TW200743819A - Drawing system - Google Patents
Drawing systemInfo
- Publication number
- TW200743819A TW200743819A TW096110742A TW96110742A TW200743819A TW 200743819 A TW200743819 A TW 200743819A TW 096110742 A TW096110742 A TW 096110742A TW 96110742 A TW96110742 A TW 96110742A TW 200743819 A TW200743819 A TW 200743819A
- Authority
- TW
- Taiwan
- Prior art keywords
- exposure
- exposure operation
- light emission
- scanning velocity
- scanning
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006147878A JP2007316473A (ja) | 2006-05-29 | 2006-05-29 | 描画システム |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200743819A true TW200743819A (en) | 2007-12-01 |
Family
ID=38850363
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096110742A TW200743819A (en) | 2006-05-29 | 2007-03-28 | Drawing system |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2007316473A (ko) |
KR (1) | KR20070114629A (ko) |
CN (1) | CN101082781B (ko) |
TW (1) | TW200743819A (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014066954A (ja) * | 2012-09-27 | 2014-04-17 | Dainippon Screen Mfg Co Ltd | 描画装置、および、描画方法 |
KR20210154290A (ko) * | 2020-06-11 | 2021-12-21 | 삼성디스플레이 주식회사 | 커패시턴스 산출 방법 및 기판의 두께 산출 방법 |
JP7471175B2 (ja) | 2020-08-20 | 2024-04-19 | 株式会社オーク製作所 | 露光装置および露光方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005300805A (ja) * | 2004-04-09 | 2005-10-27 | Pentax Corp | 描画装置 |
JP2006019478A (ja) * | 2004-07-01 | 2006-01-19 | Pentax Corp | 描画システム |
JP4532202B2 (ja) * | 2004-08-11 | 2010-08-25 | 株式会社オーク製作所 | 描画装置 |
-
2006
- 2006-05-29 JP JP2006147878A patent/JP2007316473A/ja active Pending
-
2007
- 2007-03-28 TW TW096110742A patent/TW200743819A/zh unknown
- 2007-04-18 KR KR1020070038021A patent/KR20070114629A/ko not_active Application Discontinuation
- 2007-05-29 CN CN2007101046801A patent/CN101082781B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101082781B (zh) | 2011-01-19 |
JP2007316473A (ja) | 2007-12-06 |
KR20070114629A (ko) | 2007-12-04 |
CN101082781A (zh) | 2007-12-05 |
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