TW200733555A - Film bulk acoustic resonator - Google Patents

Film bulk acoustic resonator

Info

Publication number
TW200733555A
TW200733555A TW095126420A TW95126420A TW200733555A TW 200733555 A TW200733555 A TW 200733555A TW 095126420 A TW095126420 A TW 095126420A TW 95126420 A TW95126420 A TW 95126420A TW 200733555 A TW200733555 A TW 200733555A
Authority
TW
Taiwan
Prior art keywords
bulk acoustic
acoustic resonator
film bulk
ellipse
constituted
Prior art date
Application number
TW095126420A
Other languages
English (en)
Other versions
TWI328346B (zh
Inventor
Shuichi Oka
Terukazu Ohno
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of TW200733555A publication Critical patent/TW200733555A/zh
Application granted granted Critical
Publication of TWI328346B publication Critical patent/TWI328346B/zh

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02086—Means for compensation or elimination of undesirable effects
    • H03H9/02118—Means for compensation or elimination of undesirable effects of lateral leakage between adjacent resonators
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02086—Means for compensation or elimination of undesirable effects
    • H03H9/02102—Means for compensation or elimination of undesirable effects of temperature influence
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02086—Means for compensation or elimination of undesirable effects
    • H03H9/02133—Means for compensation or elimination of undesirable effects of stress
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/125—Driving means, e.g. electrodes, coils
    • H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
    • H03H9/132—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials characterized by a particular shape
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
    • H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
    • H03H9/173—Air-gaps

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
TW095126420A 2005-09-09 2006-07-19 Film bulk acoustic resonator TW200733555A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005261573A JP4687345B2 (ja) 2005-09-09 2005-09-09 薄膜バルク音響共振器

Publications (2)

Publication Number Publication Date
TW200733555A true TW200733555A (en) 2007-09-01
TWI328346B TWI328346B (zh) 2010-08-01

Family

ID=37835538

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095126420A TW200733555A (en) 2005-09-09 2006-07-19 Film bulk acoustic resonator

Country Status (3)

Country Link
JP (1) JP4687345B2 (zh)
TW (1) TW200733555A (zh)
WO (1) WO2007029409A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200031541A (ko) * 2018-09-14 2020-03-24 스카이워크스 솔루션즈, 인코포레이티드 희생 층 에칭을 위한 릴리스 포트들의 위치들
CN113556100B (zh) * 2021-07-30 2022-06-21 武汉衍熙微器件有限公司 体声波谐振器

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3969224B2 (ja) * 2002-01-08 2007-09-05 株式会社村田製作所 圧電共振子及びそれを用いた圧電フィルタ・デュプレクサ・通信装置
JP4488167B2 (ja) * 2003-12-18 2010-06-23 Ｔｄｋ株式会社 フィルタ
JP4534158B2 (ja) * 2003-12-19 2010-09-01 宇部興産株式会社 圧電薄膜デバイスの製造方法
JP3945486B2 (ja) * 2004-02-18 2007-07-18 ソニー株式会社 薄膜バルク音響共振子およびその製造方法
JP2005348357A (ja) * 2004-06-07 2005-12-15 Sony Corp 薄膜バルク音響共振器

Also Published As

Publication number Publication date
TWI328346B (zh) 2010-08-01
JP4687345B2 (ja) 2011-05-25
JP2007074609A (ja) 2007-03-22
WO2007029409A1 (ja) 2007-03-15

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees