TW200701855A - Substrate with composite dielectric distribution and multi-layer substrate - Google Patents

Substrate with composite dielectric distribution and multi-layer substrate

Info

Publication number
TW200701855A
TW200701855A TW094137960A TW94137960A TW200701855A TW 200701855 A TW200701855 A TW 200701855A TW 094137960 A TW094137960 A TW 094137960A TW 94137960 A TW94137960 A TW 94137960A TW 200701855 A TW200701855 A TW 200701855A
Authority
TW
Taiwan
Prior art keywords
dielectric
substrate
layer
distributions
composite dielectric
Prior art date
Application number
TW094137960A
Other languages
English (en)
Other versions
TWI308855B (en
Inventor
Chih-Hao Chang
Shih-Hsien Wu
Min-Lin Lee
Shinn-Juh Lay
Original Assignee
Ind Tech Res Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst filed Critical Ind Tech Res Inst
Publication of TW200701855A publication Critical patent/TW200701855A/zh
Application granted granted Critical
Publication of TWI308855B publication Critical patent/TWI308855B/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0213—Electrical arrangements not otherwise provided for
    • H05K1/0237—High frequency adaptations
    • H05K1/024—Dielectric details, e.g. changing the dielectric material around a transmission line
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49822—Multilayer substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P3/00—Waveguides; Transmission lines of the waveguide type
    • H01P3/02—Waveguides; Transmission lines of the waveguide type with two longitudinal conductors
    • H01P3/08—Microstrips; Strip lines
    • H01P3/081—Microstriplines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P3/00—Waveguides; Transmission lines of the waveguide type
    • H01P3/02—Waveguides; Transmission lines of the waveguide type with two longitudinal conductors
    • H01P3/08—Microstrips; Strip lines
    • H01P3/085—Triplate lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30—Technical effects
    • H01L2924/301—Electrical effects
    • H01L2924/3011—Impedance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0296—Conductive pattern lay-out details not covered by sub groups H05K1/02 - H05K1/0295
    • H05K1/0298—Multilayer circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0183—Dielectric layers
    • H05K2201/0187—Dielectric layers with regions of different dielectrics in the same layer, e.g. in a printed capacitor for locally changing the dielectric properties
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0183—Dielectric layers
    • H05K2201/0195—Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
    • H05K2201/09881—Coating only between conductors, i.e. flush with the conductors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Waveguides (AREA)
  • Structure Of Printed Boards (AREA)
TW094137960A 2005-06-17 2005-10-28 Substrate with composite dielectric distribution and multi-layer substrate TWI308855B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/156,350 US7349196B2 (en) 2005-06-17 2005-06-17 Composite distributed dielectric structure

Publications (2)

Publication Number Publication Date
TW200701855A true TW200701855A (en) 2007-01-01
TWI308855B TWI308855B (en) 2009-04-11

Family

ID=37520116

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094137960A TWI308855B (en) 2005-06-17 2005-10-28 Substrate with composite dielectric distribution and multi-layer substrate

Country Status (3)

Country Link
US (1) US7349196B2 (zh)
CN (1) CN100431394C (zh)
TW (1) TWI308855B (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI295102B (en) * 2006-01-13 2008-03-21 Ind Tech Res Inst Multi-functional substrate structure
US20090034156A1 (en) * 2007-07-30 2009-02-05 Takuya Yamamoto Composite sheet
US20090033359A1 (en) * 2007-07-31 2009-02-05 Broadcom Corporation Programmable logic device with millimeter wave interface and method for use therewith
US8723722B2 (en) * 2008-08-28 2014-05-13 Alliant Techsystems Inc. Composites for antennas and other applications
TWI402003B (zh) * 2009-10-16 2013-07-11 Princo Corp 軟性多層基板之金屬層結構及其製造方法
KR20130033091A (ko) * 2011-09-26 2013-04-03 에더트로닉스코리아 (주) 무선통신기기에 설치되는 내장형 안테나 모듈 및 이의 제조방법
JP5477422B2 (ja) * 2012-01-06 2014-04-23 株式会社村田製作所 高周波信号線路
KR102125905B1 (ko) * 2013-04-25 2020-06-24 삼성디스플레이 주식회사 인쇄 회로 기판, 표시 장치 및 인쇄 회로 기판의 제조 방법
US9066424B2 (en) 2013-07-15 2015-06-23 Hong Kong Applied Science and Technology Research Institute Company Limited Partitioned hybrid substrate for radio frequency applications
TWI477209B (zh) * 2014-04-08 2015-03-11 Azotek Co Ltd 複合基板
KR102068808B1 (ko) * 2018-01-31 2020-01-22 삼성전기주식회사 커패시터 부품
US11574862B2 (en) * 2019-04-23 2023-02-07 Intel Corporation Optimal signal routing performance through dielectric material configuration designs in package substrate
KR20210081968A (ko) * 2019-12-24 2021-07-02 삼성전자주식회사 회로 기판 및 이를 포함하는 전자 장치
WO2022264725A1 (ja) 2021-06-16 2022-12-22 株式会社村田製作所 多層基板及び多層基板の製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4759965A (en) 1985-08-06 1988-07-26 Canon Kabushiki Kaisha Ceramic, preparation thereof and electronic circuit substrate by use thereof
US5604017A (en) 1990-04-12 1997-02-18 Arlon, Inc. Multi-dielectric laminates
US5055966A (en) * 1990-12-17 1991-10-08 Hughes Aircraft Company Via capacitors within multi-layer, 3 dimensional structures/substrates
US5753968A (en) 1996-08-05 1998-05-19 Itt Industries, Inc. Low loss ridged microstrip line for monolithic microwave integrated circuit (MMIC) applications
US6015739A (en) * 1997-10-29 2000-01-18 Advanced Micro Devices Method of making gate dielectric for sub-half micron MOS transistors including a graded dielectric constant
US6068884A (en) * 1998-04-28 2000-05-30 Silcon Valley Group Thermal Systems, Llc Method of making low κ dielectric inorganic/organic hybrid films
KR100385976B1 (ko) 1999-12-30 2003-06-02 삼성전자주식회사 회로기판 및 그 제조방법
EP1317775A4 (en) * 2000-03-20 2009-01-28 Bekaert Sa Nv MATERIALS COMPRISING LOW DIELECTRIC CONSTANTS AND PROCESS FOR PRODUCING THE SAME
US6753483B2 (en) * 2000-06-14 2004-06-22 Matsushita Electric Industrial Co., Ltd. Printed circuit board and method of manufacturing the same
US6406945B1 (en) * 2001-01-26 2002-06-18 Chartered Semiconductor Manufacturing Ltd. Method for forming a transistor gate dielectric with high-K and low-K regions
JP2003017861A (ja) * 2001-06-28 2003-01-17 Kyocera Corp 多層配線基板及びその製造方法
US6819540B2 (en) * 2001-11-26 2004-11-16 Shipley Company, L.L.C. Dielectric structure
WO2004079797A2 (en) 2003-03-05 2004-09-16 Achyut Dutta High speed electronics interconnect and method of manufacture
US7211881B2 (en) * 2004-03-24 2007-05-01 Hewlett-Packard Development Company, L.P. Structure for containing desiccant
US7290315B2 (en) * 2004-10-21 2007-11-06 Intel Corporation Method for making a passive device structure

Also Published As

Publication number Publication date
CN100431394C (zh) 2008-11-05
CN1882218A (zh) 2006-12-20
TWI308855B (en) 2009-04-11
US20060285273A1 (en) 2006-12-21
US7349196B2 (en) 2008-03-25

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees