TW200523380A - Evaporation coating apparatus - Google Patents

Abstract

An evaporation coating apparatus, which arranges the different nozzles corresponding to different evaporation targets in the way of coaxes or stagger, which enables the spurted gas molecules from each nozzle to be able to simultaneously arrive at the substrate surface, when the scanning co-evaporation process is carried out on the different evaporation targets, to achieve the uniformity of thin-film thickness and material distribution during co-evaporation.

Description

200523380

[Technical field to which the invention belongs] The present invention relates to a vapor deposition device, and more particularly, to a coaxial or staggered type black plating device in which nozzles for ejecting different vapor target gas are used. & [Previous technology] With the maturity of organic electroluminescence technology and more and more manufacturers producing products, it is an inevitable trend for organic electroluminescence displays (〇ELD) to enter flat display. From the perspective of the manufacturer, when organic electroluminescence displays are in short supply, they must follow the steps of liquid crystal displays, and the size of the production substrates must be reduced to obtain more economical production costs. ^ However, as substrate size is becoming a considerable challenge, how to make high-quality organic thin films on substrates has always been the biggest problem facing organics. The uniformity of the coating of Da Shi 'is that the large-area and uniform-thickness electroluminescent elements are originally produced in current mass production. From the area of mass production requirements, large-area thin-film evaporation was based on Congyuan in the early days. For improvement, the improvement methods using the point evaporation source include changing the shape of the opening of the point evaporation source gas container. "Number of Adding Evaporation Sources and Adjusting the Arrangement of Point Evaporation Sources ... In Small Areas and Small Production Volumes, < May Provide a Quite Uniformity Mode in Large-Area Mass Production with Single or Multiple Evaporation Sources Still Available Vapor deposition and quality of the film, but this kind of limitations, such as: film thickness is not

200523380 V. Description of the invention (2) Uniformity, low utilization rate of target material (material utilization rate is therefore only 0 ° for large area) · Special problem. The shape of the evaporation source is based on the requirements of the point-based process. The source of thin-film deposition is currently commonly used; the type of evaporation source, and the advantage of the line evaporation line evaporation source is the use of sweep area production, although the current line-based development is suitable for It can provide good film thickness uniformity in large accumulation. , Early / Earth accumulation source material Shen Renxun, when using a linear evaporation source to carry out multiple, uu, for example, ... to bring a Czech miscellaneous material into Y / body ... Hybrid materials and carrier materials / due to the Shen Shi, and "accumulation materials are on the arrival base: table) :; together: will produce hybrid materials can not be effective day: time difference 'cause ::? Shape, resulting in film thickness and Material distribution 2 :::: material present = problem, resulting in component quality and luminous efficiency: will appear on the next T, one because in the process of doping, I: evenly distributed in the carrier material to achieve: :: Material can: How to improve the efficiency of different materials in co-evaporation. Because it will be the technical focus to be overcome urgently. The problem of uniformity, [Summary of the Invention] The problems of the conventional technology above, the present invention The "reading device" & vapor deposition device arranges the nozzles corresponding to the source of the accumulated material provided in the same material (that is, arranged in a sinking manner, so-come, when multiple different evaporation centers:;:; :: Page 6 200523380 V. Description of the invention (3) Co-steaming The steamed bacon material reaches the surface of the substrate at the same time, and the milk knife cocoa made by IA, ..., and Jonzao can make a large area and uniform thickness. The problem of the difference in time between students and students' is therefore & Tai Gong B Day > — I ^ sentence of high-quality organic thin film. The hafnium plating device of the present invention has the following advantages. 1 · Since this evaporation device uses one + type for evaporation, the scanning type power supply module uses a scanning method. When the entire linear evaporation source module is manufactured, the substrate carrier is used to evacuate the entire cavity: / 乂 ,,,,, and near. In contrast, the source vacuum system is so large. One or two systems do not need to be like Know the point of steaming

The coating device is based on the use of a linear evaporation source to perform thin film substrates. "Too: Compared with the conventional point, the material utilization rate of rare materials can be increased by 10 times in order to make the present invention more expensive." 1 It is understood that there are further features and functions of R 、, u, and U in ^. The bismuth coordination diagram is not explained in detail below. [Embodiment] ^ Li Min σ refers to "Figure 1", which is based on Invented the first non-hybrid system-thinking map, the work of this evaporation device was originally a male non-evaporation material plus a base material: two in a vacuum environment to the surface of the substrate to be aggregated into one film. One ... Hole Attachment One This mining unit contains two main evaporation source modules 20. The important points are: the substrate carrier 10 and the wire. The substrate carrier 10 is used to carry the substrate 30, which can be silicon, round, τ ..., forged substrate 30. This base is a circular, metal substrate. , Organic or inorganic materials, and

Page 7 200523380 V. Description of the invention (4) Generally, in the process of doping, a glass substrate is usually used for vapor deposition. This substrate carrier 1 (K is connected to a constant temperature control system 70, ^, θ system 70 is used to control the temperature of the substrate 30, and to control the stability of the temperature of the substrate 30. In order to maintain the film strip plating process, The linear evaporation source module 20 is located at a position # corresponding to the substrate holder 丨 〇, and uses a scanning deposition method (similar to the form of a scanning file) to form the required advanced module type 2 evaporation on the substrate 30. Source module 20 and I to be vapor-deposited: 'This photomask 40 has a pre-designed specific pattern :: It allows people to deposit the plated material on a specific area on the substrate 30. This is similar to the problem of pattern drift due to the difference between the substrate 30 and the photomask 40 in the process of the substrate to be evaporated due to the thermal expansion coefficient. Second: ^: two: f group 2 ◦ Mainly The first nozzle unit 21 and an array are formed. The first nozzle unit 21 is a first type 30 deposited by a plurality of parallel-evaporated leather and film materials to perform the deposition. A first nozzle 2 11 is ejected to the second group of the substrate 221-into a mouth. This single flute element 22J is composed of several parallel rows. Within the second nozzle, and the second-nozzle unit 22 is set on the first nozzle unit 21, the coaxial form machine: Ϊ is arranged in a linear pattern, so that each of the first-nozzle 211 is deposited by deposition: 的 5 of the material The second: the periphery of the head 22 1, and the second type is to be printed on the substrate 30 by the second nozzle 221, so that the first nozzle unit 2 1st and

Page 8 200523380 V. Description of the invention (5) The materials of different steam cores in the two-spray f unit 22 can be deposited on the surface of the substrate 30 at the same time, in order to achieve the uniformity of film thickness and material distribution during co-evaporation. In order to produce a high-quality film with a large area and a uniform thickness. Adjacent to the first nozzle head 211 and the second nozzle head 221 of the first nozzle unit 21 and the second nozzle unit 22, the film thickness gauges 110 and 111 are respectively used to measure the deposition of different evaporation targets. The thickness of the thick film, at any time to feed the signal to the deposition rate, the thickness of the film deposition. . Oral feeding technology, so as to accurately control the thin film, please refer to "Figure 2-A" and "Figure 2_β" as shown :: the first nozzle unit 21 and the second spray of the embodiment: and the second nozzle In unit 22, = is a detailed side view of the assembly of the brother-nozzle unit 21 (the directions of this ",,, ^ 211, and the second nozzle 221" are perpendicular) The direction of the side view of the "43" is exactly the same as the "No. 1 The first nozzle unit 21 and the second shabu-shabu 50, 51, and the hanging steel 50, 51: = Beizao Wu 22 is connected to a crucible ... and the second steamed; Mining material-a kind of evaporation target 501 and the second type; hunting = J hanging pot 5., 51 to make the first different material to be deposited with 5 seeds per round, to spray two 221 to the substrate 3 Above, the 5th He head 211 and the second head 5 Γ can be binary / co-deposited. The heat generated by the heating heats the first type of ginseng Z resistive, inductive or electron beam and each crucible The pots 50 and 51 are divided into :: material 501 and the second evaporation target 511. Temperature controllers 90, 91, and batches to two heating controllers 80, 81, and one constant knife, respectively. J Controls the First Steamed Money Target 5 〇 丄 and the Second 200523 380

Keep the temperature of the first type fixed during the steaming process. The heating status of the steamed leather 5 and 1 and the evaporation target 501 and the second evaporation target 511 are provided. A tube 60 is provided between each of the first spray heads 211 and the crucible 50, respectively. The first type of gas molecules generated in the steel making 50 after steaming and steaming is transferred to each first spray head 211. Similarly, _ connecting pipes 61 are provided between the two spray heads 221 and the hanging steel 51 respectively, and the j produced by heating the second type of steamed dry material 511 in the hanging pan 51 is transmitted to each second spray head 221. A basket temperature controller is provided at the bottom of each of the first nozzles 211 and the second nozzles 221 with a nozzle temperature controller 120, 121, a thermostat ^ and a thermal insulation device (not shown) 1 to control each One nozzle 2 ιι is equal to the temperature of one nozzle 221 during the plating process to keep its temperature stable. Each first nozzle 211 and each second nozzle 221 are provided with-adiabatic cracking, because the first- The evaporation temperature of the two kinds of stripe leather 511 of two kinds of vapor-deposited leather and barn may differ by more than 100, so it is necessary to use a thermal insulation device 100 to prevent the second exchange. $ j The heat generating moon is the same as the vapor deposition material of the first embodiment, which is also applicable to the difference. The only difference is that a plurality of different nozzles corresponding to different targets are presented as nozzle units. The materials of different evaporation targets can be used. The nozzle unit is not only suitable for the evaporation of two different targets with two or more different targets. The nozzle units are set together so that they are arranged in a coaxial manner so that each spray can be deposited on the surface of the substrate 30 at the same time. 200523380 ， Explanation of the invention (7) When using two or more different target materials for film deposition, it is necessary to set corresponding film thickness meters according to different target materials to detect the thickness of the film deposited by different dry materials at any time. .

> Please refer to "Figure 4-A" and "Figure 4-B", which are respectively top views of the first nozzle unit 21 and the second nozzle unit 22 of the second embodiment of the present invention after being disassembled and combined; The "Figure 5" is a side view of the combination of the first nozzle unit 2 1 and the second nozzle unit 22; and the "Figure 6-A" and "Figure 6" show the first The detail of the nozzle unit 21 and the second nozzle unit 22 after disassembling and combining a group of the first nozzle 2 11 and the second nozzle 2 2 1 (Figure "This" 6-A "and" No. 6 -The side view of "B picture" is perpendicular to the direction of "5 picture"). The structure of this second embodiment is roughly the same as that of the first embodiment, but 'the first nozzle unit 21 and the second nozzle unit 22 are connected side by side' so that each first spray unit The head 2 11 and each of the second spray heads 2_2 1 are arranged in a linear staggered parallel manner. The arrangement of the first spray head 2 11 and the first spray head 221 is the same as that of the crucibles 50 and 51. The first type of vaporized dry material 501 and the second type of vaporized target material 5 11 can be simultaneously deposited on the surface of the substrate 3 °

Similarly, a thermal insulation device 100 is provided at each of the first nozzles 21 and the second nozzles 221. Since the first evaporation target 501 and the second evaporation target 511 are vaporized, The stable temperature may differ by more than 100 ° C. Therefore, the thermal insulation device 100 is needed to prevent the occurrence of thermal energy exchange between the two. Please refer to "Figure 7-A" and "Figure 7-B"

Page 11 200523380 Description of the invention (8) — Multiple (3) of the second embodiment — ^ ^ ^ ^ ^ Top view ^ "Figure 8-A" and "No. = early split and combined mouth" Unit 21, second nozzle list; 2218, BΛ ", is -U nozzle-nozzle 2U, second, head 221. : See the detail of the one in Hezui Unit 23 for details (see Figure 8A, verbal 231 * after solution and combination, Figure 7-B, the directions are perpendicular). To hand in the different nozzle units? For the drying of dry materials, only three different materials can be used. In this figure, the first nozzle unit 21 and the first; The 23 series is connected in a side-by-side manner. The bird 22 and the third nozzle unit are the same. The third nozzle unit 23 is the same as the second nozzle unit 22, and the third nozzle is the first nozzle unit 21 and the first crucible. The inner part 52 is used to place the third; the 23 part is connected to the crucible 52, and the hanging part 52 makes the third kind of steamed money dry to complete the material f 1 and you are sprayed by the third nozzle 231 by heating the material ; = 丄 Co-deposition of the material to be deposited. ® onto the substrate 30 for thin film inductive or electron beam generation and the hanging pan 52 is connected to a heater to control the temperature of the third evaporation target 5 2 1 The crucible 52 may use a resistance type and thermal energy to heat the third evaporation target 521.

The heating conditions of the controller 82 and a constant temperature controller 92 are used to maintain the thorium plating. …, A # 社 拉 b2 is provided between each of the third spray heads 231 and R 9 ～ 0 0, so as to heat up the crucible 52: let the connection official—the seeding target 521 after heating Generated gas

200523380 V. Description of the invention (9)-The body molecules are transmitted to each third head 231. And at the bottom of each third nozzle 2 31, a degree controller 122 and a ten-temperature device (not shown in the figure) and a thermal insulation device (not shown in the figure) are provided to control each third nozzle 2 3 1 said in the tomb 如 to observe the temperature of the process from% to maintain its temperature stability.

In addition, each of the first nozzles m, each of the second nozzles 221, and the third nozzles 231 is respectively provided with an adiabatic nozzle 100, because the first type of evaporation target 501 and the second type of evaporation target The stable temperature of the material 511 and the third evaporation target 521 during vaporization may differ by more than 100t. Therefore, the thermal insulation device 100 is required to prevent the occurrence of thermal energy exchange between the three. That is to say, each first head 2II, each second head 221, and each second head 2 31 can be aligned in a staggered manner, such first head 211, second head 221 The arrangement of the third nozzle 231 is the same as that in the crucibles 50, 51, and 5 2+, the first evaporation target 501, the second evaporation target 511, and the third evaporation target The plating target 5 2 1 can be simultaneously deposited on the surface of the substrate 30.

Please refer to "Figure 9-A" and "Figure 9-β", respectively, when the first embodiment and the second embodiment of the present invention are used in combination, a plurality of (3) different nozzle units are disassembled and combined. Top view; and as shown in "Figure 10-A" and "Figure 10-β", they are a group of the first nozzle unit 21, the second nozzle unit 22, and the third nozzle unit 23. The detailed side view of the head 211, the second head 221, and the third head 2 31 after being disassembled and combined (the side views of the "Figures 10-A" and "Figure 10-B" are exactly the same as those of the "No. 9-A "and" 9-B "are perpendicular). θ

Page 13 200523380 V. Description of the invention (10) When the user wants to perform evaporation of more than two different evaporation targets, in addition to arranging the different nozzle units in a staggered manner, it is also possible to first First, the nozzle unit 21 and the second nozzle unit 22 are nested together so that the first nozzle 211 and the second nozzle 221 corresponding to different leather materials are arranged in a coaxial manner. After that, the first nozzle unit 21 and the second nozzle unit 22 are connected together in parallel with the third nozzle unit 23 of Equation 1. Similarly, each of the hanging pots 50, 籀 T Γ ί a kind of 瘵 plated target 5 〇 1. The second type of evaporation target 5 11 and the second type of target 521 can be simultaneously deposited on the surface of the substrate 30. 5 :: The same nozzle unit is coaxially merged and staggered side by side. The actual demand will be the evaporation of two different materials, and the user can base it. One or more different nozzle units are provided in the evaporation device as described above, but are not used to limit the present day's only the preferred embodiments of the present invention, and encompass the scope of equal and clear implementation; that is, where The culture and modifications of applying for a patent in accordance with the present invention are all covered by the scope of the invention patent.

Page 14 200523380 Brief Description of Drawings Figure 1 is a schematic diagram of the first embodiment of the present invention; Figure 2-A is a top view of the first nozzle unit and the second nozzle unit of the first embodiment of the present invention when disassembled Figure 2-B is a top view of a combination of the first nozzle unit and the second nozzle unit according to the first embodiment of the present invention; Figure 3 is a first group of the first nozzle unit and the second nozzle unit A detailed side view of the nozzle and the second nozzle combined; Figure 4-A is a top view of the first nozzle unit and the second nozzle unit in the second embodiment of the present invention when disassembled; Figure 4-B is The top view of the first nozzle unit and the second nozzle unit combined according to the second embodiment of the present invention; FIG. 5 is a side view of the combination of the first nozzle unit and the second nozzle unit; A detailed side view of a nozzle unit and a second nozzle unit when a group of the first nozzle and the second nozzle are disassembled; FIG. 6-B is a group of the first nozzle unit and the second nozzle unit A detailed side view of the nozzle and the second nozzle combined; Figure 7-A shows this Top view of a plurality of (3) different nozzle units of the second embodiment of the invention when disassembled; Figure 7-B is a top view of a combination of multiple (3) different nozzle units of the second embodiment of the invention; Figure 8-A is a detailed side view of a group of the first nozzle unit, the second nozzle unit, and the third nozzle unit when the first nozzle unit, the second nozzle unit, and the third nozzle unit are disassembled; It is the first nozzle unit, the second nozzle unit and the third nozzle unit.

Page 15 200523380 The diagram briefly illustrates the detailed side view of a group of the first nozzle, the second nozzle, and the third nozzle in the set; Figure 9-A shows the first embodiment and the first embodiment of the present invention. Top view when multiple (3) different nozzle units are disassembled when the two embodiments are used in combination; Figure 9-B shows the multiple (3) different nozzles when the first embodiment and the second embodiment of the invention are used in combination Top view after unit combination; Figure 10-A shows the first nozzle unit, the second nozzle unit, and the third nozzle unit of the first nozzle unit, the second nozzle unit, and the third nozzle unit when they are disassembled. Detailed side view; and

Figure 10-B is a detailed side view of a group of the first nozzle unit, the second nozzle unit, and the third nozzle unit of the first nozzle unit, the second nozzle unit, and the third nozzle unit. [Symbol description] 10 Substrate carrier 20 Linear evaporation source module 21 First nozzle unit 211 First nozzle 22 Second nozzle unit 221 Second nozzle

23 Third nozzle unit 231 Third nozzle 30 Substrate 40 Photomask 5 0 Hanging steel

Page 16 200523380

Schematic illustration on page 17 501 First vapor deposition target 51 Crucible steel 511 Second vapor deposition target 52 Crucible 521 Second vapor deposition target 60 Connection tube 61 Connection tube 62 Connection tube 70 Thermostatic control system 80 Heater controller 81 Heater controller 82 Heater controller 90 Thermostat controller 91 Thermostat controller 92 Strange temperature controller 100 Insulation device 110 Film thickness meter 111 Film thickness meter 120 Nozzle temperature controller 121 Nozzle temperature controller 122 Nozzle Temperature Controller

Claims (1)

200523380 VI. Scope of patent application1. One, strip plating, set, set in a vacuum environment, and so on, the surface of the substrate is steamed with a thin film, which includes a substrate, a seat, which is used to carry the substrate And forming the thin film on the substrate by using a pair of the pure carrier and a product, the thin film includes two crucibles, each of which is a vapor deposition target, and is heated by a bamboo shoot. Each of the crucibles vaporizes the molecules of the evaporation target; and the first nozzle is a vehicle nozzle unit having a plurality of first nozzles, and the Gu 4th nozzle is connected to one of the The crucible and the second nozzle are connected to each other and have a plurality of second nozzles. Each of the nozzles is arranged in a coaxial manner so that each of the-= vapor deposition targets is simultaneously deposited on the substrate port. Each such 2. As in the i-th aspect of the scope of patent application. The base further includes a constant temperature control system, a coating, and a temperature of the substrate carrier. ', Π to control the base 3: during the thin film evaporation process: the Qiaoyuan source module described in the patent application scope includes a plurality of connections ...,' 2, where the linear evaporation target is heated ^ 1 ^ Do not place the second spray head in the crucible. The milk molecules are transferred to each of the first nozzles, and the steaming as described in the patent application @ Item i includes a heating control system, and each of the crucibles is tied to each of the bars. Heated state of plated leather and plywood Page 18 200523380 VI. Scope of patent application. 5. According to item 丨 of the scope of patent application, it further includes a constant temperature controller and a plating device, wherein the temperature of each crucible is fixed. During the evaporation process, each of the evaporation targets 6 · If the patent application scope is the first thermal device, it is installed in each of the above-mentioned vapor deposition devices, and it also includes _ 绝 7 · If the patent application scope item 1 So, /, and 乂 are where the second head contacts. And each of the second spray heads further includes a 1 vapor deposition device, and each of the first spray heads 8. The spraying temperature controller is more than solid as described in the scope of the patent application. And each of the first: the sprayer also includes the second steaming clock device, each of the first and the second nozzles also includes-[the evaporation device, each of the first nozzle 10. If you want a patent please No. = Ezekiel, adiabatic clothes. The source module further includes: a, a vapor deposition device, wherein the linear vaporization of another hanging steel is used in the other crucible to mount the other with another vapor deposition target, and by heating-the third The nozzle is single; the molecular evaporation of the sapwood; the three nozzles are connected to the other hanging pan and have nozzles, and each of the first and second nozzles is arranged outside the second nozzle and each of the two nozzles is coaxially interleaved with the first nozzle. The single nozzle of the 'f nozzle 5 is a straight line to align the twists and turns of the second nozzle unit as early as 70 and the second, 11 types; shovel: this is the target, and the target is simultaneously deposited on the surface of the substrate. 1 This kind of strip plating is arranged in a vacuum environment, and a thin film is deposited on the surface of the substrate, which includes: a soil plate and a substrate carrier for carrying the substrate; and 1 ^ · Page 19, 200523380 VI. Patent application Linear evaporation source module is set corresponding to the substrate carrier, and the thin film is formed on the substrate by scanning deposition, which includes:,-two crucibles, A vapor deposition target is respectively placed, and the molecules of the vapor deposition target are evaporated by heating each of the hanging steels; a first nozzle unit has a plurality of first nozzles, and each of the first nozzles Connected to one of the crucibles; and a second nozzle unit having a plurality of second spray heads, each of the second spray heads is connected to another crucible, the second nozzle unit is connected to the first nozzle A unit that makes each of the first nozzles and each of the second nozzles in a linear stagger, so that the evaporation target in each crucible is simultaneously deposited on the surface of the substrate. 1 2. The vapor deposition device as described in item 丨 丨 of the patent application scope, wherein the substrate carrier further includes a constant temperature control system to control the temperature of the substrate in the thin-film steamer during the process. / 1 3 · The vapor deposition device as described in item i of the patent application range, wherein the therapy source module further includes a plurality of connection pipes to separately heat up each of the current evaporation targets. The gas molecules are transmitted to each of the first and second nozzles. μ spray head 1 4 · The vapor deposition device as described in item 丨 丨 of the patent application scope, wherein the steel further includes a heating controller to control each of the vapor deposition. μ hanging condition. & heating of the sacrifice material 1 5. According to the vapor deposition device described in item 丨 丨 of the scope of patent application, the pot further includes a constant temperature controller to maintain the vapor deposition process. Page 20 200523380 6. Scope of patent application The temperature of the material is fixed. 16. The vapor deposition device according to item 11 of the scope of patent application, further comprising a thermal insulation device, which is disposed at a position where each of the first nozzles and each of the second nozzles contact. 1 7. According to the vapor deposition device described in item 11 of the scope of patent application, each of the first nozzle and each of the second nozzle further includes one or more nozzle temperature controllers. 1 8. According to the vapor deposition device described in item 11 of the scope of patent application, each of the first spray head and each of the second spray head further includes one or more thermostatic devices. 1 9. According to the vapor deposition device described in item 11 of the scope of patent application, each of the first spray head and each of the second spray head further includes more than one heat insulation device. Page 21