TW200613575A - Evaporator, vapor deposition apparatus, and method of switching evaporator in vapor deposition apparatus - Google Patents

Evaporator, vapor deposition apparatus, and method of switching evaporator in vapor deposition apparatus

Info

Publication number
TW200613575A
TW200613575A TW094121254A TW94121254A TW200613575A TW 200613575 A TW200613575 A TW 200613575A TW 094121254 A TW094121254 A TW 094121254A TW 94121254 A TW94121254 A TW 94121254A TW 200613575 A TW200613575 A TW 200613575A
Authority
TW
Taiwan
Prior art keywords
evaporation
evaporator
container
vapor deposition
deposition apparatus
Prior art date
Application number
TW094121254A
Other languages
Chinese (zh)
Other versions
TWI398535B (en
Inventor
Yuji Matsumoto
Yoshiyasu Maeba
Kazuhito Suzuki
Tetsuya Inoue
Hiroyuki Daiku
Original Assignee
Hitachi Shipbuilding Eng Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Shipbuilding Eng Co filed Critical Hitachi Shipbuilding Eng Co
Publication of TW200613575A publication Critical patent/TW200613575A/en
Application granted granted Critical
Publication of TWI398535B publication Critical patent/TWI398535B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D17/00—Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
    • F04D17/08—Centrifugal pumps
    • F04D17/16—Centrifugal pumps for displacing without appreciable compression
    • F04D17/168—Pumps specially adapted to produce a vacuum

Abstract

This invention discloses an evaporator (4) evaporating a specified material under a specified degree of vacuum. The evaporator comprises a container (11) for evaporation connected to a vacuum pump (12) and having material discharge holes (17) capable of discharging the evaporated evaporation material (B) formed in the upper wall part (11c) thereof and a loading table (15) installed in the container (11) for evaporation so as to be lifted by a cylinder device (13) for lifting and capable of placing, thereon, a material storage container (14) in which a vapor deposition material (A) is stored. A tubular partition wall member (19) suppressing the discharge of the evaporation material into the container (11) for evaporation by covering the outer periphery thereof when the material storage container (14) is raised through the loading table (15) is installed around the material release hole (17) for the material in the container (14) for evaporation. A heating device (21) heating the material storage container (14) is mounted on the loading table (15) and the partition wall member (19).
TW094121254A 2004-06-28 2005-06-24 A vapor deposition apparatus, a vapor deposition apparatus, and a vapor deposition apparatus TWI398535B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004189282A JP4570403B2 (en) 2004-06-28 2004-06-28 Evaporation apparatus, vapor deposition apparatus, and method for switching evaporation apparatus in vapor deposition apparatus

Publications (2)

Publication Number Publication Date
TW200613575A true TW200613575A (en) 2006-05-01
TWI398535B TWI398535B (en) 2013-06-11

Family

ID=35776668

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094121254A TWI398535B (en) 2004-06-28 2005-06-24 A vapor deposition apparatus, a vapor deposition apparatus, and a vapor deposition apparatus

Country Status (5)

Country Link
JP (1) JP4570403B2 (en)
KR (1) KR101175165B1 (en)
CN (1) CN100558929C (en)
TW (1) TWI398535B (en)
WO (1) WO2006001205A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI596224B (en) * 2013-01-15 2017-08-21 日立造船股份有限公司 Apparatus of vacuum evaporating

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5036264B2 (en) * 2006-09-19 2012-09-26 日立造船株式会社 Vacuum deposition equipment
TWI353389B (en) * 2007-02-09 2011-12-01 Au Optronics Corp Evaporation coater and evaporation source replacem
JP5153410B2 (en) * 2008-03-31 2013-02-27 Ｈｏｙａ株式会社 Lens film forming method, vapor deposition apparatus, and lens manufacturing method
US8741062B2 (en) * 2008-04-22 2014-06-03 Picosun Oy Apparatus and methods for deposition reactors
KR101084234B1 (en) 2009-11-30 2011-11-16 삼성모바일디스플레이주식회사 Deposition source, Deposition apparatus using the same and method for forming thin film
DE102010017895A1 (en) * 2010-04-21 2011-10-27 Ald Vacuum Technologies Gmbh Device for coating substrates according to the EB / PVD method
JP5384770B2 (en) * 2011-03-15 2014-01-08 シャープ株式会社 Vapor deposition particle injection apparatus and vapor deposition apparatus
WO2013005781A1 (en) * 2011-07-05 2013-01-10 東京エレクトロン株式会社 Film formation device
JP5405549B2 (en) * 2011-10-20 2014-02-05 株式会社日本製鋼所 Vacuum film forming method and vacuum film forming apparatus
JP6021377B2 (en) 2012-03-28 2016-11-09 日立造船株式会社 Vacuum deposition apparatus and crucible exchange method in vacuum deposition apparatus
ES2817842T3 (en) * 2013-11-05 2021-04-08 Tata Steel Nederland Tech Bv Method for controlling the composition of liquid metal in an evaporator device
FR3018082B1 (en) 2014-03-03 2016-03-18 Riber METHOD FOR RECHARGING EVAPORATION CELL
US9909205B2 (en) * 2014-03-11 2018-03-06 Joled Inc. Vapor deposition apparatus, vapor deposition method using vapor deposition apparatus, and device production method
FR3020381B1 (en) * 2014-04-24 2017-09-29 Riber EVAPORATION CELL
JP6302786B2 (en) * 2014-08-01 2018-03-28 シャープ株式会社 Vapor deposition apparatus, vapor deposition method, and organic EL element manufacturing method
JP6445959B2 (en) * 2015-12-16 2018-12-26 株式会社オプトラン Film forming apparatus and film forming method
KR102561591B1 (en) * 2018-07-02 2023-08-02 삼성디스플레이 주식회사 Deposition apparatus and deposition method thereof
CN109321884A (en) * 2018-10-17 2019-02-12 武汉华星光电半导体显示技术有限公司 Evaporation coating device
WO2021207904A1 (en) * 2020-04-14 2021-10-21 眉山博雅新材料有限公司 Crystal growth method and device
CN112553691A (en) * 2020-12-02 2021-03-26 中电化合物半导体有限公司 Silicon carbide crystal growth method and growth device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3773587B2 (en) * 1996-04-15 2006-05-10 株式会社アルバック Purification method for organic compound monomers
JP3863988B2 (en) * 1998-02-06 2006-12-27 株式会社アルバック Vapor deposition equipment
US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
JP3662874B2 (en) * 2001-10-26 2005-06-22 松下電工株式会社 Vacuum deposition apparatus and vacuum deposition method
JP2003155555A (en) * 2001-11-15 2003-05-30 Eiko Engineering Co Ltd Multiple molecular beam source cell for thin film deposition
JP2004099942A (en) * 2002-09-05 2004-04-02 Kiko Kenji Kagi Kofun Yugenkoshi Evaporation source for deposition system, apparatus for heating the evaporation source, and apparatus for heating and evaporating deposition material by using them
CN2618925Y (en) * 2003-05-08 2004-06-02 深圳市创欧科技有限公司 Steam plating device for making organic electroluminescence display device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI596224B (en) * 2013-01-15 2017-08-21 日立造船股份有限公司 Apparatus of vacuum evaporating

Also Published As

Publication number Publication date
CN1950537A (en) 2007-04-18
JP2006009107A (en) 2006-01-12
CN100558929C (en) 2009-11-11
WO2006001205A1 (en) 2006-01-05
KR101175165B1 (en) 2012-08-20
JP4570403B2 (en) 2010-10-27
TWI398535B (en) 2013-06-11
KR20070024519A (en) 2007-03-02

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