200925311 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種連續式真空鍍膜機，尤指~種用於 載盤具降溫效果之連續式真空鍍膜機，其概隸屬於真空錄 膜機之技術領域範疇。 【先前技術】 隨著科技的進步與發展’電子產業的產品日新月異， 近年來真空鍍膜技術已逐漸取代傳統噴導電漆或電解電銀 ® 的鍍膜方式，而廣泛地應用於半導體製程、光電和3C產 業中’成為重要的鍍膜生產技術； 目前業界所使用的鍍膜設備大多為連續式（In_Line) 多腔體（multi-chambers )的作業流程，與傳統批次式（batch type)或晶圓式（wafer type )生產方式比較，可大幅降低 "又備成本及薇房空間，極具量產經濟價值及產業競爭性； 連續式真空鍛膜的作業流程係可參考如公告第 ❹M258 10 1號「自動化潛入式内部迴流裝置」新型專利一案， 其主要可分為下列三個主要區域：進料腔體區、鍍膜腔 體區及出料腔體區，因應不同基材（)及鍍材 (target )的作業製程、以及鍍膜品質與腔體真空潔淨 度而求，可適度地增加低、中、高真空腔體數目，以逐 段漸進式地達到作業所要求的真空度及潔淨度標準。 然而，在既有鍍膜腔體區中對於被鍍物進行真空鍍膜 :τ方、濺鍍衣私中利用離子高能量撞擊靶材（被鍍物）， 將革巴材上之原子擊出並沉積於被鍍物上，由於其沉積能量 200925311 較高，因此具有良好的成模性質，且附著力極佳，但在滅 鑛的同時也會產生電子與二次電子撞擊附著於真空腔體及 載盤上進而產生高溫，由於真空腔體設有一接地線作為系 統的ground端，因此可將電子及二次電子迅速地排出腔 體外而不會產生高溫’而載盤係置於絕緣之橡膠製輸送滾200925311 IX. Inventive description: [Technical field of invention] The present invention relates to a continuous vacuum coating machine, in particular to a continuous vacuum coating machine for cooling effect of a carrier, which belongs to a vacuum filming machine. The field of technology. [Prior Art] With the advancement and development of technology, 'electronic industry products are changing with each passing day. In recent years, vacuum coating technology has gradually replaced the traditional spray paint or electrolytic silver-plated coating method, and is widely used in semiconductor manufacturing, optoelectronics and 3C. In the industry, it has become an important coating production technology; most of the coating equipment used in the industry is continuous (In_Line) multi-chambers, with traditional batch type or wafer type ( Wafer type) Compared with the production method, it can greatly reduce the cost of the room and the space of the Weifang. It is very economical in mass production and competitive in the industry. The operation process of the continuous vacuum forging film can be referred to the announcement No. M258 10 1 The new patented case of the automated submersible internal recirculation device can be divided into the following three main areas: the feed cavity area, the coating cavity area and the discharge cavity area, depending on the substrate () and the plating material ( Target ), the processing quality, and the quality of the coating and the vacuum cleanliness of the cavity, can appropriately increase the number of low, medium and high vacuum chambers, step by step progressive The ground meets the vacuum and cleanliness standards required for the job. However, vacuum coating is applied to the object to be plated in the existing coating cavity region: the τ square, the sputtering coating privately uses the ion high energy to strike the target (the object to be plated), and the atom on the leather material is shot and deposited. On the object to be plated, due to its high deposition energy 200925311, it has good mold-forming properties and excellent adhesion. However, at the same time of extinction, electrons and secondary electrons collide with the vacuum chamber and load. The disk is further heated to a high temperature. Since the vacuum chamber is provided with a grounding wire as the ground end of the system, electrons and secondary electrons can be quickly discharged outside the cavity without generating high temperature, and the carrier is placed in an insulated rubber conveyor. roll
輪上，無法將電子及二次電子排出進而產生高溫，加U 降溫速度慢，因此既有載盤於使用後需靜置一段時間，待 其冷卻後方可再次使用，相對影響作業之流程及效率，誠 有加以改進之處。 【發明内容】 為了改善上述既有載盤於濺鍍時會產生高溫之缺失及 不足，本發明之主要目的在於提供一種載盤具降溫效果之 連續式真空鐘膜機，主要係將沉積於載盤上電子及二·大電 子排出，以提供-可快速降溫並可改善作業流程 置者。 衣 ❹ 上述目的’本發明之載盤具降溫效果之連續式真 工鍵膜機主要係包含有一前後置基台組、及 一載盤，其中·· tσ組及 该剛後置基台組係包含有—前置基台及一後置基二， 其中於兩基台内係各設有一升降裝置，其中各升降^係 設有一壓缸、一平台及一動力 糸 各堡缸係往上延伸有- 軸，而平台係水平設於壓缸軸之頂端，於平台之頂面 係設有數個平行併列之滂鈐， 貝面 且可雙向運轉動力組係設於平台的—側 該腔體基台組係設於前置基台及後置基台之間且設有 6 200925311 一進料基台、 係分別設有一 各腔體 腔體基 之回傳 併列之 載 且設有 輪相貼 組及腔 自由端 設結合 相接觸 係前、 台組於 機構模 滚輪； 盤係可 一盤體 靠，使 體基台 ，各導 ，而各 進料腔體、-鍍膜腔體及一出料腔體，其中 後相互接合且分別設有數個輸送滾輪，又該 三基台之間設有一與兩升降裝置相平行設置 組’其中該回傳冑構模組係言史有數個呈水平 以及 移動地設於前後置基台組及腔體基台組之間 及個以上之導電元件，盤體底部係與各滾 ^體可藉由各浪輪的作動而相對前後置基台 組移動，而各導電元件係設有一固定端及一 電7L件的固定端係分別與盤體的一側面相固 導電元件之自由端係可與真空鍍膜機之機體 較佳地’該動力組係透過如鏈條或皮帶之傳動元件來 帶動滾輪旋轉，且該盤體係為—方形之結構。 較佳地’各導電元件係為—略呈v型之片體。 較佳地，各導電元件的自由端係呈一彎曲之結構。 較佳地，各導電元件係為一板體。 :交佳地，各導電元件係為一線體。 貝知上述技術手段以I ,本發明可獲得之優點及功效 至少包含有： * 一、有效降溫：本發明載盤具降溫效果之連續式真空 鑛膜機方、；賤錢加工所羞生並附著於載盤之電子及二次電 子可藉由各導電元件將盤體上所沉積之電子及二次電 子、工由與機體相接觸的方式迅速地排出腔體外而不會產 200925311 生南溫’進而提供_載盤 者。 >文果之連續式真空鍍膜機 直二改善作業流程：本發明載盤具降溫效果之連續式 ^ , 導電7^牛與各腔體接觸的方式，讓濺 鍍加工所需之載盤+ 巧万式mμ ^ 南再者置降溫即可使用，可有效改盖On the wheel, it is impossible to discharge the electrons and the secondary electrons to generate high temperature, and the U cooling rate is slow. Therefore, the existing carrier disk needs to be allowed to stand for a period of time after being used, and can be used again after cooling, which affects the operation process and efficiency. There are sincere improvements. SUMMARY OF THE INVENTION In order to improve the absence and deficiency of high temperature of the above-mentioned existing carrier during sputtering, the main object of the present invention is to provide a continuous vacuum film and clock machine with a cooling effect of the carrier, which is mainly deposited on the carrier. On-board electronics and two large electronic discharges are provided to provide - rapid cooling and improved process flow. The above-mentioned purpose 'the continuous true-action key film machine of the present invention has a cooling effect effect mainly comprising a front and rear abutment set and a carrier plate, wherein the · tσ group and the rigid rear abutment group The utility model comprises a front base and a rear base 2, wherein each of the two bases is provided with a lifting device, wherein each lifting system is provided with a pressure cylinder, a platform and a power 糸There is a shaft, and the platform is horizontally disposed at the top of the cylinder shaft. On the top surface of the platform, there are several parallel parallel rafts. The shell surface and the bidirectional operation power unit are arranged on the side of the platform. The set is set between the front abutment and the rear abutment and is provided with 6 200925311 a feeding abutment, which is respectively provided with a back cavity of each cavity cavity body and is provided with a wheel phase sticker and The free end of the cavity is provided in front of the contact system, and the set is on the mechanism die roller; the disk system can be a disk body, the body base, each guide, and each feed cavity, the coating cavity and a discharge cavity , wherein the two are joined to each other and are respectively provided with a plurality of conveying rollers, and between the three abutments There is a set in parallel with the two lifting devices, wherein the returning structure module has a plurality of horizontally and movably disposed between the front and rear abutment groups and the cavity abutment group and more than one conductive element. The bottom portion of the disk body and each of the rolling bodies can be moved relative to the front and rear base sets by the action of the respective wave wheels, and each of the conductive elements is provided with a fixed end and a fixed end of an electric 7L piece and one of the disk bodies respectively. The free end of the side phase-conducting conductive element can be preferably combined with the body of the vacuum coater to transmit the roller through a transmission element such as a chain or a belt, and the disc system has a square structure. Preferably, each of the conductive elements is a sheet of slightly v-shaped. Preferably, the free ends of the conductive elements are in a curved configuration. Preferably, each of the conductive elements is a plate. : Goodly, each conductive element is a linear body. The above technical means is I, and the advantages and effects obtained by the present invention include at least: * First, effective cooling: the continuous vacuum film machine of the present invention has a cooling effect, and the money processing is shy and The electrons and secondary electrons attached to the carrier can be quickly discharged out of the cavity by means of the conductive elements, and the electrons and secondary electrons deposited on the disk body are in contact with the body, and the product is not produced. ' Further provide _ carrier. > Wenguo continuous vacuum coating machine straight two to improve the operation process: the present invention has a continuous cooling effect of the tray, the conductive 7^ cattle and the contact of each cavity, the plate required for the sputtering process + Qiaowan type mμ ^ South can be used to cool down, can be effectively changed
作業的流程及效率。 』有a «： D 【實施方式】 為能詳細瞭解本發明的技術特徵及實 照說明書的内容來會 > 並可依 a巧奋耒霄％,兹進一步以如 施例，詳細說明如后： 飞所不的較侄貫 本發明主要係提供一種載盤具降溫效果 鑛膜機，請配八夫吾筮一= 連、·’貝式真空 明載盤罝目圖所示’由圖中可看出本發 月：：具降溫效果之連續式真空鑛膜機， 务 —則後置基台組（1〇)、一腔 ^匕括有 盤（3 〇 )，其中： 口、·且（2 〇 )及—載 該前後置基台組（1 〇 ) # 及-接m 係包含有-前置基台（i i) . 基口（12)，其中於兩基台（η，”、 係各設有一升降裝置（ 内 係設有-壓-("!)、-平置（"） (133)，各壓缸（131 2)及-動力組 34)，而平台（132)俜:：延伸有一壓缸軸（1 之頂端，於平台（i 3 2 )之 ） 滾輪（Ί U“山 面係-有數個平行併列之 2 ) 、组（1 3 3 )係設於平台（i 3 )的-側係且雙向運轉’較佳地，該動力 3 係透過如鏈條或皮帶之傳動元件 d ) 十、丄3 β )來帶動滾輪（工 200925311 3 5 )旋轉； 該腔體基台組（2 〇 )係設於前置基台（j i )及後 置基台（12)之間且設有一進料基台（21)、—鍍獏 基台（22)及一出料基台（23)，其中於各基台 1 ’ 2 2 ’ 2 3 )上係分別設有一進料腔體（2 4 )、一 鍍膜腔體（25)及一出料腔體（26)，其中各腔體（2 4，2 5 ’ 2 6 )係前、後相互接合且分別設有數個輸送 滾輪（2 4 1 ’ 2 5 !，2 6 i )，又該腔體基台組（2The process and efficiency of the operation. 』有 a «: D [Embodiment] In order to be able to understand in detail the technical features of the present invention and the contents of the actual manual, it is possible to follow the example of the manual. : The main reason for the invention is to provide a film-reducing film machine with a cooling effect. Please match the eight-fuss-in-one, the 'beauty-type vacuum-loaded disk', as shown in the figure. It can be seen that this month:: Continuous vacuum film machine with cooling effect, the service--the rear abutment group (1〇), the one cavity ^匕 including the disk (3 〇), where: mouth, · and (2 〇) and - the front and rear abutment group (1 〇) # and - 接 m system includes - the front abutment (ii). The base port (12), where the two abutments (η, ", Each unit is provided with a lifting device (the internal system is provided with - pressure - ("!), - flat (") (133), each pressure cylinder (131 2) and - power group 34), and the platform (132)俜:: There is a cylinder shaft (top of 1 on the platform (i 3 2)) roller (Ί U "mountain system - there are several parallel parallel 2", group (1 3 3) is set on the platform ( i 3 ) - side and bidirectional The operation 'preferably, the power 3 is driven by a transmission element d such as a chain or a belt d), 丄3 β ) to drive the roller (工 200925311 3 5 ) to rotate; the cavity abutment group (2 〇) is Between the front abutment (ji) and the rear abutment (12), there is provided a feeding abutment (21), a rhodium-plating abutment (22) and a discharging abutment (23), wherein each base The table 1 ' 2 2 ' 2 3 ) is provided with a feeding chamber (2 4 ), a coating chamber (25) and a discharge chamber (26), wherein each chamber (2 4, 2 5) ' 2 6 ) is joined to each other before and after and is provided with several conveying rollers (2 4 1 ' 2 5 !, 2 6 i ), and the cavity abutment group (2)
φ 〇)於二基台（21 ，22，23)之間設有一與兩升降 裝置（1 3 )相平行設置之回傳機構模組（2 7 )，其中 該回傳機構模組（2 7 )係設有數個呈水平併列之滾輪（2 71);以及 組（1 0 ) 1 )及一個 )係為一方 ，2 5 1， 藉由各滾輪 )的作動而 0 )移動， 且設有一固 電元件（3 )的一側面 ( 3 2 2 ) 〇 )上所沉 迅速排出， 載盤（3 0 )係可移動地設於前後置基台 及腔體基台組（20)之間且設有一盤體（3 以上之導電元件（32)，其中該盤體（3 1 形之結構，其底部係與各滾輪（工3 4工 261，271)相貼靠，使盤體（3工）可 (1 3 5 * 2 4 1，2 5 1 ^ 2 6 1 - 2 7 1 相對前後置基台組（1 〇 )及腔體基台組（2 而各導電元件（3 2 )係為一略呈v型之片體 疋端（321)及一自由端（322)，各導 2 )的固定端（3 2 1 )係分別與盤體（3 1 相固設結合’而各導電元件（3 2 )之自由端 係可與真空鍍膜機之機體相接觸，使載盤（3 積之電子及二次電子可經由各導電元件（32) 200925311 進而達到降溫之效果’以提高作業流程之效率，較佳地， 如第五圖所示，各導電元件（3 2 A)的自由端（3 2 2 A) 係呈彎曲之結構，另如第六及七圖所示，各導電元件（3 2 B，3 2 C)係可為一板體或一線體。 藉由上述之技術手段，本發明係將被鍍物（4 〇 )放 置於載盤（3 0)内，使載盤（3〇)隨著各滾輪（1 3 5 ’ 2 4 1 ’ 2 5 1 ’ 2 6 1，2 7 1 )的轉動，依序進 入進料腔體（24)、鍍膜腔體（25)及出料腔體（2 6 )中進行濺鍍加工，其中濺鍍所產生之電子與二次電子 會撞擊附著於載盤（30)上使盤體（31)產生高溫， 此時各導電元件（3 2，3 2A，3 2B，3 2C)可將2體 (3 1 )上所沉積之電子及二次電子，經由與機體相接觸 的方式迅速地排出腔體（24，25，26)外而不會產 生高溫，因此在濺鍍加工時載盤（3 〇 )不需再靜置降溫， 可有效改善作業的流程及效率，提供一載盤具降溫效果之 ©連續式真空鍍膜機者。 【圖式簡單說明】 第一圖係本發明之操作側視示意圖。 第二圖係本發明之局部放大外觀立體示意圖。 第三圖係本發明之局部立體分解示意圖。 第四圖係本發明之局部側視圖。 第五圖係本發明另一實施例之局部側視圖。 第六圖係本發明又一實施例之局部側視圖。 第七圖係本發明再一實施例之局部側視圖。 200925311 【主要元件符號 (1 〇)前後置 (1 1 )前置基 (1 3 )升降裝 " (1 3 1 )壓缸 (1 3 3 )動力 (1 3 5 )滾輪 (2 0 )腔體基 ❿ （2 2 )鍍膜基 (2 4 )進料腔 (2 5 )鍍膜腔 (2 6 )出料腔 說明】 基台組 台 ( 1 2 ) 後置基台 置 ( 1 3 2 )平台 組 ( 1 3 4 )壓缸軸 C 1 3 6 )傳動元件 台組 ( 2 1 ) 進料基台 台 ( 2 3 ) 出料基台 體 ( 2 4 1 )輸送滾輪 體 ( 2 5 1 )輸送滾輪 體 ( 2 6 1 )輸送滚輪 (2 7 )回傳機構模組（2 7 1 )滾輪φ 〇) between the two bases (21, 22, 23) is provided with a return mechanism module (27) arranged in parallel with the two lifting devices (13), wherein the return mechanism module (2 7) There are several horizontally juxtaposed rollers (2 71); and groups (10) 1) and one) are one side, 2 5 1, by the action of each roller), 0) moving, and having a solid The side of the electrical component (3) (3 2 2 ) 迅速) is quickly discharged, and the carrier (30) is movably disposed between the front and rear abutment and the cavity abutment group (20). There is a disk body (more than 3 conductive elements (32), wherein the disk body (the structure of the 3 1 shape, the bottom part of which is attached to each roller (3, 261, 271), so that the disk body (3 work) (1 3 5 * 2 4 1,2 5 1 ^ 2 6 1 - 2 7 1 relative to the front and rear abutment group (1 〇) and the cavity abutment group (2 and each conductive element (3 2 ) is one The v-shaped body end (321) and a free end (322), and the fixed end (3 2 1 ) of each of the guides 2) are respectively fixed to the disk body (the 3 1 phase is fixed) and the conductive elements ( 3 2) The free end can be in contact with the body of the vacuum coating machine, so that The disk (3 electrons and secondary electrons can reach the effect of cooling by each conductive element (32) 200925311 to improve the efficiency of the work flow. Preferably, as shown in the fifth figure, each conductive element (3 2 A The free end (3 2 2 A) has a curved structure, and as shown in the sixth and seventh figures, each conductive element (3 2 B, 3 2 C) can be a plate or a line body. In the above technical means, the present invention places the object to be plated (4 〇) in the carrier (30) so that the carrier (3 〇) follows the respective rollers (1 3 5 ' 2 4 1 ' 2 5 1 ' 2 6 1,2 7 1 ) rotation, sequentially into the feed cavity (24), the coating cavity (25) and the discharge cavity (26) for sputtering, in which the electrons generated by sputtering Colliding with the secondary electrons on the carrier (30) causes the disk (31) to generate a high temperature, at which time each conductive element (3 2, 3 2A, 3 2B, 3 2C) can be placed on the body 2 (3 1 ) The deposited electrons and secondary electrons are quickly discharged out of the cavity (24, 25, 26) by contact with the body without generating high temperature, so the carrier (3 〇) does not need to be used during the sputtering process. Resting down The utility model can effectively improve the flow and efficiency of the operation, and provides a continuous vacuum coating machine with a cooling effect of the disk. [Schematic description] The first figure is a schematic side view of the operation of the present invention. 3 is a partially exploded perspective view of the present invention. The fourth figure is a partial side view of the present invention. The fifth drawing is a partial side view of another embodiment of the present invention. Figure 6 is a partial side elevational view of yet another embodiment of the present invention. The seventh drawing is a partial side view of still another embodiment of the present invention. 200925311 [Main component symbol (1 〇) front and rear (1 1 ) front base (1 3 ) lifting device " (1 3 1 ) pressure cylinder (1 3 3 ) power (1 3 5 ) roller (20) cavity Body base ❿ (2 2 ) coating base (2 4 ) feeding cavity (2 5 ) coating cavity (2 6 ) discharge cavity description] abutment set table ( 1 2 ) rear base set ( 1 3 2 ) platform Group ( 1 3 4 ) Cylinder shaft C 1 3 6 ) Transmission component table set ( 2 1 ) Feeding abutment table ( 2 3 ) Discharge abutment body ( 2 4 1 ) conveying roller body ( 2 5 1 ) conveying Roller body ( 2 6 1 ) conveying roller (2 7 ) return mechanism module (2 7 1) roller