TW200516355A - Mask supporting apparatus using vacuum and light exposing system, and method using the same - Google Patents

Mask supporting apparatus using vacuum and light exposing system, and method using the same

Info

Publication number
TW200516355A
TW200516355A TW093131545A TW93131545A TW200516355A TW 200516355 A TW200516355 A TW 200516355A TW 093131545 A TW093131545 A TW 093131545A TW 93131545 A TW93131545 A TW 93131545A TW 200516355 A TW200516355 A TW 200516355A
Authority
TW
Taiwan
Prior art keywords
mask
vacuum
supporting apparatus
same
mask supporting
Prior art date
Application number
TW093131545A
Other languages
English (en)
Other versions
TWI290267B (en
Inventor
Chang-Won Lee
Yong-Hui Bae
Original Assignee
Dms Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dms Co Ltd filed Critical Dms Co Ltd
Publication of TW200516355A publication Critical patent/TW200516355A/zh
Application granted granted Critical
Publication of TWI290267B publication Critical patent/TWI290267B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/62—Holders for the original

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW093131545A 2003-11-13 2004-10-18 Mask supporting apparatus using vacuum and light exposing system, and method using the same TWI290267B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020030080249A KR100578262B1 (ko) 2003-11-13 2003-11-13 진공을 이용한 대면적 마스크 고정장치 및 그를 이용한노광장치와 노광방법

Publications (2)

Publication Number Publication Date
TW200516355A true TW200516355A (en) 2005-05-16
TWI290267B TWI290267B (en) 2007-11-21

Family

ID=34567722

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093131545A TWI290267B (en) 2003-11-13 2004-10-18 Mask supporting apparatus using vacuum and light exposing system, and method using the same

Country Status (5)

Country Link
US (1) US7206061B2 (zh)
JP (1) JP4128171B2 (zh)
KR (1) KR100578262B1 (zh)
CN (1) CN100342284C (zh)
TW (1) TWI290267B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI782139B (zh) * 2017-12-05 2022-11-01 日商亞多特克工程股份有限公司 光罩單元及曝光裝置
TWI863639B (zh) * 2023-04-21 2024-11-21 台灣積體電路製造股份有限公司 防止粒子攻擊的光罩、系統以及用以保護光罩的方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100742385B1 (ko) * 2006-01-23 2007-07-24 삼성에스디아이 주식회사 마스크 정렬장치 및 그 정렬방법
KR100900218B1 (ko) * 2007-05-17 2009-06-02 이병용 자외선 노광장치용 진공흡착프레임
KR100828969B1 (ko) * 2007-06-29 2008-05-13 주식회사 디엠에스 실란트 경화장치의 마스크글라스 고정유닛
JP5112151B2 (ja) * 2008-04-08 2013-01-09 株式会社アルバック 光照射装置
JP5523206B2 (ja) * 2010-05-31 2014-06-18 株式会社トプコン 露光装置
CN102402131A (zh) * 2011-11-11 2012-04-04 深南电路有限公司 一种曝光系统
JP6096515B2 (ja) * 2013-01-15 2017-03-15 株式会社アドテックエンジニアリング Ｉｔｏパターン露光装置
CN104020643B (zh) * 2013-03-01 2016-08-24 上海微电子装备有限公司 一种用于光刻设备的大掩模板面型补偿装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4054383A (en) * 1976-02-02 1977-10-18 International Business Machines Corporation Jig and process for contact printing
JPS60146674A (ja) * 1984-01-05 1985-08-02 Canon Inc チヤツク装置
GB2224136B (en) * 1988-10-19 1992-08-12 Dainippon Screen Mfg Auxiliary sheet for use with film holder of step-and-repeat machine
JPH04298753A (ja) * 1990-08-02 1992-10-22 Canon Inc レチクル支持装置
KR960018757A (ko) * 1994-11-30 1996-06-17 엄길용 포토마스크의 평탄성 유지하는 방법
KR970051901A (ko) * 1995-12-28 1997-07-29 이우복 대면적 하드 마스크용 마스크 홀더
KR200141130Y1 (ko) * 1996-10-07 1999-04-01 문정환 마스크 검사기의 마스크 흡착장치
SE9704193D0 (sv) * 1997-11-14 1997-11-14 Micronic Laser Systems Ab Device and method for flat holding of a substrate in microlithography
JP4048592B2 (ja) * 1998-04-03 2008-02-20 ソニー株式会社 露光装置
JP2002251017A (ja) * 2001-02-23 2002-09-06 Adtec Engineeng Co Ltd 露光装置
JP2003100619A (ja) * 2001-09-27 2003-04-04 Nikon Corp マスク保持装置、マスク保持方法、および露光装置
KR100522725B1 (ko) * 2002-04-04 2005-10-20 주식회사 디엠에스 대면적 마스크 및 이를 구비한 노광 시스템
KR20030082729A (ko) * 2002-04-18 2003-10-23 주식회사 디엠에스 노광 시스템
US6822731B1 (en) * 2003-06-18 2004-11-23 Asml Holding N.V. Method and apparatus for a pellicle frame with heightened bonding surfaces

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI782139B (zh) * 2017-12-05 2022-11-01 日商亞多特克工程股份有限公司 光罩單元及曝光裝置
TWI863639B (zh) * 2023-04-21 2024-11-21 台灣積體電路製造股份有限公司 防止粒子攻擊的光罩、系統以及用以保護光罩的方法

Also Published As

Publication number Publication date
US20050105074A1 (en) 2005-05-19
JP4128171B2 (ja) 2008-07-30
KR100578262B1 (ko) 2006-05-11
TWI290267B (en) 2007-11-21
CN100342284C (zh) 2007-10-10
CN1617019A (zh) 2005-05-18
JP2005148747A (ja) 2005-06-09
KR20050046221A (ko) 2005-05-18
US7206061B2 (en) 2007-04-17

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees