200811302 九、發明說明： 【發明所屬之技術領域】 本發明係有關一種在基板表面塗佈有機材料之方法，該 有j材料為粉末狀材料，其被存放在一儲存容器中，該儲 存合裔内部之溫度低於有機材料分子之分解溫度，从 料，該處被計量輸送至—蒸發裝置巾，並在域被輪入敎 而条發。 …、 本發明尚有關一種在基板表面塗佈有機材料之裝置， 存容11 ’該料容㈣部存放粉末狀有機材料， 且储存谷器内部之溫度低於有機材料分子之分解溫产， 一將粉末輸入一蒗發裝詈之於、矣狀恶上、士+ X及 中被輸入熱而蒸發輸达裝置’粉末在該蒸發裝置 【先前技術】 S 2005/0208220 A1曾提出此種方法及裝置，其 哭了=^置’該裝置具有—粉末狀有機材料之儲存容 =々為有機發光：極體⑽ED)製造所使 ί::。該材料為粉末狀，其分子具低溫度穩定性儲; 谷益中之溫度低於分子分解儲存 為流動狀態之裝置，H 、 1° 又使‘末顆粒保持 此裝置躲二 振動元件或超臨界二氧化碳。 中Μ右一、77 、工輸迗管而輸送至一蒸發器中，該蒸發哭 -加熱的破璃料。粉末顆粒與該多孔材料：：： 中，以：：力。、蒸發之材料被輸送至-反應器的心室 刀子破結在一基板表面上。 Μ 率受接觸表面限制。墓 处之舔乳產生速 “、、轧/、出現在熱輸入粉末顆粒之處。 312ΧΡ/發明說明書(補件)/96-09/96120311 200811302 遠處在真空裝置中為加熱體表面’其限制了蒸發速率。 DE 100 57 491 A1提出一種裝置及方法，其利用—脈 衝式喷射喷嘴將-液態材料喷人—氣體中。所產生氣懸膝 中的液滴被蒸發’其蒸發熱來自載氣。200811302 IX. Description of the Invention: [Technical Field] The present invention relates to a method of coating an organic material on a surface of a substrate, the j material being a powdery material, which is stored in a storage container, the storage The internal temperature is lower than the decomposition temperature of the organic material molecules, and the material is metered and transported to the evaporation device towel, and is sprayed in the field. The present invention relates to a device for coating an organic material on a surface of a substrate. The storage material 11' stores a powdery organic material, and the temperature inside the storage bar is lower than the decomposition temperature of the organic material molecule. The powder is fed into a 蒗 蒗 矣 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The device, which is crying = ^ set 'The device has a storage capacity of powdered organic material = 有机 is organic luminescence: polar body (10) ED) manufactured by ί::. The material is in the form of a powder, and its molecules are stored at a low temperature stability; the temperature in the valley is lower than that in the state where the molecular decomposition is stored, and H, 1° causes the final particle to keep the device from vibrating elements or supercritical carbon dioxide. The middle right, 77, and the industrial transport pipe are transported to an evaporator, which evaporates the crying-heated glass frit. Powder particles and the porous material:::, with:: force. The evaporated material is delivered to the ventricle of the reactor. The knife is broken on a substrate surface. The enthalpy rate is limited by the contact surface. The milk at the tomb produces a speed of ",, rolling, and appears in the heat input powder particles. 312 ΧΡ / invention manual (supplement) / 96-09/96120311 200811302 in the vacuum device is the surface of the heating body' Evaporation rate DE 100 57 491 A1 proposes a device and method for injecting a liquid material into a gas using a pulse jet nozzle. The droplets in the resulting air suspension are evaporated, and the heat of evaporation comes from the carrier gas. .
Appl. Phys· Lett. 65(8)，1994 年 8 月 22 日刊出之 銅之氣懸膠辅助化學氣相沈積：―種輪送液體至金屬薄膜 之方法文章，其揭示使-含銅溶液成為_氣懸膠，並將該 材料輸送至一基板，而使銅沈積在該基板上。 DE37 29 391 A1提出一種高功率陶究製造用之微細顆 粒的製造方法。其材料被溶解在一液體中。利用一超音波 振Μ頭使該液體成為一氣懸膠。 DE 44 26 264 A1提出一種粉末蒸發褒置，其粉末藉盘 連接超音波源的容器壁直接接觸而形成渦流。該粉末渦流 被一載氣輸送。 US 6, 180, 1 90 B1提出-種液體蒸發裳置，其使用一超 音波振盪板。液體被喷到該板上，而成為小液滴。° EP 0 905 276 A2提出-種液體蒸發襄置，其使用 音波源。該液體蒸發裝置係用於—CVD製程。 【發明内容】 甘!目的在於改良上述粉末狀材料之蒸鍍裝置。尤Appl. Phys· Lett. 65(8), Copper Gas Suspension Assisted Chemical Vapor Deposition, published on August 22, 1994: A method for the transfer of liquid to metal film, which reveals that the copper-containing solution becomes _ Air suspension, and the material is delivered to a substrate, and copper is deposited on the substrate. DE 37 29 391 A1 proposes a method for producing fine particles for the manufacture of high-power ceramics. Its material is dissolved in a liquid. An ultrasonic vibrating head is used to make the liquid a gas suspension. DE 44 26 264 A1 proposes a powder evaporation device in which a powder is directly contacted by a container wall connected to an ultrasonic source to form a vortex. The powder vortex is delivered by a carrier gas. US 6, 180, 1 90 B1 proposes a liquid evaporating skirt which uses an ultrasonic oscillating plate. The liquid is sprayed onto the plate and becomes a small droplet. ° EP 0 905 276 A2 proposes a liquid evaporation device that uses a sonic source. The liquid evaporation device is used in a CVD process. SUMMARY OF THE INVENTION The purpose of the present invention is to improve the vapor deposition apparatus of the above powdery material. especially
其是提南蒸氣產生速率D 本目的由中請專利範圍所述之本發明達成，其中每 申請專利範圍皆可獨立，但亦可盥 、 1力Τ與他項申請專利範圍組 合0 312ΧΡ/發明說明書(補件)/96_〇9/96120311 6 200811302 以 依據本發明，粉末狀材料被—載氣攜人蒸發裝置中，並 > 2熱載氣而提供其熱。為此儲存裝置設有一輸入管，以 ί 1輸入—載氣。儲存容11内設有—混合裝置，以使粉末 、，δ入f氣氣机中。该粉末氣體混合物經一連接管而被輸 ' “、、么至中°亥条發室具一加熱面以加熱被輸入墓發 ΐ:攜：粉末之尸氣體。並以一第二輸入管將另-載氣輸入 :χ至“錢軋可被預熱，以提供需要的熱，而蒸發粉 需要的熱能亦可由蒸發裝置的壁傳輸至蒸發 衣置中的氣體。顆粒的蒸發基本上與壁無接觸。 的壁對粉末顆粒之埶僖鈐筏 x ^ :、、#輪糊用》子運動。財顆粒直徑 二’味佳約為5#Π1。為使分子粉末自由漂浮 :工間中’需在蒸發室中保持-氣態狀態。此咅味分子 之自由運動路徑長度小於壁距，以藉足夠高的二:： 而達到需要的熱傳輸。故壓力應大於 ===之壓力為1或一 t里R^。連接W可設 是一開關閥。蒸發裝置A e , 里閥，其可 舻择从4 為一具加熱壁之蒸發室。1可杲一 體知約為50〇ml的鋼室，其 =疋 測連接館存容器之連接管。另一：二=主形。咖頂 發室中。蒸發室底側連接—輸出』】：另一载氣輸入蒸 ^ 輸出官，其將载氣及其所栌帶It is the speed of the steam generation rate of the south of the country. The purpose of the invention is as described in the scope of the patent application, wherein each patent application scope can be independent, but it can also be combined with the patent scope of the patent application 0 312 ΧΡ / invention Specification (Supplement)/96_〇9/96120311 6 200811302 In accordance with the present invention, the powdered material is supplied with heat by a carrier gas carrying apparatus, and > 2 hot carrier gas. For this purpose, the storage device is provided with an input tube for inputting the carrier gas. A storage device is provided in the storage container 11 to allow the powder to enter the gas machine. The powder gas mixture is fed through a connecting pipe, and the heating chamber is heated to be input into the tomb: carrying a powder of corpse gas and using a second input tube to - Carrier gas input: χ to "money rolling can be preheated to provide the required heat, and the heat energy required for evaporating powder can also be transferred from the wall of the evaporation device to the gas in the evaporation coating. The evaporation of the particles is essentially free of contact with the walls. The wall of the powder particles 埶僖钤筏 x ^ :,, #轮糊用》子运动. The size of the grain is two. The taste is about 5#Π1. In order to freely float the molecular powder: it is necessary to maintain a gaseous state in the evaporation chamber. The free moving path length of the astringent molecule is less than the wall spacing to achieve the required heat transfer by a sufficiently high two::. Therefore, the pressure should be greater than === and the pressure is 1 or 1 in R^. The connection W can be set as an on-off valve. The evaporation device A e , the inner valve, can be selected from 4 as a heating wall evaporation chamber. 1 It is possible to know a steel chamber of about 50 〇ml, which is a connection pipe connecting the storage containers. Another: two = main form. The top of the coffee room. The bottom side of the evaporation chamber is connected to the output.]: Another carrier gas is supplied to the steaming output, which will carry the carrier gas and its carrier.
之材科洛氣輸入一進氣機構中 ，、所W 應器中’其較佳設作蓮蓬頭狀。該塗佈反 缸主 佈基板相對。有機材料分早气钍+ * 板表面成為一薄膜，而製出有機半導體元# 結在基 千¥體兀件，尤其是發光 312ΧΡ/^^^^#(ΜίΦ)/96-09/96120311 7 200811302 二極體。亦可以不同之計量上下沈積出多層薄膜。 —本發明方法及裝置可提高沈積速率。沈積速率基本上受 蒸發表面與欲塗佈表面的比例左右。該幾何限制亦存在二 本發明方法中。但由於蒸發表面由自由漂浮在氣體中的粉 末顆粒表面構成’其Α於先前技術之裝置，故蒸發材料表 面增大。儲存容器中的冷材料先被超音波裝置形成渦流， =末渦流亦可由-載氣紊流產生。該粉末被載氣輸入蒸 置中1該輸入計量進行，使得材料停留在蒸發裝置中 的時間為最低，以避免材料分解。該氣體粉末混合物I 1 十量閥而被喷人蒸發裝置的熱蒸發室中。該噴射可為脈衝 發裝置中較佳輸人另—載氣，其被加熱或至少負責 L輸熱。材料蒸發熱能較佳由餘存容器加熱壁經熱傳導而 專輸至粉末。故可加熱儲存容器的壁。 【實施方式】 明將Γ據附圖詳細說明本發明—實施例’其顯示本發 明裝置之各部件。 & 二置包括一儲存容器1 ’其内部存放著構成有機 流裝置Γ G。該處設有—由超音波激發119構成之渦 存ΐί :如虱、稀有氣體或氫’經輸入管7而被輸入儲 中：載氣之計量使用-質流控制器8,其設在： ^、7中。载氣通過儲存容器1而由連接管6流出儲存容 时亚進入一条發室2中，再經輪i 之進氣機構15。 13 312XP/發明說明書(補件)/96〇9/961細！ 200811302 藉超=發器9可使粉末1〇之一部份顆粒u出現滿 至二2中;部份顆粒11被載氣經連接管6而攜帶 粉末混合物之計量❹_開_ 物嘖二6 。故甚至可脈衝式將氣體粉末混合 物賀入蒸發室2中。 墓膝^ t 2 & ^柱體構成’其轴長約1〇Cm，直徑約8cm。 連接i 6的：二被：加熱裝置4加熱。蒸發室2頂侧連接 :’―兩人官18輸人另—載氣，其同樣可為氮、 :::體或氫。加熱裝置4使蒸發室2中的氣體溫度高於 :枓_溫度。該溫度亦高於儲存容器i内部的溫度，儲 存容，1内部的溫度低於有機材料蒸發溫度或分解溫度。 於療發室2底側設置上述之輸出管12，其將載氣及蒸 =之材料輸入進氣機構15中。進氣機構15具一筛狀氣^ 流出面，該氣體流出面與一基板座16相對。基板座16可 被，卻。基板座16上放置基板17 ’蒸發之材料可在基板 上凝結成薄膜。反應室13設有一裝載門14，以將 置入反應室中。 、衣圖式所示實施例中粉末被超音波裝置9混合入載氣氣 々IL中仁亦可利用一紊流而使粉末產生渦流。亦可使用其 他方法使粉末混合入氣流中。但使用超音波激發器9較為 有利’因可利用超音波強度及頻率進行計量。重要的是， 使粉末顆粒的整個表面作為蒸發室2的熱輸入表面，該表 面因與包圍粉末顆粒之加熱氣體直接接觸而吸收熱能。如 此可提高蒸發速率，並提高質流量。故本發明裝置可明顯 312XP/發明說明書(補件)/96-09/96120311 9 200811302 提:基板17上沈積薄膜的成長速率，而沒有使材料分子 …、解的風險，因瘵發溫度提高而使得沈積時間極短。 —不同於先前技術，蒸發粉末之熱能的輪入不利用與蒸發 室2加熱面3的接觸。熱傳輸只利用分子運動。蒸發熱來 自包圍粉末顆粒之氣體。 ^ X… 本發明揭示之特徵 所有揭示特徵本身皆具有發明性質。 完全包含於本案之申請專利範圍中。The material of Kolo is input into an air intake mechanism, and the device is preferably set as a showerhead. The coating counter cylinder is opposite to the main substrate. The organic material is divided into early gas 钍 + * The surface of the plate becomes a film, and the organic semiconductor element is produced. The knot is in the base of the body, especially the light 312 ΧΡ / ^ ^ ^ ^ # (ΜίΦ) / 96-09 / 96120311 7 200811302 Diode. It is also possible to deposit a multilayer film on top of different gauges. - The method and apparatus of the present invention increase the deposition rate. The deposition rate is substantially affected by the ratio of the evaporation surface to the surface to be coated. This geometric limitation is also present in the two methods of the invention. However, since the evaporation surface is composed of the surface of the powder particles freely floating in the gas, which is a device of the prior art, the surface of the evaporated material is increased. The cold material in the storage container is first vortexed by the ultrasonic device, and the final eddy current can also be generated by the turbulent flow of the carrier gas. The powder is metered by the carrier gas input to the vaporization 1 so that the material stays in the evaporation device for the least amount of time to avoid decomposition of the material. The gas powder mixture I 1 is valved and sprayed into the thermal evaporation chamber of the evaporation device. The injection may be a preferred input of a carrier gas in the pulse generating device that is heated or at least responsible for the L heat transfer. The heat of evaporation of the material is preferably transferred to the powder by heat conduction from the heated wall of the remaining container. Therefore, the wall of the storage container can be heated. [Embodiment] The present invention will be described in detail with reference to the accompanying drawings, which show the components of the device of the invention. & The second set includes a storage container 1' in which the organic flow device Γ G is stored. There is a vortex 构成 : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : ^, 7 in. The carrier gas passes through the storage container 1 and flows out of the storage chamber 6 into the chamber 2, and then passes through the inlet mechanism 15 of the wheel i. 13 312XP / invention manual (supplement) / 96 〇 9 / 961 fine! 200811302 By means of the super=fabricator 9, one part of the particle u of the powder 1 can be filled up to the second part 2; part of the granule 11 is carried by the carrier gas through the connecting tube 6 to carry the measurement of the powder mixture ❹_开_物啧二6 . Therefore, the gas powder mixture can be pulsed into the evaporation chamber 2 even. Tomb knee ^ t 2 & ^Cylinder composition' has an axial length of about 1 〇 Cm and a diameter of about 8 cm. Connected to i 6 : two: heating device 4 is heated. The top side of the evaporation chamber 2 is connected: '- two people officer 18 loses another - carrier gas, which can also be nitrogen, ::: body or hydrogen. The heating device 4 causes the temperature of the gas in the evaporation chamber 2 to be higher than: 枓_temperature. The temperature is also higher than the temperature inside the storage container i, the storage capacity, and the internal temperature of 1 is lower than the evaporation temperature or decomposition temperature of the organic material. The above-mentioned output tube 12 is disposed on the bottom side of the treatment room 2, and the carrier gas and the vaporized material are input into the air intake mechanism 15. The air intake mechanism 15 has a sieve-like gas outlet surface, and the gas outflow surface is opposed to a substrate holder 16. The substrate holder 16 can be, however. The material on which the substrate 17' is placed on the substrate holder 16 can be condensed into a film on the substrate. The reaction chamber 13 is provided with a loading door 14 to be placed in the reaction chamber. In the embodiment shown in the drawings, the powder is mixed into the carrier gas by the ultrasonic device 9 and the lining of the powder can also cause eddy currents by using a turbulent flow. Other methods can be used to mix the powder into the gas stream. However, it is advantageous to use the ultrasonic driver 9 because it can be measured by ultrasonic intensity and frequency. It is important that the entire surface of the powder particles be used as the heat input surface of the evaporation chamber 2, which absorbs thermal energy by direct contact with the heated gas surrounding the powder particles. This increases the evaporation rate and increases the mass flow rate. Therefore, the device of the present invention can obviously 312XP/invention specification (supplement)/96-09/96120311 9 200811302: the growth rate of the deposited film on the substrate 17, without the risk of material molecules, solution, due to the increase in the temperature of the burst This makes the deposition time extremely short. - Unlike the prior art, the entrainment of the thermal energy of the evaporated powder does not utilize the contact with the heating surface 3 of the evaporation chamber 2. Heat transfer uses only molecular motion. The heat of evaporation comes from the gas surrounding the powder particles. ^ X... Features of the Disclosure of the Invention All of the disclosed features are inherent in nature. It is fully included in the scope of the patent application in this case.
【圖式簡單說明】 圖1係本發明裝置之示意圖。 【主要元件符號說明】 1 儲存容器 2 蒸發裝置（蒸發室） 3 壁 4 加熱裝置 5 開關閥 6 連接管 7 輸入管 8 質流控制器 9 超音波激發器 10 粉末狀材料（粉末） 11 顆粒 12 輸出管 13 反應器 14 裝載門 312XP/發明說明書(補件)/96·〇9/9612〇311 10 200811302 15 進氣機構 16 基板座 17 基板 18 輸入管BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view of the apparatus of the present invention. [Description of main components] 1 Storage container 2 Evaporation unit (evaporation chamber) 3 Wall 4 Heating unit 5 Switching valve 6 Connecting tube 7 Input tube 8 Mass flow controller 9 Ultrasonic oscillator 10 Powder material (powder) 11 Particle 12 Output tube 13 Reactor 14 Loading door 312XP / invention manual (supplement) / 96 · 〇 9 / 9612 〇 311 10 200811302 15 air intake mechanism 16 substrate holder 17 substrate 18 input tube
312XP/發明說明書(補件)/96-09/96120311312XP / invention manual (supplement) / 96-09/96120311