TW200644705A - TFT substrate inspection apparatus - Google Patents

TFT substrate inspection apparatus

Info

Publication number
TW200644705A
TW200644705A TW095117423A TW95117423A TW200644705A TW 200644705 A TW200644705 A TW 200644705A TW 095117423 A TW095117423 A TW 095117423A TW 95117423 A TW95117423 A TW 95117423A TW 200644705 A TW200644705 A TW 200644705A
Authority
TW
Taiwan
Prior art keywords
tft substrate
inspection
chamber
inspection apparatus
substrate inspection
Prior art date
Application number
TW095117423A
Other languages
Chinese (zh)
Other versions
TWI313142B (en
Inventor
Yasuo Konishi
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Publication of TW200644705A publication Critical patent/TW200644705A/en
Application granted granted Critical
Publication of TWI313142B publication Critical patent/TWI313142B/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851—Testing of integrated circuits [IC]
    • G01R31/2855—Environmental, reliability or burn-in testing
    • G01R31/2872—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
    • G01R31/2874—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature
    • G01R31/2875—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature related to heating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851—Testing of integrated circuits [IC]
    • G01R31/2855—Environmental, reliability or burn-in testing
    • G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
    • G01R31/2862—Chambers or ovens; Tanks
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/006—Electronic inspection or testing of displays and display drivers, e.g. of LED or LCD displays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136254—Checking; Testing

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Toxicology (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Thin Film Transistor (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Electric Properties And Detecting Electric Faults (AREA)
  • Liquid Crystal (AREA)
  • Investigating Or Analyzing Materials Using Thermal Means (AREA)

Abstract

A TFT substrate inspection apparatus which could inspect a substrate with high temperature in short time is provided. The TFT substrate inspection apparatus 1 of this invention includes an inspection chamber 4 which is performing the substrate inspection on the introduced TFT substrate 9, and a load-lock chamber 2 which introduces the TFT substrate into the inspection chamber 4. The load-lock chamber 2 includes a heating unit 10 which is pre-heating the introduced TFT substrate, and the inspection chamber 4 includes a heat insulation unit 11 which is insulating the heat of the TFT substrate introduced from the load-lock chamber 2. The TFT substrate 9 is pre-heated by the heating unit 10 and could be introduced into the inspection chamber 4 under high temperature. Therefore, a device for heating the inspection chamber to high temperature is unnecessary and the TFT substrate inspection apparatus could perform the inspection without waiting for the temperature to be raised in the inspection chamber.
TW095117423A 2005-06-14 2006-05-17 Tft substrate inspection apparatus TWI313142B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005174075 2005-06-14

Publications (2)

Publication Number Publication Date
TW200644705A true TW200644705A (en) 2006-12-16
TWI313142B TWI313142B (en) 2009-08-01

Family

ID=37532250

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095117423A TWI313142B (en) 2005-06-14 2006-05-17 Tft substrate inspection apparatus

Country Status (5)

Country Link
JP (1) JP4670870B2 (en)
KR (1) KR20070118137A (en)
CN (1) CN101176006B (en)
TW (1) TWI313142B (en)
WO (1) WO2006134888A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4863163B2 (en) * 2006-07-10 2012-01-25 株式会社島津製作所 TFT substrate inspection equipment
KR100920158B1 (en) * 2008-06-18 2009-10-06 (주)에이원메카 Straight type cell aging device of lcd cell line and cell aging method
JP5232671B2 (en) * 2009-01-22 2013-07-10 株式会社アルバック Processing equipment
JP5590043B2 (en) * 2009-12-10 2014-09-17 株式会社島津製作所 TFT substrate inspection apparatus and TFT substrate inspection method
CN105632041A (en) * 2014-11-26 2016-06-01 上海宝钢钢材贸易有限公司 Self-service lading bill printing system and method
CN104795339B (en) * 2015-03-09 2017-10-20 昆山龙腾光电有限公司 The detection means and detection method of thin-film transistor array base-plate
KR20220009667A (en) 2020-07-16 2022-01-25 삼성전자주식회사 Semiconductor module inspection device with robot

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6249268A (en) * 1985-08-28 1987-03-03 Toshiba Seiki Kk Heating and cooling of electronic part
JPS6285810A (en) * 1985-10-11 1987-04-20 Nec Corp Electron beam length measuring machine
JPH08105938A (en) * 1994-10-06 1996-04-23 Advantest Corp Ic test handler
JP3813334B2 (en) * 1997-10-24 2006-08-23 株式会社半導体エネルギー研究所 Manufacturing method of liquid crystal panel for rear projection TV
JP2001013519A (en) * 1999-06-28 2001-01-19 Matsushita Electric Ind Co Ltd Active matrix array substrate for liquid crystal display device, method and device for inspecting it, liquid crystal display device and video display device

Also Published As

Publication number Publication date
TWI313142B (en) 2009-08-01
CN101176006A (en) 2008-05-07
JPWO2006134888A1 (en) 2009-01-08
CN101176006B (en) 2010-09-01
KR20070118137A (en) 2007-12-13
WO2006134888A1 (en) 2006-12-21
JP4670870B2 (en) 2011-04-13

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees