TW200810881A - Methods and apparatus for polishing an edge of a substrate - Google Patents

Abstract

Methods of and systems for polishing an edge of a substrate are provided. The invention includes rotating a substrate against a polishing film so as to remove material from the edge of the substrate; and detecting an amount of one of energy and torque exerted in rotating the substrate against the polishing film. The invention may further include determining an amount of material removed from the edge of the substrate based on the detected energy or torque exerted in rotating the substrate against the polishing film; ascertaining a difference between the determined amount of material removed and a preset polish level; and determining an amount of energy or torque to be exerted in rotating the substrate adapted to attain the preset polish level based on the difference between the determined amount of material removed and the preset polish level. Numerous other aspects are provided.

Description

200810881 IX. INSTRUCTIONS OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The present invention relates generally to substrate processing, and more particularly to methods and apparatus for polishing the edges of a substrate. [Prior Art]

Conventional systems contact the edge of the substrate with a rubbing film to clean the edges, and conventional systems cannot completely grind or clean the edges. For example, the abrasive film does not adequately contact the two bevels of the edge during cleaning. In addition, the worn-out film becomes worn due to use, so it loses the ability to clean the substrate sufficiently and needs to be replaced from time to time, which affects the manufacturing capacity of the semiconductor component. Therefore, there is a need for improved methods and equipment for cleaning the edges of the substrate. SUMMARY OF THE INVENTION In a first aspect of the invention, the invention provides a method of grinding the edges of a substrate. The method includes: (1) rotating a substrate against an abrasive film to remove material from an edge of the substrate; and (2) detecting application of the substrate while rotating it against the abrasive film The amount of energy and torque. Embodiments of the invention further include: (3) determining the amount of material removed from the edge of the substrate based on the detected energy or torque applied when the substrate is rotated against the abrasive film; 4) the difference between the amount of material removed by Qin Ding and a predetermined degree of grinding; and (5) determining the difference between the amount of material removed and a predetermined degree of grinding, when rotating the soil The amount of energy or torque to be applied, which is suitable for the substrate to reach the top

200810881 The degree of grinding. In a second aspect of the invention, the invention provides an alternative method of grinding the edges of a material. The method comprises: (1) rotating a substrate against an abrasive film to remove material from an edge of the substrate; and (2) detecting an amount of force applied when pressing the abrasive film against the substrate . The embodiment of the invention further comprises: (3) determining the amount of material removed from the edge of the substrate according to the detected force applied when pressing the polishing film against the rotating substrate; (4) reading the classic Determining the difference between the amount of material removed and a predetermined degree of grinding; and (5) determining the level of force to be applied to the abrasive film based on the determined difference between the amount of material removed and the predetermined degree of polishing, The force level is adapted to cause the substrate to violate the predetermined degree of grinding, and to adjust the force to the determined level. In a third aspect of the invention, the invention provides a system suitable for use to sharpen the edges of a substrate. The system includes: (1) a substrate spin drive adapted to rotate an edge of a substrate against an abrasive film; and (2) a first sensor coupled to the rotator The first sensor is versatile to detect the force applied by the substrate rotary actuator and twist when the substrate rotates the driver to rotate the substrate against the film. The embodiment of the present invention further includes: (3) a controller coupled to the first sensor and to the substrate rotation driver, the controller is configured to receive a signal from the first sensor, Wherein the signal indicates the energy or torque applied by the substrate rotation driver, and the control is also adapted to transmit the control signal according to the detected energy or torque. Move the tester with the adaptor number 6 200810881 to the substrate rotary drive. • In the fourth cancer sample of the present invention, the present invention provides an apparatus for applying a predetermined pressure to a polishing film which is in contact with the edge of a substrate. The apparatus includes: (1) an actuator adapted to apply a predetermined pressure to the abrasive film; and (2) a controller coupled to the actuator and adapted to receive a signal, the device The signal indicates the state of the edge of the substrate and is adapted to adjust the pressure applied by the actuator to the abrasive film to maintain the predetermined pressure based on the received signal. Other features and aspects of the present invention will become more apparent from the detailed description and appended claims. [Embodiment] The present invention provides an improved method and apparatus for cleaning and/or grinding the edges of a substrate. Referring to Figure 1, a substrate i 〇〇 includes two major surfaces 1 〇 2, 102 ′ and an edge 104. Each major surface of the substrate 100 is 1, 2, 102,

An element area 106, 106' is included, as well as an exclusion area 1〇8, 108. (However, typically only one of the two major surfaces 1, 2, 102 will include an element area and an exclusion area.) Exclusion areas 108, 108, as a meta..... . . . ... , ·. The buffer between the area 106, 1〇6, and the edge 104. The edge of the substrate 1 _ . . . . . . . . , the edge 1 〇 4 includes an outer edge 1 10 and the slopes 1 12, 1 14 . The bevels 1 12, 1 14 are located at the outer edge 1 10 and the two main surfaces 102, 102, the exclusion areas 108, 108, . . . . . . . . . . . . . . . . . . . . . .- . . between. The present invention is suitable for cleaning and/or grinding the outer edge 110 of the substrate 100 with at least one bevel 112, 114 without affecting the component regions 106, 106. 200810881 In some embodiments, all or a portion of the exclusion zones 108, 108 may also be cleaned or ground. The present invention provides a frame to support a film (e.g., a grind abrasive film) or an abrasive buffer against the edge of the substrate 100 when the substrate 100 is rotated. By vacuum chuck, drive roller, etc.). The film is pressed against the edge of the rotating substrate 1〇4 by means of a gasket pushed by the actuator or a fillable gasket. In either case, the gasket or fillable gasket is soft and/or includes or develops a contour to conform to the opening of the substrate edge 1 〇 4 / depending on the force applied by the actuator The amount of elasticity of the selected gasket, the amount of filler that can be filled, and/or the amount of tension on the membrane, and the amount of pressure controlled to grind the edge 1〇4 can be applied. Alternatively or additionally, the film may be under tension within the frame such that the film itself may (eg with or without additional support from the haptics) apply a variable amount of tension to the substrate edge 104 and to the ramie, And to the outer edge 110 and the at least one slope 112, 114. The present invention provides an accurate control of the edge grinding process which complements the different edge geometries and variations in the substrate as the material is removed from the edge ι4. In some embodiments, the frame can support a plurality of polishing heads, each of which is adapted to support the abrasive film. Such abrasive heads support different types of membranes (e.g., different rubble stones>, discs) that are used simultaneously in a predetermined sequence or at different time points. The heads can be placed at different locations and in different orientations (eg, aligned to the edge 104, orthogonal to the edge 104, and at an angle of 1〇4 relative to the edge) to allow the supported membrane to grind the edge of the rotating substrate 1 Q 〇 1 〇4 different parts. The heads are swayed by the frame around or along the edge of the rim 200810881 or moved (eg, all of the reels of the substrate 100 are rotated and/or circumferentially angularly displaced relative to the substrate 100) to sharpen the edges 1〇4 The different portions 'in some embodiments' are such that the heads are oscillated around or along the rotating edge of the substrate 100. ^Each head may include one of the films indicating the reel' and/or being housed in a Replaceable E box. A marking reel can allow an accurate amount of film to be fed to position the unused film for use in the grinding. In some embodiments, two indexing reels can be used to move the film back and forth between the reels.

Additionally or alternatively, the invention includes a facility that delivers fluid to the edge of the substrate being ground. In some embodiments, one or more conduits are provided to direct the chemical or water to the edge 1b of the substrate to aid in grinding and/or rinsing off the particles produced by the milling. The chemical can be sprayed directly onto the substrate 100 (at the substrate/abrasive film interface) and/or can be applied to or through the film and/or gasket. The fluid may be sprayed from one or both sides of the substrate 100 and the present invention may utilize gravity or suction to prevent fluid from contaminating or contacting other portions of the substrate 100, or the apparatus of the present invention. Again, energy (e.g., ultrasonic energy) can be applied via the fluid to the substrate edge 104, wherein the flow system carries such energy. The substrate 100 can be rotated in a horizontal plane. The edge 104 of the substrate 10 can be aligned or orthogonal to the abrasive film, gasket, and/or polishing head. In an additional or alternative embodiment, the substrate 100 can be rotated in a vertical plane, other non-horizontal planes, and/or moved between different planes of rotation. In some embodiments, the actuator used to rotate the substrate 100 and the actuator that pushes the cymbal and/or abrasive film against the substrate edge 104 with 200810881 is controlled by a controller. Similarly, the operation of the marking reel and/or the fluid conduit is also under the direction of control. The controller is adapted to feed back signals from the driver and/or the actuator, wherein the signals are respectively indicated: (1) An amount of energy and/or torque applied to drive the substrate 100 (eg, rotating a vacuum chuck holding the substrate 100); and/or (2) being applied to the actuator to push the art piece/grinding film against The amount of force that depends on the substrate 100. These feedback signals are utilized to determine the amount of material that has been removed from the edge of the substrate, which may include whether a particular layer of material has been removed and/or whether a desired edge profile has been achieved. For example, a reduction in the torque of rotating the substrate 100 during the grinding process (or consumption of energy to rotate the substrate 100) may indicate a reduction in friction between the substrate 100 and the abrasive film and/or gasket. The reduction in torque or rotational energy corresponds to the amount of material removed from the edge of the substrate at or near the point of contact between the substrate and the abrasive film, and/or a feature edge profile (eg, at the edge of the substrate 100) Shape, bendability or smoothness). Alternatively or additionally, a friction sensor disposed in contact with the edge of the substrate can provide a signal indicative of the amount of material that has been removed from the substrate. Referring to Figure 2, there is shown a schematic view of an edge grinding apparatus 200. A frame 2 2 supports and tensions an abrasive film 204 in a plane perpendicular to the major surfaces 1 , 2 , 102 of the substrate 100 such that the edge 10 of the substrate 100 can be pressed The film 204 is abraded against (e.g., as indicated by the straight downward arrows 2〇5a, 205b), and the abrasive film 204 may conform to the substrate edge 104 in a contoured manner. As indicated by the curved arrow 2〇5c, the substrate 100 is rotated against 10 200810881

The film 204 is ground. Substrate 100 is rotated at a rate of, for example, between about 50 and 300 RPM, although other rates may be used. The substrate 100 contacts the abrasive film 2 0 4 for about 15 to 15 seconds, depending on the type of film used, the grit of the film, the rate of rotation, the amount of grinding required, and the like. More or less time can be used. In some embodiments, the abrasive film 204 is swept by a spacer 206 that is disposed adjacent the back side of the abrasive film 204 (e.g., non-abrasive side) and that is mounted on the frame 202. As indicated by the straight upward arrow 207, the frame 202 (including the warp-knitted abrasive film 204) and/or the gasket 206 is pushed against the edge 104 of the substrate 100. In some embodiments, the substrate 1 can be pushed against the abrasive film in an amount from about 0.5 lbs to about 2.0 lbs of force. Other forces can be used. Additionally or alternatively, the additional length of the abrasive film 204 can be supported and tightened by the spools 208, 210, wherein the spools 2, 8, 21 are loaded with δ and the frame 220. A supply spool 208 includes an unused abrasive film 2 〇 4 that can be rolled up and pulled to a position adjacent to the substrate 1 ;; a take-up spool can receive the used and/or worn abrasive Membrane 2〇4. The reels 2, 8, 21 or both can be labeled to precisely control the amount of the abrasive film 204 being fed. The abrasive film 2〇4 can be made of many different materials including alumina, yttria, tantalum carbide, and the like. Other materials can also be used. In some embodiments, the size of the abrasive particles used can range from about 5 microns to about 3 microns. While other sizes can be used, the plates can also have different shapes and textures. Grinding 暝2〇4 of different widths can be used: from about 1 吋 to about 1-5 吋 (although other widths can be used). In one or more embodiments, the thickness of the abrasive film can be about 4 4 4 〇 2 吋, and 200810881 and v, '1 to 5 can be tolerated in the embodiment using the cymbal 206. The tension of the lbs, and in the embodiment where the spacer is not used, can withstand the scent of $ 〜 and about 3 to 8 lbs. Others with different thicknesses and strengths can be used _

Disgusting film. The reel 208 V 210 may have a diameter of about 1 inch, holding about 500 s of & butyl <grinding film 204, and may be made of any implementable material (e.g., polyamine amide) Poly vinyl difloride, PVDF), etc.) to catch μ y water structure. You can use J:

His materials. The frame 202 can be constructed of any material that can be implemented, without recording steel, and the like. In some embodiments, one or more fluid conduits 212 (eg, a spray nozzle or strip) may be provided to transport chemicals and/or permanent water to aid in the grinding/cleaning of the substrate edge 104, the lubrication base. Material, and / or rushing people # wash off the removed material. Fluid conduit 212 delivers fluid to substrate 100, δ m lifetime u to abrasive film 204, and/or to gasket 206. The fluid may include deionized water, which is used as a lubricant and rinses off the particles. It may also include a surfactant and/or other cleaning chemicals that have been removed. In some embodiments, a vertical oil/~ towel chopper (e.g., ultrasonic) nozzle may be used to deliver the sonicated fluid to the edge of the substrate at a level of 1 Λ ιν & 1 补助 to aid in cleaning. Fluid can also be delivered to the edge 1〇4 via the abrasive film 204 and/or the gasket. Please refer to the third and third figures, which are front and side views, respectively, of the polishing film 204 and the spacer 206 of the second wish. It should be noted that the force θ (indicated by the straight arrow) causes the abrasive film 204 and the shim 206 to conform to and conform to the edge 104 of the substrate 100. In some embodiments, if there is a flat surface on the substrate 100' spacer 206, the flat surface is where the material 100 1 is forced to the spacer 206. Similarly, if the substrate 1 is not present, the abrasive film 204 is flat and is indicated by a straight line in the two figures. 12 200810881 Please refer to Figures 4 and 5 for the different edge grinding equipment 4 〇 〇,

Two additional alternative embodiments of 00. As shown in FIG. 4, an exemplary edge grinding apparatus 400 includes a base or frame 402, and the base or frame 4 包括 2 includes a head 404 that supports the polishing film 220, and the polishing film 205 is Tightened between the reels 2 0 8 and 2 1 0 and further marked by a spacer of 2 0 6 kg. As shown, the spacer 206 is mounted to the head 404 via a biasing member 406 (e.g., a spring). The edge grinding apparatus of FIG. 4 also includes one or more drive rollers 408 (two shown) and guide rollers 41 〇 (two shown), and the guide roller 410 is adapted to rotate the edge of the substrate 100. The crucible 4 abuts against the abrasive film 204. Each drive roller 408 is driven by a driver 412 (eg, a motor, gear, belt, chain). The drive roller 408 and the guide roller 41 〇 include a groove such that the rollers 408, 410 individually support the substrate 1 〇〇. In some embodiments, the grooves in the drive roller 408 have a diameter of about 2.5 inches, and the grooves in the guide rollers 41 have a diameter of about 1 inch. Other sizes can also be used. The block in which the drive roller 408 is in contact with the substrate 1〇 includes a textured or phase-shifted groove such that the drive roller 408 grips the substrate 1〇〇. The driving roller 4〇8 and the guiding roller 41〇 may be constructed of materials such as polyaminocarbamate, polyvinylidene difluoride (PVDF), and the like. Other materials can also be used. . . /_'.. ' . . . / / As shown in Fig. 5, another exemplary edge grinding apparatus 5 includes a base or frame 502 'the base or frame 502 includes ~ to support the abrasive film 204 The head 5〇4' is in which the abrasive film 2〇4 is knitted between the reels 2〇8, HO < and more supported by the spacers 2〇6. As shown, the gasket 2〇6 can be 13 200810881

The head 504 is mounted by an actuator 506 (e.g., a pneumatic slider, a hydraulic ram, a servo motor drive, etc.). The 5th edge edge grinding apparatus 500 can also include a vacuum chuck 5 〇 8 and a vacuum chuck 508 coupled to a driver 510 (e.g., motor, gear, belt, chain, etc.). An advantage of the embodiment shown in Fig. 5 is that the device 500 does not need to be in contact with the edge being ground.疋 ’ can eliminate the potential for particles to accumulate on the drive roller and redeposit on the edge 104. There is also no need to clean the rollers. Furthermore, it is also possible to eliminate the possibility of damage to the roller or to the edge of the injury. By holding the substrate in the hollow chuck, high speed rotation can be achieved without vibration. Referring to Figures 6 through 8B, the rims show the detailed structural features of the exemplary embodiments of Figures 4 and 5. It should be noted that the features of the different embodiments can be combined in many different practical ways to be applied to different design principles or considerations. Figure 6 is a diagram showing the detailed structure of the frame 502 (including the head 504) of Figure 5. As previously mentioned, the head 504 supports the abrasive film 204, wherein the abrasive film 204 is stretched between the spools 208, 21A. The light frame 5〇2 (including the head 5〇4) is angularly transferred from the hub 600 by a driver 600 (e.g., a feeding motor) (relative to the axis tangent to the edge 104 of the substrate, wherein the substrate is It is held in the edge grinding apparatus 500 (Fig. 5)). The angular transfer of the frame (with the abrasive film 2〇4) will be described in more detail below with reference to Figures 9A through 10C. Additionally, the spools 208, 210 that are mounted to the head 504 can be driven by one or more drivers 604 (e.g., servo motors). The driver 604 can provide an indication capability such that a particular amount of unused abrasive film 204 is advanced 14 200810881 or continuously fed to the edge of the substrate, and a tightening capability to cause the abrasive film to be stretched and pressure applied to The edge of the substrate. As shown in detail in FIG. 6 (relative to FIG. 5), the selective spacer 206 can be mounted to the head 504 via an actuator 506, wherein the actuator 506 is adjustably «forces the abrasive film 204 or The contour of the abrasive film 204 is conformed to the edge of the substrate 104 (Fig. 5). Furthermore, one or more support rollers 6〇6 may also be mounted to the head 504 to guide and align the abrasive film 2〇4 to a major surface 1〇2 (Fig. 1) perpendicular to the substrate 100. A plane in which the substrate 100 is held in the edge grinding apparatus 50 (Fig. 5). It is to be noted that in the embodiment illustrated in Figures 5 and 6, the length of the abrasive film 204 is set to be orthogonal to the edge 1 04 of the substrate 1 being ground. This is in contrast to the embodiment of Fig. 2, in which the longitudinal direction of the abrasive film 404 is aligned with the edge 1〇4 of the substrate 1 being ground. Other abrasive film alignments and configurations can also be used. For example, the abrasive film 204 can be held diagonally relative to the major surface 1〇2 of the substrate 1〇〇. Referring to Figures 7A and 7B, there are shown perspective views of two different embodiments of replaceable cassettes 7a, 700B. The cassettes 7〇〇a, 7〇〇b provide features of the head 4〇4 and the abrasive film 204 in a disposable, refillable, and/or replaceable kit that can be quickly and easily loaded The frames 402, 502 from the different edge grinding devices 400, 500 are provided to and/or removed. As shown in Fig. 7A, the cassette 700A includes a head 404 which supports the abrasive film 2 0 4 across the supply spool 2 0 8 to the take-up spool 2 1 . The abrasive film 204 can be guided and aligned by the support rollers 606, which are attached to the head 404. A spacer 2〇6 can be provided to support the abrasive film 204 in one step, as previously described. As previously mentioned, a biasing element 406 (e.g., a spring) can be utilized to provide the spacers 206 to 4404 to provide an elastic/dynamic back pressure to the spacer 206. Alternatively or in addition, an adjustable actuator 506 (Fig. 6) may be used to push the pad 206 against the squeegee film 204' or push the entire head 404 toward the substrate 1'.

In still another alternative embodiment, as shown in FIG. 7B, without the spacer 206, the head 404 can provide lateral force to the edge of the substrate by only the tension of the abrasive film 204. ). In some embodiments, the head 404 can include a notch 702, as shown in FIG. 7 to accommodate the substrate j 〇〇. Referring to Figures 8 and 8, there are shown two different alternative embodiments of the spacers 206A, 206A. In addition to the spacer 2〇6 (which has a flat surface coplanar with the polishing crucible 204 when the substrate is absent (Fig. 6)), the spacer 206Α may have a contour conforming to the edge of the substrate 1〇. 4 concave. Alternatively, as shown in FIG. 8 , the spacer 206 Β may have a double concave surface to better conform to the edge of the substrate i 00 , 〇 4 , and conformally conform to the substrate 1 又 in a contoured manner. The edge 104 (including the slopes ii2, ii4, and the outer edge 110 (Fig. 1)).

Uupont Corporation's eve, Delrin, PVDF, polyamine

The acid ester sealed chamber foam, 矽 rubber u L Tian Gan ^ is made of materials specializing in winning. You can also use ", his material. Such materials can be u ^ ^ elastic, or a conformal capability that is a function of persistence or density. ”, 垫 摞, 棂 . This material can be chosen according to its elasticity, and the elasticity can then be selected according to the hungry grinding pattern needed. 16 200810881

In the second embodiment, the spacers 206, 206A, 206B have an adjustable amount of ability to conform to the edge of the substrate. For example, the spacers 206, 206A, 206B can be or include a fillable pocket that can be made stiffer by adding more air or liquid or ', he', L-shaped, and the gasket can be Reduces the work fluid or liquid or other fluid in the garment to become more conformal. Figure 8C depicts a green example of a gasket 2 〇 6C that can be filled with a pocket 8 〇 2, wherein the fillable pocket 802 can fluid from a fluid supply source 8 经由 6 via a (10) body s The fill 804 is filled (and/or emptied). In some embodiments, the fluid supply source 806 can be slid under the direction of the operator or under the direction of a stylized and/or user operated controller. 2 filling/wave leakage. In such an embodiment, an elastic material (such as Shishi rubber, etc.) can be used for the pouch 802 to further enhance the pouch stretch and conformal to the edge of the substrate 1〇4 The ability of such an embodiment may allow the operator/controller to precisely control how far the abrasive film 204 is in contact with the substrate 1 超过 over the slopes U2, 146 (if all) and into the exclusion zone 1 〇 8 and/or 1 〇 8, how far (Fig. 2), for example, by limiting the amount of fluid that is drawn into the bladder 802 by the cartridge. For example, the outer edge 110 of the substrate is placed against the pocket having the vapor leak pocket 8 When the 塾 2 〇 2 〇 6c, the capsular bag 802 is filled so that the cymbal 2 〇 6c is forced to follow and conform to the outer edge 110 and oblique of the substrate 100 112, 114, without wrapping the component regions 106, 106 of the substrate 100. It should be noted that in some embodiments, a plurality of pockets may be used in the septum, and the sepals 206 of different shapes, Different shapes of fillable pouches can be used in 206A, 206B. In some embodiments, fluid to aid in grinding can be delivered to the edge of the substrate via the crotch panels 206, 206A, 206B. A fluid tube 17 can be provided. To drip or spray fluid onto the gasket or into the gasket. Alternatively, the fillable gasket may comprise a bladder having a semi-permeable membrane, wherein the semipermeable membrane allows the fluid to be slowly released And being transferred to the abrasive film 204 (eg, via a gasket). In such an embodiment, the gaskets 2〇6, 206A, 206B can be absorbed and/or retained for use (eg, polyvinyl alcohol (polyvinyl alcohol) •, PVA), etc.) are covered, made, and/or included with the material.

Figures 9A-9C and 10A-10C illustrate different possible head positions of the alternative edge grinding apparatus 400, 500, respectively. The present invention is applied so that the abrasive film 204 is in contact with the bevel 丨丨2, 丨4 and the outer edge of the substrate 1 丨 丨! 〇, without touching the component area 1〇6 of the substrate 100. In operation, this can be achieved by angularly transferring the heads 404, 504 about an axis (and thus a portion of the abrasive film is in contact with and contoured to conform to the edge 104 of the substrate 1), wherein the shafting It is tangent to the outer edge 丨1〇 of the substrate 1 that is rotated. Referring to Figures 9A-9C and 10A_1〇c, the axis of the angular transition is represented by a line extending vertically from the surface of the drawing labeled r p". The heads 4, 4, 5, 4 can be held in different positions to clean about the desired portion of the substrate edge 104 as the substrate 1 is rotated. In some embodiments, the heads 4, 4, 504 are adapted to be slammed between successively or intermittently at different locations and/or other locations as depicted. The headers 404, 504 can be moved to the frame 502 by the driver 600 (Fig. 6) under the direction of a programmed or user operated controller. Alternatively, the heads 4〇4, 5〇4 can be fixed and/or adjusted only when the substrate is not being rotated. In still other embodiments, the substrate can be held stationary while the headgear is circumferentially rotated by the shock disk (as previously described) and around the substrate 18 200810881 100. Furthermore, the abrasive film 204 can be mounted on the heads 404, 504 in a continuous loop, and/or the abrasive film 204 can be fed forward (or intermittently) forward to grind the substrate edge 104 and/or Add the grinding effect on the base #Edge 1 04. For example, the travel of the film can be used to establish or enhance the grinding motion. In some embodiments, the membrane 2〇4 can be reciprocated to grind and/or reinforce the abrasive response to a stationary or rotating substrate. In some embodiments, film 2〇4 can be held stationary during grinding. Furthermore, the film 204 tension and/or force 207 (Fig. 2) can be varied depending on various factors, such as including the angle and/or position of the abrasive film 204, the grinding time, and the materials used in the substrate. , the layer being grounded \ the amount of material being removed, the speed at which the substrate is being rotated, the amount of current that the substrate is rotating the substrate, and so on. Any combination of the above-described grinding motions and/or methods that can be implemented can be utilized. These methods provide additional control over the edge grinding process that can be used to complement the geometry and the material being removed as the film 204 is rotated/moved about or relative to the edge 1〇4. Referring to Figures 11-12, an additional embodiment of an edge grinding apparatus is illustrated. 11 is an edge grinding apparatus 1100 including three heads 404, 12 is an edge grinding apparatus 1200' including two heads 5〇4, and FIG. 13 is a diagram including four heads 13〇4 Edge grinding apparatus 1 300. As shown, any number and type of heads 4〇4, 5〇4, 13〇4 can be used in any implementable combination. Moreover, in such a multi-head embodiment, each of the heads 404, 5σ4, 1304 can use no abrasive film 2〇4 (eg, different numbers of heads 404, 504, 1304 of different grit, material, tension, pressure, etc. can simultaneously Individually and/or 19 200810881 are used sequentially. Different heads 404, 504, 1 304 can be used on different w substrates 100, or different types of substrates. For example, having a rigid biasing element The first head 4 〇 4 of the 406 to support a cymbal 2 〇 6 (eg, the concave cymbal 2 〇 6B) and a rough grit abrasive film 204 may be initially used to slant from the substrate 112, 114 (1st Figure) Removing a large amount of rough material from the cypress. The first head 04 04 can be suitably positioned to approximate the slopes 112, 114. After cleaning with the first head 404, the first head 4 〇 4 is from the substrate 1 The second head 504 having a fine grit abrasive film 204 (and having no spacer) can be moved to position to grind the bevels 112, 114 and the outer edge 11〇. After the substrate is 1 ,, the portion of the abrasive film 204 used for such cleaning is worn. Therefore, The take-up spool 21 (Fig. 4) can be driven to pull the abrasive film 204 from the supply spool 2〇8 toward the take-up spool 21. In this manner, the unused portion of the abrasive film 2〇4 can be Provided between the take-up reel 21 〇 and the supply reel 2 〇 8. The unused portion of the abrasive film 204 can be utilized in a manner similar to that described above to successively clean one or more other substrates 1 〇〇. The device 11 can replace the worn portion of the abrasive film 204 with the untwisted portion, with little or no impact on the substrate - as in the case of the cartridge 7〇〇a. When the abrasive film 204 is used, if the replaceable box 7〇〇a is used, the impact on the capacity can be replaced by the snap box. The rain is minimized. 0 About the edge grinding of Fig. 13 An exemplary embodiment of the device 13A0, which is shown as a frame 13〇2 supporting a plurality of heads 3〇4. Each head 1304 is mounted to the frame 13〇2, and each head 13〇4 includes Alignment 20 200810881 :.. , . . - . . . ' . . . 1306 (eg pneumatic piston, 驱动 drive drive slip , hydraulic hammer, etc.), wherein the activist 1 3 0 6 is in response to the controller 1 3 0 8 (eg a stylized computer, an operator-guided wide-range system, an embedded instant processor, etc.) And one of the control signals is adapted to press the length of the diaphragm 206 and the abrasive film 204 against the edge of the substrate 1 〇 4. It is noted that the controller 1 3 0 8 is coupled to (eg, electrically, 檄Each of the actuators 1306 is mechanically, pneumatically, hydraulically, and the like.

Additionally, a fluid supply source 806 can be coupled to controller 1 308 and under the control of controller 1 308. Fluid supply source 806 can be controlled to independently deliver fluid (e.g., deionized water, cleaning chemistry, sonicating fluid, gas, air, etc.) to each head 1304 via one or more fluid conduits 2 1 2 . Under the direction of the controller 13A8, various fluids may be selectively delivered to the gasket 206, the abrasive film 204, and/or the substrate edge 1〇4 via the fluid conduits 212. The fluid can be used to grind, lubricate, particulate remove/wet, and/or fill the bladder 8〇2 (Fig. 8C) in the gasket 206. For example, in some embodiments, the same fluid delivered via a permeable gasket 2〇6 can be used to grind the shim 206 and fill the shim 206, while a / . . . - \ , - via the second Different flow systems that are piped (not shown) to the same head 1 304 are used for wetting and grinding. Referring to Figure 14, there is shown an embodiment of the invention similar to the edge grinding apparatus 2 of Figure 2. As in the embodiment of Fig. 2, a frame 202 supports and terminates an abrasive film 204 in a plane perpendicular to the major surfaces jOr, 〇2 (Fig. 1) of the substrate 100, such that The edge 104 of the substrate 100 can be pressed against (for example, a straight downward arrow 2〇5a, 205b 21 200810881

The film 204 is ground and the abrasive film 204 can conform to the substrate edge 104 in a contoured manner. The substrate 100 is rotated against the abrasive film 204 as indicated by the curved arrow 205c. The abrasive film 204 is supported by a die 206 which is disposed adjacent to the back side of the abrasive film 204 and which is mounted on the frame 202. As indicated by the up arrow 207, the frame 202 (including the end-to-end abrasive film 204) and/or the gasket 206 is pushed against the edge 1〇4 of the substrate 1〇〇. The abrasive film 2〇4 is supported and tightened by the reels 208, 21〇, wherein the reels 2〇8, 21〇

It is mounted to the frame 202. A supply spool 208 includes an unused abrasive film 204' which can be unwound and drawn to a position adjacent to the substrate 1; a take-up spool can pick up the used and/or worn abrasive film 2〇4 . One or both of the spools 208, 210 can be labeled to precisely control the amount of abrasive film 204 being fed. One or more fluid conduits 212 may be provided to transport chemicals and/or water to aid in the grinding/cleaning of the substrate edges 1〇4, to lubricate the substrate, and/or to rinse away the removed material. The fluid conduit 212 transports fluid to the substrate loo, to the abrasive film 2〇4, and/or to the cymbal Μ6'. Figure 14 further includes a controller 13〇8 (eg, a software driven computer, a stylized processor, A Lan land gate array, logic circuit, etc., controller 1 3 0 8 is suitable for guiding the cry." A drives the operation of benefit 1402, in which driver 1402 is used to rotate the substrate 1〇〇.嗯 叙 ^ Drive rabbit 1402 can be, for example, a motor, with a rotating vacuum loss, drive rolling to look at ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 1 sorrow and so on. The controller 1 308 transmits or rotates a control spot 径 径 and/or power signal to the driver 1402 via a signal line 1 404. Moreover, the controller 1 308 can be used to receive the feedback from the driver 1402 by the one or more signal lines 1406. As previously mentioned, the feedback from the drive state 1 4 0 2 can provide a variety of indications regarding the status of the 22 200810881 driver 1402, the edge grinding device 202, and/or the substrate 1 . For example, the rotational speed of the drive thief 1 402 can be determined by a signal indicating the amount of motor current in the drive 142. Alternatively, a sensor (not shown) in the driver 1 4 0 2 can be used to generate a signal indicating that the platform (eg, vacuum chuck) holding the substrate 1〇0 is The torque of the platform when the driver 1402 is rotated, and/or the energy applied by the driver 1402 to rotate the substrate 100 via the platform.

The information signal on signal line 14〇6 can be used to monitor the grinding process of edge grinding apparatus 202. For example, a change in the amount of galvanic current in the driver 1402 (as indicated by the feedback signal on the signal line 1406) can be interpreted by the controller 13 〇 8 as an indication that the amount of friction between the edge grinding apparatus 202 and the substrate has changed. Assuming that the edge grinding apparatus 202 maintains a constant force 207 on the substrate 1 控制器, the controller 1 3 08 can interpret the change in the amount of friction as being material that is currently being ground. Substrate 100 includes a plurality of material layers (e.g., comprising a film layer) 'which may be composed of different materials. Thus, the controller 丨300 can determine the change in current indicated on the signal line 1406, meaning that a layer of material has been removed from the edge 104 of the substrate 100 (e.g., removed by grinding). Additionally or alternatively, depending on the characteristics of the edge 1〇4 of the substrate 1 控制器, the controller 1 308 can interpret the change in the amount of friction as a specific amount of material that has been removed from the edge 104 and thus the edge profile has been changed. The embodiment of Fig. 14 further includes an actuator i408, which is directed by the controller 1308. Actuator 1408 is used to urge gasket 206 and/or membrane 204 against rotary substrate 100. Actuator 14A8 applies a strange force against the substrate, or a variable force determined by controller 13A8.致 23 200810881 The actuator 1 408 can be, for example, a pneumatic piston, a hydraulic hammer, an electrical solenoid, or the like. Controller 1 308 transmits or outputs a control and/or power signal to actuator 1408 via a signal line 1410. Moreover, controller 1 308 can receive one or more feedback or signals from actuator 1408 via one or more signal lines 1412. The feedback or information signal from the actuator 1408 can provide various indications regarding the state of the actuator 1408, the driver 1402, and/or the substrate 100. For example, the amount of force applied by actuator 1 408 can be determined by a signal indicative of the amount of current in a solenoid within actuator 14A. Alternatively, a sensor (e.g., a transducer 'not shown) in the actuator 1 8 8 can be used to generate a signal indicative of being applied by the actuator 1408 for application to The energy of the substrate. As with the information signal on signal line 1406, the signal on signal line 1412 can be used to monitor the progress of the edge grinding apparatus 2〇2. For example, when the material is removed from the substrate 100 and the substrate diameter is reduced, the actuator 1408 can automatically maintain the fixed force applied to the substrate, and the position of the spacer 206 and the 'or abrasive film 204 can be adjusted, And/or applied to the shims 206 and /

Or the force of the abrasive film 204. The signal on signal line 14!2 indicates this change' and controller 13A can determine from this signal whether a particular amount of material has been removed from substrate 1 (10) (e.g., removed by grinding). The control thin film "I, '@1 308 can use the feedback provided by the driver 14"2, whether the predetermined edge grinding end point (e.g., the desired edge profile) has been reached, 盥i, k, or edge 104 When the current state and the predetermined end point of the US have reached the end point or the current state of the edge 104 is close to the end point (for example, measured by the amount of material that has been removed from the edge 104), 24 200810881 controls The device 308 can transmit a signal to the driver 14 〇 2 to reduce the rotational speed of the base 100, thereby avoiding further rates from ς 104 #^#^ , t ^ 104 in the former situation. Similarly, controller 1308 can use the feedback signal provided by actuator 1408 to determine if a predetermined end point has been reached or is close to a predetermined end point. At the time of the decision, the controller 1308 can transmit a signal to the actuator 1408' to reduce the amount of force applied to the spacer 206 and/or the abrasive film.

To suspend or slow down further material removal from the edge 1 〇 4. The foregoing description discloses only exemplary embodiments of the invention. Variations of the apparatus and method disclosed by those of ordinary skill in the art that are within the scope of the invention are apparent. For example, although the invention merely discloses an example of a substrate that cleans a circle, the invention can be modified to clean substrates having other shapes (e.g., glass or polymer sheets for use in flat panel displays). Moreover, while the above shows the processing of a single substrate by equipment, in some embodiments, the apparatus can process several substrates simultaneously. Further, the edge grinding apparatus 200 of the present invention can be incorporated into other apparatuses. For example, apparatus 200 can be incorporated into a primary surface grinder or a substrate cleaner. The integration of an edge grinding module into a substrate mill (e.g., APPLIED, MATERIALS, INC. Reflexion Oxide CMP Sy stem) exchange station has many advantages. Such incorporation can utilize substrate exchange equipment without the need for additional substrate transport members. For example, deionized water and piping facilities have been built and the modules can be easily accessed via the grinder window. Moreover, such incorporation can be accomplished without impacting the tool footprint. Furthermore, especially for applications with relatively long process cycle times (eg steel applications), 25 200810881, there is sufficient time to grind the edges of the substrate without reducing the overall productivity of the tool. It is to be understood that the invention has been described by the exemplary embodiments of the invention, and it is understood that other embodiments are within the spirit and scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view of a part of a substrate.

Figure 2 is a schematic illustration of an exemplary embodiment of an edge cleaning apparatus in accordance with the present invention. Figures 3A and 3B are partial front and side views, respectively, of a portion of the edge cleaning apparatus of Figure 2. Figure 4 is a perspective view of an embodiment of an edge cleaning apparatus in accordance with the present invention. Figure 5 is a perspective view of another embodiment of an edge cleaning apparatus in accordance with the present invention. Fig. 6 is a perspective view showing a part of the embodiment of Fig. 5. 7A and 7B are fragmentary perspective views of different interchangeable cartridge embodiments for use in embodiments of the present invention. Figures 8A-8C are partial perspective views of different gasket embodiments for use in embodiments of the present invention. Figures 9A-9C are diagrams showing examples of different possible head positions of the exemplary edge grinding apparatus of Figure 4. The 10A-1 0C diagram shows an example of the possible edge position of the exemplary edge grinding apparatus of FIG. 5 2008. Figure 11 is a perspective view of an embodiment of a multi-edge edge grinding apparatus in accordance with the present invention. 4 Figure 12 is a perspective view of another embodiment of a multi-head edge grinding apparatus in accordance with the present invention. Figure 13 is a perspective view of another embodiment of a multi-head edge grinding apparatus in accordance with the present invention.

Figure 14 is a schematic illustration of an exemplary embodiment of an edge cleaning apparatus in accordance with the present invention. [Main component symbol description] 100 substrate 102, 102, main surface 104 edge 106, 106' element region 108, 108' exclusion region 110 outer edge 112 bevel 114 slope 200 edge grinding device 202 frame 204 abrasive film 205a-e arrow 2 06 Shims 206A-C Shims 207 Arrows 208 Supply Shafts 210 Pickup Reels 212 Fluid Ducts 400 Edge Grinding Equipment 402 Frames 404 Heads 406 Biasing Elements 408 Drive Rollers 410 Guide Rollers 412 Drives 500 Edge Grinding Equipment 27 200810881

502 Frame 504 Head 506 Actuator 50 8 Vacuum chuck. 510 Drive 600 Drive 602 Hub 6 04 Drive 606 Gift Roller 700A 匣 Box 700B 匣 Box 702 Groove 8 02 Fillable 嚢 Bag 804 Fluid Pipe 8 06 Fluid Supply 1100 edge grinding equipment 120 0 edge grinding equipment 13 0 0 edge grinding equipment 13 02 frame 1304 head 1306 actuator 1308 controller 14 02 driver 1404 signal line 1406 signal line 1408 actuator 1410 signal line 14 1 2 signal line

28

Claims (1)

200810881 X. Patent Application Range: 1. A method of grinding an edge of a substrate, the method comprising: rotating a substrate against an abrasive film to remove material from an edge of the substrate; and detecting The amount of energy and torque applied when the substrate is rotated against the abrasive film. 2. The method of claim 1, further comprising: determining the shift from the edge of the substrate based on the detected energy or torque applied to rotate the substrate against the abrasive film The amount of material removed. 3. The method of claim 2, further comprising: determining a difference between the determined amount of material removed and a predetermined degree of grinding. 4. The method of claim 3, further comprising: determining the amount of energy or torque to be applied when rotating the substrate based on the determined difference between the amount of removed material and a predetermined degree of grinding The amount is adapted to bring the substrate to a predetermined degree of grinding. - The method of claim 4, further comprising: adjusting the amount of energy or torque applied when rotating the substrate to the The amount of decision. 29 200810881 6. The method of claim 3, wherein a layer of material has been removed from the edge of the substrate. 7. The method of claim 1, wherein the film is rubbed by transporting a fluid to the abrasive film. 8. The method of claim 1, wherein the particles are removed by the film during the contact of the particles with the substrate to remove particles from the edge of the substrate. 9. A method of grinding an edge of a substrate, wherein the substrate is transferred to a substrate to remove the material against a grinding month; and the amount of the abrasive film is pressed against the amount of the film. Χ 10· As stated in item 9 of the scope of patent application, according to the detected force to oppress the scrapping, it is decided to remove from the side of the substrate, including: the amount of material, determine whether it is, The method further comprises: reducing the substrate and the grinding, and further comprising: a method of conveying a fluid to the grinding method comprising at least: a force applied from the edge substrate of the substrate, further comprising: abutting The amount of material to be applied when the substrate is rotated. 30 200810881 11· The method of claim 1 and the soil S 1 1% as described in claim 10, further includes: determining the determined coarse material of the removed material also = * The difference between the bamboo and the predetermined degree of grinding. 12· The method described in claim n, further includes: Determining the level of force to be applied to the abrasive crucible according to the determined difference between the amount of material removed and the predetermined degree of grinding, which is adapted to achieve a predetermined degree of grinding of the substrate; and adjusting the force to the The level of decision. 1 3 - a system for polishing the edge of a substrate, the system comprising at least one substrate rotation driver adapted to rotate an edge of a substrate against an abrasive film; and a first a sensor coupled to the rotator, the first sensor being adapted to detect when the substrate rotation driver rotates the substrate against the .... _ - abrasive film One of the force and torque applied by the substrate rotation drive. 14. The system of claim 13, further comprising: a controller coupled to the first sensor and to the substrate rotary drive, the controller being adapted to receive from the first a signal from the sensor, wherein the signal indicates that it is detected and applied by the substrate rotary actuator 31 200810881 Energy or torque, read t μ controller is also suitable to transmit the suppression according to the detected amount or torque. _ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 2 two signals to the substrate rotation driver. 15. The system of claim 14, wherein the controller is adapted to determine the amount of material that has been removed from the substrate based on the receipt. 16. If the patent application is filed, the system described in Item 13 of the Guanguanwei, further comprises: a crying duo, 0X1', which is adapted to press the abrasive film against the rotating substrate. The system of claim 16, wherein the actuator is adapted to provide a signal indicating that the actuator is applied when the abrasive film is pressed against the rotating substrate. The power. The system of claim 17, wherein the controller is coupled to the actuator, and the controller is adapted to determine the actuator to be applied to the actuator based on the signal provided by the actuator The power of the abrasive film. 1 9 - The system of claim 16, wherein the actuator is adapted to press the abrasive film against the rotating substrate for a period of between 15 seconds and 150 seconds, A predetermined degree of grinding is obtained. 20. The system of claim 18, wherein the actuating device 32 200810881 is adapted to apply a force of between about 0.5 pounds and about 2:00 to the abrasive film to achieve a predetermined degree of grinding. . 21. The system of claim 14, further comprising: a fluid supply source coupled to the controller and to the abrasive membrane; wherein the controller is adapted to direct the fluid supply to deliver Fluid is applied to the abrasive film. 22. The system of claim 21, wherein the fluid is supplied to a point of contact between the abrasive film and the edge of the substrate. 23. An apparatus adapted to apply a predetermined pressure to a polishing film, the abrasive film contacting an edge of a substrate, the noise comprising at least: an actuator adapted to apply a predetermined pressure to the abrasive film; And a controller coupled to the actuator and adapted to receive a signal indicative of a state of an edge of the substrate and adapted to be adjusted by the received signal The pressure applied to the abrasive film is maintained at the predetermined pressure. 24. The device of claim 23, wherein the signal is indicative of whether a layer of material has been removed from the edge of the substrate. The apparatus of claim 23, further comprising: a driver coupled to the controller, the driver rotating the substrate against the abrasive film, the driver being adapted To generate a number, the signal indicates the state of the edge of the substrate. 2. The device of claim 25, wherein the control is coupled to the driver and is adapted to direct operation of the driver in response to a signal received by the sensor, thereby achieving a predetermined degree of grinding. From a signal system to 34