TW200615709A - Exposure apparatus and device manufacturing method - Google Patents
Exposure apparatus and device manufacturing methodInfo
- Publication number
- TW200615709A TW200615709A TW094118778A TW94118778A TW200615709A TW 200615709 A TW200615709 A TW 200615709A TW 094118778 A TW094118778 A TW 094118778A TW 94118778 A TW94118778 A TW 94118778A TW 200615709 A TW200615709 A TW 200615709A
- Authority
- TW
- Taiwan
- Prior art keywords
- exposure apparatus
- mask
- device manufacturing
- light source
- light
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000007787 solid Substances 0.000 abstract 1
- 230000002269 spontaneous effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D27/00—Shaving accessories
- A45D27/22—Containers or carriers for storing shaving appliances
- A45D27/225—Containers or carriers for storing shaving appliances for storing razor blade cartridges, e.g. after use
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
- B26B21/00—Razors of the open or knife type; Safety razors or other shaving implements of the planing type; Hair-trimming devices involving a razor-blade; Equipment therefor
- B26B21/08—Razors of the open or knife type; Safety razors or other shaving implements of the planing type; Hair-trimming devices involving a razor-blade; Equipment therefor involving changeable blades
- B26B21/14—Safety razors with one or more blades arranged transversely to the handle
- B26B21/22—Safety razors with one or more blades arranged transversely to the handle involving several blades to be used simultaneously
- B26B21/222—Safety razors with one or more blades arranged transversely to the handle involving several blades to be used simultaneously with the blades moulded into, or attached to, a changeable unit
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
- B26B21/00—Razors of the open or knife type; Safety razors or other shaving implements of the planing type; Hair-trimming devices involving a razor-blade; Equipment therefor
- B26B21/40—Details or accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
- B26B21/00—Razors of the open or knife type; Safety razors or other shaving implements of the planing type; Hair-trimming devices involving a razor-blade; Equipment therefor
- B26B21/40—Details or accessories
- B26B21/52—Handles, e.g. tiltable, flexible
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D25/00—Details of other kinds or types of rigid or semi-rigid containers
- B65D25/02—Internal fittings
- B65D25/10—Devices to locate articles in containers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/54—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles of special shape not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Forests & Forestry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
This invention relates to an exposure apparatus which transfers a pattern of a mask onto a wafer. The exposure apparatus includes a master stage which holds the mask, and a light source which generates light to illuminate the mask. The light source includes a solid state device which emits light by spontaneous emission.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004194231A JP2006019412A (en) | 2004-06-30 | 2004-06-30 | Exposure device and manufacturing method of device |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200615709A true TW200615709A (en) | 2006-05-16 |
Family
ID=35782934
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094118778A TW200615709A (en) | 2004-06-30 | 2005-06-07 | Exposure apparatus and device manufacturing method |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2006019412A (en) |
GB (1) | GB2437887B (en) |
TW (1) | TW200615709A (en) |
WO (1) | WO2006004135A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI404283B (en) * | 2008-05-15 | 2013-08-01 | Ricoh Co Ltd | Surface emitting laser element, surface emitting laser array, optical scanning device, and image forming apparatus |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5361239B2 (en) | 2008-04-09 | 2013-12-04 | キヤノン株式会社 | Exposure apparatus and device manufacturing method |
JP2010093094A (en) * | 2008-10-09 | 2010-04-22 | U-Vix Corp | Ultraviolet irradiation device for photocuring |
JP5345443B2 (en) * | 2009-04-21 | 2013-11-20 | 株式会社日立ハイテクノロジーズ | Exposure apparatus, exposure light irradiation method, and display panel substrate manufacturing method |
JP5121783B2 (en) * | 2009-06-30 | 2013-01-16 | 株式会社日立ハイテクノロジーズ | LED light source, manufacturing method thereof, exposure apparatus using LED light source, and exposure method |
CN102369484B (en) * | 2010-02-05 | 2015-05-20 | 恩斯克科技有限公司 | Light irradiation device for exposure devices, method for controlling turn-on of same, exposure device, exposure method, and substrate |
WO2012011497A1 (en) * | 2010-07-22 | 2012-01-26 | Nskテクノロジー株式会社 | Light irradiation device for exposure apparatus, method for controlling light irradiation device, exposure apparatus, and exposure method |
CN102483587B (en) * | 2010-07-22 | 2014-11-05 | 恩斯克科技有限公司 | Light irradiation device for exposure apparatus, method for controlling light irradiation device, exposure apparatus, and exposure method |
JP5799306B2 (en) * | 2010-07-22 | 2015-10-21 | 株式会社ブイ・テクノロジー | Method of controlling light irradiation apparatus for exposure apparatus and exposure method |
BR112014028809A2 (en) | 2012-05-22 | 2017-06-27 | Koninklijke Philips Nv | shaving head for a hair clipper |
JP6057072B2 (en) * | 2013-03-22 | 2017-01-11 | ウシオ電機株式会社 | Light source device |
KR101532352B1 (en) * | 2013-10-30 | 2015-06-29 | 주식회사 인피테크 | LED light source apparatus for exposure resist and management system for the same |
JP7202142B2 (en) * | 2018-10-30 | 2023-01-11 | キヤノン株式会社 | Cooling device, light source device, exposure device, and article manufacturing method |
JP2021043343A (en) * | 2019-09-11 | 2021-03-18 | 株式会社ブイ・テクノロジー | Illumination apparatus for proximity exposure apparatus, proximity exposure apparatus, and exposure method for proximity exposure apparatus |
JP7340167B2 (en) * | 2020-01-21 | 2023-09-07 | 株式会社ニコン | Illumination optical system, exposure equipment, and device manufacturing method |
JP7458853B2 (en) * | 2020-03-30 | 2024-04-01 | キヤノン株式会社 | Light source device, illumination device, and exposure device. |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4785534A (en) * | 1987-12-07 | 1988-11-22 | The Gillette Company | Razor |
US5518114A (en) * | 1994-07-28 | 1996-05-21 | The Gillette Company | Cartridge dispenser |
JPH09148658A (en) * | 1995-11-29 | 1997-06-06 | Nikon Corp | Laser ray source |
JPH09246648A (en) * | 1996-03-13 | 1997-09-19 | Nikon Corp | Laser beam source and illuminating optical device |
JPH08334803A (en) * | 1995-06-07 | 1996-12-17 | Nikon Corp | Uv laser beam source |
US5784790A (en) * | 1996-04-10 | 1998-07-28 | The Gillette Company | Shaving razor and method |
KR100352838B1 (en) * | 2000-06-24 | 2002-09-16 | 주식회사 도루코 | Shaver |
JP2002033255A (en) * | 2000-07-14 | 2002-01-31 | Nikon Corp | Aligner and illuminator |
US7200942B2 (en) * | 2001-03-28 | 2007-04-10 | Eveready Battery Company, Inc. | Safety razor with pivot point shift from center to guard-bar under applied load |
JP4546019B2 (en) * | 2002-07-03 | 2010-09-15 | 株式会社日立製作所 | Exposure equipment |
JP4458229B2 (en) * | 2002-08-30 | 2010-04-28 | 日亜化学工業株式会社 | Semiconductor laser light source device for exposure |
JP2004335953A (en) * | 2002-11-25 | 2004-11-25 | Nikon Corp | Aligner and exposure method |
JP2004335937A (en) * | 2002-11-25 | 2004-11-25 | Nikon Corp | Method for manufacturing aligner light source unit, aligner, exposure method and adjusting method for same |
JP2004253758A (en) * | 2002-12-27 | 2004-09-09 | Nikon Corp | Illuminating light source unit, aligner, and exposure method |
JP2004335952A (en) * | 2002-12-27 | 2004-11-25 | Nikon Corp | Illumination light source, lighting system, exposure device, and exposure method |
-
2004
- 2004-06-30 JP JP2004194231A patent/JP2006019412A/en not_active Withdrawn
-
2005
- 2005-06-07 TW TW094118778A patent/TW200615709A/en unknown
- 2005-06-29 GB GB0715924A patent/GB2437887B/en not_active Expired - Fee Related
- 2005-06-29 WO PCT/JP2005/012433 patent/WO2006004135A1/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI404283B (en) * | 2008-05-15 | 2013-08-01 | Ricoh Co Ltd | Surface emitting laser element, surface emitting laser array, optical scanning device, and image forming apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP2006019412A (en) | 2006-01-19 |
GB0715924D0 (en) | 2007-09-26 |
GB2437887A (en) | 2007-11-07 |
GB2437887B (en) | 2010-07-14 |
WO2006004135A1 (en) | 2006-01-12 |
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