TW200905392A - Radiation sensitive composition for forming colored layer, color filter, and color liquid crystal display element - Google Patents

Radiation sensitive composition for forming colored layer, color filter, and color liquid crystal display element Download PDF

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TW200905392A
TW200905392A TW097122314A TW97122314A TW200905392A TW 200905392 A TW200905392 A TW 200905392A TW 097122314 A TW097122314 A TW 097122314A TW 97122314 A TW97122314 A TW 97122314A TW 200905392 A TW200905392 A TW 200905392A
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group
compound
weight
acid
methyl
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TW097122314A
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TWI450035B (en
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Satoshi Morishita
Ryouhei Shouda
Kyosuke Yoda
Akihiro Sumi
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Jsr Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

The radiation sensitive composition comprises a colorant, an alkali soluble resin, a polyfunctional monomer and a photopolymerization initiator. The alkali soluble resin comprises a copolymer obtained by polymerizing a polymerizable mixture comprising at least one selected from the group consisting of an unsaturated carboxylic acid, an unsaturated carboxylic anhydride and an unsaturated phenol compound and an N-position substituted maleimide, in the presence of a compound having two or more thiol groups in a molecule. This composition does not undergo a reduction in film remaining percentage and chipping and undercutting of pattern even with low light exposure, provides pixels and a black matrix which are excellent in solvent resistance, adhesion to a substrate and other properties, and shows excellent storage stability as a liquid composition even when containing pigments in high concentration.

Description

200905392 九、發明說明 【發明所屬之技術領域】 本發明有關用以形成彩色層之輻射敏感性組成物、彩 色濾光片及彩色液晶顯示器元件。詳言之，其係有關用以 形成可使用於透射型或反射型彩色液晶顯示器、彩色攝影 管裝置或諸如此類者之彩色層的輻射敏感性組成物、具有 使用該輻射敏感性組成物形成之彩色層的彩色濾光片及包 含該彩色濾光片之彩色液晶顯示器元件。 【先前技術】 作爲使用彩色輻射敏感性組成物製造彩色濾光片之習 用方法，已知一種方法是將彩色輻射敏感性組成物施加於 基板或已預先形成所需圖案之阻光層的基板上，將所施加 之組成物乾燥，使乾燥之塗層依所需圖案形狀曝照輻射（ 以下稱爲「曝光」）且顯影以得到每一種顏色之像素（參 見日本專利公開公告編號2-144502及3-53201)。 此外，在近年之彩色濾光片之領域中，主要係藉由降 低曝光量來縮短膠黏時間（takt time)，而於低曝光量形 成之像素及黑色矩陣需要優異之圖案形狀、抗溶劑性及對 基板黏著性。同時，日本專利公開公告編號10-31308及 1 0-300922提議於彩色輻射敏感性組成物中摻入N-位置經 取代順丁烯二醯亞胺單體之共聚物，以改善顯影性及耐熱 性。然而，使用該種彩色輻射敏感性組成物，.難以在縮短 膠黏時間之同時得到具有良好圖案形狀之像素及黑色矩陣 200905392 ，因爲當曝光量降低時，產生顯影後對基板黏著性不足之 情況，使得膜留存百分比降低、圖案破損或側蝕或圖案自 基板脫落。 【發明內容】 本發明目的係提供一種用以形成彩色層之新穎輻射敏 感性組成物，此組成物即使在低曝光度下亦不使膜留存百 分比降低及圖案破損及側蝕，提供抗溶劑性、對基板黏著 性及其他性質優異之像素及黑色矩陣，且即使在含有高濃 度顏料時仍顯示作爲液體組成物的優異儲存安定性。 本發明另一目的係提供具有自本發明輻射敏感性組成 物形成之彩色層的彩色濾光片及包含該彩色濾光片之彩色 液晶顯示器元件。 由以下描述可明瞭本發明其他目的及優點。 根據本發明’首先由一種輻射敏感性組成物達成前述 本發明目的及優點，該組成物係包含（A )著色劑，（B )鹼可溶性樹脂’ （C)多官能性單體及（0)光聚合起 始劑’且係用以形成彩色層，該鹼可溶性樹脂（B )係包 含具有至少一個選自酸官能基及酸酐基之基團、下式（1 )所示之重現單元：200905392 IX. Description of the Invention [Technical Field] The present invention relates to a radiation-sensitive composition, a color filter, and a color liquid crystal display element for forming a color layer. In particular, it relates to a radiation-sensitive composition for forming a color layer that can be used in a transmissive or reflective type color liquid crystal display, a color photographic tube device, or the like, having a color formed using the radiation-sensitive composition. A color filter of a layer and a color liquid crystal display element including the color filter. [Prior Art] As a conventional method of manufacturing a color filter using a color radiation-sensitive composition, a method is known in which a color radiation-sensitive composition is applied to a substrate or a substrate on which a light-blocking layer of a desired pattern has been previously formed. Drying the applied composition, exposing the dried coating to a desired pattern shape (hereinafter referred to as "exposure") and developing to obtain pixels of each color (see Japanese Patent Laid-Open Publication No. 2-144502 and 3-53201). In addition, in the field of color filters in recent years, the takt time is mainly shortened by reducing the exposure amount, and the pixel and black matrix formed at a low exposure amount require an excellent pattern shape and solvent resistance. And adhesion to the substrate. Meanwhile, Japanese Patent Laid-Open Publication Nos. 10-31308 and 10-300922 propose to incorporate a copolymer of a N-position substituted maleimide monomer in a color radiation-sensitive composition to improve developability and heat resistance. Sex. However, with such a color radiation-sensitive composition, it is difficult to obtain a pixel having a good pattern shape and a black matrix 200905392 while shortening the adhesive time, because when the exposure amount is lowered, the adhesion to the substrate after development is insufficient. The film retention percentage is lowered, the pattern is broken or the side etching or the pattern is detached from the substrate. SUMMARY OF THE INVENTION The object of the present invention is to provide a novel radiation-sensitive composition for forming a color layer which does not reduce the percentage of film retention and pattern breakage and side etching even at low exposure, providing solvent resistance. Pixels and black matrices excellent in substrate adhesion and other properties, and exhibit excellent storage stability as a liquid composition even when containing a high concentration of pigment. Another object of the present invention is to provide a color filter having a color layer formed from the radiation-sensitive composition of the present invention and a color liquid crystal display element comprising the color filter. Other objects and advantages of the invention will be apparent from the description. According to the present invention, the above objects and advantages of the present invention are first achieved by a radiation-sensitive composition comprising (A) a colorant, (B) an alkali-soluble resin '(C) a polyfunctional monomer, and (0) The photopolymerization initiator "is used to form a color layer, and the alkali-soluble resin (B) comprises a reproducing unit represented by the following formula (1) having at least one group selected from the group consisting of an acid functional group and an acid anhydride group:

6- 200905392 (其中R7係表示具有1至12個碳原子之烷基或具有6至 12個碳原子之芳基）， 及下式（2)所示之基團： X--R8-S-* -.-(2) η (其中X係表示η價有機基團，R8係表示亞甲基或具有2 至6個碳原子之伸烷基，η係表示2至10之整數，且「* 」係表示鍵結手） 之聚合物。 本發明中’彩色層係表示「包含像素及/或黑色矩陣 之層」。 根據本發明，其次，由一種包含使用本發明輻射敏感 性組成物形成之彩色層的彩色濾光片達成前述本發明目的 及優點。 根據本發明’第三，由包含前述彩色濾光片之彩色液 晶顯示器元件達成前述本發明目的及優點。 進行本發明之最佳模式 以下詳細描述本發明》 -(A )著色劑- 係根據欲製得之 顏料、染料或天 本發明中之著色劑不特別限定顏色， 彩色濾光片的用途而適當地選擇，且可爲 然著色劑中之任一種。 200905392 v 因爲彩色濾光片需要高明晰度顯色性及耐熱性，故本 發明中之著色劑較佳係爲具有高度顯色性及高耐熱性之著 色劑，尤其是具有高耐熱分解性之著色劑。較佳係使用有 機顔料或無機顏料，使用有機顏料或碳黑尤佳。 前述有機顏料之說明實例係包括根據色彩索引歸類爲 「顏料」的化合物，詳言之，具有以下色彩索引（C.I.) 編號之化合物，即： C. I.顏料黃12、C. I.顏料黃13、C. I.顏料黃14、C. I.顏料黃17、C. I.顏料黃20、C. I.顏料黃24、C. I.顏料 黃31、C. I.顏料黃55、C. I·顏料黃83、C. I.顏料黃93、 C. I.顏料黃109、C. I.顏料黃11〇、C. I.顏料黃138、C. I.顏料黃139、C. I.顏料黃150、C. I.顏料黃153、C. I.顏 料黃154、C. I.顏料黃155、C. I.顏料黃166、C_ I.顏料 黃168、C. I.顏料黃180及C. I.顏料黃211 ; C. I.顏料橙5、C. I.顏料橙13、C. I.顏料橙14、Ο-ΐ. 顏料橙 24、 C. I. 顏料橙 34、 C. I. 顏料橙 36、 C. 1_ 顏料 橙38、C. I.顏料橙40、C· I.顏料橙43、C. I.顏料橙46、 C_ I.顏料橙49、C. I.顏料橙61、C_ I.顏料橙64、C_ I.顏 料橙68、C. I.顏料橙70、C. I.顏料橙71、C. I.顏料橙72 、C. I.顏料橙73及C. I.顏料橙74: c. I.顏料紅1、C. I.顏料紅2、C. I.顏料紅5、C· I. 顏料紅1 7、C · I.顏料紅3 1、C . I ·顏料紅3 2、C · I.顏料紅 4 1、C . I.顏料紅1 2 2、C · I.顏料紅1 2 3、C . I.顏料紅1 4 4 、C. I.顏料紅149、C. I.顏料紅166、C. I.顏料紅168、 200905392 C. I.顏料紅170、C. I.顏料紅171、C. I.顏料紅175、C. I.顏料紅1 7 6、C _ I ·顏料紅1 7 7、C · I.顏料紅1 7 8、C . I ·顏 料紅1 7 9、C . I.顏料紅1 8 0、C . I.顏料紅1 8 5、C . I.顏料 紅187、C. I.顏料紅202、C. I.顏料紅206、C. I.顏料紅 207、C. I.顏料紅209、C. I.顏料紅214、C. I.顏料紅220 、（:· I.顏料紅221、C. I.顏料紅224、C. I.顔料紅242、 C. I.顏料紅243、C. I.顏料紅254、C. I.顏料紅255、C. I ·顏料紅2 6 2、C . I.顏料紅2 6 4及C . I ·顏料紅2 7 2 ; C· I.顏料紫1、C. I.顏料紫19、C. I.顏料紫23、C. I·顏料紫29、C. I.顏料紫32、C. I_顏料紫36及C. I.顏料 紫38 ; C. I.顏料藍15、C. I.顏料藍15:3、C. I.顏料藍15 :4、C_ I.顏料藍15: 6、C. I.顏料藍60及C· Ι·顏料藍 80 ； C.I.顏料綠7、C. I.顏料綠36及C. I.顏料綠58; C.I.顏料棕23及C. I·顏料棕25 ;及 C. I.顏料黑1及c. I.顏料黑7。 此等有機顔料可視需要藉由例如硫酸再結晶法、溶劑 清洗法、鹽磨法或此等方法之組合方法純化並使用。 此等有機顏料中較佳者有至少一種選自以下之顏料： C. I.顏料黃83、C. I.顏料黃139、C. I.顏料黃138、C. I. 顏料黃150、C. I.顏料黃18〇、c. I.顏料紅166、C. I.顏 料紅1 7 7、C . I.顏料紅2 4 2、C · I 顏料紅2 5 4、C . I ·顏料 藍15:3、C. I.顏料藍15:4、C. I.顏料藍15:6、C. I.顏料 -9 - 200905392 綠7、C. I·顏料綠36、C I顏料綠58、c i.顏料紫23、 C. I.顏料藍60及C. I.顏料藍8〇。 此外’無機顏料之說明實例係包括氧化鈦、硫酸鋇、 碳酸鈣、鋅華、硫酸鉛、黃鉛、鋅黃、鐵丹（紅色氧化鐵 (III))、鎘紅、群青、鐵藍、氧化鉻綠、鈷錄、琥珀 、鈦黑、合成鐵黑及碳黑。 本發明中’前述有機顏料及無機顏料可單獨使用或二 或更多種組合或摻合使用。形成像素時，較佳係使用至少 一種有機顔料’形成黑色矩陣時，較佳係使用二或更多種 有機顏料及/或碳黑。 本發明中’前述顏料粒子之表面可視需要在使用之前 以聚合物進行修飾。用以顏料粒子表面修飾之聚合物說明 實例係包括日本專利公開公告8 - 2 5 9 8 7 6及其他刊物所述 之聚合物及使用於分散顏料的各種市售聚合物或寡聚物。 本發明中，著色劑可視情況與分散劑一起使用。 作爲前述分散劑，可使用例如適當之陽離子性、陰離 子性、非離子性或兩性分散劑。以聚合物分散劑較佳。其 特定實例係包括經修飾之丙烯酸系共聚物、丙烯酸系共聚 物、聚胺基甲酸酯、聚酯、共聚物之烷基銨鹽或磷酸酯鹽 及陽離子性梳狀接枝聚合物。陽離子性梳狀接枝聚合物係 爲其中二或更多個分子之分支聚合物接枝於一分子具有複 數個鹼性基團（陽離子性官能基）之主幹聚合物的聚合物 ，可舉例者爲包含作爲主幹聚合物之聚伸乙基亞胺及作爲 分支聚合物之e -己內酯開環聚合物的聚合物。此等分散 -10- 200905392 劑中’經修飾丙烯酸系共聚物、聚胺基甲酸酯及陽離子性 梳狀接枝聚合物較佳。 該等分散劑係市售品。市售分散劑產品的特定實例係 包括作爲經修飾丙烯酸系共聚物之 Disperbyk-2000及 Disperbyk-200 1 ( BYK Japan KK 之產品），作爲聚胺基 甲酸醋之 Disperbyk-161、 Disperbyk-162、 Disperbyk-165 、Disperbyk-167、Disperbyk-170 及 Disperbyk-182 ( BYK J a p a η K K 之產品）及 s o 1 s p e r s e 7 6 5 0 0 ( L u b r i z o 1 J a p a n Ltd.之產品）及作爲陽離子性梳狀接枝聚合物之Solsperse 24000 及 Solsperse 37500 ( Lubrizol Japan Ltd.之產品） 及 AJISPER PB821、AJISPER PB822 及 AJISPER PB880 ( Ajinomoto Fine-Techno. Co., Inc.之產品）〇 此等分散劑可單獨或二或更多種摻合使用。分散劑之 含量以100重量份數著色劑（A)計通常不高於100重量 份數’較佳係0.5至1〇〇重量份數，更佳係1至7〇重量 份數’特佳係1 〇至5 0重量份數。此情況下，當分散劑含 量超過1 00重量份數時，可能破壞顯影性及諸如此類性質 -(B)鹼可溶性樹脂- 本發明中驗可溶性樹脂包含具有至少一個選自酸官能 基及酸酐基之基團、前式（1)所示之重現單元及前式（2 )所示之基團的聚合物（以下稱爲「聚合物B」）。鹼可 溶性樹脂以黏合劑形式作用於著色劑（A)上，可在形成 -11 - 200905392 彩色層之顯影步驟中溶解於鹼顯影劑。 前式（1)中，作爲R7之具有1至12個碳原子的烷 基之說明實例係包括甲基、乙基、正丙基、異丙基、正丁 基、異丁基、第二丁基、第三丁基、正戊基、正己基、正 庚基、正辛基、正壬基、正癸基、正十一碳基、正十二碳 基、環戊基及環己基。另一方面，作爲R7之具有6至12 個碳原子的芳基之說明實例係包括苯基、鄰-甲苯基、間-甲苯基、對-甲苯基、1-萘基及2-萘基。作爲前式（1)中 之R7，以環己基、苯基或諸如此類者較佳，而苯基特佳 前式（2)所示之基團的說明實例係包括下式（3)所 示之基團：6- 200905392 (wherein R7 represents an alkyl group having 1 to 12 carbon atoms or an aryl group having 6 to 12 carbon atoms), and a group represented by the following formula (2): X--R8-S- * -.-(2) η (wherein X represents an η-valent organic group, R8 represents a methylene group or an alkylene group having 2 to 6 carbon atoms, and η represents an integer of 2 to 10, and "* It is a polymer that represents a bond. In the present invention, the 'color layer' means "a layer including pixels and/or black matrices". According to the present invention, secondly, the objects and advantages of the present invention are achieved by a color filter comprising a color layer formed using the radiation-sensitive composition of the present invention. According to the present invention, the third object of the present invention is achieved by the color liquid crystal display element comprising the color filter described above. BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below - (A) colorant - depending on the colorant to be produced, the coloring agent in the invention is not particularly limited in color, and the color filter is suitably used. It is selected and can be any of the colorants. 200905392 v Because the color filter requires high color rendering and heat resistance, the coloring agent in the present invention is preferably a coloring agent having high color rendering property and high heat resistance, especially having high heat decomposition resistance. Colorant. It is preferred to use an organic pigment or an inorganic pigment, and it is particularly preferable to use an organic pigment or carbon black. Examples of the foregoing organic pigments include compounds classified as "pigments" according to a color index, in detail, compounds having the following color index (CI) numbers, namely: CI Pigment Yellow 12, CI Pigment Yellow 13, CI Pigment Yellow 14. CI Pigment Yellow 17, CI Pigment Yellow 20, CI Pigment Yellow 24, CI Pigment Yellow 31, CI Pigment Yellow 55, C. I·Pig Yellow 83, CI Pigment Yellow 93, CI Pigment Yellow 109, CI Pigment Yellow 11〇 , CI Pigment Yellow 138, CI Pigment Yellow 139, CI Pigment Yellow 150, CI Pigment Yellow 153, CI Pigment Yellow 154, CI Pigment Yellow 155, CI Pigment Yellow 166, C_I. Pigment Yellow 168, CI Pigment Yellow 180, and CI Pigment Yellow 211; CI Pigment Orange 5, CI Pigment Orange 13, CI Pigment Orange 14, Ο-ΐ. Pigment Orange 24, CI Pigment Orange 34, CI Pigment Orange 36, C. 1_ Pigment Orange 38, CI Pigment Orange 40, C· I. Pigment Orange 43, CI Pigment Orange 46, C_I. Pigment Orange 49, CI Pigment Orange 61, C_I. Pigment Orange 64, C_I. Pigment Orange 68, CI Pigment Orange 70, CI Pigment Orange 71, CI Pigment Orange 72, CI Pigment Orange 73 and CI Pigment Orange 74: c. I. Pigment Red 1, CI Pigment Red 2, CI Pigment Red 5, C·I. Pigment Red 1 7 , C · I. Pigment Red 3 1 , C . I · Pigment Red 3 2, C · I. Pigment Red 4 1 , C . Pigment Red 1 2 2, C · I. Pigment Red 1 2 3, C. I. Pigment Red 1 4 4 , CI Pigment Red 149, CI Pigment Red 166, CI Pigment Red 168, 200905392 CI Pigment Red 170, CI Pigment Red 171, CI Pigment Red 175, CI Pigment Red 167, C _ I · Pigment Red 1.7, C · I. Pigment Red 178, C. I · Pigment Red 179, C. I. Pigment Red 1 8 0, C. I. Pigment Red 1 8 5, C. I. Pigment Red 187, CI Pigment Red 202, CI Pigment Red 206, CI Pigment Red 207, CI Pigment Red 209, CI Pigment Red 214, CI Pigment Red 220, (:· I. Pigment Red 221, CI Pigment Red 224, CI Pigment Red 242, CI Pigment Red 243, CI Pigment Red 254, CI Pigment Red 255, C. I · Pigment Red 2 6 2, C. I. Pigment Red 2 6 4 and C. I · Pigment Red 2 7 2 ; C· I. Pigment Violet 1, CI Pigment Violet 19, CI Pigment Violet 23, C. I·Pigment Violet 29, CI Pigment Violet 32, C. I _Pigment Violet 36 and CI Pigment Violet 38; CI Pigment Blue 15, CI Pigment Blue 15:3, CI Pigment 15 : 4, C_ I. Pigment Blue 15: 6, CI Pigment Blue 60 and C· Ι·Pigment Blue 80; CI Pigment Green 7, CI Pigment Green 36 and CI Pigment Green 58; CI Pigment Brown 23 and C. I· Pigment Brown 25; and CI Pigment Black 1 and c. I. Pigment Black 7. These organic pigments may be purified and used as needed by, for example, a sulfuric acid recrystallization method, a solvent cleaning method, a salt milling method, or a combination of these methods. Preferred among these organic pigments are at least one pigment selected from the group consisting of CI Pigment Yellow 83, CI Pigment Yellow 139, CI Pigment Yellow 138, CI Pigment Yellow 150, CI Pigment Yellow 18, c. I. Pigment Red 166 , CI Pigment Red 1.7, C. I. Pigment Red 2 4 2, C · I Pigment Red 2 5 4, C. I · Pigment Blue 15:3, CI Pigment Blue 15:4, CI Pigment Blue 15:6 , CI Pigment-9 - 200905392 Green 7, C. I. Pigment Green 36, CI Pigment Green 58, c i. Pigment Violet 23, CI Pigment Blue 60 and CI Pigment Blue 8〇. In addition, examples of 'inorganic pigments' include titanium oxide, barium sulfate, calcium carbonate, zinc oxide, lead sulfate, yellow lead, zinc yellow, iron oxide (red iron oxide (III)), cadmium red, ultramarine blue, iron blue, oxidation. Chrome green, cobalt, amber, titanium black, synthetic iron black and carbon black. In the present invention, the aforementioned organic pigments and inorganic pigments may be used singly or in combination of two or more or in combination. When forming a pixel, it is preferred to use at least one organic pigment to form a black matrix, preferably two or more organic pigments and/or carbon black. In the present invention, the surface of the aforementioned pigment particles may be modified with a polymer before use. Description of Polymers for Surface Modification of Pigment Particles Examples include the polymers described in Japanese Patent Laid-Open Publication No. Hei. No. Hei. In the present invention, the colorant may optionally be used together with a dispersing agent. As the above dispersing agent, for example, a suitable cationic, anionic, nonionic or amphoteric dispersing agent can be used. It is preferred to use a polymeric dispersant. Specific examples thereof include modified acrylic copolymers, acrylic copolymers, polyurethanes, polyesters, alkylammonium or phosphate salts of copolymers, and cationic comb-like graft polymers. The cationic comb-like graft polymer is a polymer in which a branched polymer of two or more molecules is grafted to a molecule of a backbone polymer having a plurality of basic groups (cationic functional groups), and is exemplified. It is a polymer comprising a polyethylenimine as a backbone polymer and an e-caprolactone ring-opening polymer as a branched polymer. Among these dispersions, the modified acrylic copolymer, the polyurethane, and the cationic comb-like graft polymer are preferably used in the composition of the invention. These dispersants are commercially available products. Specific examples of commercially available dispersant products include Disperbyk-2000 and Disperbyk-200 1 (products of BYK Japan KK) as modified acrylic copolymers, Disperbyk-161, Disperbyk-162, Disperbyk as polyurethanes -165, Disperbyk-167, Disperbyk-170 and Disperbyk-182 (product of BYK J apa η KK) and so 1 sperse 7 6 5 0 0 (product of L ubrizo 1 J apan Ltd.) and as a cationic comb Solsperse 24000 and Solsperse 37500 (products of Lubrizol Japan Ltd.) and AJISPER PB821, AJISPER PB822 and AJISPER PB880 (products of Ajinomoto Fine-Techno. Co., Inc.) of the branched polymer. These dispersing agents may be used alone or in combination. More blends are used. The content of the dispersing agent is usually not more than 100 parts by weight based on 100 parts by weight of the coloring agent (A), preferably 0.5 to 1 part by weight, more preferably 1 to 7 parts by weight. 1 〇 to 50 parts by weight. In this case, when the content of the dispersant exceeds 100 parts by weight, developability and the like may be deteriorated - (B) alkali-soluble resin - the soluble resin in the present invention contains at least one selected from the group consisting of an acid functional group and an acid anhydride group A polymer of a group, a reproducing unit represented by the above formula (1), and a group represented by the above formula (2) (hereinafter referred to as "polymer B"). The alkali-soluble resin acts on the colorant (A) in the form of a binder, and is soluble in the alkali developer in the developing step of forming the color layer of -11 - 200905392. In the above formula (1), illustrative examples of the alkyl group having 1 to 12 carbon atoms as R7 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, and second butyl group. Base, tert-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-decyl, n-decyl, n-undecyl, n-dodecyl, cyclopentyl and cyclohexyl. On the other hand, illustrative examples of the aryl group having 6 to 12 carbon atoms as R7 include a phenyl group, an o-tolyl group, a m-tolyl group, a p-tolyl group, a 1-naphthyl group, and a 2-naphthyl group. As R7 in the above formula (1), a cyclohexyl group, a phenyl group or the like is preferred, and an illustrative example of the group represented by the phenyl-pre-formula (2) includes the following formula (3). Group:

YY

0II 8 0-C-R8一S-0II 8 0-C-R8-S-

(3) (其中Y係表示η價有機基團，R8及η係如同式（2)所 定義，且「*」係示鍵結手）。 前式（2)及（3)中，作爲R8之具有2至6個碳原 子的伸烷基較佳係爲具有2至6個碳原子之直鏈伸烷基、 下式（R8 )所示之基團： ch3(3) (wherein Y represents an η-valent organic group, R8 and η are as defined in formula (2), and "*" is a bond). In the above formulas (2) and (3), the alkylene group having 2 to 6 carbon atoms as R8 is preferably a linear alkyl group having 2 to 6 carbon atoms, represented by the following formula (R8). Group: ch3

I -R10—CH-* (R8) (其中RlQ係表示單鍵、亞甲基或具有2至4個碳原子之 直鏈伸烷基，且「*」係表示待鍵結於S之鍵結手）、 -12- 200905392 或諸如此類者。 此外，前式（2)及（3)中，η較佳係爲2至8，更 佳係2至6。此外，前式（3 )中，Υ較佳係爲具有2至 20個碳原子之伸烷基、下式（Υ-1 )至（Υ-6 )所示的任 一基團或諸如此類者。 * -(-r11〇^-r11— * (Y-1)I -R10-CH-* (R8) (wherein RlQ represents a single bond, a methylene group or a linear alkyl group having 2 to 4 carbon atoms, and "*" means a bond to be bonded to S Hand), -12- 200905392 or the like. Further, in the above formulas (2) and (3), η is preferably from 2 to 8, more preferably from 2 to 6. Further, in the above formula (3), hydrazine is preferably an alkyl group having 2 to 20 carbon atoms, any group represented by the following formula (?-1) to (?-6) or the like. * -(-r11〇^-r11— * (Y-1)

(Y-2)(Y-2)

芈芈

本 * 氺Ben * 氺

(Y-5) -13- 200905392(Y-5) -13- 200905392

(Υ-6) (式（γ-l )中，R11係表示伸乙基或伸丙基，且m係表 示1至20之整數；式（Y-6)中，R12各獨立表示具有2 至6個碳原子之亞甲基或伸烷基；所有前式中，「*」係 表示鍵結手。） 聚合物（B)之說明實例係包括藉由使包含（bl)至 少一種選自不飽和羧酸、不飽和羧酸酐及不飽和酚化合物 之化合物（以下稱爲「不飽和化合物（bl)」）及（b2) 下式（4)所示之化合物（以下稱爲「不飽和化合物（b2(Υ-6) (In the formula (γ-l), R11 represents an exoethyl or a propyl group, and m represents an integer of 1 to 20; in the formula (Y-6), R12 each independently represents 2 to a methylene group or an alkylene group of 6 carbon atoms; in all the former formulas, "*" means a bonding hand.) An illustrative example of the polymer (B) includes by including (bl) at least one selected from the group consisting of a compound of a saturated carboxylic acid, an unsaturated carboxylic anhydride, and an unsaturated phenol compound (hereinafter referred to as "unsaturated compound (bl)") and (b2) a compound represented by the following formula (4) (hereinafter referred to as "unsaturated compound ( B2

(其中R7係如问式（1)所疋義）’之可聚合混合物於下 $ (5)所示之化合物存在下進行聚合而製得的共聚物（ 以下稱爲「共聚物（B1)」： -14- 200905392a copolymer obtained by polymerizing a polymerizable mixture of (wherein R7 is as defined in the formula (1)) in the presence of a compound represented by the following (5) (hereinafter referred to as "copolymer (B1)" : -14- 200905392

(其中X、R8及η係如同式（2)所定義）。 不飽和化合物（bl)中’不飽和羧酸及不飽和羧酸酐 之說明實例係包括不飽和單羧酸’諸如（甲基）丙烯酸、 巴豆酸、α-氯丙烯酸及肉桂酸；不飽和二羧酸或其酐， 諸如順丁烯二酸、順丁烯二酸酐、反丁嫌二酸、依康酸、 依康酸酐、檸康酸、檸康酸酐及中康酸；具有三或更多個 羧基之不飽和多羧酸或其酐；具有二或更多個羧基之多羧 酸的單[(甲基）丙烯醯氧烷基]酯，諸如琥珀酸單[2-(甲 基）丙烯醯氧乙基]酯及苯二甲酸單[2-(甲基）丙烯醯氧 乙基]酯；及於兩末端皆具有羧基及羥基之聚合物的單（ 甲基）丙烯酸酯，諸如ω-羧基聚己內酯單（甲基）丙烯 酸酯。 此等不飽和羧酸及不飽和羧酸酐中，琥珀酸單[2-丙 烯醯氧乙基]酯及苯二甲酸單[2-丙烯醯氧乙基]酯之市售商 標個別爲 Light Ester HOA-MS 及 Light Ester ΗΟΑ-ΜΡΕ (Kyoeisha Chemical Co.，Ltd.之產品）。 前述不飽和酚化合物之說明實例係包括不飽和酚，諸 如鄰-乙烯基酚、間·乙烯基酚、對-乙烯基酚、2-甲基- 4-乙烯基酚、3-甲基-4-乙烯基酚、鄰-異丙烯基酚、間-異丙 烯基酚及對-異丙烯基酚；及不飽和萘酚，諸如2-乙烯基- 1- 萘酚、3-乙烯基-1-萘酚、1-乙烯基-2-萘酚、3-乙烯基- 2- 萘酚、2-異丙烯基-1_萘酚及3-異丙烯基-1-萘酚。 -15- 200905392 本發明中，作爲不飽和化合物（bl)，以（甲基）丙 烯酸、對-乙烯基酚及諸如此類者較佳，而（甲基）丙烯 酸特佳。 不飽和化合物（b 2 )之說明實例係包括N -苯基順丁 烯二醯亞胺、N-鄰-羥基苯基順丁烯二醯亞胺、N-間-羥基 苯基順丁烯二醯亞胺、N-對-羥基苯基順丁烯二醯亞胺、 N-苄基順丁烯二醯亞胺、N-環己基順丁烯二醯亞胺、N-琥 珀醯亞胺基-3-順丁烯二醯亞胺苄酸酯、M-琥珀醯亞胺基-4-順丁烯二醯亞胺丁酸酯、N-琥珀醯亞胺基-6-順丁烯二 醯亞胺己酸酯、N -琥珀醯亞胺基-3-順丁烯二醯亞胺丙酸 酯及N-(吖啶基）順丁烯二醯亞胺。 此等N_位置經取代之順丁烯二醯亞胺中，N-苯基順 丁烯二醯亞胺、N-環己基順丁烯二醯亞胺及諸如此類者較 佳，而N_苯基順丁烯二醯亞胺特佳。 共聚物（B1)中，不飽和化合物（b2)可單獨或二或 更多種摻合使用。 本發明中，用於合成共聚物（B1)之可聚合混合物在 除了不飽和化合物（bl)及不飽和化合物（b2)之外，另 可含有其他可與此等化合物共聚之不飽和化合物。 作爲前述其他不飽和化合物（b3 )，以至少一種選自 具有氧雜環丁烷骨架之不飽和化合物（以下稱爲「不飽和 化合物（b3-l)」及具有四氫呋喃骨架的不飽和化合物（ 以下稱爲「不飽和化合物（b3-2 )」）的化合物（以下總 稱爲「不飽和化合物（b3 )」）較佳。 -16- 200905392 不飽和化合物（b3 -1 )的較佳實例包括下式（〇所 示之化合物（以下稱爲「不飽和化合物（b3-la )」）及 下式（II )所示化合物（以下稱爲「不飽和化合物（1)3-lb)」）。 CH2=C—C-〇—(CH2)—C—c—R4 (I) R5—C——O R6 (式（I)中’ R1係表示氫原子或具有1至4個碳原子之 烷基，R2係表示氫原子或具有1至4個碳原子之烷基， R3、R4、R5及R6各獨立表示氫原子、氟原子、具有1至 4個碳原子之烷基、具有1至4個碳原子之氟烷基或具有 6至20個碳原子之芳基，且n係爲〇至6之整數）。 (II) CH2=C—C—0—(CH2)—C—C—R4 ϋ 丨I 5 R6 ϋ Ο—c—R5 (式（II)中，R1、R2、R3、R4、R5、R6 及 n 係如同式（ I )中 Rl、R2、R3、R4、R5、R6 及 n 之定義）。 作爲式（I)及式（II)中 R1、R2、R3、R4、R·5 及 R6 之具有1至4個碳原子的烷基之說明實例係包括甲基、乙 基、正丙基、異丙基、正丁基、異丁基、第二丁基及第三 丁基。 此外，作爲R3、R4、R5及H6之具有1至4個碳原子 的氟烷基之說明實例係包括氟甲基、二氟甲基、三氟甲基 -17- 200905392 、1·氟乙基、2-氟乙基、ι，ΐ-二氟乙基、2,2,2-三氟乙基' 五氟乙基、七氟-正丙基、七氟-異丙基、九氟-正丁基、 九氣-異丁基、九氣_弟一丁基及九氣-第二丁基。 此外’作爲R3、R4、R5及R6之具有6至2〇個碳原 子的芳基之說明實例係包括苯基、鄰-甲苯基、間-甲苯基 及對-甲苯基。 不飽和化合物（b3-la)的特定實例係包括（甲基） 丙烯酸酯’諸如3-[(甲基）丙烯醯氧甲基]氧雜環丁烷、 3-[(甲基）丙烯醯氧甲基]-2-甲基氧雜環丁烷、3_[(甲 基）丙烯醯氧甲基卜3-甲基氧雜環丁烷、3-[(甲基）丙烯 醯氧甲基]-2-乙基氧雜環丁烷、3-[(甲基）丙烯醯氧甲基 ]-3-乙基氧雜環丁烷、3-[(甲基）丙烯醯氧甲基]-2-三氟 甲基氧雜環丁烷、3-[(甲基）丙烯醯氧甲基]-2-五氟乙基 氧雜環丁烷、3-[(甲基）丙烯醯氧甲基]-2-苯基氧雜環丁 烷、3-[(甲基）丙烯醯氧甲基]-2,2-二氟氧雜環丁烷、3-[ (甲基）丙烯醯氧甲基]-2,2,4-三氟氧雜環丁烷、3-[(甲 基）丙烯醯氧甲基]-2,2,4,4-四氟氧雜環丁烷、3-[2-(甲 基）丙烯醯氧乙基]氧雜環丁烷、3-[2-(甲基）丙烯醯氧 乙基]-2-甲基氧雜環丁烷、3-[2-(甲基）丙烯醯氧乙基]-3-甲基氧雜環丁烷、3-[2-(甲基）丙烯醯氧乙基]-2-乙基 氧雜環丁烷、3-[2-(甲基）丙烯醯氧乙基]-3-乙基氧雜環 丁院、3-[2-(甲基）丙燃醯氧乙基]-2 -三氟甲基氧雜環丁 烷、3_[2_ (甲基）丙烯醯氧乙基]-2-五氟乙基氧雜環丁烷 、3-[2-(甲基）丙烯醯氧乙基]-2-苯基氧雜環丁院、3-[2_ -18- 200905392 (甲基）丙烯醯氧乙基]-2,2-二氟氧雜環丁烷、3-[2-(甲 基）丙烯醯氧乙基]-2,2,4-三氟氧雜環丁烷及3-[2-(甲基 )丙烯醯氧乙基]-2,2,4,4-四氟氧雜環丁烷。 此外，不飽和化合物（b 3 -1 b )之特定實例係包括（ 甲基）丙烯酸酯，諸如2-[(甲基）丙烯醯氧甲基]氧雜環 丁烷、2-[(甲基）丙烯醯氧甲基]-2-甲基氧雜環丁烷、2-[(甲基）丙烯醯氧甲基]-3-甲基氧雜環丁烷、2-[(甲基 )丙烯醯氧甲基]-4-甲基氧雜環丁烷、2-[(甲基）丙烯醯 氧甲基]-2-乙基氧雜環丁烷、2-[(甲基）丙烯醯氧甲基]-3-乙基氧雜環丁烷、2-[(甲基）丙烯醯氧甲基]_4_乙基氧 雜環丁烷、2-[(甲基）丙烯醯氧甲基]-2-三氟甲基氧雜環 丁院、2_[(甲基）丙嫌醯氧甲基]-3 -三氟甲基氧雜環丁院 、2-[(甲基）丙烯醯氧甲基]-4-三氟甲基氧雜環丁烷、2-[(甲基）丙烯醯氧甲基]-2-五氟乙基氧雜環丁烷、2-[( 甲基）丙烯醯氧甲基]-3-五氟乙基氧雜環丁烷、2_[(甲基 )丙烯醯氧甲基]-4-五氟乙基氧雜環丁烷、2-[(甲基）丙 烯醯氧甲基]-2-苯基氧雜環丁烷、2-[(甲基）丙烯醯氧甲 基]-3-苯基氧雜環丁烷、2-[(甲基）丙烯醯氧甲基]-4-苯 基氧雜環丁烷、2-[(甲基）丙烯醯氧甲基]-2,3·二氟氧雜 環丁烷、2-[(甲基）丙烯醯氧甲基]-2,4-二氟氧雜環丁院 、2-[(甲基）丙烯醯氧甲基]-3,3-二氟氧雜環丁烷、2-[( 甲基）丙烯醯氧甲基]-3,4-二氟氧雜環丁烷、2-[(甲基） 丙烯醯氧甲基]-4,4-二氟氧雜環丁烷、2-[(甲基）丙嫌醯 氧甲基]-3,3,4-三氟氧雜環丁烷、2-[(甲基）丙烯醯氧甲 -19- 200905392 基]-3,4,4-三氟氧雜環丁烷、2·[(甲基）丙烯醯氧甲基]- 3.3.4.4- 三氟氧雜環丁烷、2-[2(甲基）丙烯醯氧乙基]氧 雜環丁烷、2-[2(甲基）丙烯醯氧乙基]-2 -甲基氧雜環丁 烷、2-[2(甲基）丙烯醯氧乙基]_3·甲基氧雜環丁烷、2-[2 (甲基）丙稀醯氧乙基]甲基氧雜環丁院、2-[2 (甲 基）丙嫌醯氧乙基]乙基氧雜環丁院、2_[2(甲基）丙 烯醯氧乙基]_3·乙基氧雜環丁烷、2-[2(甲基）丙烯醯氧 乙基]-4-乙基氧雜環丁烷、2-[2 (甲基）丙烯醯氧乙基]-2-三氟甲基氧雜環丁烷、2-[2 (甲基）丙烯醯氧乙基]-3-三 氟甲基氧雜環丁烷、2-[2 (甲基）丙烯醯氧乙基]-4-三氟 甲基氧雜環丁烷、2_[2(甲基）丙烯酸氧乙基]_2_五氟乙 基氧雜環丁烷、2-[2(甲基）丙烯醯氧乙基]-3-五氟乙基 氧雜環丁院、2_[2(甲基）丙嫌酿氧乙基卜4_五氟乙基氧 雜環丁院、2-[2(甲基）丙烯醯氧乙基]-2·苯基氧雜環丁 烷、2-[2 (甲基）丙烯醯氧乙基1-3-苯基氧雜環丁院、2_ [2 (甲基）丙烯醯氧乙基]苯基氧雜環丁烷、2-[2 (甲 基）丙烯醯氧乙基]-2,3-二氟氧雜環丁烷、2-[2 (甲基） 丙烯醯氧乙基]-2,4-二氟氧雜環丁烷、2-[2 (甲基）丙燃 醯氧乙基]-3，3-二氟氧雜環丁烷、2-[2 (甲基）丙稀酿氧 乙基]-3,4-二氟氧雜環丁烷、2-[2(甲基）丙烯醯氧乙基]- 4.4- 二氟氧雜環丁烷、2-[2(甲基）丙烯醯氧乙基]-3,3,4· 三氟氧雜環丁烷、2-[2(甲基）丙烯醯氧乙基]_3,4,4·三氟 氧雜環丁烷及2-[2(甲基）丙烯醯氧乙基]·3,3,4,4·四氟 氧雜環丁院。 -20- 200905392 此等不飽和化合物（b3-la)及不飽和化合物（b3-lb )中，3-[(甲基）丙烯醯氧甲基]氧雜環丁烷、3-[(甲基 )丙烯醯氧甲基]-3-乙基氧雜環丁烷、3-[(甲基）丙嫌醯 氧甲基]-2-三氟甲基氧雜環丁烷、3-[(甲基）丙烯醯氧甲 基]-2-苯基氧雜環丁烷、2-[(甲基）丙烯醯氧甲基]氧雜 環丁烷及2-[(甲基）丙烯醯氧甲基]-4-三氟甲基氧雜環 丁烷較佳，而3-[(甲基）丙烯醯氧甲基]氧雜環丁烷' 3· [(甲基）丙烯醯氧甲基]-3-乙基氧雜環丁烷、3-[(甲基 )丙烯醯氧甲基]-2-三氟甲基氧雜環丁烷、3-[(甲基）丙 烯醯氧甲基]-2-苯基氧雜環丁烷、2-[(甲基）丙烯醯氧甲 基]氧雜環丁烷及2-[(甲基）丙烯醯氧甲基]-4-三氟甲基 氧雜環丁烷特佳，因爲待製得之輻射敏感性組成物的顯影 容限變寬，改善待製得之彩色層的抗化學性。 此外，本發明中，除了飽和化合物（b3 -1 a )及不飽 和化合物（b3-lb)以外，乙烯基酚之（氧雜環丁烷基） 醚，諸如（3-氧雜環丁烷基甲氧基）-對-乙烯基苯、[2-( 3·氧雜環丁烷基）乙氧基]-對-乙烯基苯、（2-氧雜環丁院 基甲氧基）-對-乙烯基苯及[2- (2-氧雜環丁烷基）乙氧基 ]-對-乙烯基苯；及（氧雜環丁烷基烷基）乙烯基醚，諸 如（3-氧雜環丁烷基甲基）乙烯基醚、[2-(3-氧雜環丁院 基）乙基]乙烯基醚、（2_氧雜環丁烷基甲基）乙燦基_ 及[2-(2-氧雜環丁烷基）乙基]乙烯基醚亦可作爲氧雜環 丁烷不飽和化合物。 共聚物（B1)中，不飽和化合物（b3-l)可單獨$ — -21 - 200905392 或更多種摻合使用。 同時，不飽和化合物（b3-2 )之說明實例係包括（甲 基）丙烯酸之四氫呋喃酯，諸如（甲基）丙烯酸四氫呋 喃-2-酯及（甲基）丙烯酸四氫呋喃-3-酯；（甲基）丙烯 酸含四氫糠基之酯，諸如（甲基）丙烯酸四氫糠酯、（甲 基）丙烯酸3-四氫糠酯、（甲基）丙烯酸2-(四氫糠基 氧基）乙酯及（甲基）丙烯酸2-(3-四氫糠基氧基）乙酯 ;2-(甲基）丙烯醯氧丙酸含四氫糠基之酯，諸如2-(甲 基）丙烯醯氧丙酸四氫糠酯、2-(甲基）丙烯醯氧丙酸3-四氫糠酯、2-(甲基）丙烯醯氧丙酸2-(四氫糠基氧基） 乙酯及2-(甲基）丙烯醯氧丙酸2-(3-四氫糠基氧基） 乙酯；乙烯基苯衍生物，諸如（四氫呋喃-2-基）氧基_對_ 乙烯基苯、（四氫呋喃基）氧基-對-乙烯基苯及2-(四氫 呋喃-2-基氧基）乙氧基-對-乙烯基苯；乙烯基醚，諸如（ 四氫呋喃-2-基）乙烯基醚、（四氫糠基）乙烯基醚、[2-(四氫糠基氧基）乙基]乙烯基醚及[2-(甲基）丙烯醯氧 乙基](四氫糠基）琥珀酸酯。 此等不飽和化合物（b3-2)中，（甲基）丙烯酸含四 氫糠基之酯及[2-(甲基）丙烯醯氧乙基](四氫糠基）琥 珀酸酯較佳，（甲基）丙烯酸四氫糠酯及[2-(甲基）丙 烯醯氧乙基](四氫糠基）琥珀酸酯特佳。 共聚物（B1)中，不飽和化合物（b3-2)可單獨或二 或更多種摻合使用。 此外，本發明中，除不飽和化合物（b3 )以外之不飽 -22- 200905392 和化合物（以下稱爲「不飽和化合物（b3·3)」亦可作爲 其他不飽和化合物。 不飽和化合物（b3 -3 )之說明實例係包括芳族乙烯基 化合物，諸如苯乙烯、甲基苯乙烯、鄰-乙烯基甲苯、 間-乙烯基甲苯、對-乙烯基甲苯、對-氯苯乙烯、鄰-甲氧 基苯乙烯、間-甲氧基苯乙烯、對-甲氧基苯乙烯、鄰-乙 烯基苄基甲基醚、間-乙烯基苄基甲基醚、對·乙烯基苄基 甲基醚、鄰-乙烯基苄基縮水甘油基醚、間-乙烯基苄基縮 水甘油基醚及對-乙烯基苄基縮水甘油基醚：茚，諸如茚 及1-甲基茚：於聚合物分子鏈之一末端具有（甲基）丙 烯醯基之巨單體（以下簡稱爲「巨單體」），諸如聚苯乙 烯、聚（甲基）丙烯酸甲酯、聚（甲基）丙烯酸正丁酯及 聚矽氧烷：不飽和羧酸酯，諸如（甲基）丙烯酸甲酯、（ 甲基）丙烯酸乙酯、（甲基）丙烯酸正丙酯、（甲基）丙 烯酸異丙酯、（甲基）丙烯酸正丁酯、（甲基）丙烯酸異 丁酯、（甲基）丙烯酸第二丁酯、（甲基）丙烯酸第三丁 酯、（甲基）丙烯酸2-羥基乙酯、（甲基）丙烯酸2-羥 基丙酯、（甲基）丙烯酸3 -羥基丙酯、（甲基）丙烯酸 2-羥基丁酯、（甲基）丙烯酸3-羥基丁酯、（甲基）丙烯 酸4-羥基丁酯、（甲基）丙烯酸烯丙酯、（甲基）丙烯 酸苄酯、（甲基）丙烯酸環己酯、（甲基）丙烯酸2-乙基 己酯、（甲基）丙烯酸苯酯、（甲基）丙烯酸2-甲氧基 乙酯、（甲基）丙烯酸2-苯氧基乙酯、甲氧基二乙二醇 (甲基）丙烯酸酯、甲氧基三乙二醇（甲基）丙烯酸酯、 -23- 200905392 甲氧基丙二醇（甲基）丙烯酸酯、甲氧基二丙二 )丙烯酸酯、（甲基）丙烯酸異萡酯、（甲基） 環[5.2.1.02 6]癸-8-酯、（甲基）丙烯酸2-羥基-丙酯及甘油（甲基）丙烯酸酯；不飽和羧酸胺基 諸如（甲基）丙烯酸2-胺基乙酯、（甲基）丙欠 甲基胺基乙酯、（甲基）丙烯酸2-胺基丙酯、 丙烯酸2-二甲基胺基丙酯、（甲基）丙烯酸3-及（甲基）丙烯酸3 -二甲基胺基丙酯：不飽和 甘油酯，諸如（甲基）丙烯酸縮水甘油酯；羧酸 諸如乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯及苄 ;其他不飽和醚，諸如乙烯基甲基醚、乙烯基乙 丙基縮水甘油醚；乙烯基氰化合物，諸如（甲基 、〇：-氯丙烯腈及亞乙烯基二氰；及不飽和醯胺 甲基）丙烯醯胺、α-氯丙烯醯胺及ν-2 -羥基乙 )丙烯醯胺；脂族共軛二烯，諸如1，3-丁二烯、 烯、氯丁二烯及異戊間二烯磺酸。 此等不飽和化合物（b3-3)中，苯乙稀、巨 甲基）丙烯酸甲酯、（甲基）丙烯酸2-羥基乙 基）丙烯酸烯丙酯、（甲基）丙烯酸节酯、（甲 酸環己酯、（甲基）丙烯酸2 -乙基己酯、（甲 酸苯酯、（甲基）丙稀酸異宿酯、（甲基）丙 [5.2.1.021]癸-8-酯及甘油單（甲基）丙嫌酸酯較 體中’聚苯乙烧巨卓體及聚（甲基）丙嫌酸甲醋 佳。 醇（甲基 丙烯酸三 3-苯氧基 烷基酯， 希酸2-二 (甲基） 胺基丙酯 羧酸縮水 乙烯酯， 酸乙烯酯 基醚及烯 )丙烯腈 ，諸如（ 基（甲基 異戊間二 單體、（ 酯、（甲 基）丙烯 基）丙烯 烯酸三環 佳。巨單 巨單體特 -24- 200905392 共聚物（B1)中，不飽和化合物（b3-3)可單獨或二 或更多種摻合使用。 本發明中，當共聚物（B 1 )係爲藉由使包含不飽和化 合物（b3)之可聚合混合物進行聚合所製得之共聚物（以 下稱爲「共聚物（B1-1)」時，共聚物（B1-1)可於以下 任一形式下使用，即： [I] 其中使用藉由使包含不飽和化合物（bl) 、（b2 )及（b3-l)及視情況使用之不飽和化合物（b3-3)之可 聚合混合物進行聚合所得的共聚物（B 1 -1 )作爲鹼可溶性 樹脂之組份的形式， [II] 其中使用藉由使包含不飽和化合物（bl)、（ b2 )及（b3-2 )及視情況使用之不飽和化合物（b3-3 )之 可聚合混合物進行聚合所得的共聚物（B1-1)作爲鹼可溶 性樹脂之組份的形式， [ΠΙ]其中使用藉由使包含不飽和化合物（bl)、（ b2 ) 、 （ b3-l )及（b3-2 )及視情況使用之不飽和化合物 (b3-3)之可聚合混合物進行聚合所得的共聚物（B1-1) 作爲鹼可溶性樹脂之組份的形式，及 [IV]其中使用前述[I]至[III]中之二或更多種共聚物 (B 1 -1 )的混合物作爲鹼可溶性樹脂之組份的形式。 共聚物（B1)中，待共聚之不飽和化合物（bl)的比 例較佳係爲1至4 0重量％，尤其是5至3 5重量％，待共 聚之不飽和化合物（b2 )的比例較佳係爲1至40重量％ ，尤其是5至3 0重量％。 -25- 200905392 此外，當不飽和化合物（b3)與不飽和化合物（bl) 及不飽和化合物（b2 )共聚時’待共聚之不飽和化合物（ b3 )的比例較佳係爲1至70重量％，尤其是1至40重量 %，待共聚之不飽和化合物（b3 -3 )的比例較佳係爲〇至 7 0重量％，更佳係爲1至6 0重量％。 此外，當不飽和化合物（b 3 -1 )及不飽和化合物（ b3-2 )兩者皆與不飽和化合物（bl )及不飽和化合物（b2 )共聚時，待共聚之不飽和化合物（b3 - 1 )的比例較佳係 爲1至70重量％，尤其是1至40重量％，待共聚之不飽 和化合物（b 3 - 2 )的比例較佳係爲1至6 0重量％，尤其是 1至40重量。/。，而待共聚之不飽和化合物（b3-3 )的比例 較佳係爲〇至70重量％，更佳係爲1至60重量％。 此外，當不飽和化合物（b3-l )及不飽和化合物（ b3-2 )分別與不飽和化合物（bl )及不飽和化合物（b2 ) 共聚時，待共聚之不飽和化合物（b 3 -1 )的比例較佳係！ 至7 0重量％，尤其是1至4 0重量％，待共聚之不飽和化 合物（b 3 - 3 )的比例較佳係爲〇至7 0重量％，更佳爲1至 6 0重量％，待共聚之不飽和化合物（b 3 - 2 )的比例較佳係 1至60重量％，尤其是1至40重量％，待共聚之不飽和 化合物（b 3 - 3 )的比例較佳係爲0至7 0重量％，更佳爲1 至60重量％。 本發明中，當不飽和化合物於共聚物（B 1 )中之比例 介於前述範圍內時，可得到用以形成敏感性、對基板黏著 性、抗溶劑性及諸如此類性質優異的彩色層之輻射敏感性 -26- 200905392 組成物。 共聚物（B1)可藉由於適當之溶劑中在前式（5)所 示之化合物（以下稱爲「多硫醇化合物」）存在下利用自 由基聚合起始劑（諸如2,2'-偶氮基雙異丁腈、2,2，_偶氮 基雙（2,4-二甲基戊腈）或2,2·-偶氮基雙（4-甲氧基-2,4-二甲基戊腈）使不飽和化合物進行聚合來合成。 作爲前述多硫醇化合物，以下式（6 )所示之化合物 較佳。(where X, R8 and η are as defined by equation (2)). Illustrative examples of the 'unsaturated carboxylic acid and the unsaturated carboxylic acid anhydride in the unsaturated compound (bl) include unsaturated monocarboxylic acids such as (meth)acrylic acid, crotonic acid, α-chloroacrylic acid, and cinnamic acid; unsaturated dicarboxylic acid An acid or an anhydride thereof, such as maleic acid, maleic anhydride, butyl succinic acid, isaconic acid, isaconic anhydride, citraconic acid, citraconic anhydride, and mesaconic acid; having three or more a carboxyl group-unsaturated polycarboxylic acid or an anhydride thereof; a mono[(meth)acryloxyalkylalkyl] ester of a polycarboxylic acid having two or more carboxyl groups, such as succinic acid mono [2-(methyl) acrylonitrile] Oxyethyl] ester and mono [2-(methyl) propylene oxyethyl] phthalic acid ester; and mono(meth) acrylate having a carboxyl group and a hydroxyl group polymer at both ends, such as ω-carboxyl group Polycaprolactone mono(meth)acrylate. Among these unsaturated carboxylic acids and unsaturated carboxylic anhydrides, the commercial trademarks of succinic acid mono [2-propenyl oxyethyl] ester and phthalic acid mono [2- propylene oxy oxy] ester are individually Light Ester HOA. -MS and Light Ester ΗΟΑ-ΜΡΕ (product of Kyoeisha Chemical Co., Ltd.). Illustrative examples of the aforementioned unsaturated phenol compound include unsaturated phenols such as o-vinylphenol, m-vinylphenol, p-vinylphenol, 2-methyl-4-vinylphenol, 3-methyl-4 -vinylphenol, o-isopropenylphenol, m-isopropenylphenol and p-isopropenylphenol; and unsaturated naphthols such as 2-vinyl-1-naphthol, 3-vinyl-1- Naphthol, 1-vinyl-2-naphthol, 3-vinyl-2-naphthol, 2-isopropenyl-1-naphthol and 3-isopropenyl-1-naphthol. -15- 200905392 In the present invention, as the unsaturated compound (b1), (meth)acrylic acid, p-vinylphenol, and the like are preferred, and (meth)acrylic acid is particularly preferred. Illustrative examples of the unsaturated compound (b 2 ) include N-phenyl maleimide, N-o-hydroxyphenyl maleimide, N-m-hydroxyphenyl-butenylene Yttrium imine, N-p-hydroxyphenyl maleimide, N-benzyl maleimide, N-cyclohexyl maleimide, N-amber quinone -3-methyleneimine benzyl ester, M-succinimide-4-butylimide butyrate, N-succinimide-6-butylene Iminohexanoate, N-succinimide-3-butylimide propionate and N-(acridinyl) maleimide. Among these substituted N-position maleimide, N-phenyl maleimide, N-cyclohexyl maleimide and the like, and N_benzene The cis-butenylenediamine is particularly preferred. In the copolymer (B1), the unsaturated compound (b2) may be used singly or in combination of two or more. In the present invention, the polymerizable mixture for synthesizing the copolymer (B1) may contain, in addition to the unsaturated compound (b1) and the unsaturated compound (b2), other unsaturated compounds copolymerizable with these compounds. The other unsaturated compound (b3) is at least one selected from the group consisting of unsaturated compounds having an oxetane skeleton (hereinafter referred to as "unsaturated compound (b3-l)" and unsaturated compounds having a tetrahydrofuran skeleton (hereinafter A compound called "unsaturated compound (b3-2)") (hereinafter collectively referred to as "unsaturated compound (b3)") is preferred. -16-200905392 Preferred examples of the unsaturated compound (b3-1) include the following formula (The compound shown in 〇 (hereinafter referred to as "unsaturated compound (b3-la)") and the compound represented by the following formula (II) (hereinafter referred to as "unsaturated compound (1) 3-lb)") CH2= C—C—〇—(CH2)—C—c—R4 (I) R5—C—O R6 (In the formula (I), R1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R2 Is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R3, R4, R5 and R6 each independently represent a hydrogen atom, a fluorine atom, an alkyl group having 1 to 4 carbon atoms, and 1 to 4 carbon atoms. a fluoroalkyl group or an aryl group having 6 to 20 carbon atoms, and n is an integer from 〇 to 6). (II) CH2=C—C—0—(CH2)—C—C R4 ϋ 丨I 5 R6 ϋ Ο—c—R5 (In the formula (II), R1, R2, R3, R4, R5, R6 and n are as in the formula (I), R1, R2, R3, R4, R5, R6 And definition of n. Examples of the alkyl group having 1 to 4 carbon atoms of R1, R2, R3, R4, R.5 and R6 in the formula (I) and the formula (II) include methyl group and ethyl group a propyl group having 1 to 4 carbon atoms as R3, R4, R5 and H6 Illustrative examples include fluoromethyl, difluoromethyl, trifluoromethyl-17- 200905392, 1·fluoroethyl, 2-fluoroethyl, iota, fluorene-difluoroethyl, 2,2,2- Trifluoroethyl 'pentafluoroethyl, heptafluoro-n-propyl, heptafluoro-isopropyl, nonafluoro-n-butyl, nine-p-isobutyl, nine gas - di-butyl and nine gas - Further, the illustrative examples of the aryl group having 6 to 2 carbon atoms of R3, R4, R5 and R6 include a phenyl group, an o-tolyl group, a m-tolyl group and a p-tolyl group. Specific examples of the saturated compound (b3-la) include (meth) acrylates such as 3-[(meth)acryl oxime Methyl]oxetane, 3-[(meth)acrylomethoxymethyl]-2-methyloxetane, 3-[(meth)acrylomethoxymethylbut-3-methylox Heterocyclobutane, 3-[(meth)acrylomethoxymethyl]-2-ethyloxetane, 3-[(meth)acrylomethoxymethyl]-3-ethyloxocyclo Butane, 3-[(meth)acrylomethoxymethyl]-2-trifluoromethyloxetane, 3-[(methyl)acryloxymethyl]-2-pentafluoroethyloxy Heterocyclobutane, 3-[(meth)acrylomethoxymethyl]-2-phenyloxetane, 3-[(meth)acrylomethoxymethyl]-2,2-difluoroox Heterocyclobutane, 3-[(meth)acrylomethoxymethyl]-2,2,4-trifluorooxetane, 3-[(methyl)acryloxymethyl]-2,2 , 4,4-tetrafluorooxetane, 3-[2-(methyl)acryloyloxyethyl]oxetane, 3-[2-(methyl)propene oxiranyl]- 2-methyloxetane, 3-[2-(methyl)acryloyloxyethyl]-3-methyloxetane, 3-[2-(methyl)propene oxiranyl ]-2-Ethyloxetane, 3-[2-(methyl)acryloyloxyethyl]-3-ethyloxetane, 3-[2-(methyl)propane oxime Oxyethyl]-2-trifluoromethyl Oxetane, 3_[2_(methyl)acryloyloxyethyl]-2-pentafluoroethyloxetane, 3-[2-(methyl)propene oxiranyl]-2- Phenyloxetane, 3-[2_ -18- 200905392 (meth) propylene oxiranyl]-2,2-difluorooxetane, 3-[2-(methyl) propylene oxime Oxyethyl]-2,2,4-trifluorooxetane and 3-[2-(methyl)propenyloxyethyl]-2,2,4,4-tetrafluorooxetane . Further, specific examples of the unsaturated compound (b 3 -1 b ) include (meth) acrylate such as 2-[(meth)acrylomethoxymethyl]oxetane, 2-[(methyl) ) propylene oxime methyl]-2-methyl oxetane, 2-[(methyl) propylene 醯 oxymethyl]-3-methyl oxetane, 2-[(meth) propylene醯Oxymethyl]-4-methyloxetane, 2-[(meth)acrylomethoxymethyl]-2-ethyloxetane, 2-[(meth) propylene oxime Methyl]-3-ethyloxetane, 2-[(meth)acryloyloxymethyl]_4_ethyloxetane, 2-[(methyl)acryloxymethyl] -2-trifluoromethyloxetane, 2_[(methyl)-propyl oxime-oxymethyl]-3-trifluoromethyloxetane, 2-[(meth) propylene oxime 4-trifluoromethyloxetane, 2-[(meth)acrylomethoxymethyl]-2-pentafluoroethyloxetane, 2-[(methyl)propene oxime Oxymethyl]-3-pentafluoroethyloxetane, 2-[(meth)acrylomethoxymethyl]-4-pentafluoroethyloxetane, 2-[(meth)propene醯Oxymethyl]-2-phenyloxetane, 2-[(meth)acrylomethoxymethyl]-3-phenyl Heterocyclobutane, 2-[(meth)acrylomethoxymethyl]-4-phenyloxetane, 2-[(meth)acrylomethoxymethyl]-2,3·difluoroox Heterocyclic butane, 2-[(meth)acrylomethoxymethyl]-2,4-difluorooxetane, 2-[(methyl)acryloxymethyl]-3,3-di Fluoxetane, 2-[(methyl)acryloxymethyl]-3,4-difluorooxetane, 2-[(meth)acrylomethoxymethyl]-4,4 -difluorooxetane, 2-[(methyl)-propyl oxime-oxymethyl]-3,3,4-trifluorooxetane, 2-[(methyl) propylene oxime- 19- 200905392 yl]-3,4,4-trifluorooxetane, 2·[(methyl)acryloxymethyl]-3.3.4.4-trifluorooxetane, 2-[2 (Meth)acryloyloxyethyl]oxetane, 2-[2(methyl)acryloyloxyethyl]-2-methyloxetane, 2-[2(methyl)propene醯Oxyethyl]_3·methyloxetane, 2-[2 (methyl) propylene oxyethyl] methyl oxetane, 2-[2 (methyl) propylene Ethyl]ethyloxetane, 2_[2(methyl)acryloyloxyethyl]_3.ethyloxetane, 2-[2(methyl)acryloyloxyethyl]-4 -ethyl oxygen Cyclobutane, 2-[2 (meth) propylene oxyethyl]-2-trifluoromethyl oxetane, 2-[2 (methyl) propylene oxyethyl]-3-trifluoro Methyl oxetane, 2-[2 (meth) propylene oxyethyl]-4-trifluoromethyl oxetane, 2-[2(methyl) acrylate oxyethyl]_2_5 Fluoroethyl oxetane, 2-[2(methyl) propylene oxiranyl]-3-pentafluoroethyl oxetane, 2_[2(methyl) propylene oxyethylene 4_pentafluoroethyl oxetane, 2-[2(methyl)acryloyloxyethyl]-2-phenyloxetane, 2-[2 (meth) propylene oxirane 1-3-phenyloxetan, 2_[2 (meth) propylene oxyethyl] phenyl oxetane, 2-[2 (methyl) propylene oxiranyl]-2, 3-difluorooxetane, 2-[2(methyl)acryloyloxyethyl]-2,4-difluorooxetane, 2-[2(methyl)propane oxyfluoride -3,3-difluorooxetane, 2-[2 (methyl) propylene oxyethyl]-3,4-difluorooxetane, 2-[2 (methyl ) propylene oxiranyl ethyl]- 4.4-difluorooxetane, 2-[2(methyl) propylene oxiranyl]-3,3,4·trifluorooxetane, 2-[ 2 (methyl Propylene oxiranyl ethyl]_3,4,4·trifluorooxetane and 2-[2(methyl)acryloyloxyethyl]·3,3,4,4·tetrafluorooxetane . -20- 200905392 Among these unsaturated compounds (b3-la) and unsaturated compounds (b3-lb), 3-[(meth)acrylomethoxymethyl]oxetane, 3-[(methyl) ) propylene oxime methyl]-3-ethyl oxetane, 3-[(methyl) propyl oxime oxymethyl]-2-trifluoromethyl oxetane, 3-[(A Base) propylene oxime methyl]-2-phenyl oxetane, 2-[(meth) propylene oxirane methyl oxetane and 2-[(meth) propylene oxime methyl ]-4-trifluoromethyloxetane is preferred, and 3-[(meth)acrylomethoxymethyl]oxetane' 3·[(methyl)acryloxymethyl]- 3-ethyloxetane, 3-[(methyl)acryloxymethyl]-2-trifluoromethyloxetane, 3-[(methyl)acryloxymethyl]- 2-phenyloxetane, 2-[(meth)acrylomethoxymethyl]oxetane and 2-[(meth)acrylomethoxymethyl]-4-trifluoromethyloxy Heterocyclic butane is particularly preferred because the development tolerance of the radiation-sensitive composition to be prepared is broadened, improving the chemical resistance of the color layer to be produced. Further, in the present invention, in addition to the saturated compound (b3 -1 a ) and the unsaturated compound (b3-lb), an (oxetanyl) ether of a vinyl phenol such as (3-oxetanyl group) Methoxy)-p-vinylbenzene, [2-(3.oxetanyl)ethoxy]-p-vinylbenzene, (2-oxetanylmethoxy)-pair -vinylbenzene and [2-(2-oxetanyl)ethoxy]-p-vinylbenzene; and (oxetanylalkyl)vinyl ether, such as (3-oxa Cyclobutanemethyl)vinyl ether, [2-(3-oxetanyl)ethyl]vinyl ether, (2_oxetanylmethyl)ethylenyl _ and [2 -(2-oxetanyl)ethyl]vinyl ether can also be used as an oxetane unsaturated compound. In the copolymer (B1), the unsaturated compound (b3-l) may be used alone or in combination of $21 - 200905392 or more. Meanwhile, illustrative examples of the unsaturated compound (b3-2) include tetrahydrofuran ester of (meth)acrylic acid such as tetrahydrofuran-2-(meth)acrylate and tetrahydrofuran-3-(meth)acrylate; Acetylene-containing tetrahydrofurfuryl esters such as tetrahydrofurfuryl (meth)acrylate, 3-tetrahydrofurfuryl (meth)acrylate, 2-(tetrahydrofurfuryloxy)ethyl (meth)acrylate And 2-(3-tetrahydrofurfuryloxy)ethyl (meth)acrylate; 2-(methyl)propenyloxypropionic acid containing tetrahydroindenyl ester, such as 2-(methyl) propylene oxime Tetrahydrofurfuryl propionate, 3-tetrahydrofurfuryl 2-(methyl) propylene oxypropionate, 2-(tetrahydroindenyloxy) ethyl 2-(methyl) propylene oxypropionate and 2 2-(3-tetrahydroindenyloxy)ethyl (meth) propylene oxypropionate; vinyl benzene derivative such as (tetrahydrofuran-2-yl)oxy-p-vinylbenzene, (tetrahydrofuran) Ethyloxy-p-vinylbenzene and 2-(tetrahydrofuran-2-yloxy)ethoxy-p-vinylbenzene; vinyl ethers such as (tetrahydrofuran-2-yl)vinyl ether, (four Hydroquinone) vinyl ether, [2-( Tetrahydroindolyloxy)ethyl]vinyl ether and [2-(meth)acryloyloxyethyl](tetrahydroindenyl) succinate. Among these unsaturated compounds (b3-2), a (meth)acrylic acid-containing tetrahydroindenyl ester and [2-(meth)acryloyloxyethyl](tetrahydroindenyl)succinate are preferred. Tetrahydrofurfuryl (meth)acrylate and [2-(meth)acryloyloxyethyl](tetrahydroindenyl) succinate are particularly preferred. In the copolymer (B1), the unsaturated compound (b3-2) may be used singly or in combination of two or more. Further, in the present invention, the unsaturated compound -22-200905392 and the compound (hereinafter referred to as "unsaturated compound (b3·3)" other than the unsaturated compound (b3) may be used as other unsaturated compounds. -3) illustrative examples include aromatic vinyl compounds such as styrene, methyl styrene, o-vinyl toluene, m-vinyl toluene, p-vinyl toluene, p-chlorostyrene, o-a Oxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether , o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether and p-vinylbenzyl glycidyl ether: hydrazine, such as hydrazine and 1-methyl hydrazine: in the polymer molecular chain One of the macromonomers having a (meth)acrylonitrile group (hereinafter referred to as "macromonomer"), such as polystyrene, poly(methyl) methacrylate, poly(methyl) methacrylate, and Polyoxane: an unsaturated carboxylic acid ester such as methyl (meth) acrylate, (A) Ethyl acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, dibutyl (meth) acrylate , (3) butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, (meth) acrylate 2 -hydroxybutyl ester, 3-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, (meth)acrylic acid ring Hexyl ester, 2-ethylhexyl (meth)acrylate, phenyl (meth)acrylate, 2-methoxyethyl (meth)acrylate, 2-phenoxyethyl (meth)acrylate, A Oxydiethylene glycol (meth) acrylate, methoxy triethylene glycol (meth) acrylate, -23- 200905392 methoxypropanediol (meth) acrylate, methoxydipropylene acrylate Ester, isodecyl (meth)acrylate, (methyl) ring [5.2.1.02 6] 癸-8-ester, 2-hydroxy (meth) acrylate Base-propyl ester and glycerol (meth) acrylate; unsaturated carboxylic acid amine group such as 2-aminoethyl (meth)acrylate, (meth) propyl methylaminoethyl ester, (meth)acrylic acid 2-Aminopropyl propyl ester, 2-dimethylaminopropyl acrylate, 3-(meth)acrylic acid 3- and 3-dimethylaminopropyl (meth)acrylate: unsaturated glyceride such as (methyl) Glycidyl acrylate; carboxylic acid such as vinyl acetate, vinyl propionate, vinyl butyrate and benzyl; other unsaturated ethers such as vinyl methyl ether, vinyl ethyl propyl glycidyl ether; vinyl cyanide compound , such as (methyl, hydrazine: -chloroacrylonitrile and vinylidene dicyanohydrin; and unsaturated guanamine methyl) acrylamide, α-chloropropenylamine and ν-2 -hydroxyethyl) acrylamide; Group of conjugated dienes, such as 1,3-butadiene, alkene, chloroprene, and isoprene-diene sulfonic acid. Among these unsaturated compounds (b3-3), styrene, macromethyl)methyl acrylate, (meth)acrylic acid 2-hydroxyethyl) acrylate, (meth) acrylate, (formic acid) Cyclohexyl ester, 2-ethylhexyl (meth)acrylate, (phenyl formate, isobutyl (meth) acrylate, (methyl) propyl [5.2.1.021] 癸-8-ester and glycerol (Methyl)propionic acid ester is more suitable than 'polyphenylene bromide giant body and poly(methyl) propylene acid vinegar. Alcohol (tris 3-phenoxyalkyl methacrylate, citric acid 2 - bis(methyl)aminopropyl acrylate ketal, acid vinyl ester ether and olefin) acrylonitrile, such as (yl (methyl isopentyl monomer, (ester, (meth) propylene) In the copolymer (B1), the unsaturated compound (b3-3) may be used alone or in combination of two or more. In the present invention, when copolymerized The compound (B 1 ) is a copolymer obtained by polymerizing a polymerizable mixture containing the unsaturated compound (b3) (hereinafter referred to as "copolymer (B1-1)", a total of The polymer (B1-1) can be used in any of the following forms, namely: [I] wherein the unsaturated compounds (bl), (b2) and (b3-l) are used, and are optionally unsaturated. The copolymer (B 1 -1 ) obtained by polymerizing a polymerizable mixture of the compound (b3-3) is in the form of a component of an alkali-soluble resin, [II] wherein the unsaturated compound (b1), (b2) is used. And a copolymer (B1-1) obtained by polymerizing a polymerizable mixture of (b3-2) and optionally an unsaturated compound (b3-3) as a component of an alkali-soluble resin, [ΠΙ] used therein a copolymer obtained by polymerizing a polymerizable mixture containing an unsaturated compound (b1), (b2), (b3-l) and (b3-2) and optionally an unsaturated compound (b3-3) ( B1-1) in the form of a component of an alkali-soluble resin, and [IV] wherein a mixture of two or more copolymers (B 1 -1) in the above [I] to [III] is used as an alkali-soluble resin The form of the component. In the copolymer (B1), the proportion of the unsaturated compound (bl) to be copolymerized is preferably from 1 to 40% by weight. In particular, from 5 to 35 % by weight, the proportion of the unsaturated compound (b2 ) to be copolymerized is preferably from 1 to 40% by weight, especially from 5 to 30% by weight. -25- 200905392 In addition, when an unsaturated compound (b3) The ratio of the unsaturated compound (b3) to be copolymerized when copolymerized with the unsaturated compound (b1) and the unsaturated compound (b2) is preferably from 1 to 70% by weight, particularly from 1 to 40% by weight, to be The proportion of the copolymerized unsaturated compound (b3 -3 ) is preferably from 〇 to 70% by weight, more preferably from 1 to 60% by weight. Further, when both the unsaturated compound (b 3 -1 ) and the unsaturated compound ( b3-2 ) are copolymerized with the unsaturated compound (b1) and the unsaturated compound (b2), the unsaturated compound to be copolymerized (b3 - The proportion of 1) is preferably from 1 to 70% by weight, especially from 1 to 40% by weight, and the proportion of the unsaturated compound (b 3 - 2 ) to be copolymerized is preferably from 1 to 60% by weight, especially 1 Up to 40 weight. /. The proportion of the unsaturated compound (b3-3) to be copolymerized is preferably from 〇 to 70% by weight, more preferably from 1 to 60% by weight. Further, when the unsaturated compound (b3-l) and the unsaturated compound (b3-2) are copolymerized with the unsaturated compound (b1) and the unsaturated compound (b2), respectively, the unsaturated compound to be copolymerized (b 3 -1 ) The ratio is better! The proportion of the unsaturated compound (b 3 - 3 ) to be copolymerized is preferably from 〇 to 70% by weight, more preferably from 1 to 60% by weight, to 70% by weight, especially from 1 to 40% by weight, The proportion of the unsaturated compound (b 3 - 2 ) to be copolymerized is preferably from 1 to 60% by weight, especially from 1 to 40% by weight, and the proportion of the unsaturated compound (b 3 - 3 ) to be copolymerized is preferably 0. Up to 70% by weight, more preferably 1 to 60% by weight. In the present invention, when the ratio of the unsaturated compound in the copolymer (B 1 ) is within the above range, radiation for forming a color layer excellent in sensitivity, adhesion to a substrate, solvent resistance, and the like can be obtained. Sensitivity-26- 200905392 Composition. The copolymer (B1) can be utilized in the presence of a compound represented by the above formula (5) (hereinafter referred to as "polythiol compound") in a suitable solvent, such as a 2,2'-couple. Nitrogen bisisobutyronitrile, 2,2,-azobis(2,4-dimethylvaleronitrile) or 2,2·-azobis(4-methoxy-2,4-dimethyl The valeronitrile is synthesized by polymerizing an unsaturated compound. As the polythiol compound, a compound represented by the following formula (6) is preferred.

(式（6)中，Y、R8及η係如同式（3)所定義）。 前述多硫醇化合物的說明實例係包括來自巯基竣酸（ 諸如硫代乙醇酸、3-锍基丙酸、3-巯基丁酸及3_巯基戊酸 )與多羥基醇（諸如乙二醇、四乙二醇、丁烷二醇、三羥 甲基丙烷、異戊四醇、二異戊四醇、三異戊四醇 三（2 -經基乙基）異氣尿酸醋及山梨糖醇）之酯。 本發明中較佳多硫醇化合物的特定實例係包括三經甲 基丙烷三（3 -锍基丙酸）酯、異戊四醇四（3·锍基丙酸） 酯、四乙二醇雙（3-锍基丙酸）酯、二異戊四醇六（3_毓 基丙酸）醋、異戊四醇四（硫代乙醇酸）醋、1，4_雙（3-锍基丁醯基氧基）丁烷、異戊四醇四（3 -锍基丁酸）酯及 1，3,5-參（3-巯基丁氧基乙基）-1，3,5-三嗪-2,4,6(1只， 3H，5H )-三酮。 -27- 200905392 前述多硫醇化合物可單獨或二或更多種摻合使用。 多硫醇化合物係爲在合成共聚物（B1)之聚合期間作 爲鏈轉移劑的組份。本發明者發現當聚合是利用多硫醇化 合物作爲鏈轉移劑來進行時，可減少未反應之不飽和化合 物，改善不飽和化合物接受自由基聚合而轉化成聚合物的 轉化率’可於短時間內合成所需之共聚物（B1)。藉由減 少未反應之不飽和化合物，噴淋顯影及後烘烤時蒸發的圖 案膜留存百分比及因未反應不飽和化合物溶離所致之像素 抗溶劑性受損情況可因而降低。 用於合成共聚物（B1)之聚合中，多硫醇化合物之使 用量以100重量份數所有不飽和化合物計係較佳爲0.5至 2〇重量份數，更佳爲1至1〇重量份數，自由基聚合起始 劑使用量以1 00重量份數所有不飽和化合物計係較佳爲 至50重量份數，更佳爲0.丨至20重量份數。此外， 聚合溫度較佳爲0至150。(：，更佳係50至120。(：，聚合時 間較佳係10分鐘至2 0小時，更佳係3 0分鐘至6小時。 本發明中，用以合成共聚物（B1)之聚合中，亦可與 多硫醇化合物連同地使用一或多種除多硫醇化合物以外之 鏈轉移劑’例如第三-十二碳基硫醇及α -甲基苯乙烯二聚 物’用量較佳係不大於所有鏈轉移劑之9 0重量％，更佳 係不大於6 0重量％。 本發明中’共聚物（Β1)藉凝膠滲透層析測量（GPC ’溶離溶劑：四氫呋喃）以聚苯乙烯表示之重量平均分子 量（以下稱爲「Mw」）較佳係爲3,000至300,000，更佳 -28- 200905392 3,000 至 100,000。 此外，共聚物（B 1 )藉凝膠滲透層析測量（GPC，溶 離溶劑：四氫呋喃）以聚苯乙烯表示之數量平均分子量（ 以下稱爲「Μη」）較佳係爲3,000至60,000，更佳3,000 至 25,000 ° 此外，共聚物（Β1)之Mw對Μη之比値（Mw/Mn) 較佳係1至5，更佳係1至4。藉由使用具有前述特定 Mw或Μη之共聚物（B1)，製得具有優異之顯影性的輻 射敏感性組成物。因此可形成具有銳利之圖案邊緣的彩色 層，且顯影時不易在基板上未曝光部分中或遮光層上產生 殘留物、浮渣、膜殘留物及諸如此類者。 本發明中，共聚物（Β1)可單獨使用或二或更多種摻 合使用。 此外，本發明中，共聚物（Β1)可進同其他鹼可溶性 樹脂一起使用。 前述其他鹼可溶性樹脂不特別限制且可爲加成聚合樹 脂、聚合加成樹脂、縮聚樹脂及諸如此類者中之任一種。 加成聚合樹脂較佳。 前述其他加成聚合鹼可溶性樹脂可例如藉由使至少一 種選自前述不飽和化合物（bl)之化合物及至少一種選自 前述不飽和化合物（b2)及不飽和化合物（b3_3)之化合 物的混合物於多硫醇化合物不存在下進行聚合所得之共聚 物。 本發明中’該鹼可溶性樹脂之用量以1 〇〇重量份數著 -29- 200905392 色劑（A )計係較佳爲1 0至1 , 〇 〇 〇重量份數，更佳2 0至 5 00重量份數。例如，當該鹼可溶性樹脂之量太小時，鹼 顯影性可能降低，或基板上未曝光部分中或遮光層上可能 產生浮渣或膜殘留物。另一方面，當量太大時，著色劑之 濃度變成相對低’而可能難以達到薄膜之目標色彩濃度。 此外’其他鹼可溶性樹脂之用量以所有鹼可溶性樹脂 計係較佳不大於80重量％，更佳不大於60重量％。當其 他鹼可溶性樹脂之量超過8 0重量％時，可能損及本發明 所要達成之效果。 -(C)多官能性單體- 本發明多官能性單體係包含每分子具有二或更多個可 聚合之不飽和鍵結之單體。 該多官能性單體之說明實例係包括烷二醇，諸如乙二 醇及丙二醇之二（甲基）丙烯酸酯；聚烷二醇，諸如聚乙 二醇、聚丙二醇之二（甲基）丙烯酸酯；具有三或更多個 羥基之多羥基醇諸如甘油、三羥甲基丙烷、異戊四醇及二 異戊四醇的多（甲基）丙烯酸酯，及經二羧酸修飾之多（ 甲基）丙烯酸酯；聚酯、環氧樹脂、胺基甲酸酯樹脂、醇 酸樹脂、聚矽氧樹脂、螺烷樹脂等之寡（甲基）丙烯酸酯 :於兩末端皆經羥基化之聚合物，諸如於兩末端皆具有羥 基之聚-1,3 -丁二嫌、於兩末端皆具有經基之聚異戊間二烯 、於兩末端皆具有羥基之聚己內酯的二（甲基）丙烯酸酯 :及磷酸三[2-(甲基）丙烯醯氧基乙基]酯。 -30- 200905392 此等多官能性單體中，具有三或更多個羥基之多羥基 醇的多（甲基）丙烯酸酯及經二羧酸修飾之多（甲基）丙 烯酸酯較佳，詳言之，三羥甲基丙烷三丙烯酸酯、三羥甲 基丙烷三甲基丙烯酸酯、異戊四醇三丙烯酸酯、異戊四醇 三甲基丙烯酸酯、異戊四醇四丙烯酸酯、異戊四醇四甲基 丙烯酸酯、二異戊四醇五丙烯酸酯、二異戊四醇五甲基丙 烯酸酯、二異戊四醇六丙烯酸酯、二異戊四醇六甲基丙烯 酸酯、下式（III)所示之化合物： ch2ococh=ch2 CH 产 CHCOOCH 厂 C—CH2OCOCH2CH2COOH (iii) ch2〇c〇ch=ch2 及下式（IV)所示之化合物： CH2=CHCOOCH2 ch2〇coch=ch2 (IV)(In the formula (6), Y, R8 and η are as defined in the formula (3)). Illustrative examples of the aforementioned polythiol compound include those derived from mercaptodecanoic acid (such as thioglycolic acid, 3-mercaptopropionic acid, 3-mercaptobutyric acid, and 3-mercaptovaleric acid) and polyhydric alcohols (such as ethylene glycol, Tetraethylene glycol, butanediol, trimethylolpropane, isovadiol, diisopentyltetraol, triisopentaerythritol tris(2-propylethyl)isouric uric acid vinegar and sorbitol) Ester. Specific examples of preferred polythiol compounds in the present invention include tris-methylpropane tris(3-mercaptopropionic acid) ester, pentaerythritol tetrakis(3,mercaptopropionic acid) ester, tetraethylene glycol double (3-mercaptopropionic acid) ester, diisopentaerythritol hexa(3-mercaptopropionic acid) vinegar, pentaerythritol tetrakis(thioglycolic acid) vinegar, 1,4_bis(3-mercaptobutyl fluorenyl) Oxy)butane, isoamyltetrakis(3-mercaptobutyrate) and 1,3,5-gin(3-mercaptobutoxyethyl)-1,3,5-triazine-2, 4,6 (1, 3H, 5H)-trione. -27- 200905392 The aforementioned polythiol compounds may be used singly or in combination of two or more. The polythiol compound is a component which acts as a chain transfer agent during the polymerization of the synthetic copolymer (B1). The present inventors have found that when the polymerization is carried out using a polythiol compound as a chain transfer agent, the unreacted unsaturated compound can be reduced, and the conversion rate of the unsaturated compound to undergo radical polymerization to be converted into a polymer can be improved. The desired copolymer (B1) is synthesized internally. By reducing the amount of unreacted unsaturated compound, the percentage of retention of the film which is evaporated during spray development and post-baking, and the impermeability of the pixel due to the dissolution of the unreacted unsaturated compound can be reduced. In the polymerization for the synthesis of the copolymer (B1), the polythiol compound is preferably used in an amount of from 0.5 to 2 parts by weight, more preferably from 1 to 1 part by weight, based on 100 parts by weight of the total of the unsaturated compound. The amount of the radical polymerization initiator used is preferably from 50 parts by weight, more preferably from 0.1 to 20 parts by weight, based on 100 parts by weight of all unsaturated compounds. Further, the polymerization temperature is preferably from 0 to 150. (:, more preferably 50 to 120. (:, the polymerization time is preferably from 10 minutes to 20 hours, more preferably from 30 minutes to 6 hours. In the present invention, in the polymerization for synthesizing the copolymer (B1) It is also possible to use, together with the polythiol compound, one or more chain transfer agents other than the polythiol compound, such as a third-dodecyl mercaptan and an α-methylstyrene dimer. Not more than 90% by weight of all chain transfer agents, more preferably not more than 60% by weight. In the present invention, 'copolymer (Β1) is measured by gel permeation chromatography (GPC 'dissolved solvent: tetrahydrofuran) to polystyrene The weight average molecular weight (hereinafter referred to as "Mw") is preferably 3,000 to 300,000, more preferably -28 to 200905392 3,000 to 100,000. Further, the copolymer (B 1 ) is measured by gel permeation chromatography (GPC, dissolution) Solvent: tetrahydrofuran) The number average molecular weight expressed by polystyrene (hereinafter referred to as "Μη") is preferably 3,000 to 60,000, more preferably 3,000 to 25,000 °. Further, the ratio of Mw to Μη of the copolymer (Β1) Mw/Mn) is preferably from 1 to 5, more preferably from 1 to 4. The above-mentioned specific Mw or Μη copolymer (B1) is used to obtain a radiation-sensitive composition having excellent developability. Therefore, a color layer having sharp pattern edges can be formed, and it is difficult to develop in an unexposed portion on the substrate during development. Or a residue, scum, film residue, and the like are generated on the light-shielding layer. In the present invention, the copolymer (Β1) may be used singly or in combination of two or more. Further, in the present invention, the copolymer (Β1) The other alkali-soluble resin may be used without any particular limitation and may be any of an addition polymerization resin, a polymerization addition resin, a polycondensation resin, and the like. The addition polymerization resin is preferred. The other addition-polymerizable alkali-soluble resin can be, for example, by a mixture of at least one compound selected from the aforementioned unsaturated compound (b1) and at least one compound selected from the group consisting of the aforementioned unsaturated compound (b2) and the unsaturated compound (b3_3) The copolymer obtained by carrying out the polymerization in the absence of a thiol compound. In the present invention, the amount of the alkali-soluble resin is 1 part by weight. -29- 200905392 The toner (A) is preferably from 10 to 1, 〇〇〇 by weight, more preferably from 20 to 50,000 parts by weight. For example, when the amount of the alkali-soluble resin is too small, the alkali The developability may be lowered, or scum or film residue may be generated in the unexposed portion of the substrate or on the light shielding layer. On the other hand, when the equivalent is too large, the concentration of the colorant becomes relatively low, and it may be difficult to achieve the target color of the film. Further, the amount of the other alkali-soluble resin is preferably not more than 80% by weight, more preferably not more than 60% by weight based on all the alkali-soluble resin. When the amount of other alkali-soluble resin exceeds 80% by weight, it may be damaged. The effect to be achieved by the present invention. - (C) Polyfunctional Monomer - The polyfunctional single system of the present invention comprises a monomer having two or more polymerizable unsaturated bonds per molecule. Illustrative examples of the polyfunctional monomer include alkanediols such as di(meth)acrylates of ethylene glycol and propylene glycol; polyalkylene glycols such as polyethylenes, polypropylenes, di(meth)acrylic acid An ester; a poly(meth) acrylate having three or more hydroxyl groups such as glycerol, trimethylolpropane, pentaerythritol, and diisopentaerythritol, and a modification with a dicarboxylic acid ( Methyl acrylate; oligo(meth) acrylate of polyester, epoxy resin, urethane resin, alkyd resin, polyoxyn epoxide resin, spiro resin, etc.: hydroxylated at both ends a polymer, such as a poly-1,3-butane having a hydroxyl group at both ends, a polyisoprenylene having a trans group at both ends, and a polycaprolactone having a hydroxyl group at both ends ( Methyl) acrylate: and tris[2-(methyl)propenyloxyethyl]phosphate. -30- 200905392 Among these polyfunctional monomers, a poly(meth) acrylate having a polyhydric alcohol of three or more hydroxy groups and a poly(meth) acrylate modified with a dicarboxylic acid are preferred. In other words, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, different Pentaerythritol tetramethacrylate, diisopentyl alcohol pentaacrylate, diisopentyl alcohol penta methacrylate, diisopentyl alcohol hexaacrylate, diisopentyl alcohol hexamethacrylate, under The compound of the formula (III): ch2ococh=ch2 CH CHCOOCH plant C-CH2OCOCH2CH2COOH (iii) ch2〇c〇ch=ch2 and the compound of the following formula (IV): CH2=CHCOOCH2 ch2〇coch=ch2 (IV )

CHf=CHCOOCH2—c—CH2〇CH2—C—CH2〇COCH2CH2COOH CH2=CHCOOCH2 ch2ococh=ch2 。尤其，三羥甲基丙烷三丙烯酸酯、異戊四醇三丙烯酸酯 及二異戊四醇六丙烯酸酯特佳，因得到具有優異之強度及 表面光滑性之彩色層，且因爲不易於基板上未曝光部分中 及於遮光層上產生浮渣、膜殘留物及諸如此類者。 前述多官能性單體可單獨使用或二或更多種摻合使用 〇 本發明多官能性單體之用量以1 00重量份數鹼可溶性 樹脂（B )計係較佳爲5至5 00重量份數，更佳係爲20至 3 00重量份數。當該多官能性單體之量太小時，彩色層之 強度及表面光滑性可能降低，而當該量太大時，鹼顯影性 -31 - 200905392 可能降低，或基板上未曝光部分中或遮光層上易產生浮渣 、膜殘留物及諸如此類者。 另外，在本發明中，具有一個可聚合不飽和鍵結之單 官能性單體可與多官能性單體組合使用。 前述單官能性單體之說明實例係包括作爲鹼可溶性樹 脂（B )中之不飽和化合物（bl ) 、 （ b2 )或（b3 )之實 例的化合物、N-(甲基）丙烯醯基嗎啉、N-乙烯基吡咯啉 酮、N -乙嫌基-ε -己內醯.胺及市售產品M-5600 ( Toagosei Co.，Ltd.之商品名）。 此等單官能性單體可單獨使用或二或更多種摻合使用 〇 該單官能性單體之用量以多官能性單體及單官能性單 體之總量計係較佳爲不大於90重量％，更佳係不大於50 重量％。當該單官能性單體之量太大時，待製得之彩色層 的強度及表面光滑性可能變成不足。 本發明中多官能性單體及單官能性單體之總量以1 〇〇 重量份數鹼可溶性樹脂（B )計係較佳爲5至5 00重量份 數，更佳2 0至3 0 0重量份數。例如，當總量太小時，彩 色層之強度及表面光滑性可能降低，而當總量太大時’鹼 顯影性可能降低，或基板上未曝光部分中或遮光層上易產 生浮渣、膜殘留物及諸如此類者。 • ( D )光聚合起始劑- 本發明光聚合起始劑係爲在曝照輻射（諸如可見光、 -32- 200905392 紫外線輻射、遠紫外線輻射、電子束或X-射線）時產生 可起始前述多官能性單體（C )及視情況使用之單官能性 單體的聚合之活性物質的化合物。 該種光聚合起始劑之說明實例係包括乙醯基苯化合物 ’聯咪唑化合物’三嗪化合物，〇-醯基肟化合物，鎗鹽化 合物’安息香化合物，二苯甲酮化合物，α-二酮化合物， 多環醌化合物，咕噸酮化合物，重氮化合物及醯亞胺磺酸 酯化合物。此等化合物在曝光時產生活性自由基及/或活 性酸。 作爲本發明光聚合起始劑，較佳係選自乙醯酮化合物 、聯咪唑化合物、三嗪化合物及0-醯基肟化合物中之至 少一種。 本發明中，光聚合起始劑可單獨使用或二或更多種摻 合使用。 本發明中，光聚合起始劑之用量以100重量份數之多 官能性單體（c )及單官能性單體之總量計係較佳爲0.01 至120重量份數，更佳1至1〇〇重量份數。當該光聚合起 始劑之量太小時，藉由曝光進行之固化不足，而可能變成 難以得到具有根據特定配置來排列的彩色層圖案之彩色濾 光片，而當該量太大時，所形成之彩色層可能在顯影時自 基板脫落。 本發明較佳光聚合起始劑中之乙醯基苯化合物的特定 實例係包括2-羥基-2-甲基-1-苯基丙烷-1-酮、2-甲基-1-[4-(甲硫基）苯基]-2-嗎啉基丙烷-1-酮、2-苄基-2-二甲基胺 -33- 200905392 基-1-( 4-嗎啉基苯基）丁烷-1-酮、1-羥基環己基·苯基酮 、2,2-二甲氧基-1，2-二苯基乙烷-1-酮及1，2-辛烷二酮。 此等乙醯基苯化合物中，2-甲基-1-[4-(甲硫基）苯 基]-2-嗎啉基丙烷-1-酮、2-苄基-2-二甲基胺基-1- ( 4-嗎啉 基苯基）丁烷-1-酮及1,2-辛烷二酮特佳。 前述乙醯基苯化合物可單獨使用或二或更多種摻合使 用。 本發明中，使用乙醯基苯化合物作爲光聚合起始劑時 ，該乙醯基苯化合物之用量以1〇〇重量份數之多官能性單 體（C)及單官能性單體之總量計係較佳爲0·01至80重 量份數，更佳1至重量份數，特佳係1至60重量份數 。當該乙醯基苯化合物之量太小時，藉由曝光進行之固化 不足，使得可能變成難以得到具有根據特定配置來排列的 彩色層圖案的彩色濾光片’而當該量太大時，所形成之彩 色層可能在顯影時自基板脫落。 此外，前述聯咪哩化合物之特定實例係包括2,2'-雙 (2-氯苯基）-4,4·，5,5'-四（4-乙氧基羰基苯基）-υ，-聯 咪唑、2,2'-雙（2-溴苯基）-4,4’，5,5'-四（4-乙氧基羰基苯 基）-1，2'·聯咪唑、2,2’-雙（2_氯苯基）-4,4'，5,5，-四苯基· 1,2，-聯咪唑、2,2'-雙（2,4 -二氯苯基）-4,4，，5,5，-四苯基-1，2’-聯咪唑、2,2'-雙（2,4,6-三氯苯基）-4,4·,5,5，-四苯基-121·聯咪唑、2,2'-雙（2-溴苯基）-4,4·，5,5·-四苯基-1，2·-聯咪唑、2,2'-雙（2,4-二溴苯基）-4,4·，5,5·-四苯基-1，2，-聯咪唑及2,2'-雙（2,4,6 -三溴苯基）-4,4i，5,5，-四苯基- -34- 200905392 1，2 ’ ·聯咪唑。 此等聯咪唑化合物中，2,2’-雙（2-氯苯基）-4,4',5,5'-四苯基-1,2'-聯咪唑、2,2’-雙（2,4-二氯苯基）-4,4’，5,5'-四苯基-1，2、聯咪唑及2,2’-雙（2,4,6-三氯苯基 )-4,4’，5,5'-四苯基-1，2'-聯咪唑較佳，且2,2’-雙（2-氯苯 基）-4,4\5,5’-四苯基-1,2'-聯咪唑特佳。 此等聯咪唑化合物於溶劑中具有優異之溶解度，不產 生外來物，諸如不溶物及沉澱物，具有高度敏感性，容許 固化反應在低能量曝光下充分地進行，且不會在未曝光部 分造成固化反應，因此，曝光後之塗膜明確區分爲不溶於 顯影劑之固化部分及於顯影劑中具有高溶解度之未固化部 分，而可形成具有根據特定配置排列之無側蝕彩色層圖案 的高明晰度彩色濾光片。 前述聯咪唑化合物可單獨使用或二或更多種摻合使用 〇 本發明中，使用聯咪唑化合物作爲光聚合起始劑時， 該聯咪唑化合物之用量以1〇〇重量份數之多官能性單體（ C )及單官能性單體之總量計係較佳爲0.01至40重量份 數，更佳1至30重量份數，特佳係1至20重量份數。當 該聯咪唑化合物之量太小時，藉由曝光進行之固化不足， 使得可能變成難以得到具有根據特定配置來排列的彩色層 圖案的彩色濾光片’而當該量太大時，所形成之彩色層可 能自基板脫落’或彩色層之表面可能易於顯影時變粗糙。 本發明中，使用聯咪唑化合物作爲光聚合起始劑時， -35- 200905392 較佳係與以下氫供體組合使用，因爲可進一步改善敏感性 〇 「氫供體」係表示可在曝光時提供氫原子給自該聯咪 唑化合物所形成之自由基的化合物。 作爲本發明氫供體，較佳係爲下文所定義之硫醇化合 物、胺化合物及諸如此類者。 前述硫醇化合物係包含具有作爲母核之苯環或雜環及 一或多個，較佳一至三個，更佳一或二個直接鍵結於母核 之巯基的化合物（以下稱爲「硫醇氫供體」）。 前述胺化合物係爲具有作爲母核之苯環或雜環及一或 多個，較佳一至三個，更佳一或二個直接鍵結於母核之胺 基的化合物（以下稱爲「胺氫供體」）。 此外，此等氫供體亦可同時具有锍基及胺基。 以下進一步描述此等氫供體。 硫醇氫供體可具有至少一個苯環或雜環且可兼具苯環 及雜環，當含有二或更多個此等環時，其可形成稠合環。 此外，當硫醇氫供體具有二或更多個锍基時，一或多 個剩餘的锍基可被烷基取代，只要保留至少一個游離锍基 ，則其他巯基中至少一個可經烷基、芳烷基或芳基所取代 ，且只要保留至少一個游離锍基，該硫醇氫供體可具有其 中兩硫原子係藉二價有機基團（諸如伸烷基）鍵合之結構 單元或其中兩硫原子係以二硫醚形式鍵合之結構單元。 此外，在硫醇氫供體中，锍基以外之位置可經以下基 團所取代：羧基、烷氧羰基、經取代之烷氧羰基、苯氧基 -36- 200905392 羰基、經取代之苯氧基羰基、腈基或諸如此類者。 該種硫醇氫供體之特定實例係包括2-锍基苯并噻哗 、2-锍基苯并噁唑、2-锍基苯并咪唑、2,5-二锍基-丨，3,4_ 噻二唑及2-锍基-2,5-二甲基胺基吡啶。 此等硫醇氫供體中，2-锍基苯并噻唑及2-巯基苯并噁 唑較佳，且2-锍基苯并噻唑特佳。 另一方面，胺氫供體可具有至少一個苯環或雜環或兼 具苯環及雜環，當含有二或更多個該等環時，其可形成稠 合環。 此外，在胺氫供體中，一或多個胺基可經烷基或經取 代之烷基所取代，除胺基以外之位置可經以下基團所取代 :羧基、烷氧羰基、經取代之烷氧羰基、苯氧基羰基、經 取代之苯氧基羰基、腈基或諸如此類者。 該種胺氫供體之特定實例係包括4,4'-雙（二甲基胺 基）二苯甲酮、4,4'-雙（二乙基胺基）二苯甲酮、4-二乙 基胺基乙醯基苯、4-二甲基胺基丙醯基苯、乙基-4-二甲 基胺基苄酸酯、4-二甲基胺基苄酸及4-二甲基胺基苄腈。 此等胺氫供體中，4,4'-雙（二甲基胺基）二苯甲酮及 4,4'·雙（二乙基胺基）二苯甲酮較佳，且4,4’-雙（二乙 基胺基）二苯甲酮特佳。 該胺氫供體具有作爲敏化劑之效果，即使在與除聯咪 唑化合物以外之自由基生成劑組合使用時亦然。 本發明中，氫供體可單獨使用或二或更多種摻合使用 。較佳係使用至少一種硫醇氫供體及至少一種胺氫供體之 -37- 200905392 組合物，因爲所形成之彩色層在顯影時不易自基板脫落且 彩色層具有高強度及敏感性。 硫醇氫供體及胺氫供體之組合物的特定實例係包括 2-锍基苯并噻唑/4,4'-雙（二甲基胺基）二苯甲酮、2-锍基 苯并噻唑/4,4'-雙（二乙基胺基）二苯甲酮、2_锍基苯并 噁唑/4,4'-雙（二甲基胺基）二苯甲酮及2-锍基苯并噁唑 /4,4’-雙（二乙基胺基）二苯甲酮。更佳組合物係爲2-巯 基苯并噻唑/4,4’-雙（二乙基胺基）二苯甲酮及2-锍基苯 并噁唑M，4'-雙（二乙基胺基）二苯甲酮。特佳組合物係 爲2-锍基苯并噻唑/4,4’-雙（二乙基胺基）二苯甲酮。 該硫醇氫供體及該胺氫供體之組合物中，硫醇氫供體 相對於胺氫供體之重量比較佳係爲1 : 1至1 : 4，更佳1 :1 至 1 : 3。 本發明中，當該氫供體與聯咪唑化合物組合使用時， 氫供體之用量以100重量份數之多官能性單體（C)及單 官能性單體之總量計係較佳爲0.01至40重量份數，更佳 1至30重量份數，特佳係1至20重量份數。當氫供體之 量太小時，易降低改善敏感性之效果，而當該量太大時， 所形成之彩色層可能易於顯影時自基板脫落。 此外，前述三嗪化合物之特定實例係包括具有鹵甲基 之三嗪化合物，諸如2,4,6-三（三氯甲基）-s-三嗪、2-甲 基-4,6-雙（三氯甲基）-3-三嗪、2-[2-(5-甲基呋喃-2-基 )乙烯基]-4,6-雙（三氯甲基）-s-三嗪，2-[2-(呋喃-2-基 )乙烯基]-4,6-雙（三氯甲基）-3-三嗪、2-[2-(4-二乙基 -38- 200905392 胺基-2-甲基苯基）乙烯基]-4,6-雙（三氯 2-[2-(3,4-二甲氧基苯基）乙烯基]-4,6-售 s-三嗪、2- (4-甲氧基苯基）-4,6-雙（三: 、2-(4-乙氧基苯乙烯基）-4,6-雙（三氯 2-(4-正丁氧基苯基）-4,6-雙（三氯甲基 此等三嗪化合物中，2-[2- ( 3,4-二甲 基]-4,6-雙（三氯甲基）-s-三嗪特佳。 前述三嗪化合物可單獨使用或二或更 本發明中，使用該三嗪化合物作爲光 三嗪化合物之用量以1〇〇重量份數之多1 及單官能性單體之總量計係較佳爲0.0 1 3 更佳1至30重量份數，特佳係1至20重 化合物之量太小時，藉由曝光進行之固化 變成難以得到具有根據特定配置來排列的 色濾光片，而當該量太大時，所形成之彩 時自基板脫落。 此外，前述〇 -醯基肟化合物之特定1 (苯基硫基）苯基]-庚烷-1，2-二酮2-(0-(苯基硫基）苯基]-辛烷-1，2-二酮2-(0-1-[4-(苄醯基）苯基]-辛烷-1,2-二酮 ，1-[9-乙基-6-(2-甲基苄醯基）-9H-昨啤 0-乙醯肟）， 1-[9 -乙基-6- ( 3 -甲基卞酿基）-9Η，_ (0-乙醯肟）， 甲基）-s-三嗪、 I (三氯甲基）-氣甲基）-S-三嗪 甲基）-S-三嗪及 )-S -二曉。 氧基苯基）乙烯 多種摻合使用。 聚合起始劑時， ί能性單體（C ) I 40重量份數， 量份數》當三嗪 不足，使得可能 彩色層圖案的彩 色層可能在顯影 t例係包括1 - [ 4 -苄醯肟），1-[4-苄醯肟）， 2- ( 〇-苄醯肟） :-3-基]乙酮1-( ^唑-3-基]乙酮1- -39- 200905392 1-[9-乙基-6-苄醯基-9^咔唑-3-基]-乙酮1-(0-乙醯 肟）， 乙酮-1-[9-乙基-6-(2-甲基-4-四氫呋喃基苄醯基）-9.H. -咔唑-3-基]-1- ( 0 -乙醯肟）， 乙酮- l-[9-乙基-6- ( 2-甲基-4-四氫哌喃基苄醯基）-9.H.-咔唑-3-基]-1-(0-乙醯肟）， 乙酮-1-[9-乙基-6-(2-甲基-5-四氫呋喃基苄醯基）-9·Η_ -咔唑-3-基]-1- ( 0 -乙醯肟）， 乙酮-1-[9-乙基-6-(2-甲基-5-四氫哌喃基苄醯基）-9.Η. -咔唑-3-基]-1- ( 0 -乙醯肟）， 乙酮-1-[9-乙基-6-{2-甲基-4- ( 2,2-二甲基-1，3-二氧 戊環基）苄醯基}-9·Η·-咔唑-3-基]-1- ( 0-乙醯肟）， 乙酮-1-[9-乙基-6- ( 2-甲基-4-四氫呋喃基甲氧基苄醯 基）-9·Η· -咔唑-3-基]-1-(0 -乙醯肟）， 乙酮- l-[9-乙基-6- ( 2-甲基-4-四氫哌喃基甲氧基苄醯 基）咔唑-3-基]-卜（0-乙醯肟）， 乙酮- l-[9-乙基-6- ( 2-甲基-5-四氫呋喃基甲氧基苄醯 基）-9.H.-咔唑-3-基]-1- ( 0-乙醯肟）， 乙酮- l-[9-乙基-6- ( 2-甲基-5-四氫哌喃基甲氧基苄醯 基）咔唑-3-基]-1-(0-乙醯肟）及 乙酮-1-[9-乙基-6-{2-甲基-4-(2,2-二甲基-1,3-二氧 戊環基）甲氧基苄醯基}-9.Η·-咔唑-3-基]-1- ( 0-乙醯肟） 〇 此等〇-醯基肟化合物中，1-[4-(苯基硫基）苯基]- -40- 200905392 辛烷-1，2-二酮2- ( 0-苄醯肟）， l-[9-乙基-6-(2-甲基苄醯基）-9H-咔唑-3-基]乙酮1-(0-乙醯肟）， 乙酮- l-[9-乙基-6- ( 2-甲基-4-四氫呋喃基甲氧基苄醯 基）-9.H. -咔唑-3-基]-1- ( 0 -乙醯肟）及 乙酮- l-[9-乙基-6-{2 -甲基-4- ( 2,2-二甲基-1，3-二氧 戊環基）甲氧基苄醯基咔唑-3-基]-1- ( 0 -乙醯肟） 特佳。 前述〇-醯基肟化合物可單獨使用或二或更多種摻合 使用。 本發明中，使用〇-醯基肟化合物作爲光聚合起始劑 時，該0-醯基肟化合物之用量以100重量份數之多官能 性單體（C )及單官能性單體之總量計係較佳爲0.01至 80重量份數，更佳1至70重量份數，特佳係1至60重 量份數。當該〇-乙醯肟化合物之量太小時，藉由曝光進 行之固化不足，使得可能變成難以得到具有根據特定配置 來排列的彩色層圖案的彩色濾光片，而當該量太大時，所 形成之彩色層可能易於顯影時自基板脫落。 -添加劑- 用於形成本發明彩色層之輻射敏感性組成物可視需要 含有各種添加劑。 前述添加劑之說明實例係包括有機酸及有機胺基化合 物（不包括前述氫供體）、固化劑及固化助劑。 -41 - 200905392 前述有機酸及有機胺基化合物係爲用以產生進一步改 善輻射敏感性組成物於鹼顯影劑中之溶解度且進一步抑制 在顯影之後殘留不溶物的效果的組份。 作爲前述有機酸，分子中具有一或多個羧基之脂族羧 酸或含苯基之羧酸較佳。 前述脂族羧酸之特定實例係包括單羧酸，諸如甲酸、 乙酸、丙酸、丁酸、戊酸、特戊酸、己酸、二乙基乙酸、 庚酸及辛酸；二羧酸，諸如草酸、丙二酸、琥珀酸、戊二 酸、己二酸、庚二酸、辛二酸、壬二酸、癸二酸、巴西基 酸、甲基丙二酸、乙基丙二酸、二甲基丙二酸、甲基琥珀 酸、四甲基琥珀酸、環己烷二甲酸、依康酸、檸康酸、順 丁烯二酸、反丁烯二酸及中康酸；及三羧酸，諸如丙三甲 酸、烏頭酸及樟腦酮酸。 此外，前述含苯基之羧酸的說明實例包括其中羧基係 直接鍵結於苯基之化合物及其中羧基係經由碳鏈鍵結於苯 基的羧酸。 含苯基之羧酸的特定實例係包括芳族單羧酸，諸如苄 酸、甲苯酸、枯茗酸、苯連三酸及二甲基苄酸；芳族二羧 酸，諸如苯二甲酸、異苯二甲酸及對苯二甲酸；具有3或 更多個羧基之芳族多羧酸，諸如苯偏三酸、苯三甲酸、苯 偏四酸及苯四甲酸；及苯基乙酸、氫化阿托酸、氫化肉桂 酸、扁桃酸、苯基琥珀酸、阿托酸、肉桂酸、肉桂亞酸、 香豆酸及繳形酸。 此等有機酸中，脂族二羧酸較佳，而就鹼溶解度、在 -42- 200905392 下文所述溶劑中之溶解度及防止基板上未曝光部分中或遮 光層上之浮渣及膜殘留物的觀點而言，丙二酸、己二酸、 依康酸、檸康酸、反丁烯二酸、中康酸及諸如此類者係爲 特佳之脂族羧酸。此外，作爲含苯基之羧酸，芳族二羧酸 較佳，而苯二甲酸係爲特佳。 前述有機酸可單獨使用或二或更多種摻合使用。 有機酸之量以輻射敏感性組成物之固體總含量計係較 佳爲不大於1 5重量％，更佳係不大於1 0重量％。當有機 酸之量太大時，所形成之彩色層對基板之黏著性可能降低 〇 此外，作爲前述有機胺基化合物，分子中具有一或多 個胺基之脂族胺或含苯基之胺較佳。 前述脂族胺之特定實例係包括單（環）烷基胺，諸如 正丙基胺、異丙基胺、正丁基胺、異丁基胺、第二丁基胺 、第三丁基胺、正戊基胺、正己基胺、正庚基胺、正辛基 胺、正壬基胺、正癸基胺、正十一碳基胺、正十二碳基胺 、環己基胺、2-甲基環己基胺、3-甲基環己基胺、4-甲基 環己基胺、2-乙基環己基胺、3-乙基環己基胺及4-乙基環 己基胺；二（環）烷基胺，諸如甲基乙基胺、二乙基胺、 甲基-正丙基胺、乙基-正丙基胺、二-正丙基胺、二-異丙 基胺、二-正丁基胺、二-異丁基胺、二-第二丁基胺、二_ 第三丁基胺、二-正戊基胺、二-正己基胺、甲基環己基胺 、乙基環己基胺及二環己基胺；三（環）烷基胺，諸如二 甲基乙基胺、甲基二乙基胺、三乙基胺、二甲基正丙基胺 -43- 200905392 、二乙基正丙基胺、甲基二-正丙基胺、乙基二·正丙基胺 、三-正丙基胺、三-異丙基胺、三-正丁基胺、三-異丁基 胺、三-第二丁基胺、三-第三丁基胺、三-正戊基胺、三-正己基胺、二甲基環己基胺、二乙基環己基胺、甲基二環 己基胺、乙基二環己基胺及三環己基胺；單（環）烷醇胺 ，諸如2-胺基乙醇、3-胺基-1-丙醇、1-胺基-2-丙醇、4-胺基-1-丁醇、5-胺基-卜戊醇、6-胺基-1-己醇及4-胺基-1-環己醇；二（環）烷醇胺，諸如二乙醇胺、二-正丙醇胺 、二-異丙醇胺、二-正丁醇胺、二·異丁醇胺、二-正戊醇 胺、二-正己醇胺及二（4-環己醇）胺；三（環）烷醇胺 ，諸如三乙醇胺、三-正丙醇胺、三-異丙醇胺、三·正丁 醇胺、三-異丁醇胺、三-正戊醇胺、三-正己醇胺及三（4-環己醇）胺；胺基（環）烷二醇，諸如3-胺基-1,2-丙烷二 醇、2-胺基-1,3•丙烷二醇、4-胺基-1，2-丁烷二醇、4-胺基· 1，3-丁烷二醇、4-胺基-1,2-環己烷二醇、4-胺基-1,3-環己 烷二醇、3-二甲基胺基-1，2-丙烷二醇、 3-二乙基胺基-1,2-丙烷二醇、2-二甲基胺基-1，3-丙院 二醇及2·二乙基胺基-1,3-丙烷二醇；含胺基之環烷甲醇’ 諸如1-胺基環戊烷甲醇、4-胺基環戊烷甲醇、1-胺基環己 烷甲醇、4-胺基環己烷甲醇、4-二甲基胺基環戊烷甲醇、 4-二乙基胺基環戊烷甲醇、4-二甲基胺基環己烷甲醇及4_ 二乙基胺基環己烷甲醇；及胺基羧酸，諸如丙胺酸、 2-胺基丁酸、3.胺基丁酸、4-胺基丁酸、2-胺基異丁酸、 3 -胺基異丁酸、2 -胺基戊酸、5 -胺基戊酸、6 -胺基己酸、 -44- 200905392 1·胺基環丙烷甲酸、1-胺基環己烷甲酸及4-胺基環己烷甲 酸。 此外，前述含苯基之胺的說明實例係包括其中胺基直 接鍵結於苯基之化合物及其中胺基係經由碳鏈鍵結於苯基 之化合物。 該含苯基之胺的特定實例係包括芳族胺，諸如苯胺、 2-甲基苯胺、3-甲基苯胺、4-甲基苯胺、4-乙基苯胺、4-正丙基苯胺、4-異丙基苯胺、4-正丁基苯胺、4-第三丁基 苯胺、1-萘基胺、2-萘基胺、Ν，Ν-二甲基苯胺、Ν，Ν-二乙 基苯胺及4-甲基-Ν,Ν-二甲基苯胺；胺基苄基醇，諸如2-胺基苄基醇、3-胺基苄基醇、4-胺基苄基醇、4-二甲基胺 基苄基醇及4-二乙基胺基苄基醇；及胺基酚，諸如2-胺 基酚、3-胺基酚、4-胺基酚、4-二甲基胺基酚及4-二乙基 胺基酚。 此等有機胺基化合物中，就於下述溶劑中之溶解度及 防止於基板上未曝光部分中或在遮光層上形成浮渣及膜殘 留物之觀點而言，作爲脂族胺，以單（環）烷醇胺及胺基 (環）烷二醇較佳，而2·胺基乙醇、3-胺基-1-丙醇、5-胺基-1-戊醇、3-胺基-1,2-丙烷二醇、2-胺基-1，3-丙烷二 醇及4-胺基-1,2-丁烷二醇特佳。此外，作爲含苯基之胺 ，胺基酚較佳，而2-胺基酚、3-胺基酚及4-胺基酚特佳 〇 有機胺基用量以輻射敏感性組成物中總固體量計係較 佳不大於1 5重量％，更佳係不大於1 〇重量％。當有機胺 -45- 200905392 基化合物之量太大時，所形成之彩色層對基板之黏著性可 能降低。 前述固化劑係爲藉由與鹼可溶性樹脂（B )中羧基及/ 或氧雜環丁烷環反應而將鹼可溶性樹脂（B )固化的組份 〇 該種固化劑之說明實例係包括環氧化合物及氧雜環丁 烷化合物。 前述環氧化合物較佳係爲多官能性環氧化合物。其特 定實例係包括芳族環氧樹脂，諸如雙酚A環氧樹脂、氫 化雙酚A環氧樹脂、雙酚F環氧樹脂、氫化雙酚F環氧 樹脂及酚醛清漆型環氧樹脂；其他環氧樹脂，諸如脂環族 環氧樹脂、雜環性環氧樹脂、縮水甘油酯樹脂、縮水甘油 胺樹脂及環氧化油；此等環氧樹脂之溴化衍生物，及經環 氧化丁二烯（共）聚合物、經環氧化異戊間二烯（共）聚 合物、含縮水甘油基之不飽和化合物的（共）聚合物及異 氰尿酸三縮水甘油酯。 此外，含環氧基之不飽和化合物亦爲理想之前述環氧 化合物。其特定實例係包括（甲基）丙烯酸縮水甘油酯、 (甲基）丙烯酸3,4-環氧丁酯、（甲基）丙烯酸6,7-環氧 庚酯、鄰-乙烯基苄基縮水甘油基醚、間·乙烯基苄基縮水 甘油基醚及對-乙烯基苄基縮水甘油基醚。 另一方面，前述氧雜環丁烷化合物較佳係爲多官能性 氧雜環丁烷化合物。其特定實例係包括低分子量化合物， 諸如碳酸雙氧雜環丁烷酯、己二酸雙氧雜環丁烷酯、對苯 -46- 200905392 二甲酸雙氧雜環丁烷酯、對-苯二甲酸雙氧雜環丁烷酯及 1,4-環己烷二甲酸雙氧雜環丁烷酯’及高分子量化合物’ 諸如經氧雜環丁烷醚化之酚醛樹脂及具有氧雜環丁院環結 構之不飽和化合物的（共）聚合物（不包括共聚物（B1) )。具有氧雜環丁烷環結構之共聚物（B1)係爲具有作爲 固化劑效果的組份。 此外，兼具有氧雜環丁烷環結構及不飽和雙鍵之化合 物亦爲理想之氧雜環丁烷化合物。其特定實例係包括如同 前述不飽和化合物（b 3 -1 )所例不之化合物。 此等固化劑可單獨或二或更多種摻合使用。 固化劑用量以輻射敏感性組成物中固體總量計係較佳 不大於30重量％，更佳係不大於20重量％。當固化劑之 量太大時，待製得之輻射敏感性組成物的儲存安定性可能 降低。 前述固化助劑係爲藉由將前述固化劑之環氧基及/或 氧雜環丁烷環打開而加速固化劑之固化反應的組份。 該種固化助劑之說明實例係包括多羧酸、多羧酸酐及 胺基化合物。 前述多羧酸的特定實例係包括如同前述有機酸中針對 具有二或更多個羧基之化合物所列的實例之化合物。前述 胺基化合物之特定實例係包括如同針對前述有機胺基化合 物所列的實例之化合物。 此外’前述多羧酸酐之特定實例係包括芳族多羧酸酐 ，諸如苯二甲酸酐、苯四甲酸酐、苯偏三酸酐及 -47- 200905392 3,3 ·，4,4’-二苯基甲酮四甲酸二酐；脂族多羧酸酐，諸如依 康酸酐、琥珀酸酐、檸康酸酐、十二碳烯基琥珀酸酐、丙 三甲酸酐、順丁烯二酸酐及1,2,3,4 - 丁烷四甲酸酐；脂環 族多羧酸酐，諸如六氫苯二甲酸酐、3,4 -二甲基四氫苯二 甲酸酐、1，2,4-環戊烷三甲酸酐、12,4-環己烷三甲酸酐、 環戊烷四甲酸二酐、1，2,4,5 -環己烷四甲酸二酐、5 -正萡 烯-2,3 -二甲酸酐及耐地酸酐；含酯基之羧酸酐，諸如乙二 醇雙苯偏三酸酯酐及甘油參苯偏三酸酯酐；及市售環氧樹 月旨固化齊!1 商品名 ADEKA HARDENER EH-700 ( ADEKA CORPORATION 之產品）、RIKACID HH ( New Japan Chemical C ο.，L t d ·之產品）及 Μ Η-7 0 0 ( N e w J ap an Chemical Co .，Ltd.之產品）。 前述固化助劑可單獨或二或更多種摻合使用。 固化助劑用量以輻射敏感性組成物之固體總量計係較 佳爲不大於1 5重量％，更佳係不大於1 0重量％。當固化 助劑之量太大時，待製得之輻射敏感性組成物的儲存安定 性可能降低或形成之彩色層可能易於顯影時自基板脫落。 此外，除前述添加劑之外的添加劑之說明實例係包括 分散助劑，諸如藍色顔料衍生物或黃色顏料衍生物，例如 銅酞花青衍生物；塡充劑，諸如玻璃或氧化鋁；聚合物化 合物，諸如聚乙烯基醇、聚乙二醇單烷基醚或聚（氟烷基 丙烯酸酯）；非離子性、陽離子性或陰離子性界面活性劑 ;黏著促進劑，諸如乙烯基三甲氧基矽烷、乙烯基三乙氧 基矽烷、乙烯基三（2-甲氧基乙氧基）矽烷、N-(2-胺基 -48- 200905392 乙基）-3-胺基丙基甲基二甲氧基矽烷、N-(2-胺基乙基 )-3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷 、3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙 基甲基二甲氧基矽烷、2-(3,4-環氧基環己基）乙基三甲 氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3-氯丙基三甲氧 基矽烷' 3-甲基丙烯醯氧基丙基三甲氧基矽烷或3-巯基丙 基三甲氧基矽烷：抗氧化劑，諸如2,2^硫代雙（4 -甲基-6-第三丁基酚）或2,6 -二-第三丁基酚；紫外光吸收劑， 諸如2-(3-第三丁基-5-甲基-2-羥基苯基）-5-氯苯并三唑 或烷氧基二苯甲酮；黏聚抑制劑，諸如聚丙烯酸鈉；及熱 自由基生成劑，諸如1，Γ-偶氮基雙（環己烷-1-腈）或2-苯基偶氮基-4-甲氧基-2,4-二甲基戊腈。 -溶劑- 本發明用以形成彩色層之輻射敏感性組成物係含有前 述組份（A )至（D )作爲必要組份及視需要包含之前述 添加劑，且通常與溶劑混合，以製備成液體組成物。 作爲前述溶劑’可選擇且使用任何適當之溶劑，只要 該溶劑分散或溶解構成輻射敏感性組成物之組份（A )至 (D)及添加劑組份，而不與此等組份反應，且具有適當 之揮發性。 該種溶劑之說明實例係包括（聚）烷二醇單烷基醚， 諸如乙二醇單甲基醚、乙二醇單乙基醚、乙二醇單-正丙 基醚、乙二醇單-正丁基醚、雙乙二醇單甲基醚、雙乙二 -49- 200905392 醇單乙基醚、雙乙二醇單-正丙基醚、雙乙二醇單-正丁基 醚、參乙二醇單甲基醚、參乙二醇單乙基醚'丙二醇單甲 基醚、丙二醇單乙基醚、丙二醇單-正丙基醚、丙二醇單-正丁基醚、雙丙二醇單甲基醚、雙丙二醇單乙基醚 '雙丙 二醇單-正丙基醚、雙丙二醇單-正丁基醚、三丙二醇單甲 基醚及三丙二醇單乙基醚：（聚）烷二醇單烷基醚乙酸酯 ，諸如乙二醇單甲基醚乙酸酯、乙二醇單乙基醚乙酸酯、 雙乙二醇單甲基醚乙酸酯、雙乙二醇單乙基醚乙酸酯、丙 二醇單甲基醚乙酸酯及丙二醇單乙基醚乙酸酯；其他醚， 諸如雙乙二醇二甲基醚、雙乙二醇甲基乙基醚、雙乙二醇 二乙基醚及四氫呋喃；酮，諸如甲基乙基酮、環己酮、2-庚酮及3·庚酮；乳酸烷酯，諸如乳酸甲酯及乳酸乙酯； 其他酯，諸如2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲 酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙 酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲 基丁酸甲酯、3-甲基-3-甲氧基丁基乙酸酯、3-甲基-3-甲 氧基丁基丙酸酯、乙酸乙酯、乙酸正丙酯、乙酸異丙酯、 乙酸正丁酯、乙酸異丁酯、甲酸正戊酯、乙酸異戊酯、丙 酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正 丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯基 乙酸甲酯、乙醯基乙酸乙酯及2-合氧基丁酸乙酯；芳族 烴’諸如甲苯及二甲苯；及醯胺或內醯胺化合物，諸如 Ν,Ν-二甲基甲醯胺、N，N-二甲基乙醯胺及N-甲基吡咯啉 酮。 -50- 200905392 就溶解度、顏料分散性、塗覆性及諸如此類之觀點而 言’此等溶劑中，以丙二醇單甲基醚、丙二醇單乙基醚、 乙二醇單甲基醚乙酸酯、丙二醇單甲基醚乙酸酯、丙二醇 單乙基醚乙酸酯、雙乙二醇二甲基醚、雙乙二醇甲基乙基 醚、環己酮、2 -庚嗣、3_庚酮、乳酸乙酯、3_甲氧基丙酸 乙酯、3-乙氧基丙酸甲酯、3_乙氧基丙酸乙酯、3-甲基-3-甲氧基丁基丙酸酯、乙酸正丁酯、乙酸異丁酯、甲酸正戊 酯、乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸異丙酯、 丁酸正丁酯及丙酮酸乙酯較佳。前述溶劑可單獨使用或二 或更多種摻合使用。 此外’高沸點溶劑，諸如苄基乙基醚、二-正己基醚 、丙酮基丙酮、異佛爾酮、己酸、辛酸、1-辛醇、1-壬醇 、苄基醇、苄基乙酸酯、乙基苄酸酯、草酸二乙酯、順丁 烯二酸二乙酯、γ-丁內酯、碳酸伸乙酯、碳酸伸丙酯或乙 二醇單苯基醚乙酸酯，可與前述溶劑一起使用。 此等高沸點溶劑可單獨使用或二或更多種摻合使用。 雖未特別限制，但就所得之輻射敏感性組成物的塗覆 性、安定性及諸如此類之觀點而言，期望該溶劑之用量値 確定待製得之輻射敏感性組成物除溶劑以外之所有組份的 總濃度變成較佳5至5 0重量％，特佳係1 〇至40重量％。 彩色濾光片 本發明彩色濾光片具有自本發明用以形成彩色層之輻 射敏感性組成物形成之彩色層。 -51 - 200905392 以下描述形成本發明彩色濾光片中之彩色層的方法。 首先，_視情況於基板表面上形成遮光層以界定用以形 成像素之部分。將液體輻射敏感性組成物（其包含例如分 散於其中之紅色顏料）施加於該基板上，預先烘烤以蒸發 溶劑，而形成塗膜。 此塗膜隨後經由光罩曝照輻射，以鹼顯影溶液加以顯 影，溶解並移除塗膜未曝光之部分，且後烘烤以形成具有 依預定圖案排列的的紅色像素陣列。 之後，同法個別施加包含分散於其中之綠色或藍色顏 料之液體輻射敏感性組成物、預先烘烤、曝光、顯影及後 烘烤，以依序於相同基板上形成綠色像素陣列及藍色像素 陣列，而得到在基板上排列有紅色、綠色及藍色像素陣列 之彩色濾光片。然而，本發明中，形成三種顏色像素之順 序不限於前述者。 此外，可依如同形成前述像素之方式使用例如其中分 散有黑色顏料的液體輻射敏感性組成物來形成黑色矩陣。 用以形成像素及/或黑色矩陣之基板的說明實例係包 括玻璃、矽、聚碳酸酯、聚酯、芳族聚醯胺、聚醯胺-醯 亞胺及聚醯亞胺。 此外，此等基板可視情況施以適當之預先處理，諸如 使用矽烷偶合劑或諸如此類者之化學處理、電漿處理、離 子電鍍、濺鍍、氣相反應或真空沈積。 將液體輻射敏感性組成物施加於基板時，可採用任何 適當之塗覆方法，諸如噴霧塗覆法、輥塗法、旋塗法、扁 -52- 200905392 式塗嘴塗覆、桿塗法或噴墨塗覆法。特佳係旋塗法及扁式 塗嘴塗覆法。 乾燥後之塗膜厚度較佳係爲0.1至10微米，更佳0.2 至8.0微米，特佳係0.2至6.0微米。 作爲用以形成彩色層之輻射，可使用例如可見光、紫 外線輻射、遠紫外線輻射、電子束、X-射線或諸如此類者 。具有190至450奈米波長之輻射較佳。 輻射之曝光劑量較佳係爲10至1 0,000 J/m2。 此外’作爲前述鹼顯影劑，較佳係爲碳酸鈉、氫氧化 鈉 '氫氧化鉀、氫氧化四甲基銨、膽鹼、1，8-二氮雜雙環-[5.4.0]-7-十一碳烯或1，5-二氮雜雙環-[4.3·0]-5-壬烯之水 溶液。 亦可於前述鹼顯影劑中添加適量之水溶性有機溶劑， 諸如甲醇或乙醇、界面活性劑或諸如此類者。該塗膜在以 鹼顯影劑顯影之後通常以水洗滌。 作爲顯影方法，可採用例如噴啉式顯影、噴霧式顯影 、浸漬式顯影、攪煉顯影或諸如此類者。顯影較佳係於室 溫進行5至300秒。 所得之本發明彩色濾光片可極有效地使用於例如透射 型或反射型彩色液晶顯示元件、彩色攝像管裝置、彩色感 測器或諸如此類者。 彩色液晶顯示元件 本發明彩色液晶顯示元件係包含本發明彩色濾光片。 -53- 200905392 此外’作爲本發明彩色液晶顯示元件之一種形式，可如前 文所述地使用本發明用以形成彩色層之輻射敏感性組成物 於薄膜電晶體基板陣列上形成像素及/或黑色矩陣，而製 備具有特別優異特性之彩色液晶顯示元件。 【實施方式】 實施例 以下參考實施例進一步描述本發明。然而，本發明不 應受限於以下實施例。 共聚物（B1 )之合成 合成例1 在裝置有冷卻管及攪拌器之燒瓶中添加3重量份數作 爲自由基聚合起始劑之2,2’-偶氮基雙異丁腈及200重量 份數作爲溶劑之丙二醇單甲基醚乙酸酯。之後，添加作爲 可聚合不飽和化合物之25重量份數N-苯基順丁烯二醯亞 胺、15重量份數苯乙嫌、30重量份數甲基丙烯酸、10重 量份數甲基丙烯酸正丁酯及20重量份數甲基丙烯酸苄酯 及作爲多硫醇化合物之7重量份數異戊四醇四（3 -锍基丙 酸）酯（SAKAI CHEMICAL INDUSTRY CO·，LTD.之產品 )’燒瓶內部以氮換氣。之後，反應溶液溫度於溫和攪動 下升至8 0。(：，於此溫度進行聚合歷經5小時’以得到共 聚物（B 1 )之溶液（固體濃度=3 5 · 5重量％，聚合轉化率 :1 0 0重量％ )。此共聚物（B1 )稱爲「鹼可溶性樹脂（ -54- 200905392 B-1 )」。 聚合轉化率係根據下式自施以自由基聚合之組份的實 際進料重量及所得共聚物溶液之固體濃度（重量％)計算 °爲決定固體濃度，測量所得共聚物溶液在加熱前後之重 量’溶液於鋁盤中稱重且於18〇 t熱板上加熱2小時，藉 (加熱後重量00/加熱前重量）來計算固體濃度。聚合 轉化率（重量％ )=共聚物溶液在聚合後之濃度（重量％ ) X所有組份之實際進料總重量/除溶劑以外之組份的實際進 料總重量。 合成例2 依如同合成例1之方式製得共聚物（B1)溶液（固體 濃度=3 5 · 5重量％，聚合轉化率：1 〇 〇重量％ )，不同處係 可聚合不飽和化合物係變成25重量份數N-苯基順丁烯二 醯亞胺、15重量份數苯乙烯、15重量份數甲基丙烯酸、 2〇重量份數甲基丙烯酸正丁酯及25重量份數3-(甲基丙 烯醯氧基甲基）-3-乙基氧雜環丁烷。此共聚物（B1)係 稱爲「鹼可溶性樹脂（B-2 )」。 合成例3 依如同合成例1之方式製得共聚物（B 1 )溶液（固體 濃度=3 5.5重量％，聚合轉化率：1 0 0重量％ )，不同處係 可聚合不飽和化合物係變成25重量份數N_苯基順丁嫌二 醯亞胺、15重量份數苯乙烯、15重量份數甲基丙烧酸、 -55- 200905392 20重量份數甲基丙烯酸正丁酯及25重量份數甲基丙烯酸 四氫糠酯。此共聚物（B 1 )係稱爲「鹼可溶性樹脂（B-3 合成例4 依如同合成例1之方式製得共聚物（B 1 )溶液（固體 濃度=3 5.5重量％，聚合轉化率：1 00重量％ )，不同處係 可聚合不飽和化合物係變成25重量份數N-苯基順丁烯二 醯亞胺、15重量份數苯乙烯、15重量份數甲基丙烯酸、 20重量份數甲基丙烯酸正丁酯、15重量份數3-(甲基丙 烯醯氧基甲基）-3 -乙基氧雜環丁烷及10重量份數甲基丙 烯酸四氫糠酯。此共聚物（B1)係稱爲「鹼可溶性樹脂（ B-4 )」。 合成例5 依如同合成例1之方式製得共聚物（B1)溶液（固體 濃度=3 5 · 5重量％，聚合轉化率：1 〇 〇重量％ )’不同處係 多硫醇化合物變成7重量份數四（乙二醇）雙（3-锍基丙 酸酯）（SAKAI CHEMICAL INDUSTRY CO·，LTD.之產品 )。此共聚物（B 1 )係稱爲「鹼可溶性樹脂（B - 5 )」。 合成例6 依如同合成例1之方式製得共聚物（B 1 )溶液（固體 濃度=3 5.5重量％，聚合轉化率：1 〇 〇重量％ )，不同處係 -56- 200905392 多硫醇化合物變成7重量份數二異戊四醇雙（3-锍基丙酸 酯）（SAKAI CHEMICAL INDUSTRY CO·，LTD.之產品） 。此共聚物（B 1 )係稱爲「鹼可溶性樹脂（B-6 )」。 合成例7 依如同合成例1之方式製得共聚物（B1)溶液（固體 濃度=3 5.4重量％，聚合轉化率：99.8重量％)，不同處 係多硫醇化合物變成7重量份數1，4-雙（3-锍基丁醯氧S )丁烷（Showa Denko K.K.之產品）。此共聚物（B1 )係 稱爲「鹼可溶性樹脂（B-7)」。 合成例8 依如同合成例1之方式製得共聚物（B1)溶'液（@胃 濃度=3 5.3重量。/。，聚合轉化率：99,5重量°/❶）’不同處 裙右甚丁酸 係多硫醇化合物變成7重量份數異戊四醇四（3_&t $ _ r R 1 )係稱 酯）（811(^&〇6111;〇反_1^.之產品）。此共聚物（' 爲「鹼可溶性樹脂（B-8 )」。CHf=CHCOOCH2—c—CH2〇CH2—C—CH2〇COCH2CH2COOH CH2=CHCOOCH2 ch2ococh=ch2. In particular, trimethylolpropane triacrylate, pentaerythritol triacrylate and diisopentyl alcohol hexaacrylate are particularly preferred because a color layer having excellent strength and surface smoothness is obtained, and since it is not easy to be on the substrate Scum, film residue, and the like are generated in the unexposed portion and on the light shielding layer. The above polyfunctional monomer may be used singly or in combination of two or more. The amount of the polyfunctional monomer of the present invention is preferably from 5 to 500 by weight based on 100 parts by weight of the alkali-soluble resin (B). The number of parts is preferably from 20 to 300 parts by weight. When the amount of the polyfunctional monomer is too small, the strength and surface smoothness of the color layer may be lowered, and when the amount is too large, the alkali developability -31 - 200905392 may be lowered, or the unexposed portion of the substrate may be opaque. The layer is prone to scum, film residues and the like. Further, in the present invention, a monofunctional monomer having a polymerizable unsaturated bond can be used in combination with a polyfunctional monomer. The illustrative examples of the aforementioned monofunctional monomer include a compound which is an example of the unsaturated compound (b1), (b2) or (b3) in the alkali-soluble resin (B), N-(methyl)propenylmorphomorpholine , N-vinyl pyrrolidone, N-ethyl sulphate - ε - caprolactone. Amines and commercially available products M-5600 ( Toagosei Co. ,Ltd. Product name). These monofunctional monomers may be used singly or in combination of two or more. The amount of the monofunctional monomer is preferably not more than the total amount of the polyfunctional monomer and the monofunctional monomer. 90% by weight, more preferably no more than 50% by weight. When the amount of the monofunctional monomer is too large, the strength and surface smoothness of the color layer to be obtained may become insufficient. The total amount of the polyfunctional monomer and the monofunctional monomer in the present invention is preferably from 5 to 500 parts by weight, more preferably from 20 to 30, based on 1 part by weight of the alkali-soluble resin (B). 0 parts by weight. For example, when the total amount is too small, the strength and surface smoothness of the color layer may be lowered, and when the total amount is too large, the alkali developability may be lowered, or scum or film may be easily generated in the unexposed portion or the light shielding layer on the substrate. Residues and the like. • (D) Photopolymerization initiator - The photopolymerization initiator of the present invention is capable of starting up when exposed to radiation such as visible light, -32-200905392 ultraviolet radiation, far ultraviolet radiation, electron beam or X-ray A compound of the above-mentioned polyfunctional monomer (C) and a polymerized active material of a monofunctional monomer used as the case may be. Illustrative examples of such a photopolymerization initiator include an acetal benzene compound 'biimidazole compound' triazine compound, an anthracene-fluorenyl hydrazine compound, a gun salt compound 'benzoin compound, a benzophenone compound, an α-diketone Compounds, polycyclic guanidine compounds, xanthone compounds, diazo compounds and sulfhydrazine sulfonate compounds. These compounds produce active free radicals and/or active acids upon exposure. The photopolymerization initiator of the present invention is preferably at least one selected from the group consisting of an acetone compound, a biimidazole compound, a triazine compound, and a 0-fluorenyl hydrazine compound. In the present invention, the photopolymerization initiator may be used singly or in combination of two or more. In the present invention, the amount of the photopolymerization initiator is preferably 0. by weight based on 100 parts by weight of the total of the polyfunctional monomer (c) and the monofunctional monomer. 01 to 120 parts by weight, more preferably 1 to 1 part by weight. When the amount of the photopolymerization initiator is too small, curing by exposure is insufficient, and it may become difficult to obtain a color filter having a color layer pattern arranged according to a specific configuration, and when the amount is too large, The formed colored layer may be detached from the substrate during development. Specific examples of the ethoxylated benzene compound in the preferred photopolymerization initiator of the present invention include 2-hydroxy-2-methyl-1-phenylpropan-1-one and 2-methyl-1-[4- (Methylthio)phenyl]-2-morpholinylpropan-1-one, 2-benzyl-2-dimethylamine-33- 200905392 -1-(4-morpholinylphenyl)butane 1-ketone, 1-hydroxycyclohexyl phenyl ketone, 2,2-dimethoxy-1,2-diphenylethane-1-one, and 1,2-octanedione. Among these ethoxylated benzene compounds, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one, 2-benzyl-2-dimethylamine The base-1-(4-morpholinylphenyl)butan-1-one and 1,2-octanedione are particularly preferred. The aforementioned ethoxylated benzene compound may be used singly or in combination of two or more. In the present invention, when an ethoxylated benzene compound is used as a photopolymerization initiator, the acetal benzene compound is used in an amount of 1 part by weight of the polyfunctional monomer (C) and the total of the monofunctional monomer. The gauge is preferably from 0. 01 to 80 parts by weight, more preferably from 1 to part by weight, particularly preferably from 1 to 60 parts by weight. When the amount of the acetal benzene compound is too small, insufficient curing by exposure makes it difficult to obtain a color filter having a color layer pattern arranged according to a specific configuration, and when the amount is too large, The formed colored layer may be detached from the substrate during development. Further, specific examples of the aforementioned hydrazine compound include 2,2'-bis(2-chlorophenyl)-4,4.,5,5'-tetrakis(4-ethoxycarbonylphenyl)-indole, -biimidazole, 2,2'-bis(2-bromophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-1,2'-biimidazole, 2, 2'-bis(2-chlorophenyl)-4,4',5,5,-tetraphenyl-1,2,-biimidazole, 2,2'-bis(2,4-dichlorophenyl) -4,4,,5,5,-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-trichlorophenyl)-4,4·,5,5 ,-tetraphenyl-121·biimidazole, 2,2′-bis(2-bromophenyl)-4,4·,5,5·-tetraphenyl-1,2·-biimidazole, 2,2 '-Bis(2,4-dibromophenyl)-4,4·,5,5·-tetraphenyl-1,2,-biimidazole and 2,2'-bis(2,4,6-three Bromophenyl)-4,4i,5,5,-tetraphenyl- -34- 200905392 1,2 '-Biimidazole. Among these biimidazole compounds, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis ( 2,4-Dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2,biimidazole and 2,2'-bis(2,4,6-trichlorophenyl)- 4,4',5,5'-tetraphenyl-1,2'-biimidazole is preferred, and 2,2'-bis(2-chlorophenyl)-4,4\5,5'-tetraphenyl Base-1,2'-biimidazole is preferred. These biimidazole compounds have excellent solubility in a solvent, do not generate foreign matter such as insolubles and precipitates, are highly sensitive, allow the curing reaction to proceed sufficiently under low-energy exposure, and do not cause in an unexposed portion. The curing reaction, therefore, the film after exposure is clearly distinguished as a solidified portion which is insoluble in the developer and an uncured portion which has high solubility in the developer, and can be formed to have a pattern having no undercut color layer pattern arranged according to a specific configuration. Clearness color filter. The biimidazole compound may be used singly or in combination of two or more. In the present invention, when a biimidazole compound is used as a photopolymerization initiator, the biimidazole compound is used in an amount of 1 part by weight. The total amount of the monomer (C) and the monofunctional monomer is preferably 0. 01 to 40 parts by weight, more preferably 1 to 30 parts by weight, particularly preferably 1 to 20 parts by weight. When the amount of the biimidazole compound is too small, curing by exposure is insufficient, so that it may become difficult to obtain a color filter having a color layer pattern arranged according to a specific configuration, and when the amount is too large, the formed The colored layer may be detached from the substrate' or the surface of the colored layer may be roughened when it is easy to develop. In the present invention, when a biimidazole compound is used as a photopolymerization initiator, -35-200905392 is preferably used in combination with the following hydrogen donor because the sensitivity can be further improved. "Hydrogen donor" means that it can be provided at the time of exposure. A compound in which a hydrogen atom is supplied from a radical formed by the biimidazole compound. As the hydrogen donor of the present invention, preferred are thiol compounds, amine compounds and the like as defined hereinafter. The above thiol compound comprises a compound having a benzene ring or a heterocyclic ring as a mother nucleus and one or more, preferably one to three, more preferably one or two thiol groups directly bonded to the mother nucleus (hereinafter referred to as "sulfur Alcohol hydrogen donor"). The above amine compound is a compound having a benzene ring or a hetero ring as a mother nucleus and one or more, preferably one to three, more preferably one or two amine groups directly bonded to the mother nucleus (hereinafter referred to as "amine" Hydrogen donor"). In addition, such hydrogen donors may also have a mercapto group and an amine group. These hydrogen donors are further described below. The thiol hydrogen donor may have at least one benzene ring or heterocyclic ring and may have both a benzene ring and a heterocyclic ring which, when containing two or more such rings, may form a fused ring. Further, when the thiol hydrogen donor has two or more mercapto groups, one or more remaining mercapto groups may be substituted with an alkyl group, as long as at least one free mercapto group is retained, at least one of the other mercapto groups may be alkyl group Substituting an aralkyl group or an aryl group, and as long as at least one free thiol group is retained, the thiol hydrogen donor may have a structural unit in which two sulfur atoms are bonded via a divalent organic group such as an alkylene group or The structural unit in which the two sulfur atoms are bonded in the form of a disulfide. Further, in the thiol hydrogen donor, the position other than the thiol group may be substituted by a carboxyl group, an alkoxycarbonyl group, a substituted alkoxycarbonyl group, a phenoxy-36-200905392 carbonyl group, a substituted phenoxy group. Alkylcarbonyl, nitrile or the like. Specific examples of such a thiol hydrogen donor include 2-mercaptobenzothiazepine, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2,5-dimercapto-indole, 3, 4_ thiadiazole and 2-mercapto-2,5-dimethylaminopyridine. Among these thiol hydrogen donors, 2-mercaptobenzothiazole and 2-mercaptobenzoxazole are preferred, and 2-mercaptobenzothiazole is particularly preferred. In another aspect, the amine hydrogen donor can have at least one benzene or heterocyclic ring or both a benzene ring and a heterocyclic ring which, when containing two or more such rings, can form a fused ring. Further, in the amine hydrogen donor, one or more amine groups may be substituted by an alkyl group or a substituted alkyl group, and the position other than the amine group may be substituted by a carboxyl group, an alkoxycarbonyl group, or a substituted group. Alkoxycarbonyl, phenoxycarbonyl, substituted phenoxycarbonyl, nitrile or the like. Specific examples of such amine hydrogen donors include 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4-di Ethylaminoethenylbenzene, 4-dimethylaminopropionylbenzene, ethyl-4-dimethylaminobenzyl ester, 4-dimethylaminobenzyl acid and 4-dimethyl Aminobenzonitrile. Among these amine hydrogen donors, 4,4'-bis(dimethylamino)benzophenone and 4,4'-bis(diethylamino)benzophenone are preferred, and 4,4 '-Bis(diethylamino)benzophenone is particularly preferred. The amine hydrogen donor has an effect as a sensitizer, even when used in combination with a radical generator other than the imiprazole compound. In the present invention, the hydrogen donor may be used singly or in combination of two or more. It is preferred to use at least one thiol hydrogen donor and at least one amine hydrogen donor -37-200905392 composition because the formed colored layer is less likely to fall off from the substrate during development and the colored layer has high strength and sensitivity. Specific examples of the composition of the thiol hydrogen donor and the amine hydrogen donor include 2-mercaptobenzothiazole/4,4'-bis(dimethylamino)benzophenone, 2-mercaptobenzophenone Thiazole/4,4'-bis(diethylamino)benzophenone, 2-mercaptobenzoxazole/4,4'-bis(dimethylamino)benzophenone and 2-oxime Benzooxazole/4,4'-bis(diethylamino)benzophenone. More preferred compositions are 2-mercaptobenzothiazole/4,4'-bis(diethylamino)benzophenone and 2-mercaptobenzoxazole M,4'-bis(diethylamine) Base) benzophenone. A particularly preferred composition is 2-mercaptobenzothiazole/4,4'-bis(diethylamino)benzophenone. In the composition of the thiol hydrogen donor and the amine hydrogen donor, the weight of the thiol hydrogen donor relative to the amine hydrogen donor is preferably from 1:1 to 1:4, more preferably from 1:1 to 1: 3. In the present invention, when the hydrogen donor is used in combination with the biimidazole compound, the hydrogen donor is preferably used in an amount of 100 parts by weight of the polyfunctional monomer (C) and the monofunctional monomer. 0. 01 to 40 parts by weight, more preferably 1 to 30 parts by weight, particularly preferably 1 to 20 parts by weight. When the amount of the hydrogen donor is too small, the effect of improving the sensitivity is liable to be lowered, and when the amount is too large, the formed color layer may be easily peeled off from the substrate at the time of development. Further, specific examples of the aforementioned triazine compound include a triazine compound having a halomethyl group such as 2,4,6-tris(trichloromethyl)-s-triazine, 2-methyl-4,6-double (Trichloromethyl)-3-triazine, 2-[2-(5-methylfuran-2-yl)vinyl]-4,6-bis(trichloromethyl)-s-triazine, 2 -[2-(furan-2-yl)vinyl]-4,6-bis(trichloromethyl)-3-triazine, 2-[2-(4-diethyl-38- 200905392 amine- 2-methylphenyl)vinyl]-4,6-bis(trichloro-2-[2-(3,4-dimethoxyphenyl)vinyl]-4,6-sell s-triazine, 2-(4-Methoxyphenyl)-4,6-bis(tri:,2-(4-ethoxystyryl)-4,6-bis(trichloro-2-(4-n-butoxy) 2-[2-(3,4-dimethyl]-4,6-bis(trichloromethyl)-s, among the triazine compounds, phenyl)-4,6-bis(trichloromethyl) - The triazine compound may be used alone or in the present invention, and the triazine compound is used as the phototriazine compound in an amount of 1 part by weight and 1 monofunctional monomer. The total amount is preferably 0. 0 1 3 more preferably from 1 to 30 parts by weight, particularly preferably from 1 to 20 parts by weight, curing by exposure becomes difficult to obtain a color filter having a arrangement according to a specific configuration, and when the amount When it is too large, the formed color will fall off from the substrate. Further, the specific 1 (phenylthio)phenyl]-heptane-1,2-dione 2-(0-(phenylthio)phenyl]-octane-1 of the aforementioned fluorene-fluorenyl compound ,2-dione 2-(0-1-[4-(benzylidene)phenyl]-octane-1,2-dione, 1-[9-ethyl-6-(2-methylbenzyl)醯基)-9H-Oat beer 0-acetamidine), 1-[9-ethyl-6-(3-methylanthracene)-9Η, _(0-acetamidine), methyl)- S-triazine, I (trichloromethyl)-gasmethyl)-S-triazinylmethyl)-S-triazine and)-S-dixiao. Oxyphenyl) ethylene is used in various blends. When the initiator is polymerized, the amount of the monomer (C) I is 40 parts by weight, and the amount of the fraction is "when the triazine is insufficient, so that the color layer of the color layer pattern may be included in the development t system including 1 - [4-benzyl]醯肟), 1-[4-benzyl hydrazine), 2-( 〇-benzylhydrazine):-3-yl]ethanone 1-(oxazol-3-yl)ethanone 1- -39- 200905392 1 -[9-ethyl-6-benzylindol-9^oxazol-3-yl]-ethanone 1-(0-acetamidine), ethyl ketone-1-[9-ethyl-6-(2 -Methyl-4-tetrahydrofuranbenzylbenzyl)-9. H.  -carbazol-3-yl]-1-(0-acetamidine), ethyl ketone-l-[9-ethyl-6-(2-methyl-4-tetrahydropyranylbenzyl)- 9. H. -carbazol-3-yl]-1-(0-acetamidine), ethyl ketone-1-[9-ethyl-6-(2-methyl-5-tetrahydrofuranylbenzyl)-9·Η_ -carbazol-3-yl]-1-(0-acetamidine), ethyl ketone-1-[9-ethyl-6-(2-methyl-5-tetrahydropyranylbenzyl)- 9. Hey.  -carbazol-3-yl]-1-(0-acetamidine), ethyl ketone-1-[9-ethyl-6-{2-methyl-4-( 2,2-dimethyl-1 ,3-dioxolanyl)benzylidene}-9·Η·-carbazol-3-yl]-1-(0-acetamidine), ethyl ketone-1-[9-ethyl-6- (2-Methyl-4-tetrahydrofuranylmethoxybenzyl)-9·Η·-oxazol-3-yl]-1-(0-acetyl), ethyl ketone- l-[9-B -6-(2-methyl-4-tetrahydropyranylmethoxybenzyl) oxazol-3-yl]-b (0-acetamidine), ethyl ketone- l-[9-B Base-6-(2-methyl-5-tetrahydrofuranylmethoxybenzyl)-9. H. -carbazol-3-yl]-1-(0-acetamidine), ethyl ketone-l-[9-ethyl-6-(2-methyl-5-tetrahydropyranylmethoxybenzylhydrazine (carbazol-3-yl)-1-(0-acetamidine) and ethyl ketone-1-[9-ethyl-6-{2-methyl-4-(2,2-dimethyl- 1,3-dioxolanyl)methoxybenzylhydrazine}-9. Η·-carbazol-3-yl]-1-(0-acetamidine) 〇-[4-(phenylthio)phenyl]- -40- 200905392 Octane-1,2-dione 2-( 0-benzylindole), l-[9-ethyl-6-(2-methylbenzylindenyl)-9H-indazol-3-yl]ethanone 1-(0-acetamidine), ethyl ketone-l-[9-ethyl-6-(2-methyl-4-tetrahydrofuranylmethoxybenzyl)-9. H.  -oxazol-3-yl]-1-(0-acetamidine) and ethyl ketone-l-[9-ethyl-6-{2-methyl-4-( 2,2-dimethyl-1 , 3-dioxolanyl)methoxybenzylbenzyloxazol-3-yl]-1-(0-acetamidine) is particularly preferred. The aforementioned fluorenyl-indenyl hydrazine compounds may be used singly or in combination of two or more. In the present invention, when a ruthenium-indenyl ruthenium compound is used as a photopolymerization initiator, the 0-fluorenyl ruthenium compound is used in an amount of 100 parts by weight of the polyfunctional monomer (C) and the monofunctional monomer. The meter system is preferably 0. 01 to 80 parts by weight, more preferably 1 to 70 parts by weight, particularly preferably 1 to 60 parts by weight. When the amount of the bismuth-ethene compound is too small, insufficient curing by exposure makes it difficult to obtain a color filter having a color layer pattern arranged according to a specific configuration, and when the amount is too large, The formed color layer may be easily peeled off from the substrate during development. - Additive - The radiation-sensitive composition used to form the colored layer of the present invention may optionally contain various additives. Illustrative examples of the aforementioned additives include organic acids and organic amine-based compounds (excluding the aforementioned hydrogen donors), curing agents, and curing assistants. -41 - 200905392 The aforementioned organic acid and organic amine compound are components for producing an effect of further improving the solubility of the radiation-sensitive composition in an alkali developer and further suppressing the effect of residual insolubles after development. As the above organic acid, an aliphatic carboxylic acid having one or more carboxyl groups in the molecule or a carboxylic acid having a phenyl group is preferred. Specific examples of the aforementioned aliphatic carboxylic acid include monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethyl acetic acid, heptanoic acid, and octanoic acid; dicarboxylic acids such as Oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, branic acid, methylmalonic acid, ethylmalonic acid, two Methylmalonic acid, methyl succinic acid, tetramethyl succinic acid, cyclohexane dicarboxylic acid, isaconic acid, citraconic acid, maleic acid, fumaric acid and mesaconic acid; and tricarboxylic acid Acids such as glycerol, aconitic acid and camphoric acid. Further, illustrative examples of the aforementioned phenyl group-containing carboxylic acid include a compound in which a carboxyl group is directly bonded to a phenyl group and a carboxylic acid in which a carboxyl group is bonded to a phenyl group via a carbon chain. Specific examples of the phenyl group-containing carboxylic acid include aromatic monocarboxylic acids such as benzylic acid, toluic acid, lauric acid, benzotricarboxylic acid, and dimethylbenzyl acid; aromatic dicarboxylic acids such as phthalic acid, Isophthalic acid and terephthalic acid; aromatic polycarboxylic acids having 3 or more carboxyl groups, such as trimellitic acid, trimellitic acid, pyromellitic acid and pyromellitic acid; and phenylacetic acid, hydrogenated Oleic acid, hydrogenated cinnamic acid, mandelic acid, phenyl succinic acid, atropic acid, cinnamic acid, cinnamic acid, coumaric acid and chelating acid. Among these organic acids, the aliphatic dicarboxylic acid is preferred, and the solubility in the solvent, the solubility in the solvent described below in -42-200905392, and the prevention of scum and film residues in the unexposed portion of the substrate or on the light shielding layer. From the standpoint, malonic acid, adipic acid, isaconic acid, citraconic acid, fumaric acid, mesaconic acid, and the like are particularly preferred aliphatic carboxylic acids. Further, as the phenyl group-containing carboxylic acid, an aromatic dicarboxylic acid is preferred, and a phthalic acid is particularly preferred. The aforementioned organic acids may be used singly or in combination of two or more. The amount of the organic acid is preferably not more than 15% by weight, more preferably not more than 10% by weight, based on the total solid content of the radiation-sensitive composition. When the amount of the organic acid is too large, the adhesion of the formed color layer to the substrate may be lowered. Further, as the aforementioned organic amine-based compound, an aliphatic amine or a phenyl group-containing amine having one or more amine groups in the molecule Preferably. Specific examples of the aforementioned aliphatic amines include mono(cyclo)alkylamines such as n-propylamine, isopropylamine, n-butylamine, isobutylamine, second butylamine, tert-butylamine, N-pentylamine, n-hexylamine, n-heptylamine, n-octylamine, n-decylamine, n-decylamine, n-undecylamine, n-dodecylamine, cyclohexylamine, 2-methyl Cyclohexylamine, 3-methylcyclohexylamine, 4-methylcyclohexylamine, 2-ethylcyclohexylamine, 3-ethylcyclohexylamine, and 4-ethylcyclohexylamine; di(cyclo)alkane Base amines, such as methyl ethylamine, diethylamine, methyl-n-propylamine, ethyl-n-propylamine, di-n-propylamine, di-isopropylamine, di-n-butyl Amine, di-isobutylamine, di-secondbutylamine, bis-tert-butylamine, di-n-pentylamine, di-n-hexylamine, methylcyclohexylamine, ethylcyclohexylamine and Dicyclohexylamine; tri(cyclo)alkylamine, such as dimethylethylamine, methyldiethylamine, triethylamine, dimethyl-n-propylamine-43-200905392, diethyl-n-propyl Amine, methyl di-n-propylamine, ethyldi-n-propylamine, tri-n-propyl Amine, tri-isopropylamine, tri-n-butylamine, tri-isobutylamine, tri-t-butylamine, tri-t-butylamine, tri-n-pentylamine, tri-n-hexyl Amine, dimethylcyclohexylamine, diethylcyclohexylamine, methyldicyclohexylamine, ethyldicyclohexylamine, and tricyclohexylamine; mono(cyclo)alkanolamines, such as 2-aminoethanol, 3-Amino-1-propanol, 1-amino-2-propanol, 4-amino-1-butanol, 5-amino-p-pentanol, 6-amino-1-hexanol and 4 -Amino-1-cyclohexanol; di(cyclo)alkanolamines, such as diethanolamine, di-n-propanolamine, di-isopropanolamine, di-n-butanolamine, diisobutanolamine, Di-n-pentanolamine, di-n-hexanolamine and bis(4-cyclohexanol)amine; tri(cyclo)alkanolamines such as triethanolamine, tri-n-propanolamine, tri-isopropanolamine, three • n-butanolamine, tri-isobutanolamine, tri-n-pentanolamine, tri-n-hexanolamine and tris(4-cyclohexanol)amine; amine (cyclo)alkanediols such as 3-amino -1,2-propanediol, 2-amino-1,3•propanediol, 4-amino-1,2-butanediol, 4-amino-1,3-butanediol, 4-amino-1,2-cyclohexanediol, 4- -1,3-cyclohexanediol, 3-dimethylamino-1,2-propanediol, 3-diethylamino-1,2-propanediol, 2-dimethylamine -1,3-propanediol and 2·diethylamino-1,3-propanediol; amine-containing cycloalkane methanol such as 1-aminocyclopentane methanol, 4-amino ring Pentane methanol, 1-aminocyclohexane methanol, 4-aminocyclohexane methanol, 4-dimethylaminocyclopentane methanol, 4-diethylaminocyclopentane methanol, 4-dimethyl Alkylcyclohexane methanol and 4-diethylaminocyclohexane methanol; and an aminocarboxylic acid such as alanine, 2-aminobutyric acid, 3. Aminobutyric acid, 4-aminobutyric acid, 2-aminoisobutyric acid, 3-aminoisobutyric acid, 2-aminopentanoic acid, 5-aminopentanoic acid, 6-aminohexanoic acid, - 44- 200905392 1. Aminocyclopropanecarboxylic acid, 1-aminocyclohexanecarboxylic acid and 4-aminocyclohexanecarboxylic acid. Further, illustrative examples of the aforementioned phenyl group-containing amine include compounds in which an amine group is directly bonded to a phenyl group and a compound in which an amine group is bonded to a phenyl group via a carbon chain. Specific examples of the phenyl-containing amine include aromatic amines such as aniline, 2-methylaniline, 3-methylaniline, 4-methylaniline, 4-ethylaniline, 4-n-propylaniline, 4 -Isopropylaniline, 4-n-butylaniline, 4-tert-butylaniline, 1-naphthylamine, 2-naphthylamine, anthracene, fluorene-dimethylaniline, anthracene, fluorene-diethylaniline And 4-methyl-indole, fluorene-dimethylaniline; aminobenzyl alcohol, such as 2-aminobenzyl alcohol, 3-aminobenzyl alcohol, 4-aminobenzyl alcohol, 4-dimethyl Aminobenzyl alcohol and 4-diethylaminobenzyl alcohol; and aminophenols such as 2-aminophenol, 3-aminophenol, 4-aminophenol, 4-dimethylaminophenol And 4-diethylaminophenol. Among these organic amine-based compounds, as an aliphatic amine, in terms of solubility in a solvent and prevention of formation of dross and film residue on an unexposed portion of a substrate or on a light-shielding layer The cycloalkanolamine and the amine (cyclo)alkanediol are preferably 2, and the aminoethanol, 3-amino-1-propanol, 5-amino-1-pentanol, 3-amino-1 2-propanediol, 2-amino-1,3-propanediol and 4-amino-1,2-butanediol are particularly preferred. Further, as the phenyl group-containing amine, the aminophenol is preferred, and the 2-aminophenol, 3-aminophenol and 4-aminophenol phenolic organic amine groups are used in the total amount of solids in the radiation-sensitive composition. Preferably, the gauge is no more than 15% by weight, more preferably no more than 1% by weight. When the amount of the organic amine -45-200905392-based compound is too large, the adhesion of the formed color layer to the substrate may be lowered. The curing agent is a component which cures the alkali-soluble resin (B) by reacting with a carboxyl group and/or an oxetane ring in the alkali-soluble resin (B). An illustrative example of the curing agent includes an epoxy. Compounds and oxetane compounds. The epoxy compound is preferably a polyfunctional epoxy compound. Specific examples thereof include aromatic epoxy resins such as bisphenol A epoxy resin, hydrogenated bisphenol A epoxy resin, bisphenol F epoxy resin, hydrogenated bisphenol F epoxy resin, and novolac type epoxy resin; Epoxy resin, such as alicyclic epoxy resin, heterocyclic epoxy resin, glycidyl ester resin, glycidylamine resin and epoxidized oil; brominated derivatives of such epoxy resins, and epoxidized dibutyl An olefin (co)polymer, an epoxidized isoprene (co)polymer, a (co)polymer of a glycidyl group-containing unsaturated compound, and a triglycidyl isocyanurate. Further, an epoxy group-containing unsaturated compound is also desirable as the aforementioned epoxy compound. Specific examples thereof include glycidyl (meth)acrylate, 3,4-epoxybutyl (meth)acrylate, 6,7-epoxyheptyl (meth)acrylate, o-vinylbenzyl glycidol. Alkyl ether, m-vinylbenzyl glycidyl ether and p-vinylbenzyl glycidyl ether. On the other hand, the oxetane compound is preferably a polyfunctional oxetane compound. Specific examples thereof include low molecular weight compounds such as dioxetane carbonate, dioxetane adipate, p-benzene-46-200905392 dioxetane dicarboxylate, p-phenylene Dioxetanecarboxylate and dioxetane 1,4-cyclohexanedicarboxylate and high molecular weight compounds such as phenolic resins etherified with oxetane and having an oxetane (co)polymer of a cyclic structure of an unsaturated compound (excluding copolymer (B1)). The copolymer (B1) having an oxetane ring structure is a component having an effect as a curing agent. Further, a compound having both an oxetane ring structure and an unsaturated double bond is also an ideal oxetane compound. Specific examples thereof include compounds as exemplified for the aforementioned unsaturated compound (b 3 -1 ). These curing agents may be used singly or in combination of two or more. The curing agent is preferably used in an amount of not more than 30% by weight, more preferably not more than 20% by weight, based on the total of the solids of the radiation-sensitive composition. When the amount of the curing agent is too large, the storage stability of the radiation-sensitive composition to be produced may be lowered. The curing aid is a component which accelerates the curing reaction of the curing agent by opening the epoxy group and/or the oxetane ring of the curing agent. Illustrative examples of such curing assistants include polycarboxylic acids, polycarboxylic anhydrides, and amine based compounds. Specific examples of the foregoing polycarboxylic acid include compounds as exemplified for the compounds having two or more carboxyl groups in the aforementioned organic acid. Specific examples of the aforementioned amino compound include compounds as exemplified for the aforementioned organic amine-based compounds. Further, specific examples of the aforementioned polycarboxylic acid anhydride include aromatic polycarboxylic acid anhydrides such as phthalic anhydride, pyromellitic anhydride, trimellitic anhydride, and -47-200905392 3,3 ·,4,4'-diphenyl Methyl ketone tetracarboxylic dianhydride; aliphatic polycarboxylic anhydride such as isaconic anhydride, succinic anhydride, citraconic anhydride, dodecenyl succinic anhydride, propylene tricarboxylic anhydride, maleic anhydride and 1,2,3,4 - butane tetracarboxylic anhydride; alicyclic polycarboxylic anhydrides such as hexahydrophthalic anhydride, 3,4-dimethyltetrahydrophthalic anhydride, 1,2,4-cyclopentane tricarboxylic anhydride, 12, 4-cyclohexanetricarboxylic anhydride, cyclopentane tetracarboxylic dianhydride, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, 5-n-decene-2,3-dicarboxylic anhydride, and acid anhydride; Carboxylic acid-containing carboxylic anhydrides, such as ethylene glycol dibenzoic acid anhydride and glycerol benzene tricarboxylic acid anhydride; and commercially available epoxy resin solidification! 1 Trade name ADEKA HARDENER EH-700 ( ADEKA CORPORATION Product), RIKACID HH (New Japan Chemical C ο. , L t d · products) and Η 0 -7 0 0 ( N e w J ap an Chemical Co . ,Ltd. Product). The aforementioned curing assistants may be used singly or in combination of two or more. The curing assistant is preferably used in an amount of not more than 15% by weight, more preferably not more than 10% by weight, based on the total mass of the radiation-sensitive composition. When the amount of the curing assistant is too large, the storage stability of the radiation-sensitive composition to be produced may be lowered or the formed colored layer may be easily peeled off from the substrate upon development. Further, illustrative examples of the additive other than the foregoing additives include a dispersing aid such as a blue pigment derivative or a yellow pigment derivative such as a copper phthalocyanine derivative; a chelating agent such as glass or alumina; a polymer a compound such as a polyvinyl alcohol, a polyethylene glycol monoalkyl ether or a poly(fluoroalkyl acrylate); a nonionic, cationic or anionic surfactant; an adhesion promoter such as vinyltrimethoxydecane , vinyl triethoxydecane, vinyl tris(2-methoxyethoxy)decane, N-(2-amino-48- 200905392 ethyl)-3-aminopropylmethyldimethoxy Baseline, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropylmethyldimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-chloropropylmethyldimethoxydecane, 3 -chloropropyltrimethoxydecane' 3-methylpropenyloxypropyltrimethoxydecane or 3-mercaptopropyltrimethoxydecane: antioxidant , such as 2,2^thiobis(4-methyl-6-tert-butylphenol) or 2,6-di-t-butylphenol; ultraviolet light absorbers, such as 2-(3-third a 5-methyl-2-hydroxyphenyl)-5-chlorobenzotriazole or alkoxybenzophenone; a cohesion inhibitor such as sodium polyacrylate; and a thermal radical generating agent such as 1, Γ-Azobis(cyclohexane-1-carbonitrile) or 2-phenylazo-4-methoxy-2,4-dimethylvaleronitrile. - Solvent - The radiation-sensitive composition for forming a colored layer of the present invention contains the aforementioned components (A) to (D) as essential components and optionally the aforementioned additives, and is usually mixed with a solvent to prepare a liquid. Composition. As the solvent, 'optional and any suitable solvent is used as long as the solvent disperses or dissolves the components (A) to (D) and the component of the composition constituting the radiation-sensitive composition without reacting with the components, and Have appropriate volatility. Illustrative examples of such solvents include (poly)alkylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol single - n-butyl ether, bisethylene glycol monomethyl ether, diethylene di-49- 200905392 alcohol monoethyl ether, bisethylene glycol mono-n-propyl ether, bisethylene glycol mono-n-butyl ether, Glycol monomethyl ether, propylene glycol monoethyl ether 'propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl Ether, dipropylene glycol monoethyl ether 'dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether and tripropylene glycol monoethyl ether: (poly)alkane monoalkylene Ethyl acetate, such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether Acid ester, propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether acetate; other ethers, such as bisglycol dimethyl ether, bisethylene glycol methyl ethyl ether, diethylene glycol diethyl Ether Tetrahydrofuran; ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone and 3 · heptanone; alkyl lactates such as methyl lactate and ethyl lactate; other esters such as 2-hydroxy-2-methyl Ethyl propionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethoxyacetic acid Ester, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutylpropionic acid Ester, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, butyric acid Propyl ester, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetoxyacetate, ethyl acetoacetate and 2-oxyl Ethyl butyrate; aromatic hydrocarbons such as toluene and xylene; and decylamine or decylamine compounds such as hydrazine, hydrazine-dimethylformamide, N,N-dimethylacetamide and N-methyl Kepirozolone. -50- 200905392 In terms of solubility, pigment dispersibility, coatability, and the like, propylene glycol monomethyl ether, propylene glycol monoethyl ether, ethylene glycol monomethyl ether acetate, Propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, bisethylene glycol methyl ethyl ether, cyclohexanone, 2-g-indole, 3-heptanone , ethyl lactate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, 3-methyl-3-methoxybutylpropionate , n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, isopropyl butyrate, n-butyl butyrate and ethyl pyruvate are preferred. . The foregoing solvents may be used singly or in combination of two or more. In addition, 'high boiling solvents such as benzyl ethyl ether, di-n-hexyl ether, acetone acetone, isophorone, caproic acid, octanoic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl b Acid ester, ethyl benzyl ester, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethyl carbonate, propyl carbonate or ethylene glycol monophenyl ether acetate, It can be used together with the aforementioned solvent. These high boiling solvents may be used singly or in combination of two or more. Although not particularly limited, in view of the coatability, stability, and the like of the resulting radiation-sensitive composition, it is desirable to use the solvent to determine all groups of the radiation-sensitive composition to be prepared except solvent. The total concentration of the parts becomes preferably from 5 to 50% by weight, particularly preferably from 1% to 40% by weight. Color Filter The color filter of the present invention has a color layer formed from the radiation sensitive composition of the present invention for forming a colored layer. -51 - 200905392 A method of forming a color layer in the color filter of the present invention is described below. First, a light shielding layer is formed on the surface of the substrate as appropriate to define a portion for forming a pixel. A liquid radiation-sensitive composition (which contains, for example, a red pigment dispersed therein) is applied to the substrate, and pre-baked to evaporate the solvent to form a coating film. The coating film is then exposed to radiation via a reticle, developed with an alkali developing solution, dissolved and removed from the unexposed portions of the coating film, and post-baked to form a red pixel array having a predetermined pattern. Thereafter, the liquid radiation sensitive composition containing the green or blue pigment dispersed therein is separately applied, pre-baked, exposed, developed, and post-baked to form a green pixel array and blue on the same substrate in sequence. A pixel array is obtained, and a color filter in which red, green, and blue pixel arrays are arranged on the substrate is obtained. However, in the present invention, the order of forming the three color pixels is not limited to the foregoing. Further, a black matrix may be formed using, for example, a liquid radiation-sensitive composition in which a black pigment is dispersed, in a manner similar to the formation of the aforementioned pixels. Illustrative examples of substrates for forming pixels and/or black matrices include glass, ruthenium, polycarbonate, polyester, aromatic polyamines, polyamido-imine and polyimine. In addition, such substrates may optionally be subjected to appropriate pretreatment such as chemical treatment using a decane coupling agent or the like, plasma treatment, ion plating, sputtering, gas phase reaction or vacuum deposition. When the liquid radiation-sensitive composition is applied to the substrate, any suitable coating method may be employed, such as spray coating, roll coating, spin coating, flat-coating, bar coating, or Inkjet coating method. Excellent spin coating and flat nozzle coating. The thickness of the coating film after drying is preferably 0. 1 to 10 microns, more preferably 0. 2 to 8. 0 micron, especially good 0. 2 to 6. 0 micron. As the radiation for forming the color layer, for example, visible light, ultraviolet radiation, far ultraviolet radiation, electron beam, X-ray or the like can be used. Radiation having a wavelength of 190 to 450 nm is preferred. The exposure dose for radiation is preferably from 10 to 10,000 J/m2. Further, the above-mentioned alkali developer is preferably sodium carbonate, sodium hydroxide 'potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo-[5. 4. 0]-7-undecene or 1,5-diazabicyclo-[4. 3·0]-5-pinene water solution. It is also possible to add an appropriate amount of a water-soluble organic solvent such as methanol or ethanol, a surfactant or the like to the aforementioned alkali developer. The coating film is usually washed with water after development with an alkali developer. As the developing method, for example, spray-type development, spray development, immersion development, smelting development or the like can be employed. Development is preferably carried out at room temperature for 5 to 300 seconds. The resulting color filter of the present invention can be extremely effectively used for, for example, a transmissive or reflective type color liquid crystal display element, a color image pickup device, a color sensor or the like. Color Liquid Crystal Display Element The color liquid crystal display element of the present invention comprises the color filter of the present invention. -53- 200905392 Further, as a form of the color liquid crystal display element of the present invention, the radiation sensitive composition for forming a color layer of the present invention can be used to form a pixel and/or black on a thin film transistor substrate array as described above. A matrix is used to prepare a color liquid crystal display element having particularly excellent characteristics. [Embodiment] EXAMPLES Hereinafter, the present invention will be further described with reference to examples. However, the invention should not be limited to the following examples. Synthetic Synthesis Example 1 of Copolymer (B1) To a flask equipped with a cooling tube and a stirrer, 3 parts by weight of 2,2'-azobisisobutyronitrile and 200 parts by weight as a radical polymerization initiator were added. The number is propylene glycol monomethyl ether acetate as a solvent. Thereafter, 25 parts by weight of N-phenyl maleimide, 15 parts by weight of benzene, 30 parts by weight of methacrylic acid, and 10 parts by weight of methacrylic acid are added as a polymerizable unsaturated compound. Butyl ester and 20 parts by weight of benzyl methacrylate and 7 parts by weight of isoamyl alcohol tetrakis(3-mercaptopropionate) as a polythiol compound (SAKAI CHEMICAL INDUSTRY CO·, LTD. Product) The inside of the flask was ventilated with nitrogen. Thereafter, the temperature of the reaction solution was raised to 80 under mild agitation. (:, polymerization was carried out at this temperature for 5 hours to obtain a solution of the copolymer (B 1 ) (solid concentration = 35.5% by weight, polymerization conversion: 100% by weight). This copolymer (B1) It is called "alkali-soluble resin (-54- 200905392 B-1)." The polymerization conversion ratio is the actual feed weight of the component subjected to radical polymerization according to the following formula and the solid concentration (% by weight) of the obtained copolymer solution. Calculate ° to determine the solid concentration, measure the weight of the obtained copolymer solution before and after heating. The solution is weighed in an aluminum pan and heated on a 18 〇t hot plate for 2 hours, and calculated by weight (weight 00 after heating / weight before heating) Solid concentration. Polymerization conversion (% by weight) = concentration of the copolymer solution after polymerization (% by weight) X Total weight of the actual feed of all components / total weight of the actual feed of the components other than the solvent. A copolymer (B1) solution (solid concentration = 35.5% by weight, polymerization conversion ratio: 1% by weight) was obtained in the same manner as in Synthesis Example 1, and the polymerizable unsaturated compound was changed to 25 parts by weight. N-phenyl maleimide, 15 Amount of styrene, 15 parts by weight of methacrylic acid, 2 parts by weight of n-butyl methacrylate and 25 parts by weight of 3-(methacryloxymethyl)-3-ethyloxocyclohexane Butane. This copolymer (B1) is referred to as "alkali-soluble resin (B-2)". Synthesis Example 3 A copolymer (B 1 ) solution was obtained in the same manner as in Synthesis Example 1 (solid concentration = 3 5. 5% by weight, polymerization conversion: 100% by weight), different from the polymerizable unsaturated compound to 25 parts by weight of N-phenyl cis-butyl bis-imine, 15 parts by weight of styrene, 15 weight Parts Methylpropionic acid, -55-200905392 20 parts by weight of n-butyl methacrylate and 25 parts by weight of tetrahydrofurfuryl methacrylate. This copolymer (B 1 ) is referred to as "alkali-soluble resin (B-3 Synthesis Example 4) A copolymer (B 1 ) solution was obtained in the same manner as in Synthesis Example 1 (solid concentration = 3 5. 5% by weight, polymerization conversion: 100% by weight), different from polymerizable unsaturated compound to 25 parts by weight of N-phenyl maleimide, 15 parts by weight of styrene, 15 parts by weight a number of methacrylic acid, 20 parts by weight of n-butyl methacrylate, 15 parts by weight of 3-(methacryloxymethyl)-3-ethyloxetane and 10 parts by weight of methacrylic acid Tetrahydrofurfuryl ester. This copolymer (B1) is called "alkali-soluble resin (B-4)". Synthesis Example 5 A copolymer (B1) solution was obtained in the same manner as in Synthesis Example 1 (solid concentration = 3 5 · 5 wt%, polymerization conversion ratio: 1 〇〇 wt%) - where the polythiol compound became 7 weights Part number four (ethylene glycol) bis(3-mercaptopropionate) (SAKAI CHEMICAL INDUSTRY CO·,LTD. Product). This copolymer (B 1 ) is referred to as "alkali-soluble resin (B - 5 )". Synthesis Example 6 A copolymer (B 1 ) solution was obtained in the same manner as in Synthesis Example 1 (solid concentration = 3 5. 5% by weight, polymerization conversion: 1 〇〇% by weight), different parts -56- 200905392 The polythiol compound becomes 7 parts by weight of diisoamyltetraol bis(3-mercaptopropionate) (SAKAI CHEMICAL INDUSTRY CO·,LTD. Product). This copolymer (B 1 ) is referred to as "alkali-soluble resin (B-6)". Synthesis Example 7 A copolymer (B1) solution was obtained in the same manner as in Synthesis Example 1 (solid concentration = 3 5. 4% by weight, polymerization conversion rate: 99. 8 wt%), in different places, the polythiol compound becomes 7 parts by weight of 1,4-bis(3-mercaptobutyl fluorene S) butane (Showa Denko K. K. Product). This copolymer (B1) is referred to as "alkali-soluble resin (B-7)". Synthesis Example 8 A copolymer (B1) solution was prepared in the same manner as in Synthesis Example 1 (@胃 concentration = 3 5. 3 weight. /. , polymerization conversion rate: 99,5 weight ° / ❶) 'different skirts, the right-butyric acid-based polythiol compound becomes 7 parts by weight of isopentanol tetra (3_&t $ _ r R 1 ) is called ester) (811(^&〇6111; 〇反_1^. Product). This copolymer (' is "alkali-soluble resin (B-8)".

合成例9 依如同合成例2之方式製得共聚物（B 溶液 固體 ,不同處 濃度=35.4重量％，聚合轉化率：99.8重量％ ) / β 某丁氧I 係多硫醇化合物變成7重量份數1,3，5-參（3 # mSynthesis Example 9 A copolymer was obtained in the same manner as in Synthesis Example 2 (B solution solid, different concentration = 35.4% by weight, polymerization conversion ratio: 99.8% by weight) / β A butoxygen I-based polythiol compound was changed to 7 parts by weight. Number 1,3,5-parameter (3 # m

Sh〇waSh〇wa

乙基）-1,3,5 -三嗪-2,4,6 (1H，3H, 5H) _ /说「鹼可溶性 此共聚物（B1)係稱爲 WEthyl)-1,3,5-triazine-2,4,6 (1H,3H, 5H) _ / said "alkali solubility" This copolymer (B1) is called W

Denko K.K.之產品） -57- 200905392 樹脂（B-9)」。 對照組成物之合成 合成例1 〇 依如同合成例1之方式製得共聚物溶液（固體濃度 = 34.9重量％，聚合轉化率：98.4重量％ )，不同處係可 聚合不飽和化合物係變成15重量份數甲基丙烯酸、15重 量份數苯乙烯及70重量份數甲基丙烯酸苄酯。此共聚物 係稱爲「鹼可溶性樹脂（B-10)」。 合成例1 1 依如同合成例1之方式製得共聚物溶液（固體濃度 =3 4.0重量％ ’聚合轉化率：9 5 · 8重量％ )，不同處係使 用7重量份數第三-十二碳烷基硫醇取代異戊四醇四（3-锍基丙酸）。此共聚物係稱爲「鹼可溶性樹脂（B-11)」 合成例1 2Product of Denko K.K.) -57- 200905392 Resin (B-9)". Synthesis of Comparative Composition Synthesis Example 1 A copolymer solution (solid concentration = 34.9% by weight, polymerization conversion ratio: 98.4% by weight) was obtained in the same manner as in Synthesis Example 1, except that the polymerizable unsaturated compound was changed to 15 weights. The parts are methacrylic acid, 15 parts by weight of styrene, and 70 parts by weight of benzyl methacrylate. This copolymer is referred to as "alkali-soluble resin (B-10)". Synthesis Example 1 1 A copolymer solution (solid concentration = 3 4.0 wt% 'polymerization conversion ratio: 9 5 · 8 wt%) was obtained in the same manner as in Synthesis Example 1, and 7 parts by weight of the third to twelve were used in different places. The alkylalkyl thiol is substituted with isopentanol tetrakis(3-mercaptopropionic acid). This copolymer is referred to as "alkali-soluble resin (B-11)" Synthesis Example 1 2

依如同合成例1之方式製得共聚物溶液（固體濃度 =3丨.〇重量。/。，聚合轉化率：87·4重量％)，不同處係使 用7重量份數2,4_ —苯基-4-甲基·丨_戊烯（n〇F C〇RP〇RATI〇N之產品）取代異戊四醇四（3_巯基丙酸醋 )。此共聚物係稱爲「鹼可溶性樹脂（B _丨2 ) -58- 200905392 聚合率之比較 合成例13 依如同合成例1之方式製得共聚物（B·1)溶液’不 同處係可聚合不飽和化合物係變成1 5重量份數N-苯基順 丁烯二醯亞胺、8重量份數苯乙烯、15重量份數甲基丙烯 酸、15重量份數甲基丙烯酸2-羥基乙酯、28重量份數甲 基丙烯酸2 -乙基己酯及19重量份數甲基丙烯酸苄酯。此 情況下，反應溶液溫度升至8 0°C後’每小時取得反應溶 液試樣，測量各試樣之固體濃度，追蹤聚合轉化率。結果 列於表1。在反應溶液溫度升至80°C後聚合2小時所得之 共聚物稱爲「鹼可溶性樹脂（B-13)」，在反應溶液溫度 升至8(TC後聚合5小時所得之共聚物稱爲「鹼可溶性樹 脂（B-14)」。鹼可溶性樹脂（B-14)具有7,〇00之Mw 及 4,400 之 Μη。 合成例1 4 依如同合成例13之方式追蹤聚合轉化率且製得^$ 物溶液，不同處係使用2,4_二苯基_4_甲基-1-戊嫌取代異 戊四醇四（3-锍基丙酸酯）。在反應溶液溫度升至8〇。A copolymer solution (solid concentration = 3 丨. 〇 weight / /, polymerization conversion ratio: 87. 4 % by weight) was obtained in the same manner as in Synthesis Example 1, and 7 parts by weight of 2,4 phenyl group was used in different places. -4-Methyl·丨-pentene (product of n〇FC〇RP〇RATI〇N) replaces isopentaerythritol tetrakis(3_mercaptopropionic acid vinegar). This copolymer is referred to as "alkali-soluble resin (B _ 丨 2 ) - 58 - 200905392. Comparison of polymerization ratio Synthesis Example 13 A copolymer (B·1) solution was prepared in the same manner as in Synthesis Example 1 The unsaturated compound is changed to 15 parts by weight of N-phenyl maleimide, 8 parts by weight of styrene, 15 parts by weight of methacrylic acid, 15 parts by weight of 2-hydroxyethyl methacrylate, 28 parts by weight of 2-ethylhexyl methacrylate and 19 parts by weight of benzyl methacrylate. In this case, after the temperature of the reaction solution is raised to 80 ° C, the sample of the reaction solution is taken every hour, and each test is measured. The solid concentration was followed, and the polymerization conversion rate was traced. The results are shown in Table 1. The copolymer obtained by polymerizing for 2 hours after the temperature of the reaction solution was raised to 80 ° C was called "alkali-soluble resin (B-13)" at the temperature of the reaction solution. The copolymer obtained by raising to 8 (polymerization for 5 hours after TC is referred to as "alkali-soluble resin (B-14)". The alkali-soluble resin (B-14) has a Mw of 7, 〇00 and Μη of 4,400. Synthesis Example 1 4 The polymerization conversion ratio was traced in the same manner as in Synthesis Example 13 and a solution was prepared. 2,4_-diphenyl-methyl-1-pentyl too _4_ substituted pentaerythritol tetrakis (3-sulfonium propionate). The reaction solution temperature was raised to 8〇.

C 後聚合2小時所得之共聚物稱爲「鹼可溶性樹脂（Β i 5 ) 」’在反應溶液溫度升至8 0 °C後聚合5小時所得之赴 物稱爲「驗可溶性樹脂（B-16)」。鹼可溶性樹脂（b 1 )具有 9,000 之 Mw 及 4,3 00 之 Μη。 -59- 200905392 一嗽 位：重量％) 聚合轉化率 67.1 79.4 86.8 87.4 87.4 合成例14 (單彳 固體濃度 23.8 28.2 30.8 31.0 31.0 合成例13 (單位：重量％) 聚合轉化率 94.4 99.8 99.5 99.8 99.8 固體濃度 33.5 35.4 35.3 35.4 35.4 升溫至80°C後經過之時間 1小時後 2小時後 3小時後 4小時後 5小時後 -60- 200905392 顏料分散液之製備 製備例1 使用珠磨機處理20重量份數作爲著色劑（A)之包 含C丄顏料紅254及C.L顏料紅177重量比8〇/2〇的混合 物、6重量份數（以固體計）作爲分散劑之pB_82i及75 重量份數作爲溶劑之丙二醇單甲基醚乙酸酯，製備顏料分 散液（R )。 製備例2 使用珠磨機處理20重量份數作爲著色劑（a)之包 曰C.I.顏料綠36、C.I.顏料黃150及C.I·顏料黃138重量 比5 0/3 0/2 0的混合物、5重量份數（以固體計）作爲分散 劑之BYK-2001及75重量份數作爲溶劑之丙二醇單甲基 醚乙酸酯，製備顏料分散液（G)。 製備例3 使用珠磨機處理20重量份數作爲著色劑（a)之碳 黑、3重量份數（以固體計）作爲分散劑之BYK-2001及 75重量份數作爲溶劑之丙二醇單甲基醚乙酸酯，製備顏 料分散液（BK)。 實施例1 藉由混合100重量份數作爲著色劑（A)之顏料分散 液（R ) 、1 5重量份數（以固體計）作爲鹼可溶性樹脂（ -61 - 200905392 B )之鹼可溶性樹脂（B-1 ) 、1 5重量份數作爲多官能性 單體（C)之二異戊四醇六丙烯酸酯、5重量份數作爲光 聚合起始劑（D )之2-甲基-l-[4-(甲基硫基）苯基]-2-嗎 啉丙烷-1-酮及作爲溶劑之丙二醇單甲基醚乙酸酯，使得 固體濃度變成20重量％，而製備液體組成物（R1 )。 使用液體組成物（R1 )形成圖案，依以下方法進行評 估。評估結果列於表6。 圖案之形成 液體組成物（R 1 )使用旋塗器施加於6片玻璃基板表 面，隨後於9(TC預烘烤4分鐘，以形成膜厚1.3微米之塗 膜。之後，將基板冷卻至室溫，各基板上之塗膜經由光罩 以 100 ' 200、300、400、500' 750 或 1,000 焦耳 / 米2之曝 光量曝照高壓汞燈。之後於1公斤力/厘米2之顯影壓力（ 噴嘴分散劑：1毫米）以23 °c之0.04重量％氫氧化鉀水溶 液噴淋各基板上之塗膜，以進行噴淋顯影，之後於220°C 後烘烤30分鐘，以形成200微米X200微米之點狀圖案。 敏感性之評估 以掃描式電子顯微鏡觀察由各曝光量於各基板上形成 之點狀圖案，當所形成之圖案良好且以顯影前後之膜厚比 計算之膜留存百分比（顯影後之膜厚xl 00/顯影前之膜厚 )爲90%或更高時評估爲「〇」，所形成之圖案良好但膜 留存百分比低於90%或圖案部分破損時評估爲「△」，而 -62- 200905392 未形成圖案時評爲「χ」。 抗溶劑性之評估 三片曝照曝光量1，000焦耳/米2之基板浸漬於25 1N-甲基吡咯啉酮（表6至9中以「NMP」表示）、5重量。/。 氫氧化鈉水溶液（表6至9以「NaOH」表示）或18重量 %鹽酸（表6至9中以「H C1」表示）歷經3 0分鐘，經由 掃描式電子顯微鏡觀察浸漬前後之點狀圖案，當所形成之 圖案良好且浸漬前後之膜厚比（浸漬後之膜厚X 1 00/浸漬 前之膜厚）爲95 %或更高時評估爲「〇」，當浸漬前後之 膜厚比低於95%或圖案部分破損時評估爲「△」，而浸漬 後整個圖案自基板脫落時評爲「X」。 黏著性評估 液體組成物（R 1 )以旋塗器施加於玻璃基板表面，於 9 0°C預先烘烤4分鐘以形成I.3微米厚之塗膜。基板冷卻 至室溫之後’塗膜以高壓汞燈曝照2,000焦耳/米2曝光量 。之後於1公斤力/厘米2之顯影壓力（噴嘴分散劑：1毫 米）以2 3 °C之0.0 4重量％氫氧化鉀水溶液噴淋塗膜，以 進行噴淋顯影，之後於220 °C後烘烤30分鐘。之後，塗 膜根據JIS K5400標準交叉裁成1〇〇個方格，以評估黏著 性。〇係表示沒有方格剝落，△表示有1至1 〇個方格剝 落’且X係表示有多於10個方格剝落。 -63- 200905392 實施例2至41及對照例1至20 依如同實施例1之方式製備及評估液體組成物，不同 處係組份之種類及用量係如表2至5所示般改變（其中「 份數」係表示「重量份數」）。評估結果示於表6至9。 表2至5中，多官能性單體及光聚合起始劑係使用以 下符號示。 多官能性單體 C-1 :二異戊四醇六丙烯酸酯 C-2:三羥甲基丙烷三丙烯酸酯 光聚合起始劑 D-1 : 2-甲基- l-[4-(甲基硫基）苯基卜2-嗎啉丙烷-1- 酮 D-2: 2-苄基-2-二甲基胺基-1-(4-嗎啉苯基）丁烷- 1 -酮 D-3: 1-[9·乙基-6-(2-甲基苄醯基）-9H-咔唑-3-基]-乙酮1- ( 0-乙醯肟） 〇-4:4,4'-雙（二乙基胺基）二苯基甲酮 D-5 : 2,4-二乙基硫雜蒽酮 D-6: 2,2·-雙（2-氯苯基）-4,4'，5,5f-四（4-乙氧基羰 基苯基）-1,2’-聯咪唑 D-7 : 2-锍基苯并噻唑 -64 - 200905392 £ 光聚合起始劑（份）I D-1 (4) D-5 ( 1 ) D-1 (4) D-5 ( 1 ) D-1 (4) D-5 (1) D-1 (4) D-5 ( 1 ) D-1 (4) D-5 ( 1 ) 寸— ' 7 in Q Q D-1 (4) D-5 ( 1 ) 寸— f—i m Q Q D-1 (4) D-5 ( 1 ) 寸— T—< Q Q D-3 (3) D-4 ( 1 ) D-1 (4) D-4 ( 1 ) D-6 (0.4) D-7 (0.2) 多官能性單體（份） C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3 ) C-1 (12) C-2 (3) C-1 (12) C-2 (3) 鹼可溶性樹脂（份） B-1 (15) B-2 ( 15) B-3 ( 15) B-2 (7.5) B-3 (7.5) B-4 ( 15) B-5 ( 15) B-6 ( 15) B-7 ( 15) B-8 ( 15) B-9 (15) B-2 ( 15) B-2 ( 15) 顏料分散液（份） R ( 100) R ( 100) R ( 100) R ( 100) R ( 100) R (100) R (100) R ( 100) R ( 100) R (100) R (100) R ( 100) 液體組成物 5 m 寸 Pi C4 卜 00 Pi Os Pi RIO Rll R12 Ex.l Ex.2 _1 Ex.3 Ex.4 Ex.5 Ex.6 Ex.7 Ex.8 Ex.9 Ex. 10 Ex. 11 Ex. 12 霸κ: ·Χ3 -65- 200905392 ε« 光聚合起始劑（份） D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-3 (3) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-6 (0.4) D-7 (0.2) 多官能性單體（份） C-1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) 鹼可溶性樹脂（份） Β-1 (10) B-2 ( 10) B-3 (10) B-2 (5) B-3 (5) B-4 ( 10) B-5 ( 10) B-6 ( 10) B-7 ( 10) B-8 ( 10) B-9 ( 10) B-2 ( 10) B-2 ( 10) 顏料分散液（份） G ( 100) G ( 100) G ( 100) G ( 100) G ( 100) G ( 100) G (100) G (100) G ( 100) G (100) G ( 100) G (100) 液體組成物 〇 (N o C^i o 寸 o o o o 00 〇 Os o G10 Gil G12 Ex. 13 Ex. 14 Ex. 15 Ex. 16 Ex. 17 Ex. 18 Ex. 19 Ex.20 Ex.21 Ex.22 Ex.23 Ex.24 画«: ·Χ3 -66 - 200905392 寸嗽 光聚合起始劑（份） D-3 (4) D-5 ( 1 ) D-3 (4) D-5 (1 ) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 (1 ) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 (1 ) D-3 (4) D-4 (1) D-6 (0.4) D-7 (0.2) 多官能性單體（份） C-1 (8) C-1 (8) C-1 (8) C-1 (8) C-1 (8) C-1 (8) C-1 (8) C-1 (8) C-1 (8) C-1 (8) C-1 (8) 鹼可溶性樹脂（份） Β-1 (9) Β-2 (9) B-3 (9) B-2 (4.5) B-3 (4.5) B-4 (9) B-5 (9) B-6 (9) B-7 (9) B-8 (9) B-9 (9) B-2 (9) 顏料分散液（份） ΒΚ ( 100) ΒΚ(100) BK ( 100) BK (100) BK (100) BK (100) BK ( 100) BK ( 100) BK ( 100) BK (100) BK (100) 液體組成物 ΒΚ1 BK2 BK3 BK4 BK5 BK6 ! BK7 BK8 BK9 BK10 BK11 Εχ.25 Ex.26 Ex.27 Ex.28 Ex.29 Ex.30 Ex.31 Ex.32 Ex.33 Ex.34 Ex.35 冢滔Μ: ·χω -67- 200905392 §寸嗽 光聚合起始劑（份） D-1 (4) D-5 ( 1 ) D-1 (4) D-5 (1) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1 ) 多官能性單體（份） C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (10) C-1 (10) C-1 (8) C-1 (8) 鹼可溶性樹脂（份） B-13 ( 15) B-14 (15) B-13 (10) B-14 ( 10) B-13 (9) B-14 (9) 顏料分散液（份） R (100) R ( 100) G (100) G (100) BK ( 100) BK ( 100) 液體組成物 R18 R19 G18 G19 BK16 BK17 Ex.36 Ex.37 Ex.38 Ex.39 Ex.40 Ex.41 .. -68- 200905392 光聚合起始劑（份） D-1 (4) D-5 ( 1 ) D-l (4) D-5 ( 1 ) D-l (4) D-5 ( 1 ) D-3 (3) D-4 ( 1 ) D-l (4) D-4 ( 1 ) D-6 (0.4) D-7 (0.2) D-2 (4) D-4 (1 ) /"N N 寸— CN寸 Q Q D-2 (4) D-4 ( 1 ) D-3 (3) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-6 (0.4) D-7 (0.2) 多官能性單體（份） C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 ( 3 ) C-1 (12) C-2 (3) C-1 (12) C-2 (3) 1 J C-1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) 鹼可溶性樹脂（份） B-10 ( 15) B-ll (15) B-12 (15) B-10 (15) B-10 ( 15) B-10 (10) B-ll (10) B-12 ( 10) B-10 ( 10) B-10 ( 10) 顏料分散液（份） R ( 100) R (100) R ( 100) R (100) R (100) G (100) G ( 100) G (100) G ( 100) G (100) 液體組成物 m Pi 寸 oi Pi Pi 卜 ro o 寸 o o Ό o 卜 a >< ω ϋ C. Ex.2 C. Ex.3 C. Ex.4 C. Ex.5 C. Ex.6 C. Ex.7 C. Ex.8 C. Ex.9 C. Ex.10 .. .χωϋ -69- 200905392 § £ 光聚合起始劑（份） D-3 (4) D-5 ( 1 ) 寸— m wo Q Q D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1 ) D-6 (0.4) D-7 (0.2) N 寸 — —ΙΟ Q Q D-l (4) D-5 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 (1) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1) 多官能性單體（份） C-1 (8) C-1 (8) C-1 (8) C-1 (8) C-1 (12) C-2 ( 3 ) C-1 (12) C-2 (3) C-1 (10) C-1 (10) I C-1 (8) C-1 (8) 鹼可溶性樹脂（份）」 B-10 (9) B-ll (9) B-12 (9) B-10 (9) B-15 ( 15) B-16 (15) B-15 ( 10) B-16 (10) B-15 (9) B-16 (9) 顏料分散液（份） BK ( 100) BK ( 100) BK ( 100) BK (100) R (100) R (100) G ( 100) G (100) BK (100) BK (100) 液體組成物 BK12 BK13 BK14 BK15 〇 CN Ρί 1 cs 〇 BK18 BK19 C. Ex.ll i 1 . 1 C.Ex.12 C. Ex. 13 C. Ex.14 C. Ex. 15 C. Ex.16 C. Ex. 17 C. Ex. 18 C. Ex. 19 C. Ex.20 -70- 200905392 9撇 抗溶劑性 HC1 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 NaOH 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 NMP 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 黏著性 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 敏感性（焦耳/米2) I 1000 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 750 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 500 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 400 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 1 300 <3 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 200 <3 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 <1 < <] <] < < 0 < <] < 〇 液體組成物 s cn 寸 oi 00 Di as Pi RIO Rll R12 Ex.l Ex.2 Ex.3 Ex.4 Ex.5 Ex.6 Ex.7 Ex.8 Ex.9 Ex. 10 Ex.ll Ex. 12 Φ^Μ: ·χω -71 - 200905392 抗溶劑性 HC1 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 NaOH 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 -1 NMP <3 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 黏著性 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 敏感性（焦耳/米2) 1000 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 750 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 500 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 400 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 -1 300 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 200 < 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 <] <] < <] < < <1 〇 〇 液體組成物 〇 (N ϋ ΓΟ Ο 寸 Ο Ο 〇 卜 o 00 a ON 〇 G10 Gil G12 Ex. 13 Ex. 14 Ex. 15 Ex. 16 Ex. 17 Ex. 18 Ex. 19 Ex.20 Ex.21 Ex.22 Ex.23 Ex.24 莩捶*: ·Χ3 -72- 200905392 8漱 抗溶劑性 HC1 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 1 NaOH | <] 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 <] < NMP <] 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 <1 < < < <] <1 黏著性 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 敏感性（焦耳/米2) 1000 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 750 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 500 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 400 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 < < 300 < <] <3 < <] <1 <] <] <] 〇 < < 〇 〇 <] < 200 < <] <3 < < < <1 < 〇 < < < < < < 〇 < <] <1 < < <1 < <] <3 < < < < <1 <3 <] < 液體組成物 BK1 BK2 BK3 BK4 BK5 BK6 BK7 BK8 BK9 BK10 BK11 R18 1- R19 G18 G19 I- BK16 BK17 Ex.25 Ex.26 Ex.27 Ex.28 Ex.29 Ex.30 Ex.31 Ex.32 Ex.33 Ex.34 Ex.35 Ex.36 Ex.37 Ex.38 Ex.39 Ex.40 Ex.41 麗fc: .X3 -73 - 200905392 抗溶劑性 HC1 <] X X X X 0 X X X X X X X X X X X X X X NaOH j <] X X X X X X X X X X X X X X X X X X X NMP X X X X X X X X X X X X X X X X X X X X 黏著性 .......1 X X X <1 < X X X X < X X X X X X X X X X 敏感性（焦耳/米2) 1000 1 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 X 〇 X 〇 X 〇 750 i 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 <] <] <1 X 〇 X 〇 X < 500 〇 < < 〇 〇 〇 <] < <1 〇 X X X X X <] X < X X 400 [ < X X <3 < X X X X < X X X X X X X X X X 300 ί X X X X X X X X X X X X X X X X X X X X 200 X X X X X X X X X X X X X X X X X X X X 100 X X X X X X X X X X X X X X X X X X X X 液體組成物 _____________________________J |_ R13 」 R14 R15 R16 1 R17 1 G13 1 G14 1 G15 G16 G17 1 ΒΚ12 ΒΚ13 ΒΚ14 ΒΚ15 R20 R21 G20 G21 BK18 BK19 υ C. Εχ.2 1 C. Εχ.3 C. Εχ.4 1 C. Εχ.5 C. Εχ.6 C. Εχ.7 I C. Εχ.8 C. Εχ.9 C. Εχ.10 C. Ex.ll C. Εχ.12 C. Εχ.13 丨 C.Ex.14 I C. Ex. 15 C. Ex.16 C. Ex.17 I C. Ex.18 1 C. Ex.19 C. Ex.20 匡陛！ϋ3ϋ -74- 200905392 如前文所述’本發明用以形成彩色層之輻射敏感性組 成物即使在低曝光量下’亦不會降低膜留存百分比及產生 圖案破損及側蝕’可形成抗溶劑性、對基板黏著性及其他 性質優異之像素及黑色矩陣，且即使含有高濃度顏料時， 在液體組成物形式下仍顯示優異之儲存安定性，且構成鹼 可溶性樹脂（B )之主要組份（即黏合劑組份）的共聚物 (B 1 )具有良好之儲存安定性。 因此，本發明用以形成彩色層之輻射敏感性組成物極 適用於製造各種彩色濾光片’包括用於電子工業中彩色液 晶顯示元件的彩色濾光片。 -75-The copolymer obtained by polymerizing for 2 hours after C is called "alkali-soluble resin (Β i 5 )". The polymer obtained after polymerization for 5 hours after the temperature of the reaction solution is raised to 80 ° C is called "soluble resin (B-16). )". The alkali-soluble resin (b 1 ) has an Mw of 9,000 and a 4η of 4,300. -59- 200905392 嗽 position: wt%) Polymerization conversion rate 67.1 79.4 86.8 87.4 87.4 Synthesis Example 14 (single enthalpy solid concentration 23.8 28.2 30.8 31.0 31.0 Synthesis Example 13 (unit: wt%) Polymerization conversion rate 94.4 99.8 99.5 99.8 99.8 Solid Concentration 33.5 35.4 35.3 35.4 35.4 After heating to 80 ° C, the elapsed time 1 hour, 2 hours, 3 hours, 4 hours, 5 hours later -60 - 200905392 Preparation of pigment dispersion Preparation Example 1 20 parts by weight using a bead mill The number of the coloring agent (A) containing C丄 Pigment Red 254 and CL Pigment Red 177 by weight of 8〇/2〇, 6 parts by weight (based on solids) as a dispersing agent, pB_82i and 75 parts by weight as a solvent Preparation of Pigment Dispersion (R) with Propylene Glycol Monomethyl Ether Acetate. Preparation Example 2 Treatment of 20 parts by weight of a beading agent CI pigment green 36, CI Pigment Yellow 150 and CI as a coloring agent (a) using a bead mill - a pigment yellow 138 weight ratio of 5 0 / 3 0 / 2 0 mixture, 5 parts by weight (by solids) as a dispersing agent BYK-2001 and 75 parts by weight as a solvent of propylene glycol monomethyl ether acetate, A pigment dispersion (G) was prepared. Preparation 3 20 parts by weight of a carbon black as a coloring agent (a), 3 parts by weight (as solid) of BYK-2001 as a dispersing agent, and 75 parts by weight of a propylene glycol monomethyl group as a solvent were treated using a bead mill Ether acetate, preparation of pigment dispersion (BK). Example 1 As a base dispersion by mixing 100 parts by weight of the pigment dispersion (R) as a colorant (A), 15 parts by weight (based on solids) Alkali-soluble resin (B-1) of resin (-61 - 200905392 B), 15 parts by weight as difunctional pentaerythritol hexaacrylate of polyfunctional monomer (C), 5 parts by weight as photopolymerization Starting agent (D) 2-methyl-l-[4-(methylthio)phenyl]-2-morpholinanpropan-1-one and propylene glycol monomethyl ether acetate as a solvent to make a solid The liquid composition (R1) was prepared by changing the concentration to 20% by weight. The liquid composition (R1) was used to form a pattern, which was evaluated by the following method. The evaluation results are shown in Table 6. The formation of the pattern liquid composition (R 1 ) was used. The applicator was applied to the surface of 6 glass substrates, and then pre-baked at 9 (TC for 4 minutes to form a film having a film thickness of 1.3 μm. Thereafter, the substrate was cooled to room temperature, and the coating film on each of the substrates was exposed to a high-pressure mercury lamp at a exposure of 100 '200, 300, 400, 500' 750 or 1,000 J/m2 via a reticle. Thereafter, a coating film on each substrate was sprayed at a developing pressure of 1 kgf/cm 2 (nozzle dispersant: 1 mm) with a 0.04 wt% aqueous solution of potassium hydroxide at 23 ° C for spray development, followed by 220°. C was post-baked for 30 minutes to form a dot pattern of 200 microns x 200 microns. Evaluation of Sensitivity A scanning dot microscope was used to observe the dot pattern formed on each substrate by each exposure amount, and the film formation ratio was calculated when the formed pattern was good and the film thickness ratio before and after development (film thickness after development xl) When 00/film thickness before development is 90% or higher, it is evaluated as "〇", and the formed pattern is good, but the film retention percentage is less than 90% or the pattern is partially damaged, and it is evaluated as "△", and -62-200905392 "评为" when no pattern is formed. Evaluation of Solvent Resistance Three sheets of the substrate having an exposure exposure of 1,000 J/m 2 were immersed in 25 1N-methylpyrrolidinone (indicated by "NMP" in Tables 6 to 9), and 5 parts by weight. /. An aqueous sodium hydroxide solution (indicated by "NaOH" in Tables 6 to 9) or 18% by weight of hydrochloric acid (indicated by "H C1" in Tables 6 to 9) was observed for 30 minutes through a scanning electron microscope to observe dot patterns before and after impregnation. When the formed pattern is good and the film thickness ratio before and after the immersion (film thickness after immersion X 1 00 / film thickness before immersion) is 95% or more, it is evaluated as "〇", and the film thickness ratio before and after immersion When it is less than 95% or the pattern portion is broken, it is evaluated as "△", and when the entire pattern is detached from the substrate after the immersion, it is evaluated as "X". Adhesion evaluation The liquid composition (R 1 ) was applied to the surface of the glass substrate by a spin coater and prebaked at 90 ° C for 4 minutes to form a coating film of 1.3 μm thick. After the substrate was cooled to room temperature, the coating film was exposed to a 2,000 Joule/m 2 exposure with a high pressure mercury lamp. Thereafter, the coating film was sprayed at a developing pressure of 1 kgf/cm 2 (nozzle dispersant: 1 mm) at a concentration of 0.04 wt% aqueous potassium hydroxide solution at 23 ° C for spray development, after which it was after 220 ° C. Bake for 30 minutes. Thereafter, the coating film was cross-cut into 1 square according to the JIS K5400 standard to evaluate the adhesion. The lanthanum indicates no square peeling, △ indicates that there are 1 to 1 square peeling' and X indicates that there are more than 10 squares peeling off. -63- 200905392 Examples 2 to 41 and Comparative Examples 1 to 20 Liquid compositions were prepared and evaluated in the same manner as in Example 1, and the types and amounts of the components of the different parts were changed as shown in Tables 2 to 5 (wherein "Number of copies" means "parts by weight"). The results of the evaluation are shown in Tables 6 to 9. In Tables 2 to 5, the polyfunctional monomer and the photopolymerization initiator are shown by the following symbols. Polyfunctional monomer C-1: diisopentyltetraol hexaacrylate C-2: trimethylolpropane triacrylate photopolymerization initiator D-1 : 2-methyl- l-[4-(A Thiophenyl)phenyl-2-morpholinopropan-1-one D-2: 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butane-1-ketone D -3: 1-[9.ethyl-6-(2-methylbenzyl)-9H-indazol-3-yl]-ethanone 1-(0-acetamidine)-4:4, 4'-bis(diethylamino)diphenyl ketone D-5 : 2,4-diethylthiaxanone D-6: 2,2·-bis(2-chlorophenyl)-4 ,4',5,5f-tetrakis(4-ethoxycarbonylphenyl)-1,2'-biimidazole D-7 : 2-mercaptobenzothiazole-64 - 200905392 £ Photopolymerization initiator (parts) ) I D-1 (4) D-5 ( 1 ) D-1 (4) D-5 ( 1 ) D-1 (4) D-5 (1) D-1 (4) D-5 ( 1 ) D-1 (4) D-5 ( 1 ) inch - ' 7 in QQ D-1 (4) D-5 ( 1 ) inch — f—im QQ D-1 (4) D-5 ( 1 ) inch — T—< QQ D-3 (3) D-4 ( 1 ) D-1 (4) D-4 ( 1 ) D-6 (0.4) D-7 (0.2) Polyfunctional monomer (parts) C -1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12 ) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (12) C-2 (3) Alkali-soluble resin (parts) B-1 (15 B-2 ( 15) B-3 ( 15) B-2 (7.5) B-3 (7.5) B-4 ( 15) B-5 ( 15) B-6 ( 15) B-7 ( 15) B -8 ( 15) B-9 (15) B-2 ( 15) B-2 ( 15) Pigment Dispersion (Parts) R ( 100) R ( 100) R ( 100) R ( 100) R ( 100) R (100) R (100) R ( 100) R ( 100) R (100) R (100) R ( 100) Liquid composition 5 m inch Pi C4 00 Pi Os Pi RIO Rll R12 Ex.l Ex.2 _1 Ex.3 Ex.4 Ex.5 Ex.6 Ex.7 Ex.8 Ex.9 Ex. 10 Ex. 11 Ex. 12 κ: ·Χ3 -65- 200905392 ε« Photopolymerization initiator (parts) D -2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 (4 D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-3 (3) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-6 (0.4) D -7 (0.2) Polyfunctional monomer (parts) C-1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) C -1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) C-1 (10) Alkali-soluble resin (parts) Β-1 (10) B-2 (10) B-3 (10) B-2 (5) B-3 (5) B-4 (10) B-5 ( 1 0) B-6 ( 10) B-7 ( 10) B-8 ( 10) B-9 ( 10) B-2 ( 10) B-2 ( 10) Pigment dispersion (parts) G ( 100) G ( 100) G ( 100) G ( 100) G ( 100) G ( 100) G (100) G (100) G ( 100) G (100) G ( 100) G (100) Liquid composition 〇 (N o C ^io inch oooo 00 〇Os o G10 Gil G12 Ex. 13 Ex. 14 Ex. 15 Ex. 16 Ex. 17 Ex. 18 Ex. 19 Ex.20 Ex.21 Ex.22 Ex.23 Ex.24 Painting «: ·Χ3 -66 - 200905392 Inch photopolymerization initiator (parts) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 (1 ) D-3 (4) D-5 ( 1) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 (1 ) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 (1 ) D-3 (4) D-4 (1) D- 6 (0.4) D-7 (0.2) Polyfunctional monomer (parts) C-1 (8) C-1 (8) C-1 (8) C-1 (8) C-1 (8) C- 1 (8) C-1 (8) C-1 (8) C-1 (8) C-1 (8) C-1 (8) Alkali-soluble resin (parts) Β-1 (9) Β-2 ( 9) B-3 (9) B-2 (4.5) B-3 (4.5) B-4 (9) B-5 (9) B-6 (9) B-7 (9) B-8 (9) B-9 (9) B-2 (9) Pigment dispersion (parts) ΒΚ ( 100) ΒΚ (100) BK ( 100) BK (100) BK (100) BK (100) BK ( 100) BK ( 100) BK ( 100) BK (100) BK (100) Liquid composition ΒΚ1 BK2 BK3 BK4 BK5 BK6 ! BK7 BK8 BK9 BK10 BK11 Εχ.25 Ex.26 Ex.27 Ex.28 Ex.29 Ex.30 Ex.31 Ex.32 Ex.33 Ex.34 Ex.35 冢滔Μ: ·χω -67- 200905392 §Indigo photopolymerization initiator (parts) D-1 (4) D-5 ( 1 ) D-1 (4) D-5 (1) D-2 (4) D -4 ( 1 ) D-2 (4) D-4 ( 1 ) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1 ) Polyfunctional monomer (parts) C -1 (12) C-2 (3) C-1 (12) C-2 (3) C-1 (10) C-1 (10) C-1 (8) C-1 (8) Alkali-soluble resin (Part) B-13 ( 15) B-14 (15) B-13 (10) B-14 ( 10) B-13 (9) B-14 (9) Pigment dispersion (parts) R (100) R ( 100) G (100) G (100) BK ( 100) BK ( 100) Liquid composition R18 R19 G18 G19 BK16 BK17 Ex.36 Ex.37 Ex.38 Ex.39 Ex.40 Ex.41 .. -68 - 200905392 Photopolymerization initiator (parts) D-1 (4) D-5 ( 1 ) Dl (4) D-5 ( 1 ) Dl (4) D-5 ( 1 ) D-3 (3) D- 4 ( 1 ) Dl (4) D-4 ( 1 ) D-6 (0.4) D-7 (0.2) D-2 (4) D-4 (1 ) /"NN inch - CN inch QQ D-2 (4) D-4 ( 1 ) D-3 (3) D-4 ( 1 ) D-2 (4) D-4 ( 1 ) D-6 (0.4) D-7 (0.2) Polyfunctional monomer (Part) C-1 (12) C-2 (3) C-1 (12) C-2 (3) C- 1 (12) C-2 ( 3 ) C-1 (12) C-2 (3) C-1 (12) C-2 (3) 1 J C-1 (10) C-1 (10) C- 1 (10) C-1 (10) C-1 (10) Alkali Soluble Resin (Parts) B-10 ( 15) B-ll (15) B-12 (15) B-10 (15) B-10 ( 15) B-10 (10) B-ll (10) B-12 ( 10) B-10 ( 10) B-10 ( 10) Pigment dispersion (parts) R ( 100) R (100) R ( 100) R (100) R (100) G (100) G ( 100) G (100) G ( 100) G (100) Liquid composition m Pi inch oi Pi Pi 卜ro o inch oo Ό o 卜 a >< ω ϋ C. Ex.2 C. Ex.3 C. Ex.4 C. Ex.5 C. Ex.6 C. Ex.7 C. Ex.8 C. Ex.9 C. Ex.10 .. . Χωϋ -69- 200905392 § £ Photopolymerization initiator (parts) D-3 (4) D-5 ( 1 ) inch — m wo QQ D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1 ) D-6 (0.4) D-7 (0.2) N inch — —ΙΟ QQ Dl (4) D-5 ( 1 ) D-2 (4) D-4 ( 1 ) D-2 ( 4) D-4 (1) D-3 (4) D-5 ( 1 ) D-3 (4) D-5 ( 1) Polyfunctional monomer (parts) C-1 (8) C-1 ( 8) C-1 (8) C-1 (8) C-1 (12) C-2 ( 3 ) C-1 (12) C-2 (3) C-1 (10) C-1 (10) I C-1 (8) C-1 (8) Alkali Soluble Resin (Parts) B-10 (9) B-ll (9) B-12 (9) B-10 (9) B-15 ( 15) B-16 (15) B-15 ( 10) B-16 (10) B -15 (9) B-16 (9) Pigment Dispersion (Parts) BK ( 100) BK ( 100) BK ( 100) BK (100) R (100) R (100) G ( 100) G (100) BK (100) BK (100) Liquid composition BK12 BK13 BK14 BK15 〇CN Ρί 1 cs 〇BK18 BK19 C. Ex.ll i 1 . 1 C.Ex.12 C. Ex. 13 C. Ex.14 C. Ex. 15 C. Ex.16 C. Ex. 17 C. Ex. 18 C. Ex. 19 C. Ex. 20 -70- 200905392 9 Antisolvent HC1 〇〇〇〇〇〇〇〇〇〇〇〇 NaOH 〇 〇〇〇〇〇〇〇〇〇〇〇NMP 〇〇〇〇〇〇〇〇〇〇〇Adhesive 〇〇〇〇〇〇〇〇〇〇〇〇 sensitivity (Joules/m 2 ) I 1000 〇〇〇 〇〇〇〇〇〇〇〇〇750 〇〇〇〇〇〇〇〇〇〇〇〇500 〇〇〇〇〇〇〇〇〇〇〇〇400 〇〇〇〇〇〇〇〇〇〇〇〇1 300 <3 〇〇〇〇〇〇〇〇〇〇〇200 <3 〇〇〇〇〇〇〇〇〇〇〇〇<1 <<><]<< 0 << ] < 〇 liquid composition s cn inch Oi 00 Di as Pi RIO Rll R12 Ex.l Ex.2 Ex.3 Ex.4 Ex.5 Ex.6 Ex.7 Ex.8 Ex.9 Ex. 10 Ex.ll Ex. 12 Φ^Μ: ·χω -71 - 200905392 Solvent-resistant HC1 〇〇〇〇〇〇〇〇〇〇〇〇NaOH 〇〇〇〇〇〇〇〇〇〇〇〇-1 NMP <3 〇〇〇〇〇〇〇〇〇〇〇 Adhesive sensitivity (Joules/m2) 1000 〇〇〇〇〇〇〇〇〇〇〇〇750 〇〇〇〇〇〇〇〇〇〇〇〇500 〇 〇〇〇〇〇〇〇〇〇〇〇400 〇〇〇〇〇〇〇〇〇〇〇〇-1 300 〇〇〇〇〇〇〇〇〇〇〇〇200 < 〇〇〇〇〇〇〇〇 〇〇〇〇<] <] <<]<<<1 〇〇Liquid Composition 〇(N ϋ ΓΟ Ο Ο Ο 〇 〇 o o 00 a ON 〇G10 Gil G12 Ex. 13 Ex 14 Ex. 15 Ex. 16 Ex. 17 Ex. 18 Ex. 19 Ex.20 Ex.21 Ex.22 Ex.23 Ex.24 莩捶*: ·Χ3 -72- 200905392 8漱Solvent resistant HC1 〇〇 〇〇〇 〇〇〇〇〇〇〇〇〇〇〇〇1 NaOH | <] 〇〇〇〇〇〇〇〇〇〇〇〇〇〇<] < NMP <] 〇〇〇〇〇〇〇〇〇 〇<1 <<<<>1 Adhesive 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇 sensitivity (Joules/m 2 ) 1000 〇〇〇〇〇〇 〇〇〇〇〇〇〇〇〇〇〇750 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇500 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇400 〇〇 〇〇〇〇〇〇〇〇〇〇〇〇<< 300 <<]<3<<>1<]<]<]〇<<〇〇<;]< 200 <<]<3<<<<1<<<<<<<<<<]<1<<<1<<><3<<<<1<3<3<<1> Liquid composition BK1 BK2 BK3 BK4 BK5 BK6 BK7 BK8 BK9 BK10 BK11 R18 1- R19 G18 G19 I- BK16 BK17 Ex.25 Ex.26 Ex.2 7 Ex.28 Ex.29 Ex.30 Ex.31 Ex.32 Ex.33 Ex.34 Ex.35 Ex.36 Ex.37 Ex.38 Ex.39 Ex.40 Ex.41 丽 fc: .X3 -73 - 200905392 Antisolvent HC1 <] XXXX 0 XXXXXXXXXXXXXX NaOH j <] XXXXXXXXXXXXXXXXXXX NMP XXXXXXXXXXXXXXXXXXXX Adhesion.......1 XXX <1 < XXXX < XXXXXXXXXX Sensitivity (Joules/m2) 1000 1 〇〇〇〇〇〇〇〇〇〇〇〇〇〇X 〇X 〇X 〇750 i 〇〇〇〇〇〇〇〇〇〇<] <] <1 X 〇X 〇X < 500 〇 <<〇〇〇<]<<1 〇XXXXX <] X < XX 400 [ < XX <3 < XXXX < XXXXXXXXXX 300 ί XXXXXXXXXXXXXXXXX 200 XXXXXXXXXXXXXXXXXXXX 100 XXXXXXXXXXXXXXXXXXXX Liquid Composition _____________________________ |_ R13 ” R14 R15 R16 1 R17 1 G13 1 G14 1 G15 G16 G17 1 ΒΚ12 ΒΚ13 ΒΚ14 ΒΚ15 R20 R21 G20 G21 BK18 BK19 υ C. Εχ.2 1 C. Εχ.3 C. Χ.4 1 C. Εχ.5 C. Εχ.6 C. Εχ.7 I C. Εχ.8 C. Εχ.9 C. Εχ.10 C. Ex.ll C. Εχ.12 C. Εχ.13丨C.Ex.14 I C. Ex. 15 C. Ex.16 C. Ex.17 I C. Ex.18 1 C. Ex.19 C. Ex.20 匡陛! Ϋ3ϋ -74- 200905392 As described above, the radiation-sensitive composition of the present invention for forming a color layer does not reduce the percentage of film retention and the occurrence of pattern breakage and side etching to form solvent resistance even at low exposure levels. Pixel and black matrix excellent in substrate adhesion and other properties, and even when containing a high concentration of pigment, exhibit excellent storage stability in the form of a liquid composition, and constitute a main component of the alkali-soluble resin (B) ( That is, the copolymer (B 1 ) of the binder component has good storage stability. Accordingly, the radiation-sensitive composition of the present invention for forming a color layer is highly suitable for use in the manufacture of various color filters' including color filters for color liquid crystal display elements in the electronics industry. -75-

Claims (1)

200905392 十、申請專利範圍 1 · 一種輻射敏感性組成物，其包含（A )著色劑，（B )鹼可溶性樹脂，（C )多官能性單體及（D )光聚合起 始劑，且係用以形成彩色層，該鹼可溶性樹脂（B )係包 含具有至少一個選自酸官能基及酸酐基之基團、下式（1 )所示之重現單元：200905392 X. Patent Application No. 1 · A radiation-sensitive composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator, and For forming a color layer, the alkali-soluble resin (B) comprises a reproducing unit represented by the following formula (1) having at least one group selected from the group consisting of an acid functional group and an acid anhydride group: • · (1) (其中R7係表示具有1至12個碳原子之烷基或具有6至 12個碳原子之芳基）， 及下式（2)所示之基團： X--R®-S-* • · (2) (其中X係表示η價有機基團，R8係表示亞甲基或具有2 至6個碳原子之伸烷基，η係表示2至10之整數，且「* 」係表不鍵結手） 之聚合物。 2 ·如申請專利範圍第1項之輻射敏感性組成物，其中 鹼可溶性樹脂（Β )中前式（2 )所示之基團係爲下式（3 )所示之基團： -76- 200905392• (1) (wherein R7 represents an alkyl group having 1 to 12 carbon atoms or an aryl group having 6 to 12 carbon atoms), and a group represented by the following formula (2): X--R® -S-* • · (2) (wherein X represents an η-valent organic group, R8 represents a methylene group or an alkylene group having 2 to 6 carbon atoms, and η represents an integer of 2 to 10, and * "The polymer is not bonded to the hand". 2. The radiation-sensitive composition according to claim 1, wherein the group represented by the former formula (2) in the alkali-soluble resin (Β) is a group represented by the following formula (3): -76- 200905392 (其中Y係表示η價有機基團，R8及η係如同式（2)所 定義，且「*」係示鍵結手）。 3 .如申請專利範圍第1項之輻射敏感性組成物，其中 鹼可溶性樹脂（Β)包含由可聚合的混合物聚合所得共聚 物’該可聚合的混合物包含（bl)選自由不飽和羧酸、不 飽和羧酸酐及不飽和酚化合物所構成之群至少一種化合物 及（b2)下式（4)所示之化合物：(wherein Y represents an η-valent organic group, R8 and η are as defined in formula (2), and "*" is a bond). 3. The radiation-sensitive composition of claim 1, wherein the alkali-soluble resin (Β) comprises a copolymer obtained by polymerizing a polymerizable mixture, the polymerizable mixture comprising (bl) selected from the group consisting of unsaturated carboxylic acids, At least one compound composed of an unsaturated carboxylic anhydride and an unsaturated phenol compound and (b2) a compound represented by the following formula (4): (其中R7係如同式（1 )所定義） 且其聚合爲於下式（5)所示之化合物存在下進行：(wherein R7 is as defined in formula (1)) and its polymerization is carried out in the presence of a compound represented by the following formula (5): (其中X、R8及n係如同式（2 )所定義）。 4.如申請專利範圍第3項之輻射敏感性組成物，其中 該可聚合混合物係進一步包含（b3)具有氧雜環丁烷結構 之不飽和化合物及/或具有四氫呋喃結構的不飽和化合物 5. —種彩色濾光片，其包含使用如申請專利範圍第i -77- 200905392 至4項中任一項之輻射敏感性組成物所形成之彩色層。 6 · —種彩色液晶顯示元件，其包含如申請專利範圍胃 5項之彩色濾光片。 7. —種製造鹼可溶性樹脂之方法，其包含聚合可聚$ 的混合物，該可聚合的混合物包含（bl)選自由不飽和羧 酸、不飽和羧酸酐及不飽和酚化合物所構成之群至少一種 化合物及（b2)前式（4)所示之化合物，且其聚合爲於 前式（5 )所示之化合物存在下進行。 -78 - 200905392 無 ·· 明 說 單 無簡 ..號 為符 圊件 表元 代之 定圖 :指表 圊案代 表本本 代 /-V \ 定一二 指CC 八、本案若有化學式時，請揭示最能顯示發明特徵的化學 式：無(where X, R8 and n are as defined by equation (2)). 4. The radiation-sensitive composition of claim 3, wherein the polymerizable mixture further comprises (b3) an unsaturated compound having an oxetane structure and/or an unsaturated compound having a tetrahydrofuran structure. A color filter comprising a color layer formed using the radiation-sensitive composition of any one of the claims i-77-200905392 to 4. 6 - A color liquid crystal display element comprising a color filter of the stomach of the patent application. 7. A method of producing an alkali-soluble resin comprising a polymerizable polymerizable mixture comprising (bl) a group selected from the group consisting of unsaturated carboxylic acids, unsaturated carboxylic anhydrides, and unsaturated phenolic compounds. A compound and (b2) a compound represented by the above formula (4), wherein the polymerization is carried out in the presence of a compound represented by the above formula (5). -78 - 200905392 无·· Ming said that there is no simple.. No. is the symbol of the table. The figure refers to the table: the representative of the case represents the present generation /-V \ fixed one or two refers to CC VIII, if there is a chemical formula in this case, please Reveal the chemical formula that best shows the characteristics of the invention: none
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