TW200836993A - Substrate processing apparatus and substrate processing method - Google Patents

Abstract

A substrate reverse moving device is composed of a reversing mechanism and a moving mechanism. A rotating mechanism incorporates a motor or the like, and is capable of rotating a first movable member and a second movable member to which first and second supporting members that support a substrate therebetween are fixed, respectively, around a horizontal axis through, for example, 180 degrees via a link mechanism. Moreover, a pair of transport rails is fixed on a base in parallel to V direction. A pair of sliding blocks is slidably attached to the pair of transport rails. A floorboard of the reversing mechanism is attached to the sliding blocks. A direct acting mechanism moves a driver in a direction parallel to the transport rails, so that the reversing mechanism moves back and forth in the V direction along the transport rails.

Description

200836993 IX. Description of the Invention: [Technical Field] The present invention relates to a substrate processing apparatus and a substrate processing method for performing predetermined processing on a substrate. [Previously] In order to perform various processes on substrates such as semiconductor wafers, glass substrates for photomasks, glass substrates for liquid crystal display devices, and glass substrates for optical disks,

A substrate processing apparatus is employed. For example, JP-A-2005-85882 discloses a substrate processing apparatus including a substrate inversion mechanism that reverses the surface and the back surface of the substrate. In such a substrate processing apparatus, a substrate transfer person who transports a substrate is disposed at a slight center of the rectangular processing region. In the processing area, a plurality of (for example, four) substrates are disposed around the substrate transporter, and the floor is further improved. The substrate reversing mechanism is disposed at a position accessible by the substrate transfer robot in the processing area. ^ On the end side of the treatment area, there is a manned unit, which is provided with a cassette for receiving and inner soil plates. A loading machine is provided in the man-machine unit. The card is used to take out the pre-processed substrate, or the processed substrate is received in the card. The 载入 六 'loading robot takes the front substrate from the --匣 and processes the substrate to process the substrate 1^=’. On the same day, the substrate transport robot receives the person who receives the pre-processed substrate. The substrate reversing mechanism rotates from the substrate. The substrate transfer robot transfers the substrate from the loading device to the substrate reversing mechanism. 97100774 6 200836993 The substrate received by the transport robot is oriented with the surface facing downward. The substrate transfer robot receives the substrate inverted by the substrate inverting mechanism, and carries the substrate into any of the substrate processing units. Then, after the substrate transfer robot completes the substrate V process in any of the substrate processing units, the substrate is carried out from the substrate processing unit and is again transferred to the substrate inversion structure. The substrate inverting mechanism reverses the substrate processed by the substrate processing unit so that the surface thereof faces upward. _ ",,: After the substrate transporter receives the substrate inverted by the substrate reversing mechanism and delivers it to the loading robot. The loading robot stores the processed substrate received by the substrate transfer robot in the cassette. The substrate before being processed by the card g is reversed by the substrate inverting mechanism, processed by the substrate processing unit (processing on the back surface of the substrate), and then reversed by the substrate inverting mechanism, and then placed in the cassette after being processed. In the above-described conventional substrate processing apparatus, a reciprocating transport mechanism that transfers a substrate between the loading robot and the substrate transport robot may be provided. By this means, the loader and the substrate transport robot are not subject to each other. The transport operation can be performed efficiently. However, when the shuttle transport mechanism and the substrate reversing mechanism are provided in the substrate processing apparatus, the transporting process of the substrate transport robot is increased. Specifically, the substrate transport robot For the cymbal substrate, it is necessary to carry the transfer from the transfer mechanism to the substrate reversing mechanism, and from the substrate reversal mechanism to the substrate. The transfer process from the substrate processing unit to the substrate reversing mechanism and the transfer operation of the second substrate reversing mechanism to the transfer mechanism are performed four times. Thus, the reciprocating mechanism, the substrate reversing mechanism, and the plurality of substrates are processed 97100774 7 The transfer process of the substrate transfer robot is increased between 200836993. Therefore, the amount of processing for the substrate processing is reduced. SUMMARY OF THE INVENTION An object of the present invention is to provide a substrate processing apparatus and a substrate processing method capable of improving the processing amount of substrate processing. (1) A substrate processing apparatus according to an aspect of the present invention, for processing a substrate having one surface and the other surface; comprising: a processing region for processing the substrate; a loading/unloading region for loading and unloading the substrate into the processing region; and processing The delivery unit of the transfer substrate between the area and the loading/unloading area; and the loading/unloading area package=the valley loading unit, which houses the storage container 用以 for storing the substrate and the first conveying device, and is placed in the container The substrate is transported between the storage container of the placing portion and the delivery 4, and the processing region includes a processing portion that applies the substrate The second transfer device transports the substrate between the delivery unit and the processing unit. The delivery unit includes a reversing mechanism that reverses the substrate-surface and the other surface, and a movement mechanism that reverses the movement. In the mechanism, the substrate can be transferred between the second moving and reversing mechanisms, and the substrate can be transferred between the second conveying device and the reversing mechanism. ::Base: In the reverse processing device, the transfer unit t is moved by the moving mechanism. The substrate can be transferred between the first transfer device and the reversing mechanism. (9) In the carry-out area, the substrate is transported by the first transfer farm between the storage unit 1 and the storage unit. In the delivery unit, the substrate is transferred between the substrate and the reaction mechanism by the inversion mechanism. Then, in the processing region 97100774 200836993, the substrate is transported by the second transfer device between the delivery unit and the processing unit. The delivery unit has a function of a reciprocating transport mechanism that transfers the substrate between the first transport device and the second transport device, and a function of reversing the reversing mechanism of the substrate. Therefore, the transport step V of the second transport apparatus for one substrate is two steps of transporting from the delivery unit to the processing unit and transporting from the processing unit to the delivery unit. Therefore, since the transfer step of the second transfer device is reduced, the amount of processing for the two substrates can be increased. Further, since the delivery unit including the reversing mechanism and the moving mechanism is provided between the second conveying device and the second conveying device, it is not necessary to change the configuration of the predetermined substrate (the so-called platform configuration). Therefore, an increase in the manufacturing cost of the substrate processing apparatus can be suppressed. (2) In the moving mechanism, the reversing mechanism can be moved back and forth in the horizontal direction, and can be moved to and from the position where the substrate can be transferred between the first conveying device and the reversing mechanism, and can be used in the second conveying device. The position where the substrate is transferred between the inversion mechanisms. In the case of the transfer of the base between the reversing mechanism and the first transfer device, and the transfer of the substrate 1 between the reversing mechanism and the second transfer device, the substrate can be reversed, and Since the substrate is transported between the transport devices of the ninth, y, and yin 2, the shovel tr π 11 —, , , 乂〆 of the second transport device can be reduced. Thus, the throughput of the substrate processing is increased. The transport device may also have an i-th support portion, and is arranged to be capable of inserting silver, 筮, 丄 符 扳 扳 扳 , , , , , , , a a a a a a a a a a a a a a a a a The rotation mechanism advances and retreats in the first advance and retreat direction, and the second conveyance and the 弟有弟2 support portion support the substrate and are set to be able to enter the 97100774 9 200836993 5 Wei 11 support portion when the substrate is transferred between the reverse and the reversing mechanism, In the ==, 2 advance and retreat! Advance and retreat, the moving mechanism encloses the rotating mechanism to the second advancing and retracting side 6 = the direction of the transfer to the younger brother 1 is substantially perpendicular, and is in a direction substantially perpendicular to the direction of the transfer of the younger brother 2 Axis and in this case, the 丨 support of the 1st (fourth) device = the reversing mechanism of the movement and the next! Advance and retreat in the direction of advance and retreat, and borrow::: Gossip to transfer the substrate between the reversing mechanisms. Further, the second support portion of the second transfer device transfers the substrate between the second retracting mechanism 2 and the second reversing mechanism with respect to the reversing mechanism. k Hunting this can be rotated between the first and the second direction of the direction of the forward and backward direction of the direction of the direction of the third direction of the forward direction and the second direction of the forward and backward direction, and at the same time! The transfer device and the second transfer device are transported to the base. Therefore, the transport step of the second transfer device is reduced. Soil • The amount of substrate processing. Eight hunting is improved in this way. (4) The reversing mechanism can also be configured as the first! The angle of rotation between the transitions is 18 degrees. The younger brother 2 is connected to the Japanese sergeant, the second transfer direction and the second transfer direction are parallel to each other: 2: I, the first support part of the first support unit, the first forward and backward steering wheel (2) The second advancement and retraction direction of the support unit is mutually = Brother. J: The reversing mechanism is rotated by 180 degrees. This allows the substrate to be transported between the i-th transfer and the transfer device. /, Brother 2 (5) The reversing mechanism can also be configured. The rotation angle between the i-th transfer direction and the second transfer direction 97100774 200836993 is less than 18 degrees. In this case, when the first transfer direction and the second transfer direction are mutually different, that is, the first advance/reverse direction of the first support portion is When the second advancing and retracting directions of the second support portion are not parallel to each other, the reversing mechanism rotates by less than 18 degrees, whereby the substrate can be transported between the first transfer device and the second transfer device. The rotation angle of the rotating mechanism can shorten the substrate time transported between the soil transporting device and the second transporting device. As a result, the processing amount of the substrate processing can be further improved. (6) The first transporting device can also be disposed along the axial direction Parallel movement 'in the direction orthogonal to the first axis direction In the state of the two-axis direction, the substrate is placed in the container of the container mounting portion, and the substrate is taken out, and the needle reversing mechanism delivers the substrate in a state in which the angle between the second axis directions is less than the third axial direction. In the case where the first conveying device is in the third axial direction with an angle of less than 180 degrees with respect to the second axial direction, the substrate is transferred to the reversing mechanism, thereby reducing the rotation angle of the first conveying device. In this way, the substrate time that can be transferred between the nano container and the delivery portion can be reduced. As a result, the processing amount of the south substrate processing can be further improved. (7) The substrate processing method according to another aspect of the present invention has the following The substrate processing apparatus performs processing on the substrate: a loading/unloading area including the container placing unit and the i-th conveying device; a processing area including the processing unit and the second conveying device; and transferring the substrate between the processing area and the carrying-out area The father's joint part; the secret domain method has a wealth: # From the first delivery device, the pre-processed substrate is taken out from the storage container placed in the container mounting portion, and the taken-out 97100774 11 200836993 substrate is handed over to the transfer Step of the part; at the intersection _ by the reversing mechanism, the surface of the front substrate and the other surface are reversed, and (4) moving

The mechanism allows the second transfer device to be transferred from the reversing mechanism to the front plate: = '· the second transfer device transports the pre-processed substrate from the transfer portion to the transfer step; and the processing portion processes the pre-processed substrate a step of transferring the processed substrate from the processing unit to the j-th portion by the second transfer device; and reversing the other side of the processed substrate with the reversing mechanism by the reversing mechanism And moving the reversing mechanism to transfer the processed substrate to the first conveying device; and receiving the processed substrate from the delivery portion by the first conveying/setting, and collecting the processed substrate after receiving the processing The step of accommodating the container. . One of the series of steps of the substrate processing method is as follows. First, the pre-process substrate is taken out from the storage container placed on the container mounting portion by the first transfer device, and the pre-processed substrate taken out is delivered to the delivery portion. Next, in the transfer port, the one surface of the front substrate and the other surface of the front substrate are reversed by the reversing mechanism, and the reversing mechanism is moved so that the front substrate can be transferred to the second transfer device from the reversing mechanism. " Then, the pre-processed substrate is transferred from the delivery unit to the processing unit by the second transfer device, and the pre-processed substrate is processed in the processing unit. Then, the processed substrate processed by the processing unit is transferred from the processing unit to the delivery unit by the second transfer device. Next, in the delivery unit, the other surface of the processed substrate is reversed from the surface by the reversing mechanism, and the reversing mechanism is moved, so that the processed substrate can be transferred from the delivery unit to the first transfer device. Next, the processed substrate is received from the parent side of the 97100774 12 200836993 by the second transport device, and the collected processed substrate is stored in the nano container. In this way, the delivery unit functions as a reciprocating mechanism for the parent substrate between the second transfer device and the second transfer device, and a function of reversing the substrate reversing mechanism. Therefore, the transfer step of the f 2 transfer device is carried out from the transfer unit to the processing unit and from the processing unit to the delivery unit, in two steps. Therefore, since the transfer step of the second transfer device is reduced, the amount of processing of the substrate processing can be reduced. In addition, the function of the transfer mechanism and the function of the reversing mechanism are provided between the first transfer device and the second transfer device, and the configuration of the predetermined substrate processing device (so-called platform configuration) is not changed. Because: the increase in the manufacturing cost of the substrate processing apparatus can be suppressed. According to the present invention, the transfer step of the second transfer device can be reduced to increase the throughput of the substrate processing. [Embodiment] Hereinafter, the present invention and a substrate processing method will be described with reference to the drawings. In the case of the substrate, the semiconductor substrate, the glass substrate for a liquid crystal display device, the glass substrate for a PDP (electric panel), and the substrate for a disk are used. For soap, 'so-called liquid medicine means, for example, η acid), DHF (dilute hydrogen fluoride, ,, * & 4 mice, milk fluoride k, hydrochloric acid, sulfuric acid, tartaric acid, hydrazine acetic acid, oxalic acid, peroxidation μ Stem solution. '^Cyanide water special aqueous solution, or the mixture of 4, 97100774 13 200836993 Hereinafter, the treatment using these chemical liquids is called chemical liquid treatment. Usually after the chemical liquid treatment is completed, the substrate using the rinse liquid is performed. The rinsing liquid is an organic solvent such as pure water, carbonated water, ozone water, magnetic water, reducing water (hydrophobic) or ionized water, or IPA (isopropyl alcohol). (1) First embodiment Form U-1) Configuration of Substrate Processing Apparatus FIG. 1 is a plan view of a substrate processing apparatus according to the first embodiment. Further, Fig. 2 is a side view of the substrate processing apparatus of Fig. 1. In addition, in Figure i and Figure 2

In the middle, the horizontal directions orthogonal to each other are defined as the U direction and the v direction, and the wrong direction is defined as the T direction. The same applies to the figures described later. D As shown in FIG. 1, the substrate processing apparatus 1A has processing areas A and B, and has a transfer area c between the processing areas A and B. The control unit 4, the fluid tank unit 仏, the cymbal, the processing units MP1 and MP3, and the processing units MP2 and MP4 are disposed in the processing area A. As shown in Fig. 2, the processing units MP2 and MP4 are respectively disposed above the φ MPS. The fluid tank portions 2a and 2b of Fig. 1 respectively supply the chemical solution and the pure water to the treatment portion swollen Mp2, supply the chemical liquid and the pure water to the treatment portions MP3 and MP4, and discharge from the treatment portions ΜΠ, ΜΡ2 and the treatment portions MP3 and MP4. Fluid-related equipment such as liquids and other related joints, valves, flow meters, regulators, pumps, temperature regulators, chemical solutions, and storage tanks. In the treatment unit, the chemical liquid is treated with the chemical liquid. Further, in the treatment units MP2 and MP4, the chemical liquid is also treated with the chemical liquid. Further, after the chemical liquid treatment, the water is washed with pure water or the like. 97100774 200836993 The fluid tanks 2c and 2d, the processing units MP5 and MP7, and the processing units MP6 and MP8 are disposed in the processing area B. The processing units MP6 and MP8 are respectively disposed above the processing units MP5 and MP7. The parts 2c and 2d respectively accommodate the supply of the chemical liquid and the pure water to the processing units MP5 and MP6, the supply of the chemical liquid and the pure water to the processing units MP7 and MP8, and the discharge of the liquid from the processing units MP5 and MP6 and the processing units MP7 and MP8. Fluid-related equipment such as joints, valves, flow meters, regulators, pumps, temperature regulators, and chemical storage tanks. In the processing units MP5, MP7, MP6, and MP8, the processing unit MP MP3, MP2, and MP4 are performed. In the same manner, the treatment unit refers to any of the treatment units MP1, MP3, MP5, MP7 and the treatment units MP2, MP4, MP6, and MP8. In the present embodiment, the hydrofluorocarbon is used as the chemical solution. Acid, ammonia, hydrogen peroxide and hydrochloric acid are separately supplied to the treatment The chemical liquid supply system of the part is provided in the fluid tank parts 2a to 2d, and the substrate transport robot CR is provided in the transport area C. The loader id for loading and unloading the substrate is disposed on one end side of the processing areas A and B. The access ID includes a plurality of carrier mounting portions ia and a loading robot ir. The carrier 1 for storing the substrate W is placed on each of the carrier mounting portions 1a.

In the present embodiment, the carrier 1 is a FOUP (Front Opening Unified Pod) that accommodates the substrate W in a sealed state. However, the present invention is not limited thereto, and SMIF (Standard Mechanical Inter Face ' standard machine may be used. Interface) box, 〇c (〇pen Cassette, open cassette) and so on. Further, the loading robot IR is configured to be movable in the u direction within the loader ID 97100774 15 200836993. Here, in the present embodiment, the position of the transfer area c between the loaders CR is such that the surface of the substrate f and the back surface are connected to each other. Ία 基板 夂轱 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板The substrate inversion moving device 7 can linearly reciprocate in the y direction as described above in the intersection portion 3. ,

In the configuration, the loading robot U takes out the pre-processing substrate F from the carrier 1 and the parent reversing the moving device 7; otherwise, the substrate backing device 7 takes it out and the substrate w is returned to the carrier. Further, the earth plate reverse moving device 7 reverses the substrate w taken by the loading robot W, and moves the inverted substrate w in the vicinity to the vicinity of the substrate transfer robot CR. The details will be described later. Further, the substrate transfer robot (3) transports the substrate w picked up by the substrate reverse moving device 7 to a designated processing unit, or transports the base & W collected by the processing unit to another processing unit, or hands it over to the substrate. The mobile device 7 further includes a computer including a CPU (Central Processing Unit), and controls the operations of the processing units 1P1 to MP8 in the processing areas A and B, and the substrate inversion moving unit 7 in the transport area c. The operation of the substrate transfer robot cR and the operation of loading the robot ir into the loader ID. Further, the substrate processing apparatus 100 is installed in a clean room or the like in which a downflow (downflow) is formed. Further, a vertical flow is formed in each of the processing units MP1 to MP8 and the transport area C. 97100774 16 200836993 (1 - 2) Configuration of Processing Unit Next, the configuration of the processing units MP1 to MP8 will be described with reference to the drawings. Since the respective configurations of the processing units MP1 to MP8 are the same, the following is a description of the configuration of the processing unit. * In the processing unit Mp! +, the substrate cleaning process, the substrate-on-film process or the polymer residue on the substrate, and the like (for example, a resist residue) removal process are performed. In the following description, the substrate cleaning process will be described as an example. FIG. 3 is a cross-sectional view showing the configuration of the processing unit MP1. As shown in FIG. 3, the portion MP1 includes a cover 1 (n, a horizontally-shaped retaining base disposed inside thereof) so as to surround it substantially through the substrate W1^ (four) rotation = disk 2, and a closed cover The fan above the m end is filtered and boring early. The fan is over the unit FFU outside | 101 (four) into the

(downflow). In addition, the kitchen, the walk, and the L constitute. The feather filter is 70 FFlJ. The fan and the filter are rotated by the chuck 21. The chuck 21 is set on the shovel | 士 a 土圭 axis 25 on the m 疋 rotation drive mechanism 36 rotation rotation _ the soil plate W is washed in the liquid medicine, The chuck is rotated while being horizontal. S hunting is condensed on the outside of the rotating chuck 21, the ancient land, the Zhuang soil connects the right side of the 1 square sigh, there is a brother 1 motor 6 〇. The first motor 6〇 τ moves the shaft 61. Further, the first arm 62 is coupled to the first rotating shaft 6 to extend the water, and the first arm 62 is coupled to the liquid nozzle 50 at the lf62. The treatment liquid squirt is placed on the substrate W. The liquid medicine for washing the substrate W is supplied to the outside of the rotary chuck 21. 6〇a is connected to the second rotation motor 60a. In the second motor la, a 97100774 17 200836993 2 arm 62a is coupled to the second rotating shaft 61a. Further, a pure water nozzle 50a is provided at the front end of the second arm 62a. The pure water nozzle 50a supplies pure water to the substrate W in the cleaning process after the washing process. When the cleaning process is performed using the processing liquid nozzle 50, the pure water nozzle 50a is retracted to a predetermined position. The rotary shaft 25 of the rotary chuck 21 is constituted by a hollow shaft. A processing liquid supply pipe 26 is inserted into the inside of the rotating shaft 25. The treatment liquid supply pipe 26 is supplied with a chemical liquid such as pure water or a washing liquid. The treatment liquid supply pipe 26 extends to a position close to the lower side of the substrate W held by the rotary chuck 21. At the end of the processing liquid supply pipe 26, a lower nozzle 27 for discharging the liquid toward the center of the lower surface of the substrate W is provided.

The square turn chuck 21 is received in the processing cup 2 3 . A cylindrical partition wall 33 is provided inside the treatment cup 23. Further, a liquid discharge space 31 is formed around the periphery of the rotary chuck 21 to discharge the chemical liquid for the substrate W cleaning treatment. Further, a recovery space 32' is formed between the processing cup 23 and the partition wall around the liquid discharge space 31 to recover the chemical liquid 0 for the substrate w washing treatment, and is connected to the liquid discharge space 31 to guide the liquid medicine to The liquid discharge pipe 34 of the liquid discharge treatment device (not shown) is connected to the recovery liquid space 32 for a recovery pipe for guiding the chemical liquid to a recovery and reuse device (not shown). : Is it useful to prevent the substrate from being placed above the processing cup 23? The liquid medicine is directed to the scattered protective member 24. The protector 24 is formed by a shape that is symmetrical with respect to the rotating shaft 25. The inner surface of the upper end portion of the protector 24 is covered with a belly and a weir. The drain guide groove 41 having a cross section is formed in a long shape. The inner surface of the lower end portion of the guard member 24 is formed with a recovery liquid guiding portion 42 composed of a slope on the outer side 97100774 18 200836993. A partitioning wall 33 for accommodating the processing cup 23 is formed in the vicinity of the end of the recovery liquid guiding portion 42 to be separated from the protecting member 24, and a ball-and-screw mechanism or the like is connected; ). The protective member lifting and lowering drive mechanism is disposed at a recovery position of the recovery liquid guiding portion 42 opposite to the outer peripheral end surface of the substrate W held by the rotating chuck 21, and the liquid discharge guide

The groove 41 moves up and down between the groove 41 and the liquid discharge position facing the outer peripheral end surface of the substrate w held by the rotary chuck 21. When the protector 24 is located at the recovery position (the position of the protector 24 shown in FIG. 3), the chemical liquid scattered outward from the substrate w is guided by the recovered liquid guiding portion 42 to the returning liquid space 32' through the recovery pipe 35. . On the other hand, when the lecture piece μ is located at the liquid discharge position, the liquid medicine which is scattered outward from the substrate W is guided to the discharge space 31 by the discharge groove 41, and is discharged through the discharge pipe 34. The discharge and recovery of the chemical liquid are carried out by the above configuration. Further, when the chuck chuck 21 is carried into the substrate W, the guard lift driving mechanism moves the protector "μ retract=to the lower position of the draining position' to such that the upper end portion of the protector 24 is located at the lower rotating chuck 21 Keep the substrate & height at a low position. Above the purely rotating chuck 21, a disk-shaped blocking plate 22 having an opening at the center portion is provided. The shaft 29' is disposed in the vertical downward direction from the vicinity of the front end of the arm 28 to the support shaft 29<the lower end is provided with a blocking plate 22 opposed to the upper surface of the substrate which is held by the rotating chuck 21. The inside of the support shaft 29 is inserted through an open milk supply path 3G that communicates with the shutter 22. Nitrogen gas is supplied to the nitrogen supply path 3{) ((6). The nitrogen gas is supplied to the substrate 97100774 200836993 when it is subjected to a drying treatment after the pure water cleaning treatment. Further, the inside of the nitrogen supply path 30 is inserted and connected to the cover. The pure water supply pipe 39 of the opening of the breaking plate 22 is supplied to the pure water supply pipe 39, pure water, etc. The blocking plate lifting drive mechanism 37 and the blocking plate moving mechanism 38 are connected to the arm 28. The blocking plate lifting drive mechanism 37, the shutter 22 is moved up and down between a position close to the upper surface of the substrate w held by the rotating clip 21 and a position away from the upper portion of the rotating lost disk 21. Further, the blocking plate rotation driving mechanism 38 makes The blocking plate 22 is rotated. (1 - 3) Configuration and operation of the substrate reversing moving device Next, the configuration of the substrate reversing moving device 7 will be described with reference to the drawings. Fig. 4 is a view showing the configuration of the substrate reversing moving device 7 of Fig. 1. Fig. 4 is a side view of the substrate reverse moving device 7, and Fig. 4(b) is a plan view of the substrate reverse moving device 7. Further, Fig. 5 is a perspective view showing the appearance of the substrate reverse moving device. Figure 6 is a view showing the portion of the substrate reverse moving clothes 7 As shown in Fig. 4, the substrate reversing movement stepping mechanism 30 is formed. The reversing mechanism 7 and the reversing mechanism 7° include the first supporting member 7 and the second supporting member 79. 73a, 73b, π & 2 support member 72, member 75, Gudi 1 movable member 74, second movable portion 79. Cup mechanism 77, rotating mechanism 78 and seat plate as shown in the factory, I do not, brother 1 The supporting member 71 is composed of a haw-shaped member. The six bar-shaped material supports the pin 73a by six rod-shaped extending plates. The respective ends of the cow are respectively provided with a base, as shown in Fig. 6, The first Z support member 72 is also composed of six rod-shaped members extending radially from 97100774 20 200836993. Substrate support locks are provided in the respective 6 pieces. Each of the ends of the parts is further provided in the present embodiment. Although the first and second support strains 71 support: the cow 7 b 72 may be any other number of members of any shape, for example, having a circular plate or a polygonal shape along the periphery of the plurality of substrate support pins 73a; T; The first movable member 74 of Fig. 5 is fixed to the _ end of the movable member 74 by a square structure 71. The first movable structure: the end money is connected to the link mechanism 77. Similarly, the second movable structure of Fig. 6 is formed in a chevron shape. The second support member 72 is fixed to the end of the second movable member 75. The second movable member The other end of the 75 is connected to the link mechanism 77. The link mechanism 77 is attached to the rotating shaft of the rotating mechanism 78. The link mechanism 77 and the rotating mechanism 78 are attached to the fixed plate. The link mechanism 77 of Fig. 5 has a built-in air pressure. In the cylinder or the like, the first movable member 74 and the second movable member 75 can be selectively switched between the phase separated state and the close state. Further, the rotating mechanism 78 has a motor or the like built in, and the transmission link mechanism 77 can be used. The first movable member 74 and the second movable member 75 are rotated about the horizontal axis by, for example, 18 degrees. As shown in Fig. 4, the moving mechanism 3 includes a base 31, a pair of transporting conveyances 3a, a linear motion mechanism 3b, a driving portion 3c, a coupling member 3d, and a pair of sliding blocks 3e. Further, in Fig. 4 (1)), some members such as the joining member 3d are not illustrated for the sake of simplicity. A pair of transport rails 3& are fixed to the base 31 in parallel with the v direction. 97100774 21 200836993 A pair of sliders 3e are slidably attached to a pair of transport lanes 3a. A seat plate portion 79 of the reversing mechanism 70 is attached to the slide block 3e. The linear motion mechanism 3b is composed of, for example, a ball screw mechanism and an electric cylinder in which a motor that gives a driving force is incorporated. A drive unit 3c is provided in the linear motion mechanism 3b. The driving portion 3c is coupled to the seat plate portion 79 by the coupling member 3d. In such a configuration, the linear motion mechanism 3b moves the driving portion 3c in a direction parallel to the transport lane 3a, whereby the reversing mechanism 7b reciprocates in the v direction along the transport rail. Here, the operation of the substrate inversion moving device 7 will be described with reference to the drawings. First, the substrate w is carried into the substrate inversion moving device 7 by the loading robot IR (Fig. In this case, the reversing mechanism 7 moves to the end portion of the loading robot IR side as described above in the transport path (hereinafter referred to as the second transfer position substrate W in the vertical direction of the first movable member 74 and the second movable member 75). In the state in which the upper phase is separated, the loading robot IR transfers to the plurality of substrate supporting pins 73b of the second supporting member 72. Next, as shown in Fig. 4(a), by the action of the link mechanism 77, The movable member 74 and the second movable member 75 are switched to be in a state of being close to each other in the vertical direction. Thereby, both surfaces of the substrate W are held by the plurality of substrate supporting pins 73a and 73b, respectively, and then, as shown in Fig. 4(b), The reversing mechanism 7 is moved in the V direction to the side of the substrate transfer robot (3) of FIG. 1 on the pair of transport lanes %, and the first movable member 74 and the second movable member 75 are wound around the U direction in accordance with the operation of the rotation mechanism 78. The shaft is rotated by 180 degrees. Thereby, the substrate w and the second movable member 74 and the second movable member 75 are taken together by the plurality of substrate supporting pins 73a provided on the second supporting members 97100774 22 200836993 71 and the second supporting member 72, 73b, and rotated by 180 degrees. Thus, the substrate W is reversed by the inversion mechanism 70 At the same time, the reversing mechanism 70 moves to the end portion of the substrate transfer robot CR side (hereinafter referred to as the second transfer position) on the transport path 3a. Next, with the operation of the link mechanism 77, the first movable member 74 and the second movable member 75 are switched into a state of being separated in the vertical direction. In this case, the substrate transfer robot CR is reversely moved from the substrate. The device 7 carries out the substrate W. On the other hand, when the substrate w is carried into the substrate inversion moving device 7 by the substrate transfer robot CR, the substrate w is reversed by the reverse f structure 7 〇 + reversed while moving. In the vicinity of the loading robot IR, the substrate W is carried out from the substrate inversion moving device 7 by the loading robot IR. _ (1-4) The respective configurations of the loading robot and the substrate transfer robot are shown in Fig. 7 Fig. 1 is a plan view showing the configuration of the loading robot (7) and the board moving robot (Fig. 7(a) shows the configuration of the multi-joint arm of the loader, Fig. 7(b) Indicates the structure of the multi-joint arm of the substrate transfer robot CR Among them, in Fig. 7 (4) and (8), the clockwise direction is + 0 direction on the paper surface, and the paper surface is -Θ direction. τ々π is loaded into the robot as shown in Fig. 7(a). R is provided with a pair of transfer arms am4 and cm4 for holding the substrate w, and for moving the pair of transfer arms 4, cm4 97100774 23 200836993 independently and independently with respect to the loading robot body IRH. Rotating and driving the robot body coffee port in the direction of the axis = drive mechanism (not shown); lifting and lowering the load in the τ direction: • lifting and lowering mechanism of the body 1RH (not shown); And, in the u direction moving mechanism portion for loading the robot body IRH in the dead movement. Solid: The drive mechanism -, am2, am3, and (5), (5) (5) are multi-level, and can be advanced and retracted in the horizontal direction under the posture of the transport arm am4 and cin4. - The transfer arm (10) 4 is above the other transfer arm (10) = the transfer arm (10) 4, both of which are retracted to the initial state of the loading robot τ' such transfer arms - "superimposed in the up and down direction. The moving body (10) is driven by the control unit 4 (indicated by Figure D, the mechanism (4), 2, am3, and (5) (5) (5). The drive: the mechanism "am3 and the (4) drive mechanism is used to make the pair of transfer arms (10), ^ = = up to: steel wire and pulleys, etc.. With such an action::::,, 4 are directly assigned to the power, and can be moved along the horizontal direction of the machine ^ person 1R transfer arm (10) 4, Cm4 can be moved in the direction of supporting the base I::::" to rotate in the direction of the ~ and can be stretched. ps is mounted on the top of the two arm (10) 4, (10) 4 with a plurality of substrate support parts in the "form" It is placed on the upper side of the transfer arms affl4 and cm4. 97100774 24 200836993: The four substrate support portions Psldl are supported by the substrate support portion Psldl. The substrate support portion PS is supported. The number of S is supported. It is not limited to the number of "solid f. 4% of the support substrate is provided. The inversion mechanism 70 of the base mechanism 7 is located at the first transfer position, and is a person 1! To the position of the 7-square arm (10) 4, (10) 4 - the reverse moving device 2 toward the substrate, the direction is forward, thereby the reverse machine 7〇交接板?. By: FIG. 7(b), the substrate transfer robot CR includes a pair of transfer arms bm4 and dm4 for mutually opposing the substrates The robot body q is moved forward and backward, and the forward and backward drive mechanisms w, bm2, bm3, and dml, dm2, which are too rigidly twisted and twisted, drive the substrate conveyor to drive the substrate transfer mechanism (not shown); The lifting drive mechanism (not shown) for transporting the robot body C 4 on the τ side: the slab substrate. The j retracting drive mechanisms bna, bm2, bm3, and dna, dm2, and dm3 are multi-close: type, which can maintain a pair When the transfer arms bm4 and dm4 are moved forward and backward in the horizontal direction, the transfer arm bm4 is returned to the upper side of the substrate transfer robot body CRH above the transfer arm bm4 and dm4 above the other transfer arm 4, 4 Then, the transfer arms bm4 and dm4 overlap in the vertical direction. The substrate transfer robot main body CRH drives the advance/retract drive mechanisms bm!, bm2, bm3, and dml, dm2, and dm3 in accordance with the instruction of the control unit 4 (FIG.). 200836993 The drive mechanism bml, bm2, hm] j 1 Sudede ^, bm3 and dnU, clin2, dm3 have the function of driving the mu bxian, you set up a pair of moving arms bm4, dm4 motor, wire and pulley. By u / τ, (c) χ this special institution, A pair of transport # dm4 is directly given the driving force and retreats. > Ding Lijun hunts this 'transport arm bm4, dm4 can be dead in ancient garbage』 』 in the state of supporting the substrate f in the T direction, Rotate in the direction of ±θ and expand and contract. Further, a plurality of substrate supporting portions PS are mounted on the upper surfaces of the transfer arms bm4 and dm4 of the substrate transfer robot (3). In the t-th embodiment, the substrate support portions PS are mounted on the substrate w' placed on the upper surfaces of the transfer arms bm4 and dm4 slightly and evenly on the outer periphery thereof. The substrate W is held by the four substrate supporting portions PSjt. In addition, the number of the substrate supporting portions is not limited to four, and the number of the substrates f can be stably supported. When the reaction mechanism 7 of the substrate inversion moving mechanism 7 is located at the second transfer position, the substrate transfer robot CR advances any of the transfer arms bm4 and dm4 toward the substrate reverse moving device "", thereby counteracting The rotating mechanism 70 is connected to the substrate w. Further, in the present embodiment, the loading robot IR and the substrate transfer robot CR are both examples of a pair of arms having a pair of transfer arm grips 4, cm4, and dm4, but the robot R and the substrate are loaded. Either or both of the transfer robots CR may be an arm type having only one transfer arm. (1 - 5) Example of substrate transfer step Next, an example of the transfer process of the substrate W will be described. However, the substrate transfer is not limited to the following. FIG. 8 is a flow chart showing a procedure of transporting the substrate W. As shown in Fig. 8, first, the reversing mechanism 70 of the substrate reversing moving mechanism 7 is located at the first transfer position on the IR side of the loader. The loading robot IR takes out the 1 plate f from the carrier 1 and delivers it to the substrate reverse moving device 7 (step S1).

Next, the inversion mechanism 7 of the substrate inversion moving device 7 reverses the substrate W received from the loading robot IR, and moves in the v direction to the second transfer position on the base transfer state CR side (step S2). . Next, the substrate transfer apparatus Λ CR is reversely moved from the substrate and the substrate W is picked up (step S3). Then, the substrate transfer robot (3) invites the substrate to any of the processing units MP1 to MP8 (step S4). Then, the substrate is processed by the above-described processing unit (step (6). Then, the substrate transfer robot „the above-described processing unit carries out the processing, and then the substrate transport robot CR reverses the substrate w 乂 and the β substrate. Device 7 (step) Next, the 'substrate (four) moving device 7 inverts the substrate W received by the recording board while being along the parent side of the v IR side (step S8). Then, the loader is crying IR from The substrate reversal moving device 7 receives the substrate? ( : The loading robot R stores the substrate w at 9)° (B 6) The effect of the first embodiment is based on the substrate at the substrate (10) inversion according to the present embodiment. The mobile device 7 has a function of transferring the substrate W between the substrate CR of the loading robot iR, and a substrate reversing mechanism for transposing the substrate w of 97100774 27 200836993 In other words, the reversing mechanism 7 is reciprocally moved linearly between the second transfer position and the second transfer position by the moving mechanism 30 of the substrate reverse moving device 7, and is loaded into the robot 基板 substrate transfer robot CR. Substrate w And a substrate transfer

Thereby, the substrate transfer robot CR is on! The transport step of the sheet substrate w is a two-step process from the substrate reversal moving device 7 to the processing unit and the transfer from the processing unit to the substrate reversal moving device 7. Thus, since the transfer step of the substrate transfer robot (3) can be reduced, the throughput of the substrate W processing is increased. Further, since the delivery unit 3 including the substrate inversion moving device 7 is disposed at the position of the transfer region c between the loading robot IR and the substrate transfer robot CR, it is not necessary to change the configuration of the predetermined substrate processing device (the so-called platform configuration) ). Therefore, an increase in the manufacturing cost of the substrate processing apparatus 1 can be suppressed. (2) Second Embodiment (2 - 1) Configuration of Substrate Processing Apparatus Fig. 9 is a plan view of a substrate processing apparatus in which the second embodiment is applied. As shown in FIG. 9, the configuration of the substrate processing apparatus i〇〇a of the second embodiment differs from the configuration of the substrate processing apparatus 1〇0 of the first embodiment in that the interface 3 includes a substrate inversion. The mobile device 7a, instead of the substrate, reverses the mobile device 7. Hereinafter, this point will be described with reference to the drawings. (2-2) Configuration and Operation of Substrate Reversal Moving Device FIG. 10 is a schematic view showing the configuration of the substrate reversing moving device 7a of FIG. 97100774 28 200836993 Fig. 10(a) is a plan view showing a side view of the substrate reverse moving device 7a. As a base, as shown in Fig. 10(a), the substrate reverses the moving device? The constituent fish of a is as described above. The configuration of the substrate reverse moving device 7 (Fig. 4) differs in that the moving mechanism 3〇a is provided instead of the moving mechanism 3〇. The moving mechanism 3〇& includes a base 31, a rotating shaft 3g, and a motor 3f. The motor 3f is fixed to the base 31. The shaft of the motor 3f is connected to the lower surface of the seat plate portion 79 through the rotating shaft. With such a configuration, as shown in Fig. (8), the reversing mechanism 70 is rotatable in the direction of the soil θ (the axis about the τ direction). With respect to the reversing mechanism 7 of the substrate reversing moving device 7a, the substrate w can be transferred from the delivery side s on the opposite side of the rotating mechanism 78. In the present embodiment, the substrate reversal moving device is disposed on the connecting line between the position of the human-mounted device IR when the substrate W is delivered and the position at which the substrate CR is transferred when the substrate w is transferred. Next, the operation of the substrate reversal moving device of the present embodiment will be described. • First, the loading robot 1R moves to a position opposite to the substrate reverse moving device 7a. Further, the moving mechanism 3〇a rotates the reversing mechanism 7〇, thereby causing the delivery side S to face the loading robot 110. In this case, one of the loading arms of the loading robot IR advances in the advancing and retracting direction VI parallel to the v direction, thereby moving the substrate w into the substrate reversal moving device 7a. Then, the reversing mechanism 70 is rotated in the 0 direction around the rotating shaft 3g. When the rotation is 18 inches, the first movable member 74 and the second movable structure 75 of the reversing mechanism 70 are rotated by 18 degrees around the axis of the horizontal direction in accordance with the operation of the rotating mechanism 78. 97100774 29 200836993 Therefore, while the substrate w is reversed, the delivery side s of the reversing mechanism 70 is opposed to the substrate transfer robot CR. In this state, the transfer arm of one of the substrate transfer robots CR advances in the advancing and retreating direction V2 in the parallel direction with respect to the V side, whereby the substrate W is carried out from the substrate inversion moving device 7a. On the other hand, when the substrate f is carried into the substrate reverse moving device 7a by the substrate transfer robot CR, the substrate W is reversed by the inversion mechanism 70 while the reverse mechanism 7 is being used. Rotate, hand over $S opposite the manned robot IR. In this state, the substrate w is carried out from the substrate inversion moving device 7a by the loading robot IR. (2 - 3) The effect of the second embodiment is the substrate processing apparatus according to the present embodiment, the substrate reverse moving clothes 7a, and the reciprocating mechanism for transferring the substrate w between the loading robot IR and the substrate transfer robot (3). The function, and the substrate inversion mechanism used to invert the substrate w. In other words, the reversing mechanism 70 is rotationally moved by 180 degrees between the first transfer direction in the advancing and retracting direction and the second transfer direction in the advancing and retracting direction V2 by the moving mechanism 30a' of the substrate inversion moving device #=. The transfer of the substrate W and the inversion of the substrate w are performed between the loading robot IR and the substrate transfer robot (3). Thereby, the substrate transporter (4) transport step of the cymbal substrate w is carried out in two steps: transport from the substrate processing reverse processing unit to the conventional processing unit, and transfer from the processing unit to the substrate reverse transport unit 7a. 'Reduce, because the substrate conveyor can be reduced! ^Transfer step, so the processing capacity of the substrate W processing. 97100774 30 200836993 Further, since the delivery unit 3 including the substrate inversion moving device 7a is disposed at the position of the transfer region c between the loading robot IR and the substrate transfer robot CR, it is not necessary to change the configuration of the predetermined substrate processing device (so-called , the composition of the platform). Therefore, it is possible to suppress an increase in the manufacturing cost of the substrate processing apparatus 10a. (3) Younger Embodiment 3 (3-1) Configuration of Substrate Processing Apparatus FIG. 11 is a plan view of a substrate processing apparatus in which the third embodiment is implemented. As shown in FIG. 11, the configuration of the substrate processing apparatus i〇〇b according to the third embodiment differs from the configuration of the substrate processing apparatus i00a of the second embodiment in that the fluid tank portions 2a and 2c and the processing unit are not provided. MP1, MP2, MP5, MP6, and the substrate inversion moving device 7a of the delivery unit 3 have a difference in arrangement, so the substrate processing apparatus 10b of the actual thin surface is composed of four processing units MP3 and MP4. MP7, MP8 constitutes. Hereinafter, the arrangement of the substrate inversion moving device 7a will be described with reference to the drawings. As shown in FIG. 11, the substrate reverse moving device 7a is disposed laterally separated by the connecting line with respect to the connecting line where the position of the robot IR is loaded when the substrate W is transferred and the position of the substrate transfer robot CR when the substrate W is transferred. The location. Thereby, when the loading robot IR stores or takes out the substrate w on the carrier 1, the direction of advancement and retreat of the transport arm, and the loading robot 反转!^ reverse the movement of the substrate. Between the loader crying IR rotation angle is less than 180 degrees. Fig. 12 is an explanatory view showing the arrangement of the substrate reverse moving device 7a of the third embodiment. 97100774 31 200836993 As shown in FIG. 12, for example, when the robot ir is rotated, and the forward/backward direction of the transfer arm is rotated from the V direction toward the carrier i toward the −Θ direction, for example, 12 degrees, the substrate is reversed. The moving device 7a is disposed at a position where the loader crying IR can transfer the substrate W to the substrate reverse moving device 7a. Next, the operation of the substrate reversal moving device of the present embodiment will be described. First, the loading robot IR moves to the center of the loader ID, and the direction of advancement and retraction of the carrying arm is rotated from the V direction toward the carrier 1 by, for example, 120 degrees. Further, the reversing mechanism 70 is rotated by the moving mechanism 3A (Fig. 1A), whereby the delivery side s (Fig. 1A) is opposed to the loading robot R. In this state, the substrate w is carried into the substrate inversion moving device by the loading arm of the loading robot IR in the advancing and retracting direction VI. Then, the reversing mechanism 70 is rotated by, for example, 12 degrees in the +0 direction and the substrate w is reversed. Thereby, as shown by the broken line, the delivery side s (Fig. 1A) of the reversing mechanism 7 is opposed to the substrate transfer robot CR. In this state, the transfer arm of one of the substrate transfer robots CR advances in the advancing and retracting direction V2 of, for example, 12 degrees in the v direction, whereby the substrate w is moved out of the substrate reversing device. On the other hand, when the substrate f is carried into the substrate reverse moving device 7a by the substrate transfer robot CR, the reverse mechanism 7 is rotated while the substrate w is reversed by the reversing mechanism 70 in accordance with the reverse operation. For example, 12 degrees to make the parent side S (Fig. 1A) face the loading robot IR. In this state, the substrate f is carried out from the substrate inversion moving device 7a by the loading robot IR. (3-2) Effect of Embodiment 3 97100774 32 200836993 The substrate device 7a according to the present embodiment also has a reciprocating C transport robot CR that reverses the movement of the transfer substrate W in the loader's crying f::f嶋' substrate Between = the function of the transfer mechanism. That is, the second transfer side toward the advancing and retracting side = plate/direction and toward the advancing and retreating direction V2: the moving mechanism of the substrate reversal moving device 7a is reversed; the transfer of the substrate w is reversed between R and the substrate is reversed. In this way, the substrate transfer robot (3) transports the one substrate W to two steps: from the substrate reverse moving device to the processing unit, and from the processing unit to the substrate reverse moving device. For example, since the transfer step of the substrate transfer robot CR can be reduced, the amount of processing for the substrate W processing is increased. Further, the substrate reversal 10 moving device 7a is provided at a position separated laterally by the connecting line with respect to the connecting line at the position where the robot IR is loaded when the substrate W is transferred and the position at which the substrate transfer robot W is transferred. By this, the loader's IR can transfer the substrate w between the carrier 1 and the substrate reverse moving device 7a by rotating at an angle of less than 18 degrees in the direction of the Θ. Further, the inversion mechanism 70 of the substrate inversion moving device 7a can transfer the substrate W between the loading robot and the substrate transfer robot CR by rotating at an angle of less than 180 degrees in the +0 direction. The time for loading the robot IR transport substrate W and the time when the substrate reverse moving device 7a delivers the substrate is shortened. As a result, the processing amount of the south substrate W processing can be further improved. (4) Other Embodiments 97100774 33 200836993 In the above embodiment The reversing mechanism 70 has a configuration in which the substrate w is reversed while sandwiching and holding the substrate W from both sides, but the reversing mechanism 70 may have another configuration. For example, the reversing mechanism may also have a guarantee In the above-described embodiment, after the substrate W is processed by any of the processing units, the substrate transfer robot CR transfers the processed substrate w to the substrate in the reverse state in which the substrate W is reversed on the opposite side of the substrate W. The example of the transfer device 7 and 7a is not limited thereto, and the processed substrate may be carried into another processing unit by the substrate transfer robot CR, and then the processing unit may be processed. In the third embodiment, the substrate reversal moving device 7a is disposed at a counterclockwise position centered on the rotation axis of the loading robot Ir in the V direction. However, the present invention is not limited thereto, and may be disposed in the above-described rotation. The axis is centered at the clockwise position. (5) The relationship between each component of the patent application and the components of the embodiment is as follows: _ The following describes the correspondence between each component of the patent application scope and the embodiment. For example, the present invention is not limited to the following examples. In the above embodiment, the transporting area c is an example of a carrying-out area, the carrier 1 is an example of a storage container, and the carrier placing unit 1& [I ft human machine $ human IR is an example of a first transport device, a substrate transport device. A case where a person CR is a second transport device.] The substrate reverse moving devices 7 and 7a are examples of a parent connection portion, and are reversed. The machine 70 is an example of a reversing mechanism, and the moving mechanism 3〇, 30 a is an example of a moving mechanism. 97100774 34 200836993 In the above embodiment, the second delivery position is a substrate that can be transferred between the devices (=4). Example of location, the first place ^ ^ in the second transport The position of the transfer substrate between the inverting device and the inverting device is set to be the column 'transport arm (10) 4, and the cra4 is the first support portion. The reference finger 4 is an example of the second support portion. 'Add 4, f further, in the above embodiment, The direction of advance and retreat n is the direction of the third direction. 'The material V2 is the T-axis of the material 2'. The direction of the earth is from the earth direction.

For example, the axis is slightly perpendicular to the axis, and the ϋ direction is the example in which the θ-axis direction is the second-axis direction, and the advancing and retracting axis direction is an example. ~d Other components of the patent range are also applicable to other components of the structure or function described in the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view of a substrate processing apparatus according to a first embodiment. Figure 2 is a side elevational view of the substrate processing apparatus of Figure 1. Fig. 3 is a cross-sectional view showing the configuration of a processing unit. 4(a) and 4(b) are schematic views showing the configuration of a substrate reverse moving device. Fig. 5 is a perspective view showing the appearance of a main portion of a substrate reverse moving device. Fig. 6 is a perspective view showing a part of the appearance of the substrate reverse moving device. Figures 7 (4) and (b) are diagrams! A plan view of the configuration of the loading robot and the earth-moving robot of the substrate processing apparatus. Fig. 8 is a flow chart showing a substrate transfer step. Fig. 9 is a plan view showing a second substrate processing apparatus for forming a shape. 97100774 35 200836993 FIGS. 10(a) and (b) are schematic views showing the configuration of the substrate reverse moving device of FIG. 9. Fig. 11 is a plan view showing a substrate processing apparatus according to a third embodiment. Fig. 12 is an explanatory view showing the arrangement of the substrate reverse moving device of the third embodiment.

[Description of main component symbols] 1 carrier la carrier mounting portion 2a to 2d fluid tank portion 3 delivery portion 3a transport lane 3b linear motion mechanism 3c driving portion 3d coupling member 3e sliding block 3f motor 3g rotary shaft 4 control portion 7, 7 a Substrate reverse moving device 21 Rotating plate 22 Blocking plate 23 Processing cup 24 Protector 24a Upper end 97100774 36 200836993

25 Rotary shaft 26 Treatment liquid supply pipe 27 Lower nozzle 28 Arm 29 Support shaft 30 Nitrogen supply path 30a Movement mechanism 31 Discharge space 32 Recovery space 33 Partition wall 34 Drain pipe 35 Recovery pipe 36 Clamp rotary drive mechanism 37 Breaker Lifting drive mechanism 38 Blocking plate rotation drive mechanism 39 Pure water supply pipe 41 Drainage guide groove 42 Recovery liquid guide portion 43 Partition wall storage groove 50 Process liquid nozzle 50 a Pure water nozzle 60 First motor 60a Second motor 61 First rotation shaft 97100774 37 78 79 100 , 100a , 100b 200836993 61a 62 62a 70 71 72 73a , 73b 74 • 75 76 77 101

Ami~am3 bml~bm3 cml~cm3 dml~dm3 am4, bm4 cm4, dm4 ABC 97100774 Second rotation axis first arm second arm reversing mechanism first support member second support member substrate support lock first movable member second Movable member fixing plate link mechanism rotation mechanism seat plate portion substrate processing device housing advance and retreat drive mechanism advancing and retracting drive mechanism advancing and retracting drive mechanism advancing and retracting drive mechanism transfer arm transfer arm processing area processing area transfer area 200836993 CR substrate transfer robot CRH substrate transfer robot body FFU fan Filter unit_ ID Loader IR Load robot IRH Load robot body MP1~MP8 Processing unit PS Substrate support unit S S Handover side T direction U direction V direction VI Advance and retreat direction V2 Advance and retreat direction W Substrate • 97100774 39

Claims (1)

200836993 X. Patent Application Range: 1. A substrate processing apparatus for processing a substrate having one surface and the other surface; comprising: a processing region for processing the substrate; a loading/unloading region for loading and unloading the substrate into the processing region; The processing area and the loading/unloading area are transferred to a delivery portion of the substrate; and the loading/unloading area includes a gusset mounting unit on which a storage container for accommodating the substrate is placed, and a first conveying device placed on the substrate The storage container of the container placing portion and the transfer portion transport the substrate; the processing region includes: a processing portion that performs a process on the substrate; and a second transfer I that is disposed between the transfer portion and the processing portion The transfer unit includes: a reversing mechanism that reverses one surface of the substrate and the other surface; and a strong moving mechanism that moves the reversing mechanism to the first and second reversing mechanisms The substrate is transferred between the substrates, and the substrate can be transferred between the second transfer device and the reversing mechanism. 2. The substrate processing apparatus according to claim 2, wherein in the moving mechanism, the reversing mechanism reciprocates linearly in a horizontal direction, and = returns to the above-mentioned first! A position where the earthing plate is transferred between the conveying device and the reversing mechanism, and a position at which the substrate can be transferred between the second conveying device and the reversing machine 97100774 200836993. 3. The substrate processing apparatus according to claim 4, wherein the transfer device has a first support portion that supports the substrate and is provided with a first support portion and the first support portion The reversing mechanism is connected to the substrate I with respect to the above-mentioned reversing mechanism! In the advancing and retracting direction, the second conveying device has a 帛2 support to be advanced and retractable, and the second supporting portion advances along the second advancing and retracting direction with respect to the reversing mechanism when the substrate is connected to the upper== The moving mechanism rotationally moves the rotating mechanism about an axis that is substantially perpendicular to a direction in which the first transfer direction is in the upward direction and a direction in which the second advancing and retracting directions are perpendicular to each other. In the processing apparatus, the reversing mechanism is disposed such that the rotation angle between the first delivery direction and the second and second delivery 2 is 180 degrees. 5. The substrate processing apparatus of claim 3 is reversed. The mechanism is configured such that the rotation angle between the ith intersection direction and the second party: is less than 18 degrees. " 6. According to the substrate processing apparatus of claim 5, the first conveyor of the basin is set to be along In the state in which the second axis direction of the first axis direction is orthogonal to the second axis direction of the first axis direction, the storage container of the wearer==t device mounting portion is housed and taken out, and the substrate is sandwiched between the two axes. Angle less than 18 In the direction of the third axis of the degree, the lower side of the 97100774 200836993 is the substrate for the above-mentioned reversing mechanism. 7·---------------------------------------------------------------------------------------------------------------------- The processing unit of the loading and unloading unit of the first transport unit and the second transport unit, and the transfer of the substrate between the unit and the upper and lower loading and unloading areas, the substrate processing method includes : the step of transferring the receiving portion of the μ mounting portion before the processing of the squeezing and squeezing container is carried out by the first conveying device; and the pre-processed substrate taken out is delivered to the above In the above-mentioned joint portion, the one surface and the other surface of the front substrate are reversed by the reversing mechanism, and the reversing mechanism is moved so that the second transfer device can be transferred from the front substrate to the front substrate. a step of transferring the pre-processed substrate from the delivery unit to the processing unit by the second transfer device; a step of processing the pre-processed substrate in the processing unit; • processing by the processing unit a step of transporting the processed substrate to the transfer unit by the second transfer device, wherein the transfer unit rotates the other surface of the processed substrate and the surface thereof by the reversing mechanism a reversing mechanism for transferring the processed substrate to the first conveying device from the delivery portion; and ??? receiving, by the first conveying device, the processed substrate from the delivery portion, and storing the processed substrate after the processing The above steps of accommodating the container. 97100774 42