TW200644141A - Visual inspection apparatus - Google Patents

Visual inspection apparatus

Info

Publication number
TW200644141A
TW200644141A TW095114216A TW95114216A TW200644141A TW 200644141 A TW200644141 A TW 200644141A TW 095114216 A TW095114216 A TW 095114216A TW 95114216 A TW95114216 A TW 95114216A TW 200644141 A TW200644141 A TW 200644141A
Authority
TW
Taiwan
Prior art keywords
unit
illuminating
inspection apparatus
visual inspection
wafer
Prior art date
Application number
TW095114216A
Other languages
English (en)
Chinese (zh)
Inventor
Haruyuki Tsuji
Yoshiaki Suge
Hiroshi Naiki
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Publication of TW200644141A publication Critical patent/TW200644141A/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8803—Visual inspection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
TW095114216A 2005-04-21 2006-04-19 Visual inspection apparatus TW200644141A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005123944A JP2006300775A (ja) 2005-04-21 2005-04-21 外観検査装置

Publications (1)

Publication Number Publication Date
TW200644141A true TW200644141A (en) 2006-12-16

Family

ID=37186506

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095114216A TW200644141A (en) 2005-04-21 2006-04-19 Visual inspection apparatus

Country Status (4)

Country Link
US (1) US20060238753A1 (enExample)
JP (1) JP2006300775A (enExample)
CN (1) CN1854718A (enExample)
TW (1) TW200644141A (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4442550B2 (ja) * 2005-11-15 2010-03-31 オムロン株式会社 不良分析箇所特定装置、不良分析箇所特定方法、不良分析箇所特定用プログラム、およびコンピュータ読取り可能記録媒体
WO2007145223A1 (ja) * 2006-06-12 2007-12-21 Sharp Kabushiki Kaisha 起伏検査装置、起伏検査方法、起伏検査装置の制御プログラム、記録媒体
JP5283830B2 (ja) * 2006-06-13 2013-09-04 富士通セミコンダクター株式会社 欠陥検査方法
JP2008249386A (ja) * 2007-03-29 2008-10-16 Dainippon Screen Mfg Co Ltd 欠陥検査装置および欠陥検査方法
US8073240B2 (en) * 2007-05-07 2011-12-06 Kla-Tencor Corp. Computer-implemented methods, computer-readable media, and systems for identifying one or more optical modes of an inspection system as candidates for use in inspection of a layer of a wafer
JP4777310B2 (ja) * 2007-07-31 2011-09-21 シャープ株式会社 検査装置、検査方法、検査システム、カラーフィルタの製造方法、検査装置制御プログラム、及び該プログラムを記録したコンピュータ読み取り可能な記録媒体
JP4902456B2 (ja) * 2007-07-31 2012-03-21 シャープ株式会社 スジムラ評価装置、スジムラ評価方法、スジムラ評価プログラム、記録媒体及びカラーフィルタの製造方法
CN101256157B (zh) * 2008-03-26 2010-06-02 广州中国科学院工业技术研究院 表面缺陷检测方法和装置
CN101261234B (zh) * 2008-03-26 2010-06-09 广州中国科学院工业技术研究院 表面缺陷检测装置
JP5303217B2 (ja) * 2008-08-29 2013-10-02 株式会社日立ハイテクノロジーズ 欠陥検査方法及び欠陥検査装置
JP2010185692A (ja) * 2009-02-10 2010-08-26 Hitachi High-Technologies Corp ディスク表面検査装置、その検査システム及びその検査方法
DE102009041268A1 (de) * 2009-09-11 2011-05-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Partikeldetektor und Verfahren zur Detektion von Partikeln
JP5247664B2 (ja) * 2009-11-18 2013-07-24 株式会社日立ハイテクノロジーズ 基板検査装置及びその測定運用システム
JP2011134931A (ja) * 2009-12-25 2011-07-07 Jeol Ltd 半導体検査装置のレシピ設定支援方法及び装置
JP5581286B2 (ja) * 2011-09-09 2014-08-27 株式会社日立ハイテクノロジーズ 欠陥検査方法および欠陥検査装置
JP5826612B2 (ja) 2011-11-18 2015-12-02 株式会社キーエンス 画像処理装置、画像処理方法及びコンピュータプログラム
US20140207403A1 (en) * 2013-01-22 2014-07-24 General Electric Company Inspection instrument auto-configuration
US9575008B2 (en) * 2014-02-12 2017-02-21 ASA Corporation Apparatus and method for photographing glass in multiple layers
CN109192673B (zh) * 2018-08-27 2021-09-17 苏州精濑光电有限公司 一种晶圆检测方法
CN109100901B (zh) * 2018-10-15 2024-04-16 苏州精濑光电有限公司 一种宏观检查机的上灯箱
JP7379104B2 (ja) * 2019-03-04 2023-11-14 東京エレクトロン株式会社 基板検査装置、基板処理装置、基板検査方法、及びコンピュータ読み取り可能な記録媒体
JP7151873B2 (ja) 2019-03-26 2022-10-12 日本電気株式会社 検査装置
JP7164117B2 (ja) * 2019-06-14 2022-11-01 レボックス株式会社 照明装置
KR102292547B1 (ko) * 2020-04-10 2021-08-20 코그넥스코오포레이션 가변 확산판을 이용한 광학 시스템
CN116888452A (zh) * 2021-03-01 2023-10-13 徕卡显微系统科技(苏州)有限公司 用于光学检查的处理装置、检查设备和系统以及相应的方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4110653B2 (ja) * 1999-01-13 2008-07-02 株式会社ニコン 表面検査方法及び装置
CN100419410C (zh) * 1999-11-25 2008-09-17 奥林巴斯光学工业株式会社 缺陷检查数据处理系统
AU4277501A (en) * 2000-03-24 2001-10-03 Olympus Optical Co., Ltd. Apparatus for detecting defect

Also Published As

Publication number Publication date
JP2006300775A (ja) 2006-11-02
CN1854718A (zh) 2006-11-01
US20060238753A1 (en) 2006-10-26

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