TW200712786A - Lithographic apparatus immersion damage control - Google Patents

Lithographic apparatus immersion damage control

Info

Publication number
TW200712786A
TW200712786A TW095121789A TW95121789A TW200712786A TW 200712786 A TW200712786 A TW 200712786A TW 095121789 A TW095121789 A TW 095121789A TW 95121789 A TW95121789 A TW 95121789A TW 200712786 A TW200712786 A TW 200712786A
Authority
TW
Taiwan
Prior art keywords
fluid supply
substrate table
supply system
substrate
lithographic apparatus
Prior art date
Application number
TW095121789A
Other languages
English (en)
Other versions
TWI338818B (en
Inventor
Henrikus Herman Marie Cox
Der Meulen Frits Van
Martijn Houkes
Vliet Robertus Johannes Van
Stoyan Nihtianov
Petrus Wilhelmus Josephus Maria Kemper
Roland Petrus Hendrikus Hanegraaf
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200712786A publication Critical patent/TW200712786A/zh
Application granted granted Critical
Publication of TWI338818B publication Critical patent/TWI338818B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70533—Controlling abnormal operating mode, e.g. taking account of waiting time, decision to rework or rework flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
TW095121789A 2005-06-29 2006-06-16 Lithographic apparatus immersion damage control TWI338818B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/169,298 US7170583B2 (en) 2005-06-29 2005-06-29 Lithographic apparatus immersion damage control

Publications (2)

Publication Number Publication Date
TW200712786A true TW200712786A (en) 2007-04-01
TWI338818B TWI338818B (en) 2011-03-11

Family

ID=37052587

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095121789A TWI338818B (en) 2005-06-29 2006-06-16 Lithographic apparatus immersion damage control

Country Status (7)

Country Link
US (1) US7170583B2 (zh)
EP (2) EP1739489B1 (zh)
JP (1) JP4610526B2 (zh)
KR (2) KR100794688B1 (zh)
CN (2) CN101424884B (zh)
SG (1) SG128650A1 (zh)
TW (1) TWI338818B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI384318B (zh) * 2007-10-30 2013-02-01 Asml Netherlands Bv 浸潤式微影裝置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
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US7291569B2 (en) * 2005-06-29 2007-11-06 Infineon Technologies Ag Fluids for immersion lithography systems
SG151198A1 (en) 2007-09-27 2009-04-30 Asml Netherlands Bv Methods relating to immersion lithography and an immersion lithographic apparatus
NL1036009A1 (nl) * 2007-10-05 2009-04-07 Asml Netherlands Bv An Immersion Lithography Apparatus.
JP2009094254A (ja) * 2007-10-05 2009-04-30 Canon Inc 液浸露光装置およびデバイス製造方法
NL1036579A1 (nl) * 2008-02-19 2009-08-20 Asml Netherlands Bv Lithographic apparatus and methods.
NL2007279A (en) * 2010-09-28 2012-03-29 Asml Netherlands Bv Method for calibrating a target surface of a position measurement system, position measurement system, and lithographic apparatus.
NL2009692A (en) * 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
CN105739245B (zh) * 2014-12-12 2018-12-14 上海微电子装备（集团）股份有限公司 一种浸没光刻机浸没单元防碰撞装置及方法
US10471610B2 (en) 2015-06-16 2019-11-12 Samsung Electronics Co., Ltd. Robot arm having weight compensation mechanism
JP7015147B2 (ja) * 2017-11-06 2022-02-02 キヤノン株式会社 インプリント装置および物品製造方法
CN110609448B (zh) * 2018-06-14 2020-12-01 上海微电子装备（集团）股份有限公司 一种硅片边缘保护装置
US11131931B2 (en) * 2018-06-29 2021-09-28 Taiwan Semiconductor Manufacturing Co., Ltd. Fluidic leakage handling for semiconductor apparatus
JP7471171B2 (ja) 2020-08-17 2024-04-19 東京エレクトロン株式会社 基板処理装置

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US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
US4918977A (en) * 1986-09-30 1990-04-24 Tatsuta Electric Wire And Cable Co., Ltd. Liquid leakage detector line
US5177996A (en) * 1991-11-21 1993-01-12 W. L. Gore & Associates, Inc. Liquid leak detection cable
CN2212779Y (zh) * 1994-12-09 1995-11-15 水利部能源部地质勘探机电研究所 一种液位传感器
US5825483A (en) * 1995-12-19 1998-10-20 Cognex Corporation Multiple field of view calibration plate having a reqular array of features for use in semiconductor manufacturing
JPH09248725A (ja) * 1996-03-13 1997-09-22 Nikon Corp ステージ装置
JP3526174B2 (ja) * 1997-04-14 2004-05-10 キヤノン株式会社 半導体露光装置およびデバイス製造方法
WO1999049504A1 (fr) 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
JP2000076707A (ja) * 1998-08-31 2000-03-14 Sony Corp 光学記録媒体作製用原盤記録装置
EP1037117A3 (en) 1999-03-08 2003-11-12 ASML Netherlands B.V. Off-axis levelling in lithographic projection apparatus
JP2002280282A (ja) * 2001-03-16 2002-09-27 Union Optical Co Ltd ウェハのキャリブレーション方法及び装置
TWI232357B (en) * 2002-11-12 2005-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1420299B1 (en) * 2002-11-12 2011-01-05 ASML Netherlands B.V. Immersion lithographic apparatus and device manufacturing method
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
KR100588124B1 (ko) * 2002-11-12 2006-06-09 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스제조방법
KR101643112B1 (ko) * 2003-02-26 2016-07-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP2282233A1 (en) * 2003-05-13 2011-02-09 ASML Netherlands BV Lithographic apparatus
EP1486828B1 (en) * 2003-06-09 2013-10-09 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7779781B2 (en) * 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101475995B1 (ko) * 2003-08-21 2014-12-23 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
TWI361450B (en) * 2003-10-31 2012-04-01 Nikon Corp Platen, stage device, exposure device and exposure method
US7057702B2 (en) * 2004-06-23 2006-06-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7330238B2 (en) * 2005-03-28 2008-02-12 Asml Netherlands, B.V. Lithographic apparatus, immersion projection apparatus and device manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI384318B (zh) * 2007-10-30 2013-02-01 Asml Netherlands Bv 浸潤式微影裝置

Also Published As

Publication number Publication date
EP1962140A3 (en) 2010-07-28
CN1892435A (zh) 2007-01-10
JP4610526B2 (ja) 2011-01-12
CN1892435B (zh) 2010-06-09
KR20070087543A (ko) 2007-08-28
US7170583B2 (en) 2007-01-30
SG128650A1 (en) 2007-01-30
CN101424884B (zh) 2011-06-01
JP2007013159A (ja) 2007-01-18
US20070002294A1 (en) 2007-01-04
EP1739489A3 (en) 2007-06-06
CN101424884A (zh) 2009-05-06
TWI338818B (en) 2011-03-11
EP1739489A2 (en) 2007-01-03
EP1962140B1 (en) 2013-07-31
KR20070001829A (ko) 2007-01-04
KR100775542B1 (ko) 2007-11-09
EP1739489B1 (en) 2011-05-11
EP1962140A2 (en) 2008-08-27
KR100794688B1 (ko) 2008-01-14

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