TW200744242A - Linear evaporator for manufacturing organic light emitting device using crucibles - Google Patents

Linear evaporator for manufacturing organic light emitting device using crucibles

Info

Publication number
TW200744242A
TW200744242A TW096117672A TW96117672A TW200744242A TW 200744242 A TW200744242 A TW 200744242A TW 096117672 A TW096117672 A TW 096117672A TW 96117672 A TW96117672 A TW 96117672A TW 200744242 A TW200744242 A TW 200744242A
Authority
TW
Taiwan
Prior art keywords
crucibles
light emitting
emitting device
organic light
housing
Prior art date
Application number
TW096117672A
Other languages
English (en)
Other versions
TWI364125B (en
Inventor
Il-Ho Noh
Original Assignee
Semes Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semes Co Ltd filed Critical Semes Co Ltd
Publication of TW200744242A publication Critical patent/TW200744242A/zh
Application granted granted Critical
Publication of TWI364125B publication Critical patent/TWI364125B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
TW096117672A 2006-05-23 2007-05-17 Linear evaporator for manufacturing organic light emitting device using crucible TWI364125B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060046222A KR100784953B1 (ko) 2006-05-23 2006-05-23 다수의 도가니를 이용한 유기발광소자 박막 제작을 위한선형증발원

Publications (2)

Publication Number Publication Date
TW200744242A true TW200744242A (en) 2007-12-01
TWI364125B TWI364125B (en) 2012-05-11

Family

ID=38748342

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096117672A TWI364125B (en) 2006-05-23 2007-05-17 Linear evaporator for manufacturing organic light emitting device using crucible

Country Status (5)

Country Link
US (1) US20070272156A1 (zh)
JP (1) JP4876237B2 (zh)
KR (1) KR100784953B1 (zh)
CN (1) CN101078104A (zh)
TW (1) TWI364125B (zh)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007035166B4 (de) * 2007-07-27 2010-07-29 Createc Fischer & Co. Gmbh Hochtemperatur-Verdampferzelle mit parallel geschalteten Heizbereichen, Verfahren zu deren Betrieb und deren Verwendung in Beschichtungsanlagen
JP5502069B2 (ja) * 2008-04-15 2014-05-28 グローバル ソーラー エナジー インコーポレーテッド 薄膜太陽電池セルを製造するための装置および方法
WO2009134041A2 (en) * 2008-04-29 2009-11-05 Sunic System. Ltd. Evaporator and vacuum deposition apparatus having the same
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
US20100247809A1 (en) * 2009-03-31 2010-09-30 Neal James W Electron beam vapor deposition apparatus for depositing multi-layer coating
JP5400653B2 (ja) * 2010-02-16 2014-01-29 株式会社日立ハイテクノロジーズ 真空蒸着装置
JP2011176148A (ja) * 2010-02-24 2011-09-08 Nitto Denko Corp 太陽電池モジュールの製造方法およびそれを用いて得られた太陽電池モジュール
CN102212784A (zh) * 2010-04-12 2011-10-12 无锡尚德太阳能电力有限公司 沉积蒸发源
KR101730498B1 (ko) * 2010-10-22 2017-04-27 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
EP2447393A1 (en) * 2010-10-27 2012-05-02 Applied Materials, Inc. Evaporation system and method
JP5715802B2 (ja) * 2010-11-19 2015-05-13 株式会社半導体エネルギー研究所 成膜装置
JP6049355B2 (ja) * 2012-08-29 2016-12-21 キヤノントッキ株式会社 蒸発源
EP2921572B1 (en) * 2012-11-14 2020-06-24 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Film deposition device
CN103898450B (zh) * 2012-12-25 2017-06-13 北京创昱科技有限公司 一种铜铟镓硒共蒸发线性源装置及其使用方法
KR102227546B1 (ko) * 2014-01-20 2021-03-15 주식회사 선익시스템 대용량 증발원 및 이를 포함하는 증착장치
CN105102087A (zh) * 2014-03-01 2015-11-25 Hzo股份有限公司 优化通过材料沉积设备的前驱材料的蒸发的船形器皿
CN104178734B (zh) * 2014-07-21 2016-06-15 京东方科技集团股份有限公司 蒸发镀膜装置
JP6291696B2 (ja) * 2014-07-28 2018-03-14 株式会社Joled 蒸着装置および蒸発源
WO2016087005A1 (en) * 2014-12-05 2016-06-09 Applied Materials, Inc. Material deposition system and method for depositing material in a material deposition system
KR101649689B1 (ko) * 2015-04-14 2016-08-19 한국표준과학연구원 유도 가열 선형 증발 증착 장치
CN105112855A (zh) * 2015-09-29 2015-12-02 京东方科技集团股份有限公司 蒸镀坩埚和蒸镀系统
JP2017157782A (ja) * 2016-03-04 2017-09-07 ソニー株式会社 有機電界発光素子、および有機電界発光素子の製造方法
CN105624611B (zh) * 2016-03-29 2018-04-24 苏州方昇光电股份有限公司 一种旋转式有机材料蒸发装置
CN107058957A (zh) * 2017-04-18 2017-08-18 武汉华星光电技术有限公司 一种蒸发源装置
US11396694B2 (en) 2017-07-18 2022-07-26 Boe Technology Group Co., Ltd. Evaporation crucible and evaporation apparatus
CN111051564A (zh) * 2017-09-14 2020-04-21 艾尔法普拉斯株式会社 真空蒸发源
CN110055498B (zh) * 2018-01-19 2022-08-12 京东方科技集团股份有限公司 面蒸镀源及其制作方法、蒸镀方法、蒸镀装置
DE102020133979A1 (de) 2020-12-17 2022-06-23 Phoenix Silicon International Corp. Tiegel und aufdampfvorrichtung
CN114836721B (zh) * 2022-04-25 2024-01-26 山东国晶新材料有限公司 一种用于水平横置的陶瓷点源

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3904607A1 (de) * 1989-02-16 1990-08-23 Leybold Ag Direkt beheizbarer schmelzenbehaelter fuer induktionsschmelzoefen
US5525156A (en) * 1989-11-24 1996-06-11 Research Development Corporation Apparatus for epitaxially growing a chemical compound crystal
JP3371454B2 (ja) * 1993-01-13 2003-01-27 石川島播磨重工業株式会社 連続真空蒸着装置
US5803976A (en) * 1993-11-09 1998-09-08 Imperial Chemical Industries Plc Vacuum web coating
US5616180A (en) * 1994-12-22 1997-04-01 Northrop Grumman Corporation Aparatus for varying the flux of a molecular beam
WO1999024366A1 (en) * 1997-11-12 1999-05-20 P.P.A. Water Industries (Proprietary Limited) Means for chemical water treatment
US6068441A (en) * 1997-11-21 2000-05-30 Asm America, Inc. Substrate transfer system for semiconductor processing equipment
US6310281B1 (en) * 2000-03-16 2001-10-30 Global Solar Energy, Inc. Thin-film, flexible photovoltaic module
US20040035360A1 (en) * 2002-05-17 2004-02-26 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
US20030221620A1 (en) * 2002-06-03 2003-12-04 Semiconductor Energy Laboratory Co., Ltd. Vapor deposition device
TWI277363B (en) * 2002-08-30 2007-03-21 Semiconductor Energy Lab Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
KR100532657B1 (ko) * 2002-11-18 2005-12-02 주식회사 야스 다증발원을 이용한 동시증착에서 균일하게 혼합된 박막의증착을 위한 증발 영역조절장치
US20080282983A1 (en) * 2003-12-09 2008-11-20 Braddock Iv Walter David High Temperature Vacuum Evaporation Apparatus
KR20060030426A (ko) * 2004-10-05 2006-04-10 삼성에스디아이 주식회사 진공 증착장치 및 진공 증착 방법
JP4552184B2 (ja) * 2004-10-22 2010-09-29 富士電機ホールディングス株式会社 有機発光素子用基板に有機層を蒸着させる装置および方法
KR100592304B1 (ko) * 2004-11-05 2006-06-21 삼성에스디아이 주식회사 가열 용기와 이를 구비한 증착 장치

Also Published As

Publication number Publication date
KR20070113410A (ko) 2007-11-29
TWI364125B (en) 2012-05-11
JP2007314873A (ja) 2007-12-06
KR100784953B1 (ko) 2007-12-11
CN101078104A (zh) 2007-11-28
US20070272156A1 (en) 2007-11-29
JP4876237B2 (ja) 2012-02-15

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