JP2002219642A - Glass substrate for magnetic recording medium and its manufacturing method and magnetic recording medium using the same - Google Patents
Glass substrate for magnetic recording medium and its manufacturing method and magnetic recording medium using the sameInfo
- Publication number
- JP2002219642A JP2002219642A JP2001016279A JP2001016279A JP2002219642A JP 2002219642 A JP2002219642 A JP 2002219642A JP 2001016279 A JP2001016279 A JP 2001016279A JP 2001016279 A JP2001016279 A JP 2001016279A JP 2002219642 A JP2002219642 A JP 2002219642A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- polishing
- recording medium
- magnetic recording
- face
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 322
- 239000011521 glass Substances 0.000 title claims abstract description 292
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 136
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 82
- 238000000034 method Methods 0.000 claims abstract description 100
- 238000005498 polishing Methods 0.000 claims description 261
- 230000002093 peripheral effect Effects 0.000 claims description 100
- 239000002002 slurry Substances 0.000 claims description 40
- 239000006061 abrasive grain Substances 0.000 claims description 35
- 239000010410 layer Substances 0.000 claims description 33
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 28
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 28
- 239000007864 aqueous solution Substances 0.000 claims description 26
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 18
- 229910003460 diamond Inorganic materials 0.000 claims description 17
- 239000010432 diamond Substances 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 16
- 239000008119 colloidal silica Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- 239000003513 alkali Substances 0.000 claims description 15
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 15
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 15
- 239000011241 protective layer Substances 0.000 claims description 14
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 12
- 229920000728 polyester Polymers 0.000 claims description 8
- 239000004094 surface-active agent Substances 0.000 claims description 8
- 239000004677 Nylon Substances 0.000 claims description 7
- 230000001050 lubricating effect Effects 0.000 claims description 7
- 229920001778 nylon Polymers 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 6
- 238000007517 polishing process Methods 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 239000012670 alkaline solution Substances 0.000 claims description 2
- 230000000694 effects Effects 0.000 claims 2
- 238000003825 pressing Methods 0.000 description 20
- 238000007796 conventional method Methods 0.000 description 11
- 238000005553 drilling Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 238000010828 elution Methods 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000006124 Pilkington process Methods 0.000 description 3
- 238000000635 electron micrograph Methods 0.000 description 3
- 238000004255 ion exchange chromatography Methods 0.000 description 3
- 239000000314 lubricant Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- 101001094026 Synechocystis sp. (strain PCC 6803 / Kazusa) Phasin PhaP Proteins 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/0056—Control means for lapping machines or devices taking regard of the pH-value of lapping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
- B24B21/002—Machines or devices using grinding or polishing belts; Accessories therefor for grinding edges or bevels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/0014—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture record carriers not specifically of filamentary or web form
- G11B23/0021—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture record carriers not specifically of filamentary or web form discs
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Surface Treatment Of Glass (AREA)
- Magnetic Record Carriers (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、コンピュータの外
部記憶装置をはじめとする各種磁気記録装置に搭載され
る磁気記録媒体（ハードディスク）用ガラス基板および
その製造方法、並びに該基板を用いた磁気記録媒体に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass substrate for a magnetic recording medium (hard disk) mounted on various magnetic recording devices such as an external storage device of a computer, a method of manufacturing the same, and magnetic recording using the substrate. Regarding the medium.
【０００２】[0002]
【従来の技術】磁気記録媒体（ハードディスク）用の基
板として用いられるガラス基板の製造方法では、一般
に、ガラス基板の端面を研磨する工程が含まれる。従来
の端面研磨法は、基板を複数枚重ねて、酸化セリウム等
の砥粒を含んだスラリーを流しながらブラシを基板の端
面に押しつけて研磨する方法と、枚葉式で基板表面を真
空チャックによりクランプし、酸化セリウム等の砥粒を
含んだスラリーを流しながら硬質ウレタン等を基板の端
面に押しつけて研磨する方法の２種類が用いられてい
る。2. Description of the Related Art A method for manufacturing a glass substrate used as a substrate for a magnetic recording medium (hard disk) generally includes a step of polishing an end face of the glass substrate. The conventional edge polishing method is a method in which a plurality of substrates are stacked, a brush is pressed against an end surface of a substrate while a slurry containing abrasive grains such as cerium oxide is flown, and a polishing is performed on a substrate surface by a vacuum chuck in a single-wafer method. There are two methods of clamping and pressing a hard urethane or the like against an end face of a substrate while flowing a slurry containing abrasive grains such as cerium oxide.
【０００３】[0003]
【発明が解決しようとする課題】近年の磁気記録媒体
（ハードディスク）の高記録高密度化の要求に伴い、磁
気ヘッドの浮上量を低く保つ必要が生じ、このような要
請から基板表面に求められる品質が厳しくなっている。
上述のような従来の研磨方法では、基板を重ねたり、基
板表面をクランプして研磨を行うため、基板表面に傷が
発生するという問題がある。この傷は、表面を研磨する
工程（例えば、ラップ加工やポリッシュ加工）でも残留
し、最終的に磁気記録媒体の表面に悪影響を及ぼす。例
えば、これは磁気ヘッドの浮上性を悪化させ、最悪の場
合磁気記録装置のクラッシュに繋がる。With the recent demand for higher recording density of a magnetic recording medium (hard disk), it has become necessary to keep the flying height of a magnetic head low. Quality is getting stricter.
In the conventional polishing method as described above, since the substrates are stacked or the substrate surface is clamped for polishing, there is a problem that the substrate surface is damaged. These scratches remain even in the step of polishing the surface (for example, lapping or polishing), and finally have a bad influence on the surface of the magnetic recording medium. For example, this degrades the flyability of the magnetic head, and in the worst case, leads to a crash of the magnetic recording device.
【０００４】また、磁気記録媒体用ガラス基板の製造で
は、該基板の端面を研磨するが、この端面の品質は、磁
気記録媒体用ガラス基板のアルカリ溶出量に直接関係
し、磁気記録媒体の信頼性において非常に重要である。In the production of a glass substrate for a magnetic recording medium, the end face of the substrate is polished. The quality of this end face is directly related to the amount of alkali elution of the glass substrate for a magnetic recording medium. Very important in sex.
【０００５】したがって、ガラス基板の表面に傷を発生
させることなく、高品質な端面の研磨を行う方法が必要
となる。[0005] Therefore, there is a need for a method for polishing a high-quality end face without causing scratches on the surface of the glass substrate.
【０００６】[0006]
【課題を解決するための手段】本発明は、上記課題を解
決するためになされたものであり、以下の本発明により
解決される。SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and is attained by the following present invention.
【０００７】本発明の第一は、内周および外周を有する
磁気記録媒体（ハードディスク）用ガラス基板の製造方
法に関する。本発明の一態様は、該製造方法がガラス基
板の端面研磨工程を具備し、該端面研磨工程が前記ガラ
ス基板の内周をチャックして枚葉式で、研磨テープまた
は砥石を用いて前記ガラス基板の外周側の端面を研磨加
工する工程であることを特徴とする磁気記録媒体用ガラ
ス基板の製造方法である。The first aspect of the present invention relates to a method for manufacturing a glass substrate for a magnetic recording medium (hard disk) having an inner periphery and an outer periphery. In one embodiment of the present invention, the manufacturing method includes a step of polishing an end face of a glass substrate, and the end face polishing step is a single-wafer method in which an inner periphery of the glass substrate is chucked by using a polishing tape or a grindstone. A method for manufacturing a glass substrate for a magnetic recording medium, which is a step of polishing an end face on the outer peripheral side of the substrate.
【０００８】本発明の他の態様は、該製造方法がガラス
基板の端面研磨工程を具備し、該端面研磨工程が前記ガ
ラス基板の外周をチャックして枚葉式で、研磨テープま
たは砥石を用いて前記ガラス基板の内周側の端面を研磨
加工する工程であることを特徴とする磁気記録媒体用ガ
ラス基板の製造方法である。In another aspect of the present invention, the manufacturing method includes a step of polishing an end face of a glass substrate, and the end face polishing step uses a polishing tape or a grindstone by chucking the outer periphery of the glass substrate in a single-wafer manner. Polishing the inner peripheral end surface of the glass substrate by using a method for manufacturing a glass substrate for a magnetic recording medium.
【０００９】本発明の他の態様は、内周および外周を有
する磁気記録媒体用ガラス基板の製造方法であって、
（ａ）中心穴を有するディスク状ガラス基板の形状を形
成する工程、（ｂ）前記ディスク状ガラス基板の端面研
磨を行う工程、（ｃ）前記ディスク状ガラス基板の表面
仕上げを行う工程とを具備し、前記端面の研磨工程が、
前記ガラス基板の内周をチャックして枚葉式で、研磨テ
ープまたは砥石を用いて前記ガラス基板の外周側の端面
を研磨加工する工程であることを特徴とする磁気記録媒
体用ガラス基板の製造方法である。Another aspect of the present invention is a method of manufacturing a glass substrate for a magnetic recording medium having an inner periphery and an outer periphery,
(A) forming a shape of a disk-shaped glass substrate having a center hole, (b) polishing an end surface of the disk-shaped glass substrate, and (c) finishing the surface of the disk-shaped glass substrate. And polishing the end face,
Manufacturing the glass substrate for a magnetic recording medium, wherein the inner peripheral surface of the glass substrate is chucked and the outer peripheral side end surface of the glass substrate is polished using a polishing tape or a grindstone in a single wafer type. Is the way.
【００１０】本発明の他の態様は、内周および外周を有
する磁気記録媒体用ガラス基板の製造方法であって、
（ａ）中心穴を有するディスク状ガラス基板の形状を形
成する工程、（ｂ）前記ディスク状ガラス基板の端面研
磨を行う工程、（ｃ）前記ディスク状ガラス基板の表面
仕上げを行う工程とを具備し、前記端面の研磨工程が、
前記ガラス基板の外周をチャックして枚葉式で、研磨テ
ープまたは砥石を用いて前記ガラス基板の内周側の端面
を研磨加工する工程であることを特徴とする磁気記録媒
体用ガラス基板の製造方法である。Another aspect of the present invention is a method of manufacturing a glass substrate for a magnetic recording medium having an inner periphery and an outer periphery,
(A) forming a shape of a disk-shaped glass substrate having a center hole, (b) polishing an end surface of the disk-shaped glass substrate, and (c) finishing the surface of the disk-shaped glass substrate. And polishing the end face,
Manufacturing the glass substrate for a magnetic recording medium, wherein the outer periphery of the glass substrate is chucked and a single wafer processing is performed, and an inner peripheral end surface of the glass substrate is polished using a polishing tape or a grindstone. Is the way.
【００１１】本発明の他の態様は、内周および外周を有
する磁気記録媒体用ガラス基板の製造方法であって、該
製造方法がガラス基板の端面研磨工程を具備し、該端面
研磨工程が前記ガラス基板の内周をチャックして枚葉式
で、研磨テープまたは砥石を用いて前記ガラス基板の外
周側の端面を研磨加工する工程と、前記ガラス基板の外
周をチャックして枚葉式で、研磨テープまたは砥石を用
いて前記ガラス基板の内周側の端面を研磨加工する工程
とを具備することを特徴とする磁気記録媒体用ガラス基
板の製造方法である。Another aspect of the present invention is a method for manufacturing a glass substrate for a magnetic recording medium having an inner periphery and an outer periphery, the method comprising a step of polishing an end face of a glass substrate, wherein the step of polishing the end face comprises the step of: In a single wafer type by chucking the inner periphery of the glass substrate, a step of polishing the outer peripheral side end surface of the glass substrate using a polishing tape or a grinding stone, and in a single wafer type by chucking the outer periphery of the glass substrate, Polishing the inner peripheral end surface of the glass substrate using a polishing tape or a grindstone.
【００１２】本発明の他の態様は、内周および外周を有
する磁気記録媒体用ガラス基板の製造方法であって、
（ａ）中心穴を有するディスク状ガラス基板の形状を形
成する工程、（ｂ）前記ディスク状ガラス基板の端面研
磨を行う工程、（ｃ）前記ディスク状ガラス基板の表面
仕上げを行う工程とを具備し、前記端面の研磨工程が、
前記ガラス基板の内周をチャックして枚葉式で、研磨テ
ープまたは砥石を用いて前記ガラス基板の外周側の端面
を研磨加工する工程と、前記ガラス基板の外周をチャッ
クして枚葉式で、研磨テープまたは砥石を用いて前記ガ
ラス基板の内周側の端面を研磨加工する工程とを具備す
ることを特徴とする磁気記録媒体用ガラス基板の製造方
法である。Another aspect of the present invention is a method of manufacturing a glass substrate for a magnetic recording medium having an inner periphery and an outer periphery,
(A) forming a shape of a disk-shaped glass substrate having a center hole, (b) polishing an end surface of the disk-shaped glass substrate, and (c) finishing the surface of the disk-shaped glass substrate. And polishing the end face,
Chucking the inner periphery of the glass substrate in a single-wafer manner, a step of polishing the outer peripheral side end surface of the glass substrate using a polishing tape or a grindstone, and chucking the outer periphery of the glass substrate in a single-wafer manner. Polishing the inner peripheral end surface of the glass substrate using a polishing tape or a grindstone.
【００１３】さらに、上記第一の発明は、前記端面研磨
工程が、ダイヤモンド、酸化アルミ、酸化セリウム、シ
リコンカーバイド、コロイダルシリカから選択される研
磨砥粒を含む研磨テープで研磨する工程であることを特
徴とする。この態様では、前記端面研磨工程がスラリー
を用いた湿式法で研磨する工程、または、スラリーを用
いない乾式法で研磨する工程であることを特徴とする。
また、前記端面研磨工程が湿式法である場合、前記端面
研磨工程はダイヤモンド、酸化アルミ、酸化セリウム、
シリコンカーバイド、コロイダルシリカから選択される
研磨砥粒を含むスラリーを滴下しながら研磨する工程、
または、研磨砥粒を含まない、水、アルカリでｐＨ調整
したアルカリ水溶液、および界面活性剤を含む水溶液か
ら選択される水または水溶液を滴下しながら研磨する工
程であることを特徴とする。Further, the first invention is characterized in that the end face polishing step is a step of polishing with a polishing tape containing polishing grains selected from diamond, aluminum oxide, cerium oxide, silicon carbide and colloidal silica. Features. In this embodiment, the end face polishing step is a step of polishing by a wet method using a slurry or a step of polishing by a dry method without using a slurry.
Further, when the end face polishing step is a wet method, the end face polishing step is diamond, aluminum oxide, cerium oxide,
Silicon carbide, a step of polishing while dropping a slurry containing abrasive grains selected from colloidal silica,
Alternatively, the polishing step is characterized in that polishing is performed while dropping water or an aqueous solution selected from water, an alkaline aqueous solution adjusted to pH with an alkali, and an aqueous solution containing a surfactant, which do not contain abrasive grains.
【００１４】さらに、上記第一の発明は、前記端面研磨
工程がウレタン、ポリエステルおよびナイロンから選択
される材料で形成された砥粒を含まない研磨テープを用
い、研磨砥粒を含まない、水、アルカリでｐＨ調整した
アルカリ水溶液、および界面活性剤を含む水溶液から選
択される水または水溶液を滴下しながら研磨する工程で
あることを特徴とする。Further, in the first invention, the end face polishing step uses a polishing tape containing no abrasive grains formed of a material selected from urethane, polyester and nylon, and contains no abrasive grains, The process is characterized in that the polishing is performed while dropping water or an aqueous solution selected from an aqueous alkaline solution adjusted to pH with an alkali and an aqueous solution containing a surfactant.
【００１５】上記第一の発明は、前記端面研磨工程がウ
レタン、ポリエステルおよびナイロンから選択される材
料で形成された砥粒を含まないテープを用い、スラリー
としてダイヤモンド、酸化アルミニウム、酸化セリウ
ム、シリコンカーバイドおよびコロイダルシリカから選
択される研磨砥粒を含むスラリーを滴下しながら研磨す
る工程であることを特徴とする。[0015] In the first invention, the end face polishing step uses a tape containing no abrasive grains formed of a material selected from urethane, polyester and nylon, and uses diamond, aluminum oxide, cerium oxide, silicon carbide as a slurry. And polishing while dropping a slurry containing abrasive grains selected from colloidal silica.
【００１６】上記第一の発明は、前記端面研磨工程が、
ダイヤモンド、酸化アルミニウム、酸化セリウム、シリ
コンカーバイドおよびコロイダルシリカを含む砥石を用
いて研磨する工程であることを特徴とする。この態様
は、前記端面研磨工程が、研磨砥粒を含まない、水、ア
ルカリでｐＨ調整したアルカリ水溶液、および界面活性
剤を含む水溶液から選択される水または水溶液を滴下し
ながら研磨する工程であることを特徴とする。さらにこ
の態様では、前記端面研磨工程が、ダイヤモンド、酸化
アルミニウム、酸化セリウム、シリコンカーバイドおよ
びコロイダルシリカから選択される研磨砥粒を含むスラ
リーを滴下しながら研磨する工程であることを特徴とす
る。[0016] In the first aspect of the present invention, the end face polishing step preferably comprises:
The polishing is performed using a grindstone including diamond, aluminum oxide, cerium oxide, silicon carbide, and colloidal silica. In this aspect, the end face polishing step is a step of polishing while dropping water or an aqueous solution selected from water, an alkaline aqueous solution adjusted to a pH with an alkali, and an aqueous solution containing a surfactant, which does not contain abrasive grains. It is characterized by the following. Furthermore, in this aspect, the end face polishing step is characterized in that the end face polishing step is a step of performing polishing while dropping a slurry containing abrasive grains selected from diamond, aluminum oxide, cerium oxide, silicon carbide and colloidal silica.
【００１７】本発明の第二は、上記磁気記録媒体用ガラ
ス基板の製造方法で製造された磁気記録媒体用ガラス基
板に関する。The second aspect of the present invention relates to a glass substrate for a magnetic recording medium manufactured by the method for manufacturing a glass substrate for a magnetic recording medium.
【００１８】本発明の第三は、基板上に、少なくとも磁
性層、保護層および液体潤滑層が形成されている磁気記
録媒体であって、前記基板が第二の発明で特定される磁
気記録媒体用ガラス基板であることを特徴とする磁気記
録媒体に関する。A third aspect of the present invention is a magnetic recording medium in which at least a magnetic layer, a protective layer, and a liquid lubricating layer are formed on a substrate, wherein the substrate is the magnetic recording medium specified in the second invention. The present invention relates to a magnetic recording medium characterized by being a glass substrate for use.
【００１９】[0019]
【発明の実施の形態】以下に本発明を詳細に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail.
【００２０】本発明の第一は、磁気記録媒体用ガラス基
板の製造方法である。特に本発明の磁気記録媒体用ガラ
ス基板の製造方法は、該ガラス基板の内周および外周を
研磨する端面研磨工程に特徴を有する。The first aspect of the present invention is a method for manufacturing a glass substrate for a magnetic recording medium. In particular, the method for manufacturing a glass substrate for a magnetic recording medium of the present invention is characterized by an end face polishing step of polishing the inner and outer circumferences of the glass substrate.
【００２１】なお、本明細書において、外周とは、磁気
記録媒体に一般的に使用されるドーナツ型円盤状の磁気
記録媒体用ガラス基板の外側縁部を意味する。内周と
は、該ドーナツ型円盤状の磁気記録媒体用ガラス基板の
内側縁部を意味する。In this specification, the outer periphery means the outer edge of a doughnut-shaped disk-shaped glass substrate for magnetic recording media generally used for magnetic recording media. The inner circumference means the inner edge of the doughnut-shaped disk-shaped glass substrate for a magnetic recording medium.
【００２２】本発明者らは、本発明を完成させる過程
で、従来の磁気記録媒体用ガラス基板の製造方法の問題
点を検討した。すなわち、磁気記録媒体用ガラス基板の
外周または内周を研磨する端面研磨工程における基板表
面の傷の発生原因を調査した。基板を多数枚重ねてブラ
シで研磨する従来の端面研磨工程では、基板表面の傷
は、基板と基板の間にガラス屑や酸化セリウムなどの砥
粒が挟まり、この異物と基板表面が擦れることにより発
生することが判明した。また、基板表面を真空チャック
により固定して硬質ウレタンでガラス基板の内周および
外周の端面（以下では、それぞれ内周端面および外周端
面という）を研磨する方法では、基板表面とチャックの
クランプ面の傷が擦れて傷が発生すること、および、チ
ャックのクランプ面に付着した砥粒などの異物が基板表
面と擦れて傷が発生することが判明した。このような傷
の発生をなくすための解決方法としては、基板表面やチ
ャックのクランプ面のクリーニングを強化すること、チ
ャックのクランプ面の面精度（平滑さ）を向上させるこ
とが考えられる。また、他の解決策として、現在のガラ
ス基板の製造方法が、一般に、厚板をフロート法または
プレス形成法により形成し、端面研磨を行い、その後、
表面研磨工程により規定板厚を得るという工程で製造さ
れていることから、端面研磨の後、ガラス基板の表面を
研磨し、傷を取り除くことが考えられる。しかし、この
方法では、表面の傷を十分に取り除くことができない場
合がある。すなわち、製造工程の短縮、コストの削減な
どのためには初期の厚板を薄くすることが考えられてい
るため、表面研磨での取りしろが減り、その結果端面研
磨などの前工程で生じた表面の傷を十分に取り除くこと
ができない場合がある。In the course of completing the present invention, the present inventors have examined problems of a conventional method for manufacturing a glass substrate for a magnetic recording medium. That is, the cause of the occurrence of scratches on the substrate surface in the end face polishing step of polishing the outer or inner circumference of the glass substrate for a magnetic recording medium was investigated. In the conventional end-face polishing process in which a large number of substrates are stacked and polished with a brush, scratches on the substrate surface are caused by abrasive particles such as glass dust and cerium oxide sandwiched between the substrates, and the foreign matter rubs the substrate surface It was found to happen. Further, in a method in which the substrate surface is fixed by a vacuum chuck and the inner and outer end surfaces of the glass substrate are polished with hard urethane (hereinafter referred to as the inner and outer peripheral end surfaces, respectively), the substrate surface and the clamp surface of the chuck are polished. It has been found that the scratches are rubbed to cause scratches, and that foreign matter such as abrasive particles attached to the clamp surface of the chuck rubs against the substrate surface to cause scratches. As solutions for eliminating such scratches, it is conceivable to enhance the cleaning of the substrate surface and the clamping surface of the chuck and to improve the surface accuracy (smoothness) of the clamping surface of the chuck. As another solution, the current method of manufacturing a glass substrate generally includes forming a thick plate by a float method or a press forming method, polishing an end face, and thereafter,
Since it is manufactured by a process of obtaining a specified plate thickness by a surface polishing process, it is conceivable to polish the surface of the glass substrate to remove scratches after polishing the end surface. However, this method may not be able to sufficiently remove surface flaws. That is, in order to shorten the manufacturing process, reduce the cost, etc., it is considered to make the initial thick plate thinner, so that the margin in the surface polishing is reduced, and as a result, it has occurred in the previous process such as edge polishing. In some cases, surface scratches cannot be sufficiently removed.
【００２３】本発明者は、このような従来の端面研磨の
方法で生じる傷を防止する方法を見出した。すなわち、
端面研磨時にガラス基板表面を、ガラス基板の表面と接
触させることのない方法（ガラス基板を多数枚を重ねて
研磨する場合）、または真空チャックのクランプ面と接
触させることのない方法（真空チャックによりガラス基
板を保持して研磨する場合）で端面研磨を行う必要があ
るという観点から、本発明では、外周端面を研磨する場
合には内周をチャックし、内周を研磨する場合には外周
をチャックして研磨を行う。The present inventor has found a method for preventing a flaw caused by such a conventional edge polishing method. That is,
A method in which the surface of the glass substrate is not brought into contact with the surface of the glass substrate during edge polishing (when a large number of glass substrates are polished), or a method in which the surface of the glass substrate is not brought into contact with the clamp surface of the vacuum chuck (by the vacuum chuck). From the viewpoint that the end face needs to be polished in the case where the glass substrate is held and polished), in the present invention, the inner circumference is chucked when the outer peripheral end face is polished, and the outer circumference is polished when the inner circumference is polished. Grinding is performed by chucking.
【００２４】具体的には、本発明は、内周および外周を
有する磁気記録媒体用ガラス基板の製造方法であって、
該製造方法がガラス基板の端面研磨工程を具備し、該端
面研磨工程が前記ガラス基板の内周をチャックして枚葉
式で、研磨テープまたは砥石を用いて前記ガラス基板の
外周側の端面を研磨（ポリッシュ）加工する工程である
ことを特徴とする磁気記録媒体用ガラス基板の製造方法
を提供する。さらに、本発明は、該端面研磨工程が、前
記ガラス基板の外周をチャックして枚葉式で、研磨テー
プまたは砥石を用いて前記ガラス基板の内周側の端面を
研磨（ポリッシュ）加工する工程とを具備することを特
徴とする磁気記録媒体用ガラス基板の製造方法を提供す
る。また、本発明は、該端面研磨工程が、前記ガラス基
板の内周をチャックして枚葉式で、研磨テープまたは砥
石を用いて前記ガラス基板の外周側の端面を研磨（ポリ
ッシュ）加工する工程と、前記ガラス基板の外周をチャ
ックして枚葉式で、研磨テープまたは砥石を用いて前記
ガラス基板の内周側の端面を研磨（ポリッシュ）加工す
る工程とを具備することを特徴とする磁気記録媒体用ガ
ラス基板の製造方法を提供する。Specifically, the present invention relates to a method for producing a glass substrate for a magnetic recording medium having an inner periphery and an outer periphery,
The manufacturing method includes an end surface polishing step of the glass substrate, and the end surface polishing step chucks the inner periphery of the glass substrate in a single-wafer manner, and uses an abrasive tape or a grindstone to form an end surface on the outer peripheral side of the glass substrate. A method for manufacturing a glass substrate for a magnetic recording medium, which is a step of performing a polishing (polishing) process. Further, in the present invention, in the end face polishing step, the outer periphery of the glass substrate is chucked, and the inner peripheral side end face of the glass substrate is polished using a polishing tape or a grindstone by a single-wafer method. And a method for producing a glass substrate for a magnetic recording medium. Further, in the present invention, in the end face polishing step, the inner circumference of the glass substrate is chucked, and the outer peripheral side end face of the glass substrate is polished (polished) using a polishing tape or a grindstone in a single wafer type. And a step of polishing (polishing) the inner peripheral end surface of the glass substrate using a polishing tape or a grindstone by chucking the outer periphery of the glass substrate and using a single-wafer method. Provided is a method for manufacturing a glass substrate for a recording medium.
【００２５】本発明の製造方法では、ガラス基板の材料
に、従来の磁気記録媒体用ガラス基板に使用される材料
を用いることができる。具体的には、金属酸化物を含有
するガラスを好適に用いることができる。この例として
は、ソーダライムガラス、ホウ珪酸ガラス、アルミノシ
リケートガラス、アルミノホウ珪酸ガラス、アルミノシ
リケート−アルミ組成のガラス等を挙げることができる
が、これらに限定されない。In the manufacturing method of the present invention, the material used for the conventional glass substrate for a magnetic recording medium can be used as the material for the glass substrate. Specifically, glass containing a metal oxide can be suitably used. Examples of this include, but are not limited to, soda lime glass, borosilicate glass, aluminosilicate glass, aluminoborosilicate glass, and aluminosilicate-aluminum composition glass.
【００２６】本発明では、上記ガラス材料から粗製ガラ
ス基板を形成する。粗製ガラス基板は従来から用いられ
ている方法で製造すればよい。例えば、厚板の粗製ガラ
ス基板を製造する場合、フロート法、プレス法、削りだ
し法などで厚板を製造し、穴あけ、端面研削の各工程を
経て粗製ガラス基板を製造すればよい。なお、本発明で
は、上記工程に限定されず、所望の粗製ガラス基板に適
合した製造方法であればどのような方法や工程でも採る
ことができる。In the present invention, a rough glass substrate is formed from the above glass material. The rough glass substrate may be manufactured by a conventionally used method. For example, in the case of manufacturing a rough glass substrate of a thick plate, a thick plate may be manufactured by a float method, a pressing method, a shaving method, or the like, and the rough glass substrate may be manufactured through the steps of drilling and edge grinding. In the present invention, the present invention is not limited to the above steps, and any method and step can be adopted as long as it is a manufacturing method suitable for a desired rough glass substrate.
【００２７】次いで、本発明では、粗製ガラス基板の外
周端面または内周端面を研磨する。Next, in the present invention, the outer peripheral end surface or the inner peripheral end surface of the rough glass substrate is polished.
【００２８】本発明の端面研磨工程では、前記ガラス基
板の外周または内周をチャックして枚葉式で、研磨テー
プまたは砥石を用いて前記ガラス基板の外周側の端面を
研磨加工、すなわちポリッシュ加工する。本発明の方法
は、外周端面のみを研磨する方法、内周端面のみを研磨
する方法、または外周端面と内周端面の両方を研磨する
方法のいずれの方法であってもよい。なお、本発明で外
周端面と内周端面の両方を研磨する場合、外周端面また
は内周端面のいずれを先に研磨してもよい。In the end face polishing step of the present invention, the outer circumference or the inner circumference of the glass substrate is chucked, and the outer circumference side end face of the glass substrate is polished using a polishing tape or a grindstone, that is, polished. I do. The method of the present invention may be any of a method of polishing only the outer peripheral end face, a method of polishing only the inner peripheral end face, and a method of polishing both the outer peripheral end face and the inner peripheral end face. When polishing both the outer peripheral end surface and the inner peripheral end surface in the present invention, either the outer peripheral end surface or the inner peripheral end surface may be polished first.
【００２９】本発明では、研磨材として研磨テープまた
は砥石を使用することが好ましい。これは、本発明の方
法で研磨を行う場合、従来のブラシや、硬質ウレタンを
用いると、タクト的な問題や、研磨材のガラス基板表面
への回り込みなどが起こるためである。In the present invention, it is preferable to use a polishing tape or a grindstone as the polishing material. This is because, when the polishing is performed by the method of the present invention, if a conventional brush or hard urethane is used, a problem of tact or a sneaking of the abrasive to the surface of the glass substrate occurs.
【００３０】本発明の端面研磨方法で使用する研磨テー
プは、ガラス基板の端面を、チッピングのような欠陥の
ない高品質な端面に研磨でき、ガラス基板表面を傷つけ
ることのないものであれば特に限定されないが、ダイヤ
モンド、酸化アルミ、酸化セリウム、シリコンカーバイ
ド、コロイダルシリカから選択される研磨砥粒を含む研
磨テープを例として挙げることができる。また、本発明
で使用される砥石は、ガラス基板の端面を、チッピング
のような欠陥のない高品質な端面に研磨でき、ガラス基
板表面を傷つけることのないものであれば特に限定され
ないが、ダイヤモンド、酸化アルミニウム、酸化セリウ
ム、シリコンカーバイドおよびコロイダルシリカを含む
砥石を、例としてあげることができる。さらに、研磨粒
子を含まないウレタン、ナイロン、ポリエステルのよう
な材料の研磨テープを使用することも可能である。The polishing tape used in the method for polishing the end face of the present invention is particularly suitable as long as it can polish the end face of the glass substrate to a high quality end face free from defects such as chipping and does not damage the glass substrate surface. Although not limited, a polishing tape including polishing abrasive grains selected from diamond, aluminum oxide, cerium oxide, silicon carbide, and colloidal silica can be exemplified. The grinding wheel used in the present invention is not particularly limited as long as it can polish the end surface of the glass substrate to a high-quality end surface free from defects such as chipping and does not damage the glass substrate surface. , Aluminum oxide, cerium oxide, silicon carbide and whetstones containing colloidal silica can be mentioned by way of example. Further, it is also possible to use a polishing tape made of a material such as urethane, nylon or polyester which does not contain abrasive particles.
【００３１】研磨テープまたは砥石によりガラス基板の
外周を研磨するには、ガラス基板の内周をチャックし、
ガラス基板を回転させながら研磨テープまたは砥石を備
えた研磨機をガラス基板の外周に押し付けて研磨すれば
よい。また、ガラス基板の内周を研磨するには、ガラス
基板の外周をチャックし、ガラス基板を回転させながら
研磨テープまたは砥石を備えた研磨機をガラス基板の内
周に押し付けて研磨すればよい。In order to polish the outer periphery of the glass substrate with a polishing tape or a grindstone, the inner periphery of the glass substrate is chucked,
The polishing may be performed by pressing a polishing machine provided with a polishing tape or a grindstone against the outer periphery of the glass substrate while rotating the glass substrate. In addition, in order to grind the inner periphery of the glass substrate, the outer periphery of the glass substrate may be chucked, and a polishing machine provided with a polishing tape or a grindstone may be pressed against the inner periphery of the glass substrate while rotating the glass substrate.
【００３２】本発明では、端面研磨工程をスラリーを用
いた湿式法、または、スラリーを用いない乾式法で行う
ことができる。スラリーを用いる場合、スラリーは、通
常の研磨で用いられるものを使用すればよい。本発明で
は、ダイヤモンド、酸化アルミ、酸化セリウム、シリコ
ンカーバイド、コロイダルシリカから選択される研磨砥
粒を含むスラリーを好適に使用しうる。また、本発明で
は、研磨砥粒を含まない、水、アルカリでｐＨ調整した
アルカリ水溶液、および界面活性剤を含む水溶液から選
択される水または水溶液を用いることもできる。In the present invention, the edge polishing step can be performed by a wet method using a slurry or a dry method using no slurry. When a slurry is used, a slurry used in ordinary polishing may be used. In the present invention, a slurry containing abrasive grains selected from diamond, aluminum oxide, cerium oxide, silicon carbide, and colloidal silica can be suitably used. In the present invention, water or an aqueous solution containing no abrasive grains and selected from water, an alkaline aqueous solution whose pH has been adjusted with an alkali, and an aqueous solution containing a surfactant can also be used.
【００３３】上記端面の研磨工程で、内周および／また
は外周を研磨されたガラス基板は、次に、表面仕上げ工
程にかけられる。表面仕上げ工程は、例えば、規定の厚
さまでガラス基板を研磨する表面ラップ加工および表面
仕上げのためのポリッシュ加工によりガラス基板表面を
加工する。これらの仕上げ工程の方法は、従来のガラス
基板の仕上げに使用される方法を使用することができ
る。このようにして磁気記録媒体用ガラス基板が製造さ
れる。The glass substrate whose inner periphery and / or outer periphery has been polished in the end surface polishing step is then subjected to a surface finishing step. In the surface finishing step, for example, the surface of the glass substrate is processed by surface lapping for polishing the glass substrate to a specified thickness and polishing for surface finishing. As a method of these finishing steps, a method used for finishing a conventional glass substrate can be used. Thus, a glass substrate for a magnetic recording medium is manufactured.
【００３４】本発明の磁気記録媒体用ガラス基板の製造
方法を、さらに具体的に各工程を追って説明する。The method of manufacturing a glass substrate for a magnetic recording medium according to the present invention will be described more specifically by following each step.
【００３５】本発明は、内周および外周を有する磁気記
録媒体用ガラス基板の製造方法であって、該方法が
（ａ）中心穴を有するディスク状ガラス基板の形状を形
成する工程、（ｂ）前記ディスク状ガラス基板の端面研
磨を行う工程、（ｃ）前記ディスク状ガラス基板の表面
仕上げを行う工程とを具備し、前記端面の研磨工程が、
前記ガラス基板の内周をチャックして枚葉式で、研磨テ
ープまたは砥石を用いて前記ガラス基板の外周側の端面
を研磨（ポリッシュ）加工する工程であることを特徴と
する。さらに、本発明は、上記（ａ）から（ｃ）に記載
の工程を具備し、前記ガラス基板の外周をチャックして
枚葉式で、研磨テープまたは砥石を用いて前記ガラス基
板の内周側の端面を研磨（ポリッシュ）加工する工程と
を具備することを特徴とする。また、本発明は、上記
（ａ）から（ｃ）に記載の工程を具備し、前記ガラス基
板の内周をチャックして枚葉式で、研磨テープまたは砥
石を用いて前記ガラス基板の外周側の端面を研磨（ポリ
ッシュ）加工する工程と、前記ガラス基板の外周をチャ
ックして枚葉式で、研磨テープまたは砥石を用いて前記
ガラス基板の内周側の端面を研磨（ポリッシュ）加工す
る工程とを具備することを特徴とする。なお、本発明で
外周側および内周側の両方を研磨する場合、外周側また
は内周側のいずれを先に研磨してもよい。The present invention is a method for producing a glass substrate for a magnetic recording medium having an inner periphery and an outer periphery, the method comprising: (a) forming a disk-shaped glass substrate having a central hole; (b) A step of polishing the end face of the disc-shaped glass substrate; and (c) a step of finishing the surface of the disc-shaped glass substrate.
The method is characterized in that the inner periphery of the glass substrate is chucked, and the outer peripheral side end surface of the glass substrate is polished using a polishing tape or a grindstone. Furthermore, the present invention includes the steps described in (a) to (c) above, wherein the outer periphery of the glass substrate is chucked, and the outer periphery of the glass substrate is chucked using a polishing tape or a grindstone. Polishing (polishing) the end surface of the substrate. Further, the present invention includes the steps (a) to (c) described above, wherein the inner periphery of the glass substrate is chucked, and the outer periphery of the glass substrate is polished using a polishing tape or a grindstone by a single wafer processing. Polishing (polishing) the end surface of the glass substrate, and polishing (polishing) the inner peripheral end surface of the glass substrate using a polishing tape or a grindstone by chucking the outer periphery of the glass substrate in a single wafer type. And characterized in that: When both the outer peripheral side and the inner peripheral side are polished in the present invention, either the outer peripheral side or the inner peripheral side may be polished first.
【００３６】上記工程（ａ）は、粗製ガラス基板を製造
する工程である。The step (a) is a step of manufacturing a rough glass substrate.
【００３７】粗製ガラス基板は、厚板の粗製ガラス基板
の場合、例えばガラスの厚板を製造する工程、穴あけ工
程、端面研削工程等を経て製造される。これらの工程
は、従来の方法を用いることができる。例えば、厚板を
製造する方法は、フロート法、プレス形成法、削りだし
法などを用いることができ、穴あけ工程には、コアドリ
ルによる切削加工のような方法を用いることができ、端
面研削工程には砥石による研削加工のような方法を用い
ることができる。また、本発明で使用しうるガラス材料
などの諸条件は、先に説明したとおりである。なお、本
発明においては、上記説明の方法に限定されず、所望の
粗製ガラス基板に応じて、種々の製造方法や工程を採る
ことができる。In the case of a thick rough glass substrate, the rough glass substrate is manufactured through, for example, a process of manufacturing a thick glass plate, a drilling process, an end surface grinding process, and the like. For these steps, a conventional method can be used. For example, a method of manufacturing a thick plate can use a float method, a press forming method, a shaving method, and the like, and a drilling process can use a method such as a cutting process using a core drill. A method such as grinding with a grindstone can be used. Various conditions such as a glass material that can be used in the present invention are as described above. The present invention is not limited to the above-described method, and various manufacturing methods and steps can be adopted according to a desired rough glass substrate.
【００３８】上記工程（ｂ）は、端面研磨を行う工程で
ある。The above step (b) is a step of polishing the end face.
【００３９】端面研磨の方法は、上記の端面研磨工程で
説明したとおりであり、研磨材スラリー等の諸条件は、
上記の説明がそのまま当てはまる。The method for polishing the end face is as described in the above-mentioned end face polishing step.
The above description applies as is.
【００４０】以下に図面を参照して本発明の端面研磨工
程を説明する。以下の説明は、本発明の例示であり、本
発明を限定することを意図しない。Hereinafter, the end face polishing step of the present invention will be described with reference to the drawings. The following description is illustrative of the invention and is not intended to limit the invention.
【００４１】まず、外周端面を研磨する場合について図
１および図２を参照して説明する。図１および図２に
は、研磨が研磨テープを使用して行われる場合を例示し
た。First, the case of polishing the outer peripheral end face will be described with reference to FIGS. FIGS. 1 and 2 illustrate a case where polishing is performed using a polishing tape.
【００４２】図１は、本発明の方法の端面研磨工程を、
磁気記録媒体用ガラス基板の上面方向から見た場合の概
略図である。また、図２は、本発明の方法の端面研磨工
程を、磁気記録媒体用ガラス基板の外周端面２２の方向
から見た場合の概略図である。図１および図２に示され
るように、ガラス基板１を内周チャック１０により保持
し、該基板１を回転させながら研磨機１８を用いて外周
端面２２を研磨する。なお、内周チャック１０は、ガラ
ス基板を内周で固定し、所定の回転数でガラス基板１を
回転させることができる機構を有するものを使用する。
内周端面２６がすでに研磨されたガラス基板１の外周端
面２２を研磨する場合もあるので、内周チャックは、内
周端面２６に損傷を与えないような機構を有し、表面処
理をしておくことが好ましい。研磨機１８は、研磨テー
プ１６を用いてガラス基板の表面を傷つけず、高品質の
外周端面２２を形成できるものであれば特に限定されな
い。図１および図２の例では、少なくとも研磨テープ１
６、および研磨テープをガラス基板の外周端面に押しつ
けるための押し付け部１９を備えたものを示した。FIG. 1 shows an end face polishing step of the method of the present invention.
FIG. 3 is a schematic diagram when viewed from the upper surface direction of a glass substrate for a magnetic recording medium. FIG. 2 is a schematic diagram when the end face polishing step of the method of the present invention is viewed from the direction of the outer peripheral end face 22 of the glass substrate for a magnetic recording medium. As shown in FIGS. 1 and 2, the glass substrate 1 is held by an inner peripheral chuck 10, and the outer peripheral end face 22 is polished using a polishing machine 18 while rotating the substrate 1. The inner peripheral chuck 10 has a mechanism capable of fixing the glass substrate at the inner periphery and rotating the glass substrate 1 at a predetermined rotation speed.
Since the inner peripheral end surface 26 may polish the outer peripheral end surface 22 of the glass substrate 1 which has already been polished, the inner peripheral chuck has a mechanism that does not damage the inner peripheral end surface 26, and performs a surface treatment. Preferably. The polishing machine 18 is not particularly limited as long as it can form the high-quality outer peripheral end face 22 without damaging the surface of the glass substrate using the polishing tape 16. In the example of FIG. 1 and FIG.
6 and the one provided with a pressing portion 19 for pressing the polishing tape against the outer peripheral end face of the glass substrate.
【００４３】本発明の方法では、ガラス基板１を回転さ
せながら、研磨機１８の押し付け部１９により研磨テー
プ１６をガラス基板１の外周端面２２に押し付け（図１
および図２の矢印２０）、外周端面２２を研磨する。押
し付け部１９は、図２に示されるように、研磨テープの
研磨部分が外周端面２２に並行に接触するようにガラス
基板１の外周端面２２に研磨テープを押し付ける。In the method of the present invention, the polishing tape 16 is pressed against the outer peripheral end face 22 of the glass substrate 1 by the pressing portion 19 of the polishing machine 18 while rotating the glass substrate 1 (FIG. 1).
2 and the outer peripheral end face 22 is polished. The pressing portion 19 presses the polishing tape against the outer peripheral end face 22 of the glass substrate 1 so that the polished portion of the polishing tape contacts the outer peripheral end face 22 in parallel, as shown in FIG.
【００４４】本発明の方法では、ガラス基板１の回転数
は、１分あたり１００から５００回転、好ましくは１分
あたり２００から３００回転、もっとも好ましくは１分
あたり３００回転である。また、押し付け部１９による
研磨テープ１６の押し付け圧は、研磨テープの種類によ
り変化するが、０．５ｋｇｆ／ｃｍ２から３ｋｇｆ／ｃ
ｍ２が好適であり、０．５ｋｇｆ／ｃｍ２から２．０ｋ
ｇｆ／ｃｍ２がより好ましい。研磨時間は、研磨テープ
の種類により変化するが、１０秒から１分、好ましくは
２０から４０秒である。In the method of the present invention, the number of rotations of the glass substrate 1 is 100 to 500 rotations per minute, preferably 200 to 300 rotations per minute, and most preferably 300 rotations per minute. The pressing pressure of the polishing tape 16 by the pressing portion 19 varies depending on the type of the polishing tape, and is 0.5 kgf / cm 2 to 3 kgf / c.
m 2 is preferred, and 0.5 kgf / cm 2 to 2.0 k
gf / cm 2 is more preferred. The polishing time varies depending on the type of the polishing tape, but is 10 seconds to 1 minute, preferably 20 to 40 seconds.
【００４５】本発明では、端面研磨工程をスラリーを用
いた湿式法、または、スラリーを用いない乾式法で行う
ことができる。スラリーを用いる場合、スラリーは、ダ
イヤモンド、酸化アルミ、酸化セリウム、シリコンカー
バイド、コロイダルシリカから選択される研磨砥粒を含
むスラリーを好適に使用しうる。また、本発明では、研
磨砥粒を含まない、水、アルカリでｐＨ調整した、およ
び界面活性剤を含む水溶液から選択される水または水溶
液を用いることもできる。このようなスラリーまたは水
溶液をスラリー導入口１２から導入し、ガラス基板１の
外周端面２２付近から滴下しながら研磨テープ１６で研
磨する。In the present invention, the end face polishing step can be performed by a wet method using a slurry or a dry method using no slurry. When a slurry is used, a slurry containing abrasive grains selected from diamond, aluminum oxide, cerium oxide, silicon carbide, and colloidal silica can be suitably used. In the present invention, it is also possible to use water or an aqueous solution which does not contain abrasive grains, is pH-adjusted with water or an alkali, and is selected from aqueous solutions containing a surfactant. Such a slurry or aqueous solution is introduced from the slurry introduction port 12, and is polished with the polishing tape 16 while being dropped from near the outer peripheral end face 22 of the glass substrate 1.
【００４６】さらに、本発明の方法では、端面研磨工程
がウレタン（例えば、シリコンを練り込んだウレタンバ
フなど）、ポリエステルおよびナイロンから選択される
材料で形成された砥粒を含まないテープを用い、研磨砥
粒を含まない、水、アルカリでｐＨ調整したアルカリ水
溶液、および界面活性剤を含む水溶液から選択される水
または水溶液を滴下しながら研磨を行うことも可能であ
る。Further, in the method of the present invention, the end face polishing step uses a tape containing no abrasive grains formed of a material selected from urethane (eg, urethane buff into which silicon is kneaded), polyester and nylon, It is also possible to perform polishing while dropping water or an aqueous solution selected from water, an alkaline aqueous solution adjusted to a pH with an alkali, and an aqueous solution containing a surfactant, which does not contain abrasive grains.
【００４７】また、本発明では、ウレタン、ポリエステ
ルおよびナイロンから選択される材料で形成された砥粒
を含まないテープを用い、スラリーとしてダイヤモン
ド、酸化アルミニウム、酸化セリウム、シリコンカーバ
イドおよびコロイダルシリカから選択される研磨砥粒を
含むスラリーを滴下しながら研磨を行うことが可能であ
る。In the present invention, a tape containing no abrasive grains formed of a material selected from urethane, polyester and nylon is used, and the slurry is selected from diamond, aluminum oxide, cerium oxide, silicon carbide and colloidal silica. It is possible to perform polishing while dropping a slurry containing abrasive grains.
【００４８】本発明の外周端面の研磨工程では、研磨剤
として研磨テープ以外にも、砥石を用いることができ
る。砥石を用いる場合には、図１および図２に示される
押し付け部１９を砥石に交換し、研磨テープを用いずに
研磨するればよい。研磨の条件などは研磨テープを用い
て端面を研磨する場合と同様である。In the step of polishing the outer peripheral end face of the present invention, a grindstone can be used as a polishing agent in addition to the polishing tape. When a grindstone is used, the pressing portion 19 shown in FIGS. 1 and 2 may be replaced with a grindstone, and polishing may be performed without using a polishing tape. Polishing conditions and the like are the same as in the case of polishing the end face using a polishing tape.
【００４９】次に、図３および図４を参照して、内周端
面２６を研磨する場合を説明する。図３および図４に
は、研磨が研磨テープを使用して行われる場合を例示し
た。Next, a case where the inner peripheral end face 26 is polished will be described with reference to FIGS. FIGS. 3 and 4 illustrate a case where polishing is performed using a polishing tape.
【００５０】図３は、本発明の方法の端面研磨工程を、
磁気記録媒体用ガラス基板の上面方向から見た場合の概
略図である。また、図４は、本発明の方法の端面研磨工
程を、磁気記録媒体用ガラス基板の外周端面２２の方向
から見た場合の概略図である。図３および図４に示され
るように、ガラス基板１を外周チャック２４により保持
し、該基板１を回転させながら研磨機１８を用いて内周
端面２６を研磨する。なお、外周チャック２４は、ガラ
ス基板を外周で固定し、所定の回転数でガラス基板１
を、ガラス基板１の中心や、外周がぶれないように回転
させることができる機構を有するものを使用する。外周
端面２６がすでに研磨されたガラス基板１の内周端面２
６を研磨する場合もあるので、外周チャックは、外周端
面に損傷を与えないような機構有し、表面処理をしてお
くことが好ましい。研磨機１８は、研磨テープ１６を用
いてガラス基板の表面を傷つけず、高品質の内周端面２
６を形成できるものであれば特に限定されない。図３お
よび図４の例では、少なくとも研磨テープ１６、および
研磨テープをガラス基板の内周端面に押しつけるための
押し付け部１９を備えたものを示した。FIG. 3 shows an end face polishing step of the method of the present invention.
FIG. 3 is a schematic diagram when viewed from the upper surface direction of a glass substrate for a magnetic recording medium. FIG. 4 is a schematic view when the end face polishing step of the method of the present invention is viewed from the direction of the outer peripheral end face 22 of the glass substrate for a magnetic recording medium. As shown in FIGS. 3 and 4, the glass substrate 1 is held by the outer peripheral chuck 24, and the inner peripheral end surface 26 is polished using the polishing machine 18 while rotating the substrate 1. In addition, the outer peripheral chuck 24 fixes the glass substrate at the outer periphery, and rotates the glass substrate 1 at a predetermined rotation speed.
Having a mechanism that can be rotated so that the center and the outer periphery of the glass substrate 1 do not move. Inner peripheral end surface 2 of glass substrate 1 whose outer peripheral end surface 26 has already been polished
6 may be polished, it is preferable that the outer peripheral chuck has a mechanism that does not damage the outer peripheral end face, and is surface-treated. The polishing machine 18 uses the polishing tape 16 to prevent the surface of the glass substrate from being damaged, and to provide a high-quality inner peripheral end face 2.
There is no particular limitation as long as it can form 6. In the examples of FIGS. 3 and 4, at least the polishing tape 16 and the pressing portion 19 for pressing the polishing tape against the inner peripheral end face of the glass substrate are shown.
【００５１】本発明の方法では、ガラス基板１を回転さ
せながら、研磨機１８の押し付け部１９により研磨テー
プ１６をガラス基板１の内周端面２６に押し付け（図３
および４の押し付け：２０）、内周端面２６を研磨す
る。押し付け部１９は、図４に示されるように、研磨テ
ープが内周端面２６に並行に接触するようにガラス基板
１の内周端面２６に研磨テープを押し付ける（図３およ
び図４の矢印２０）。In the method of the present invention, the polishing tape 16 is pressed against the inner peripheral end face 26 of the glass substrate 1 by the pressing portion 19 of the polishing machine 18 while rotating the glass substrate 1 (FIG. 3).
And 4 are pressed: 20), and the inner peripheral end surface 26 is polished. The pressing portion 19 presses the polishing tape against the inner peripheral end surface 26 of the glass substrate 1 so that the polishing tape contacts the inner peripheral end surface 26 in parallel as shown in FIG. 4 (arrow 20 in FIGS. 3 and 4). .
【００５２】本発明の方法では、ガラス基板１の回転数
は、１分あたり１００から５００回転、好ましくは１分
あたり２００から３００回転、もっとも好ましくは１分
あたり３００回転である。また、押し付け部１９による
研磨テープ１６の押し付け圧は、研磨テープの種類によ
り変化するが、０．５ｋｇｆ／ｃｍ２から３ｋｇｆ／ｃ
ｍ２が好適であり、０．５ｋｇｆ／ｃｍ２から２．０ｋ
ｇｆ／ｃｍ２がより好ましい。研磨時間は、研磨テープ
の種類により変化するが、１０秒から１分、好ましくは
２０から４０秒である。In the method of the present invention, the rotation speed of the glass substrate 1 is 100 to 500 rotations per minute, preferably 200 to 300 rotations per minute, and most preferably 300 rotations per minute. The pressing pressure of the polishing tape 16 by the pressing portion 19 varies depending on the type of the polishing tape, and is 0.5 kgf / cm 2 to 3 kgf / c.
m 2 is preferred, and 0.5 kgf / cm 2 to 2.0 k
gf / cm 2 is more preferred. The polishing time varies depending on the type of the polishing tape, but is 10 seconds to 1 minute, preferably 20 to 40 seconds.
【００５３】本発明では、上述の外周端面２２の端面研
磨で説明したようにスラリーを用いた湿式法、または、
スラリーを用いない乾式法で行うことができる。研磨テ
ープ１６の種類、スラリーの種類などの諸条件は、上記
外周端面の研磨で説明した条件と同様である。In the present invention, as described in the end surface polishing of the outer peripheral end surface 22, the wet method using the slurry,
It can be performed by a dry method without using a slurry. Various conditions such as the type of the polishing tape 16 and the type of the slurry are the same as the conditions described in the polishing of the outer peripheral end surface.
【００５４】本発明の内周端面の研磨工程では、研磨材
として研磨テープ以外にも、砥石を用いることができ
る。砥石を用いる場合には、図３および図４に示される
押し付け部１９を砥石に交換し、研磨テープを用いずに
研磨するればよい。研磨の条件などは研磨テープを用い
て端面を研磨する場合と同様である。In the polishing step of the inner peripheral end face of the present invention, a grindstone can be used as a polishing material other than a polishing tape. When a grindstone is used, the pressing portion 19 shown in FIGS. 3 and 4 may be replaced with a grindstone, and polishing may be performed without using a polishing tape. Polishing conditions and the like are the same as in the case of polishing the end face using a polishing tape.
【００５５】本発明の磁気記録媒体用ガラス基板の製造
方法は、上記外周端面の研磨工程と、内周端面の研磨工
程をそれぞれ単独で使用する、外周または内周のいずれ
かを研磨する端面研磨工程を具備した磁気記録媒体用ガ
ラス基板の製造方法と、これらの両方の工程により内周
および外周の両方を研磨する研磨工程を具備したガラス
基板の製造方法を含む。The method of manufacturing a glass substrate for a magnetic recording medium according to the present invention is characterized in that the polishing step for the outer peripheral end face and the polishing step for the inner peripheral end face are used alone, respectively. The method includes a method of manufacturing a glass substrate for a magnetic recording medium having a step, and a method of manufacturing a glass substrate having a polishing step of polishing both an inner periphery and an outer periphery by both steps.
【００５６】図１から図４に示されるように、本発明の
製造方法は、ガラス基板の表面を重ねることなく、１枚
ずつ研磨する枚葉式を採用する。As shown in FIGS. 1 to 4, the manufacturing method of the present invention employs a single-wafer method in which the glass substrates are polished one by one without overlapping the surfaces.
【００５７】工程（ｃ）は、表面仕上げ工程である。こ
の工程では、例えば表面のラップ加工、表面仕上げのた
めのポリッシュ加工などを行う。これらの工程は、従来
の方法を用いることができる。具体的には、表面のラッ
プ加工には、ダイヤペレットや、遊離砥粒と鋳鉄定盤に
よるラップ加工のような手順を用いることができ、表面
仕上げのためのポリッシュ加工には、例えば、得られた
ガラス基板を酸化セリウムおよびコロイダルシリカ等の
研磨剤を用いて、所望の荒さに研磨し、次に、研磨した
ガラス基板を中性洗剤及びポリビニルアルコール（ＰＶ
Ａ）スポンジ等を用いてこすり洗いすればよい。Step (c) is a surface finishing step. In this step, for example, lapping of the surface and polishing for finishing the surface are performed. For these steps, a conventional method can be used. Specifically, for the lapping of the surface, a procedure such as diamond pellets, lapping with free abrasive grains and a cast iron platen can be used, and for polishing for surface finishing, for example, the obtained The polished glass substrate is polished to a desired roughness using an abrasive such as cerium oxide or colloidal silica, and then the polished glass substrate is neutralized with a neutral detergent and polyvinyl alcohol (PV).
A) It may be scrubbed using a sponge or the like.
【００５８】次に、第二の発明について説明する。Next, the second invention will be described.
【００５９】本発明の第二は、上記第一の発明により製
造されたガラス基板である。本発明の磁気記録媒体用ガ
ラス基板は、上記第一の発明に従って製造されることが
特徴であり、ガラス基板表面に傷がなく、内周端面およ
び外周端面の品質が高い磁気記録媒体用ガラス基板であ
る。本発明の磁気記録媒体用ガラス基板は、第一の発明
に従って製造されることから、上記第一の発明で説明し
たガラス材料より構成される。The second aspect of the present invention is a glass substrate manufactured according to the first aspect. The glass substrate for a magnetic recording medium of the present invention is characterized in that it is manufactured according to the first invention, and the glass substrate surface has no scratches and has a high quality of the inner peripheral end surface and the outer peripheral end surface. It is. Since the glass substrate for a magnetic recording medium of the present invention is manufactured according to the first invention, it is made of the glass material described in the first invention.
【００６０】磁気記録媒体用ガラス基板の評価上述のよ
うにして得られたガラス基板を電子顕微鏡で検査した結
果を図５に示した。図５に示される条件で、本発明の製
造方法にしたがって製造された磁気記録媒体用ガラス基
板は、従来法で研磨したものと同等以上の高品質の内周
および外周端面を有することがわかる。Evaluation of Glass Substrate for Magnetic Recording Medium FIG. 5 shows the result of inspecting the glass substrate obtained as described above with an electron microscope. Under the conditions shown in FIG. 5, it can be seen that the glass substrate for a magnetic recording medium manufactured according to the manufacturing method of the present invention has a high quality inner and outer peripheral end surfaces equal to or higher than those polished by the conventional method.
【００６１】さらに、端面の状態と磁気記録媒体用ガラ
ス基板のイオンクロマトグラフィ（Ｉ．Ｃ．）分析によ
るアルカリ溶出量の比較を行った結果を図６に示した。
図６（Ａ）は各端面の状態の電子顕微鏡写真である。図
６（Ａ）には端面を研磨しない未加工のガラス基板、チ
ッピングのあるガラス基板（酸化アルミニウム＃４００
０のテープと酸化セリウムのスラリーを用いて２０秒間
加工した場合）、および本発明の方法（酸化アルミニウ
ム＃４０００のテープと酸化セリウムのスラリーを用い
て４０秒間加工した場合）の電子顕微鏡写真である。チ
ッピングのあるガラス基板では、研磨不足により端面研
削のチッピングが残留した。なお、図６（Ａ）で、端面
は外周端面を表す。また、チャンファーは外周の面取り
された部分をいう。すなわち、チャンファーとは、ガラ
ス基板の外周端面と基板の表面とが交差する部分（外周
の縁の部分）が斜めにカットされている場合の、この斜
めにカットされた部分をいう。図６（Ｂ）は、各状態の
ガラス基板から溶出されたアルカリの量をＩ．Ｃ．分析
により測定した結果をグラフにしたものである。この結
果から明らかなように、未加工のガラス基板では、端面
からのアルカリ溶出量が多かった。チッピングがあるガ
ラス基板の場合は、溶出量は未加工よりも減少するが、
高密度記録用に使用するためのガラス基板としてはまだ
不十分なレベルであった。端面研磨の条件を適正化する
こと、すなわち本発明の方法により端面研磨を行うこと
により、アルカリ溶出量を高密度記録用に使用するため
のガラス基板として十分なレベルまで減少させることが
できる。FIG. 6 shows the results of comparison between the state of the end face and the alkali elution amount of the glass substrate for a magnetic recording medium by ion chromatography (IC) analysis.
FIG. 6A is an electron micrograph of the state of each end face. FIG. 6A shows an unprocessed glass substrate whose end face is not polished and a glass substrate having chipping (aluminum oxide # 400).
7 shows electron micrographs of the case of processing for 20 seconds using a tape of No. 0 and a slurry of cerium oxide) and the method of the present invention (the case of processing for 40 seconds using a tape of aluminum oxide # 4000 and a slurry of cerium oxide). . In the glass substrate having chipping, chipping of the end face grinding remained due to insufficient polishing. In FIG. 6 (A), the end surface represents the outer peripheral end surface. Also, the chamfer refers to a chamfered portion of the outer periphery. That is, the chamfer refers to a diagonally cut portion when a portion where the outer peripheral end surface of the glass substrate intersects with the surface of the substrate (a portion of the outer peripheral edge) is diagonally cut. FIG. 6B shows the amount of alkali eluted from the glass substrate in each state. C. It is a graph of the result measured by analysis. As is clear from the results, the unprocessed glass substrate had a large amount of alkali elution from the end face. In the case of a glass substrate with chipping, the elution amount is smaller than that of the unprocessed glass substrate,
The level was still insufficient as a glass substrate for use in high-density recording. By optimizing the conditions for end face polishing, that is, by performing end face polishing by the method of the present invention, the amount of alkali elution can be reduced to a level sufficient for a glass substrate to be used for high-density recording.
【００６２】次に第三の発明につて説明する。本発明の
第三は、上記磁気記録媒体用ガラス基板を用いた磁気記
録媒体に関する。Next, the third invention will be described. The third aspect of the present invention relates to a magnetic recording medium using the glass substrate for a magnetic recording medium.
【００６３】図７に本発明の磁気記録媒体の一態様を示
す。図７は、本発明の磁気記録媒体の部分構造断面図で
ある。FIG. 7 shows one embodiment of the magnetic recording medium of the present invention. FIG. 7 is a sectional view of a partial structure of the magnetic recording medium of the present invention.
【００６４】本発明では、上記第一の発明で製造された
ガラス基板（すなわち、第二の発明のガラス基板）を基
板１として使用する。その上に非磁性金属層２、非磁性
下地層３、磁性層４、保護層５および液体潤滑層６を順
次形成し、磁気記録媒体とする。上記非磁性金属層２、
非磁性下地層３、磁性層４、保護層５および液体潤滑層
６は、従来から使用されている材料を使用することがで
きる。具体的には、非磁性金属層２は、例えばＮｉ−Ａ
ｌよりなる金属層であり、非磁性下地層３は、例えばＣ
ｒよりなる下地層であり、磁性層４はＣｏ合金、例えば
強磁性合金であるＣｏ−Ｃｒ−Ｐｔ、Ｃｏ−Ｃｒ−Ｔａ
などであり、保護層５は、例えばカーボン保護層などで
あり、さらに液体潤滑層６はパーフルオロポリエーテル
系潤滑剤のようなフッ素系潤滑剤等である。In the present invention, the glass substrate manufactured in the first invention (that is, the glass substrate of the second invention) is used as the substrate 1. A nonmagnetic metal layer 2, a nonmagnetic underlayer 3, a magnetic layer 4, a protective layer 5, and a liquid lubricating layer 6 are sequentially formed thereon to obtain a magnetic recording medium. The nonmagnetic metal layer 2,
The non-magnetic underlayer 3, the magnetic layer 4, the protective layer 5, and the liquid lubricating layer 6 can be made of a conventionally used material. Specifically, the nonmagnetic metal layer 2 is made of, for example, Ni-A
1 and the nonmagnetic underlayer 3 is made of, for example, C
The magnetic layer 4 is a Co alloy, for example, a ferromagnetic alloy such as Co-Cr-Pt or Co-Cr-Ta.
The protective layer 5 is, for example, a carbon protective layer, and the liquid lubricating layer 6 is a fluorine-based lubricant such as a perfluoropolyether-based lubricant.
【００６５】本発明の磁気記録媒体を図７により説明し
たが、この構造は一例であり、磁気記録媒体の目的に応
じて種々の変更が可能である。Although the magnetic recording medium of the present invention has been described with reference to FIG. 7, this structure is merely an example, and various modifications can be made according to the purpose of the magnetic recording medium.
【００６６】次に、磁気記録媒体の製造方法について説
明する。本発明の磁気記録媒体の製造方法は、ガラス基
板の端面を上記のように研磨することによって、磁気記
録媒体用ガラス基板を得る工程、および、このガラス基
板の上面に上記の記録を可能とする層構造を積層する工
程とを少なくとも含む。Next, a method for manufacturing a magnetic recording medium will be described. The method of manufacturing a magnetic recording medium according to the present invention includes a step of obtaining a glass substrate for a magnetic recording medium by polishing the end surface of the glass substrate as described above, and enabling the above recording on the upper surface of the glass substrate. And laminating a layer structure.
【００６７】磁気記録媒体用ガラス基板を得る工程は、
上述の磁気記録媒体用ガラス基板の製造方法で説明した
方法を使用する。The step of obtaining a glass substrate for a magnetic recording medium includes:
The method described in the method for manufacturing a glass substrate for a magnetic recording medium is used.
【００６８】得られたガラス基板の表面上に磁気記録を
可能とする層構造を積層する工程は、本発明の製造方法
により得られたガラス基板上に非磁性金属層２をスパッ
タ法等で形成し、次いで、この非磁性金属層２上に非磁
性下地層３をコートし、その上に磁性層４および保護層
５を順次形成する。この後、溶媒で希釈した潤滑剤を前
記保護層５の表面に塗布する。In the step of laminating a layer structure enabling magnetic recording on the surface of the obtained glass substrate, the nonmagnetic metal layer 2 is formed on the glass substrate obtained by the manufacturing method of the present invention by a sputtering method or the like. Then, a nonmagnetic underlayer 3 is coated on the nonmagnetic metal layer 2, and a magnetic layer 4 and a protective layer 5 are sequentially formed thereon. Thereafter, a lubricant diluted with a solvent is applied to the surface of the protective layer 5.
【００６９】本発明においては、非磁性金属層２が、Ｎ
ｉ−Ａｌであり、前記非磁性下地層３がＣｒ層であり、
前記磁性層４がＣｏ−Ｃｒ−Ｐｔ合金層であることが好
ましい。In the present invention, the nonmagnetic metal layer 2 is
i-Al, the nonmagnetic underlayer 3 is a Cr layer,
The magnetic layer 4 is preferably a Co-Cr-Pt alloy layer.
【００７０】非磁性下地層３、磁性層４および保護膜５
は、これらが例えばＣｒ非磁性下地層、Ｃｏ−Ｃｒ−Ｐ
ｔ磁性合金層およびカーボン保護膜である場合、スパッ
タ法によって形成することができる。また、保護層５が
カーボン保護層である場合、通常のグラファイトを主体
としたカーボン保護層であってもＤＬＣ保護層であって
もよい。また、潤滑層６は、ディップコート法、スピン
コート法等により塗布することができる。Non-magnetic underlayer 3, magnetic layer 4, and protective film 5
Are made of, for example, a Cr nonmagnetic underlayer, Co-Cr-P
In the case of a t-magnetic alloy layer and a carbon protective film, they can be formed by a sputtering method. When the protective layer 5 is a carbon protective layer, it may be a normal graphite-based carbon protective layer or a DLC protective layer. Further, the lubricating layer 6 can be applied by a dip coating method, a spin coating method or the like.
【００７１】これらの非磁性金属層２、非磁性下地層
３、磁性層４、保護層５および潤滑層５の厚さは通常の
磁気記録媒体で用いられる厚さである。なお、上記の構
成は本発明を限定するものではない。例えば、上記磁気
記録媒体は、ガラス基板の一方の表面のみに記録層を形
成する場合を説明したが、ガラス基板の両方の面に記録
層を形成してもよい。The thickness of the non-magnetic metal layer 2, the non-magnetic underlayer 3, the magnetic layer 4, the protective layer 5, and the lubricating layer 5 is a thickness used for a normal magnetic recording medium. Note that the above configuration does not limit the present invention. For example, in the above-described magnetic recording medium, the case where the recording layer is formed only on one surface of the glass substrate has been described, but the recording layer may be formed on both surfaces of the glass substrate.
【００７２】[0072]
【実施例】実施例により、本発明をさらに詳細に説明す
るが、以下の実施例は本発明を制限することを意味しな
い。The present invention will be described in more detail by way of examples, but the following examples are not meant to limit the present invention.
【００７３】実施例１ 厚板ガラスの形成、穴あけおよび端面研削を行った磁気
記録媒体用ガラス基板の内周をチャックし、３００ｒｐ
ｍで該ガラス基板を回転させた。このガラス基板の外周
端面に、酸化アルミニウム砥粒（＃４０００）の研磨テ
ープをゴム硬度６０°の押しつけ部材を介して押しつけ
圧力１ｋｇｆ／ｃｍ２で押しつけ、酸化セリウム砥粒を
含むスラリーを滴下しながら２０秒間研磨を行った。得
られた基板の表面を、レーザー光を用いて表面の変位を
測定し、欠陥の有無を測定する表面欠陥検査装置で検査
したところ、表面の傷はなかった。外周端面の品質につ
いても従来の方法で研磨した場合と同等以上の品質が得
られた。Example 1 The inner periphery of a glass substrate for a magnetic recording medium having been subjected to formation, drilling and edge grinding of a thick glass plate was chucked at 300 rpm.
The glass substrate was rotated at m. The outer peripheral end face of the glass substrate, the polishing tape aluminum oxide abrasive grains (# 4000) against a pressure 1 kgf / cm 2 pressed via the pressing member having a rubber hardness 60 °, while dropping a slurry containing cerium oxide abrasive grains Polishing was performed for 20 seconds. When the surface of the obtained substrate was inspected with a surface defect inspection device for measuring the presence or absence of a defect by measuring the displacement of the surface using a laser beam, no surface flaw was found. Regarding the quality of the outer peripheral end face, a quality equal to or higher than that obtained by polishing by the conventional method was obtained.
【００７４】実施例２ 厚板ガラスの形成、穴あけおよび端面研削を行った磁気
記録媒体用ガラス基板の内周をチャックし、３００ｒｐ
ｍで該ガラス基板を回転させた。このガラス基板の外周
端面に、ダイヤモンド（＃８０００）の研磨テープをゴ
ム硬度６０°の押しつけ部材を介して押しつけ圧力１ｋ
ｇｆ／ｃｍ２で押しつけ、スラリーを用いないドライ研
磨で２０秒間研磨を行った。得られた基板の表面を実施
例１と同様に検査したところ、表面の傷はなかった。外
周端面の品質についても従来の方法で研磨した場合と同
等以上の品質が得られた。Example 2 The inner periphery of a glass substrate for a magnetic recording medium having been subjected to formation, drilling and edge grinding of a thick plate glass was chucked at 300 rpm.
The glass substrate was rotated at m. A diamond (# 8000) polishing tape is pressed against the outer peripheral end surface of the glass substrate through a pressing member having a rubber hardness of 60 °, and the pressure is 1 k.
The wafer was pressed at gf / cm 2 and polished for 20 seconds by dry polishing without using a slurry. When the surface of the obtained substrate was inspected in the same manner as in Example 1, no surface flaw was found. Regarding the quality of the outer peripheral end face, a quality equal to or higher than that obtained by polishing by the conventional method was obtained.
【００７５】実施例３ 厚板ガラスの形成、穴あけおよび端面研削を行った磁気
記録媒体用ガラス基板の内周をチャックし、３００ｒｐ
ｍで該ガラス基板を回転させた。このガラス基板の外周
端面に、酸化セリウム砥石を押しつけ圧力０．５ｋｇｆ
／ｃｍ２で押しつけ、酸化セリウム砥粒を含むスラリー
を滴下しながら２０秒間研磨を行った。得られた基板の
表面を実施例１と同様に検査したところ、表面の傷はな
かった。外周端面の品質についても従来の方法で研磨し
た場合と同等以上の品質が得られた。Example 3 The inner periphery of a glass substrate for a magnetic recording medium having been subjected to formation, drilling and edge grinding of a thick glass was chucked at 300 rpm.
The glass substrate was rotated at m. A cerium oxide grindstone is pressed against the outer peripheral end face of the glass substrate and the pressure is 0.5 kgf.
/ Cm 2 and polished for 20 seconds while dropping a slurry containing cerium oxide abrasive grains. When the surface of the obtained substrate was inspected in the same manner as in Example 1, no surface flaw was found. Regarding the quality of the outer peripheral end face, a quality equal to or higher than that obtained by polishing by the conventional method was obtained.
【００７６】実施例４ 厚板ガラスの形成、穴あけおよび端面研削を行った磁気
記録媒体用ガラス基板の内周をチャックし、３００ｒｐ
ｍで該ガラス基板を回転させた。このガラス基板の外周
端面に、ダイヤモンド（＃４０００）の砥石を押しつけ
圧力０．５ｋｇｆ／ｃｍ２で押しつけ、界面活性剤を加
えてクーラントを流しながら２０秒間研磨を行った。得
られた基板の表面を実施例１と同様に検査したところ、
表面の傷はなかった。外周端面の品質についても従来の
方法で研磨した場合と同等以上の品質が得られた。Example 4 The inner circumference of a glass substrate for a magnetic recording medium having been subjected to formation, drilling and edge grinding of a thick glass plate was chucked at 300 rpm.
The glass substrate was rotated at m. A grindstone of diamond (# 4000) was pressed against the outer peripheral end surface of the glass substrate at a pressure of 0.5 kgf / cm 2 , and polishing was performed for 20 seconds while adding a surfactant and flowing a coolant. When the surface of the obtained substrate was inspected in the same manner as in Example 1,
There were no surface scratches. Regarding the quality of the outer peripheral end face, a quality equal to or higher than that obtained by polishing by the conventional method was obtained.
【００７７】実施例５ 厚板ガラスの形成、穴あけおよび端面研削を行った磁気
記録媒体用ガラス基板の内周をチャックし、３００ｒｐ
ｍで該ガラス基板を回転させた。このガラス基板の外周
端面に、シリコンを練り込んだウレタンバフを押しつけ
圧力２．０ｋｇｆ／ｃｍ２で押しつけ、酸化セリウム砥
粒を含むスラリーを滴下しながら２０秒間研磨を行っ
た。得られた基板の表面を実施例１と同様に検査したと
ころ、表面の傷はなかった。外周端面の品質についても
従来の方法で研磨した場合と同等以上の品質が得られ
た。Example 5 An inner periphery of a glass substrate for a magnetic recording medium on which a thick glass plate was formed, perforated and edge-polished was chucked, and 300 rpm was applied.
The glass substrate was rotated at m. A urethane buff into which silicon was kneaded was pressed against the outer peripheral end surface of the glass substrate at a pressure of 2.0 kgf / cm 2 , and polishing was performed for 20 seconds while a slurry containing cerium oxide abrasive grains was dropped. When the surface of the obtained substrate was inspected in the same manner as in Example 1, no surface flaw was found. Regarding the quality of the outer peripheral end face, a quality equal to or higher than that obtained by polishing by the conventional method was obtained.
【００７８】実施例６ 厚板ガラスの形成、穴あけおよび端面研削を行った磁気
記録媒体用ガラス基板の外周をチャックし、３００ｒｐ
ｍで該ガラス基板を回転させた。このガラス基板の内周
端面に、酸化セリウム砥石を押しつけ圧力０．５ｋｇｆ
／ｃｍ２で押しつけ、酸化セリウム砥粒を含むスラリー
を滴下しながら２０秒間研磨を行った。得られた基板の
表面を実施例１と同様に検査したところ、表面の傷はな
かった。外周端面の品質についても従来の方法で研磨し
た場合と同等以上の品質が得られた。Example 6 The outer periphery of a magnetic recording medium glass substrate which had been subjected to formation, drilling and edge grinding of a thick glass plate was chucked at 300 rpm.
The glass substrate was rotated at m. A cerium oxide grindstone is pressed against the inner peripheral end face of this glass substrate and the pressure is 0.5 kgf.
/ Cm 2 and polished for 20 seconds while dropping a slurry containing cerium oxide abrasive grains. When the surface of the obtained substrate was inspected in the same manner as in Example 1, no surface flaw was found. Regarding the quality of the outer peripheral end face, a quality equal to or higher than that obtained by polishing by the conventional method was obtained.
【００７９】実施例７ 厚板ガラスの形成、穴あけおよび端面研削を行った磁気
記録媒体用ガラス基板の外周をチャックし、３００ｒｐ
ｍで該ガラス基板を回転させた。このガラス基板の内周
端面に、ポリエステルからなる織布を押しつけ圧力２．
０ｋｇｆ／ｃｍ ２で押しつけ、酸化セリウム砥粒を含む
スラリーを滴下しながら２０秒間研磨を行った。得られ
た基板の表面を実施例１と同様に検査したところ、表面
の傷はなかった。外周端面の品質についても従来の方法
で研磨した場合と同等以上の品質が得られた。Example 7 Magnetic Properties of Thick Glass Formed, Drilled and End-Grounded
Chuck the outer periphery of the recording medium glass substrate, and
The glass substrate was rotated at m. Inner circumference of this glass substrate
1. A woven cloth made of polyester is pressed against the end face, and the pressure is 2.
0kgf / cm 2With cerium oxide abrasive grains
Polishing was performed for 20 seconds while dropping the slurry. Obtained
The surface of the substrate was inspected in the same manner as in Example 1.
There were no scratches. Conventional method for outer end face quality
The quality equal to or higher than that obtained by polishing was obtained.
【００８０】[0080]
【発明の効果】以上のように、本発明の製造方法によれ
ば、ガラス基板の表面に傷を付けることなく、高品質の
端面を有する磁気記録媒体用ガラス基板が提供できる。As described above, according to the manufacturing method of the present invention, a glass substrate for a magnetic recording medium having a high-quality end face can be provided without damaging the surface of the glass substrate.
【００８１】また、本発明の磁気記録媒体用ガラス基板
は、表面および端面の品質が優れるため、高密度の記録
に対応した高信頼性の磁気記録媒体用ガラス基板とな
る。Further, the glass substrate for a magnetic recording medium of the present invention is a highly reliable glass substrate for a magnetic recording medium corresponding to high-density recording because of its excellent surface and end surface quality.
【００８２】さらに、本発明の磁気記録媒体は、表面お
よび端面の品質が優れた磁気記録媒体用基板を用いるた
め、高密度の記録に対応した高信頼性の磁気記録媒体と
なる。Further, since the magnetic recording medium of the present invention uses a magnetic recording medium substrate having excellent surface and end face quality, it becomes a highly reliable magnetic recording medium compatible with high-density recording.
【図１】本発明の磁気記録媒体用ガラス基板の製造方法
の端面研磨工程（外周端面の研磨）を説明するための概
略図である。FIG. 1 is a schematic diagram for explaining an end surface polishing step (polishing of an outer peripheral end surface) of a method of manufacturing a glass substrate for a magnetic recording medium according to the present invention.
【図２】本発明の磁気記録媒体用ガラス基板の製造方法
の端面研磨工程（外周端面の研磨）を説明するための概
略図である。FIG. 2 is a schematic view for explaining an end face polishing step (polishing of an outer peripheral end face) of the method for producing a glass substrate for a magnetic recording medium according to the present invention.
【図３】本発明の磁気記録媒体用ガラス基板の製造方法
の端面研磨工程（内周端面の研磨）を説明するための概
略図である。FIG. 3 is a schematic view for explaining an end face polishing step (polishing of an inner peripheral end face) of the method for manufacturing a glass substrate for a magnetic recording medium of the present invention.
【図４】本発明の磁気記録媒体用ガラス基板の製造方法
の端面研磨工程（内周端面の研磨）を説明するための概
略図である。FIG. 4 is a schematic view for explaining an end face polishing step (polishing of an inner peripheral end face) of the method for manufacturing a glass substrate for a magnetic recording medium according to the present invention.
【図５】磁気記録媒体用ガラス基板の研磨前（Ａ）、と
各種材料を用いて研磨した後（（Ｂ）から（Ｄ））のガ
ラス基板の端面の電子顕微鏡写真である。FIG. 5 is an electron micrograph of an end face of a glass substrate for a magnetic recording medium before polishing (A) and after polishing using various materials ((B) to (D)).
【図６】ガラス基板の外周端面とチャンファーの状態
（Ａ）と各ガラス基板から磁気記録媒体を製造した場合
のイオンクロマトグラフによるアルカリ溶出量を比較し
た図（Ｂ）である。FIG. 6 is a diagram (B) comparing the state of the outer peripheral end surface of the glass substrate and the chamfer (A) and the amount of alkali elution by ion chromatography when a magnetic recording medium is manufactured from each glass substrate.
【図７】本発明の磁気記録媒体の部分構造断面図であ
る。FIG. 7 is a partial sectional view of a magnetic recording medium according to the present invention.
１ ガラス基板 ２ 非磁性金属層 ３ 非磁性下地層 ４ 磁性層 ５ 保護層 ６ 液体潤滑層 １０ 内周チャック １２ スラリー導入口 １４ スラリー １６ 研磨テープ １８ 研磨機 １９ 押し付け部 ２２ 外周端面 ２４ 外周チャック ２６ 内周端面 DESCRIPTION OF SYMBOLS 1 Glass substrate 2 Nonmagnetic metal layer 3 Nonmagnetic underlayer 4 Magnetic layer 5 Protective layer 6 Liquid lubrication layer 10 Inner circumference chuck 12 Slurry introduction port 14 Slurry 16 Polishing tape 18 Polisher 19 Pressing part 22 Outer end face 24 Outer circumference chuck 26 Inside Peripheral end face
フロントページの続き (72)発明者 日比野 邦男 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 伊藤 健太 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 Ｆターム(参考） 3C043 BB05 3C058 AA05 AA07 AA09 AA14 AA16 AB04 AC04 CB01 CB02 DA02 4G059 AA08 AB19 AC03 5D006 CB04 5D112 AA02 BA03 BA09 GA09 GA13 GA14 GA30 Continuing from the front page (72) Inventor Kunio Hibino 1006 Kadoma Kadoma, Osaka Prefecture Inside Matsushita Electric Industrial Co., Ltd. 3C043 BB05 3C058 AA05 AA07 AA09 AA14 AA16 AB04 AC04 CB01 CB02 DA02 4G059 AA08 AB19 AC03 5D006 CB04 5D112 AA02 BA03 BA09 GA09 GA13 GA14 GA30
Claims (18)
ガラス基板の製造方法であって、該製造方法がガラス基
板の端面研磨工程を具備し、該端面研磨工程が前記ガラ
ス基板の内周をチャックして枚葉式で、研磨テープまた
は砥石を用いて前記ガラス基板の外周側の端面を研磨加
工する工程であることを特徴とする磁気記録媒体用ガラ
ス基板の製造方法。1. A method of manufacturing a glass substrate for a magnetic recording medium having an inner periphery and an outer periphery, the method comprising a step of polishing an end face of a glass substrate, wherein the step of polishing the end face forms an inner periphery of the glass substrate. A method of manufacturing a glass substrate for a magnetic recording medium, comprising a step of polishing and polishing an outer peripheral end surface of the glass substrate using a polishing tape or a grindstone in a single-wafer manner.
ガラス基板の製造方法であって、該製造方法がガラス基
板の端面研磨工程を具備し、該端面研磨工程が前記ガラ
ス基板の外周をチャックして枚葉式で、研磨テープまた
は砥石を用いて前記ガラス基板の内周側の端面を研磨加
工する工程であることを特徴とする磁気記録媒体用ガラ
ス基板の製造方法。2. A method of manufacturing a glass substrate for a magnetic recording medium having an inner periphery and an outer periphery, the method comprising a step of polishing an end face of a glass substrate, wherein the end face polishing step chucks the outer periphery of the glass substrate. A step of polishing the inner peripheral end face of the glass substrate using a polishing tape or a grindstone in a single-wafer method.
ガラス基板の製造方法であって、 （ａ）中心穴を有するディスク状ガラス基板の形状を形
成する工程、 （ｂ）前記ディスク状ガラス基板の端面研磨を行う工
程、 （ｃ）前記ディスク状ガラス基板の表面仕上げを行う工
程 とを具備し、前記端面研磨工程が、前記ガラス基板の内
周をチャックして枚葉式で、研磨テープまたは砥石を用
いて前記ガラス基板の外周側の端面を研磨加工する工程
であることを特徴とする磁気記録媒体用ガラス基板の製
造方法。3. A method of manufacturing a glass substrate for a magnetic recording medium having an inner periphery and an outer periphery, comprising: (a) forming a disk-shaped glass substrate having a center hole; and (b) the disk-shaped glass substrate. (C) finishing the surface of the disk-shaped glass substrate, wherein the edge-polishing step chucks the inner periphery of the glass substrate, and uses a polishing tape or A method of manufacturing a glass substrate for a magnetic recording medium, comprising a step of polishing an outer peripheral end surface of the glass substrate using a grindstone.
ガラス基板の製造方法であって、 （ａ）中心穴を有するディスク状ガラス基板の形状を形
成する工程、 （ｂ）前記ディスク状ガラス基板の端面研磨を行う工
程、 （ｃ）前記ディスク状ガラス基板の表面仕上げを行う工
程 とを具備し、前記端面研磨工程が、前記ガラス基板の外
周をチャックして枚葉式で、研磨テープまたは砥石を用
いて前記ガラス基板の内周側の端面を研磨加工する工程
であることを特徴とする磁気記録媒体用ガラス基板の製
造方法。4. A method of manufacturing a glass substrate for a magnetic recording medium having an inner periphery and an outer periphery, comprising: (a) forming a disk-shaped glass substrate having a center hole; and (b) the disk-shaped glass substrate. (C) finishing the surface of the disc-shaped glass substrate, wherein the end-face polishing process is a single-wafer polishing tape or grindstone by chucking the outer periphery of the glass substrate. Polishing the inner peripheral end surface of the glass substrate by using a method for manufacturing a glass substrate for a magnetic recording medium.
ガラス基板の製造方法であって、該製造方法がガラス基
板の端面研磨工程を具備し、該端面研磨工程が前記ガラ
ス基板の内周をチャックして枚葉式で、研磨テープまた
は砥石を用いて前記ガラス基板の外周側の端面を研磨加
工する工程と、前記ガラス基板の外周をチャックして枚
葉式で、研磨テープまたは砥石を用いて前記ガラス基板
の内周側の端面を研磨加工する工程とを具備することを
特徴とする磁気記録媒体用ガラス基板の製造方法。5. A method for manufacturing a glass substrate for a magnetic recording medium having an inner periphery and an outer periphery, the method comprising a step of polishing an end face of the glass substrate, and the step of polishing the end face forms the inner periphery of the glass substrate. A step of polishing and polishing the end face on the outer peripheral side of the glass substrate using a polishing tape or a grindstone with a single wafer type, and using a polishing tape or a grindstone with a single wafer type by chucking the outer periphery of the glass substrate. Polishing the inner peripheral end surface of the glass substrate by using a polishing method.
ガラス基板の製造方法であって、 （ａ）中心穴を有するディスク状ガラス基板の形状を形
成する工程、 （ｂ）前記ディスク状ガラス基板の端面研磨を行う工
程、 （ｃ）前記ディスク状ガラス基板の表面仕上げを行う工
程 とを具備し、前記端面研磨工程が、前記ガラス基板の内
周をチャックして枚葉式で、研磨テープまたは砥石を用
いて前記ガラス基板の外周側の端面を研磨加工する工程
と、前記ガラス基板の外周をチャックして枚葉式で、研
磨テープまたは砥石を用いて前記ガラス基板の内周側の
端面を研磨加工する工程とを具備することを特徴とする
磁気記録媒体用ガラス基板の製造方法。6. A method for manufacturing a glass substrate for a magnetic recording medium having an inner periphery and an outer periphery, comprising: (a) forming a disk-shaped glass substrate having a center hole; and (b) the disk-shaped glass substrate. (C) finishing the surface of the disk-shaped glass substrate, wherein the edge-polishing step chucks the inner periphery of the glass substrate, and uses a polishing tape or A step of polishing the outer peripheral end surface of the glass substrate using a grindstone, and chucking the outer periphery of the glass substrate in a single-wafer method, using an abrasive tape or a grindstone to form an inner peripheral end surface of the glass substrate. A method of manufacturing a glass substrate for a magnetic recording medium, comprising a step of polishing.
ガラス基板の製造方法であって、前記端面研磨工程が、
ダイヤモンド、酸化アルミ、酸化セリウム、シリコンカ
ーバイド、コロイダルシリカから選択される研磨砥粒を
含む研磨テープで研磨する工程であることを特徴とする
磁気記録媒体用ガラス基板の製造方法。7. The method for producing a glass substrate for a magnetic recording medium according to claim 1, wherein the polishing of the end face comprises:
A method for producing a glass substrate for a magnetic recording medium, comprising a step of polishing with a polishing tape containing polishing abrasive grains selected from diamond, aluminum oxide, cerium oxide, silicon carbide, and colloidal silica.
基板の製造方法であって、前記端面研磨工程がスラリー
を用いた湿式法で研磨する工程であることを特徴とする
磁気記録媒体用ガラス基板の製造方法。8. The method for manufacturing a glass substrate for a magnetic recording medium according to claim 7, wherein the polishing of the end face is a step of polishing by a wet method using a slurry. A method for manufacturing a glass substrate.
基板の製造方法であって、前記端面研磨工程がスラリー
を用いない乾式法で研磨する工程であることを特徴とす
る磁気記録媒体用ガラス基板の製造方法。9. The method for producing a glass substrate for a magnetic recording medium according to claim 7, wherein the polishing of the end face is a step of polishing by a dry method without using a slurry. A method for manufacturing a glass substrate.
ス基板の製造方法であって、前記端面研磨工程が、ダイ
ヤモンド、酸化アルミ、酸化セリウム、シリコンカーバ
イド、コロイダルシリカから選択される研磨砥粒を含む
スラリーを滴下しながら研磨する工程であることを特徴
とする磁気記録媒体用ガラス基板の製造方法。10. The method of manufacturing a glass substrate for a magnetic recording medium according to claim 8, wherein the polishing of the end face is performed by using abrasive grains selected from diamond, aluminum oxide, cerium oxide, silicon carbide, and colloidal silica. A method for producing a glass substrate for a magnetic recording medium, which is a step of polishing while dropping a slurry containing.
ス基板の製造方法であって、前記端面研磨工程が、研磨
砥粒を含まない、水、アルカリでｐＨ調整したアルカリ
水溶液、および界面活性剤を含む水溶液から選択される
水または水溶液を滴下しながら研磨する工程であること
を特徴とする磁気記録媒体用ガラス基板の製造方法。11. The method for producing a glass substrate for a magnetic recording medium according to claim 8, wherein the polishing of the end face does not include polishing abrasive grains, and the pH is adjusted with water, an alkali aqueous solution, and surface activity. A method for producing a glass substrate for a magnetic recording medium, comprising a step of polishing while dropping water or an aqueous solution selected from an aqueous solution containing an agent.
用ガラス基板の製造方法であって、前記端面研磨工程が
ウレタン、ポリエステルおよびナイロンから選択される
材料で形成された砥粒を含まない研磨テープを用い、研
磨砥粒を含まない、水、アルカリでｐＨ調整したアルカ
リ水溶液、および界面活性剤を含む水溶液から選択され
る水または水溶液を滴下しながら研磨する工程であるこ
とを特徴とする磁気記録媒体用ガラス基板の製造方法。12. The method of manufacturing a glass substrate for a magnetic recording medium according to claim 1, wherein the polishing step does not include abrasive grains formed of a material selected from urethane, polyester, and nylon. Using a polishing tape, not including abrasive grains, water, an alkaline aqueous solution adjusted to pH with alkali, and a step of polishing while dropping water or an aqueous solution selected from aqueous solutions containing a surfactant, A method for manufacturing a glass substrate for a magnetic recording medium.
用ガラス基板の製造方法であって、前記端面研磨工程が
ウレタン、ポリエステルおよびナイロンから選択される
材料で形成された砥粒を含まない研磨テープを用い、ス
ラリーとしてダイヤモンド、酸化アルミニウム、酸化セ
リウム、シリコンカーバイドおよびコロイダルシリカか
ら選択される研磨砥粒を含むスラリーを滴下しながら研
磨する工程であることを特徴とする磁気記録媒体用ガラ
ス基板の製造方法。13. The method of manufacturing a glass substrate for a magnetic recording medium according to claim 1, wherein the polishing step does not include abrasive grains formed of a material selected from urethane, polyester, and nylon. A glass substrate for a magnetic recording medium, which is a step of polishing while dropping a slurry containing polishing abrasive grains selected from diamond, aluminum oxide, cerium oxide, silicon carbide and colloidal silica as a slurry using a polishing tape. Manufacturing method.
用ガラス基板の製造方法であって、前記端面研磨工程
が、ダイヤモンド、酸化アルミニウム、酸化セリウム、
シリコンカーバイドおよびコロイダルシリカを含む砥石
を用いて研磨する工程であることを特徴とする磁気記録
媒体用ガラス基板の製造方法。14. The method for producing a glass substrate for a magnetic recording medium according to claim 1, wherein the polishing of the end face comprises diamond, aluminum oxide, cerium oxide,
A method for producing a glass substrate for a magnetic recording medium, comprising a step of polishing using a grindstone containing silicon carbide and colloidal silica.
ラス基板の製造方法であって、前記端面研磨工程が、研
磨砥粒を含まない、水、アルカリでｐＨ調整したアルカ
リ水溶液、および界面活性剤を含む水溶液から選択され
る水または水溶液を滴下しながら研磨する工程であるこ
とを特徴とする磁気記録媒体用ガラス基板の製造方法。15. The method for producing a glass substrate for a magnetic recording medium according to claim 14, wherein the polishing of the end surface does not include abrasive grains, and the aqueous solution is an aqueous alkaline solution adjusted to pH with water, an alkali, and surface activity. A method for producing a glass substrate for a magnetic recording medium, comprising a step of polishing while dropping water or an aqueous solution selected from an aqueous solution containing an agent.
ラス基板の製造方法であって、前記端面研磨工程が、ダ
イヤモンド、酸化アルミニウム、酸化セリウム、シリコ
ンカーバイドおよびコロイダルシリカから選択される研
磨砥粒を含むスラリーを滴下しながら研磨する工程であ
ることを特徴とする磁気記録媒体用ガラス基板の製造方
法。16. The method for manufacturing a glass substrate for a magnetic recording medium according to claim 14, wherein the polishing of the end face is performed by using abrasive grains selected from diamond, aluminum oxide, cerium oxide, silicon carbide, and colloidal silica. A method for producing a glass substrate for a magnetic recording medium, which is a step of polishing while dropping a slurry containing.
載の製造方法で製造された磁気記録媒体用ガラス基板。17. A glass substrate for a magnetic recording medium manufactured by the manufacturing method according to claim 1. Description:
および液体潤滑層が形成されている磁気記録媒体であっ
て、前記基板が請求項１７に記載の磁気記録媒体用ガラ
ス基板であることを特徴とする磁気記録媒体。18. A magnetic recording medium having at least a magnetic layer, a protective layer and a liquid lubricating layer formed on a substrate, wherein the substrate is the glass substrate for a magnetic recording medium according to claim 17. Characteristic magnetic recording medium.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001016279A JP2002219642A (en) | 2001-01-24 | 2001-01-24 | Glass substrate for magnetic recording medium and its manufacturing method and magnetic recording medium using the same |
| US10/052,495 US20020142707A1 (en) | 2001-01-24 | 2002-01-23 | Glass substrate for magnetic recording medium, production method thereof, and magnetic recording medium using the substrate |
| SG200200481A SG107094A1 (en) | 2001-01-24 | 2002-01-24 | Glass substrate for magnetic recording medium production method thereof, and magnetic recording medium using the substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001016279A JP2002219642A (en) | 2001-01-24 | 2001-01-24 | Glass substrate for magnetic recording medium and its manufacturing method and magnetic recording medium using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002219642A true JP2002219642A (en) | 2002-08-06 |
Family
ID=18882680
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001016279A Pending JP2002219642A (en) | 2001-01-24 | 2001-01-24 | Glass substrate for magnetic recording medium and its manufacturing method and magnetic recording medium using the same |
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| Country | Link |
|---|---|
| US (1) | US20020142707A1 (en) |
| JP (1) | JP2002219642A (en) |
| SG (1) | SG107094A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008112497A (en) * | 2006-10-30 | 2008-05-15 | Fujitsu Ltd | Disk edge vanishing device and disk edge vanishing method |
| JP2012040643A (en) * | 2010-08-19 | 2012-03-01 | Sanshin Co Ltd | Method and apparatus for polishing substrate |
| JP2013193892A (en) * | 2012-03-16 | 2013-09-30 | Avanstrate Inc | Method of manufacturing glass sheet |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4090247B2 (en) * | 2002-02-12 | 2008-05-28 | 株式会社荏原製作所 | Substrate processing equipment |
| US7083871B2 (en) * | 2002-05-09 | 2006-08-01 | Maxtor Corporation | Single-sided sputtered magnetic recording disks |
| MY138480A (en) * | 2002-05-09 | 2009-06-30 | Maxtor Corp | Method of simultaneous two-disk processing of single-sided magnetic recording disks |
| US7628895B2 (en) * | 2002-05-09 | 2009-12-08 | Seagate Technology Llc | W-patterned tools for transporting/handling pairs of disks |
| US7180709B2 (en) * | 2002-05-09 | 2007-02-20 | Maxtor Corporation | Information-storage media with dissimilar outer diameter and/or inner diameter chamfer designs on two sides |
| US7600359B2 (en) * | 2002-05-09 | 2009-10-13 | Seagate Technology Llc | Method of merging two disks concentrically without gap between disks |
| US7748532B2 (en) * | 2002-10-10 | 2010-07-06 | Seagate Technology Llc | Cassette for holding disks of different diameters |
| JP3940693B2 (en) * | 2003-02-24 | 2007-07-04 | 日本ミクロコーティング株式会社 | Magnetic hard disk substrate and manufacturing method thereof |
| JP3534115B1 (en) * | 2003-04-02 | 2004-06-07 | 住友電気工業株式会社 | Edge-polished nitride semiconductor substrate, edge-polished GaN free-standing substrate, and edge processing method for nitride semiconductor substrate |
| US7682653B1 (en) * | 2004-06-17 | 2010-03-23 | Seagate Technology Llc | Magnetic disk with uniform lubricant thickness distribution |
| US7355814B1 (en) | 2004-09-02 | 2008-04-08 | Maxtor Corporation | Disk texture located in load/unload zone of disk for cleaning contamination and disk lubricant from head ABS surface |
| US7882616B1 (en) | 2004-09-02 | 2011-02-08 | Seagate Technology Llc | Manufacturing single-sided storage media |
| US20070238393A1 (en) * | 2006-03-30 | 2007-10-11 | Shin Ho S | Methods and apparatus for polishing an edge of a substrate |
| JP2008306179A (en) | 2007-05-21 | 2008-12-18 | Applied Materials Inc | Method and apparatus for removing film and foil from edge on both sides of substrate by using backing pad |
| JP2008306180A (en) * | 2007-05-21 | 2008-12-18 | Applied Materials Inc | Method and apparatus for controlling polishing profile of film on slope and edge of substrate |
| TW200908122A (en) * | 2007-05-21 | 2009-02-16 | Applied Materials Inc | Methods and apparatus for using a rolling backing pad for substrate polishing |
| US20100112909A1 (en) * | 2008-02-22 | 2010-05-06 | Nihon Micro Coating Co., Ltd. | Method of and apparatus for abrading outer peripheral parts of a semiconductor wafer |
| WO2010029878A1 (en) * | 2008-09-10 | 2010-03-18 | Hoya株式会社 | Method for manufacturing glass substrate for magnetic disc, glass substrate for magnetic disc, method for manufacturing magnetic disc, and magnetic disc |
| JP5352331B2 (en) * | 2009-04-15 | 2013-11-27 | ダイトエレクトロン株式会社 | Wafer chamfering method |
| US8986072B2 (en) * | 2011-05-26 | 2015-03-24 | Corning Incorporated | Methods of finishing an edge of a glass sheet |
| TWI680031B (en) * | 2012-09-24 | 2019-12-21 | 日商荏原製作所股份有限公司 | Grinding method and grinding device |
| US9931726B2 (en) * | 2013-01-31 | 2018-04-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer edge trimming tool using abrasive tape |
-
2001
- 2001-01-24 JP JP2001016279A patent/JP2002219642A/en active Pending
-
2002
- 2002-01-23 US US10/052,495 patent/US20020142707A1/en not_active Abandoned
- 2002-01-24 SG SG200200481A patent/SG107094A1/en unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008112497A (en) * | 2006-10-30 | 2008-05-15 | Fujitsu Ltd | Disk edge vanishing device and disk edge vanishing method |
| JP2012040643A (en) * | 2010-08-19 | 2012-03-01 | Sanshin Co Ltd | Method and apparatus for polishing substrate |
| JP2013193892A (en) * | 2012-03-16 | 2013-09-30 | Avanstrate Inc | Method of manufacturing glass sheet |
Also Published As
| Publication number | Publication date |
|---|---|
| US20020142707A1 (en) | 2002-10-03 |
| SG107094A1 (en) | 2004-11-29 |
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