TW200613919A - Coating compositions for use with an overcoated photoresist - Google Patents

Coating compositions for use with an overcoated photoresist

Info

Publication number
TW200613919A
TW200613919A TW094116038A TW94116038A TW200613919A TW 200613919 A TW200613919 A TW 200613919A TW 094116038 A TW094116038 A TW 094116038A TW 94116038 A TW94116038 A TW 94116038A TW 200613919 A TW200613919 A TW 200613919A
Authority
TW
Taiwan
Prior art keywords
coating compositions
overcoated photoresist
compositions
antireflective coating
overcoated
Prior art date
Application number
TW094116038A
Other languages
English (en)
Inventor
Gerald B Wayton
Peter Trefonas Iii
Min-Ho Jung
Original Assignee
Rohm & Haas Elect Mat
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas Elect Mat filed Critical Rohm & Haas Elect Mat
Publication of TW200613919A publication Critical patent/TW200613919A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polyesters Or Polycarbonates (AREA)
TW094116038A 2004-05-18 2005-05-18 Coating compositions for use with an overcoated photoresist TW200613919A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US57201304P 2004-05-18 2004-05-18

Publications (1)

Publication Number Publication Date
TW200613919A true TW200613919A (en) 2006-05-01

Family

ID=34941338

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094116038A TW200613919A (en) 2004-05-18 2005-05-18 Coating compositions for use with an overcoated photoresist

Country Status (6)

Country Link
US (1) US20060057491A1 (zh)
EP (1) EP1598702A1 (zh)
JP (1) JP4738054B2 (zh)
KR (1) KR20060048011A (zh)
CN (1) CN100503756C (zh)
TW (1) TW200613919A (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI462150B (zh) * 2009-03-20 2014-11-21 Asml Holding Nv 在微影雙重圖案化過程中改善對準標的對比
TWI821442B (zh) * 2018-10-31 2023-11-11 南韓商羅門哈斯電子材料韓國公司 形成用於euv光蝕刻製程的抗蝕劑底層膜之塗料組成物

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
JP4566861B2 (ja) * 2005-08-23 2010-10-20 富士通株式会社 レジスト組成物、レジストパターンの形成方法、半導体装置及びその製造方法
EP1845416A3 (en) * 2006-04-11 2009-05-20 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for photolithography
US8455178B2 (en) * 2006-09-26 2013-06-04 Rohm And Haas Electronic Materials Llp Coating compositions for photolithography
US20080286689A1 (en) * 2007-05-14 2008-11-20 Hong Zhuang Antireflective Coating Compositions
KR101372829B1 (ko) * 2007-12-13 2014-03-12 닛산 가가쿠 고교 가부시키 가이샤 레지스트 하층막 형성 조성물 및 레지스트패턴의 형성방법
KR101546222B1 (ko) 2008-02-25 2015-08-20 허니웰 인터내셔널 인코포레이티드 공정가능한 무기 및 유기 중합체 배합물, 이의 제조방법 및 이의 용도
US8221965B2 (en) 2008-07-08 2012-07-17 Az Electronic Materials Usa Corp. Antireflective coating compositions
US8329387B2 (en) 2008-07-08 2012-12-11 Az Electronic Materials Usa Corp. Antireflective coating compositions
US20100092894A1 (en) * 2008-10-14 2010-04-15 Weihong Liu Bottom Antireflective Coating Compositions
US9244352B2 (en) 2009-05-20 2016-01-26 Rohm And Haas Electronic Materials, Llc Coating compositions for use with an overcoated photoresist
KR101710415B1 (ko) * 2009-09-14 2017-02-27 주식회사 동진쎄미켐 유기 반사방지막 형성용 이소시아누레이트 화합물 및 이를 포함하는 조성물
US8507192B2 (en) 2010-02-18 2013-08-13 Az Electronic Materials Usa Corp. Antireflective compositions and methods of using same
JP5782283B2 (ja) * 2010-03-31 2015-09-24 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 新規のポリマーおよびフォトレジスト組成物
EP2472328B1 (en) * 2010-12-31 2013-06-19 Rohm and Haas Electronic Materials LLC Coating compositions for use with an overcoated photoresist
EP2773710B1 (en) * 2011-11-04 2016-04-06 Valspar Sourcing, Inc. Coating composition for packaging articles
US9170494B2 (en) 2012-06-19 2015-10-27 Az Electronic Materials (Luxembourg) S.A.R.L. Antireflective compositions and methods of using same
US10307752B2 (en) 2012-06-26 2019-06-04 Mitsubishi Chemical Corporation Method for producing polymer, and polymer
KR102255221B1 (ko) 2013-12-27 2021-05-24 롬엔드하스전자재료코리아유한회사 나노리소그래피용 유기 바닥 반사방지 코팅 조성물
KR102233875B1 (ko) * 2013-12-30 2021-03-30 롬엔드하스전자재료코리아유한회사 광산 발생제를 포함하는 반사방지 코팅 조성물을 이용한 패턴 형성 방법
TWI592760B (zh) * 2014-12-30 2017-07-21 羅門哈斯電子材料韓國有限公司 與經外塗佈之光致抗蝕劑一起使用之塗層組合物
US11092894B2 (en) 2014-12-31 2021-08-17 Rohm And Haas Electronic Materials Korea Ltd. Method for forming pattern using anti-reflective coating composition comprising photoacid generator
EP3194502A4 (en) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
US10203602B2 (en) 2016-09-30 2019-02-12 Rohm And Haas Electronic Materials Korea Ltd. Coating compositions for use with an overcoated photoresist

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3297785A (en) * 1963-09-30 1967-01-10 George Co P D Melamine-aldehyde resin modified polyester reaction products
US4186122A (en) * 1976-09-03 1980-01-29 Hitachi Chemical Company, Ltd. Electrical insulating coatings
US5935760A (en) * 1997-10-20 1999-08-10 Brewer Science Inc. Thermosetting polyester anti-reflective coatings for multilayer photoresist processes
KR100355604B1 (ko) * 1999-12-23 2002-10-12 주식회사 하이닉스반도체 난반사 방지막용 중합체와 그 제조방법
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
US20050215713A1 (en) * 2004-03-26 2005-09-29 Hessell Edward T Method of producing a crosslinked coating in the manufacture of integrated circuits

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI462150B (zh) * 2009-03-20 2014-11-21 Asml Holding Nv 在微影雙重圖案化過程中改善對準標的對比
TWI821442B (zh) * 2018-10-31 2023-11-11 南韓商羅門哈斯電子材料韓國公司 形成用於euv光蝕刻製程的抗蝕劑底層膜之塗料組成物

Also Published As

Publication number Publication date
JP2005346051A (ja) 2005-12-15
US20060057491A1 (en) 2006-03-16
CN1704455A (zh) 2005-12-07
CN100503756C (zh) 2009-06-24
JP4738054B2 (ja) 2011-08-03
KR20060048011A (ko) 2006-05-18
EP1598702A1 (en) 2005-11-23

Similar Documents

Publication Publication Date Title
TW200613919A (en) Coating compositions for use with an overcoated photoresist
EP1298492A3 (en) Coating compositions for use with an overcoated photoresist
EP1705519A3 (en) Coating compositions for use with an overcoated photoresist
TW200641533A (en) Coating compositions for use with an overcoated photoresist
TW200741352A (en) Coating compositions for use with an overcoated photoresist
EP2261738A3 (en) Coating compositions suitable for use with an overcoated photoresist
TW200613920A (en) Coating compositions for use with an overcoated photoresist
TW200632559A (en) Positive dry film photoresist and composition for preparing the same
TW200611923A (en) Radiation sensitive silicone resin composition
TW200741351A (en) Coating compositions for use with an overcoated photoresist
ATE451397T1 (de) Strahlungshärtbare hochglänzende überdrucklackzusammensetzungen
TW200506516A (en) Photoresists and methods for use thereof
TW200745764A (en) Coating compositions for photolithography
AU2003280750A1 (en) Actinic radiation curable coating composition and molded articles having coating films made from the composition through curing
TW200617604A (en) Composition for forming antireflective film and method for forming wiring using the same
EP2637062A3 (en) Pattern forming method
EP1736824A3 (en) Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
TW200731014A (en) Photosensitive composition
WO2005000912A3 (en) Novel positive photosensitive resin compositions
SG160322A1 (en) High integrity protective coating
WO2004090965A3 (en) Organosilicate resin formulation for use in microelectronic devices
EP1906249A3 (en) Antireflective coating compositions for photolithography
WO2008143302A1 (ja) レジスト下層膜形成用組成物
AU2002361686A1 (en) Organic anti-reflective coating compositions for advanced microlithography
EP1783520A3 (en) Optical grating trim retarders