TW200837498A - Alkali developable photosensitive paste composition - Google Patents

Abstract

To provide an alkali developable photosensitive paste composition comprising a cellulosic binder, having good printing property and pattern property, and further having good thermal decomposability. The alkali developable photosensitive paste composition comprises (A) inorganic powder, (B) a (meth)acryl modified cellulosic derivative having an acid value of 25-80 mgKOH/g obtained by adding (meth)acryloyloxyethyl isocyanate and/or glycidyl (meth)acrylate to a cellulose derivative represented by formula 1, (C) a polymerizable monomer having an acetal group and/or a hemiacetal group within a molecule, and (D) a photopolymerization initiator. Wherein R1, R2, and R3, independent respectively, represent hydrogen, the alkyl group of the carbon numbers 1-4, the hydroxyalkyl group of the carbon numbers 1-4, the acyl group of the carbon numbers 1-8, a carboxymethyl group, and -CO-R4-COOH. The said R4 shows the residue derived from anhydrous carboxylic acid with the anhydrous carboxylic acid and/or the substituent which consist of the aliphatic series alkylene of the carbon numbers 1-4, an aliphatic series cyclo alkylene group of the carbon numbers 6-8, and a phenylene group of the carbon numbers 6-10.

Description

200837498 IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to an alkali-developing type, which is not a composition of a nine-sex paste, and is classified into a γ-- The composition of the paste used in the field of the sub-materials is formed by the pattern of the photolithography method. In the past, in order to form a body pattern and a dielectric pattern in a plasma display panel, a glory display tube, an electronic love 2, etc., the use of a metal powder or glass is very much used. Patterning is carried out by a powdery conductive paste or a glass plate printing method. However, hunting, 罔1, 疋迎年, in electronic parts, etc., due to the demand for high-definition patterns, borrowing, and,,,,,,,,,,,,,,,,,,,,,,,, , halo, caused by the network: requirements. When L is in doubt, it is difficult to conform to a high-definition pattern. Therefore, a technique of forming a wiring pattern by a photolithography method capable of forming a fine pattern has been developed. Therefore, it is desirable to use a combination of the same type of soil and a photosensitive paste composition for forming a figure by the photolithography method. For example, in Patent Document 2, a cellulose-based adhesive is composed of an image-sensitive photosensitive paste. The composition of the photosensitive paste is excellent in density and density. In addition, as a characteristic required for a photosensitive paste composition, the thermal decomposition property at the time of baking is excellent. In order to improve the decomposability at the time of firing, in Patent Document 3, a "crosslinked molded body, which is characterized by having an acetal bond and/or a semi-acetal vinegar cross-linking, must be disclosed. Body and inorganic fillers." In the molded body, the crosslinking temperature of the crosslinked body having a good time-solving property is lowered to lower the decomposition temperature, and the acrylic binder resin is required. Since the solubility of the acrylic binder resin is good, a large amount of resin must be added to the paste, and the viscosity is high, resulting in poor printability, particularly in the case of deterioration of the release. Further, in the case of alkali development, since a large amount of resin is contained, an increase in ash due to the metal bonded to the functional group cannot be avoided. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. An alkali-developing photosensitive paste composition using a cellulose-based adhesive, and an object of the invention is to provide a good printability and pattern property having the advantages of the compositions, and a good thermal decomposition property. Image type photosensitive paste composition. The alkali-developing photosensitive paste composition of the present invention, which comprises (A) an inorganic powder, and (B) a cellulose derivative represented by Chemical Formula 1 (meth) acryloxyethyl group Isocyanate _ and / or (meth)acrylic acid glycidin S 曰 到 到 到 酸 酸 酸 酸 酸 酸 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 A polymerizable monomer containing an acetal group and/or a hemiacetal group, and (D) a photopolymerization initiator. 6 200837498

Here, R1, R2 and R3 are each independently represented by hydrogen, an alkyl group having 1 to 4 carbon atoms, a hydroxyalkyl group having 1 to 4 carbon atoms, a mercapto group having 1 to 8 carbon atoms, a carboxymethyl group, -CO- R4-COOH, the above R4 represents a carboxylic acid anhydride composed of an aliphatic alkyl group having 1 to 4 carbon atoms, an aliphatic extended cycloalkyl group having 6 to 8 carbon atoms, and a phenyl group having a carbon number of 6 to 10 and/or A residue derived from a carboxylic anhydride having a substituent. The component (A) accounts for the entire content of the photosensitive composite paste composition, and is preferably 12% to 30% by volume. Further, as the component (B), it is preferred to use a Lewis base and/or a metal ester to form (meth) propylene methoxyethyl isocyanate S and/or (meth) acryl glycidol g. The purpose. When the photo-sensitive photosensitive paste composition of the present invention is used for photolithography, the pattern can be made denser and thinner, and the firing characteristics are also excellent and the deashing property is excellent. [Embodiment] The image-forming photosensitive paste composition of the present invention is characterized in that (A) an inorganic powder is added to the cellulose derivative represented by Chemical Formula 1 (methyl) propylene oxy oxy group B. (meth)acrylic acid obtained by the isocyanate and/or glycidyl (meth) acrylate having an acid value of 25 to 80 mgKOH/g; 200837498 modified cellulose derivative, (c) contained in the molecule An acetal-based and/or hemiacetal-based polymerizable monomer, and (D) a photopolymerization initiator. [Chemical Formula 2]

In the chemical formula i, Ri, R2 and R3 are each independently represented by hydrogen, an alkyl group having 1 to 4 carbon atoms, a hydroxyalkyl group having a carbon number of 丨4, a fluorenyl group having a carbon number of 丨8, a carboxymethyl group, and -CO. -RtCOOH, the above R4 represents a carboxylic acid anhydride composed of an aliphatic alkyl group having a carbon number of 1-4, an aliphatic extended cycloalkyl group having a carbon number of 6 to 8, and a phenyl group having a carbon number of 6 to 〇. Or a residue derived from a carboxylic acid anhydride having a substituent. The powder of the inorganic powder (A) of the present invention is not particularly limited, and may be a metal powder, an oxide powder, a metal salt powder or the like. As the metal powder, a conductive powder containing a metal selected from the group consisting of Au, Ag, Cu, Pd, Pt, Ni, A, W, Mo, and Mn, a mixture of the metals, and an alloy of the metals can be used. a mixture of metals, generally Α(四),

Two or more types of Ag-Pt, Ag-Pt-Pd, and M〇_Mn are used in combination. The particle diameter of the metal powder is not particularly limited, and is suitable for use as a paste composition (especially, the blade coating property is preferably a particle diameter below the printing line width, and the average grain is required because fine printing is required. The metal powder of the diameter (b) is 8 200837498. The oxide powder can be selected from the group consisting of si, pb, Zn, B, A1, Ca,

The gasification of the elements in Mg and Ba, the stolen goods. In addition, the glass containing the oxide powder can also be used as a helmet to pick up the ancient ^ ^ ^ ^, Qian Yang. The specific oxide powder or the glass containing the oxide powder, the Sungu catcher brown powder helps to form a dielectric layer or to sinter the substrate and the conductive powder after firing to firmly bond the film.

The glass containing the above oxide powder may be used in the form of B2〇3.Bi2〇3, Pb〇.B2〇3, Pb〇.Si〇2, pb〇.B2cvsi〇2, 〇•Al2CVSi02 System, Ζη〇·ΡΙ)〇·Β2〇3 system, Zn(>m Ca〇· B2〇3 system, Ca〇.B2CVSi〇2 system, Ca〇.pb〇.Si〇2 system, Ca〇. Pb〇•B2〇3.Si02 system, Mg0.B2 (VSi〇2 system, Mg〇.pb〇.si〇2 system, Mg〇.Pb〇.B2〇3.Si〇2 system, etc.) The above oxide powder or glass containing an oxide powder may form a dielectric layer or may be followed by a conductor and a substrate after firing. For the metal salt powder, clock acid, cobalt acid, nickel acid, iron may be used. Metal salts and the like of squary acid, etc. The above-mentioned machine powder can be further used as an oxide of metal powder of Au, Ag, Cu, Pd, Pt, Ni, A, W, Mo and Μη. , telluride, hydroxide, Bi2〇s, etc. These, when fired at a lower temperature, have the effect of promoting the sintering of the metal, lowering the softening point of the glass, and releasing the oxygen contained during firing. Promote the effect of debonding agents, etc. Here, the '(A) inorganic powder is preferably 12% to 30% by volume in the paste. When the inorganic powder is less than 12%, defects such as cutting of the pattern are likely to occur, and if it exceeds 30 %, because of the decrease in fluidity, the printability 9 200837498 is lowered, and the uv hardenability is deteriorated. (B) (Methyl) acrylic acid modified cellulose Hebi's cellulose derivative represented by chemical formula! Addition (methyl) (iv) methoxyethyl isocyanate S is obtained by adding glycidol methacrylate, and the component (B) is alkali-soluble when it is not hardened and hardened by photopolymerization. A part of the resin which is alkali-insoluble. The ri, r2, and R3 of the derivative of Chemical Formula 1 each independently represent hydrogen, an alkyl group having 1 to 4 carbon atoms, a hydroxyalkyl group having a carbon number of i to 4, and a carbon number of 8 to 8. Anthracenyl, carboxymethyl, -C0-R4-C00H, the above R4 represents an aliphatic alkyl group having a hindrance number J to 4, an aliphatic extended cycloalkyl group having a carbon number of 6 to 8, and a carbon number of 6 to 10 a residue derived from a deuteric anhydride composed of a base group and/or a taurine having a substituent. Among the above, hydrogen or a hydroxyl group derived from a hydroxyalkyl group, a carboxy group The methyl and/or carboxylic acid anhydride residues are necessary for the addition of (decyl) acryloxyethyl isocyanate and/or (glycidyl) glycidyl ester. The above-mentioned carbon number 1 to 4 The number of the bases of 1 to 8 is suitably introduced in order to control the solvent used as the paste and the mutual solubility with the monomer. The addition of (meth)acryloxyethyl isocyanate and/or (曱) Base) The glycidyl acrylate (mercapto) acrylate modified cellulose derivative must have a residual carboxyl group of a carboxymethyl group or a carboxylic acid anhydride residue, and the residual amount must be controlled. In the case of adding (meth)acryloxyethyl isocyanate and/or glycidyl (meth)acrylate, it is preferred to use a Lewis base in maintaining the stability of the paste. Here, the Lewis base used in the reaction not only promotes the addition reaction of (meth) propylene oxiranyl ethyl isocyanate and/or glycidyl (meth) acrylate, but also forms a residual carboxylic acid with an ion pair or The wrong salt, the acetal group and/or the semi-shrinking base of the component (C) are reduced by the acid, and the stability and properties of the 200837498 in the non-firing state are improved, and the printing characteristics of the paste, the same monomer, and the solvent are improved. The mutual solubility has greatly improved the pattern. Lewis base, preferably amine, aromatic amine, with dimethine. Among them, aliphatic tertiary amines, aryldiazepines, 4, _r7: tetramethyl decyl diamine, 1,8-octane, from the cost point of view, the ratio of The diaza double ring rides the H dragon. Compared with the addition (A, it, * Ρ & & 3 3 3 成 成 成 成 成 成 成 成 成 成 成 成 成 成

Glycidyl acrylate J 〇〇 Cao Dan (soil), "曰. Heavy aliquot" is preferably 1~1 〇 by weight, 2~5 weight; g; part is particularly good. If the content of right Lewis base is low When the amount is 1 part by weight, the unreacted material will increase, and not only the kneading knife increases, but also the mutual solubility with the component (C) is lowered. On the other hand, if the inclusion of the danzo 3 is 5 parts by weight, the cost is changed. In addition, as with Lewis base, metal vinegar can also be used. Metal vinegar is particularly limited to ^ dibutyltin dilaurate, dioctyl laurate. Straight, from the point of view of cost, Dibutyltin dilaurate is preferred. Residues of (meth)acrylic acid modified fiber obtained by addition of (meth)acryloxyethyl isocyanate and/or glycidyl (meth)acrylate The amount of the carboxyl group of the derivative is 25 to 80 mgKOH/g in terms of acid value. Here, if the acid value is less than 25 mg K〇H/g, the alkali developability is lowered, and it is difficult to obtain a good development pattern. In addition, if the acid value exceeds 8 〇 mg K 〇 H / g, not only the pattern disappears due to alkali development, but also (c) Here, the mutual solubility is also lowered. Here, the (B) (fluorenyl) acrylic acid modified cellulose derivative can be used in 5~ when the paste component other than the (A) inorganic powder is set to 1 part by weight. 2 parts by weight of the range used, if it is less than 5 parts by weight, it will cause the film strength of the drying 11 200837498 to be lowered and it is difficult to use, and alkali development is also prone to pattern peeling. If it exceeds 20 parts by weight, the viscosity will increase. In the case of printing, it is difficult to release the mold, and the printability and the coating property are lowered. The polymerizable single system containing the acetal group and/or the hemiacetal group in the molecule (C) is not particularly limited, and preferably has a chemical formula. The functional group represented by 2. [Chemical Formula 3] "

# Here, R is a hydrogen group having a carbon number of carbon and a cyclic alkyl group, and an aromatic alkyl group having a carbon number of 〇 12 may have other functional groups. The polymerizable functional group contained in the polymerizable monomer is not particularly limited, and the acrylic group-propenyl group is preferred from the viewpoint of cost, and it is particularly preferable to have two or more functional groups.

The method for producing the above polymerizable monomer is not particularly limited, and it can be synthesized by adding (meth)acrylic acid to the ether compound, and it can be used in the form of B = sub-specifically, for example, it can be ethylene Alcohol Diethylene Women's Shout, Propylene Glycol Di-Butane Diethylene Glycol Diethylene Bond, Ring-Button Ethylene Digestion, Ring-Baked Twenty-Two Cry, Diethylene Glycol Divinyl Ether, Alcohol Divinyl Ether, Alcohol Ethylene Ether , dipropylene glycol divinyl ether, propylene vinyl ether, ethylene scale, glycerol triethylene ether 'tripropylene glycol divinyl ether, tetrapropanol monoethyl ether, trishydroxymethyl-methyl propane monovinyl ether, trioxindole Propane III, cloth-, pentaerythritol diethyl _, pentaerythritol trivinyl ether, penta pentylene 12 200837498 fermented tetraethylene scales. The component (C) is added to dilute the resin composed of the (meth)acrylic modified cellulose derivative of the component (B), and the viscosity is adjusted to adjust the physical properties of the cured portion. The component (c) may be used in an amount of 10 to 4 parts by weight when the amount of the paste component other than the inorganic powder (A) is 100 parts by weight, and if it is less than 10 parts by weight, the residue at the time of baking will be Become bigger. On the other hand, when it exceeds 40 parts by weight, the compatibility with other components will be deteriorated, resulting in stickiness and the like, and the printability and coatability will be lowered. (D) Photopolymerization initiator, as long as it is a (meth) propylene methoxyethyl isocyanate group and/or a glycidyl (meth) acrylate group and (C) component which can be added to the component (B) The (meth) propylene thiol group is reacted to cure the exposed portion, and benzyl, diphenyl ketone, mirekone (Michk〆s ketone), benzotrione, benzoin, A known compound such as benzoin ether, acetophenone, xanthone or a derivative thereof. In the component (D), when the paste component other than the inorganic powder (A) is set to 1 part by weight, it can be used in the range of 3 to 2 parts by weight, and if it is less than 3% by weight, Due to poor hardening, there is a case where the resolution of the pattern is lowered. On the other hand, when it exceeds 2 parts by weight, the storage stability of the paste is lowered, and since the excessive curing occurs, the alkali developability of the pattern is lowered. In the present invention, in order to achieve the affinity between the cured film and the substrate to be applied, the film strength deemed necessary in the process, and the viscosity of the coating, the polymerization other than the component (c) may be further added. Sexual monomer. The polymerizable monomer to be added is not particularly limited, and may be, for example, 13 to 18 of carbon number 200837498 alkyl (meth) acrylate, alkoxy oxyethylene oxide derivative having a carbon number of i 8 (methyl) Acrylate, aromatic alkoxyethylene oxide derivative (mercapto) acrylate having a carbon number of 6 to 8, polyethylene oxide di(meth)acrylate, polypropylene glycol (mercapto) acrylate, bisphenol A ethylene Oxide derivative (meth) acrylate, trimethylolpropane bis(indenyl) acrylate, trimethylolpropane tri(decyl) acrylate, trishydroxypropyl propane ethylene oxime derivative Acrylate, trihydroxymercaptopropene propylene oxide derivative tris(decyl) acrylate, glycerin ethylene oxide derivative tri(meth) acrylate, glycerin propylene oxide derivative tri(meth) acrylate Pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, and the like. Further, in the present invention, a solvent such as an aromatic group, an ether, an alcohol, an ester or a ketone may be added in order to control the characteristics at the time of coating. The solvent to be added is not particularly limited, and examples thereof include ethylene glycol, diethylene glycol, propylene glycol, dipropanol, rosinol, dibasic rosin, ethyl sirlo, butyl sir, and Kikabi alcohol, butyl carbitol, cyclohexane, cyclohexane, dimethanol, and the like, the acetate, pentanediol alkyl ether, diethylene glycol phthalate, dibutyl phthalate. [Examples] The preferred embodiments of the present invention are described below, but the present invention is not limited to the following examples, and modifications and corrections may be appropriately made without departing from the scope of the invention. (1) Synthesis Example of (B) Component &lt;Synthesis Example 1&gt; HQ (hydroquinone) 〇. 〇 37 g, ECA (diethylene glycol monoethyl ether acetate 14 200837498 )) 54·8 g was added and separable In a flask, 30 g of HP-50 (manufactured by Shin-Etsu Chemical Co., Ltd.) was added while being applied. The heating was carried out at 110 ° C in an oil bath equipped with a stirring wing, a cooling tube and a thermometer. After 1 hour, after becoming a transparent "paste", GMA (glycidyl methacrylate) 6.5 g and DBU (1,8-diazabicyclo[5.4.0]non-7-ene) were added. 0.26 g, after directly stirring for 15 hours, it was cooled and taken out to the container. The obtained resin acid value was 38 mgKOH/g. Let it be a resin solution 1. &lt;Synthesis Example 2&gt; HQ (hydroquinone) 〇. 〇 4 g, ECA (diethylene glycol monoethyl ether acetate vinegar) 61 _0 g was placed in a separable flask, and hp_50 (Shin-Etsu Chemical Co., Ltd.) was added while stirring. Acid modified cellulose) 30g. It is heated at 11 〇 °C in an oil bath equipped with a stirring blade, a cooling tube and a thermometer. After 1 hour, it became a transparent "paste", and then cooled to 80 ° C, and methacryloyloxyethyl isocyanate (Karenz Μ0Ι, manufactured by Showa Denko) 1〇6g and dibutyltin dilaurate 0.02g were added. After reacting for 5 hours, it was allowed to cool and taken out to the container. The acid value of the obtained resin was 62 mgKOH/g. Let it be a resin solution 2. &lt;Synthesis Example 3 &gt; 22.8 g of HQ (p-diphenol) 〇.〇i 5 g and ECA (diethylene glycol monoethyl silicate) were placed in a separable flask, and hp_5 was added while stirring. (Shin-Etsu Chemicals carboxylic acid modified cellulose) 1 〇g. The heating was carried out at 110 ° C in an oil bath equipped with a stirring blade, a cooling tube and a thermometer. After 1 hour, after becoming a transparent "paste", GMA (glycidyl methacrylate) 1.7 g and DBu〇,8-diazabicyclo[54〇]壬_ 15 200837498 7-ene) were added. 〇.〇65g. After reacting for 15 hours, the mixture was cooled to 80 ° C, and 3.6 g of methacrylium oxirane ethyl isocyanate (Karenz®, manufactured by Showa Denko) and 0.008 g of dibutyltin dilaurate were added, and after reacting for 5 hours, it was cooled and taken out. To the container. The obtained resin acid value was 37 mgKOH/g. Let it be a resin solution 3 〇 &lt;Comparative Synthesis Example 1&gt; 11 (5 (hydroquinone) 〇.〇13, 〇8 (diethylene glycol monoethyl ether acetate) 13.3 g was added to be separable The flask was charged with 10 g of HP-50 (trusted _ _ carboxylic acid modified cellulose) while stirring, and heated at 110 ° C in an oil bath equipped with a stirring blade, a cooling tube and a thermometer. After 1 hour After becoming a transparent "paste", GMA (methyl acrylate propylene glycol) 3 · 3 g was added. After directly reacting for 15 hours, it was cooled and taken out to a container. The acid value was 50 mgKOH/g, and it was made into the resin solution 4. <Comparative Synthesis Example 2> Lu HQ (hydroquinone) 〇.〇28 g, ECA (diethylene glycol monoethyl ether acetate) 41.7 g was added to a separable flask, and 25 g of HP-50 (manufactured by Shin-Etsu Chemical Co., Ltd.) was added while stirring. The mixture was heated at 110 ° C in an oil bath equipped with a stirring blade, a cooling tube and a thermometer. After the 'transparent paste', add GMA (glycidyl methacrylate) 1.4g and DBU (1,8-diazabicyclo[5·4·0]壬-7-ene 0.06 g, the reaction was stirred for 15 hours, then cooled, and taken out to the vessel. The obtained resin acid value was 83 nlg KOH / g, and it was made into the resin solution 5. 16 200837498 <Comparative Synthesis Example 3 &gt; HQ (pair Resorcinol) 0.015g, ECA (diethylene glycol monoethyl ether fumarate) 23.6g was added to the separable flask, and while the chemically-modified carboxylic acid-modified cellulose was added, l〇g was added. It is heated at 11 °C in an oil bath equipped with a stirring blade, a cooling tube and a thermometer. After 1 hour, it became a transparent "paste", and then added GMA (glycidyl methacrylate) 2.2 g and DBU (1,8-diazabicyclo[5·4·〇]壬-7- Alkene) 〇 8g. After reacting for 15 hours, the mixture was cooled to 80 ° C, and 3 g of mercaptopropyl ruthenium oxyethyl isocyanate (Karenz Μ0Ι, manufactured by Showa Denko) was added to react with dilaurate 一 丁 〇 〇〇 8 g ' for 5 hours. , let it cool out and take it out to the container. The obtained resin acid value was 21 mg K 〇 H / g. Let it be a resin solution 6. 2 · Synthesis Example of (C) Component &lt;Synthesis Example 4&gt; 64.8 g (2 eq) of acrylic acid, 636 g (leq) of trimethylolpropane trivinyl ether and HQ (for dumbness) were found to be 3 g (isobutylene) The total weight of the acid and triethylene _ 1000 ppm was dissolved in 360 mL of toluene and reacted at 9 Torr to 1 Torr for 4 hours. The terpene was distilled off by an evaporator to obtain a target of 121 §. The polymerizable monomer containing the acetal group obtained is the compound 1. <Synthesis Example 5> 50 g (2 eq) of acrylic acid, 75.6 g (leq) of triethylene glycol divinyl ether, and 0.13 g of HQ (p-diphenol) (100 ppm of total weight of methacrylic acid and divinyl ether) were dissolved in 360 mL. Toluene, reacted 4% by weight under 9〇~ι〇〇ό. The toluene was distilled off with a hair dryer to obtain a target of i 2 〇g. The polymerizable monomer containing the acetal group obtained is the compound 2. 17 200837498 3. EXAMPLES Examples 1 to 6 and Comparative Examples U to 6 were prepared by mixing the compositions shown in Table i, and then the mixture of the Taman products of the company was mixed and gelatinized. The obtained paste was subjected to slick printing on a glass substrate using a #325 mesh stainless steel sieve, and then (10) was carried out. The cxi 〇 minutes were dried, and the chrome mask 10 shown in Table 1 was placed, and exposure was performed with parallel light of I50 mj. Then, spraying with a G.5Wt% Na2C03 aqueous solution,

Visualize it. Fig. 1 is a plan view showing a chrome mask 1. The chrome mask is 1 inch, and has two areas with different line widths W and different gaps! ,2. The line 1 of the first area is W and the gap width G is 5 〇 μιη, and the line width of the second area 2 and the gap width G are both 75 μm. Fig. 2 is a plan view showing a part of the area i in an enlarged manner, and clearly shows the width of the line width W and the gap width G.

The evaluation of the linear formability of an image is the sum of the line width w and the gap width G of $5〇μιη! region! The second region, or the 2 evaluation line, is formed with the line width | and the gap width g. The evaluation was carried out by visually observing the shape of the line. The evaluation criteria are as follows. 〇: The whole is patterned, and the unexposed parts are completely etched, and there are no defects such as broken wires or short circuits. △: The whole is patterned', but there are defects such as insufficient short-circuit due to insufficient exposure and disconnection due to over-etching. 3: It cannot be etched, or it is dissolved and cannot be imaged. In addition, in the above evaluation, the patterned hardened material was cut to raise the temperature from hunger by TG/DTA. When c〇(rc/min) 18 The final weight of 200837498 is reduced to 1%, and the temperature at the point of 50% reduction and 50% reduction is measured. The above evaluation results are shown in Table 1.

19 200837498

[! &lt;】Compared with the car 6 (N 1 37.5 1 1 i 1 1 1 ! I 1 37.5 12.5 12.5 m cn 1 1 Comparative Example 5 (N 37.5 i 1 1 1 1 1 1 37.5 1 12.5 12, 5 cn ! 1 Comparative Example 4 un (N 37.5 1 1 1 1 1 1 ! 37.5 1 1 12, 5 12.5 &lt;] &lt; I 1 Comparative Example 3 Ο 37.5 1 1 i 1 1 1 37_5 - 丨 1 ! 1 12.5 12.5 mm 1 Comparative Example 2 Ο ι—Η 37.5 I 1 1 1 1 —37.5——1 1 1 12.5 12.5 &lt;&lt;3 1 i Comparative Example 1 CN 1 1 (N 12.5 1 1 1 37.5 1 1 1 1 12, 5 12.5 〇〇 358 488 Example 6 ιη (Ν 1 (N 12.5 1 1 1 1 37.5 1 1 ! 1 12.5 12.5 〇〇rn &lt; N inch Example 5 CN (Ν 1 12.5 1 i 1 [—31 .丨1 12.5 12.5 〇〇255 实施Example 4 (Μ 1 37.5 I 1 1 1 1 37^5 I 1 1 1 12.5 12.5 〇〇267 Example 3 &lt;Ν 37.5 1 1 1 1 1 —37.5” 1 1 1 12.5 12.5 〇〇227 426 Example 2 (Ν 37.5 1 1 1 1 丨37·5—1 1 1 1 1 1 12.5 1 12.5 〇〇230 436 Example 1 ιη &lt;Ν 37.5 ! 1 1 1 37, 5 JI 1 1 1 1 1 12.51 12.5 〇〇224 〇〇&lt;N inch (volume %) (parts by weight)*1) (parts by weight)*1) (parts by weight)*1) (parts by weight *1) (parts by weight) *1) (parts by weight) *1) (parts by weight) *1) (parts by weight) *1) i (parts by weight) *1) (parts by weight) *1) (parts by weight) *1) (parts by weight)*1) 75/75 50/50 minus 50% reduction 90% silver powder compound 1 compound 2 PET-3 TEGDMA resin solution 1 resin solution 2 resin solution 3 resin solution 4 resin solution 5 resin solution 6 R- 〇ON bC ι ίη ECA line interstitial thermal decomposition reduction temperature *2) Feeding order -f砩o: VU3 (qf meal ϋν) Bu 06633⁄43⁄4 : Bu 065?1 (vwao31si^SJAV3N:^il^Ts ^^^«^6--risMOW:vsao31 (ε 丨13%.2lasJAV3N: 镰 盔 盔 ^ ^ ^ ^ ^ „ 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 fSEf w^os #飧, times 06 ¥ shout? f^OOI t^斋¥^wlpooos 甽lang 4bih^s((n*00- 03 200837498 From the results of Table 1 , it is known that Examples 1 to 6 and Comparative Examples are compared with Comparative Examples 2 to 6 1 line gap is excellent. 1 Compared with Example 2, it is considered that there are few inorganic powders, and defects occur on the line. In Comparative Example 3, it is considered that the pattern changes due to the large amount of inorganic powder and insufficient organic components. In Comparative Example 4, it was considered that the Lewis test was not used in the synthesis of the resin solution 4, and line defects occurred due to insufficient compatibility. Comparative Example $ is considered to be due to the excessive acid value of the resin solution 5, and solubility in the alkali solution. Calling big: causing a change in the pattern. Comparing 爿6 is not possible. This is considered to be because the acid value of the resin solution 6 is too low. In terms of hot knife solution, in Examples 1 to 6, the weight is reduced. The temperature of $ 〇% is 224 ° C to 273 ° C, and the temperature at which the weight is reduced by 90% is 421 ° C to 442 ◦. On the other hand, in Comparative Example 1, the temperature at which the weight is reduced by 50% is 358, and the weight is reduced by 90. The temperature of % is 488 ° C, which is higher than any of the examples. The development-type photosensitive paste composition is suitable for pattern formation by the light lithography method in the field of electronic materials. [Simplified illustration of the drawing] Fig. 1 is a plan view showing the shape of the chrome mask. Partial enlargement of the chrome mask of 1 1. Explanation of the main component symbols 1 Zone 1 of the 2nd Zone 2 of the chrome mask 21

Claims (1)

200837498 X. Patent application scope: 1 - An alkali-developing photosensitive paste composition characterized by containing (A) a powder, (B) a cellulose derivative represented by Chemical Formula 1 (methyl a (meth)acrylic acid modified cellulose derivative having a ruthenium oxyethyl isocyanate and/or a glycidyl (meth)acrylate to be added in an amount of 25 to 80 mgKOH/g, (C) a polya-type monomer having an acetal group and/or a hemiacetal group in the molecule, and (d) a photopolymerization initiator, [Chemical Formula 1] Here, 'R1, R2 and R3 are each independently, and represent hydrogen, a carbon number of 1 to 4, a hydroxyalkyl group having 1 to 4 carbon atoms, a fluorenyl group having 1 to 8 carbon atoms, a carboxymethyl group, and _CO-R4. -COOH 'This R4 represents a carboxylic acid anhydride composed of a carbon number of ~4 aliphatic alkyl group, a carbon number of 6 to 8 aliphatic cycloalkyl group, a carbon number of 6 to 1 phenylene group and/or A residue derived from a carboxylic anhydride having a substituent. 2. The composition of the alkali-developing photosensitive paste composition of the ninth application of the patent application, wherein the component (A) accounts for the entire content of the alkali-developing photosensitive paste composition, and is 12 in terms of volume fraction. %~30%. 3. The composition of the alkali-developing photosensitive paste as claimed in claim 2 or 2, wherein the component (B) is a Lewis base and/or a metal ester, and 22 200837498 is a (mercapto) acrylonitrile. Oxyethyl isocyanate and / or (mercapto) acrylic glycoacetic acid. XI. Schema: as the next page twenty three