectable. In the following, in conjunction with the drawings and the drawings, a preferred embodiment will be further described, which will enable those skilled in the art to have more detailed descriptions of the present invention. However, the following description is only for the preferred embodiment of the present invention. example,
企圖據以對本發明做任何形式上之限制，因此凡是在本發 明之創作精神下，所為任何形式的修飾或變更，皆仍應 於本發明意圖保護之範疇。 … 【實施方式】 本發明係一種應用於儲存或運輸製程中晶圓或光罩之 移載容器的氣閥結構，請參照第一圖所揭示者，該移載容 器具有可選擇性啟閉的容置空間，且容置空間可供儲存晶 圓或光罩，又移載容器上設有一或多數可選擇性氣密之氣 閥（20)，而移載容器可供擺置於對應之承载裝置（3)上 ，且承載裝置（3)上設有對應移載容器氣閥（2〇)的穩壓 閥件（30)或進氣閥件（40)，穩壓閥件（3〇)或進^闊 件（40)可選擇性作動氣閥（20)啟閉； ' 而本發明之移載容器係以容置晶圓的晶圓傳送箱（1〇 )為較佳實施例，至於其詳細構成則請參照第二、二圖所 顯示者’該晶圓傳送箱（10)的開口處覆設有一箱門（15 )’供晶圓傳送箱（10)形成有一透過箱門（15)選擇性 啟閉的容置空間，又晶圓傳送箱（10)上具有一或多數氣 嘴（12)，該氣嘴（12)可供氣閥（20)鎖接、且連通晶 200951042 (2〇) C )的穩壓閥件（30)與進氣閥件（40); ^中具選擇性啟閉作用之氣閥⑽具有一中空的闕 隔；Wwn’、且闕體（21)内部中段形成有一具較小通孔的 报成一贫’又閥體（21)内部於隔片（210)兩侧分別 21) 純:槽孔（211)與一第二槽孔（212)，且閥體（ 、，二'"第二槽孔（212)之外緣形成有一螺紋段（213 φ φ =閥（20)之閥體（21)鎖設於前述晶圓傳送箱（ r Y氣嘴、^12)上。再者閥體（21)内滑設有一浮動桿 刘w、’該洋動桿（22)兩端分別形成有一較大徑之抵頂 邓（）與一較小徑之頸部（24)，其中抵頂部（23)周 緣具有或夕數供氣流流動之通道（ 230)，又該浮動桿（ 22) 之頸部（24)可穿經一彈簧（25)後，由閥體（21) 第槽孔（211)經隔片（21〇)進入第二槽孔（212)，並 於該頸邛（24)上套設有一密封墊圈（26)，且彈簧（35 )並可提供-彈性預力，以推抵浮動桿（22)於位移後自 動復位，使浮動桿（22)上的密封墊圈（26)相對開啟或 费閉該閥體（21)之隔片（210)，供阻隔氣體於第一槽孔 (211)與第二槽孔（212)間的氣流流動，且當浮動桿（ 22)土欠外力推抵時，可讓浮動桿（22)之密封墊圈（26) 可遠離隔片（210)，使得氣體可由閥體（21)之第一槽孔 (211)向第二槽孔（212)流動； 至於承載裝置（3)之穩壓閥件（30)則具有一中空 的閥體（31)，該閥體（31)内部形成有一隔片（33) ，閥體（31)之隔片（33)上形成有一或多數流道孔（ 34)，且前述流道孔（34)並可同時跨越晶圓傳送箱（ 200951042 10)對應氣閥（20)的内部與外部，前述隔片（33)頂 ，並具有向上凸出之推桿（35)，供選擇性啟閉前述氣 閥（20)的洋動桿（22)。而進氣閥件（4〇)具有一中办 :閥體⑻，該閥體⑼内設有一可選擇性啟閉； 道的浮動桿（43)，該浮動桿（43)上具有至少一供氣 流流動之通孔（44)，且浮動桿（43)並具有向上凸出 =推桿U5) ’該推桿（45)可選擇性前述氣閥（2〇) 的浮動桿（22); ❹ ❹ 藉此，使得移載容器之晶圓傳送箱（1〇)的氣闕（2〇 )可受承載裝置（3)之穩壓閥件（3{))或進氣閥件（4〇) 選擇性啟動’而組構成-動作順暢、且氣密性佳的移載容 器之氣閥結構者。 又本發明另有-實施例，如第四、五圖所示者，該移 載容器係為一供儲放光罩之光罩盒（5〇)，罩盒（5〇)具 有了底座（51)及-相對底座（51)選擇性啟^的殼罩^ )’且底座（51)上並設有兩承托件（52)與一抵持件 (53)，且承托件（52)與抵持件（53)並於底座 =面圍繞形成” Π”型支賴，供讀光罩及光罩侧邊貼 霏，且底座（51)底面埋設有一螺帽（54)，其中螺帽 54)可供鎖設前述之氣閥（2〇)。 、 透過上述的設計，本發明於實際運用時，則係如第丄 圖所顯示者，操作上，當光罩盒（5G)置於承載裝置& )上時，該光罩盒（5〇)底座（51)的不同氣闕（⑷適 可與承載裝置（3)上的穩壓閥件⑽）或進氣閥件（4〇 )相對串接’其中氣閥（2G)的浮動桿（22)受到觀 閥件（30)或進氣閥件（40)之推桿（35 ) ( 45 )的“ 200951042 Ο 抵，使氣閥（20)的浮動桿（22)壓縮彈簧（25)，使 氣閥（20)之浮動桿（22)上的密封墊圈（26)遠離隔 片（210) ’讓氣閥（20)閥體（21)的第一槽孔（211) 與第二槽孔（212)導通，讓承載裝置（3)之進氣閥件（ 40)可透過氣閥（20)向光罩盒（5〇)内部輸氣，並透過 光罩盒（50)氣閥（20)與承載裝置（3)穩壓闊件（3〇) 將氣體排出，由於本發明移載容H利用㈣的設計 移載容器具有選擇性氣密的功效，得以防止外部的微粒 2分子等無法進人，以長時間維持移轉容器内部環境 =與:便並可解決現有移載容器需不斷提升氣密度的 本於：ΐίί1發明具有上述眾多的實用價值’因此 步的創作，在相同的技術領域中 專利的：、產品公開使用，故本發明已符合發明 專利。、 &法提出申請’祈請早日賜准本案發明 ❹ 【圖式簡單說明】 第一圖··本發明較佳實施 .第二圖：本發_佳實施例之料觀示意圖。 ，說明其與部分解示意圖 第三圖··本發_佳實施例的相對關係。 第四圖：本發明另一較^ 刀解不意圖。 第五圓··本發明另—===意圖。 意圖。較佳實施例與承载裝置的接合參考示 200951042 【主要元件符號說明】 (10) 晶圓傳送箱 (12) 氣嘴 (15) 箱門 (20) 氣閥 (21) 閥體 (210) 隔片 (211) 第一槽孔 (212) 第二槽孔 (213) 螺紋段 (22) 浮動桿 (23) 抵頂部 ( 230) 通道 (24) 頸部 (25) 彈簧 (26) 密封墊圈 (3) 承載裝置 (30) 穩壓閥件 (31) 閥體 (33) 隔片 (34) 流道孔 (35) 推桿 (40) 進氣閥件 (41) 閥體 (43) 浮動桿 (44) 通孔 (45) 推桿 (50) 光罩盒 (51) 底座 (52) 承托件 (53) 抵持件 (54) 螺帽 (55) 殼罩 ❿ 12It is intended that the present invention be construed as being limited by the scope of the present invention. [Embodiment] The present invention is a gas valve structure applied to a transfer container of a wafer or a reticle in a storage or transportation process. Referring to the first figure, the transfer container has a selectively openable and closable The accommodating space and the accommodating space are used for storing the wafer or the reticle, and the transfer container is provided with one or a plurality of selectively airtight gas valves (20), and the transfer container can be placed on the corresponding bearing On the device (3), the load-bearing device (3) is provided with a pressure-regulating valve member (30) or an intake valve member (40) corresponding to the transfer container air valve (2〇), and a pressure-regulating valve member (3〇) Or the opening member (40) can selectively actuate the gas valve (20) to open and close; and the transfer container of the present invention is a wafer transfer box (1) for accommodating the wafer as a preferred embodiment. For detailed structure, please refer to the second and second figures. 'The opening of the wafer transfer box (10) is covered with a box door (15)' for the wafer transfer box (10) to form a through box door (15). a selectively opening and closing accommodating space, and the wafer transfer box (10) has one or more gas nozzles (12), and the gas nozzles (12) are lockable for the gas valve (20), and Connected crystal 200951042 (2〇) C ) regulator valve (30) and intake valve (40); ^ the selective opening and closing of the valve (10) has a hollow separation; Wwn', and 阙The inner middle portion of the body (21) is formed with a small through hole, and the inner portion of the valve body (21) is internally formed on both sides of the spacer (210). 21) pure: the slot (211) and a second slot ( 212), and the valve body (,, the second '" the second slot (212) is formed with a threaded section at the outer edge (213 φ φ = valve (20) valve body (21) is locked to the wafer transfer box (r Y nozzle, ^12). In addition, the valve body (21) is slidably provided with a floating rod Liu w, and the two ends of the ocean moving rod (22) are respectively formed with a larger diameter to the top Deng () and a neck (24) of a smaller diameter, wherein the periphery of the top (23) has a passage (230) for the flow of the airflow, and the neck (24) of the float (22) can pass through a spring ( 25), the first slot (211) of the valve body (21) through the spacer (21〇) enters the second slot (212), and a sealing gasket (26) is sleeved on the neck collar (24). And the spring (35) can provide - elastic preload to push the floating rod (22) Automatically reset after displacement, so that the sealing gasket (26) on the floating rod (22) is relatively open or closes the diaphragm (210) of the valve body (21) for blocking gas in the first slot (211) and The air flow between the second slots (212) flows, and when the floating rod (22) is under the external force, the sealing washer (26) of the floating rod (22) can be moved away from the spacer (210), so that the gas The first slot (211) of the valve body (21) can flow to the second slot (212); and the regulator valve member (30) of the carrying device (3) has a hollow valve body (31), which A diaphragm (33) is formed inside the valve body (31), and one or a plurality of flow passage holes (34) are formed in the spacer (33) of the valve body (31), and the flow passage holes (34) can simultaneously cross the crystal The round transfer box (200951042 10) corresponds to the inside and the outside of the air valve (20), the spacer (33) is topped, and has a push rod (35) protruding upward for selectively opening and closing the gas valve (20). Ocean moving rod (22). The intake valve member (4〇) has a central body: a valve body (8), the valve body (9) is provided with a selectively openable and closable; a floating rod (43) of the track, the floating rod (43) having at least one a flow through hole (44), and the floating rod (43) has an upward protrusion = push rod U5) 'The push rod (45) can select the floating rod (22) of the aforementioned air valve (2);借此 In this way, the air 阙 (2〇) of the wafer transfer box (1〇) of the transfer container can be subjected to the pressure regulating valve member (3{)) or the intake valve member (4〇) of the carrying device (3). Selective start-up and group configuration - the valve structure of the transfer container with smooth motion and good air tightness. Further, in another embodiment of the present invention, as shown in the fourth and fifth figures, the transfer container is a photomask case (5〇) for storing the reticle, and the cover case (5〇) has a base ( 51) and - with respect to the base (51) selectively opening the cover ^)' and the base (51) is provided with two supporting members (52) and a resisting member (53), and the supporting member (52) ) and the resisting member (53) is formed on the base=face to form a “Π” type for the reading reticle and the side of the reticle, and a nut (54) is embedded in the bottom surface of the base (51). The cap 54) can be used to lock the aforementioned air valve (2〇). Through the above design, the present invention is actually shown in the figure, as shown in the figure, in operation, when the photomask case (5G) is placed on the carrying device & The different air enthalpy of the base (51) ((4) is suitable to be connected in series with the pressure regulating valve (10) on the carrying device (3) or the intake valve member (4 〇) 'the floating rod of the air valve (2G) 22) The "200951042" of the push rod (35) (45) of the valve member (30) or the intake valve member (40) causes the floating rod (22) of the gas valve (20) to compress the spring (25). Keep the sealing gasket (26) on the floating rod (22) of the gas valve (20) away from the spacer (210) 'Let the first slot (211) of the valve body (21) of the gas valve (20) with the second slot (212) conducting, allowing the air intake valve member (40) of the carrying device (3) to pass through the air valve (20) to the inside of the photomask case (5〇), and through the reticle box (50) air valve (20) With the load-bearing device (3), the gas is discharged (3〇), and the gas is discharged. Since the transfer container of the present invention utilizes the design of the transfer container to have a selective airtight effect, it is possible to prevent the external particles 2 molecules from being able to be prevented. Enter people to maintain for a long time The internal environment of the transfer container = and can solve the problem that the existing transfer container needs to continuously increase the gas density: ΐίί1 invention has the above-mentioned numerous practical values. Therefore, the creation of the step is patented in the same technical field: The invention has been in accordance with the invention patent. The & method proposes to apply for 'inviting the invention of the case as soon as possible'. [Simplified description of the drawings] The first figure · The preferred embodiment of the present invention. The second picture: the present hair_good A schematic view of the material of the embodiment, and a relative relationship between the third embodiment of the present invention and the preferred embodiment. The fourth figure: another method of the present invention is not intended. Inventive--== Intention. Intention. Joint reference of the preferred embodiment and the carrying device 200951042 [Explanation of main component symbols] (10) Wafer transfer box (12) Gas nozzle (15) Door (20) Air valve (21) Body (210) Spacer (211) First Slot (212) Second Slot (213) Threaded Section (22) Floating Rod (23) Abutting Top (230) Channel (24) Neck (25 ) Spring (26) Gasket (3) Carrier (30) Regulator valve (31) Body (33) Spacer (34) Runner hole (35) Push rod (40) Intake valve member (41) Body (43) Floating rod (44) Through hole (45) Push rod (50) Mask box ( 51) Base (52) Support (53) Resistor (54) Nut (55) Cover ❿ 12