KR100953010B1 - Substrate processing apparatus and substrate processing method - Google Patents

Abstract

The substrate inversion transfer device is constituted by an inversion mechanism and a movement mechanism. In the rotating mechanism, a motor or the like is built in, and the first movable member and the second movable member to which the first and second supporting members respectively supporting the substrate are fixed are circumscribed around a horizontal axis through the link mechanism. For example, it can be rotated 180 degrees. Moreover, a pair of conveyance rails are fixed on the base in parallel in the X direction. A pair of sliding blocks are attached to a pair of conveyance rails so that sliding is possible. The seat plate part of the reversing mechanism is attached to the sliding block. The linear motion mechanism reciprocates in the X direction along the conveyance rail by moving the drive part in the direction parallel to the conveyance rail.

Description

Substrate Processing System and Substrate Processing Method {SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD}

TECHNICAL FIELD This invention relates to the substrate processing apparatus and substrate processing method which perform a predetermined process to a board | substrate.

Background Art Conventionally, substrate processing apparatuses have been used to perform various processes on substrates such as semiconductor wafers, glass substrates for photomasks, glass substrates for liquid crystal display devices, and glass substrates for optical disks.

For example, Japanese Patent Laid-Open No. 2005-85882 discloses a substrate processing apparatus having a substrate inversion mechanism for inverting the front and rear surfaces of a substrate. In such a substrate processing apparatus, the board | substrate conveyance robot which conveys a board | substrate is arrange | positioned in the substantially center of a rectangular processing area | region. A plurality of substrate processing units (for example, four) are disposed to surround the substrate transport robot in the processing area. Further, the substrate inverting mechanism is arranged at a position accessible by the substrate transport robot in the processing region.

At one end of the processing area, an indexer unit having a plurality of cassettes for storing a substrate is provided. The indexer unit is provided with an indexer robot which takes out the substrate before the treatment from the cassette or houses the substrate after the treatment in the cassette.

In the above structure, the indexer robot takes out the substrate before the processing from one of the cassettes, passes it to the substrate transport robot, and receives the processed substrate from the substrate transport robot and stores it in the cassette.

When the substrate transfer robot receives the substrate before processing from the indexer robot, the substrate transfer robot passes the received substrate to the substrate inversion mechanism. The substrate inversion mechanism inverts the substrate received from the substrate transport robot so that the surface thereof faces downward. The substrate transfer robot receives the substrate inverted by the substrate inversion mechanism and carries the substrate into one of the substrate processing units.

Subsequently, when the substrate transfer robot finishes processing the substrate in any one of the above substrate processing units, the substrate transporting robot is taken out of the substrate processing unit and is passed back to the substrate inversion mechanism. The substrate inverting mechanism inverts the substrate subjected to the processing in the substrate processing unit so that the surface thereof faces upward.

Then, the substrate transfer robot receives the substrate inverted by the substrate inversion mechanism and passes it to the indexer robot. The indexer robot stores the processed substrate received from the substrate transport robot in a cassette.

In this way, the substrate before the process housed in the cassette is inverted by the substrate inverting mechanism, and after the treatment (process on the back surface of the substrate) is performed in the substrate processing unit, the substrate is inverted again by the substrate inverting mechanism to serve as the substrate after the treatment. It is stored in a cassette.

In the above conventional substrate processing apparatus, there is a case where a shuttle transport mechanism for intermediating transfer of substrates is provided between the indexer robot and the substrate transport robot. As a result, the indexer robot and the substrate transfer robot can efficiently carry out respective transfer operations without being restricted to the operation of each other.

However, when the above shuttle transfer mechanism and substrate transfer mechanism are provided in the substrate processing apparatus, the transfer process of the substrate transfer robot increases. Specifically, the substrate transfer robot is one substrate transfer, transfer from the shuttle transfer mechanism to the substrate transfer mechanism, transfer from the substrate transfer mechanism to the substrate processing unit, transfer from the substrate processing unit to the substrate transfer mechanism, And four transfer steps called transfer from the substrate transfer mechanism to the shuttle transfer mechanism.

Thus, the conveyance process by the board | substrate conveyance robot between a shuttle conveyance mechanism, a board | substrate inversion mechanism, and a some board | substrate processing part increases. Therefore, the processing rate of the substrate treatment decreases.

An object of the present invention is to provide a substrate processing apparatus and a substrate processing method capable of improving the throughput of substrate processing.

(1) A substrate processing apparatus according to an aspect of the present invention is a substrate processing apparatus for processing a substrate having one surface and the other surface, and includes a processing region for processing the substrate and a substrate into the processing region ( A carrying-in and out-portion area for accommodating and carrying out, and a receiving portion for exchanging a substrate between the processing area and the carrying-in / out area, wherein the carrying-out area includes a container placing part on which a storage container for storing a substrate is placed; A first conveying device for conveying the substrate between the container and the receiving container placed on the container placing portion and the receiving portion, wherein the processing region includes a processing portion for processing the substrate, the receiving portion and the processing portion; And a second conveying apparatus for conveying the substrate between the two receiving apparatuses, wherein the receiving part includes an inverting mechanism for inverting one surface and the other surface of the substrate with each other, and transferring and transferring the substrate between the first conveying apparatus and the inverting mechanism. Carrier and reverse And a moving mechanism for moving the inversion mechanism so that the substrate can be exchanged with the mechanism.

In the substrate processing apparatus, the inversion mechanism is moved by the moving mechanism in the delivery section so that the substrate can be exchanged between the first transfer device and the inversion mechanism. And a board | substrate is conveyed by a 1st conveying apparatus between the storage container and the receiver which were put in the container mounting part in the carrying-in / out area.

The inverting mechanism is moved by the moving mechanism so that one surface and the other surface of the substrate are inverted from each other by the inverting mechanism in the receiving portion, and at the same time, the substrate can be exchanged between the second transfer device and the inverting mechanism. And a board | substrate is conveyed by a 2nd conveyance apparatus between a hand receipt part and a process part in a process area.

In this way, the delivery unit has a function of a transfer mechanism for mediating the transfer of the substrate between the first transfer apparatus and the second transfer apparatus, and a function of an inversion mechanism for inverting the substrate. Thereby, the conveyance process by a 2nd conveying apparatus becomes two processes, conveyance from a delivery part to a processing part, and conveyance from a processing part to a delivery part with respect to one board | substrate. Therefore, since the conveyance process of a 2nd conveyance apparatus is reduced, the processing rate regarding the process of a board | substrate improves.

In addition, it is not necessary to change the configuration of the existing substrate processing apparatus (the configuration of the so-called platform) by providing the receiving portion including the inversion mechanism and the moving mechanism between the first conveying apparatus and the second conveying apparatus. . Therefore, an increase in the manufacturing cost of the substrate processing apparatus can be suppressed.

(2) The moving mechanism is provided with a reversal mechanism at a position where the substrate can be exchanged between the first transfer device and the reversal mechanism and at a position where the substrate can be exchanged between the second transfer device and the reversal mechanism. The linear movement may be performed by reciprocating in the horizontal direction.

In this case, at the time of linear movement of the inversion mechanism between the position where the substrate can be exchanged with the first transfer device and the position where the substrate can be exchanged between the second transfer device, Inverting and conveying of the board | substrate between a 1st conveying apparatus and a 2nd conveying apparatus are performed, and the conveyance process of a 2nd conveying apparatus is reduced. Thereby, the processing rate regarding the process of a board | substrate improves.

(3) The 1st conveying apparatus has a 1st support part provided so that advancing and retreating while supporting a board | substrate, a 1st support part is a 1st advancing and returning with respect to a reversing mechanism at the time of exchange of a board | substrate with an inversion mechanism. Direction, the second conveying apparatus has a second support portion provided to support the substrate and to be retracted at the same time, and the second support portion has a second advancing direction with respect to the inversion mechanism when the substrate is exchanged with the inversion mechanism. And the revolving mechanism may rotate the reversing mechanism about an axis approximately perpendicular to the first receiving direction facing the first retreat direction and the second receiving direction facing the second retreat direction.

In this case, the substrate is exchanged with the inversion mechanism by retreating in the first advance direction with respect to the inversion mechanism with which the first support portion of the first transport device is rotated by the movement mechanism.

Moreover, the board | substrate is exchanged with the said inversion mechanism by advancing in the 2nd advancing direction with respect to the inversion mechanism with which the 2nd support part of the 2nd conveyance apparatus was rotated by the moving mechanism.

As described above, the substrate is reversed and the first conveying device and the second conveying device are rotated at the time of the rotation movement of the reversing mechanism between the first receiving direction facing the first advancing direction and the second receiving direction facing the second advancing direction. Since the board | substrate is conveyed between and, the conveyance process of a 2nd conveyance apparatus is reduced. Thereby, the processing rate regarding the process of a board | substrate improves.

(4) The inversion mechanism may be arranged so that the rotation angle between the first delivery direction and the second delivery direction is 180 degrees.

In this case, when the first receiving direction and the second receiving direction are parallel, that is, when the first advancing direction of the first supporting part of the first conveying device and the second advancing direction of the second supporting part of the second conveying device are parallel. The inversion mechanism can convey a board | substrate between a 1st conveying apparatus and a 2nd conveying apparatus by rotating 180 degrees.

(5) The inversion mechanism may be arranged so that the rotation angle between the first delivery direction and the second delivery direction is smaller than 180 degrees.

In this case, when the first receiving direction and the second receiving direction are not parallel, that is, when the first advancing direction of the first supporting part and the second advancing direction of the second supporting part are not parallel, the reversal mechanism is smaller than 180 degrees. By rotating small, a board | substrate can be conveyed between a 1st conveying apparatus and a 2nd conveying apparatus. Thereby, the rotation angle of a reversing mechanism becomes small, and the conveyance time of the board | substrate between a 1st conveying apparatus and a 2nd conveying apparatus is shortened. As a result, the processing rate regarding the processing of the substrate can be further improved.

(6) The first conveying apparatus is provided so as to be movable in parallel in the first axial direction and accommodates the substrate with respect to the storage container placed on the container placing portion in a state of facing the second axial direction perpendicular to the first axial direction. The substrate may be taken out and sent to and received from the inverting mechanism in a state facing the third axial direction smaller than 180 degrees with respect to the second axial direction.

In this case, the rotational angle of the first conveying apparatus is reduced by performing the transfer of the substrate to the inverting mechanism in a state in which the first conveying apparatus faces the third axial direction smaller than 180 degrees with respect to the second axial direction. . Thereby, the conveyance time of the board | substrate between a storage container and a rice feed is shortened. As a result, the processing rate regarding the processing of the substrate can be further improved.

(7) A substrate processing method according to another aspect of the present invention includes a carry-in / out area including a container placing part and a first conveying device, a processing area containing a processing part and a second conveying device, a processing area and a carry-in / out area. A substrate processing method for processing a substrate by a substrate processing apparatus having a receiving and receiving unit for exchanging a substrate between the substrates, wherein the substrate before processing is taken out from the storage container placed on the container placing unit by the first transfer device, The step of passing the substrate before the processing to the receiver and the inverting mechanism on one side and the other surface of the substrate before the treatment by the inversion mechanism at the same time, and the transfer of the substrate before the treatment from the inversion mechanism to the second transfer device. A step of moving the inversion mechanism so that reception is possible; a step of conveying the substrate before processing by the second transfer device from the receiver to the processing unit; The step of processing the plate, the step of conveying the processed substrate processed by the processing unit from the processing unit to the receiving unit by the second transfer device, and the other side of the substrate and the one surface of the processed substrate by the inversion mechanism in the receiving unit, Moving the inversion mechanism so that the substrate can be exchanged from the receiver to the first transfer apparatus, and the substrate after the treatment is received from the receiver by the first transfer apparatus. It comprises the step of storing in a storage container.

A series of processes in the substrate processing method are as follows. First, the board | substrate before a process is taken out from the storage container mounted to the container mounting part by the 1st conveying apparatus, and the board | substrate before the process taken out is passed to a water receiver. Next, the inversion mechanism is moved by the inversion mechanism so that one surface and the other surface of the substrate before the processing are inverted with each other and the transfer of the substrate before the processing from the inversion mechanism to the second transfer device is made possible.

Subsequently, after the board | substrate before a process is conveyed by the 2nd conveying apparatus from a delivery part to a process part, the board | substrate before a process is processed by a process part. Next, the board | substrate after the process processed by the process part is conveyed from a process part to a water receiving part by a 2nd conveying apparatus.

Subsequently, the inversion mechanism is moved so that the other surface and one surface of the processed substrate are inverted from each other by the inversion mechanism in the receiver and at the same time, the transfer of the substrate after the treatment from the receiver to the first transfer device is enabled. Next, the board | substrate after a process is received from a receiver by the 1st conveying apparatus, and the board | substrate after the received process is accommodated in a storage container.

In this way, the delivery unit combines the function of the transfer mechanism for mediating the transfer of the substrate between the first transfer apparatus and the second transfer apparatus and the function of the inversion mechanism for inverting the substrate. Thereby, the conveyance process by a 2nd conveying apparatus becomes two processes, conveyance from a receiver and a process part, and conveyance from a process part to a receiver part with respect to one board | substrate. Therefore, since the conveyance process of a 2nd conveyance apparatus is reduced, the processing rate regarding the process of a board | substrate improves.

Moreover, the structure of the existing substrate processing apparatus (so-called so-called) is provided by providing a receiving part having a function of a conveying mechanism and a reversing mechanism between the first conveying apparatus and the second conveying apparatus. No configuration is required. Therefore, an increase in the manufacturing cost of the substrate processing apparatus can be suppressed.

According to the structure of this invention, since the conveyance process of a 2nd conveyance apparatus is reduced, the throughput of a substrate process improves.

EMBODIMENT OF THE INVENTION Hereinafter, the substrate processing apparatus and substrate processing method which concern on one Embodiment of this invention are demonstrated, referring drawings.

In the following description, the substrate refers to a semiconductor wafer, a glass substrate for a liquid crystal display device, a glass substrate for a plasma display panel (PDP), a glass substrate for a photomask, a substrate for an optical disk, and the like.

In addition, a chemical liquid is BHF (buffered hydrofluoric acid), DHF (dihydrohydrofluoric acid), hydrofluoric acid, hydrochloric acid, sulfuric acid, acetic acid, phosphoric acid, acetic acid, oxalic acid, for example. , Aqueous solutions such as hydrogen peroxide or ammonia, or mixed solutions thereof.

Hereinafter, the process using these chemical liquids is called chemical liquid processing. Usually, after the chemical liquid treatment is finished, the substrate is rinsed using the rinse liquid. The rinse liquid refers to an organic solvent such as pure water, carbonated water, ozone water, magnetic water, reduced water (hydrogen water) or ionized water, or IPA (isopropyl alcohol).

(1) First embodiment

(1-1) Structure of Substrate Processing Apparatus

1 is a plan view of a substrate processing apparatus according to a first embodiment. 2 is a side view of the substrate processing apparatus of FIG. In addition, in FIG. 1 and FIG. 2, the horizontal directions orthogonal to each other are defined as the X direction and the X direction, and the vertical direction is defined as the T direction. The same applies to the drawings described later.

As shown in FIG. 1, the substrate processing apparatus 100 has processing regions A and B, and has a conveyance region C between the processing regions A and B. As shown in FIG.

In the processing area A, the control part 4, the fluid box parts 2a and 2b, the processing parts MP1 and MP3 and the processing parts MP2 and MP4 are arranged.

As shown in FIG. 2, the processing parts MP2 and MP4 are provided in the upper part of the processing parts MP1 and MP3, respectively.

The fluid box parts 2a and 2b of FIG. 1 are supplied with chemical liquids and pure water to the processing units MP1 and MP2, supplying chemical liquids and pure water to the processing units MP3 and MP4, and processing units MP1 and MP2 and processing units MP3, respectively. And fluid-related equipment such as piping, joints, valves, flow meters, regulators, pumps, thermostats, and chemical storage tanks related to drainage from MP4).

In the processing units MP1 and MP3, the chemical liquid processing by the chemical liquid described above is performed. In addition, in the processing units MP2 and MP4, the chemical liquid processing by the chemical liquid described above is performed. After the chemical liquid treatment, a rinse treatment with pure water or the like is performed.

In the processing area B, the fluid box parts 2c and 2d, the processing parts MP5 and MP7 and the processing parts MP6 and MP8 are arranged. The processing units MP6 and MP8 are provided above the processing units MP5 and MP7, respectively.

The fluid box parts 2c and 2d of FIG. 1 are supplied with chemical liquids and pure water to the processing units MP5 and MP6, supplying chemical liquids and pure water to the processing units MP7 and MP8, and processing units MP5 and MP6 and processing units MP7, respectively. And fluid-related equipment such as piping, joints, valves, flow meters, regulators, pumps, thermostats, and chemical storage tanks related to drainage from MP8).

In the processing units MP5, MP7, MP6, and MP8, the same chemical liquid processing as the above-described processing units MP1, MP3, MP2, and MP4 is performed.

Hereinafter, when referring to any one of the process part MP1, MP3, MP5, MP7 and the process part MP2, MP4, MP6, MP8, it is called a process part.

In the present embodiment, a chemical liquid supply system for supplying hydrofluoric acid, aqueous ammonia, hydrogen peroxide, and hydrochloric acid as the chemical liquid to the treatment unit is provided in the fluid box portions 2a to 2d.

In the conveyance area C, a substrate conveyance robot (CR) is provided. On one side of the processing regions A and B, an indexer ID for carrying in and out of the substrate is disposed.

The indexer ID includes a plurality of carrier placing parts 1a and an indexer robot IR. On each carrier mounting part 1a, the carrier 1 which accommodates a board | substrate is mounted. In the present embodiment, the front opening Unified Pod (FOUP) for storing the substrate in a sealed state is used as the carrier 1, but the present invention is not limited thereto, and the SMIF (Standard Mechanical InterFace) pod and OC ( Open Cassette). The indexer robot IR is configured to be movable in the X direction in the indexer ID.

Here, in this embodiment, the water-receiving part 3 is provided in the position of the conveyance area | region C between the indexer ID and the board | substrate conveyance robot Cr. The receiving part 3 includes a substrate inversion transfer device 7 which inverts the front and back surfaces of the substrate. Here, the surface of a board | substrate refers to the surface in which various patterns, such as a circuit pattern, are to be formed. The substrate inversion transfer device 7 can linearly reciprocate in the X direction on a pair of transfer rails 3a in the delivery section 3.

In such a configuration, the indexer robot (IR) takes out the substrate before the process from the carrier 1 and passes it to the substrate inversion transfer device 7. On the contrary, the substrate after the treatment is transferred to the substrate inversion transfer device ( 7) and return to the carrier (1).

In addition, the substrate inversion transfer device 7 inverts the substrate received from the indexer robot IR and moves the inverted substrate along the X direction to the vicinity of the substrate transfer robot CR. Let's do it. Details will be described later.

In addition, the substrate transfer robot (CR) conveys the substrate received from the substrate inversion transfer device 7 to the designated processing unit, or transfers the substrate received from the processing unit to another processing unit, or the substrate inversion transfer device. Hand it to (7).

The control unit 4 comprises a computer including a CPU (central processing unit), the operation of the processing units MP1 to MP8 in the processing areas A and B, the substrate inversion transfer device 7 and the substrate in the transfer area C. The operation of the transfer robot (CR) and the operation of the indexer robot (IR) of the indexer (ID) are controlled.

Moreover, the substrate processing apparatus 100 is installed in the clean room etc. in which downflow (downflow) is formed. Further, downflows are also formed in the processing sections MPl to MP8 and the transport region C, respectively.

(1-2) Configuration of Processing Unit

Next, the structure of the process parts MP1-MP8 is demonstrated, referring drawings. In addition, since each structure of the process part MP1-MP8 is the same, the structure of the process part MP1 is demonstrated typically below.

In this processing part MPl, the process of washing a board | substrate, the process of etching the film | membrane on a board | substrate, the process of removing the polymer dregs (for example, the residue of a resist) on a board | substrate, etc. are performed. In the following description, a process of cleaning a substrate will be described as an example.

3 is a cross-sectional view showing the configuration of the processing unit MP1. As shown in FIG. 3, the processing part MP1 is provided in the housing 101 and its inside, and the vertical axis | shaft which passes through the substantially center of a board | substrate, while supporting a board | substrate substantially horizontally. And a fan filter unit (FFU) installed to block the upper opening of the housing 101 and the spin chuck 21 rotating around. Downflow (downflow) is formed in the housing 101 by the fan filter unit FFU. In addition, the fan filter unit (FFU) consists of a fan and a filter.

The spin chuck 21 is fixed to the upper end of the rotating shaft 25 rotated by the chuck rotation driving mechanism 36. The substrate is rotated in a state of being horizontally gripped by the spin chuck 21 when performing a cleaning treatment with a chemical liquid.

The outer side of the spin chuck 21 is provided with a first motor 60. The first rotational shaft 61 is connected to the first motor 60. Moreover, the 1st arm 62 is connected to the 1st rotation shaft 61 so that a horizontal direction may extend, and the process liquid nozzle 50 is provided in the front-end | tip of the 1st arm 62. As shown in FIG. The processing liquid nozzle 50 supplies a chemical liquid for cleaning the substrate onto the substrate.

The second motor 60a is provided outside the spin chuck 21. The second rotating shaft 61a is connected to the second motor 60a, and the second arm 62a is connected to the second rotating shaft 61a. Moreover, the pure water nozzle 50a is provided in the front-end | tip of the 2nd arm 62a. The pure water nozzle 50a supplies pure water on a substrate in the rinsing treatment after the cleaning treatment. When the cleaning process is performed using the processing liquid nozzle 50, the pure nozzle 50a is evacuated to a predetermined position.

The rotating shaft 25 of the spin chuck 21 consists of a hollow shaft. The processing liquid supply pipe 26 is fitted inside the rotary shaft 25. The treatment liquid supply pipe 26 is supplied with a chemical liquid such as pure water or a cleaning liquid. The processing liquid supply pipe 26 extends to a position near the bottom surface of the substrate held by the spin chuck 21. At the distal end of the processing liquid supply pipe 26, a lower surface nozzle 27 for discharging the chemical liquid toward the center of the lower surface of the substrate is provided.

The spin chuck 21 is housed in the processing cup 23. Inside the processing cup 23, a cylindrical partition wall 33 is provided. Further, in the form surrounding the spin chuck 21, a drainage space 44 for draining the chemical liquid used for the cleaning process of the substrate is formed. Further, in the form of enclosing the drainage space 44, a recovery liquid space 32 for recovering the chemical liquid used for the cleaning process of the substrate is formed between the processing cup 23 and the partition wall 33. have.

The drainage pipe 44 is connected to a drainage pipe 34 for guiding a chemical liquid to a drainage processing device (not shown), and to a recovery liquid space 32, a recovery material recycling apparatus (not shown). A recovery pipe 35 for guiding the chemical liquid is connected.

Above the processing cup 23, a guard 24 for preventing the chemical liquid from the substrate from scattering outward is provided. The guard 24 has a shape that is rotationally symmetrical with respect to the rotation shaft 25. On the inner surface of the upper end part of the guard 24, the drain guide 41 which has a square cross section is formed in ring shape.

On the inner surface of the lower end of the guard 24, a recovery liquid guide portion 42 formed of an inclined surface inclined downwardly is formed. In the vicinity of the upper end of the collection liquid guide part 42, a partition wall storage opening 43 for accommodating the partition wall 33 of the processing cup 23 is formed. A guard lift drive mechanism (not shown) formed of a ball screw mechanism or the like is connected to the guard 24.

The guard lifting and driving mechanism includes a guard 24 having a recovery position in which the recovery liquid guide portion 42 opposes the outer circumferential end face of the substrate held by the spin chuck 21, and a drainage guide tool. 41 is moved up and down between the drainage position opposite to the outer circumferential end face of the substrate held by the spin chuck 21.

When the guard 24 is in the recovery position (the position of the guard 24 shown in FIG. 3), the chemical liquid scattered outward from the substrate is guided by the recovery liquid guide part 42 to the recovery liquid space 32. Then, it is recovered through the recovery pipe 35. On the other hand, when the guard 24 is in the drainage position, the chemical liquid scattered outward from the substrate is guided to the drainage space 44 by the drainage guide 41 and drained through the drainage pipe 34. .

With the above configuration, the liquid liquid is drained and recovered. In addition, at the time of carrying in the board | substrate to the spin chuck 21, the guard lifting and driving mechanism retracts the guard 24 below the drainage position, and the upper end part 24a of the guard 24 is a spin chuck ( It moves so that it may become a position lower than the holding height of the board | substrate of (21).

Above the spin chuck 21, a disk-shaped blocking plate 22 having an opening in the center is provided. The support shaft 29 is provided vertically downward from the vicinity of the tip of the arm 28, and the lower surface of the support shaft 29, the upper surface of the substrate holding the blocking plate 22 held by the spin chuck 21 It is mounted in the form opposite to.

Inside the support shaft 29, a nitrogen gas supply passage 40 communicating with the opening of the blocking plate 22 is fitted. Nitrogen gas N ₂ is supplied to the nitrogen gas supply passage 40. This nitrogen gas supply path 40 supplies nitrogen gas to a board | substrate at the time of the drying process after the rinse process with pure water. In addition, a pure water supply pipe 39 communicating with an opening of the blocking plate 22 is fitted inside the nitrogen gas supply passage 40. Pure water and the like are supplied to the pure water supply pipe 39.

The arm 28 is connected to a blocking plate lift driving mechanism 37 and a blocking plate rotating driving mechanism 38. The blocking plate elevating driving mechanism 37 includes a position close to the upper surface of the substrate held by the spin chuck 21 and a position separated upward from the spin chuck 21. Move up and down between. In addition, the blocking plate rotation driving mechanism 38 rotates the blocking plate 22.

(1-3) Structure and Operation of Substrate Reverse Transfer Device

Next, the structure of the board | substrate reverse movement apparatus 7 is demonstrated, referring drawings.

4 is a schematic configuration diagram of the substrate inversion transfer device 7 of FIG. 1. FIG. 4A is a side view of the substrate inversion transfer device 7, and FIG. 4B is a top view of the substrate inversion transfer device 7. 5 is a perspective view which shows the external appearance of the principal part of the board | substrate reverse shift apparatus 7, and FIG. 6 is a perspective view which shows the external appearance of a part of the board | substrate reverse transfer apparatus 7. As shown in FIG.

As shown in FIG. 4, the board | substrate reverse movement apparatus 7 is comprised by the inversion mechanism 70 and the movement mechanism 30. As shown in FIG.

The reversing mechanism 70 includes a first support member 71, a second support member 72, a plurality of substrate support pins 73a and 73b, and a first movable member 74. And a second movable member 75, a fixed plate 76, a link mechanism 77, a rotation mechanism 78, and a seat plate portion 79.

As shown in FIG. 5, the 1st support member 71 is comprised from six rod-shaped members extended radially. The board | substrate support pin 73a is provided in the front-end | tip part of six rod-shaped members, respectively.

Similarly, as shown in FIG. 6, the 2nd support member 72 also consists of six rod-shaped members extended radially. The board | substrate support pin 73b is provided in each front-end | tip part of these six rod-shaped members, respectively.

In addition, in this embodiment, although the 1st and 2nd support members 71 and 72 consist of six rod-shaped members, it is not limited to this, The arbitrary number of which the 1st and 2nd support members 71 and 72 differs is different. The rod-shaped member or other arbitrary shape member, for example, may be configured in the shape of a disc or polygon having an outer periphery parallel to the plurality of substrate support pins 73a and 73b.

The first movable member 74 of FIG. 5 is formed in a U shape. The first supporting member 71 is fixed to one end of the first movable member 74. The other end of the first movable member 74 is connected to the link mechanism 77. Similarly, the second movable member 75 of FIG. 6 has a U shape. The second supporting member 72 is fixed to one end of the second movable member 75. The other end of the second movable member 75 is connected to the link mechanism 77. The ring size port 77 is attached to the rotating shaft of the rotating mechanism 78. The link mechanism 77 and the rotation mechanism 78 are attached to the fixed plate 76.

An air cylinder or the like is built into the link mechanism 77 of FIG. 5, and the first movable member 74 and the second movable member 75 can be selectively shifted to a state in which they are relatively close to each other. In addition, a motor or the like is built into the rotary mechanism 78, and the first movable member 74 and the second movable member 75 are rotated about a horizontal axis, for example, 180 degrees through the link mechanism 77. Can be rotated.

As shown in Fig. 4, the moving mechanism 30 includes a base 31, a pair of conveying rails 3a, a linear motion mechanism 3b, a drive unit 3c, a coupling member 3d, and A pair of sliding blocks 3e are included. In addition, in FIG.4 (b), illustration of some members, such as the coupling member 3d, is abbreviate | omitted for simplicity.

A pair of conveyance rails 3a are fixed on the base 31 in parallel in the X direction. The pair of sliding blocks 3e are slidably mounted to the pair of transport rails 3a. The seat plate portion 79 of the inversion mechanism 70 is attached to the sliding block 3e.

The linear motion mechanism 3b is composed of, for example, a ball screw mechanism and an electric cylinder incorporating a motor that gives a driving force thereto. The drive part 3c is provided in the linear motion mechanism 3b. The drive part 3c is coupled to the seat plate part 79 by the coupling member 3d.

In this structure, the linear motion mechanism 3b moves the drive part 3c in the direction parallel to the conveyance rail 3a, and the inversion mechanism 70 reciprocates along a conveyance rail 3a in a Ｖ direction.

Here, the operation of the substrate inversion transfer device 7 will be described with reference to the drawings.

First, the substrate is loaded into the substrate inversion transfer device 7 by the indexer robot IR (FIG. 1). In this case, the inversion mechanism 70 moves to the edge part (henceforth a 1st delivery position) by the indexer robot (IR) side on the conveyance rail 3a. The substrate may include a plurality of substrate support pins of the second support member 72 by the indexer robot IR in a state where the first movable member 74 and the second movable member 75 are spaced in the vertical direction. It is mobilely loaded on 73b).

Next, as shown in Fig. 4A, the first movable member 74 and the second movable member 75 are shifted in the vertical direction by the action of the link mechanism 77. As shown in Figs. Thereby, both surfaces of the board | substrate are supported by the some board | substrate support pin 73a, 73b, respectively.

Subsequently, as shown in FIG.4 (b), the 1st movable member moves the inversion mechanism 70 to the board | substrate conveyance robot (CR) side of FIG. 1 along a Ｖ direction along the pair of conveyance rails 3a. 74 and the second movable member 75 rotate 180 degrees about the axis in the X direction by the action of the rotary mechanism 78. Thereby, the board | substrate has several board | substrate support pins provided in the 1st support member 71 and the 2nd support member 72 with the 1st movable member 74 and the 2nd movable member 75 ( Rotates 180 degrees while being supported by 73a, 73b).

In this way, the substrate is inverted by the inversion mechanism 70 and moved in the vicinity of the substrate transport robot Cr. In this case, the inversion mechanism 70 moves to the edge part (henceforth a 2nd delivery position) by the side of the board | substrate conveyance robot (CR) on the conveyance rail 3a.

Next, the first movable member 74 and the second movable member 75 are shifted in the vertical direction by the action of the link mechanism 77. In this state, the board | substrate is carried out from the board | substrate inversion moving apparatus 7 by a board | substrate conveyance robot Cr.

On the other hand, when the board | substrate is carried in to the board | substrate inversion transfer apparatus 7 by the board | substrate conveyance robot (CR), the board | substrate is reversed by the operation | movement in the opposite direction to the above, and the inversion mechanism 70 is carried out. Inverted and moved near the indexer robot (IR). In that state, the board | substrate is carried out from the board | substrate inversion moving apparatus 7 by indexer robot IR.

(1-4) Structure of Indexer Robot and Substrate Transport Robot

FIG. 7: is a top view which shows the structure of the indexer robot IR and the board | substrate conveyance robot Cr in the substrate processing apparatus 100 of FIG. Fig. 7 (a) shows the configuration of the articulated arm of the indexer robot (IR), and Fig. 7 (b) shows the configuration of the articulated arm of the substrate transfer robot (CR). In addition, with respect to θ in Figs. 7A and 7B, the clockwise direction is set to + θ direction on the surface, and the counterclockwise direction is set to -θ direction on the surface.

As shown to Fig.7 (a), the indexer robot IR has a pair of conveyance arms am4 and cm4 for holding a board | substrate, and a pair of these conveyance arms am4 and cm4. ) And the retraction drive mechanisms (am1, am2, am3 and cm1, cm2, cm3) to move the indexer robot body (IRH) independently of each other, and the indexer robot body (IRH) in a ± θ direction around the vertical axis. Rotation drive mechanism (not shown), lifting drive mechanism (not shown) for lifting the indexer robot body (IRH) in the T direction, and indexing robot body (IRR) for moving the indexer robot body (IRH) in the X direction. A mechanism part (not shown) is provided.

The forward and backward drive mechanisms am1, am2, am3 and cm1, cm2, cm3 are multi-articulated arm types, which maintain the posture of a pair of carrier arms am4 and cm4, You can advance in the direction. One conveyance arm am4 is made to advance and retreat above the other conveyance arm cm4, and both of the pair of conveyance arms am4 and cm4 are evacuated above the indexer robot body (IRH). In this initial state, these carrier arms am4 and cm4 overlap each other up and down.

The indexer robot body (IRH) drives the forward and backward drive mechanisms am1, am2, am3 and cm1, cm2, cm3 in accordance with the instructions of the controller 4 (FIG. 1). The forward and backward drive mechanisms am1, am2, am3 and cm1, cm2, cm3 are provided with a drive device comprising a motor, a wire, a pulley, and the like for reciprocating the pair of carrier arms am4, cm4. By such a mechanism, a pair of conveyance arms am4 and cm4 are directly provided with driving force, respectively, and can move forward and backward in a horizontal direction.

As a result, the carrier arms am4 and cm4 of the indexer robot IR can be moved in the T direction while supporting the substrate, and can be rotated in the ± θ direction while being stretchable.

Moreover, the some board | substrate support part PS is attached to the upper surface of conveyance arms am4 and cm4. In this embodiment, four board | substrate support parts (PS) are respectively mounted substantially equally along the outer periphery of the board | substrate mounted on the upper surface of conveyance arms am4 and cm4. The board | substrate is supported by these four board | substrate support parts PS. In addition, the number of board | substrate support parts PS is not limited to four, What is necessary is just the number which can stably support a board | substrate.

The indexer robot (IR) is any of the transfer arms (am4, cm4) at a position opposite to the substrate inversion transfer device (7) when the inversion mechanism (70) of the substrate inversion movement device (7) is at the first receiving position. The substrate can be exchanged with the inversion mechanism 70 by advancing one side in the X direction toward the substrate inversion transfer device 7.

Next, as shown in FIG.7 (b), the board | substrate conveyance robot (CR) has a pair of conveyance arms bm4 and dm4 for supporting a board | substrate, and a pair of these conveyance arms bm4, Reciprocating driving mechanisms bm1, bm2, bm3 and dm1, dm2, dm3 for advancing dm4) independently of the substrate transfer robot body (CHH), and the substrate transfer robot body (CCH) in the ± θ direction around the vertical axis. And a lift drive mechanism (not shown) for lifting and lowering the substrate transfer robot main body (CHH) in the T direction.

The forward and backward drive mechanisms bm1, bm2, bm3 and dm1, dm2, dm3 are multi-articulated arm types that can support the pair of carrier arms bm4 and dm4 in a horizontal direction while supporting them. have. One conveyance arm bm4 is made to advance and retreat above the other conveyance arm dm4, and both of the pair of conveyance arms bm4 and dm4 are retracted above the substrate conveyance robot main body (CHH). In the initial state in which these carrier arms bm4 and dm4 overlap each other up and down.

The substrate transfer robot main body (CHH) drives the forward and backward drive mechanisms bm1, bm2, bm3, and dm1, dm2, and dm3 in accordance with the instructions of the controller 4 (FIG. 1). The forward and backward drive mechanisms bm1, bm2, bm3 and dm1, dm2, dm3 are provided with a drive device which consists of a motor, a wire, a pulley, etc. for reciprocating a pair of carrier arms bm4, dm4. By such a mechanism, the pair of carrier arms bm4 and dm4 are directly provided with driving force, respectively, and can move forward and backward in the horizontal direction.

As a result, the carrier arms bm4 and dm4 can move in the T direction while supporting the substrate, and can be rotated in the ± θ direction while being stretchable.

In addition, a plurality of substrate support portions PS are mounted on the upper surfaces of the transfer arms bm4 and dm4 of the substrate transfer robot Cr. In this embodiment, four board | substrate support parts (PS) are respectively mounted substantially equally along the outer periphery of the board | substrate mounted on the upper surface of conveyance arms bm4 and dm4. The board | substrate is supported by these four board | substrate support parts PS. In addition, the number of board | substrate support parts PS is not limited to four, What is necessary is just the number which can stably support a board | substrate.

The substrate transfer robot (CR), when the inversion mechanism (70) of the substrate inversion transfer device (7) is in the second receiving position, one of the transfer arms (bm4, dm4) toward the substrate inversion transfer device (7). By advancing in the X direction, the substrate can be exchanged with the inversion mechanism 70.

In addition, in this embodiment, about the example which both the indexer robot (IR) and the board | substrate conveyance robot (CR) are the double arm type which has a pair of conveyance arms am4, cm4, bm4, and dm4, respectively, Although demonstrated, either or both of the indexer robot (IR) and the board | substrate conveyance robot (CR) may be a single arm type provided with only one conveyance arm.

(1-5) Example of substrate transport process

Next, although an example of the conveyance process of a board | substrate is demonstrated, the conveyance process of a board | substrate is not limited to the following.

8 is a flowchart showing a transfer step of a substrate. As shown in FIG. 8, first, the inversion mechanism 70 of the board | substrate inversion movement apparatus 7 moves to the 1st delivery position of the indexer robot (IR) side. The indexer robot IR takes out the board | substrate from the carrier 1, and passes it to the board | substrate inversion moving apparatus 7 (step Sl).

Next, the inversion mechanism 70 of the substrate inversion transfer device 7 inverts the substrate received from the indexer robot IR, and at the second side of the substrate transfer robot CC along the X direction. It moves to a delivery position (step S2).

Next, the board | substrate conveyance robot Cr receives a board | substrate from the board | substrate inversion transfer apparatus 7 (step S3). And the board | substrate conveyance robot CR loads a board | substrate into any one of process part MP1-MP8 (step S4).

Next, a process is performed to the board | substrate by any one of said process parts (step S5). Next, the board | substrate conveyance robot CR carries out the processed board | substrate W from any one said process part (step S6). And the board | substrate conveyance robot Cr passes the board | substrate to the board | substrate inversion transfer apparatus 7 (step S7).

Next, the substrate inversion transfer device 7 inverts the substrate received from the substrate transfer robot (CR) and moves to the first receiving position on the indexer robot (IR) side along the direction of X. (Step S8). And the indexer robot IR receives the board | substrate from the board | substrate inversion moving apparatus 7 (step S9). Thereafter, the indexer robot IR stores the substrate in the predetermined carrier 1.

(1-6) Effect in 1st Embodiment

According to the substrate processing apparatus 100 which concerns on this embodiment, the board | substrate inversion movement apparatus 7 of the delivery part 3 exchanges a board | substrate between the indexer robot IR and the board | substrate conveyance robot Cr. It has the function of the shuttle conveyance mechanism which intermediates with the function, and the function of the board | substrate inversion mechanism which inverts a board | substrate. That is, the moving mechanism 30 of the substrate inversion transfer device 7 moves the inversion mechanism 70 back and forth in a reciprocating manner between the first delivery position and the second delivery position, so that the indexer robot IR and the substrate transfer robot ( The exchange of the substrate and the inversion of the substrate are performed between the CR and the substrate.

Therefore, the conveyance process by a board | substrate conveyance robot (CR) is called conveyance from the board | substrate inversion transfer apparatus 7 to a process part, and conveyance from the process part to the board | substrate inversion transfer apparatus 7 with respect to one board | substrate. It becomes a process.

As described above, since the transfer step of the substrate transfer robot (CR) is reduced, the processing rate related to the processing of the substrate is improved.

Furthermore, the structure of the existing substrate processing apparatus is provided by providing the receiving part 3 including the substrate inversion transfer device 7 at the position of the transfer area C between the indexer robot IR and the substrate transfer robot Cr. There is no need to change the so-called platform configuration. Therefore, an increase in the manufacturing cost of the substrate processing apparatus 100 can be suppressed.

(2) 2nd Embodiment

(2-1) Structure of Substrate Processing Apparatus

9 is a plan view of the substrate processing apparatus according to the second embodiment.

As shown in FIG. 9, the structure of the substrate processing apparatus 100a according to the second embodiment is different from that of the substrate processing apparatus 100 according to the first embodiment. Instead of the device 7, it includes a substrate inversion transfer device 7a. This point will be described below with reference to the drawings.

(2-2) Structure and Operation of Substrate Reverse Transfer Device

FIG. 10 is a schematic configuration diagram of the substrate inversion transfer device 7a of FIG. 9. 10A is a side view of the substrate inversion transfer device 7a, and FIG. 10B is a top view of the substrate inversion transfer device 7a.

As shown in Fig. 10A, the configuration of the substrate inversion transfer device 7a differs from the configuration of the substrate inversion transfer device 7 (FIG. 4) described above in place of the movement mechanism 30. 30a) is installed. The moving mechanism 30a includes a base 31, a rotation shaft 3g, and a motor 3f.

The motor 3f is fixed on the base 31. The shaft of the motor 3f is connected to the lower surface of the seat plate 79 via the rotation shaft 3g. By this structure, as shown in FIG. 10 (b), the inversion mechanism 70 can be rotated in the ± θ direction (around the axis in the T direction).

About the inversion mechanism 70 of this board | substrate inversion movement apparatus 7a, the board | substrate can be exchanged from the receiving side S on the opposite side to the rotating mechanism 78. FIG.

In this embodiment, the board | substrate inversion transfer apparatus 7a is a board | substrate conveyance robot (CR) at the time of the exchange of the board | substrate, and the position of the indexer robot (IR) and the board | substrate of the board | substrate. It is arranged on the line connecting the position of).

Next, operation | movement of the board | substrate inversion moving apparatus 7a in this embodiment is demonstrated.

First, the indexer robot IR moves to a position opposite to the substrate inversion transfer device 7a. In addition, the inversion mechanism 70 rotates by the moving mechanism 30a so that the receiver side S faces the indexer robot IR.

In this state, one carrier arm of the indexer robot IR advances in the retracting direction # 1 parallel to the X direction so that the substrate is loaded into the substrate inversion transfer device 7a.

Then, while the inversion mechanism 70 rotates 180 degrees in the θ direction around the rotation shaft 3g, the first movable member 74 and the second movable member 75 of the inversion mechanism 70 rotate the rotation mechanism 78. Rotate 180 degrees around the horizontal axis by the action of. Thereby, while the board | substrate is reversed, the receiving side S of the inversion mechanism 70 opposes the board | substrate conveyance robot Cr.

In this state, one of the transfer arms of the substrate transfer robot (CR) is advanced in the advancing direction # 2 parallel to the X direction so that the substrate is taken out from the substrate inversion transfer device 7a.

On the other hand, when a board | substrate is carried in to the board | substrate inversion transfer apparatus 7a by the board | substrate conveyance robot (CR), the board | substrate is reversed by the operation | movement in the opposite direction to the above, and the inversion mechanism 70 is carried out. At the same time, the receiver side S faces the indexer robot IR by the rotation of the inversion mechanism 70. In this state, the substrate is taken out from the substrate inversion transfer device 7a by the indexer robot IR.

(2-3) Effect in 2nd Embodiment

According to the substrate processing apparatus 100a which concerns on this embodiment, the shuttle transfer apparatus which mediates transfer of a board | substrate between the indexer robot IR and the board | substrate conveyance robot Cr is carried out by the board | substrate reverse transfer apparatus 7a. It has a function of a mechanism and a function of a substrate inversion mechanism for inverting a substrate. That is, the moving mechanism 30a of the substrate reversing transfer device 7a rotates the reversing mechanism 70 by 180 degrees between the first receiving direction facing the forward and backward direction 과 1 and the second receiving direction facing the forward and backward direction Ｖ2. The exchange of the substrate and the inversion of the substrate are performed between the indexer robot IR and the substrate transfer robot CR.

Thereby, the conveyance process by a board | substrate conveyance robot (CR) is two processes of conveyance from the board | substrate inversion transfer apparatus 7a to the processing part, and conveyance from the processing part to the substrate inversion transfer apparatus 7a with respect to one board | substrate. Becomes

As described above, since the transfer step of the substrate transfer robot (CR) is reduced, the processing rate related to the processing of the substrate is improved.

Furthermore, the structure of the existing substrate processing apparatus is provided by providing the receiving part 3 including the substrate inversion transfer device 7a at the position of the transfer area C between the indexer robot IR and the substrate transfer robot CR. There is no need to change the so-called platform configuration. Therefore, an increase in the manufacturing cost of the substrate processing apparatus 100a can be suppressed.

(3) Third embodiment

(3-1) Structure of Substrate Processing Apparatus

11 is a plan view of the substrate processing apparatus according to the third embodiment.

As shown in FIG. 11, the structure of the substrate processing apparatus 100b which concerns on 3rd Embodiment differs from the structure of the substrate processing apparatus 100a which concerns on 2nd Embodiment by the fluid box parts 2a and 2c, and The point where the processing parts MP1, MP2, MP5, and MP6 are not provided is different from the arrangement of the substrate inversion transfer device 7a of the delivery section 3. Therefore, the substrate processing apparatus 100b which concerns on this embodiment is comprised from four processing parts MP3, MP4, MP7, and MP8. Hereinafter, the arrangement of the substrate inversion transfer device 7a will be described with reference to the drawings.

As shown in FIG. 11, the board | substrate inversion transfer apparatus 7a is a board | substrate conveyance robot (R) at the time of the exchange of the board | substrate with the position of the indexer robot (IR) at the time of the exchange of a board | substrate ( It is provided in the position spaced laterally from the line which connects the position of a CR. As a result, when the indexer robot IR receives and unloads the substrate from the carrier 1, the retracting direction of the transfer arm and the indexer robot IR are set against the substrate inversion transfer device 7a. The rotation angle of the indexer robot (IR) becomes smaller than 180 degrees between the transfer arm and the retraction direction when the substrate is exchanged.

FIG. 12: is explanatory drawing which shows the arrangement | positioning of the board | substrate inversion moving apparatus 7a in 3rd Embodiment.

As shown in FIG. 12, the board | substrate inversion movement apparatus 7a rotated the indexer robot (IR) so that the advancing direction of the conveyance arm may rotate 120 degree | times, for example 120 degree | times from-direction toward the carrier 1, -θ direction. In this case, the substrate is disposed at a position where the substrate can be exchanged with the substrate inversion transfer device 7a by the indexer robot IR.

Next, operation | movement of the board | substrate inversion movement apparatus 7a in this embodiment is demonstrated.

First, while the indexer robot IR moves to the center part of the indexer ID, the advancing direction of the carrier arm is rotated, for example, by 120 degrees in the -θ direction from the X direction toward the carrier 1. In addition, the inversion mechanism 70 rotates by the movement mechanism 30a (FIG. 10), and the receiving side S (FIG. 10) opposes the indexer robot IR.

In this state, one carrier arm of the indexer robot IR advances in the advancing direction 방향 l, whereby the substrate is loaded into the substrate inversion transfer device 7a.

The inversion mechanism 70 inverts the substrate while rotating, for example, 120 degrees in the + θ direction. Thereby, as shown by the dotted line, the receiving side S (FIG. 10) of the inversion mechanism 70 opposes the board | substrate conveyance robot Cr. In this state, one of the transfer arms of the substrate transfer robot (CR) advances in the X direction and, for example, the advancing direction # 2 forming 120 degrees, and the substrate is taken out from the substrate inversion transfer device 7a.

On the other hand, when the substrate is loaded into the substrate inversion transfer device 7a by the substrate transfer robot (CR), the substrate is inverted by the inversion mechanism 70 in the reverse operation as described above. The inversion mechanism 70 rotates 120 degrees, for example, and the receiving side S (FIG. 10) opposes the indexer robot IR. In this state, the substrate is taken out from the substrate inversion transfer device 7a by the indexer robot IR.

(3-2) Effect in 3rd Embodiment

According to the substrate processing apparatus 100b which concerns on this embodiment, the shuttle transfer apparatus which mediates transfer of a board | substrate between the indexer robot IR and the board | substrate conveyance robot Cr is carried out by the board | substrate reverse transfer apparatus 7a. It has a function of a mechanism and a function of a substrate inversion mechanism for inverting a substrate. That is, the moving mechanism 30a of the substrate reversing transfer device 7a moves the reversing mechanism 70 between, for example, 120 degrees between the first receiving direction facing the advancing direction Ｖ1 and the second receiving direction facing the advancing direction Ｖ2, for example. By rotational movement, the transfer of the substrate and the inversion of the substrate are performed between the indexer robot IR and the substrate transfer robot CR.

Thereby, the conveyance process by a board | substrate conveyance robot (CR) is two processes of conveyance from the board | substrate inversion transfer apparatus 7a to the processing part, and conveyance from the processing part to the substrate inversion transfer apparatus 7a with respect to one board | substrate. Becomes

As described above, since the transfer step of the substrate transfer robot (CR) is reduced, the processing rate related to the processing of the substrate is improved.

Moreover, the board | substrate inversion transfer apparatus 7a changes the position of the indexer robot IR when the board | substrate is exchanged, and the position of the board | substrate conveyance robot CR when the board | substrate transfers. It is installed at a position spaced laterally from the connecting line. Thereby, the indexer robot IR can convey the board | substrate between the carrier 1 and the board | substrate reverse transfer apparatus 7a by rotating at an angle smaller than 180 degree | times in a-(theta) direction. In addition, the inversion mechanism 70 of the substrate inversion transfer device 7a rotates at an angle smaller than 180 degrees in the + θ direction so that the substrate can be exchanged between the indexer robot IR and the substrate transfer robot Cr. have. Thereby, the conveyance time of the board | substrate by an indexer robot (IR) and the transit time of the board | substrate by the board | substrate inversion movement apparatus 7a are shortened. As a result, the processing rate regarding the processing of the substrate can be further improved.

(4) another embodiment

In the said embodiment, although the inversion mechanism 70 has a structure which inverts a board | substrate in the state which hold | maintained the board | substrate in the form which pinched the board | substrate from both sides, the inversion mechanism 70 has another structure. You may have it. For example, you may have the structure which inverts a board | substrate in the state in which the inversion mechanism 70 grasped the two opposite sides of the periphery of the board | substrate.

In the above embodiment, an example of passing the substrate after the treatment by the substrate transfer robot (CR) to the substrate inversion transfer apparatuses 7 and 7a after the treatment of the substrate by any one of the processing units has been described. However, the present invention is not limited thereto, and the substrate after the treatment may be carried into another processing unit by a substrate transfer robot (CR), and the processing may be performed by the processing unit.

In the third embodiment, the substrate inversion transfer device 7a is arranged in a counterclockwise position with respect to the rotational axis of the indexer robot IR from the Ｖ direction, but is not limited thereto. You may arrange | position in a clockwise position centering on it.

(5) Correspondence between each component of the claim and each component of the embodiment

Hereinafter, although the corresponding example of each component of an Claim and each element of embodiment is demonstrated, this invention is not limited to the following example.

In the above embodiment, the indexer ID is an example of the carry-in / out area, the carrier 1 is an example of the storage container, the carrier placing portion 1a is an example of the container placing portion, and the indexer robot IR is the first conveyance. The substrate conveying robot (CR) is an example of the second conveying apparatus, the substrate reversing transfer apparatuses 7 and 7a are examples of the receiving part, the inverting mechanism 70 is an example of the inverting mechanism, and the moving mechanism ( 30, 30a) are examples of moving mechanisms.

In addition, in the said embodiment, a 1st delivery position is an example of the position which the board | substrate can exchange between a 1st conveyance apparatus and an inversion apparatus, and a 2nd delivery position is between a 2nd conveyance apparatus and an inversion apparatus. An example of a position where a substrate can be exchanged is an example of a carrier arm (am4, cm4) as an example of the first support unit, and carrier arms (bm4, dm4) are an example of the second support unit.

In the above embodiment, the advancing direction Ｖ1 is an example of the first advancing direction, the advancing direction Ｖ2 is an example of the second advancing direction, and the θ-direction (around the axis in the T direction) is an example of the axis around the vertical direction in the substantially vertical direction. , The X direction is an example of the first axial direction, the X direction is an example of the second axial direction, and the advancing direction X1 is an example of the third axial direction.

Moreover, as each component of a claim, it is also possible to use various other elements which have a structure or a function described in a claim.

1 is a plan view of a substrate processing apparatus according to a first embodiment.

FIG. 2 is a side view of the substrate treating apparatus of FIG. 1.

3 is a cross-sectional view showing the configuration of a processing unit.

4 is a schematic configuration diagram of a substrate inversion transfer device.

5 is a perspective view showing the appearance of main parts of the substrate inversion transfer device.

6 is a perspective view showing the appearance of a part of the substrate inversion transfer device.

7 is a plan view illustrating the structure of an indexer robot and a substrate transfer robot in the substrate processing apparatus of FIG. 1.

8 is a flowchart showing a substrate transfer step.

9 is a plan view of the substrate processing apparatus according to the second embodiment.

FIG. 10 is a schematic configuration diagram of the substrate inversion transfer device of FIG. 9.

11 is a plan view of the substrate processing apparatus according to the third embodiment.

It is explanatory drawing which shows the arrangement | positioning of the board | substrate reverse movement apparatus in 3rd Embodiment.

Claims (7)

A substrate processing apparatus for processing a substrate having one surface and the other surface, A processing area for processing a substrate, An import and export area for carrying in and carrying out a substrate with respect to the processing area; And a receiving portion for transferring a substrate between the processing region and the carry-in / out region, The import and export area is, A container mounting portion on which a storage container for storing a substrate is placed; A first conveying apparatus for conveying a substrate between the storage container placed on the container placing portion and the receiving portion; The treatment area is, A processing unit for processing the substrate, A second conveying apparatus for conveying a substrate between the receiving part and the processing part; The delivery part, An inversion mechanism for inverting one side and the other side of the substrate with each other, And a moving mechanism for moving the inversion mechanism to enable substrate exchange between the first transfer device and the inversion mechanism and substrate transfer between the second transfer device and the inversion mechanism. , And inverting the substrate by the inversion mechanism while moving the inversion mechanism by the moving mechanism. The method of claim 1, The moving mechanism includes the inversion mechanism at a position where the substrate can be exchanged between the first transfer device and the inversion mechanism and at a position where the substrate can be exchanged between the second transfer device and the inversion mechanism. Substrate processing apparatus for linear movement by reciprocating in the horizontal direction. The method of claim 1, The first conveying apparatus has a first support portion provided to support the substrate and to be able to move forward and backward, wherein the first support portion is in a first advance direction with respect to the inversion mechanism when the substrate is exchanged with the inversion mechanism. Receding, The second conveying apparatus has a second support portion provided to support the substrate and to be retracted at the same time, wherein the second support portion retreats in the second retraction direction with respect to the reversal mechanism when the substrate is exchanged with the reversal mechanism. And the moving mechanism rotates the inversion mechanism about an axis perpendicular to the first receiving direction facing the first forward and backward direction and the second receiving direction facing the second forward and backward direction. The method of claim 3, And the inversion mechanism is disposed so that the rotation angle between the first delivery direction and the second delivery direction is 180 degrees. The method of claim 3, And the inversion mechanism is disposed so that the rotation angle between the first delivery direction and the second delivery direction is smaller than 180 degrees. The method of claim 5, The first conveying apparatus is installed to be movable in parallel in the first axial direction, and accommodates and pulls out the substrate with respect to the storage container placed on the container mounting portion in a state of facing the second axial direction perpendicular to the first axial direction. And exchanging a substrate with respect to the inversion mechanism in a state in which the third axial direction is smaller than 180 degrees with respect to the second axial direction. A substrate having an import / export area including a container placing part and a first conveying device, a processing area including a processing part and a second conveying device, and a receiving part which exchanges a substrate between the processing area and the import / export area. As a substrate processing method for processing a substrate by a processing apparatus, A step of taking out the substrate before the processing from the storage container placed on the container placing unit by the first transfer device, and passing the taken-out substrate to the receiving unit; A step of inverting the one surface and the other surface of the substrate before the processing by the inversion mechanism in the receiver, and moving the inversion mechanism so that the transfer of the substrate before the processing from the inversion mechanism to the second transfer device is possible; , A step of conveying the substrate before the process by the second conveying apparatus from the delivery section to the processing section; Processing the substrate before processing in the processing unit; Conveying the processed substrate processed by the processing unit from the processing unit to the delivery unit by the second transfer device; The inversion mechanism such that the other surface and one surface of the substrate processed by the inversion mechanism are inverted from each other in the receiver and at the same time enable the exchange of the substrate after the treatment from the delivery portion to the first transfer device. Moving the step, And a step of receiving the substrate after the treatment from the receiving portion by the first conveying device and storing the received substrate after the treatment in the storage container.

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