TW200615506A - Apparatus and method of inspecting unevenness and recording medium - Google Patents

Apparatus and method of inspecting unevenness and recording medium

Info

Publication number
TW200615506A
TW200615506A TW094130515A TW94130515A TW200615506A TW 200615506 A TW200615506 A TW 200615506A TW 094130515 A TW094130515 A TW 094130515A TW 94130515 A TW94130515 A TW 94130515A TW 200615506 A TW200615506 A TW 200615506A
Authority
TW
Taiwan
Prior art keywords
unevenness
pass
pass filtering
pixels
region
Prior art date
Application number
TW094130515A
Other languages
Chinese (zh)
Other versions
TWI260396B (en
Inventor
Kazutaka Taniguchi
Kunio Ueta
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW200615506A publication Critical patent/TW200615506A/en
Application granted granted Critical
Publication of TWI260396B publication Critical patent/TWI260396B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/42—Measurement or testing during manufacture
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N17/00—Diagnosis, testing or measuring for television systems or their details
    • H04N17/04—Diagnosis, testing or measuring for television systems or their details for receivers

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biomedical Technology (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Immunology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

In an unevenness inspecting apparatus (1) for inspecting density unevenness of resist coated on a substrate (9), a picked-up image is compressed and low-pass filtering is performed on the image, and furthermore, high-pass filtering is performed on it by high-pass filtering part (4214). In the high-pass filtering part (4214), in a case where a high-pass window exists near an edge, the high-pass window is contracted and kept away from a region which is not a region including a target pixel whose value is to be obtained by the filtering. By the above operation, in the unevenness inspecting apparatus (1), a group of pixels which are subjected to high-pass filtering are limited to pixels in the high-pass window, in other words, pixels in a region which includes a target pixel, and the accuracy of inspection of unevenness around an edge is improved.
TW094130515A 2004-10-08 2005-09-06 Apparatus and method of inspecting unevenness and recording medium TWI260396B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004295672A JP4353479B2 (en) 2004-10-08 2004-10-08 Unevenness inspection apparatus, unevenness inspection method, and program for causing computer to inspect shading unevenness

Publications (2)

Publication Number Publication Date
TW200615506A true TW200615506A (en) 2006-05-16
TWI260396B TWI260396B (en) 2006-08-21

Family

ID=36375792

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094130515A TWI260396B (en) 2004-10-08 2005-09-06 Apparatus and method of inspecting unevenness and recording medium

Country Status (4)

Country Link
JP (1) JP4353479B2 (en)
KR (1) KR100730052B1 (en)
CN (1) CN100385200C (en)
TW (1) TWI260396B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4702953B2 (en) * 2006-06-01 2011-06-15 大日本スクリーン製造株式会社 Unevenness inspection method, unevenness inspection apparatus, and program
JP4702952B2 (en) * 2006-06-01 2011-06-15 大日本スクリーン製造株式会社 Unevenness inspection method, unevenness inspection apparatus, and program
IL188825A0 (en) 2008-01-16 2008-11-03 Orbotech Ltd Inspection of a substrate using multiple cameras
WO2012141245A1 (en) 2011-04-15 2012-10-18 日本ゼオン株式会社 Polymerizable compound, polymerizable composition, polymer, and optically anisotropic body
JP2013015389A (en) * 2011-07-04 2013-01-24 Hitachi-Ge Nuclear Energy Ltd Inspection method of weld position and device for the method
TWI460395B (en) * 2012-07-25 2014-11-11 Ind Tech Res Inst Flatness measurement device and measuring method thereof
TWI477766B (en) * 2012-12-18 2015-03-21 Ind Tech Res Inst Inspection device and inspection method
CN103245309B (en) * 2013-05-21 2017-12-12 杭州鼎热科技有限公司 A kind of laser evenness measurement Error Compensation method
TWI509268B (en) * 2013-12-16 2015-11-21 Machvision Inc Double-feed circuit board testing method and system
JP6638453B2 (en) * 2016-02-16 2020-01-29 コニカミノルタ株式会社 Bad image occurrence prediction system and bad image occurrence prediction program
CN107945170B (en) * 2017-12-04 2020-09-29 苏州精濑光电有限公司 Method and device for judging non-uniformity of linear process
JP2021096195A (en) * 2019-12-19 2021-06-24 コニカミノルタ株式会社 Image inspection device, image forming apparatus, and program

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3224620B2 (en) * 1993-02-05 2001-11-05 大日本印刷株式会社 Method for quantifying unevenness of periodic pattern
US5974160A (en) * 1993-10-26 1999-10-26 Asahi Kasei Kogyo Kabushiki Kaisha Measuring method and apparatus of gloss irregularity and printing unevenness
IL108974A (en) * 1994-03-14 1999-11-30 Orbotech Ltd Apparatus and method for display panel inspection
JP3366802B2 (en) * 1995-06-21 2003-01-14 大日本スクリーン製造株式会社 Unevenness inspection method and apparatus
JP3335503B2 (en) * 1995-06-22 2002-10-21 大日本スクリーン製造株式会社 Inspection method and inspection device for perforated plate
JP3302863B2 (en) * 1995-08-30 2002-07-15 大日本スクリーン製造株式会社 Inspection method and inspection device for perforated plate
JPH0968502A (en) * 1995-08-30 1997-03-11 Dainippon Screen Mfg Co Ltd Method and device for inspection of plate with through hole
JPH10197453A (en) * 1997-01-16 1998-07-31 Dainippon Screen Mfg Co Ltd Device and method for inspecting optical unevenness
JPH10206344A (en) * 1997-01-17 1998-08-07 Dainippon Screen Mfg Co Ltd Optical nonuniformity inspecting device and optical nonuniformity inspecting method
JP2000228147A (en) * 1999-02-08 2000-08-15 Nec Kansai Ltd Inspecting method for cathode ray tube

Also Published As

Publication number Publication date
JP4353479B2 (en) 2009-10-28
CN100385200C (en) 2008-04-30
TWI260396B (en) 2006-08-21
KR100730052B1 (en) 2007-06-27
CN1758021A (en) 2006-04-12
KR20060052001A (en) 2006-05-19
JP2006105884A (en) 2006-04-20

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees