TW200915930A - Normal-pressure linear plasma jet device - Google Patents
Normal-pressure linear plasma jet device Download PDFInfo
- Publication number
- TW200915930A TW200915930A TW96136590A TW96136590A TW200915930A TW 200915930 A TW200915930 A TW 200915930A TW 96136590 A TW96136590 A TW 96136590A TW 96136590 A TW96136590 A TW 96136590A TW 200915930 A TW200915930 A TW 200915930A
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- electrode
- open end
- side electrodes
- opening
- Prior art date
Links
- 238000010494 dissociation reaction Methods 0.000 claims abstract description 16
- 230000005593 dissociations Effects 0.000 claims abstract description 16
- 230000005281 excited state Effects 0.000 claims abstract description 14
- 230000005684 electric field Effects 0.000 claims abstract description 7
- 238000007750 plasma spraying Methods 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 5
- 239000002826 coolant Substances 0.000 claims description 2
- 230000007423 decrease Effects 0.000 claims 1
- 230000005611 electricity Effects 0.000 claims 1
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 238000004381 surface treatment Methods 0.000 abstract description 12
- 238000012986 modification Methods 0.000 abstract description 2
- 230000004048 modification Effects 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 67
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 210000004513 dentition Anatomy 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000007787 electrohydrodynamic spraying Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000010977 jade Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000036346 tooth eruption Effects 0.000 description 1
Landscapes
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96136590A TW200915930A (en) | 2007-09-29 | 2007-09-29 | Normal-pressure linear plasma jet device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96136590A TW200915930A (en) | 2007-09-29 | 2007-09-29 | Normal-pressure linear plasma jet device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200915930A true TW200915930A (en) | 2009-04-01 |
| TWI354513B TWI354513B (enExample) | 2011-12-11 |
Family
ID=44725876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW96136590A TW200915930A (en) | 2007-09-29 | 2007-09-29 | Normal-pressure linear plasma jet device |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200915930A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9363881B2 (en) | 2013-12-04 | 2016-06-07 | Industrial Technology Research Institute | Plasma device and operation method of plasma device |
| US11352696B2 (en) | 2014-06-25 | 2022-06-07 | Nederlandse Organisatie Voor Toegepast—Natuurwetenschappelijk Onderzoek Tno | Plasma source and surface treatment method |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI488546B (zh) * | 2012-02-23 | 2015-06-11 | Shinkawa Kk | A plasma generating device and a plasma reactor |
| MX2015003569A (es) * | 2012-09-19 | 2016-06-21 | Apjet Inc | Aparato y metodo para procesar plasma bajo presion atmosferica. |
-
2007
- 2007-09-29 TW TW96136590A patent/TW200915930A/zh unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9363881B2 (en) | 2013-12-04 | 2016-06-07 | Industrial Technology Research Institute | Plasma device and operation method of plasma device |
| US11352696B2 (en) | 2014-06-25 | 2022-06-07 | Nederlandse Organisatie Voor Toegepast—Natuurwetenschappelijk Onderzoek Tno | Plasma source and surface treatment method |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI354513B (enExample) | 2011-12-11 |
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