TW200712783A - 1x magnification exposure method and 1x magnification exposure apparatus - Google Patents

1x magnification exposure method and 1x magnification exposure apparatus

Info

Publication number
TW200712783A
TW200712783A TW094130599A TW94130599A TW200712783A TW 200712783 A TW200712783 A TW 200712783A TW 094130599 A TW094130599 A TW 094130599A TW 94130599 A TW94130599 A TW 94130599A TW 200712783 A TW200712783 A TW 200712783A
Authority
TW
Taiwan
Prior art keywords
mask
wafer
stage
patterns
ray
Prior art date
Application number
TW094130599A
Other languages
English (en)
Chinese (zh)
Inventor
Tadahiro Ohmi
Shigetoshi Sugawa
Kimio Yanagida
Kiwamu Takehisa
Original Assignee
Tadahiro Ohmi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tadahiro Ohmi filed Critical Tadahiro Ohmi
Publication of TW200712783A publication Critical patent/TW200712783A/zh

Links

TW094130599A 2004-03-17 2005-09-06 1x magnification exposure method and 1x magnification exposure apparatus TW200712783A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004076786A JP2005268439A (ja) 2004-03-17 2004-03-17 等倍ｘ線露光方法及び等倍ｘ線露光装置

Publications (1)

Publication Number Publication Date
TW200712783A true TW200712783A (en) 2007-04-01

Family

ID=35092691

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094130599A TW200712783A (en) 2004-03-17 2005-09-06 1x magnification exposure method and 1x magnification exposure apparatus

Country Status (2)

Country Link
JP (1) JP2005268439A (ja)
TW (1) TW200712783A (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007029303A1 (ja) * 2005-09-05 2007-03-15 Tadahiro Ohmi 等倍ｘ線露光方法及び等倍ｘ線露光装置
FR3000698B1 (fr) * 2013-01-09 2015-02-06 Phidias Technologies Fabrication d'un objet en volume par lithographie, a resolution spatiale amelioree

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0492411A (ja) * 1990-08-08 1992-03-25 Fujitsu Ltd Ｘ線マスク及びその製造方法及びｘ線露光装置
JPH0511434U (ja) * 1991-07-24 1993-02-12 石川島播磨重工業株式会社 Ｓｏｒ露光用のマスク構造
US5235626A (en) * 1991-10-22 1993-08-10 International Business Machines Corporation Segmented mask and exposure system for x-ray lithography
JPH0794406A (ja) * 1993-07-30 1995-04-07 Canon Inc Ｘ線マスクと該マスクの製造方法と製造装置、ならびに該マスクを用いたｘ線露光方法と露光装置
JP2877190B2 (ja) * 1996-01-09 1999-03-31 日本電気株式会社 Ｘ線マスク及びその製造方法
JPH1174190A (ja) * 1997-07-01 1999-03-16 Canon Inc Ｘ線露光装置
JPH1167638A (ja) * 1997-08-20 1999-03-09 Matsushita Electric Ind Co Ltd 露光方法及び露光装置
JP2002099097A (ja) * 2000-09-25 2002-04-05 Nikon Corp 走査露光方法および走査型露光装置
JP4273679B2 (ja) * 2001-06-12 2009-06-03 日本精工株式会社 分割逐次近接露光装置

Also Published As

Publication number Publication date
JP2005268439A (ja) 2005-09-29

Similar Documents

Publication Publication Date Title
TW200707122A (en) Exposure method and apparatus
TW201612951A (en) Exposure apparatus, exposure method, and device producing method
SE0104238D0 (sv) Method and apparatus for patterning a workpiece
TW200511389A (en) Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
SG148994A1 (en) Exposure apparatus, exposure method, method for producing device, and optical part
ATE328303T1 (de) Richtungsabhängige abschirmung zur benutzung mit dipolbelichtung
TW200509209A (en) Wafer table for immersion lithography
ATE334754T1 (de) Verfahren und vorrichtung zum texturieren von metallblechen oder metallbändern
TW200500813A (en) Exposure apparatus and method, and method of producing device
TW200741365A (en) Exposure apparatus, exposing method, and device manufacturing method
WO2008123535A3 (en) Exposure method, exposure apparatus and device manufacturing method
WO2008120785A1 (ja) 露光装置及び露光方法
CN100559285C (zh) 用于生产印刷电路板的投影曝光装置和投影曝光方法
TW200715065A (en) Exposure apparatus and exposure method, and method of manufacturing electrical wiring board
TW200628998A (en) Lithographic apparatus and device manufacturing method
TW200703548A (en) Exposing apparatus having substrate chuck of good flatness
DE602005013202D1 (de) Vorrichtung und verfahren zum stapeln von objekten
TW200513629A (en) Reticle, inspection system for exposure equipment, inspection method for exposure equipment, and method for manufacturing reticle
TW200622515A (en) Measure method for height direction positions of a mask surface, exposure device and exposure method
TW200712783A (en) 1x magnification exposure method and 1x magnification exposure apparatus
TW200634451A (en) Proximity type exposure apparatus
TW200510945A (en) Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program
TW200619829A (en) Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases
EP1975699A3 (en) A method and system for patterning a mask layer
TW200501230A (en) Method of measuring focus deviation amount of pattern exposure, and pattern exposure method