TW200512058A - Electrolytic processing apparatus and electrolytic processing method - Google Patents
Electrolytic processing apparatus and electrolytic processing methodInfo
- Publication number
- TW200512058A TW200512058A TW093123170A TW93123170A TW200512058A TW 200512058 A TW200512058 A TW 200512058A TW 093123170 A TW093123170 A TW 093123170A TW 93123170 A TW93123170 A TW 93123170A TW 200512058 A TW200512058 A TW 200512058A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- processing
- electrolytic processing
- processing apparatus
- electrolytic
- Prior art date
Links
- 238000003672 processing method Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 10
- 239000007788 liquid Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 230000003746 surface roughness Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003206147A JP2005054205A (ja) | 2003-08-05 | 2003-08-05 | 電解加工装置及び電解加工方法 |
JP2004082863A JP2005264304A (ja) | 2004-03-22 | 2004-03-22 | 電解加工装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200512058A true TW200512058A (en) | 2005-04-01 |
Family
ID=34117901
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093123170A TW200512058A (en) | 2003-08-05 | 2004-08-03 | Electrolytic processing apparatus and electrolytic processing method |
Country Status (3)
Country | Link |
---|---|
US (1) | US20070095659A1 (zh) |
TW (1) | TW200512058A (zh) |
WO (1) | WO2005012600A1 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103317197A (zh) * | 2013-06-26 | 2013-09-25 | 大连理工大学 | 一种平面电化学加工装置 |
CN104152979A (zh) * | 2014-09-04 | 2014-11-19 | 蒙家革 | 一种电解蚀刻头和数控电解蚀刻系统及蚀刻方法 |
CN114453689A (zh) * | 2022-02-15 | 2022-05-10 | 南京工业大学 | 一种用于掩膜电解加工的柱塞式冲液加工装置 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7799200B1 (en) * | 2002-07-29 | 2010-09-21 | Novellus Systems, Inc. | Selective electrochemical accelerator removal |
US11487307B2 (en) * | 2018-07-02 | 2022-11-01 | Overcast Innovations Llc | Method and system for providing a centralized appliance hub |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH462981A (fr) * | 1967-04-28 | 1968-09-30 | Charmilles Sa Ateliers | Dispositif d'avance et de guidage rectilignes de l'électrode dans une machine à usiner par électro-érosion |
EP0213825A3 (en) * | 1985-08-22 | 1989-04-26 | Molecular Devices Corporation | Multiple chemically modulated capacitance |
JP2001260012A (ja) * | 2000-03-15 | 2001-09-25 | Mitsubishi Materials Corp | ウェーハ研磨用ヘッド及びこれを用いた研磨装置 |
FR2803284B1 (fr) * | 2000-01-03 | 2002-04-12 | Michel Bernard | Dispositif automatique de purification d'eau potable |
US7125477B2 (en) * | 2000-02-17 | 2006-10-24 | Applied Materials, Inc. | Contacts for electrochemical processing |
US7153410B2 (en) * | 2000-08-30 | 2006-12-26 | Micron Technology, Inc. | Methods and apparatus for electrochemical-mechanical processing of microelectronic workpieces |
US6478937B2 (en) * | 2001-01-19 | 2002-11-12 | Applied Material, Inc. | Substrate holder system with substrate extension apparatus and associated method |
US7638030B2 (en) * | 2001-06-18 | 2009-12-29 | Ebara Corporation | Electrolytic processing apparatus and electrolytic processing method |
JP3995463B2 (ja) * | 2001-12-13 | 2007-10-24 | 株式会社荏原製作所 | 電解加工方法 |
JP2004209588A (ja) * | 2002-12-27 | 2004-07-29 | Ebara Corp | 研磨装置及び研磨方法 |
-
2004
- 2004-07-28 US US10/559,724 patent/US20070095659A1/en not_active Abandoned
- 2004-07-28 WO PCT/JP2004/011100 patent/WO2005012600A1/en active Application Filing
- 2004-08-03 TW TW093123170A patent/TW200512058A/zh unknown
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103317197A (zh) * | 2013-06-26 | 2013-09-25 | 大连理工大学 | 一种平面电化学加工装置 |
CN104152979A (zh) * | 2014-09-04 | 2014-11-19 | 蒙家革 | 一种电解蚀刻头和数控电解蚀刻系统及蚀刻方法 |
CN104152979B (zh) * | 2014-09-04 | 2017-02-01 | 蒙家革 | 一种电解蚀刻头和数控电解蚀刻系统及蚀刻方法 |
CN114453689A (zh) * | 2022-02-15 | 2022-05-10 | 南京工业大学 | 一种用于掩膜电解加工的柱塞式冲液加工装置 |
Also Published As
Publication number | Publication date |
---|---|
US20070095659A1 (en) | 2007-05-03 |
WO2005012600A1 (en) | 2005-02-10 |
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