CN107945170B - Method and device for judging non-uniformity of linear process - Google Patents
Method and device for judging non-uniformity of linear process Download PDFInfo
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- CN107945170B CN107945170B CN201711261274.6A CN201711261274A CN107945170B CN 107945170 B CN107945170 B CN 107945170B CN 201711261274 A CN201711261274 A CN 201711261274A CN 107945170 B CN107945170 B CN 107945170B
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/0008—Industrial image inspection checking presence/absence
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
Abstract
The embodiment of the invention discloses a method and a device for judging non-uniformity of a linear process, wherein the method comprises the following steps: acquiring an image of a detection object; identifying an uneven area of the detection object based on the image; calculating a linear offset angle in a specific direction of the uneven area according to a preset detection direction; filtering out non-uniform regions in the particular direction based on the linear offset angle and a set filter size; and carrying out unevenness judgment on the non-filtered unevenness region. The method for judging the non-uniformity of the linear process improves the accuracy of judging the non-uniformity of the linear process.
Description
Technical Field
The embodiment of the invention relates to the technical field of semiconductor detection, in particular to a method and a device for judging non-uniformity of a linear process.
Background
In the semiconductor industry, in the panel manufacturing process, for example, an AMOLED (Active Matrix organic light Emitting Diode) or a TFT (Thin Film Transistor), the detection of the non-uniformity of the linear manufacturing process is an important step, and the non-uniformity of the linear manufacturing process may specifically refer to the phenomenon that the display brightness of the panel is non-uniform or the panel has various traces.
At present, the non-uniform detection of the linear process is mainly carried out by visual inspection of human eyes, and the detection mode has the advantages of strong subjectivity, high risk of misjudgment and misjudgment, low efficiency and incapability of quantitatively seeing the phenomenon. Or by an automatic optical inspection machine, but the detection by the automatic optical inspection machine may fail due to optical noise interference.
Disclosure of Invention
The embodiment of the invention provides a method and a device for judging non-uniformity of a linear process, which improve the accuracy of judging the non-uniformity of the linear process.
In a first aspect, an embodiment of the present invention provides a method for determining linear process non-uniformity, the method including:
acquiring an image of a detection object;
identifying an uneven area of the detection object based on the image;
calculating a linear offset angle in a specific direction of the uneven area according to a preset detection direction;
filtering out non-uniform regions in the particular direction based on the linear offset angle and a set filter size;
and carrying out unevenness judgment on the non-filtered unevenness region.
Further, the identifying the uneven area of the detection object based on the image includes:
carrying out binarization processing on the image;
counting the ratio of the number of black pixels to the number of white pixels in the set area;
determining an uneven area of the image by comparing the ratio to a threshold.
Further, the calculating the linear offset angle in the specific direction of the uneven area according to the preset detection direction includes:
determining a straight line along the specific direction from the uneven area according to a preset detection direction;
calculating an included angle between the straight line and the preset detection direction;
and taking the included angle as a linear offset angle in a specific direction of the uneven area.
Further, the preset detection direction includes an X direction and a Y direction;
when the preset detection direction is the X direction, the specific direction is the Y direction;
and when the preset detection direction is the Y direction, the specific direction is the X direction.
Further, the non-uniformity determining the non-filtered non-uniformity region includes:
counting the ratio of the number of black pixels to the number of white pixels in the unfiltered uneven area;
and carrying out non-uniformity judgment according to the ratio.
Further, the method further comprises:
and judging the abnormal process according to the non-uniform judgment result of the non-filtered non-uniform area.
In a second aspect, an embodiment of the present invention further provides an apparatus for determining linear process non-uniformity, the apparatus including:
the acquisition module is used for acquiring an image of a detection object;
an identifying module for identifying an uneven area of the detection object based on the image;
the calculation module is used for calculating a linear offset angle in the specific direction of the uneven area according to a preset detection direction;
a filtering module for filtering out the non-uniform region in the specific direction based on the linear offset angle and a set filtering size;
and the judging module is used for carrying out non-uniformity judgment on the non-filtered non-uniform area.
Further, the identification module includes:
a processing unit configured to perform binarization processing on the image;
the statistical unit is used for counting the ratio of the number of the black pixels to the number of the white pixels in the set area;
an identification unit for determining an uneven area of the image by comparing the ratio with a threshold.
Further, the calculation module includes:
a determination unit configured to determine a straight line along the specific direction from the uneven area according to a preset detection direction;
and the calculation unit is used for calculating an included angle between the straight line and the preset detection direction and taking the included angle as a linear offset angle in the specific direction of the uneven area.
Further, the preset detection direction includes an X direction and a Y direction;
when the preset detection direction is the X direction, the specific direction is the Y direction;
when the preset detection direction is the Y direction, the specific direction is the X direction;
the device further comprises:
and the processing procedure abnormity judgment module is used for judging the processing procedure abnormity according to the non-uniform judgment result of the non-filtered non-uniform area.
The embodiment of the invention provides a method for judging non-uniformity of a linear process, which comprises the steps of obtaining an image of a detection object; identifying an uneven area of the detection object based on the image; calculating a linear offset angle in a specific direction of the uneven area according to a preset detection direction; and filtering out the uneven area in the specific direction based on the linear offset angle and the set filtering size, and carrying out uneven judgment on the uneven area which is not filtered out, thereby improving the accuracy of uneven judgment of the linear process.
Drawings
FIG. 1 is a flowchart illustrating a method for determining linear process non-uniformity according to an embodiment of the present invention;
FIG. 2 is a schematic diagram illustrating a filter area determined based on a linear offset angle and a set filter size according to an embodiment of the present invention;
FIG. 3 is a flowchart illustrating a method for determining linear process non-uniformity according to a second embodiment of the present invention;
fig. 4 is a schematic structural diagram of an apparatus for determining linear process non-uniformity according to a third embodiment of the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
Before discussing exemplary embodiments in more detail, it should be noted that some exemplary embodiments are described as processes or methods depicted as flowcharts. Although a flowchart may describe the steps as a sequential process, many of the steps can be performed in parallel, concurrently or simultaneously. In addition, the order of the various steps may be rearranged. The process may be terminated when its steps are completed, but may have additional steps not included in the figure. The processes may correspond to methods, functions, procedures, subroutines, and the like.
Example one
Fig. 1 is a flowchart illustrating a method for determining linear process non-uniformity according to an embodiment of the present invention, where the method is applicable to determining linear process non-uniformity in the manufacturing process of a semiconductor display panel, and the method can be performed by an apparatus for determining linear process non-uniformity, where the apparatus can be implemented by software and/or hardware. Referring specifically to fig. 1, the method specifically includes the following steps:
Wherein the detection object may be a display panel, such as an AMOLED or a TFT. The image of the detection object can be obtained by continuously scanning the detection object with a CCD (Charge Coupled Device) camera, for example, assuming that the detection object is an AMOLED, the AMOLED is kept at a fixed position, and the CCD camera continuously captures the AMOLED at a proper angle and at a certain moving speed to obtain a plurality of images; the angle and the moving speed are adjusted by taking the definition of the shot image meeting the requirement as a reference.
And 120, identifying the uneven area of the detection object based on the image.
Specifically, identifying the uneven area of the detection object may be performed by performing feature extraction on an image of the detection object, and further identifying the uneven area of the detection object by the extracted features; or comparing the image with a standard image, wherein the area which is different from the standard image is regarded as an uneven area, the standard image and the image are from the detection object with the same specification, and the detection object corresponding to the standard image does not have the uneven area. The non-uniform region may also be identified by the signal-to-noise ratio of the image, or the non-uniform region of the detection object may be identified by performing binarization processing on the image and then counting the ratio of the number of black pixels to the number of white pixels, which may be specifically described in embodiment two.
And step 130, calculating a linear offset angle in the specific direction of the uneven area according to a preset detection direction.
The preset detection direction comprises an X direction and a Y direction;
when the preset detection direction is the X direction, the specific direction is the Y direction;
and when the preset detection direction is the Y direction, the specific direction is the X direction.
Illustratively, calculating the linear offset angle in the specific direction of the uneven area according to a preset detection direction includes:
determining a straight line along the specific direction from the uneven area according to a preset detection direction;
calculating an included angle between the straight line and the preset detection direction;
and taking the included angle as a linear offset angle in a specific direction of the uneven area.
Assuming that the preset detection direction is an X direction, the specific direction is a Y direction, and specifically, refer to a schematic structural display diagram of determining a filtering area based on a linear offset angle and a set filtering size shown in fig. 2. The determination of a straight line along a specific direction can be realized by finding black pixels. The filter size may be set by the operator.
The purpose of filtering the uneven regions in the specific direction is to avoid the situation that linear unevenness in the transverse direction (X direction) and the longitudinal direction (Y direction) are mixed together to cause misjudgment, and the accuracy of performing uneven judgment on the remaining uneven regions is improved by filtering the uneven regions in one direction.
Meanwhile, in the field of semiconductor manufacturing, a finished product usually needs to go through many processes, such as etching or ELA (Excimer Laser Annealing), and each process may have an uneven effect on the product in which direction, as would be expected by a person skilled in the art. Therefore, by filtering the uneven area in the specific direction, the specific abnormality of which process is generated can be traced and distinguished according to the uneven judgment result of the remaining unfiltered area, and meanwhile, the condition of linear uneven misjudgment caused by the previous process or the non-monitored process can be avoided, so that the inspection stopping difficulty caused by the influence of linear uneven of the previous process or the non-monitored process is reduced. The pre-process specifically refers to a process that a product has already undergone when the linear process non-uniformity determination is performed, for example, a process 1-a process 2-a process 3 are required to be performed to complete a finished product, and three processes are required to perform non-uniformity determination on the product when the process 2 is performed, so that the pre-process specifically refers to the process 1 and the process 2. The non-monitoring processes refer to processes which do not have a critical influence on the next process, such as optical noise generated in the CCD scanning process, and are also reflected on the obtained images, so that the images have abnormalities other than the production process, which are not caused by production, and do not have a process influence on the next production process, and do not need to be monitored and do not hope to appear on the scanned images. For another example, after the panel goes through multiple processes, there may be two kinds of anomalies a and B, but only the anomaly B will affect the next process, and the process causing the anomaly a is also a non-monitoring process.
And 150, judging the unevenness of the non-filtered uneven area.
The method for performing non-uniformity determination on non-filtered non-uniformity regions can be referred to the explanation of step 120, and a specific implementation manner is also given in the second embodiment.
In the method for determining linear process non-uniformity provided by the present embodiment, by calculating the linear offset angle in the specific direction of the non-uniform region according to the preset detection direction, filtering the non-uniform area in the specific direction based on the linear offset angle and the set filtering size, and finally performing non-uniform judgment on the non-filtered non-uniform area to avoid the condition of misjudgment caused by the mixing of the linear non-uniformity in the transverse direction (X direction) and the linear non-uniformity in the longitudinal direction (Y direction), meanwhile, the accuracy of the non-uniform judgment of the remaining non-uniform area is improved, and the specific abnormal process can be traced and distinguished according to the non-uniform judgment result of the remaining non-filtered area, meanwhile, the condition of linear non-uniformity misjudgment caused by the previous process or the non-monitoring process is avoided, thereby reducing the difficulty of stopping inspection caused by the influence of the non-uniform linearity of the previous process or the non-monitored process.
Further, on the basis of the technical solution of the above embodiment, the method further includes:
and judging the abnormal process according to the non-uniform judgment result of the non-filtered non-uniform area.
Example two
Fig. 3 is a flowchart illustrating a method for determining linear process non-uniformity according to a second embodiment of the present invention, and based on the first embodiment, the present embodiment further optimizes "step 120, the non-uniform region of the inspection object is identified based on the image", which has an advantage that the non-uniform region of the inspection object can be identified relatively accurately. Referring specifically to fig. 3, the method specifically includes the following steps:
And step 320, carrying out binarization processing on the image.
Wherein the set area is sequentially cut out from the image of the detection object. Assuming that the ratio of the number of black pixels to the number of white pixels in the set area is 1/1 in a linear uniform state, and the ratio obtained through statistics is 2/3, it can be obtained that the currently set area is an uneven area.
The threshold is the ratio of the number of black pixels to the number of white pixels in a set area under a linear uniform state.
And 350, calculating a linear offset angle in the specific direction of the uneven area according to a preset detection direction.
And 360, filtering out the uneven area in the specific direction based on the linear offset angle and a set filtering size.
In step 370, non-uniformity determination is performed on the non-filtered non-uniformity regions.
Illustratively, the non-uniformity determining the non-filtered non-uniformity region includes:
counting the ratio of the number of black pixels to the number of white pixels in the unfiltered uneven area;
and carrying out non-uniformity judgment according to the ratio.
In the method for determining non-uniformity of a linear process provided by this embodiment, on the basis of the first embodiment, in the process of identifying a non-uniform region of a detection object based on an image, firstly, binarization processing is performed on the image, then, a ratio of the number of black pixels to the number of white pixels in a set area is counted, and the non-uniform region of the image is determined by comparing the ratio with a threshold value, so that the purpose of identifying the non-uniform region of the detection object more accurately is achieved.
EXAMPLE III
Fig. 4 is a schematic structural diagram of an apparatus for determining linear process non-uniformity according to a third embodiment of the present invention, the apparatus including: an acquisition module 410, an identification module 420, a calculation module 430, a filtering module 440 and a decision module 450;
the acquiring module 410 is configured to acquire an image of a detection object; an identifying module 420 for identifying an uneven area of the detection object based on the image; a calculating module 430, configured to calculate a linear offset angle in a specific direction of the uneven area according to a preset detection direction; a filtering module 440 for filtering out the non-uniform region in the specific direction based on the linear offset angle and a set filtering size; and a decision module 450, configured to perform non-uniformity decision on the non-filtered non-uniformity region.
Further, the identification module 420 includes:
a processing unit configured to perform binarization processing on the image;
the statistical unit is used for counting the ratio of the number of the black pixels to the number of the white pixels in the set area;
an identification unit for determining an uneven area of the image by comparing the ratio with a threshold.
Further, the calculation module 430 includes:
a determination unit configured to determine a straight line along the specific direction from the uneven area according to a preset detection direction;
and the calculation unit is used for calculating an included angle between the straight line and the preset detection direction and taking the included angle as a linear offset angle in the specific direction of the uneven area.
Further, the preset detection direction includes an X direction and a Y direction;
when the preset detection direction is the X direction, the specific direction is the Y direction;
when the preset detection direction is the Y direction, the specific direction is the X direction;
the device further comprises:
and the processing procedure abnormity judgment module is used for judging the processing procedure abnormity according to the non-uniform judgment result of the non-filtered non-uniform area.
The present embodiment provides an apparatus for determining linear process non-uniformity, which calculates a linear offset angle in a specific direction of the non-uniform region according to a predetermined detection direction, filtering the non-uniform area in the specific direction based on the linear offset angle and the set filtering size, and finally performing non-uniform judgment on the non-filtered non-uniform area to avoid the condition of misjudgment caused by the mixing of the linear non-uniformity in the transverse direction (X direction) and the linear non-uniformity in the longitudinal direction (Y direction), meanwhile, the accuracy of the non-uniform judgment of the remaining non-uniform area is improved, and the specific abnormal process can be traced and distinguished according to the non-uniform judgment result of the remaining non-filtered area, meanwhile, the condition of linear non-uniformity misjudgment caused by the previous process or the non-monitoring process is avoided, thereby reducing the difficulty of stopping inspection caused by the influence of the non-uniform linearity of the previous process or the non-monitored process.
The device can execute the method provided by any embodiment of the invention, and has the corresponding functional modules and beneficial effects of the execution method.
Those skilled in the art can understand that all or part of the steps in the method of the foregoing embodiments may be implemented by a program to instruct related hardware, where the program is stored in a storage medium and includes several instructions to enable a device (which may be a single chip, a chip, etc.) or a processor (processor) to execute all or part of the steps of the method described in the embodiments of the present application. And the aforementioned storage medium includes: a U-disk, a removable hard disk, a Read-only Memory (ROM), a Random Access Memory (RAM), a magnetic disk or an optical disk, and other various media capable of storing program codes.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (7)
1. A method for determining linear process non-uniformity, comprising:
acquiring an image of a detection object;
identifying an uneven area of the detection object based on the image;
calculating a linear offset angle in a specific direction of the uneven area according to a preset detection direction;
filtering out non-uniform regions in the particular direction based on the linear offset angle and a set filter size;
carrying out non-uniformity judgment on non-filtered non-uniform areas;
the calculating the linear offset angle in the specific direction of the uneven area according to the preset detection direction comprises:
determining a straight line along the specific direction by searching black pixel points from the uneven area according to a preset detection direction;
calculating an included angle between the straight line and the preset detection direction;
taking the included angle as a linear offset angle in a specific direction of the uneven area;
the preset detection direction comprises an X direction and a Y direction;
when the preset detection direction is the X direction, the specific direction is the Y direction;
and when the preset detection direction is the Y direction, the specific direction is the X direction.
2. The method of claim 1, wherein the identifying the non-uniform region of the detection object based on the image comprises:
carrying out binarization processing on the image;
counting the ratio of the number of black pixels to the number of white pixels in the set area;
determining an uneven area of the image by comparing the ratio to a threshold.
3. The method of claim 1, wherein the non-uniformity determining the non-filtered non-uniformity region comprises:
counting the ratio of the number of black pixels to the number of white pixels in the unfiltered uneven area;
and carrying out non-uniformity judgment according to the ratio.
4. The method of claim 1 or 2, further comprising:
and judging the abnormal process according to the non-uniform judgment result of the non-filtered non-uniform area.
5. An apparatus for determining linear process non-uniformity, comprising:
the acquisition module is used for acquiring an image of a detection object;
an identifying module for identifying an uneven area of the detection object based on the image;
the calculation module is used for calculating a linear offset angle in the specific direction of the uneven area according to a preset detection direction;
a filtering module for filtering out the non-uniform region in the specific direction based on the linear offset angle and a set filtering size;
the judging module is used for carrying out non-uniform judgment on the non-filtered non-uniform area;
the calculation module comprises:
the determining unit is used for determining a straight line along the specific direction by searching black pixel points from the uneven area according to a preset detection direction;
the calculation unit is used for calculating an included angle between the straight line and the preset detection direction and taking the included angle as a linear offset angle in the specific direction of the uneven area;
the preset detection direction comprises an X direction and a Y direction;
when the preset detection direction is the X direction, the specific direction is the Y direction;
and when the preset detection direction is the Y direction, the specific direction is the X direction.
6. The apparatus of claim 5, wherein the identification module comprises:
a processing unit configured to perform binarization processing on the image;
the statistical unit is used for counting the ratio of the number of the black pixels to the number of the white pixels in the set area;
an identification unit for determining an uneven area of the image by comparing the ratio with a threshold.
7. The apparatus of claim 6,
the device further comprises:
and the processing procedure abnormity judgment module is used for judging the processing procedure abnormity according to the non-uniform judgment result of the non-filtered non-uniform area.
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