TW200807151A - Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device - Google Patents

Abstract

A radiation sensitive composition comprising a colorant, an alkali-soluble resin, a polyfunctional monomer and a photopolymerization initiator. The alkali-soluble resin is a copolymer of (b1) at least one first unsaturated compound selected from the group consisting of an unsaturated carboxylic acid, an unsaturated carboxylic anhydride and an unsaturated phenolic compound and at least one second unsaturated compound selected from the group consisting of (b2) an unsaturated compound having an oxetane skeleton and (b3) an unsaturated compound having a tetrahydrofuran skeleton. The radiation sensitive composition is used to form a colored layer.

Description

200807151 (1) Description of the Invention [Technical Field] The present invention relates to a radiation-sensitive composition, a color filter, and a color liquid crystal display device for forming a coloring layer. In particular, it relates to a radiation-sensitive composition for forming a colored layer, which can be used for color filters for use in transmissive and reflective color liquid crystal displays and color photographic devices. A color filter for a coloring layer formed by a radiation-sensitive composition and a color liquid crystal display device including the color filter. [Prior Art] A method of manufacturing a color filter using a color radiation-sensitive composition is known in which a color radiation-sensitive composition is applied to a substrate or a substrate containing a light-shielding layer having a desired pattern, dried, and then dried. A method in which a coating film is exposed to radiation of a desired pattern (hereinafter referred to as "exposure" and developed to obtain a color pixel (refer to JP-A 2-144502 and JP-A 3-53201). In the technical field of color filters, The requirements for the formed pixels and black matrix and color radiation-sensitive compositions are becoming more and more stringent. That is, in addition to the sensitivity, resolution and pattern shape of the color radiation-sensitive composition, the pixels and the black matrix are extremely resistant to various types. The tolerance of the various solvents and the adhesion to the substrate, and the color radiation-sensitive composition used to form the color filter requires excellent storage stability in the form of a solvent-containing composition. The sensitive composition cannot fully satisfy these requirements. [Invention] -4- 200807151 (2) One object of the present invention is to provide a novel radiation sensitive for forming a colored layer. The composition has excellent storage stability in the form of a liquid composition containing a solvent, and provides a pixel and a black matrix which are excellent in resistance to various solvents and excellent in adhesion to a substrate. Another object of the present invention is to provide a color filter and a color liquid crystal display device. Other objects and advantages of the present invention will become apparent from the following description. In accordance with the present invention, first, the foregoing objects and advantages of the present invention are achieved by a radiation-sensitive composition. The composition comprises (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, and (D) a photopolymerization initiator, wherein the alkali-soluble resin (B) is at least (bl) a first unsaturated compound selected from the group consisting of unsaturated carboxylic acids, unsaturated carboxylic anhydrides and unsaturated phenolic compounds, and at least one unsaturated compound selected from the group consisting of (b2) having an oxetane backbone and (b3) having tetrahydrofuran a copolymer of a second unsaturated compound of an unsaturated compound of a main chain, and the radiation-sensitive composition is used to form a colored layer. In the present invention, the colored layer represents a pixel and/or black Next, according to the present invention, the foregoing objects and advantages of the present invention are achieved by a color filter having a coloring layer formed from the radiation-sensitive composition of the present invention. Second, according to the present invention, the foregoing objects and advantages of the present invention are included. The color liquid crystal display device of the color filter of the present invention is achieved. BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below. -5- 200807151 (3) Radiation-sensitive composition-(A) colorant - The coloring agent in the present invention is not limited to a specific color, and is appropriately selected depending on the application purpose of the color filter produced. It may be a pigment, a dye or a natural coloring matter. Color development and heat resistance due to high vividness color A coloring agent having high color rendering property and high heat resistance, especially a coloring agent having high heat decomposition resistance, is a preferred coloring agent of the present invention. Therefore, it is preferred to use an organic pigment or an inorganic pigment, and it is particularly preferable to use an organic pigment or carbon black. Examples of the aforementioned organic pigments are compounds classified as a group of pigments according to a colorimetric index (CI; published by The Society of Dyers and Colourists), especially a compound having the following color index (CI) number: C. I. Pigment Yellow 1, c · I · Pigment Yellow 3, c · I · Pigment Yellow 1 2, C · I Pigment Yellow 1 3, C · I · Pigment Yellow 1 4, C · I · Pigment Yellow〗 5, c · ; • Pigment Yellow 16, C·I·Pig Yellow 17, C·I. Pigment Yellow 20, C. I·Pig Yellow 24, c I. Pigment Yellow 31, c· ][•Pigment Yellow 55, C·ϊ•Pigment Yellow 6〇, c·〗·Pigment Yellow 61, C.I·Pigment Yellow 65, C·I. Pigment Yellow 71, CI Pigment Yellow 73, C·I·Pig Yellow 74, C·I·Pig Yellow 81, C · I·Pigment Yellow 83, C· ][•Pigment Yellow 93, C· :[•Pigment Yellow 95, C· ][•Pigment Yellow 97, C. ][•Pigment Yellow 98, C · I · Pigment Yellow 1 〇〇, c · I · Pigment Yellow 1 〇 1, c. I. Pigment Yellow 1 〇 4, CI · Pigment Yellow 1 〇 6, c. I · Pigment Yellow 1 0 8 , C · I · Pigment Yellow i 〇 9 , C · I. Pigment Yellow 1 1 〇, C · 1. Pigment Yellow 1 1 3, c · 1 · Pigment Yellow 1 1 4, C · I. Pigment Yellow 1 1 6 C · I · Pigment Yellow n 7, c · ] [• Pigment Yellow n 9, c.] Pigment Yellow i 2 〇200807151 (4), CI Pigment Yellow 126, CI Pigment Yellow 127, CI Pigment Yellow 128, CI Pigment Yellow 129, CI Pigment Yellow 138, CI Pigment Yellow 139, C·I. Pigment Yellow 150, C·I. Pigment Yellow 151, CI Pigment Yellow 152, CI Pigment Yellow 1 5 3, C. I · Pigment Yellow 1 5 4 , C. I · Pigment Yellow 1 5 5, C · I · Pigment Yellow 1 5 6 , CI Pigment Yellow 166, CI Pigment Yellow 168, CI Pigment Yellow 175, CI Pigment Yellow 180 and C·I. Pigment Yellow 185 ; CI Pigment Orange 1, CI Pigment Orange 5, C · I. Pigment Orange 1 3, C. I. Pigment Orange 1 4, C · I. Pigment Orange 1 6, CI Pigment Orange 17, CI Pigment Orange 24, CI Pigment Orange 34 , CI Pigment Orange 3 6 , C · I · Pigment Orange 3 8 , C . I. Pigment Orange 4 0, C · I. Pigment Orange 4 3 , CI Pigment Orange 46, CI Pigment Orange 49, CI Pigment Orange 51, CI Pigment Orange 61, C·I. Pigment Orange 63, C·I. Pigment Orange 64, C·I. Pigment Orange 7 1 and C · I · Pigment Orange 7 3 ; C. I. Pigment Violet 1, C · I · Pigment Violet 19, C. I. Pigment Violet 23, C·I. Pigment Violet 29, C·I. Pigment Violet 32, C·I. Violet 3 6 and CI Pigment Violet 3 8 ; C · I. Pigment Red 1, C · I. Pigment Red 2, C · I. Pigment Red 3, C. I. Pigment Red 4, C. I. Pigment Red 5, C. I. Pigment Red 6, C · I. Pigment Red 7, C · I. Pigment Red 8, C · I. Pigment Red 9, C · I. Pigment Red 1 0, C · I. Pigment Red 1 1. C. I. Pigment Red 1 2, C · I. Pigment Red 1 4 , C. I · Pigment Red 1 5, C. I · Pigment Red 1 6 , C. I. Pigment Red 1 7 , C . I. Pigment Red 18, C·I. Pigment Red 19, C·I. Pigment Red 21, CI Pigment Red ' 2 2, C · I. Pigment Red 2 3, C · I. Pigment Red 3 0, C · I. Pigment Red 3 1, C. I · Pigment Red 3 2, C · I. Pigment Red 3 7 , C . I. Pigment Red 3 8 , C · I. Pigment Red 40, C·I. Pigment Red 41, CI Pigment Red 42 , CI Pigment Red 48 : 1, C · I · Pigment Red 4 8 : 2, C · I. Pigment Red 4 8 : 3, C . 1 . Pigment Red 4 8 : 4, C · I. Pigment Red 49 : 1 , C · I. Pigment Red 49 : 2, C · I. Pigment Red 200807151 (5) 5 0 ·· 1, C · I · Pigment Red 5 2 : 1, C. I · Pigment Red 5 3 : 1, C · I. Pigment Red 5 7 , C · I · Pigment Red 5 7 : 1, C · I · Pigment Red 5 7 : 2, C. I · Pigment Red 5 8 : 2, C I · Pigment Red 5 8 : 4, C · I. Pigment Red 6 0 : 1, C · I · Pigment Red 6 3 : 1, C · I. Pigment Red 6 3 : 2, C · I · Pigment Red 6 4 : 1, C. I · Pigment Red 8 1 : 1, C · I · Pigment Red 8 3, C · I · Pigment Red 8 8 , C · I · Pigment Red 9 0 : 1, C · I · Pigment Red 9 7. C · I · Pigment Red 1 〇 1, C. I. Pigment Red 102, C. 1. Pigment Red 104, CI Pigment Red l〇5, C·I·Pigment Red 106, C · I · Pigment Red 1 0 8 , C · I. Pigment Red 1 1 2, C · I. Pigment Red 1 1 3, C . I · Pigment Red 1 1 4, C · I · Pigment Red 1 2 2, C. I · Pigment Red 1 2 3, C · I · Pigment Red 1 4 4, C . I · Pigment Red 1 4 6 , C · I · Pigment Red 1 4 9 , C · I · Pigment Red 1 5 0, C · I · Pigment Red 1 5 1 , C · I. Pigment Red 1 6 6 , C · I. Pigment Red 1 6 8 , C · I. Pigment Red 1 7 0, C . I. Pigment Red 1 7 1 , C · I · Pigment Red 1 7 2, C. I. Pigment Red 1 7 4, C · I. Pigment Red 1 7 5, C · I · Pigment Red 1 7 6 , C · I · Pigment Red 1 7 7 , C · I. Pigment Red 1 7 8, C · I · Pigment Red 1 7 9 , C · I. Pigment Red 1 8 0, C · I · Pigment Red 1 8 5, C · I. Pigment 1 8 7, C · I · Pigment Red 1 8 8 , C · I. Pigment Red 1 90, C · I · Pigment Red 1 9 3, C · I · Pigment Red 1 9 4, C. I. Pigment Red 2 0 2, C · I · Pigment Red 2 0 6 , C · I · Pigment Red 2 0 7 , C · I. Pigment Red 20 8 , C · I. Pigment Red 209, C· I· Pigment Red 215, C · I·Pigment Red 216, CI Pigment Red 220, C·I·Pigment Red 224, CI Pigment Red 226 - , C. I · Pigment Red 2 4 2, C · I. Pigment Red 2 4 3, C · I · Pigment Red 2 4 5, C · I. Pigment Red 254, C·I·Pigment Red 25 5, C·I·Pigment Red 264 and CI Pigment Red 265; C. I·Pigment Blue 15, C·I·Pigment Blue 15 : 3, C. I·Pigment Blue 15 : 4, CI Pigment Blue 15: 6 and CI Pigment Blue 60; -8 - 200807151 (6) CI·Pigment Green 7 and C·I·Pigment Green 36; CI·Pigment Brown 23 and C· Ι·Pigment Brown 25; and C. Ι·Pigment Black 1 and CI Pigment Black 7. These organic pigments can be purified by recrystallization of sulfuric acid, solvent washing or a combination thereof before use. Examples of the foregoing inorganic pigments include titanium oxide, barium sulfate, calcium carbonate, zinc white, lead sulfate, yellow lead, zinc yellow, red iron oxide (red iron oxide (III)), cadmium red, ultramarine blue, Prussian blue, chromium oxide. Green, cobalt, amber, titanium black, synthetic iron black and carbon black. In the present invention, the aforementioned organic pigments and inorganic pigments may be used singly or in combination of two or more, or may be used in combination. For example, it is preferred to form a pixel using one or more organic pigments, and it is preferred to form a black matrix using two or more organic pigments and/or carbon black. In the present invention, the surface of the particles of the pigment may be modified as appropriate before use. Examples of the polymer for modifying the surface of the pigment particles include polymers disclosed in JP-A 8-25 9876 and polymers and oligomers commercially available for dispersing pigments. In the present invention, the colorant may optionally be used in combination with a dispersing agent. The dispersing agent is, for example, a cationic, anionic, nonionic, amphoteric, or a surfactant based on polyfluorinated oxygen or a substrate based on fluorine. Examples of the foregoing surfactant include polyethylene oxide alkyl ethers such as polyethylene oxide lauryl ether, polyethylene oxide stearyl ether, and polyethylene oxide oleyl ether; polyethylene oxide Alkyl phenyl ethers such as polyethylene oxide n-octyl phenyl ether and polyethylene oxide n-decyl phenyl ether; polyethylene glycol diester, -9 - 200807151 (7) Diol dilaurate and polyethylene glycol distearate; sorbitan fatty acid ester; fatty acid modified polyester; tertiary amine modified polyurethane; and polyethylidene amine. Commercially available trademarks for such surfactants are KP (Shin-Etsu Chemical, Co., Ltd.) Polyflow (Kyoeisya Chemical Co., Ltd.), F Top (Tokem Products Co., Ltd.), Megafac (Dainippon Ink and Chemicals, Inc.), Florade (Sumitomo 3M Limited), Asahi Guard and Surflon (Asahi Glass Co., Ltd.), BYK and Disperbyk (BYK Chemie Japan KK) and S o 1 sper se (S eneka C o ·, Ltd · ) o These surfactants may be used singly or in combination of two or more. The amount of the surfactant is preferably 50 parts by weight or less, more preferably 30 parts by weight, based on 1 part by weight of the coloring agent. In the present invention, the light-sensitive resin composition can be prepared by an appropriate method. For example, it can be prepared by mixing the components (A) to (D), optionally using a solvent and an additive as described below. When a pigment is used as a colorant, it is preferably mixed with a solvent and dispersed in a solvent in the presence of a dispersing agent, as in the case of a dispersing agent, and is milled by a bead mill or a f-mill to prepare a pigment dispersion. The dispersion is then mixed with components (B), (c) and (D) and optionally with additional solvents and additives to prepare a radiation-sensitive resin composition. The amount of the dispersant used to prepare the pigment dispersion is preferably 100 parts by weight or less, more preferably 0.5 to 1 part by weight, and still more preferably 1 to 70 parts by weight, based on parts by weight of the pigment. Number, especially good to 5 parts by weight. When the amount of the dispersant is more than 1 part by weight, color rendering may be impaired. - 200807151 (8) The solvent used to prepare the pigment dispersion may be used as described below for preparing a liquid radiation-sensitive resin composition. Solvent. The amount of the solvent used to prepare the pigment dispersion is preferably from 500 to 1,000 parts by weight, more preferably from 700 to 900 parts by weight, based on 100 parts by weight of the pigment. When a pigment dispersion is prepared using a bead mill, a solution of a mixed pigment is mixed and dispersed with glass beads or titania beads having a diameter of about 0.5 to 1 mm, preferably, with cooling water or the like. The solution contains a pigment, a solvent, and a dispersing agent. The beading rate of the beads is preferably from 50 to 80% of the mill capacity, and the injection amount of the pigment-mixed solution is preferably about 20 to 50% of the mill capacity. The treatment time is preferably from 2 to 50 hours, more preferably from 2 to 25 hours. The pigment dispersion is prepared using a roll mill, and the three-roll mill or the two-roll mill mixes and disperses the pigment-mixed solution, preferably while cooling with cooling water or the like. The interval between the rolls is preferably 1 〇 micrometer or less, and the shearing force is preferably about 108 dynes/second. The treatment time is preferably 2 to 50 hours', more preferably 2 to 25 hours. - (B) alkali-soluble resin - The alkali-soluble resin in the present invention is (bl) at least one first unsaturated compound selected from the group consisting of unsaturated carboxylic acids, unsaturated carboxylic anhydrides, and unsaturated phenol compounds (hereinafter referred to as "acid An unsaturated compound") and at least one selected from the group consisting of (b2) -11 - 200807151 (9) an unsaturated compound having an oxetane backbone and (b3) a second unsaturated group having an unsaturated compound having a tetrahydrofuran backbone The copolymer of the compound 'is a component as a binder of the colorant (A) and has solubility in an alkali developer used in a developing step for forming a coloring layer. Specific examples of the alkali-soluble resin (B) include a copolymer of (B1) an acid unsaturated compound and an unsaturated compound having an oxetane main chain (hereinafter referred to as "oxetane unsaturated compound"). (B 2 ) an acid unsaturated compound and a copolymer of an unsaturated compound having a tetrahydrofuran main chain (hereinafter referred to as "tetrahydrofuran unsaturated compound") and (B3) an acid unsaturated compound, an oxetane unsaturated compound, and A copolymer of a tetrahydrofuran unsaturated compound. Examples of the aforementioned unsaturated carboxylic acid and unsaturated carboxylic anhydride of the acid-unsaturated compound in the copolymers (B1), (B2) and (B3) include unsaturated monocarboxylic acids such as (meth)acrylic acid, crotonic acid, a -chloroacrylic acid and cinnamic acid; unsaturated dicarboxylic acid and its anhydride, such as maleic acid, maleic anhydride, fumaric acid, isaconic acid, isaconic anhydride, citraconic acid, citraconic anhydride And mesaconic acid; an unsaturated polycarboxylic acid having three or more carboxyl groups and an anhydride thereof; a mono[(meth)acryloxyalkylalkyl] ester having a polycarboxylic acid of two or more carboxyl groups, such as Mono[2-(methyl)acryloxyethyl]succinate and mono[2-(methyl)propenyloxyethyl]phthalate; and having a carboxyl group and a hydroxyl group at both ends A mono(meth)acrylate of a polymer such as w-carboxypolycaprolactone mono(meth)acrylate. Among these unsaturated carboxylic acids and unsaturated phthalic anhydrides, the market of mono(2-propenyloxyethyl) succinate and mono(2-propenyloxyethyl) phthalate is -12- 200807151 (10) The trademarks sold as Light Ester HOA-MS and LightEster HOA-MPE (Kyoeisha Kagaku Co., Ltd.) are examples of the aforementioned unsaturated phenolic compounds in the phthalic acid unsaturated compound, including unsaturated phenols such as o- Vinyl phenol, m-vinyl phenol, p-vinyl phenol, 2-methyl-4-vinyl phenol, 3-methyl-4-vinyl phenol, o-isopropenyl phenol, m-isopropenyl Phenol and p-isopropenyl phenol; and unsaturated naphthol, such as 2-vinyl small naphthol, 3-vinyl small naphthol, 1-vinyl-2-naphthol, 3-vinyl-2-naphthalene Phenol, 2-isopropenyl-1-naphthol and 3-isopropenyl-1-naphthol. In the present invention, (meth)acrylic acid and p-vinylphenol are preferred, and (meth)acrylic acid is a particularly preferred acid unsaturated compound. In the copolymers (B1) and (B3), the oxetane unsaturated compound is preferably a compound represented by the following formula (1) (hereinafter referred to as "oxetane unsaturated compound (1)" Or a compound represented by the following formula (2) (hereinafter referred to as "oxetane unsaturated compound (2)"). CHf=C—C—0—(CH2); Ο

C ι-1 , - L· (1) • C——O R5 (In the formula (1), R is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R 1 is a hydrogen atom or has 1 to 4 The alkyl group of the carbon atom, each of r2, r3, r4 and R5 is independently a hydrogen atom, a fluorine atom, an alkyl group having 1 to 4 carbon atoms, a fluoroalkyl group having 1 to 4 carbon atoms or having 6 to An aryl group of 20 carbon atoms, and η is an integer from 〇 to 6.) -13- 200807151 (11)

(In the formula (2), R, R1, R2, R3, R4, Rs and η are as defined in the above formula (1). In the above formulae (1) and (2), examples of the alkyl group having 1 to 4 carbon atoms represented by R, R1, R2, R3, R4 and Rs include methyl group, ethyl group, n-propyl group, Isopropyl, n-butyl, isobutyl, tbutyl and tert-butyl. Examples of the fluoroalkyl group having 1 to 4 carbon atoms represented by R2, R3, R4 and Rs include fluoromethyl, difluoromethyl, trifluoromethyl, fluoroethyl, 2-fluoroethyl 1,1-Difluoroethyl, 2,2,2-difluoroethyl, pentafluoroethyl, heptafluoro-n-propyl, heptafluoro-1-propyl, nonafluoro--n-butyl, nine Fluorine-isobutyl, nonafluoro-t-butyl and nonafluoro-t-butyl. Examples of the aryl group having 6 to 20 carbon atoms represented by R2, R3, R4 and R5 include a phenyl group, an o-tolyl group, a m-tolyl group and a p-tolyl group. Examples of the oxetane unsaturated compound (1) include (meth) acrylate such as 3-[(meth) propylene methoxymethyl] oxetane, 3-[(methyl) Propylene methoxymethyl]-2-methyloxetane, 3-[(meth)acryloxymethyl]-3-methyloxetane, 3-[(methyl) Anodic oxymethyl]-2-ethyloxetane, 3-[(meth)acryloxymethylbethyl 3-ethyloxetane, 3-[(methyl) Propylene methoxymethyl]-2-trifluoromethyl oxy-14- 200807151 (12) Heterocyclobutane, 3-[(methyl) propylene methoxymethyl]-2-pentafluoroethyl oxalate Cyclobutane, 3-[(meth)acryloxymethyl]-2-phenyloxetane, 3-[(meth)acryloxymethyl]-2,2-difluoro Oxetane, 3-[(methyl)acryloxymethyl]-2,2,4-trifluorooxetane, 3-[(meth)acryloxymethyl]- 2,2,4,4-tetrafluorooxetane, 3-[2-(methyl)propenyloxyethyl]oxetane, 3-[2-(methyl)propene oxime Benzyl]-2-methyloxetane, 3-[2-(methyl)propenyloxyethyl]-3-methyloxetane , 3-[2-(methyl)acryloxyethyl]-2-ethyloxetane, 3-[2-(methyl)propenyloxyethyl]-3-ethyloxy Heterocyclobutane, 3-[2-(methyl)propenyloxyethyl]-2-trifluoromethyloxetane, 3-[2-(methyl)propenyloxyethyl] -2-pentafluoroethyl oxetane, 3-[2-(methyl) propylene methoxyethyl]-2-phenyl oxetane, 3-[2 _(methyl) propylene醯oxyethyl]-2,2-difluorooxetane, 3-[2-(methyl)propenyloxyethyl]-2,2,4-trifluorooxetane and 3-[2-(Methyl)propenyloxyethyl]-2,2,4,4 -4 (anthracene ring. Examples of oxetane unsaturated compounds (2) include ( Methyl) acrylate such as 2-[(methyl) propylene methoxymethyl] oxetane, 2-[(methyl) propylene methoxymethyl]-2-methyl oxetane Alkane, 2-[(meth)acryloxymethyl]-3-methyloxetane, 2-[(methyl)propenyloxymethyl]-4-methyloxocycle Butane, 2-[(meth)acryloxymethyl]-2-ethyloxetane, 2-[(meth)acryloxymethyl]-3-ethyl Heterocyclobutane, 2-[(meth)acryloxymethyl]-4-ethyloxetane, 2-[(methyl)propenyloxymethyl b 2-trifluoromethyl Oxetane, 2-[(meth)acryloxymethyl]-3-trifluoromethyloxetane, 2-[(methyl)prop-15-200807151 (13) Oxymethyl]-4-difluoromethyloxetane, 2-[(methyl)propanoloxymethyl]-2-pentafluoroethyloxetane, 2-[( Methyl) propylene methoxymethyl]-3-pentafluoroethyl oxetane, 2-[(meth) propylene methoxymethyl]-4 pentafluoroethyl oxetane, 2-[(Methyl)acryloxymethyl]-2-phenyloxetane, 2-[(meth)acryloxymethyl]-3-phenyloxetane, 2-[(Meth)acryloxymethyl]-4-phenyloxetane, 2-[(meth)acryloxymethyl]-2,3-difluorooxetane Alkane, 2-[(meth)acryloxymethyl]-2,4-difluorooxetane, 2-[(meth)acryloxymethyl]-3,3-difluoro Oxetane, 2-[(meth)acryloxymethyl]-3,4-difluorooxetane, 2-[(methyl)acryloxymethyl bromide 4,4 -difluorooxetine, 2-[(meth)acryloxymethyl]-3,3,4-trifluorooxetane, 2-[(meth)acrylomethoxy group -3,4,4-trifluorooxetane, 2-[(meth)acryloxymethyl]-3,3,4,4-tetrafluorooxetane, 2- [2-(Methyl)propenyloxyethyl]oxetane, 2-[2-(methyl)acryloxyethyl]-2-methyloxetane, 2-[ 2-(Methyl)propenyloxyethyl]-3-methyloxetane, 2-[2-(methyl)propenyloxyethyl]-4-methyloxetane ,2-[2-(Methyl)acryloxyethyl]-2-ethyloxetine, 2-[2-(methyl)propanyloxyethyl]-3-ethyl Oxetane, 2-[2-(methyl)propenyloxyethyl]-4-ethyloxetane, 2-[2-(methyl)propenyloxyethyl]- 2-trifluoromethyloxetane, 2-[2-(methyl)propenyloxyethyl]-3-trifluoromethyloxetane, 2-[2-(methyl) Propylene methoxyethyl]-4-trifluoromethyloxetane, 2-[2-(methyl)propenyloxyethyl]-2-pentafluoroethyl oxetane, 2 -[2-(methyl)-propanyloxyethyl]-3 - Gas ethene, 2-[2-(methyl)-16- 200807151 (14) propylene methoxyethyl]-4-pentafluoroethyl oxetane, 2-[2- (Meth) propylene methoxyethyl]-2-phenyl oxetane, 2-[2-(methyl) propylene methoxyethyl]-3-phenyl oxetane, 2_ [2-(Methyl)acryloxyethyl]-4-phenyloxetane, 2-[2-(methyl)propenyloxyethyl]-2,3-difluorooxa Cyclobutane, 2-[2-(methyl)propenyloxyethyl]-2,4.difluorooxo-heterocyclobutane, 2-[2-(methyl)propenyloxyethyl] _3,3_Difluorooxetane, 2-[2-(methyl)propenyloxyethyl]-3,4-difluorooxetane, 2-[2-(methyl) Propylene oxiranyl ethyl]-4,4-difluorooxetane, 2-[2-(methyl)propenyloxyethyl]-3,3,4-trifluorooxetane ,2-[2-(methyl)acryloxyethyl l·3,4,4-trifluorooxetane and 2-[2-(methyl)propenyloxyethyl]-3 , 3,4,4-tetrafluorooxetane. In the oxetane unsaturated compound (1) and the oxetane unsaturated compound (2), 3-[(meth)acryloxymethyl]oxetane, 3 -[(Meth)acryloxymethyl]-3-ethyloxetane, 3-[(meth)acryloxymethyl]-2-trifluoromethyloxetane , 3-[(methyl)acryloxymethyl]-2-phenyloxetane, 2-[(meth)acryloxymethyl]oxetane and 2-[( Methyl)propenyloxymethyl]-4-trifluoromethyloxetane is preferred. 3-(methacryloxymethyl)oxetane, 3-(methacryloxymethyl)-3-ethyloxetane, 3-(methylpropyl' olefin Oxymethyl)-2-trifluoromethyloxetane, 3-(methacryloxymethyl)-2-phenyloxetane, 2-(methacryloxyloxy) Methyl)oxetane and 2-(methacryloxymethyl)-4-trifluoromethyloxetane are particularly preferred because the resulting radiation-sensitive composition has a wide development tolerance' Improve the chemical resistance of the resulting colored layer. -17- 200807151 (15) In the present invention, an (oxetanylalkyl)ether of a vinylphenol such as (3-oxetanylmethoxy)-p-vinylbenzene, [2] -(3-oxetanyl)ethoxy]-p-vinylbenzene, (2-oxetanylmethoxy)-p-vinylbenzene and [2-(2-oxa) Cyclobutane)ethoxy]-p-vinylbenzene; and (oxetanylalkyl)vinyl ether, such as (3-oxetanylmethyl). ) vinyl ether, [2-(3-oxetanyl)ethyl]vinyl ether, (2-oxetanylmethyl)vinyl ether and [2-(2-oxo-heterocycle) Butanyl)ethyl vinyl ether can also be used as an oxetane unsaturated compound other than the oxetane unsaturated compound (1) and the oxetane unsaturated compound (2). The aforementioned oxetane unsaturated compounds may be used singly or in combination of two or more. Examples of the tetrahydrofuran unsaturated compound in the copolymers (B 2 ) and (B3) include tetrahydrofuranyl (meth)acrylate such as tetrahydrofuran-2-yl (meth)acrylate and tetrahydrofuran-3 (meth)acrylate. - a base ester; a tetrahydroindenyl ester of (meth)acrylic acid, such as tetrahydrofurfuryl (meth)acrylate, 3-tetrahydrofurfuryl (meth)acrylate, 2-(tetra)(meth)acrylate Hydroquinolyloxy)ethyl ester and 2-(3-tetrahydroindenyloxy)ethyl (meth)acrylate; tetrahydroindenyl-containing ester of 2-(methyl)acryloxypropionic acid, Such as 4-(methyl)propenyloxypropionic acid tetrahydrofurfuryl ester, 2-(methyl)propenyloxypropionic acid 3-tetrahydrofurfuryl ester, 2-(•methyl)propenyloxypropionic acid 2-(tetrahydrofurfuryloxy)ethyl ester and 2-(3-tetrahydrofurfuryloxy)ethyl 2-(methyl)propenyloxypropionate; vinylbenzene derivatives such as (tetrahydrofuran- 2-yl)oxy-p-vinylbenzene, (tetrahydroindenyl)oxy-p-vinylbenzene and 2-(tetrahydrofurfuryloxy)ethoxy-p-vinylbenzene; and ethylene Ether, such as (tetrahydrofuran-2-yl) ethylene Alkyl ether, (tetrahydroindole-18-200807151 (16)) vinyl ether and [2-(tetrahydrofurfuryloxy)ethyl vinyl ether. In the present invention, a tetrahydroindenyl group-containing ester of (mercapto)acrylic acid is preferred, and (meth)acrylic acid tetrahydrofurfuryl ester and [2-(meth)acryloxyethyl)(tetrahydroindenyl) A succinate is a particularly preferred tetrahydrofuran unsaturated compound. The aforementioned tetrahydrofuran unsaturated compounds may be used singly or in combination of two or more. Used in combination. The copolymers (Bl), (B2), and (B3) may optionally contain an unsaturated compound other than an acid unsaturated compound, an oxetane unsaturated compound, and a tetrahydrofuran unsaturated compound (hereinafter referred to as "other unsaturated compound" ") as a constituent. Examples of other unsaturated compounds include aromatic vinyl compounds such as styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, ortho -methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl Ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether and p-vinylbenzyl glycidyl ether; hydrazine, such as hydrazine and 1-methyl hydrazine; unsaturated hydrazine Imines, such as maleimide, anthracene-cyclohexyl maleimide, anthracene-phenyl maleimide, econazole, and citrate; Saturated carboxylic acid esters such as methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, ( Isobutyl methacrylate, second butyl (meth) acrylate, tert-butyl (meth) acrylate, 2-(meth) acrylate Ethyl ethyl ester, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate-19- 200807151 (17), 2-hydroxybutyl (meth)acrylate, (meth)acrylic acid 3 -hydroxybutyl ester, 4-hydroxybutyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, phenyl (meth)acrylate, 2-methoxyethyl (meth)acrylate, 2-phenoxyethyl (meth)acrylate, methoxybisethylene glycol (meth) acrylate, methoxyethylene glycol (methyl) Acrylate, methoxypropanediol (meth) acrylate, methoxybispropanediol (meth) acrylate, isodecyl (meth) acrylate, dicyclopentadienyl (meth) acrylate, (a) 2-hydroxy-3-phenoxypropyl acrylate and glycerol mono(meth)acrylate; unsaturated aminoalkyl carboxylate such as 2-aminoethyl (meth)acrylate, (methyl) ) 2-dimethylaminoethyl acrylate, 2-aminopropyl (meth) acrylate, 2-dimethylaminopropyl (meth) acrylate , 3-aminopropyl (meth)acrylate and 3-dimethylaminopropyl (meth)acrylate; unsaturated glycidyl carboxylate, such as glycidyl (meth)acrylate; vinyl cyanide Compounds such as (meth)acrylonitrile, a-chloroacrylonitrile and vinylidene cyanide; unsaturated decylamines such as (meth) acrylamide, a-chloropropenylamine and N-2-hydroxyethyl ( Methyl) acrylamide; vinyl carboxylate such as vinyl acetate, vinyl propionate, vinyl butyrate and vinyl benzoate; unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether and Allyl glycidyl ether; aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; and mono(meth) propylene oxime at the end of the polymer molecular chain Macromonomers such as polystyrene, poly(methyl) methacrylate, poly-(methyl) butyl acrylate and polyoxyalkylene. These other unsaturated compounds may be used singly or in combination of two or more. -20- 200807151 (18) In the present invention, the copolymer (B1) is preferably a copolymer of (b 1) and (b 2 ) and optionally (b4) (hereinafter referred to as "copolymer (BI)"). And (b) is at least one acid unsaturated compound consisting essentially of (meth)acrylic acid, and (b2) is at least one selected from the group consisting of 3-(methacryloxymethyl)oxetane, Methyl propylene methoxymethyl)-3-ethyl oxetane, 3-(methyl propylene awake. Oxymethyl)-2-trifluoromethyloxetane, 3-(methacryloxymethyl)-2-phenyloxetane, 2-(methacryloxyloxy) Methyl)oxetane and 2-(methacryloxymethyl)-4-trifluoromethyloxetane oxetane unsaturated compound, (b4) is at least one selected From styrene, N-phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)propionate, allyl (meth)acrylate, (methyl) Other unsaturated compounds of benzyl acrylate, glycerol mono(meth) acrylate, polystyrene macromonomer and polymethyl methacrylate macromonomer. In detail, the copolymer (BI) is, for example, a copolymer of the following components (BI-1): (bl) an acid unsaturated compound composed of (meth)acrylic acid and (b2) by 3-[(A) An oxetane unsaturated compound consisting of acryloxymethyl]oxetane and optionally (b4) at least one selected from the group consisting of styrene and N-phenyl maleimide , (methyl) methacrylate, 2-hydroxyethyl (meth) acrylate, allyl (meth) acrylate, benzyl methacrylate, glycerol mono (meth) acrylate, polystyrene Giant monomer and other unsaturated compounds of polymethyl methacrylate macromonomer; copolymer of the following components (B 1-2): (M) acid unsaturated compound composed of (meth)acrylic acid and (b2) An oxetane unsaturated compound consisting of 3-[(methyl)acryloxymethyl)-3-ethyloxetane, and optionally (b 4) at least one - 21 - 200807151 (19) Species selected from the group consisting of styrene, N-phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, (meth) propylene Acid allyl ester, benzyl (meth) acrylate, glycerol mono (meth) acrylate, polystyrene macromonomer and other unsaturated compounds of polymethyl methacrylate macromonomer; the following components are copolymers ( BI-3) : (bi) acid-unsaturated compound composed of (meth)acrylic acid • and (b2) from 3-[(methyl)acryloxymethyl]-2-trifluoromethyl oxalate An oxetane unsaturated compound composed of cyclobutane, and optionally (b4) at least one selected from the group consisting of styrene, N-phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl methacrylate, allyl (meth) acrylate, benzyl (meth) acrylate, glycerol mono (meth) acrylate, polystyrene macromonomer and polymethyl methacrylate Other unsaturated compounds of the monomers; copolymers of the following components (BI-4): (bl) acid-unsaturated compounds composed of (meth)acrylic acid and (b2) 3-((meth)acryloyloxyl An oxetane unsaturated compound consisting of methyl-2-phenyloxetane, and optionally (b4) at least one From styrene, N-phenyl maleimide, methyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, allyl (meth) acrylate, benzyl (meth) acrylate Ester, glycerol mono(meth) acrylate, polystyrene macromonomer and polymethyl methacrylate macromonomer other unsaturated compounds; the following components are copolymers (BI-5): (bi) by (a An acid unsaturated compound composed of a propylene acid and (b2) an oxetane unsaturated compound composed of 2-[(meth) propylene methoxymethyl] oxetane, and The case exists (b4) at least one selected from the group consisting of styrene, N-phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, (meth)acrylic acid Propyl ester, benzyl (meth) acrylate, glycerol mono(methyl) propyl-22- 200807151 (20) enoate, polystyrene macromonomer and other unsaturated compounds of polymethyl methacrylate macromonomer Or a copolymer of the following components (BI-G): (bl) an acid unsaturated compound composed of (meth)acrylic acid and (b2) consisting of 2-[(A) An oxetane unsaturated compound composed of propylene methoxymethyl]-4-trifluoromethyloxetane, and optionally (b4) at least one selected from the group consisting of styrene.  , N-phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, glycerin Monounsaturated compounds of mono (meth) acrylate, polystyrene macromonomer and polymethyl methacrylate macromonomer. Among these copolymers (BI), copolymers (BI-1) and (BI-2) are particularly preferred. In the copolymer (BI), the copolymerization amount of the acid unsaturated compound is preferably from i to 40% by weight, particularly preferably from 5 to 30% by weight, and the copolymerization amount of the oxetane unsaturated compound is preferably one. Up to 60% by weight, particularly preferably from 1 4 to 45% by weight, and the copolymerization amount of other unsaturated compounds is preferably from 0 to 70% by weight, more preferably from 1 to 70% by weight, particularly preferably from 1 to 5 0% by weight. In the present invention, when the copolymerization amount of the unsaturated compound contained in the copolymer (BI) is set within the above range, storage stability and sensitivity, solvent resistance of the pigment dispersion and the solvent-containing liquid composition can be obtained. A radiation-sensitive composition excellent in adhesion to a substrate, even if the pigment content is high. The copolymer (B2) is preferably a copolymer of the following components (hereinafter referred to as "copolymer (BII)"): (bi) at least one acid unsaturated compound composed of (meth)acrylic acid and (b3) at least one kind a tetrahydrofuran-23-200807151 (21) unsaturated compound selected from the group consisting of tetrahydroindenyl (meth) acrylate and [2-(methyl) propylene methoxyethyl] (tetrahydroindenyl) succinate, and Depending on the case (b4) at least one selected from the group consisting of styrene, N-phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, (meth)acrylic acid Other unsaturated compounds of allyl ester, benzyl (meth) acrylate, glycerol mono (meth) acrylate, polystyrene macromonomer and polymethyl methacrylate macromonomer. • In detail, the copolymer (BII) is, for example, a copolymer of the following components (hereinafter referred to as "copolymer BII-1"): (bl) at least one acid unsaturated compound composed of (meth)acrylic acid and (b3) at least one tetrahydrofuran unsaturated compound composed of tetrahydroindenyl (meth) acrylate, and optionally (b4) at least one selected from the group consisting of styrene and N-phenyl maleimide, Methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, mono(meth)acrylate, polystyrene And other unsaturated compounds of polymethyl methacrylate macromonomer; or a copolymer of the following components (hereinafter referred to as "copolymer (13 11-2)"): (bl) at least one (meth)acrylic acid a composition of an acid unsaturated compound and (b3) at least one tetrahydrofuran unsaturated compound consisting of [2-(meth)acryloxyethyl](tetrahydrofurfuryl) succinate, and optionally (b4) At least one selected from the group consisting of styrene, N-phenyl maleimide, (a) Base) methyl acetoacetate, (meth)propionic acid 2-bromoethyl ester, (meth)propionic acid propylene ester, benzyl (meth) acrylate, glycerol mono (meth) acrylate The copolymerization amount of the 'acid unsaturated compound in the other unsaturated compound 〇 copolymer (B 2) of the polystyrene macromonomer and the polymethyl methacrylate macromonomer is preferably from 1 to 40% by weight. 5 to 30% by weight, tetrahydrofuran-unsaturated - 24-200807151 (22) The copolymerization amount of the compound is preferably from 1 to 70% by weight, particularly preferably from 5 to 50% by weight, and other unsaturated compounds The copolymerization amount is preferably from 0 to 80% by weight, more preferably from 1 to 80% by weight, particularly preferably from 1 to 50% by weight. In the present invention, when the copolymerization amount of the unsaturated compound in the copolymer (B2) is set within the above range, a pigment dispersion and a solvent-containing one can be obtained. A radiation-sensitive composition excellent in storage stability and sensitivity, solvent resistance, and adhesion to a substrate of a liquid composition, even if the pigment content is high. The copolymer (B 3) is preferably a copolymer of the following components (hereinafter referred to as "Bill"): (bl) at least one acid unsaturated compound composed of (meth)acrylic acid, (b3) at least a tetrahydrofuran unsaturated compound selected from the group consisting of tetrahydroindenyl (meth) acrylate and [2-(methyl) propylene methoxyethyl] (tetrahydroindenyl) succinate and (b 2) at least one selected From 3-(methacryloxymethyl)oxetane, 3-(methacryloxymethyl)-3-ethyloxetane, 3-(methacryloxyl) Methyl)-2-trifluoromethyloxetane, 3-(methacryloxymethyl)-2-phenyloxetane, 2-(methacryloxyloxymethyl) Oxycyclobutane and oxetane unsaturated compounds of 2-(methacryloxymethyl)-4-trifluoromethyloxetane, and optionally (b4) At least one selected from the group consisting of styrene, N-phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth')acrylate, (A) Base) benzyl acrylate, glycerol single (A ) Acrylate, a polystyrene macromonomer and polymethyl methacrylate macromonomer other unsaturated compound of. In detail, the copolymer (III) is, for example, a copolymer of the following components (BIII-1): (bl) an acid unsaturated compound composed of (meth)acrylic acid, -25- 200807151 (23) (b3 a tetrahydrofuran unsaturated compound composed of tetrahydroindenyl (meth) acrylate, and (b2) an oxetane composed of 3-[(meth) propylene methoxymethyl] oxetane An unsaturated compound, and optionally (b4) at least one selected from the group consisting of styrene, N-phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, Other unsaturated compounds of allyl (meth) acrylate, benzyl (meth) acrylate, glycerol mono (meth) acrylate, polystyrene macromonomer and polymethyl methacrylate macromonomer; Copolymer (Bill-2): (bi) an acid unsaturated compound composed of (meth)acrylic acid, (b3) a tetrahydrofuran unsaturated compound composed of tetrahydroindenyl (meth) acrylate, and (b2) Oxetane unsaturation consisting of 3-[(methyl)acryloxymethyl]-3-ethyloxetane And, as the case may be, (b4) at least one selected from the group consisting of styrene, N-phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, Other unsaturated compounds of allyl methacrylate, benzyl (meth) acrylate, glycerol mono (meth) acrylate, polystyrene macromonomer and polymethyl methacrylate macromonomer; a copolymer (BIII-3) (hi) an acid unsaturated compound composed of (meth)acrylic acid, (b 3 ) a tetrahydrofuran unsaturated compound composed of tetrahydroindenyl (meth) acrylate, and (b2) An oxetane unsaturated compound consisting of 3-[(meth)acryloxymethyl]-2-trifluoromethyloxetane, and optionally (b4) at least one selected from Styrene, N-phenylmaleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate , glycerol mono (meth) acrylate, polystyrene macromonomer and polymethyl methacrylate giant monomer And compounds; copolymers of the following ingredients -26- 200807151 (24) (BIII-4): (bl) an acid unsaturated compound composed of (meth)acrylic acid, (b3) from tetrahydroindenyl (methyl) a tetrahydrofuran unsaturated compound composed of an acrylate, and (b2) an oxetane unsaturated compound composed of 3-[(meth)acryloxymethyl]-2-phenyloxetane, and _ (b4) at least one selected from the group consisting of styrene, N-phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, (methyl) Alkenyl acrylate, benzyl (meth) acrylate, glycerol mono (meth) acrylate, polystyrene macromonomer and other unsaturated compounds of polymethyl methacrylate macromonomer; (BIII-5): (bl) an acid unsaturated compound composed of (meth)acrylic acid, (b3) a tetrahydrofuran unsaturated compound composed of tetrahydrofurfuryl (meth)acrylate, and (b 2) from 2 An oxetane unsaturated compound composed of [(methyl)acryloxymethyl]oxetane, and optionally (b4) at least one selected from the group consisting of styrene, N-phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, Benzyl (meth) acrylate, glycerol mono (meth) acrylate, polystyrene macromonomer and other unsaturated compounds of polymethyl methacrylate macromonomer; or the following winter copolymer (BIII-6) ): (bl) an acid-unsaturated compound composed of (meth)acrylic acid, (b3) a tetrahydrofuran unsaturated compound composed of tetrahydroindenyl (meth) acrylate, and (b2) from 2-[(A) An oxetane unsaturated compound composed of a propylene methoxymethyl]-4-trifluoromethyloxetane, and optionally (b4) at least one selected from the group consisting of styrene and N- Phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, glycerol mono Acrylate, polystyrene macromonomer and polymethyl-27 - 200807151 (25) Other unsaturation of methyl acrylate macromonomer Thereof. In the copolymers (Bill), the copolymerization amount of the 'acid-unsaturated compound in the copolymer (BIII-1) and (BIII-2)-based copolymer (ΒΙΠ) is preferably from 1 to 40% by weight. The copolymerization amount of the tetrahydrofuran unsaturated compound is preferably from 1 to 70% by weight, particularly preferably from 1 to 40% by weight, and the copolymerization amount of the oxetane unsaturated compound is preferably from 5 to 30% by weight. It is 1 to 6% by weight, particularly preferably 1 to 40% by weight, and the copolymerization amount of the other unsaturated compound is preferably from 〇 to 70% by weight, more preferably from 1 to 6% by weight. In the present invention, when the copolymerization amount of the unsaturated compound in the copolymer (Bill) is set within the above range, radiation for forming a coloring layer excellent in sensitivity, solvent resistance, and adhesion to a substrate can be obtained. Sensitive Composition In the present invention, other alkali-soluble resins may be used in combination with the copolymers (B1), (B2) and (B3). The above other alkali-soluble resin is not particularly limited as long as it has a solubility as a binder of the colorant (A) and in an alkali developer used in a developing step for forming a coloring layer. For example, it is preferably an alkali-soluble resin having a carboxyl group (hereinafter referred to as "other carboxyl group-containing alkali-soluble resin"). 'Examples of other carboxyl group-containing alkali-soluble resins are at least one of the carboxyl group-containing unsaturated compounds exemplified in the copolymers (BI), (B 2) and (B3) and at least one of the copolymers (B1), (B 2 ) And copolymers of other unsaturated compounds listed in (B3). Preferred examples of other carboxyl group-containing alkali-soluble resins are the following components: -28 - 200807151 (26) Copolymer: (i) a carboxyl group-containing unsaturated compound composed of (meth)acrylic acid and (ii) at least one selected from the group consisting of benzene Ethylene, N-phenyl maleimide, methyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, Glycerol mono (meth) acrylate, polystyrene macromonomer and polymethyl methacrylate macromonomer. In the present invention, the copolymers (Bl), (B2) and (B3) and other alkali-soluble resins are measured by gel permeation chromatography (GPC, solvent: tetrahydrofuran) in terms of weight average molecular weight (hereinafter referred to as "Mw" is preferably from 3,000 to 300,000, more preferably from 5,000 to 100, 〇〇〇. The number average molecular weight (hereinafter referred to as "Μη") of the copolymers (Bl), (B2) and (B3) and other alkali-soluble resins measured by gel permeation chromatography (GPC, solvent: tetrahydrofuran) in terms of polystyrene Preferably, each system is from 3, 〇〇〇 to 60,000, more preferably 5,000 to 25,000. In the present invention, by using the above-mentioned copolymer (Β1) having a specific Mw and Μη and a copolymer (Β2) or the aforementioned copolymer (Β 3) having a specific Mw and Μη, and optionally using a specific Mw and Μη The combination of the other alkali-soluble resins described above produces a radiation-sensitive composition having excellent color rendering properties. Therefore, a pixel having a sharp pattern edge and a black matrix can be formed, and it is difficult to cause residue, contamination or film residue on the substrate or the light-shielding layer of the unexposed portion during development. The Mw/Mn ratio of the copolymers (B1), (Β2) and (Β3) and other alkali-soluble resins is preferably from 1 to 5, more preferably from 1 to 4. In the present invention, the copolymers (B1), (B2) and (B3) and other alkali-soluble resins may be used singly or in combination of two or more. -29- 200807151 (27) In the present invention, the total amount of the alkali-soluble resin is preferably 10 to 1,000 parts by weight, more preferably 20 to 500 parts by weight, based on 100 parts by weight of the coloring agent (A). . When the total amount of the alkali-soluble resin is less than 10 parts by weight, alkali developability may be lowered, or contamination or film residue may be generated on the substrate or the light-shielding layer of the unexposed portion. When the total amount is higher than parts by weight, the concentration of the colorant becomes relatively low, and it may be difficult to achieve the target color density of the film. The amount of the copolymer (31) and (B2) or the amount of the copolymer (B3) in the alkali-soluble resin is preferably from 5 to 100% by weight, more preferably from 10 to 100% by weight, particularly preferably from 30 to 1 0 0% by weight. When the total amount is less than 5% by weight, the object of the present invention may be impaired. The amount of the copolymer (B1) is preferably from 1 to 90% by weight, particularly preferably from 5 to 80% by weight, based on the total of the copolymers (B1) and (B2). When the amount of the copolymer (B1) is less than 1% by weight, the solvent resistance may be lowered, and when the amount is more than 90% by weight, the storage stability may be lowered. - (C) Polyfunctional Monomer - The polyfunctional single system of the present invention is a monomer having two or more polymerizable unsaturated bonds. 'Examples of the polyfunctional monomer include alkanediols such as di(meth)acrylates of ethylene glycol and propylene glycol; polyalkylene glycols such as di(meth)acrylic acid of polyethylene glycol and polypropylene glycol An ester; a poly(meth)acrylate having a polyhydric alcohol having 3 or more hydroxyl groups and a dicarboxylic acid-modified product thereof such as glycerin, trimethylolpropane, isovaerythritol, and diisopentaerythritol; Oligo(methyl) -30- 200807151 (28) Acrylates, such as polyesters, epoxies, urethane resins, alkyds, polyoxyxides, and spiro resins; have hydroxyl groups at both ends The polymer is, for example, poly-1,3-butadiene having a hydroxyl group at both terminals, polyisoprene having a hydroxyl group at both terminals, and di(methyl) having a polycaprolactone having a hydroxyl group at both terminals. Acrylate; and tris[2-(methyl)propenyloxyethyl]phosphate. Among these polyfunctional monomers, polyhydric alcohols having 3 or more hydroxyl groups and poly(meth)acrylates thereof modified by dicarboxylic acid are preferred, and examples thereof include trimethylolpropane triacrylate. Trimethylolpropane trimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, diisoamyl Tetraol pentaacrylate, diisopentyl alcohol pentamethacrylate, diisopentyl alcohol hexaacrylate, diisopentyl alcohol hexamethacrylate, and represented by the following formulas (3) and (4) Compound. Ch2〇coch=ch2 CHf=CHCOOCH—C—CH2〇COCH2CH2COOH (3) ch2ococh—ch2 ch3 CH3 CH2=CCOOCH2—c—CH2〇COCH2CH2COOH (4) ch2oc〇c=ch2 ch3 Among these compounds, trimethylolpropane Triacrylate, pentaerythritol triacrylate and diisopentaerythritol hexaacrylate are particularly preferred because they provide a substrate having excellent strength and surface smoothness and very little less than unexposed portions or covering -31 - 200807151 ( 29) A colored layer of stained or film residue on the light layer. The above polyfunctional monomer may be used singly or in combination of two or more. The amount of the polyfunctional monomer of the present invention is preferably from 5 to 500 parts by weight based on 100 parts by weight of the alkali-soluble resin. The best is 20 to 300. Parts by weight. When the amount of the polyfunctional monomer is less than 5 parts by weight, the strength and surface smoothness of the colored layer may be lowered, and when the amount is more than 500 parts by weight, the alkali developability may be lowered, or may not be exposed. Part of the substrate or light-shielding layer may cause contamination or film residue. In the present invention, the polyfunctional monomer may be used in combination with a monofunctional monomer having a polymerizable unsaturated bond. Examples of the aforementioned monofunctional monomer include the aforementioned compounds listed in the acid unsaturated compound, N-substituted maleimide or other unsaturated compound in the aforementioned alkali-soluble resin (B), N-( Methyl)propenylmorpholine, N-vinylpyrrolidone, N-vinyl-s-caprolactam and commercially available M-5600 (Toagosei Chemical Industry Co., Ltd. Trademark). These monofunctional monomers may be used singly or in combination of two or more. The amount of the monofunctional monomer is preferably 90% by weight based on the total of the polyfunctional monomer and the monofunctional monomer*. Or lower, more preferably 50% by weight or less. When the amount of the monofunctional monomer is more than 90% by weight, the strength and surface smoothness of the resulting coloring layer may become unsatisfactory. The total amount of the polyfunctional monomer and the monofunctional monomer in the present invention is preferably from 5 to 500 parts by weight based on 100 parts by weight of the alkali-soluble resin, -32-200807151 (30) More preferably 20 Up to 300 parts by weight. When the total amount is less than 5 parts by weight, the strength and surface smoothness may be lowered, and when the total amount is high: the amount of parts may be lowered, the alkali developability may be lowered, or the unexposed portion may be contaminated or left on the optical layer. Things. - (D) Photopolymerization Initiator - The photopolymerization initiator of the present invention is capable of initiating the aforementioned polyfunctional monomer (C) during exposure radiation (such as radiation, ultraviolet radiation, far ultraviolet radiation, electron irradiation or formation) And a compound which polymerizes the active material as the case may be. The photopolymerization initiator is, for example, an acetal benzene compound, a conjugate, a triterpene compound, a benzoin compound, a benzophenone ketone compound, a polycyclic guanidine. a compound, a xanthone compound, a diazo, a ruthenium-indenyl ruthenium compound, an onium salt compound or a guanidinium sulfonate. These compounds form active radicals and are active upon exposure. In the present invention, the aforementioned light The polymerization initiators may be used singly or in combination. It is preferred to use at least one bright-light polymerization initiator selected from the group consisting of an ethyl phthalimidazole compound, a triterpenoid compound and a 0-fluorenyl hydrazine compound. The amount of the photopolymerization initiator is preferably 100% by weight of the functional monomer (C) or the polyfunctional monomer and the monofunctional monomer. 01 to 120 parts by weight, more preferably 1 to 100. When the amount of the photopolymerization initiator is less than 0. a monofunctional imidazole compound, a-di-based compound radically acid or two or more compounds, when used in the present invention, in the case of 01 parts by weight, cold-cooled substrate or radiation. The total number of parts by weight may be difficult to obtain a color filter having a predetermined color pattern due to incomplete curing by exposure, and when the amount is higher than At 20 parts by weight, the formed coloring layer may be detached from the substrate during development. Examples of the ethoxybenzene compound in the preferred photopolymerization initiator of the present invention include 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2-methyl-bu [4-(A) , thio)phenyl]-2-morpholinylpropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2,2-dimethoxy-1,2-diphenylethane ketone and 1,2-octanedione. Among these ethoxylated benzene compounds, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one, 2-benzyl-2-dimethylamine The base-1-(4-morpholinylphenyl)butan-1-one and 1,2-octanedione are preferred. When the aforementioned ethoxybenzene compound can be used singly or in combination of two or more, when an ethoxylated benzene compound is used as the photopolymerization initiator of the present invention, the amount of the ethoxybenzene compound is 10 parts by weight. The total amount of the functional monomer (C) or the polyfunctional monomer and the monofunctional monomer is preferably 〇. 〇1 to 80 parts by weight, more preferably 1 to 60 parts by weight, particularly preferably 1 to 30 parts by weight. When the amount of the ethoxybenzene compound is less than 0. 01 parts by weight may be difficult to obtain a color filter having a predetermined color layer pattern because the curing by exposure is incomplete. When the amount is more than 80 parts by weight, the formed coloring layer may be detached from the substrate during development. Examples of the aforementioned biimidazole compound include 2,2'-bis(2-chlorophenyl)-4,4f,5,5.-tetrakis(4-ethoxycarbonylphenylbiimidazole, 2,2, bis ( 2-bromophenyl)-4,4',5,5,-tetrakis(4-ethoxycarbonylphenyl)-1,2,-biimidazole, 2,2,- -34- 200807151 (32) double (2-Chlorophenyl)-4,4',5,5,-tetraphenyl-1,2,-biimidazole, 2,2,-bis(2,4-dichlorophenyl)-4,4 ',5,5'-Tetraphenyl-1,2'-biimidazole, 2,2,-bis(2,4,6-trichlorophenyl)-4,4',5,5'-tetraphenyl Base-1, 2, biimidazole, 2,2,-bis(2-bromophenyl)-4,4',5,5'-tetraphenyl-1,2|biimidazole, 2,2'-double (2,4-dibromophenyl)-4,4',5,5, tetraphenylbiimidazole and 2,2·-bis(2,4,6-tribromophenyl)-, 4,4\ 5,5'-tetraphenyl 1,2'-biimidazole. Among these biimidazole compounds, 2,2'-bis(2-chlorophenyl)-4,4,5,5,-tetraphenyl -1,2·biimidazole, 2,2'-bis(2,4-dichlorophenyl)-4,4,5,5,-tetraphenyl-1,2'biimidazole and 2,2' -Bis(2,4,6-trichlorophenyl)-4,4,5,5,-tetraphenyl-1, 2 bisimidazole is preferred, and 2,2, bis (2,4-di chlorobenzene Base)-4,4',5,5丨-tetraphenyl-1,2'biimidazole. These biimidazole compounds have excellent solubility in solvents, and do not form foreign substances, such as undissolved products and The precipitate is highly sensitive, and the curing reaction is sufficiently promoted by low-energy exposure, and does not cause a curing reaction in the unexposed portion. Therefore, the coating film obtained after the exposure is clearly distinguished as being insoluble in the cured portion of the developer and The uncured portion having high solubility in the developer can form a color filter having a predetermined coloring layer pattern having high sharpness without side etching. The aforementioned biimidazole compounds can be used singly or in combination of two or more. When a biimidazole compound is used as the photopolymerization initiator of the present invention, the amount of the tabuylimidazole compound is 100 parts by weight of the total amount of the polyfunctional monomer (C) or the polyfunctional monomer and the monofunctional monomer. The preferred value is 0. 01 g 4 重量 parts by weight, more preferably 1 to 30 parts by weight, particularly preferably 1 to 2 parts by weight -35- 200807151 (33). When the amount of the biimidazole compound is less than 0.1 part by weight, it may be difficult to obtain a color filter having a predetermined coloring layer pattern because curing by exposure is incomplete. When the amount is more than 40 parts by weight, the formed coloring layer may be peeled off from the substrate, and the film surface of the colored layer may become rough during the development. When a biimidazole compound is used as the photopolymerization initiator of the present invention, it is preferably used in combination with the following hydrogen donor to further improve the sensitivity. The term "hydrogen donor" as used in the present invention means a compound which can provide a radical in which a hydrogen atom is supplied from the biimidazole compound upon exposure. The hydrogen donor of the present invention is preferably a thiol compound or an amine compound as defined hereinafter. The above thiol compound is a compound having a benzene ring or a hetero ring as a mother nucleus and one or more, preferably 1 to 3, more preferably 1 or 2 thiol groups directly bonded to a mother nucleus (hereinafter referred to as It is a "thiol hydrogen donor"). The amine compound is a compound having a benzene ring or a hetero ring as a mother nucleus and one or more, preferably 1 to 3, more preferably 1 or 2 amine groups directly bonded to the mother nucleus (hereinafter referred to as " Amine hydrogen donor"). These hydrogen donors may have both a thiol group and an amine group. These hydrogen donors are described in detail below. The thiol gas donor can have at least one benzene or heterocyclic ring or both. When it has two or more of these rings, a fused ring can be formed. When the thiol hydrogen donor has two or more thiol groups, at least one of the other thio groups may be substituted with an alkyl group, an aralkyl group or an aryl group as long as at least one free thiol group is retained. Further, as long as at least one free hydrogen-36-200807151 (34) thio group is retained, the thiol hydrogen donor may have a structural unit in which two sulfur atoms are bonded via a divalent organic group such as an alkylene group or The disulfide atom is a structural unit bonded in the form of a disulfide. Further, the thiol hydrogen donor may be substituted at a position other than the thiol group (etc.) by a carboxyl group, an alkoxycarbonyl group, a substituted alkoxycarbonyl group, a phenoxycarbonyl group, a substituted benzene group. Oxycarbonyl or nitrile group. Examples of such thiol hydrogen donors include 2-hydrothiobenzothiazole, 2-hydrothiobenzoxazole, 2-hydrothiobenzimidazole, 2,5-dihydrothio-1, 3,4-thiadiazole and 2-hydrothio-2,5-dimethylaminopyridine. Among these thiol hydrogen donors, 2-hydrothiobenzothiazole and 2-hydrothiobenzoxazole are preferred, and 2-hydrothiobenzothiazole is particularly preferred. The amine hydrogen donor can have at least one benzene or heterocyclic ring or both. A fused ring can be formed when it has one or more of these rings. At least one amine group of the amine hydrogen donor may be substituted with an alkyl group or a substituted alkyl group. The amine hydrogen donor may be substituted with a τ group at a position other than the amine group (etc.), a carboxyl group, an alkoxycarbonyl group, a substituted alkoxycarbonyl group, a phenoxy group, a substituted phenoxycarbonyl group. Or nitrile group. Examples of the aforementioned amine hydrogen donor include 4,4,-bis(dimethylamino)benzophenone, 4,4,-bis(diethylamino)benzophenone, 4-diethyl Aminoethyl benzene benzene, 4-dimethylamino propyl phenyl benzene, ethyl 4 dimethyl benzyl benzoate ' 4-dimethylamino benzoic acid and 4 dimethyl amine Benzyzonitrile. Among these amine hydrogen donors, 4,4,-bis(dimethylamino)benzophenone and 4,4'-bis(diethylamino)benzophenone are preferred, and 4, 4 ,-bis(diethylamino)benzophenone is particularly preferred. -37- 200807151 (35) The amine hydrogen supply system is used as a sensitizer even when a photopolymerization initiator other than the biimidazole compound is used. In the present invention, the aforementioned hydrogen donors may be used singly or in combination of two or more. It is preferred to use at least one thiol hydrogen donor and at least one amine hydrogen donor composition because the colored layer formed is hardly self-developing during development.  The substrate is detached and has high strength and sensitivity. Preferred examples of the composition of the thiol hydrogen donor and the amine hydrogen donor include a composition of 2-hydrothiobenzothiazole and 4,4 bis(dimethylamino)benzophenone, Composition of 2-hydrothiobenzothiazole and 4,4'-bis(diethylamino)benzophenone, 2-hydrothiobenzoxazole and 4,4'-bis(dimethyl A composition of an amino)benzophenone and a composition of 2-hydrothiobenzoxazole and 4,4'-bis(diethylamino)benzophenone. Compositions of 2-hydrothiobenzothiazole and 4,4'-bis(diethylamino)benzophenone and 2-hydrothiobenzoxazole and 4,4' in such compositions a compound of bis(diethylamino)benzophenone is preferred, and a combination of 2-hydrothiobenzothiazole and 4,4'-bis(diethylamino)benzophenone is particularly preferred. . In the composition of the thiol hydrogen donor and the amine hydrogen donor, the weight of the thiol hydrogen donor relative to the amine hydrogen donor is preferably from 1:1 to 1:4' more preferably from 1:1 to 1: 3. When the hydrogen donor is used in combination with the biimidazole compound of the present invention, the amount of the hydrogen donor is 1 part by weight of the polyfunctional monomer (C) or the polyfunctional monomer and the monofunctional monomer. The total amount is preferably from 1 to 40 parts by weight, more preferably from 1 to 30 parts by weight, particularly preferably from 1 to 20 parts by weight. When the amount of hydrogen donor is lower than 〇.  〇 1 part by weight, the effect of improving sensitivity -38- 200807151 (36) may be reduced. When the amount is more than 40 parts by weight, the formed coloring layer may be detached from the substrate during development. Examples of the aforementioned three-till compound include a three-till compound having a halomethyl group such as 2,4,6-tris(trichloromethyl)-s-tritium, 2-methyl-4,6-bis(trichloro) Methyl)-s-three tillage, 2-[2-(5-methylfuran-2-yl)vinyl]-4,6-bis(trichloromethyl)-s-triterpene, 2-[2 -(furan-2-yl)vinyl]-4,6-bis(trichloromethyl)-s triterpene, 2-[2-(4-diethylamino-2-methylphenyl)ethene 4-[6,6-bis(trichloromethyl)-s-triterpene, 2-[2-(3,4-dimethoxyphenyl)vinyl]_ 4. 6-bis(trichloromethyl)-s-triterpene, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-three tillage, 2-(4-B Oxystyryl)-4,6-bis(trichloromethyl)-s-three tillage and 2-(4-n-butoxyphenyl)-4,6-bis(trichloromethyl)-s _ Three tillage. Among these three tillage compounds, 2-[2-(3,4-dimethoxyphenyl)vinyl]_ 4. 6-Bis(trichloromethyl)-s-triterpene is preferred. The aforementioned triterpenoid compounds may be used singly or in combination of two or more. When the triterpene compound is used as the photopolymerization initiator of the present invention, the amount of the triterpenoid compound is 1 part by weight of the polyfunctional monomer (c) or the polyfunctional monomer and the monofunctional monomer. The total amount is preferably from 1 to 40 parts by weight, more preferably from 1 to 30 parts by weight, particularly preferably from 1 to 20 parts by weight. When the amount of the diterpene compound is less than 0. At 0 parts by weight, it is possible to obtain a color filter having a predetermined color layer pattern because the curing by exposure is incomplete. When the amount is more than 40 parts by weight, the formed coloring layer may be detached from the substrate during development. Examples of the aforementioned 0-fluorenyl hydrazine compound include i 4 -(phenylthio)phenyl]-heptane-1,2-dione 2-(〇-benzyl hydrazine), 1-[4-(benzene Phenylthio)phenyl-39 - 200807151 (37) octane-1,2-dione 2-(0-benzylindole), 1-[4-(benzylidene)phenyl]-octane- 1,2-dione 2-(0-benzylindole), 1-[9-ethyl-6-(2-methylbenzylindenyl)-9H-indazol-3-yl]ethanone 1-( 0-acetamidine), 1-[9-ethyl-6-(3-methylanthracene)-9H- miso-3-yl]acetamido 1-(0-acetamidine) and 1 -[9-ethyl-6-cathenyl- 9H-miso-3-yl]-ethanone 1-(0-ethyl-branched bow) 〇-such 〇-mercaptopurine compound, 1-[ 4-(phenylthio)phenyl]-octane-1,2-dione 2-(0-benzylhydrazine) and 1-[9-ethyl-6-(2-methylbenzylidene) -9H-carbazol-3-yl]ethanone 1-(0-acetamidine) is particularly preferred. The aforementioned fluorenyl-indenyl hydrazine compounds may be used singly or in combination of two or more. When a ruthenium-indenyl ruthenium compound is used as the photopolymerization initiator of the present invention, the ruthenium-indenyl ruthenium compound is used in an amount of 100 parts by weight of the polyfunctional monomer (C) or a polyfunctional monomer and monofunctionality. The total amount of the monomers is preferably 0. 0 to 40 parts by weight, more preferably 1 to 30 parts by weight, particularly preferably 1 to 20 parts by weight. When the amount of the 0-acetamidine compound is less than 0. In the case of 01 parts by weight, it may be difficult to obtain a color filter having a predetermined color layer pattern because the curing by exposure is incomplete. When the amount is more than 40 parts by weight, the formed coloring layer may be detached from the substrate during development. The above key salt compound is, for example, a diaryliodonium salt, a triarylsulfonium salt or a diarylphosphonium salt. -40- 200807151 (38) Examples of the aforementioned diaryl iodine salt include diphenyl tetrafluoroborate, diphenyl iodine hexafluorophosphate, diphenyl iodine hexafluoroarsenate, diphenyl trifluorophosphate Iodine, diphenylpyridinium trifluoroacetate, p-toluenesulfonate iodine, 4-methoxyphenylphenyl iodine tetrafluoroborate, oxyphenylphenyl iodine hexafluorophosphate, hexafluorophosphate 4-methoxyphenylphenyl iodide fluorosulfonic acid 4-methoxyphenyl phenyl iodide, 4-methoxyphenyl iodine trifluoroacetate, 4-methyl p-toluenesulfonic acid Oxyphenyl phenyl iodine, bis(4-tert-butylphenyl) iodine tetracarboxylate, bis(4-tert-butyl) iodine hexafluoroarsenate, bis(trifluoromethanesulfonate) Third butyl phenyl) iodine, trifluoro(4-tert-butylphenyl) iodine and p-toluenesulfonic acid bis(4-tert-butylphenyl) iodine. Examples of the aforementioned triarylsulfide salt include triphenyl tetrafluoroborate, triphenylsulfur hexafluorophosphate, triphenylsulfonium hexafluoroarsenate, triphenylsulfate trifluorosulfate, triphenyl trifluoroacetate. Base sulfonate, p-toluenesulfonate sulfonate, 4-methoxyphenyl diphenyl sulfonate tetrafluoroborate, hexafluorophosphoryl phenyl diphenyl sulfide, hexafluoroarsenate 4-methyl Oxyphenyl phenyl diphenyl hydrazine, 4-methoxyphenyl diphenyl sulfonyl trifluoromethanesulfonate, fluorophenyl diphenyl sulfonyl trifluoroacetate, 4-methoxy benzene p-toluenesulfonic acid Dithiocarbamate, 4-phenylthiophenyldiphenylsulfonate tetrafluoroborate, hexafluorophosphorylphenylthiophenyldiphenylsulfate, 4-phenylthiophenyl hexafluoroarsenate Pyrite, 4-phenylthiophenyldiphenylsulfate trifluoromethanesulfonate, 4-phenylthiophenyldiphenylsulfonate of benzenesulfonic acid and 4-thiobenzene of p-toluenesulfonic acid Base diphenyl sulfide. Examples of the aforementioned diarylphosphonium salt include hexafluorophosphonic acid (1-6-η- occupational iron methanesulfonate 4-methyl, triphenylfluoroboronic acid dithio-iron methanesulfonate 4-ylsulfuric acid) 4-tolyl 4-diphenyl-tolylcumene-41 - 200807151 (39) ) (7?-cyclopentadienyl) iron. Among these gun salt compounds, diphenyl iodine hexafluorophosphonate and triphenyl sulfonate trifluoromethanesulfonate are particularly preferred. The aforementioned key salt compounds may be used singly or in combination of two or more. 'When a key salt compound is used as the photopolymerization initiator of the present invention, the amount of the key salt compound is 100 parts by weight of the total amount of the polyfunctional monomer (C) or the polyfunctional monomer and the monofunctional monomer. The preferred value is 0. 01 to 40 parts by weight, more preferably 1 to 30 parts by weight, particularly preferably 1 to 20 parts by weight. When the amount of the key salt compound is less than 0.1 part by weight, it may be difficult to obtain a color filter having a predetermined color pattern because the curing by exposure is incomplete. When the amount is more than 40 parts by weight, the formed coloring layer may be detached from the substrate during development. Additives - The radiation-sensitive composition used to form the colored layer of the present invention may optionally contain various additives. The aforementioned additives include organic acids, organic amine based compounds (excluding the aforementioned hydrogen donor), curing agents, and curing assistants. The above organic acid and organic amine based compound are used to further improve the solubility of the radiation-sensitive composition in an alkali developer and further suppress the generation of insoluble products remaining after development. The above organic acid is preferably an aliphatic carboxylic acid having at least one carboxyl group in the molecule or a carboxylic acid having a phenyl group. Examples of the aforementioned aliphatic carboxylic acid include monocarboxylic acids such as formic acid 'acetic acid-42-200807151 (40), propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethylacetic acid, and caprylic acid; Acids such as oxalic acid, malonic acid, succinic acid, glutaric acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, Brazilian methylmalonic acid, ethylmalonic acid, dimethyl propyl Diacid, methyl succinyl succinic acid, cyclohexane dicarboxylic acid, isaconic acid, citraconic acid, diacid, fumaric acid and mesaconic acid; and tricarboxylic acids such as propylene aconitate and Camphorone acid. The phenyl group-containing carboxylic acid is, for example, a compound having a bond directly bonded to a phenyl group or a carboxylic acid having a bond to a phenyl group via a carbon chain. Examples of the phenyl group-containing carboxylic acid include aromatic monocarboxylic acids, acids, toluic acid, lauric acid, benzotricarboxylic acid, and dimethylbenzoic acid; carboxylic acids such as phthalic acid, isophthalic acid And terephthalic acid; or a plurality of aromatic polycarboxylic acids of a carboxyl group, such as trimellitic acid, trimellitic acid, and pyromellitic acid; and phenylacetic acid, hydrogenated atropic acid, cinnamic acid, mandelic acid , phenyl succinic acid, atopic acid, cinnamic acid, meat, coumaric acid and chelating acid. Among these organic acids, an aliphatic dicarboxylic acid is preferred, and malonic acid is used in view of solubility of the alkali in the solvent described below, and prevention of contamination on the base layer of the unexposed portion and film residue. , Ikonic acid, citraconic acid, fumaric acid and mesaconic acid are particularly good residual acids. The aromatic dicarboxylic acid is preferred, and the phthalic acid is a particularly preferred carboxylic acid. The organic acid may be used alone or in combination of two or more kinds to the total solid content of the radiation-sensitive composition, heptanoic acid, carboxylic acid, peric acid, maleic acid, carboxylic acid such as Preferably, the benzoic aromatic compound has 3 formic acid, hydrogenated cinnamic acidity, or an aliphatic phenyl group of a material or adipic acid. -43-200807151 (41) is 15% by weight or less, more preferably 1 〇% by weight or less. When the amount of the organic acid is more than 15% by weight, the adhesion of the formed coloring layer to the substrate may be lowered. The aforementioned organic amine-based compound is preferably an aliphatic amine having at least one amine group or a phenyl group-containing amine in the molecule. • Examples of the aforementioned aliphatic amines include mono(cyclo)alkylamines such as n-propylamine, isopropylamine, n-butylamine, isobutylamine, second butylamine, tert-butylamine, N-pentylamine, n-hexylamine, n-heptylamine, n-octylamine, n-decylamine, n-decylamine, n-undecylamine, n-dodecylamine, cyclohexylamine, 2-methyl Cyclohexylamine, 3-methylcyclohexylamine, 4-methylcyclohexylamine, 2-ethylcyclohexylamine, 3-ethylcyclohexylamine, and 4-ethylcyclohexylamine; di(cyclo)alkane Amines such as methyl ethylamine, diethylamine, methyl-n-propylamine, ethyl-n-propylamine, di-n-propylamine, di-isopropylamine, di-n-butyl Amine, di-isobutylamine, di-secondbutylamine, di-tert-butylamine, di-n-pentylamine, d-n-hexylamine, methylcyclohexylamine, ethylcyclohexylamine And dicyclohexylamine; tri(cyclo)alkylamines such as dimethyl-ethylamine, methyl•diethylamine, triethylamine, dimethyl-n-propylamine, diethyl·positive Propylamine, methyl•di-n-propylamine, ethyl•di-n-propylamine, tri-n-propyl Amine, tri-isopropylamine, tri-n-butylamine, tri-isobutylamine, tri-'t-butylamine, tri-t-butylamine, tri-n-pentylamine, tri- n-Hexylamine, dimethylcyclohexylamine, diethylcyclohexylamine, methyldicyclohexylamine, ethyldicyclohexylamine, and tricyclohexylamine; mono(cyclo)alkanolamines, such as 2-amino groups Ethanol, 3-amino-1-propanol, 1-amino-2-propanol, 4-amino-1-butanol, 5-aminopentanol, 6-amino hexanol and 4- Amino-cyclohexanol; di(cyclo)-44-200807151 (42) alkanolamines, such as diethanolamine, di-n-propanolamine, di-isopropanolamine, di-n-butanolamine, di-iso Butanolamine, di-n-pentanolamine, di-n-hexanolamine and bis(4-cyclohexanol)amine; tri(cyclo)alkanolamines such as triethanolamine, tri-n-propanolamine, tri-isopropyl Alcoholamine, tri-n-butanolamine, tri-isobutanolamine, tri-n-pentanolamine, tri-n-hexanolamine and tris(4-cyclohexanol)amine; amine (cyclo)alkanediol', Such as 3-amino-1,2-propanediol, 2-amino-1,3-propanediol, 4-amino-1,2-butanediol, 4-amino-1,3- Butanediol , 4-amino-1,2-cyclohexanediol, 4-amino-1,3-cyclohexanediol, 3-dimethylamino-1,2-propanediol, 3-di Ethylamino-1,2-propanediol, 2-dimethylamino-1,3-propanediol and 2-diethylamino-1,3-propanediol; amine-containing Cycloalkane methanol, such as amine cyclopentane methanol, amine cyclopentane methanol, 1-aminocyclohexane methanol, 4-aminocyclohexane methanol, 4-dimethylaminocyclopentane methanol, 4 - diethylaminocyclopentane methanol, 4-dimethylaminocyclohexane methanol and 4-diethylaminocyclohexane methanol; and an aminocarboxylic acid such as (/3-alanine, 2 - aminobutyric acid, 3-aminobutyric acid, 4-aminobutyric acid, 2-aminoisobutyric acid, 3-aminoisobutyric acid, 2-aminopentanoic acid, 5-aminovaleric acid, 6-Aminocaproic acid, 1-aminocyclopropanecarboxylic acid, 1-aminocyclohexanecarboxylic acid and 4-aminocyclohexanecarboxylic acid. The phenyl group-containing amine is, for example, a compound having an amine group directly bonded to a phenyl group or a compound having an amine group bonded to a phenyl group via a carbon chain. Examples of the phenyl group-containing amine include aromatic amines such as aniline, 2-methylaniline, 3-methylaniline, 4-methylaniline, 4-ethylaniline, 4-n-propylaniline, 4- Isopropylaniline, 4-n-butylaniline, 4-tert-butylaniline, 1-naphthylamine, 2-naphthylamine, N,N-dimethylaniline, N,N-diethylbenzene- 45- 200807151 (43) Amines and 4-methyl-N,N-dimethylaniline; Aminobenzyl alcohols such as 2-aminobenzyl alcohol, 3-aminobenzyl alcohol, 4-aminobenzyl Alcohol, 4-dimethylaminobenzyl alcohol and 4-diethylaminobenzyl alcohol; and aminophenols such as 2-aminophenol, 3-aminophenol, 4-aminophenol, 4 -Dimethylaminophenol and 4-diethylaminophenol phenolphthalein. Among these organic amine based compounds, mono(cyclo)alkanolamines and amino(cyclo)alkanediols are preferred, as described below. From the viewpoints of solubility in a solvent and prevention of contamination or film residue on a substrate or a light-shielding layer of an unexposed portion, 2-aminoethanol, 3-aminopropylpropanol, 5-aminopentanol, 3-amino-1,2-propanediol, 2-amino-1,3-propanediol and 4-amino-1,2-butanediol are particularly preferred aliphatic amine. Aminophenol is preferred, and 2-aminophenol, 3-aminophenol and 4-aminophenol are particularly preferred phenylamine-containing amines. The aforementioned organic amine-based compounds may be used singly or in combination of two or more. The amount of the organic amine-based compound is preferably 15% by weight or less, more preferably 10% by weight or less based on the total solid content of the radiation-sensitive composition. When the amount of the organic amine-based compound is more than 15% by weight, the adhesion of the formed coloring layer to the substrate may be lowered. The curing agent is a group which reacts with a carboxyl group contained in the copolymers (B1) and (B3) and a carboxyl group contained in the '' or oxetane ring or copolymer (B2) to cure the copolymers. Share. The curing agent is, for example, an epoxy compound or an oxetane compound. The foregoing epoxy compound is preferably a polyfunctional epoxy compound, an example of which is an aromatic epoxy resin such as bisphenol A epoxy resin, hydrogenated bisphenol A ring-46 - 200807151 (44) oxyresin, bisphenol F ring Oxygen resin, hydrogenated bisphenol F epoxy resin and novolac epoxy resin; alicyclic epoxy resin, heterocyclic epoxy resin and other epoxy resins, such as glycidyl ester-based resin, shrinking Glycerylamine is a base resin and an epoxidized oil; and a brominated derivative of such an epoxy resin, an epoxylated product of a butadiene (co)polymer, and isoprene.  The epoxidation product of the meta-diene (co)polymer, the (co)polymer of the glycidyl group-containing unsaturated compound, and the triglycidyl isocyanurate. The epoxy group-containing unsaturated compound is also preferably the aforementioned epoxy compound, and examples thereof include glycidyl (meth)acrylate, 3,4-epoxybutyl (meth)acrylate, and (meth)acrylic acid 6. 7-epoxyheptyl ester, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether and p-vinylbenzyl glycidyl ether. The oxetane compound is preferably a polyfunctional oxetane compound, examples of which are low molecular weight compounds such as dioxetane carbonate, dioxetane adipate, p-benzene. Dioxetane dicarboxylate, dioxetane p-benzodimethyl dicarboxylate and dioxetane 1,4-cyclohexanedicarboxylate and polymer compounds such as phenol novolac A (co)polymer of an oxetane ether of a varnish resin and an unsaturated compound having an oxetane backbone (excluding copolymers (B1) and (B3)). A compound having both an oxetane ring structure and an unsaturated double bond is also a preferred oxetane compound, and examples thereof include the aforementioned oxetane unsaturated compound. These curing agents may be used singly or in combination of two or more. The amount of the curing agent is preferably 30% by weight or less, more preferably 20% by weight or less, based on the total solid content of the radiation-sensitive composition. When the amount of the curing agent is more than 30% by weight, the storage stability of the resulting radiation-sensitive composition may be lowered. The curing assistant is subjected to a ring-opening reaction of an epoxy group and/or an oxetane ring of a curing agent to enhance a curing reaction component of the curing agent. The curing assistant is, for example, a polycarboxylic acid, a polycarboxylic acid anhydride, an amine compound or a thermal acid generator. Examples of the above polycarboxylic acid include the aforementioned compounds having two or more carboxyl groups in the above organic acid. Examples of the amine-based compound include the aforementioned organic amine-based compound. Examples of the above polycarboxylic acid anhydride include aromatic polycarboxylic acid anhydrides such as phthalic anhydride, pyromellitic anhydride, trimellitic anhydride, and 3,3',4,4'-benzophenonetetracarboxylic dianhydride; a polycarboxylic acid anhydride such as isaconic anhydride, succinic anhydride, citraconic anhydride, dodecenyl succinic anhydride, propylene tricarboxylic anhydride, maleic anhydride, and 1,2,3,4-butane tetracarboxylic dianhydride; Alicyclic polycarboxylic anhydrides such as hexahydrophthalic anhydride, 3,4-dimethyltetrahydrophthalic anhydride, 1,2,4-cyclopentane tricarboxylic anhydride, 1,2,4-cyclohexane Tricarboxylic anhydride, cyclopentane tetracarboxylic dianhydride, 1,2,4,5-cyclohexanin tetracarboxylic dianhydride, seawater anhydride (11)^111丨〇&1111)^1:丨(16) and resistant Nadic anhydride; an acid anhydride containing an ester group such as ethylene glycol dibenzoic acid anhydride and glyceryl tricarboxylic acid anhydride; and a commercial trademark of Adeca Hardener EH-700 (Asahi Denka Kogyo K) .  K. )-

An epoxy resin curing agent of Rikacid HH (Shin Nippon Rika Co., Ltd.) and MH-700 (Shin Nippon Rika Co., Ltd.). Examples of the aforementioned thermal acid generator include a ferrosulfide salt (excluding the triarylsulfonium salt listed in the above-mentioned photo-48-200807151 (46) polymerization initiator (D)), a benzothiazole salt, an ammonium salt, Phosphorus-salt, sulfonate compound, sulfonimide compound, and diazomethane compound. Among these compounds, a sulfonium salt, a benzothiazole salt, a sulfonate compound, a sulfonimide compound, and a diazomethane compound are preferred. The aforementioned sulphur salt salt includes an alkyl sulphide salt such as 4-acetyl hexafluoroantimony phenyl dimethyl sulfonate, hexafluoroarsenic acid 4-ethenyloxy phenyl dimethyl sulfonate, hexafluoride. Dimethyl-4-(benzyloxycarbonyloxy)phenylsulfonate phthalate, dimethyl-4-(benzylideneoxy)phenylsulfate hexafluoroantimonate, hexafluoroarsenate 4--4-benzylideneoxy)phenylsulfonate and hexafluoroantimonate dimethyl-3-chloro-4-ethenyloxyphenylsulfonate; benzylsulfide salt, such as hexafluoroantimonic acid Benzyl-4-hydroxyphenylmethylsulfide, benzyl-4-hydroxyphenylmethylsulfonium hexafluorophosphate, 4-ethenyloxyphenylbenzylmethylsulfonium hexafluoroantimonate, hexafluoro Benzyl phthalate 4-methoxyphenylmethylsulfide, benzyl-2-methyl-4-hydroxyphenylmethylsulfonium hexafluoroantimonate, benzyl-3-chlorohexafluoroarsenate 4-hydroxyphenylmethylsulfide and 4-methoxybenzyl-4-hydroxyphenylmethylsulfate hexafluorophosphate; dibenzylsulfonyl salt, such as dibenzyl-4-hydroxyl hexafluoroantimonate Phenylsulfide, dibenzyl-4-hydroxyphenylsulfonium hexafluorophosphate, 4-ethenyloxyphenyl dibenzylsulfonium hexafluoroantimonate, dibenzyl-4-methoxy hexafluoroantimonate Phenyl Iron, dibenzyl-3-chloro-4-hydroxyphenylsulfonium hexafluoroarsenate, dibenzyl-3-methyl-4-hydroxy-5-t-butylphenylsulfonyl hexafluoroantimonate and a benzyl fluoro-4-fluorobenzyl-4-hydroxyphenyl sulfonate; and a substituted benzyl thiosulfate such as p-chlorobenzyl-4-hydroxyphenylmethyl hexafluoroantimonate Sulfuric acid, p-nitrobenzyl-4-hydroxyphenylmethylsulfonium hexafluoroantimonate, p-chlorobenzyl-4-hydroxyphenylmethylsulfonium hexafluorophosphate, hexafluoroantimonic acid Benzyl-3-methyl-4-hydroxyphenylmethylsulfate, hexafluoroantimonic acid-49- 200807151 (47) 3,5-dichlorobenzyl-4 hydroxyphenylmethylsulfonate and six O-chlorobenzyl 3-fluoro-4-hydroxyphenylmethylsulfonyl fluoroantimonate. The aforementioned benzothiazole key salt includes a benzyl benzothiazole key salt, such as hexyl-benzoic acid 3-benzylbenzothiazole, hexafluorophosphate 3-benzylbenzothiazole, and 4-benzylbenzene tetrafluoroborate. And thiazolyl iron, hexafluoroantimonic acid 3_(p-methoxybenzyl)benzothiophene U, hexafluoroantimonate 3_benzyl-2-methylthiobenzothiazolium and hexafluoroantimonate 3 · Benzyl-5-chlorobenzothiazole key. The aforementioned sulfonate compound includes benzoin tosylate, α-hydroxymethylbenzoin tosylate, α-hydroxymethylbenzoin n-octane sulfonate, pyro(difluoromethanesulfonate), and coke掊酣3 (nonafluoro-n-butyl sulfonate) 'pyrophenol three (methane sulfonate) and nitrobenzyl _ 9,1 0 -diethoxy oxime-2 - sulfonate. The aforementioned sulfonium imine compound includes N-(trifluoromethanesulfonyloxy) succinimide, N-(trifluoromethanesulfonyloxy)bicyclo[2.21]glycol-2,3-dimethyl Yttrium, N - ( 1 0 - camphorsulfonyloxy) succinimide, N-(10-camphorsulfonyloxy)bicyclo[2·2·1]hept-5- _-2 , 3 dimethyl sulfoxide and hydrazine [(5-methyl-5-carboxymethanebicyclo[^:^g-yl]sulfonyloxy] succinimide. The above diazomethane compounds include bis(cyclohexanesulfonyl)diazomethane, bis(t-butylsulfonyl)diazomethane and bis(1,4-dioxaspiro[4.5] - decane-7-sulfonyl) diazomethane. Among these thermal acid generators, 'hexafluoroarsenic acid 4-ethenyloxyphenyldimethylsulfide, hexafluoroantimonic acid benzyl-4-hydroxyphenylmethylsulfide, hexamic acid 4_etheneoxy Phenylphenyl group methyl sulfonate, hexafluoroantimonate bis- phenyl-phenylphenyl-50- 200807151 (48) sulphur, hexafluoroantimonate 4-ethenyloxyphenyl benzyl sulfonate, six 3-Benzylbenzothiazole fluoroantimonate and N-(trifluoromethanesulfonyloxy)bicyclo[2.2.1]hept-5-ene-2,3-dimethylimine are particularly preferred. The aforementioned curing assistants may be used singly or in combination of two or more. The amount of the curing assistant is calculated by the total solid content of the radiation-sensitive composition. Preferably, it is 15% by weight or less, more preferably 10% by weight or less. When the amount of the curing aid is more than 15% by weight, the storage stability of the resulting radiation-sensitive composition may be lowered or the formed coloring layer may be detached from the substrate during development. Additives other than the aforementioned additives include dispersing assistants such as blue pigment derivatives or yellow pigment derivatives such as berberine derivatives; chelating agents such as glass or alumina; polymer compounds such as polyvinyl Alcohol, polyethylene glycol monoalkyl ether or poly(fluoroalkyl acrylate); nonionic, cationic or anionic surfactant; adhesion accelerator, such as vinyl trimethoxy decane, vinyl triethoxy Base decane, vinyl tris(2-methoxyethoxy)decane, N-(2-aminoethyl)-3-aminopropyl•methyl•dimethoxydecane, N-(2- Aminoethyl)-3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyl • Methyl•dimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-chloropropyl•methyl•dimethoxydecane, 3-chloropropyl Trimethoxydecane, 3-methylpropenyloxypropyltrimethoxydecane or 3-hydrothiopropyltrimethoxydecane; antioxidants such as 2, 2 '-Thiobis(4-methyl-6-tert-butylphenol) or 2,6-di-t-butylphenol; UV absorbers such as 2-(3-tert-butyl-5- Methyl-2-hydroxy-51 - 200807151 (49) phenyl)-5-chlorobenzotriazole or alkoxybenzophenone; adhesion inhibitors such as sodium polyacrylate; and thermal radical generators, such as 1, Γ-azobis(cyclohexane-1-carbonitrile) or 2-phenylazo-4-methoxy-2,4-dimethylvaleronitrile. Solvent The radiation-sensitive composition of the present invention comprises the aforementioned components (A) to (D) as essential components and optionally the aforementioned additives, usually mixed with a solvent to prepare a liquid composition. A suitable solvent may be selected and used as long as it disperses or dissolves the components (A) to (D) and additives constituting the radiation-sensitive composition, does not react with such components, and has appropriate volatility. Examples of the solvent include (poly)alkylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl Ether, bisethylene glycol monomethyl ether, bisethylene glycol monoethyl ether, bisethylene glycol mono-n-propyl ether, bisethylene glycol mono-n-butyl ether, ginseng ethylene monomethyl Ether, ginseng ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol single B Ethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether and tripropylene glycol monoethyl ether; (poly)alkylene glycol monoalkyl ether acetate, such as Ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, bisethylene glycol monomethyl ether acetate, bisethylene glycol monoethyl ether acetate, propylene glycol monomethyl Ether acetate and propylene glycol monoethyl ether acetate; other ethers such as bisglycol dimethyl ether, bisethylene glycol methyl ethyl ether, diethylene glycol diethyl ether and tetrahydrofuran; ketone, Such as methyl ethyl ketone, cyclohexanone, 2-heptanone and 3-g-52-200807151 (50) ketone; alkyl lactate such as methyl lactate and ethyl lactate; other esters such as 2-hydroxy-2 -ethyl methacrylate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethoxy Ethyl acetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl Propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, N-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetoxyacetate, ethyl acetoacetate and 2- Ethyl butyrate; aromatic hydrocarbons such as toluene and xylene; and decylamine and decylamine such as N,N-dimethylformamide, N,N-dimethylacetamide and N-methylpyrrolidinone. From the viewpoints of solubility, pigment dispersibility, and coatability, among these solvents, propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, and propylene glycol monoethyl Ethyl acetate, diethylene glycol dimethyl ether, bisethylene glycol methyl ethyl ether, cyclohexanone, 2-heptanone, 3-heptanone, ethyl lactate, 3-methoxypropionic acid Ethyl ester, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, 3-methyl-3-methoxybutyl propionate, n-butyl acetate 'isobutyl vine acetate, formic acid N-amyl ester, isoamyl acetate, n-butyl propionate 'TS ethyl ester, isopropyl butyrate, n-butyl butyrate and ethyl pyruvate. The above solvents may be used alone or in two or more. Used in combination. In addition, 'high boiling point solvents such as benzyl ethyl ether, di-n-hexyl ether, acetone acetone, isophorone, hexanoic acid, octanoic acid, octanoicol, oxime sterol-53-200807151 (51), benzyl Alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethyl carbonate, propyl carbonate or ethylene glycol Phenyl ether acetate can be used in combination with the aforementioned solvents. These high boiling solvents may be used singly or in combination of two or more. The amount of the solvent is not particularly limited, but from the viewpoint of the coatability and stability of the resulting radiation-sensitive composition, it is desirable to determine that the total amount of all components other than the solvent of the composition becomes preferably 5 to 50% by weight, particularly preferably 10 to 40% by weight. Color filter The color filter of the present invention has a coloring layer formed from the radiation-sensitive composition of the present invention. The method of forming the coloring layer in the color filter of the present invention is described below. Forming a light-shielding layer on the surface of the substrate as appropriate to define a portion for forming a pixel, applying a liquid radiation-sensitive composition (including, for example, a red pigment dispersed therein) to the substrate, pre-baking to evaporate the solvent, A coating film is formed. The coating film is then exposed to radiation via a reticle, developed with an alkali developer, dissolved and removed from the unexposed portions of the coating film, and post-baked to form a pixel array having a predetermined red pixel pattern. Then, the same method is applied to apply, pre-baking, exposing, developing and post-baking the liquid radiation-sensitive composition containing the green and blue pigment dispersed therein to form a green pixel array and blue on the same substrate in sequence. The color pixel array is used to obtain a -54-200807151 (52) color filter having a red, green, and blue pixel array on the substrate. The order in which the present invention forms a color pixel is not limited to the foregoing. The black matrix can likewise be formed using a liquid radiation-sensitive composition comprising, for example, a black pigment dispersed therein. The substrate used to form the pixel and/or black matrix is made of glass, ruthenium, polycarbonate, polyester, aromatic polyamine, polyamido-imide or polyimine. The substrate may suitably be pretreated, such as by chemical treatment with a decane coupling agent, plasma treatment, ion plating, sputtering, gas reaction or vacuum deposition. When the liquid radiation-sensitive composition is applied to the substrate, suitable coating techniques such as spray coating, roll coating, spin coating (spin coating), slit extrusion coating, smear coating or spraying may be employed. Ink coating method. Among these methods, a spin coating method and a slit extrusion coating method are preferred. The thickness of the coating film after drying is preferably from 0.1 to 10 μm, more preferably from 0.2 to 8.0 μm, and particularly preferably from 0.2 to 6.0 μm. The radiation used to form the pixel and/or black matrix is selected from the group consisting of visible light radiation, ultraviolet radiation, far ultraviolet radiation, electron radiation, and X-radiation. Among such radiations, radiation having a wavelength of 190 to 450 nm is preferred. The radiation dose is preferably from 10 to 10, 〇〇〇 J/m 2 . • The developer is preferably sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo-[5·4·0]-7- An aqueous solution of undecene or 1,5-diazabicyclo-[4.3 · 0 ] - 5 -pinene. A suitable amount of a water-soluble organic solvent such as methanol or ethanol, or an interfacial active agent may be added to the aforementioned alkali developer. The coating film is preferably washed with water after alkali development -55-200807151 (53). Spray-type development, spray development, dipping (immersion) development or retort development can be employed. As the developing conditions, the coating film is preferably developed at room temperature for 5 to 300 seconds. The obtained color filter of the present invention can be extremely effectively used for a transmissive and reflective type color liquid crystal display device, a color photographing device, a color sensor, and the like. Color Liquid Crystal Display Device The color liquid crystal display device of the present invention comprises the color filter of the present invention. As an example of the color liquid crystal display device of the present invention, a pixel and/or black matrix can be formed on the thin film transistor substrate array using the radiation-sensitive composition of the present invention as described above to produce a color liquid crystal display device having excellent characteristics. The radiation-sensitive composition of the present invention contains the aforementioned components (A) to (D) as essential components. Particularly preferred examples of the compositions are described below. (a) a radiation-sensitive composition for forming a coloring layer, wherein the copolymer (B1) comprises a copolymer (BI) and the copolymer (B2) comprises a copolymer (BII) (b) for forming a colored layer a radiation-sensitive composition (a), wherein the copolymer (BI) comprises at least one member selected from the group consisting of copolymers (BI-1) to (B 1-6), and the copolymer (BII) comprises at least one selected from the group consisting of copolymerization (BII-1) and (BII-2) (c) a radiation-sensitive composition (a) or (b) for forming a colored layer, wherein the polyfunctional monomer (C) is one selected from the group consisting of trishydroxyl Methylpropane triacrylate, pentaerythritol triacrylate and pentaerythritol hexaacrylate -56- 200807151 (54) (d) Radiation-sensitive composition (a), b) or (c) wherein the photopolymerization initiator (D) is at least one selected from the group consisting of an ethoxylated benzene compound, a biimidazole compound, a triterpenoid compound and a 0-fluorenyl hydrazine compound (e) for forming a colored layer of radiation sensitive a composition (a), (b), (c) or (d) wherein the colorant (A) is an organic pigment or carbon black (f) for forming a color-sensitive layer of a radiation-sensitive composition, wherein The soluble resin (B) comprises a copolymer (B II) (g) a radiation-sensitive composition (f) for forming a coloring layer, wherein the copolymer (BII) comprises at least one selected from the group consisting of copolymers (ΒΠ-1) and (BII_2) (h) a radiation-sensitive composition (f) or (g) for forming a coloring layer, wherein the polyfunctional monomer (C) is at least one selected from the group consisting of trimethylolpropane triacrylate, and different Pentaerythritol triacrylate and diisopentaerythritol hexaacrylate (i) a radiation-sensitive composition (f), (g) or (h) for forming a colored layer, wherein the photopolymerization initiator (D) Is a radiation-sensitive composition (f), (g), (h) or (i) which is at least one selected from the group consisting of an ethoxylated benzene compound, a biimidazole compound and a tri-till compound (j) for forming a colored layer, wherein The colorant (A) is an organic pigment or carbon black. Preferably, the color filter (k) of the present invention has pixels and/or black matrix formed from the radiation-sensitive composition (a), (b), (c), (d) or (e) used to form the colored layer. . Preferably, the color filter (1) of the present invention has a pixel and/or a black matrix formed from the radiation sensitive composition (f), (g), (h), (i) or (j) used to form the coloring layer. Preferably, the color liquid crystal display device (m) of the present invention comprises the aforementioned color filter -57-200807151 (55) (k) or (1), and more preferably, the color liquid crystal display device (η) of the present invention comprises a thin film transistor. The aforementioned color filter (k) or (1) on the substrate array. As described above, the radiation-sensitive composition of the present invention has excellent storage stability in the form of a liquid composition while maintaining excellent sensitivity, resolution, and pattern shape, and provides excellent resistance to a wide variety of solvents. The pixel pattern and the black matrix pattern which are excellent in adhesion to the substrate, therefore, the radiation-sensitive composition of the present invention is extremely advantageous for the manufacture of color filters in the electronics industry, such as color filters for use in color liquid crystal display devices. EXAMPLES The following examples are intended to further illustrate the invention but are not to be construed as limiting. "Number of copies" and "%" are by weight. Synthesis of alkali-soluble copolymer Synthesis Example 1 3 parts of 2,2f-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were fed into a flask equipped with a cooling tube and a stirrer, and then 1 5 parts methacrylic acid, 25 parts of 3-(methacryloxymethyl)-3_ethyloxetane, 60 parts of benzyl methacrylate and 3 parts of α-methylstyrene dimer (as a molecular weight controlling agent) was fed into the flask, and the inside of the flask was replaced with nitrogen. The resulting mixture was gently stirred, and the resulting reaction solution was heated at 80 ° C, and polymerized by maintaining the temperature for 5 hours to obtain a resin solution. This resin is referred to as an alkali-soluble resin (B-1). -58- 200807151 (56) Synthesis Example 2 3 parts of 2,2·-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were fed into a flask equipped with a cooling tube and a stirrer, and then 1 5 parts of methacrylic acid, 25 parts of 3-(methacryloxymethyl)-3-ethyloxetan, 20 parts of N-phenyl cis-butenedimino, 10 A portion of styrene, 30 parts of benzyl methacrylate, and 3 parts of a-methylstyrene dimer (as a molecular weight controlling agent) were fed into the flask, and the inside of the flask was replaced with nitrogen. The resulting mixture was gently stirred, and the resulting reaction solution was heated at 80 ° C, and polymerized by maintaining the temperature for 5 hours to obtain a resin solution. This resin is referred to as an alkali soluble resin (B-2). Synthesis Example 3 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were fed into a flask equipped with a cooling tube and a stirrer, followed by 15 parts of methacrylic acid. 25 parts of 3-(methacryloxymethyl)oxetane, 60 parts of benzyl methacrylate and 3 parts of α-methylstyrene dimer (as a molecular weight controlling agent) are fed to the The inside of the flask was replaced with nitrogen. The resulting mixture was gently stirred, and the resulting reaction solution was heated at 80 ° C to be polymerized by maintaining the temperature for 5 hours to obtain a resin solution. This resin is referred to as a soluble resin (B-3). Synthesis Example 4 -59- 200807151 (57) 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were fed into a flask equipped with a cooling tube and a stirrer, after which 15 parts of methacrylic acid, 25 parts of tetrahydrofurfuryl methacrylate, 60 parts of benzyl methacrylate and 3 parts of α-methylstyrene dimer (as a molecular weight controlling agent) were fed into the flask, The inside of the flask was replaced with nitrogen. The resulting mixture was gently stirred, and the resulting reaction solution was heated at 80 ° C, and polymerized by maintaining the temperature for 5 hours to obtain a resin solution. This resin is referred to as an alkali soluble resin (B-4). Synthesis Example 5 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were fed into a flask equipped with a cooling tube and a stirrer, followed by 15 parts of methacrylic acid. 25 parts of tetrahydrofurfuryl methacrylate, 20 parts of N-phenyl maleimide, 10 parts of styrene, 30 parts of benzyl methacrylate and 3 parts of α-methylstyrene The polymer (as a molecular weight controlling agent) was fed into the flask, and the inside of the flask was replaced with nitrogen. The resulting mixture was gently stirred, and the resulting reaction solution was heated at 80 ° C, and polymerized by maintaining the temperature for 5 hours to obtain a resin solution. This resin is called alkali-soluble resin (B-5). Synthesis Example 6 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were fed to the apparatus with cooling tubes and stirring. In a flask, then 15 parts of methacrylic acid, 60 parts of benzyl methacrylate, 25 parts of n-butylmethyl-60-200807151 (58) acrylate and 3 parts of α-methylstyrene dimer (as The molecular weight controller) was fed into the flask and the inside of the flask was replaced with nitrogen. The resulting mixture was gently stirred, and the resulting reaction solution was heated at 80 ° C, and polymerized by maintaining the temperature for 5 hours to obtain a resin solution. This resin is called an alkali soluble 'resin (B-6). Synthesis Example 7 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were fed into a flask equipped with a cooling tube and a stirrer, followed by 15 parts of methacrylic acid. , 15 parts of tetrahydrofurfuryl methacrylate, 15 parts of 3-(methacryloxymethyl)-3-ethyloxetane, 55 parts of benzyl methacrylate and 3 parts of α-A A styrene dimer (as a molecular weight controlling agent) was fed into the flask, and the inside of the flask was replaced with nitrogen. The resulting mixture was gently stirred, and the resulting reaction solution was heated at 80 ° C, and polymerized by maintaining the temperature for 5 hours to obtain a resin solution. This resin is referred to as an alkali-soluble resin (B-7). The synthesis examples 8 to 14 and the comparative synthesis examples 1 to 6 are solutions of the alkali-soluble resins (B-8) to (B-20) in the same manner as in Synthesis Example 7. The type and amount of the unsaturated compound constituting the alkali-soluble resin in different places were changed as shown in Table 1. -61 - 200807151 (59) I撇 Synthesis Example rH inch Η I PQ If) rH Οί • r〇LD Ο O CN CM H rn ro rH 1 PQ L0 H 卜 03 ro i LD Ο O (N CN H CN Η CN tH 1 PQ Ln rH Γ0 OQ 1 卜 · · rH γΗ rH rH 1 PQ LD H 〇CM • ss * » ο Η O rH 1 PQ ID rH LO Η • 2 S « I CTi B-9 ui H η οα I&gt ; 1 S « · 00 B-8 LO H 〇CN s, S · · r- r- 1 PQ If) iH LO Η ^ IS Alkali Soluble Resin: 邻氍恶}Ε 氍糊氍<Π 453 SM Boat HSU If趦忉13⁄4 ιε 倾小脉& Secret 1 jL·/ -i-rhy & m _ _ S Ξ 2$ 遁^ mfgm β面III f; m ke i mm It* CO CO m 松碟Π IS 1 g S ^ tg Jg butterfly|cluster i (4) -62- 200807151 (60) 鱅-I撇Comparative Synthesis Example VD 〇〇q 1 PQ LD Η 1 1 1 s · · LD σ\ Η I m ID Η 1 Γ0 I (N Ο O Ln CN rH inch CO Η 1 PQ m rH 1 ΓΟ 1 (N Ο O LD CN rH ΓΟ Γ Η I PQ lo ο ΓΟ 1 1 s * · CN ω rH 1 CQ ID rH 1 • ss ' ιΗ ΙΛ Η 1 PQ LO rH 1 ^ · s ' · Alkali-soluble resin -___1 4α 氍 le 遨 K K - - - - - - - - - 働 働 働 働 働 働 働^ mf ^ ^ is« h $ mmm line ^ mm Λ fr § S 1 love μ IE E — slightly WS: i: Z$ cn cn m Π Π is|g S — t wear IE slightly connected W1 蝉K] 1 »- _63- 200807151 (61) Preparation of Pigment Dispersion Preparation Example 1 2 parts as a colorant (A) C. I·Pigment Red 254 and C·I·Pigment Red 177 in a weight ratio of 80/20, 5 parts (solid content) of BYK-200 1 as a dispersing agent and 75 parts of propylene glycol monomethyl ether acetate as a solvent were mixed by a bead mill to prepare a pigment dispersion (R). Preparation Example 2 2 parts of a mixture of C·I·Pigment Green 36 and C·1·Pigment Yellow 1 50 as a coloring agent (A) in a weight ratio of 5 0/5 0, and 5 parts (solid content) as a dispersing agent Sol Sperse 24000 and 75 parts of propylene glycol monomethyl ether acetate as a solvent were mixed by a bead mill to prepare a pigment dispersion (G). Example 1 1 part pigment dispersion (R), 10 parts (solid content) of the alkali-soluble resin (B1) (solution form obtained in Synthesis Example 1), and 5 parts (solid content) of the alkali-soluble resin (B- 4) (form of the solution obtained in Synthesis Example 4), 15 parts of trimethylolpropane triacrylate as a polyfunctional monomer (C), and 5 parts of 2-methylmethylthio)phenyl]-2-? Phytyl propan-1-one and 3 parts of diethyl thioxanthone as a photopolymerization initiator (D) and propylene glycol monomethyl ether acetate as a solvent to prepare a liquid composition having a solid content of 25% (R_l) (see Table 2). The liquid composition (R-1) was patterned and evaluated by the following method. The results of the assessment are shown in Table 1. -64- (62) (62)200807151 The pattern forming liquid composition (R-1) was applied to the surface of the glass substrate by a spin coater and prebaked at 9 ° C for 4 minutes to form a 1.3 μm thick coating film. . Thereafter, three of the substrates were cooled to room temperature, and the coating film on the substrate was exposed to 2,000 J/m 2 of radiation through a reticle using a high pressure mercury lamp. The coating film was sprayed and developed with a 0.04% potassium hydroxide aqueous solution at a temperature of 23 ° C under a developing pressure of 1 kgf/cm 2 (nozzle diameter of 1 mm), and baked at 20 ° C for 30 minutes to form 2 0 0 X 2 〇〇 micron dot pattern. Evaluation of Solvent Resistance Three sheets of 2,000 J/m2 radiation substrate were individually impregnated with N-methylpyrrolidone at 25 ° C (represented by NMP in Tables 10 to 13), and 1 8% aqueous HCl solution (Table) From 10 to 13 (indicated by HC1) and a 5% aqueous solution of KOH (indicated by KOH in Tables 10 to 13), after 30 minutes, the dot pattern before and after the immersion was observed by a scanning electron microscope. 〇 indicates that the pattern formation condition is good and the film thickness ratio before and after immersion (film thickness after immersion X 100 / film thickness before immersion) is 95% or higher, and Δ indicates that the film thickness ratio before and after immersion is less than 95% or part The pattern disappears, and the X system indicates that all the patterns are peeled off from the substrate after the immersion. Adhesion evaluation The liquid composition (R-1) was applied to the surface of a glass substrate by a spin coater and prebaked at 9 ° C for 4 minutes to form a film of 1.3 μm thick. Thereafter, this -65-200807151 (63) substrate was cooled to room temperature, and the film was exposed to 2,000 J/m2 with a high pressure mercury lamp. The coating film was then spray-developed at a temperature of 23 ° C under a developing pressure of 1 kgf/cm 2 with a 0.04% aqueous solution of potassium hydroxide (nozzle diameter: 1 mm), and baked at 22 ° C for 30 minutes. Thereafter, the coating film was cut into 1 squares in accordance with JIS K5400 to carry out an adhesion test. The 0 system indicates that there is no square peeling, the Δ indicates that there are 1 to 10 squares peeling off, and the X system indicates that there are more than 10 squares peeling off. Evaluation of storage stability of liquid composition When the liquid composition (R-1) was placed in a glass bottle and kept at 40 ° C for one week in a thermo-hygrostat, the viscosity of the liquid composition before and after storage was measured to Calculate the rate of change of viscosity (viscosity after storage X 100 / viscosity before storage). The viscosity of the pigment dispersion (R), the viscosity of the solution of the alkali-soluble resin (B-1) and the viscosity of the solution of the alkali-soluble resin (B-4) remain unchanged after maintaining the conditions as described above. Examples 2 to 22 Liquid compositions (R-2) to (R-22) were prepared in the same manner as in Example 1. The types and amounts of the different components were changed as shown in Tables 2 and 3. . Evaluation was carried out in the same manner as in Example 1 except that the liquid compositions (R-2) to (R-22) were used in place of the liquid composition (R-1). The solution viscosity of the alkali-soluble resin (B-5) used in Examples 8 to 10, the solution viscosity of the alkali-soluble resin (B-2) used in Examples 11 to 16 and Examples-66-200807151 (64) 17 The solution viscosity of the alkali-soluble resin (B-3) used up to 22 remained unchanged even under the conditions used to evaluate the storage stability of the aforementioned liquid composition. The results of the assessment are shown in Table 1. Example 23 1 part pigment dispersion (G), 10 parts (solid content) alkali-soluble resin (Bl) (solution form obtained in Synthesis Example 1), 5 parts (solid content) alkali-soluble resin (B-4) (Form of the solution obtained in Synthesis Example 4), 12 parts of diisopentaerythritol hexaacrylate as the polyfunctional monomer (C), and 5 parts of 2-benzyl-2-dimethylamino-1-(4) -morpholinylphenyl)-butan-1-one and 3 parts of 4,4'-bis(diethylamino)benzophenone as a photopolymerization initiator (D) and propylene glycol as a solvent Methyl ether acetate was mixed to prepare a liquid composition (G1) having a solid content of 25 % (see Table 4). A pattern was formed from the liquid composition (G-1) in the same manner as in Example 1, except that the liquid composition (G-1) was used in place of the liquid composition (R-1) and evaluated. The viscosity of the pigment dispersion (G) used in the present invention remains unchanged even under the conditions used to evaluate the storage stability of the aforementioned liquid composition. The evaluation results are shown in Table 11. Examples 24 to 44 The liquid compositions (G - 2 ) to (G - 2 2 ) were prepared in the same manner as in Example 23, and the types and amounts of the components of the different parts were as shown in Table 4 or Table 5. change. Evaluation was carried out in the same manner as in Example 1 except that the liquid composition was -67-200807151 (65) (G-2) to (G-22) were used to replace the liquid composition (R-1). The results of the evaluation are shown in Table 11. Comparative Examples 1 to 19 The liquid compositions (R-23) to (R-41) were prepared in the same manner as in Example 1, and the types and amounts of the components constituting the different parts were changed as shown in Table 6 or Table 7. Evaluation was carried out in the same manner as in Example 1 except that the liquid compositions (R-23) to (R-4 1) were used in place of the liquid composition (R-1). The results of the evaluation are shown in Table 12. Comparative Example 2 0 to 3 8 The liquid compositions (G-23) to (G-41) were prepared in the same manner as in Example 23, and the types and amounts of the components of the different parts were as shown in Table 8 or Table 9. change. Evaluation was carried out in the same manner as in Example 1 except that the liquid compositions (G-2 3) to (G-4 1) were used in place of the liquid composition (R-i). The results of the evaluation are shown in Table 13. The polyfunctional monomers, photopolymerization initiators and additives in Tables 2 to 9 are shown below. Polyfunctional monomer C-1: Trimethylolpropane triacrylate C-2: Diisopentyltetraol hexaacrylate-68- 200807151 (66) Photopolymerization initiator D-1 : 2-methyl- L-[4-(Methylthio)phenyl]-2-morpholinylpropan-1-one D-2: 1-[9-ethyl-6-(2-methylbenzylindenyl)-9H- Oxazol-3-yl]ethanone 1-(0-acetamidine) D-3: keto 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butane- 1- D-4 : 2,4-Diethylthioxanthone D-5 : 4,4'-bis(diethylamino)benzophenone additive E-1 : Bisphenol A novolac epoxy resin (Trademark: 157S65 of Japan Epoxy Resin Co., Ltd.) E-2 ·· Benzadetricarboxylic anhydride E-3 ··N-(Trifluoromethanesulfonyloxy)bicyclo[2.2.11hept-5-ene - 2,3-Dimethyl@证胺胺-69- 200807151 CNm Additives (parts) 1 1 rH 1 w CN OJ 1 W 5 cn 1 W » 1 1 1 1 Photopolymerization starter (parts) ID ΓΟ Η inch 1 I Ρ Ρ lh on (N inch 1 1 QQ Dl (5) D-4 (3) m cn H inch 1 1 PP lo cn H inch 1 1 PP Dl (5) D-4 (3) N LD ro H Inch 1 1 QP D-l(5) D-4 (3) lo m rH Inch 1 1 PP ^^ LO Γ0 H Inch 1 1 PQ Polyfunctional monomer (parts) Cl (15) Cl (15) C -l (15) Cl (15) Cl (15) Cl (15) Cl (15) Cl (15) 1___.___ ! Cl (15) Cl (15) Alkali-soluble resin (parts) O rH LD ^—· ' —^ rH inch 1 1 PQ PQ o ^ iH LD , ~ a ^ rH inch 1 1 PQ PQ o ^ H LO '--- '---- i-1 1 PQ PQ OA h in ^_ H inch 1 1 PQ pq —V o ^ rH Lf) ___^ ^ H inch 1 1 PQ PQ ^ a ^' o Lf) rH ---- H inch 1 1 pq pq a m CN H rH inch flat l P3 PQ 〇^ h In ^^ rH Lf) 1 1 PQ PQ 〇LO rH rH L〇1 1 PQ PQ ^-N. Γ0 (N rH —〆— t~1 LD 1 1 PQ PQ pigment dispersion (parts) R (100) R (100) _ί R (100) R (100) R (100) R (100) R (100) ί R (100) 1 1_ R (100) R (100) Liquid composition ί rH 1 (N 1 ro 1 1 LO 1 江KD 1 1 00 1 σ\ 1 o tH 1 (3⁄4 rH XH CNJ XW cn XW Ex. 4 LO XW KD X wo XW 00 XW ch >< W 〇rH >< W Li*· :Χ3 -70- 200807151 (68)

Co撇

Additives (parts) 1 1 Ink 1 1 1 1 1 1 1 1 1 Photopolymerization initiator (parts) ^—v ^ in η 1 -1 inch 1 1 PP in m ^^ H inch l 1 QP ---- - id cn ✓ rH inch 1 1 PP Dl (5) D-4 (3) mm rH inch 1 1 PPX in m ^^ rl inch 1 1 PP x^ mm H inch 1 1 PQ in m ^ rH inch 1 1 PP ^-V ID Γ0 rH inch 1 1 PP LO 00 rH inch 1 1 PQ id m H inch 1 1 PP mm V-*· ----- rH inch 1 1 PP polyfunctional monomer (parts) C-1 (15) C-1 (15) C-1 (15) 1 c-1 (15) 1 C-1 (15) C-1 (15) C-1 (15) C-1 (15) C-1 (15) C-1 (15) C-1 (15) C-1 (15) Alkali-soluble resin (parts) Ο H LD ^ ^^ 1 幽m PQ ^ o in h > - one '^^ CN inch 1 1 PQ PQ —^ r〇CN tH CN inch 1 1 PQ PQ rH LT) ^^ ---* CN ID 1 1 PQ PQ a o L〇H --^ CN LO 1 1 PQ PQ 一Γ0 (N rH V--^ ------ 〇qm 1 1 PQ PQ o one rH LO ^ m inch 1 1 PQ PQ ^ ^ o LO rH --------- m inch 1 1 PQ PQ one m CN rH --------- Γ0 inch 1 1 PQ PQ 〇一HL〇----^ V__^ Γ0 LD 1 1 PQ PQ a o Lf) tH •w* ---^ ro in 1 1 PQ PQ a m OQ H ^^ ___ mm 1 1 PQ PQ pigment dispersion (parts) R (100) R (100) R (100) R (100) R (100) 1 R ( 100) 1 R (100) R (100) [R (100) 1_ 1 R (100) R (100) R (100) I Liquid composition rH γΗ 1 03 rH 1 m rH 1 inch H 1 LD H 1 VO rH 1 I> rH 1 00 rH 1 ratio rH 1 o CN 1 rH (N 1 CN <N 1 Pi Ex. 11 CN rH > ω Γ0 rH w inch rH >< H LD rH w VD iH XH r- rH X w 00 rH >< w σ\ rH >< w 〇CN XM rH CN w CN CN XW

^辑»: .XH -71 200807151 (69 inches ·

Additives (parts) 1 1 5 rH 1 W (N ^^ CN 1 W CN m 1 W 喔1 1 1 1 photopolymerization initiator (parts) LO ΓΟ ΓΟ II) 1 1 Ρ Ρ ^ one---- lo m CN LO 1 1 QQ D-3(5) D-5 (3) LD Γ0 Γ0 IT) 1 1 PQ mm cn m 1 1 PP ld m Γ0 LD 1 1 PP if) cn,~〆—/ m in 1 1 PP ld Cn m ld 1 1 PP lo m ·»««-一米 in 1 1 QP m ro cn lo 1 1 PP Polyfunctional monomer (parts) C-2 (12) C-2 (12) C-2 ( 12) '—"'丨-1 C-2 (12) C-2 (12) C-2 (12) I | C-2 (12) j C-2 (12) C-2 (12) C -2 (12) Alkali-soluble resin (parts) 〇一η in '-^ ___^ rH inch 1 1 pq PQ Ο ^ rH LO ^ ------ ιΗ inch 1 1 PQ PQ ^ ο ^ \-1 ι_π Η Η 1 1 PQ PQ 〇^ tH LO '—^ , —〆rH inch 1 1 PQ PQ o a rH LO ^^ ^--- rH inch 1 1 PQ PQ ^ 〇LD rH ^----- ^^ rH inch 1 1 PQ PQ ^ Γ0 (NHH inch 1 1 pq PQ rH LO V—----- rH LO 1 1 PQ PQ ^ o LT) rH ----- '〆rH ID 1 1 PQ PQ m CN HH ID 1 庐PQ PQ Pigment Dispersions (parts) G (100) G (100) G (100) G (100) G (100) G (100) G (100) G (100) " G (100) G (100) Liquid composition G-1 03 ! 〇Γ〇 1 ο 1 〇LD 1 〇U) 1 o 1 ϋ 00 1 o G-9 o H 1 o Ex.23 OJ X Η L0 CN X w VD CN H I> CN X w 00 03 X w <y\ CN X· W o Γ0 H rH Γ0 x· w CN m W Each key «: .xw - 72- 200807151 (70)

Additives (parts) 1 1 1 1 \ 1 1 1 1 1 1 1 Photopolymerization initiator (parts) ld ro ν^ ΓΟ LD 1 1 Q Ρ mm • S-✓ (Ν LO 1 1 Ρ Ρ --Ν lo m ΓΟ LO 1 1 Ρ Ρ lo mm ld 1 1 QQ -S. ^---- mm Γ0 LO 1 1 QQ LO Γ0 --^ ΓΟ IT) 1 1 PP LO Γ0 m ld 1 1 QP LO Γ0 m ld 1 1 PQ LD Γ0 Γ0 ID 1 1 QQ in cn m in 1 1 QP IT) ro mm 1 1 PQ mm ro LD sense 1 QP polyfunctional monomer (parts) C-2 (12) C-2 (12) C -2 (12) C-2 (12) C-2 (12) C-2 (12) C-2 (12) C-2 (12) C-2 (12) I C-2 (12) C- 2 (12) C-2 (12) Alkali-soluble resin (parts) Ο ^ rH LD '--- (Ν寸1 1 PQ PQ Β-2 (5) Β-4 (10) One ΓΟ CN ιΗ CN inch1 1 PQ PQ o ^ rH LO CN LD 1 1 PQ PQ ^—s a CD ID H '>—^ CN LD 1 1 PQ PQ ^ m (NH '---- *- CN ID 1 1 PQ PQ o rH LD Γ0 inch 1 1 PQ PQ o LO rH **---^ r〇 inch 1 1 PQ pq (NH ^ r〇 inch 1 1 PQ PQ rH LD ----^ ----* Γ0 LO 1 1 PQ pq ----s A 〇LD H m LO 1 1 PQ PQ B-3 (2) B-5 (13) Pigment Dispersions (parts) G (100) G (100) G (100) _1 G ( 100) G (100) G (100) G (100) G (100) G (100) G (100) G (100) G (100) Body composition τΗ γΗ 1 CN γΗ 1 (3⁄4 m rH 1 inch rH i ID rH 1 (3⁄4 VD rH 1 rH 1 00 H 1 c\ rH 1 o CN 1 to H (N 1 (N CN 1 ΓΟ ΓΟ χ· ΓΟ W LD n XW VO m XW r- m >< H 00 m X* pq σ\ m >< W o inch>< W rH >< w CN inch XH ro inch X' W inch XW ^^1«: ·Χ3 -73- 200807151 (71)

孽骏莉:·Χ3·3 -74- 200807151(72) /^S s Π3 m 1 I 1 1 1 1 Photopolymerization initiator (parts) mm ν. in m ^-Ν. in m ^^ ^ if ) ro ^ ^ id m ^ ^ in r〇Η inch 1 1 inch H inch I | rH inch II rH inch H inch Ρ Ρ Ρ Ρ QQQPPPPP m igpn nmL ¢1 ζ Jhn LO LO m LD m ^^ m τΗ * —^ γΗ H ,w〆rH rH ,〆H ^^ lULl Your rH 1 τΗ 1 rH 1 rH 1 H 1 rH 1 υ υ u UU ums sg % | X1— ---N ^--N* tH7^ LD ΗΗ LO γΗ in rH LD H LD rH m rH 纒—, 〆*·—- ^^ γΗ 1 (Ν ro m VD (i ώ fi CQ ii scatter (parts) (100) (1〇〇) ( 100) (100) (100) (100) ϋ Pi Μ UD 00 σ gt; o rH 灿 mmmm inch inch (i 丄ώ ii inch LD VD Γ- 00 Ch rH rH H γΗ rH rH X >< X· &gt ;< X· X· www W ww ο ο u U uu - 75- (73)200807151

陛 陛寂:.xw.o -76- (74) 200807151 6撇Additives (parts) 1 1 1 1 1 1 Photopolymerization initiator (parts) D-3 (5) D-5 (3) D-3 (5) D-5 (3) D-3 (5) D-5 (3) in ro cn ld PQ mmm lo QQ D-3 (5) D-5 (3) Polyfunctional monomer (parts) 02 (12) C-2 (12) C-2 (12) C-2 (12) C-2 (12) C-2 (12) Alkali-soluble resin (parts) B-1 (15) B-2 (15 B~3 (15) B-4 (15) B-5 (15) B-6 (15) Pigment dispersion! (parts) G (100) G (100) G (100) 丨G (100) i G (100) i_ G (100) Liquid composition VO ro 1 〇r- Γ0 1 〇00 r〇1 o σι m 1 〇o inch 1 o rH inch 1 〇cn >< Η U m Xi W u LD Γ0 u <〇00 X· WU ro WU 00 m >< W a .:xwu -77- 200807151 (75) Table 10 Storage stability of solvent-resistant adhesive liquid composition NMP HC1 KOH Ex.l 〇 〇〇〇100 Ex. 2 〇〇〇〇100 Ex. 3 〇〇〇〇100 Ex. 4 〇〇〇〇100 Ex. 5 〇〇〇〇100 Ex. 6 〇〇〇〇100 Ex. 7 〇〇〇 〇100 Ex. 8 〇〇〇〇100 Ex. 9 〇〇〇〇100 Ex.10 〇〇〇〇100 Ex.11 〇〇〇 〇100 Ex. 12 〇〇〇〇100 Ex. 13 〇〇〇〇100 Ex. 14 〇〇〇〇100 Ex. 15 〇〇〇〇100 Ex. 16 〇〇〇〇100 Ex. 17 〇〇〇〇100 Ex. 18 〇〇〇〇100 Ex. 19 〇〇〇〇100 Ex. 2 0 〇〇〇o 100 Ex.21 〇〇〇〇100 Ex. 22 〇〇〇o 100 EX.:Example-78- 200807151 (76) Table 11 Storage stability of solvent-resistant adhesive liquid composition NMP HC1 KOH Ex. 23 〇〇〇〇100 Ex. 24 〇〇〇〇100 Ex. 25 〇〇〇〇100 Ex. 26 〇〇〇 〇100 Ex.27 〇〇〇〇100 Ex. 28 〇〇〇〇100 Ex.29 〇〇〇〇100 Ex.30 〇〇〇〇100 Ex.31 〇〇〇〇100 Ex.32 〇〇o 〇100 Ex.33 〇〇〇〇100 Ex.34 〇〇〇〇100 Ex.35 〇〇〇〇100 Ex.36 〇〇〇〇100 Ex.37 〇〇〇〇100 Ex-38 〇〇〇〇100 Ex. 39 〇〇〇〇100 Ex.40 〇〇〇〇100 Ex.41 〇〇〇〇100 Ex.42 〇〇〇〇100 Ex. 43 〇〇〇〇100 Ex. 44 〇 〇 〇 〇 100

Ex.: Example-79-(77)200807151 Table 12 Storage stability of solvent-resistant adhesive liquid composition NMP HC1 K〇H C.Ex.l XX △ X 100 C.Ex.2 XX △ X 100 C .Ex.3 △ Δ △ X 100 C.Ex.4 △ Δ △ X 100 C·Ex·5 △ Δ △ X 100 C.Ex.6 X △ XX 100 C.Ex.7 XXXX 100 C.Ex.8 △ Δ △ X 100 C·Ex·9 Δ Δ △ X 100 C.Ex.10 △ XXX 100 C.Ex.11 X Δ △ X 100 C.Ex.12 X Δ XX 100 C.Ex.13 XXXX 100 C Ex.14 〇〇〇〇304 C.Ex.15 〇〇〇〇300 C.Ex.16 〇〇〇〇405 C.Ex.17 XXXX 100 C.Ex.18 XXXX 100 C.Ex.19 XXXX 100 C.Ex. ··Control -80- 200807151 (78) Table 13 Storage stability of solvent-resistant adhesive liquid composition NMP HC1 KOH C.Ex.20 XXXX 100 C.Ex.21 XXXX 100 C.Ex. 22 Δ Δ Δ X 100 C.Ex,23 Δ X Δ X 100 C.Ex.24 X Δ Δ X 100 C.Ex.25 XXXX 100 C.Ex.26 XXXX 100 C.Ex.27 Δ Δ Δ X 100 C.Ex.28 △ X △ X 100 C.Ex.29 △ XXX 100 C. Ex.3 0 XXXX 100 C.Ex.31 XXXX 100 C.Ex.32 XXXX 100 C.Ex.33 〇〇〇 〇405 C.Ex.34 〇〇〇〇387 C.Ex.35 〇〇〇〇504 C.Ex.36 XXXX 100 C. Ex.3 7 XXXX 100 C·Ex·3 8 XXXX 100 -81 - 200807151 ( 79) Example 4 5 100 parts of pigment dispersion (R), 15 parts (solid content) alkali-soluble resin (B-7) (in the form of a resin solution prepared in Synthesis Example 7), 10 parts of diisopentaerythritol Acrylate and 5 parts of trimethylolpropane triacrylate as polyfunctional monomer (C), 5 parts of 2-methylmethylthio)phenyl]-2-morpholinylpropan-1-one and 3 4,4'-bis(diethylamino)benzophenone as a photopolymerization initiator (D) and propylene glycol monomethyl ether acetate as a solvent to prepare a solid content of 25% The liquid composition (R-42) (see Table 14) was patterned and evaluated from the liquid composition (R-42) by the following method. The results of the g-flat evaluation are not as shown in Table 18. Pattern Formation The liquid composition (R-42) was applied to the surface of the glass substrate by a spin coater and prebaked at 9 ° C for 4 minutes to form a 1.3 μm thick coating film. Thereafter, three of the substrates were cooled to room temperature, and the coating film on the substrate was exposed to 2,000 J/m2 of radiation through a reticle using a high pressure mercury lamp. The coating film was spray-developed with a 0.04% by weight aqueous potassium hydroxide solution at a temperature of 23 ° C and a developing pressure of 1 kgf/cm 2 (nozzle diameter of 1 mm), and baked at 220 ° C for 30 minutes to form a 200 X 200 μm point. Shaped pattern. Evaluation of Solvent Resistance Three sheets of 2,000 J/m2 radiation substrate were individually impregnated with N-methylpyrrolidone at 25 ° C (represented by NMP in Tables 18 and 19), 18% HC1 water-82-200807151 (80) The solution (indicated by HC1 in Tables 18 and 19) and the 5% aqueous KOH solution (expressed as KOH in Tables 18 and 19) were observed for 30 minutes, and the dot pattern before and after the immersion was observed by a scanning electron microscope. 〇 indicates that the pattern formation condition is good and the film thickness ratio before and after the immersion (film thickness after immersion X 100 / film thickness before immersion) is 95% or higher, and Δ indicates that the film thickness ratio before and after immersion is less than 95% or part The pattern disappears, and the X system indicates that all the patterns are peeled off from the substrate after the immersion. Adhesion Evaluation The liquid composition (R-42) was applied to the surface of a glass substrate by a spin coater and prebaked at 90 ° C for 4 minutes to form a 1.3 μm thick coating film. Thereafter, the substrate was cooled to room temperature, and the coating film was irradiated with a high pressure mercury lamp at 2,00 J/m2. The film was spray-developed with a 0.04% aqueous potassium hydroxide solution (nozzle diameter of 1 mm) at a temperature of 23 ° C and a developing pressure of 1 kgf/cm 2 , and baked at 22 ° C for 30 minutes. Thereafter, the coating film was cut into 100 squares in accordance with JIS K5400 to carry out an adhesion test. The lanthanide indicates no square flaking, the △ indicates that there are 1 to 10 squares peeling off, and the X system indicates the evaluation of the storage stability of more than 10 square flaking liquid compositions when the liquid composition (R- 42) When placed in a glass bottle and kept at a constant temperature and humidity device at 40 ° C for one week, the viscosity of the liquid composition before and after storage was measured to calculate the viscosity change rate (viscosity after storage X 100 / viscosity before storage) ). The viscosity of the pigment dispersion (R) and the solution viscosity of the alkali-soluble resin (B-7) -83-200807151 (81) remain unchanged after maintaining the conditions as described above. Examples 46 to 56 The liquid compositions (R-43) to (R-53) were prepared in the same manner as in Example 45, and the constituents of the different compositions were changed as shown in Table 14. The evaluation was carried out in the same manner as in Example 4, except that the liquid compositions (R-43) to (R-53) were used in place of the liquid composition (R-42). The solution viscosity of the alkali-soluble resins (B-8) to (B-14) used in Examples 50 to 56 remained unchanged even under the conditions used to evaluate the storage stability of the aforementioned liquid composition. The evaluation results are shown in Table 18. Example 5 7 1 part pigment dispersion (G), 15 parts (solid content) alkali-soluble resin (B-7) (in the form of a resin solution prepared in Synthesis Example 7), 5 parts of diisopentaerythritol Acrylate and 10 parts of pentaerythritol tetraacrylate as polyfunctional monomer (C), 5 parts of 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)- Butane-1-one and 5 parts of diethyl thioxanthone as a photopolymerization initiator (D) and propylene glycol monomethyl ether acetate as a solvent to prepare a liquid composition having a solid content of 25% (G-42). The pattern was formed and evaluated as in Example 45, except that the liquid composition (G-42) was used in place of the liquid composition (R-42). The viscosity of the pigment dispersion (G) used in the present invention remains unchanged even under the conditions used to evaluate the storage stability of the aforementioned liquid composition. The evaluation results are shown in Table 18. -84- 200807151 (82) Example 5 8 to 6 8 Liquid compositions (G-43) to (G-53) were prepared in the same manner as in Example 57. Changed like this. The evaluation was carried out in the same manner as in Example 4, except that the liquid compositions (G-43) to (G-53) were used to replace the liquid composition (R_42). The results of the evaluation are shown in Table 18. Comparative Examples 39 to 48 The liquid compositions (R-54) to (R-63) were prepared in the same manner as in Example 45, and the different constituent components were changed as shown in Table 16. The evaluation was carried out in the same manner as in Example 45, except that the liquid compositions (R_54) to (R-63) were used in place of the liquid composition (R-42). The evaluation results are shown in Table 19. Comparative Examples 49 to 58 The liquid compositions (G-54) to (G-63) were prepared in the same manner as in Example 57, and the different constituent components were changed as shown in Table 17. The evaluation was carried out in the same manner as in Example 4, except that the liquid compositions (G-54) to (G-63) were used to replace the liquid composition (R-42). The results of the evaluation are shown in Table 19. The polyfunctional monomer, photopolymerization initiator and additive in Tables 1 to 7 are shown below. -85- 200807151 (83) Polyfunctional monomer C-1: Diisopentaerythritol hexaacrylate C-2: Trimethylolpropane triacrylate C-3: Isopentenol tetraacrylate photopolymerization Starting agent D-1 : 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one D-2 : keto 2-indenyl-2-yl Amino-1-(4-cylinylphenyl) butyl ketone - Ι D-3 : thioxanthone oxime, 4'-bis(diethylamino)benzophenone D-4: 2, 4-Diethyl Additive Ε-1 : Double 酣A | Awakening varnish epoxy resin (Trademark: Japan Epoxy Resin C 〇. , Ltd. 1 57S65) E-2 : Trimellitic anhydride E-3 : N-( Trifluoromethanesulfonyloxy)bicyclo[2·2·1]heptane-S-ene-2,3-dimethylimineimine-86- 200807151 Additives (parts) 1 1 El(4) E-2 ( 2) E-3 (2) 1 1 1 1 1 1 1 Photopolymerization initiator (parts) in ro ^^ ^ rH ΓΟ 1 1 PP to cn rH ΓΠ 1 1 QQ Dl(5) D-3 (3) In ro rH Γ0 1 1 PP 1/) ro rH Γ0 1 1 PP Dl (5) ! D-3 (3) ! D-1(5) D-3 (3) m ro ιΗ Γ0 1 1 PP 1 Dl (5) D-3 (3) D-l(5) D-3 (3) D-l(5) D-3 (3) Dl(5) D-3 (3) Polyfunctional monomer (parts) 01(10) C-2( 5) C - l (10) C-2 ( 5) O LD H rH CN 1 l 〇UO LD tH *—一^—rH CN ll 〇U ✓-N. O LO H ---- ^ rH (N llo 〇〇lo H , ^—· Η (N 1 l UUO LO H ^ ----- H 03 » 1 UU ^^ v O ID rH ^^ H CN 1 I u 〇X------- o in rH H CN 1 1 o 〇---- ----VO If) rH ^^ ^—- Η (N 1 1 ua ^ O LD iH ----* ____* Η (N 1 1 ua Cl(10) C -2( 5) Alkali Soluble Resin (Parts) B-7(15) B-7(15) B-7(15) B-7(15) -1 B-7(15) B-8(15) B -9 (15) B-10(15) 1 B-ll(15) ! 1 B-12(15) 1 B-13(15) B-14 (15) Pigment dispersion (parts) (100) (100 ) (100) (100) (100) (100) (100) (100) (100) (100) (100) (100) pt; Pd & liquid composition CN inch 1 ro 1 1 LO inch 1 &amp R-46 R-47 CO inch 1 (T\ inch 1 o LO 1 (3⁄4 f-1 LD & (N LD 1 by ro LD 1 (3⁄4 Ex.45 Ex.46 Χ· w 00 inch X· W σ Χ · W o in XW rH LA >< W CN m XH m LO >< m inch LD X w LD LO >< W VD LO X w sac *: • occupies -87- 200807151(85) § Additives (parts) 1 1 Ε-1 (4) Ε-2(2) Ε-3 (2) 1 1 1 1 1 1 1 Photopolymerization initiator (parts) mm CN寸1 1 PP Lf) L0 CN inch 1 1 Ρ Ρ -V LD L0 CN inch 1 1 Ρ Ρ D-2(5) D-4 (5) D-2 (5) D-4(5) D- 2 (5) D-4 (5) D-2 (5) D-4 (5) lo m CN inch 1 1 QQ —V ^^ LD Ln og inch 1 1 PQ D-2 (5) D-4 ( 5) in lo CN ^ 1 1 PP D-2 (5) D-4(5) Polyfunctional monomer (parts) in ο rH γΗ ΓΟ υ ο cl( 5) 03 (10) cl( 5) C- 3 (10) ✓—ν LD Ο τΗ »—«· Η η 1 1 ου ιη ο ι—1 Η ΓΠ 1 1 UU ^—V ^-X ιη ο rH Η ΓΠ 1 1 UU LD Ο Η Η ΓΠ 1 1 UU Cl( 5) C-3 (10) Cl( 5) C-3 (10) LO O tH , —rH Γ0 1 1 uu Cl( 5) C-3 (10) LO O rH Η Γ0 1 1 ua Alkali Soluble Resin (Parts) Β-7 (15) Β-7(15) Β-7 (15) Β-7 (15) Β-7(15) Β-8 (15) Β-9(15) B- 10 (15) B-ll (15) 1 B-12(15) B-13 (15) B-14(15) Pigment dispersion (parts) (1〇〇) (100) (100) (100) 1 (100) (100) (100) (100) (100) (100) (100) (1Q0) ϋ Ο 0 Ο ο ϋ Ο 〇oo ϋ 0 Liquid composition CN inch 1 Ό m inch I Ο inch I ϋ LD Inch 1 ϋ VD inch 1 ο r- inch 1 Ο 0D inch 1 Ο ch inch 1 〇o LO 1 〇rH m 1 〇03 LO 1 0 ro LD 1 o Bu ID Χ· W 00 L0 XW σ\ ιη Χ· W ο VD χ· W γΗ VD χ· W CN νο >< W Γ0 KD χ· WK〇X· W Ln KD X' W KD ΚΩ X* w Ex. 67 00 VD X' W Ex·: Implementation ^ -88- 200807151(86) Additive (Yue) 1 1 El(4) E-2 (2) E-3 (2) 1 1 1 1 1 Photopolymerization initiator (parts) ) LD ΓΟ rH ΡΟ 1 1 Ρ Ρ mm Η Γ0 1 1 QP lo cn '—^ rH Γ0 1 1 PP m ro *—^ _____· Η ΓΠ QP Dl(5) D-3 (3) LD Γ0 rH ΓΠ 1 1 PQ in m ^^ tH P〇1 1 QQ lo n tH Γ0 1 1 PP in ro H m 1 1 PP mm tH Γ0 1 1 PQ Polyfunctional twin monomer (part) om rH , —〆^^ H CN UU Cl (10) C-2 ( 5) Cl(10) C-2( 5) o in rH ^ ^—✓ h eg \ 隹ua O if) rH , · V-✓ Η (N 1 1 ua -- —s. ------ O LD rH ------ H CN 1 1 au Cl (10) C-2( 5) ----- 0 lo rH ----* V—^ H CN 1 1 ou 〇m rH ^^ ^ H CN 1 1 UUO LD H ----- ^--- H CN 1 1 UU Alkali Soluble Resin (Parts) B-15(15) 1 B-15(15) j B-15 (15) B-15(15) B-15(15) B-16(15) B-17 (15) B-18 (15) i- 1 B-19 (15) B-20 ( 15) Pigment Dispersion (Parts) (100) (100) 1 (100) (100) (100) (100) (10 0) (100) (100) (100) aa Pi liquid composition 1 _1 inch LT) 1 LT) m 1 KD LD 1 LD 1 a 00 LO 1 σ> in 1 o VO 1 (3⁄4 iH 1 Oi KO I ΓΊ \D 1 σ\ cn X· H ◦ 〇W o C.Ex.41 CN >< W a C.Ex.43 W um inch W 〇VD inch X· W CJ inch X· w CJ 00 inch W A -89- 200807151 (87)

Additives (parts) 1 1 Ε-1(4) Ε-2 (2) Ε-3(2) 1 1 1 1 1 Photopolymerization initiator (parts) D-2(5) D-4 (5) D -2(5) D-4 (5) LD LT) 1 1 Ρ Ρ if) LD CM inch 1 1 Ρ Ρ ιη ιη 'w^ ^ 03 ^ 1 1 QQ ! D-2(5) D-4 (5 D-2 (5) D-4 (5) m lo -----^ ^ (N inch 1 1 PP UO LO CN ^ 1 1 QQ Ln LO CN ^ 1 1 QP Polyfunctional monomer (parts)丨ΙΤ) 〇γΗ 〆γΗ ΓΠ 1 1 υ )Li) Ο γΗ ^—✓ γΗ Γ〇1 1 υ Ο C-1( 5) 03 (10) Cl( 5) 03 (10) Cl( 5) C- 3 (10) C -1( 5 > C-3 (10) Cl ( 5) C-3(10) Cl( 5) C-3 (10) ----- in o rH ^^ v—- rH Γ0 1 1 〇U x LT) O rH ----- rH Γ0 1 1 uu Alkali-soluble resin (parts) Β-15(15) 1 Β-15(15) 1 Β-15(15) Β-15( 15) Β-15(15) B-16 (15) B-17 (15) Γ ! B~18(15) B-19(15) B-20 (15) Pigment dispersion (parts) (1〇〇 ) ί (100) ! (100) (100) (100) (100) (100) (100) (100) (100) 〇ο ϋ α Ο ϋ 0 〇ϋ 〇Liquid composition LD 1 〇LD ID 1 ο ^0 LD 1 Ο r- LD 1 Ο 00 ιη 1 Ο CTi m 1 〇〇VD 1 ϋ H KD 1 〇CN VD 1 〇m VD 1 〇σ\ inch X· W 〇〇ω &gt ; < W ο τΗ m >< Η υ CN LD χ· Η 00 00 LD XW 寸 inch in X pq 〇LD LD X· wu U5 LD X* W 〇LD >< W a 00 in >< U 孽陛 Bowl:·Ώϋ -90- 200807151 (88) Table 18 Storage stability of solvent-resistant adhesive liquid composition NMP HC1 KOH Ex.45 〇〇〇〇100 Ex.46 〇〇〇〇100 Ex .47 〇〇〇〇100 Ex. 48 〇〇〇〇100 Ex. 4 9 〇〇〇〇100 Ex. 5 0 〇〇〇〇100 Ex.51 〇〇〇o 100 Ex. 52 〇〇〇〇100 Ex 53 〇〇〇〇100 Ex. 54 〇〇〇〇100 Ex. 55 〇〇〇〇100 Ex. 56 〇〇〇〇100 Ex. 57 〇〇〇〇100 Ex.58 〇〇〇〇100 Ex. 59 〇〇〇〇100 Ex. 6 0 〇〇〇〇100 Ex. 61 〇〇〇〇100 Ex. 62 〇〇〇〇100 Ex. 63 〇〇〇〇100 Ex. 64 o 〇〇〇100 Ex. 65 o 〇〇〇100 Ex. 66 〇〇〇〇100 Ex. 67 〇〇〇〇100 Ex. 68 〇〇〇〇100

Ex.: Example-91 - 200807151 (89) Table 19 Storage stability of solvent-resistant adhesive liquid composition NMP HC1 KOH C. Ex.3 9 〇〇0 〇280 C. Ex.4 0 〇〇〇〇 304 C.Ex.41 〇〇〇〇334 C.Ex.42 〇〇〇〇456 C.Ex.43 〇〇〇〇345 C.Ex.44 〇〇〇〇298 C.Ex.45 XXXX 100 C. Ex.46 X Δ XX 100 C.Ex.47 X Δ XX 100 C.Ex.48 XXXX 100 C.Ex.49 〇〇〇〇350 C.Ex.50 〇〇〇〇460 C.Ex.51 〇〇 〇〇315 C.Ex.52 〇〇〇〇316 C.Ex.53 〇〇〇〇317 C.Ex.54 〇〇〇〇406 C.Ex.55 XXXX 100 C.Ex.56 X Δ XX 100 C .Ex.57 XXXX 100 C.Ex.58 XXXX 100 C.Ex.:Comparative Example - 92-

Claims (1)

200807151 (1) X. Patent application scope 1 · A radiation-sensitive composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, and (D) a photopolymerization initiator, Wherein the alkali-soluble resin (B) is a copolymer of at least one first unsaturated compound and at least one second unsaturated compound, the first unsaturated compound (M) being selected from the group consisting of unsaturated carboxylic acids, not a saturated carboxylic anhydride and an unsaturated phenol compound selected from the group consisting of (b2) an unsaturated compound having an oxetane backbone and (b3) an unsaturated compound having a tetrahydrofuran backbone, and the radiation The sensitive composition is used to form a colored layer. 2. The radiation-sensitive composition of claim 1, wherein the alkali-soluble resin (B) is a first unsaturated compound and the second unsaturated compound has an oxetane backbone A copolymer of a saturated compound or a copolymer of a first unsaturated compound and an unsaturated compound having a tetrahydrofuran backbone as a second unsaturated compound. 3. The radiation-sensitive composition of claim 1, wherein the alkali-soluble resin (B) is a first unsaturated compound and the second unsaturated compound has an oxetane backbone A copolymer of a saturated compound and an unsaturated compound having a tetrahydrofuran backbone. A color filter having a colored layer formed of a radiation-sensitive composition for forming a coloring layer according to any one of claims 1 to 3. A color liquid crystal display device comprising the color filter of item 4 of the patent application. -93- 200807151 Seven designated representatives: (1) The representative representative of the case is: No (2), the representative symbol of the representative figure is a simple description: No. 8. If there is a chemical formula in this case, please reveal the characteristics that can best show the invention. Chemical formula: none