TW200513811A - Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method - Google Patents

Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method

Info

Publication number
TW200513811A
TW200513811A TW093125538A TW93125538A TW200513811A TW 200513811 A TW200513811 A TW 200513811A TW 093125538 A TW093125538 A TW 093125538A TW 93125538 A TW93125538 A TW 93125538A TW 200513811 A TW200513811 A TW 200513811A
Authority
TW
Taiwan
Prior art keywords
sub
spots
resist layer
carrying
manufacturing
Prior art date
Application number
TW093125538A
Other languages
English (en)
Inventor
Roger Anton Marie Timmermans
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Publication of TW200513811A publication Critical patent/TW200513811A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW093125538A 2003-08-27 2004-08-26 Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method TW200513811A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03103227 2003-08-27

Publications (1)

Publication Number Publication Date
TW200513811A true TW200513811A (en) 2005-04-16

Family

ID=34259214

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093125538A TW200513811A (en) 2003-08-27 2004-08-26 Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method

Country Status (7)

Country Link
US (1) US7459709B2 (zh)
EP (1) EP1660942A2 (zh)
JP (1) JP2007503611A (zh)
KR (1) KR20060120606A (zh)
CN (1) CN1842746A (zh)
TW (1) TW200513811A (zh)
WO (1) WO2005022263A2 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI629569B (zh) * 2005-03-29 2018-07-11 日商尼康股份有限公司 曝光裝置、微元件的製造方法、及元件的製造方法
US20080117402A1 (en) * 2006-11-20 2008-05-22 Asml Netherlands B.V. Lithographic apparatus and method
JP5224341B2 (ja) * 2008-05-15 2013-07-03 株式会社ブイ・テクノロジー 露光装置及びフォトマスク
US8426119B2 (en) * 2009-10-21 2013-04-23 GM Global Technology Operations LLC Dynamic projection method for micro-truss foam fabrication
JP5704525B2 (ja) * 2010-08-19 2015-04-22 株式会社ブイ・テクノロジー マイクロレンズアレイを使用したスキャン露光装置
JP5515119B2 (ja) * 2010-10-05 2014-06-11 株式会社ブイ・テクノロジー マイクロレンズアレイを使用したスキャン露光装置
KR102151254B1 (ko) * 2013-08-19 2020-09-03 삼성디스플레이 주식회사 노광장치 및 그 방법
JP7023601B2 (ja) * 2016-11-14 2022-02-22 株式会社アドテックエンジニアリング ダイレクトイメージング露光装置及びダイレクトイメージング露光方法
JP7196271B2 (ja) * 2016-11-14 2022-12-26 株式会社アドテックエンジニアリング ダイレクトイメージング露光装置及びダイレクトイメージング露光方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19522936C2 (de) * 1995-06-23 1999-01-07 Fraunhofer Ges Forschung Vorrichtung zum Strukturieren einer photolithographischen Schicht
AU1975197A (en) * 1996-02-28 1997-10-01 Kenneth C. Johnson Microlens scanner for microlithography and wide-field confocal microscopy
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
KR20050044371A (ko) * 2001-11-07 2005-05-12 어플라이드 머티어리얼스, 인코포레이티드 광학 스폿 그리드 어레이 프린터
EP1316850A1 (en) * 2001-11-30 2003-06-04 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4373731B2 (ja) * 2003-07-22 2009-11-25 富士フイルム株式会社 描画装置及び描画方法
US7187399B2 (en) * 2003-07-31 2007-03-06 Fuji Photo Film Co., Ltd. Exposure head with spatial light modulator
US7253881B2 (en) * 2004-12-29 2007-08-07 Asml Netherlands Bv Methods and systems for lithographic gray scaling

Also Published As

Publication number Publication date
US20060261289A1 (en) 2006-11-23
CN1842746A (zh) 2006-10-04
WO2005022263A3 (en) 2005-10-13
WO2005022263A2 (en) 2005-03-10
KR20060120606A (ko) 2006-11-27
US7459709B2 (en) 2008-12-02
EP1660942A2 (en) 2006-05-31
JP2007503611A (ja) 2007-02-22

Similar Documents

Publication Publication Date Title
KR100756503B1 (ko) 리소그래피 장치 및 디바이스 제조방법
KR101313514B1 (ko) 노광 장치 및 광원 장치
CN1196072C (zh) 制作平滑的对角组件的数字光刻系统
CN100520591C (zh) 光刻装置及器件制造方法
JP3170074B2 (ja) 光学走査装置
KR100354158B1 (ko) 리소그래피 시스템
ATE442606T1 (de) Scanner
JP5286744B2 (ja) 空間光変調ユニット、照明光学系、露光装置及びデバイスの製造方法
US20060087635A1 (en) Exposure apparatus and device manufacturing method
WO2003087946A3 (en) Imaging method
TWI344062B (en) Optical system for transforming numerical aperture
TW200611080A (en) Method for forming pattern
TW200513811A (en) Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method
TW200632570A (en) Lithographic apparatus and device manufacturing method
US7443412B2 (en) Exposure apparatus adopting organic light-emitting diode array as light source
TWI277838B (en) Lithographic apparatus and device manufacturing method
JP2004200221A (ja) レーザマーキング方法及び装置
CN102414025A (zh) 光学成像系统
EP1722273A2 (en) Exposure method and exposure device
EP1211066A3 (de) Abbildungsvorrichtung
JP2008112093A (ja) 露光方法及び露光装置
US6096461A (en) Laser exposure utilizing secondary mask capable of concentrating exposure light onto primary mask
US9746780B2 (en) Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method
US6366339B1 (en) Laser exposure utilizing secondary mask capable of concentrating exposure light onto primary mask
JP2005056995A (ja) パターン描画方法、及びパターン描画装置