TW200632116A - Tool and device for dedicate coating a photochemical film on a substrate - Google Patents

Tool and device for dedicate coating a photochemical film on a substrate

Info

Publication number
TW200632116A
TW200632116A TW094106336A TW94106336A TW200632116A TW 200632116 A TW200632116 A TW 200632116A TW 094106336 A TW094106336 A TW 094106336A TW 94106336 A TW94106336 A TW 94106336A TW 200632116 A TW200632116 A TW 200632116A
Authority
TW
Taiwan
Prior art keywords
coating
substrate
dedicate
tool
coating surface
Prior art date
Application number
TW094106336A
Other languages
English (en)
Other versions
TWI265202B (en
Inventor
Chien-Ming Huang
Original Assignee
Asia Optical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asia Optical Co Inc filed Critical Asia Optical Co Inc
Priority to TW094106336A priority Critical patent/TWI265202B/zh
Priority to US11/230,500 priority patent/US20060196423A1/en
Priority to JP2006007972A priority patent/JP4509943B2/ja
Publication of TW200632116A publication Critical patent/TW200632116A/zh
Application granted granted Critical
Publication of TWI265202B publication Critical patent/TWI265202B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
TW094106336A 2005-03-02 2005-03-02 Tool and device for dedicate coating a photochemical film on a substrate TWI265202B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
TW094106336A TWI265202B (en) 2005-03-02 2005-03-02 Tool and device for dedicate coating a photochemical film on a substrate
US11/230,500 US20060196423A1 (en) 2005-03-02 2005-09-21 Gradually changed film coating device and tool for using in the coating device
JP2006007972A JP4509943B2 (ja) 2005-03-02 2006-01-16 グラジエント式光学薄膜形成装置及びその治具

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094106336A TWI265202B (en) 2005-03-02 2005-03-02 Tool and device for dedicate coating a photochemical film on a substrate

Publications (2)

Publication Number Publication Date
TW200632116A true TW200632116A (en) 2006-09-16
TWI265202B TWI265202B (en) 2006-11-01

Family

ID=36942896

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094106336A TWI265202B (en) 2005-03-02 2005-03-02 Tool and device for dedicate coating a photochemical film on a substrate

Country Status (3)

Country Link
US (1) US20060196423A1 (zh)
JP (1) JP4509943B2 (zh)
TW (1) TWI265202B (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101363117B (zh) * 2007-08-08 2011-08-24 鸿富锦精密工业（深圳）有限公司 镀膜支架及镀膜机
CN101407908B (zh) * 2007-10-09 2010-06-09 鸿富锦精密工业（深圳）有限公司 补正板
CN101538699B (zh) * 2008-03-17 2012-06-20 鸿富锦精密工业（深圳）有限公司 镀膜装置及其所使用的镀膜伞架遮罩
TWI452163B (zh) * 2010-04-08 2014-09-11 Hon Hai Prec Ind Co Ltd 鍍膜治具
WO2014125091A1 (en) * 2013-02-14 2014-08-21 Universiteit Gent Deposition tool for combinatorial thin film material libraries
WO2015196326A1 (zh) * 2014-06-23 2015-12-30 孙义昌 多层膜层的中性灰度减光滤镜及其制造装置及其制造方法
CN104862656B (zh) * 2015-06-10 2017-12-08 光驰科技(上海)有限公司 双向沉积镀膜装置及镀膜方法
CN105695938B (zh) * 2016-04-08 2018-06-12 光驰科技(上海)有限公司 采用扫描式蒸发源的镀膜装置及其镀膜方法
CN108505013A (zh) * 2018-06-26 2018-09-07 光驰科技(上海)有限公司 一种应用于真空镀膜设备中可调节角度的伞架机构
CN110230034B (zh) * 2019-05-20 2024-04-16 江苏光腾光学有限公司 光学镀膜多角度伞架及包含该伞架的镀膜机
CN112718355B (zh) * 2020-12-30 2021-12-17 新沂市棋盘工业集中区建设发展有限公司 一种筷子生产表面加工用自动喷漆设备及喷漆方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5316377A (en) * 1977-08-02 1978-02-15 Canon Inc Evapolation depositing method
KR900001825B1 (ko) * 1984-11-14 1990-03-24 가부시끼가이샤 히다찌세이사꾸쇼 성막 지향성을 고려한 스퍼터링장치
US4988424A (en) * 1989-06-07 1991-01-29 Ppg Industries, Inc. Mask and method for making gradient sputtered coatings
US5236510A (en) * 1989-12-08 1993-08-17 North American Philips Corporation Method and apparatus for forming a deposited layer on a skirted substrate
EP0682125A1 (en) * 1994-05-11 1995-11-15 Applied Materials, Inc. Controlling material sputtered from a target
JPH07335553A (ja) * 1994-06-08 1995-12-22 Tel Varian Ltd 処理装置および処理方法
US5885425A (en) * 1995-06-06 1999-03-23 International Business Machines Corporation Method for selective material deposition on one side of raised or recessed features
GB9701114D0 (en) * 1997-01-20 1997-03-12 Coherent Optics Europ Ltd Three-dimensional masking method for control of optical coating thickness
SG126681A1 (en) * 2001-07-25 2006-11-29 Inst Data Storage Oblique deposition apparatus
PT1350863E (pt) * 2002-03-19 2006-12-29 Scheuten Glasgroep Bv Dispositivo e processo para a aplicação orientada de um material a depositar num substrato
US20030180462A1 (en) * 2002-03-19 2003-09-25 Temescal, A Unit Of The Boc Group, Inc. Planetary lift-off vapor deposition system
JP2004205777A (ja) * 2002-12-25 2004-07-22 Canon Inc 光学フィルタの製造方法

Also Published As

Publication number Publication date
JP4509943B2 (ja) 2010-07-21
US20060196423A1 (en) 2006-09-07
TWI265202B (en) 2006-11-01
JP2006241588A (ja) 2006-09-14

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees