TW200734810A - Method and apparatus for evaluating photomask, and method for manufacturing semiconductor device - Google Patents

Method and apparatus for evaluating photomask, and method for manufacturing semiconductor device

Info

Publication number
TW200734810A
TW200734810A TW095145690A TW95145690A TW200734810A TW 200734810 A TW200734810 A TW 200734810A TW 095145690 A TW095145690 A TW 095145690A TW 95145690 A TW95145690 A TW 95145690A TW 200734810 A TW200734810 A TW 200734810A
Authority
TW
Taiwan
Prior art keywords
photomask
evaluating
semiconductor device
manufacturing semiconductor
pattern
Prior art date
Application number
TW095145690A
Other languages
English (en)
Other versions
TWI322329B (zh
Inventor
Masamitsu Itoh
Original Assignee
Toshiba Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Kk filed Critical Toshiba Kk
Publication of TW200734810A publication Critical patent/TW200734810A/zh
Application granted granted Critical
Publication of TWI322329B publication Critical patent/TWI322329B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G03F1/86—Inspecting by charged particle beam [CPB]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW095145690A 2005-12-12 2006-12-07 Method and apparatus for evaluating photomask, and method for manufacturing semiconductor device TW200734810A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005357935A JP4709639B2 (ja) 2005-12-12 2005-12-12 マスクパターン評価方法及び評価装置

Publications (2)

Publication Number Publication Date
TW200734810A true TW200734810A (en) 2007-09-16
TWI322329B TWI322329B (zh) 2010-03-21

Family

ID=38195373

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095145690A TW200734810A (en) 2005-12-12 2006-12-07 Method and apparatus for evaluating photomask, and method for manufacturing semiconductor device

Country Status (4)

Country Link
US (1) US8189903B2 (zh)
JP (1) JP4709639B2 (zh)
KR (1) KR100832660B1 (zh)
TW (1) TW200734810A (zh)

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JP4816225B2 (ja) * 2006-04-27 2011-11-16 凸版印刷株式会社 レベンソン型位相シフトマスク
JP4675854B2 (ja) 2006-07-25 2011-04-27 株式会社東芝 パターン評価方法と評価装置及びパターン評価プログラム
US8335369B2 (en) * 2007-02-28 2012-12-18 Taiwan Semiconductor Manufacturing Company, Ltd. Mask defect analysis
JP4846635B2 (ja) * 2007-03-22 2011-12-28 株式会社東芝 パターン情報生成方法
JP4856047B2 (ja) * 2007-11-12 2012-01-18 株式会社東芝 マスクパターン寸法検査方法およびマスクパターン寸法検査装置
JP2010038944A (ja) 2008-07-31 2010-02-18 Toshiba Corp フォトマスクの製造方法及びこのフォトマスクを用いた半導体デバイスの製造方法
US8948513B2 (en) * 2009-01-27 2015-02-03 Apple Inc. Blurring based content recognizer
JP5672800B2 (ja) * 2010-07-02 2015-02-18 凸版印刷株式会社 フォトマスクの評価システム及びその方法
US8905314B2 (en) 2010-09-30 2014-12-09 Apple Inc. Barcode recognition using data-driven classifier
US8901492B1 (en) 2013-07-16 2014-12-02 Taiwan Semiconductor Manufacturing Company, Ltd. Three-dimensional semiconductor image reconstruction apparatus and method
KR102170143B1 (ko) 2013-08-19 2020-10-26 삼성전자주식회사 노출 허용도 오차 및 레지스트레이션 오차가 보정된 포토마스크 및 그의 레지스트레이션 보정방법
KR102154075B1 (ko) 2013-10-21 2020-09-09 삼성전자주식회사 반도체 소자의 검사 방법 및 반도체 검사 시스템
KR102085522B1 (ko) 2013-11-14 2020-03-06 삼성전자 주식회사 패턴의 결함 탐지 방법
US20220214610A1 (en) * 2019-05-02 2022-07-07 Asml Netherlands B.V. A patterning device
CN112230507A (zh) * 2020-10-22 2021-01-15 泉芯集成电路制造(济南)有限公司 光学邻近矫正模型构建方法、装置及计算机设备

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JP3339174B2 (ja) * 1993-11-08 2002-10-28 ソニー株式会社 フォトマスクの製造方法、露光方法及び半導体装置の製造方法
US6091845A (en) * 1998-02-24 2000-07-18 Micron Technology, Inc. Inspection technique of photomask
US6999611B1 (en) * 1999-02-13 2006-02-14 Kla-Tencor Corporation Reticle defect detection using simulation
JP4158266B2 (ja) * 1999-03-11 2008-10-01 凸版印刷株式会社 フォトマスク外観検査装置
JP4597509B2 (ja) 1999-08-26 2010-12-15 株式会社ナノジオメトリ研究所 パターン検査装置およびパターン検査方法
US7120285B1 (en) * 2000-02-29 2006-10-10 Advanced Micro Devices, Inc. Method for evaluation of reticle image using aerial image simulator
US6559048B1 (en) * 2001-05-30 2003-05-06 Lsi Logic Corporation Method of making a sloped sidewall via for integrated circuit structure to suppress via poisoning
US7382447B2 (en) * 2001-06-26 2008-06-03 Kla-Tencor Technologies Corporation Method for determining lithographic focus and exposure
JP2003207879A (ja) * 2002-01-17 2003-07-25 Sony Corp 位相シフトマスクの検査方法、位相シフトマスクの作製方法、位相シフトマスクによるパターン露光方法
JP3708058B2 (ja) * 2002-02-28 2005-10-19 株式会社東芝 フォトマスクの製造方法およびそのフォトマスクを用いた半導体装置の製造方法
US7136796B2 (en) * 2002-02-28 2006-11-14 Timbre Technologies, Inc. Generation and use of integrated circuit profile-based simulation information
US6783904B2 (en) * 2002-05-17 2004-08-31 Freescale Semiconductor, Inc. Lithography correction method and device
TWI229894B (en) * 2002-09-05 2005-03-21 Toshiba Corp Mask defect inspecting method, semiconductor device manufacturing method, mask defect inspecting apparatus, generating method of defect influence map, and computer program product
JP4302965B2 (ja) * 2002-11-01 2009-07-29 株式会社日立ハイテクノロジーズ 半導体デバイスの製造方法及びその製造システム
JP3825744B2 (ja) * 2002-12-02 2006-09-27 株式会社東芝 フォトマスクの製造方法及び半導体装置の製造方法
JP2004330310A (ja) * 2003-04-30 2004-11-25 Ricoh Co Ltd 微細形状作製方法
JP2005189491A (ja) * 2003-12-25 2005-07-14 Sii Nanotechnology Inc 転写もしくは光強度シミュレーションを用いたフォトマスクの欠陥修正方法
JP4432575B2 (ja) * 2004-03-29 2010-03-17 凸版印刷株式会社 パターン画像判定方法
US7313781B2 (en) * 2004-05-28 2007-12-25 Kabushiki Kaisha Toshiba Image data correction method, lithography simulation method, image data correction system, program, mask and method of manufacturing a semiconductor device
US20080233487A1 (en) * 2007-03-21 2008-09-25 Taiwan Semiconductor Manufacturing Company, Ltd. Method and System for Optimizing Lithography Focus and/or Energy Using a Specially-Designed Optical Critical Dimension Pattern
JP4856047B2 (ja) * 2007-11-12 2012-01-18 株式会社東芝 マスクパターン寸法検査方法およびマスクパターン寸法検査装置
JP5103219B2 (ja) * 2008-02-22 2012-12-19 株式会社日立ハイテクノロジーズ パターン寸法計測方法

Also Published As

Publication number Publication date
US20070150850A1 (en) 2007-06-28
US8189903B2 (en) 2012-05-29
KR100832660B1 (ko) 2008-05-27
JP2007163686A (ja) 2007-06-28
TWI322329B (zh) 2010-03-21
JP4709639B2 (ja) 2011-06-22
KR20070062427A (ko) 2007-06-15

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MM4A Annulment or lapse of patent due to non-payment of fees