TWI260396B - Apparatus and method of inspecting unevenness and recording medium - Google Patents

Abstract

In an unevenness inspecting apparatus (1) for inspecting density unevenness of resist coated on a substrate (9), a picked-up image is compressed and low-pass filtering is performed on the image, and furthermore, high-pass filtering is performed on it by high-pass filtering part (4214). In the high-pass filtering part (4214), in a case where a high-pass window exists near an edge, the high-pass window is contracted and kept away from a region which is not a region including a target pixel whose value is to be obtained by the filtering. By the above operation, in the unevenness inspecting apparatus (1), a group of pixels which are subjected to high-pass filtering are limited to pixels in the high-pass window, in other words, pixels in a region which includes a target pixel, and the accuracy of inspection of unevenness around an edge is improved.

Description

1260396 IX. OBJECTS OF THE INVENTION · TECHNICAL FIELD OF THE INVENTION The present invention relates to a technique for inspecting an object [previous technique] and a technique of unevenness. In the prior art, for the use of the b piece, the use of the inspector's eye #用士", the 'non-clothing's shouting surface of the various directions of the zero-direction unevenness of the stripes is uneven, or in the vertical Or horizontal | For example, in the case of the technique disclosed in the Braun tube report, the light transmittance of the 嶋 嶋 敝 敝 敝 敝 不 不 不 不 不 不- Fang Zhi Er Ni Ying = side: light explosion for smoothing the inter-filter, find: slip two: Becco:: use: material except the color data, according to the calculated 2 1 to smooth the uneven The emphasis is on the shade of the shade / the application of the test, and the improvement of the accuracy of the inspection. - In recent years, there has been no longer relying on the use of images from the inspection of the object to check the image of the object, but to order: to edit the unevenness, to check the image of the object Contrast emphasis == used in liquid crystal display devices. 疋In coating P. , when the unevenness of the resist of the panel is inspected, when the panel of the dust-glass substrate is connected with a panel of a plurality of panels The electrode part of the department is kept. The area of the shape of the square, ten θ "can not detect the line of unevenness; 2 5 ^ the detection of the accuracy of the unevenness of the line is reduced. The main reason for the generation of this area - the product is u Before removing the low frequency that would hinder the effect of the emphasis on the 312ΧΡ/invention specification (supplement)/94-12/94130515 6 1260396, it is made by the high-pass «wave processing. Contrast emphasis processing [invention content] The purpose of the present invention is to check the object inspection device to improve the accuracy of the unevenness inspection of the image obtained from the object. The photography department, which is used to hold the image, which is used to hold the image, and is used to process the image to produce a processed image; the image processing unit is provided with a measurement unit. It is used to detect the difference between the image and the image in the image: the toxic ^ edge; the high-pass wave device, which is used to image the object image S = than the emphasis portion 'it is used to emphasize the high pass; the wave filter - two The pass filter unit 'will determine the pixel value of the main pixel in the processed image. In the image, the group is substantially limited to the pixel of the region to which the pixel of interest belongs. In the high-pass filtering process, the pixel of the pixel group used in the calculus is in the region of the region to which the main pixel belongs. The unevenness of the stone is checked by the unevenness of the edge of the limit. In the "object image, in the preferred embodiment of the present invention, the processing using the high-pass 泸, waver portion" is performed according to the second= prime value in the window centered on the pixel of interest. In the case of near the edge, the $ is reduced, so that the window avoids the area a domain to which the pixel of interest belongs. In this way, the characteristics of your rabbit in the vicinity of the edge can be made with 312/invention instructions (supplements) ) / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / The pixel values of the pixels of the area where the two ', middle/main eye elements belong are performed. In the case of "heavy form", the setting of the window can be simply performed.斤 : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : The unevenness is checked by the $ method' and the recording medium in which the program for performing the unevenness check method is recorded. The above and other objects, features, aspects and advantages of the present invention will become apparent from the Detailed Description [Embodiment] FIG. 1 shows an apparatus for detecting an unevenness inspection apparatus 1 according to a first embodiment of the present invention, which is used for inspection of a glass substrate (hereinafter referred to as "substrate"). In the device in which the etching agent is uneven (hereinafter referred to as "uneven"), a pattern for a plurality of panels for a liquid crystal display device is connected to the surface of the substrate 9. The unevenness inspection device 丨 includes a light transmissive stage 2 for holding the substrate 9 and a light irradiation unit 3 for illuminating the substrate 7 held by the thin plate-like substrate 9 of the stage 2 (the main surface on the (_ζ) side shown in Fig. 1)'. The photographing unit 5 is for photographing the upper surface of the main surface on the (+ζ) side of the substrate 9, and the computer 4 for performing various calculations. deal with. The computer 4 includes 3] 2 ΧΡ / invention manual (supplement) / 94 - ] 2 / 941 305 ] 5 8 1260396: The photographing control unit 41 is provided as a dedicated board for controlling the photographing unit 5; and the calculation unit 42 is used. The CPU or its peripheral circuits are subjected to various arithmetic processing; and the memory unit 43 uses a memory or a fixed optical disc to store various information. The memory unit 43 stores a dedicated program 81 read from a recording medium 8 readable by a computer such as a disc or an optical disk via a reading device (not shown) provided in the drawing of the computer 4, and the CPU executes the program 81 in accordance with the program 81. The arithmetic processing, that is, the execution of the program 81 by the computer 4, is used to perform the unevenness check with the electric moon I4. Further, the memory unit 43 itself may be one of recording mediums for recording the program 81. 2 is a plan view showing the stage 2 and the photographing portion 5. The photographing unit 5 includes a head portion 52 having a plurality of (10 in the present embodiment) CCD line sensors 51 arranged in a staggered manner in the Y direction in FIG. 2, and a head moving mechanism 53. For moving the head 52 in the X direction perpendicular to the Y direction; the head moving mechanism 53 is controlled by the photographing control unit 41 (refer to FIG. 1) for integrally moving the plurality of line sensors 51, The photographic image of the substrate 9 held on the stage 2 is obtained by 0. In the unevenness inspection device 1, 10 line sensors 51 each having 5,000 imaging elements are arranged to extend by 2 m, and each of the imaging elements is used as a pixel area of 40 // m square on the substrate 9. Take photography. The substrate 9 has a square shape of about 2 m square, and the image pickup unit 5 obtains an image of 50,000 pixels x 50000 pixels. As shown in FIG. 2, a pattern corresponding to eight panels for a liquid crystal display device is connected to the substrate 9, and each of the patterns has a portion (hereinafter referred to as "display portion 91") that is used in the center of the display, and is provided. The electrode portion 92 for electrode pattern formation in the outer peripheral edge shape 312XP/invention specification (supplement)/94-12/94130515 9 1260396. Since the light transmittance is different, the areas corresponding to the substrate '9', the second 91, and the electrode portion 92 91, and the area adjacent thereto are darker than the head portion (hereinafter referred to as "concentration" + 4,

The periphery of the outer side of the electrode portion 92 is different from each other. Similarly, in the region of (4), the concentration is also the same area, and the electrode unit is as shown in Fig. 1. The calculation unit 42 has the arithmetic processing to execute the calculation processing for the CPU 7 to the CPU. >The image obtained (hereinafter referred to as "photography scene: Ί 'to the photography department 5 to generate processed 彡 silly. $ I 八 5象") into the image processing, with processed & like 'and uneven The detecting unit 42 uses the calculation processing to obtain the representative substrate 9 == shirt image, thereby generating the second:: 4211' for compressing the photographic image mu filter unit 4212 for low-passing the first $ image. The filtering process is used to detect the richness of the shirt, such as the edge detection unit, 91 and the electrode part 92:::) V: the realm of the area (for example, the display clip # Μ 9 public) You, two ") edge; high-pass filter unit 4214, the shirt image is subjected to high-pass filtering processing to generate a third fg contrast emphasizing portion 4215, which is used to force the stems to be processed, and to process images. The comparison of the five-week 3 image is used to generate the flow of the unevenness detection f on the substrate 9 using the unevenness inspection device 1: the unevenness inspection device 1 first uses the light irradiation shown in the figure: U is moved to the lower side of the substrate g of the stage 2 (step f. 1) ^, and the plurality of line sensors 51 are moved in the X direction in FIG. 1 by the head moving mechanism 53. By using the plurality of line sensors 51, the substrate/invention specification (supplement)/9 sentences 2 touches 3〇5]5 312XP/: 1260396 9 is photographed, and the photographic image calculation unit 42 is operated by The user, the player, and the computer 4 are accepted by the shirt image processing unit 421 (step S1w n is preferably high S/wr 2). The photographic image is photographed by Junhuai Huaiguang (10). In order to receive the first image of each sensitive component of the sensitive multiple line sensor 51 as needed, the photographic image is used to generate the first image. (Step (10). In this video, when the pixel value of the pixel at the coordinates (χ, γ) is taken as the image of the pixel Xsa pixel, the first generation of the image is generated by Μ心;^;., located in the block - the pixel value of the eye Α > Υ:

Fxy / In the present embodiment, since "is 4 (Tong Xin), the g prime number becomes moo pixel χ 125 η η = prime), so the image of the brother 1 is four times as large as the captured image. The S 1 of the image 1 1 When N can generate a first image, the image is subjected to low-pass processing, and the image is chopped by the wave-sharing unit 4212 to suppress the first image and smooth the smoothed second image. The calculation range of the processing is two (14). The length of the square of the low-pass square is determined by the length of the 1疋1 side (2s丨+ 1), the value of the pixel element value A (reference formula ()), w - 3 si 之 之 si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si si图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图2 s 1 +1) (2)

The Si solid 4 is enlarged to indicate the vicinity of one corner of the area corresponding to the i panels in the second image. In the following description, the area in the image corresponding to the display unit 91 and the portion 92 is also indicated by the "display portion 91" and the port "electrode portion 92". In Fig. 4, the pixel 9 〇 1 indicated by the cross line is the pixel on the edge _ of the boundary between the display 91 and the electrode portion 92, hereinafter referred to as the edge pixel 901". The pixel 911 indicated by the line on the upper right side of the edge _ in Fig. 4 is a picture element on the display unit 91, hereinafter referred to as "profit element 911". Further, the 'edge edge _ is opposite to the display portion 91; and the pixel 921 indicated by a different parallel oblique line on the side is an electrode portion, hereinafter referred to as "electrode portion pixel 921". As shown in Fig. 4: In the embodiment, the edge_ has the amplitude of two pixel parts. When the second image is generated by the present animal, the memory is used in the memory unit 43 (step s] 5). In addition, _彳= before high-pass chopping, it can also be performed at low pass = as in the pressure. Then, the high-resolution image filtering processing is performed by the high image image, and the second image is used to generate the low-frequency density variation of the contrast emphasis processing described in the t-plane, which hinders the subsequent step S16). Here, the attention image at the coordinates (x, y) (step H, using the pixel of the vicinity of the pixel of interest: the prime value U of the prime (2)), and the equation (3) Got it. The figure value of the shirt image 3 ] 2XP / invention manual (supplement) /94-] 2/94130515 12 ...· · (31260396

Hxy 2 L) f2 Y+S2 2 , ^ Σ Lxy / (2 S2+1) ~ s2 Y, s2 Equation (3) does not need to determine high-pass filtering (hereafter referred to as "Qualcomm 爻 爻, 爻ο,, target The window is surrounded by the eye. The tomb is centered on the eye and the tomb: (in the case of a square window of 2 pixels. In the middle, S2 is variable, and the maximum is 12 (pixels). Fig. 5 shows the wave generator part 4214 of the high-pass filter processing in step S16 (夂日召r Ί, , a &丄'丨L private. In the 焉通滤•渡波处理二算: Figure 2 : The first choice, the use of the Qualcomm's seat protector and the 1 产 于 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取 取The distance between the pixel and each edge pixel 9〇1 'horizontal direction, and the row direction (in the figure === in the middle of Figure 4) for each edge pixel 9 〇 find the distance: = larger - square The value (step _. then = 'true edge 9 〇〇 901, the minimum value of the value of riding the big side as the minimum value of the distance between the pixel of interest and the distance d, becomes a high-pass filter with the attention pixel Department 4214 confirmed Whether the attention pixel exists in the vicinity of the edge (step S162), and when the minimum value associated with the pixel of interest is 13 (pixel) or more, it is judged that it is substantially away from the edge _, and the maximum value is 12 The high-pass window of (pixel) is set at the specified maximum size (that is, 25 pixels square) (step S163). Further, when the minimum value d of the pixel is 13, the pixel is not full. In order to note that the pixel is present near the edge 900, U becomes Qualcomm 312XP/Inventive Manual (supplement)/94·] 2/94130515 1260396 is fine (step, step S164). At this time, the reduced high view = edge _. There are other edge pixels called Gaotong; the internal and future gates of the 'eyes of the eye' and the ##, the true set of the other edge elements 901 between the direction of the column and the direction of the direction of the seal, the seven 々 π π . , ~ Fortunately, the value of the big one, because it must be smaller than the minimum value d, so the Qualcomm window is further reduced. Figure 6 is similar to Figure 4, used to expand the second image: f In the vicinity of the corner of the area, the value of each pixel in the display unit is not The minimum value d between the display unit pixels 911 and _. The display unit pixel with the symbol 9仏 in Fig. 6 becomes the attention pixel, in this case, the attention pixel 911a and each edge pixel coffee The maximum value of the distance between the column direction and the row direction is the value of the square, because the minimum value d becomes 2 pixels, and the value becomes 1 (pixel): the high pass shown by the thick line of the figure ^ The length of each side of the window·a is 3 pixels (that is, 'becomes (2s2+1) pixels, and becomes (2d-l) pixels). The value d is not: 1) The high-pass window of the square of the pixel, when the Qualcomm window still leaves the edge 900, the Qualcomm window 4214a is fixed to the maximum size, when it exists in the edge_near side = The window 4214a is reduced to avoid the area other than the display portion 91 of the region to which the pixel 9 is located (also the electrode portion 92). That is, the edge 900 in Fig. 6 and the result that all the pixels in the high-pass window 4214a become the display portion pixels 9n of the pixels in the region to which the attention pixel 9 belongs, in this case 3] 2 χ ρ / invention Manual (supplement) /94] 2/94130515 14 1260396 state, according to Qualcomm window 42u Tonghu,, ##卢里, the figure of the figure of the king of the king is high ui. . R77 ^ / x ang 3 In the shirt, the figure of the figure 911a is the picture value of the figure 911a - the picture of the figure '3' S165) 'then, then the picture of the eye is converted to the next (step 6 66 = ^ ^ on the production of 3 days, in addition, ¥Note 911a is on the edge of the 900 lf month, not built, S, 丄, ^ ^ ^ pass filter processing, becomes 1. When the pass filter processing is completed, use the image to compare _ processing, / 3 f M5 brother 3 % ^ ψ η μ -ρ ^ ^ Generate processed image, in the processed image, located at coordinates (x, y), main = light 317). In the processed value of the Pm element, the E value is obtained by using the figure of the eyepiece of the brother's 3 shirt and the background value b, and the formula (4) is abruptly a contrasted with the strong ratio rc, 0.02, 0.05 or 01. The heart, the rc is 0.01,

E xy=b((H B-1) 八 c + i) · · · · · (4) • The picture shows the part of the image. The left side of the edge _ in Fig. 7 shows the electrode portion 92, and the area on the right side indicates the display portion 91. In addition, the electrode portion 92 and the display portion 91 have different concentrations of the two regions, and the concentration of the different pole portions 92 in FIG. 2 is higher than that of the display portion 9 and is not narrow. Indicates that the processed image produced by the photographic image shown in FIG. 7 is partially processed: part: processing: 9: = image, emphasis is made to confirm the difficulty. FIG. 9 does not show the size of the edge _ high-pass window 4214a = ' . 3] 2XP / invention manual (supplement V94-12/941305) 5 15 1260396 虞 Qualcomm window all the pixels in her, to have processed the processed image of high-pass wave elimination, as a comparative example. For the edge and edge_near pixels, the high-pass filter is performed according to the pixel values of the pixels of the two regions (that is, the display portion 91 and the electrode=92 in FIG. 7). Wave processing, so as shown in the figure, it can be confirmed that the horizontal stripe unevenness is 95, but the pixel value is saturated by two:: two, through the contrast emphasis processing, the pixel value is calculated to be less than ^ or larger than the larger value) 94 ' The area generated at the edge _ will become the area where the unevenness cannot be detected due to the saturation of the pixel value. The reason why such a region 4 where the unevenness cannot be detected is generated is because the pixels on both sides of the edge and edge 9 are subjected to high-wave processing to emphasize the variation of the pixel value in the direction of the edge 900. ~ On the other hand, in the uneven inspection device, via the Nantong window 4214a, because the edge of the cover is not used, the main eye diagram: the pixel value of the pixel where the spear is present on the opposite side is used. Come in = 'wave processing, so as shown in Figure 8, when compared with the comparison example, :::: 9〇〇 (in the processed image shown in Figure 8, because the edge cannot be seen, the edge is ' In the vicinity of the two-point key line, the area of the side can be narrowed, so as to improve the unevenness of the edge near the edge 900. When the emphasis is emphasized, the accuracy shown in the old one is utilized. The arithmetic processing of the processed image data is performed on the scatter sentence = the whole part is not uniform, and the part is present on the substrate 9 "the average of the inverse 9 and the linearity in the column direction or the row direction. The part of the knife is not uneven. The degree of unevenness (called the unevenness intensity) is determined; the pattern: the average of each 疋, the calculation indicates 312XP / invention manual (supplement) / 9' 12/9413〇 515 16 !260396 =:=:= value (step S18). When the evaluation values for various unevenness 4=two:::: are described below, first, each of the unevenness detecting unit regions is used, and the FFT is performed. The evaluation of the size of the square of the shirt size FFT (Fourier transform), 4:,), find the spectrum F, where k is an additional word, used to represent: j is the evaluation of the object The area is the evaluation area of the processed image = the evaluation area of the younger k, Γ 瘫 2^ UkG, yk°) and (Xh, ykl) are the coordinates of the pixels that define the apex of the kth · · area. , (8); becomes the length of the i-side of the estimated area, in the real 64 (pixel) or 128 (pixel).

Fuv = Σ Σ Εχ γ i · 2 (υΧ+ν\〇 /Sf Χ = χκ-υ Y: yk〇 • · · · (5) • · . · (6)

Xk 卜 Xk0 + l = ykl - yk〇 + ] [ • In addition, the power of the specified frequency band of the low frequency in the spectrum F, is accumulated as shown in the equation (?), and is used to obtain the evaluation region of the kth The evaluation value of the overall unevenness Pkf. Here, I and sum; i 2 are the lower and upper limits of the frequency of the cumulative range. By the above processing, the evaluation value pkf is sequentially obtained in the unevenness detecting portion m for each of the sweat evaluation regions of the processed shirt images. P, (7) In addition, the 'standard deviation of the pixel values of each evaluation area of the processed image can also be used. In this case, the evaluation of the kth 3] 2XP/invention manual (supplement) ) /94-12/94130515 17 1260396 The evaluation value of the area p, the use of no, the size and shape of the area and the formula (5) and the formula (2) =. Here the number k, the same as the month, the shape of the spring area The shape (in the following description, the rectangular or circular shape can also be used in the description of the evaluation value of the 17th, etc., which is also suitable for the pixel number of the profit region. nk°' (9) is used to indicate the Evaluation

For example, the unevenness detection unit 422 calculates the pixel values of the entire pixels of the processed image by the calculation of the equation (10):: In the outline, the entire pixel is binarized from the threshold of the value of the second and the value of the value, and the specified size is calculated (that is, the link has the same value as the number or the second number as the evaluation of the partial unevenness. Value. Here (4) The number of pixels in the direction of the column and the direction of the line in the image of the sun, in the form of the present application, according to Zhao Chengcheng ancient #尬id he I χ?0 γ?〇ΕλΎ//(^ +υ (hei+1) w]d hei..., i mode makes both sides become 1 2500 (pixels).

AVE ......(10) 3]2ΧΡ/Invention Manual (supplement)/94-] 2/94〗 3 05] 5 18 1260396 In addition, the evaluation of the part of the evaluation of the unevenness ± >. : The rod can be found in the estimated area smaller than the total unevenness, and the standard deviation of one of the m ^ (or rectangular) mothers is obtained. The average value of ^ can also be obtained as the average of the evaluation area as the number of edges in each evaluation area. In the case of uneven distribution, the 422 dry valuation date, the first, the use of the uneven detection department has been processed. The image is subjected to a low pass filter. Low-pass filter p 葙帟 3 〗, the real use of the production of the brother 4 shadow • shape, the length of the 4th side is (2s3 + 1) the square of the square l,, use, the main day pressure 铩 (x, y ) The value of the element value of the syllabus of the syllabus (the syllabus of the processed shirt image of the syllabus I (...) (4)), which is obtained by using the formula (11) (the figure is in the sorrow of the sorrow ,S3 α X+S3 y+S3 (11)

Lxy= Σ Σ Exy/(2S3+1)2 X—X—S3 Y=y —S3 The other L uses the unevenness detection _ 422, and the evaluation area of the square with the evaluation value 不ίΓ 与 that is not uniform with the whole. As shown in the equation (10), the maximum value among the projection values of the column directions obtained for each of the two elements is calculated, and the evaluation value Pkhl of the unevenness of the stripes (so-called horizontal unevenness) is calculated. In the evaluation area, the word γ is used as the first additional word γ. In addition, b is the same background value max [, name, and formula (4). Lxv/ b ], (γ = yk.~yw) VI, 1 Similarly, as in equation (1), for the evaluation field, the maximum value of the projection values of the g directions of each row is calculated, and the direction of the row is calculated. Stripe not 3 ] 2XP / invention manual (supplement) /94-12/94130515 39 1260396 Both (the so-called vertical head is not %, u straight sentence) after the valuation Pk', i. For the Bu Bu ▲ The additional words of the first few lines indicate the evaluation area here Λ 1 uses Xk. ~Xu value.

P :max κ j

(X

Xko ~ Xk] Σ L^y/b ······· (1 3 ) In addition, as the other side of the unevenness of the stripe, the length of the stripe unevenness to be detected is evaluated in parallel to obtain the average value, and the evaluation area is used. The average value of the rod thousand: / domain pixel value in the unevenness detection unit 422, the evaluation of the Φ substrate 9 according to the type is recorded in the county t 4 Γ, so that the relevant threshold is compared, when there is In the case of ^, various kinds of inconsistencies, the value is detected, and π is detected (step S19). The value is different from the type of L. As shown above, in the shadow, $^^Q, Ji, is set to 1, and when the third == element is obtained (that is, when the processed image is generated, it becomes the target of π. When the pixel value of the pixel is high, the high-pass filter is used in the second image shown in Fig. 6 to use the 4-becker to be used in the shoulder-opening figure, and is limited to the figure in Qualcomm: That is, the limitation of the display element "in the second or the display portion 91 of the display portion 91" can be used to improve the accuracy of the unevenness inspection near the edge 900. In addition, the high-pass window 42Ua is placed near the edge 900. The narrowing is used to avoid the area other than the area to which the attention pixel 91 la belongs, even if the attention pixel 911a is located at the approximate center of the plurality of pixels used in the high-pass filtering process, the edge 900 can be made close to the edge 900 The characteristics of the inspection are similar to those of the inspection of the unevenness of the area far from the edge. 312XP/Invention Manual (Supplement)/94·ι2/9413〇515 20 1260396 In addition, the Qualcomm Window 4214a is squared.夂, really longer than the attention between the pixel 9na and the edge pixel 9〇1 The degree is the minimum value of the larger of the distances. The illusion direction and the row direction are set to the high-pass window 4214a so that the newspaper can easily avoid the area outside the area where the 1 pixel can belong. In addition, in the unevenness inspection apparatus i, it is possible to greatly suppress the evaluation of the degree of unevenness of the substrate 9 by the use of the edge/detection unit 422. 3 and can be automatically > In the following, the device structure of the unevenness inspection device according to the second embodiment of the present invention will be described. The fish: "device. The second inspection device" is the same as the following: 2. The method for detecting the unevenness of the embodiment is the same as the second symbol. The method of the high-pass filter processing of the device 4214 is the same as that of the remote wave 1 in the same manner. When the unevenness inspection apparatus first uses the light-time g-shooting of the 日 仃 仃 仃 仃 仃 ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( === (step S14). Second, use At the end of the generation of the 2 shirts, the coordinates of each edge pixel 901 = 4 4 / 13 detection edge 90 〇 ' after the high-pass filter unit 4214 to the Ί _ 5 部 43 43 43 43 43 43 43 '^进=通法皮处理, with the treatment of 5 Hai Temple and the first real 312XP / invention manual (supplement) / 9 wood〗 2/94 丨 3 〇 5] 5 21 1260396 The same as the case of the form. In the same manner as in FIG. 4, the second image of the unevenness inspection device of the second embodiment is enlarged to indicate that the second image is first in the vicinity of the corner of Ά: ^91. In the high-pass chopper unit 4214, the range of the center-pass filtering process is set to be the size of the eye-catching element 4214a, and the sides are wide: the height of the embodiment is the maximum size of the high-pass window 4214. Fig. (i.e., when the length of each side is made (2s state, the monthly condition t, and S4 becomes 12 (pixel)), but in Fig. 11, the convenience of the illustration is shown as 7 pixels. When the blinking window 4214a is set, the pixels in the display portion 91 (that is, the display portion pixels 911) are made to be in the pixels in the high-pass window 4214a according to the coordinates of the attention pixel 9na and the edge pixel 901. The region to which the attention pixel 911a belongs is used to designate a region formed by a pixel group that does not interfere with the edge of the pixel 911a (in the figure J}, indicated by a thick solid line, The high-pass filter unit 4214, as shown in the formula (14), only refers to the pixel value l of the pixel in the connection region 4214b of the second image (see equation (2). ), high-pass wave processing is performed to obtain the pixel value H xy of the attention pixel 911 a of the third image (step) SI 62a) mxy where the number of picture elements within the coupling region 4214b is ^ Lxy:.. If the connection, 0: Other

〇 / x+S4 y+S4

Hxy = Lxy / / ί 2 2 X = x - S4 Υ = y - 312 ΧΡ / invention manual (supplement) / 94-12/9413 0515 22 • (14) !26〇396 4 round heart in the side%% become 〗. ^Do not enter the Nantong filter processing, when the bamboo shoots and the 隹成门d skin treatment, use the contrast emphasizing unit 4215 to compare and emphasize the third image, which is used to generate the data of the image of the image of the king... In the memory unit 43 (step 3 of FIG. 3, the Γ processing unevenness detecting unit 422 calculates the substrate 9:: Τ:: calculation according to the above-described method, and evaluates the unevenness according to the method described above. (牛·&quot;不句, unevenness of the bruises and the striped board 9 ====: two in all kinds of unevenness, so that the threshold of the base is compared, each has its own =43 and all kinds of non-pro In the case of the limit, the inspection of her marriage is indicated by the use of the unevenness of the second embodiment; the part of the processed image produced by the rationale. As shown in the figure: the unevenness inspection device like 9 c can make The area 94 where the strip n is not detected unevenly (in the area of Fig. 95, which is reduced to the area corresponding to the side (ie, = folder, area), the area of the two pixel parts) In the case of the above-described example, in the second embodiment, the high-pass is performed on a plurality of pixels adjacent to the unevenness inspection device of the adjacent edge_ The wave processing a, '= according to the attention of the eye-steps to improve the unevenness of the edge 900 near the edge can be further improved by the size of the high-pass window 4214a; ^ month accuracy. In addition, the pass-through filter processing simplified 312XP / Inventive specification (supplement) /94·〗 2/941305] 5 23 Ϊ260396. Sample: In the case of the uneven inspection device of the Ang 24 wide state, the first implementation of the energy gate (5) pass filter unit 4214 is obtained. 3 ~ When the pixel value of the same pixel is the same as the first: the meaning of the first:: - is limited to the connection area 4214b # + in the same as the 01 彳仏 p pixels, In other words, the restriction element...the display unit 91 of the area to which it belongs is used to improve the brightness of the unevenness inspection near the edge 900, and the calculation processing by the unevenness detection unit 422 is used. The other edge of the 900 铷 / 铷 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以 以The above embodiment may be modified in various ways. x, 'not limited to, for example, the imaging unit 5 may be provided. Set 2 dimensional cCD film 'photography element, instead of line sensing $ 51 ϋ ^ ^ : : : : : : : : 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上The shot is emitted from the opposite side of the clad substrate 9_, and the light transmitted through the substrate 9 is incident on the photographing unit 5, and can be constructed such that the illumination of the light is reflected from the same side as the photographing portion 5, and the sheet 9 is reflected. Light is incident on the photographing unit 5. In addition, when the light source of the substrate 9 is other than a light source having sufficient brightness (for example, normal illumination for performing unevenness inspection), the light irradiation unit 3 may be omitted. If the pixel 911a is located in the Qualcomm window 4214a, the prime numbers of the sides of the Qualcomm window 4214a may also be even. ^ In addition, Qualcomm window 4214a is not limited to a square, but can also be other shapes such as ^ or round, but it can be simple from the 丄 ' ^ 疋仃 Nantong window 312XP / invention manual (supplement) / 94-12/94130515 1260396 14a. From a point of view, it is best to become a rectangle. Two ^::: 4214, from the Qualcomm window 42143 can also be larger from the point of view of the average =: 1 'best way to show the full &amp; (3) as a Nantong filter, but can also be processed, for example, Perform the weighted averaging process, or the center, / / his various mediation, and 4 inter-filter processing. In addition, ', σ performs Fourier transform on the second image ^ ^ ^ ^ ^ ^ ^ ΒΒ , , Μ 夂 寻 寻 寻 以 以 以 以 以 以 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻 寻Used to generate a third image. ...transformed into the image utilization image processing unit 4 21 shadow silly t-b production _ shadow image into (four) shrink processing and low (four) processing before the photographic image S / N ratio is very much processing 'but can also be in photography, conditions, It is appropriate to insert the influence of the current situation or the influence of the two-frequency noise into other processing. </ br> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> The hole is inspected. The temple is not limited to the various embodiments of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing the structure of an unevenness inspection device according to a first embodiment. Fig. 2 is a plan view showing a stage and a photographing unit. The process of detecting the operation is not shown. 312ΧΡ/Invention Manual (Supplement)/94-12/94130515 25 1260396 Figure 4 shows one part of the second image in an enlarged manner. Figure 5 shows the flow of high-pass filtering processing. The ground indicates a part of the second image. Fig. 7 shows a part of the photographic image. Fig. 8 shows a part of the processed image. Fig. 9 shows a part of the processed image of the comparative example. 2 The height of the unevenness inspection device of the embodiment The flow of the filtering process is shown in Fig. 11. One part of the second image is enlarged. Fig. 12 shows a part of the processed image. [Description of main component symbols] 1 Uneven inspection device 2 Stage 3 Light irradiation section 4 Computer 5 Photographing unit 8 Recording medium 9 Substrate 41 Photographing control unit 42 Calculation unit 43 Memory unit 51 Line sensor 52 Head 53 Head moving mechanism 312XP / Invention manual (supplement) / 94-12/94130515 26 1260396 81 Program 91 Display portion 92 Electrode portion 93 Peripheral portion 94 Undetectable region 95 Uneven unevenness 421 Image processing unit 422 Uneven detection unit • 00 Edge 901 Edge pixel 911 Display part 911a Note element 921 Electrode part Element 4211 image compression unit 4212 low-pass filter unit 4213 • edge detection unit 4214 high-pass filter unit 4214a high-pass window 4214b connection area 4215 contrast emphasis unit 312XP/invention specification (supplement)/94-12/94130515

Claims (1)

1260396 X. Patent application scope: 1 · The type of unevenness inspection device' is used for inspection, and is characterized by: 'the shade of unevenness of the object' is used to hold the object; It is used for the image processing unit of the object, 1 uses the μ + 4i main surface to perform the image processing, and the image processing to generate the processed image, and the subtracted oblique image into the image processing unit is provided with: The detecting unit is configured to detect the edge of the domain boundary; ~ the high pass fiUer portion of the seventh-degree difference, the image is subjected to high-pass filtering processing; and, the end of the object is &quot;ΓΓί a modulation unit for emphasizing the comparison of the target image processed by the high-pass filter and the waver unit; and the processed high-pass filter unit is configured to determine one of the processed images in the processed image group When the pixel value is used, the pixels of the pixel group used in the calculation are limited to the pixels in the region to which the above-mentioned pixel of interest belongs. - 2. If you apply for a patent scope! The item unevenness inspection device is characterized in that the high-pass filter processing of the filter unit is performed based on the pixel values of all the pixels in the window in the approximate center of the image, and the window exists in the above In the case of a near edge, the window is reduced so that the window avoids an area other than the area to which the above-mentioned pixel of interest is located. 、 3. The uneven inspection device of claim 2, wherein the window is rectangular. 312 ΧΡ / invention manual (supplement) Outline · 2/94130515 28 1260396 Depending on the ttt, please refer to the third aspect of the patent range inspection device, wherein the above-mentioned edge of the edge: the above-mentioned high-pass wave device unit obtains the above-mentioned attention pixel And the distance between the column direction and the row direction between the upper and the lower pixels is larger, and will be smaller than 2 times the minimum value of the long-term threshold value of the above-mentioned window related to all the pixels in the edge. The value of the prime is set to the length of each side of the above-mentioned sight. , specialization: the unevenness inspection device of the first item of the scope, in which the high-pass filter processing of the use of • Xin: 2: Bo Jie Department, only according to the above-mentioned attention in the pixels in the window of the above-mentioned attention map = two fixed size The pixel value of the pixel of the £ domain to which the pixel belongs is performed. V-visor V: Moment: Patent model, item unevenness inspection device, in which the above-mentioned material factory song, * has processed the shirt image, and uses the arithmetic processing to obtain an unevenness check indicating the value of the degree of unevenness of the object unit. ^Object查方Λ==Kang from the object obtained image of the object: t material is not uniform, it is characterized by the following steps = in the object image in the shade of the boundary between the boundaries of the realm (four); a step of performing high-pass filtering on the image; 'steps of the high-pass chopping process used to generate the processed image; and 1' comparing the steps of detecting the unevenness of the object according to the processed image 312XP/Invention Manual (Supplement)/94-12/94130515 29 I26〇396 In the above-mentioned image of the high-pass filtering process, when the pixel value of the pixel is taken, the pixel group of the upper 34 processed image is calculated. In essence, the second object is used in the image of the target image. It is limited to the region to which the above-mentioned pixel of interest belongs: the method of uneven detection of the δth item in the second V! patent range, 1 in the upper and lower f When the figure is the vicinity of the window near the center of the window: "When the above window exists on the edge of the above-mentioned window, the description of the picture is shown in Fig. 2: The window is reduced, so that the window is avoided." Outside the area The area. The method for checking the unevenness of item 9 of the profit range, wherein, the above 11 · If the application of the patented tendon cage window is a square in the method of uneven inspection of the item, wherein the above-mentioned attention is a In the processing step, summing the squares = the column direction between the pixels in the edge > the value of the γ above all the pixels, and the value of the value of the % of the above edges is The minimum of 2 times the minimum value is also the length of each side of the above window. If the method of inspection of the inequality of item 8 of the patent application is applied, the filtering process is based only on the above-mentioned attention chart; the pixel value of the element = the picture of the region of the above-mentioned pixel of interest in the internal element. The unevenness inspection method of item 12, in which the upper 312XP/invention specification (supplement) is taken 1 i 3〇5] 5 14. - The recording medium is recorded so that the computer is based on the object obtained from the object 30 Ϊ 260396 object The image inspection program uses the above-mentioned computer's unevenness program, in which the detection is concentrated in the target image, and the fire is "&quot; the following steps are performed: the boundary T / Chen / fire is different The step of the object image, the edge of the boundary; the step of filtering the filter; °. The step of generating the processed image after the Nantong filtering process; and the contrast of the image is based on the processed image test; The step of snoring/infested unevenness is performed in the above-mentioned step-by-step filtering process ^^ in the steps of your heart, when the above-mentioned processed image is obtained - 咏^^, the prime value is ¥, and the object image is used. In / show Voxel group, report area substantially limited Shu Shi Min ^ 1 ^ prepared in that the target pixel belongs to the picture element of FIG. 312ΧΡ/Invention Manual (Repair) Outline-12 Touch 130515 31