TW200641443A - Film formation method, electro-optical device manufacturing method, and electronic apparatus - Google Patents

Film formation method, electro-optical device manufacturing method, and electronic apparatus

Info

Publication number
TW200641443A
TW200641443A TW095101895A TW95101895A TW200641443A TW 200641443 A TW200641443 A TW 200641443A TW 095101895 A TW095101895 A TW 095101895A TW 95101895 A TW95101895 A TW 95101895A TW 200641443 A TW200641443 A TW 200641443A
Authority
TW
Taiwan
Prior art keywords
film formation
electro
optical device
electronic apparatus
device manufacturing
Prior art date
Application number
TW095101895A
Other languages
English (en)
Inventor
Kei Hiruma
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of TW200641443A publication Critical patent/TW200641443A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133784—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by rubbing

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
TW095101895A 2005-01-21 2006-01-18 Film formation method, electro-optical device manufacturing method, and electronic apparatus TW200641443A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005013722A JP4367347B2 (ja) 2005-01-21 2005-01-21 膜形成方法及び電気光学装置の製造方法並びに電子機器

Publications (1)

Publication Number Publication Date
TW200641443A true TW200641443A (en) 2006-12-01

Family

ID=36696394

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095101895A TW200641443A (en) 2005-01-21 2006-01-18 Film formation method, electro-optical device manufacturing method, and electronic apparatus

Country Status (5)

Country Link
US (1) US7794781B2 (zh)
JP (1) JP4367347B2 (zh)
KR (1) KR100773023B1 (zh)
CN (1) CN100456110C (zh)
TW (1) TW200641443A (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4475305B2 (ja) * 2007-09-06 2010-06-09 セイコーエプソン株式会社 配向膜形成用組成物、液晶装置の製造方法
JP2009272511A (ja) * 2008-05-09 2009-11-19 Mimaki Engineering Co Ltd 配線形成装置及び配線形成方法
KR20100044087A (ko) * 2008-10-20 2010-04-29 삼성전자주식회사 잉크젯 프린트용 전극 조성물, 이를 사용하여 제조된 전극 및 이차 전지
JP5491022B2 (ja) * 2008-12-10 2014-05-14 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、基板処理装置の制御方法および基板処理装置の表示方法
CN102078854A (zh) * 2010-11-18 2011-06-01 深圳市华星光电技术有限公司 薄膜干燥方法、配向膜干燥方法及显示面板的装造方法
JP5344105B1 (ja) * 2013-03-08 2013-11-20 ウシオ電機株式会社 光配向用偏光光照射装置及び光配向用偏光光照射方法
JP5709286B2 (ja) * 2014-02-26 2015-04-30 株式会社日立国際電気 基板処理装置、基板処理装置の制御方法及び半導体装置の製造方法
CN108465576A (zh) * 2018-02-13 2018-08-31 东莞市联洲知识产权运营管理有限公司 一种汽车零件上漆流水线

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5234760A (en) * 1989-03-31 1993-08-10 Elf Atochem, S.A. Composite material comprising a substrate and a polymeric based coating and process for the manufacture thereof
JPH06251364A (ja) * 1993-03-01 1994-09-09 Matsushita Electric Ind Co Ltd 磁気記録媒体の製造方法
JP3223142B2 (ja) * 1997-08-22 2001-10-29 チッソ株式会社 液晶表示素子の製造法
JPH11142641A (ja) 1997-11-14 1999-05-28 Asahi Glass Co Ltd カラーフィルタの製造方法及びカラー表示装置
US6248168B1 (en) * 1997-12-15 2001-06-19 Tokyo Electron Limited Spin coating apparatus including aging unit and solvent replacement unit
JP2000343620A (ja) * 1999-06-03 2000-12-12 Ricoh Co Ltd 無端状ベルトの製造方法における製造条件設定方法、無端状ベルトの製造方法、及び無端状ベルトの製造装置
US6397488B1 (en) * 2000-06-15 2002-06-04 Hewlett-Packard Company Apparatus and method for drying printing composition on a print medium
JP2003080694A (ja) * 2001-06-26 2003-03-19 Seiko Epson Corp 膜パターンの形成方法、膜パターン形成装置、導電膜配線、電気光学装置、電子機器、並びに非接触型カード媒体
JP4290905B2 (ja) * 2001-07-10 2009-07-08 Ｎｅｃ液晶テクノロジー株式会社 有機膜の平坦化方法
JP2003222875A (ja) * 2002-01-30 2003-08-08 Toshiba Corp 基板の乾燥方法、その装置、液晶表示素子の製造方法およびその装置
JP2003225600A (ja) 2002-02-04 2003-08-12 Shibaura Mechatronics Corp 機能性薄膜形成装置及び形成方法
JP3985545B2 (ja) * 2002-02-22 2007-10-03 セイコーエプソン株式会社 薄膜形成装置と薄膜形成方法、液晶装置の製造装置と液晶装置の製造方法と液晶装置、及び薄膜構造体の製造装置と薄膜構造体の製造方法と薄膜構造体、及び電子機器
US20050151890A1 (en) * 2002-03-25 2005-07-14 Koichi Nishimura Optical film and process for producing the same
US6866972B2 (en) * 2002-05-15 2005-03-15 Nec Lcd Technologies, Ltd. Color layer forming method
JP2004144849A (ja) * 2002-10-22 2004-05-20 Sekisui Chem Co Ltd 液晶表示装置の製造方法
JP2004223354A (ja) 2003-01-21 2004-08-12 Seiko Epson Corp 液状組成物の塗布方法、ｅｌ素子の製造方法、カラーフィルタの製造方法、電気光学装置、電子機器
JP4369773B2 (ja) * 2003-03-07 2009-11-25 日東電工株式会社 塗布膜の乾燥方法
JP3915789B2 (ja) * 2003-03-13 2007-05-16 セイコーエプソン株式会社 カラーフィルタ基板の製造方法

Also Published As

Publication number Publication date
KR20060085176A (ko) 2006-07-26
JP2006198537A (ja) 2006-08-03
US20060164591A1 (en) 2006-07-27
KR100773023B1 (ko) 2007-11-02
US7794781B2 (en) 2010-09-14
CN1808248A (zh) 2006-07-26
JP4367347B2 (ja) 2009-11-18
CN100456110C (zh) 2009-01-28

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