TW200642440A - Image data storing method and control device and program, frame data generation method and its device and program, drawing method and device - Google Patents

Image data storing method and control device and program, frame data generation method and its device and program, drawing method and device

Info

Publication number
TW200642440A
TW200642440A TW095105694A TW95105694A TW200642440A TW 200642440 A TW200642440 A TW 200642440A TW 095105694 A TW095105694 A TW 095105694A TW 95105694 A TW95105694 A TW 95105694A TW 200642440 A TW200642440 A TW 200642440A
Authority
TW
Taiwan
Prior art keywords
program
frame data
data
turn
enables
Prior art date
Application number
TW095105694A
Other languages
English (en)
Inventor
Mitsuru Mushano
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of TW200642440A publication Critical patent/TW200642440A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J5/00—Devices or arrangements for controlling character selection
    • B41J5/30—Character or syllable selection controlled by recorded information
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Image Processing (AREA)
  • Storing Facsimile Image Data (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Facsimile Scanning Arrangements (AREA)
TW095105694A 2005-02-22 2006-02-21 Image data storing method and control device and program, frame data generation method and its device and program, drawing method and device TW200642440A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005045111 2005-02-22

Publications (1)

Publication Number Publication Date
TW200642440A true TW200642440A (en) 2006-12-01

Family

ID=36927375

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095105694A TW200642440A (en) 2005-02-22 2006-02-21 Image data storing method and control device and program, frame data generation method and its device and program, drawing method and device

Country Status (5)

Country Link
US (1) US20090051970A1 (zh)
KR (1) KR20070106016A (zh)
CN (1) CN101128777A (zh)
TW (1) TW200642440A (zh)
WO (1) WO2006090737A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007096124A (ja) * 2005-09-29 2007-04-12 Fujifilm Corp フレームデータ作成装置、方法及び描画装置
CN102778819B (zh) * 2012-07-31 2014-10-15 中国科学院长春光学精密机械与物理研究所 一种用于点阵式无掩模光刻的曝光帧数据的产生方法
JP6811555B2 (ja) * 2016-06-28 2021-01-13 株式会社Ｓｃｒｅｅｎホールディングス データ処理装置、錠剤印刷装置、データ処理方法および錠剤印刷方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2776358B2 (ja) * 1996-01-12 1998-07-16 日本電気株式会社 電子ビームによるｌｓｉ検査方法及び装置
JPH10210251A (ja) * 1997-01-20 1998-08-07 Toshiba Corp 画像メモリアクセス方法、画像形成装置、画像形成記憶装置、アドレス発生方法、及びアドレス発生装置
JP3533895B2 (ja) * 1997-03-13 2004-05-31 セイコーエプソン株式会社 シリアルプリンタ及びシリアルプリンタにおけるイメージバッファアクセス方法
JP4054941B2 (ja) * 2000-08-10 2008-03-05 セイコーエプソン株式会社 印刷イメージ表示装置、印刷イメージ表示方法および印刷イメージ表示処理プログラムを記録したコンピュータ読み取り可能な記録媒体
JP4320694B2 (ja) * 2001-08-08 2009-08-26 株式会社オーク製作所 多重露光描画装置および多重露光式描画方法
US6778180B2 (en) * 2001-09-28 2004-08-17 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Video image tracking engine
US20040012700A1 (en) * 2002-06-25 2004-01-22 Minolta Co., Ltd. Image processing device, image processing program, and digital camera
CN100407782C (zh) * 2002-09-27 2008-07-30 富士胶片株式会社 相册制作方法及其装置
JP4373731B2 (ja) * 2003-07-22 2009-11-25 富士フイルム株式会社 描画装置及び描画方法

Also Published As

Publication number Publication date
WO2006090737A1 (ja) 2006-08-31
KR20070106016A (ko) 2007-10-31
US20090051970A1 (en) 2009-02-26
CN101128777A (zh) 2008-02-20

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